US20140042621A1 - Package on Package Devices and Methods of Forming Same - Google Patents
Package on Package Devices and Methods of Forming Same Download PDFInfo
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- US20140042621A1 US20140042621A1 US13/570,065 US201213570065A US2014042621A1 US 20140042621 A1 US20140042621 A1 US 20140042621A1 US 201213570065 A US201213570065 A US 201213570065A US 2014042621 A1 US2014042621 A1 US 2014042621A1
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- substrate
- wire
- package
- conductive
- top plate
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- H10W72/90—
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- H10W70/093—
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- H10W90/00—
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- H10W90/701—
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/44—Structure, shape, material or disposition of the wire connectors prior to the connecting process
- H01L2224/45—Structure, shape, material or disposition of the wire connectors prior to the connecting process of an individual wire connector
- H01L2224/45001—Core members of the connector
- H01L2224/45099—Material
- H01L2224/451—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof
- H01L2224/45138—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof the principal constituent melting at a temperature of greater than or equal to 950°C and less than 1550°C
- H01L2224/45147—Copper (Cu) as principal constituent
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/44—Structure, shape, material or disposition of the wire connectors prior to the connecting process
- H01L2224/45—Structure, shape, material or disposition of the wire connectors prior to the connecting process of an individual wire connector
- H01L2224/45001—Core members of the connector
- H01L2224/45099—Material
- H01L2224/451—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof
- H01L2224/45163—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof the principal constituent melting at a temperature of greater than 1550°C
- H01L2224/45164—Palladium (Pd) as principal constituent
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/44—Structure, shape, material or disposition of the wire connectors prior to the connecting process
- H01L2224/45—Structure, shape, material or disposition of the wire connectors prior to the connecting process of an individual wire connector
- H01L2224/45001—Core members of the connector
- H01L2224/45099—Material
- H01L2224/451—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof
- H01L2224/45163—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof the principal constituent melting at a temperature of greater than 1550°C
- H01L2224/45169—Platinum (Pt) as principal constituent
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- H10W70/60—
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- H10W72/01551—
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- H10W72/0198—
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- H10W72/07141—
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- H10W90/722—
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- H10W90/724—
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- H10W90/732—
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- H10W90/734—
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Definitions
- Semiconductor devices are used in a variety of electronic applications, such as personal computers, cell phones, digital cameras, and other electronic equipment, as examples. Semiconductor devices are typically fabricated by sequentially depositing insulating or dielectric layers, conductive layers, and semiconductive layers of material over a semiconductor substrate, and patterning the various material layers using lithography to form circuit components and elements thereon.
- the semiconductor industry continues to improve the integration density of various electronic components (e.g., transistors, diodes, resistors, capacitors, etc.) by continual reductions in minimum feature size, which allow more components to be integrated into a given area. These smaller electronic components may also require smaller packages that utilize less area than packages of the past.
- various electronic components e.g., transistors, diodes, resistors, capacitors, etc.
- PoP Package on package
- PoP technology is becoming increasingly popular for its ability to allow for denser integration of integrated circuits into a small overall package. PoP technology is employed in many advanced handheld devices, such as smart phones. While PoP technology has allowed for a lower package profile, the total thickness reduction is currently limited by the solder ball joint height between the top package and bottom package.
- FIG. 1 illustrates a perspective view of a substrate according to an embodiment
- FIG. 2 illustrates a top-down view of a substrate according to an embodiment
- FIG. 3 illustrates a perspective view of a top plate, a substrate, and a bottom plate according to an embodiment
- FIGS. 4A through 4D illustrate cross-sectional views of a method of forming wire sticks according to an embodiment
- FIGS. 5A through 9 illustrate cross-sectional views of a method of forming a semiconductor device 1 according to an embodiment.
- FIGS. 1 through 9 Various steps in the formation of a semiconductor device 1 will be described with reference to FIGS. 1 through 9 .
- the shape and thickness may be exaggerated for clarity and convenience. This description will be directed in particular to elements forming part of, or cooperating more directly with, methods and apparatus in accordance with the present disclosure. It is to be understood that elements not specifically shown or described may take various forms well known to those skilled in the art. Many alternatives and modifications will be apparent to those skilled in the art, once informed by the present disclosure.
- Embodiments will be described with respect to a specific context, namely packaging for a semiconductor device utilizing wire sticks. Other embodiments may also be applied, however, to other semiconductor devices where assembly yield and bump height control is important.
- FIGS. 1 through 9 illustrate a process to form a semiconductor device 1 according to an embodiment. Although this embodiment is discussed with steps performed in a particular order, steps may be performed in any logical order.
- the first substrate 10 may be a silicon substrate, a silicon or glass interposer, a printed circuit board (PCB), an organic laminate substrate, or the like.
- the first substrate 10 may include electronic components and elements formed thereon in some embodiments, or alternatively, the first substrate 10 may be free of electronic components and elements.
