CN212011029U - A photovoltaic cell structure - Google Patents

Abstract

A photovoltaic cell structure includes: a transparent conductive substrate, an electron transfer layer, an active layer, a plurality of first etching grooves, a plurality of second etching grooves, a plurality of third etching grooves, a plurality of insulating layers, a hole transfer layer and a plurality of series-connected conductive layers. The etching grooves are used to block and form a photovoltaic unit, and the etching grooves are filled with a plurality of insulating layers. In addition, one of the etching grooves is filled with the same material as the hole transfer layer, and the hole transfer layer is connected in series and electrically connected to the lower conductive layer to form a photovoltaic cell structure. By eliminating the existing production of metal as a conductive layer, the light-receiving area of the photovoltaic material coating can be increased, and the etching groove gap is filled with an insulating layer to increase the operating margin of the photovoltaic cell, improve the yield and the utilization of the effective area of photoelectric conversion.

Description

A photovoltaic cell structure

technical field

The utility model relates to a photovoltaic cell structure, in particular to a photovoltaic cell structure related to an electrode structure.

Background technique

Photovoltaic cell research is an expected direction in renewable energy. Although most of the commercialized products today use silicon as the main material, organic photovoltaic cells developed using polymer materials have been favored by the industry and academia due to their simple process, low cost, lightness, flexibility and other characteristics. Attention.

At present, in the preparation of organic photovoltaic cells, coating is mostly used as a technical means for preparing photovoltaic cell thin films, which has the advantage of enabling the thin film to have better flatness and uniformity. Furthermore, the R2R process is a potential technology for large-area preparation of organic photovoltaic cells. It has already cooperated in the industry, and the R2R process can cooperate with its operation well, and can produce these organic photovoltaic cells at a lower cost. Plasticity, light weight, impact resistance and other advantages.

Recently, photovoltaic cells have been made into a translucent structure that can illuminate on both sides and have light transmission for more product applications, such as building windows, etc. However, the color of the materials in the structure is limited and the metal of the upper and lower conductive layers is limited. The material used as an electrical connection circuit will affect the light transmittance of the photovoltaic cell and even affect the photoelectric conversion efficiency of illumination.

There are many types of photoelectric conversion devices for further discussion of photovoltaic cells, one of which is a photoelectric conversion device called photovoltaic cells, such as organic photovoltaic cells or perovskite photovoltaic cells, in which the photovoltaic cell consists of a plurality of photovoltaic cell strings, In parallel, each photovoltaic unit includes an electron transport layer, an active layer (the light absorbing layer is called BHJ layer (bulk-heterojunction layer) in OPV, and it is called Perovskite layer in Perovskite solar cell), hole transport layer, Further, the electrode wires of the upper and lower layers are linearly connected to achieve the effects of photoelectric conversion and electron transfer.

Taking an organic photovoltaic cell as an example, the electron transport layer can be composed of PEI as the main component, and the active layer can be solvent-diluted P3HT/PCBM, PCPDTBT/PCBM, wherein P3HT/PCBM is a poly-3-hexylthiophene ( Poly(3-hexylthiophene), P3HT (p-type material)) polymer semiconductor and a plurality of phenyl-C61-butyric acid methylester (phenyl-C61-butyric acid methylester, PCBM (n-type material)) are mixed. The hole transfer layer can be a solvent-diluted PEDOT:PSS main component (PEDOT:PSS), a polymer containing a plurality of EDOT (3,4-ethylenedioxythiophene monomer) and a plurality of polystyrene sulfonic acid Sodium (sodium-p-styrenesulfonate, PSS) is mixed.

The aforementioned hole transport layer (HTL) not only has the functional requirement of hole transfer, because the PEDOT:PSS can also have conductivity, so the present invention proposes a novel method by utilizing the conductive properties of the hole transport layer. The photovoltaic cell structure design can improve the traditional photovoltaic cell structure, simplify the process and reduce the production cost, and can also improve the photoelectric conversion efficiency.

