TWM670763U - Wet process device - Google Patents
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Abstract
Description
本申請涉及一種濕式處理設備,特別是關於一種可變流場之濕式處理設備。The present application relates to a wet processing equipment, and in particular to a wet processing equipment with a variable flow field.
在半導體晶圓、封裝、顯示面板、發光二極體等產品的製造過程中,需要經過一晶圓(基板)處理系統,以對基板的表面供給處理液,例如化學品或去離子水等,進行蝕刻、清洗、去光阻等處理程序,而在該基板處理系統中,則必須藉由一濕製程設備來針對使用過之製程液進行收集、排液、回收等後續處理。然而,傳統濕製程設備僅能提供單一方向的內循環,且管路設計複雜,必須要添購多種設備才能執行不同流場模式的製程,也無法過濾流動循環中的液體,進而增加設備成本,影響良率、造成表面缺陷、電性等問題。In the manufacturing process of semiconductor wafers, packages, display panels, LEDs and other products, a wafer (substrate) processing system is required to supply processing liquids, such as chemicals or deionized water, to the surface of the substrate for etching, cleaning, photoresist removal and other processing procedures. In the substrate processing system, a wet process equipment must be used to collect, drain, recycle and other subsequent processing of the used process liquid. However, traditional wet process equipment can only provide a single-direction internal circulation, and the pipeline design is complex. It is necessary to purchase multiple equipment to perform processes with different flow field modes. It is also impossible to filter the liquid in the flow circulation, which increases the equipment cost, affects the yield, and causes surface defects and electrical problems.
本申請之一目的在於提供一種濕式處理設備,其具有簡化的管路設計,並可切換多種流場模式,且可持續過濾製程中的液體。One purpose of this application is to provide a wet processing equipment which has a simplified pipeline design, can switch between multiple flow field modes, and can continuously filter the liquid in the process.
為達上述目的,本申請提供一種可變流場之濕式處理設備,包括:一第一槽體,包括至少一第一連通口;一第二槽體,包括一第二連通口,且該第二槽體位於該第一槽體的側部;一泵浦,包括一進液口端及一排液口端;一第一管路,該第一管路的一端連接至該泵浦的排液口端,且該第一管路中具有一第一閥件;一第二管路, 該第二管路的一端連接至該第二槽體的第二連通口,另一端連接至該泵浦的進液口端,且該第二管路中具有一第二閥件及一第三閥件;一第三管路,該第三管路的一端連接至該第二閥件及該第三閥件之間的該第二管路,且該第三管路中具有一第四閥件,其中該第一管路及該第三管路的至少其中之一的另一端連接至該第一槽體的該至少一第一連通口;一第四管路,該第四管路的一端連接至該第二閥件及該第二槽體之間的該第二管路,另一端連接至該第一閥件及該泵浦之間的該第一管路,且該第四管路中具有一第五閥件;以及一第五管路, 該第五管路的一端連接至該第二閥件及該第三閥件之間的該第二管路,另一端連接至該第三閥件及該泵浦之間的該第二管路,且該第五管路中具有一第六閥件及一第七閥件。To achieve the above-mentioned purpose, the present application provides a wet processing equipment with a variable flow field, comprising: a first tank body, comprising at least one first communication port; a second tank body, comprising a second communication port, and the second tank body is located at the side of the first tank body; a pump, comprising a liquid inlet end and a liquid outlet end; a first pipeline, one end of the first pipeline is connected to the liquid outlet end of the pump, and the first pipeline has a first valve; a second pipeline, One end of the second pipeline is connected to the second communication port of the second tank body, and the other end is connected to the liquid inlet end of the pump, and the second pipeline has a second valve and a third valve; a third pipeline, one end of the third pipeline is connected to the second pipeline between the second valve and the third valve, and the third pipeline has a fourth valve, wherein the other end of at least one of the first pipeline and the third pipeline is connected to the at least one first communication port of the first tank body; a fourth pipeline, one end of the fourth pipeline is connected to the second pipeline between the second valve and the second tank body, and the other end is connected to the first pipeline between the first valve and the pump, and the fourth pipeline has a fifth valve; and a fifth pipeline, One end of the fifth pipeline is connected to the second pipeline between the second valve and the third valve, and the other end is connected to the second pipeline between the third valve and the pump, and a sixth valve and a seventh valve are provided in the fifth pipeline.
較佳地,該第一槽體包括兩個該第一連通口,該第一管路的該端連接至該兩個第一連通口的其中之一,及該第二管路的該端連接至另一該第二連通口。Preferably, the first tank includes two first communication ports, the end of the first pipeline is connected to one of the two first communication ports, and the end of the second pipeline is connected to the other second communication port.
較佳地,該第一管路的該另一端連接至該第四閥件及該第一槽體之間的該第三管路。Preferably, the other end of the first pipeline is connected to the third pipeline between the fourth valve and the first tank.
較佳地,該濕式處理設備還包括一第二延伸管路及一第三延伸管路,該第二延伸管路的一端連接至該第二閥件及該第三閥件之間的該第二管路,且該第三延伸管路的一端連接至該第四閥件及該第一槽體之間的該第三管路 ,其中該第三延伸管路中具有一第八閥件,且該第二延伸管路中具有一第九閥件。Preferably, the wet treatment equipment also includes a second extension pipeline and a third extension pipeline, one end of the second extension pipeline is connected to the second pipeline between the second valve component and the third valve component, and one end of the third extension pipeline is connected to the third pipeline between the fourth valve component and the first trough body, wherein the third extension pipeline has an eighth valve component and the second extension pipeline has a ninth valve component.
