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TWI903181B - Nickel particles and their manufacturing methods, and multilayer ceramic capacitors - Google Patents

Nickel particles and their manufacturing methods, and multilayer ceramic capacitors

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Publication number
TWI903181B
TWI903181B TW112124552A TW112124552A TWI903181B TW I903181 B TWI903181 B TW I903181B TW 112124552 A TW112124552 A TW 112124552A TW 112124552 A TW112124552 A TW 112124552A TW I903181 B TWI903181 B TW I903181B
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nickel
particles
mass
metallic element
nickel particles
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TW112124552A
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TW202415469A (en
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西野光彦
佐佐木隆史
澤本裕樹
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日商三井金屬鑛業股份有限公司
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Abstract

本發明提供一種鎳粒子,具有包含鎳與金屬元素M之合金之表面區域。金屬元素M為選自鉍、銅、鐵及鉬中之至少一種。金屬元素M相對於鎳粒子整體之含量為0.09質量%以上15.8質量%以下。在藉由X射線光電子分光分析對在鎳粒子之深度方向上自最表面起至以SiO2換算之濺射深度為5 nm之區域進行測定時,將該區域中之金屬元素M之原子數相對於鎳元素與金屬元素M之合計原子數之比率之最大值設為X(at%),在藉由ICP發光分光分析法對鎳粒子進行測定時,將金屬元素M之原子數相對於鎳元素與金屬元素M之合計原子數之比率設為Y(at%),此時,X/Y之值為0.5以上35以下。This invention provides nickel particles having a surface region comprising an alloy of nickel and metallic element M. Metallic element M is selected from at least one of bismuth, copper, iron, and molybdenum. The content of metallic element M relative to the total nickel particles is 0.09% by mass or more and 15.8% by mass or less. When measuring the nickel particles in the depth direction from the outermost surface to a sputtering depth of 5 nm (converted from SiO2) using X-ray photoelectron spectroscopy, the maximum value of the ratio of the number of metal element M atoms in this region to the total number of nickel atoms is set as X (at%). When measuring the nickel particles using ICP emission spectrophotometry, the ratio of the number of metal element M atoms to the total number of nickel atoms is set as Y (at%). In this case, the value of X/Y is between 0.5 and 35.

Description

鎳粒子及鎳粒子之製造方法、與積層陶瓷電容器Nickel particles and their manufacturing methods, and multilayer ceramic capacitors

本發明係關於一種鎳粒子及其製造方法。 This invention relates to nickel particles and a method for their manufacture.

電子機器所使用之積層陶瓷電容器(以下,亦稱為「MLCC」)之內部電極之形成一般使用鎳粒子。製造MLCC時,於同時焙燒包含鎳粒子之內部電極與介電層之積層體之情形時,由於原料之燒結溫度不同,內部電極有時會產生缺陷。為了防止此種不良現象,要求提昇鎳粒子之耐燒結性。 Nickel particles are generally used to form the internal electrodes of multilayer ceramic capacitors (MLCCs) used in electronic devices. During the manufacturing of MLCCs, when the multilayer containing the nickel particles and the dielectric layer are simultaneously calcined, defects can sometimes occur in the internal electrodes due to differences in the sintering temperatures of the raw materials. To prevent this defect, it is necessary to improve the sintering resistance of the nickel particles.

例如,於專利文獻1中揭示了將藉由PVD(Physical Vapor Deposition,物理氣相沈積)法或CVD(Chemical Vapor Deposition,化學氣相沈積)法所獲得之包含錫或鉍之鎳粉末用於形成MLCC之內部電極之技術。據該文獻所載,藉由向鎳粉末中添加錫等非磁性金屬而使鎳之晶體結構變形,藉此使該鎳粉末之燒結溫度提昇。 For example, Patent 1 discloses a technique for using nickel powder containing tin or bismuth, obtained by PVD (Physical Vapor Deposition) or CVD (Chemical Vapor Deposition), to form the internal electrodes of MLCCs. According to this document, by adding non-magnetic metals such as tin to the nickel powder, the crystal structure of nickel is deformed, thereby increasing the sintering temperature of the nickel powder.