Utility model content

Therefore, the main purpose of the present invention is to provide an improved photovoltaic cell structure, wherein a hole (hole) transport layer (HTL) is used to form an impedance of 100Ω/□ (common unit "ohm square") with a material with high conductivity ” is expressed as Ω□, or “per square ohm” is expressed as Ω/□) or less, the light transmittance is more than 50%, the hole transfer layer also has a conductive function, and the production of the upper conductive layer is omitted to simplify the process. The cost-effective photovoltaic cell structure can increase the light transmittance and photoelectric conversion efficiency of the photovoltaic cell.

Another object of the present invention is to combine a plurality of etching grooves on the photovoltaic cell structure, wherein the etching grooves are used to form photovoltaic cells, and the etching grooves are filled with a plurality of insulating layers. In addition, an etching groove is used as a through hole to be filled with the same material as the hole transfer layer, so as to connect the hole transfer layer and the lower conductive layer in series, so as to form a photovoltaic cell structure. The structure of the utility model omits the fabrication of the existing metal as the conductive layer, which can increase the light-receiving area of the photovoltaic material coating, and the gap between the etching grooves and the filling design of the insulating layer are used to increase the operating margin of the photovoltaic cell and improve the yield. And the utilization of photoelectric conversion effective area.

In order to achieve the above purpose, the present invention provides a photovoltaic cell structure, which comprises:

a transparent conductive substrate, including a transparent substrate and a lower conductive layer, the lower conductive layer is disposed on one side of the transparent substrate;

an electron transport layer, disposed on one side of the lower conductive layer;

an active layer, disposed on one side of the electron transport layer;

a plurality of first etching grooves to penetrate the active layer, the electron transport layer and the lower conductive layer to form a plurality of photovoltaic units;

a plurality of second etching grooves to penetrate through the active layer and the electron transport layer;

A plurality of third etching grooves penetrate the active layer and the electron transport layer longitudinally and laterally;

a plurality of insulating layers disposed inside the first etching grooves and the third etching grooves;

a hole transport layer, respectively disposed on a specific area of the surface of the active layer where a plurality of small cells have been etched;

A plurality of series-connected conductive layers are arranged inside the second etching grooves, so that the hole transfer layer is electrically connected to the lower conductive layer.

In the above photovoltaic cell structure, the thickness of the structure layer of the electron transport layer is 0.5nm-10nm.

In the above photovoltaic cell structure, the structure layer thickness of the active layer is 100nm-500nm.

In the above photovoltaic cell structure, the structural layer thickness of the hole transport layer is 100nm-1um.

In the above photovoltaic cell structure, the impedance of the hole transport layer is 1-100Ω/□.

In the above photovoltaic cell structure, the hole transport layer further includes a reflective layer on the surface.

In the above photovoltaic cell structure, the first etching grooves are 10um-500um.

In the above photovoltaic cell structure, the widths of the second etching grooves and the third etching grooves are 10um-500um.

In the above photovoltaic cell structure, the hole transfer layer and the lower conductive layer are each electrically connected to a lead wire made of silver paste and electrically connected to the outside, and the lead wire is printed to form a wiring area.

In the above photovoltaic cell structure, the transparent conductive substrate is a transparent conductive layer coil.

In the above photovoltaic cell structure, a buffer layer is provided on one side or both sides of the transparent substrate to increase the strength of the transparent substrate or the adhesion with the lower conductive layer.

In the above photovoltaic cell structure, the transparent substrate is a transparent plastic or a transparent glass substrate.

In the above photovoltaic cell structure, the thickness of the transparent substrate is 10um-500um.

In the above photovoltaic cell structure, the light transmittance of the lower conductive layer is 70%-95%.

The above photovoltaic cell structure, wherein the upper and lower water-blocking and gas-blocking material layers of the photovoltaic cell structure are encapsulated to form a photovoltaic cell element.

