TWM619998U - Shielding device and deposition equipment having shielding device - Google Patents

Abstract

The present model provides a deposition equipment with a shielding device, which mainly includes a reaction chamber, a supporting tray and a shielding device, wherein part of the shielding device and the carrying tray are located in the reaction chamber. The shielding device includes two shielding plates and a driving device, wherein the driving device is connected and drives the two shielding plates to swing in opposite directions. The two shielding plates respectively include a side surface facing each other, and the two side surfaces are respectively provided with a concave portion and a convex portion. During the deposition process, the driving device drives the two shielding plates to move away from each other and switch to the open state. During the cleaning process, the driving device drives the two shielding plates to approach each other and switch to the shielding state. The convex part of one shielding plate enters the concave part of the other shielding plate and can effectively shield the carrier plate.

Description

Shielding device and deposition equipment with shielding device

The present invention relates to a deposition equipment with a shielding device, which mainly completely shields a carrying plate through the shielding device, so as to avoid contamination of the carrying plate in the process of cleaning a processing chamber.

Chemical Vapor Deposition (CVD), Physical Vapor Deposition (PVD) and Atomic Layer Deposition (ALD) are all commonly used deposition equipment, and are commonly used in integrated circuits, light-emitting diodes, and display manufacturing processes.

The deposition equipment mainly includes a cavity and a wafer carrier. The wafer carrier is located in the cavity and used to carry at least one wafer. Taking physical vapor deposition as an example, a target material needs to be set in the cavity, where the target material faces the wafer on the wafer carrier tray. During physical vapor deposition, inert gas and/or reactive gas can be delivered into the cavity, bias voltage is applied to the target and the wafer carrier respectively, and the wafer carried by the wafer carrier is heated through the wafer carrier.

The inert gas in the cavity forms ionized inert gas due to the action of the high-voltage electric field, and the ionized inert gas will be attracted by the bias on the target material and bombard the target material. The target atoms or molecules sputtered from the target are attracted by the bias voltage on the wafer carrier and are deposited on the surface of the heated wafer to form a thin film on the surface of the wafer.

After a period of use, a deposited film will be formed on the inner surface of the cavity. Therefore, the cavity needs to be cleaned periodically to prevent the deposited film from falling during the manufacturing process and contaminating the wafer. In addition, oxides or other contaminants may also form on the surface of the target, so it is also necessary to clean the target periodically. Generally speaking, a burn-in process is used to strike a target in the cavity with plasma ions to remove oxides or other contaminants on the surface of the target.

When cleaning the cavity and the target, it is necessary to remove the wafer carrier and the wafer from the cavity or isolate the wafer carrier to avoid contamination of the wafer carrier and wafer during the cleaning process.

Generally speaking, after a period of use, the deposition equipment usually needs to be cleaned to remove the oxide or nitride on the thin film deposited in the chamber and the target material. The particles generated during the cleaning process will contaminate the carrier plate, so it is necessary to isolate the carrier plate and contaminants. The present invention proposes a shielding device and a deposition device with a shielding device. The driving device drives two shielding plates to swing in opposite directions, so that the two shielding plates are operated in an open state and a shielding state. The shielding plate operated in the shielding state can completely shield the carrier plate, so as to effectively avoid the contamination of the carrier plate by particles generated when cleaning the cavity or the target material.

An object of the present invention is to provide a deposition equipment with a shielding device, which mainly includes a reaction chamber, a supporting plate and a shielding device. The shielding device includes a driving device and two shielding plates, wherein the driving device connects and drives the two shielding plates to swing in opposite directions respectively, so that the two shielding plates operate in an open state and a shielding state.

The two shielding plates respectively include a side surface, wherein the side surfaces of the two shielding plates face each other, and at least one concave portion and at least one convex portion are respectively provided on the side surfaces of the two shielding plates facing each other. When cleaning the reaction chamber, the driving device drives the two shielding plates to approach each other in a swinging manner, and the convex part on the side of one shielding plate will enter the concave part on the side of the other shielding plate and be between the two shielding plates. An overlapping area is formed so that the two shielding plates constitute a complete shielding member. During the deposition process, the driving device drives the two shielding plates to move away from each other in a swinging manner, and can deposit thin films on the substrate in the reaction chamber.

