M329855 、 八、新型說明： 【新型所屬之技術領域】 - 本創作係有關於一種光罩盒，特別是有關於一種金屬光罩盒及其過濾裝置。 【先前技術】 • 近代半導體科技發展迅速，其中光學微影技術（Optical Lithography)扮演 重要的角色’只要是關於圖形(pattern)定義，皆需仰賴光學微影技術。光學微影 φ技術在半導體的應用上，是將設計好的線路製作成具有特定形狀可透光之光罩 (photo mask)。利用曝光原理，則光源通過光罩投影至矽晶圓(si|ic〇n wafer)可 曝光顯示特定圖案。由於任何附著於光罩上的塵埃顆粒(如微粒、粉塵或有機物) 都會造成投影成像的品質劣化，用於產生圖形的光罩必須保持絕對潔淨，因此 在一般的晶圓製程中，都提供無塵室(C|ean r〇〇m)的環境以避免空氣中的顆粒污 染。然而，目前的無塵室也無法達到絕對無塵狀態。 因此，現代的半導體製程皆利用抗污染的光罩盒(retjcie p〇d)進行光罩的保 存與運輸’以使光罩储潔淨。光罩盒係在半賴製程巾詩存放光罩，以利 光罩在機台之間的搬運與傳送，並隔絕光罩與大氣的接觸，避免光罩被雜質汗 春染而產生變化。因此，在先進的半導體廢中，通常會要求光罩傳送盒的潔淨度 要符合機械標準介面(Standard Mechanical Interface ; SMIF)，也就是說保持潔 淨度在Class 1以下。故，在光罩盒中充入氣體便是目前解決的手段之一。 然而，為了進-步提升產品的良率及降低製造之成本，除了達到潔淨度的 標準要求之外，還要克服因為外來氣體對於光罩的汙染。這樣的外來氣體除了 大氣以外，還有兩個來源，其—是源自於高分子材料所製成之光罩傳送盒本身 所釋出的氣體(outgasing)，其二是源自於殘留在光罩表面的微量化學溶=所產 生的揮發氣體。這些非賊氣體會對光罩的表面產生霧化伽，使得光罩無法 再使用而必須報廢的箸境，使得製造成本增加。在光罩傳送盒中充人氣體是目 5 M329855 前解決光罩霧化的手段之一，其中如何保持充入氣體的潔淨度，是一個重要的 議題。 再者’由於習知的光罩盒多以高分子材質所構成，此種高分子材質具有成 型容易、價格低廉以及可形成透明體的優點。此種絕緣電阻高的高分子材質容 ，易因為磨擦或撥離而產生靜電，尤其是無塵室的作業環境需要保持較低濕度， 使1¾刀子材質的光罩盒非常容易產生與累積電荷。光罩表面的靜電容易吸引空 氣中的污染微粒，更甚者還會造成光罩上的金屬線出現靜電放電(electrostatic discharge ’ ESD)效應。靜電放電所產生的瞬間電流會引起電花(spark)或電弧 | (arc)，在電花與電弧發生的同時，強大的電流伴隨著高溫，導致金屬線的氧化 1與溶解，因而改變了光罩的圖案。 目前針對靜電放電所解決的方法有許多，首先是改善作業環境，使空氣中 維持適當的渥度、作業人員穿著具接地效應的衣物或使用離子扇消除環境中的 靜電。但是改變作業環境的具有許多無法預測的變因，沒有辦法完全解決靜電 對光罩的傷害。 有鑒於此，本創作所提供之具有過濾裝置的光罩盒，乃針對先前技術加以 改良者。 【新型内容】 為解決先前技術之問題，本創作提供一種具有過濾裝置以及具有氣密效果 之金屬光罩盒。光罩盒係由金屬上蓋體與金屬下蓋體組合而成，形成一内部空 間可容納光罩，此光罩盒之金屬上蓋體或該金屬下蓋體侧邊設註少—通U 用以連通光罩盒的内部空間以及外部空間，以及一過濾裝置覆蓋該通孔。該過 遽裝置可為-體成形，或是由多個部件構成。根據本發明—較佳實施例，該過 餘置可包含彈性套件、夾持件與顧賴，彈性套件_以卡設於該通孔上， 此彈性套件具有-對應於通孔之第一開口，夾持件係卡設於彈性套件中，且具 有至少-制，該細設於對應於彈性套件之第—開口的位置，過濾薄膜夹設 於該夾持件上具有該孔洞的位置。 6 &β9 • M329855 此外，金屬光罩盒之金屬上蓋體具有— 具有-邊緣且界定出-開口與金屬上蓋 緣界定出一開口，金屬下蓋體亦 蓋體之邊緣上設有-氣密細，使得該⑽並於上蓋體之邊緣或下 •係以卡設的方式固定在上蓋體或是下蓋體之封閉的空間’且氣密整圈 . 因此，本創作之主要目的在於提供—種光5人上〜朴 止靜電對光罩所造成的傷害。 | ’可減>、電何累積，並且防 本創作之另一目的在於提供一種光罩各， •免光罩於運送過程中產生碰撞而損害光罩Ρ 1由扣壓裝置固定光罩，以避 -之又-目的在於提供—種光罩盒，其側邊具有至少—板子，可使光 罩1立式擺放，亦可於其上黏貼標籤，以便於辨識光罩盒之内容物。 罩盒直立嫩·—嶋，可使光 避免==曝嫌i顧4，娜咖版微塵，以 保持 、本創作之再-目的在於提供難置，卡設方式設於光罩盒内， 以避免微粒產生，減少污染源。 本創作之再-目的在於提供一氣密裝置’使金屬光罩盒之上下蓋體蓋合 時’具有較佳之密合效果。 本創作之再-目的在於提供—氣密裝置，可保持光罩加氣體之潔淨度， 以避免光罩受到汙染。 • M329855 ϊΐ罩或光罩ί之詳細製造或處理過程，係_現有技術來達成 ，故在下述說 =给之圖式，亦並未依據實際之相關尺寸 疋整、4 ’其作用僅在表達與本創作特徵有關之示意s。 =作提供—種金屬光罩盒，肋解決靜電放電_題飾，由於一般 =罩=多μ分子材料製成’因此在光罩盒之上下蓋體蓋合時，光罩盒具有彈 嘗下盖體密合。當使用金屬材料製造盒體時，上下蓋密合不易’需在 ，體的邊緣做特殊加卫，使蓋體具有咬合的部份，以軸上下蓋之密合。然而， ^屬光罩盒之蓋體上做特殊加卫，除了設計上較為複料，所需花費 亦較高。M329855, VIII, new description: [New technical field] - This creation is about a reticle box, especially a metal reticle box and its filtering device. [Prior Art] • Modern semiconductor technology is developing rapidly, and Optical Lithography plays an important role. As long as it is about the definition of a pattern, it depends on optical lithography. Optical lithography In the application of semiconductors, φ technology is to make a designed circuit into a photo mask with a specific shape to transmit light. Using the exposure principle, the light source is projected onto a silicon wafer (si|ic〇n wafer) to expose a specific pattern. Since any dust particles (such as particles, dust, or organic matter) attached