In the above photovoltaic cell structure, the water and gas barrier material layer comprises a water and gas barrier layer and a water and gas barrier layer.

In the above photovoltaic cell structure, the thickness of the water blocking gas blocking layer is 50um-500um.

The present utility model will be described in detail below in conjunction with the accompanying drawings and specific embodiments, but it is not intended to limit the present utility model.

Description of drawings

Figure 1a is a schematic diagram of the photovoltaic layer of the photovoltaic cell structure of the present invention;

Fig. 1b is a schematic top view of Fig. 1a;

FIG. 2a is a schematic side view of cutting the first etching groove, the second etching groove and the third etching groove in the electron transport layer, the active layer and the lower conductive layer of the photovoltaic layer in FIG. 1a;

Fig. 2b is a schematic top view of Fig. 2a;

Fig. 3a is a schematic side view of the insulating layer formed inside the first etching groove and the third etching groove in Fig. 2a;

Fig. 3b is a schematic top view of Fig. 3a;

FIG. 4a is a schematic side view of the hole transfer layer and the series-connected conductive layer on the active layer in FIG. 3a;

Fig. 4b is a schematic top view of Fig. 4a;

FIG. 5 is a schematic diagram of another photovoltaic cell structure embodiment of the present invention.

where the reference number

Photovoltaic layer 10

Transparent Conductive Substrate 1

Transparent substrate 11

lower conductive layer 12

Electron Transport Layer 2

Active Layer 3

hole transport layer 4

Insulation layer 5

Series conductive layer 6

Water and gas barrier material layer 7

Water and Air Barrier 71

Water and Air Barrier 72

Water blocking and air blocking glue 73

first etching groove 20

Second etching groove 30

The third etching groove 40

Detailed ways

Hereby, the technical content and detailed description of the present utility model are described as follows in conjunction with the accompanying drawings:

Please refer to FIGS. 1 a and 1 b , the photovoltaic layer of the photovoltaic cell structure of the present invention and the top view of FIG. 1 a . As shown in the figure: a photovoltaic cell structure of the present invention, the photovoltaic layer 10, including an electron transfer layer 2 and an active layer 3, are sequentially coated on a transparent conductive substrate (or a transparent conductive layer coil material) in sequence. )1 on. Wherein, the electron transport layer 2 of the photovoltaic layer 10 is coated with polyethyleneimine (PEI) as the main component, and the thickness of the structural layer is preferably 0.5nm-10nm; the active layer 3 of the photovoltaic layer 10 It can be solvent-diluted P3HT/PCBM, PCPDTBT/PCBM, wherein P3HT/PCBM is a polymer semiconductor with multiple poly(3-hexylthiophene), P3HT (p-type material)) and multiple benzene It is prepared by mixing phenyl-C61-butyric acid methylester (PCBM (n-type material)), and the thickness of the structural layer is preferably 100nm-500nm after being diluted with xylene and then slit coating.

In addition, the transparent conductive substrate 1 includes a transparent substrate 11 and a lower conductive layer 12 disposed on one side of the transparent substrate 11 . A buffer layer (not shown in the figure) can be provided on either side or both sides of the transparent substrate (or transparent roll material) 11 to increase the strength of the transparent substrate 11 or the adhesion with the lower conductive layer 12 . The buffer layer is acrylic, epoxy resin, silicon dioxide or a combination of the above two materials. The transparent substrate 11 is a transparent plastic or a transparent glass substrate, wherein the transparent plastic is phenolic resin (Phenol Novolac, PN), polyamide (Polyamide, PA), polyimide (Polyimide, PI), polyurethane (Polyurethanes) , PU), polyethylene (Polyethylene, PE), polyethylene terephthalate (PolyethyleneTerephthalate, PET), acrylic plastic and so on. In this figure, the thickness of the transparent substrate 11 is 10um-500um.