較佳地,當該開啟該第二閥件、該第八閥件及該第九閥件且關閉該第一閥件、該第三閥件、該第四閥件、該第五閥件、該第六閥件及該第七閥件時,該濕式處理設備處於排液流場模式。Preferably, when the second valve, the eighth valve and the ninth valve are opened and the first valve, the third valve, the fourth valve, the fifth valve, the sixth valve and the seventh valve are closed, the wet processing equipment is in the discharge flow field mode.
較佳地,當開啟該第一閥件、該第二閥件及該第三閥件且關閉該第四閥件、該第五閥件、該第六閥件及該第七閥件時,該濕式處理設備處於第一升流循環流場模式;當開啟該第一閥件、該第二閥件、該第六閥件及該第七閥件且關閉該第三閥件、該第四閥件及該第五閥件時,該濕式處理設備處於第二升流循環流場模式。Preferably, when the first valve, the second valve and the third valve are opened and the fourth valve, the fifth valve, the sixth valve and the seventh valve are closed, the wet treatment equipment is in a first upflow circulation flow field mode; when the first valve, the second valve, the sixth valve and the seventh valve are opened and the third valve, the fourth valve and the fifth valve are closed, the wet treatment equipment is in a second upflow circulation flow field mode.
較佳地,當開啟該第三閥件、該第四閥件及該第五閥件且關閉該第一閥件、該第二閥件、該第六閥件及該第七閥件時,該濕式處理設備處於第一降流循環流場模式;當開啟該第四閥件、該第五閥件、該第六閥件及該第七閥件且關閉該第一閥件、該第二閥件及該第三閥件時,該濕式處理設備處於第二降流循環流場模式。Preferably, when the third valve, the fourth valve and the fifth valve are opened and the first valve, the second valve, the sixth valve and the seventh valve are closed, the wet treatment equipment is in a first downflow circulation flow field mode; when the fourth valve, the fifth valve, the sixth valve and the seventh valve are opened and the first valve, the second valve and the third valve are closed, the wet treatment equipment is in a second downflow circulation flow field mode.
較佳地,該濕式處理設備還包括至少一過濾器,其至少設置在該第二管路及該第一管路的其中之一。Preferably, the wet treatment equipment further includes at least one filter, which is disposed in at least one of the second pipeline and the first pipeline.
較佳地,多個該過濾器串聯設置。Preferably, a plurality of the filters are arranged in series.
較佳地,該濕式處理設備還包括一第一並聯管路及多個該過濾器,其中該多個過濾器並聯設置在該第一並聯管路。Preferably, the wet treatment equipment further includes a first parallel pipeline and a plurality of the filters, wherein the plurality of filters are arranged in parallel in the first parallel pipeline.
較佳地,該濕式處理設備還包括至少一濾袋設備,其設置在該第六閥件及該第七閥件之間的該第五管路。Preferably, the wet treatment equipment further comprises at least one filter bag device, which is arranged in the fifth pipeline between the sixth valve component and the seventh valve component.
較佳地,多個該濾袋設備串聯設置。Preferably, a plurality of the filter bag devices are arranged in series.
較佳地,該濕式處理設備還包括一第二並聯管路及多個該濾袋設備,其中該第二並聯管路連接至該第五管路,且該多個濾袋設備並聯設置在該第二並聯管路。Preferably, the wet treatment equipment further includes a second parallel pipeline and a plurality of the filter bag devices, wherein the second parallel pipeline is connected to the fifth pipeline, and the plurality of filter bag devices are arranged in parallel in the second parallel pipeline.
較佳地,該濕式處理設備還包括至少一溢流口,其設置在該第一槽體和該第二槽體之間,用以供液體進出。Preferably, the wet processing equipment further includes at least one overflow port, which is arranged between the first tank body and the second tank body for liquid to enter and exit.
本申請實施例的濕式處理設備可以切換升流、降流、靜止多種流場模式,以減少設備費用,提升製程切換便利性,且循環管路與排液管路共用,以減少管路數量,增加利用空間,更加裝外槽過濾元件、管路中的過濾器及濾袋設備的過濾系統,減少汙染物回沾,提升化學品重複利用率,有效解決傳統濕製程設備僅能提供單一方向的循環模式,且管路設計複雜,並且無法過濾液體所造成影響良率、表面缺陷、電性等問題。The wet treatment equipment of the embodiment of the present application can switch between multiple flow field modes such as upflow, downflow, and static to reduce equipment costs and improve the convenience of process switching. The circulation pipeline and the drainage pipeline are shared to reduce the number of pipelines and increase the utilization space. The filtration system is further equipped with an external tank filter element, a filter in the pipeline, and a filter bag equipment to reduce the back-contamination of pollutants and improve the reuse rate of chemicals. It effectively solves the problems that traditional wet process equipment can only provide a single-direction circulation mode, the pipeline design is complex, and it cannot filter liquids, which affects the yield, surface defects, electrical properties, etc.
以下各實施例的說明是參考附加的圖式,用以例示本申請可用以實施的特定實施例。本申請所提到的方向用語,例如“上”、“下”、“前”、“後”、“左”、“右”、“內”、“外”、“側面”等,僅是參考附加圖式的方向。因此,使用的方向用語是用以說明及理解本申請,而非用以限制本申請。The following descriptions of the embodiments refer to the attached drawings to illustrate specific embodiments that can be implemented in the present application. Directional terms mentioned in the present application, such as "upper", "lower", "front", "back", "left", "right", "inner", "outer", "side", etc., are only with reference to the directions of the attached drawings. Therefore, the directional terms used are used to explain and understand the present application, but not to limit the present application.