to the reticle will cause deterioration in the quality of the projection image, the reticle used to produce the pattern must be absolutely clean, so no trace is provided in the general wafer process. The environment of the dust chamber (C|ean r〇〇m) to avoid particle contamination in the air. However, the current clean room cannot reach an absolute dust-free state. Therefore, modern semiconductor processes use the anti-contamination mask (retjcie p〇d) for the preservation and transportation of the mask to keep the mask clean. The reticle box is stored in a semi-finished hood to store and transport the reticle between the rigs, and to isolate the reticle from the atmosphere, so as to prevent the reticle from being damaged by the impurities. Therefore, in advanced semiconductor waste, the cleanliness of the reticle transfer box is usually required to conform to the Standard Mechanical Interface (SMIF), which means that the cleanliness is below Class 1. Therefore, filling the mask box with gas is one of the solutions currently solved. However, in order to further improve the yield of the product and reduce the cost of manufacturing, in addition to meeting the cleanliness standard requirements, it is also necessary to overcome the contamination of the reticle by foreign gases. In addition to the atmosphere, such foreign gases have two sources, which are derived from the outgasing of the reticle transfer box made of polymer materials, and the second is derived from the residual light. Trace chemical dissolution on the surface of the mask = volatile gases generated. These non-thief gases can cause atomization gamma on the surface of the reticle, making the reticle impossible to use and having to be scrapped, making the manufacturing cost increase. Filling the gas in the reticle transfer box is one of the means to solve the atomization of the reticle before the M329855. How to maintain the cleanliness of the gas is an important issue. Furthermore, since conventional photomasks are mostly made of a polymer material, such a polymer material has the advantages of easy molding, low cost, and transparency. The polymer material with high insulation resistance is easy to generate static electricity due to friction or disengagement. In particular, the working environment of the clean room needs to maintain low humidity, so that the mask of the 13⁄4 knife material is very easy to generate and accumulate charges. The static electricity on the surface of the mask easily attracts contaminated particles in the air, and moreover causes an electrostatic discharge (ESD) effect on the metal lines on the mask. The instantaneous current generated by electrostatic discharge causes spark or arc | (arc). At the same time as electric spark and arc occur, a strong current is accompanied by high temperature, which causes oxidation and dissolution of the metal wire, thus changing the light. The pattern of the cover. There are many solutions for electrostatic discharge. The first is to improve the working environment, maintain