TWM633261U - Photomask supporting container for lithography-based application - Google Patents

Abstract

This creation relates to a photomask holding container based on lithography, which is used to accommodate and limit a photomask, and the photomask holding container includes a first window group and a second window group, and the first and second window groups are set On the sides of the photomask holding container opposite to the two sides of the photomask, and the first and second window groups respectively have a transparent quartz plate, and the light transmittance of these transparent quartz plates is greater than or equal to 90%, and the The visible range of the first and second window groups is greater than or equal to the circuit pattern of the photomask, so that when the photomask is contained in the photomask holding container, a lithography beam can be transmitted through a lithography equipment It enters from the outside of the first window group or the second window group, and then passes through the photomask and then emits from the opposite second window group or the first window group, so that the circuit pattern projected by the photolithography beam through the photomask is transferred to the photomask. The wafer surface of the working platform, and furthermore, the photomask holding container can simultaneously detect the contamination on the upper and lower surfaces of the photomask in a visual inspection device.

Description

Reticle holding container based on lithography application

This creation belongs to the technical field of a photomask holding container, specifically a photomask holding container based on photolithography, so as to reduce the pollution of photolithographic patterns on the surface of the photomask during storage, transmission and manufacturing process.

According to, electronic products are constantly developing towards characteristics such as thinness, shortness, high frequency, and high performance, so that the core semiconductor components used in electronic products need to be miniaturized and have high performance. Therefore, the circuit pattern wire diameter of existing semiconductor components has changed from the early From the micron level to the nano level. According to the current semiconductor element manufacturing technology, the circuit pattern of the semiconductor element is transferred to the surface of the wafer through the process of lithography (Lithography). Specifically, the light source of a specific wavelength is projected through the photomask (Photomask). In this way, the circuit pattern is transferred to the surface of the wafer. In order to double the number of semiconductor elements per unit area and reduce the line width of semiconductor circuits as the main technical solution, deep ultraviolet (DUV) with a wavelength of 193 nm and extreme ultraviolet (EUV) with a wavelength of 13.5 nm are currently used As the exposure light source for the lithography process, the maximum physical limit of deep ultraviolet light (DUV) is the line width of 10nm. To achieve a line width below 7nm, extreme ultraviolet light (EUV) must be used.

However, in the process, due to the process materials, or process gas, or the peeling off of parts particles and oil, or the accumulation or chemical changes of particles or gas free molecules in the environment, the wafer/optical Cover storage and transportation Particles or smog and other defects are generated during transportation. Therefore, the photomask must be placed in a carrier with high cleanliness, good airtightness, low gas escape and high antistatic protection during the transportation process and storage period. Prevent the mask from being polluted, ensure the cleanliness of the mask and improve the process yield.

Affected by the aforementioned miniaturization of semiconductor elements, in the manufacturing process of semiconductor elements, if the photomask used to transfer circuit patterns is defective (or polluted), it will cause distortion or deformation of the circuit patterns on the wafer surface. One of the known causes of photomask defects is that the surface of the photomask is contaminated, for example, by process materials or process gases, or by the peeling off of parts particles and oil, or by particles or gas free molecules in the environment After the accumulation or chemical change of pollutants, defects such as particles or haze will be generated on the surface of the photomask. In order to maintain the quality of the photomask during the process, the photomask will generally be stored in a photomask during storage or transmission. In the container, the existing photomask holding container includes a base and a cover. When the cover and the base are closed relative to each other, an inner cavity for accommodating a photomask can be formed between the two, and through the The clamping parts in the seat and the cover allow the photomask to be selectively confined in the inner cavity, which can reduce the particle pollution caused by collision, friction or reaction with external process gas, which affects the cleanliness of the photomask surface.