本申請特別以下述例子加以描述,這些例子僅係用以舉例說明而已,因為對於熟習此技藝者而言,在不脫離本揭示內容之精神和範圍內,當可作各種之更動與潤飾,因此本揭示內容之保護範圍當視後附之申請專利範圍所界定者為準。在通篇說明書與申請專利範圍中,除非內容清楚指定,否則「一」以及「所述」的意義包含這一類敘述包含「一或至少一」所述元件或成分。此外,如本申請所用,除非從特定上下文明顯可見將複數個排除在外,否則單數冠詞亦包含複數個元件或成分的敘述。而且,應用在此描述中與下述之全部申請專利範圍中時,除非內容清楚指定,否則「在其中」的意思可包含「在其中」與「在其上」。The present application is particularly described with the following examples, which are used for illustration only, because for those skilled in the art, various changes and modifications can be made without departing from the spirit and scope of the present disclosure, so the protection scope of the present disclosure shall be subject to the definition of the attached patent scope. Throughout the specification and the patent scope, unless the content clearly specifies, the meaning of "one" and "the" includes such a description including "one or at least one" of the elements or components. In addition, as used in the present application, unless it is obvious from the specific context that the plural is excluded, the singular article also includes the description of plural elements or components. Moreover, when applied in this description and the entire patent scope below, unless the content clearly specifies, the meaning of "in which" may include "in which" and "on which".
下面將結合本申請實施例中的附圖,對本申請實施例中的技術方案進行清楚、完整地描述,顯然,所描述的實施例僅是本申請一部分實施例,而不是全部的實施例。基於本申請中的實施例,本領域技術人員在沒有作出創造性勞動前提下所獲得的所有其他實施例,都屬本申請保護的範圍。The following will be combined with the drawings in the embodiments of this application to clearly and completely describe the technical solutions in the embodiments of this application. Obviously, the described embodiments are only part of the embodiments of this application, not all of them. Based on the embodiments in this application, all other embodiments obtained by technical personnel in this field without creative labor are within the scope of protection of this application.
本申請提供一種濕式處理設備,尤其是指一種浸泡式並可變流場的濕式處理設備,適用於批次量的基板或晶圓的處理製程,例如半導體前段製程、半導體先進封裝製程、化合物半導體製程、光電製程等有關蝕刻、清洗、去光阻等處理。參照圖1, 其為本申請一實施例的可變流場之濕式處理設備1的剖面示意圖。本申請的濕式處理設備1包括一第一槽體11、一第二槽體12、一泵浦3、一第一管路21、一第二管路22、一第三管路23、一第四管路24、一第五管路25、一第二延伸管路221及一第三延伸管路231。如圖1所示,第二槽體12位於第一槽體11(內槽)的側部,且為環繞第一槽體11周圍的外槽。第一槽體11和第二槽體12之間的連接壁具有至少一用於液體進出的溢流口101。具體地,第二槽體12的外側壁的高度大於第一槽體11和第二槽體12之間的連接壁的高度,以形成溢流口101,使第一槽體11內的液體溢滿時可沿該連接壁流入第二槽體12。在一些實施例中,可以透過在第一槽體11和第二槽體12之間的該連接壁開孔以形成溢流口101。具體地,第一槽體11的底部包括兩個第一連通口111及112,第二槽體12的底部包括一第二連通口121。泵浦3具有一進液口端301及一排液口端302。在一些實施例中,在第二槽體12靠近頂部處設置有過濾元件13,以過濾第一槽體11和第二槽體12內液體中的雜質或細小微粒等。The present application provides a wet processing device, in particular, an immersion-type and variable flow field wet processing device, which is suitable for batch processing of substrates or wafers, such as semiconductor front-end processes, semiconductor advanced packaging processes, compound semiconductor processes, optoelectronic processes, etc., related to etching, cleaning, photoresist removal, etc. Refer to Figure 1, which is a cross-sectional schematic diagram of a variable flow field wet processing device 1 of an embodiment of the present application. The wet processing device 1 of the present application includes a first tank body 11, a second tank body 12, a pump 3, a first pipeline 21, a second pipeline 22, a third pipeline 23, a fourth pipeline 24, a fifth pipeline 25, a second extension pipeline 221 and a third extension pipeline 231. As shown in FIG1 , the second tank body 12 is located at the side of the first tank body 11 (inner tank) and is an outer tank surrounding the first tank body 11. The connecting wall between the first tank body 11 and the second tank body 12 has at least one overflow port 101 for liquid to enter and exit. Specifically, the height of the outer side wall of the second tank body 12 is greater than the height of the connecting wall between the first tank body 11 and the second tank body 12 to form the overflow port 101, so that the liquid in the first tank body 11 can flow into the second tank body 12 along the connecting wall when it overflows. In some embodiments, the overflow port 101 can be formed by opening a hole in the connecting wall between the first tank body 11 and the second tank body 12. Specifically, the bottom of the first tank body 11 includes two first communication ports 111 and 112, and the bottom of the second tank body 12 includes a second communication port 121. The pump 3 has a liquid inlet port 301 and a liquid outlet port 302. In some embodiments, a filter element 13 is disposed near the top of the second tank body 12 to filter impurities or fine particles in the liquid in the first tank body 11 and the second tank body 12.