proper humidity in the air, wear clothing with grounding effects, or use an ion fan to eliminate static electricity in the environment. However, there are many unpredictable causes of changing the working environment, and there is no way to completely solve the damage caused by static electricity to the reticle. In view of this, the photomask case with the filtering device provided by the present invention is improved for the prior art. [New content] In order to solve the problems of the prior art, the present invention provides a metal photomask case having a filtering device and an airtight effect. The reticle box is formed by combining a metal upper cover body and a metal lower cover body, and forms an inner space for accommodating the reticle. The metal upper cover body of the reticle case or the metal lower cover body is provided with less side-through U The inner space of the reticle box and the outer space are connected, and a filtering device covers the through hole. The overturning device can be formed in a body or composed of a plurality of components. According to the preferred embodiment of the present invention, the excess may include an elastic sleeve, a clamping member and a snap-on, and the elastic sleeve is disposed on the through hole, the elastic sleeve having a first opening corresponding to the through hole The clamping member is disposed in the elastic sleeve and has at least a shape which is disposed at a position corresponding to the first opening of the elastic sleeve, and the filtering film is disposed on the clamping member at the position having the hole. 6 &β9 • M329855 In addition, the metal upper cover of the metal photomask case has a - edge and defines an opening defining an opening with the metal upper cover edge, and the metal lower cover body is also provided with an airtight edge on the edge of the cover body Thin, so that the (10) is fixed on the edge of the upper cover or under the closed space of the upper cover or the lower cover and is airtight and complete. Therefore, the main purpose of the creation is to provide - Kind of light on 5 people ~ ~ 止 静电 静电 对 对 。 。 。 。 。 。 。 。 | 'Can be reduced>, what accumulates electricity, and another purpose of preventing this creation is to provide a mask, • The mask is damaged during transport and damages the mask. 1 The photomask is fixed by the crimping device to The purpose of the refusal is to provide a reticle box having at least a board on its side so that the reticle 1 can be placed vertically or a label can be attached thereto to facilitate identification of the contents of the reticle box. The cover box is erect and tender, and the light can be avoided. == The suspected i Gu 4, the Naca version of the dust, to maintain, the re-creation of the creation - the purpose is to provide difficulty, the card is set in the mask box, to Avoid particle generation and reduce pollution sources. A further refinement of the present invention is to provide a gas-tight device 'to make the metal mask case over the upper