An object of the present invention is to provide a deposition device with a shielding device, which mainly constitutes a complete shielding member through two shielding plates, which can reduce the space required for storing the shielding plates. In an embodiment of the present invention, the two shielding plates can swing in opposite directions in the accommodating space of the reaction chamber, and the two shielding plates can be operated in the open state or the shielded state in the accommodating space of the reaction chamber. , Can simplify the structure of the reaction chamber and reduce the volume of the reaction chamber.

An object of the present invention is to provide a deposition equipment with a shielding device, wherein the driving device is connected to and carries two shielding plates through two connecting arms respectively, so as to reduce the load of the connecting arms. In addition, a shielding plate with a larger thickness can be further used to prevent high temperature deformation of the shielding plate when cleaning the deposition equipment, and to improve the effect of the shielding plate in shielding the carrier plate.

In order to achieve the above-mentioned objective, the present invention proposes a deposition device with a shielding device, which includes: a reaction chamber, including an accommodating space: a carrier plate located in the accommodating space, and used to carry at least one substrate; and a shielding The device includes: a first shielding plate located in the accommodating space and including a first inner side surface, wherein the first inner side surface includes at least one convex part; a second shielding plate located in the accommodating space and including a The second inner side surface, wherein the second inner side surface includes at least one concave portion, and the convex portion on the first inner side surface corresponds to the concave portion on the second inner side surface; A shielding plate and a second shielding plate swing in opposite directions, so that the first shielding plate and the second shielding plate are switched between an open state and a shielding state, wherein the first inner surface of the first shielding plate in the shielding state and The second inner side surfaces of the second shielding plate will be close to each other, and the convex portion on the first inner side surface will enter the concave portion on the second inner side surface, and the first and second shielding plates will shield the carrier tray.

The present model proposes a shielding device suitable for a deposition device, comprising: a first shielding plate including a first inner side surface, wherein the first inner side surface includes at least one convex part; a second shielding plate including a second inner surface Side surface, wherein the second inner side surface includes at least one concave portion, and the convex portion on the first inner side surface corresponds to the concave portion on the second inner side surface; And the second shielding plate swing in opposite directions, so that the first shielding plate and the second shielding plate are switched between an open state and a shielding state, wherein the first inner side surface of the first shielding plate and the second shielding state in the shielding state The second inner side surface of the board will be close to each other, and the convex part on the first inner side surface will enter the concave part on the second inner side surface.

In the deposition equipment and the shielding device, the driving device includes a shaft sealing device and at least one driving motor, and the driving motor is connected to the first shielding plate and the second shielding plate through the shaft sealing device.

In the deposition equipment and the shielding device, the shaft sealing device includes an outer tube body and a shaft body, the outer tube body includes a space for accommodating the shaft body, the driving motor is connected to the first shielding plate through the outer tube body, and the shaft body The second shielding plate is connected, and the shaft body and the outer tube body are synchronously driven to rotate in opposite directions.

The deposition equipment and the shielding device include two sensing areas connected to the reaction chamber, the two sensing areas respectively include a sensing space and fluidly connected accommodating space, and the thickness of the two sensing areas is smaller than that of the reaction chamber, wherein At least one position sensing unit is respectively arranged in the two sensing areas to sense the first shielding plate and the second shielding plate entering the sensing space.

The deposition equipment and the shielding device include at least one position sensing unit arranged in the reaction chamber and used for sensing the positions of the first shielding plate and the second shielding plate.

In the deposition equipment and the shielding device, the area of the first shielding plate is larger than the area of the second shielding plate.

Please refer to FIG. 1, which is a schematic side cross-sectional view of an embodiment of a new deposition device with a shielding device operating in a shielded state. As shown in the figure, the deposition equipment 10 mainly includes a reaction chamber 11, a carrier plate 13 and a shielding device 100. The reaction chamber 11 includes an accommodating space 12 for accommodating the carrier plate 13 and part of the shielding device 100. .

