US20180354095A1 - Grinding Tool and Method of Fabricating the Same - Google Patents
Grinding Tool and Method of Fabricating the Same Download PDFInfo
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- US20180354095A1 US20180354095A1 US16/003,264 US201816003264A US2018354095A1 US 20180354095 A1 US20180354095 A1 US 20180354095A1 US 201816003264 A US201816003264 A US 201816003264A US 2018354095 A1 US2018354095 A1 US 2018354095A1
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- abrasive particles
- grinding tool
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- 238000000227 grinding Methods 0.000 title claims abstract description 62
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 10
- 239000000758 substrate Substances 0.000 claims abstract description 119
- 239000002245 particle Substances 0.000 claims abstract description 93
- 239000000853 adhesive Substances 0.000 claims abstract description 32
- 230000001070 adhesive effect Effects 0.000 claims abstract description 32
- 230000000717 retained effect Effects 0.000 claims abstract description 4
- 238000000034 method Methods 0.000 claims description 20
- 239000000463 material Substances 0.000 claims description 12
- 238000005553 drilling Methods 0.000 claims description 8
- 239000000919 ceramic Substances 0.000 claims description 6
- 239000004593 Epoxy Substances 0.000 claims description 3
- 239000007769 metal material Substances 0.000 claims description 3
- 229920001568 phenolic resin Polymers 0.000 claims description 3
- 239000005011 phenolic resin Substances 0.000 claims description 3
- 229920006122 polyamide resin Polymers 0.000 claims description 3
- 229920005668 polycarbonate resin Polymers 0.000 claims description 3
- 239000004431 polycarbonate resin Substances 0.000 claims description 3
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- 229920001721 polyimide Polymers 0.000 claims description 3
- 239000009719 polyimide resin Substances 0.000 claims description 3
- 229910052582 BN Inorganic materials 0.000 claims description 2
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 claims description 2
- 229910003460 diamond Inorganic materials 0.000 claims description 2
- 239000010432 diamond Substances 0.000 claims description 2
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 claims description 2
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 claims description 2
- 229910010271 silicon carbide Inorganic materials 0.000 claims description 2
- 238000005498 polishing Methods 0.000 description 9
- 238000010276 construction Methods 0.000 description 6
- 239000003292 glue Substances 0.000 description 5
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- 239000000126 substance Substances 0.000 description 5
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Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/11—Lapping tools
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B53/00—Devices or means for dressing or conditioning abrasive surfaces
- B24B53/017—Devices or means for dressing, cleaning or otherwise conditioning lapping tools
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
- B24D18/00—Manufacture of grinding tools or other grinding devices, e.g. wheels, not otherwise provided for
- B24D18/0072—Manufacture of grinding tools or other grinding devices, e.g. wheels, not otherwise provided for using adhesives for bonding abrasive particles or grinding elements to a support, e.g. by gluing
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
- B24D3/00—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents
- B24D3/02—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents the constituent being used as bonding agent
- B24D3/04—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents the constituent being used as bonding agent and being essentially inorganic
- B24D3/06—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents the constituent being used as bonding agent and being essentially inorganic metallic or mixture of metals with ceramic materials, e.g. hard metals, "cermets", cements
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
- B24D3/00—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents
- B24D3/02—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents the constituent being used as bonding agent
- B24D3/04—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents the constituent being used as bonding agent and being essentially inorganic
- B24D3/14—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents the constituent being used as bonding agent and being essentially inorganic ceramic, i.e. vitrified bondings
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
- B24D7/00—Bonded abrasive wheels, or wheels with inserted abrasive blocks, designed for acting otherwise than only by their periphery, e.g. by the front face; Bushings or mountings therefor
- B24D7/06—Bonded abrasive wheels, or wheels with inserted abrasive blocks, designed for acting otherwise than only by their periphery, e.g. by the front face; Bushings or mountings therefor with inserted abrasive blocks, e.g. segmental
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
- B24D2203/00—Tool surfaces formed with a pattern
Definitions
- FIG. 1 is a schematic view illustrating a conventional technique for fabricating a conditioner 1 .
- a mesh plate 13 can be used to position and control the height of a abrasive elements 11 placed in a mold 14 .
- a glue or resin 12 can be applied over the abrasive elements 11 inside the mold 14 .
- Pressure and vacuum can be applied so as to reduce the formation of air voids in the glue or resin 12 .
- the glue or resin 12 solidifies, it can be removed from the mold 14 to obtain the conditioner 1 shown in FIG. 2 comprised of the abrasive elements 11 adhered to the solidified glue or resin 12 .
- FIG. 6 is a cross-sectional view illustrating another variant construction of a grinding tool
- the abrasive particles 22 can be made of any suitable materials having high hardness. Examples of suitable materials for the abrasive particles 22 may include, without limitation, diamond, cubic boron nitride, aluminum oxide, and silicon carbide. The abrasive particles 22 are not limited in shape, and may exemplary have a hexoctahedron crystalline form. Moreover, the abrasive particles 22 may have any suitable size in accordance with the requisite functions of the grinding tool 2 .