於專利文獻2中揭示了將具有大致球形之粒子形狀,且藉由錫進行了表面處理之鎳粉末用於形成MLCC之內部電極之技術。又,於該文獻中亦揭示了除使用錫以外還使用鉍進行表面處理。據該文獻所載,根據該文獻中所記載之鎳粉末,其燒結行為得以改善。 Patent document 2 discloses a technique for forming internal electrodes of MLCCs using nickel powder with a generally spherical particle shape and surface-treated with tin. Furthermore, the document also discloses the use of bismuth in addition to tin for surface treatment. According to this document, the sintering behavior is improved using the nickel powder described therein.

先前技術文獻 Previous technical literature 專利文獻 Patent Documents

專利文獻1:國際公開第2014/080600號說明書 Patent Document 1: International Publication No. 2014/080600 (Specification)

專利文獻2:日本專利特開2018-104819號公報 Patent Document 2: Japanese Patent Application Publication No. 2018-104819

且說,隨著近年來電子機器之高性能化,對於MLCC,要求進一步防止由內部電極可能產生之缺陷所導致之不良現象。為了滿足該要求,對於鎳粒子,除要求耐燒結性進一步提昇以外,還希望在使用該鎳粒子形成內部電極時,不會過度提高該電極之電阻。 Furthermore, with the increasing performance of electronic devices in recent years, there is a growing demand for MLCCs to prevent defects caused by internal electrodes. To meet this requirement, in addition to improved sintering resistance, it is also desirable to avoid excessively increasing the resistance of internal electrodes when using nickel particles to form them.

因此,本發明之課題在於提供一種不會過度提高電阻而耐燒結性較高之鎳粒子。 Therefore, the present invention aims to provide nickel particles with high sintering resistance without excessively increasing resistance.

本發明提供一種鎳粒子,其係具有包含鎳與金屬元素M之合金之表面區域者,且上述金屬元素M為選自鉍、銅、鐵及鉬中之至少一種,上述金屬元素M相對於上述鎳粒子整體之含量為0.09質量%以上15.8質量%以下,在藉由X射線光電子分光分析對在上述鎳粒子之深度方向上自最表面起至以SiO2換算之濺射深度為5nm之區域進行測定時,將該區域中之金屬元素M之原子數相對於鎳元素與金屬元素M之合計原子數之比率之最大值設為X(at%),在藉由ICP(Inductively Coupled Plasma,感應耦合電漿)發光分光分析法對上述鎳粒子進行測定時,將金屬元素M之原子數相對於鎳元素與金屬元素M之合計原子數之比率設為Y(at%),此時,X/Y之值為0.5以上35以下。 This invention provides nickel particles having a surface region comprising an alloy containing nickel and a metallic element M, wherein the metallic element M is selected from at least one of bismuth, copper, iron, and molybdenum, and the content of the metallic element M relative to the total nickel particles is 0.09% by mass to 15.8% by mass. When measuring the region from the outermost surface to a sputtering depth of 5 nm (converted from SiO₂) in the depth direction of the nickel particles using X-ray photoelectron spectroscopy, the maximum value of the ratio of the number of metallic element M atoms in that region to the total number of nickel atoms and metallic element M atoms is set as X (at%). The method is then analyzed using ICP (Inductively Coupled Plasma Phosphate). When determining nickel particles using the Plasma (Inductively Coupled Plasma) luminescence spectrophotometry method, the ratio of the number of atoms of metal element M to the total number of atoms of nickel and metal element M is set as Y (at%). In this case, the value of X/Y is between 0.5 and 35.

又,本發明提供一種鎳粒子之製造方法,其係對包含氫氧化鎳粒子、多元醇、聚乙烯吡咯啶酮及聚乙烯亞胺之混合液進行加熱而製 造鎳粒子之方法,使用相對於1質量份之聚乙烯亞胺為30質量份以上200質量份以下之聚乙烯吡咯啶酮,藉由上述加熱將上述氫氧化鎳粒子還原為鎳母粒子,於殘存有一部分上述氫氧化鎳粒子之狀態下,將上述混合液與金屬元素M之化合物混合,將該化合物還原為金屬M,而於上述鎳母粒子形成包含鎳與金屬元素M之合金之表面區域,且上述金屬元素M為選自鉍、銅、鐵及鉬中之至少一種。 Furthermore, this invention provides a method for manufacturing nickel particles, which involves heating a mixture comprising nickel hydroxide particles, a polyol, polyvinylpyrrolidone, and polyethyleneimine to produce nickel particles. The method uses 30 to 200 parts by mass of polyvinylpyrrolidone relative to 1 part by mass of polyethyleneimine. The nickel hydroxide particles are reduced to nickel masterbatch particles by heating. While a portion of the nickel hydroxide particles remains, the mixture is mixed with a compound of metallic element M, and the compound is reduced to metallic M. This forms a surface region on the nickel masterbatch particles containing an alloy of nickel and metallic element M, wherein metallic element M is selected from at least one of bismuth, copper, iron, and molybdenum.

