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WO1986000752A1 - Tube a faisceau pour le declenchement de lumiere de rayons x - Google Patents

Tube a faisceau pour le declenchement de lumiere de rayons x Download PDF

Info

Publication number
WO1986000752A1
WO1986000752A1 PCT/DE1985/000236 DE8500236W WO8600752A1 WO 1986000752 A1 WO1986000752 A1 WO 1986000752A1 DE 8500236 W DE8500236 W DE 8500236W WO 8600752 A1 WO8600752 A1 WO 8600752A1
Authority
WO
WIPO (PCT)
Prior art keywords
membrane
area
jet pipe
pipe according
vacuum
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/DE1985/000236
Other languages
German (de)
English (en)
Inventor
Hans Betz
Bertram Brucker
Heinz-Ulrich Scheunemann
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fraunhofer Gesellschaft zur Foerderung der Angewandten Forschung eV
Original Assignee
Fraunhofer Gesellschaft zur Foerderung der Angewandten Forschung eV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fraunhofer Gesellschaft zur Foerderung der Angewandten Forschung eV filed Critical Fraunhofer Gesellschaft zur Foerderung der Angewandten Forschung eV
Publication of WO1986000752A1 publication Critical patent/WO1986000752A1/fr
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H7/00—Details of devices of the types covered by groups H05H9/00, H05H11/00, H05H13/00
    • H05H7/001—Arrangements for beam delivery or irradiation

