US3303113A - Chromium plating - Google Patents
Chromium plating Download PDFInfo
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- US3303113A US3303113A US317129A US31712963A US3303113A US 3303113 A US3303113 A US 3303113A US 317129 A US317129 A US 317129A US 31712963 A US31712963 A US 31712963A US 3303113 A US3303113 A US 3303113A
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- United States
- Prior art keywords
- thorium
- chromium
- concentrations
- sulfate
- liter
- Prior art date
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- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 title claims description 44
- 229910052804 chromium Inorganic materials 0.000 title claims description 43
- 239000011651 chromium Substances 0.000 title claims description 43
- 238000007747 plating Methods 0.000 title description 25
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 claims description 30
- JOPOVCBBYLSVDA-UHFFFAOYSA-N chromium(6+) Chemical compound [Cr+6] JOPOVCBBYLSVDA-UHFFFAOYSA-N 0.000 claims description 15
- 230000002378 acidificating effect Effects 0.000 claims description 13
- 238000004070 electrodeposition Methods 0.000 claims description 5
- 150000003586 thorium compounds Chemical class 0.000 claims description 5
- 101100459267 Crotalus durissus terrificus CRO3 gene Proteins 0.000 claims 1
- 229910052776 Thorium Inorganic materials 0.000 description 44
- UBXAKNTVXQMEAG-UHFFFAOYSA-L strontium sulfate Chemical compound [Sr+2].[O-]S([O-])(=O)=O UBXAKNTVXQMEAG-UHFFFAOYSA-L 0.000 description 41
- ZSLUVFAKFWKJRC-IGMARMGPSA-N 232Th Chemical compound [232Th] ZSLUVFAKFWKJRC-IGMARMGPSA-N 0.000 description 40
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 36
- MZQZQKZKTGRQCG-UHFFFAOYSA-J thorium tetrafluoride Chemical class F[Th](F)(F)F MZQZQKZKTGRQCG-UHFFFAOYSA-J 0.000 description 31
- KRVSOGSZCMJSLX-UHFFFAOYSA-L chromic acid Substances O[Cr](O)(=O)=O KRVSOGSZCMJSLX-UHFFFAOYSA-L 0.000 description 30
- AWJWCTOOIBYHON-UHFFFAOYSA-N furo[3,4-b]pyrazine-5,7-dione Chemical compound C1=CN=C2C(=O)OC(=O)C2=N1 AWJWCTOOIBYHON-UHFFFAOYSA-N 0.000 description 30
- 229910052759 nickel Inorganic materials 0.000 description 18
- 239000000243 solution Substances 0.000 description 17
- 150000002500 ions Chemical class 0.000 description 15
- -1 that is Substances 0.000 description 14
- 239000003054 catalyst Substances 0.000 description 11
- 238000000034 method Methods 0.000 description 10
- 229910052700 potassium Inorganic materials 0.000 description 9
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 8
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 7
- 239000002253 acid Substances 0.000 description 7
- 239000011591 potassium Substances 0.000 description 7
- 229910052708 sodium Inorganic materials 0.000 description 6
- 239000011734 sodium Substances 0.000 description 6
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 5
- WGLPBDUCMAPZCE-UHFFFAOYSA-N Trioxochromium Chemical compound O=[Cr](=O)=O WGLPBDUCMAPZCE-UHFFFAOYSA-N 0.000 description 5
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 5
- 239000004327 boric acid Substances 0.000 description 5
- 239000010949 copper Substances 0.000 description 5
- BEJNTOQZNHFUFT-UHFFFAOYSA-N 1-ethylcyclohexane-1-sulfonic acid Chemical compound CCC1(S(O)(=O)=O)CCCCC1 BEJNTOQZNHFUFT-UHFFFAOYSA-N 0.000 description 4
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 4
- WUKWITHWXAAZEY-UHFFFAOYSA-L calcium difluoride Chemical compound [F-].[F-].[Ca+2] WUKWITHWXAAZEY-UHFFFAOYSA-L 0.000 description 4