- each hole 213 can include two hole sections 215 and 214 connected with each other that have different sizes and shapes.
- the hole section 215 can exemplary have a cylindrical shape, and the other hole section 214 can be exemplary shaped as a truncated cone.
- the hole section 215 can open on the surface 212 through the opening 212 A, and can have an inner sidewall that can be substantially perpendicular to the surface 212 .
- the hole section 214 can open on the surface 211 through the opening 211 A, and can have a tapered shape that narrows toward the surface 211 .
- a material angle between an inner sidewall of the hole section 214 and the surface 211 can be between about 70 and about 89 degrees.
- FIG. 5 is a cross-sectional view illustrating a variant construction of a grinding tool 3 .
- the grinding tool 3 can include the substrate 21 , the abrasive particles 22 attached to the substrate 21 , and a base substrate 31 .
- the base substrate 31 can be provided to further increase the rigidity of the grinding tool 3 .
- the substrate 21 may have the same structure described previously, and the abrasive particles 22 may be attached to the substrate 21 in a similar way. More specifically, the same holes 213 described previously may be provided in the substrate 21 and extend through the two opposite surfaces 211 and 212 of the substrate 21 .
- the abrasive particles 22 can be respectively disposed in the holes 213 , and can be respectively attached to the substrate 21 via the adhesive portions 216 .
- the opening 412 A can have a diameter between 1 mm and 2 mm, such as 2 mm, and the opening 411 A can have a diameter between 0.4 mm and 0.75 mm, such as 750 ⁇ m.
- the smaller opening 411 A can block passage of the abrasive particle 22 and thereby retain the abrasive particle 22 in the hole 413 .
- the abrasive particle 22 can be prevented from falling out of the grinding tool 4 during use.
- the abrasive particle 22 can partially protrude outward from the opening 411 A on the surface 411 of the substrate 41 .
- the abrasive particles 22 in step S 120 can be respectively introduced through the openings 212 A and placed in the holes 213 of the substrate 21 . Because the openings 211 A are smaller than the abrasive particles 22 , the abrasive particles 22 can be respectively retained in the hole sections 214 of the holes 213 .
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Ceramic Engineering (AREA)
- Inorganic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Polishing Bodies And Polishing Tools (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
Abstract
A grinding tool includes a substrate and a plurality of abrasive particles. The substrate has a first and a second surface and a plurality of holes, each of the holes extending through the substrate and respectively having a first and a second opening on the first and second surface, the second opening being larger than the first opening. The abrasive particles are respectively disposed in the holes and attached to the substrate via a plurality of adhesive portions, each of the abrasive particles having a tip protruding outward from the first surface and a remaining part covered with one of the adhesive portions inside the corresponding hole, wherein the first openings of the holes are smaller than the abrasive particles, and the abrasive particles are respectively retained in the holes. Moreover, embodiments described herein include a method of fabricating a grinding tool.
Description
- This U.S. patent application claims priority to Taiwan Patent Application No. 106119428 filed on Jun. 12, 2017, which is incorporated herein by reference.
- The present invention relates to grinding tools and fabrication methods thereof.
- Grinding and/or polishing techniques are generally applied to create a desirable surface roughness or planarity of a rigid part, such as metal, ceramic or glass parts, or semiconductor wafers. To this purpose, the grinding and/or polishing techniques use tools having abrasive elements that can wear the rigid surface.
- A well known polishing technique is the chemical mechanical polishing (CMP) technique employed in semiconductor fabrication processes. CMP uses a corrosive chemical slurry in conjunction with a polishing pad to remove undesired residues and planarize a wafer surface, which can be made of ceramic, silicon, glass, sapphire or metal. After the polishing pad is used over a period of time, the grinding action of the polishing pad may diminish. Accordingly, an additional grinding tool (also called “conditioner”) may be typically used to coarsen the surface of the polishing pad for maintaining an optimal grinding efficiency of the polishing pad.
- Conventionally, a cutting rate of the grinding tool may be improved by increasing a distribution density of the abrasive elements provided thereon. This requires increasing the quantity of abrasive elements on the grinding tool, which makes the grinding tool more expensive to manufacture.
-
FIG. 1 is a schematic view illustrating a conventional technique for fabricating aconditioner 1. Amesh plate 13 can be used to position and control the height of aabrasive elements 11 placed in a mold 14. Then a glue orresin 12 can be applied over theabrasive elements 11 inside the mold 14. Pressure and vacuum can be applied so as to reduce the formation of air voids in the glue or resin 12. Once the glue orresin 12 solidifies, it can be removed from the mold 14 to obtain theconditioner 1 shown inFIG. 2 comprised of theabrasive elements 11 adhered to the solidified glue orresin 12. In practice, theaforementioned conditioner 1 may have some disadvantages, e.g., the solidified glue orresin 12 may be subjected to alteration in contact with a corrosive chemical slurry, which may result in the detachment of theabrasive elements 11. - Therefore, there is a need for an improved grinding tool that can be fabricated in a cost-effective manner and reliably attach abrasive elements, and can address at least the foregoing issues.
