TWM622809U - Powder atomic layer deposition machine with downward blowing line - Google Patents

Abstract

The new model provides a powder atomic layer deposition machine with a downward blowing line, which mainly includes a vacuum chamber, a shaft sealing device and a driving unit, wherein the driving unit is connected to the vacuum chamber through the shaft sealing device and drives the vacuum chamber to rotate. The vacuum chamber includes a reaction space and a blow-down line, wherein the reaction space is used for accommodating a plurality of powders, and the blow-down line is connected to the reaction space and faces the bottom of the reaction space. At least one non-reactive gas delivery line is located in the shaft sealing device for connecting the down blowing line, and delivering a non-reactive gas to the reaction space through the down blowing line to blow the powder deposited at the bottom of the reaction space, so as to facilitate A film of uniform thickness is formed on the surface of the powder.

Description

Powder atomic layer deposition machine with blow down line

The new model relates to a powder atomic layer deposition machine with a downward blowing line, which is beneficial to form a thin film with a uniform thickness on the surface of the powder.

Nanoparticles are generally defined as particles smaller than 100 nanometers in at least one dimension that are physically and chemically distinct from macroscopic substances. In general, the physical properties of macroscopic substances are independent of their size, but this is not the case for nanoparticles, which have potential applications in fields such as biomedicine, optics, and electronics.

Quantum Dot (Quantum Dot) is a nanoparticle of semiconductor material. The currently studied semiconductor materials are II-VI materials, such as ZnS, CdS, CdSe, etc. Among them, CdSe has attracted the most attention. The size of quantum dots is usually between 2 and 50 nanometers. When the quantum dots are irradiated with ultraviolet light, the electrons in the quantum dots absorb energy and transition from the valence band to the conduction band. Excited electrons release energy by emitting light as they travel from the conduction band back to the valence band.

The energy gap of quantum dots is related to the size. The larger the size of the quantum dot, the smaller the energy gap, and it will emit light with a longer wavelength after irradiation. The smaller the size of the quantum dot, the larger the energy gap, and the wavelength will be emitted after irradiation. shorter light. For example, quantum dots of 5 to 6 nanometers will emit orange or red light, while quantum dots of 2 to 3 nanometers will emit blue or green light. Of course, the light color depends on the material composition of the quantum dots.

Light emitting diodes (LEDs) using quantum dots produce light close to a continuous spectrum, and at the same time have high color rendering properties, which are beneficial to improve the luminous quality of light emitting diodes. In addition, by changing the The size of the subdots adjusts the wavelength of the emitted light, making quantum dots the focus of the development of a new generation of light-emitting devices and displays.

Although quantum dots have the above-mentioned advantages and characteristics, they are prone to agglomeration in the process of application or manufacture. In addition, quantum dots have high surface activity and easily react with air and water vapor, thereby shortening the life of quantum dots.

Specifically, when quantum dots are used as sealants for light-emitting diodes, agglomeration effects may occur, reducing the optical properties of quantum dots. In addition, after the quantum dots are made into the sealant of the light-emitting diodes, the external oxygen or moisture may still pass through the sealant and contact the surface of the quantum dots, resulting in oxidation of the quantum dots and affecting the quantum dots and light-emitting diodes. performance or service life. Defects and dangling bonds on the surface of quantum dots may also cause non-radiative recombination, which also affects the luminous efficiency of quantum dots.

At present, the industry mainly uses atomic layer deposition (ALD) to form a nanometer-thick film on the surface of the quantum dot, or to form a multi-layer film on the surface of the quantum dot to form a quantum well structure.

Atomic layer deposition can form a thin film with uniform thickness on the substrate, and can effectively control the thickness of the thin film. It is also suitable for three-dimensional quantum dots in theory. When the quantum dots are placed on the carrier plate, there will be contact points between adjacent quantum dots, so that the precursor gas of atomic layer deposition cannot contact these contact points, and it is impossible to form uniform thickness on the surface of all nanoparticles. film.

In order to solve the above-mentioned problems of the prior art, the present invention proposes a powder atomic layer deposition machine with a downward blowing line, which can fully stir the powder during the atomic layer deposition process, so that the powder expands It is scattered to each area of the reaction space of the vacuum chamber, so as to facilitate the formation of a thin film with uniform thickness on the surface of each powder.