- 229910001634 calcium fluoride Inorganic materials 0.000 description 4
- 229910052802 copper Inorganic materials 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 150000002222 fluorine compounds Chemical class 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- KMUONIBRACKNSN-UHFFFAOYSA-N potassium dichromate Chemical compound [K+].[K+].[O-][Cr](=O)(=O)O[Cr]([O-])(=O)=O KMUONIBRACKNSN-UHFFFAOYSA-N 0.000 description 4
- 150000003839 salts Chemical class 0.000 description 4
- 229910001369 Brass Inorganic materials 0.000 description 3
- 229910000831 Steel Inorganic materials 0.000 description 3
- 230000004913 activation Effects 0.000 description 3
- 238000007792 addition Methods 0.000 description 3
- 239000010951 brass Substances 0.000 description 3
- 239000003795 chemical substances by application Substances 0.000 description 3
- 239000011737 fluorine Substances 0.000 description 3
- 229910052731 fluorine Inorganic materials 0.000 description 3
- 125000001153 fluoro group Chemical group F* 0.000 description 3
- 239000010959 steel Substances 0.000 description 3
- NVKTUNLPFJHLCG-UHFFFAOYSA-N strontium chromate Chemical compound [Sr+2].[O-][Cr]([O-])(=O)=O NVKTUNLPFJHLCG-UHFFFAOYSA-N 0.000 description 3
- SFKTYEXKZXBQRQ-UHFFFAOYSA-J thorium(4+);tetrahydroxide Chemical compound [OH-].[OH-].[OH-].[OH-].[Th+4] SFKTYEXKZXBQRQ-UHFFFAOYSA-J 0.000 description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 229910000581 Yellow brass Inorganic materials 0.000 description 2
- 239000012190 activator Substances 0.000 description 2
- 230000002411 adverse Effects 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 150000001450 anions Chemical class 0.000 description 2
- AYJRCSIUFZENHW-UHFFFAOYSA-L barium carbonate Chemical compound [Ba+2].[O-]C([O-])=O AYJRCSIUFZENHW-UHFFFAOYSA-L 0.000 description 2
- 229910052791 calcium Inorganic materials 0.000 description 2
- 239000011575 calcium Substances 0.000 description 2
- ABXXWVKOBZHNNF-UHFFFAOYSA-N chromium(3+);dioxido(dioxo)chromium Chemical compound [Cr+3].[Cr+3].[O-][Cr]([O-])(=O)=O.[O-][Cr]([O-])(=O)=O.[O-][Cr]([O-])(=O)=O ABXXWVKOBZHNNF-UHFFFAOYSA-N 0.000 description 2
- SOCTUWSJJQCPFX-UHFFFAOYSA-N dichromate(2-) Chemical compound [O-][Cr](=O)(=O)O[Cr]([O-])(=O)=O SOCTUWSJJQCPFX-UHFFFAOYSA-N 0.000 description 2
- 150000001457 metallic cations Chemical class 0.000 description 2
- 229920006395 saturated elastomer Polymers 0.000 description 2
- 229910001427 strontium ion Inorganic materials 0.000 description 2
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- 239000004115 Sodium Silicate Substances 0.000 description 1
- PMZURENOXWZQFD-UHFFFAOYSA-L Sodium Sulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=O PMZURENOXWZQFD-UHFFFAOYSA-L 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 229910000928 Yellow copper Inorganic materials 0.000 description 1
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 229910001863 barium hydroxide Inorganic materials 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 150000001768 cations Chemical class 0.000 description 1
- ZCDOYSPFYFSLEW-UHFFFAOYSA-N chromate(2-) Chemical class [O-][Cr]([O-])(=O)=O ZCDOYSPFYFSLEW-UHFFFAOYSA-N 0.000 description 1
- 230000001684 chronic effect Effects 0.000 description 1
- 239000003426 co-catalyst Substances 0.000 description 1
