US3881919A - Ternary alloys - Google Patents
Ternary alloys Download PDFInfo
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- US3881919A US3881919A US431025A US43102574A US3881919A US 3881919 A US3881919 A US 3881919A US 431025 A US431025 A US 431025A US 43102574 A US43102574 A US 43102574A US 3881919 A US3881919 A US 3881919A
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- metal
- chromium
- alloys
- cobalt
- chloride
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- 229910002058 ternary alloy Inorganic materials 0.000 title claims abstract description 21
- 229910052751 metal Inorganic materials 0.000 claims abstract description 29
- 239000002184 metal Substances 0.000 claims abstract description 28
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims abstract description 19
- 229910052804 chromium Inorganic materials 0.000 claims abstract description 19
- 239000011651 chromium Substances 0.000 claims abstract description 19
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 claims abstract description 9
- 229910052725 zinc Inorganic materials 0.000 claims abstract description 9
- 239000011701 zinc Substances 0.000 claims abstract description 9
- 229910017052 cobalt Inorganic materials 0.000 claims abstract description 8
- 239000010941 cobalt Substances 0.000 claims abstract description 8
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 claims abstract description 8
- 229910052738 indium Inorganic materials 0.000 claims abstract description 8
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 claims abstract description 8
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims abstract description 7
- 229910052787 antimony Inorganic materials 0.000 claims abstract description 5
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 claims abstract description 5
- 229910052793 cadmium Inorganic materials 0.000 claims abstract description 5
- BDOSMKKIYDKNTQ-UHFFFAOYSA-N cadmium atom Chemical compound [Cd] BDOSMKKIYDKNTQ-UHFFFAOYSA-N 0.000 claims abstract description 5
- 230000000737 periodic effect Effects 0.000 claims abstract description 5
- 229910045601 alloy Inorganic materials 0.000 abstract description 16
- 239000000956 alloy Substances 0.000 abstract description 16
- 150000002739 metals Chemical class 0.000 abstract description 10
- 230000002378 acidificating effect Effects 0.000 abstract description 5
- 239000002253 acid Substances 0.000 description 12
- 238000007747 plating Methods 0.000 description 12
- GVPFVAHMJGGAJG-UHFFFAOYSA-L cobalt dichloride Chemical compound [Cl-].[Cl-].[Co+2] GVPFVAHMJGGAJG-UHFFFAOYSA-L 0.000 description 8
- 150000001875 compounds Chemical class 0.000 description 8
- JIAARYAFYJHUJI-UHFFFAOYSA-L Zinc chloride Inorganic materials [Cl-].[Cl-].[Zn+2] JIAARYAFYJHUJI-UHFFFAOYSA-L 0.000 description 7
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 6
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 5
- 150000007513 acids Chemical class 0.000 description 5
- 239000000908 ammonium hydroxide Substances 0.000 description 5
- 150000001450 anions Chemical class 0.000 description 5
- 238000004070 electrodeposition Methods 0.000 description 5
- 239000000758 substrate Substances 0.000 description 5
- TXUICONDJPYNPY-UHFFFAOYSA-N (1,10,13-trimethyl-3-oxo-4,5,6,7,8,9,11,12,14,15,16,17-dodecahydrocyclopenta[a]phenanthren-17-yl) heptanoate Chemical compound C1CC2CC(=O)C=C(C)C2(C)C2C1C1CCC(OC(=O)CCCCCC)C1(C)CC2 TXUICONDJPYNPY-UHFFFAOYSA-N 0.000 description 4
- LCALOJSQZMSPHJ-QMMMGPOBSA-N (2s)-2-amino-3-cyclohexa-1,5-dien-1-ylpropanoic acid Chemical compound OC(=O)[C@@H](N)CC1=CCCC=C1 LCALOJSQZMSPHJ-QMMMGPOBSA-N 0.000 description 4
- 229910021626 Tin(II) chloride Inorganic materials 0.000 description 4
- 238000000576 coating method Methods 0.000 description 4
- 238000005260 corrosion Methods 0.000 description 4
- 230000007797 corrosion Effects 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- CLDVQCMGOSGNIW-UHFFFAOYSA-N nickel tin Chemical group [Ni].[Sn] CLDVQCMGOSGNIW-UHFFFAOYSA-N 0.000 description 4
- 239000001119 stannous chloride Substances 0.000 description 4
- 235000011150 stannous chloride Nutrition 0.000 description 4
- 239000011592 zinc chloride Substances 0.000 description 4
