TWM573898U - Improved structure of photovoltaic cell - Google Patents

Abstract

An improved structure of a photovoltaic cell comprises a transparent conductive substrate, the transparent conductive substrate comprises a transparent substrate and a lower conductive layer, and the lower conductive layer is disposed on a side surface of the transparent substrate. A photovoltaic layer is disposed on one surface of the lower conductive layer, wherein the photovoltaic layer comprises an electron transport layer and a hole transfer layer, and an active layer is sandwiched between the electron transport layer and the hole transfer layer. An upper conductive layer is disposed on one side surface of the photovoltaic layer. The plurality of etching grooves are formed to block a photovoltaic unit, and a plurality of insulating layers are disposed on each of the etching grooves. A plurality of series-connected conductive layers are disposed on the insulating layer and the upper conductive layer, and are electrically connected to the lower conductive layer by the etching grooves of the adjacent photovoltaic units.

Description

Photovoltaic cell improved structure

The present invention relates to a photovoltaic cell, and more particularly to a photovoltaic cell structure with improved electrode structure.

Solar cell research is a direction that audiences in renewable energy look forward to. Although most of the products that have been commercialized today are based on bismuth, organic solar cells developed using polymer materials have received industry and academia due to their simple process, low cost, light weight, and flexibility. Attention.

At present, in the preparation of an organic solar cell, it is a technical means for preparing a solar cell film by coating, which has the advantage of enabling the film to have better flatness and uniformity. Further, the R2R process is a technology with potential for large-area preparation of organic solar cells. It has been coordinated in the industry, and the R2R process can be well matched with its operation, enabling the production of these plasticity at lower cost. Light weight and impact resistance.

There are many types of photoelectric conversion devices for solar cells, one of which is a photoelectric conversion device called a photovoltaic cell, such as an Organic Photovoltaics (OPV) or a Perovskite solar cell. The electron transport layer ETL, the active layer can be utilized (the absorption layer in the Organic Photo Voltaics (OPV) is called the BHJ layer (bulk-heterojunction layer), and the perovskite solar cell (called Perovskite in the Perovskite solar cell) The combination of the hole transfer HTL and the electrode lead ITO achieves the effect of photoelectric conversion and electron transfer. The structure is as shown in FIG. 1 and FIG. 2, and the photovoltaic cell 100a (FIG. 1) comprises a substrate. 101a, the substrate 101a has a lower conductive layer 102a, and the lower conductive layer 102a has a photovoltaic layer 103a for providing a photoelectric conversion mechanism, and an electrical circuit is formed via the upper and lower conductive layers 104a, 102a, wherein the so-called photovoltaic layer 103a is The electron transport layer 1031a, the active layer 1032a, and the hole transport layer 1033a are formed, or the hole transport layer 1033a, the active layer 1032a, and the electron transport layer 1031a of FIG. 2 have an upper conductive layer 104a on the photovoltaic layer 103a. The effect of photoelectric conversion and electron transfer is achieved by the combination with the upper and lower conductive layers 104a and 102a.

In order to improve the processing convenience of the R2R photovoltaic cell coil, the convenience of the fabrication and processing of the photovoltaic cell component can be improved, and the design further improves the structure design of the conductive layer to provide mass production improvement of the photovoltaic cell component fabrication.

Therefore, in order to facilitate the mass production of photovoltaic elements, the present invention provides a novel photovoltaic cell structure, which can be further fabricated by processing which can be coated with a conductive layer at a time to form a photovoltaic cell component, which is different from the conventional technology. The fabrication of each of the lower conductive layer and the photovoltaic layer and the photovoltaic unit can simplify the process and improve mass production.