- 230000002079 cooperative effect Effects 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- ZHGASCUQXLPSDT-UHFFFAOYSA-N cyclohexanesulfonic acid Chemical compound OS(=O)(=O)C1CCCCC1 ZHGASCUQXLPSDT-UHFFFAOYSA-N 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 230000001627 detrimental effect Effects 0.000 description 1
- 230000003467 diminishing effect Effects 0.000 description 1
- WLILEPGHDWFWAT-UHFFFAOYSA-N dioxido(dioxo)chromium thorium(4+) Chemical compound [Cr](=O)(=O)([O-])[O-].[Th+4].[Cr](=O)(=O)([O-])[O-] WLILEPGHDWFWAT-UHFFFAOYSA-N 0.000 description 1
- 238000002845 discoloration Methods 0.000 description 1
- 239000002355 dual-layer Substances 0.000 description 1
- 239000002659 electrodeposit Substances 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- RRHRMDCJEDCXMI-UHFFFAOYSA-N fluoro hypofluorite;thorium Chemical compound [Th].FOF RRHRMDCJEDCXMI-UHFFFAOYSA-N 0.000 description 1
- 238000009472 formulation Methods 0.000 description 1
- 230000009931 harmful effect Effects 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 description 1
- BDAGIHXWWSANSR-NJFSPNSNSA-N hydroxyformaldehyde Chemical compound O[14CH]=O BDAGIHXWWSANSR-NJFSPNSNSA-N 0.000 description 1
- 229910001506 inorganic fluoride Inorganic materials 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 229910052744 lithium Inorganic materials 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- VCXNHCBXRKRKSO-UHFFFAOYSA-J oxalate;thorium(4+) Chemical compound [Th+4].[O-]C(=O)C([O-])=O.[O-]C(=O)C([O-])=O VCXNHCBXRKRKSO-UHFFFAOYSA-J 0.000 description 1
- YFSUTJLHUFNCNZ-UHFFFAOYSA-N perfluorooctane-1-sulfonic acid Chemical compound OS(=O)(=O)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F YFSUTJLHUFNCNZ-UHFFFAOYSA-N 0.000 description 1
- 229910001414 potassium ion Inorganic materials 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- 238000005185 salting out Methods 0.000 description 1
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 1
- 229910052911 sodium silicate Inorganic materials 0.000 description 1
- 229910052938 sodium sulfate Inorganic materials 0.000 description 1
- 235000011152 sodium sulphate Nutrition 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910052712 strontium Inorganic materials 0.000 description 1
- CIOAGBVUUVVLOB-UHFFFAOYSA-N strontium atom Chemical compound [Sr] CIOAGBVUUVVLOB-UHFFFAOYSA-N 0.000 description 1
- 229910000018 strontium carbonate Inorganic materials 0.000 description 1
- FVRNDBHWWSPNOM-UHFFFAOYSA-L strontium fluoride Chemical compound [F-].[F-].[Sr+2] FVRNDBHWWSPNOM-UHFFFAOYSA-L 0.000 description 1
- 229910001637 strontium fluoride Inorganic materials 0.000 description 1
- ZCUFMDLYAMJYST-UHFFFAOYSA-N thorium dioxide Chemical compound O=[Th]=O ZCUFMDLYAMJYST-UHFFFAOYSA-N 0.000 description 1
- 229910003452 thorium oxide Inorganic materials 0.000 description 1
- UTLZBWAGLRNNAY-UHFFFAOYSA-J thorium(4+);dicarbonate Chemical compound [Th+4].[O-]C([O-])=O.[O-]C([O-])=O UTLZBWAGLRNNAY-UHFFFAOYSA-J 0.000 description 1
- RUJLHPZAKCVICY-UHFFFAOYSA-J thorium(4+);disulfate Chemical compound [Th+4].[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O RUJLHPZAKCVICY-UHFFFAOYSA-J 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/04—Electroplating: Baths therefor from solutions of chromium
Definitions
- This invention relates to the electrodeposition of chromium from aqueous acidic hexavalent chromium solutions, and especially to the use of thorium fluorides in aqueous acidic hexavalent chromium solutions to make possible improved chromium plate from operationally simplified baths.