However, when the photomask is in the lithography process or surface inspection, it is still necessary to open the cover to extract the photomask placed on the base. Before opening the photomask holding container, in order to make the working environment dust-free, there will be a process , exhaust and other operations, at this time, particles or some pollutants will enter the photomask holding container due to pressure changes inside and outside the photomask holding container, and adhere to the surface of the photomask, and even repeated opening and closing actions are easy Particles or static electricity are generated due to friction or improper collision, which greatly increases the probability of contamination of the mask, thereby shortening the interval between the mask returning to the factory for refurbishment, and increasing the number of times the mask is cleaned, thereby shortening the life of the circuit pattern of the mask. Increase the mask reserve of the same layout, greatly reduce its production efficiency, and increase the process cost, and as lithography process technology becomes more and more sophisticated and costly, such as deep ultraviolet (DUV) and extreme ultraviolet (EUV) lithography processes, the demand for protection of photomasks is also increasing.

In other words, due to the lithography process of transferring circuit patterns of existing semiconductor components, the photomask will produce different defects on the surface of the photomask due to the accumulation or chemical changes of process materials, gases, particles or gas free molecules. Taking out the mask from the protective carrier to carry out the lithography process is the main moment for the defect in the whole use process of the mask. Therefore, how to avoid accidental pollution caused by taking out the mask for lithography is the expectation of the industry and users. , is also the person who this creation intends to explore and solve.

In view of the above deficiencies and disadvantages, the author believes that it is necessary to correct them. Based on his years of experience in related technologies and product design and manufacturing, and adhering to the excellent design concept, he researched and improved the above deficiencies. After continuous hard work and trial production, he finally successfully developed A photomask holding container based on photolithography is used to overcome the trouble and inconvenience caused by the loss of protection of the existing photomask during use.

Therefore, the main purpose of this creation is to provide a photomask holding container based on photolithography, so that when the photomask is stored in the photomask holding container, the circuit pattern can be transferred to the photomask by projecting light of a specific wavelength. The surface of the wafer allows the photomask to be protected during the manufacturing process, so as to reduce the probability of defects on the photomask surface.

Moreover, the main purpose of this creation is to provide a photomask holding container based on photolithography, which can allow the image sensing device to simultaneously perform vision on both sides of the photomask when the photomask is stored in the photomask holding container Detection will contribute to the utilization and practicality of the industry.

Furthermore, the main purpose of this creation is to provide a photomask holding container based on lithography, which can reduce the chance of the photomask being extracted from the photomask holding container, and improve the protection requirements for the photomask to avoid The accidental contamination caused by the lithography or inspection of the mask can improve the process efficiency and reduce the process cost.

Based on this, this creation mainly achieves the aforementioned purpose and performance through the following technical means; it is used to accommodate a photomask with a circuit pattern, and the photomask holding container includes: a base, which has a bottom plate; The cover body has a top plate corresponding to the bottom plate of the base. The periphery of the top plate of the cover body is formed with an annular wall surface extending toward the base. A cavity is formed between them to accommodate the photomask, and the photomask can be moved and fixed at a restricted position; a first window group and a second window group are respectively arranged on the bottom plate of the base and the cover The top plate of the body corresponds to the photomask at the limit position of the inner cavity, and the first and second window groups respectively have a transparent quartz plate, and the light transmittance of these transparent quartz plates is greater than or equal to 90%, and the The visible range of the first and second window groups is greater than or equal to the circuit pattern of the photomask; when the photomask is contained in the photomask holding container, it can pass through a lithography beam in a lithography equipment from the first The transparent quartz plate of the window group or the second window group is injected from the outside, and after passing through the mask, it is emitted from the transparent quartz plate of the second window group or the first window group, so that the lithography beam is projected through the circuit of the mask The pattern is transferred to the wafer surface of the work stage.

And this creation and use the following technical means to further achieve the aforementioned purpose and effect; One wall, the second wall, the third wall and the fourth wall, and any one of the corresponding wall surfaces is provided with a side light transmission group corresponding to the side of the mask at the limit position, and these side light transmission groups are respectively There is a transparent quartz plate, and the light transmittance of these transparent quartz plates is greater than or equal to 90%, and the light-transmitting range of the side light-transmitting groups is larger than the side profile of the photomask, when the photomask storage limit After the photomask holding container, in a visual inspection device, the first and second light source groups can be transmitted from the outside of the photomask holding container on both sides, and the light beam can be injected from the quartz glass plates of the side light-transmitting groups, And projected on the upper and lower surfaces of the photomask, and can simultaneously detect the photomask through the first and second image sensing devices on the upper and lower sides of the photomask holding container through the quartz glass plates of the first and second window groups Contaminants on upper and lower surfaces.