An object of the present invention is to provide a powder atomic layer deposition machine with a blow-down line, which mainly includes a driving unit, a shaft sealing device and a vacuum chamber, wherein the driving unit is connected through the shaft sealing device and drives the vacuum chamber to rotate . The vacuum chamber includes a reaction space and a blow-down line, wherein the reaction space is used for accommodating a plurality of powders, and the blow-down line is connected to the reaction space and faces the bottom or sidewall of the reaction space.

The shaft sealing device is provided with at least one suction line, at least one intake line and at least one non-reactive gas conveying line, wherein the non-reactive gas conveying line is connected to the down blowing line of the vacuum chamber, and a non-reactive gas is passed through the down blowing line. The gas is blown against the bottom or side walls of the reaction space to blow the powder deposited on the bottom of the reaction space. In addition, when the vacuum chamber rotates to a specific angle, the non-reactive gas delivery line will be connected to the down blowing line of the vacuum chamber, so that the down blowing line is fixed to blow the non-reactive gas toward a specific angle or position in the reaction space.

An object of the present invention is to provide a powder atomic layer deposition machine with a blow-down pipeline, including a transition space disposed in the vacuum chamber and/or the shaft sealing device, wherein the non-reactive gas delivery pipeline is connected to the vacuum through the transition space The blowdown line of the cavity. The cross-sectional area of the transition space is larger than that of the non-reactive gas delivery line and the down blowing line, so that the non-reactive gas delivery line is aligned with the down blowing line through the transition space, and the non-reactive gas is transported to the down blowing line through the transition space.

In addition, the transition space can be an annular space and surrounds the inner pipe body of the shaft sealing device, wherein the non-reactive gas delivery line can continuously convey the non-reactive gas to the down blowing line through the annular transition space, so that the down-flow line can be continuously transported. The blowing line can continuously deliver the non-reactive gas into the reaction space of the vacuum chamber, and blow it to all directions of the reaction space.

An object of the present invention is to provide a powder atomic layer deposition machine with a blow down line, wherein the non-reactive gas delivery line arranged in the shaft sealing device is used to connect the blow down line of the vacuum chamber, and the non-reactive gas is connected to the down blow line of the vacuum chamber. A sealing ring is respectively provided on both sides of the connection position of the conveying pipeline and the blowing-down pipeline.

In order to achieve the above-mentioned purpose, the present invention proposes a powder atomic layer deposition machine with a downward blowing line, including: a driving unit; a shaft sealing device connected to the driving unit; a vacuum chamber connected to the shaft sealing device, the driving unit passing through the shaft The sealing device drives the vacuum cavity to rotate. The vacuum cavity includes: a cover plate and a cavity. An inner surface of the cover plate covers the cavity to form a reaction space between the two. A reaction space is formed on the inner surface of the cover plate. a monitoring wafer, wherein the reaction space is used for accommodating a plurality of powders, and the powders are deposited on a bottom of the reaction space by gravity; and a blow-down line is connected to the reaction space and faces the bottom of the reaction space; The shaft sealing device is fluidly connected to the reaction space of the vacuum chamber and used to extract a gas in the reaction space; at least one intake line is located in the shaft sealing device, fluidly connected to the reaction space of the vacuum chamber, and used to pump a precursor The reactant gas is transported to the reaction space; and at least one non-reactive gas transport line is located in the shaft sealing device and is used to connect the down blowing line of the vacuum chamber, wherein the non-reactive gas transport line is used to pass a non-reactive gas through the down blowing line Transported to the reaction space to blow towards the bottom of the reaction space.

The powder atomic layer deposition machine with blowing down pipeline, wherein the shaft sealing device includes an outer tube body and an inner tube body, the outer tube body includes an accommodating space for accommodating the inner tube body, and the inner tube body Then it includes at least one connection space for accommodating the gas extraction pipeline, the gas inlet pipeline and the non-reactive gas delivery pipeline.

In the powder atomic layer deposition machine with down blowing line, the non-reactive gas conveying line includes a branch part, and the branch part penetrates through the inner pipe body and is used for connecting the down blowing line.