- Patents 1,844,751, 2,063,197, 2,042,611, 2,640,021, 2,640,022, and 2,952,590 are disclosed.
- Lukens used saturation concentrations of the slightly soluble strontium sulfate with or without added strontium chromate, to maintain the sulfate ion concentration in chromic acid baths containing about 200 grams per liter of CrO or less, Passal improved on this by also using with saturation concentrations of strontium sulfate, sparingly soluble potassium silicofluoride fluosilicate), and Stareck made further improvements by using with the saturation concentrations of strontium sulfate and potassium silicofluoride, mixed suppressing agents such as strontium chromate and potassium dichromate to better control the concentrations of sulfate and silicofiuoride ions by common ion efiects. Stareck also employed fluoaluminate, fluotitanate and fiuozirconate ions instead of fluosilicate to use with controlled sulfate ion concentrations.
- the standard or conventional chromium bath employing only the sulfate anion as catalyst and used for plating on nickel, iron, yellow brass or copper has been the 100 to 1 ratio of chromic acid anhydride (CrO to sulfate ion.
- CrO to sulfate ion chromic acid anhydride
- a ratio of 200 to 1 of CrO to $0. and plates on top of nickel, copper, yellow brass or steel, only an iridescent non-metallic chromium chromate 330MB Patented Feb.
- a fluorine-containing thorium compound such as thorium tetrafluoride, thorium fluoborate, thorium fluosilicate, or mixtures, etc., which are practically insoluble in water and only slightly soluble in chromic acid solutions containing about to 500 grams/liter of chromic acid are unusual in cooperating with saturated strontium sulfate in the chromic acid baths to produce bright chromium plate of exceptional covering power on nickel, brass, copper and steel.
- the presence of the thorium tetrafluori-de and/or the thorium fluoborate or thorium fiuosilicate in the bath saturated with the strontium sulfate makes possible the deposition of bright chromium plate over a very wide cathode current density range even with dead entry of the nickel plate into the chromium plating bath.
- the thorium fluorides can be used in concentrations of about 0.2 gram/ liter to saturation concentrations.
- Saturation concentrations of the thorium fluorides in the chromic acid baths do not cause any harmful effects in conjunction with saturation concentrations of strontium sulfate, such as greatly diminishing the covering and throwing power of the chromium deposit and producing dull white areas in the high current density chromium plate.
- the saturation concentrations of thorium fluorides act quite differently than saturation concentrations of other inorganic fluorides which were tested, such as calcium fluoride, strontium fluoride, potassium or sodium fluosilicate (silocofluoride).
- These latter fluorides and silicofiuorides when used in saturation concentrations in the chromic acid solutions diminish the covering and throwing power of the chromium plate. It is for this reason that suppressing agents (for common ion effects) must be used in conjunction with saturation concentrations of these latter fluorides.
- the best or optimum covering power chromium plating baths were obtained by the use in chromic acid baths containing-300-35O gra'ms/lier CrO of saturation concentrations of strontium sulfate and saturation concentrations (2 to about 6 grams/ liter) of thorium tetrafluoride and/or thorium fluoborate, or thorium fiuosilicate, and with the use of perfiuoro para ethyl cyclohexyl sulfonic acid in concentrations of about 1 to 3 grams/liter.