- 235000005074 zinc chloride Nutrition 0.000 description 4
- MIMUSZHMZBJBPO-UHFFFAOYSA-N 6-methoxy-8-nitroquinoline Chemical compound N1=CC=CC2=CC(OC)=CC([N+]([O-])=O)=C21 MIMUSZHMZBJBPO-UHFFFAOYSA-N 0.000 description 3
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 3
- 239000003153 chemical reaction reagent Substances 0.000 description 3
- WDHWFGNRFMPTQS-UHFFFAOYSA-N cobalt tin Chemical compound [Co].[Sn] WDHWFGNRFMPTQS-UHFFFAOYSA-N 0.000 description 3
- 238000009713 electroplating Methods 0.000 description 3
- 150000002736 metal compounds Chemical class 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 239000000243 solution Substances 0.000 description 3
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonia chloride Chemical compound [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 description 2
- RGHNJXZEOKUKBD-SQOUGZDYSA-N D-gluconic acid Chemical compound OC[C@@H](O)[C@@H](O)[C@H](O)[C@@H](O)C(O)=O RGHNJXZEOKUKBD-SQOUGZDYSA-N 0.000 description 2
- 239000012736 aqueous medium Substances 0.000 description 2
- 229910002056 binary alloy Inorganic materials 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 150000001805 chlorine compounds Chemical class 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- PUZPDOWCWNUUKD-UHFFFAOYSA-M sodium fluoride Chemical compound [F-].[Na+] PUZPDOWCWNUUKD-UHFFFAOYSA-M 0.000 description 2
- UMGDCJDMYOKAJW-UHFFFAOYSA-N thiourea Chemical compound NC(N)=S UMGDCJDMYOKAJW-UHFFFAOYSA-N 0.000 description 2
- 229910001369 Brass Inorganic materials 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- 241000861718 Chloris <Aves> Species 0.000 description 1
- 229910021555 Chromium Chloride Inorganic materials 0.000 description 1
- 229910019043 CoSn Inorganic materials 0.000 description 1
- RGHNJXZEOKUKBD-UHFFFAOYSA-N D-gluconic acid Natural products OCC(O)C(O)C(O)C(O)C(O)=O RGHNJXZEOKUKBD-UHFFFAOYSA-N 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- 101150089644 Rnls gene Proteins 0.000 description 1
- 229910001128 Sn alloy Inorganic materials 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Natural products NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 description 1
- 239000003929 acidic solution Substances 0.000 description 1
- 238000013019 agitation Methods 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 125000002877 alkyl aryl group Chemical group 0.000 description 1
- 238000005275 alloying Methods 0.000 description 1
- 235000019270 ammonium chloride Nutrition 0.000 description 1
- 239000010951 brass Substances 0.000 description 1
- 238000005282 brightening Methods 0.000 description 1
- 239000003518 caustics Substances 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- QSWDMMVNRMROPK-UHFFFAOYSA-K chromium(3+) trichloride Chemical compound [Cl-].[Cl-].[Cl-].[Cr+3] QSWDMMVNRMROPK-UHFFFAOYSA-K 0.000 description 1
- -1 cobaltous ions Chemical class 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 150000004673 fluoride salts Chemical class 0.000 description 1
- 238000009472 formulation Methods 0.000 description 1
- 239000000174 gluconic acid Substances 0.000 description 1
- 235000012208 gluconic acid Nutrition 0.000 description 1
- 150000004820 halides Chemical class 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- PSCMQHVBLHHWTO-UHFFFAOYSA-K indium(iii) chloride Chemical compound Cl[In](Cl)Cl PSCMQHVBLHHWTO-UHFFFAOYSA-K 0.000 description 1
- 229910052500 inorganic mineral Inorganic materials 0.000 description 1
- 150000008040 ionic compounds Chemical class 0.000 description 1
- 239000011707 mineral Substances 0.000 description 1
- 235000010755 mineral Nutrition 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- SQTLECAKIMBJGK-UHFFFAOYSA-I potassium;titanium(4+);pentafluoride Chemical compound [F-].[F-].[F-].[F-].[F-].[K+].[Ti+4] SQTLECAKIMBJGK-UHFFFAOYSA-I 0.000 description 1
- 239000011253 protective coating Substances 0.000 description 1
- 230000003716 rejuvenation Effects 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011775 sodium fluoride Substances 0.000 description 1
- 235000013024 sodium fluoride Nutrition 0.000 description 1
