US3878067A - Electrolyte and method for electrodepositing of bright nickel-iron alloy deposits - Google Patents
Electrolyte and method for electrodepositing of bright nickel-iron alloy deposits Download PDFInfo
- Publication number
- US3878067A US3878067A US414003A US41400373A US3878067A US 3878067 A US3878067 A US 3878067A US 414003 A US414003 A US 414003A US 41400373 A US41400373 A US 41400373A US 3878067 A US3878067 A US 3878067A
- Authority
- US
- United States
- Prior art keywords
- bath
- nickel
- complexing agent
- iron
- acid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000000034 method Methods 0.000 title claims description 46
- 229910001030 Iron–nickel alloy Inorganic materials 0.000 title claims description 14
- 239000003792 electrolyte Substances 0.000 title description 3
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims abstract description 72
- -1 iron ions Chemical class 0.000 claims abstract description 56
- 239000008139 complexing agent Substances 0.000 claims abstract description 44
- 229910052742 iron Inorganic materials 0.000 claims abstract description 43
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims abstract description 22
- UCKMPCXJQFINFW-UHFFFAOYSA-N Sulphide Chemical compound [S-2] UCKMPCXJQFINFW-UHFFFAOYSA-N 0.000 claims abstract description 19
- 238000004070 electrodeposition Methods 0.000 claims abstract description 12
- VEQPNABPJHWNSG-UHFFFAOYSA-N Nickel(2+) Chemical compound [Ni+2] VEQPNABPJHWNSG-UHFFFAOYSA-N 0.000 claims abstract description 11
- 229910001453 nickel ion Inorganic materials 0.000 claims abstract description 11
- 239000000758 substrate Substances 0.000 claims abstract description 9
- 230000000536 complexating effect Effects 0.000 claims abstract description 8
- 239000002659 electrodeposit Substances 0.000 claims abstract description 7
- PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Substances [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 77
- 229910052759 nickel Inorganic materials 0.000 claims description 37
- 150000003839 salts Chemical class 0.000 claims description 18
- 150000001875 compounds Chemical class 0.000 claims description 17
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid group Chemical group C(CC(O)(C(=O)O)CC(=O)O)(=O)O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 claims description 15
- NIAGBSSWEZDNMT-UHFFFAOYSA-N hydroxidotrioxidosulfur(.) Chemical group [O]S(O)(=O)=O NIAGBSSWEZDNMT-UHFFFAOYSA-N 0.000 claims description 13
- CVHZOJJKTDOEJC-UHFFFAOYSA-N saccharin Chemical group C1=CC=C2C(=O)NS(=O)(=O)C2=C1 CVHZOJJKTDOEJC-UHFFFAOYSA-N 0.000 claims description 12
- 229940081974 saccharin Drugs 0.000 claims description 12
- 235000019204 saccharin Nutrition 0.000 claims description 12
- 239000000901 saccharin and its Na,K and Ca salt Substances 0.000 claims description 12
- 125000004432 carbon atom Chemical group C* 0.000 claims description 11
- LGQLOGILCSXPEA-UHFFFAOYSA-L nickel sulfate Chemical compound [Ni+2].[O-]S([O-])(=O)=O LGQLOGILCSXPEA-UHFFFAOYSA-L 0.000 claims description 11
- IJGRMHOSHXDMSA-UHFFFAOYSA-N nitrogen Substances N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 11
- 229910052757 nitrogen Inorganic materials 0.000 claims description 11
- RAIPHJJURHTUIC-UHFFFAOYSA-N 1,3-thiazol-2-amine Chemical compound NC1=NC=CS1 RAIPHJJURHTUIC-UHFFFAOYSA-N 0.000 claims description 10
- CWYNVVGOOAEACU-UHFFFAOYSA-N Fe2+ Chemical compound [Fe+2] CWYNVVGOOAEACU-UHFFFAOYSA-N 0.000 claims description 10
- 239000002253 acid Substances 0.000 claims description 10
- 229910000363 nickel(II) sulfate Inorganic materials 0.000 claims description 10
- VTLYFUHAOXGGBS-UHFFFAOYSA-N Fe3+ Chemical compound [Fe+3] VTLYFUHAOXGGBS-UHFFFAOYSA-N 0.000 claims description 9
- 229910001447 ferric ion Inorganic materials 0.000 claims description 9
- 239000001257 hydrogen Substances 0.000 claims description 9
- 229910052739 hydrogen Inorganic materials 0.000 claims description 9
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 claims description 9
- RGHNJXZEOKUKBD-SQOUGZDYSA-N Gluconic acid Natural products OC[C@@H](O)[C@@H](O)[C@H](O)[C@@H](O)C(O)=O RGHNJXZEOKUKBD-SQOUGZDYSA-N 0.000 claims description 8
- 229910001448 ferrous ion Inorganic materials 0.000 claims description 8
- 125000005157 alkyl carboxy group Chemical group 0.000 claims description 7
- LAIZPRYFQUWUBN-UHFFFAOYSA-L nickel chloride hexahydrate Chemical compound O.O.O.O.O.O.[Cl-].[Cl-].[Ni+2] LAIZPRYFQUWUBN-UHFFFAOYSA-L 0.000 claims description 6
- RGHNJXZEOKUKBD-UHFFFAOYSA-N D-gluconic acid Natural products OCC(O)C(O)C(O)C(O)C(O)=O RGHNJXZEOKUKBD-UHFFFAOYSA-N 0.000 claims description 5
- 150000007933 aliphatic carboxylic acids Chemical group 0.000 claims description 5
- 239000000174 gluconic acid Substances 0.000 claims description 5
- 235000012208 gluconic acid Nutrition 0.000 claims description 5
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 5
- SURQXAFEQWPFPV-UHFFFAOYSA-L iron(2+) sulfate heptahydrate Chemical compound O.O.O.O.O.O.O.[Fe+2].[O-]S([O-])(=O)=O SURQXAFEQWPFPV-UHFFFAOYSA-L 0.000 claims description 5
- HOSGXJWQVBHGLT-UHFFFAOYSA-N 6-hydroxy-3,4-dihydro-1h-quinolin-2-one Chemical group N1C(=O)CCC2=CC(O)=CC=C21 HOSGXJWQVBHGLT-UHFFFAOYSA-N 0.000 claims description 4
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 4