- The present application describes a grinding tool that can reliably attach abrasive particles, and can be fabricated in a cost-effective manner. The grinding tool includes a substrate and a plurality of abrasive particles. The substrate has a first and a second surface and a plurality of holes, each of the holes extending through the substrate and respectively having a first and a second opening on the first and second surface, the second opening being larger than the first opening. The abrasive particles are respectively disposed in the holes and attached to the substrate via a plurality of adhesive portions, each of the abrasive particles having a tip protruding outward from the first surface and a remaining part covered with one of the adhesive portions inside the corresponding hole, wherein the first openings of the holes are smaller than the abrasive particles, and the abrasive particles are respectively retained in the holes.
- The present application further describes a method of fabricating a grinding tool. The method includes providing a substrate having a first and a second surface and a plurality of holes, each of the holes extending through the substrate and respectively having a first and a second opening on the first and second surface, the second opening being larger than the first opening; respectively placing a plurality of abrasive particles in the holes through the second openings thereof, wherein the abrasive particles are generally larger than the first openings and partially protrude outward from the first openings; placing the substrate on a fixed support having a plurality of positioning cavities, the abrasive particles protruding from the first openings being respectively received partially in the positioning cavities; and respectively applying a plurality of adhesive portions through the second openings into the holes, thereby the adhesive portions respectively cover the abrasive particles inside the holes and fixedly attach the abrasive particles to the substrate.
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FIG. 1 is a schematic view illustrating a conventional technique for fabricating a conditioner; -
FIG. 2 is a schematic cross-sectional view illustrating a conventional conditioner; -
FIG. 3 is a schematic top view illustrating an embodiment of a grinding tool; -
FIG. 4 is a cross-sectional view illustrating an embodiment of a grinding tool; -
FIG. 5 is a cross-sectional view illustrating a variant construction of a grinding tool; -
FIG. 6 is a cross-sectional view illustrating another variant construction of a grinding tool; -
FIG. 7 is a flowchart of method steps for fabricating a grinding tool; and -
FIGS. 8-11 are schematic views illustrating various intermediate stages in the fabrication of a grinding tool. -
FIG. 3 is a schematic top view illustrating an embodiment of agrinding tool 2, andFIG. 4 is a cross-sectional view illustrating thegrinding tool 2. Referring toFIGS. 3 and 4 , thegrinding tool 2 can include asubstrate 21, and a plurality ofabrasive particles 22 fixedly attached to thesubstrate 21. Thesubstrate 21 may be a single rigid body. Thesubstrate 21 may be made of stiff and chemically stable materials, which can exemplary include metallic materials such as stainless steel, ceramics, and the like. According to an embodiment, thesubstrate 21 is made of stainless steel so that thegrinding tool 2 is less subjected to chemical alteration when it is used in contact with an acid or alkaline slurry. There is no particular limitation imposed on the size of thesubstrate 21. According to an embodiment, thesubstrate 21 may be a generally circular disk having a diameter of about 4 inches and a thickness equal to about 2 mm to about 3 mm. Thesubstrate 21 may have two 211 and 212, theopposite surfaces surface 211 being a working surface of thegrinding tool 2, and thesurface 212 being a non-working surface of thegrinding tool 2. Theabrasive particles 22 can be distributed across and protrude outward from thesurface 211 of thesubstrate 21. - The
abrasive particles 22 can be made of any suitable materials having high hardness. Examples of suitable materials for theabrasive particles 22 may include, without limitation, diamond, cubic boron nitride, aluminum oxide, and silicon carbide. Theabrasive particles 22 are not limited in shape, and may exemplary have a hexoctahedron crystalline form. Moreover, theabrasive particles 22 may have any suitable size in accordance with the requisite functions of thegrinding tool 2. According to an embodiment, the size of theabrasive particles 22 can exemplary be about 20 to about 30 US mesh, i.e., a mesh screen used to filter theabrasive particles 22 can have about 20 to about 30 openings per square inch, and an average greatest width of theabrasive particles 22 is between about 800 μm and about 1000 μm. According to an embodiment, there may be about 60 to about 300abrasive particles 22 provided on thesubstrate 21. - Referring to
FIG. 4 , thesubstrate 21 can include a plurality ofholes 213. Theabrasive particles 22 can be respectively disposed in theholes 213, and can be respectively attached to thesubstrate 21 via a plurality ofadhesive portions 216. Eachabrasive particle 22 thereby attached can have atip 221 protruding from thesurface 211 of thesubstrate 21, and a remaining part entirely covered with theadhesive portion 216 inside thehole 213 of thesubstrate 21. In other words, theabrasive particles 22 protrude outward from thesurface 211 of thesubstrate 21, but do not protrude from thesurface 212 of thesubstrate 21. - Each
