TWM619999U - Opening and closing type shielding member and thin film deposition device with opening and closing type shielding member - Google Patents

Abstract

The present model provides a thin film deposition device with an opening and closing type shielding member, which mainly includes a reaction chamber, a carrying plate and an opening and closing type shielding member, wherein part of the opening and closing type shielding member and the carrying plate are located in the reaction chamber. The opening and closing shielding member includes a first shielding plate, a second shielding plate and a driving device, wherein the driving device is connected to the first shielding plate and the second shielding plate, and is used to drive the first shielding plate and the second shielding plate in opposite directions swing. During the deposition process, the driving device drives the first and second shielding plates to move away from each other and switch to an open state. During the cleaning process, the driving device will drive the first and second shielding plates to approach each other and switch to a shielding state to shield the carrier plate, so as to avoid contamination of the carrier plate during the cleaning of the thin film deposition device.

Description

Opening and closing type shielding member and film deposition device with opening and closing type shielding member

The present invention relates to a thin film deposition device with an opening and closing type shielding member. The opening and closing type shielding member mainly shields a carrying tray to avoid contamination of the carrying tray in the process of cleaning a processing chamber.

Chemical vapor deposition (CVD), physical vapor deposition (PVD) and atomic layer deposition (ALD) are all commonly used thin film deposition equipment, and are commonly used in integrated circuits, light-emitting diodes, and display manufacturing processes.

The deposition equipment mainly includes a cavity and a wafer carrier. The wafer carrier is located in the cavity and used to carry at least one wafer. Taking physical vapor deposition as an example, a target material needs to be set in the cavity, where the target material faces the wafer on the wafer carrier tray. During physical vapor deposition, inert gas and/or reactive gas can be delivered into the cavity, bias voltage is applied to the target and the wafer carrier respectively, and the wafer carried by the wafer carrier is heated through the wafer carrier.

The inert gas in the cavity forms ionized inert gas due to the action of the high-voltage electric field, and the ionized inert gas will be attracted by the bias on the target material and bombard the target material. The target atoms or molecules sputtered from the target are attracted by the bias voltage on the wafer carrier and are deposited on the surface of the heated wafer to form a thin film on the surface of the wafer.

After a period of use, a deposited film will be formed on the inner surface of the cavity. Therefore, the cavity needs to be cleaned periodically to prevent the deposited film from falling during the manufacturing process and contaminating the wafer. In addition, oxides or other contaminants may also form on the surface of the target, so it is also necessary to clean the target periodically. Generally speaking, a burn-in process is used to strike a target in the cavity with plasma ions to remove oxides or other contaminants on the surface of the target.

When cleaning the cavity and the target, it is necessary to remove the wafer carrier and the wafer from the cavity or isolate the wafer carrier to avoid contamination of the wafer carrier and wafer during the cleaning process.

Generally speaking, after a period of use, the thin film deposition device usually needs to be cleaned to remove the oxide or nitride on the thin film deposited in the chamber and the target material. The particles generated during the cleaning process will contaminate the carrier plate, so it is necessary to isolate the carrier plate and contaminants. The present model proposes an opening and closing shielding member and a thin film deposition device with the opening and closing shielding member. The driving device drives two shielding plates to swing in opposite directions, so that the two shielding plates operate in an open state and a shielding state. The shielding plate operating in the shielding state can be used to shield the carrier tray to avoid contamination of the carrier tray with particles generated when cleaning the cavity or the target material.

An object of the present invention is to provide a thin film deposition device with an opening and closing type shielding member, which mainly includes a reaction chamber, a supporting tray and an opening and closing type shielding member. The opening-closing shielding member includes a driving device and two shielding plates, wherein the driving device is connected to and drives the two shielding plates to swing in opposite directions respectively, so that the two shielding plates operate in an open state and a shielding state.