The powder atomic layer deposition machine with down blowing line, wherein the vacuum chamber or inner pipe body includes a transition space, the non-reactive gas conveying pipeline is connected to the down blowing line through the transition space, and a cross-sectional area of the transition space is Larger than the non-reactive gas delivery line and down blow line.

In the powder atomic layer deposition machine with down blowing line, the transition space is an annular body, which surrounds the inner tube body.

The powder atomic layer deposition machine with down blowing line includes a first sealing ring located between the inner pipe body and the vacuum chamber.

The powder atomic layer deposition machine with blow-down line includes a second seal ring located between the outer pipe body and the vacuum chamber, wherein the connection position of the non-reactive gas delivery line and the blow-down line is located in the first seal ring and the second sealing ring.

The powder atomic layer deposition machine with down blowing line includes an extension pipe body connected to the air inlet line, and the extension pipe body is located in the reaction space of the vacuum chamber.

The powder atomic layer deposition machine with down blowing line includes at least one fixing unit for fixing the vacuum chamber on the shaft sealing device. After the connecting unit is unlocked, the vacuum chamber is removed from the shaft sealing device.

10: Powder atomic layer deposition machine with down blowing line

11: Vacuum chamber

111: Cover

1111: inner surface

112: Fixed unit

113: Cavity

114: Recess

115: Monitor Wafers

116: Bottom

117: Down blow line

12: Reaction Space

121: Powder

13: Shaft seal device

131: outer tube body

132: accommodating space

133: inner tube body

134: Connect Space

139: Filter unit

14: Gear

15: Drive unit

161: The first sealing ring

163: Second sealing ring

171: Non-reactive gas delivery line

1711: Branches

172: Extension tube body

1721: Air vent

173: Intake line

175: Heater

177: Exhaust line

179: Temperature Sensing Unit

18: Transfer space

[FIG. 1] This is a three-dimensional schematic diagram of an embodiment of a new type of powder atomic layer deposition machine with down blowing line.

Fig. 2 is a schematic cross-sectional view of an embodiment of a new type of powder atomic layer deposition machine with a blow-down line.

FIG. 3 is a schematic cross-sectional view of an embodiment of a shaft sealing device for a powder atomic layer deposition machine with a down-blowing line.

FIG. 4 is a schematic cross-sectional view of another embodiment of the novel powder atomic layer deposition machine with down blowing line.

Fig. 5 is a schematic cross-sectional view of another embodiment of the novel powder atomic layer deposition machine with down blowing line.

Fig. 6 is a schematic cross-sectional view of another embodiment of the novel powder atomic layer deposition machine with down blowing line.

FIG. 7 is a schematic cross-sectional view of another embodiment of the novel powder atomic layer deposition machine with down blowing line.

FIG. 8 is a schematic exploded cross-sectional view of another embodiment of the novel powder atomic layer deposition machine with down blowing line.

Please refer to FIG. 1 , FIG. 2 and FIG. 3 , which are a three-dimensional schematic diagram, a schematic cross-sectional view, and a shaft sealing device of a powder atomic layer deposition machine with a down-blowing line, respectively, according to an embodiment of the new type of powder atomic layer deposition machine with a down-blowing line. cross-sectional schematic diagram. As shown in the figure, the powder atomic layer deposition machine 10 with the blowing line mainly includes a vacuum chamber 11 , a shaft sealing device 13 and a driving unit 15 , wherein the driving unit 15 is connected through the shaft sealing device 13 and drives the vacuum chamber. 11 Turn.

The vacuum chamber 11 has a reaction space 12 for accommodating a plurality of powders 121 . When the vacuum chamber 11 is stationary, the powders 121 will be deposited on the bottom of the reaction space 12 by gravity. The powder 121 can be a quantum dot (Quantum Dot), such as ZnS, CdS, CdSe and other II-VI semiconductors material, and the thin film formed on the quantum dots may be aluminum oxide (Al2O3). The vacuum chamber 11 may include a cover plate 111 and a cavity 113 , wherein an inner surface 1111 of the cover plate 111 is used to cover the cavity 113 and form the reaction space 12 therebetween.