hole 213 can extend through thesubstrate 21, and can respectively form two 212A and 211A on the twoopenings 212 and 211. According to an example of construction, theopposite surfaces 212A and 211A can have circular shapes, and theopenings openings 212A can be larger than theopenings 211A. Moreover, theabrasive particles 22 are generally larger than theopenings 211A. For example, each opening 211A can have a diameter generally smaller than eachabrasive particle 22, e.g., smaller than an average size or average greatest width of theabrasive particles 22. According to an embodiment, the opening 212A can have a diameter between 1 mm and 2 mm, such as 1 mm, and the opening 211A can have a diameter between 0.4 mm and 0.75 mm, such as 750 μm. According to an embodiment, a size ratio (e.g., diameter ratio) between the opening 211A and the opening 212A can be between about 0.2 and about 0.75, e.g., from 0.4 to 0.375. With this differential size configuration, thesmaller opening 211A can block passage of theabrasive particle 22 and thereby retain theabrasive particle 22 in thehole 213. As a result, theabrasive particle 22 can be prevented from falling out of the grindingtool 2 during use. Once theabrasive particle 22 is positioned in thehole 213, theabrasive particle 22 can partially protrude outward from theopening 211A on thesurface 211 of thesubstrate 21. - According to an embodiment, each
hole 213 can include two 215 and 214 connected with each other that have different sizes and shapes. Thehole sections hole section 215 can exemplary have a cylindrical shape, and theother hole section 214 can be exemplary shaped as a truncated cone. Thehole section 215 can open on thesurface 212 through theopening 212A, and can have an inner sidewall that can be substantially perpendicular to thesurface 212. Thehole section 214 can open on thesurface 211 through theopening 211A, and can have a tapered shape that narrows toward thesurface 211. For example, a material angle between an inner sidewall of thehole section 214 and thesurface 211 can be between about 70 and about 89 degrees. Because the diameter of thehole section 215 is generally greater than any diameter of the taperedhole section 214, an adhesive material flowed from thehole section 215 toward thehole section 214 to form theadhesive portion 216 can fully fill thehole 213, which can reduce the occurrence of air voids inside theadhesive portion 216. The portion of theabrasive particle 22 received inside thehole 213 is in contact with theadhesive portion 216, which can substantially attach theabrasive particle 22 to thesubstrate 21. Examples of suitable materials for theadhesive portions 216 can include epoxy, phenolic resins, polyester resins, polyamide resins, polyimide resins, polycarbonate resins, and any combinations thereof. -
FIG. 5 is a cross-sectional view illustrating a variant construction of a grinding tool 3. Referring toFIG. 5 , the grinding tool 3 can include thesubstrate 21, theabrasive particles 22 attached to thesubstrate 21, and abase substrate 31. Thebase substrate 31 can be provided to further increase the rigidity of the grinding tool 3. Thesubstrate 21 may have the same structure described previously, and theabrasive particles 22 may be attached to thesubstrate 21 in a similar way. More specifically, thesame holes 213 described previously may be provided in thesubstrate 21 and extend through the two 211 and 212 of theopposite surfaces substrate 21. Theabrasive particles 22 can be respectively disposed in theholes 213, and can be respectively attached to thesubstrate 21 via theadhesive portions 216. Eachabrasive particle 22 thereby attached can have atip 221 protruding from thesurface 211 of thesubstrate 21, and a remaining part entirely covered with theadhesive portion 216 inside thehole 213 of thesubstrate 21. Thebase substrate 31 can have acavity 311 provide on a major surface thereof, and thesubstrate 21 can be placed in thecavity 311 and attached to thebase substrate 31 with theabrasive particles 22 protruding outward. According to an embodiment, a plurality ofcavities 311 can be provided on the major surface of thebase substrate 31, andmultiple substrates 21 with theabrasive particles 22 thereon can be respectively disposed in thecavities 311. -
FIG. 6 is a cross-sectional view illustrating another variant construction of a grinding tool 4. Referring toFIG. 6 , the grinding tool 4 can include asubstrate 41, and a plurality ofabrasive particles 22 respectively attached to thesubstrate 41. - The
substrate 41 can may be integrally formed as a single rigid body. In particular, thesubstrate 41 may be made of a stiff and chemically stable material, which can exemplary include stainless steel, ceramics, and the like. According to an embodiment, thesubstrate 41 is made of stainless steel so that the grinding tool 4 is less subjected to chemical alteration when it is used in contact with an acid or alkaline slurry. There is no particular limitation imposed on the size of thesubstrate 41. According to an embodiment, thesubstrate 41 may be a generally circular disk having a diameter of about 4 inches. Moreover, thesubstrate 41 may have a thickness greater than the thickness of thesubstrate 21 described previously so as to increase the rigidity of the grinding tool 4. For example, the thickness of thesubstrate 41 can be between 5 mm and 6.35 mm. - The