- XBDQKXXYIPTUBI-UHFFFAOYSA-N Propionic acid Substances CCC(O)=O XBDQKXXYIPTUBI-UHFFFAOYSA-N 0.000 claims description 4
- 125000003277 amino group Chemical group 0.000 claims description 4
- 125000000623 heterocyclic group Chemical group 0.000 claims description 4
- 229950003476 aminothiazole Drugs 0.000 claims description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical class [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 claims 1
- UGKDIUIOSMUOAW-UHFFFAOYSA-N iron nickel Chemical compound [Fe].[Ni] UGKDIUIOSMUOAW-UHFFFAOYSA-N 0.000 abstract description 17
- 238000005260 corrosion Methods 0.000 abstract description 8
- 230000007797 corrosion Effects 0.000 abstract description 8
- 125000002887 hydroxy group Chemical group [H]O* 0.000 abstract description 7
- 125000000217 alkyl group Chemical group 0.000 description 23
- 150000002367 halogens Chemical class 0.000 description 17
- 229910052736 halogen Inorganic materials 0.000 description 16
- 125000000542 sulfonic acid group Chemical group 0.000 description 12
- 238000013019 agitation Methods 0.000 description 10
- KDKYADYSIPSCCQ-UHFFFAOYSA-N but-1-yne Chemical compound CCC#C KDKYADYSIPSCCQ-UHFFFAOYSA-N 0.000 description 10
- 150000002009 diols Chemical class 0.000 description 8
- 239000000047 product Substances 0.000 description 8
- 239000011734 sodium Substances 0.000 description 8
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical group [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 7
- BRLQWZUYTZBJKN-UHFFFAOYSA-N Epichlorohydrin Chemical compound ClCC1CO1 BRLQWZUYTZBJKN-UHFFFAOYSA-N 0.000 description 7
- 229910052804 chromium Inorganic materials 0.000 description 7
- 239000011651 chromium Substances 0.000 description 7
- RGHNJXZEOKUKBD-SQOUGZDYSA-M D-gluconate Chemical compound OC[C@@H](O)[C@@H](O)[C@H](O)[C@@H](O)C([O-])=O RGHNJXZEOKUKBD-SQOUGZDYSA-M 0.000 description 6
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 6
- 238000000576 coating method Methods 0.000 description 6
- 229940050410 gluconate Drugs 0.000 description 6
- 229940053662 nickel sulfate Drugs 0.000 description 6
- IAYPIBMASNFSPL-UHFFFAOYSA-N Ethylene oxide Chemical compound C1CO1 IAYPIBMASNFSPL-UHFFFAOYSA-N 0.000 description 5
- 238000007747 plating Methods 0.000 description 5
- TVDSBUOJIPERQY-UHFFFAOYSA-N prop-2-yn-1-ol Chemical compound OCC#C TVDSBUOJIPERQY-UHFFFAOYSA-N 0.000 description 5
- KRKNYBCHXYNGOX-UHFFFAOYSA-K Citrate Chemical compound [O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O KRKNYBCHXYNGOX-UHFFFAOYSA-K 0.000 description 4
- BHELZAPQIKSEDF-UHFFFAOYSA-N allyl bromide Chemical compound BrCC=C BHELZAPQIKSEDF-UHFFFAOYSA-N 0.000 description 4
- 125000003118 aryl group Chemical group 0.000 description 4
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 4
- 239000004327 boric acid Substances 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- SMUQFGGVLNAIOZ-UHFFFAOYSA-N quinaldine Chemical compound C1=CC=CC2=NC(C)=CC=C21 SMUQFGGVLNAIOZ-UHFFFAOYSA-N 0.000 description 4
- FSSPGSAQUIYDCN-UHFFFAOYSA-N 1,3-Propane sultone Chemical compound O=S1(=O)CCCO1 FSSPGSAQUIYDCN-UHFFFAOYSA-N 0.000 description 3
- PBYMYAJONQZORL-UHFFFAOYSA-N 1-methylisoquinoline Chemical compound C1=CC=C2C(C)=NC=CC2=C1 PBYMYAJONQZORL-UHFFFAOYSA-N 0.000 description 3
- CIWBSHSKHKDKBQ-JLAZNSOCSA-N Ascorbic acid Chemical compound OC[C@H](O)[C@H]1OC(=O)C(O)=C1O CIWBSHSKHKDKBQ-JLAZNSOCSA-N 0.000 description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 3
- 241000080590 Niso Species 0.000 description 3
- 229910000831 Steel Inorganic materials 0.000 description 3
- 239000000654 additive Substances 0.000 description 3
- 125000004171 alkoxy aryl group Chemical group 0.000 description 3
- 229910052799 carbon Chemical group 0.000 description 3
- 235000015165 citric acid Nutrition 0.000 description 3
- 229910052802 copper Inorganic materials 0.000 description 3
- 239000010949 copper Substances 0.000 description 3
- VAYGXNSJCAHWJZ-UHFFFAOYSA-N dimethyl sulfate Chemical compound COS(=O)(=O)OC VAYGXNSJCAHWJZ-UHFFFAOYSA-N 0.000 description 3
- RBNPOMFGQQGHHO-UHFFFAOYSA-N glyceric acid Chemical compound OCC(O)C(O)=O RBNPOMFGQQGHHO-UHFFFAOYSA-N 0.000 description 3
- 150000002541 isothioureas Chemical class 0.000 description 3
- 150000002815 nickel Chemical class 0.000 description 3
- 239000004033 plastic Substances 0.000 description 3
- 229920003023 plastic Polymers 0.000 description 3
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 3
- 239000010959 steel Substances 0.000 description 3
- 150000004763 sulfides Chemical class 0.000 description 3
- BDHFUVZGWQCTTF-UHFFFAOYSA-M sulfonate Chemical compound [O-]S(=O)=O BDHFUVZGWQCTTF-UHFFFAOYSA-M 0.000 description 3
- UMGDCJDMYOKAJW-UHFFFAOYSA-N thiourea Chemical compound NC(N)=S UMGDCJDMYOKAJW-UHFFFAOYSA-N 0.000 description 3
- ADLGXSDHBWGZGR-UHFFFAOYSA-N 2-methylquinoline;propane Chemical compound CCC.C1=CC=CC2=NC(C)=CC=C21 ADLGXSDHBWGZGR-UHFFFAOYSA-N 0.000 description 2
- YEJRWHAVMIAJKC-UHFFFAOYSA-N 4-Butyrolactone Chemical compound O=C1CCCO1 YEJRWHAVMIAJKC-UHFFFAOYSA-N 0.000 description 2
- 229910001369 Brass Inorganic materials 0.000 description 2
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 2
- DHMQDGOQFOQNFH-UHFFFAOYSA-N Glycine Chemical compound NCC(O)=O DHMQDGOQFOQNFH-UHFFFAOYSA-N 0.000 description 2
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 2