In order to achieve the above object, the present invention provides a photovoltaic cell improved structure comprising a transparent conductive substrate, a photovoltaic layer, an upper conductive layer, a plurality of first etching grooves, a plurality of second etching grooves, and a plurality of The third etching trench, the plurality of insulating layers and the plurality of serially connected conductive layers. The transparent conductive substrate comprises a transparent substrate and a lower conductive layer, and the lower conductive layer is disposed on one side of the transparent substrate. The photovoltaic layer is disposed on one side of the lower conductive layer. The upper conductive layer is disposed on one side of the photovoltaic layer. The first etching grooves penetrate the upper conductive layer, the photovoltaic layer and the lower conductive layer to form a plurality of photovoltaic units. The second etching grooves penetrate the upper conductive layer and the photovoltaic layer. The third etching grooves penetrate the upper conductive layer and the photovoltaic layer in the longitudinal direction and the lateral direction. The insulating layers are disposed on the first etching trenches and on the upper conductive layer. The series of conductive layers are disposed on the insulating layers, and the In the upper conductive layer and the second etching grooves, the upper conductive layer and the lower conductive layer are electrically connected.

In one embodiment of the present invention, the first etching grooves, the second etching grooves, and the third etching grooves have a width of 10 μm to 100 μm.

In an embodiment of the present invention, the insulating layers are UV glue, epoxy resin or blue glue.

In one embodiment of the present invention, the upper conductive layer and the lower conductive layer are formed by coating, sputtering, or evaporation.

In an embodiment of the present invention, the lower conductive layer and the upper conductive layer are metal or metal oxide.

In an embodiment of the present invention, the lower conductive layer and the upper conductive layer are a combination of a plurality of layers of a metal oxide, a metal, and a metal oxide.

In an embodiment of the present invention, the light transmittance of the lower conductive layer may be 70% to 95%.

In an embodiment of the present invention, the lower conductive layer has a thickness of 100 nm to 10 μm.

In an embodiment of the present invention, the upper conductive layer and the lower conductive layer are electrically connected to each other by a lead, and the lead can be formed by printing into a row of wiring areas.

In an embodiment of the present invention, the photovoltaic layer sequentially includes an electron transport layer, an active layer, and a hole transport layer, and the photovoltaic layer is disposed on the transparent conductive substrate.

In an embodiment of the present invention, the photovoltaic layer sequentially includes an electron transport layer, an active layer, and a hole transport layer, and the photovoltaic layer is disposed on a transparent conductive layer coil.

In one embodiment of the present invention, the photovoltaic layer sequentially includes a hole transfer layer, an active layer, and an electron transfer layer, and the photovoltaic layer is disposed on the transparent conductive substrate.

In an embodiment of the present invention, the photovoltaic layer sequentially includes a hole transfer layer, an active layer, and an electron transfer layer, and the photovoltaic layer is disposed on a transparent conductive layer coil.

In one embodiment of the present invention, the transparent conductive layer web comprises a transparent web and a lower conductive layer, and the lower conductive layer is disposed on one side of the transparent web. In one of the creations In an embodiment, a buffer layer is disposed on either or both sides of the transparent substrate or the transparent web to increase the strength of the transparent substrate or the transparent web or the adhesion to the lower conductive layer.

In one embodiment of the present invention, the buffer layer is acrylic, epoxy, ceria or a combination of the above.

In an embodiment of the present invention, the transparent substrate is a light transmissive plastic or a light transmissive glass substrate.

In one embodiment of the present invention, the transparent web is a light transmissive plastic.

In one embodiment of the present invention, the light transmissive plastic is a phenolic resin, a polyamide, a polyimide, a polyurethane, a polyethylene, a polyethylene terephthalate, or an acrylic plastic.

In an embodiment of the present invention, the transparent substrate has a thickness of 10 um to 500 μm. In one embodiment of the present invention, the water-blocking gas barrier material layer of the photovoltaic cell improved structure is packaged to form a photovoltaic cell component.

In an embodiment of the present invention, the water-blocking gas barrier material layer comprises a transparent water-blocking gas barrier layer and a water-blocking gas barrier glue.

In an embodiment of the present invention, the water-blocking gas barrier layer has a thickness of 50 μm to 500 μm.

In an embodiment of the present invention, the water blocking gas barrier layer is a transparent plastic or glass substrate.