In order to enable your review committee to further understand the composition, characteristics and other purposes of this creation, the following are some preferred embodiments, which are described in detail with the drawings, and at the same time allow those familiar with this technical field to implement it.

10: Base

11: Bottom plate

110: the first penetration hole

111: class slot

12: Support limit mechanism

13: Lock mechanism

15: The first window group

16: Transparent quartz plate

17: sealing ring gasket

18: Bottom cover

180: Second penetration hole

20: cover body

21: top plate

210: The third penetration hole

211: class slot

22: Annular wall

221: The first wall

222: second wall

223: The third wall

224: The fourth wall

225: side penetration hole

226: class slot

23: clamping mechanism

24: clamping mechanism

25:Second window group

26: Transparent quartz plate

27: sealing ring gasket

28: top cover sheet

280: The fourth penetration hole

30: inner cavity

40: side light transmission group

41: Transparent quartz plate

42: sealing ring gasket

43: side cover ring frame

50: Lithography equipment

51: Microshadow light source

52: Lithography Beam

55: work platform

60: Visual inspection equipment

61: The first image sensing device

62: Second image sensing device

65: The first light source module

650: Beam

66:Second light source module

660: Beam

70: Mask inner box

71: Inner box base

711: Bottom plate

72: Inner box cover

721: top plate

73: Inner cavity of inner box

100: mask

105: circuit pattern

200: Wafer

Figure 1: A schematic diagram of the appearance of a preferred embodiment of the photomask holding container of this creation.

Figure 2: An exploded schematic diagram of a preferred embodiment of the photomask holding container of this invention, for illustrating the shape and relative relationship of the components of the cover.

Figure 3: Another exploded schematic view of a preferred embodiment of the photomask holding container of this invention, for illustrating the appearance of the components of the base and their relative relationships.

Figure 4: It is a top plan view of a preferred embodiment of the photomask holding container of the present invention in a closed state during actual use.

Figure 5: It is a schematic side view plan view of a preferred embodiment of the photomask holding container of the present invention in a closed state during actual use.

Figure 6: The preferred embodiment of the photomask holding container created for this invention in practice Schematic diagram of the side view cross-section reference used for lithography when in use.

Fig. 7: It is a side view cross-sectional reference schematic diagram for visual inspection of a preferred embodiment of the photomask holding container of the present invention in actual use.

Figure 8: It is a schematic view of the appearance of another preferred embodiment of the photomask holding container of this invention.

Fig. 9 is an exploded schematic view of another preferred embodiment of the photomask holding container of the present invention.

This creation is a photomask holding container based on lithography. The accompanying drawings illustrate the specific embodiments of this creation and its components, all about front and back, left and right, top and bottom, upper and lower, and horizontal and Vertical references are for convenience of description only and do not limit the invention, nor its components, to any position or orientation in space. The dimensions specified in the drawings and description can be changed according to the design and requirements of the specific embodiments of this creation without departing from the patent scope of this creation.

