TWI905785B - Drawing apparatus - Google Patents

Abstract

A drawing control part of a drawing apparatus controls a light modulation part 44 to sequentially form an image of the same shape on a target area at each of the plurality of irradiation positions when the substrate is moved with the stage by the stage moving mechanism and the target area on the substrate passes through the plurality of irradiation positions. A lens movement control part controls an autofocus mechanism 5 to make the unit movement number less than the number of multiple segmented modulation areas in the light modulation part 44. The unit movement number is the number of times the second lens group 452 is raised or lowered during the formation of the above image on the target area at the plurality of irradiation positions. It is thereby possible to suppress the reduction in drawing accuracy caused by slight vibrations during the movement of the second lens group 452 by the autofocus mechanism 5.

Description

Drawing device

This invention relates to a drawing apparatus for irradiating a substrate with light and drawing a pattern. [Reference to Related Applications] This application claims priority to Japanese Patent Application JP2023-137508, filed on August 25, 2023, and incorporates the entire disclosure of Japanese Patent Application JP2023-137508 into this application.

A known direct drawing apparatus irradiates a printed wiring board or similar material (hereinafter referred to as "the board") on a stage with modulated light and scans the irradiated area on the board to draw a pattern. In this direct drawing apparatus, an autofocus mechanism is provided to correspond to the unevenness or other features of the board surface.

For example, the autofocus mechanism installed in the drawing apparatus disclosed in Japanese Patent Application Publication No. 2016-31502 (Document 1) includes: a detector that detects changes in the distance between the optical head and the substrate surface; a lifting mechanism that holds the lens of the projection optical system and raises and lowers the lens of the projection optical system; and a control unit that calculates the amount of raising and lowering of the lens of the projection optical system based on the amount of change detected by the detector.

Furthermore, in drawing devices such as those described in Reference 1, when the autofocus mechanism operates, the lens or other components may experience slight vibrations due to the drive load applied to the lifting mechanism. In the future, when pursuing higher detail in the pattern, there is a concern that the line width of the pattern may not fall within the desired precision due to the slight vibrations of the lens or other components.

The purpose of this invention is to suppress the reduction in drawing precision caused by micro-vibrations when the lens group is moved by the autofocus mechanism.

Specimen 1 of the present invention is a drawing apparatus for irradiating a substrate with light and drawing a pattern, and includes: a stage for holding the substrate; a drawing head for irradiating the substrate with modulated light; a stage moving mechanism for moving the stage relative to the drawing head in a scanning direction parallel to the upper surface of the substrate; and a control unit for controlling the drawing head. The drawing head includes: an illumination optical system for receiving light emitted from a light source; a light modulation unit for modulating the light guided by the illumination optical system; a projection optical system for guiding the light modulated by the light modulation unit to the substrate; and an automatic focusing mechanism for adjusting the focus position of the light emitted from the drawing head in accordance with changes in the distance between the projection optical system and the substrate. The aforementioned light modulation section includes a plurality of segmented modulation regions, each corresponding to a plurality of illumination positions arranged below the aforementioned drawing head in the aforementioned scanning direction. The aforementioned projection optical system comprises: a first lens group for receiving light modulated by the aforementioned light modulation section; and a second lens group for guiding the light guided by the aforementioned first lens group to the aforementioned substrate. The aforementioned autofocus mechanism comprises: a sensor unit for measuring the vertical distance between the aforementioned second lens group and the aforementioned substrate; and a lens moving mechanism for supporting the aforementioned second lens group and moving the aforementioned second lens group vertically based on the output from the aforementioned sensor unit, thereby adjusting the aforementioned focus position of the light emitted from the aforementioned drawing head. The aforementioned control unit comprises: a drawing control unit that controls the aforementioned light modulation unit, thereby causing the aforementioned substrate and the aforementioned stage to move together via the aforementioned stage movement mechanism and, when a region on the aforementioned substrate passes through the aforementioned plurality of illumination positions, sequentially forming an image of the same shape in the aforementioned region at each of the aforementioned plurality of illumination positions; and a lens movement control unit that controls the aforementioned autofocus mechanism, thereby ensuring that, during the formation of the aforementioned image in the aforementioned region at the aforementioned plurality of illumination positions, the number of single displacements, which is the sum of the number of times the aforementioned second lens group rises and falls, is less than the number of the aforementioned plurality of segmented modulation regions.

According to the present invention, the reduction in drawing precision caused by micro-vibrations when the lens group is moved by the autofocus mechanism can be suppressed.

The present invention, in its second state, is a drawing device as described in the first state, wherein the number of single displacements is one or less.

The present invention, in its third embodiment, is a drawing apparatus as described in the present invention, wherein the aforementioned lens movement control unit limits the maximum movement speed or maximum acceleration of the aforementioned second lens group by the aforementioned lens movement mechanism based on information related to the movement speed of the aforementioned stage in the aforementioned scanning direction by the aforementioned stage movement mechanism; the aforementioned movement speed related information includes at least one of the scanning speed of the aforementioned substrate, the type of photosensitive material on the aforementioned substrate, and the required exposure amount of the aforementioned photosensitive material.

The present invention, in aspect 4, is a drawing apparatus for irradiating a substrate with light and drawing a pattern thereon. It comprises: a stage for holding the substrate; a drawing head for irradiating the substrate with modulated light; and a stage moving mechanism for moving the stage relative to the drawing head in a scanning direction parallel to the upper surface of the substrate. The drawing head comprises: an illumination optical system for receiving light emitted from a light source; a light modulation unit for modulating the light guided by the illumination optical system; a projection optical system for guiding the light modulated by the light modulation unit to the substrate; and an automatic focusing mechanism for adjusting the focus position of the light emitted from the drawing head in accordance with changes in the distance between the projection optical system and the substrate. The aforementioned projection optical system comprises: a first lens group for receiving light modulated by the aforementioned light modulation unit; and a second lens group for guiding the light guided by the aforementioned first lens group to the aforementioned substrate. The aforementioned autofocus mechanism comprises: a sensor unit for measuring the vertical distance between the aforementioned second lens group and the aforementioned substrate; and a lens moving mechanism for supporting the aforementioned second lens group and moving the aforementioned second lens group vertically based on the output from the aforementioned sensor unit, thereby adjusting the aforementioned focus position of the light emitted from the aforementioned drawing head. Based on information related to the movement speed of the aforementioned stage in the aforementioned scanning direction by the aforementioned stage moving mechanism, the maximum movement speed or maximum acceleration of the aforementioned second lens group by the aforementioned lens moving mechanism is limited; the aforementioned movement speed related information includes at least one of the aforementioned substrate scanning speed, the type of photosensitive material on the aforementioned substrate, and the required exposure amount of the aforementioned photosensitive material.

The present invention, in its 5th embodiment, is a drawing apparatus as described in the 4th embodiment, wherein the aforementioned stage moving mechanism enables the aforementioned stage to move relative to the aforementioned drawing head in a sub-scanning direction that is parallel to the aforementioned upper surface of the aforementioned substrate and perpendicular to the aforementioned scanning direction. In the aforementioned drawing apparatus, while the substrate is irradiated with modulated light from the drawing head, the substrate is moved relatively in the aforementioned scanning direction to draw one of the plurality of drawing areas arranged in the aforementioned sub-scanning direction. After the drawing of the aforementioned drawing area is completed, the substrate is displaced relatively in the aforementioned sub-scanning direction relative to the aforementioned drawing head by a predetermined distance. This process of positioning the drawing head in the aforementioned plurality of drawing areas corresponding to the undrawn drawing area adjacent to the aforementioned drawing area is repeated, and a predetermined pattern is drawn on the aforementioned substrate. The maximum moving speed or maximum acceleration of the aforementioned second lens group by the aforementioned lens moving mechanism is also limited based on the maximum value of the vertical moving distance of the aforementioned second lens group when drawing the aforementioned drawing area.