- CKLJMWTZIZZHCS-REOHCLBHSA-N L-aspartic acid Chemical compound OC(=O)[C@@H](N)CC(O)=O CKLJMWTZIZZHCS-REOHCLBHSA-N 0.000 description 2
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 2
- 229910021586 Nickel(II) chloride Inorganic materials 0.000 description 2
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 2
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 description 2
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Natural products NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 description 2
- 125000003545 alkoxy group Chemical group 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- 239000010951 brass Substances 0.000 description 2
- GZUXJHMPEANEGY-UHFFFAOYSA-N bromomethane Chemical compound BrC GZUXJHMPEANEGY-UHFFFAOYSA-N 0.000 description 2
- 239000000460 chlorine Substances 0.000 description 2
- 229910052801 chlorine Inorganic materials 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 239000002131 composite material Substances 0.000 description 2
- YXVFQADLFFNVDS-UHFFFAOYSA-N diammonium citrate Chemical compound [NH4+].[NH4+].[O-]C(=O)CC(O)(C(=O)O)CC([O-])=O YXVFQADLFFNVDS-UHFFFAOYSA-N 0.000 description 2
- 238000009713 electroplating Methods 0.000 description 2
- 229910052744 lithium Inorganic materials 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- QMMRZOWCJAIUJA-UHFFFAOYSA-L nickel dichloride Chemical compound Cl[Ni]Cl QMMRZOWCJAIUJA-UHFFFAOYSA-L 0.000 description 2
- RRIWRJBSCGCBID-UHFFFAOYSA-L nickel sulfate hexahydrate Chemical compound O.O.O.O.O.O.[Ni+2].[O-]S([O-])(=O)=O RRIWRJBSCGCBID-UHFFFAOYSA-L 0.000 description 2
- 229940116202 nickel sulfate hexahydrate Drugs 0.000 description 2
- 229910052700 potassium Inorganic materials 0.000 description 2
- 239000011591 potassium Substances 0.000 description 2
- 229910052708 sodium Inorganic materials 0.000 description 2
- GAWAYYRQGQZKCR-REOHCLBHSA-N (S)-2-chloropropanoic acid Chemical compound C[C@H](Cl)C(O)=O GAWAYYRQGQZKCR-REOHCLBHSA-N 0.000 description 1
- BJEPYKJPYRNKOW-REOHCLBHSA-N (S)-malic acid Chemical compound OC(=O)[C@@H](O)CC(O)=O BJEPYKJPYRNKOW-REOHCLBHSA-N 0.000 description 1
- JCLGDKHNBWVKGV-UHFFFAOYSA-N 1,2-dibromo-1-phenoxyethanesulfonic acid Chemical compound OS(=O)(=O)C(Br)(CBr)OC1=CC=CC=C1 JCLGDKHNBWVKGV-UHFFFAOYSA-N 0.000 description 1
- PAAZPARNPHGIKF-UHFFFAOYSA-N 1,2-dibromoethane Chemical compound BrCCBr PAAZPARNPHGIKF-UHFFFAOYSA-N 0.000 description 1
- AEQDJSLRWYMAQI-UHFFFAOYSA-N 2,3,9,10-tetramethoxy-6,8,13,13a-tetrahydro-5H-isoquinolino[2,1-b]isoquinoline Chemical compound C1CN2CC(C(=C(OC)C=C3)OC)=C3CC2C2=C1C=C(OC)C(OC)=C2 AEQDJSLRWYMAQI-UHFFFAOYSA-N 0.000 description 1
- SHHKMWMIKILKQW-UHFFFAOYSA-N 2-formylbenzenesulfonic acid Chemical compound OS(=O)(=O)C1=CC=CC=C1C=O SHHKMWMIKILKQW-UHFFFAOYSA-N 0.000 description 1
- AGBXYHCHUYARJY-UHFFFAOYSA-N 2-phenylethenesulfonic acid Chemical compound OS(=O)(=O)C=CC1=CC=CC=C1 AGBXYHCHUYARJY-UHFFFAOYSA-N 0.000 description 1
- JHUFGBSGINLPOW-UHFFFAOYSA-N 3-chloro-4-(trifluoromethoxy)benzoyl cyanide Chemical compound FC(F)(F)OC1=CC=C(C(=O)C#N)C=C1Cl JHUFGBSGINLPOW-UHFFFAOYSA-N 0.000 description 1
- OUQMXTJYCAJLGO-UHFFFAOYSA-N 4-methyl-1,3-thiazol-2-amine Chemical compound CC1=CSC(N)=N1 OUQMXTJYCAJLGO-UHFFFAOYSA-N 0.000 description 1
- SWQWTDAWUSBMGA-UHFFFAOYSA-N 5-chloro-1,3-thiazol-2-amine Chemical compound NC1=NC=C(Cl)S1 SWQWTDAWUSBMGA-UHFFFAOYSA-N 0.000 description 1
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 1
- KWIUHFFTVRNATP-UHFFFAOYSA-N Betaine Natural products C[N+](C)(C)CC([O-])=O KWIUHFFTVRNATP-UHFFFAOYSA-N 0.000 description 1
- BTBUEUYNUDRHOZ-UHFFFAOYSA-N Borate Chemical compound [O-]B([O-])[O-] BTBUEUYNUDRHOZ-UHFFFAOYSA-N 0.000 description 1
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- CIWBSHSKHKDKBQ-DUZGATOHSA-N D-isoascorbic acid Chemical compound OC[C@@H](O)[C@H]1OC(=O)C(O)=C1O CIWBSHSKHKDKBQ-DUZGATOHSA-N 0.000 description 1
- KCXVZYZYPLLWCC-UHFFFAOYSA-N EDTA Chemical compound OC(=O)CN(CC(O)=O)CCN(CC(O)=O)CC(O)=O KCXVZYZYPLLWCC-UHFFFAOYSA-N 0.000 description 1
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 1
- 239000004471 Glycine Substances 0.000 description 1
- AEMRFAOFKBGASW-UHFFFAOYSA-N Glycolic acid Chemical compound OCC(O)=O AEMRFAOFKBGASW-UHFFFAOYSA-N 0.000 description 1
- KWIUHFFTVRNATP-UHFFFAOYSA-O N,N,N-trimethylglycinium Chemical compound C[N+](C)(C)CC(O)=O KWIUHFFTVRNATP-UHFFFAOYSA-O 0.000 description 1
- KQJQICVXLJTWQD-UHFFFAOYSA-N N-Methylthiourea Chemical compound CNC(N)=S KQJQICVXLJTWQD-UHFFFAOYSA-N 0.000 description 1
- FULZLIGZKMKICU-UHFFFAOYSA-N N-phenylthiourea Chemical compound NC(=S)NC1=CC=CC=C1 FULZLIGZKMKICU-UHFFFAOYSA-N 0.000 description 1
- 229910000990 Ni alloy Inorganic materials 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- GOOHAUXETOMSMM-UHFFFAOYSA-N Propylene oxide Chemical compound CC1CO1 GOOHAUXETOMSMM-UHFFFAOYSA-N 0.000 description 1
- VMHLLURERBWHNL-UHFFFAOYSA-M Sodium acetate Chemical compound [Na+].CC([O-])=O VMHLLURERBWHNL-UHFFFAOYSA-M 0.000 description 1
- 241000272534 Struthio camelus Species 0.000 description 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
- QTBSBXVTEAMEQO-UHFFFAOYSA-N acetic acid Substances CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 1
- XECAHXYUAAWDEL-UHFFFAOYSA-N acrylonitrile butadiene styrene Chemical compound C=CC=C.C=CC#N.C=CC1=CC=CC=C1 XECAHXYUAAWDEL-UHFFFAOYSA-N 0.000 description 1