When cleaning the reaction chamber, the driving device drives the two shielding plates to approach each other in a swinging manner, so that the two shielding plates are close to each other and shield the carrier plate in the accommodating space, so as to avoid the plasma used in the cleaning process or generated Contamination contacts the carrier plate and/or the substrate it carries. During the deposition process, the driving device drives the two shielding plates to move away from each other in a swinging manner, and can deposit thin films on the substrate in the reaction chamber.

An object of the present invention is to provide a thin film deposition device with an open-close type shielding member, which mainly constitutes a complete shielding piece through two shielding plates, which can reduce the space required for storing the shielding plates. In an embodiment of the present invention, the two shielding plates can swing in opposite directions in the accommodating space of the reaction chamber, and the two shielding plates can be operated in the open state or the shielded state in the accommodating space of the reaction chamber. , Can simplify the structure of the reaction chamber and reduce the volume of the reaction chamber.

An object of the present invention is to provide a thin film deposition device with an open-close type shielding member, wherein the driving device is connected to and carries two shielding plates through two connecting arms respectively, so as to reduce the load of the connecting arms. In addition, a shielding plate with a larger thickness can be further used to prevent high-temperature deformation of the shielding plate when cleaning the thin film deposition device, and to improve the effect of the shielding plate to shield the carrier plate.

In order to achieve the above objective, the present invention proposes a thin film deposition device, which includes: a reaction chamber, including an accommodating space; a carrying tray, located in the accommodating space, and used to carry at least one substrate; and an opening and closing type shielding member , Including: a first shielding plate located in the accommodating space; a second shielding plate located in the accommodating space; a driving device connected to the first shielding plate and the second shielding plate, and respectively driving the first shielding plate and The second shielding plate swings in the opposite direction, so that the first shielding plate and the second shielding plate are switched between an open state and a shielding state, wherein the first shielding plate and the second shielding plate in the shielding state are used to shield the carrier tray .

The present model proposes an opening and closing shielding member suitable for a thin film deposition device, comprising: a first shielding plate; a second shielding plate; and a driving device, which is connected to the first shielding plate and the second shielding plate, and drives the A shielding plate and a second shielding plate swing in opposite directions, so that the first shielding plate and the second shielding plate switch between an open state and a shielding state, wherein the first shielding plate in the shielding state is close to the second shielding plate, A space is formed between the first shielding plate and the second shielding plate in the open state.

In the thin film deposition device and the opening and closing type shielding member, the driving device includes a shaft sealing device and at least one driving motor, and the driving motor is connected to the first shielding plate and the second shielding plate through the shaft sealing device.

In the thin film deposition device and the opening and closing type shielding member, the shaft sealing device includes an outer tube body and a shaft body, the outer tube body includes a space for accommodating the shaft body, and the driving motor is connected to the first shielding plate through the outer tube body, The second shielding plate is connected through the shaft body, and the shaft body and the outer tube body are synchronously driven to rotate in opposite directions.

The thin film deposition device and the opening and closing type shielding member include a first connecting arm and a second connecting arm. The outer tube body is connected to the first shielding plate through the first connecting arm, and the shaft body is connected to the second connecting arm through the second connecting arm. Two shielding board.

The thin film deposition device and the open-close type shielding member include a plurality of position sensing units arranged in the reaction chamber and used for sensing the positions of the first shielding plate and the second shielding plate.

In the thin film deposition device and the open-close shielding member, the area of the first shielding plate is larger than the area of the second shielding plate.

Please refer to FIG. 1, which is a schematic side sectional view of an embodiment of the new thin film deposition device operating in a shielded state. As shown in the figure, the thin film deposition apparatus 10 mainly includes a reaction chamber 11, a carrier plate 13 and an opening and closing shielding member 100, wherein the reaction chamber 11 includes an accommodating space 12 for accommodating the carrier plate 13 and part of the The opening and closing type shielding member 100.