The above-mentioned objectives, as well as other objectives, features, forms, and advantages, will become clearer with reference to the accompanying diagrams and through the detailed description of the invention that follows.

Figure 1 is a perspective view of a drawing apparatus 1, one embodiment of the present invention. The drawing apparatus 1 is a direct drawing apparatus used to irradiate a spatially modulated, slightly beamed light onto a photosensitive material on a substrate 9 and scan the irradiated area of the light onto the substrate 9, thereby drawing a pattern. In Figure 1, the three mutually orthogonal directions are indicated by arrows as the X, Y, and Z directions. In the example shown in Figure 1, the X and Y directions are mutually perpendicular horizontal directions, and the Z direction is a vertical direction (i.e., the up-down direction). The same applies to other figures.

The substrate 9 is, for example, a slightly rectangular flat printed circuit board. A resist film formed of a photosensitive material is disposed on the main surface (hereinafter also referred to as "upper surface 91") on the +Z side of the substrate 9, on a copper layer. In the drawing apparatus 1, a circuit pattern is drawn (i.e. formed) on the resist film of the substrate 9. Furthermore, the type and shape of the substrate 9 can be varied in various ways.

The drawing apparatus 1 includes a stage 21, a stage moving mechanism 22, an alignment section 3, a drawing section 4, and a control section 8. The stage 21 is a slightly rectangular flat plate-shaped component, disposed below the alignment section 3 and the drawing section 4 (i.e., the -Z side). The stage 21 includes a substrate holding section 25, which holds a horizontally positioned substrate 9 from below. The substrate holding section 25 is, for example, a vacuum chuck, used to adsorb and hold the lower surface of the substrate 9. The substrate holding section 25 may also have a structure other than a vacuum chuck, for example, it may be a mechanical chuck. The upper surface 91 of the substrate 9 placed on the substrate holding section 25 is slightly perpendicular to the Z direction and slightly parallel to the X and Y directions.

The stage movement mechanism 22 is a movement mechanism used to move the stage 21 horizontally (that is, in a direction slightly parallel to the upper surface 91 of the substrate 9) relative to the alignment unit 3 and the drawing unit 4. The stage movement mechanism 22 is mounted on the upper surface of the base 11 and supported by the base 11 from below. The stage movement mechanism 22 includes a first movement mechanism 23 and a second movement mechanism 24. The second movement mechanism 24 supports the stage 21 from below and moves the stage 21 along the guide rail in a straight line in the X direction. The first movement mechanism 23 supports the second movement mechanism 24 from below and moves the stage 21 and the second movement mechanism 24 together along the guide rail in a straight line in the Y direction. The drive source for the first moving mechanism 23 and the second moving mechanism 24 is, for example, a linear servo motor or a structure with a motor mounted on a ball screw. The structure of the first moving mechanism 23 and the second moving mechanism 24 can also be modified in various ways.

The drawing apparatus 1 may also include a stage rotation mechanism that rotates the stage 21 around a rotation axis extending in the Z direction. Additionally, the drawing apparatus 1 may also include a stage lifting mechanism that moves the stage 21 in the Z direction. For example, a servo motor can be used as the stage rotation mechanism. For example, a linear servo motor can be used as the stage lifting mechanism. The structures of the stage rotation mechanism and the stage lifting mechanism can also be modified in various ways.

The alignment unit 3 includes a plurality of alignment cameras 31. Two alignment cameras 31 are arranged in the X direction, but in the example shown in FIG1, only the alignment camera 31 on the +X side is shown. Each alignment camera 31 is supported above the platform 21 and the platform moving mechanism 22 by a support 27 that spans the platform 21 and the platform moving mechanism 22. The support 27 is, for example, a single metal component located at a position in the Y direction. In the example shown in FIG1, the support 27 is a gate-shaped component (a so-called gantry) spanning the platform 21 and the platform moving mechanism 22, and is vertically mounted on the upper surface of the base 11.

In the example shown in Figure 1, two aligning cameras 31 are mounted on the +Y side of the support 27. For example, one of the aligning cameras 31 is fixed to the support 27, while the other aligning camera 31 can move in the X direction on the support 27. This allows the distance between the two aligning cameras 31 in the X direction to be varied. Furthermore, the number of aligning cameras 31 in the alignment unit 3 can be one or more.

Each alignment camera 31 captures alignment marks (not shown) pre-set on the upper surface 91 of the substrate 9. In the tracing device 1, the substrate 9 is aligned based on the image of the alignment marks obtained by the alignment camera 31 (that is, the relative position of the substrate 9 relative to the tracing head 41 is corrected).

The drawing unit 4 includes a plurality of drawing heads 41 (six in the example shown in FIG1) arranged in the X direction. The plurality of drawing heads 41 have a slightly similar structure. Each drawing head 41 includes a light modulator that illuminates modulated (i.e., spatially modulated) light downwards. Each drawing head 41 is supported above the stage 21 and the stage moving mechanism 22 by the support 27 described above. In the example shown in FIG1, the six drawing heads 41 are mounted on the Y-side of the support 27. Furthermore, the aiming camera 31 described above can also be supported by a different support than the support 27 on which the drawing heads 41 are mounted.

In the example shown in Figure 1, the six drawing heads 41 are arranged in a slightly straight line, roughly parallel to the X direction. The positions of the six drawing heads 41 in the Y and Z directions are roughly the same. The sensor section 51, which will be described later, is omitted from the illustration of each drawing head 41 in Figure 1. Furthermore, the plurality of drawing heads 41 do not necessarily need to be arranged in a straight line; they can also be arranged, for example, in a staggered pattern. In the case where the drawing heads 41 are arranged in a staggered pattern, for example, the plurality of drawing heads 41 are arranged in a slightly parallel line in the X direction at a first position in the Y direction, and at a second position adjacent to the -Y side of the first position, drawing heads 41 are arranged between each of the plurality of drawing heads 41 in the X direction. Furthermore, in the drawing section 4, the number of drawing heads 41 can be one or more.

In the drawing apparatus 1, the drawing of the pattern on the substrate 9 is performed using a multi-pass method. Specifically, while modulated light is irradiated onto the upper surface 91 of the substrate 9 from a plurality of drawing heads 41 of the drawing unit 4, the substrate 9 is moved in the Y direction and passes under the drawing heads 41 by the first moving mechanism 23 of the stage moving mechanism 22. In this way, the irradiated area of the light from the plurality of drawing heads 41 is scanned on the substrate 9 in the Y direction, thereby drawing the substrate 9. A plurality of drawing areas corresponding to the plurality of drawing heads 41 are drawn on the substrate 9. Each drawing area is a slightly rectangular strip-shaped area (a swath) that extends slightly parallel to the Y direction, and the plurality of drawing areas are separated from each other and arranged in the X direction. The region between these multiple drawing regions in the X direction is the predetermined undrawn drawing region that will be drawn in the future.