In an embodiment of the present invention, a monitoring wafer 115 may be disposed on the inner surface 1111 of the cover plate 111 . When the cover plate 111 covers the cavity 113 , the monitoring wafer 115 will be located in the reaction space 12 . During the atomic layer deposition in the reaction space 12 , a thin film is formed on the surface of the monitoring wafer 115 . In practical application, the film thickness on the surface of the monitoring wafer 115 and the film thickness on the surface of the powder 121 can be further measured, and the relationship between the two can be calculated. Then, the film thickness on the surface of the wafer 115 can be monitored and measured, and the film thickness on the surface of the powder 121 can be converted.

The shaft sealing device 13 includes an outer tube body 131 and an inner tube body 133, wherein the outer tube body 131 has an accommodating space 132, and the inner tube body 133 has a connecting space 134, such as the outer tube body 131 and the inner tube body 133 can be a hollow cylinder. The accommodating space 132 of the outer tube body 131 is used for accommodating the inner tube body 133 , wherein the outer tube body 131 and the inner tube body 133 are coaxially arranged. The shaft seal device 13 may be a common shaft seal or a magnetic fluid shaft seal, and is mainly used to isolate the reaction space 12 of the vacuum chamber 11 from the external space, so as to maintain the vacuum of the reaction space 12 .

The driving unit 15 is connected to one end of the shaft sealing device 13 , and drives the vacuum chamber 11 to rotate through the shaft sealing device 13 .

The driving unit 15 can be connected to and drive the outer tube body 131 and the vacuum chamber 11 to continuously rotate in the same direction, for example, clockwise or counterclockwise. In an embodiment of the present invention, the driving unit 15 can be a motor, which is connected to the outer tube 131 through at least one gear 14 , and drives the outer tube 131 and the vacuum chamber 11 to rotate relative to the inner tube 133 through the gear 14 .

At least one non-reactive gas delivery line 171 , at least one intake line 173 , a heater 175 , an exhaust line 177 and/or a temperature sensing unit 179 can be arranged in the connection space 134 of the inner pipe body 133 , as shown in FIG. 2 and shown in Figure 3.

The pumping line 177 is fluidly connected to the reaction space 12 of the vacuum chamber 11, and is used for pumping out the gas in the reaction space 12, so that the reaction space 12 is in a vacuum state, so that the atomic layer deposition process can be performed. Specifically, the pumping line 177 can be connected to a pump, and the gas in the reaction space 12 can be pumped out through the pump.

The gas inlet line 173 is fluidly connected to the reaction space 12 of the vacuum chamber 11, and is used for delivering a precursor gas or a non-reactive gas to the reaction space 12, wherein the non-reactive gas can be an inert gas such as nitrogen or argon. For example, the inlet line 173 can be connected to a precursor gas storage tank and a non-reactive gas storage tank through the valve assembly, and the precursor gas can be transported into the reaction space 12 through the valve assembly, so that the precursor gas is deposited on the surface of the powder 121 . In practical applications, the gas inlet line 173 may transport a carrier gas and the precursor gas into the reaction space 12 together. Then, the non-reactive gas is transported into the reaction space 12 through the valve assembly, and evacuated through the exhaust line 177 to remove the precursor gas in the reaction space 12 . In an embodiment of the present invention, the inlet line 173 can be connected to a plurality of branch lines, and different precursor gases are sequentially transported into the reaction space 12 through each branch line.

In addition, the inlet line 173 can increase the flow rate of the non-reactive gas delivered to the reaction space 12, and blow the powder 121 in the reaction space 12 through the non-reactive gas, so that the powder 121 is driven by the non-reactive gas and diffuses into the reaction space 12 of the various areas.

The vacuum chamber 11 of the present invention includes a blow-down line 117, wherein the blow-down line 117 is connected to the reaction space 12 and faces the bottom or side of the vacuum chamber 11 and the reaction space 12, such as the following The blowing line 117 may be inclined relative to the axis of the vacuum chamber 11 and/or the shaft sealing device 13 . In an embodiment of the present invention, the reaction space 12 can approximate a cylinder or a polygonal cylinder, and includes two bottom surfaces and one side surface, wherein the two bottom surfaces face each other, and the side surface connects the two bottom surfaces.