The carrier plate 13 is located in the accommodating space 12 of the reaction chamber 11 and is used to carry at least one substrate 163. Taking the thin film deposition apparatus 10 as a physical vapor deposition chamber as an example, a target 161 is set in the reaction chamber 11, wherein the target 161 faces the substrate 163 and the carrier plate 13. For example, the target 161 may be disposed on the upper surface of the reaction chamber 11 and face the carrier plate 13 and/or the substrate 163 in the accommodating space 12.

Please refer to FIGS. 2 and 3 together, the opening and closing shielding member 100 includes a first shielding plate 151, a second shielding plate 153 and a driving device 17, wherein the first shielding plate 151 and the second shielding plate 153 are located in the accommodating space Within 12. The driving device 17 connects the first shielding plate 151 and the second shielding plate 153, and drives the first shielding plate 151 and the second shielding plate 153 to swing in opposite directions, for example, the first shielding plate 151 and the second shielding plate 153 drive the device 17 is the axis swing synchronously.

In an embodiment of the present invention, the driving device 17 is connected to a first connecting arm 141 and a second connecting arm 143, and is connected to the first shielding plate 151 and the second shielding plate 151 through the first connecting arm 141 and the second connecting arm 143, respectively. The shielding plate 153, wherein the driving device 17 drives the first shielding plate 151 and the second shielding plate 153 to swing or rotate in opposite directions through a first connecting arm 141 and a second connecting arm 143, respectively.

The first shielding plate 151 and the second shielding plate 153 can be plate bodies. The area and shape of the first shielding plate 151 and the second shielding plate 153 can be similar. For example, the first shielding plate 151 and the second shielding plate 153 can be Semi-circular plate body. When the driving device 17 drives the first shielding plate 151 and the second shielding plate 153 to close, the first shielding plate 151 and the second shielding plate 153 will approach each other to form a disc-shaped shielding member 15, and the shielding member 15 shields the load. The disk 13 and/or the substrate 163.

The first shielding plate 151 and the second shielding plate 153 described in the embodiment of the present invention are operated in the shielding state or the first shielding plate 151 and the second shielding plate 153 are connected, which can be defined as the first shielding plate 151 and the second shielding plate. The plates 153 are close to each other until the distance between the two is less than a threshold value, for example, less than 1 mm. Specifically, the first shielding plate 151 and the second shielding plate 153 do not directly contact, so as to prevent the first shielding plate 151 and the second shielding plate 153 from generating particles during the contact process and polluting the accommodation of the reaction chamber 11 Space 12 and/or carrier plate 13.

In an embodiment of the present invention, the first shielding plate 151 and the second shielding plate 153 can be set at different heights. For example, the first shielding plate 151 is higher than the second shielding plate 153. When the plate 153 is operated in the shielding state, part of the first shielding plate 151 and part of the second shielding plate 153 will overlap, which can improve the shielding effect of the shield 15.

The area and shape of the above-mentioned first shielding plate 151 and the second shielding plate 153 are similar, and the semicircular plate body is only an embodiment of the present invention, and is not a limitation of the scope of rights of the present invention. In practical applications, the first shielding plate 151 and the second shielding plate 153 can be plates with different areas and shapes, or can be square, elliptical, or any geometrical shape, such as the area of the first shielding plate 151 The area of the second shielding plate 153 may be larger. As long as the shielding member 15 is composed of the first shielding plate 151 and the second shielding plate 153, when the first shielding plate 151 and the second shielding plate 153 are closed, they can achieve the purpose of shielding the carrier plate 13 and/or the substrate 163. The scope of rights of the present model.

Taking the first shielding plate 151 and the second shielding plate 153 as a semicircular plate body as an example, the first shielding plate 151 and the second shielding plate 153 have straight sides and semicircular or arc-shaped sides, respectively. The linear sides of the first shielding plate 151 and the second shielding plate 153 face each other. When the driving device 17 drives the first shielding plate 151 and the second shielding plate 153 to approach each other, the linear sides of the first shielding plate 151 and the second shielding plate 153 will approach and form a circular shielding member 15. The connection of the first shielding plate 151 and the second shielding plate 153 through straight sides is only an embodiment of the present invention, and is not a limitation of the scope of rights of the present invention. In practical applications, the linear sides of the first shielding plate 151 and the second shielding plate 153 can also be corresponding curved or zigzag sides, as long as the first shielding plate 151 and the second shielding plate 153 are connected to the side It can be approached and combined, and both can effectively shield the carrier plate 13.