Definitions

  • the invention relates to a beam pipe for decoupling X-ray light from a UHV region of an X-ray radiation source according to the preamble of patent claim 1.
  • the X-ray radiation source can, for example, be an electronic circulation system, such as. an electron storage ring. or a. Be electron synchrotron.
  • the synchrotron radiation of such electron circulation systems has recently been increasingly used as a powerful X-ray light or X-ray radiation source for scientific experiments, for material analysis or in the semiconductor industry.
  • beam tubes For coupling out the synchrotron radiation from such electron circulation systems, so-called beam tubes are used, which establish the connection between the electron circulation system and the area (application area) in which the x-ray radiation is used, for example, for one of the aforementioned purposes.
  • the jet pipes are used over their entire length and also the second area, i.e. the application area is carried out in ultra-high vacuum technology, since the beam tube creates a direct connection between the electron circulation system and the application area.
  • the beam tubes are designed as continuous tubes, so that in order to maintain the ultra-high vacuum in the electron circulation system, the beam tube and the area of application must also be implemented in UHV technology. This leads to a considerable increase in costs, since ultra-high vacuum components are several times more expensive than, for example, fine vacuum components.
  • a pressure reduction in the jet pipe has not yet been considered.
  • differential pressure stages are used for such pressure reductions. These essentially consist of a very long and narrow pipe, into which additional screens may be installed, which increase the line resistance.
  • the pressure reduction of such differential pressure stages is not only very limited, the constricted pipe cross-section also has the disadvantage that the optical path is also greatly restricted. This is very disadvantageous if, for example, the full geometrical extent of the synchrotron light is to be used.
  • differential pressure stages there would be great problems with adjusting the beam path in the beam pipe which has these narrow points.
  • a large aperture is required if the light beam by means of optical elements te, for example with mirrors, etc. to be able to illuminate large areas in the vertical direction.
  • such elements must be in the ultra-high vacuum part in order to maintain their optical quality. All of this has resulted in the average person having developed a prejudice against pressure reduction in the jet pipe.
  • the invention has for its object to provide a beam pipe for coupling out X-ray light according to the preamble of claim 1, which allows a pressure reduction for the X-ray light with a large aperture.
  • this thin membrane seals the UHV area of the X-ray source and the smaller UHV part of the jet pipe in a vacuum-tight manner against a second area of the jet pipe as well as, if applicable, the area of application in which there is a higher pressure, for example a fine vacuum of approx. 10 -2 hPa.
  • a vacuum-tight membrane - as has been recognized according to the invention - can nevertheless be almost transparent to X-rays.
  • the steel tube according to the invention has the same aperture as the prior art with the same geometric dimensions. It is particularly advantageous if - as claimed in claim 2 - the membrane consists of materials with a low mass number because of the strong mass dependence of the X-ray absorption.
  • membrane In claim 3 it is characterized that preferred materials for the membrane are metals or semiconductors, for example aluminum, beryllium, magnesium or silicon and their compounds.
  • the use of the membrane according to the invention for reducing the pressure has the advantage that the jet pipe is easy to handle and the membrane takes up little space. Since the absorption, particularly of the elements to be used with preference, is very high in the long-wave range, the heat load for the subsequent components is very low. The good thermal stability and the high thermal conductivity of silicon, for example, allow the use of this material, inter alia, even at the highest radiation intensities. This is another surprising advantage of the membrane according to the invention.
  • Fig. 2 shows another way to attach the membrane
  • Fig. 3 shows a preferred embodiment of a membrane according to the invention.
  • Fig. 1 shows part of a jet pipe.
  • a thin, but vacuum-tight membrane 1 separates an ultra-high vacuum area A of the jet pipe from an area B in which a substantially higher pressure, for example a pressure in the fine vacuum or high vacuum area, is maintained.
  • Area B is followed by the application area, not shown, in which experimental setups are arranged; a vacuum connection between the application area and area B is not absolutely necessary.
  • the area A is directly connected in terms of vacuum to the X-ray radiation source, which is designed using UHV technology.
  • the pressure is typically a few 10 -9 hPa, while in range B the pressure is typically 10 -2 hpa is.
  • the membrane 1 is attached to a window flange 2.
  • the window flange 2 is connected to the flanges 4 and 5 of the jet pipe using conventional vacuum sealing technology.
  • the known vacuum sealing technology is only shown schematically by the elements 3, for example O-rings.
  • the thin membrane 1 is connected to the window flange 2 in a vacuum-tight manner by means of sealing rings 6 and a retaining ring 7.
  • the two sealing rings 6 can preferably be arranged slightly offset, so that the membrane 1 is simultaneously slightly tensioned.
  • the sealing rings 6 can be conventional vacuum sealing elements, for example O-rings, but soft metal rings, for example made of gold, indium or lead, can also be used as sealing rings.
  • a window flange 2 which carries the membrane 1
  • the membrane 1 can be easily replaced in the event of damage or if another radiation source is used.
  • FIG. 2 shows a further possibility of attaching the membrane 1 to the window flange 2 in a vacuum-tight manner.
  • the membrane 1 is tightly connected to the window flange 2 by means of a sealing and adhesive compound 8, which is very thin.
  • Vacuum-compatible adhesives commonly used, for example two-component adhesives, can be used as sealants and adhesives. Since the adhesive surfaces are very small, the emission rate of the adhesive is very low.
  • FIG. 3 shows a special embodiment of the thin membrane 1.
  • the membrane 1 has a circular area 1 a on, the thickness of which is very small compared to the surrounding annular area 1b.
  • Such a membrane can be produced, for example, by etching a 400 to 500 ⁇ m thick silicon wafer in such a way that the circular region 1a is formed.
  • the annular area 1b, ie the edge also serves as a clamping frame for the film 1a and can be connected to the window flange 2, for example in the manner shown in FIGS. 1 and 2, without the actual membrane 1a itself being mechanically stressed.
  • the use of a membrane according to the invention has the advantage that an excellent pressure reduction is achieved.
  • a membrane according to the invention has the advantage that an excellent pressure reduction is achieved.
  • Silicon foil with a thickness of 1.5 ⁇ m and an area of 15 cm 2 can achieve pressure reductions of 10 -9 hPa against 10 -2 hPa at any time.
  • the membrane can be connected to the window flange by means of a sintering or diffusion process.
  • Silver for example, can be used as the diffusion material.
  • This method of vacuum-tight fastening has the advantage that the window flange 2 together with the membrane can also be heated to higher temperatures when the UHV part of the vacuum system is heated.
  • the x-ray permeable membrane can also have a rectangular or other shape.

