TWM611628U - Vacuum inspection platform - Google Patents

Abstract

A vacuum inspection platform includes a vacuum platform and a controlling device. The vacuum platform has a first vacuum suction area and a second vacuum suction area, and is configured for absorbing at least one inspected object. The first vacuum suction area and the second vacuum suction area are separated from each other, and are disposed in a first direction. The controlling device is coupled to the vacuum platform, and is configured for respectively controlling the first vacuum suction area and the second vacuum suction area, and thus an entirety of or a part of the first vacuum suction area and/or the second vacuum suction area generates the absorbing force.

Description

Vacuum testing stage

This new creation relates to a testing platform, and particularly to a vacuum testing platform.

Automated Optical Inspection (AOI) has been widely used in the semiconductor industry, panel industry, circuit board industry or other related science and technology industries or manufacturing industries, and gradually replaced the past manual visual inspection (Visual Inspection) operations to significantly Improve detection efficiency and accuracy.

In the process of using automatic optical inspection technology to detect the object to be tested, in order to prevent the object to be tested placed on the carrier from moving arbitrarily, a common practice is to use vacuum means to provide negative pressure to the carrier to remove The measured object is adsorbed and fixed on the stage. Specifically, the carrier has an adsorption surface for carrying the object to be measured and a plurality of suction holes on the adsorption surface, wherein the plurality of suction holes are evenly distributed on the adsorption surface, and are arranged in a matrix or at equal intervals.

Generally speaking, no matter the size of the test object placed on the adsorption surface, all the suction holes on the adsorption surface generate adsorption force. If a part of the suction holes are not covered by the test object, the suction force generated by the suction holes covered by the test object is easily weakened by the influence of the suction holes not covered by the test object, causing it to be adsorbed and fixed on the stage The stability of the tested object has declined, even affecting the detection efficiency and accuracy.

This new creation provides a vacuum testing stage, which is universally used for objects to be tested of different sizes and geometric contours, and helps to improve testing efficiency and accuracy.

This new creation proposes a vacuum detection stage, which includes a vacuum stage and a control device. The vacuum stage has a first vacuum adsorption zone and a second vacuum adsorption zone for adsorbing at least one object to be tested. The first vacuum adsorption zone and the second vacuum adsorption zone are separated from each other and arranged along a first direction. The control device is coupled to the vacuum stage to individually control the first vacuum adsorption zone or the second vacuum adsorption zone, so that the first vacuum adsorption zone and/or the second vacuum adsorption zone can generate adsorption force as a whole or locally.

Based on the above, the vacuum detection stage created by the present invention can generate adsorption force in a specific area of the suction surface of the vacuum stage (for example, the area covered by the test object) according to the size and geometric contour of the object to be tested. Accordingly, the object to be tested can be firmly adsorbed and fixed on the adsorption surface of the vacuum stage, which helps to improve the detection efficiency and accuracy. Furthermore, since only the area covered by the object to be tested generates the adsorption force on the adsorption surface, the strength of the adsorption force is maintained and it is not easy to weaken.

In order to make the above-mentioned features and advantages of the new creation more obvious and understandable, the following specific examples are given in conjunction with the accompanying drawings to describe in detail as follows.

FIG. 1 is a schematic diagram of the structure of a vacuum detection stage according to an embodiment of the present invention. Fig. 2 is a schematic diagram of a specific structure of a vacuum detection stage according to an embodiment of the present invention. Please refer to FIGS. 1 and 2. In this embodiment, the vacuum detection stage 100 includes a base 110, a vacuum stage 120, a vacuum device 130 and a control device 140. The vacuum stage 120, the vacuum device 130 and the control device 140 are arranged on the base 110. The vacuum stage 120 has an adsorption surface 121, a first vacuum adsorption area 122 located on the adsorption surface 121, and a second vacuum adsorption area 123 located on the adsorption surface 121, and is used for adsorbing at least one object to be tested. The first vacuum adsorption zone 122 and the second vacuum adsorption zone 123 are separated from each other and arranged along a first direction D1. In this embodiment, the shapes of the first vacuum adsorption zone 122 and the second vacuum adsorption zone 123 are quadrilateral or square, respectively, but the invention is not limited to this.