- 229920000122 acrylonitrile butadiene styrene Polymers 0.000 description 1
- 239000004676 acrylonitrile butadiene styrene Substances 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
- 229910001413 alkali metal ion Inorganic materials 0.000 description 1
- 125000002947 alkylene group Chemical group 0.000 description 1
- HTKFORQRBXIQHD-UHFFFAOYSA-N allylthiourea Chemical compound NC(=S)NCC=C HTKFORQRBXIQHD-UHFFFAOYSA-N 0.000 description 1
- 229960001748 allylthiourea Drugs 0.000 description 1
- BJEPYKJPYRNKOW-UHFFFAOYSA-N alpha-hydroxysuccinic acid Natural products OC(=O)C(O)CC(O)=O BJEPYKJPYRNKOW-UHFFFAOYSA-N 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 150000001450 anions Chemical class 0.000 description 1
- 235000010323 ascorbic acid Nutrition 0.000 description 1
- 229960005070 ascorbic acid Drugs 0.000 description 1
- 239000011668 ascorbic acid Substances 0.000 description 1
- 235000003704 aspartic acid Nutrition 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- JEHKKBHWRAXMCH-UHFFFAOYSA-M benzenesulfinate Chemical compound [O-]S(=O)C1=CC=CC=C1 JEHKKBHWRAXMCH-UHFFFAOYSA-M 0.000 description 1
- JEHKKBHWRAXMCH-UHFFFAOYSA-N benzenesulfinic acid Chemical class O[S@@](=O)C1=CC=CC=C1 JEHKKBHWRAXMCH-UHFFFAOYSA-N 0.000 description 1
- KCXMKQUNVWSEMD-UHFFFAOYSA-N benzyl chloride Chemical compound ClCC1=CC=CC=C1 KCXMKQUNVWSEMD-UHFFFAOYSA-N 0.000 description 1
- 229940073608 benzyl chloride Drugs 0.000 description 1
- OQFSQFPPLPISGP-UHFFFAOYSA-N beta-carboxyaspartic acid Natural products OC(=O)C(N)C(C(O)=O)C(O)=O OQFSQFPPLPISGP-UHFFFAOYSA-N 0.000 description 1
- VEZXCJBBBCKRPI-UHFFFAOYSA-N beta-propiolactone Chemical compound O=C1CCO1 VEZXCJBBBCKRPI-UHFFFAOYSA-N 0.000 description 1
- 229960003237 betaine Drugs 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000005282 brightening Methods 0.000 description 1
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 1
- 229910052794 bromium Inorganic materials 0.000 description 1
- WKVSEJXEIVEFJT-UHFFFAOYSA-N bromo ethanesulfonate Chemical compound CCS(=O)(=O)OBr WKVSEJXEIVEFJT-UHFFFAOYSA-N 0.000 description 1
- 239000000872 buffer Substances 0.000 description 1
- 229930188620 butyrolactone Natural products 0.000 description 1
- 150000001768 cations Chemical class 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- FOCAUTSVDIKZOP-UHFFFAOYSA-N chloroacetic acid Chemical compound OC(=O)CCl FOCAUTSVDIKZOP-UHFFFAOYSA-N 0.000 description 1
- 229940106681 chloroacetic acid Drugs 0.000 description 1
- 229960004106 citric acid Drugs 0.000 description 1
- 150000001868 cobalt Chemical class 0.000 description 1
- 238000006482 condensation reaction Methods 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 239000007857 degradation product Substances 0.000 description 1
- 230000001934 delay Effects 0.000 description 1
- 230000001627 detrimental effect Effects 0.000 description 1
- DENRZWYUOJLTMF-UHFFFAOYSA-N diethyl sulfate Chemical compound CCOS(=O)(=O)OCC DENRZWYUOJLTMF-UHFFFAOYSA-N 0.000 description 1
- 229940008406 diethyl sulfate Drugs 0.000 description 1
- CICQKHNSTQLPCW-UHFFFAOYSA-N dimethyl sulfate;2-methylquinoline Chemical compound COS(=O)(=O)OC.C1=CC=CC2=NC(C)=CC=C21 CICQKHNSTQLPCW-UHFFFAOYSA-N 0.000 description 1
- 125000004119 disulfanediyl group Chemical group *SS* 0.000 description 1
- 230000009977 dual effect Effects 0.000 description 1
- 229960001484 edetic acid Drugs 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005868 electrolysis reaction Methods 0.000 description 1
- 235000010350 erythorbic acid Nutrition 0.000 description 1
- NLVXSWCKKBEXTG-UHFFFAOYSA-M ethenesulfonate Chemical compound [O-]S(=O)(=O)C=C NLVXSWCKKBEXTG-UHFFFAOYSA-M 0.000 description 1
- 229960004887 ferric hydroxide Drugs 0.000 description 1
- 229960002089 ferrous chloride Drugs 0.000 description 1
- 235000003891 ferrous sulphate Nutrition 0.000 description 1
- 239000011790 ferrous sulphate Substances 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- SLGWESQGEUXWJQ-UHFFFAOYSA-N formaldehyde;phenol Chemical compound O=C.OC1=CC=CC=C1 SLGWESQGEUXWJQ-UHFFFAOYSA-N 0.000 description 1
- 239000002198 insoluble material Substances 0.000 description 1
- PNDPGZBMCMUPRI-UHFFFAOYSA-N iodine Chemical compound II PNDPGZBMCMUPRI-UHFFFAOYSA-N 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- NMCUIPGRVMDVDB-UHFFFAOYSA-L iron dichloride Chemical compound Cl[Fe]Cl NMCUIPGRVMDVDB-UHFFFAOYSA-L 0.000 description 1
- 159000000014 iron salts Chemical class 0.000 description 1
- IEECXTSVVFWGSE-UHFFFAOYSA-M iron(3+);oxygen(2-);hydroxide Chemical compound [OH-].[O-2].[Fe+3] IEECXTSVVFWGSE-UHFFFAOYSA-M 0.000 description 1
- 229910000359 iron(II) sulfate Inorganic materials 0.000 description 1
- 229940026239 isoascorbic acid Drugs 0.000 description 1
- 239000001630 malic acid Substances 0.000 description 1
- 235000011090 malic acid Nutrition 0.000 description 1
- 229940099690 malic acid Drugs 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229910021645 metal ion Inorganic materials 0.000 description 1
- QABLOFMHHSOFRJ-UHFFFAOYSA-N methyl 2-chloroacetate Chemical compound COC(=O)CCl QABLOFMHHSOFRJ-UHFFFAOYSA-N 0.000 description 1
- 229940102396 methyl bromide Drugs 0.000 description 1