cover body' having a better adhesion effect. The purpose of this creation is to provide an airtight device that maintains the cleanliness of the reticle plus gas to avoid contamination of the reticle. • The detailed manufacturing or processing of the M329855 hood or reticle is based on the prior art, so the following description = the pattern is not based on the actual size of the adjustment, 4 'the role is only expressed and The schematic of the creative features. = for the supply - a metal mask box, ribs to solve the electrostatic discharge _ title decoration, due to the general = cover = multi-μM material made of 'so the cover box cover over the mask box, the mask box has a bomb taste The cover is tight. When the metal body is used to manufacture the casing, the upper and lower covers are not easy to be attached. The special edge of the body is required to be fixed, so that the cover has a bite portion, and the upper and lower covers are tightly closed. However, ^ is a special decoration on the cover of the reticle box, in addition to the design is relatively complex, the cost is also higher.
第-A ®與第-β _本創作金屬光罩盒之—較佳實補示意圖，金屬光 罩盒1係由金屬上蓋體Μ與金屬下蓋體12組合而成，形成一個可容納光罩之 内部空間’且此光罩盒]之金屬材質可為例如不錄鋼、齡金或鎂合金。光罩 盒1之金屬上蓋體μ或金屬下蓋體12之侧邊設有至少一通孔13，用以連通光 罩盒1的内部空間以及外部空間，並以過濾裝置2覆蓋在通孔13上。此外，於 金屬光罩盒1之側邊上另包含至少-接合機構14、至少—鎖扣件15、至少一個 板子16或至少-凸腳17(請參照第—c圖），以及於金屬光罩y之上蓋體H 或下蓋，12内’另設有一扣壓件3。接合機構14係用以連接金屬上蓋體μ及 ，屬下蓋體12 ;鎖扣件15係用以扣合金屬上蓋體Ή及金屬下蓋體12，且為一 焉分子材料所形成；板子16與凸腳17係肋使光罩盒彳可直立式擺放，此外， 亦可於板子16上黏貼標籤，以便於辨識光罩盒彳之内容物。 第二Α圖係本創作過濾裝置之一較佳實施例示意圖，過濾裝置2包含彈性 套件21、夾持件22與過濾薄膜23。彈性套件21(請參照第二B圖)係用以卡設 於光罩盒1之通孔13上，此彈性套件21具有第一開口 21彳與第二開口 212， 且第口 211小於第二開口 212，第1 口 211之周圍設有一突出部213對 應並卡設於通孔13上，第二開口 212之周圍設有一卡持部214，用以卡持夾持 件22，且彈性套件21為一高分子材料所形成。夾持件22(請參照第二c圖)卡 8 M329855 設於彈性套件21中且具有至少一孔洞221，該孔洞221設於對應於彈性套件 21第一開口 211的位置，夾持件22係由一第一部份222以及一第二部份223 所組成，其第一部份222以及第二部分223各具有孔洞221，其第一部份222 以及第二部分223可為對稱且一體成型的元件或兩個分離的元件，亦可為兩個 ，相同的元件’夾持件22之第一部份222以及第二部份223至少其中之一具有 一凹陷部224，另一則具有一凸出部225，且夾持件22為金屬材質所製成。過 濾薄膜23係夾持(sandwiched)於夾持件22之第一部份222以及第二部分223 之間，並夾設於夾持件22上具有該孔洞221的位置，且過濾薄膜23為混合纖 _維所製成。 與第二部分223之間，且凹陷部224大於凸出部挪，用以夾持並固定過遽薄 膜23於其中。 I帛三A _本_料盒無縣置卡奴—難實施_意圖，過雜 置2之彈性套件21係以其突出部213卡設於光罩盒，之通孔13上且其突出 本創作提供一夾持件夾持(sandwiched)過濾薄膜之一較佳實施例，夾持件 22之第一部份222以及第二部分223皆具有凹陷部224或其中之一具有凹陷部 224面向第一部分222與第二部份223之間，用以形成一可容置過濾薄膜23 之玉間。本創作另提供一夾持件夾持(sandw|_ched)過濾薄膜之另一較佳實施 例，夾持件22之第-部份222以及第二部分223至少其中之一具有一凹陷部 224’另一則具有一凸出部225,凹陷部224與凸出部225皆面向第一部分222 部213具有一溝槽213a， 孔13上，以此方式蔣渦请 a ’該突出部213係以該溝槽213a卡設於該光罩盒之通The first-A ® and the -β _ the original metal reticle box - a better complement diagram, the metal reticle box 1 is composed of a metal upper cover Μ and a metal lower cover 12 to form a hood The metal material of the internal space 'and the reticle box> may be, for example, no steel, age gold or magnesium alloy. At least one through hole 13 is provided in the side of the metal upper cover body or the metal lower cover body 12 of the mask case 1 for communicating the inner space and the outer space of the photomask case 1 and covering the through hole 13 with the filtering device 2. . In