The vacuum device 130 is coupled to the first vacuum adsorption zone 122 and the second vacuum adsorption zone 123 of the vacuum stage 120 through the control device 140 to provide adsorption force to the first vacuum adsorption zone 122 and the second vacuum adsorption zone 123. The control device 140 is coupled to the vacuum stage 120 to individually control the first vacuum adsorption zone 122 and the second vacuum adsorption zone 123, so that the first vacuum adsorption zone 122 and/or the second vacuum adsorption zone 123 can generate adsorption force entirely or locally . In this embodiment, the vacuum device 130 may be a vacuum pump, and the control device 140 may use a normally open solenoid valve, but the invention of the present invention is not limited to this. When the coil of the control device 140 is energized, the pipeline between the vacuum device 130 and the first vacuum adsorption zone 122 is connected to form a passage. On the contrary, the pipeline between the vacuum device 130 and the first vacuum adsorption zone 122 is disconnected to form an open circuit. On the other hand, when the coil of the control device 140 is energized, the pipeline between the vacuum device 130 and the second vacuum suction zone 123 is connected to form a passage. On the contrary, the pipeline between the vacuum device 130 and the second vacuum adsorption zone 123 is disconnected to form an open circuit.

In one mode, the vacuum device 130 and the first vacuum adsorption zone 122 form a passage, and a circuit is formed between the vacuum device 130 and the second vacuum adsorption zone 123, and the vacuum device 130 vacuums the whole or part of the first vacuum adsorption zone 122 , So that the whole or part of the first vacuum adsorption zone 122 generates adsorption force.

In another mode, the vacuum device 130 and the second vacuum adsorption zone 123 form a passage, and a circuit is formed between the vacuum device 130 and the first vacuum adsorption zone 122, and the vacuum device 130 pumps the entire or part of the second vacuum adsorption zone 123 The action of the vacuum causes the entire or part of the second vacuum adsorption zone 123 to generate adsorption force.

In yet another mode, the vacuum device 130 and the first vacuum adsorption zone 122 form a passage, and the vacuum device 130 and the second vacuum adsorption zone 123 form a passage. The vacuum device 130 vacuumizes the whole or part of the first vacuum adsorption zone 122, and at the same time, the vacuum device 130 vacuumizes the whole or part of the second vacuum adsorption zone 123, so that the first vacuum adsorption zone 122 The whole or part of the second vacuum adsorption zone 123 generates adsorption force, and the whole or part of the second vacuum adsorption zone 123 generates adsorption force.

The above modes can be switched according to the size and geometric profile of different objects to be tested, so the vacuum testing stage 100 is universally used for objects to be tested of different sizes and geometric profiles. On the other hand, based on the position of the test object on the adsorption surface 121, the adsorption surface 121 can divide the area covered by the test object (hereinafter referred to as the coverage area) and the area not covered by the test object (hereinafter referred to as the uncovered area) ), through the control of the control device 140, the vacuum device 130 vacuumizes the covered area, but does not vacuumize the uncovered area, so the strength of the adsorption force generated by the covered area is maintained and it is not easy to weaken. According to this, the object to be tested can be firmly adsorbed and fixed on the adsorption surface 121 of the vacuum stage 120, which helps to improve the detection efficiency and accuracy.

Fig. 3 is a schematic top view of the vacuum detection stage of Fig. 2. Fig. 4 is a schematic side view of the vacuum detection stage of Fig. 2. Fig. 5 is a schematic cross-sectional view of the vacuum stage of Fig. 3 along the line A-A1. 2 to 4, in this embodiment, the vacuum device 130 and the control device 140 are located on one side of the vacuum stage 120, and the control device 140 can be coupled to the vacuum stage through a plurality of exhaust pipes (not shown) 120, so that the vacuum device 130 vacuumizes the whole or part of the first vacuum adsorption zone 122 through the control device 140 and the corresponding exhaust pipe (not shown), or the vacuum device 130 is connected to the first vacuum adsorption zone 122 through the control device 140 The corresponding suction pipe (not shown) vacuumizes the whole or part of the second vacuum adsorption zone 123.