- the first substrate 10 may include metallization layers (see FIGS. 7 through 9 ). As illustrated in FIG. 9 , the metallization layers may comprise through substrate vias (TSVs) to connect the top package 90 and the bottom package 92 to form functional circuitry.
- TSVs substrate vias
- the metallization layers may be formed of alternating layers of dielectric (e.g., low-k dielectric material) and conductive material (e.g., copper) and may be formed through any suitable process (such as deposition, damascene, dual damascene, etc.).
- the metallization and dielectric layers may include metal lines and vias to electrically couple the top package 90 and the bottom package 92 (see FIG. 9 ). Only a portion of the first substrate 10 is illustrated in the figures, as this is sufficient to fully describe the illustrative embodiments.
- FIG. 2 illustrates a top-down view of a bond area 12 on the top surface of the first substrate 10 .
- Each bond area 12 may comprise a plurality of bond pads 22 .
- the bond pads 22 for a bond area 12 are arranged in a grid of nine sections, wherein each section comprises a plurality of rows and columns of bond pads 22 .
- the bond pads 22 may be arranged in a peripheral region of the first substrate 10 or in a central region of the first substrate 10 .
- the bond pads 22 may fully populate the top surface or may be arranged in various patterns, such as, for example, patterns used in ball grid array (BGA) or land grid array (LGA) package devices.
- BGA ball grid array
- LGA land grid array
- the bond pads 22 may comprise a conductive material such as aluminum, copper, gold, nickel, the like, or a combination thereof.
- an organic solderability preservative (OSP) may be applied to the bond pads 22 .
- the bond pads 22 may be copper. However, as copper oxidizes relatively rapidly when exposed to the temperatures of semiconductor processing, an OSP may be applied to the bond pads 22 to prevent such oxidation and permit long term storage of packages and maintain the solder adhesion capabilities of the bond pads 22 .
- the bond pads 22 may be formed using an electroless nickel-electroless palladium-immersion gold technique (ENEPIG).
- ENEPIG electroless nickel-electroless palladium-immersion gold technique
- An adhesive 50 may be deposited on the bond pads 22 , directly, or on the OSP, when used.
- This adhesive may be any conductive material that is configured to affix a wire stick 52 (see FIGS. 5A and 5B ) to a bond pad 22 .
- an OSP may be deposited on a copper bond pad 22 , with the adhesive 50 comprising solder paste or solder being applied to the OSP.
- a conductive adhesive comprising electrically conductive particles in an adhesive resin such as a polymer or epoxy may be employed. While several embodiments for deposition of an adhesive have been described herein, one skilled in the art will recognize that any conductive material capable of securing a wire stick 52 to a bond pad 22 is within the scope of this disclosure.
- FIG. 3 illustrates the assembly of a bottom plate 30 , the first substrate 10 , and a top plate 32 to assist in the formation of the wire sticks 52 (see FIGS. 5A and 5B ).
- the bottom plate 30 may comprise pins 34 which align with holes 36 in the first substrate 10 and holes 38 in the top plate 32 .
- the pins and holes allow the bottom plate 30 , the first substrate 10 , and the top plate 32 to be aligned and stay aligned during the forming of the wire sticks 52 and transportation.
- the top plate 32 may comprise pad holes 39 which may be aligned with the bond pads 22 of the first substrate 10 .
- the pad holes 39 may provide support for the wire sticks 52 before they are affixed to the bond pads 22 as described below.
- the bottom plate 30 may be used to support the first substrate 10 and the top plate 32 during wire stick 52 formation and during transportation.
- the bottom plate 30 may comprise openings to allow heating of the first substrate 10 (see FIG. 3 ).
- the top plate 32 and the bottom plate 30 may comprise stainless steel, plastic steel, the like, a same material as the first substrate 10 , or a combination thereof.
- the top plate 32 may have a thickness between about 0.05 mm and about 0.1 mm and the bottom plate 30 may have a thickness of about 2 mm.
- FIGS. 4A through 4D illustrate an example of a method of forming the wire sticks 52 shown, for example, in FIG. 5A , FIG. 5B , and FIG. 6 .
- the wire dispenser 40 may include a capillary 42 for dispensing wire 44 , an electric flame off (EFO) wand (not shown), and a transducer (not shown).
- the wire 44 may comprise copper, aluminum, gold, platinum, palladium, the like, or a combination thereof. In an embodiment, the wire 44 may have a diameter between about 1 mil and about 10 mil.
- a first end of the wire 44 protrudes from the tip of the capillary 42 .
- the EFO wand is used to create an electrical spark 45 proximate the first end of the wire 44 , which may form a ball 47 at the first end of the wire 44 , as shown in FIG. 4B .
- the ball 47 is formed using a free air ball (FAB) technique.
