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TWM568268U - The cladding material for terminal - Google Patents

The cladding material for terminal Download PDF

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Publication number
TWM568268U
TWM568268U TW107208020U TW107208020U TWM568268U TW M568268 U TWM568268 U TW M568268U TW 107208020 U TW107208020 U TW 107208020U TW 107208020 U TW107208020 U TW 107208020U TW M568268 U TWM568268 U TW M568268U
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TW
Taiwan
Prior art keywords
plating layer
terminal
layer
nickel
plating
Prior art date
Application number
TW107208020U
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Chinese (zh)
Inventor
楊秋賢
肖啟文
李鵬
Original Assignee
正崴精密工業股份有限公司
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Publication date
Application filed by 正崴精密工業股份有限公司 filed Critical 正崴精密工業股份有限公司
Priority to TW107208020U priority Critical patent/TWM568268U/en
Publication of TWM568268U publication Critical patent/TWM568268U/en

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Abstract

本創作公開一種用於端子之電鍍鍍層,所述電鍍鍍層包括電鍍於端子表面的銅鍍層,銅鍍層表面依次電鍍有鎳鍍層、鎳鎢鍍層、內金鍍層、鈀鍍層、外金鍍層以及銠釕鍍層。本創作用於端子之電鍍鍍層藉由設置鎳鎢鍍層、鈀鍍層以及銠釕鍍層可以有效提高端子的耐磨性、防腐蝕性以及硬度和電接觸性能,使得端子使用壽命長。The present invention discloses an electroplating coating for a terminal, the electroplating layer comprising a copper plating layer plated on a surface of the terminal, the surface of the copper plating layer being sequentially plated with a nickel plating layer, a nickel tungsten plating layer, an inner gold plating layer, a palladium plating layer, an outer gold plating layer and a crucible layer. Plating. The electroplating coating for the terminal can effectively improve the wear resistance, corrosion resistance, hardness and electrical contact performance of the terminal by providing nickel-tungsten plating, palladium plating and ruthenium plating, so that the terminal has a long service life.

Description

用於端子之電鍍鍍層Electroplated coating for terminals

本創作涉及一種用於端子之電鍍鍍層,尤其是涉及一種能使端子具有耐磨擦性及耐腐蝕性的電鍍鍍層。The present invention relates to an electroplated coating for a terminal, and more particularly to an electroplated coating capable of providing a terminal with abrasion resistance and corrosion resistance.

隨著電子設備不斷普及,其使用的頻率越來越高,如手機、平板電腦等,在使用的過程中,其接口線路的功能將由單純的充電或數據傳輸轉為二合一的狀況,且隨著快充技術將繼續普及,高頻次、耐高壓及強電流的連接器元件接口對接觸端子的性能要求逐漸提高,並且該接口經常與數據線之間進行插拔,故經常會被手觸摸到,長時間使用後,容易造成接口內的端子受到環境腐蝕、電腐蝕以及磨損,進而影響電子設備的使用壽命。With the increasing popularity of electronic devices, the frequency of their use is increasing, such as mobile phones, tablet computers, etc., in the process of use, the function of the interface line will be changed from simple charging or data transmission to two-in-one, and As the fast charging technology will continue to be popularized, the high-frequency, high-voltage and high-current connector component interfaces gradually improve the performance requirements of the contact terminals, and the interface is often plugged and unplugged with the data lines, so it is often handed When touched, after long-term use, it is easy to cause the terminals in the interface to be corroded by the environment, electrical corrosion and wear, thereby affecting the service life of the electronic device.

因此,有必要提供一種用於端子之電鍍鍍層,使得搭載該端子的電子設備,得以具有耐腐蝕性及耐磨損性,能以增加端子的使用壽命,進而延長電子設備的使用時間。Therefore, it is necessary to provide an electroplating layer for a terminal, so that an electronic device equipped with the terminal can have corrosion resistance and wear resistance, and can increase the service life of the terminal, thereby prolonging the use time of the electronic device.

本創作之目的提供一種用於端子之電鍍鍍層,該用於端子之電鍍鍍層具有耐磨性、防腐蝕性以及硬度和電接觸性能。The purpose of the present invention is to provide an electroplated coating for terminals having an abrasion resistance, corrosion resistance, and hardness and electrical contact properties.

為了實現以上目的,本創作公開一種用於端子之電鍍鍍層,包括電鍍於端子表面的銅鍍層,銅鍍層表面依次電鍍有鎳鍍層、鎳鎢鍍層、內金鍍層、鈀鍍層、外金鍍層以及銠釕鍍層。In order to achieve the above object, the present invention discloses an electroplating coating for a terminal, comprising a copper plating layer plated on a surface of a terminal, wherein the surface of the copper plating layer is sequentially plated with a nickel plating layer, a nickel tungsten plating layer, an inner gold plating layer, a palladium plating layer, an outer gold plating layer, and a crucible.钌 plating.