substrate 41 may include a plurality ofholes 413 extending through two 411 and 412 of theopposite surfaces substrate 41. Theabrasive particles 22 can be respectively disposed in theholes 413, and can be respectively attached to thesubstrate 41 viaadhesive portions 416. Eachabrasive particle 22 thereby attached can have a tip 421 protruding from thesurface 411 of thesubstrate 41, and a remaining part entirely covered with theadhesive portion 416 inside thehole 413 of thesubstrate 41. In other words, theabrasive particles 22 partially protrude outward from thesurface 411 of thesubstrate 41, but do not protrude from thesurface 412 of thesubstrate 41. - Referring to
FIG. 6 , eachhole 413 extending through thesubstrate 41 can respectively have two 412A and 411A on the twoopenings 412 and 411. According to an example of construction, theopposite surfaces 412A and 411A can have circular shapes, and theopenings openings 412A can be larger than theopenings 411A. Moreover, theabrasive particles 22 are generally larger than theopenings 411A. For example, eachopening 411A can have a diameter generally smaller than eachabrasive particle 22, e.g., smaller than an average size or average greatest width of theabrasive particles 22. According to an embodiment, theopening 412A can have a diameter between 1 mm and 2 mm, such as 2 mm, and theopening 411A can have a diameter between 0.4 mm and 0.75 mm, such as 750 μm. With this differential size configuration, thesmaller opening 411A can block passage of theabrasive particle 22 and thereby retain theabrasive particle 22 in thehole 413. As a result, theabrasive particle 22 can be prevented from falling out of the grinding tool 4 during use. Once theabrasive particle 22 is positioned in thehole 413, theabrasive particle 22 can partially protrude outward from theopening 411A on thesurface 411 of thesubstrate 41. - In the embodiment illustrated in
FIG. 6 , eachhole 413 can include three 415, 417 and 414 connected with one another, thehole sections hole section 417 being located between and connected with the two 415 and 414. Thehole sections hole section 415 can open on thesurface 412 through theopening 412A, and thehole section 414 can open on thesurface 411 through theopening 411A. Thehole section 415 can exemplary have a cylindrical shape with an inner sidewall substantially perpendicular to thesurface 412. Thehole section 417 can have a cylindrical shape with a diameter generally uniform along its axis, which can be exemplary about 1 mm. Thehole section 414 can exemplary have a tapered shape (e.g., a truncated cone) that narrows toward thesurface 411. For example, a material angle between an inner sidewall of thehole section 414 and thesurface 411 can be between about 70 and about 89 degrees. Because the diameter of thehole section 415 is generally greater than the diameter of thehole section 417, and thehole section 417 is generally larger than thehole section 414, an adhesive material flowed from thehole section 415 through thehole section 417 toward thehole section 414 can fully fill thehole 413, which can reduce the occurrence of air voids inside theadhesive portion 416. The portion of theabrasive particle 22 received inside thehole 413 is in contact with theadhesive portion 416, which can substantially attach theabrasive particle 22 to thesubstrate 41. -
FIG. 7 is a flowchart of exemplary method steps for fabricating thegrinding tools 2, 3 or 4 described previously.FIGS. 8-11 are schematic views illustrating various intermediate stages in the fabrication of a grinding tool according to the method steps depicted inFIG. 7 . Referring toFIGS. 7 and 8 , thesubstrate 21 including theholes 213 can be provided in initial step S110 for fabricating the grindingtool 2 or 3. Eachhole 213 is respectively opened on the two 212 and 211 of theopposite surfaces substrate 21 via the two 212A and 211A, theopenings opening 212A being larger than theopening 211A. - According to an embodiment, the
holes 213 and the 212A and 211A may be formed by drilling into theopenings substrate 21 with a machining tool. For example, step S110 can include drilling thelarger hole section 215 and theopening 212A through thesurface 212 of thesubstrate 21, and then drilling thesmaller hole section 214 and theopening 211A through thesurface 211 of thesubstrate 21. It will be appreciated that other techniques may be used for fabricating thesubstrate 21 with theholes 213 therein. For example, another embodiment may directly form thesubstrate 21 with theholes 213 by powder metallurgy, which can include pressing and sintering a metallic powder to form thesubstrate 21 with theholes 213 therein. - Referring to
FIGS. 7 and 9 , theabrasive particles 22 in step S120 can be respectively introduced through theopenings 212A and placed in theholes 213 of thesubstrate 21. Because theopenings 211A are smaller than theabrasive particles 22, theabrasive particles 22 can be respectively retained in thehole sections 214 of theholes 213. - Referring to