Please refer to Figures 1, 2 and 3 for the composition of the photomask holding container based on the application of lithography in this creation. It is used to accommodate and fix a photomask (100), and one side of the photomask (100) has a surface of A circuit pattern (105) for photolithographic transfer, and the photomask holding container includes a base (10) and a cover (20) that can be relatively closed, and the base (10) has a bottom plate (11), and the cover (20) has a top plate (21) corresponding to the bottom plate (11), and the periphery of the top plate (21) of the cover (20) is formed with a An annular wall (22), and the annular wall (22) has a first wall (221), a second wall (222), a third wall (223) and a fourth wall (224) adjacent to each other, when the When the cover body (20) is relatively covered with the base (10), the bottom plate (11), the An inner cavity (30) for accommodating the photomask (100) can be formed between the top plate (21) and the annular wall surface (22), and the material of the base (10) and the cover (20) can be Selected from metal or plastic; and the base (10) is provided with at least one support limit mechanism (12) on the bottom plate (11) corresponding to the cover (20), for supporting the photomask (100) from bottom to top, And the cover (20) is provided with at least one clamping mechanism (23) on the surface of the top plate (21) corresponding to the base (10), for clamping and pressing the photomask (100) from top to bottom, so that the photomask (100) can be constrained to be positioned in the inner cavity (30), and in addition, the base (10) and the cover (20) can be provided with a relative locking mechanism (13) at the joint position, so that the cover (20 ) and the base (10) can be selectively locked after the cover is closed and cannot be opened arbitrarily. In addition, according to some embodiments, the cover (20) can optionally be provided with a clamping mechanism (24) on the outer surface of the top plate (21) for manual or mechanical clamping to transport the photomask holding container, wherein the clamping Mechanism (24) can be selected from the clamping flap of mechanical arm or the OHT head of OHT system; The first window group (15), wherein the contour of the visible range of the first window group (15) is greater than or equal to the circuit pattern (105) of the photomask (100), and the cover (20) is on the top plate (21) There is a pair of second window group (25) of the first window group (15), and the first and second window groups (15, 25) respectively have a transparent quartz plate (16, 26), and the transparent quartz The purity of the plates (16, 26) is greater than or equal to 99.995%, and the content of metal impurities is less than 5ppm, and its light transmittance is greater than or equal to 90%, so that the transparent quartz plates (16, 26) can be used from ultraviolet, visible light to Infrared bands have good transmittance, so that when the mask (100) is limited and positioned in the inner cavity (30) between the base (10) and the cover (20), the base (10) can Look directly at the mask (100) through the first and second window groups (15, 25) from the outside of the cover (20) circuit pattern (105) [as shown in Fig. 4], and any two corresponding wall surfaces of the cover body (20) on the annular wall surface (22) such as the first and third wall surfaces (221, 223) or the second wall surface 2. The four walls (222, 224) are respectively provided with a side light-transmitting group (40) corresponding to the side of the mask (100), and the profile of the side light-transmitting group (40) is slightly larger than the side of the mask (100) Contour, so that when the photomask (100) is limited and positioned in the inner cavity (30) between the base (10) and the cover (20), light can be transmitted through the side outside of the cover (20) Group (40) directly looks at this photomask (100) or introduces light source [as shown in the 5th figure], and this first, second window group (15,25) and side light-transmitting group (40) system respectively have a transparent quartz plate (41), the purity of these transparent quartz plates (41) is greater than or equal to 99.995%, and the content of metal impurities is less than 5ppm, and its light transmittance is greater than or equal to 90%, so that these transparent quartz plates (41) It has good transmittance from ultraviolet light, visible light to infrared waveband; according to some embodiments, the first window group (15) of the base (10) is formed on the bottom plate (11) with a corresponding photomask (100) The first penetration hole (110), and the bottom plate (11) is formed with a larger-diameter stepped groove (111) on the top surface periphery corresponding to the first penetration hole (110), for setting the first window group ( 15) of the transparent quartz plate (16), and a sealing ring pad (17) for the pressure of the transparent quartz plate (16) is provided in the step groove (111), and the base plate (10) of the base (10) 11) The top surface is covered with a bottom cover sheet (18), and the bottom cover sheet (18) has a second penetration hole (180) with an inner diameter corresponding to the first penetration hole (110), for the transparent The quartz plate (16) is pressed and fixed on the base (10). Also according to some embodiments, the second window group (25) of the cover (20) is formed on the top plate (21) with a third penetration hole (210) corresponding to the photomask (100), and the top plate (21 ) forms a step groove (211) with a larger diameter on the top surface periphery corresponding to the third through hole (210), for setting the transparent quartz plate (26) of the second viewing window group (25), and in the transparent There is a sealing ring pad (27) on the upper periphery of the quartz plate (26), Furthermore, the top surface of the top plate (21) of the cover (20) is covered with a top cover sheet (28), and the top cover sheet (28) has a fourth inner diameter corresponding to the third through hole (210). The through hole (280) is used to press and fix the transparent quartz plate (26) on the cover (20), and the aforementioned clamping mechanism (24) can be locked on the top cover sheet of the cover (20) (28), and the clamping mechanism (24) does not cover the fourth penetration hole (280). Furthermore, according to some embodiments, the side light-transmitting group (40) of the cover (20) forms a side penetration hole (225) corresponding to the side of the photomask (100) on the second and fourth wall surfaces (222, 224). ), and the second and fourth wall surfaces (222, 224) form a step groove (226) with a larger diameter on the outer peripheral edge of the corresponding side penetration hole (225), for setting the side light transmission group (40) The transparent quartz plate (41), and a sealing ring gasket (42) for pressing the transparent quartz plate (41) is provided in the step groove (226), and the second and fourth of the cover (20) The outer surface of the wall (222, 224) is covered with a side ring frame (43), which is used to press and fix the transparent quartz plate (41) of the side light-transmitting group (40) on the second and second sides of the cover (20). On the four walls (222, 224); thereby, the light can be incident from the cover (20) [or from the base (10)] of the photomask holding container, and pass through the photomask (100) from the base Seat (10) [from or cover body (20)] shoots out, for carrying out the lithography process of semiconductor element or carry out automatic visual inspection to this photomask (100) both sides surfaces synchronously.