Next, the second moving mechanism 24 causes the substrate 9 to move in a step shift in the X direction to a predetermined distance. In other words, the substrate 9 is displaced relative to the drawing head 41 in the X direction to a predetermined distance. Here, each drawing head 41 is positioned corresponding to the undrawn drawing area (e.g., above the predetermined drawing area to be drawn next), which is adjacent to the drawing area that has been drawn by each drawing head 41. Then, the first moving mechanism 23 moves the substrate 9 in the Y direction, and the drawing head 41 moves in parallel with the substrate 9 in the Y direction to irradiate light onto the substrate 9, thereby drawing the undrawn drawing area. In the drawing apparatus 1, the process of irradiating the substrate 9 moving in the Y direction with light and the step-by-step movement of the substrate 9 in the X direction are repeated alternately to draw a predetermined pattern on the substrate 9.

In the following description, the Y direction will also be referred to as the "main scanning direction" or "scanning direction," and the X direction will also be referred to as the "sub-scanning direction." The main scanning direction and the sub-scanning direction are directions that are slightly parallel to the upper surface 91 of the substrate 9. In the stage movement mechanism 22, the first movement mechanism 23 is the main scanning mechanism, which is used to move the stage 21 relative to the tracing head 41 in the main scanning direction. The second movement mechanism 24 is the sub-scanning mechanism, which is used to move the stage 21 relative to the tracing head 41 in the sub-scanning direction.

Furthermore, in the drawing apparatus 1, the substrate 9 can also be drawn using a single-pass method (also known as a one-pass method). In the single-pass method, the substrate 9 is moved only once relative to the drawing head 41 in the Y direction, thereby completing the drawing of the pattern onto the substrate 9. In this case, the second moving mechanism 24 does not perform a secondary scan of the substrate 9 (i.e., step-by-step movement in the X direction) during pattern drawing. That is, the stage moving mechanism 22 is a scanning mechanism used to move the stage 21 relative to the drawing head 41 at least in the scanning direction.

The control unit 8 comprises a console 21, a platform moving mechanism 22, a alignment unit 3, and a drawing unit 4. Figure 2 shows the configuration of the control unit 8. The control unit 8 is a typical computer system comprising a CPU (Central Processing Unit) 81, a ROM (Read Only Memory) 82, a RAM (Random Access Memory) 83, a hard disk 84, a display 85, an input unit 86, a reading device 87, a communication unit 88, and a bus 80. The CPU 81 performs various calculations. The ROM 82 stores the basic program. The RAM 83 stores various information. The hard disk 84 stores information. The display 85 is the display unit, which displays various information such as images. The input unit 86 is equipped with a keyboard 86a and a mouse 86b for accepting input from the operator.

The reading device 87 reads information from a computer-readable recording medium 811, such as an optical disc, magnetic disk, magneto-optical disk, or memory card. The display 85, keyboard 86a, mouse 86b, and reading device 87 are connected to the bus 80 via an interface (I/F). The communication unit 88 transmits and receives signals between the drawing device 1 (excluding the control unit 8) and external devices. The bus 80 is a signal circuit used to connect the CPU 81, ROM 82, RAM 83, hard disk 84, display 85, input unit 86, reading device 87, and communication unit 88.

In the control unit 8, program 812 is read from recording medium 811 via reading device 87 and stored in hard disk 84. Program 812 can also be stored in hard disk 84 via network. CPU 81 functions as an operating unit, which performs calculations according to program 812 using RAM 83 and hard disk 84. In addition to CPU 81, other configurations may be used to function as an operating unit.

Figure 3 is a diagram illustrating the functional configuration of the display control unit 8, which performs calculations and other operations according to program 812. This functional configuration includes a memory unit 801, a drawing control unit 802, and a lens movement control unit 803. All or part of these functions can be implemented using dedicated electrical circuits. Furthermore, these functions can be implemented using multiple computers. The drawing control unit 802 and the lens movement control unit 803 in the functional configuration shown in Figure 3 are implemented using a CPU 81, ROM 82, RAM 83, hard disk 84, and the peripheral components of these components. Furthermore, the memory unit 801 is primarily implemented using RAM 83 and hard disk 84.

Figure 4 is a magnified side view of a drawing head 41 from the +X side. Other drawing heads 41 have the same structure as the drawing head 41 shown in Figure 4. The drawing head 41 includes a light source 42, an illumination optical system 43, a light modulation unit 44, a projection optical system 45, a drawing head cover 46, a frame 47, and an autofocus mechanism 5. The light source 42, the illumination optical system 43, the light modulation unit 44, the projection optical system 45, and the frame 47 are housed inside the drawing head cover 46. In addition, a portion of the autofocus mechanism 5 is also housed inside the drawing head cover 46. In Figure 4, for ease of understanding, the cross-section of the drawing head cover 46 is shown in dashed lines, and the internal structure of the drawing head cover 46 is shown in solid lines. In addition, support 27 is also shown in Figure 4.

In the example shown in Figure 4, the tracing head 46 is a slightly L-shaped component when viewed from above. The light source 42 is disposed inside the tracing head 46 at the +Y side end of the upper part of the tracing head 41. The light source 42 is a light source 421 such as an LED (Light Emitting Diode) or an LD (Laser Diode). The light emitted from the light source 421 enters the illumination optical system 43 along the predetermined optical axis J1 of the tracing head 41. In Figure 4, the optical axis J1 is depicted as a single-point chain.

The illumination optical system 43 is disposed inside the drawing head cover 46 on the Y-side of the light source section 42, in the upper part of the drawing head 41. The illumination optical system 43 extends slightly parallel in the Y direction. The illumination optical system 43 has a plurality of optical elements such as lenses arranged slightly parallel in the Y direction. In FIG4, the plurality of lenses are not shown, but a lens tube or the like housing the plurality of lenses is shown instead. The illumination optical system 43 guides the light incident from the light source 421 to the light modulation section 44. In the example shown in FIG4, the light passing through the illumination optical system 43 is incident to the light modulation section 44 via mirrors 431 and 432.

The light modulation unit 44 is disposed inside the drawing head cover 46 at the upper Y-side end of the drawing head 41. The light modulation unit 44 is located on the Y-side of the illumination optical system 43. The light modulation unit 44 is equipped with a spatial light modulator for modulating light. The spatial light modulator is, for example, a DMD (Digital Micromirror Device), which is composed of a plurality of tiny mirrors arranged in two dimensions. Alternatively, the light modulation unit 44 may also be equipped with a spatial light modulator other than a DMD. The light modulation unit 44 modulates the light guided by the illumination optical system 43 while guiding it to the projection optical system 45.

The projection optical system 45 is disposed inside the drawing head cover 46 at the Y-side end of the drawing head 41, on the Z-side (i.e., below) of the light modulation unit 44. The projection optical system 45 extends slightly parallel in the Z-direction. The projection optical system 45 has a plurality of optical elements such as lenses arranged slightly parallel in the Z-direction. In FIG4, the plurality of lenses are not shown, but a lens tube or the like housing the plurality of lenses is shown instead. The projection optical system 45 guides the light modulated by the light modulation unit 44 to the upper surface 91 of the substrate 9 (see FIG1).