The non-reactive gas delivery line 171 is used to connect the down blowing line 117 of the vacuum chamber 11 , and deliver a non-reactive gas into the reaction space 12 through the down blowing line 117 to stir the powder 121 in the reaction space 12 . Specifically, the down blowing line 117 can be used to spray the non-reactive gas toward the side and/or bottom of the reaction space 12 to blow the powder 121 deposited on the bottom of the reaction space 12 under the action of gravity.

In an embodiment of the present invention, the disposition direction of the non-reactive gas delivery line 171 is substantially parallel to the axial direction of the shaft sealing device 13 , and has a branch portion 1711 . The branch portion 1711 is close to one end of the inner pipe body 133 connected to the vacuum chamber 11 , wherein the branch portion 1711 penetrates through the inner pipe body 133 and is used to connect the blow-down line 117 , for example, the branch portion 1711 is along the radial direction of the shaft sealing device 13 . set up.

When the outer tube body 131 of the shaft sealing device 13 drives the vacuum chamber 11 to rotate, the blow-down line 117 of the vacuum chamber 11 will rotate relative to the inner tube body 133 of the shaft sealing device 13 and the non-reactive gas delivery line 171 . In an embodiment of the present invention, when the blowdown line 117 is rotated to a certain angle, the blowdown line 117 will be connected to the non-reactive gas delivery line 171 , so that the unreacted gas can be delivered to the blowdown line 117 from the unreacted gas delivery line 171 . .

In an embodiment of the present invention, both the gas inlet line 173 and the non-reactive gas delivery line 171 can be used to deliver the non-reactive gas to the reaction space 12 , wherein the flow rate of the non-reactive gas delivered by the gas inlet line 173 is relatively small, mainly used for In order to remove the precursor gas in the reaction space 12 , the flow rate of the non-reactive gas conveyed by the non-reactive gas transmission line 171 is relatively large, and is mainly used to blow the powder 121 in the reaction space 12 .

When the driving unit 15 of the present invention drives the outer tube body 131 and the vacuum chamber 11 to rotate, the inner tube body 133 and the non-reactive gas delivery line 171 , the air extraction line 177 and the air intake line 173 in the inner tube body 133 will not rotate along with it, which is beneficial to In order to improve the stability of the non-reactive gas and/or the precursor gas delivered to the reaction space 12 by the gas inlet line 173 and/or the non-reactive gas delivery line 171 .

The heater 175 is used for heating the connecting space 134 and the inner pipe body 133 , and heating the exhaust line 177 , the gas inlet line 173 and/or the non-reactive gas transmission line 171 in the inner pipe body 133 through the heater 175 . The temperature sensing unit 179 is used to measure the temperature of the heater 175 or the connection space 134 to know the working state of the heater 175 . Of course, another heating device is usually disposed inside, outside or around the vacuum chamber 11 , wherein the heating device is adjacent to or in contact with the vacuum chamber 11 and used to heat the vacuum chamber 11 and the reaction space 12 .

In an embodiment of the present invention, as shown in FIG. 4 , at least one sealing ring, such as the first sealing ring 161 and/or the second sealing ring 163 , may be disposed between the shaft sealing device 13 and/or the vacuum chamber 11 , wherein The connection position of the non-reactive gas delivery line 171 and the blowdown line 117 is located between the two seal rings.

In practical application, the first sealing ring 161 is located between the inner pipe body 133 and the vacuum chamber 11 , and the second sealing ring 163 is located between the outer pipe body 131 and the vacuum chamber 11 , wherein the first sealing ring 161 is a dynamic sealing ring, and the second sealing ring 163 is a static sealing ring. For example, the first sealing ring 161 can be sleeved on the inner tube body 133, and is a Teflon O-ring (Teflonoring), and the second sealing ring 163 is a rubber O-ring. The first and second sealing rings 161/163 between the shaft seal device 13 and the vacuum chamber 11 are only one embodiment of the present invention. In different embodiments, only the first seal ring 161/163 can be provided between the shaft seal device 13 and the vacuum chamber 11. The sealing ring 161 can achieve the purpose of sealing the reaction space 12 .