以下,對於本發明,基於其較佳實施方式進行說明。本發明之鎳粒子具有鎳母粒子、及位於該母粒子之表面之包含鎳與金屬元素M之合金(以下,亦稱為「鎳-金屬M合金」)之表面區域。本說明書中之「鎳母粒子」係實質上由鎳元素構成,剩餘部分包含不可避免之元素之粒子。不可避免之元素例如為源自大氣中之氧或二氧化碳之氧元素及碳元素、以及鎳粒子之製造過程中混入之氮元素等。 The present invention will now be described based on its preferred embodiment. The nickel particles of the present invention comprise nickel mother particles and a surface region on the surface of the mother particles containing an alloy of nickel and metallic element M (hereinafter also referred to as a "nickel-metal M alloy"). The "nickel mother particles" in this specification are substantially composed of nickel, with the remaining portion consisting of particles containing unavoidable elements. Unavoidable elements include, for example, oxygen and carbon elements derived from atmospheric oxygen or carbon dioxide, and nitrogen elements introduced during the manufacturing process of the nickel particles.

鎳粒子中之鎳母粒子於其表面具有包含鎳-金屬M合金之表面區域。於本說明書中,所謂「鎳-金屬M合金」係包含下述金屬元素M之鎳基合金。鎳-金屬M合金實質上由鎳元素與金屬元素M之合金構成,剩餘部分包含不可避免之元素。於包含鎳-金屬M合金之表面區域,金屬元素M能夠以其一部分為金屬元素M之單質之狀態(即金屬之狀態)存在。或者,金屬元素M亦能夠以其一部分為金屬元素M之化合物之狀態存在。或者,金屬元素M還能夠以將其等組合兩種以上之狀態存在。於金屬元素M以上述金屬元素M之化合物之狀態存在於包含鎳-金屬M合金之表面區域 之情形時,作為該化合物,例如可例舉包含金屬M之氧化物、氫氧化物、硫化物、硫酸化物、硼化物、磷化物等,但不限於該等。但是,就最大限度地發揮本發明之鎳粒子原本所具有之優點之觀點而言,包含鎳-金屬M合金之表面區域中之金屬元素M宜實質上僅由其與鎳之合金構成。於本說明書中,「實質上僅由其與鎳之合金構成」係指排除上述表面區域刻意地包含除與鎳之合金以外之金屬元素M,且容許鎳粒子之製造過程中不可避免地混入之微量金屬元素M之單質或金屬元素M之化合物。 The nickel parent particles in the nickel particles have surface regions comprising a nickel-metal M alloy. In this specification, "nickel-metal M alloy" refers to a nickel-based alloy containing the metal element M. The nickel-metal M alloy is essentially an alloy of nickel and metal element M, with the remaining portion containing unavoidable elements. In the surface regions comprising the nickel-metal M alloy, metal element M can exist, in part, as an elemental form (i.e., a metallic state). Alternatively, metal element M can exist, in part, as a compound form. Alternatively, metal element M can exist in two or more combinations thereof. When metallic element M exists in the surface region of a nickel-metal M alloy in the form of a compound of metallic element M, examples of such compounds include, but are not limited to, oxides, hydroxides, sulfides, sulfates, borides, and phosphides containing metallic M. However, from the viewpoint of maximizing the advantages inherent in the nickel particles of this invention, the metallic element M in the surface region of the nickel-metal M alloy should substantially consist only of its alloy with nickel. In this specification, "substantially consist only of its alloy with nickel" means excluding the intentional inclusion of metallic element M other than its alloy with nickel in the aforementioned surface region, and allowing trace amounts of elemental or compound metallic element M to inevitably mix in during the manufacturing process of the nickel particles.