- LJRGBERXYNQPJI-UHFFFAOYSA-M sodium;3-nitrobenzenesulfonate Chemical compound [Na+].[O-][N+](=O)C1=CC=CC(S([O-])(=O)=O)=C1 LJRGBERXYNQPJI-UHFFFAOYSA-M 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- BDHFUVZGWQCTTF-UHFFFAOYSA-M sulfonate Chemical compound [O-]S(=O)=O BDHFUVZGWQCTTF-UHFFFAOYSA-M 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 150000003467 sulfuric acid derivatives Chemical class 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 238000005494 tarnishing Methods 0.000 description 1
- 101150051314 tin-10 gene Proteins 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- MDFPKPWKVUWTRD-UHFFFAOYSA-L zinc indium(3+) dichloride Chemical compound [In+3].[Cl-].[Zn+2].[Cl-] MDFPKPWKVUWTRD-UHFFFAOYSA-L 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/56—Electroplating: Baths therefor from solutions of alloys
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C13/00—Alloys based on tin
Definitions
- the alloys are electrodeposited from aqueous acidic baths at a temperature of about 50 85 C and current density of about 5 45 A/ft.
- This invention relates to new and improved ternary alloys, to aqueous electrolytic baths from which the ailoys are deposited, and to a process for forming the alloys.
- an object of the invention is to provide a new and improved alloy which not only provides a chromium-like brightness and tarnish resistance, but also provides color stability and hardness superior to that found in any of the alloying metals individually.
- Still another object of the invention is to provide new and improved electrolytic plating baths which are easily formulated and from which ternary alloys can be efficiently deposited on a wide variety of substrates to give coatings which are hard, bright, tarnish resistant and which have good color stability.
- Another object is to provide a new and improved process whereby tin, cobalt and a third metal are electrolytically co-deposited to form a hard, bright coating which is stable and highly resistant to tarnishing.
- a new and improved ternary alloy consisting essentially of about 40 -]90 wt. tin, about l 50 wt. cobalt and about I 28 wt. of a third metal selected from Periodic Group II III,, or V1
- Third metals include zinc, cadmium, indium, antimony or chromium, of which zinc, indium and chromium are preferred.
- the third metals may be present in the alloy singly or in admixtures of two or more.
- the plating baths of the invention are aqueous and highly acidic, and contain compounds providing stannous ions, cobaltous ions and ions of the third metal or metals to be deposited.
- the ternary alloys are efficiently codeposited from the baths at a temperature of about 50 85C. and current density of about 5 45 A/ftF.
- the alloys exhibit a hardness, chromium-like brightness and color stability which make them useful as coatings on a wide variety of substrates.
- the ternary alloys of the invention are electrodeposited from highly acidic, aqueous baths of pH of about 1-3.
- a mineral acid is utilized for this purpose, such as a hydro-halide or a sulfur acid.
- Preferred acids are hydrochloric and fluoboric acids since such acids provide anions in common with anions of preferred compounds of the metals to be deposited, and thus promote stability of the baths and good control of electrodeposition therefrom.
- the metals to be deposited are present in the baths as ionic compounds, the anions of the compounds and other conditions being chosen such that the compounds are substantially completely soluble in the aqueous medium. Accordingly, the compounds may be present as halides, sulfates, or otherwise but preferably the compounds will have anions common to the anions of the acid utilized to provide the high acidity. Since hydrochloric and fluoboric acids are the preferred acids, the preferred metal compounds will be the chlorides and fluoborates of the metals.
- cobalt chloride stannous chloride zinc chloride about 20-400 g./l. about 10-100 g./l. about l0-l75 g./I.
- cobalt chloride about [00-300 g./l. stannous fluoborate (50% solution) about 25-75 mls./l. fluoboric acid about -225 g./l.
- Indium chloride as a substitute for zinc chloride preferably is utilized at a concentration of about 5 3S g./l. and chromium chloride as a substitute for either of the foregoing compounds is effective at a concentration of about 5 55 g./l.