In an embodiment of the present invention, a filter unit 139 may be disposed between the vacuum chamber 11 or the shaft sealing device 13 , wherein the exhaust line 177 , the intake line 173 and/or the non-reactive gas are arranged in the inner pipe body 133 The delivery line 171 is fluidly connected to the reaction space 12 of the vacuum chamber 11 via the filter unit 139 .

In an embodiment of the present invention, as shown in FIG. 5 , the intake line 173 can extend from the connection space 134 of the inner pipe body 133 to the reaction space 12 of the vacuum chamber 11 , and is formed in the reaction space 12 of the vacuum chamber 11 An extension tube 172 . At least one air outlet 1721 may be disposed on the end and/or the tube wall of the extension tube 172 , and the extension tube 172 may deliver precursor gas or non-reactive gas to the reaction space 12 through the air outlet 1721 .

In an embodiment of the present invention, as shown in FIG. 6 , a transition space 18 may be provided between the non-reactive gas delivery line 171 and the blowdown line 117 , wherein the transition space 18 may be provided in the inner tube of the shaft sealing device 13 on the body 133 and/or the vacuum chamber 11 , and facilitates the alignment of the non-reactive gas delivery line 171 and the blowdown line 117 . The cross-sectional area of the transfer space 18 is larger than that of the non-reactive gas delivery line 171 and the blow-down line 117. When the vacuum chamber 11 rotates relative to the inner tube body 133 of the shaft sealing device 13, the non-reactive gas delivery line 171 can pass through the transfer space 18 is fluidly connected to down blow line 117 .

The transition space 18 can be a part of the down blowing line 117, so that the position where the down blowing line 117 is connected to the non-reactive gas delivery line 171 has a larger cross-sectional area. shape. In another embodiment of the present invention, the transition space 18 can be an annular body and surrounds the inner tube body 133, so that the non-reactive gas delivery line 171 disposed in the inner tube body 133 can pass through the annular turnaround. The connecting space 18 is continuously connected to the down blowing line 117, and the non-reactive gas is continuously transported to the reaction space 12 through the down blowing line 117. For example, the output non-reacting gas will rotate with the down blowing line 117 and blow to the different reaction spaces 12. angle.

In an embodiment of the present invention, as shown in FIG. 7 and FIG. 8 , the vacuum chamber 11 and the shaft sealing device 13 can be designed as two independent components. During atomic layer deposition, as shown in FIG. 7 , the vacuum chamber 11 can be connected to the shaft sealing device 13 , and the vacuum chamber 11 and the shaft sealing device 13 can be fixed through the fixing unit 112 , for example, the fixing unit 112 is a screw, so that the driving The unit 15 can drive the vacuum chamber 11 to rotate through the shaft sealing device 13 . After the atomic layer deposition is completed, the locking of the fixing unit 112 can be released, and the vacuum chamber 11 can be removed from the shaft sealing device 13 .

In an embodiment of the present invention, as shown in FIG. 8 , a concave portion 114 may be disposed on the bottom 116 of the vacuum chamber 11 , and a first sealing ring 161 is disposed in the concave portion 114 . The inner tube body 133 of the shaft sealing device 13 partially protrudes from the outer tube body 131 , and a second sealing ring 163 is provided on the side of the outer tube body 131 connected to the bottom 116 of the vacuum chamber 11 .

When the protruding inner tube 133 is inserted into the recess 114 of the vacuum chamber 11 , the protruding inner tube 133 will press the first sealing ring 161 in the recess 114 , and the bottom 116 or the recess 114 of the vacuum chamber 11 will press The second sealing ring 163 provided on the outer tube body 131 of the shaft sealing device 13 . The above-mentioned number and arrangement position of the first sealing ring 161 , the second sealing ring 163 and/or the concave portion 114 are only a specific embodiment of the present invention, and are not intended to limit the scope of the rights of the present invention.