- thorium tetrafluoride Thin ionizes to ThFl ThFl etc., and these complex ions are also activators in the chromium bath is not known, but rea3 gardless of its mechanism of ionization, the fact is that saturation concentrations of the thorium tetrafluoride or thorium fluoborate or thorium fluosilicate cooperate with saturation concentrations of strontium sulfate to give chromium plating baths of high covering power on nickel, steel, stainless steel, copper, brass and aluminum. As far as we have been able to ascertain this is the first time thorium fluorides have been used in acidic hexavalent chromium plating baths. The thorium cation makes possible the simplest regulation of the fluoride, silicofluoride (fluosilicate) and fluoborate ion concentrations in chromic acid solutions.
- strontium sulfate as the source of the sulfate ion
- the thorium fluorides any source of sulfate ion that is less than about one hun dredth the concentration of chromic acid and preferably in the ratio of about 120 to l to about 200 to l of chromic acid anhydride (CrO to sulfate ion.
- the bright nickel plates from the latter baths are more passive, and this condition often requires a higher concentration of sulfate ion or fluoride ion in the chromium plating bath than would otherwise be necessary to obtain a bright chromium plate free of white streaks and with maximum covering power. Since it is far easier to analyze for sulfate ion in the chromium plating bath than fluoride ion, it is thus much simpler to obtain maximum chromium coverage on any of the bright nickel surfaces described above, from a chromium plating bath with low and controlled concentrations of fluoride or complex fluoride ions by merely gradually raising the sulfate ion concentration above that given by saturation concentrations of strontium sulfate.
- the acidic hexavalent chromium bath in general needs no control of the catalyst concentrations, but if the bright nickel is overly passive, a small addition of sulfuric acid or sodium sulfate can very easily control and eliminate any whitish streaks in the chromium plate.
- a pre-dip of the bright nickel plate in dilute chromic acid about 5 to grams/ liter of chromic acid
- thorium fluorides are operating more as activators of passive surfaces of nickel, brass or copper, that is, of the surface being plated upon, than as catalyst, in the sense that sodium or potassium silicofluoride or fluosilicic acid or calcium fluoride act as catalysts in promoting chromium plating from pure chromic acid solutions, such as 100- 500 grams/liter concentrations of chromic acid.
- the acidic hexavalent chromium plating baths may be made up from straight chromic acid anhydride or chromic acid, or from mixtures with dichromates, chromates, and polychromates. It is generally preferred to use straight chromic acid or chromic acid anhydride.
- the presence of cations such as Na, K, Li, Mg and Ca are not detrimental, but they are best kept in low concentration values.
- the important metallic cations are the metallic cations of this invention, the thorium and thorium fluoride complexes to control the fluoride concentration which is normally difficult to control, unlike the sulfate concentration which is easy to control.
- Strontium ions may be present from strontium chromate or dichromate, but it is generally preferred that the strontium ions should be mainly from the saturation concentrations of strontium sulfate.
- thorium tetrafluoride, thorium fluoborate, thorium silicofluoride (fluosilicate) can be replaced partially or entirely by other thorium fluorides such as thorium fluoaluminate, thorium fluotitanate, thorium fluozirconate, thorium oxyfluoride and mixtures thereof and any of these single or mixed salts can be used with saturation concentrations of strontium sulfate.
- Example I 340 grams/liter (45 oz./gal.) of chromic acid anhydride Saturation concentrations of SrSO (excess present) Saturation concentrations of thorium tetrafluoride (1-4 grams/ liter) 0 to saturation concentrations of boric acid 0 to 3 grams/liter of perfluoro para ethyl cyclohexyl sulfonic acid l to 3 grams/ liter preferred) Temperature -130" F. (46-55 C.)
- Example II 200-400 grams/liter of CrO Saturation concentrations of SrSO (excess present) Saturation concentrations of thorium fluoborate (2-6 grams/ liter, excess present) 1-3 grams/liter of perfluoro para ethyl cyclohexyl sulfonic acid Temperature 105-140 F.