The carrier plate 13 is located in the accommodating space 12 of the reaction chamber 11 and is used to carry at least one substrate 163. Taking the deposition device 10 as a physical vapor deposition chamber as an example, a target 161 is set in the reaction chamber 11, wherein the target 161 faces the substrate 163 and the carrier plate 13. For example, the target 161 may be disposed on the upper surface of the reaction chamber 11 and face the carrier plate 13 and/or the substrate 163 in the accommodating space 12.

Please refer to FIGS. 2 and 3 together, the shielding device 100 includes a first shielding plate 151, a second shielding plate 153, and a driving device 17. The first shielding plate 151 and the second shielding plate 153 are located in the accommodating space 12 . The driving device 17 connects the first shielding plate 151 and the second shielding plate 153, and drives the first shielding plate 151 and the second shielding plate 153 to swing in opposite directions, for example, the first shielding plate 151 and the second shielding plate 153 drive the device 17 is the axis swing synchronously.

In an embodiment of the present invention, the driving device 17 is connected to a first connecting arm 141 and a second connecting arm 143, and is connected to the first shielding plate 151 and the second shielding plate 151 through the first connecting arm 141 and the second connecting arm 143, respectively. The shielding plate 153, wherein the driving device 17 drives the first shielding plate 151 and the second shielding plate 153 to swing or rotate in opposite directions through a first connecting arm 141 and a second connecting arm 143, respectively.

The first shielding plate 151 and the second shielding plate 153 can be plate bodies. The area and shape of the first shielding plate 151 and the second shielding plate 153 can be similar. For example, the first shielding plate 151 and the second shielding plate 153 can be Semi-circular plate body. When the driving device 17 drives the first shielding plate 151 and the second shielding plate 153 to close, the first shielding plate 151 and the second shielding plate 153 will approach each other to form a disc-shaped shielding member 15, and the shielding member 15 shields the load. The disk 13 and/or the substrate 163.

The first shielding plate 151 includes a first inner side 1511 and at least one first outer side 1513, and the second shielding plate 153 includes a second inner side 1531 and at least one second outer side 1533. The first shielding plate 151 The first inner side 1511 faces the second inner side 1531 of the second shielding plate 153.

The first inner side 1511 of the first shielding plate 151 includes at least one protrusion 1515, and the second inner side 1531 of the second shielding plate 153 includes at least one recess 1535. The convex portion 1515 of the first inner side surface 1511 corresponds to the concave portion 1535 of the second inner side surface 1531, wherein the volume of the convex portion 1515 is slightly smaller than the concave portion 1535. As shown in FIG. 4, the convex portion 1515 is located at the middle position of the first inner side surface 1511 of the first shielding plate 151, and the concave portion 1535 is located at the middle position of the second inner side surface 1531 of the second shielding plate 153. As shown in FIG. 6, the convex portion 1515 is located above the first inner surface 1511 of the first shielding plate 151, and the concave portion 1535 is also located above the second inner surface 1531 of the second shielding plate 153.

As shown in FIG. 5, the first shielding plate 151 and the second shielding plate 153 according to the embodiment of the present invention are operated in the shielding state, which can be defined as the first inner side 1511 of the first shielding plate 151 and the second shielding plate 153 The second inner side surfaces 1531 of each are close to each other, wherein a gap 154 is formed between the first inner side surface 1511 of the first shielding plate 151 operating in the shielding state and the second inner side surface 1531 of the second shielding plate 153.

In addition, when the first shielding plate 151 and the second shielding plate 153 are operated in the shielding state, the convex portion 1515 of the first inner side surface 1511 will enter the concave portion 1535 of the second inner side surface 1531, and the gap between the convex portion 1515 and the concave portion 1535 will also be There is a gap 154.