- Electrodeposition including the cell form of electrolytic arrangement and type of substrate to be coated, control of concentration and rejuvenation of the baths, are well known in the art and do not require further description.
- the well known Hull cell may be utilized.
- the current density preferred for efficient electrodeposition is about 5 45 A/ft.
- the percentage of each metal in the ternary alloy will vary in direct proportion to the concentration of each metal in the plating bath. To a lesser extent the percentage of each metal in the alloy will also vary in accordance with electroplating conditions such as temperature, current density and pH. It is believed that the new alloy exists as Sn (Co, X) or (Sn, X) (Co, X) where X is the third metal.
- the resultant ternary alloys are analogous to tin-nickel and tin-cobalt with respect to tarnish resistance, the alloys exhibit not only chromium-like brightness but also consistently good color and color stability. Moreover, while the ternary alloys resist corrosion essentially to the same extent as chromium, they have a higher resistance than chromium to strong alkali under a superimposed anoidic potential, that is, whereas chromium will dissolve if made anodic in a caustic solution, the ternary alloys of the invention are not affected. The alloys of the invention therefore are more resistant to chloride attack than chromium and will resist salt spray and salt water contact better than chromium.
- the plating baths may contain auxiliary reagents for various purposes in accordance with the understanding in the art.
- auxiliary reagents are ammonium chloride, gluconic acid, thiourea, fluorides such as ammonium bifluoride, sodium fluoride and potassium titanium fluoride, and various surfactants and the like such as alkyl aryl sodium sulfonate.
- fluorides such as ammonium bifluoride, sodium fluoride and potassium titanium fluoride
- surfactants and the like such as alkyl aryl sodium sulfonate.
- Such reagents generally are useful in minor amounts, for example, about 0.01 to about 10 grams per liter of plating bath, to obtain their known benefits.
- the ternary alloys may be co-deposited electrolytically upon a wide variety of substrates, including metals such as steel, brass and zinc, as well as ceramics and plastics, in accordance with techniques well known in the art for coating such substrates.
- aqueous plating bath formulations and conditions of electrodeposition are intended as further illustration of the invention but are not necessarily limited of the scope of the invention except as set forth in the claims. All parts and percentages in these examples as well as in the foregoing specifica tion are by weight unless otherwise indicated.
- the ternary alloy deposited has an approximate composition: tin, 40 90%; cobalt, l 50%; third metal, 1 28%.
- Plating Conditions Temperature 60-80 C, 10 Current density 10-30 A/ft.” pH of bath 1-3 EXAMPLE 3 Composition of ueens bath Cobalt Chloride -400 g./1r Stannous Chloride 10-100 g./l. Ammonium Bifluoridc 20-400 g./l. Hydrochloric Acid (37%) 40-150 mls/l. Ammonium H droxide (28%) 10-50 rnls./l. Chromium Ch oride 5-55 g1]. 20 Plating Conditions:
- Ammonium Hydroxide (28%) 25-150 m1s./l.
- Fluoboric Acid 75-225 gJl.
- Ammonium Hydroxide 28%) 25-150 mlsrll.
- Indium Chloride 5-35 3.11.
- Plating Conditions Temperature 50-85 C. Current density 5-45 A/f't. pH [-3 What is claimed is: l. A bright, tarnish resistant and color stable ternary alloy consisting essentially of about 40 90 wt. tin 10 50 wt. cobalt 1 28 wt. third metal wherein said third metal is antimony or a metal of Periodic Group 11,, 111,, or V1 2. A ternary alloy as in claim 1 wherein said third 5 metal is zinc, cadmium, indium, or chromium.
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Mechanical Engineering (AREA)
- Electroplating And Plating Baths Therefor (AREA)
Abstract
Bright, tarnish resistant and color stable ternary alloys of about 40 - 90% of tin, about 10 - 50% cobalt and about 1 - 28% of a third metal of Periodic Group IIB, IIIA or VIB. Typical third metals are zinc, cadmium, indium, antimony or chromium. The alloys are electrodeposited from aqueous acidic baths at a temperature of about 50* - 85*C. and current density of about 5 45 A/ft.2.
Description
Hyner et a1.
May 6, 1975 TERNARY ALLOYS Inventors: Jacob Hyner; Robert A. Michelson,
both of Waterbury, Conn.
