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TWI913751B - 分析微影微結構化樣品的影像的方法與裝置以及電腦程式產品 - Google Patents

分析微影微結構化樣品的影像的方法與裝置以及電腦程式產品

Info

Publication number
TWI913751B
TWI913751B TW113118785A TW113118785A TWI913751B TW I913751 B TWI913751 B TW I913751B TW 113118785 A TW113118785 A TW 113118785A TW 113118785 A TW113118785 A TW 113118785A TW I913751 B TWI913751 B TW I913751B
Authority
TW
Taiwan
Prior art keywords
microlithographic
analysing
image
computer program
program product
Prior art date
Application number
TW113118785A
Other languages
English (en)
Other versions
TW202516173A (zh
Inventor
言斯 歐斯特
拉爾夫 勳伯格
馬利歐 朗格勒
Original Assignee
德商卡爾蔡司Ｓｍｔ有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from DE102023113273.3A external-priority patent/DE102023113273B3/de
Application filed by 德商卡爾蔡司Ｓｍｔ有限公司 filed Critical 德商卡爾蔡司Ｓｍｔ有限公司
Publication of TW202516173A publication Critical patent/TW202516173A/zh
Application granted granted Critical
Publication of TWI913751B publication Critical patent/TWI913751B/zh

Links

TW113118785A 2023-05-22 2024-05-21 分析微影微結構化樣品的影像的方法與裝置以及電腦程式產品 TWI913751B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102023113273.3A DE102023113273B3 (de) 2023-05-22 2023-05-22 Verfahren und vorrichtung zum analysieren eines bildes einer mikrostrukturierten probe für die mikrolithographie
DE102023113273.3 2023-05-22

Publications (2)

Publication Number Publication Date
TW202516173A TW202516173A (zh) 2025-04-16
TWI913751B true TWI913751B (zh) 2026-02-01

Family

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Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102005054401A1 (de) 2004-11-19 2006-06-08 Holon Co. Ltd. Verfahren zum Treffen einer Entscheidung über einen Messwert
TW202037999A (zh) 2018-12-22 2020-10-16 美商Ｄ２Ｓ公司 減少帶電粒子束寫入時間的方法及系統
CN115410213A (zh) 2021-05-27 2022-11-29 卡尔蔡司Smt有限责任公司 用于分析微光刻微结构部件的图像的方法和设备

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102005054401A1 (de) 2004-11-19 2006-06-08 Holon Co. Ltd. Verfahren zum Treffen einer Entscheidung über einen Messwert
TW202037999A (zh) 2018-12-22 2020-10-16 美商Ｄ２Ｓ公司 減少帶電粒子束寫入時間的方法及系統
CN115410213A (zh) 2021-05-27 2022-11-29 卡尔蔡司Smt有限责任公司 用于分析微光刻微结构部件的图像的方法和设备
US20220383485A1 (en) 2021-05-27 2022-12-01 Carl Zeiss Smt Gmbh Method and apparatus for analyzing an image of a microlithographic microstructured component

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