In an embodiment of the present invention, as shown in FIG. 4, the driving device 17 includes at least one driving motor 171 and a shaft sealing device 173, wherein the driving motor 171 is connected to the first shielding plate 151 and the second shielding plate 153 through the shaft sealing device 173 . The driving motor 171 is located outside the accommodating space 12 of the reaction chamber 11, and the shaft sealing device 173 passes through and is disposed in the reaction chamber 11, and part of the shaft sealing device 173 is located in the accommodating space 12 of the reaction chamber 11.

The shaft sealing device 173 includes an outer tube body 1731 and a shaft body 1733. The outer tube body 1731 includes a space 1732 for accommodating the shaft body 1733, wherein the outer tube body 1731 and the shaft body 1733 are coaxially arranged, and the outer tube body 1731 and the shaft body 1733 can rotate relatively. The outer tube body 1731 is connected to the first connecting arm 141, and is connected via the first connecting arm 141 to drive the first shielding plate 151 to swing. The shaft 1733 is connected to the second connecting arm 143 and connected via the second connecting arm 143 to drive the second shielding plate 153 to swing.

The shaft sealing device 173 may be a common shaft seal, and is mainly used to isolate the accommodating space 12 of the reaction chamber 11 from an external space, so as to maintain the vacuum of the accommodating space 12. In another embodiment of the present invention, the shaft sealing device 173 may be a magnetic fluid shaft seal, and includes a plurality of bearings, at least one permanent magnet, at least one pole piece, and at least one magnetic fluid. For example, the bearing can be sleeved on the outer surface of the shaft body 1733 and located between the shaft body 1733 and the outer tube body 1731, so that the shaft body 1733 and the outer tube body 1731 can rotate relatively. The permanent magnet is arranged on the inner surface of the outer tube body 1731 and located between the two bearings. Two magnetic pole pieces are arranged on the inner surface of the outer tube body 1731, and are respectively located between the permanent magnet and the two bearings. There is a gap between the pole piece and the outer surface of the shaft body 1733, and the magnetic fluid is arranged in the gap. The above-mentioned structure of the magnetic fluid shaft seal is only an embodiment of the present invention, and is not a limitation of the scope of the rights of the present invention.

In an embodiment of the present invention, as shown in FIG. 4, the number of driving motors 171 may be two, and the two driving motors 171 are respectively connected to the outer tube body 1731 and the shaft body 1733 of the shaft sealing device 173, and drive the outer tube separately The body 1731 and the shaft body 1733 rotate in opposite directions synchronously to drive the first shielding plate 151 and the second shielding plate 153 to swing in different directions through the outer tube body 1731 and the shaft body 1733, respectively.

In another embodiment of the present invention, as shown in FIG. 5, the number of the driving motor 171 can be one, and the first shielding plate is respectively connected and driven by a linkage mechanism 18 through the first connecting arm 141 and the second connecting arm 143 151 and the second shielding plate 153 synchronously swing in opposite directions. Specifically, the linkage mechanism 18 includes a driving gear 181, a first driven gear 183 and a second driven gear 185, wherein the driving gear 181 meshes with the first driven gear 183 and the second driven gear 185. The first driven gear 183 is connected to the first shielding plate 151 through the outer tube body 1731 and the first connecting arm 141, and the second driven gear 185 is connected to the second shielding plate 153 through the shaft 1733 and the second connecting arm 143. When the driving gear 181 rotates, the first driven gear 183 and the second driven gear 185 will rotate in opposite directions, and drive the outer tube body 1731 and the shaft body 1733 to rotate in opposite directions to drive the first shielding plate 151 and the The two shielding plates 153 swing in opposite directions synchronously.