FIGS. 7 and 10 , in next step S130, thesubstrate 21 with theabrasive particles 22 thereon can be placed on a fixedsupport 5 with thesurface 211 of thesubstrate 21 in contact with the fixedsupport 5. The fixedsupport 5 can include a plurality ofpositioning cavities 51 having an accurately controlled depth, and thesubstrate 21 can be placed on the fixedsupport 5 with the abrasive particles 22 (in particular thetips 221 thereof) protruding from theopenings 211A respectively received at least partially in thepositioning cavities 51 and in contact with the bottoms of thepositioning cavities 51. As a result, the positions of theabrasive particles 22 in theholes 213 can be adjusted so that thetips 221 of theabrasive particles 22 can protrude from thesurface 211 of thesubstrate 21 with a desirable height. In particular, thetips 221 of theabrasive particles 22 can be thereby level and protrude from thesurface 211 of thesubstrate 21 with a substantially equal height, the remaining parts of theabrasive particles 22 being located inside theholes 213. For example, the depth of thepositioning cavities 51 can be between about 0.01 mm and about 0.3 mm, and thetips 221 of theabrasive particles 22 can protrude outward from thesurface 211 of thesubstrate 21 with a height equal to about 100 μm. A grinding tool having a level placement of theabrasive particles 22 may be advantageously used as a conditioner for uniformly grinding an object surface. - Referring to
FIGS. 7 and 11 , while thesubstrate 21 is kept in position on the fixedsupport 5, theadhesive portions 216 in step S140 can be respectively applied through theopenings 212A into theholes 213 with an adhesive dispenser 6 for fixedly attaching theabrasive particles 22 to thesubstrate 21. The quantity of the adhesive material introduced through theopenings 212A can be controlled so that theadhesive portions 216 can fully fill theholes 213 and cover the parts of theabrasive particles 22 inside theholes 213. Examples of suitable materials for theadhesive portions 216 can include epoxy, phenolic resins, polyester resins, polyamide resins, polyimide resins, polycarbonate resins, and any combinations thereof. - It will be appreciated that steps S110, S120, S130 and S140 described herein may be likewise applied for fabricating the grinding tool 4 based on the
substrate 41 provided with theholes 413. In this case, thesubstrate 41 with theholes 413 therein can be provided in initial step S110. For example, step S110 can include drilling thehole section 415 in thesubstrate 41, then drilling thehole section 417 connected with thehole section 415, and eventually drilling thehole section 414 communicating with the 415 and 417. Thehole sections 415 and 414 thereby formed can respectively have thehole sections 412A and 411A on the twoopenings 412 and 411 of theopposite surfaces substrate 41. Subsequently, theabrasive particles 22 in step S120 can be respectively introduced through theopenings 412A and placed in theholes 413 of thesubstrate 41. Step S130 then can be performed to properly position theabrasive particles 22 in theholes 413. Eventually, theadhesive portions 416 in step S140 can be respectively applied through theopenings 412A into theholes 413 for fixedly attaching theabrasive particles 22 to thesubstrate 41. - According to an embodiment, the method steps may further include attaching the
substrate 21 with theabrasive particles 22 affixed thereto to thebase substrate 31 for forming the grinding tool 3 shown inFIG. 5 . Thebase substrate 31 may include acavity 311, and thesubstrate 21 can be positioned and attached in thecavity 311. - Advantages of the structures and method described herein include the ability to fabricate a grinding tool in a cost-effective manner. The grinding tool can include abrasive particles that are affixed to a substrate with adhesive portions substantially free of air voids, which can ensure reliable attachment of the abrasive particles.
- Realizations of the grinding tool and its fabrication process have been described in the context of particular embodiments. These embodiments are meant to be illustrative and not limiting. Many variations, modifications, additions, and improvements are possible. These and other variations, modifications, additions, and improvements may fall within the scope of the inventions as defined in the claims that follow.
Claims (20)
1. A grinding tool comprising:
a substrate having a first and a second surface and a plurality of holes, each of the holes extending through the substrate and respectively having a first and a second opening on the first and second surface, the second opening being larger than the first opening; and
a plurality of abrasive particles respectively disposed in the holes and attached to the substrate via a plurality of adhesive portions, each of the abrasive particles having a tip protruding outward from the first surface and a remaining part covered with one of the adhesive portions inside the corresponding hole;
wherein the first openings of the holes are smaller than the abrasive particles, and the abrasive particles are respectively retained in the holes.
2. The grinding tool according to claim 1 , wherein each of the holes includes at least a first and a second hole section connected with each other, the first hole section being opened on the first surface through the first opening, and the second hole section being opened on the second surface through the second opening.
3. The grinding tool according to claim 2 , wherein each of the holes further includes a third hole section between the first and second hole sections, the third hole section being respectively connected with the first and second hole sections.