And when the photomask holding container of the present creation is actually applied to the lithography process of semiconductor elements, then it is as shown in Fig. 6. After the photomask holding container is loaded into a lithography equipment (50), the lithography equipment (50) ) has a lithography light source (51) that can emit a lithography beam (52) of a specific wavelength, and the lithography equipment (50) has a work stage (55) that can transfer a wafer (200), and the The lithography light source (51) can enter the transparent quartz plate (26) of the second window group (25) of the cover (20) with the lithography beam (52), and pass through the mask (100) and then pass through The base (10) The transparent quartz plate (16) of the first window group (15) is projected, so that the photolithography beam (52) is projected through the circuit pattern (105) of the photomask (100), and the circuit pattern is transferred to the work load. The wafer (200) surface of the stage (55). According to some embodiments, the surface of the photomask (100) can be coated with a reflective layer, and the circuit pattern (105) is formed on the reflective layer, so that the lithography beam (52) can be transmitted from the same side of the base (10) The transparent quartz plate (16, 26) of the first window group (15) or the second window group (25) of the cover (20) is injected and emitted, and the circuit pattern of the photomask (100) is reflected (105) projectively transferred onto the surface of the wafer (200).

And when the photomask holding container of the present creation is actually applied to the visual inspection of semiconductor components, it is as shown in Figure 7. After the photomask holding container is loaded into a visual inspection equipment (60), the visual inspection equipment (60) There are first and second image sensing devices (61, 62) (such as CCD sensors or CMOS sensors) that can detect surface contamination on and below the photomask holding container, and the visual inspection equipment (60) There are respectively a first and a second light source module (65, 66) on opposite sides of the photomask holding container, so that the first and second light source modules (65, 66) can emit light beams (650, 660) The transparent quartz plate (41) of the light transmission group (40) on the opposite side of the cover (20) enters and projects the two sides of the mask (100) for the first and second image sensing devices (61 , 62) Visually inspect the particles and other pollutants on the surface of the photomask (100), so as to visually inspect the surfaces on both sides of the photomask (100) placed in the photomask protection carrier, and transmit it to a connection with the visual inspection A display device of the equipment (60). And according to some embodiments, the visual inspection device (60) has a first and a second light source module (65, 66) on the opposite upper and lower surfaces of the mask holding container, so that the first and second light source modules Groups (65, 66) can inject light beams (650, 660) from the transparent quartz plates (16, 26) of the first and second window groups (15, 25) opposite to the cover (20), and project the light The surfaces on both sides of the mask (100) are used for the first and second image sensing devices (61, 62) to visually detect particles and other pollutants on the surface of the photomask (100) and transmit them to the display device.