鎳粒子中之金屬元素M較佳為選自鉍、銅、鐵及鉬中之至少一種。藉由使金屬元素M為鉍、銅、鐵或鉬,可不過度提高鎳粒子之電阻而進一步提高耐燒結性。金屬元素M可僅使用鉍、銅、鐵及鉬中之一種,或者亦可使用兩種以上之任意組合。於以下說明中稱為金屬元素M(或金屬M)時,根據上下文意指鉍、銅、鐵或鉬或者該等之任意之兩種以上之組合。 The metallic element M in the nickel particles is preferably selected from at least one of bismuth, copper, iron, and molybdenum. By using bismuth, copper, iron, or molybdenum as the metallic element M, the sintering resistance of the nickel particles can be further improved without excessively increasing it. The metallic element M may be only one of bismuth, copper, iron, and molybdenum, or any combination of two or more of them. In the following description, when referred to as metallic element M (or metal M), it means, depending on the context, bismuth, copper, iron, or molybdenum, or any combination of two or more of these.

鎳粒子於其表面區域包含鎳-金屬M合金可藉由以下方法來確認。 The presence of nickel-metal M alloy in the surface region of nickel particles can be confirmed by the following methods.

具體而言,首先,藉由X射線光電子分光分析(以下,亦稱為「XPS」)之測定確認鎳粒子於其表面區域包含金屬元素M,且該金屬元素M主要為金屬狀態。繼而,確認上述鎳粒子之X射線繞射峰中之a軸長度超出預先僅對鎳粒子進行測定而得之X射線繞射峰中之a軸長度。X射線繞射峰中之a軸長度延長意指物質固溶。因此,除藉由XPS之測定所確認到之金屬元素M以金屬狀態存在於鎳粒子之表面區域以外,還可根據藉由a軸長度之比較所確認到之金屬元素M與鎳固溶,而確認該鎳粒子於其表面區域包含鎳-金屬M合金。 Specifically, firstly, X-ray photoelectron spectrometry (XPS) confirms that the nickel particles contain a metallic element M in their surface region, and that the metallic element M is primarily in a metallic state. Next, it is confirmed that the a-axis length of the X-ray diffraction peak of the aforementioned nickel particles exceeds the a-axis length previously obtained from measurements only on the nickel particles. An extended a-axis length in the X-ray diffraction peak indicates solid solution. Therefore, in addition to the presence of metallic element M in a metallic state in the surface region of the nickel particles as confirmed by XPS measurements, the presence of a nickel-metal M alloy in the surface region of the nickel particles can also be confirmed by comparing the a-axis lengths of metallic element M with those of nickel solid solution.

鎳粒子於其表面區域包含金屬元素M之比率可藉由XPS進行測定。詳細而言,在藉由XPS對在鎳粒子之深度方向上自最表面起至以SiO2換算之濺射深度為5nm之區域(以下,亦將該區域稱為「粒子表面區域」)進行測定時,於該粒子表面區域,金屬元素M之原子數相對於鎳元素與金屬元素M之合計原子數之比率之最大值X之值較佳為0.5at%以上。上述「最大值」係指於沿粒子表面區域之厚度方向所測得之複數個X之值不同之情形時,該X之值之最大值。就進一步提高下述鎳粒子之耐燒結性之觀點而言,較佳為以具有X之值為0.5at%以上之部位之方式存在金屬元素M。 The proportion of metallic element M contained in the surface region of nickel particles can be determined by XPS. Specifically, when measuring the region from the outermost surface of the nickel particles to a sputtering depth of 5 nm (converted to SiO2) in the depth direction (hereinafter, this region is also referred to as the "particle surface region") by XPS, the maximum value X of the ratio of the number of metallic element M atoms to the total number of nickel atoms in this particle surface region is preferably 0.5 at% or more. The aforementioned "maximum value" refers to the maximum value of X when multiple X values measured along the thickness direction of the particle surface region are different. From the viewpoint of further improving the sintering resistance of the nickel particles, it is preferable that metallic element M is present in a manner where the X value is 0.5 at% or more.

於金屬元素M為鉍之情形時,就與上述相同之觀點而言,X之值(at%)更佳為1at%以上,進而較佳為2at%以上,進而更佳為3at%以上,尤佳為7at%以上,特佳為14at%以上。又,X之值(at%)更佳為70at%以下,進而較佳為35at%以下,進而更佳為30at%以下,尤佳為20at%以下,特佳為15at%以下。 When the metallic element M is bismuth, following the same principles as above, the value of X (at%) is preferably 1 at% or higher, more preferably 2 at% or higher, more preferably 3 at% or higher, especially preferably 7 at% or higher, and particularly preferably 14 at% or higher. Furthermore, the value of X (at%) is preferably 70 at% or lower, more preferably 35 at% or lower, more preferably 30 at% or lower, especially preferably 20 at% or lower, and particularly preferably 15 at% or lower.