4. The grinding tool according to claim 2 , wherein the first hole section has a tapered shape that narrows toward the first surface.
5. The grinding tool according to claim 4 , wherein a material angle between an inner sidewall of the first hole section and the first surface is between about 70 and about 89 degrees.
6. The grinding tool according to claim 2 , wherein the second hole section has an inner sidewall substantially perpendicular to the second surface.
7. The grinding tool according to claim 1 , wherein the first opening has a diameter between 0.4 mm and 0.75 mm, and the second opening has a diameter between 1 mm and 2 mm.
8. The grinding tool according to claim 1 , wherein the substrate is a single rigid body.
9. The grinding tool according to claim 1 , wherein the substrate is made of a metallic material or ceramics.
10. The grinding tool according to claim 1 , wherein the abrasive particles are made of diamond, cubic boron nitride, aluminum oxide or silicon carbide.
11. The grinding tool according to claim 1 , wherein the abrasive particles have a hexoctahedron crystalline form, and an average greatest width of the abrasive particles is between about 800 μm and about 1000 μm.
12. The grinding tool according to claim 1 , further including a base substrate having a surface provided with a cavity, the substrate being disposed in the cavity and attached to the base substrate.
13. The grinding tool according to claim 1 , wherein the adhesive portions include epoxy, phenolic resins, polyester resins, polyamide resins, polyimide resins, polycarbonate resins, and any combinations thereof.
14. A method of fabricating a grinding tool, comprising:
providing a substrate having a first and a second surface and a plurality of holes, each of the holes extending through the substrate and respectively having a first and a second opening on the first and second surface, the second opening being larger than the first opening;
respectively placing a plurality of abrasive particles in the holes through the second openings thereof, wherein the abrasive particles are generally larger than the first openings and partially protrude outward from the first openings;
placing the substrate on a fixed support having a plurality of positioning cavities, the abrasive particles protruding from the first openings being respectively received partially in the positioning cavities; and
respectively applying a plurality of adhesive portions through the second openings into the holes, thereby the adhesive portions respectively cover the abrasive particles inside the holes and fixedly attach the abrasive particles to the substrate.
15. The method according to claim 14 , further including attaching the substrate with the abrasive particles thereon to a base substrate having a surface provided with a cavity, the substrate being disposed in the cavity of the base substrate.
16. The method according to claim 14 , wherein the positioning cavities of the fixed support have an accurately controlled depth, and the step of placing the substrate on the fixed support adjusts the positions of the abrasive particles in the holes so that the abrasive particles protrude from the first surface of the substrate with a desirable height.
17. The method according to claim 14 , wherein the step of providing a substrate having a first and a second surface and a plurality of holes includes drilling the holes into the substrate, each of the holes including a first and a second hole section connected with each other, the first hole section having a tapered shape and being opened on the first surface through the first opening, and the second hole section having a cylindrical shape and being opened on the second surface through the second opening.
18. The method according to claim 14 , wherein the step of providing a substrate having a first and a second surface and a plurality of holes includes drilling the holes into the substrate, each of the holes including a first, a second and a third hole sections connected with one another, the first hole section having a tapered shape and being opened on the first surface through the first opening, the second hole section being opened on the second surface through the second opening, and the third hole section being located between the first and second hole sections.
19. The method according to claim 14 , wherein the substrate is a single rigid body.
20. The method according to claim 14 , wherein the substrate is made of a metallic material or ceramics.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TW106119428A TWI636854B (en) | 2017-06-12 | 2017-06-12 | Grinding tool and method of fabricating the same |
| TW106119428 | 2017-06-12 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| US20180354095A1 true US20180354095A1 (en) | 2018-12-13 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| US16/003,264 Abandoned US20180354095A1 (en) | 2017-06-12 | 2018-06-08 | Grinding Tool and Method of Fabricating the Same |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US20180354095A1 (en) |