如圖1所示,在此實施例中,第一管路21的一端連接至泵浦3的排液口端302,另一端連接至第一槽體11的第一連通口112,且第一管路21中具有一第一閥件51。第二管路22的一端連接至第二槽體12的第二連通口121,另一端連接至泵浦3的進液口端301,且第二管路22中具有一第二閥件52及一第三閥件53。第三管路23的一端連接至第二閥件52及第三閥件53之間的第二管路22,另一端連接至第一槽體11的第一連通口111,且第三管路23中具有一第四閥件54。第四管路24的一端連接至第二閥件52及第二槽體12之間的第二管路22,另一端連接至第一閥件51及泵浦3之間的第一管路21,且第四管路24中具有一第五閥件55。第五管路25的一端連接至第二閥件52及第三閥件53之間的第二管路22,另一端連接至第三閥件53及泵浦3之間的第二管路22,且第五管路25中具有一第六閥件56及一第七閥件57。As shown in FIG. 1 , in this embodiment, one end of the first pipeline 21 is connected to the discharge port 302 of the pump 3, and the other end is connected to the first communication port 112 of the first tank 11, and the first pipeline 21 has a first valve 51. One end of the second pipeline 22 is connected to the second communication port 121 of the second tank 12, and the other end is connected to the inlet port 301 of the pump 3, and the second pipeline 22 has a second valve 52 and a third valve 53. One end of the third pipeline 23 is connected to the second pipeline 22 between the second valve 52 and the third valve 53, and the other end is connected to the first communication port 111 of the first tank 11, and the third pipeline 23 has a fourth valve 54. One end of the fourth pipeline 24 is connected to the second pipeline 22 between the second valve 52 and the second tank 12, and the other end is connected to the first pipeline 21 between the first valve 51 and the pump 3, and a fifth valve 55 is provided in the fourth pipeline 24. One end of the fifth pipeline 25 is connected to the second pipeline 22 between the second valve 52 and the third valve 53, and the other end is connected to the second pipeline 22 between the third valve 53 and the pump 3, and a sixth valve 56 and a seventh valve 57 are provided in the fifth pipeline 25.
繼續參照圖1,第二延伸管路221的一端連接至第二閥件52及第三閥件53之間的第二管路22,且第二延伸管路221中具有一第九閥件59。第三延伸管路231的一端連接至第四閥件54及第一槽體11之間的第三管路23,且第三延伸管路231中具有一第八閥件58。第二延伸管路221及第三延伸管路231分別連接於外部處理設備(未圖示),用於將液體排出槽體外,不再經過濕式處理設備1的循環。在一些實施例中,第二延伸管路221與第二管路22為同一管路,作為第二槽體12(外槽)的排液管使用,第三延伸管路231與第三管路23為同一管路,作為第一槽體11(內槽)的排液管使用,也就是說,本申請的第一槽體11與第二槽體12各自的排液管路與循環管路共用,以減少管路數量,增加利用空間。Continuing to refer to FIG. 1 , one end of the second extension pipeline 221 is connected to the second pipeline 22 between the second valve 52 and the third valve 53, and the second extension pipeline 221 has a ninth valve 59. One end of the third extension pipeline 231 is connected to the third pipeline 23 between the fourth valve 54 and the first tank 11, and the third extension pipeline 231 has an eighth valve 58. The second extension pipeline 221 and the third extension pipeline 231 are respectively connected to external processing equipment (not shown) to discharge the liquid out of the tank without circulating through the wet processing equipment 1. In some embodiments, the second extension pipeline 221 and the second pipeline 22 are the same pipeline, which are used as the drainage pipe of the second tank body 12 (outer tank), and the third extension pipeline 231 and the third pipeline 23 are the same pipeline, which are used as the drainage pipe of the first tank body 11 (inner tank). In other words, the drainage pipeline and circulation pipeline of the first tank body 11 and the second tank body 12 of the present application are shared to reduce the number of pipelines and increase the utilization space.
參照圖2,其為本申請另一實施例的濕式處理設備1’的剖面示意圖。圖2所示的濕式處理設備1’與圖1所示的濕式處理設備1的區別在於第一管路21及第三管路23與第一槽體11的連接關係的不同。在一些實施例中,該第一管路21及該第三管路23的至少其中之一的一端連接至第一槽體11的第一連通口111或112。具體地,如圖2所示的實施例中,第一管路21遠離泵浦3的一端連接至第四閥件54及第一槽體11之間的第三管路23,亦即,第一管路21透過第三管路23連接至第一槽體11的第一連通口111或112,使管路共用,減少管路數量,增加利用空間。Refer to Figure 2, which is a cross-sectional schematic diagram of a wet processing equipment 1' of another embodiment of the present application. The difference between the wet processing equipment 1' shown in Figure 2 and the wet processing equipment 1 shown in Figure 1 lies in the different connection relationships between the first pipeline 21 and the third pipeline 23 and the first tank body 11. In some embodiments, one end of at least one of the first pipeline 21 and the third pipeline 23 is connected to the first communication port 111 or 112 of the first tank body 11. Specifically, in the embodiment shown in Figure 2, the end of the first pipeline 21 far from the pump 3 is connected to the third pipeline 23 between the fourth valve 54 and the first tank body 11, that is, the first pipeline 21 is connected to the first communication port 111 or 112 of the first tank body 11 through the third pipeline 23, so that the pipelines are shared, the number of pipelines is reduced, and the utilization space is increased.
如圖1所示,本申請濕式處理設備1還包括至少一過濾器6及至少一濾袋設備7,其分別用於過濾在對基板的處理製程中,第一槽體11及第二槽體12內液體中的汙染源,例如雜質或細小微粒等。詳細地,過濾器6至少設置在第二管路22及第一管路21的其中之一,亦即,過濾器6可設置在泵浦3的進液方向或排液方向或兩邊皆設置,以提升過濾效果。濾袋設備7設置在第六閥件56及第七閥件57之間的第五管路25。As shown in FIG1 , the wet processing equipment 1 of the present application further includes at least one filter 6 and at least one filter bag device 7, which are used to filter the pollution sources, such as impurities or fine particles, in the liquid in the first tank body 11 and the second tank body 12 during the processing of the substrate. In detail, the filter 6 is at least arranged in one of the second pipeline 22 and the first pipeline 21, that is, the filter 6 can be arranged in the liquid inlet direction or the liquid discharge direction of the pump 3 or both sides to enhance the filtering effect. The filter bag device 7 is arranged in the fifth pipeline 25 between the sixth valve 56 and the seventh valve 57.