addition, at least the side of the metal reticle 1 comprises at least an engagement mechanism 14, at least a locking member 15, at least one plate 16 or at least a spur 17 (please refer to the figure - c), and the metallic light The cover y is above the cover H or the lower cover, and 12 is further provided with a buckle member 3. The joint mechanism 14 is for connecting the metal upper cover μ and the lower cover body 12; the lock member 15 is for engaging the metal upper cover body and the metal lower cover body 12, and is formed by a molecular material; the board 16 The ribs are attached to the ribs to form the hood, and the label can be attached to the board 16 to identify the contents of the reticle. The second diagram is a schematic view of a preferred embodiment of the present invention. The filter device 2 comprises an elastic sleeve 21, a clamping member 22 and a filter membrane 23. The elastic sleeve 21 (refer to FIG. 2B) is used to be fastened to the through hole 13 of the reticle case 1. The elastic sleeve 21 has a first opening 21 彳 and a second opening 212, and the first opening 211 is smaller than the second opening 211 The opening 212 is provided with a protruding portion 213 corresponding to the first opening 211 and is disposed on the through hole 13. The second opening 212 is provided with a holding portion 214 for holding the clamping member 22 and the elastic sleeve 21 Formed as a polymer material. The clamping member 22 (please refer to the second c-figure) card 8 M329855 is disposed in the elastic sleeve 21 and has at least one hole 221 disposed at a position corresponding to the first opening 211 of the elastic sleeve 21, and the clamping member 22 is The first portion 222 and the second portion 223 each have a hole 221, and the first portion 222 and the second portion 223 can be symmetric and integrally formed. The component or the two separate components may also be two. The same component 'the first portion 222 of the clamping member 22 and the second portion 223 have at least one of the recesses 224 and the other has a convex portion. The outlet portion 225 and the holding member 22 are made of a metal material. The filter film 23 is sandwiched between the first portion 222 and the second portion 223 of the clamping member 22, and is sandwiched between the clamping member 22 having the hole 221, and the filtering film 23 is mixed. Made of fiber _ dimension. Between the second portion 223 and the recessed portion 224 is larger than the projection portion for clamping and fixing the film 23 therethrough. I帛三 A _本_料盒无县置卡奴—difficult to implement _ Intention, the elastic kit 21 of the miscellaneous 2 is attached to the photomask box through the protruding portion 213, and the protruding portion thereof A preferred embodiment of the present invention provides a sandwiched filter membrane. The first portion 222 and the second portion 223 of the clamp member 22 each have a recess 224 or one of which has a recess 224 facing the first A portion 222 and the second portion 