USD1112390S1 - Flow control ring - Google Patents
Flow control ringInfo
- Publication number
- USD1112390S1 USD1112390S1 US29/953,438 US202429953438F USD1112390S US D1112390 S1 USD1112390 S1 US D1112390S1 US 202429953438 F US202429953438 F US 202429953438F US D1112390 S USD1112390 S US D1112390S
- Authority
- US
- United States
- Prior art keywords
- flow control
- control ring
- view
- ring
- ornamental design
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Images
Description
Claims (1)
- The ornamental design of a flow control ring as shown and described.
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US29/953,438 USD1112390S1 (en) | 2024-07-22 | 2024-07-22 | Flow control ring |
| JP2025000648F JP1802266S (en) | 2024-07-22 | 2025-01-15 | Flow Control Ring |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US29/953,438 USD1112390S1 (en) | 2024-07-22 | 2024-07-22 | Flow control ring |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| USD1112390S1 true USD1112390S1 (en) | 2026-02-10 |
Family
ID=96135335
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| US29/953,438 Active USD1112390S1 (en) | 2024-07-22 | 2024-07-22 | Flow control ring |
Country Status (2)
| Country | Link |
|---|---|
| US (1) | USD1112390S1 (en) |
| JP (1) | JP1802266S (en) |
Citations (25)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6245192B1 (en) | 1999-06-30 | 2001-06-12 | Lam Research Corporation | Gas distribution apparatus for semiconductor processing |
| US6753255B1 (en) * | 2002-05-17 | 2004-06-22 | Lsi Logic Corporation | Process for wafer edge profile control using gas flow control ring |
| US6921556B2 (en) | 2002-04-12 | 2005-07-26 | Asm Japan K.K. | Method of film deposition using single-wafer-processing type CVD |
| US20070128862A1 (en) | 2005-11-04 | 2007-06-07 | Paul Ma | Apparatus and process for plasma-enhanced atomic layer deposition |
| US7408225B2 (en) | 2003-10-09 | 2008-08-05 | Asm Japan K.K. | Apparatus and method for forming thin film using upstream and downstream exhaust mechanisms |
| US7661386B2 (en) | 2001-02-09 | 2010-02-16 | Tokyo Electron Limited | Film forming device |
| KR20120008074U (en) | 2011-05-17 | 2012-11-27 | 김원택 | Hooded hooded jacket with a zipper to the head to block strong winds |
| US20130129577A1 (en) | 2011-11-23 | 2013-05-23 | ASM Holding B.V. | Chamber sealing member |
| US8911553B2 (en) | 2010-10-19 | 2014-12-16 | Applied Materials, Inc. | Quartz showerhead for nanocure UV chamber |
| US9123510B2 (en) | 2013-06-12 | 2015-09-01 | ASM IP Holding, B.V. | Method for controlling in-plane uniformity of substrate processed by plasma-assisted process |
| US20170298509A1 (en) | 2016-04-15 | 2017-10-19 | Applied Materials, Inc. | Micro-Volume Deposition Chamber |
| USD876504S1 (en) * | 2017-04-03 | 2020-02-25 | Asm Ip Holding B.V. | Exhaust flow control ring for semiconductor deposition apparatus |
| US10593539B2 (en) | 2004-02-26 | 2020-03-17 | Applied Materials, Inc. | Support assembly |
| US20200312681A1 (en) | 2019-03-28 | 2020-10-01 | Asm Ip Holding B.V. | Substrate processing apparatus |
| US11094511B2 (en) | 2018-11-13 | 2021-08-17 | Applied Materials, Inc. | Processing chamber with substrate edge enhancement processing |
| US20210280448A1 (en) * | 2020-03-04 | 2021-09-09 | Asm Ip Holding B.V. | Alignment fixture for a reactor system |
| US20220259731A1 (en) * | 2021-02-16 | 2022-08-18 | Asm Ip Holding B.V. | Substrate processing apparatus with flow control ring, and substrate processing method |
| US11646184B2 (en) | 2019-11-29 | 2023-05-09 | Asm Ip Holding B.V. | Substrate processing apparatus |
| USD990441S1 (en) * | 2021-09-07 | 2023-06-27 | Asm Ip Holding B.V. | Gas flow control plate |
| US20240076778A1 (en) | 2022-09-01 | 2024-03-07 | Asm Ip Holding B.V. | System and apparatus for a reaction chamber |
| USD1040304S1 (en) * | 2018-12-17 | 2024-08-27 | Applied Materials, Inc. | Deposition ring for physical vapor deposition chamber |
| USD1049067S1 (en) * | 2022-04-04 | 2024-10-29 | Applied Materials, Inc. | Ring for an anti-rotation process kit for a substrate processing chamber |