In addition, the lower conductive layer 12 can be made by coating, sputtering or evaporation, the lower conductive layer 12 is metal or metal oxide, or a multi-layer combination of metal oxide, metal and metal oxide, and the The light transmittance of the lower conductive layer 12 may be 70%-95%. In addition, in this figure, the lower conductive layer 12 is electrically connected to the outside by a lead (not shown in the figure) made of silver paste, and the lead can be printed to form a wiring area (not shown in the figure). ) is made.

Please refer to FIGS. 2 a and 2 b , which are a side view of cutting the first etching groove, the second etching groove and the third etching groove in the electron transport layer, the active layer and the lower conductive layer of the photovoltaic layer in FIG. 1 a and the top view of FIG. 2 a . As shown in the figure: the present invention performs laser etching of a plurality of first etching grooves (lines) 20 in a manner that a specific laser energy does not damage the transparent substrate 11 to etch the active layer 3, the electron transfer layer 2 and the lower conductive layer 12. To form each of the photovoltaic units, the width of the first etching grooves 20 is 10um-500um.

Furthermore, in a manner that a specific laser energy does not damage the lower conductive layer 12, laser etching of a plurality of second etching grooves (lines) 30 and a plurality of third etching grooves (lines) 40 is performed to etch the active layer 3 and the electrons. The transfer layer 2 is provided with through holes formed by the second etching grooves 30 to provide electrical connection between the hole (hole) transfer layer (upper conductive layer) and the lower conductive layer 12 to be laid in the future. The second etching grooves 30 and The width of the third etching groove 40 is 10um-500um. In this figure, the second etching groove 30 is a through hole, and the third etching groove 40 is not only longitudinally cut, but also laterally cut.

Please refer to FIGS. 3 a and 3 b , which are a side view of the insulating layer in the first etching groove and the third etching groove in FIG. 2 a and a top view of FIG. 3 a . As shown in the figure, according to the present invention, an insulating layer 5 is filled in each of the first etching grooves 20 and the third etching grooves 40 . In this figure, the insulating layers 5 are UV glue, epoxy resin or blue glue.

Please refer to FIGS. 4 a and 4 b , which are a side view of the hole transfer layer and a series-connected conductive layer in the active layer of FIG. 3 a and a top view of FIG. 4 a . As shown in the figure: the present invention then forms a hole transport layer 4 on a specific area of the surface of the active layer 3 that has been etched into a plurality of small units by printing or masking, and the hole transport layer The material of 4 can be filled by the second etching groove 30 to form a series conductive layer 6, so that the hole transfer layer 4, the series conductive layer 6 and the lower conductive layer 12 are electrically connected to the next photovoltaic unit. In the figure, the hole transport layer 4 can be a solvent-diluted poly(3,4-ethylenedioxythiophene)/poly-p-styrenesulfonic acid (PEDOT/PSS) as the main component, and contains a plurality of EDOTs (3,4-ethylenedioxythiophene monomer) polymer and multiple sodium-p-styrenesulfonate (PSS) mixed, such as alcohol or polar solvent (such as ethanol) After dilution, the thickness of the structural layer is preferably 100nm-1um, and the impedance is preferably 1-100Ω/□.

Further, in the present invention, the local silver paste material printed on the hole transfer layer 6 can be used as a lead, so as to facilitate the electrical connection with the wire.

Still further, on the surface of the hole transport layer 6 of the present invention, there is a glossy or reflective layer (not shown in the figure) that provides light reflection and refraction effects.

The photovoltaic cell structure connected in series is thus completed. The photovoltaic unit structure connected in series can be further cut and used according to the requirements of each product element. Accordingly, the present invention uses the hole transfer layer 4 to replace the traditional fabrication of the conductive layer, which can reduce the complexity of the related process of fabricating the conductive layer. In this way, the gap design of the etching groove can be narrowed, the utilization of the photoelectric conversion effective area can be increased, and the photoelectric reaction area can be increased without the light shielding of the electrode wires.