Convention:

100a‧‧‧Photovoltaic cell improved structure

101a‧‧‧Substrate

102a‧‧‧lower conductive layer

103a‧‧‧Photovoltaic layer

1031a‧‧‧Electronic transfer layer

1032a‧‧‧ active layer

1033a‧‧‧ hole transmission

104a‧‧‧Upper conductive layer

This creation:

10‧‧‧Photovoltaic layer

1‧‧‧Transparent conductive substrate

11‧‧‧Transparent substrate

12‧‧‧lower conductive layer

2‧‧‧Electronic transmission layer

3‧‧‧ active layer

4‧‧‧ hole transfer layer

5‧‧‧Upper conductive layer

6‧‧‧Insulation

7‧‧‧Connected conductive layer

8‧‧‧Water and gas barrier material layer

81‧‧‧Transparent water blocking gas barrier

82‧‧‧Water-blocking gas barrier

20‧‧‧First etching groove

30‧‧‧Second etching tank

40‧‧‧ third etching groove

1 is a schematic view of a conventional photovoltaic cell improved structure; FIG. 2 is a schematic view of a conventional photovoltaic cell improved structure; FIG. 3a is a schematic view of a photovoltaic layer of the photovoltaic cell improved structure of the present invention; FIG. 3b is a top view of FIG. 4a is a side view showing the upper conductive layer on the photovoltaic layer of FIG. 3a; FIG. 4b is a top view of FIG. 4a; FIG. 5a is the upper conductive layer of FIG. 4a, the photovoltaic layer and the lower conductive layer are first etched, A schematic side view of the second etching groove and the third etching groove; Figure 5b is a top plan view of Figure 5a; Figure 6a is a side view of the insulating layer formed on the first etching trench of the upper conductive layer of Figure 5a; Figure 6b is a top view of Figure 6a; Figure 7a, Figure 7a FIG. 7b is a schematic top view of FIG. 7a; FIG. 8 is a schematic view of another modified embodiment of the photovoltaic cell of FIG. 7a.

The technical content and detailed description of this creation are described below with reference to the following figures: Please refer to Figures 3a and 3b, which are schematic views of the photovoltaic layer of the improved photovoltaic cell structure and the top view of Figure 3a. As shown in the figure: This is a modified structure of a photovoltaic cell, which firstly applies a photovoltaic layer 10, including an electron transport layer 2, an active layer 3, and a hole transport layer 4, sequentially to a transparent conductive substrate (or a transparent conductive layer). In the coil material 1, the so-called photovoltaic layer 10 may be sequentially applied to the transparent conductive substrate (or transparent conductive layer coil) 1 in the order of the hole transport layer 4, the active layer 3 and the electron transport layer 2. The transparent conductive substrate 1 includes a transparent substrate 11 and a lower conductive layer 12 disposed on one side of the transparent substrate 11. A buffer layer (not shown) may be disposed on either side or both sides of the transparent substrate (or transparent web) 11 to increase the strength of the transparent substrate 11 or the adhesion to the lower conductive layer 12; The layer is acrylic, epoxy, cerium oxide or a combination of the above. In addition, the transparent substrate 11 is a light transmissive plastic or a transparent glass substrate, wherein the transparent plastic is phenol novolac (PN), polyamide (PA), polyimide (PI), Polyurethanes (PU), Polyethylene (PE), Polyethylene Terephthalate (PET), Acrylic Plastics, etc. In the present drawing, the thickness of the transparent substrate 11 is from 10 μm to 500 μm. Moreover, the lower conductive layer 12 can be formed by coating, sputtering or evaporation, and the lower conductive layer 12 is a metal or a metal oxide, or a metal oxide, a metal and a metal oxide. The layers are combined, and the lower conductive layer 12 may have a light transmittance of 70% to 95%, and the lower conductive layer 12 has a thickness of 100 nm to 10 μm. In the figure, the lower conductive layer 12 is electrically connected to the outside by using a lead which can be printed into a row of wiring areas (not shown).

Referring to Figures 4a and 4b, a side view of the upper conductive layer on the photovoltaic layer of Figure 3a and a top view of Figure 4a are shown. As shown, the present application is then coated with an upper conductive layer 5 on the photovoltaic layer 10 by coating, sputtering or evaporation. The upper conductive layer 5 is electrically connected to the outside by a lead (not shown), and the lead can be printed into a row of wiring areas (not shown). In the figure, the upper conductive layer 5 is a metal or metal oxide or a multilayer combination of a metal oxide, a metal and a metal oxide.