- OVQABVAKPIYHIG-UHFFFAOYSA-N n-(benzenesulfonyl)benzenesulfonamide Chemical compound C=1C=CC=CC=1S(=O)(=O)NS(=O)(=O)C1=CC=CC=C1 OVQABVAKPIYHIG-UHFFFAOYSA-N 0.000 description 1
- KERTUBUCQCSNJU-UHFFFAOYSA-L nickel(2+);disulfamate Chemical compound [Ni+2].NS([O-])(=O)=O.NS([O-])(=O)=O KERTUBUCQCSNJU-UHFFFAOYSA-L 0.000 description 1
- MGFYIUFZLHCRTH-UHFFFAOYSA-N nitrilotriacetic acid Chemical compound OC(=O)CN(CC(O)=O)CC(O)=O MGFYIUFZLHCRTH-UHFFFAOYSA-N 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 230000035515 penetration Effects 0.000 description 1
- 229920001568 phenolic resin Polymers 0.000 description 1
- 229920000570 polyether Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- 239000004800 polyvinyl chloride Substances 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 239000001294 propane Substances 0.000 description 1
- YORCIIVHUBAYBQ-UHFFFAOYSA-N propargyl bromide Chemical compound BrCC#C YORCIIVHUBAYBQ-UHFFFAOYSA-N 0.000 description 1
- 229960000380 propiolactone Drugs 0.000 description 1
- 239000001632 sodium acetate Substances 0.000 description 1
- 235000017281 sodium acetate Nutrition 0.000 description 1
- 239000000176 sodium gluconate Substances 0.000 description 1
- 235000012207 sodium gluconate Nutrition 0.000 description 1
- 229940005574 sodium gluconate Drugs 0.000 description 1
- IIACRCGMVDHOTQ-UHFFFAOYSA-M sulfamate Chemical compound NS([O-])(=O)=O IIACRCGMVDHOTQ-UHFFFAOYSA-M 0.000 description 1
- 229940124530 sulfonamide Drugs 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 150000003585 thioureas Chemical class 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/12—Electroplating: Baths therefor from solutions of nickel or cobalt
- C25D3/14—Electroplating: Baths therefor from solutions of nickel or cobalt from baths containing acetylenic or heterocyclic compounds
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/56—Electroplating: Baths therefor from solutions of alloys
- C25D3/562—Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of iron or nickel or cobalt
Definitions
- Applicants invention is directed to the electrodeposition of a bright iron-nickel alloy deposit of from 5 to 50 percent by weight iron preferably about to about 35% by weight which can be used as the basis for subsequent electrodeposition of chromium in order to impart desirable decorative and/or corrosion resistant properties to substrates, such as metallic substrates.
- the bath and process of the present invention can also be used in the electrodeposition of nickeLiron alloy for plastics.
- plastic substrate such as, acrylonitrile-butadiene-styrene, polyethylene, polypropylene, polyvinyl chloride, phenol-formaldehyde polymers is pretreated by applying a conductive metallic deposit onto the plastic substrate such as, nickel or copper.
- the iron-nickel deposit may then be used as a subsequent coating onto the conductive metallic deposit.
- the bath that may be employed in the present invention utilizes one or more salts of nickel, one or more salts of iron, and a complexing agent.
- any bath soluble iron or nickel containing compound may be employed providing the corresponding anion is not detrimental to the bath.
- inorganic nickel salts may be employed, such as, nickel sulfate, nickel chloride, and the like as well as other nickel materials such as nickel sulfamate and the like.
- nickel sulfate salts When nickel sulfate salts are used they are normally present in amounts ranging from 40 to 300 grams/liter (calculated as nickel sulfate 6I-I O); nickel chloride may also be used and is present in an amount ranging from about to 250 grams/liter.
- the chloride or halide ions are employed in order to obtain satisfactory conductivity of the solution and at the same time to obtain satisfactory corrosion properties of the soluble anodes.
- the inorganic salts of iron are employed, such as, ferrous salts, such as, ferrous sulfate, ferrous chloride, and the like. These salts are present in an amount ranging from about 3 to 60 grams/liter.
- Other bath soluble iron salts may be employed, such as, soluble ferrous fluo'borate, or sulfamate, and the like. The bath 'should contain not less than about 10 g/l of nickel plus ferric and ferrous ions.
- the iron complexing agent that is employed in the present invention is one that is bath soluble and contains complexing groups independently selected from the group consisting of carboxy and hydroxy providing at least I of the complexing groups is a carboxy group and further providing that there are at least two complexing groups.
- the complexing agent that may be employed is present in amount ranging from about 10 to about grams/liter.
- Suitable complexing agents are hydroxy substituted lower aliphatic carboxylic acids having from 2 to 8 carbon atoms, from 1 to 6 hydroxy] groups and from 1 to 3 carboxyl groups such as, ascorbic acid, isoascorbic acid, citric acid, malic acid, gluteric acid, gluconic acid, muconic, glutamic, gluheptonate, glycollic acid, aspartic acid and the like as well as amine containing complexing agents, such as nitrilotriacetic acid, ethylene diamine tetra-acetic acid, as well as the water soluble salts thereof such as ammonium and the alkali metal salts such as potassium, sodium, lithium, and the like. It can also be appreciated that the iron may be introduced into the bath as a salt of the complexing agent.