於金屬元素M為銅之情形時,就與上述相同之觀點而言,X之值(at%)更佳為1at%以上,進而較佳為2at%以上,進而更佳為4at%以上,尤佳為8at%以上,特佳為12at%以上。又,X之值(at%)更佳為70at%以下,進而較佳為35at%以下,進而更佳為20at%以下,尤佳為14at%以下。 When the metallic element M is copper, following the same principles as above, the value of X (at%) is preferably 1 at% or higher, more preferably 2 at% or higher, more preferably 4 at% or higher, especially preferably 8 at% or higher, and particularly preferably 12 at% or higher. Furthermore, the value of X (at%) is preferably 70 at% or lower, more preferably 35 at% or lower, more preferably 20 at% or lower, and particularly preferably 14 at% or lower.

於金屬元素M為鐵之情形時,就與上述相同之觀點而言,X之值(at%)更佳為1at%以上,進而較佳為2at%以上,進而更佳為4at%以上,尤佳為7at%以上。又,X之值(at%)更佳為70at%以下,進而較佳為35at%以下,進而更佳為30at%以下,尤佳為20at%以下,特佳為9at%以 下。 When the metallic element M is iron, following the same principles as above, the value of X (at%) is preferably 1 at% or higher, more preferably 2 at% or higher, more preferably 4 at% or higher, and especially preferably 7 at% or higher. Furthermore, the value of X (at%) is preferably 70 at% or lower, more preferably 35 at% or lower, more preferably 30 at% or lower, especially preferably 20 at% or lower, and particularly preferably 9 at% or lower.

於金屬元素M為鉬之情形時,就與上述相同之觀點而言,X之值(at%)更佳為1at%以上,進而較佳為2at%以上,進而更佳為4at%以上,尤佳為8at%以上。又,X之值(at%)更佳為70at%以下,進而較佳為35at%以下,進而更佳為30at%以下,尤佳為10at%以下。 When the metallic element M is molybdenum, following the same principles as above, the value of X (at%) is preferably 1 at% or higher, more preferably 2 at% or higher, more preferably 4 at% or higher, and especially preferably 8 at% or higher. Furthermore, the value of X (at%) is preferably 70 at% or lower, more preferably 35 at% or lower, more preferably 30 at% or lower, and especially preferably 10 at% or lower.

X之值之測定方法於下述實施例中進行說明。 The method for determining the value of X is illustrated in the following embodiments.

關於上述「鎳粒子之最表面」,於鎳粒子之表面例如存在有機酸或胺等表面處理劑之情形時,係指包含該表面處理劑之鎳粒子之最外面。於鎳粒子之表面不存在表面處理劑之情形時,係指粒子之表面本身。 Regarding the aforementioned "outermost surface of nickel particles," when a surface treatment agent such as an organic acid or amine is present on the surface of the nickel particles, it refers to the outermost part of the nickel particles containing that surface treatment agent. When no surface treatment agent is present on the surface of the nickel particles, it refers to the surface of the particles themselves.

鎳粒子較佳為含有相對於該鎳粒子整體為0.09質量%以上15.8質量%以下之金屬元素M。藉由使金屬元素M相對於鎳粒子之含量處於該範圍內,可不過度提高鎳粒子之電阻而進一步提高耐燒結性。 The nickel particles preferably contain a metallic element M in an amount of 0.09% to 15.8% by mass relative to the total nickel particles. By keeping the content of metallic element M within this range relative to the nickel particles, the sintering resistance can be further improved without excessively increasing the electrical resistance of the nickel particles.