本申請實施例的濕式處理設備可依據實際製程需求切換液體在管路的流動路徑,以實現在相同的濕式處理設備中應付不同流場的需求。一般而言,流體由內槽向上溢流到外槽,簡稱升流流場;流體由外槽往內槽向下流,簡稱降流流場;以及流體靜止,簡稱靜止流場。參照圖3,其為濕式處理設備1處於第一升流循環流場模式的結構示意圖,其中圖示中箭頭所指方向即代表液體流動之方向。如圖3所示,當開啟第一閥件51、第二閥件52及第三閥件53且關閉第四閥件54、第五閥件55、第六閥件56、第七閥件57、第八閥件58及第九閥件59時,濕式處理設備1處於第一升流循環流場模式。詳細地,第二槽體12內的液體8先流經第二管路22並通過過濾器6的過濾流入泵浦3,接著流經第一管路21後進入第一槽體11內並逐漸上升,最後溢出第一槽體11的液體8經由溢流口101流入第二槽體12,進而繼續上述路徑的循環流動。The wet processing equipment of the embodiment of the present application can switch the flow path of the liquid in the pipeline according to the actual process requirements to achieve the requirements of different flow fields in the same wet processing equipment. Generally speaking, the fluid overflows from the inner tank to the outer tank, which is referred to as the upflow flow field; the fluid flows downward from the outer tank to the inner tank, which is referred to as the downflow flow field; and the fluid is stationary, which is referred to as the stationary flow field. Refer to Figure 3, which is a structural schematic diagram of the wet processing equipment 1 in the first upflow circulation flow field mode, wherein the direction indicated by the arrow in the diagram represents the direction of liquid flow. As shown in FIG3 , when the first valve 51, the second valve 52 and the third valve 53 are opened and the fourth valve 54, the fifth valve 55, the sixth valve 56, the seventh valve 57, the eighth valve 58 and the ninth valve 59 are closed, the wet treatment equipment 1 is in the first upflow circulation flow field mode. Specifically, the liquid 8 in the second tank 12 first flows through the second pipeline 22 and flows into the pump 3 after being filtered by the filter 6, then flows through the first pipeline 21 and enters the first tank 11 and gradually rises, and finally the liquid 8 overflowing the first tank 11 flows into the second tank 12 through the overflow port 101, and then continues the circulation flow of the above path.
參照圖4,其為濕式處理設備1處於第二升流循環流場模式的結構示意圖。如圖4所示,當開啟第一閥件51、第二閥件52、第六閥件56及第七閥件57且關閉第三閥件53、第四閥件54、第五閥件55、第八閥件58及第九閥件59時,濕式處理設備1處於第二升流循環流場模式。詳細地,第二槽體12內的液體8先流經第二管路22,接著流經第五管路25並通過濾袋設備7的過濾,之後流經第二管路22並通過過濾器6的過濾後流入泵浦3,最後流經第一管路21後進入第一槽體11內並逐漸上升,後續溢出第一槽體11的液體8經由溢流口101流入第二槽體12,進而繼續上述路徑的循環流動。Referring to Fig. 4, it is a schematic diagram of the structure of the wet treatment equipment 1 in the second upflow circulation flow field mode. As shown in Fig. 4, when the first valve 51, the second valve 52, the sixth valve 56 and the seventh valve 57 are opened and the third valve 53, the fourth valve 54, the fifth valve 55, the eighth valve 58 and the ninth valve 59 are closed, the wet treatment equipment 1 is in the second upflow circulation flow field mode. In detail, the liquid 8 in the second tank body 12 first flows through the second pipeline 22, then flows through the fifth pipeline 25 and is filtered by the filter bag device 7, then flows through the second pipeline 22 and is filtered by the filter 6 and then flows into the pump 3, and finally flows through the first pipeline 21 and enters the first tank body 11 and gradually rises, and the liquid 8 that subsequently overflows the first tank body 11 flows into the second tank body 12 through the overflow port 101, and then continues the circulation flow of the above path.
參照圖5,其為濕式處理設備1處於第一降流循環流場模式的結構示意圖。如圖5所示,當開啟第三閥件53、第四閥件54及第五閥件55且關閉第一閥件51、第二閥件52、第六閥件56、第七閥件57、第八閥件58及第九閥件59時,濕式處理設備1處於第一降流循環流場模式。詳細地,第一槽體11內的液體8先下降流經第三管路23,接著經過第二管路22並通過過濾器6的過濾流入泵浦3,之後流經第四管路後進入第二槽體12,最後溢出第二槽體12的液體8經由溢流口101流入第一槽體11,進而繼續上述路徑的循環流動。Referring to Fig. 5, it is a schematic diagram of the structure of the wet treatment equipment 1 in the first downflow circulation flow field mode. As shown in Fig. 5, when the third valve 53, the fourth valve 54 and the fifth valve 55 are opened and the first valve 51, the second valve 52, the sixth valve 56, the seventh valve 57, the eighth valve 58 and the ninth valve 59 are closed, the wet treatment equipment 1 is in the first downflow circulation flow field mode. In detail, the liquid 8 in the first tank 11 first flows downward through the third pipe 23, then flows through the second pipe 22 and filtered by the filter 6 to flow into the pump 3, then flows through the fourth pipe and enters the second tank 12, and finally the liquid 8 overflowing the second tank 12 flows into the first tank 11 through the overflow port 101, and then continues the circulation flow of the above path.