- the capillary 42 then moves the ball 47 through the pad hole 39 of the top plate 32 and into the adhesive 50 on the bond pad 22 , as shown in FIG. 4C .
- the capillary 42 may fit in the pad hole 39 of the top plate 32 (see FIG. 4C ), and thus the width of the pad hole 39 may be dependent on the size of the capillary 42 (discussed below).
- the capillary 42 may move up the wire 44 while blades 46 may cut the wire 44 to form wire sticks 52 .
- the wire sticks 52 may be cut to a length between about 50 um and about 150 um.
- FIGS. 5A and 5B illustrate cross-sectional views of the bottom plate 30 , the first substrate 10 , and the top plate 32 according to embodiments.
- the pad holes 39 in the top plate 32 may hold the wire sticks 52 such that they may be bonded to be substantially orthogonal to the top surface of the first substrate 10 .
- the sidewalls of the pad holes 39 in the top plate 32 are substantially linear and form a tapered profile from a top surface of the top plate 32 to a bottom surface of the top plate 32 .
- the sidewalls of the pad holes 39 are neither parallel nor perpendicular to the top surface of the first substrate 10 .
- the bottom of the sidewalls of the pad holes 39 are adjacent the adhesive 50 on the bond pads 22 .
- the sidewalls of the pad holes 39 comprise a top section and a bottom section with the top section being tapered and the bottom section being substantially perpendicular to a top surface of the substrate.
- the pad holes 39 have a width 53 at the top surface of the top plate 32 and a width 54 at the bottom surface of the top plate 32 . These widths may be based on the diameter of the wire 44 and also on the size of the capillary 42 (see FIG. 4C ). For example, in an embodiment where the wire 44 has a 1 mil diameter, the pad holes 39 may have a width 53 of about 0.12 mm at the top surface of the top plate 32 and may have a width 54 of about 0.11 mm at the bottom surface of the top plate 32 .
- the wire sticks 52 may be placed manually, automatically, singly, or as a group. Although two embodiments for the pad holes 39 of the top plate 32 have been described, other embodiments contemplate any structure to support the wire sticks 52 prior to affixing them to the bond pads 22 is within the scope of this disclosure.
- wire sticks 52 are then bonded to the first substrate 10 .
- the procedure for bonding the wire sticks 52 to the first substrate 10 depends on the type of adhesive 50 used.
- the bonding procedure may comprise activating the adhesive 50 , or letting the adhesive 50 cure.
- the bonding method may comprise reflowing and cooling the solder material to secure the wire stick 52 to the bond pad 22 .
- the bonding process may affix the wire sticks 52 such that they may be orthogonal to the top surface of the first substrate 10 .
- the top plate 32 may be removed as illustrated in FIG. 6 .
- the first substrate 10 may undergo further processing such as, for example, attaching a semiconductor die.
- one or more dies 70 may be provided and attached to the first substrate 10 to form one or more bottom packages 92 as illustrated in FIG. 7 .
- the first substrate 10 comprises two bottom packages 92 and TSVs 72 to couple the connector elements 74 to the dies 70 and the wire sticks 52 .
- the bottom package 92 may comprise one or more dies 70 disposed on the top and/or bottom surface of the bottom package 92 .
- the dies 70 may comprise an integrated circuit or chip and may be mounted to a top surface and/or bottom surface of the first substrate 10 by way of connector elements 78 or 74 .
- the dies 70 may be mounted to the first substrate 10 using contact bumps that are in contact with mounting pads on the first substrate 10 , which in turn are electrically connected to other dies 102 a or 102 b (see FIG. 9 ) or the connector elements 74 .
- the dies 70 may be mounted to the first substrate 10 using a technique such as surface mounting, to connect the pins of the die 70 to an array of die mounting pads on the first substrate 10 .
- Connector elements 78 are shown disposed in an underfill 76 , which may provide stress relief and protection for the connector elements 78 .
- Underfill materials provide some stress relief and may include thermally conductive filler materials, to assist in handling mechanical stress from thermal expansion.
- Underfill 76 may comprise resins, epoxies, polymers, no flow underfill (NUF), capillary underfill, the like, or a combination thereof and may be injected between the dies 70 and the first substrate 10 .
- the two bottom packages 92 may then be singulated into two separate bottom packages 92 as illustrated in FIG. 8 .
- FIG. 9 illustrates a semiconductor device 1 according to an embodiment.
- the semiconductor device 1 may include a bottom package 92 , a top package 90 mounted to the bottom package 92 with solder joints 96 , and the bottom package 92 mounted to a third substrate 94 .
- the semiconductor device may have a total thickness between about 0.98 mm and about 1.35 mm.
- the third substrate 94 may have bond areas 95 on a top surface of the third substrate 94 .
- the third substrate 94 may be a silicon substrate, a silicon or glass interposer, a PCB, an organic laminate substrate, or the like.