223 are formed to form a jade chamber that can accommodate the filter film 23. The present invention further provides another preferred embodiment of a sandwich holding (sandw|_ched) filter film, at least one of the first portion 222 and the second portion 223 of the clamping member 22 having a recess 224' The other has a protrusion 225, and the recess 224 and the protrusion 225 both face the first portion 222. The portion 213 has a groove 213a on the hole 13 in such a manner that the protrusion 213 is attached to the groove. The slot 213a is latched in the photomask box
，邊牆131可朝向光罩盒1之外 9 M329855 部空間延伸。 根據本發明另一較佳實施例(未示於圖中），該過濾裝置之過濾部分以及卡設 於該光罩盒的部分亦可一體成形。根據本發明又一較佳實施例(未示於圖中），該 過濾裝置包含一過濾片與一中空框架，該過濾片以及該框架可卡設於該通孔13 ，周圍的邊牆彳31中，使得該過濾片被夾設於該框架以及該光罩盒之間，藉此覆 盍該通孔13 ’達成過濾的功效。 第四A圖係本創作金屬光罩盒之另一較佳實施例示意圖，金屬光罩盒’之 金屬上蓋體11具有一邊緣111界定出一開口，金屬下蓋體12亦具有一邊緣121 m且界定出一開口與金屬上蓋體11之開口相對，並於上蓋體11之邊緣111或下 蓋體12之邊緣121上設有一氣密墊圈18 ,使得該内部空間成為封閉的空間， 且該氣密墊圈18大致由高分子樹脂或導電膠所製成，其中氣密墊圈18係以卡 設的方式固定在上蓋體11或是下蓋體12之邊緣111或121上。根據本創作另 一較佳實施例，該氣密墊圈18亦可直接設於該金屬上蓋體彳彳之邊緣Ή1或是 下蓋體12之邊緣121上。 其中，該氣密墊圈18包含有一溝槽181，氣密墊圈18藉由溝槽181卡設 於上蓋體11或疋下蓋體12的邊緣111或121上，其中，溝槽181具有開口端 1811以及底部1812，且開口端1811之寬度較底部1812為窄(請參考第四Β φ 圖），該氣密墊圈彳8可直接藉由以上結構與與邊緣111或121緊密接合。 ， 本創作提供一氣密墊圈固定於上蓋體或下蓋體邊緣上之另一較佳實施例， 該氣密墊圈18係藉由一黏合劑固接於上蓋體11或是下蓋體12的邊緣111或 121 上。 本創作提供一氣密墊圈固定於上蓋體或下蓋體邊緣上之再一較佳實施例， 請參考第四c圖，其中上蓋體11或下蓋體12之側邊具有數個鎖固孔112或 122 ’氣密墊圈18上則具有數個座耳M2，且鎖固孔112或122與座耳182可 相對應，該氣密墊圈18係藉由一鎖固件將此氣密墊圈18固設於上蓋體彳1或是 下蓋體12的邊緣111或121上。 M329855 第五A圖、第五B圖與第五c圖係本創作扣壓件之一較佳實施例示意圖， 扣壓件结構之特徵包括-座體31以及至少一個、彎曲彈性元件32，且此扣壓 件3為回刀子材料所形成。座體31係以複數個支撐點固接於該光罩盒，之 -金屬上蓋體Ή及金屬下蓋體12内各角落之位置，且其座體31大致為兩兩一對 ·(請參考第四Α圖）。彎曲彈性元件32其一彎曲之端部結合於越&上，另一 f曲之呈彈性懸浮狀態於單數個或複數個支撐點311之間，且料彈性 το件32進-步包括-頂持面312及一扣壓面313。其中，當光罩盒’承載一光 罩且蓋合時，該f曲彈性元件32之頂持面312具有將光罩導正及定位之功能， 而扣壓面313於蓋合時會與光罩接觸並固定之，以避免光罩於運送過程中產生 >碰撞而損害光罩。 本創作提供一種利用氣密墊圈使金屬光罩盒上下蓋體可完全密合的結構， 可避免设计複雜等問題，且又可提供較佳之氣密程度，使得光罩盒既具有防止 靜電放電的優點，又能具有氣密效果佳且不擔心成本高昂的問題。 以上所述僅為本創作之較佳實施例而已，並非用以限定本創作之申請專利 權利；同時以上的描述，對於熟知本技術領域之專門人士應可明瞭及實施，因 此其他未脫離本發明所揭示之精神下所完成的等效改變或修飾，均應包含在下 述之申請專利範圍中。 ί 【圖式簡單說明】 第一Α圖與第一Β圖係本創作金屬光罩盒之一實施例示意圖。 第一 C圖係本創作金屬光罩盒凸腳之一實施例示意圖。 第二A圖係本創作過濾裝置之一實施例示意圖。 第二B圖係本創作彈性套件之一實施例示意圖。 第二C圖係本創作夾持件之一實施例示意圖。 第三A圖至第三c圖係本創作光罩盒與過濾裝置卡設之一實施例示意圖。 第四A圖係本創作光罩盒與氣密墊圈之一實施例示意圖。 11 ,M329855 具敗'、 i ' • 第四B圖本創作氣密墊圈之二ϋ例剖面圖。 ' 第四C圖係本創作光罩盒與氣密墊圈之一實施例示意圖。 • 第五Α圖至第五C圖係本創作扣壓件之一實施例示意圖。The side wall 131 can extend toward the 9 M329855 space outside the mask case 1. According to another preferred embodiment of the present invention (not shown), the filter portion of the filter device and the portion of the filter case that is clipped to the reticle can also be integrally formed. According to still another preferred embodiment of the present invention (not shown), the filter device includes a filter sheet and a hollow frame, and the filter sheet and the frame are engageable in the through hole 13 and the surrounding side wall 31 The filter is sandwiched between the frame and the photomask case, thereby covering the through hole 13' to achieve the filtering effect. 