- Example 111 150400 grams/liter Cr0 Saturation concentrations of SrSO or to 1 ratio of CrO /SO 0.4 to 3 grams/liter of thorium tetrafluoride, thorium fluoborate, thorium fluosilicate, thorium fluoaluminate, thorium fluotitanate, thorium fluozirconate, or mixtunes 0 to saturation concentrations of boric acid 5 grams/liter of perfluoro para ethyl (or methyl) cyclohexyl sulfonic acid (or the Na, K, Ca, etc., salt) Temperature 105140 F.
- Example IV 200-400 grams/liter CrO Saturation concentrations of thorium fluosilicate (2-6 grams/ liter) Saturation concentrations of strontium sulfate 1-3 grams/liter of perfluoro para ethyl cyclohexyl sulfonic acid Temperature IDS-140 F.
- the most economical form to obtain the thorium cation is as the hydrated thorium oxide, that is, as thorium hydroxide.
- This hydrated thorium compound can be added di-rectly to acidic hexavalent chromium plating baths containing for example, potassium or sodium fluosilicate (silicofluoride) or fluosilicic acid, and by formation of thorium fluosilicate immediately put the fluoride concentration in optimum concentration.
- the chromic acid bath had calcium fluoride or hydrofluoric acid present, or strontium fluoborate or fluob-oric acid present, or the ferric, aluminum, zirconium or titanium complex fluoride anions present, that is the particular thorium fluoride would form preferentially and put the fluoride ion under control of the thorium cation.
- the thorium fluosilicate, fluoborate or fluoride could be formed directly in the chromic acid bath by adding the thorium hydroxide to the proper molar quantity of the particular fluoro acid, or the thorium fluosilicate, fluoborate, or tetrafluoride could be added as such to the bath.
- the same procedure can be followed for thorium fluoaluminate, thorium fluotitanate and thorium fluozirconate. Concentrations of the thorium fluorides greater than about 8 grams/ liter are usually not necessary as this concentration leaves a suflicient excess of undissolved thorium fluoride compound at the bottom of the plating solution to allow for maintenance and easy control.
- thorium hydroxide instead of using thorium hydroxide, thorium chromate, bichromate, thorium carbonate, thorium oxalate, or thorium sulfate could be added to the baths containing the fluo-acids or their salts. If excess sulfate ions are present they can be eliminated by adding barium carbonate or hydroxide or strontium carbonate.
- the plate obtained With plating of thick chromium of 1 to 10 miles thickness or higher, the plate obtained is very bright with the saturation concentrations of a thorium fluoride and saturation concentrations of strontium sulfate in chronic acid concentrations of 300-350 grams/liter, at bath temperatures of 1l5125 F., also the plate is much less prone to stress-cracking.
- the plate For crack-free bright chromium plate up to about 0.1 mil, it is less critical to use than many previous crack-free formulations. Also, it is suitable to use these chromium baths to obtain single or dual layers of micro-cracked chromium by using the more dilute concentrations of chromic acid such as 180-200 grams/liter.
- a bath for the electrodeposition of chromium plate comprising an aqueous acidic hexavalent chromium solution containing a ratio of concentrations of CrO to sulfate ion greater than about 100 to 1, and less than about 200 to 1, and containing at least one fluorine-containing thorium compound in a concentration of about 0.2 gram/ liter to saturation concentrations.
- a bath in accordance with claim 1 wherein said hexavalent chromium solution is chromic acid in a concentration of about 100 to about 500 grams/ liter.
- bath in accordance with claim 1 wherein bath contains thorium fluoborate.
- bath in accordance with claim 1 wherein bath contains thorium fluosilicate (silicofluoride).
- bath in accordance with claim 1 wherein bath contains thorium fluoaluminate.
- bath in accordance with claim 1 wherein bath contains thorium fluotitanate.
- bath in accordance with claim 1 wherein bath contains thorium fluozirconate.