Please refer to FIG. 5 , which is a schematic diagram of another embodiment of the photovoltaic cell packaging structure of the present invention. As shown in the figure: the utility model is attached with a water and gas barrier material layer 7 on the top and bottom of the photovoltaic cell packaging structure, and the water and gas barrier material layer 7 includes an upper water and gas barrier layer 71 and a lower water and gas barrier layer. 72 and a water-blocking and gas-blocking adhesive 73, the upper water-blocking and gas-blocking layers 71 and 72 are encapsulated with 50um-500um to form photovoltaic cell elements. In this figure, the water and gas barrier layers 71 and 72 are transparent plastic or glass substrates.

Of course, the present utility model can also have other various embodiments, without departing from the spirit and essence of the present utility model, those skilled in the art can make various corresponding changes and deformations according to the present utility model, but These corresponding changes and deformations should all belong to the protection scope of the appended claims of the present invention.

Claims (17)

1. A photovoltaic cell structure, comprising:

a transparent conductive substrate including a transparent substrate and a lower conductive layer disposed on one side of the transparent substrate

An electronic transfer layer arranged on one side of the lower conductive layer

An active layer arranged on one side of the electronic transfer layer

Multiple first etching grooves penetrating the active layer, the electron transfer layer and the lower conductive layer to form multiple photovoltaic cells

Multiple second etching grooves penetrating the active layer and the electronic transfer layer

Multiple third etching grooves running longitudinally and transversely through the active layer and the electronic transfer layer

Multiple insulation layers arranged inside the first and third etching grooves

A hole transfer layer respectively disposed on specific areas of the surface of the active layer of the plurality of small cells etched

Multiple series-connected conductive layers arranged inside the second etching grooves for electrically connecting the hole transfer layer and the lower conductive layer.

2. The photovoltaic cell structure of claim 1, wherein the electron transport layer has a structural layer thickness of 0.5nm to 10 nm.

3. The photovoltaic cell structure of claim 1, wherein the active layer has a structure layer thickness of 100nm to 500 nm.

4. The photovoltaic cell structure of claim 1, wherein the thickness of the structural layer of the hole transport layer is between 100nm and 1 um.

5. The photovoltaic cell structure of claim 1, wherein the resistance of the hole transport layer is 1-100 Ω/□.

6. The photovoltaic cell structure of claim 1, wherein the surface of the hole transport layer further comprises a light reflecting layer.

7. The photovoltaic cell structure of claim 1, wherein the first etching trenches are 10um to 500 um.

8. The photovoltaic cell structure of claim 1, wherein the width of the second etching grooves and the width of the third etching grooves are 10um to 500 um.

9. The structure of claim 1, wherein the hole transport layer and the bottom conductive layer are electrically connected to a lead made of silver paste and an external electrical connection, and the lead is printed to form a wiring region.

10. The photovoltaic cell structure of claim 1, wherein the transparent conductive substrate is a roll of transparent conductive layer.

11. The photovoltaic cell structure of claim 1, wherein a buffer layer is disposed on one or both sides of the transparent substrate to increase the strength of the transparent substrate or the adhesion with the lower conductive layer.

12. The photovoltaic cell structure of claim 1, wherein the transparent substrate is a light-transmissive plastic or glass substrate.

13. The photovoltaic cell structure of claim 1, wherein the transparent substrate has a thickness of 10um to 500 um.

14. The photovoltaic cell structure of claim 1, wherein the lower conductive layer has a light transmittance of 70% to 95%.

15. The photovoltaic cell structure of claim 1, wherein the photovoltaic cell structure is packaged by attaching water-blocking and gas-blocking material layers on top and bottom of the photovoltaic cell structure to form a photovoltaic cell device.

16. The photovoltaic cell structure of claim 15, wherein the water-blocking gas barrier material layer comprises a water-blocking gas barrier layer, a water-blocking gas barrier layer.

17. The photovoltaic cell structure of claim 15, wherein the water-blocking gas barrier layer has a thickness of 50um to 500 um.

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