The projection optical system 45 includes a first lens group 451 and a second lens group 452. The first lens group 451 has a plurality of optical elements such as lenses arranged in a slightly parallel manner along the Z direction. The second lens group 452 has one optical element such as a lens, or has a plurality of optical elements such as lenses arranged in a slightly parallel manner along the Z direction. In Figure 4, the plurality of lenses such as lenses are omitted from the illustration of the first lens group 451 and the second lens group 452; instead, a lens tube or the like housing the plurality of lenses is shown. The first lens group 451 and the second lens group 452 are arranged in a slightly parallel manner and positioned in the Z direction. The first lens group 451 is located on the +Z side of the second lens group 452.

In the projection optical system 45, the light modulated by the light modulation unit 44 enters the first lens group 451 and is guided by the first lens group 451 to the second lens group 452. The second lens group 452 guides the light guided by the first lens group 451 to the upper surface 91 of the substrate 9.

The first lens group 451 and the second lens group 452 are mounted on the Y-side of the frame 47, which is a slightly quadrangular prism extending in the Z-direction. The first lens group 451 and the second lens group 452 are mounted on the frame 47 in a manner that allows them to move in the Z-direction. When changing the magnification of the image formed on the substrate 9, the first lens group 451 is raised or lowered; during the drawing of a pattern on the substrate 9, the first lens group 451 is not raised or lowered. During the drawing of a pattern on the substrate 9, the second lens group 452 is raised or lowered by the autofocus mechanism 5. The frame 47 is a supporting structure used to support the first lens group 451 and the second lens group 452. The frame 47 is, for example, fixed to the inside of the drawing headgear 46 and indirectly supported by the support portion 27 of the drawing headgear 46. The frame 47 may also be part of the drawing headgear 46.

In the drawing head 41, the second lens group 452 in the projection optical system 45 moves in the Z direction, thereby adjusting the focusing position of the light emitted from the drawing head 41 toward the substrate 9 in the Z direction. The focusing position is the position where the light emitted from the drawing head 41 toward the substrate 9 is focused on the -Z side of the drawing head 41. In other words, the focusing position is the position where the light passing through the second lens group 452 from the +Z side toward the -Z side is focused on the -Z side of the second lens group 452. Further, the focusing position is the position where the image of the micromirror of the DMD in the light modulation unit 44 is formed on the -Z side of the second lens group 452.

In the projection optical system 45, the first lens group 451 is housed inside the drawing head 46. Furthermore, the second lens group 452 is also housed inside the drawing head 46. The lower end of the drawing head 46 is open. The lower end of the second lens group 452 (i.e., the lower end of the projection optical system 45) can also protrude downwards from the lower opening of the drawing head 46.

The autofocus mechanism 5 is located near the second lens group 452 of the projection optical system 45. The autofocus mechanism 5 moves (i.e., lifts and lowers) the second lens group 452 in the Z direction in coordination with the change in the distance between the projection optical system 45 and the substrate 9, thereby adjusting the focus position of the light emitted from the drawing head 41 toward the substrate 9 in the Z direction.

Figure 5 is an enlarged longitudinal sectional view showing the second lens group 452 of the projection optical system 45 in the drawing head 41 shown in Figure 4 and the area near the autofocus mechanism 5. A portion of the structure is shown in Figure 5 from the side. In addition, the structure further inside the cross-section is also shown in Figure 5 with fine lines.

The autofocus mechanism 5 includes a sensor unit 51 and a lens moving mechanism 52. The sensor unit 51 is mounted on the second lens group 452 of the projection optical system 45. Specifically, the sensor unit 51 is fixed to the lower end (i.e., the Z-side end) of the lens barrel of the second lens group 452. The sensor unit 51 measures the distance in the Z direction (hereinafter referred to as "projection distance") between the lower end of the second lens group 452 and the upper surface 91 of the substrate 9 on the stage 21 (see FIG. 1).

The sensor unit 51 includes a light-emitting part 511, a light-receiving part 512, and a sensor support part 513. The sensor support part 513 is, for example, a slightly cylindrical component extending slightly parallel in the Z direction. The sensor support part 513 is located on the -Z side of the second lens group 452 outside the drawing head cover 46 and is fixed to the lower end of the lens barrel of the second lens group 452. In the example shown in FIG. 5, the light-emitting part 511 is fixed to the +Y side end of the sensor support part 513 in the -Z side end. Furthermore, the light-receiving part 512 is fixed to the -Y side end of the sensor support part 513 in the -Z side end. The light emitted from the light-emitting section 511 toward the -Y and -Z sides is reflected by the upper surface 91 of the substrate 9 and received by the light-receiving section 512. The light-receiving section 512 is, for example, a line sensor. In the sensor section 51, the projection distance described above is determined based on the receiving position of the reflected light from the substrate 9 in the light-receiving section 512.

The lens moving mechanism 52 is mounted on and supported by the frame 47. The lens moving mechanism 52 connects the second lens group 452 and the frame 47. The lens moving mechanism 52 supports the second lens group 452 and causes the second lens group 452 to move in the Z direction. The lens moving mechanism 52 includes a drive unit 521, a guide rail 522, a bearing block 523, and a lens support unit 524.

Guide rail 522 is fixed to the -Y side of frame 47 in the +Y side of second lens group 452. When the Y direction is referred to as the "lateral direction", guide rail 522 is arranged between second lens group 452 and frame 47 in the lateral direction. Guide rail 522 has two tracks arranged in the X direction. The two tracks extend slightly parallel in the Z direction.

Bearing housing 523 is a bearing component connected to guide rail 522 from the -Y side and movable along guide rail 522 in the Z direction. In the example shown in Figure 5, two bearing housings 523 are respectively connected to two tracks of guide rail 522. Each bearing housing 523 is, for example, a slightly cubic or slightly flat component. Each bearing housing 523 moves smoothly along guide rail 522 in the Z direction while contacting guide rail 522.

The lens support 524 is a component that is fixed to the bearing housing 523 and supports the second lens group 452. The lens support 524 is fixed to the Y-side surface of the bearing housing 523. The second lens group 452 supported by the lens support 524 is indirectly fixed to the bearing housing 523 via the lens support 524.

The +Y side portion of the lens support 524 is inserted into the interior of the frame 47 through the opening 471 between the two tracks of the guide rail 522 on the -Y side of the frame 47. The +Y side portion of the lens support 524 is connected to the drive unit 521 inside the frame 47. The weight of the lens support 524 and the second lens group 452 is mainly supported by the drive unit 521.

The drive unit 521 extends in the Z direction within the frame 47 and is fixed to the frame 47. In other words, the drive unit 521 is supported by the support unit 27 via the frame 47. The drive unit 521 is, for example, a drive unit composed of an electric motor and a ball screw. The +Y side portion of the lens support unit 524 described above is fixed within the drive unit 521 to a movable member capable of moving in the Z direction. When the movable member in the drive unit 521 moves in the Z direction, the lens support 524 fixed to the movable member, the second lens group 452 fixed to the lens support 524, and the bearing seat 523 move in the Z direction while being guided by the guide rail 522. In addition, the drive unit 521 can also be modified in various ways, such as being modified into a linear servo motor or an air cylinder.

In the drawing apparatus 1 shown in FIG1, when drawing the pattern described above on the substrate 9, the drawing control unit 802 controls the light modulation unit 44 and the stage movement mechanism 22 based on the drawing data pre-memorized in the memory unit 801 (see FIG3) of the control unit 8, thereby irradiating the modulated light onto the upper surface 91 of the substrate 9 moving in the Y direction and drawing the pattern.