The gap 154 between the first inner side surface 1511 and the second inner side surface 1531 is smaller than a threshold value, for example, smaller than 1 mm. Specifically, the first shielding plate 151 and the second shielding plate 153 do not directly contact, and the convex part 1515 of the first shielding plate 151 and the concave part 1535 of the second shielding plate 153 do not directly contact, so as to prevent the first shielding The plate 151 and the second shielding plate 153 generate particles during the contact process, which contaminate the accommodating space 12 of the reaction chamber 11 and/or the carrier plate 13.

Taking the semicircular plate bodies of the first shielding plate 151 and the second shielding plate 153 as an example, the first inner side 1511 of the first shielding plate 151 and the second inner side 1531 of the second shielding plate 153 are straight sides. , The first outer side 1513 of the first shielding plate 151 and the second outer side 1533 of the second shielding plate 153 and semicircular or arc-shaped sides.

The linear sides of the first inner side surface 1511 of the first shielding plate 151 and the second inner side surface 1531 of the second shielding plate 153 are only an embodiment of the present invention, and are not limited by the scope of rights of the present invention. In practical applications, the first inner side 1511 of the first shielding plate 151 and the second inner side 1531 of the second shielding plate 153 may also be corresponding curved or jagged sides.

In addition, the area and shape of the first shielding plate 151 and the second shielding plate 153 are similar, and the semicircular plate body is only an embodiment of the present invention, and is not a limitation of the scope of rights of the present invention. In practical applications, the first shielding plate 151 and the second shielding plate 153 can be plates with different areas and shapes, or can be square, elliptical, or any geometrical shape, such as the area of the first shielding plate 151 The area of the second shielding plate 153 may be larger.

In an embodiment of the present invention, as shown in FIG. 7, the driving device 17 includes at least one driving motor 171 and a shaft sealing device 173, wherein the driving motor 171 is connected to the first shielding plate 151 and the second shielding plate 153 through the shaft sealing device 173 . The driving motor 171 is located outside the accommodating space 12 of the reaction chamber 11, and the shaft sealing device 173 passes through and is disposed in the reaction chamber 11, and part of the shaft sealing device 173 is located in the accommodating space 12 of the reaction chamber 11.

The shaft sealing device 173 includes an outer tube body 1731 and a shaft body 1733. The outer tube body 1731 includes a space 1732 for accommodating the shaft body 1733, wherein the outer tube body 1731 and the shaft body 1733 are coaxially arranged, and the outer tube body 1731 and the shaft body 1733 can rotate relatively. The outer tube body 1731 is connected to the first connecting arm 141, and is connected via the first connecting arm 141 to drive the first shielding plate 151 to swing. The shaft 1733 is connected to the second connecting arm 143 and connected via the second connecting arm 143 to drive the second shielding plate 153 to swing. In another embodiment of the present invention, the shaft sealing device 173 may be a magnetic fluid shaft seal.

In an embodiment of the present invention, as shown in FIG. 7, the number of driving motors 171 may be two, and the two driving motors 171 are respectively connected to the outer tube body 1731 and the shaft body 1733 of the shaft sealing device 173, and respectively drive the outer tube The body 1731 and the shaft body 1733 rotate in opposite directions synchronously to drive the first shielding plate 151 and the second shielding plate 153 to swing in different directions through the outer tube body 1731 and the shaft body 1733, respectively.

In another embodiment of the present invention, the number of the driving motor 171 may be one, and the first shielding plate 151 and the second shielding plate 153 are respectively connected and driven by a linkage mechanism through the first connecting arm 141 and the second connecting arm 143 Swing synchronously in the opposite direction.

Specifically, the deposition apparatus 10 and/or the shielding device 100 of the present invention can be operated in two states, namely an open state and a shielded state. As shown in FIGS. 2 and 9, the driving device 17 can drive the first shielding plate 151 and the second shielding plate 153 to swing in opposite directions, so that the first shielding plate 151 and the second shielding plate 153 are separated from each other and operated in the open state . A space 152 is formed between the first shielding plate 151 and the second shielding plate 153 operating in the open state, so that there is no first shielding plate 151 and second shielding plate between the target 161 and the carrier plate 13 and the substrate 163 153.