- the third substrate 94 may include electronic components and elements formed thereon in some embodiments, or alternatively, the third substrate 94 may be free of electronic components and elements.
- the bottom package 92 may be coupled to the third substrate by the connector elements 74 and bond areas 95 .
- the top package 90 may comprise one or more stacked dies, such as the dies 102 a and 102 b , coupled to a second substrate 100 .
- the dies 102 a and 102 b are coupled to the second substrate 100 by wire bonds 104 , although other connections may be used, such as contact bumps.
- the dies 102 a and 102 b may be encapsulated in a molding compound 106 on a top surface of the second substrate 100 .
- the molding compound 106 may comprise a polymer, a molding underfill, the like, or a combination thereof.
- the molding compound 102 may be formed by injecting the molding compound 106 to surround the dies 102 a and 102 b and the wire bonds 104 .
- the top package 90 and the bottom package 92 may be encapsulated in a molding compound on a top surface of the third substrate 94 .
- the top package 90 may be coupled to the bottom package by a plurality of contact areas 98 on the bottom surface of the second substrate 100 , the solder joints 96 , the wire sticks 52 , and the bond pads 22 on the top surface of the first substrate 10 .
- the wire sticks 52 may provide separation, support, and electrical connectivity between the top package 90 and the bottom package 92 .
- the wire sticks 52 may have a length large enough to separate the top package 90 and the bottom package 92 far enough to provide adequate space for the die 70 .
- the top package 90 and the bottom package 92 may be separated by a height 108 of about 150 um, which corresponds to a wire stick 52 height of about 150 um. Greater separation of the top package 90 and the bottom package 92 may be achieved by taller wire sticks 52 , which may be necessary in embodiments with a thicker die 70 , multiple stacked dies 70 , or where dies 70 are mounted on both a bottom surface of the second substrate 100 and the top surface of the first substrate 10 .
- the top package 90 and the bottom package 92 may be separated by a height 108 of between about 50 um and about 350 um.
- a predetermined spacing between the top package 90 and the bottom package 92 may be achieved by using a corresponding wire stick 52 height.
- the solder joints 96 may be formed by forming solder balls on the contact areas 98 on the bottom surface of the second substrate 100 .
- the bottom package 92 may then be lowered until the plurality of wire sticks 52 are coupled to the plurality of solder balls on the top package 90 .
- the plurality of solder balls may then be reflowed so that the plurality of wire sticks 52 may be inserted in the plurality of solder balls so that a solder joint 96 is formed over each of the wire sticks 52 (see FIG. 9 ).
- the solder joints 96 may have a substantially barrel shape in the cross-sectional view.
- Each of the wire sticks 52 is disposed between the top package 90 and the bottom package 92 and each are embedded in a solder joint 96 .
- the wire sticks 52 may extend partially to the contact area 98 of the second substrate 100 .
- the wire sticks 52 may extend fully to the contact area 98 of the second substrate 100 .
- Embodiments may achieve advantages.
- the wire sticks 52 may allow for control of the solder joint 96 size and height, enabling a greater range of height of the solder joint 96 than that of a solder ball joint.
- the wire sticks 52 can be applied to substrates with an OSP layer which may be lower cost than other comparable substrates. Further, the overall height of the package may be reduced due to the low profile of the solder joint 96 .
- An embodiment is a package-on-package (PoP) device comprising a first package on a first substrate and a second package over the first package.
- a plurality of wire sticks disposed between the first package and the second package and the plurality of wire sticks couple the first package to the second package.
- Each of the plurality of wire sticks comprise a conductive wire of a first height affixed to a bond pad on the first substrate and each of the plurality of wire sticks is embedded in a solder joint.
- Another embodiment is a PoP device comprising a bottom package comprising a semiconductor die on a first substrate and a plurality of wire sticks disposed on a top surface of the first substrate, wherein each of the wire sticks are bonded to a bond pad on the first substrate.
- a top package comprising a plurality of vertically stacked dies on a second substrate and a plurality of contacts on a bottom surface of the second substrate, wherein each of the plurality of wire sticks is disposed in one of a plurality of solder joints. Each of the plurality of solder joints is coupled to one or more of the plurality of contacts.
- Yet another embodiment is a method of forming a PoP device comprising forming a plurality of bond pads on a first substrate, forming a plurality of wire sticks, and bonding the plurality of wire sticks to the first substrate. Each of the plurality of wire sticks is bonded to one of the bond pads on the first substrate.
- the method further comprises mounting a first die to the first substrate, mounting a second die to a second substrate, forming a plurality of solder balls on the second substrate, and coupling each of the plurality of wire sticks to one of the plurality of solder balls.
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Abstract
Description
- Semiconductor devices are used in a variety of electronic applications, such as personal computers, cell phones, digital cameras, and other electronic equipment, as examples. Semiconductor devices are typically fabricated by sequentially depositing insulating or dielectric layers, conductive layers, and semiconductive layers of material over a semiconductor substrate, and patterning the various material layers using lithography to form circuit components and elements thereon.