Furthermore, as shown in Figures 8 and 9, it is another preferred embodiment of the photomask holding container of this invention, which is a photomask inner box (70) [Inner Pod] that can be placed inside a transfer box , the photomask inner box (70) has an inner box base (71) [Inner Pod Baseplate] and an inner box cover (72) [Inner Pod Cover], and the inner box base (71) and The inner box cover (72) is made of metal material, and the inner box base (71) has a bottom plate (711), and the inner box cover (72) has a corresponding bottom plate (711) The top plate (721), and the periphery of the top plate (721) of the inner box cover (72) is formed with an annular wall surface (22) extending toward the inner box base (71), when the cover (20) and the When the base (10) is relatively closed, an inner box cavity (73) for accommodating a photomask (100) can be formed between the two, and the inner box cavity (73) can be used for clamping and limiting the tool. A photomask (100) for lithography transfer circuit pattern (105); and the feature of this embodiment is that the inner box base (71) is provided with a pair of first photomask (100) on the bottom plate (711). The window group (15), wherein the profile of the first window group (15) is slightly larger than the circuit pattern (105) of the photomask (100), and the inner box cover (72) is provided with a pair of It should be the second window group (25) of the first window group (15), and the first and second window groups (15, 25) have a transparent quartz plate (16, 26) respectively, so as to act as a photomask (100) When restricting the inner box cavity (73) between the inner box base (71) and the inner box cover (72), the inner box base (71) and the inner box cover (72) can through the first and second window groups (15, 25) to directly look at the circuit pattern (105) on the photomask (100). Furthermore, according to some embodiments, the inner box cover (72) of the photomask inner box (70) is divided on any two corresponding wall surfaces of the annular wall surface (22). A side light transmission group (40) corresponding to the side of the photomask (100) is separately provided, and the profile of these side light transmission groups (40) is slightly larger than the side profile of the photomask (100), so as to act as a photomask (100) When the restriction is positioned in the inner cavity (73) of the inner box, the light cover (100) or the light source can be directly viewed from the side outside of the inner box cover (72) through the side light-transmitting groups (40), and These side light-transmitting groups (40) are respectively equipped with a transparent quartz plate (41), so that light can be injected from the inner box cover (72) of the inner box (70) of the photomask or the outside of the inner box cover (72) , and after passing through the photomask (100), it is ejected from the relative inner box cover (72) or inner box base (71) for the lithography process of semiconductor elements, or it is arranged in the photomask The photomask (100) inside the inner cavity (73) of the box (70) can simultaneously perform visual inspection on both sides of the surface.

Moreover, according to some embodiments, the photomask holding container includes a first window group (15), and the first window group (15) is arranged in the photomask holding container opposite to the photomask ( 100) One side of one of the surfaces, and the photomask holding container further includes a second window group (25), the second window group (25) is arranged in the photomask holding container opposite to the photomask (100) One side of a surface, and the first and second window groups (15, 25) respectively have a transparent quartz plate, and the light transmittance of these transparent quartz plates is greater than or equal to 90%, and the first and second The visible range of the window group (15, 25) is greater than or equal to the circuit pattern (105) of the photomask (100).

Through the above description, the photomask holding container of this creation utilizes its base (10) [or inner box base (71)] and cover (20) [or inner box cover (72)] to be provided with a quartz The first and second window groups (15, 25) of the glass plate are designed so that when the photomask (100) is stored in the photomask holding container, light can be projected through the photomask (100) to transfer the circuit pattern (105) to the surface of the wafer (200), so that the photomask (100) can still be protected during the process of use, so as to reduce the probability of defects on the surface of the photomask (100), and at the same time when the photomask (100) When stored in the photomask holding container, the image sensing device can further be used to simultaneously perform visual inspection on both sides of the photomask (100), which can reduce the chance of the photomask (100) being extracted from the photomask holding container, Increasing the protection requirements for the photomask (100) to reduce the accidental pollution caused by taking out the photomask (100) for lithography process or inspection can improve the process efficiency and reduce the process cost, which will help the industry Utilization and practicality.