Referring to FIGS. 5a and 5b, the upper guide layer of FIG. 4a, the photovoltaic layer and the lower conductive layer are cut side view of the first etching groove, the second etching groove and the third etching groove, and a top view of FIG. 5a. As shown in the figure: the present invention performs laser etching of a plurality of first etching grooves (lines) 20 by etching a transparent substrate 11 without etching the transparent substrate 11, etching the photovoltaic layer 10, the upper conductive layer 5 and the lower portion. The conductive layer 12 is formed to form each of the photovoltaic cells, and the first etching grooves 20 have a width of 10 μm to 100 μm.

Then, a specific laser energy does not damage the lower conductive layer 12, and a plurality of second etching grooves (lines) 30 and a plurality of third etching grooves (lines) 40 are subjected to laser etching to etch the photovoltaic layer. 10 and the upper conductive layer 5, the filling hole formed by the second etching groove 30 provides a future conductive layer and the lower conductive layer 12 electrically connected, the second etching groove 30 and the third etching groove 40 The width is from 10 μm to 100 μm. In the present drawing, the third etching groove 40 is simultaneously subjected to lateral cutting in addition to the longitudinal cutting.

Referring to FIGS. 6a and 6b, a side view of the insulating layer is formed on the first etching trench of the upper conductive layer of FIG. 5a and a top view of FIG. 6a. As shown in the figure, an insulating layer 6 is disposed on each of the first etching grooves 20, and the insulating layer 6 is coated with UV glue, epoxy resin or blue glue to cover the first etching. One side of the slot 20.

Please refer to FIGS. 7a and 7b for a side view of the parallel conductive layer fabrication on the upper conductive layer of FIG. 6a and a top view of FIG. 7a. As shown in the figure: the present invention is then coated with a specific structure of the series conductive layer 7 on the upper conductive layer 5 and the insulating layer 6 by a printing or yellow lithography process, and the conductive layer conductive material coated on the series conductive layer 7 At the same time, it is simultaneously filled in the second etching trench 30, so that the upper conductive layer 5 and the lower conductive layer 12 are electrically connected.

This completes the photovoltaic unit structure in series. The serially connected photovoltaic unit structure can be further cut and used according to the requirements of each product component. According to this, the creation can reduce the complexity of the related process for fabricating the upper conductive layer 5. After the upper conductive layer 5 is completely coated, it can be controlled by different laser energies to form a photovoltaic unit and a line, which makes the process easier. , greatly reduce production costs, facilitate the application of mass production, and provide photovoltaic cell structure that increases light utilization.

Please refer to FIG. 8 , which is a schematic diagram of an improved structural embodiment of another photovoltaic cell of FIG. 7 a . As shown in the figure, the water-blocking gas barrier material layer 8 is attached to the upper and lower sides of the photovoltaic cell structure, and the water-blocking gas barrier material layer 8 comprises a transparent water-blocking gas barrier layer 81 and a water-blocking gas barrier gel 82. The transparent water-blocking gas barrier layer 81 has a thickness of 50 μm to 500 μm and is packaged to constitute a photovoltaic cell element. In the present drawing, the water-blocking gas barrier layer 81 is a transparent plastic or glass substrate.

However, the above description is only a preferred embodiment of the present invention, and it is not intended to limit the scope of patent protection of the present creation. Therefore, the equivalent changes made by using the present specification or the content of the schema are all included in the right of the creation. Within the scope of protection, it is given to Chen Ming.

Claims (25)

