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WO1997030570A1 - Dispositif pour preparer un plasma et son mode d'emploi - Google Patents

Dispositif pour preparer un plasma et son mode d'emploi Download PDF

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Publication number
WO1997030570A1
WO1997030570A1 PCT/DE1997/000214 DE9700214W WO9730570A1 WO 1997030570 A1 WO1997030570 A1 WO 1997030570A1 DE 9700214 W DE9700214 W DE 9700214W WO 9730570 A1 WO9730570 A1 WO 9730570A1
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WO
WIPO (PCT)
Prior art keywords
plasma
electrodes
produced
electrons
electrode
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/DE1997/000214
Other languages
German (de)
English (en)
Inventor
Horst Schmidt-Böcking
Karl-Heinz Gericke
Anselm Tobias Haas
Michael Lock
Volker Dangendorf
Angela Demian
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Individual
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Individual filed Critical Individual
Publication of WO1997030570A1 publication Critical patent/WO1997030570A1/fr
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/48—Generating plasma using an arc
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/34—Chemical or biological purification of waste gases
    • B01D53/74—General processes for purification of waste gases; Apparatus or devices specially adapted therefor
    • B01D53/86—Catalytic processes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • B01J19/087—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy
    • B01J19/088—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy giving rise to electric discharges
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/47—Generating plasma using corona discharges
    • H05H1/475—Filamentary electrodes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2259/00—Type of treatment
    • B01D2259/80—Employing electric, magnetic, electromagnetic or wave energy, or particle radiation
    • B01D2259/812—Electrons
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2217/00—Gas-filled discharge tubes
    • H01J2217/38—Cold-cathode tubes
    • H01J2217/49—Display panels, e.g. not making use of alternating current
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2261/00—Gas- or vapour-discharge lamps