In the drawing of the pattern described above in the drawing apparatus 1, so-called multiple exposures are performed under the control of the drawing control unit 802. Specifically, as shown in FIG6, the DMD441 of the spatial light modulator belonging to the light modulation unit 44 has a light modulation region 442, which has a plurality of tiny mirrors arranged in two dimensions. The light modulation region 442 includes a plurality of segmented modulation regions 443 arranged in a predetermined direction. In the example shown in FIG6, four segmented modulation regions 443 are provided in the light modulation region 442. Each segmented modulation region 443 is surrounded by a thick line in FIG6. Furthermore, in Figure 6, for ease of illustration, each tiny mirror is displayed as a square larger than it actually is, and the number of multiple tiny mirrors is depicted as less than it actually is.

Each segmented modulation region 443 is connected to an adjacent segmented modulation region 443, and no tiny mirror is disposed between any two adjacent segmented modulation regions 443. The arrangement direction of the plurality of segmented modulation regions 443 in the DMD441 corresponds to the scanning direction (i.e., the Y direction) on the substrate 9 as described above. In the example shown in FIG6, the four segmented modulation regions 443 are arranged in a slightly parallel manner in the Y direction.

Figure 7 is a conceptual diagram showing the relationship between a plurality of segmented modulation regions 443 of the light modulation unit 44 and a plurality of illumination positions 93 on the substrate 9, each illuminated by light reflected from the plurality of segmented modulation regions 443. Each illumination position 93 is a region in which light reflected from a segmented modulation region 443 corresponding to that illumination position 93 is focused to form an image. In Figure 7, the four illumination positions 93 are arranged in a slightly parallel manner in the Y direction. The first, second, third, and fourth illumination positions 93 from the +Y side correspond to the first, second, third, and fourth segmented modulation regions 443 from the +Y side, respectively. In Figure 7, the corresponding segmented modulation regions 443 and illumination positions 93 are connected by arrows.

In the drawing apparatus 1, when the substrate 9 moves in the -Y direction and a region 94 (hereinafter also referred to as "object region 94") on the upper surface 91 of the substrate 9 is located at the first irradiation position 93 from the +Y side, light rays with a predetermined shape are irradiated onto the object region 94 by the first segmented modulation region 443 from the +Y side controlled by the drawing control unit 802, thereby forming an image with a predetermined shape (that is, an image of a pattern element that constitutes part of a pattern). Furthermore, when the substrate 9 moves further in the -Y direction and the target area 94 is located at the second irradiation position 93 from the +Y side, the target area 94 is irradiated with light having the same shape as the irradiation area described above by the second segmented modulation area 443 from the +Y side controlled by the drawing control unit 802, thereby forming an image with the same shape as the image described above.

Similarly, when the target area 94 of the substrate 9 is located at the third illumination position 93 from the +Y side, an image with the same shape as the image described above is formed in the target area 94 by the third segmented modulation area 443 from the +Y side controlled by the drawing control unit 802. Furthermore, when the target area 94 is located at the fourth illumination position 93 from the +Y side, an image with the same shape as the image described above is formed in the target area 94 by the fourth segmented modulation area 443 from the +Y side controlled by the drawing control unit 802.

That is, when the substrate 9 moves in the -Y direction and the target area 94 passes through a plurality of illumination positions 93, the light modulation unit 44 is controlled by the drawing control unit 802 to sequentially form an image of the same shape in the target area 94 at each of the plurality of illumination positions 93. In the target area 94, the photosensitive material is photosensitive by accumulating the amount of light from forming the image of the same shape multiple times (four times in this embodiment) to perform the drawing of the pattern elements described above. In the drawing of the pattern on the substrate 9, the pattern elements are drawn in each area on the substrate 9 by multiple exposures (i.e., multiple exposures), just like in the target area 94 described above. Furthermore, the number of multiple segmented modulation regions 443 included in the light modulation region 442 is not limited to four; various changes can be made as long as there are two or more.

In the drawing apparatus 1, during the drawing of the pattern described above on the substrate 9, the projection distance described above, performed by the sensor unit 51 shown in FIG5, is continuously measured at predetermined time intervals (hereinafter also referred to as "measurement intervals"). The projection distance measured by the sensor unit 51 is output to the lens movement control unit 803. The lens movement control unit 803 controls the lens movement mechanism 52 based on the output from the sensor unit 51.

Specifically, in the lens movement control unit 803, the projection distance measured by the sensor unit 51 (hereinafter also referred to as "measured projection distance") is compared with the target projection distance which is the designed projection distance, and the amount of movement (i.e., the direction of movement and the distance of movement) in the Z direction of the second lens group 452 is determined by the difference between the measured projection distance and the target projection distance being zero. Furthermore, the lens movement control unit 803 sends a drive signal to the drive unit 521 of the lens movement mechanism 52, and the drive unit 521 is driven in response to the drive signal. The transmission of the drive signal described above by the lens movement control unit 803 is also performed at the measurement intervals described above.

In this way, the position of the second lens group 452 in the Z direction is adjusted so that the projection distance is approximately equal to the target projection distance. In other words, the focus position of the light emitted from the drawing head 41 toward the substrate 9 is adjusted in the Z direction and aligned with the upper surface 91 of the substrate 9. As a result, even in the case of deformation such as warping of the substrate 9 and in the case of unevenness on the upper surface 91 of the substrate 9, high-precision drawing can be achieved because the focus position described above can be aligned with the upper surface 91 of the substrate 9.

In the control described above for the lens movement mechanism 52, which is constituted by the lens movement control unit 803, the drive of the drive unit 521 in the lens movement mechanism 52 is controlled such that the number of times the second lens group 452 rises and falls (hereinafter also referred to as "single displacement number") during the period when the target area 94 passes through the four illumination positions 93 described above is less than four times. In other words, by controlling the autofocus mechanism 5 by the lens movement control unit 803, the single displacement number is set to be less than the number of the plurality of segmented modulation areas 443 in the light modulation unit 44.

Specifically, the measurement interval of the sensor unit 51 described above (that is, the transmission interval of the drive signal to the drive unit 521) is set to be larger than the following value: the value obtained by dividing the time required for the target area 94 to pass through the four irradiation positions 93 by the number of the plurality of segmented modulation regions 443 by "4". For example, in the case where the length in the Y direction of the four irradiation positions 93 is 8 mm and the moving speed (that is, the scanning speed) in the Y direction of the substrate 9 is 100 mm/second, the measurement interval described above is set to be larger than 0.02 seconds (that is, (8/100/4) seconds) by the lens movement control unit 803.

In the drawing apparatus 1, even if the second lens group 452 vibrates (a small vibration, hereinafter also referred to as "micro-vibration") due to the driving load applied to the drive unit 512 during the raising and lowering of the second lens group 452, as explained above, the number of single displacements is set to be less than the number of multiple segmented modulation regions 443 in the light modulation unit 44, thereby preventing the micro-vibration from affecting all four exposures of a target area 94. In other words, even if the micro-vibration of the second lens group 452 temporarily affects a portion of the four exposures of a target area 94, the micro-vibration of the second lens group 452 can be prevented from affecting the remaining exposures.