In summary, it can be understood that this creation is a new creation with excellent creativity. In addition to effectively solving the problems faced by practitioners, it also greatly improves the efficacy, and there is no identical or similar product creation in the same technical field. Or open use, and at the same time have the enhancement of efficacy, so this creation has met the requirements of "novelty" and "progressiveness" of a new patent, and an application for a new patent is filed according to law.

20: cover body

24: clamping mechanism

25:Second window group

26: Transparent quartz plate

40: side light transmission group

41: Transparent quartz plate

100: mask

105: circuit pattern

221: The first wall

224: The fourth wall

Claims (10)

A photomask holding container for accommodating a photomask with a circuit pattern, the photomask holding container includes: a base with a bottom plate; a cover with a top plate corresponding to the bottom plate of the base, the The periphery of the top plate of the cover is formed with an annular wall surface extending toward the base. When the cover is selectively closed relative to the base, an inner cavity for accommodating the photomask is formed between the two. The photomask is moved and fixed at a limited position; a first window group and a second window group are respectively arranged on the bottom plate of the base and the top plate of the cover corresponding to the position where the photomask is limited in the inner cavity , and the first and second window sets respectively have a transparent quartz plate, and the light transmittance of the transparent quartz plates is greater than or equal to 90%, and the visible range of the first and second window sets is greater than or equal to the light The circuit pattern of the mask; when the photomask is accommodated in the photomask holding container, it can pass through a lithography beam in a lithography device and inject from the outside of the transparent quartz plate of the first window group or the second window group, and After passing through the photomask, it is emitted from the transparent quartz plate of the opposite second window group or the first window group, so that the photolithography beam is projected through the photomask and the circuit pattern is transferred to a wafer set in the photolithography equipment surface. The photomask holding container according to claim 1, wherein the purity of the transparent quartz plates of the first and second window groups is greater than or equal to 99.995%, and the content of metal impurities is less than 5ppm. According to the photomask holding container described in claim 1, wherein the first viewing window is set on the base plate of the base, a first penetration hole corresponding to the position of the photo mask is formed on the base base plate, and The bottom plate is formed with a step groove for setting the transparent quartz plate of the first window group on the periphery of the top surface corresponding to the first through hole, and a step groove for the transparent quartz plate to be pressed is provided in the step groove. The sealing ring pad, and the top surface of the bottom plate of the base is covered with a bottom cover sheet, and the bottom cover sheet has a second penetration hole with an inner diameter corresponding to the first penetration hole, for pressing the transparent quartz plate The trigger is fixed on the base. According to the photomask holding container described in Claim 1, wherein the second viewing window is set on the top plate of the cover body, a third penetration hole corresponding to the photomask limiting position is formed on the top plate of the cover body, and A step groove for setting the transparent quartz plate of the second viewing window group is formed on the periphery of the top surface of the top plate corresponding to the third through hole, and a sealing ring gasket is pressed on the upper periphery of the transparent quartz plate, and the cover body A top cover sheet is covered on the top surface of the top plate, and the top cover sheet has a fourth through hole with an inner diameter corresponding to the third through hole for pressing and fixing the transparent quartz plate to the cover body. According to the photomask holding container described in claim 1, wherein the annular wall of the cover has a first wall, a second wall, a third wall, and a fourth wall that are adjacently connected, and any one of the corresponding walls There is a side light transmission group corresponding to the side of the mask at the limit position, and the side light transmission groups respectively have a transparent quartz plate, and the light transmittance of these transparent quartz plates is greater than or equal to 90%, and the Wherein the light-transmitting range of the side light-transmitting groups is larger than the side profile of the photomask, when the photomask is accommodated in the photomask holding container, it can be viewed from both sides of the photomask holding container in a visual inspection device The outside through a first and second light source group can inject light beams from the quartz glass plates of the side light-transmitting groups and project on the upper and lower surfaces of the mask, and can transmit a light beam from the upper and lower sides of the mask holding container. The first and second image sensing devices synchronously detect the pollutants on the upper and lower surfaces of the photomask through the quartz glass plates of the first and second window groups. According to the photomask holding