The linkage mechanism 18 including three gears is only an embodiment of the present invention. In different embodiments, the linkage mechanism 18 may include a plurality of runners and a plurality of belts. The driving motor 171 is connected to one of the runners through the runner and the belt. Drive the outer tube body 1731 and the shaft body 1733 to rotate in opposite directions.

Specifically, the thin film deposition apparatus 10 and/or the open-close shielding member 100 of the present invention can be operated in two states, namely the open state and the shielding state. As shown in Figures 2 and 6, the driving device 17 can drive the first shielding plate 151 and the second shielding plate 153 to swing in opposite directions, so that the first shielding plate 151 and the second shielding plate 153 are separated from each other and operated in the open state . A space 152 is formed between the first shielding plate 151 and the second shielding plate 153 operating in the open state, so that there is no first shielding plate 151 and second shielding plate between the target 161 and the carrier plate 13 and the substrate 163 153.

Then, the carrier plate 13 and the substrate 163 can be driven to approach the target 161, and the gas in the accommodating space 12, such as an inert gas, strikes the target 161 to deposit a thin film on the surface of the substrate 163.

In an embodiment of the present invention, as shown in FIG. 1, the accommodating space 12 of the reaction chamber 11 may be provided with a stopper 111, wherein one end of the stopper 111 is connected to the reaction chamber 11, and the other end of the stopper 111 is An opening 112 is formed. When the carrier plate 13 approaches the target 161, it enters or contacts the opening 112 formed by the stopper 111. The reaction chamber 11, the carrier plate 13 and the stopper 111 partition a reaction space in the accommodating space 12, and deposit a thin film on the surface of the substrate 163 in the reaction space, which can prevent the reaction chamber 11 and the reaction space outside the reaction space. A deposited film is formed on the surface of the carrier plate 13.

In addition, as shown in FIGS. 3 and 7, the driving device 17 can drive the first shielding plate 151 and the second shielding plate 153 to swing in opposite directions, so that the first shielding plate 151 and the second shielding plate 153 are close to each other and operate at Covered state. The closed first shielding plate 151 and the second shielding plate 153 can form the shielding member 15, wherein the shielding member 15 is located between the target 161 and the carrier plate 13, and is used to shield the carrier plate 13 to isolate the target material 161 and the carrier plate 13.

The shielding member 15 may partition a clean space 121 in the accommodating space 12, wherein the clean space 121 and the reaction space partially overlap or are close to each other. A burn-in process can be performed in the clean space 121 to clean the target 161 and the reaction chamber 11 and/or the stopper 111 in the clean space 121, and to remove oxides and nitrides on the surface of the target 161 Or other contaminants, and the deposition film on the surface of the reaction chamber 11 and/or the stopper 111.

In the process of cleaning the thin film deposition apparatus 10, the carrier plate 13 and/or the substrate 163 will be shielded or isolated by the shielding member 15 to avoid contamination or deposition on the surface of the carrier plate 13 and/or the substrate 163 by substances generated during the cleaning process.

Specifically, the present invention constitutes the shield 15 through the first shielding plate 151 and the second shielding plate 153, and carries the first shielding plate 151 and the second shielding plate 153 through the first connecting arm 141 and the second connecting arm 143, respectively. The weight can reduce the burden of the first connecting arm 141 and the second connecting arm 143.

By using the two connecting arms 141/143 to respectively carry the weight of part of the shielding plate 151/153, the thickness or weight of the first shielding plate 151 and the second shielding plate 153 can be further increased. The thicker first shielding plate 151 and the second shielding plate 153 can avoid high temperature deformation during the cleaning of the thin film deposition device 10, and can prevent plasma or pollution during the cleaning process from passing through the deformed first shielding plate 151 and the second shielding plate 151 The two shielding plates 153 contact the carrier plate 13 or the substrate 163 below.