As explained above, in the drawing apparatus 1, the target area 94 is drawn using multiple exposures. In areas where the cumulative light intensity of the four exposures exceeds a predetermined threshold, the photosensitive material is exposed to light. Furthermore, in the drawing apparatus 1, even though the irradiated area on the substrate 9 deviates somewhat from the designed irradiated area due to the micro-vibration of the second lens group 452 during some of the exposures described above, the irradiated area remains roughly consistent with the designed irradiated area during the remaining exposures described above. Therefore, outside the designed irradiated area (i.e., the area exposed to light due to the micro-vibration of the second lens group 452), the possibility that the cumulative light intensity of the four exposures falls below the threshold described above, thus preventing the photosensitive material from being exposed to light, increases. This result suppresses changes in the line width and other dimensions of the pattern caused by the micro-vibrations of the second lens group 452, thereby suppressing the reduction in the drawing precision of the pattern.

Furthermore, the number of single-shift operations described above can be set to various values as long as it is greater than zero and smaller than the number of the plurality of segmented modulation regions 443 in the optical modulation unit 44 (four in the example described above). For example, the number of single-shift operations can be an integer or a decimal. From the viewpoint of suppressing the reduction in the drawing precision of the pattern described above, the number of single-shift operations is preferably set to one or less.

In the drawing head 41, the second lens group 452 is capable of moving from a predetermined reference position in the Z direction towards the +Z and -Z directions. Furthermore, the maximum value of the movement distance of the second lens group 452 from the reference position in the Z direction is limited by the lens movement control unit 803. This prevents unnecessary movement of the second lens group 452, such as aligning the focusing position described above with the bottom of the recess, even when a deep recess such as a via is formed on the substrate 9 and the projection distance measured by the sensor unit 51 is performed at that recess. This prevents micro-vibrations of the second lens group 452 caused by unnecessary large-distance movement, and consequently prevents a decrease in drawing precision due to micro-vibrations of the second lens group 452.

In the drawing device 1, the maximum movement distance of the second lens group 452 in the Z direction during the time equal to the measurement interval described above (hereinafter also referred to as the "single displacement time") is twice the maximum value of the movement distance from the reference position of the second lens group 452 described above. Therefore, the movement speed and acceleration of the second lens group 452 in the Z direction by the drive unit 521 are set to complete the movement of the maximum movement distance described above within the single displacement time. The lens movement control unit 803 limits the maximum speed and/or maximum acceleration of the second lens group 452 in the Z direction to be as small as possible within the range of completing the movement of the maximum movement distance described above within the single displacement time. This suppresses the micro-vibrations described above, which may increase as the velocity and acceleration of the second lens group 452 move. As a result, the reduction in pattern rendering precision caused by these micro-vibrations is suppressed.

As explained above, the moving speed and acceleration of the second lens group 452 in the Z direction are set based on a single displacement time. Furthermore, this single displacement time (i.e., measurement interval) is determined, as explained above, by the following: the length of the plurality of illumination positions 93 (four in the example above); the moving speed of the substrate 9 in the Y direction (i.e., scanning speed); and the number of the plurality of segmented modulation regions 443 (four in the example above). Typically, since the length of the plurality of illumination positions 93 and the number of the plurality of segmented modulation regions 443 are predetermined, the moving speed and acceleration of the second lens group 452 in the Z direction are determined based on the scanning speed of the substrate 9. Therefore, the limits described above regarding the maximum speed and/or maximum acceleration of the second lens group 452 in the Z direction as set by the lens movement control unit 803 are based on the scanning speed of the substrate 9 (i.e., the movement speed of the stage 21 in the scanning direction as set by the stage movement mechanism 22).

Furthermore, the scanning speed of substrate 9 is determined based on the type of photosensitive material on substrate 9 and the required exposure amount for that photosensitive material. Therefore, the limitation on the maximum speed and/or maximum acceleration of the second lens group 452 in the Z direction by the lens movement control unit 803 can also be based on the type of photosensitive material on substrate 9 and/or the required exposure amount of that photosensitive material. Here, if the scanning speed of substrate 9, the type of photosensitive material on substrate 9, and the required exposure amount of that photosensitive material are referred to as "information related to the scanning speed of substrate 9", the limitation on the maximum speed and/or maximum acceleration of the second lens group 452 in the Z direction by the lens movement control unit 803 is based on information related to the scanning speed of substrate 9 (i.e., information related to the movement speed of stage 21 in the scanning direction by stage movement mechanism 22). In addition, information related to the scanning speed of substrate 9 may also include information other than the scanning speed of substrate 9, the type of photosensitive material on substrate 9, and the required exposure of the photosensitive material.

As explained above, the drawing apparatus 1 for illuminating a substrate with light and drawing patterns includes a stage 21, a drawing head 41, a stage movement mechanism 22, and a control unit 8. The stage 21 holds the substrate 9. The drawing head 41 illuminates the substrate 9 with modulated light. The stage movement mechanism 22 moves the stage 21 relative to the drawing head 41 in a scanning direction parallel to the upper surface 91 of the substrate 9 (the Y direction in the example described above). The control unit 8 controls the drawing head 41. The drawing head 41 includes an illumination optical system 43, a light modulation unit 44, a projection optical system 45, and an autofocus mechanism 5. Light emitted from the light source 421 enters the illumination optical system 43. The light modulation unit 44 modulates the light guided by the illumination optical system 43. The projection optical system 45 guides the light modulated by the light modulation unit 44 to the substrate 9. The autofocus mechanism 5 adjusts the focus position of the light emitted from the drawing head 41 in accordance with the change of the distance (i.e., the projection distance) between the projection optical system 45 and the substrate 9.

The light modulation region 442 of the light modulation unit 44 includes a plurality of segmented modulation regions 443, each corresponding to a plurality of illumination positions 93 arranged below the drawing head 41 (i.e., on the Z side) in the scanning direction described above. The projection optics system 45 includes a first lens group 451 and a second lens group 452. Light modulated by the light modulation unit 44 is incident on the first lens group 451. The second lens group 452 guides the light guided by the first lens group 451 to the substrate 9. The autofocus mechanism 5 includes a sensor unit 51 and a lens moving mechanism 52. The sensor unit 51 measures the vertical (i.e., Z-direction) distance between the second lens group 452 and the substrate 9. The lens moving mechanism 52 supports the second lens group 452. The lens moving mechanism 52 moves the second lens group 452 in the vertical direction based on the output from the sensor unit 51, thereby adjusting the focus position of the light emitted from the drawing head 41 as described above.

The control unit 8 includes a drawing control unit 802 and a lens movement control unit 803. The drawing control unit 802 controls the light modulation unit 44, thereby enabling images of the same shape to be sequentially formed on the object area 94 at each of the plurality of illumination positions 93 when the substrate 9 and the stage 21 are moved together by the stage movement mechanism 22 and a region on the substrate 9 (i.e., the object area 94) passes through a plurality of illumination positions 93. The lens movement control unit 803 controls the autofocus mechanism 5, thereby enabling the number of single displacements of the second lens group 452 during the formation of the image of the object area 94 as described above at the plurality of illumination positions 93 to be less than the number of the plurality of segmented modulation areas 443.

As explained above, this reduces the number of times the second lens group 452 rises and falls during multiple exposures at various locations on the substrate 9. Therefore, even if micro-vibrations occur during the rise and fall of the second lens group 452 by the autofocus mechanism 5, changes in the line width, etc., of the pattern caused by these micro-vibrations can be suppressed, thereby preventing a decrease in the drawing precision of the pattern.

As explained above, the number of single displacements described above is preferably less than one. This further suppresses the reduction in pattern rendering precision caused by the micro-vibrations of the second lens group 452.