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • X-Ray Techniques (AREA)
  • Particle Accelerators (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

Tube à faisceau pour le déclenchement de lumière à rayons X provenant d'une zone d'ultravide d'une source de rayonnement X, où est maintenu un vide poussé jusqu'à un ultravide, dans une seconde zone. Le présent tube à faisceau est caractérisé par le fait qu'il est séparé en deux zones (A, B) entre lesquelles est placée une membrane séparant de manière étanche la zone (A) reliée à la source de rayonnement X de la seconde zone (B), mais qui est pourtant pratiquement perméable à la lumière de rayons X. Dans un mode préférentiel de réalisation, la membrane est formée d'un matériau de faible nombre massique, par exemple du silicium ou de l'aluminium.
PCT/DE1985/000236 1984-07-07 1985-07-08 Tube a faisceau pour le declenchement de lumiere de rayons x Ceased WO1986000752A1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE19843425146 DE3425146A1 (de) 1984-07-07 1984-07-07 Strahlrohr zum auskoppeln von roentgenlicht aus einer synchrotronstrahlungsquelle
DEP3425146.4 1984-07-07

Publications (1)

Publication Number Publication Date
WO1986000752A1 true WO1986000752A1 (fr) 1986-01-30

Family

ID=6240135

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/DE1985/000236 Ceased WO1986000752A1 (fr) 1984-07-07 1985-07-08 Tube a faisceau pour le declenchement de lumiere de rayons x

Country Status (4)

Country Link
EP (1) EP0187786A1 (fr)
JP (1) JPS62501110A (fr)
DE (1) DE3425146A1 (fr)
WO (1) WO1986000752A1 (fr)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0469895A3 (en) * 1990-08-01 1992-08-12 Canon Kabushiki Kaisha X-ray transmitting window and method of mounting the same

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3711293A1 (de) * 1987-04-03 1988-10-27 Fraunhofer Ges Forschung Schnellschliessendes durchgangsventil eines vakuum-schutzsystems

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE760042C (de) * 1940-09-20 1954-02-22 Siemens & Halske A G Schnellverschluss fuer ein vakuumdichtes Gefaess, insbesondere ein Zyklotron
DE2951387A1 (de) * 1979-12-20 1981-07-02 Deutsches Elektronen-Synchrotron Desy, 2000 Hamburg Schnellschlussklappenventil fuer hochvakuum- oder ultrahoch-vakuumbetriebe
DE3022127A1 (de) * 1980-06-10 1982-01-07 Hahn-Meitner-Institut für Kernforschung Berlin GmbH, 1000 Berlin Strahlendurchtrittsfenster mit einer in einen rahmen gefassten duennen metallfolie
US4342917A (en) * 1978-01-16 1982-08-03 The Perkin-Elmer Corporation X-ray lithography apparatus and method of use
WO1983003674A1 (fr) * 1982-04-14 1983-10-27 Battelle Development Corp Production de rayons x

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE760042C (de) * 1940-09-20 1954-02-22 Siemens & Halske A G Schnellverschluss fuer ein vakuumdichtes Gefaess, insbesondere ein Zyklotron
US4342917A (en) * 1978-01-16 1982-08-03 The Perkin-Elmer Corporation X-ray lithography apparatus and method of use
DE2951387A1 (de) * 1979-12-20 1981-07-02 Deutsches Elektronen-Synchrotron Desy, 2000 Hamburg Schnellschlussklappenventil fuer hochvakuum- oder ultrahoch-vakuumbetriebe
DE3022127A1 (de) * 1980-06-10 1982-01-07 Hahn-Meitner-Institut für Kernforschung Berlin GmbH, 1000 Berlin Strahlendurchtrittsfenster mit einer in einen rahmen gefassten duennen metallfolie
WO1983003674A1 (fr) * 1982-04-14 1983-10-27 Battelle Development Corp Production de rayons x

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
IBM Technical Disclosure Bulletin, Vol. 26, No. 1, June 1983, New York (US) L.V. GAL et al.: "Cascade Beryllium Window Arrangement for X-Ray Lithography", page 34, see page 34, lines 1-26 *

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0469895A3 (en) * 1990-08-01 1992-08-12 Canon Kabushiki Kaisha X-ray transmitting window and method of mounting the same

Also Published As

Publication number Publication date
JPS62501110A (ja) 1987-04-30
DE3425146A1 (de) 1986-01-16
EP0187786A1 (fr) 1986-07-23

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