In an embodiment of the present invention, the concave portion 114 can extend from the bottom 116 of the vacuum chamber 11 into the reaction space 12 , and the inner tube 133 of the shaft sealing device 13 extends from the accommodating space 132 of the outer tube 131 to the outside. And the shaft sealing device 13 and the outer tube body 131 are protruded. When connecting the vacuum chamber 11 and the shaft sealing device 13 , the inner tube body 133 protruding from the shaft sealing device 13 can be inserted into the concave portion 114 , wherein the inner tube body 133 of the shaft sealing device 13 is enclosed by the accommodating space 132 of the outer tube body 131 . It extends to the concave portion 114 of the vacuum chamber 11 and/or the reaction space 12 .

The above description is only a preferred embodiment of the present invention, and is not intended to limit the scope of the present invention. Modifications should be included within the scope of the patent application of the present invention.

10: Powder atomic layer deposition machine with down blowing line

11: Vacuum chamber

111: Cover

1111: inner surface

113: Cavity

115: Monitor Wafers

117: Down blow line

12: Reaction Space

121: Powder

13: Shaft seal device

131: outer tube body

132: accommodating space

133: inner tube body

134: Connect Space

14: Gear

15: Drive unit

171: Non-reactive gas delivery line

1711: Branches

175: Heater

177: Exhaust line

Claims (9)

A powder atomic layer deposition machine with a blow-down pipeline, comprising: a drive unit; a shaft seal device connected to the drive unit; a vacuum cavity connected to the shaft seal device, the drive unit drives the vacuum through the shaft seal device The cavity is rotated, and the vacuum cavity includes: a cover plate and a cavity, an inner surface of the cover plate covers the cavity to form a reaction space therebetween, and is arranged on the inner surface of the cover plate a monitoring wafer, wherein the reaction space is used for accommodating a plurality of powders, and the powders are deposited on a bottom of the reaction space by gravity; and a blow-down line is connected to the reaction space and faces the bottom of the reaction space; At least one suction line is located in the shaft sealing device, and is fluidly connected to the reaction space of the vacuum chamber, and is used to extract a gas in the reaction space; at least one air intake line is located in the shaft sealing device and is fluidly connected to the The reaction space of the vacuum chamber is used to deliver a precursor gas to the reaction space; and at least one non-reactive gas delivery line is located in the shaft sealing device and used to connect the blow down line of the vacuum chamber, Wherein the non-reactive gas conveying line is used for conveying a non-reactive gas to the reaction space through the down blowing line, so as to be blown to the bottom of the reaction space. The powder atomic layer deposition machine having a down blowing line as claimed in claim 1, wherein the shaft sealing device comprises an outer tube body and an inner tube body, and the outer tube body includes an accommodating space for accommodating the inner tube body A pipe body, and the inner pipe body includes at least one connecting space for accommodating the air extraction line, the air intake line and the non-reactive gas delivery line. The powder atomic layer deposition machine having a down blowing line according to claim 2, wherein the non-reactive gas conveying line comprises a branch part, the branch part penetrates the inner pipe body and is used for connecting the down blowing line. The powder atomic layer deposition machine with down blowing line as claimed in claim 2, wherein the vacuum chamber or the inner pipe body includes a transition space, and the non-reactive gas delivery line is connected to the down blowing line via the transition space , a cross-sectional area of the transition space is larger than that of the non-reactive gas delivery pipeline and the blowdown pipeline. The powder atomic layer deposition machine with a blow-down line as claimed in claim 4, wherein the transition space is an annular body surrounding the inner tube body. The powder atomic layer deposition machine with a blow-down line as claimed in claim 2 includes a first sealing ring located between the inner pipe body and the vacuum chamber. The powder atomic layer deposition machine with down blowing line as claimed in claim 6, comprising a second sealing ring located between the outer pipe body and the vacuum chamber, wherein the non-reactive gas conveying line and the down blowing line are connected to each other. The connection position is between the first sealing ring and the second sealing ring. The powder atomic layer deposition machine having a blow-down line as claimed in claim 1 includes an extension pipe body connected to the air inlet line, and the extension pipe body is located in the reaction space of the vacuum chamber. The powder atomic layer deposition machine with down blowing line as claimed in claim 1, comprising at least one fixing unit for fixing the vacuum chamber body on the shaft sealing device, after the connection unit is unlocked, the vacuum chamber The body is removed from the shaft seal device.

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