Whyeo Chromium Company Inc., Thomaston, Conn.
Filed: Jan. 7, 1974 Appl. No.: 431,025
Assignee:
US. Cl 75/175 R; 75/175 A; 75/170;
75/171, 204/43 Int. Cl. C22c 13/00 F ari of Search 75/175 R, 175 A, 134 N,
References Cited UNITED STATES PATENTS 9/1958 Klochkov.......................... 75/175 R Primary Examiner-L. Dewayne Rutledge Assistant Examiner-E. L. Weise Attorney, Agent, or FirmDelio and Montgomery [57] ABSTRACT Bright, tarnish resistant and color stable ternary alloys of about 40 90% of tin, about 10 50% cobalt and about 1 28% of a third metal of Periodic Group 11 III or VI Typical third metals are zinc, cadmium, indium, antimony or chromium. The alloys are electrodeposited from aqueous acidic baths at a temperature of about 50 85 C and current density of about 5 45 A/ft.
3 Claims, No Drawings TERNARY ALLOYS BACKGROUND OF THE INVENTION This invention relates to new and improved ternary alloys, to aqueous electrolytic baths from which the ailoys are deposited, and to a process for forming the alloys.
Various alloys have been developed in efforts to duplicate the superior color of chromium and alloys containing substantial amounts of chromium, while also providing the corrosion resistance and tarnish resistance required when the alloy is to be used as a protective coating. Accordingly, the prior art teaches the addition of brightening agents to plating baths for the electro-deposition of tin-nickel binary alloys, as in US. Pat. No. 3,141,836 Seyb et al, or the careful control of plating conditions, also in the deposition of nickeltin binary allows, such as the highly acidic baths in US. Pat. No. 2,926,] 24 Taylor et al. In another approach cobalt-tin binary alloys have been studied with respect to close similarities in corrosion resistance to nickel-tin alloys. Clarke et al, An Electrodeposited Bright Tin- Cobalt lntermetallic Compound, CoSn, Transactions of the Institute of Metal Finishing, 1972, Volume 50.
Despite the usefulness of such alloys from the standpoint of tarnish and corrosion resistance, those of such alloys which initially exhibited brightness similar to that of chromium did not maintain the good color. Moreover, results in obtaining hardness, brightness, tarnish resistance and color stability have not been consistent. Such properties tend to be overly sensitive to specific process conditions and therefore are difficult to reproduce on a commercial scale.
OBJECTS AND SUMMARY Accordingly, an object of the invention is to provide a new and improved alloy which not only provides a chromium-like brightness and tarnish resistance, but also provides color stability and hardness superior to that found in any of the alloying metals individually.
Still another object of the invention is to provide new and improved electrolytic plating baths which are easily formulated and from which ternary alloys can be efficiently deposited on a wide variety of substrates to give coatings which are hard, bright, tarnish resistant and which have good color stability.
Another object is to provide a new and improved process whereby tin, cobalt and a third metal are electrolytically co-deposited to form a hard, bright coating which is stable and highly resistant to tarnishing.
These and other objects, features and advantages of the invention will be apparent from the description which follows.
In summary outline, the foregoing and other objects are achieved in a new and improved ternary alloy consisting essentially of about 40 -]90 wt. tin, about l 50 wt. cobalt and about I 28 wt. of a third metal selected from Periodic Group II III,, or V1 Third metals include zinc, cadmium, indium, antimony or chromium, of which zinc, indium and chromium are preferred. The third metals may be present in the alloy singly or in admixtures of two or more. The plating baths of the invention are aqueous and highly acidic, and contain compounds providing stannous ions, cobaltous ions and ions of the third metal or metals to be deposited. The ternary alloys are efficiently codeposited from the baths at a temperature of about 50 85C. and current density of about 5 45 A/ftF. In addition to the tarnish resistance expected in alloys containing tin and cobalt, the alloys exhibit a hardness, chromium-like brightness and color stability which make them useful as coatings on a wide variety of substrates.
DESCRIPTION OF THE PREFERRED EMBODIMENTS The ternary alloys of the invention are electrodeposited from highly acidic, aqueous baths of pH of about 1-3. A mineral acid is utilized for this purpose, such as a hydro-halide or a sulfur acid. Preferred acids are hydrochloric and fluoboric acids since such acids provide anions in common with anions of preferred compounds of the metals to be deposited, and thus promote stability of the baths and good control of electrodeposition therefrom.