| US20240391645A1 (en) * | 2023-05-25 | 2024-11-28 | Asm Ip Holding B.V. | Method, assembly and kit for transporting a gas distribution device |
| US20250092516A1 (en) * | 2023-09-15 | 2025-03-20 | Asm Ip Holding B.V. | Substrate processing apparatus with flow control ring and method of using same |
| USD1069863S1 (en) * | 2022-08-04 | 2025-04-08 | Applied Materials, Inc. | Deposition ring of a process kit for semiconductor substrate processing |
-
2024
- 2024-07-22 US US29/953,438 patent/USD1112390S1/en active Active
-
2025
- 2025-01-15 JP JP2025000648F patent/JP1802266S/en active Active
Patent Citations (25)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6245192B1 (en) | 1999-06-30 | 2001-06-12 | Lam Research Corporation | Gas distribution apparatus for semiconductor processing |
| US7661386B2 (en) | 2001-02-09 | 2010-02-16 | Tokyo Electron Limited | Film forming device |
| US6921556B2 (en) | 2002-04-12 | 2005-07-26 | Asm Japan K.K. | Method of film deposition using single-wafer-processing type CVD |
| US6753255B1 (en) * | 2002-05-17 | 2004-06-22 | Lsi Logic Corporation | Process for wafer edge profile control using gas flow control ring |
| US7408225B2 (en) | 2003-10-09 | 2008-08-05 | Asm Japan K.K. | Apparatus and method for forming thin film using upstream and downstream exhaust mechanisms |
| US10593539B2 (en) | 2004-02-26 | 2020-03-17 | Applied Materials, Inc. | Support assembly |
| US20070128862A1 (en) | 2005-11-04 | 2007-06-07 | Paul Ma | Apparatus and process for plasma-enhanced atomic layer deposition |
| US8911553B2 (en) | 2010-10-19 | 2014-12-16 | Applied Materials, Inc. | Quartz showerhead for nanocure UV chamber |
| KR20120008074U (en) | 2011-05-17 | 2012-11-27 | 김원택 | Hooded hooded jacket with a zipper to the head to block strong winds |
| US20130129577A1 (en) | 2011-11-23 | 2013-05-23 | ASM Holding B.V. | Chamber sealing member |
| US9123510B2 (en) | 2013-06-12 | 2015-09-01 | ASM IP Holding, B.V. | Method for controlling in-plane uniformity of substrate processed by plasma-assisted process |
| US20170298509A1 (en) | 2016-04-15 | 2017-10-19 | Applied Materials, Inc. | Micro-Volume Deposition Chamber |
| USD876504S1 (en) * | 2017-04-03 | 2020-02-25 | Asm Ip Holding B.V. | Exhaust flow control ring for semiconductor deposition apparatus |
| US11094511B2 (en) | 2018-11-13 | 2021-08-17 | Applied Materials, Inc. | Processing chamber with substrate edge enhancement processing |
| USD1040304S1 (en) * | 2018-12-17 | 2024-08-27 | Applied Materials, Inc. | Deposition ring for physical vapor deposition chamber |
| US20200312681A1 (en) | 2019-03-28 | 2020-10-01 | Asm Ip Holding B.V. | Substrate processing apparatus |
| US11646184B2 (en) | 2019-11-29 | 2023-05-09 | Asm Ip Holding B.V. | Substrate processing apparatus |
| US20210280448A1 (en) * | 2020-03-04 | 2021-09-09 | Asm Ip Holding B.V. | Alignment fixture for a reactor system |
| US20220259731A1 (en) * | 2021-02-16 | 2022-08-18 | Asm Ip Holding B.V. | Substrate processing apparatus with flow control ring, and substrate processing method |
| USD990441S1 (en) * | 2021-09-07 | 2023-06-27 | Asm Ip Holding B.V. | Gas flow control plate |
| USD1049067S1 (en) * | 2022-04-04 | 2024-10-29 | Applied Materials, Inc. | Ring for an anti-rotation process kit for a substrate processing chamber |
| USD1069863S1 (en) * | 2022-08-04 | 2025-04-08 | Applied Materials, Inc. | Deposition ring of a process kit for semiconductor substrate processing |
| US20240076778A1 (en) | 2022-09-01 | 2024-03-07 | Asm Ip Holding B.V. | System and apparatus for a reaction chamber |
| US20240391645A1 (en) * | 2023-05-25 | 2024-11-28 | Asm Ip Holding B.V. | Method, assembly and kit for transporting a gas distribution device |
| US20250092516A1 (en) * | 2023-09-15 | 2025-03-20 | Asm Ip Holding B.V. | Substrate processing apparatus with flow control ring and method of using same |
Also Published As
| Publication number | Publication date |
|---|---|
| JP1802266S (en) | 2025-06-27 |
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