於金屬元素M為鉍之情形時,就與上述相同之觀點而言,鉍元素相對於鎳粒子整體之含量更佳為0.3質量%以上,進而較佳為0.4質量%以上,進而更佳為1質量%以上,尤佳為6.7質量%以上。又,鉍元素相對於鎳粒子整體之含量更佳為15.8質量%以下,進而較佳為13質量%以下,進而更佳為11.4質量%以下,尤佳為10質量%以下。 When the metallic element M is bismuth, following the same principles as above, the content of bismuth relative to the total nickel particles is preferably 0.3% by mass or more, more preferably 0.4% by mass or more, more preferably 1% by mass or more, and particularly preferably 6.7% by mass or more. Furthermore, the content of bismuth relative to the total nickel particles is preferably 15.8% by mass or less, more preferably 13% by mass or less, more preferably 11.4% by mass or less, and particularly preferably 10% by mass or less.

於金屬元素M為銅之情形時,就與上述相同之觀點而言,銅元素相對於鎳粒子整體之含量更佳為0.4質量%以上,進而較佳為1質量%以上,進而更佳為2.1質量%以上,尤佳為4.3質量%以上。又,銅元素相對於鎳粒子整體之含量更佳為11.4質量%以下,進而較佳為7.6質量%以下,進而更佳為6.5質量%以下,尤佳為6質量%以下,特佳為5.4質量%以下。 When the metallic element M is copper, following the same principles as above, the copper content relative to the total nickel particles is preferably 0.4% by mass or more, more preferably 1% by mass or more, more preferably 2.1% by mass or more, and even more preferably 4.3% by mass or more. Furthermore, the copper content relative to the total nickel particles is preferably 11.4% by mass or less, more preferably 7.6% by mass or less, more preferably 6.5% by mass or less, even more preferably 6% by mass or less, and particularly preferably 5.4% by mass or less.

於金屬元素M為鐵之情形時,就與上述相同之觀點而言,鐵元素相 對於鎳粒子整體之含量更佳為0.09質量%以上,進而較佳為0.28質量%以上,進而更佳為0.40質量%以上,尤佳為0.47質量%以上。又,鐵元素相對於鎳粒子整體之含量更佳為11.4質量%以下,進而較佳為6質量%以下,進而更佳為2.87質量%以下,尤佳為1.91質量%以下,特佳為0.96質量%以下。 When the metallic element M is iron, following the same principles as above, the iron content relative to the total nickel particles is preferably 0.09% by mass or more, more preferably 0.28% by mass or more, more preferably 0.40% by mass or more, and even more preferably 0.47% by mass or more. Furthermore, the iron content relative to the total nickel particles is preferably 11.4% by mass or less, more preferably 6% by mass or less, more preferably 2.87% by mass or less, even more preferably 1.91% by mass or less, and particularly preferably 0.96% by mass or less.

於金屬元素M為鉬之情形時,就與上述相同之觀點而言,鉬元素相對於鎳粒子整體之含量更佳為0.4質量%以上,進而較佳為1質量%以上,進而更佳為1.1質量%以上,尤佳為1.6質量%以上。又,鉬元素相對於鎳粒子整體之含量更佳為11.4質量%以下,進而較佳為6.4質量%以下,進而更佳為6質量%以下,尤佳為4.9質量%以下,特佳為3.3質量%以下。 When the metallic element M is molybdenum, following the same principles as above, the content of molybdenum relative to the total nickel particles is preferably 0.4% by mass or more, more preferably 1% by mass or more, more preferably 1.1% by mass or more, and particularly preferably 1.6% by mass or more. Furthermore, the content of molybdenum relative to the total nickel particles is preferably 11.4% by mass or less, more preferably 6.4% by mass or less, more preferably 6% by mass or less, particularly preferably 4.9% by mass or less, and especially preferably 3.3% by mass or less.

金屬元素M相對於鎳粒子整體之含量可藉由下述ICP發光分光分析法進行測定。 The content of the metal element M relative to the total nickel particles can be determined by the following ICP-based emission spectrophotometry.

本發明之鎳粒子以金屬元素M相對於鎳粒子整體之含量滿足上述範圍作為條件,於該鎳粒子整體中,金屬元素M之原子數相對於鎳元素與金屬元素M之合計原子數之比率Y之值(at%)較佳為0.1at%以上7at%以下。就不過度提高鎳粒子之電阻而進一步提高耐燒結性之觀點而言,較佳為以Y之值處於該範圍內之方式存在金屬元素M。 The nickel particles of this invention are provided with the condition that the content of metallic element M relative to the total nickel particles meets the aforementioned range. Preferably, the ratio (at%) of the number of metallic element M atoms to the total number of nickel atoms and metallic element M atoms in the total nickel particles is 0.1at% to 7at%. From the viewpoint of further improving sintering resistance without excessively increasing the electrical resistance of the nickel particles, it is preferable that metallic element M exists with the value of Y within this range.