4A is a schematic view of another preferred embodiment of the present metal mask case. The metal upper cover 11 of the metal mask case has an edge 111 defining an opening, and the metal lower cover 12 also has an edge 121 m. And defining an opening opposite to the opening of the metal upper cover 11, and providing an airtight gasket 18 on the edge 111 of the upper cover 11 or the edge 121 of the lower cover 12, so that the internal space becomes a closed space, and the air The gasket 18 is substantially made of a polymer resin or a conductive paste, and the hermetic gasket 18 is fixed to the upper cover 11 or the edge 111 or 121 of the lower cover 12 in a snap-fit manner. According to another preferred embodiment of the present invention, the hermetic gasket 18 can also be disposed directly on the edge Ή1 of the metal upper cover or the edge 121 of the lower cover 12. The airtight gasket 18 includes a groove 181. The airtight gasket 18 is mounted on the edge 111 or 121 of the upper cover 11 or the lower cover 12 by the groove 181. The groove 181 has an open end 1811. And the bottom portion 1812, and the width of the open end 1811 is narrower than the bottom portion 1812 (please refer to the fourth φ φ view), and the airtight gasket 彳 8 can be directly engaged with the edge 111 or 121 by the above structure. The present invention provides another preferred embodiment in which a gas-tight gasket is attached to the edge of the upper cover or the lower cover. The airtight gasket 18 is fixed to the edge of the upper cover 11 or the lower cover 12 by an adhesive. On 111 or 121. The present invention provides a further embodiment in which a gas-tight gasket is fixed to the edge of the upper cover or the lower cover. Please refer to the fourth c-figure, wherein the side of the upper cover 11 or the lower cover 12 has a plurality of locking holes 112. Or 122' airtight gasket 18 has a plurality of ears M2, and the locking holes 112 or 122 correspond to the ears 182, and the airtight gasket 18 is fixed by a locker to the airtight gasket 18. It is on the upper cover 1 or the edge 111 or 121 of the lower cover 12. M329855 A fifth diagram, a fifth B diagram and a fifth c diagram are schematic views of a preferred embodiment of the present invention. The buckle member structure includes a body 31 and at least one curved elastic member 32, and the buckle is pressed. Piece 3 is formed by returning the knife material. The seat body 31 is fixed to the photomask box by a plurality of support points, and the positions of the metal upper cover body and the metal lower cover body 12, and the seat body 31 is substantially two-two pairs (please refer to The fourth picture). The curved elastic member 32 has a curved end portion bonded to the outer portion, and the other f curved portion is elastically suspended between the single number or the plurality of support points 311, and the material elastic τ ο οf 32 includes - top The holding surface 312 and a pressing surface 313. Wherein, when the photomask case carries a photomask and is covered, the top surface 312 of the f-curvature member 32 