- a method of electrodepositing chromium which comprises passing current from an anode to a cathode to be coated in an aqueous acidic hexavalent chromium solution containing a ratio of concentrations of CrO to sulfate ion greater than about to 1 and less than about 200 to 1, and containing at least one fluorine-containing thorium compound in a concentration of about 0.2 gram/ liter to saturation concentrations.
- a method in accordance with claim 10 wherein said hexavalent chromium solution is chromic acid in a concentration of about 100 to about 500 grams/ liter.
- sulfate ion is derived from saturation concentrations of strontium sulfate in said acidic hexavalent chromium plating solution.
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating And Plating Baths Therefor (AREA)
Description
Claims (1)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US317129A US3303113A (en) | 1963-10-18 | 1963-10-18 | Chromium plating |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US317129A US3303113A (en) | 1963-10-18 | 1963-10-18 | Chromium plating |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| US3303113A true US3303113A (en) | 1967-02-07 |
Family
ID=23232240
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| US317129A Expired - Lifetime US3303113A (en) | 1963-10-18 | 1963-10-18 | Chromium plating |
Country Status (1)
| Country | Link |
|---|---|
| US (1) | US3303113A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2064241A1 (en) * | 1969-10-10 | 1971-07-16 | Permalite Chem Ltd | |
| US4619742A (en) * | 1984-07-04 | 1986-10-28 | Hoechst Aktiengesellschaft | Process for the simultaneous graining and chromium-plating of steel plates as supports for lithographic applications |
Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US1844751A (en) * | 1925-08-12 | 1932-02-09 | United Chromium Inc | Process of electrodepositing chromium |
| US1928284A (en) * | 1932-01-14 | 1933-09-26 | Colin G Fink | Process of electrodepositing chromium |
| US2042611A (en) * | 1932-02-03 | 1936-06-02 | United Chromium Inc | Control of chromium plating solutions |
| US2063197A (en) * | 1933-08-30 | 1936-12-08 | Schneidewind Richard | Method of chromium plating |
| US2640022A (en) * | 1950-11-07 | 1953-05-26 | United Chromium Inc | Composition, bath, and process for chromium plating |
| US2787588A (en) * | 1954-08-12 | 1957-04-02 | Metal & Thermit Corp | Chromium plating |
| US2952590A (en) * | 1959-08-14 | 1960-09-13 | Metal & Thermit Corp | Process for chromium plating |
| US2962428A (en) * | 1959-01-15 | 1960-11-29 | Metal & Thermit Corp | Process for chromium plating |
-
1963
- 1963-10-18 US US317129A patent/US3303113A/en not_active Expired - Lifetime
Patent Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US1844751A (en) * | 1925-08-12 | 1932-02-09 | United Chromium Inc | Process of electrodepositing chromium |
| US1928284A (en) * | 1932-01-14 | 1933-09-26 | Colin G Fink | Process of electrodepositing chromium |
| US2042611A (en) * | 1932-02-03 | 1936-06-02 | United Chromium Inc | Control of chromium plating solutions |
| US2063197A (en) * | 1933-08-30 | 1936-12-08 | Schneidewind Richard | Method of chromium plating |
| US2640022A (en) * | 1950-11-07 | 1953-05-26 | United Chromium Inc | Composition, bath, and process for chromium plating |
| US2787588A (en) * | 1954-08-12 | 1957-04-02 | Metal & Thermit Corp | Chromium plating |
| US2962428A (en) * | 1959-01-15 | 1960-11-29 | Metal & Thermit Corp | Process for chromium plating |
| US2952590A (en) * | 1959-08-14 | 1960-09-13 | Metal & Thermit Corp | Process for chromium plating |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2064241A1 (en) * | 1969-10-10 | 1971-07-16 | Permalite Chem Ltd | |
| US4619742A (en) * | 1984-07-04 | 1986-10-28 | Hoechst Aktiengesellschaft | Process for the simultaneous graining and chromium-plating of steel plates as supports for lithographic applications |
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