Definitions

  • the present invention relates to a device for producing a plasma according to claim 1 and the use of such a device according to claims 6 to 11.
  • JP-OS 07142192 it is known to assemble several plasmas in order to obtain a flat plasma. None is described there about the shape of the individual plasmas and the generation of these individual plasmas.
  • the invention proposes a device according to claim 1, by means of which a flat plasma can be generated.
  • the area is defined by the electrodes and in particular their mechanical attachment. Due to the sharp edges of the electrodes, electrons can escape at these edges, which in comparison to the point-like emergence of electrons from a tip already results in a significantly larger spatial expansion.
  • the fact that several pairs of electrodes can be present means that a flat plasma can be generated.
  • Individual parameters of the plasma can advantageously be set precisely by setting a corresponding electric field strength.
  • a plasma can be produced in a simple manner, the production of which does not require any particular demands on the environmental conditions. Due to the sufficiently large electrical field strength generated by the electrical voltage that is applied to the electrode pairs, the plasma can be produced in particular under ambient conditions such as normal air pressure and room temperature. Another advantage over other known methods for producing a plasma is that a large plasma area is created without the need to generate a large-volume plasma.
  • the device according to claim 1 can be used to produce a plasma which is precisely defined with regard to its spatial extent and with regard to the components contained in it and their temperature distribution.
  • This plasma area can at the same time have sufficient expansion for a large number of applications.
  • the ratio of the plasma surface to the plasma volume can be selected as desired, ie can also be selected as large as desired.
  • locally limited plasmas can be integrated into a large plasma area. Due to the possibility of the small and at the same time controllable expansion of the plasma in one direction, the plasma can be brought as close as possible to objects which are to be processed or changed by means of this plasma.
  • the plasma as a whole can be adapted to different applications.
  • the individual plasma surfaces can differ in their composition and temperature distribution. If, for example, a gas flows through these plasma areas, this gas can be processed one after the other with different plasmas.
  • the device according to claim 3 is particularly easy to manufacture.
  • the plasma can be adjusted with both temporal and local accuracy via the electric field strength.
  • the result such as the rate of a certain chemical conversion of starting materials, can be monitored as a measured variable.
  • This measured variable can be compared with a reference variable.
  • the electrical field strength is then adjusted so that the measured variable approximates the reference variable. It is advantageous that this regulation is possible with a very short time constant.
  • the electric field strength can be varied in the order of nanoseconds.
  • Claims 6 to 11 show advantageous applications of the device.
  • a spectral adjustability results from the use of a certain gas.
  • Fig. 2 another device for generating a plasma in a section in
  • FIG. 1 shows a side view of a device with which a plasma according to the invention can be generated.
  • 103 electrodes 101 and 102 face each other on a surface.
  • Electrodes are advantageously produced using microstructure technology or nanostructure technology.
  • a plastic film for example with an aluminum film.
  • the electrode spacing depends on the wavelength of the radiation with which this structure is generated. If this structure is generated, for example, with light in the visible range, this results in a distance of the electrodes in the order of the wavelength of visible light, i.e. of a few 100 nm.
  • Electrodes 101 and 102 advantageously have a sharp edge 104 on their upper side.
  • a voltage is applied between the electrodes 101 and 102, an electrical field 105 is created between these electrodes.
  • the sharp edge 104 then creates a particularly large electrical field 105 of almost atomic orders of magnitude on the upper side of the electrodes 101, 102, which facilitates the exit of electrons 106 from the electrode 101.
  • a voltage which is negative in relation to the electrode 102 is applied to the electrode 101.
  • These electrodes 101, 102 is applied to materials such as glass or plastic film by means of already known technology, for example lithographic processes. Depending on the manufacturing process, this results in the distance between the electrodes 101 and 102, which has a significant influence on the electric field strength. Due to the rectangular etchable electrode structures, ie the sharp edges 104 of the electrodes 101 and 102 on their upper side, field strengths of such a magnitude are achieved even at comparatively low voltages that electrons 106 are emitted. It is also possible to obtain a cold emission of electrons 106 from the cold electrode 101 of the electrode 101 designed as a solid-state electrode.
  • the electrodes 101 and 102 are then connected with direct or alternating voltages of the order of magnitude of a few 100 V, as is known from microelectronics.
  • the electric field 105 can then be varied in the order of ns by voltages of this order of magnitude. This makes it possible to control or regulate the plasma with a rapidly variable manipulated variable. Overall, there is a control or regulation with a very short time constant.
  • the electrons 106 are then accelerated as free electrons in the strong electric fields 105 and generate ions or radicals by impact ionization with the surrounding atoms or molecules of the surrounding gas atmosphere.
  • the resulting microplasma between the electrodes 101 and 102 can be switched through appropriate wiring, i.e. Applying voltage to electrodes 101 and 102 can be switched on and off quickly.
  • a plasma can therefore be produced under these conditions under standard ambient conditions, i.e. Normal pressure, room temperature and without pre-ionization.
  • the plasma has a small extent perpendicular to the electric field lines, so that the ions can be easily extracted with pulsed electric fields and applied to other adjacent surfaces.
  • a gas can flow in the direction of arrow 107 over the surface and thereby interact with the plasma, which is formed in particular on the upper side of electrodes 101 and 102. It is also conceivable to bring this surface close to the top of a solid to be processed by means of the plasma. Another direction of flow of a gas can be formed substantially perpendicular to the plane of the paper.
  • FIG. 2 shows a further embodiment of a cathode 101 and an associated anode 102, by means of which a plasma can be generated.
  • Anode 102 and cathode 101 be attached to a plastic film 103.
  • the electric field 105 forms again between the electrodes 101 and 102 when an electrical voltage is applied.
  • the electrodes 101 and 102 again have a sharp edge 104 on the top.
  • the plastic film 103 acting as a carrier has holes 202, the gas can flow in the direction of arrow 201 if the number of holes 202 is sufficiently large. The gas then flows vertically through the plasma surface.
  • Fig. 2 shows the device in a section in side view, in which the holes 202 are just visible.
  • FIG. 3 shows the device according to FIG. 2 in a top view.
  • the cathode 101 is again provided with the reference number 101.
  • the plastic film 103 is penetrated by holes 202. These holes 202 lead to a honeycomb structure of the plastic film 103, so that there is still a mechanical connection of the electrodes and the gas can still flow vertically through the plasma surface.
  • the gas could only interact with a plasma surface.
  • Appropriate wiring of the individual electrodes in the area allows the plasma to be designed differently within the area.
  • a procedure for producing such a plasma which can be regulated and / or controlled in three dimensions, is given by the so-called LIGA technology.
  • LIGA lithography, electroforming, molding, described for example in W. Ehrfeld, H. Lehr: Radiation, Physics ND Chemistry 45 (3), 349-365 1995)). If an electrode structure is thus produced in this method in such a way that electrodes are always sufficiently close together and are correspondingly sharp-edged, corresponding three-dimensional plasma fields can be generated.
  • FIG. 4 shows a side view of an arrangement of electrodes 101 and 102, which in turn have correspondingly sharp edges 104 at the corners. These electrodes are held by supporting walls (for example made of plastic) at a defined distance held. The electrical field 105 then arises again between the electrodes. The gas flows through corresponding holes in the direction of arrow 401. The gas then flows through a plurality of plasma surfaces.
  • FIG. 5 shows a top view of the device according to FIG. 4.
  • the electrodes 101 and 102 are again held by a carrier made of plastic 103, which, however, must again have holes 202 so that the gas can flow through the plasma surfaces.
  • the production takes place, for example, in such a way that metallic electrodes are introduced into a solid plastic block.
  • LIGA technology the corresponding structure with the sharp edges of the electrodes is then worked out.
  • the electrons in the plasma have high energy and are therefore able to break practically any electronic bond.
  • the kinetic energy of the electrons can be set comparatively precisely, so that the energy can be adjusted to stimulate certain reactions.
  • the energy of the electrons can be varied within an energy range of a few 10 eV.
  • the primary electron acts like a dynamically induced catalyst, which is available for further reactions unused even after the reaction.
  • the electron gas is extremely hot and can break practically any chemical bond, the gas atoms or molecules remain practically at the ambient temperature of the reactor vessel. This means that chemical reaction zones can be created with the plasma, which practically have two separately selectable temperatures for reaction stage 1 (e.g. dissociation of the starting molecules) and for reaction stage 2 (synthesis of the end products).
  • the plasmas therefore allow a completely new type of gas phase chemistry.
  • environmental protection e.g. Cold burns induced by electron impact reduce dioxins and nitrogen oxides. Higher nitrogen oxides can also be separated into nitrogen and oxygen.