承上所述,本創作用於端子之電鍍鍍層俾藉由設置鎳鎢鍍層、鈀鍍層以及銠釕鍍層可以有效提高端子的耐磨性、防腐蝕性以及硬度和電接觸性能,使得端子使用壽命長。As mentioned above, the electroplating coating used for the terminal can effectively improve the wear resistance, corrosion resistance, hardness and electrical contact performance of the terminal by setting nickel-tungsten plating, palladium plating and ruthenium plating, so that the service life of the terminal long.

為詳細說明本創作之技術內容、構造特徵、所達成的目的及功效,以下茲例舉實施例並配合圖式詳予說明。To clarify the technical content, structural features, objectives, and effects of the present invention, the embodiments are described in detail below with reference to the drawings.

請參閱第一圖,一種用於端子1之電鍍鍍層,其包括電鍍於端子1表面的銅鍍層2,銅鍍層2表面依次電鍍有鎳鍍層3、鎳鎢鍍層4、內金鍍層5、鈀鍍層6、外金鍍層7以及銠釕鍍層8。Referring to the first figure, an electroplating coating for the terminal 1 includes a copper plating layer 2 plated on the surface of the terminal 1. The surface of the copper plating layer 2 is sequentially plated with a nickel plating layer 3, a nickel tungsten plating layer 4, an inner gold plating layer 5, and a palladium plating layer. 6. The outer gold plating layer 7 and the ruthenium plating layer 8.

由於端子1一般來說採用銅材料,以提供端子1的信號傳輸性能和導電性能;在端子1表面電鍍一層銅鍍層2,與端子1可以緊密結合,同時在端子1表面形成較為平整的電鍍層,避免尖端效應。鎳鍍層3用於提高鹽霧及作為鎳鎢鍍層4及銅鍍層2的過渡層。鎳鎢鍍層4為奈米鍍層,具有較好的耐磨性能和防腐蝕,尤其是耐硝酸性能,用於提高硝酸測試能力並增加耐磨性;鈀鍍層6的硬度較大,可以提高端子1的硬度,防止其彎曲延伸,耐插拔;銠釕鍍層8可以提高端子1的電接觸性能,其硬度高且接觸電阻小,用以提高端子的耐硝酸、耐磨性、耐鹽霧等特性;同時還具有較高的硬度和良好的抗腐蝕性、耐插拔以及耐手汗電解;鎳鎢合金鍍層5、鈀鍍層6以及銠釕鍍層8可以有效提高端子1的耐磨性、防腐蝕性以及硬度和電接觸性能;而在這三種鍍層間採用金鍍層作為過渡層,金具有較好的延展性,可以緩衝或消減上述三種鍍層的內應力,防止鍍層出現裂縫,從而使得電鍍鍍層具有較好的性能,具體地,內金鍍層5用於提高導電性能及降低鎳鎢合金鍍層5及鈀鍍層6間的內應力以提高與後續鍍層的結合力;外金鍍層7用於提高鈀鍍層6及銠釕鍍層8之間的結合力並可用於端子焊錫。Since the terminal 1 is generally made of a copper material to provide signal transmission performance and electrical conductivity of the terminal 1, a copper plating layer 2 is plated on the surface of the terminal 1, and can be tightly bonded to the terminal 1, and a relatively flat plating layer is formed on the surface of the terminal 1. To avoid cutting-edge effects. The nickel plating layer 3 serves to enhance the salt spray and the transition layer as the nickel-tungsten plating layer 4 and the copper plating layer 2. Nickel-tungsten coating 4 is a nano-plated layer with good wear resistance and corrosion resistance, especially nitric acid resistance, used to improve nitric acid testing ability and increase wear resistance; palladium plating layer 6 has higher hardness and can improve terminal 1 The hardness is prevented from bending and extending, and the plugging is resistant; the coating 8 can improve the electrical contact performance of the terminal 1, the hardness is high and the contact resistance is small, and the terminal is resistant to nitric acid, abrasion resistance and salt spray resistance. At the same time, it has high hardness and good corrosion resistance, plugging resistance and hand sweat resistance. Nickel-tungsten alloy coating 5, palladium plating layer 6 and ruthenium plating layer 8 can effectively improve the wear resistance and corrosion resistance of terminal 1. Sex and hardness and electrical contact properties; and gold plating as a transition layer between the three coatings, gold has good ductility, can buffer or reduce the internal stress of the above three coatings, prevent cracks in the coating, so that the electroplated coating has Better performance, specifically, the inner gold plating layer 5 is used to improve the electrical conductivity and reduce the internal stress between the nickel-tungsten alloy plating layer 5 and the palladium plating layer 6 to improve the junction with the subsequent plating layer. Force; outer gold plating layer 7 for improving palladium and rhodium, ruthenium plating layer 6 bonding force between the coating 8 can be used to solder the terminal.

具體地,銅鍍層2的厚度為0.5~3.5µmSpecifically, the thickness of the copper plating layer 2 is 0.5 to 3.5 μm.