於金屬元素M為鉍之情形時,就與上述相同之觀點而言,Y之值更佳為0.1at%以上,進而較佳為0.2at%以上,進而更佳為0.3at%以上,尤佳為0.5at%以上,特佳為2at%以上。又,Y之值更佳為6at%以下,進而較佳為5at%以下,進而更佳為4at%以下,尤佳為3at%以下。 When the metallic element M is bismuth, following the same principles as above, the value of Y is preferably 0.1 at% or higher, more preferably 0.2 at% or higher, more preferably 0.3 at% or higher, particularly preferably 0.5 at% or higher, and especially preferably 2 at% or higher. Furthermore, the value of Y is preferably 6 at% or lower, more preferably 5 at% or lower, more preferably 4 at% or lower, and especially preferably 3 at% or lower.

於金屬元素M為銅之情形時,就與上述相同之觀點而言,Y之值更佳為0.2at%以上,進而較佳為0.5at%以上,進而更佳為1at%以上,尤佳為 2at%以上,特佳為4at%以上。又,Y之值更佳為7at%以下,進而較佳為6at%以下,進而更佳為5at%以下。 When the metallic element M is copper, following the same principles as above, the value of Y is preferably 0.2 at% or higher, more preferably 0.5 at% or higher, more preferably 1 at% or higher, particularly preferably 2 at% or higher, and especially preferably 4 at% or higher. Furthermore, the value of Y is preferably 7 at% or lower, more preferably 6 at% or lower, and more preferably 5 at% or lower.

於金屬元素M為鐵之情形時,就與上述相同之觀點而言,Y之值更佳為0.1at%以上,進而較佳為0.2at%以上,進而更佳為0.3at%以上,尤佳為0.5at%以上。又,Y之值更佳為6at%以下,進而較佳為3at%以下,進而更佳為2at%以下,尤佳為1at%以下。 When the metallic element M is iron, following the same principles as above, the value of Y is preferably 0.1 at% or higher, more preferably 0.2 at% or higher, more preferably 0.3 at% or higher, and especially preferably 0.5 at% or higher. Furthermore, the value of Y is preferably 6 at% or lower, more preferably 3 at% or lower, more preferably 2 at% or lower, and especially preferably 1 at% or lower.

於金屬元素M為鉬之情形時,就與上述相同之觀點而言,Y之值更佳為0.2at%以上,進而較佳為0.3at%以上,進而更佳為0.5at%以上,尤佳為0.7at%以上,特佳為1at%以上。又,Y之值更佳為6at%以下,進而較佳為4at%以下,進而更佳為3at%以下,尤佳為2at%以下。 When the metallic element M is molybdenum, following the same principles as above, the value of Y is preferably 0.2 at% or higher, more preferably 0.3 at% or higher, more preferably 0.5 at% or higher, particularly preferably 0.7 at% or higher, and especially preferably 1 at% or higher. Furthermore, the value of Y is preferably 6 at% or lower, more preferably 4 at% or lower, more preferably 3 at% or lower, and especially preferably 2 at% or lower.

鎳粒子整體中所包含之金屬元素M之原子數之比率Y之值可藉由ICP發光分光分析法進行測定。具體而言,首先,藉由ICP發光分光分析法對鎳粒子整體進行測定,求出鎳元素之含有比率及金屬元素M之含有比率。繼而,將鎳元素之含有比率(質量%)除以鎳元素之原子量(58.7),將該含有比率換算為鎳元素之原子數ANi。又,將金屬元素M之含有比率(質量%)除以金屬元素M之原子量(鉍為209,銅為63.6,鐵為55.9,鉬為96),將該含有比率換算為金屬元素M之原子數AM。然後,算出金屬元素M之原子數相對於鎳元素之原子數ANi與金屬元素M之原子數AM之比率(AM/(ANi+AM)×100),求出上述Y之值。 The ratio Y of the number of atoms of metallic element M contained in a nickel particle can be determined by ICP-ELISA. Specifically, firstly, the nickel particle is analyzed by ICP-ELISA to determine the content ratio of nickel and metallic element M. Then, the nickel content ratio (mass %) is divided by the atomic weight of nickel (58.7) to convert the content ratio into the number of nickel atoms, ΔNi . Finally, the metallic element content ratio (mass %) is divided by the atomic weight of metallic element M (209 for bismuth, 63.6 for copper, 55.9 for iron, and 96 for molybdenum) to convert the content ratio into the number of metallic element M atoms, ΔM . Then, calculate the ratio of the number of atoms of metal element M to the number of atoms of nickel element ANi and the number of atoms of metal element M Am ( Am / ( ANi + Am ) × 100), and obtain the value of Y mentioned above.