- carboxy is meant the group-COOH. However, it is to be appreciated that in solution, the proton disassociates from the carboxy group and therefore this group is to be included in the meaning of carboxy.
- the purpose of the complexing agent is to keep the metal ions, in particular, the ferrous and ferric ions in solution. It has been found that as the pH of a normal Watts nickel plating bath increases above a pH of 3.0, ferric ions tend to precipitate as ferric hydroxide. The complexing agent will prevent the precipitation from taking place and therefore makes the iron and nickel ions available for electrodeposition from the complexing agent.
- the pH of the bath preferably ranges from about 2.5 to about 5.5 and even more preferably about 3 to about 3.5.
- the temperature of the bath may range from about F to about 180F preferably about F.
- the average cathode current density may range from about 10 to about 70 amps sq. ft. preferably about 45 amps sq. ft.
- the complexing agent concentration should be at least three times the total iron ion concentration in the bath.
- the complexing agent concentration ratio to total iron ion concentration may range from 3 to 50:1.
- the bath may also contain various buffers such as boric acid and sodium acetate and the like ranging in amounts from about 30 to 60 grams/ liter, preferably 40 grams/liter.
- the ratio of nickel ions to iron ions ranges from about 5 to about 50 to 1.
- While the bath may'be operated without agitation, various means of agitation may be employed such as mechanical agitation, air agitation, cathode rod movement and the like.
- Suitable additives are the sulfo oxygen compounds as are described as brighteners of the first class described in Modern Electroplating, published by John Wiley and Sons, second edition, page 272.
- the amount of sulfo-oxygen compounds employed in the present invention ranges from about 0.5 to about g/l. It has been found that saccharin may be used in amounts ranging from 0.5 to about 5 g/l resulting in a bright ductile deposit. When other sulfo-oxygen compounds are employed, such as, naphthlenetrisulfonic, sulfobenzaldehyde, dibenzenesulfonamide, good brightness is obtained but the ductility is not as good as with saccharin.
- the bath soluble sulfo-oxygen compounds that may be used in the present invention are those such as the unsaturated aliphatic sulfonic acids, mononuclear and binuclear aromatic sulfonic acids, mononuclear aromatic sulfinic acids, mononuclear aromatic sulfonamides and sulfonimides, and the like.
- acetylenic nickel brighteners may also be used in amounts ranging from about 10 to about 500 mg/l. Suitable compounds are the acetylenic sulfo-oxygen compounds mentioned in U.S. Pat. No. 2,800,440. These nickel brighteners are the oxygen containing acetylenic sulfo-oxygen compounds. Other acetylenic nickel brighteners are those described in U.S. Pat. No.
- 3,366,557 such as the polyethers resulting from the condensation reaction of acetylenic alcohols and diols such as, propargyl alcohol, butyndiol, and the like and lower alkylene oxides such as, epichlorohydrin, ethylene oxide, propylene oxide and the like.
- nitrogen heterocyclic quaternary or betaine nickel brighteners may also be used in amounts ranging from about I to about 50 mg/l. Suitable compounds are those nickel brighteners described in U.S. Pat. No. 2,647,866 and the nitrogen heterocyclic sulfonates described in U.S. Pat. No. 3,023,151. Preferred compounds described therein are the pyridine quaternaries or betaines or the pyridine sulfobetaines.
- Suitable quaternaries that may be employed are quinaldine propane sultone, quinaldine dimethyl sulfate, quinaldine allyl bromide, pyridine allyl bromide, isoquinaldine propane sultone, isoquinaldine dimethyl sulfate, isoquinaldine allyl bromide, and the like.
- R l R -N C-S-R where R is hydrogen or a carbon atom of an organic radical, R is nitrogen or a carbon atom of an organic radical and R is a carbon atom of an organic radical. R and R or R may be linked together through a single organic radical.
- bath soluble organic sulfide compounds used are 2-amino thiazoles and isothioureas having the formulae:
- halogens it is intended to include chlorine, bromine, fluorine and iodine, although chlorine is generally preferred.
- lower alkyl or alkoxy groups it is intended to include groups containing from about 1 to 6 carbon atoms in a straight or branched chain, with from about 1 to 4 carbon atoms being preferred.
- sulfonic or carboxy acids and their salts it is intended to include those sulfonic and carboxy acids which have halogen substituents on their alkyl, alkoxy or aryl groups and wherein TABLE I (3) HC-N a N (CH -S0 Na (6) I-lzC-N Compound (1), 2-aminothiazole and compound (2), 2-aminobezothiazole can be reacted with bromoethane sulfonate, propane sultone, benzyl chloride, dimethylsulfate, diethyl sulfate, methyl bromide, propargyl bromide, ethylene dibromide, allyl bromide, methyl chloro acetate, sulfophenoxyethylene bromide, the latter, for example, can be reacted with compound (1) to give compound (3), etc., to form compounds that give even improved results over compounds (1) and (2).
- substituted 2-aminothiazoles and 2- amionbenzothiazoles such as 2-amino-5- chlorothiazole, 2-amino-4-methylthiazole, etc.
- 2-amino-5- chlorothiazole 2-amino-4-methylthiazole, etc.
- thiourea can be reacted with propiolactone, butyrolactone, chloroacetic acid, chloropropionic acid, propane sultone, dimethyl sulfate, etc.
- phenyl thiourea, methyl thiourea, allyl thiourea and other similar substituted thiourea may be used in the reactions to form compounds similar to types (5) and (6).
- nickel brighteners must be soluble in the electroplating bath and may be introduced into the bath, when an acid is involved, as the acid itself or as a salt having bath soluble cations,
- Concentration Range such as ammonium ions or the alkali metal ion, such as, lithium, potassium, sodium, and the like.
- relatively thin coatings of bright nickel iron having less than about 0.5 mil thickness (such as 0.1 mil thickness) with an alloy content of about 20 to 45% iron function more effectively than an equivalent bright nickel coating when copper or brass undercoats are employed.
- the iron content is about 35% or more, the alloy deposits corrode more preferentially to copper or brass undercoats than does bright nickel. This action delays penetration to the basis metal.
- These bright nickel iron coatings also function well as the thin top coat on semi-bright sulfur free nickel deposits.
- the bright nickel iron is very effective in such a composite electroplate when overplated with micro discontinuous chromium coatings such as that described in U.S. Pat. Nos. 3,563,864 and 3,151,971-3.