Please refer to FIGS. 2, 4 and 5, the vacuum stage 120 also has a bottom surface 124 opposite to the suction surface 121, and a plurality of suction holes 125 passing through the suction surface 121 and the bottom surface 124, wherein the bottom surface 124 faces the base 110, and The suction holes 125 are distributed in the first vacuum suction zone 122 and the second vacuum suction zone 123. On the other hand, the vacuum detection stage 100 further includes a plurality of air nozzles 150, wherein the air nozzles 150 are disposed on the bottom surface 124 and inserted into the suction holes 125. Furthermore, the control device 140 may be coupled to the air nozzles 150 through a plurality of suction pipes (not shown), and the suction pipes (not shown), the air nozzles 150 and the suction holes 125 form a corresponding first vacuum. The adsorption zone 122 and the second vacuum adsorption zone 123 have multiple vacuum paths.

Please refer to FIGS. 2 and 4, the vacuum detection stage 100 further includes a plurality of fine-tuning columns 160, wherein the fine-tuning columns 160 are disposed between the base 110 and the vacuum stage 120, and are configured to adjust the level of the vacuum stage 120 . In detail, one end of each fine adjustment column 160 is connected to the base 110, and the other end of each fine adjustment column 160 is connected to the vacuum stage 120. Since the level of the vacuum stage 120 can be adjusted through these fine adjustment columns 160, and the suction surface 121 of the vacuum stage 120 has a high flatness (for example, less than 10 microns, but not limited to this), it helps to improve The image resolution of the test object.

2 and 3, in this embodiment, the first vacuum adsorption zone 122 has two sub-vacuum adsorption zones 122a arranged along a second direction D2 perpendicular to the first direction D1, of which two sub-vacuum adsorption zones The 122a is substantially symmetrically arranged, and the two sub-vacuum adsorption zones 122a have the same geometrical design. Each sub-vacuum adsorption zone 122a includes a plurality of vacuum adsorption flow channels 122b arranged along the first direction D1, and these vacuum adsorption flow channels 122b have the same geometrical design.

Each vacuum adsorption channel 122b includes a rectangular trench 122c, a horizontal trench 122d, and a plurality of longitudinal trenches 122e staggered with the horizontal trench 122d, wherein the rectangular trench 122c surrounds the horizontal trench 122d and the vertical trench 122e, and the horizontal trench 122d and the longitudinal trench 122e is connected to the rectangular trench 122c. For example, the rectangular trench 122c, the horizontal trench 122d, and the longitudinal trench 122e of each vacuum adsorption flow channel 122b are recessed on the adsorption surface 121, and the passage and disconnection between each vacuum adsorption flow channel 122b and the vacuum device 130 can be controlled by the control device 140 individual control.

When the vacuum device 130 evacuates the first vacuum adsorption zone 122, the control device 140 can control the vacuum device 130 to maintain a passage with the at least one vacuum adsorption flow channel 122b, so that the at least one vacuum adsorption flow channel 122b generates adsorption force. In this way, the control device 140 can control the vacuum device 130 to maintain passages with all the vacuum adsorption flow channels 122b, so that all the vacuum adsorption flow channels 122b generate adsorption force.

FIG. 6A is a partial enlarged schematic diagram of the region R1 in FIG. 3. Referring to FIGS. 3 and 6A, the transverse trenches 122 d and the longitudinal trenches 122 e that intersect each other form a plurality of intersecting points 101, and the suction holes 125 are distributed at the intersecting points 101. Therefore, when the vacuum device 130 maintains a path with any vacuum suction flow channel 122b, the vacuum device 130 can vacuum the rectangular trench 122c, the horizontal trench 122d, and the longitudinal trench 122e through the suction hole 125, so that the rectangular trench 122c, The horizontal trench 122d and the vertical trench 122e generate adsorption force.

FIG. 6B is a partial enlarged schematic diagram of the region R2 in FIG. 3. Please refer to FIG. 2, FIG. 3 and FIG. 6B. In this embodiment, the second vacuum adsorption zone 123 has two sub-vacuum adsorption zones 123a arranged along the second direction D2, of which the two sub-vacuum adsorption zones 123a are substantially symmetrically arranged , And the two sub-vacuum adsorption zones 123a have the same geometrical design. Each sub-vacuum adsorption zone 123a includes a plurality of upper semicircular arc trenches 123b arranged along the first direction D1 and a plurality of lower semicircular arc trenches 123c arranged along the first direction D1, and these upper semicircular arc trenches 123b The center 102 is shared with the lower semi-circular arc trenches 123c. In other words, the center of curvature of the upper semi-circular arc trenches 123b and the center of curvature of the lower semi-circular arc trenches 123c are at the same point.