- The semiconductor industry continues to improve the integration density of various electronic components (e.g., transistors, diodes, resistors, capacitors, etc.) by continual reductions in minimum feature size, which allow more components to be integrated into a given area. These smaller electronic components may also require smaller packages that utilize less area than packages of the past.
- Package on package (PoP) technology is becoming increasingly popular for its ability to allow for denser integration of integrated circuits into a small overall package. PoP technology is employed in many advanced handheld devices, such as smart phones. While PoP technology has allowed for a lower package profile, the total thickness reduction is currently limited by the solder ball joint height between the top package and bottom package.
- For a more complete understanding of the present embodiments, and the advantages thereof, reference is now made to the following descriptions taken in conjunction with the accompanying drawings, in which:
-
FIG. 1 illustrates a perspective view of a substrate according to an embodiment; -
FIG. 2 illustrates a top-down view of a substrate according to an embodiment; -
FIG. 3 illustrates a perspective view of a top plate, a substrate, and a bottom plate according to an embodiment; -
FIGS. 4A through 4D illustrate cross-sectional views of a method of forming wire sticks according to an embodiment; and -
FIGS. 5A through 9 illustrate cross-sectional views of a method of forming a semiconductor device 1 according to an embodiment. - Various steps in the formation of a semiconductor device 1 will be described with reference to
FIGS. 1 through 9 . Reference will now be made in detail to embodiments illustrated in the accompanying drawings. Wherever possible, the same reference numbers are used in the drawings and the description to refer to the same or like parts. In the drawings, the shape and thickness may be exaggerated for clarity and convenience. This description will be directed in particular to elements forming part of, or cooperating more directly with, methods and apparatus in accordance with the present disclosure. It is to be understood that elements not specifically shown or described may take various forms well known to those skilled in the art. Many alternatives and modifications will be apparent to those skilled in the art, once informed by the present disclosure. - Reference throughout this specification to “one embodiment” or “an embodiment” means that a particular feature, structure, or characteristic described in connection with the embodiment is included in at least one embodiment. Thus, the appearances of the phrases “in one embodiment” or “in an embodiment” in various places throughout this specification are not necessarily all referring to the same embodiment. Furthermore, the particular features, structures, or characteristics may be combined in any suitable manner in one or more embodiments. It should be appreciated that the following figures are not drawn to scale; rather, these figures are merely intended for illustration.
- Embodiments will be described with respect to a specific context, namely packaging for a semiconductor device utilizing wire sticks. Other embodiments may also be applied, however, to other semiconductor devices where assembly yield and bump height control is important.
-
FIGS. 1 through 9 illustrate a process to form a semiconductor device 1 according to an embodiment. Although this embodiment is discussed with steps performed in a particular order, steps may be performed in any logical order. - With reference now to
FIG. 1 , there is shown afirst substrate 10 withbond areas 12 on a top surface of thefirst substrate 10. In an embodiment, thefirst substrate 10 may be a silicon substrate, a silicon or glass interposer, a printed circuit board (PCB), an organic laminate substrate, or the like. Thefirst substrate 10 may include electronic components and elements formed thereon in some embodiments, or alternatively, thefirst substrate 10 may be free of electronic components and elements. - The
first substrate 10 may include metallization layers (seeFIGS. 7 through 9 ). As illustrated inFIG. 9 , the metallization layers may comprise through substrate vias (TSVs) to connect thetop package 90 and thebottom package 92 to form functional circuitry. The metallization layers may be formed of alternating layers of dielectric (e.g., low-k dielectric material) and conductive material (e.g., copper) and may be formed through any suitable process (such as deposition, damascene, dual damascene, etc.). The metallization and dielectric layers may include metal lines and vias to electrically couple thetop package 90 and the bottom package 92 (seeFIG. 9 ). Only a portion of thefirst substrate 10 is illustrated in the figures, as this is sufficient to fully describe the illustrative embodiments. -
FIG. 2 illustrates a top-down view of abond area 12 on the top surface of thefirst substrate 10. Eachbond area 12 may comprise a plurality ofbond pads 22. InFIG. 2 , thebond pads 22 for abond area 12 are arranged in a grid of nine sections, wherein each section comprises a plurality of rows and columns ofbond pads 22. In other embodiments, thebond pads 22 may be arranged in a peripheral region of thefirst substrate 10 or in a central region of thefirst substrate 10. Thebond pads 22 may fully populate the top surface or may be arranged in various patterns, such as, for example, patterns used in ball grid array (BGA) or land grid array (LGA) package devices. - The