- the microdiscontinuous chromium coatings may be achieved by thin nickel deposits which induce microporosity or micro-cracking in the chromium or by plating the chromium deposit from a specific solution which deposits a microcracked chromium.
- nickel salts may be substituted with minor amounts up to 50% of the nickel salts with cobalt salts in order to achieve different corrosion behavior.
- a suitable composition that may be employed in the present invention is as follows:
- soluble iron anodes or nickel-iron alloy anodes should be employed.
- the ratio of nickel to iron in the anode area should be maintained at approximately 4 to l.
- dual (nickel and iron) anodes are used and the iron anodes should be insulated from a direct contact to the anode rail and connected subsequently to the anode rail through a highly electrically resistant device such as a nickel-chrome wire or controlled by a separate rheostate to maintain a total current to the iron anodes of about 8 to 30% preferably about 10 to 25% of the total anode current.
- Anode bags, filter bags, hoses, tank linings etc. should be those which are generally employed in other bright nickel processes.
- a bright iron nickel bath was formulated as follows:
- Nickel sulfate hexahydrate I g/l Nickel chloride hexahydrate l g/l Ferrous sulfate heptahydrate 26 g/l Ammonium hydrogen citrate 60 g/l Boric acid Temp. l50F Agitation Rod 4.5 g/l Saccharin 3.75 g/l Allyl sulfonate 200 mg/l Butyne diol ethylene oxide (ratio 1.8 moles oxide: l mole diol) mg/l Quinaldine propane sultone Rolled steel panels were plated at 45 ASF and gave full bright lustrous ductile deposits containing 15-20% iron.
- Example No. l but containing; 7.5 g/l glycine instead of citrate resulted in the formation of an insoluble complex. No acceptable nickel-iron deposit was obtained.
- the iron content of the plated deposit was approximately 20-25%.
- a nickel-iron plating bath having a high iron concentration was tested in a pilot plating laboratory.
- the composition of the bath was as follows:
- the iron included in these deposits was approximately 38-47%.
- a bath was formulated as follows:
- Two nickel-iron plating solutions were prepared having the following compositions.
- a plurality of complexing agents may be used to obtain desirable results. It has also been determined that the gluconate complexing agent tends after long periods of electrolysis to form insoluble materials such as nickel salt of a gluconate degradation product. To continue to obtain desirable results a combination of complexing agents may be employed, such as, citrate and gluconate.
- An aqueous bath suitable for the electrodeposition of a bright iron-nickel electrodeposit onto a substrate susceptible to corrosion comprising not less than about 10 grams per liter nickel plus ferric and ferrous ions, the ratio of nickel ions to ferric and ferrous ions being from about 5 to about 50 to l, 0.5 to 10 g/l of a bath soluble organic primary nickel brightener of the first class containing a sulfo-oxygen group, an amount of a bath soluble complexing agent effective to keep substantially all of the ferric and ferrous ions in solution and containing at least two complexing groups, said groups being independently selected from the group consisting of carboxy and hydroxy, provided at least one group is a carboxy group; the bath having a pH from about 2.5 and about 5.5 and 0.5 to 40 mg/l of an organic sulfide of the formula:
- R is selected from H, lower alkyl sulfonic acid groups, aryl sulfonic acid groups, lower alkoxy aryl sulfonic acid groups and the salts thereof:
- R and R are selected from H, halogen, lower alkyl groups and the bivalent radical in which R is H, halogen or lower alkyl groups and n is 0 or 1, the R groups being selected from H, halogen and lower alkyl groups, R is selected from lower alkyl sulfonic acid groups and lower alkyl carboxy acid groups and the salts thereof; and R and R are selected from H, halogen, lower alkyl groups and the bivalent radical in which the R and R, groups are selected from H, halogen and lower alkyl groups, n is O or 1, and providing that when n O, the bivalent radicals form a six membered ring when R and R are joined and a five membered ring when R and R are joined.
- the complexing agent is an aliphatic carboxylic acid having from 1 to 3 carboxyl groups, 2 to 8 carbon atoms, and l to 6 hydroxyl groups.
- R is lower alkyl carboxy acid and salts thereof.
- the bath of claim 1 wherein the total iron ions are present in an amount ranging from about 5 to 40 g/l, calculated as FeSO .7H O; nickel sulfate present in an amount ranging from about 40 to 300 g/l, calculated as nickel sulfate.6H O; nickel chloride hexahydrate present in an amount from about 80 to 250 g/l and the complexing agent is present in an amount from about 10 to 100 g/l.
- the bath of claim 1 further comprising an acety- 12 lenic nickel brightener present in an amount ranging from about 10 to 500 mg/l.
- the bath of claim 1 further comprising a quaternary nitrogen heterocyclic nickel brightener present in an amount ranging from about 1 to about 50 mg/l.
- a process for producing a bright iron nickel alloy electrodeposit comprising passing a current through the bath of claim 1 and electrodepositing an iron nickel alloy containing about from 5 to about 50% iron onto a cathodic surface.
- R is selected from H, lower alkyl sulfonic acid groups, aryl sulfonic acid groups, lower alkoxy aryl sulfonic acid groups and the salts thereof;
- R and R are selected from H, halogen, lower alkyl groups and the bivalent radical F10 C I in which R, is H, halogen or lower alkyl groups and n is O or 1, the R groups being selected from H, halogen and lower alkyl groups, R is selected from lower alkyl sulfonic acid groups and lower alkyl carboxy acid groups and the salts thereof; and R and R are selected from H, halogen, lower alkyl groups and the bivalent radical in which the R and R groups are selected from H, halogen and lower alkyl groups, n is 0 or 1, and providing that when n O, the bivalent radicals form a six membered ring when R, and R are joined and a five membered ring when R and R are joined.
- the complexing agent is an aliphatic carboxylic acid having from 1 to 3 carboxyl groups, 2 to 8 carbon atoms, and l to 6 hydroxyl groups.