From the center 102 outward, the nth upper semicircular arc trench 123b is connected to the (n+1)th upper semicircular arc trench 123b, where n is greater than or equal to 1, and is an odd number. For example, from the center 102 outward, the first upper semicircular arc trench 123b is connected to the second upper semicircular arc trench 123b, and the curvature radius of the second upper semicircular arc trench 123b is greater than that of the first upper semicircular arc trench 123b. The radius of curvature of the semi-circular arc trench 123b. The second upper semicircular arc trench 123b is not connected with the third upper semicircular arc trench 123b, and the curvature radius of the third upper semicircular arc trench 123b is greater than the curvature radius of the second upper semicircular arc trench 123b. The third upper semicircular arc trench 123b communicates with the fourth upper semicircular arc trench 123b, and the curvature radius of the fourth upper semicircular arc trench 123b is greater than the curvature radius of the third upper semicircular arc trench 123b. And so on, without repeating it.

From the center 102 outward, the nth lower semicircular arc trench 123c is connected to the (n+1)th lower semicircular arc trench 123c, where n is greater than or equal to 1, and is an odd number. For example, from the center 102 outward, the first lower semicircular arc trench 123c is connected to the second lower semicircular arc trench 123c, and the curvature radius of the second lower semicircular arc trench 123c is greater than that of the first lower semicircular arc trench 123c. The radius of curvature of the semi-circular arc trench 123c. The second lower semicircular arc trench 123c is not connected with the third lower semicircular arc trench 123c, and the curvature radius of the third lower semicircular arc trench 123c is greater than the curvature radius of the second lower semicircular arc trench 123c. The third lower semicircular arc trench 123c communicates with the fourth lower semicircular arc trench 123c, and the curvature radius of the fourth lower semicircular arc trench 123c is greater than the curvature radius of the third lower semicircular arc trench 123c. And so on, without repeating it.

In particular, from the center 102 outward, the radius of curvature of the first upper semicircular arc trench 123b is equal to the radius of curvature of the first lower semicircular arc trench 123c, and the curvature radius of the second upper semicircular arc trench 123b It is equal to the radius of curvature of the second lower semicircular arc trench 123c. And so on, without repeating it.

2 and 6B, each sub-vacuum adsorption zone 123a further includes a plurality of first radial trenches 123d and a plurality of second radial trenches 123e, wherein the n-th upper semicircular arc trench 123b and the (n+th) 1) At least one first radial trench 123d is provided between the upper semicircular arc trenches 123b to communicate with each other, and between the nth lower semicircular arc trench 123c and the (n+1)th lower semicircular arc trench 123c At least one second radial trench 123e is provided therebetween to communicate with each other. n is greater than or equal to 1, and is an odd number. On the other hand, the upper semicircular arc trenches 123b, the lower semicircular arc trenches 123c, the first radial trenches 123d, and the second radial trenches 123e are recessed in the suction surface 121.

In particular, the virtual extension line of each first radial trench 123d and each second radial trench 123e passes through the circle center 102.

In this embodiment, the number of first radial trenches 123d connected to the (n+2)th upper semicircular arc trench 123b outward from the circle center 102 is greater than that connected to the nth upper semicircular arc trench 123b The number of first radial trenches 123d. On the other hand, the number of second radial trenches 123e connected to the (n+2)th lower semicircular arc trench 123c is greater than that of the second radial trenches 123e connected to the nth lower semicircular arc trench 123c. Quantity. n is greater than or equal to 1, and is an odd number.

Correspondingly, outward from the circle center 102, the number of first radial trenches 123d connected to the (k+2)th upper semicircular arc trench 123b is greater than the number of first radial trenches 123d connected to the kth upper semicircular arc trench 123b The number of radial trenches 123d. On the other hand, the number of second radial trenches 123e connected to the (k+2)th lower semicircular arc trench 123c is greater than that of the second radial trenches 123e connected to the kth lower semicircular arc trench 123c. Quantity. k is greater than or equal to 2, and is an even number.