container described in Claim 5, wherein the side light-transmitting group of the cover body forms a pair of The side penetration hole on the side of the photomask, and the outer periphery of the side penetration hole is formed with a step groove for setting the transparent quartz plate of the side light transmission group, and a step groove for the transparent quartz plate is provided in the step groove The sealing ring gasket of the pressure switch, and the outer surface of the transparent quartz plate of the side light transmission group of the cover is covered with a side ring frame, which is used to fix the transparent quartz plate of the side light transmission group to the cover. superior. A photomask holding container, the photomask holding container can be a photomask inner box placed inside a transfer box, for accommodating a photomask with a circuit pattern, which includes: an inner box base, which has a Bottom plate; an inner box cover, which has a pair of top plates corresponding to the bottom plate of the inner box base. When it is closed with the base of the inner box, an inner cavity of the inner box for accommodating the photomask is formed between the two, and the photomask can be moved and fixed at a restricted position; a first window group and a The second window group is respectively arranged on the bottom plate of the inner box base and the top plate of the inner box cover corresponding to the position where the photomask is limited in the inner cavity of the inner box, and the first and second window groups have a transparent quartz respectively. plate, and the light transmittance of these transparent quartz plates is greater than or equal to 90%, and the visible range of the first and second window groups is greater than or equal to the circuit pattern of the photomask; After the container is covered and held, in a lithography equipment, a lithography light beam can enter from the outside of the transparent quartz plate of the first window group or the second window group, and then pass through the photomask and then pass through the second window group or the second window group. The transparent quartz plate of the first window group is emitted, so that the circuit pattern projected by the lithography beam through the photomask is transferred to the surface of a wafer arranged in the lithography equipment. According to the photomask holding container described in claim 7, wherein the annular wall of the inner box cover has a first wall, a second wall, and a third wall that are adjacently connected surface and the fourth wall surface, and any one of the corresponding wall surfaces is provided with a side light transmission group corresponding to the side of the mask at the limit position, and these side light transmission groups have a transparent quartz plate respectively, and these The light transmittance of the transparent quartz plate is greater than or equal to 90%, and the light-transmitting range of the side light-transmitting groups is larger than the side profile of the mask. When the mask is accommodated in the mask holding container, it can In a visual inspection device, a first light source group and a second light source group pass through the outer sides of the photomask holding container, and light beams are injected from the quartz glass plates of the side light-transmitting groups and projected on the upper and lower surfaces of the photomask , and can simultaneously detect the pollutants on the upper and lower surfaces of the photomask from the upper and lower surfaces of the photomask holding container through a first and second image sensing device through the quartz glass plates of the first and second window groups. A photomask holding container for accommodating and restricting a photomask, the photomask has two relatively parallel surfaces, one side of which can be selectively provided with a circuit pattern, and the photomask holding container includes: a first window group , which is arranged on one side of the photomask holding container opposite to one surface of the photomask; a second window group, which is arranged on the side of the photomask holding container opposite to the other surface of the photomask, and the first, The two window groups respectively have a transparent quartz plate, and the light transmittance of these transparent quartz plates is greater than or equal to 90%, and the visible range of the first and second window groups is greater than or equal to the circuit pattern of the photomask; The photomask is contained behind the photomask holding container, so that in a lithography equipment, a lithography light beam is incident from the outside of the first window group or the second window group, and then passes through the photomask and then passes through the opposite second window group. The second window group or the first window group is emitted, so that the circuit pattern projected by the lithography beam through the photomask is transferred to the surface of a wafer disposed in the lithography equipment. According to the photomask holding container described in Claim 9, wherein the photomask holding container is provided with two opposite side light-transmitting groups on the peripheral side of the photomask to be stored, and the side light-transmitting groups respectively have a transparent quartz plate, and The light transmittance of the transparent quartz plates is greater than or equal to 90%, and the light transmittance range of the side light transmission groups is larger than the side profile of the mask.

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