bond pads 22 may comprise a conductive material such as aluminum, copper, gold, nickel, the like, or a combination thereof. In some embodiments, an organic solderability preservative (OSP) may be applied to thebond pads 22. In an embodiment, thebond pads 22 may be copper. However, as copper oxidizes relatively rapidly when exposed to the temperatures of semiconductor processing, an OSP may be applied to thebond pads 22 to prevent such oxidation and permit long term storage of packages and maintain the solder adhesion capabilities of thebond pads 22. In other embodiments, thebond pads 22 may be formed using an electroless nickel-electroless palladium-immersion gold technique (ENEPIG). - An adhesive 50 (see
FIGS. 5A and 5B ) may be deposited on thebond pads 22, directly, or on the OSP, when used. This adhesive may be any conductive material that is configured to affix a wire stick 52 (seeFIGS. 5A and 5B ) to abond pad 22. In an embodiment, an OSP may be deposited on acopper bond pad 22, with the adhesive 50 comprising solder paste or solder being applied to the OSP. In other embodiments, a conductive adhesive, comprising electrically conductive particles in an adhesive resin such as a polymer or epoxy may be employed. While several embodiments for deposition of an adhesive have been described herein, one skilled in the art will recognize that any conductive material capable of securing awire stick 52 to abond pad 22 is within the scope of this disclosure. -
FIG. 3 illustrates the assembly of abottom plate 30, thefirst substrate 10, and atop plate 32 to assist in the formation of the wire sticks 52 (seeFIGS. 5A and 5B ). Thebottom plate 30 may comprisepins 34 which align withholes 36 in thefirst substrate 10 andholes 38 in thetop plate 32. The pins and holes allow thebottom plate 30, thefirst substrate 10, and thetop plate 32 to be aligned and stay aligned during the forming of thewire sticks 52 and transportation. - The
top plate 32 may comprisepad holes 39 which may be aligned with thebond pads 22 of thefirst substrate 10. Thepad holes 39 may provide support for thewire sticks 52 before they are affixed to thebond pads 22 as described below. Thebottom plate 30 may be used to support thefirst substrate 10 and thetop plate 32 duringwire stick 52 formation and during transportation. In an embodiment, thebottom plate 30 may comprise openings to allow heating of the first substrate 10 (seeFIG. 3 ). Thetop plate 32 and thebottom plate 30 may comprise stainless steel, plastic steel, the like, a same material as thefirst substrate 10, or a combination thereof. In an embodiment, thetop plate 32 may have a thickness between about 0.05 mm and about 0.1 mm and thebottom plate 30 may have a thickness of about 2 mm. -
FIGS. 4A through 4D illustrate an example of a method of forming the wire sticks 52 shown, for example, inFIG. 5A ,FIG. 5B , andFIG. 6 . InFIG. 4A , a portion of awire dispenser 40 that may be used to form the wire sticks 52 is illustrated. Thewire dispenser 40 may include a capillary 42 for dispensingwire 44, an electric flame off (EFO) wand (not shown), and a transducer (not shown). Thewire 44 may comprise copper, aluminum, gold, platinum, palladium, the like, or a combination thereof. In an embodiment, thewire 44 may have a diameter between about 1 mil and about 10 mil. - A first end of the
wire 44 protrudes from the tip of the capillary 42. The EFO wand is used to create anelectrical spark 45 proximate the first end of thewire 44, which may form aball 47 at the first end of thewire 44, as shown inFIG. 4B . Theball 47 is formed using a free air ball (FAB) technique. - The capillary 42 then moves the
ball 47 through thepad hole 39 of thetop plate 32 and into the adhesive 50 on thebond pad 22, as shown inFIG. 4C . The capillary 42 may fit in thepad hole 39 of the top plate 32 (seeFIG. 4C ), and thus the width of thepad hole 39 may be dependent on the size of the capillary 42 (discussed below). - As illustrated in
FIG. 4D , the capillary 42 may move up thewire 44 whileblades 46 may cut thewire 44 to form wire sticks 52. In an embodiment, the wire sticks 52 may be cut to a length between about 50 um and about 150 um. -
FIGS. 5A and 5B illustrate cross-sectional views of thebottom plate 30, thefirst substrate 10, and thetop plate 32 according to embodiments. The pad holes 39 in thetop plate 32 may hold the wire sticks 52 such that they may be bonded to be substantially orthogonal to the top surface of thefirst substrate 10. InFIG. 5A , the sidewalls of the pad holes 39 in thetop plate 32 are substantially linear and form a tapered profile from a top surface of thetop plate 32 to a bottom surface of thetop plate 32. In this embodiment, the sidewalls of the pad holes 39 are neither parallel nor perpendicular to the top surface of thefirst substrate 10. The bottom of the sidewalls of the pad holes 39 are adjacent the adhesive 50 on thebond pads 22. InFIG. 5B , the sidewalls of the pad holes 39 comprise a top section and a bottom section with the top section being tapered and the bottom section being substantially perpendicular to a top surface of the substrate. The pad holes 39 have awidth 53 at the top surface of thetop plate 32 and awidth 54 at the bottom surface of thetop plate 32. These widths may be based on the diameter of thewire 44 and also on the size of the capillary 42 (seeFIG. 4C ). For example, in an embodiment where thewire 44 has a 1 mil diameter, the pad holes 39 may have awidth 53 of about 0.12 mm at the top surface of thetop plate 32 and may have awidth 54 of about 0.11 mm at the bottom surface of thetop plate 32. The wire sticks 52 may be placed manually, automatically, singly, or as a group. Although two embodiments for the pad holes 39 of thetop plate 32 have been described, other embodiments contemplate any structure to support the wire sticks 52 prior to affixing them to thebond pads 22 is within the scope of this disclosure. - After the wire sticks 52 are inserted into the pad holes 39 and cut, wire sticks 52 are then bonded to the