From the center 102 outward, the n-th upper semicircular arc trench 123b, the (n+1)th upper semicircular arc trench 123b, and at least one first radial trench 123d that communicate with each other form an upper semi-vacuum adsorption flow channel, In addition, the nth lower semicircular arc trench 123c, the (n+1)th lower semicircular arc trench 123c, and at least one second radial trench 123e that are connected to each other form a lower semi-vacuum adsorption flow channel. n is greater than or equal to 1, and is an odd number.

Furthermore, the passage and disconnection between each upper half vacuum adsorption flow channel and the vacuum device 130 can be individually controlled by the control device 140, and the passage and disconnection between each lower half vacuum adsorption flow passage and the vacuum device 130 can be controlled by the control device 140 Individual control. When the vacuum device 130 evacuates the second vacuum adsorption zone 123, the control device 140 can control the vacuum device 130 and the at least one upper half-vacuum adsorption flow channel to maintain a passage, and control the vacuum device 130 and the at least one lower half-vacuum adsorption The flow channel maintains a passage, so that at least one upper semi-vacuum adsorption flow channel and at least one lower semi-vacuum adsorption flow channel generate adsorption force. According to this kind of pairing, the control device 140 can control the vacuum device 130 and all the upper half vacuum adsorption flow channels and all the lower half vacuum adsorption flow channels to produce holding passages, so that all the upper half vacuum adsorption flow channels and all the lower half vacuum adsorption channels are maintained. The vacuum adsorption flow channel generates adsorption force.

6B, the first radial trenches 123d and the upper semicircular arc trenches 123b that are connected to each other form a plurality of first intersections 103, and the second radial trenches 123e and the lower semicircular arc trenches that are connected to each other 123c forms a plurality of second intersection points 104, and the suction holes 125 are distributed at the first intersection points 103 and the second intersection points 104. Therefore, when the vacuum device 130 maintains a path with any upper semi-vacuum adsorption flow channel, the vacuum device 130 can vacuum the two upper semi-circular arc trenches 123b and at least one first radial trench 123d through the suction hole 125 , So that the two upper semi-circular arc trenches 123b and at least one first radial trench 123d generate adsorption force. In addition, when the vacuum device 130 maintains a path with any one of the lower semi-vacuum adsorption channels, the vacuum device 130 can vacuum the two lower semi-circular arc trenches 123c and at least one second radial trench 123e through the suction hole 125. , So that the two lower semi-circular arc trenches 123c and at least one second radial trench 123e generate adsorption force.

2 and 3, in this embodiment, the second vacuum adsorption zone 123 also has a plurality of auxiliary vacuum adsorption zones 123f, and these auxiliary vacuum adsorption zones 123f are distributed around the two sub-vacuum adsorption zones 123a for Increase the adsorption force and adsorption area. For example, the auxiliary vacuum adsorption area 123f is generally a field-shaped trench, and has at least two sub-channels extending outward.

Please refer to FIGS. 2 to 4, the vacuum detection stage 100 further includes an air floatation stage 170, which is disposed on the base 110 and is located on one side of the vacuum stage 120. The air flotation stage 170 has an air flotation zone 171 and an outer vacuum adsorption zone 172 surrounding the air flotation zone 171. The outer vacuum adsorption area 172 can be used to adsorb and fix the object to be tested, and the air flotation area 171 can be used to prevent the object to be tested from sagging or sinking, so as to maintain the flatness of the surface of the object to be tested.

7A to 7E are schematic top views of different objects to be tested placed on the vacuum detection stage of FIG. 3. In this embodiment, the object to be tested is a square panel, a 12-inch round wafer with a wafer ring, a 12-inch round wafer, an 8-inch round wafer, and a 6-inch round wafer. At least one or a combination of a 4-inch round wafer and an 8-inch round glass wafer is not limited in this embodiment. Please refer to Figure 2, Figure 3 and Figure 7A, the test object 10a can be a large-sized panel, when the test object 10a is placed on the suction surface 121 of the vacuum stage 120, the test object 10a completely covers the first The vacuum adsorption zone 122 and the second vacuum adsorption zone 123. In this state, the vacuum device 130 and the first vacuum adsorption zone 122 form a passage, and the vacuum device 130 and the second vacuum adsorption zone 123 form a passage. Next, the vacuum device 130 evacuates the entire first vacuum adsorption zone 122, and at the same time, the vacuum device 130 evacuates the entire second vacuum adsorption zone 123, so that the first vacuum adsorption zone 122 and the second vacuum adsorption zone 122 are evacuated. The whole of the second vacuum adsorption zone 123 generates adsorption force, so that the test object 10a is firmly adsorbed and fixed on the adsorption surface 121 of the vacuum stage 120.