| JP (1) | JP2019000978A (en) |
| CN (1) | CN109015339B (en) |
| TW (1) | TWI636854B (en) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109822452B (en) * | 2019-03-29 | 2020-04-03 | 深圳市宏通新材料有限公司 | Porous metal-based diamond grinding and polishing plate |
| CN110465898A (en) * | 2019-07-24 | 2019-11-19 | 广州市三研磨材有限公司 | The manufacturing method of piece is thinned in a kind of diamond |
| CN111687224A (en) * | 2020-06-24 | 2020-09-22 | 瓯锟科技温州有限公司 | Transmission mechanism of large-roll-diameter multi-roll compound rolling mill |
| TWI780883B (en) * | 2021-08-31 | 2022-10-11 | 中國砂輪企業股份有限公司 | Chemical mechanical polishing pad conditioner and manufacture method thereof |
Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6769975B2 (en) * | 2001-03-02 | 2004-08-03 | Asahi Diamond Industrial Co., Ltd. | Super abrasive tool and process for producing the same |
| US7467989B2 (en) * | 2005-08-24 | 2008-12-23 | Kinik Company | Ceramic polishing pad dresser and method for fabricating the same |
| WO2009091140A2 (en) * | 2008-01-15 | 2009-07-23 | Ehwa Diamond Industrial Co., Ltd. | Conditioner for chemical mechanical planarization pad |
| KR20130004776A (en) * | 2011-07-04 | 2013-01-14 | 주식회사 계산이엔씨 | Offensive odor tereatment apparatus using low pressure aqueous ozone solution |
| US20130244552A1 (en) * | 2012-03-14 | 2013-09-19 | Taiwan Semiconductor Manufacturing Company, Ltd. | Manufacture and method of making the same |
| US20150231759A1 (en) * | 2014-02-18 | 2015-08-20 | Kinik Company | Chemical mechanical polishing conditioner with high performance |
| US20160176017A1 (en) * | 2014-12-17 | 2016-06-23 | Kinik Company | Grinding Tool and Method of Manufacturing the Same |
Family Cites Families (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6669745B2 (en) * | 2001-02-21 | 2003-12-30 | 3M Innovative Properties Company | Abrasive article with optimally oriented abrasive particles and method of making the same |
| JP2003168814A (en) * | 2001-09-18 | 2003-06-13 | Dainippon Printing Co Ltd | Back protection sheet for solar cell module and solar cell module using the same |
| JP4463084B2 (en) * | 2003-11-27 | 2010-05-12 | 株式会社オクテック | Dressing tools |
| JP2005219152A (en) * | 2004-02-04 | 2005-08-18 | Ebara Corp | Dresser and method of manufacturing the same |
| JP4854445B2 (en) * | 2006-09-25 | 2012-01-18 | 三菱マテリアル株式会社 | CMP conditioner and method of manufacturing the same |
| JP2008114334A (en) * | 2006-11-06 | 2008-05-22 | Mezoteku Dia Kk | Cmp conditioner and manufacturing method therefor |
| JP2010149221A (en) * | 2008-12-25 | 2010-07-08 | Kyocera Corp | Tool and method for dressing |
| CN101927457A (en) * | 2009-06-26 | 2010-12-29 | 宋健民 | Combined trimmer |
| CN201516579U (en) * | 2009-07-29 | 2010-06-30 | 钻面奈米科技股份有限公司 | Precision grinding tools |
| JP5809880B2 (en) * | 2011-08-25 | 2015-11-11 | 新日鉄住金マテリアルズ株式会社 | Polishing cloth dresser |
| JP5972032B2 (en) * | 2012-05-01 | 2016-08-17 | 新技術開発株式会社 | Polishing tool for high-efficiency precision machining and its manufacturing method |
| CN203390712U (en) * | 2013-04-08 | 2014-01-15 | 宋健民 | Chemical mechanical polishing dresser |
| TWI542444B (en) * | 2014-09-11 | 2016-07-21 | China Grinding Wheel Corp | A polishing pad dresser with a brush holder |
-
2017
- 2017-06-12 TW TW106119428A patent/TWI636854B/en active
-
2018
- 2018-06-06 CN CN201810587256.5A patent/CN109015339B/en active Active
- 2018-06-08 US US16/003,264 patent/US20180354095A1/en not_active Abandoned
- 2018-06-11 JP JP2018111017A patent/JP2019000978A/en active Pending
Patent Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6769975B2 (en) * | 2001-03-02 | 2004-08-03 | Asahi Diamond Industrial Co., Ltd. | Super abrasive tool and process for producing the same |
| US7467989B2 (en) * | 2005-08-24 | 2008-12-23 | Kinik Company | Ceramic polishing pad dresser and method for fabricating the same |
| WO2009091140A2 (en) * | 2008-01-15 | 2009-07-23 | Ehwa Diamond Industrial Co., Ltd. | Conditioner for chemical mechanical planarization pad |
| KR20130004776A (en) * | 2011-07-04 | 2013-01-14 | 주식회사 계산이엔씨 | Offensive odor tereatment apparatus using low pressure aqueous ozone solution |
| US20130244552A1 (en) * | 2012-03-14 | 2013-09-19 | Taiwan Semiconductor Manufacturing Company, Ltd. | Manufacture and method of making the same |
| US20150231759A1 (en) * | 2014-02-18 | 2015-08-20 | Kinik Company | Chemical mechanical polishing conditioner with high performance |
| US20160176017A1 (en) * | 2014-12-17 | 2016-06-23 | Kinik Company | Grinding Tool and Method of Manufacturing the Same |
Also Published As
| Publication number | Publication date |
|---|---|
| TWI636854B (en) | 2018-10-01 |
| CN109015339B (en) | 2020-09-18 |
| CN109015339A (en) | 2018-12-18 |
| JP2019000978A (en) | 2019-01-10 |
| TW201902624A (en) | 2019-01-16 |
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