has the function of guiding and positioning the photomask, and the pressing surface 313 is combined with the photomask when the cover is closed. Contact and fix to prevent the reticle from colliding during transport to damage the reticle. The present invention provides a structure in which the upper and lower covers of the metal photomask case can be completely adhered by using a gas-tight gasket, which can avoid the complicated design and the like, and can provide a better airtightness, so that the photomask case has the function of preventing electrostatic discharge. The advantage is that it has a good airtight effect and does not worry about the high cost. The above description is only for the preferred embodiment of the present invention, and is not intended to limit the patent application rights of the present invention; the above description should be understood and implemented by those skilled in the art, so that the other embodiments are not deviated from the present invention. Equivalent changes or modifications made in the spirit of the disclosure are intended to be included in the scope of the claims below. ί [Simple description of the diagram] The first diagram and the first diagram are schematic diagrams of one embodiment of the metal mask case. The first C diagram is a schematic diagram of one embodiment of the convexity of the metal mask case. The second A diagram is a schematic diagram of an embodiment of the present creation filtering device. The second B diagram is a schematic diagram of one embodiment of the present flexible assembly. The second C is a schematic view of one embodiment of the present invention. 3A to 3C are schematic views showing an embodiment of the present photomask box and the filter device. The fourth A is a schematic view of one embodiment of the present photomask case and hermetic gasket. 11 , M329855 has defeated ', i ' • Figure 4 B is a cross-sectional view of the second example of the hermetic gasket. 'Fourth C is a schematic diagram of one embodiment of the present photomask box and hermetic gasket. • The fifth to fifth C drawings are schematic views of one embodiment of the present crimping member.
【主要元件符號說明】 1 金屬光罩盒 11 金屬上蓋體 111 金屬上蓋體邊緣 112 鎖固孔 12 金屬下蓋體 121 金屬下蓋體邊緣 122 鎖固孔 13 通孔 131 邊牆 14 接合機構 15 鎖扣件 16 板子 17 凸腳 18 氣密墊圈 181 溝槽 1811 開口端 1812 底部 182 氣密墊圈座耳 2 過濾裝置 21 彈性套件 211 第一開口 12 溝槽 卡持部 夾持件 孔洞 第一部份 第二部份 凹陷部 凸出部 過濾薄膜 壓扣件 座體 支撐點 頂持面 扣壓面 彎曲彈性元件 13[Main component symbol description] 1 Metal mask box 11 Metal upper cover 111 Metal upper cover edge 112 Locking hole 12 Metal lower cover 121 Metal lower cover edge 122 Locking hole 13 Through hole 131 Side wall 14 Engagement mechanism 15 Lock Fasteners 16 Plates 17 Tips 18 Gas-tight gaskets 181 Grooves 1811 Open ends 1812 Bottom 182 Gas-tight gaskets Ears 2 Filters 21 Elastic kits 211 First opening 12 Groove grips Clamping holes First part Two-part recessed portion protruding portion filter film pressing member seat body support point top holding surface buckle pressing surface bending elastic member 13