As explained above, the lens movement control unit 803 limits the maximum movement speed or maximum acceleration of the second lens group 452 operated by the lens movement mechanism 52 based on information related to the movement speed of the stage 21 (i.e., the scanning speed of the substrate 9) in the scanning direction of the stage 21 operated by the stage movement mechanism 22. This prevents the movement speed or acceleration of the second lens group 452 from becoming excessive. As a result, it further suppresses the reduction in pattern drawing precision caused by the micro-vibration of the second lens group 452.

In the drawing apparatus 1, it is not always necessary to draw the pattern on the substrate 9 using the multiple exposure method described above. For example, in the drawing apparatus 1, each position on the substrate 9 may be illuminated only once with light modulated by the light modulation unit 44, thereby drawing the pattern on the substrate 9.

In this configuration, the drawing apparatus 1 used to illuminate the substrate 9 and draw a pattern includes a stage 21, a drawing head 41, and a stage movement mechanism 22. The stage 21 holds the substrate 9. The drawing head 41 illuminates the substrate 9 with modulated light. The stage movement mechanism 22 moves the stage 21 relative to the drawing head 41 in a scanning direction parallel to the upper surface 91 of the substrate 9 (the Y direction in the example described above). The drawing head 41 includes an illumination optical system 43, a light modulation unit 44, a projection optical system 45, and an autofocus mechanism 5. The light emitted from the light source 421 enters the illumination optical system 43. The light modulation unit 44 modulates the light guided by the illumination optical system 43. The projection optical system 45 guides the light modulated by the light modulation unit 44 to the substrate 9. The autofocus mechanism 5 adjusts the focus position of the light emitted from the drawing head 41 in accordance with the change of the distance (i.e., the projection distance) between the projection optical system 45 and the substrate 9.

The projection optics system 45 includes a first lens group 451 and a second lens group 452. Light modulated by the light modulation unit 44 enters the first lens group 451. The second lens group 452 guides the light guided by the first lens group 451 to the substrate 9. The autofocus mechanism 5 includes a sensor unit 51 and a lens moving mechanism 52. The sensor unit 51 measures the vertical (i.e., Z-direction) distance between the second lens group 452 and the substrate 9. The lens moving mechanism 52 supports the second lens group 452. The lens moving mechanism 52 moves the second lens group 452 in the vertical direction based on the output from the sensor unit 51, thereby adjusting the focus position of the light emitted from the drawing head 41 as described above.

In the drawing apparatus 1, based on information related to the movement speed of the stage 21 in the scanning direction (i.e., the scanning speed of the substrate 9) provided by the stage movement mechanism 22, the maximum movement speed or maximum acceleration of the second lens group 452 provided by the lens movement mechanism 52 is limited. This prevents the movement speed or acceleration of the second lens group 452 from becoming excessive. As a result, the reduction in pattern drawing precision caused by micro-vibrations of the second lens group 452 can be further suppressed.

In the drawing apparatus 1, when drawing is performed using the multi-pass method described above, it is preferable that the maximum moving speed or maximum acceleration of the second lens group 452 by the lens moving mechanism 52 is limited not only to information related to the scanning speed of the substrate 9 described above, but also to the maximum value of the vertical moving distance of the second lens group 452 during the first scan (i.e., when it moves in the Y direction towards the substrate 9 for the first time while being illuminated by light from the drawing head 41). Alternatively, the maximum moving speed or maximum acceleration of the second lens group 452 may not be limited based on the maximum vertical moving distance of the second lens group 452 during the first scan, but rather based on the maximum vertical moving distance of the second lens group 452 during a subsequent scan. That is, the maximum moving speed or maximum acceleration of the second lens group 452 is preferably limited based not only on information related to the scanning speed of the substrate 9 described above, but also on the maximum vertical moving distance of the second lens group 452 during a representative scan.

In this case, the stage movement mechanism 22 can also move the stage 21 relative to the drawing head 41 in a sub-scanning direction (the X direction in the example described above) that is parallel to the upper surface 91 of the substrate 9 and perpendicular to the scanning direction. In the drawing apparatus 1, while a modulated light is irradiated onto the substrate 9 from a drawing head 41, the substrate 9 is moved relatively in the scanning direction (Y direction in the example described above) to draw one of a plurality of drawing areas arranged in the sub-scanning direction. After the drawing of that drawing area is completed, the substrate 9 is displaced relatively relative to the drawing head 41 in the sub-scanning direction to a predetermined distance. This process of positioning the drawing head 41 at a position corresponding to an undrawn drawing area adjacent to the drawing area described above is repeated, and a predetermined pattern is drawn on the substrate 9. Furthermore, the maximum moving speed or maximum acceleration of the second lens group 452 caused by the lens moving mechanism 52 is also limited based on the maximum vertical moving distance of the second lens group 452 when drawing a drawing area as described above.

Thus, when drawing the substrate 9 in a multi-pass manner, the maximum movement speed or maximum acceleration of the second lens group 452 is limited based on the actual autofocus result during a representative scan, thereby further suppressing the movement speed or acceleration of the second lens group 452 from becoming excessive. As a result, the reduction in pattern drawing precision caused by the micro-vibration of the second lens group 452 can be further suppressed.

Various changes can be made in the drawing device 1 described above.

For example, the number of single displacements of the second lens group 452 described above can also be greater than one.

In the drawing apparatus 1, it is not necessarily necessary to limit the maximum moving speed or maximum acceleration of the second lens group 452 based on the maximum vertical moving distance of the second lens group 452 when drawing a drawing area as described above. Furthermore, it is not necessarily necessary to limit the maximum moving speed or maximum acceleration of the second lens group 452 based on information related to the scanning speed of the substrate 9.

The shape of the drawing headgear 46 can also be varied. For example, the drawing headgear 46 can be a component that extends slightly parallel to the Z direction. In this case, the lighting optical system 43 and the light source 42 are arranged, for example, on the +Z side of the light modulation unit 44.

In the example shown in Figure 4, although only one light source 421 is drawn in the light source section 42, the number of light sources 421 provided in the light source section 42 can be multiple. For example, multiple light sources 421 for emitting light with different wavelengths can also be provided in the light source section 42. In this case, when drawing a pattern on the substrate 9, one or more of the multiple light sources 421 are selected for use depending on the type of photosensitive material on the substrate 9. Furthermore, the light sources 421 provided in the light source section 42 are not limited to LEDs and LDs, and various types of light sources can be used. In addition, the light source section 42 can also be provided outside the drawing head 41. In this case, the light emitted from the light source section 42 is guided to the drawing head 41 via optical fibers or the like.

The stage moving mechanism 22 does not necessarily need to move the stage 21. For example, multiple drawing heads 41 can be moved in a direction parallel to the upper surface 91 of the substrate 9 from above the fixed stage 21.

The substrate 9 used for drawing in the drawing apparatus 1 is not limited to a printed wiring substrate. In the drawing apparatus 1, circuit patterns can also be drawn on, for example, glass substrates for flat panel display devices such as semiconductor substrates, liquid crystal display devices or plasma display devices, glass substrates for photomasks, and substrates for solar cell panels.

The above-mentioned embodiments and the components in each variation can be appropriately combined as long as they do not contradict each other.

Although the invention has been described and explained in detail, the above description is illustrative rather than limiting. Therefore, it can be considered that various variations and forms are possible without departing from the scope of the invention.