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  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Analytical Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Biomedical Technology (AREA)
  • General Chemical & Material Sciences (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • General Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Organic Chemistry (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)

Abstract

L'invention concerne un procédé pour préparer un plasma, dans lequel le plasma est produit par interaction d'électrons libres avec d'autres particules. Le plasma est produit sous la forme d'une nappe plasmique tandis que sont produits des électrons libres présentant une intensité de champ électrique de ce type, ladite nappe plasmique étant produite par émission à froid, sans conditions ambiantes particulières telles qu'une température élevée, à partir d'une structure solide, notamment du métal. L'intensité de champ électrique provoquant l'émission est établie, de manière limitée localement, par la géométrie de la structure d'électrode, notamment par des structures d'électrode allant de quelques nm au mm. De nombreux champs électriques limités localement se raccordent les uns aux autres sensiblement dans un même plan.
PCT/DE1997/000214 1996-02-13 1997-02-04 Dispositif pour preparer un plasma et son mode d'emploi Ceased WO1997030570A1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE19605226A DE19605226C2 (de) 1996-02-13 1996-02-13 Vorrichtung zur Erzeugung mehrerer Mikroplasmen bei Umgebungstemperatur und Verwendung einer derartigen Vorrichtung
DE19605226.2 1996-02-13

Publications (1)

Publication Number Publication Date
WO1997030570A1 true WO1997030570A1 (fr) 1997-08-21

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Application Number Title Priority Date Filing Date
PCT/DE1997/000214 Ceased WO1997030570A1 (fr) 1996-02-13 1997-02-04 Dispositif pour preparer un plasma et son mode d'emploi

Country Status (2)

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DE (1) DE19605226C2 (fr)
WO (1) WO1997030570A1 (fr)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2798077A1 (fr) * 1999-09-03 2001-03-09 Lab Sa Procede et installation d'epuration de gaz
WO2021096853A1 (fr) * 2019-11-13 2021-05-20 Stitch Partners Appareil et procédés pour éliminer la fumée dans des environnements fermés à l'aide de microplasmas non thermiques

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1999035893A2 (fr) 1998-01-08 1999-07-15 The University Of Tennessee Research Corporation Accelerateur d'ecoulement gazeux para-electrique
US6406759B1 (en) 1998-01-08 2002-06-18 The University Of Tennessee Research Corporation Remote exposure of workpieces using a recirculated plasma
DE19826418C2 (de) * 1998-06-16 2003-07-31 Horst Schmidt-Boecking Vorrichtung zur Erzeugung eines Plasma sowie ein Herstellungsverfahren für die Vorrichtung sowie Verwendung der Vorrichtung
DE19958016B4 (de) * 1998-12-02 2013-07-18 Stefan Laure Plasmagenerator
US6821379B2 (en) 2001-12-21 2004-11-23 The Procter & Gamble Company Portable apparatus and method for treating a workpiece

Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SU1140189A2 (ru) * 1983-06-24 1985-02-15 Предприятие П/Я А-3609 Газоразр дна спектральна лампа
US4820226A (en) * 1987-10-14 1989-04-11 The United States Of America As Represented By The United States Department Of Energy Getter pump for hydrogen and hydrocarbon gases
EP0404645A1 (fr) * 1989-06-23 1990-12-27 Thomson Tubes Electroniques Panneaux à plasma à zones de décharges délimitées
FR2677043A1 (fr) * 1991-05-29 1992-12-04 Solems Sa Procede, dispositif et appareil pour traiter un substrat par un plasma basse pression.
JPH0572520A (ja) * 1991-09-11 1993-03-26 Sony Corp プラズマアドレス電気光学装置
US5366701A (en) * 1991-11-01 1994-11-22 Environmental Plasma Arc Technology, Inc. Apparatus and method for reducing pollutants in effluent gas flow utilizing an ionizing and resonance means
US5403680A (en) * 1988-08-30 1995-04-04 Osaka Gas Company, Ltd. Photolithographic and electron beam lithographic fabrication of micron and submicron three-dimensional arrays of electronically conductive polymers
JPH07142192A (ja) * 1993-11-16 1995-06-02 Fuji Electric Co Ltd プラズマ溶射装置
JPH07176267A (ja) * 1993-11-05 1995-07-14 Sony Corp プラズマアドレス液晶表示装置の製造方法
US5526151A (en) * 1994-09-27 1996-06-11 Sony Corporation Method of manufacturing a plasma addressed liquid crystal display device having planarized barrier ribs

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* Cited by examiner, † Cited by third party
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DE3605735A1 (de) * 1986-02-22 1986-10-30 Holger Dr. 7400 Tübingen Hübner Vorrichtung zur erzeugung kurzer elektronen- ionen- oder roentgenimpulse mit hohem richtstrahlwert

Patent Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SU1140189A2 (ru) * 1983-06-24 1985-02-15 Предприятие П/Я А-3609 Газоразр дна спектральна лампа
US4820226A (en) * 1987-10-14 1989-04-11 The United States Of America As Represented By The United States Department Of Energy Getter pump for hydrogen and hydrocarbon gases
US5403680A (en) * 1988-08-30 1995-04-04 Osaka Gas Company, Ltd. Photolithographic and electron beam lithographic fabrication of micron and submicron three-dimensional arrays of electronically conductive polymers
EP0404645A1 (fr) * 1989-06-23 1990-12-27 Thomson Tubes Electroniques Panneaux à plasma à zones de décharges délimitées
FR2677043A1 (fr) * 1991-05-29 1992-12-04 Solems Sa Procede, dispositif et appareil pour traiter un substrat par un plasma basse pression.
JPH0572520A (ja) * 1991-09-11 1993-03-26 Sony Corp プラズマアドレス電気光学装置
US5366701A (en) * 1991-11-01 1994-11-22 Environmental Plasma Arc Technology, Inc. Apparatus and method for reducing pollutants in effluent gas flow utilizing an ionizing and resonance means
JPH07176267A (ja) * 1993-11-05 1995-07-14 Sony Corp プラズマアドレス液晶表示装置の製造方法
JPH07142192A (ja) * 1993-11-16 1995-06-02 Fuji Electric Co Ltd プラズマ溶射装置
US5526151A (en) * 1994-09-27 1996-06-11 Sony Corporation Method of manufacturing a plasma addressed liquid crystal display device having planarized barrier ribs

Non-Patent Citations (4)

* Cited by examiner, † Cited by third party
Title
DATABASE WPI Section EI Week 8535, Derwent World Patents Index; Class S03, AN 85-216137, XP002033830 *
PATENT ABSTRACTS OF JAPAN vol. 017, no. 399 (P - 1579) 26 July 1993 (1993-07-26) *
PATENT ABSTRACTS OF JAPAN vol. 095, no. 009 31 October 1995 (1995-10-31) *
PATENT ABSTRACTS OF JAPAN vol. 095, no. 010 30 November 1995 (1995-11-30) *

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2798077A1 (fr) * 1999-09-03 2001-03-09 Lab Sa Procede et installation d'epuration de gaz
WO2021096853A1 (fr) * 2019-11-13 2021-05-20 Stitch Partners Appareil et procédés pour éliminer la fumée dans des environnements fermés à l'aide de microplasmas non thermiques
US11413627B2 (en) 2019-11-13 2022-08-16 Stitch Partners Apparatus and methods for clearing smoke within closed environments using non-thermal microplasmas

Also Published As

Publication number Publication date
DE19605226A1 (de) 1997-08-14
DE19605226C2 (de) 2001-02-22

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