In particular, the test object 10a also covers all the auxiliary vacuum adsorption areas 123f, so the vacuum device 130 also vacuumizes all the auxiliary vacuum adsorption areas 123f to generate adsorption force.

Please refer to Figure 2, Figure 3 and Figure 7B, the object to be tested 10b can also be a panel smaller in size than the object to be tested 10a (see Figure 7A), when the object to be tested 10b is placed on the suction surface 121 of the vacuum stage 120 , The test object 10b covers one of the two sub-vacuum adsorption regions 122a of the first vacuum adsorption zone 122, and completely covers the three vacuum adsorption flow channels 122b. In this state, the vacuum device 130 forms a passage with the three vacuum suction flow channels 122b. Next, the vacuum device 130 vacuumizes the three vacuum adsorption flow channels 122b, so that the three vacuum adsorption flow channels 122b generate adsorption force, so that the test object 10b is firmly adsorbed and fixed to the adsorption of the vacuum stage 120面121上.

Please refer to Figure 2, Figure 3 and Figure 7C. The test object 10c can also be a 12-inch wafer with a wafer ring 11. When the test object 10c is placed on the suction surface 121 of the vacuum stage 120, the test object 10c The object 10c covers one of the two sub-vacuum adsorption regions 123a of the second vacuum adsorption zone 123, and completely covers all the upper semicircular arc trenches 123b, all the lower semicircular arc trenches 123c, and all the first radial trenches. 123d and all the second radial trenches 123e. In this state, the vacuum device 130 forms a path with all upper semicircular arc trenches 123b, all lower semicircular arc trenches 123c, all first radial trenches 123d, and all second radial trenches 123e. Next, the vacuum device 130 vacuumizes all the upper semicircular arc trenches 123b, all the lower semicircular arc trenches 123c, all the first radial trenches 123d, and all the second radial trenches 123e, so that all The upper semi-circular arc trenches 123b, all the lower semi-circular arc trenches 123c, all the first radial trenches 123d, and all the second radial trenches 123e generate adsorption force, thereby firmly adsorbing and fixing the test object 10c to On the suction surface 121 of the vacuum stage 120.

In particular, the wafer ring 11 also covers a part of the auxiliary vacuum suction area 123f, so the vacuum device 130 also vacuumizes the part of the auxiliary vacuum suction area 123f covered by the wafer ring 11 to produce suction. force.

Please refer to Figure 2, Figure 3 and Figure 7D. The test object 10d can also be a 4-inch wafer. When the test object 10d is placed on the suction surface 121 of the vacuum stage 120, the test object 10d covers the second One of the two sub-vacuum adsorption zones 123a of the vacuum adsorption zone 123, and covers the first to second upper semicircular arc trenches 123b, the first to second lower semicircular arc trenches 123c, and the corresponding first radial The trench 123d and the corresponding second radial trench 123e. In this state, the vacuum device 130 is connected to the first to second upper semicircular arc trenches 123b, the first to second lower semicircular arc trenches 123c, the corresponding first radial trench 123d, and the corresponding second radial trench. The trench 123e forms a passage. Next, the vacuum device 130 performs processing on the first to second upper semicircular arc trenches 123b, the first to second lower semicircular arc trenches 123c, the corresponding first radial trench 123d, and the corresponding second radial trench 123e. The action of vacuuming so that the first to second upper semicircular arc trenches 123b, the first to second lower semicircular arc trenches 123c, the corresponding first radial trench 123d, and the corresponding second radial trench 123e The adsorption force is generated, so that the test object 10d is firmly adsorbed and fixed on the adsorption surface 121 of the vacuum stage 120.