1: Drawing device 3: Alignment unit 4: Drawing unit 5: Autofocus mechanism 8: Control unit 9: Base plate 11: Base 21: Stage 22: Stage moving mechanism 23: First moving mechanism 24: Second moving mechanism 25: Base plate holding unit 27: Support unit 31: Alignment camera 41: Drawing head 42: Light source unit 43: Illumination optical system 44: Light modulation unit 45: Projection optical system 46: Drawing head cover 47: Frame 51: Sensor unit 52: Lens moving mechanism 80: Bus 81: CPU 82: ROM 83: RAM 84: Hard disk 85: Display 86: Input unit 86a: Keyboard 86b: Mouse 87: Reading device 88: Communication Unit 91: Upper Surface (of Substrate) 93: Illumination Position 94: Object Area (Area) 421: Light Source 431, 432: Mirror 441: DMD 442: Light Modulation Area 443: Segmented Modulation Area 451: First Lens Group 452: Second Lens Group 471: Opening 511: Light Emitting Unit 512: Light Receiving Unit 513: Sensor Support Unit 521: Drive Unit 522: Guide Rail 523: Bearing Seat 524: Lens Support Unit 801: Memory Unit 802: Drawing Control Unit 803: Lens Movement Control Unit 811: Recording Media 812: Program I/F: Interface J1: Optical Axis

[Figure 1] is a perspective view showing one embodiment of the drawing apparatus. [Figure 2] is a diagram showing the structure of the control unit. [Figure 3] is a diagram showing the functional structure of the control unit. [Figure 4] is a side view of the drawing head. [Figure 5] is a longitudinal sectional view showing the area near the autofocus mechanism. [Figure 6] is a bottom view of the light modulation unit. [Figure 7] is a conceptual diagram showing the relationship between the plurality of segmented modulation regions of the light modulation unit and the plurality of illumination positions on the substrate.

5: Autofocus mechanism

27: Support Section

41: Drawing the Head

42: Light Source Section

43: Illumination Optical Systems

44: Optical Modulation Unit

45: Projection Optical System

46: Draw the hood

47: Framework

421: Light Source

431, 432: Mirror

451: First Lens Group

452: Second Lens Group

J1: Optical Axis

Claims (5)

A drawing apparatus for illuminating a substrate with light and drawing a pattern thereon, comprising: a stage for holding the substrate; a drawing head for illuminating the substrate with modulated light; a stage moving mechanism for moving the stage relative to the drawing head in a scanning direction parallel to the upper surface of the substrate; and a control unit for controlling the drawing head; the drawing head comprising: an illumination optical system for receiving light emitted from a light source; a light modulation unit for modulating the light guided by the illumination optical system; a projection optical system for guiding the light modulated by the light modulation unit to the substrate; and an automatic focusing mechanism for adjusting the focus position of the light emitted from the drawing head in accordance with changes in the distance between the projection optical system and the substrate. The aforementioned light modulation section includes a plurality of segmented modulation regions, each corresponding to a plurality of illumination positions arranged below the aforementioned drawing head in the aforementioned scanning direction; The aforementioned projection optical system includes: a first lens group for receiving light modulated by the aforementioned light modulation section; and a second lens group for guiding the light guided by the aforementioned first lens group to the aforementioned substrate; The aforementioned autofocus mechanism includes: a sensor unit for measuring the vertical distance between the aforementioned second lens group and the aforementioned substrate; and a lens moving mechanism for supporting the aforementioned second lens group and moving the aforementioned second lens group vertically based on the output from the aforementioned sensor unit, thereby adjusting the aforementioned focus position of the light emitted from the aforementioned drawing head; The aforementioned control unit includes: The drawing control unit controls the aforementioned light modulation unit, thereby causing the aforementioned substrate and the aforementioned stage to move together via the aforementioned stage movement mechanism, and when a region on the aforementioned substrate passes through the aforementioned plurality of illumination positions, images of the same shape are sequentially formed in the aforementioned region at each of the aforementioned plurality of illumination positions; and the lens movement control unit controls the aforementioned autofocus mechanism, thereby ensuring that the number of single displacements during the formation of the aforementioned image in the aforementioned region at the aforementioned plurality of illumination positions, which is the sum of the number of times the aforementioned second lens group rises and falls, is less than the number of the aforementioned plurality of segmented modulation regions. The drawing device described in claim 1, wherein the number of single displacements is one or less. As described in claim 1 or 2, the aforementioned lens movement control unit limits the maximum movement speed or maximum acceleration of the aforementioned second lens group by the aforementioned lens movement mechanism based on information related to the movement speed of the aforementioned stage in the aforementioned scanning direction by the aforementioned stage movement mechanism; the aforementioned movement speed related information includes at least one of the scanning speed of the aforementioned substrate, the type of photosensitive material on the aforementioned substrate, and the required exposure amount of the aforementioned photosensitive material. A drawing apparatus for illuminating a substrate with light and drawing a pattern thereon, comprising: a stage for holding the substrate; a drawing head for illuminating the substrate with modulated light; and a stage moving mechanism for moving the stage relative to the drawing head in a scanning direction parallel to the upper surface of the substrate; the drawing head comprising: an illumination optical system for receiving light emitted from a light source; a light modulation unit for modulating the light guided by the illumination optical system; a projection optical system for guiding the light modulated by the light modulation unit to the substrate; and an automatic focusing mechanism for adjusting the focusing position of the light emitted from the drawing head in accordance with changes in the distance between the projection optical system and the substrate; the projection optical system comprising: The first lens group allows light modulated by the aforementioned light modulation unit to enter; and the second lens group guides the light guided by the first lens group to the aforementioned substrate; the aforementioned autofocus mechanism includes: a sensor unit that measures the vertical distance between the second lens group and the aforementioned substrate; and a lens moving mechanism that supports the second lens group and moves the second lens group vertically based on the output from the aforementioned sensor unit, thereby adjusting the aforementioned focus position of the light emitted from the aforementioned drawing head; and limiting the maximum moving speed or maximum acceleration of the second lens group by the aforementioned lens moving mechanism based on information related to the movement speed of the aforementioned stage in the aforementioned scanning direction by the aforementioned stage moving mechanism; The aforementioned information related to the moving speed includes at least one of the following: the scanning speed of the aforementioned substrate, the type of photosensitive material on the aforementioned substrate, and the required exposure of the aforementioned photosensitive material. As described in claim 4, the aforementioned stage moving mechanism enables the aforementioned stage to move relative to the aforementioned drawing head in a sub-scanning direction that is parallel to the aforementioned upper surface of the aforementioned substrate and perpendicular to the aforementioned scanning direction. In the aforementioned drawing apparatus, while the substrate is irradiated with modulated light from the drawing head, the substrate is moved relatively in the aforementioned scanning direction to draw one of the plurality of drawing areas arranged in the aforementioned sub-scanning direction. After the drawing of the aforementioned drawing area is completed, the substrate is displaced relatively in the aforementioned sub-scanning direction relative to the aforementioned drawing head by a predetermined distance. This process of positioning the drawing head in the aforementioned plurality of drawing areas corresponding to the undrawn drawing area adjacent to the aforementioned drawing area is repeated, and a predetermined pattern is drawn on the aforementioned substrate. The maximum moving speed or maximum acceleration of the aforementioned second lens group by the aforementioned lens moving mechanism is also limited based on the maximum value of the vertical moving distance of the aforementioned second lens group when drawing the aforementioned drawing area.