first substrate 10. The procedure for bonding the wire sticks 52 to thefirst substrate 10 depends on the type ofadhesive 50 used. In embodiments in which a solvent-based or curing adhesive is used, the bonding procedure may comprise activating the adhesive 50, or letting the adhesive 50 cure. In embodiments with a solder-based adhesive, the bonding method may comprise reflowing and cooling the solder material to secure thewire stick 52 to thebond pad 22. The bonding process may affix the wire sticks 52 such that they may be orthogonal to the top surface of thefirst substrate 10. - After the wire sticks 52 are bonded to the
first substrate 10, thetop plate 32 may be removed as illustrated inFIG. 6 . After thetop plate 32 is removed, thefirst substrate 10 may undergo further processing such as, for example, attaching a semiconductor die. - After the
top plate 32 has been removed, one or more dies 70 may be provided and attached to thefirst substrate 10 to form one or morebottom packages 92 as illustrated inFIG. 7 . In this embodiment, thefirst substrate 10 comprises twobottom packages 92 andTSVs 72 to couple theconnector elements 74 to the dies 70 and the wire sticks 52. - The
bottom package 92 may comprise one or more dies 70 disposed on the top and/or bottom surface of thebottom package 92. The dies 70 may comprise an integrated circuit or chip and may be mounted to a top surface and/or bottom surface of thefirst substrate 10 by way of 78 or 74. In the illustrated embodiment, the dies 70 may be mounted to theconnector elements first substrate 10 using contact bumps that are in contact with mounting pads on thefirst substrate 10, which in turn are electrically connected to other dies 102 a or 102 b (seeFIG. 9 ) or theconnector elements 74. In another embodiment the dies 70 may be mounted to thefirst substrate 10 using a technique such as surface mounting, to connect the pins of the die 70 to an array of die mounting pads on thefirst substrate 10. -
Connector elements 78 are shown disposed in anunderfill 76, which may provide stress relief and protection for theconnector elements 78. Underfill materials provide some stress relief and may include thermally conductive filler materials, to assist in handling mechanical stress from thermal expansion.Underfill 76 may comprise resins, epoxies, polymers, no flow underfill (NUF), capillary underfill, the like, or a combination thereof and may be injected between the dies 70 and thefirst substrate 10. The twobottom packages 92 may then be singulated into twoseparate bottom packages 92 as illustrated inFIG. 8 . -
FIG. 9 illustrates a semiconductor device 1 according to an embodiment. The semiconductor device 1 may include abottom package 92, atop package 90 mounted to thebottom package 92 withsolder joints 96, and thebottom package 92 mounted to athird substrate 94. In an embodiment, the semiconductor device may have a total thickness between about 0.98 mm and about 1.35 mm. - The
third substrate 94 may havebond areas 95 on a top surface of thethird substrate 94. In an embodiment, thethird substrate 94 may be a silicon substrate, a silicon or glass interposer, a PCB, an organic laminate substrate, or the like. Thethird substrate 94 may include electronic components and elements formed thereon in some embodiments, or alternatively, thethird substrate 94 may be free of electronic components and elements. Thebottom package 92 may be coupled to the third substrate by theconnector elements 74 andbond areas 95. - The
top package 90 may comprise one or more stacked dies, such as the dies 102 a and 102 b, coupled to asecond substrate 100. In the illustrated embodiment, the dies 102 a and 102 b are coupled to thesecond substrate 100 bywire bonds 104, although other connections may be used, such as contact bumps. - The dies 102 a and 102 b may be encapsulated in a
molding compound 106 on a top surface of thesecond substrate 100. Themolding compound 106 may comprise a polymer, a molding underfill, the like, or a combination thereof. The molding compound 102 may be formed by injecting themolding compound 106 to surround the dies 102 a and 102 b and the wire bonds 104. In other embodiments, thetop package 90 and thebottom package 92 may be encapsulated in a molding compound on a top surface of thethird substrate 94. - The
top package 90 may be coupled to the bottom package by a plurality ofcontact areas 98 on the bottom surface of thesecond substrate 100, the solder joints 96, the wire sticks 52, and thebond pads 22 on the top surface of thefirst substrate 10. - The wire sticks 52 may provide separation, support, and electrical connectivity between the