Please refer to FIG. 2, FIG. 3 and FIG. 7E, the test object 10e can also be an 8-inch glass wafer, and the air bearing stage 170 is used to carry the test object 10e. The outer vacuum suction zone 172 can be used to provide suction to the external part of the test object 10e, so as to adsorb and fix the test object 10e, and the air flotation zone 171 can provide blowing force to the middle part within the outer edge of the test object 10e. This prevents the object to be tested 10e from sagging or sinking. In this way, the outer edge part and the middle part of the test object 10e can be equally stressed, which helps to maintain the surface flatness of the test object 10e within a better range, so as to facilitate the test or processing of the test object 10e. Follow-up work.

In summary, the vacuum detection stage created by the present invention can generate adsorption force in a specific area of the suction surface of the vacuum stage (for example, the area covered by the test object) according to the size and geometric contour of the object to be tested. Accordingly, the object to be tested can be firmly adsorbed and fixed on the adsorption surface of the vacuum stage, which helps to improve the detection efficiency and accuracy. Furthermore, since only the area covered by the object to be tested generates the adsorption force on the adsorption surface, the strength of the adsorption force is maintained and it is not easy to weaken. On the other hand, the level of the vacuum stage can be adjusted through multiple fine-tuning columns. At the same time, the suction surface of the vacuum stage has a high flatness, which helps to improve the image resolution of the object to be measured.

Although the creation of this new type has been disclosed in the above embodiments, it is not intended to limit the creation of this new type. Anyone with ordinary knowledge in the technical field can make some changes and changes without departing from the spirit and scope of the creation of the new type. Retouching, so the scope of protection of the creation of this new model shall be subject to the scope of the attached patent application.

10a~10e: DUT 11: Wafer ring 100: Vacuum testing stage 101: staggered point 102: Circle Center 103: The first meeting point 104: The second meeting point 110: base 120: Vacuum stage 121: Adsorption surface 122: The first vacuum adsorption zone 122a, 123a: sub-vacuum adsorption zone 122b: Vacuum adsorption channel 122c: rectangular ditch 122d: lateral ditch 122e: Longitudinal trench 123: The second vacuum adsorption zone 123b: Upper semi-circular arc trench 123c: Lower semicircular arc trench 123d: first radial trench 123e: second radial trench 123f: auxiliary vacuum adsorption zone 124: Bottom 125: Suction hole 130: vacuum device 140: control device 150: Gas Mouth 160: fine-tuning column 170: Air Floating Platform 171: Air Flotation Zone 172: Outer vacuum adsorption zone A-A1: Line segment D1: First direction D2: second direction R1, R2: area

FIG. 1 is a schematic diagram of the structure of a vacuum detection stage according to an embodiment of the present invention. Fig. 2 is a schematic diagram of a specific structure of a vacuum detection stage according to an embodiment of the present invention. Fig. 3 is a schematic top view of the vacuum detection stage of Fig. 2. Fig. 4 is a schematic side view of the vacuum detection stage of Fig. 2. Fig. 5 is a schematic cross-sectional view of the vacuum stage of Fig. 3 along the line A-A1. FIG. 6A is a partial enlarged schematic diagram of the region R1 in FIG. 3. FIG. 6B is a partial enlarged schematic diagram of the region R2 in FIG. 3. 7A to 7E are schematic top views of different objects to be tested placed on the vacuum detection stage of FIG. 3.

100: Vacuum testing stage

110: base

120: Vacuum stage

122: The first vacuum adsorption zone

123: The second vacuum adsorption zone

130: vacuum device

140: control device

Claims (14)