The metals to be deposited are present in the baths as ionic compounds, the anions of the compounds and other conditions being chosen such that the compounds are substantially completely soluble in the aqueous medium. Accordingly, the compounds may be present as halides, sulfates, or otherwise but preferably the compounds will have anions common to the anions of the acid utilized to provide the high acidity. Since hydrochloric and fluoboric acids are the preferred acids, the preferred metal compounds will be the chlorides and fluoborates of the metals.
The metal compounds may be dispersed and dissolved in the aqueous medium in any suitable manner with heating and agitation, as needed. Sequence of admixture is not critical although the usual precautions with highly acidic solutions should be exercised. However, dispersion and electroplating are each benefited by somewhat elevated temperature of the bath, of the order of about 50 85C.
As chlorides the following ranges of concentrations of the metal compounds in the baths are effective:
cobalt chloride stannous chloride zinc chloride about 20-400 g./l. about 10-100 g./l. about l0-l75 g./I.
cobalt chloride about [00-300 g./l. stannous fluoborate (50% solution) about 25-75 mls./l. fluoboric acid about -225 g./l.
about 25-150 mls./l. about l0-135 g./l.
ammonium hydroxide (28% solution) zinc chloride Indium chloride as a substitute for zinc chloride preferably is utilized at a concentration of about 5 3S g./l. and chromium chloride as a substitute for either of the foregoing compounds is effective at a concentration of about 5 55 g./l.
Other conditions of electrodeposition, including the cell form of electrolytic arrangement and type of substrate to be coated, control of concentration and rejuvenation of the baths, are well known in the art and do not require further description. For example, the well known Hull cell may be utilized. The current density preferred for efficient electrodeposition is about 5 45 A/ft.
Generally, the percentage of each metal in the ternary alloy will vary in direct proportion to the concentration of each metal in the plating bath. To a lesser extent the percentage of each metal in the alloy will also vary in accordance with electroplating conditions such as temperature, current density and pH. It is believed that the new alloy exists as Sn (Co, X) or (Sn, X) (Co, X) where X is the third metal.
While the resultant ternary alloys are analogous to tin-nickel and tin-cobalt with respect to tarnish resistance, the alloys exhibit not only chromium-like brightness but also consistently good color and color stability. Moreover, while the ternary alloys resist corrosion essentially to the same extent as chromium, they have a higher resistance than chromium to strong alkali under a superimposed anoidic potential, that is, whereas chromium will dissolve if made anodic in a caustic solution, the ternary alloys of the invention are not affected. The alloys of the invention therefore are more resistant to chloride attack than chromium and will resist salt spray and salt water contact better than chromium.
The plating baths may contain auxiliary reagents for various purposes in accordance with the understanding in the art. Among such auxiliary reagents are ammonium chloride, gluconic acid, thiourea, fluorides such as ammonium bifluoride, sodium fluoride and potassium titanium fluoride, and various surfactants and the like such as alkyl aryl sodium sulfonate. Such reagents generally are useful in minor amounts, for example, about 0.01 to about 10 grams per liter of plating bath, to obtain their known benefits.
The ternary alloys may be co-deposited electrolytically upon a wide variety of substrates, including metals such as steel, brass and zinc, as well as ceramics and plastics, in accordance with techniques well known in the art for coating such substrates.
The following examples of aqueous plating bath formulations and conditions of electrodeposition are intended as further illustration of the invention but are not necessarily limited of the scope of the invention except as set forth in the claims. All parts and percentages in these examples as well as in the foregoing specifica tion are by weight unless otherwise indicated. In each example the ternary alloy deposited has an approximate composition: tin, 40 90%; cobalt, l 50%; third metal, 1 28%.
EXAMPLE 1 CornEsition of ageuous bath Cobalt Chloride 20-400 gJl. Stannous Chloride 10-100 gjl. Ammonium Bifluoride 20-400 g./l. Hydrochloric Acid (37%) 40-150 mls./l. Ammonium Hydroxide (28%) 10-50 m1s./l. Zinc Chloride 15-175 g./l.