In addition, the shielding member 15 is divided into two first shielding plate 151 and second shielding plate 153 that can be connected and separated, which is more conducive to reducing the storage space required by the first shielding plate 151 and the second shielding plate 153 in the open state. , And the structure of the reaction chamber 11 can be simplified or adjusted.

In an embodiment of the present invention, as shown in FIGS. 6 and 7, the first shielding plate 151 and the second shielding plate 153 can be operated in the open state and the shielded state in the accommodating space 12 of the reaction chamber 11, without One or more storage cavities need to be additionally provided to store the shielding plate in the open state. For example, the volume of the reaction chamber 11 and/or the accommodating space 12 can be slightly larger than the original volume, so that the first shielding plate 151 and the second shielding plate 153 can be opened or closed in the accommodating space 12 of the reaction chamber 11.

In an embodiment of the present invention, a plurality of position sensing units 19 may be further provided on the reaction chamber 11, wherein the position sensing units 19 face the accommodating space 12 and are used to sense the first shielding plate 151 and the second shielding The position of the plate 153 is used to determine whether the first shielding plate 151 and the second shielding plate 153 are in the open state. For example, the position sensing unit 19 may be a light sensing unit.

If the first shielding plate 151 and the second shielding plate 153 are not fully opened, the carrier tray 13 will be displaced toward the target 161, which may cause the carrier tray 13 to collide with the first shielding plate 151 and the second shielding plate 153, and This causes damage to the carrier plate 13, the first shielding plate 151 and/or the second shielding plate 153. In practical applications, the position of the position sensing unit 19 can be adjusted, and the first shielding plate 151 and the second shielding plate 153 will be sensed by the position sensing unit 19 only after opening to a specific angle. Only then can the carrier plate 13 approach the target 161 to avoid the carrier plate 13, the first shielding plate 151 and the second shielding plate 153 from colliding.

In practical applications, the position of the open-close shielding member 100 in the reaction chamber 11 can be adjusted according to the configuration of other mechanisms or moving lines on the thin film deposition apparatus 10. Taking the accommodating space 12 of the reaction chamber 11 as a square as an example, as shown in FIGS. 6 and 7, the driving device 17 of the opening and closing shielding member 100 can be arranged on the side of the reaction chamber 11 and/or the accommodating space 12 side. As shown in FIG. 8, the driving device 17 of the opening and closing shielding member 100 can also be arranged at or close to the corner or top corner of the reaction chamber 11/or the accommodating space 12, so as to facilitate the provision of a substrate feeding port on the side of the reaction chamber 11. And pumping pipelines and other institutions.

The foregoing is only one of the preferred embodiments of the present invention, and is not used to limit the scope of implementation of the present invention, that is, all the equivalent changes and changes in the shape, structure, characteristics and spirit described in the scope of the patent application of the present invention Modifications should be included in the scope of the patent application for this new model.

10: Thin film deposition device 100: Open and close shielding member 11: Reaction chamber 111: stop 112: opening 12: accommodating space 121: clean space 13: Carrier plate 141: First connecting arm 143: second connecting arm 15: Shield 151: The first shielding board 152: Interval 153: The second shielding board 161: Target 163: Substrate 17: Drive 171: drive motor 173: Shaft seal device 1731: Outer tube body 1732: space 1733: Shaft 18: Linkage mechanism 181: drive gear 183: First driven gear 185: second driven gear 19: Position sensing unit

[Fig. 1] is a schematic side view of an embodiment of a new type of film deposition device with an open-close type shielding member operating in a shielded state.

[Fig. 2] is a three-dimensional schematic diagram of an embodiment of the open-close type shielding member of the new thin film deposition apparatus operating in an open state.

[Fig. 3] is a three-dimensional schematic diagram of an embodiment of the opening and closing type shielding member of the new thin film deposition device operating in the shielding state.