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating And Plating Baths Therefor (AREA)
Abstract
Description
Claims (40)
Priority Applications (9)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US414003A US3878067A (en) | 1972-07-03 | 1973-11-08 | Electrolyte and method for electrodepositing of bright nickel-iron alloy deposits |
| AR25646774A AR224853A1 (en) | 1973-11-08 | 1974-10-08 | A SUITABLE AQUEOUS BATHROOM FOR THE ELECTRO-DEPOSITION OF A GLOSSY IRON-NICKEL ALLOY ON A SUBSTRATE SUSCEPTIBLE TO CORROSION AND ELECTRO-DEPOSITION PROCEDURE FROM SUCH A BATH |
| CA213,100A CA1028649A (en) | 1973-11-08 | 1974-11-04 | Organic sulfides useful for the electrodeposition of bright nickel iron deposits |
| BR937574A BR7409375A (en) | 1973-11-08 | 1974-11-07 | BATH AND PROCESS TO PRODUCE A BRIGHT IRON-NICKEL ALLOY ELECTRODEPOSIT |
| DE19742452831 DE2452831A1 (en) | 1973-11-08 | 1974-11-07 | BATH AND METHOD FOR GALVANIC DEPOSITION OF GLOSSY NICKEL IRON |
| FR7437049A FR2250834A1 (en) | 1973-11-08 | 1974-11-08 | Electrodepositing bright nickel-iron alloy deposits - from aq. bath contg. complexing agent and sulphide brightener |
| NL7414615A NL7414615A (en) | 1973-11-08 | 1974-11-08 | PROCESS FOR ELECTROLYTIC DEPOSITION OF GLOSSY NICKEL IRON COATINGS. |
| IT5393774A IT1023186B (en) | 1973-11-08 | 1974-11-08 | ACOUSE BATH FOR THE ELECTRODEPOSITION OF IRON NICKEL AND PROCEDURE TO PRODUCE |
| JP12883474A JPS5635753B2 (en) | 1973-11-08 | 1974-11-08 |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US26835272A | 1972-07-03 | 1972-07-03 | |
| US414003A US3878067A (en) | 1972-07-03 | 1973-11-08 | Electrolyte and method for electrodepositing of bright nickel-iron alloy deposits |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| US3878067A true US3878067A (en) | 1975-04-15 |
Family
ID=26953023
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| US414003A Expired - Lifetime US3878067A (en) | 1972-07-03 | 1973-11-08 | Electrolyte and method for electrodepositing of bright nickel-iron alloy deposits |
Country Status (1)
| Country | Link |
|---|---|
| US (1) | US3878067A (en) |
Cited By (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3974044A (en) * | 1975-03-31 | 1976-08-10 | Oxy Metal Industries Corporation | Bath and method for the electrodeposition of bright nickel-iron deposits |
| US3994694A (en) * | 1975-03-03 | 1976-11-30 | Oxy Metal Industries Corporation | Composite nickel-iron electroplated article |
| US4014759A (en) * | 1975-07-09 | 1977-03-29 | M & T Chemicals Inc. | Electroplating iron alloys containing nickel, cobalt or nickel and cobalt |
| US4053373A (en) * | 1975-07-09 | 1977-10-11 | M & T Chemicals Inc. | Electroplating of nickel, cobalt, nickel-cobalt, nickel-iron, cobalt-iron and nickel-iron-cobalt deposits |
| US4089754A (en) * | 1977-07-18 | 1978-05-16 | Oxy Metal Industries Corporation | Electrodeposition of nickel-iron alloys |
| US4179343A (en) * | 1979-02-12 | 1979-12-18 | Oxy Metal Industries Corporation | Electroplating bath and process for producing bright, high-leveling nickel iron electrodeposits |
| US4375849A (en) * | 1981-05-15 | 1983-03-08 | Sage Products, Inc. | Syringe needle removal and disposal device |
| US4450051A (en) * | 1981-01-13 | 1984-05-22 | Omi International Corporation | Bright nickel-iron alloy electroplating bath and process |
| US4874103A (en) * | 1986-10-01 | 1989-10-17 | Winfield Corporation | Receptacle for receiving infectious waste material |
| US5683568A (en) * | 1996-03-29 | 1997-11-04 | University Of Tulsa | Electroplating bath for nickel-iron alloys and method |
| RU2237756C2 (en) * | 2002-07-25 | 2004-10-10 | Калининградский государственный университет | Electrolyte for nickel-iron-based allow plating |
| US20100167087A1 (en) * | 2007-07-13 | 2010-07-01 | Hille & Muller Gmbh | Method of providing a metallic coating layer and substrate provided with said coating layer |
| US20130071738A1 (en) * | 2010-02-10 | 2013-03-21 | Qiming Wang | Soft package lithium battery tab material and its method of plating and application |
| US8637165B2 (en) | 2011-09-30 | 2014-01-28 | Apple Inc. | Connector with multi-layer Ni underplated contacts |
| US9004960B2 (en) | 2012-08-10 | 2015-04-14 | Apple Inc. | Connector with gold-palladium plated contacts |
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| US2892760A (en) * | 1954-10-28 | 1959-06-30 | Dehydag Gmbh | Production of metal electrodeposits |
| US2978391A (en) * | 1958-08-25 | 1961-04-04 | Harshaw Chem Corp | Nickel plating process and solution |
| US3276979A (en) * | 1961-08-31 | 1966-10-04 | Dehydag Gmbh | Baths and processes for the production of metal electroplates |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2892760A (en) * | 1954-10-28 | 1959-06-30 | Dehydag Gmbh | Production of metal electrodeposits |
| US2978391A (en) * | 1958-08-25 | 1961-04-04 | Harshaw Chem Corp | Nickel plating process and solution |
| US3276979A (en) * | 1961-08-31 | 1966-10-04 | Dehydag Gmbh | Baths and processes for the production of metal electroplates |
Cited By (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3994694A (en) * | 1975-03-03 | 1976-11-30 | Oxy Metal Industries Corporation | Composite nickel-iron electroplated article |
| US3974044A (en) * | 1975-03-31 | 1976-08-10 | Oxy Metal Industries Corporation | Bath and method for the electrodeposition of bright nickel-iron deposits |
| US4014759A (en) * | 1975-07-09 | 1977-03-29 | M & T Chemicals Inc. | Electroplating iron alloys containing nickel, cobalt or nickel and cobalt |
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| US5932082A (en) * | 1996-03-29 | 1999-08-03 | The University Of Tulsa | Electroplating bath for nickel-iron alloys and method |
| RU2237756C2 (en) * | 2002-07-25 | 2004-10-10 | Калининградский государственный университет | Electrolyte for nickel-iron-based allow plating |
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| US8551316B2 (en) * | 2007-07-13 | 2013-10-08 | Hille & Muller Gmbh | Method of electrodepositing a metallic coating layer containing nickel and molybdenum |
| US20130071738A1 (en) * | 2010-02-10 | 2013-03-21 | Qiming Wang | Soft package lithium battery tab material and its method of plating and application |
| US8637165B2 (en) | 2011-09-30 | 2014-01-28 | Apple Inc. | Connector with multi-layer Ni underplated contacts |
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