Plating Conditions: Temperature of bath (mo-80 C. Current density 10-30 A/lt. pH of bath l-3 EXAMPLE 2 Commsition of ag ueous bath 5 Cobalt Chloride 20-400 gvll. Stannous Chloride -100 g./l. Ammonium Bifluoride 20-400 g./l. Hydrochloric Acid (37%) 40-150 mls./l. Ammonium H droxide (28%) 10-50 mls./1. lndium Chlori e 5-35 g./l.
Plating Conditions: Temperature 60-80 C, 10 Current density 10-30 A/ft." pH of bath 1-3 EXAMPLE 3 Composition of ueens bath Cobalt Chloride -400 g./1r Stannous Chloride 10-100 g./l. Ammonium Bifluoridc 20-400 g./l. Hydrochloric Acid (37%) 40-150 mls/l. Ammonium H droxide (28%) 10-50 rnls./l. Chromium Ch oride 5-55 g1]. 20 Plating Conditions:
Temperature (SO-80 C. Current density 10-30 A/ft. pH of bath [-3 EXAMPLE 4 Com sition of a q' ueous bath Cobalt Chloride 100-300 r/l. Stannous Fluoborate (50%) 25-75 mfs/l. Fluoboric Acid 75-225 gfl. Ammonium Hydroxide (28%) 25-150 m/s./l. 30 Zinc Chloride l0-135 g./l.
Plating Conditions: Temperature 50-85 C Current density 5-45 A/lt. pH [-3 EXAMPLE 5 Comggitlon of g ueous bath Cobalt Chloride 100-300 ./1. Stannous Fluoborate (50%) 25-75 m s.(l. Fluoboric Acid 75-225 g./.
Ammonium Hydroxide (28%) 25-150 m1s./l. Chromium Ch oride 10-75 g./l.
Hating Conditions: Temperature 50-85 C. Current density 5-45 A/lt. pH |-3 EXAMPLE 6 Commgition of gueous bath Cobalt Chloride 100-300 .ll. Stannous Fluoborate (50%) 25-75 m sJl.
Fluoboric Acid 75-225 gJl. Ammonium Hydroxide (28%) 25-150 mlsrll. Indium Chloride 5-35 3.11.
Plating Conditions: Temperature 50-85 C. Current density 5-45 A/f't. pH [-3 What is claimed is: l. A bright, tarnish resistant and color stable ternary alloy consisting essentially of about 40 90 wt. tin 10 50 wt. cobalt 1 28 wt. third metal wherein said third metal is antimony or a metal of Periodic Group 11,, 111,, or V1 2. A ternary alloy as in claim 1 wherein said third 5 metal is zinc, cadmium, indium, or chromium.
3. A ternary alloy as in claim I wherein said third metal is zinc, indium or chromium.
1 i 1 I I.
Claims (3)
1. A BRIGHT, TARNISH RESISTANT AND COLOR STABLE TERNARY ALLOY CONSISTING ESSENTIALLY OF ABOUT 40-90 WT.% TIN 10-50 WT.% COBALT 1-28 WT.% THIRD METAL WHEREIN SAID THIRD METAL IS ANTIMONY OR A METAL OF PERIODIC GROUP IIB, III$ OR VIB.