top package 90 and thebottom package 92. In an embodiment, the wire sticks 52 may have a length large enough to separate thetop package 90 and thebottom package 92 far enough to provide adequate space for thedie 70. In this embodiment, thetop package 90 and thebottom package 92 may be separated by aheight 108 of about 150 um, which corresponds to awire stick 52 height of about 150 um. Greater separation of thetop package 90 and thebottom package 92 may be achieved by taller wire sticks 52, which may be necessary in embodiments with athicker die 70, multiple stacked dies 70, or where dies 70 are mounted on both a bottom surface of thesecond substrate 100 and the top surface of thefirst substrate 10. In these embodiments, thetop package 90 and thebottom package 92 may be separated by aheight 108 of between about 50 um and about 350 um. As one of ordinary skill in the art will appreciate, a predetermined spacing between thetop package 90 and thebottom package 92 may be achieved by using acorresponding wire stick 52 height. - The solder joints 96 may be formed by forming solder balls on the
contact areas 98 on the bottom surface of thesecond substrate 100. Thebottom package 92 may then be lowered until the plurality of wire sticks 52 are coupled to the plurality of solder balls on thetop package 90. The plurality of solder balls may then be reflowed so that the plurality of wire sticks 52 may be inserted in the plurality of solder balls so that a solder joint 96 is formed over each of the wire sticks 52 (seeFIG. 9 ). The solder joints 96 may have a substantially barrel shape in the cross-sectional view. Each of the wire sticks 52 is disposed between thetop package 90 and thebottom package 92 and each are embedded in asolder joint 96. In an embodiment, the wire sticks 52 may extend partially to thecontact area 98 of thesecond substrate 100. In another embodiment, the wire sticks 52 may extend fully to thecontact area 98 of thesecond substrate 100. - Embodiments may achieve advantages. The wire sticks 52 may allow for control of the solder joint 96 size and height, enabling a greater range of height of the solder joint 96 than that of a solder ball joint. Also, the wire sticks 52 can be applied to substrates with an OSP layer which may be lower cost than other comparable substrates. Further, the overall height of the package may be reduced due to the low profile of the
solder joint 96. - An embodiment is a package-on-package (PoP) device comprising a first package on a first substrate and a second package over the first package. A plurality of wire sticks disposed between the first package and the second package and the plurality of wire sticks couple the first package to the second package. Each of the plurality of wire sticks comprise a conductive wire of a first height affixed to a bond pad on the first substrate and each of the plurality of wire sticks is embedded in a solder joint.
- Another embodiment is a PoP device comprising a bottom package comprising a semiconductor die on a first substrate and a plurality of wire sticks disposed on a top surface of the first substrate, wherein each of the wire sticks are bonded to a bond pad on the first substrate. A top package comprising a plurality of vertically stacked dies on a second substrate and a plurality of contacts on a bottom surface of the second substrate, wherein each of the plurality of wire sticks is disposed in one of a plurality of solder joints. Each of the plurality of solder joints is coupled to one or more of the plurality of contacts.
- Yet another embodiment is a method of forming a PoP device comprising forming a plurality of bond pads on a first substrate, forming a plurality of wire sticks, and bonding the plurality of wire sticks to the first substrate. Each of the plurality of wire sticks is bonded to one of the bond pads on the first substrate. The method further comprises mounting a first die to the first substrate, mounting a second die to a second substrate, forming a plurality of solder balls on the second substrate, and coupling each of the plurality of wire sticks to one of the plurality of solder balls.
- Although the present embodiments and their advantages have been described in detail, it should be understood that various changes, substitutions, and alterations can be made herein without departing from the spirit and scope of the disclosure as defined by the appended claims. Moreover, the scope of the present application is not intended to be limited to the particular embodiments of the process, machine, manufacture, composition of matter, means, methods, and steps described in the specification. As one of ordinary skill in the art will readily appreciate from the disclosure, processes, machines, manufacture, compositions of matter, means, methods, or steps, presently existing or later to be developed, that perform substantially the same function or achieve substantially the same result as the corresponding embodiments described herein may be utilized according to the present disclosure. Accordingly, the appended claims are intended to include within their scope such processes, machines, manufacture, compositions of matter, means, methods, or steps.
Claims (20)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US13/570,065 US8642393B1 (en) | 2012-08-08 | 2012-08-08 | Package on package devices and methods of forming same |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
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| US13/570,065 US8642393B1 (en) | 2012-08-08 | 2012-08-08 | Package on package devices and methods of forming same |
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| US8642393B1 US8642393B1 (en) | 2014-02-04 |
| US20140042621A1 true US20140042621A1 (en) | 2014-02-13 |
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