A vacuum testing stage, including: A vacuum stage has a first vacuum adsorption zone and a second vacuum adsorption zone for adsorbing at least one object to be tested, wherein the first vacuum adsorption zone and the second vacuum adsorption zone are separated from each other and are along a Arranged in the first direction; and A control device, coupled to the vacuum stage, for individually controlling the first vacuum adsorption zone or the second vacuum adsorption zone, so that the first vacuum adsorption zone and/or the second vacuum adsorption zone are generated entirely or partially Adsorption. The vacuum detection stage according to claim 1, further comprising a vacuum device coupled to the vacuum stage for providing adsorption force to the first vacuum adsorption zone and/or the second vacuum adsorption zone. The vacuum testing stage as described in claim 2, further including: A base for setting the vacuum stage, the vacuum device and the control device; and A plurality of fine adjustment columns are arranged between the base and the vacuum stage to adjust the level of the vacuum stage. One end of each fine adjustment column is connected to the base and the other end is connected to the vacuum stage. The vacuum detection stage according to claim 1, wherein the first vacuum adsorption zone has two sub-vacuum adsorption zones arranged along a second direction perpendicular to the first direction, and each sub-vacuum adsorption zone includes A plurality of vacuum adsorption flow channels arranged in the first direction, each of the vacuum adsorption flow channels includes a rectangular trench, a horizontal trench, and a plurality of longitudinal trenches staggered across the horizontal trenches, and each of the vacuum adsorption flow channels The rectangular trench surrounds the horizontal trench and the longitudinal trenches. The vacuum detection stage according to claim 4, wherein the vacuum stage further has a bottom surface opposite to the suction surface and a plurality of suction holes penetrating the suction surface and the bottom surface, the transverse trenches and the The longitudinal trenches form a plurality of staggered points, and the suction holes are distributed at the staggered points. The vacuum detection stage according to claim 1, wherein the second vacuum adsorption zone has two sub-vacuum adsorption zones arranged along a second direction perpendicular to the first direction, and each of the sub-vacuum adsorption zones includes A plurality of upper semicircular arc trenches arranged along the first direction and a plurality of lower semicircular arc trenches arranged along the first direction, the upper semicircular arc trenches and the lower semicircular arc trenches having the same center . The vacuum detection stage according to claim 6, wherein from the center of the circle outward, the nth upper semicircular arc trench is connected to the (n+1)th upper semicircular arc trench, and the nth lower semicircular arc trench is The semicircular arc trench is connected to the (n+1)th lower semicircular arc trench, where n is greater than or equal to 1, and is an odd number. The vacuum detection stage according to claim 7, wherein each of the sub-vacuum adsorption zones further includes a plurality of first radial trenches and a plurality of second radial trenches, the nth upper semicircular arc trench and the first ( At least one first radial trench is provided between the n+1) upper semicircular arc trenches to communicate with each other, and the nth lower semicircular arc trench and the (n+1)th lower semicircular arc trench At least one second radial trench is provided between them to communicate with each other. The vacuum detection stage according to claim 8, wherein: From the center of the circle, the radius of curvature of the (n+2)th upper semicircular arc trench is greater than the radius of curvature of the nth upper semicircular arc trench, and the (n+2)th upper semicircular arc trench The number of the first radial trenches connected to each other is greater than the number of the first radial trenches connected to the nth upper semicircular arc trench; and From the center of the circle, the radius of curvature of the (n+2)th lower semicircular arc trench is greater than the radius of curvature of the nth lower semicircular arc trench, and the (n+2)th lower semicircular arc trench The number of the connected second radial trenches is greater than the number of the second radial trenches connected with the nth lower semicircular arc trench. The vacuum detection stage according to claim 8, wherein the vacuum stage further has a bottom surface opposite to the suction surface and a plurality of suction holes penetrating the suction surface and the bottom surface, and the first radial directions communicating with each other The trenches and the upper semicircular arc trenches form a plurality of first intersection points, and the second radial trenches and the lower semicircular arc trenches that are connected to each other form a plurality of second intersection points, and the suction holes are distributed At the first intersection points and the second intersection points. The vacuum detection stage according to claim 6, wherein the second vacuum adsorption zone further has a plurality of auxiliary vacuum adsorption zones, and the auxiliary vacuum adsorption zones are distributed around each of the sub-vacuum adsorption zones. The vacuum detection stage according to claim 1, further comprising an air flotation stage arranged on the base and located on one side of the vacuum stage, the air flotation stage having an air flotation area and a surrounding air flotation zone The outer vacuum adsorption zone of the zone. The vacuum detection stage according to claim 1, wherein the shapes of the first vacuum adsorption zone and the second vacuum adsorption zone are quadrilateral or square respectively. The vacuum inspection stage according to claim 1, wherein the object to be tested is a square panel, a 12-inch round wafer with a wafer ring, a 12-inch round wafer, and an 8-inch round wafer , At least one of a 6-inch round wafer, a 4-inch round wafer, and an 8-inch round glass wafer, or a combination thereof.

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