Then, the carrier plate 13 and the substrate 163 can be driven to approach the target 161, and the gas in the accommodating space 12, such as an inert gas, strikes the target 161 to deposit a thin film on the surface of the substrate 163.

In an embodiment of the present invention, as shown in FIG. 1, the accommodating space 12 of the reaction chamber 11 may be provided with a stopper 111, wherein one end of the stopper 111 is connected to the reaction chamber 11, and the other end of the stopper 111 is An opening 112 is formed. When the carrier plate 13 approaches the target 161, it enters or contacts the opening 112 formed by the stopper 111. The reaction chamber 11, the carrier plate 13 and the stopper 111 partition a reaction space in the accommodating space 12, and deposit a thin film on the surface of the substrate 163 in the reaction space to prevent the reaction chamber 11 and the carrier from being outside the reaction space. A deposited film is formed on the surface of the disk 13.

In addition, as shown in FIGS. 3 and 9, the driving device 17 can drive the first shielding plate 151 and the second shielding plate 153 to swing in opposite directions, so that the first shielding plate 151 and the second shielding plate 153 are close to each other and operate at Covered state. The closed first shielding plate 151 and the second shielding plate 153 can form the shielding member 15, wherein the shielding member 15 is located between the target 161 and the carrier plate 13, and is used to shield the carrier plate 13 to isolate the target material 161 and the carrier plate 13.

The shielding member 15 may partition a clean space 121 in the accommodating space 12, wherein the clean space 121 and the reaction space partially overlap or are close to each other. A burn-in process can be performed in the clean space 121 to clean the target 161 and the reaction chamber 11 and/or the stopper 111 in the clean space 121, and to remove oxides and nitrides on the surface of the target 161 Or other contaminants, and the deposition film on the surface of the reaction chamber 11 and/or the stopper 111.

In the process of cleaning the deposition apparatus 10, the carrier plate 13 and/or the substrate 163 will be shielded or isolated by the shielding member 15 to avoid contamination or deposition on the surface of the carrier plate 13 and/or the substrate 163 by substances generated during the cleaning process.

Specifically, the present invention constitutes the shield 15 through the first shielding plate 151 and the second shielding plate 153, and carries the first shielding plate 151 and the second shielding plate 153 through the first connecting arm 141 and the second connecting arm 143, respectively. The weight can reduce the burden of the first connecting arm 141 and the second connecting arm 143.

In addition, the thickness or weight of the first shielding plate 151 and the second shielding plate 153 can be further increased to prevent the first and second shielding plates 151/153 from being deformed at high temperature during the cleaning of the deposition equipment 10, which can prevent the cleaning process Plasma or contamination in the battery contacts the lower carrier plate 13 or the substrate 163 through the deformed first shielding plate 151 and the second shielding plate 153.

Dividing the shielding member 15 into two first shielding plate 151 and second shielding plate 153 that can be connected and separated is more conducive to reducing the storage space required by the first shielding plate 151 and the second shielding plate 153 in the open state. The structure of the reaction chamber 11 can be simplified or adjusted.

In an embodiment of the present invention, as shown in FIGS. 8 and 9, the first shielding plate 151 and the second shielding plate 153 can be operated in the open state and the shielded state in the accommodating space 12 of the reaction chamber 11, and not One or more storage cavities need to be additionally provided to store the shielding plate in the open state. For example, the volume of the reaction chamber 11 and/or the accommodating space 12 can be slightly larger than the original volume, so that the first shielding plate 151 and the second shielding plate 153 can be opened or closed in the accommodating space 12 of the reaction chamber 11.

In an embodiment of the present invention, a plurality of position sensing units 19 may be further provided on the reaction chamber 11, wherein the position sensing units 19 face the accommodating space 12 and are used to sense the first shielding plate 151 and the second shielding The position of the plate 153 is used to determine whether the first shielding plate 151 and the second shielding plate 153 are in the open state. For example, the position sensing unit 19 may be a light sensing unit.