參照圖6,其為濕式處理設備1處於第二降流循環流場模式的結構示意圖。如圖6所示,當開啟第四閥件54、第五閥件55、第六閥件56及該第七閥件57且關閉第一閥件51、第二閥件52、第三閥件53、第八閥件58及第九閥件59時,濕式處理設備1處於第二降流循環流場模式。詳細地,第一槽體11內的液體8先下降流經第三管路23,接著經過第二管路22並通過濾袋設備7的過濾,之後流經第二管路22並通過過濾器6的過濾後流入泵浦3,泵浦3排出後流經第四管路後進入第二槽體12,後續溢出第二槽體12的液體8經由溢流口101流入第一槽體11,進而繼續上述路徑的循環流動。Referring to Fig. 6, it is a schematic diagram of the structure of the wet treatment equipment 1 in the second downflow circulation flow field mode. As shown in Fig. 6, when the fourth valve 54, the fifth valve 55, the sixth valve 56 and the seventh valve 57 are opened and the first valve 51, the second valve 52, the third valve 53, the eighth valve 58 and the ninth valve 59 are closed, the wet treatment equipment 1 is in the second downflow circulation flow field mode. In detail, the liquid 8 in the first tank body 11 first flows downward through the third pipeline 23, then flows through the second pipeline 22 and is filtered by the filter bag device 7, then flows through the second pipeline 22 and is filtered by the filter 6 and then flows into the pump 3. After being discharged from the pump 3, it flows through the fourth pipeline and then enters the second tank body 12. Subsequently, the liquid 8 overflowing from the second tank body 12 flows into the first tank body 11 through the overflow port 101, and then continues the circulation flow of the above path.
參照圖7,其為濕式處理設備1處於靜止模式的結構示意圖。如圖7所示,當所有第一閥件51至第九閥件59皆關閉,液體8不會在管路內流動,此時,濕式處理設備1處於靜止模式,以待基板9依據預定時間浸泡完成後在切換成其他流場模式。Referring to Fig. 7, it is a schematic diagram of the structure of the wet processing equipment 1 in the static mode. As shown in Fig. 7, when all the first valves 51 to the ninth valves 59 are closed, the liquid 8 will not flow in the pipeline. At this time, the wet processing equipment 1 is in the static mode, waiting for the substrate 9 to be immersed according to the predetermined time before switching to other flow field modes.
參照圖8,其為濕式處理設備1處於排液流場模式的結構示意圖。如圖8所示,當開啟第二閥件52、第八閥件58及第九閥件59且關閉第一閥件51、第三閥件53、第四閥件54、第五閥件55、第六閥件56及第七閥件57時,濕式處理設備1處於排液流場模式。詳細地,第一槽體11內的液體8經由第三管路23及第三延伸管路231直接排出並進入外部處理設備(未圖示),第二槽體12內的液體8經由第二管路22及第二延伸管路221直接排出並進入該外部處理設備,透過上述排液管路與循環管路共用的設計排出液體8。Refer to FIG8 , which is a schematic diagram of the structure of the wet treatment equipment 1 in the discharge flow field mode. As shown in FIG8 , when the second valve 52, the eighth valve 58 and the ninth valve 59 are opened and the first valve 51, the third valve 53, the fourth valve 54, the fifth valve 55, the sixth valve 56 and the seventh valve 57 are closed, the wet treatment equipment 1 is in the discharge flow field mode. In detail, the liquid 8 in the first tank body 11 is directly discharged through the third pipeline 23 and the third extension pipeline 231 and enters the external treatment equipment (not shown), and the liquid 8 in the second tank body 12 is directly discharged through the second pipeline 22 and the second extension pipeline 221 and enters the external treatment equipment, and the liquid 8 is discharged through the design shared by the above-mentioned discharge pipeline and the circulation pipeline.
參照圖9及圖10,圖9為濕式處理設備1的俯視示意圖。如圖9所示,在第二槽體12(外槽)的頂部處設置有過濾元件13,並可依需求選取過濾元件13的孔徑大小。在一些實施例中,如圖10所示,過濾元件13可為單層或多層設置,例如三層,以初步過濾濾徑較大污染物及雜質。Referring to Figures 9 and 10, Figure 9 is a schematic top view of the wet treatment device 1. As shown in Figure 9, a filter element 13 is disposed at the top of the second tank body 12 (outer tank), and the pore size of the filter element 13 can be selected as required. In some embodiments, as shown in Figure 10, the filter element 13 can be a single-layer or multi-layer arrangement, such as three layers, to preliminarily filter pollutants and impurities with larger filter diameters.
參照圖11A及圖11B,其分別為圖1的濕式處理設備之A部分的不同實施例的配置示意圖。本申請的濾袋設備7作為中段過濾,濾袋設備7內含濾芯、濾網或濾袋,可依需求更換孔徑。如圖11A所示,在一些實施例中,多個濾袋設備7以並聯方式設置在第六閥件56及第七閥件57之間的第二並聯管路262,該第二並聯管路262的兩端分別連接至第五管路25。具體地,第二並聯管路262中對應每一濾袋設備7設置有一閥件,以控制液體8在第二並聯管路262中不同的流動路徑。如圖11B所示,多個濾袋設備7採用串聯設置,以提升過濾效果。在一些實施例中,可配置多組串聯的濾袋設備7,再將每一組串聯的濾袋設備7彼此並聯設置。本申請利用將濾袋設備7串聯以增強過濾效率,也可將濾袋設備7並聯以在製程中不停機切換,進行清洗、更換濾芯,以達到持續過濾液體並確保液體無雜質的目的。Refer to FIG. 11A and FIG. 11B , which are respectively schematic configuration diagrams of different embodiments of part A of the wet treatment equipment of FIG. 1 . The filter bag device 7 of the present application serves as a mid-stage filter, and the filter bag device 7 contains a filter element, a filter mesh or a filter bag, and the aperture can be replaced as needed. As shown in FIG. 11A , in some embodiments, a plurality of filter bag devices 7 are arranged in parallel in a second parallel pipeline 262 between the sixth valve 56 and the seventh valve 57 , and both ends of the second parallel pipeline 262 are respectively connected to the fifth pipeline 25 . Specifically, a valve is provided in the second parallel pipeline 262 corresponding to each filter bag device 7 to control different flow paths of the liquid 8 in the second parallel pipeline 262 . As shown in FIG. 11B , multiple filter bag devices 7 are arranged in series to enhance the filtering effect. In some embodiments, multiple sets of filter bag devices 7 in series may be configured, and each set of filter bag devices 7 in series may be arranged in parallel with each other. The present application utilizes the filter bag devices 7 in series to enhance the filtering efficiency, and the filter bag devices 7 may also be connected in parallel to switch without stopping the process, clean, and replace the filter element, so as to achieve the purpose of continuously filtering the liquid and ensuring that the liquid is free of impurities.