[Fig. 4] is a three-dimensional cross-sectional schematic diagram of an embodiment of the driving device of the novel opening and closing type shielding member.

[Figure 5] is a three-dimensional schematic diagram of an embodiment of the linkage mechanism of the novel open-close shielding member.

[Fig. 6] is a top view of an embodiment of the new thin film deposition device with an open-close type shielding member operating in an open state.

[Fig. 7] is a top view of an embodiment of a new type of thin film deposition device with an open-close type shielding member operating in a shielded state.

[Fig. 8] is a top view of another embodiment of the novel thin film deposition apparatus with an open-close type shielding member operating in an open state.

10: Thin film deposition device

100: Open and close shielding member

11: Reaction chamber

111: stop

112: opening

12: accommodating space

121: clean space

13: Carrier plate

141: First connecting arm

143: second connecting arm

15: Shield

151: The first shielding board

153: The second shielding board

161: Target

163: Substrate

17: Drive

Claims (10)

A thin film deposition device, including: A reaction chamber, including an accommodating space; A carrying tray located in the accommodating space and used for carrying at least one substrate; and A block, one end of the block is connected to the reaction chamber, and the other end of the block forms an opening; An opening and closing shielding member, including: A first shielding plate located in the accommodating space; A second shielding plate located in the accommodating space; A driving device connects the first shielding plate and the second shielding plate, and drives the first shielding plate and the second shielding plate to swing in opposite directions, so that the first shielding plate and the second shielding plate are at Switching between an open state and a shielding state, wherein the first shielding plate and the second shielding plate in the shielding state are close to each other and used for shielding the carrier tray. The thin film deposition apparatus according to claim 1, wherein the driving device includes a shaft sealing device and at least one driving motor, and the driving motor is connected to the first shielding plate and the second shielding plate through the shaft sealing device. The thin film deposition apparatus according to claim 2, wherein the shaft sealing device includes an outer tube body and a shaft body, the outer tube body includes a space for accommodating the shaft body, and the drive motor is connected to the shaft through the outer tube body. The first shielding plate is connected to the second shielding plate through the shaft body, and synchronously drives the shaft body and the outer tube body to rotate in opposite directions. The thin film deposition apparatus according to claim 3, comprising a first connecting arm and a second connecting arm, the outer tube body is connected to the first shielding plate through the first connecting arm, and the shaft body is through the second connecting arm. The connecting arm is connected to the second shielding plate. The thin film deposition apparatus according to claim 1, comprising a plurality of position sensing units arranged in the reaction chamber and used for sensing the positions of the first shielding plate and the second shielding plate. The thin film deposition apparatus according to claim 1, wherein the area of the first shielding plate is larger than the area of the second shielding plate. An opening and closing type shielding member suitable for a thin film deposition device, including: A first shielding plate; A second shielding plate, wherein the height of the first shielding plate is higher than that of the second shielding plate; and A driving device connects the first shielding plate and the second shielding plate, and drives the first shielding plate and the second shielding plate to swing in opposite directions, so that the first shielding plate and the second shielding plate are at Switch between an open state and a shielding state, wherein part of the first shielding plate and part of the second shielding plate in the shielding state overlap, and between the first shielding plate and the second shielding plate in the open state Form a space. The opening and closing shielding member according to claim 7, wherein the driving device includes a shaft sealing device and at least one driving motor, and the driving motor is connected to the first shielding plate and the second shielding plate through the shaft sealing device. The opening and closing shielding member according to claim 8, wherein the shaft sealing device includes an outer tube body and a shaft body, the outer tube body includes a space for accommodating the shaft body, and the drive motor is connected through the outer tube body The first shielding plate is connected to the second shielding plate through the shaft body, and synchronously drives the shaft body and the outer tube body to rotate in opposite directions. The opening and closing shielding member according to claim 7, wherein the area of the first shielding plate is larger than the area of the second shielding plate.

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