In practical applications, the position of the position sensing unit 19 can be adjusted, and the first shielding plate 151 and the second shielding plate 153 will be sensed by the position sensing unit 19 only after opening to a specific angle. Only then can the carrier plate 13 approach the target 161 to avoid the carrier plate 13, the first shielding plate 151 and the second shielding plate 153 from colliding.

In practical applications, the position of the shielding device 100 in the reaction chamber 11 can be adjusted according to the configuration of other mechanisms or moving lines on the deposition device 10. Taking the accommodating space 12 of the reaction chamber 11 as a square as an example, as shown in FIG. 8 and FIG. As shown in FIG. 10, the driving device 17 of the shielding device 100 can also be arranged at the corner of the reaction chamber 11/or the accommodating space 12, so as to facilitate the installation of substrate feed ports and exhaust pipes on the side of the reaction chamber 11 .

In an embodiment of the present invention, the reaction cavity 11 can be connected to two sensing areas 113, wherein the sensing area 113 protrudes from the side surface of the reaction cavity 11, and the thickness of the sensing area 113 is smaller than that of the reaction cavity 11. The two sensing regions 113 respectively include a sensing space 120, and the sensing space 120 of the sensing region 113 is fluidly connected to the accommodating space 12 of the reaction chamber 11, wherein the thickness or height of the sensing space 120 is smaller than the accommodating space 12 . When the first shielding plate 151 and the second shielding plate 153 are operated in the open state, part of the first shielding plate 151 and part of the second shielding plate 153 will respectively enter the two sensing spaces 120 fluidly connected to the accommodation space 12. The area of the first shielding plate 151 and the second shielding plate 153 located in the sensing space 120 is smaller than the area of the first shielding plate 151 and the second shielding plate 153 located in the accommodating space 12.

As shown in FIG. 10, two sensing areas 113 are respectively provided on two adjacent sides of the reaction chamber 11, and at least one position sensing unit 19 is respectively provided on the two sensing areas 113 for sensing respectively The first shielding plate 151 and the second shielding plate 153 that enter the sensing space 120 are detected.

The foregoing is only one of the preferred embodiments of the present invention, and is not used to limit the scope of implementation of the present invention, that is, all the equivalent changes and changes in the shape, structure, characteristics and spirit described in the scope of the patent application of the present invention Modifications should be included in the scope of the patent application for this new model.

10: Deposition equipment 100: Shading device 11: Reaction chamber 111: stop 112: opening 113: Sensing area 12: accommodating space 120: Sensing Space 121: clean space 13: Carrier plate 141: First connecting arm 143: second connecting arm 15: Shield 151: The first shielding board 1511: first inner side 1513: first outer side 1515: convex 152: Interval 153: The second shielding board 1531: second inner side 1533: second outer side 1535: recess 154: Gap 161: Target 163: Substrate 17: Drive 171: drive motor 173: Shaft seal device 1731: Outer tube body 1732: space 1733: Shaft 19: Position sensing unit

[Fig. 1] is a schematic side sectional view of an embodiment of a new type of deposition equipment with a shielding device operating in a shielded state.

[Figure 2] is a three-dimensional schematic diagram of an embodiment of the shielding device of the new deposition equipment operating in an open state.

[Figure 3] is a three-dimensional schematic diagram of an embodiment of the shielding device of the new deposition equipment operating in the shielding state.

[Fig. 4] is a partial enlarged cross-sectional schematic diagram of an embodiment of the new-type shielding device not operating in the shielding state.

[Figure 5] is a partial enlarged cross-sectional schematic diagram of an embodiment of the new type of shielding device operating in the shielding state.

[Fig. 6] is a schematic partial enlarged cross-sectional view of another embodiment of the new shielding device not operating in the shielding state.

[Fig. 7] is a three-dimensional cross-sectional schematic diagram of an embodiment of the driving device of the new type of shielding device.

[Fig. 8] is a top view of an embodiment of a deposition device with a shielding device operating in an open state.

[Fig. 9] is a top view of an embodiment of the new deposition equipment with a shielding device operating in a shielded state.

[Fig. 10] is a top view of another embodiment of the deposition device with a shielding device operating in an open state.