參照圖12A及圖12B,其分別為圖1的濕式處理設備之B部分的不同實施例的配置示意圖。本申請的過濾器6作為終段過濾,過濾器6內設置有濾芯,可依需求更換濾芯孔徑。參照圖12A並配合圖1,在一些實施例中,多個過濾器6以並聯方式設置在第三閥件53及泵浦3之間的第一並聯管路261,該第一並聯管路261連接至第二管路22。具體地,第一並聯管路261中對應每一串連的過濾器6設置有一閥件,以控制液體8在第一並聯管路261中不同的流動路徑。如圖12B所示,多個過濾器6採用串聯設置,以提升過濾效果。在一些實施例中,如圖12A所示,可配置多組串聯的過濾器6,再將每一組串聯的過濾器6彼此以並聯設置。本申請利用將過濾器6串聯以增強過濾效率,也可將過濾器6並聯以在製程中不停機切換,進行清洗、更換濾芯,以達到持續過濾液體並確保液體無雜質的目的。Refer to FIG. 12A and FIG. 12B, which are respectively schematic diagrams of the configuration of different embodiments of the B part of the wet treatment equipment of FIG. 1. The filter 6 of the present application serves as the final stage filter, and a filter element is disposed in the filter 6, and the pore size of the filter element can be replaced as needed. Referring to FIG. 12A and in conjunction with FIG. 1, in some embodiments, a plurality of filters 6 are disposed in parallel in a first parallel pipeline 261 between the third valve 53 and the pump 3, and the first parallel pipeline 261 is connected to the second pipeline 22. Specifically, a valve is disposed in the first parallel pipeline 261 corresponding to each filter 6 connected in series to control different flow paths of the liquid 8 in the first parallel pipeline 261. As shown in FIG12B , multiple filters 6 are arranged in series to enhance the filtering effect. In some embodiments, as shown in FIG12A , multiple sets of filters 6 in series may be configured, and each set of filters 6 in series may be arranged in parallel with each other. The present application utilizes filters 6 in series to enhance filtering efficiency, and filters 6 may also be connected in parallel to switch without stopping the process, clean, and replace the filter element, so as to achieve the purpose of continuously filtering the liquid and ensuring that the liquid is free of impurities.
綜上所述,本申請實施例的濕式處理設備可以切換升流、降流、靜止多種流場模式,以減少設備費用,提升製程切換便利性,且循環管路與排液管路共用,以減少管路數量,增加利用空間,更加裝外槽過濾元件、管路中的過濾器及濾袋設備的過濾系統,減少汙染物回沾,提升化學品重複利用率,有效解決傳統濕製程設備僅能提供單一方向的循環模式,且管路設計複雜,並且無法過濾液體所造成影響良率、表面缺陷、電性等問題。In summary, the wet processing equipment of the embodiment of the present application can switch between multiple flow field modes such as upflow, downflow, and static flow to reduce equipment costs and improve the convenience of process switching. The circulation pipeline and the drainage pipeline are shared to reduce the number of pipelines and increase the utilization space. The filtration system is equipped with an external tank filter element, a filter in the pipeline, and a filter bag equipment to reduce the back-contamination of pollutants and improve the reuse rate of chemicals. It effectively solves the problems that traditional wet process equipment can only provide a single-direction circulation mode, the pipeline design is complex, and it cannot filter liquids, which affects the yield, surface defects, electrical properties, etc.
雖然本申請已以優選實施例闡述如上,但上述優選實施例並非用以限制本申請,本領域的普通技術人士在不脫離本申請的精神和範圍內,均可作各種更動與潤飾,因此本申請的保護範圍以請求項界定的範圍為準。Although the present application has been described above with preferred embodiments, the above preferred embodiments are not intended to limit the present application. A person skilled in the art may make various changes and modifications without departing from the spirit and scope of the present application. Therefore, the scope of protection of the present application shall be based on the scope defined in the claims.
以上對本申請實施例所提供用於晶圓及基板的處理製程中的濕式處理設備詳細介紹,本文中應用了具體個例對本申請的原理及實施方式進行了闡述,以上實施例的說明只是用於幫助理解本申請的方法及其核心思想。同時,對於本領域的技術人員,依據本申請的思想,在具體實施方式及應用範圍上均會有改變的地方,綜上所述,本說明書內容不應理解為對本申請的限制。The above is a detailed introduction to the wet processing equipment used in the processing process of wafers and substrates provided by the embodiment of this application. This article uses specific examples to explain the principles and implementation methods of this application. The description of the above embodiments is only used to help understand the method and core ideas of this application. At the same time, for technical personnel in this field, according to the ideas of this application, there will be changes in the specific implementation methods and application scopes. In summary, the content of this specification should not be understood as a limitation on this application.
