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TWI914271B - Method for manufacturing element-doped nanostructure - Google Patents

Method for manufacturing element-doped nanostructure

Info

Publication number
TWI914271B
TWI914271B TW114124699A TW114124699A TWI914271B TW I914271 B TWI914271 B TW I914271B TW 114124699 A TW114124699 A TW 114124699A TW 114124699 A TW114124699 A TW 114124699A TW I914271 B TWI914271 B TW I914271B
Authority
TW
Taiwan
Prior art keywords
manufacturing element
doped nanostructure
nanostructure
doped
manufacturing
Prior art date
Application number
TW114124699A
Other languages
Chinese (zh)
Inventor
謝淑貞
Original Assignee
國立中山大學
Filing date
Publication date
Application filed by 國立中山大學 filed Critical 國立中山大學
Application granted granted Critical
Publication of TWI914271B publication Critical patent/TWI914271B/en

Links

TW114124699A 2025-06-30 Method for manufacturing element-doped nanostructure TWI914271B (en)

Publications (1)

Publication Number Publication Date
TWI914271B true TWI914271B (en) 2026-02-01

Family

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Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20140054784A (en) 2012-10-29 2014-05-09 한국과학기술원 Graphene doped with nitrogen and manufacturing method for the same
TWI639555B (en) 2016-05-27 2018-11-01 國立交通大學 Preparation method of nitrogen-doped graphene
CZ2019600A3 (en) 2019-09-23 2021-04-14 Fyzikální Ústav Av Čr, V. V. I. Surface treatment of semiconductor nanoparticles using water activated by non-thermal plasma and the product of this method
TWI775548B (en) 2021-07-30 2022-08-21 雪曼電漿科技有限公司 A manufacturing modus of a plasma-activated solution

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20140054784A (en) 2012-10-29 2014-05-09 한국과학기술원 Graphene doped with nitrogen and manufacturing method for the same
TWI639555B (en) 2016-05-27 2018-11-01 國立交通大學 Preparation method of nitrogen-doped graphene
CZ2019600A3 (en) 2019-09-23 2021-04-14 Fyzikální Ústav Av Čr, V. V. I. Surface treatment of semiconductor nanoparticles using water activated by non-thermal plasma and the product of this method
TWI775548B (en) 2021-07-30 2022-08-21 雪曼電漿科技有限公司 A manufacturing modus of a plasma-activated solution

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