具體地,鎳鍍層3的厚度為0.5~2.5µmSpecifically, the thickness of the nickel plating layer 3 is 0.5 to 2.5 μm.

具體地,鎳鎢鍍層4的厚度為1~3.5µmSpecifically, the thickness of the nickel-tungsten plating layer 4 is 1 to 3.5 μm.

具體地,內金鍍層5的厚度為0.075~2.5µmSpecifically, the thickness of the inner gold plating layer 5 is 0.075 to 2.5 μm.

具體地,鈀鍍層6的厚度為0.125~2.0µmSpecifically, the thickness of the palladium plating layer 6 is 0.125 to 2.0 μm.

具體地,外金鍍層7的厚度為0.075~1.0µmSpecifically, the outer gold plating layer 7 has a thickness of 0.075 to 1.0 μm.

具體地,銠釕鍍層8的厚度為0.125~2.5µmSpecifically, the thickness of the ruthenium plating layer 8 is 0.125 to 2.5 μm.

承上所述,將本創作用於端子之電鍍鍍層鍍於一種端子1上,該端子1可以做為目前電子接口中的端子,並使該電子接口可以作為各種數據連接線的接口,如USB接口;也可以為電連接器的電子接口,或其他用於信號傳輸或導電的接口;更進一步地,該電連接器可設於各種電子設備中,如手機、筆記型電腦、平板電腦、相機、電腦等具有數據處理或具有存儲功能的設備。As described above, the electroplating coating for the terminal is plated on a terminal 1, which can be used as a terminal in the current electronic interface, and can be used as an interface of various data connectors, such as USB. Interface; can also be an electrical interface of an electrical connector, or other interface for signal transmission or conduction; further, the electrical connector can be installed in various electronic devices, such as a mobile phone, a notebook computer, a tablet computer, a camera A device such as a computer that has data processing or storage capabilities.

以上內容僅為本創作的較佳實施例,對於本領域的普通技術人員,依據本創作的思想,在具體實施方式及應用範圍上均會有改變之處本說明書的內容不應理解為對本創作的限制。The above content is only a preferred embodiment of the present invention. For those skilled in the art, the content of the present specification and the scope of application may be changed according to the idea of the present invention. limits.

1‧‧‧端子1‧‧‧terminal

2‧‧‧銅鍍層 2‧‧‧ copper plating

3‧‧‧鎳鍍層 3‧‧‧ Nickel plating

4‧‧‧鎳鎢鍍層 4‧‧‧ Nickel-Tungsten Coating

5‧‧‧內金鍍層 5‧‧‧ Inner gold plating

6‧‧‧鈀鍍層 6‧‧‧Palladium plating

7‧‧‧外金鍍層 7‧‧‧Exposed gold plating

8‧‧‧銠釕鍍層。 8‧‧‧铑钌 plating.

第一圖係本創作用於端子之電鍍鍍層之一種結構示意圖。The first figure is a structural schematic diagram of the electroplating coating for the terminal.

Claims (2)

一種用於端子的電鍍鍍層,包括:電鍍於端子表面的銅鍍層,銅鍍層表面依次電鍍有鎳鍍層、鎳鎢鍍層、內金鍍層、鈀鍍層、外金鍍層以及銠釕鍍層。An electroplating coating for a terminal, comprising: a copper plating layer plated on a surface of a terminal, wherein the surface of the copper plating layer is sequentially plated with a nickel plating layer, a nickel tungsten plating layer, an inner gold plating layer, a palladium plating layer, an outer gold plating layer and a tantalum plating layer. 如申請專利範圍第1項所述之用於端子的電鍍鍍層,所述銅鍍層的厚度為0.5~3.5µm;所述鎳鍍層的厚度為0.5~2.5µm;所述鎳鎢鍍層的厚度為1~3.5µm;所述內金鍍層的厚度為0.075~2.5µm;;所述鈀鍍層的厚度為0.125~2.0µm;所述外金鍍層的厚度為0.075~1.0µm;所述銠釕鍍層的厚度為0.125~2.5µm。The electroplating layer for terminals according to claim 1, wherein the copper plating layer has a thickness of 0.5 to 3.5 μm; the nickel plating layer has a thickness of 0.5 to 2.5 μm; The thickness of the tungsten plating layer is 1 to 3.5 μm; the thickness of the inner gold plating layer is 0.075 to 2.5 μm; the thickness of the palladium plating layer is 0.125 to 2.0 μm; the thickness of the outer gold plating layer It is 0.075 to 1.0 μm; the thickness of the ruthenium plating layer is 0.125 to 2.5 μm.
TW107208020U 2018-06-14 2018-06-14 The cladding material for terminal TWM568268U (en)

Priority Applications (1)

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TW107208020U TWM568268U (en) 2018-06-14 2018-06-14 The cladding material for terminal

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Application Number Priority Date Filing Date Title
TW107208020U TWM568268U (en) 2018-06-14 2018-06-14 The cladding material for terminal

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TWM568268U true TWM568268U (en) 2018-10-11

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