1、1’:濕式處理設備 101:溢流口 11:第一槽體 111、112:第一連通口 12:第二槽體 121:第二連通口 13:過濾元件 21:第一管路 22:第二管路 221:第二延伸管路 23:第三管路 231:第三延伸管路 24:第四管路 25:第五管路 261:第一並聯管路 262:第二並聯管路 3:泵浦 301:進液口端 302:排液口端 51:第一閥件 52:第二閥件 53:第三閥件 54:第四閥件 55:第五閥件 56:第六閥件 57:第七閥件 58:第八閥件 59:第九閥件 6:過濾器 7:濾袋設備 8:液體 9:基板 1, 1': Wet treatment equipment 101: Overflow port 11: First tank 111, 112: First connection port 12: Second tank 121: Second connection port 13: Filter element 21: First pipeline 22: Second pipeline 221: Second extension pipeline 23: Third pipeline 231: Third extension pipeline 24: Fourth pipeline 25: Fifth pipeline 261: First parallel pipeline 262: Second parallel pipeline 3: Pump 301: Liquid inlet end 302: Liquid outlet end 51: First valve 52: Second valve 53: Third valve 54: Fourth valve 55: Fifth valve 56: Sixth valve 57: Valve 7 58: Valve 8 59: Valve 9 6: Filter 7: Filter bag equipment 8: Liquid 9: Substrate
圖1為本申請一實施例的可變流場之濕式處理設備的剖面示意圖。 圖2為本申請另一實施例的可變流場之濕式處理設備的剖面示意圖。 圖3為圖1的濕式處理設備處於第一升流循環流場模式的結構示意圖。 圖4為圖1的濕式處理設備處於第二升流循環流場模式的結構示意圖。 圖5為圖1的濕式處理設備處於第一降流循環流場模式的結構示意圖。 圖6為圖1的濕式處理設備處於第二降流循環流場模式的結構示意圖。 圖7為圖1的濕式處理設備處於靜止模式的結構示意圖。 圖8為圖1的濕式處理設備處於排液流場模式的結構示意圖。 圖9為本申請一實施例的可變流場之濕式處理設備的俯視示意圖。 圖10為圖9的可變流場之濕式處理設備的局部剖面示意圖。 圖11A為圖1的濕式處理設備之A部分的另一實施例的配置示意圖。 圖11B為圖1的濕式處理設備之A部分的另一實施例的配置示意圖。 圖12A為圖1的濕式處理設備之B部分的另一實施例的配置示意圖。 圖12B為圖1的濕式處理設備之B部分的另一實施例的配置示意圖。 FIG. 1 is a cross-sectional schematic diagram of a wet treatment device with a variable flow field in one embodiment of the present application. FIG. 2 is a cross-sectional schematic diagram of a wet treatment device with a variable flow field in another embodiment of the present application. FIG. 3 is a structural schematic diagram of the wet treatment device of FIG. 1 in a first upflow circulation flow field mode. FIG. 4 is a structural schematic diagram of the wet treatment device of FIG. 1 in a second upflow circulation flow field mode. FIG. 5 is a structural schematic diagram of the wet treatment device of FIG. 1 in a first downflow circulation flow field mode. FIG. 6 is a structural schematic diagram of the wet treatment device of FIG. 1 in a second downflow circulation flow field mode. FIG. 7 is a structural schematic diagram of the wet treatment device of FIG. 1 in a static mode. FIG8 is a schematic diagram of the structure of the wet processing equipment of FIG1 in the discharge flow field mode. FIG9 is a schematic diagram of a top view of a wet processing equipment with a variable flow field of an embodiment of the present application. FIG10 is a schematic diagram of a partial cross-section of the wet processing equipment with a variable flow field of FIG9. FIG11A is a schematic diagram of the configuration of another embodiment of the part A of the wet processing equipment of FIG1. FIG11B is a schematic diagram of the configuration of another embodiment of the part A of the wet processing equipment of FIG1. FIG12A is a schematic diagram of the configuration of another embodiment of the part B of the wet processing equipment of FIG1. FIG12B is a schematic diagram of the configuration of another embodiment of the part B of the wet processing equipment of FIG1.
1:濕式處理設備 1: Wet treatment equipment
101:溢流口 101: Overflow port
11:第一槽體 11: First tank
111、112:第一連通口 111, 112: First connection port
12:第二槽體 12: Second tank
121:第二連通口 121: Second connection port
13:過濾元件 13: Filter element
21:第一管路 21: First pipeline
22:第二管路 22: Second pipeline
221:第二延伸管路 221: Second extension pipeline
23:第三管路 23: The third pipeline
231:第三延伸管路 231: The third extension pipeline
24:第四管路 24: Fourth pipeline
25:第五管路 25: Fifth pipeline
3:泵浦 3: Pumping
301:進液口端 301: Liquid inlet end
302:排液口端 302: Drain port end
51:第一閥件 51: First valve
52:第二閥件 52: Second valve
53:第三閥件 53: The third valve
54:第四閥件 54: The fourth valve
55:第五閥件 55: Fifth valve
56:第六閥件 56: The sixth valve
57:第七閥件 57: The seventh valve
58:第八閥件 58: The eighth valve
59:第九閥件 59: The ninth valve
6:過濾器 6: Filter
7:濾袋設備 7: Filter bag equipment
Claims (14)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TW114202497U TWM670763U (en) | 2025-03-13 | 2025-03-13 | Wet process device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TW114202497U TWM670763U (en) | 2025-03-13 | 2025-03-13 | Wet process device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| TWM670763U true TWM670763U (en) | 2025-05-21 |
Family
ID=96549032
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW114202497U TWM670763U (en) | 2025-03-13 | 2025-03-13 | Wet process device |
Country Status (1)
| Country | Link |
|---|---|
| TW (1) | TWM670763U (en) |
-
2025
- 2025-03-13 TW TW114202497U patent/TWM670763U/en unknown
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