2. A ternary alloy as in claim 1 wherein said third metal is zinc, cadmium, indium, or chromium.
3. A ternary alloy as in claim 1 wherein said third metal is zinc, indium or chromium.
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US431025A US3881919A (en) | 1974-01-07 | 1974-01-07 | Ternary alloys |
| US05/533,472 US3966564A (en) | 1974-01-07 | 1974-12-17 | Method of electrodepositing an alloy of tin, cobalt and a third metal and electrolyte therefor |
| US05/614,349 USRE29239E (en) | 1974-01-07 | 1975-09-17 | Ternary alloys |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US431025A US3881919A (en) | 1974-01-07 | 1974-01-07 | Ternary alloys |
Related Child Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| US05/533,472 Division US3966564A (en) | 1974-01-07 | 1974-12-17 | Method of electrodepositing an alloy of tin, cobalt and a third metal and electrolyte therefor |
| US05/614,349 Reissue USRE29239E (en) | 1974-01-07 | 1975-09-17 | Ternary alloys |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| US3881919A true US3881919A (en) | 1975-05-06 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| US431025A Expired - Lifetime US3881919A (en) | 1974-01-07 | 1974-01-07 | Ternary alloys |
Country Status (1)
| Country | Link |
|---|---|
| US (1) | US3881919A (en) |
Cited By (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4029556A (en) * | 1975-10-22 | 1977-06-14 | Emlee Monaco | Plating bath and method of plating therewith |
| US4035249A (en) * | 1975-06-10 | 1977-07-12 | Oxy Metal Industries Corporation | Electrode position of tin-containing alloys and bath therefor |
| US4299671A (en) * | 1980-06-13 | 1981-11-10 | Hooker Chemicals & Plastics Corp. | Bath composition and method for electrodepositing cobalt-zinc alloys simulating a chromium plating |
| US4795682A (en) * | 1986-07-19 | 1989-01-03 | Ae Plc | Tin-cobalt bearing overlay alloys |
| US5333550A (en) * | 1993-07-06 | 1994-08-02 | Teledyne Mccormick Selph | Tin alloy sheath material for explosive-pyrotechnic linear products |
| US5501154A (en) * | 1993-07-06 | 1996-03-26 | Teledyne Industries, Inc. | Substantially lead-free tin alloy sheath material for explosive-pyrotechnic linear products |
| US5766776A (en) * | 1994-12-07 | 1998-06-16 | Wieland-Werke Ag | Strip shaped or wire-shaped compound material |
| WO2001002627A1 (en) * | 1999-07-06 | 2001-01-11 | Dunigan, Frank, C. | Method and electroplating solution for plating antimony and antimony alloy coatings |
| WO2002022913A3 (en) * | 2000-09-16 | 2002-07-25 | Degussa Galvanotechnik Gmbh | Ternary tin zinc alloy, electroplating solutions and galvanic method for producing ternary tin zinc alloy coatings |
| US20040055495A1 (en) * | 2002-04-23 | 2004-03-25 | Hannagan Harold W. | Tin alloy sheathed explosive device |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2853382A (en) * | 1957-07-24 | 1958-09-23 | John V Klochkov | Alloy compositions |
-
1974
- 1974-01-07 US US431025A patent/US3881919A/en not_active Expired - Lifetime
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2853382A (en) * | 1957-07-24 | 1958-09-23 | John V Klochkov | Alloy compositions |
Cited By (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4035249A (en) * | 1975-06-10 | 1977-07-12 | Oxy Metal Industries Corporation | Electrode position of tin-containing alloys and bath therefor |
| US4029556A (en) * | 1975-10-22 | 1977-06-14 | Emlee Monaco | Plating bath and method of plating therewith |
| US4299671A (en) * | 1980-06-13 | 1981-11-10 | Hooker Chemicals & Plastics Corp. | Bath composition and method for electrodepositing cobalt-zinc alloys simulating a chromium plating |
| US4795682A (en) * | 1986-07-19 | 1989-01-03 | Ae Plc | Tin-cobalt bearing overlay alloys |
| US5333550A (en) * | 1993-07-06 | 1994-08-02 | Teledyne Mccormick Selph | Tin alloy sheath material for explosive-pyrotechnic linear products |
| US5501154A (en) * | 1993-07-06 | 1996-03-26 | Teledyne Industries, Inc. | Substantially lead-free tin alloy sheath material for explosive-pyrotechnic linear products |
| US5766776A (en) * | 1994-12-07 | 1998-06-16 | Wieland-Werke Ag | Strip shaped or wire-shaped compound material |
| WO2001002627A1 (en) * | 1999-07-06 | 2001-01-11 | Dunigan, Frank, C. | Method and electroplating solution for plating antimony and antimony alloy coatings |
| US6409906B1 (en) | 1999-07-06 | 2002-06-25 | Frank C. Danigan | Electroplating solution for plating antimony and antimony alloy coatings |
| WO2002022913A3 (en) * | 2000-09-16 | 2002-07-25 | Degussa Galvanotechnik Gmbh | Ternary tin zinc alloy, electroplating solutions and galvanic method for producing ternary tin zinc alloy coatings |
| US20040091385A1 (en) * | 2000-09-16 | 2004-05-13 | Klaus Leyendecker | Ternary tin zinc alloy, electroplating solutions and galvanic method for producing ternary tin zinc alloy coatings |
| US20040055495A1 (en) * | 2002-04-23 | 2004-03-25 | Hannagan Harold W. | Tin alloy sheathed explosive device |
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