10: Deposition equipment

100: Shading device

11: Reaction chamber

111: stop

112: opening

12: accommodating space

121: clean space

13: Carrier plate

141: First connecting arm

143: second connecting arm

15: Shield

151: The first shielding board

153: The second shielding board

161: Target

163: Substrate

17: Drive

Claims (10)

A deposition equipment with a shielding device, including: A reaction chamber, including an accommodating space; A carrying tray located in the accommodating space and used for carrying at least one substrate; A block, one end of the block is connected to the reaction chamber, and the other end of the block forms an opening; and A shielding device, including: A first shielding plate located in the accommodating space and including a first inner side surface, wherein the first inner side surface includes at least one convex portion; A second shielding plate is located in the accommodating space and includes a second inner side surface, wherein the second inner side surface includes at least one concave portion, and the convex portion of the first inner side surface corresponds to the concave portion of the second inner side surface ;and A driving device connects the first shielding plate and the second shielding plate, and drives the first shielding plate and the second shielding plate to swing in opposite directions, so that the first shielding plate and the second shielding plate are at Switch between an open state and a shielding state, wherein the first inner side surface of the first shielding plate in the shielding state and the second inner side surface of the second shielding plate are close to each other, and the first inner side surface The protruding part enters the concave part on the second inner side surface, and the carrier tray is covered by the first shielding plate and the second shielding plate. The deposition apparatus with a shielding device according to claim 1, wherein the driving device includes a shaft sealing device and at least one driving motor, and the driving motor is connected to the first shielding plate and the second shielding plate through the shaft sealing device. The deposition apparatus with a shielding device according to claim 2, wherein the shaft sealing device includes an outer tube body and a shaft body, the outer tube body includes a space for accommodating the shaft body, and the driving motor penetrates the outer tube The body is connected to the first shielding plate, the second shielding plate is connected through the shaft body, and the shaft body and the outer tube body are synchronously driven to rotate in opposite directions. The deposition apparatus with a shielding device according to claim 1, comprising two sensing areas connected to the reaction chamber, the two sensing areas respectively include a sensing space fluidly connected to the accommodating space, the two sensing areas The thickness of the zone is smaller than that of the reaction chamber, wherein the two sensing zones are respectively provided with at least one position sensing unit for sensing the first shielding plate and the second shielding plate entering the sensing space. The deposition equipment with a shielding device according to claim 1, comprising at least one position sensing unit disposed in the reaction chamber and used for sensing the positions of the first shielding plate and the second shielding plate. The deposition apparatus with a shielding device according to claim 1, wherein the area of the first shielding plate is larger than the area of the second shielding plate. A shielding device suitable for a deposition equipment, including: A first shielding plate including a first inner side surface, wherein the first inner side surface includes at least one convex portion; A second shielding plate including a second inner side surface, wherein the second inner side surface includes at least one concave portion, and the convex portion of the first inner side surface corresponds to the concave portion of the second inner side surface; and A driving device connects the first shielding plate and the second shielding plate, and drives the first shielding plate and the second shielding plate to swing in opposite directions, so that the first shielding plate and the second shielding plate are at Switch between an open state and a shielding state, wherein the first inner side surface of the first shielding plate in the shielding state and the second inner side surface of the second shielding plate are close to each other, and the first inner side surface The protruding portion enters the recessed portion on the second inner surface, and there is a gap between the protruding portion and the recessed portion. The shielding device according to claim 7, wherein the driving device includes a shaft sealing device and at least one driving motor, and the driving motor is connected to the first shielding plate and the second shielding plate through the shaft sealing device. The shielding device according to claim 8, wherein the shaft sealing device includes an outer tube body and a shaft body, the outer tube body includes a space for accommodating the shaft body, and the driving motor is connected to the second shaft through the outer tube body. A shielding plate is connected to the second shielding plate through the shaft body, and synchronously driving the shaft body and the outer tube body to rotate in opposite directions. The shielding device according to claim 7, wherein the area of the first shielding plate is larger than the area of the second shielding plate.

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