An improved structure of a photovoltaic cell comprises: a transparent conductive substrate comprising a transparent substrate and a lower conductive layer, wherein the lower conductive layer is disposed on one side of the transparent substrate; and a photovoltaic layer is disposed on one side of the lower conductive layer An upper conductive layer is disposed on one side of the photovoltaic layer; a plurality of first etching grooves are formed through the upper conductive layer, the photovoltaic layer and the lower conductive layer to form a plurality of photovoltaic units; a second etching groove of the strip penetrates the upper conductive layer and the photovoltaic layer; a plurality of third etching grooves penetrate the upper conductive layer and the photovoltaic layer in a longitudinal direction and a lateral direction; the plurality of insulating layers are disposed on On the first etched trench and the upper conductive layer; a plurality of serially connected conductive layers are disposed in the insulating layer, the upper conductive layer and the second etched trenches, and the upper conductive layer and the lower conductive layer The conductive layer is electrically connected. The photovoltaic cell improved structure of claim 1, wherein the first etching grooves, the second etching grooves, and the third etching grooves have a width of 10 μm to 100 μm. The photovoltaic cell improved structure of claim 1, wherein the insulating layers are UV glue, epoxy resin or blue glue. The photovoltaic cell improved structure of claim 1, wherein the upper conductive layer and the lower conductive layer are formed by coating, sputtering or evaporation. The photovoltaic cell improved structure of claim 1, wherein the lower conductive layer and the upper conductive layer are metal or metal oxide. The photovoltaic cell improved structure of claim 1, wherein the lower conductive layer and the upper conductive layer are a combination of a plurality of layers of a metal oxide, a metal, and a metal oxide. The photovoltaic cell improved structure according to claim 1, wherein the lower conductive layer has a light transmittance of 70% to 95%. The photovoltaic cell improved structure of claim 1, wherein the lower conductive layer has a thickness of 100 nm to 10 μm. The improved structure of the photovoltaic cell of claim 1, wherein the upper conductive layer and the lower conductive layer are electrically connected to each other by a lead, and the lead can be formed into a row of wiring areas by printing. The photovoltaic cell improved structure of claim 1, wherein the photovoltaic layer comprises an electron transport layer, an active layer and a hole transport layer, and the photovoltaic layer is disposed on the transparent conductive substrate. The photovoltaic cell improved structure of claim 1, wherein the photovoltaic layer comprises an electron transport layer, an active layer and a hole transport layer, and the photovoltaic layer is disposed on a transparent conductive layer coil. The photovoltaic cell improved structure of claim 11, wherein the transparent conductive layer coil comprises a transparent coil and a lower conductive layer, and the lower conductive layer is disposed on one side of the transparent coil. The photovoltaic cell improved structure of claim 1, wherein the photovoltaic layer comprises a hole transport layer, an active layer and an electron transport layer, and the photovoltaic layer is disposed on the transparent conductive substrate. The photovoltaic cell improved structure of claim 1, wherein the photovoltaic layer comprises a hole transport layer, an active layer and an electron transport layer, and the photovoltaic layer is disposed on a transparent conductive layer coil. The photovoltaic cell improved structure according to claim 14, wherein the transparent conductive layer coil comprises a transparent coil and a lower conductive layer, and the lower conductive layer is disposed on one side of the transparent coil. The photovoltaic cell improved structure of claim 12, wherein a buffer layer is disposed on either or both sides of the transparent substrate or the transparent web to increase the strength of the transparent substrate or the lower conductive layer. Adhesion. The photovoltaic cell improved structure according to claim 16, wherein the buffer layer is acrylic, epoxy resin, cerium oxide or a combination of the above materials. The photovoltaic cell improved structure of claim 17, wherein the transparent substrate is a light transmissive plastic or a light transmissive glass substrate. The photovoltaic cell improved structure of claim 18, wherein the transparent web is a light transmissive plastic. The improved structure of the photovoltaic cell according to claim 19, wherein the transparent plastic is phenolic resin, polyamine, polyimide, polyurethane, polyethylene, polyethylene terephthalate, acrylic Force plastic. The photovoltaic cell improved structure according to claim 1, wherein the transparent substrate has a thickness of 10 μm to 500 μm. The photovoltaic cell improved structure according to claim 1, wherein the water-blocking gas barrier material layer of the improved structure of the photovoltaic cell is packaged to form a photovoltaic cell component. The photovoltaic cell improved structure according to claim 22, wherein the water-blocking gas barrier material layer comprises a transparent water-blocking gas barrier layer and a water-blocking gas barrier rubber. The photovoltaic cell improved structure according to claim 23, wherein the transparent water-blocking gas barrier layer has a thickness of 50 μm to 500 μm. The photovoltaic cell improved structure according to claim 24, wherein the water-blocking gas barrier material layer is a transparent plastic or glass substrate.