經本發明人之研究,結果表明X之值與Y之值之關係會影響鎳粒子之耐燒結性。詳細而言,表明藉由將X/Y之值設為0.5以上35以下,鎳粒子因燒結而開始收縮之溫度上升,即耐燒結性提高。耐燒結性較高之本發明之鎳粒子於使用其製造例如MLCC之情形時,可於作為製造之 一步驟之焙燒步驟中,儘量使內部電極因鎳粒子之燒結而收縮之溫度接近介電層因介電粒子之燒結而收縮之溫度。減小內部電極與介電層各者收縮之溫度之差之優點在於在焙燒步驟之升溫過程中,內部電極與介電層收縮之時間重疊。具體而言,就可有效防止於MLCC之焙燒步驟中,因內部電極與介電層收縮之溫度或收縮率不同而產生龜裂或分層(內部電極與介電層之界面之層間剝離)等構造缺陷之觀點而言,有利。 The inventors' research shows that the relationship between the values of X and Y affects the sintering resistance of nickel particles. Specifically, by setting the X/Y value to between 0.5 and 35, the temperature at which nickel particles begin to shrink due to sintering increases, thus improving sintering resistance. When using the nickel particles of this invention, which exhibit higher sintering resistance, in the manufacture of materials such as MLCCs, the baking step, a key manufacturing step, can be performed to ensure that the temperature at which the internal electrodes shrink due to nickel particle sintering is as close as possible to the temperature at which the dielectric layer shrinks due to dielectric particle sintering. The advantage of reducing the temperature difference between the internal electrodes and the dielectric layer during the heating process of MLCCs lies in preventing the overlap of their shrinkage times. Specifically, this effectively prevents structural defects such as cracking or delamination (interlayer peeling at the interface between the internal electrodes and the dielectric layer) caused by differences in the temperature or shrinkage rate of the internal electrodes and dielectric layer during the MLCC's baking process.

於金屬元素M為鉍之情形時,就使上述優點更加顯著之觀點而言,鎳粒子中之X/Y之值更佳為1.5以上,進而較佳為3.7以上,進而更佳為4以上,尤佳為5以上,特佳為7以上。鎳粒子中之X/Y之值更佳為30以下,進而較佳為25以下,進而更佳為20以下。 When the metallic element M is bismuth, from the viewpoint of making the above advantages even more significant, the X/Y value of the nickel particles is preferably 1.5 or higher, more preferably 3.7 or higher, more preferably 4 or higher, especially preferably 5 or higher, and particularly preferably 7 or higher. The X/Y value of the nickel particles is preferably 30 or lower, more preferably 25 or lower, and more preferably 20 or lower.

於金屬元素M為銅之情形時,就使上述優點更加顯著之觀點而言,鎳粒子中之X/Y之值更佳為0.5以上,進而較佳為1以上,進而更佳為1.5以上,尤佳為2以上。鎳粒子中之X/Y之值更佳為30以下,進而較佳為15以下,進而更佳為13以下,尤佳為10以下,特佳為7以下,最佳為3以下。 When the metallic element M is copper, from the viewpoint of making the above advantages even more significant, the X/Y value of the nickel particles is preferably 0.5 or higher, more preferably 1 or higher, more preferably 1.5 or higher, and especially preferably 2 or higher. The X/Y value of the nickel particles is preferably 30 or lower, more preferably 15 or lower, more preferably 13 or lower, especially preferably 10 or lower, particularly preferably 7 or lower, and most preferably 3 or lower.

於金屬元素M為鐵之情形時,就使上述優點更加顯著之觀點而言,鎳粒子中之X/Y之值更佳為1以上,進而較佳為1.5以上,進而更佳為3.7以上,尤佳為5以上,特佳為10以上。鎳粒子中之X/Y之值更佳為30以下,進而較佳為25以下,進而更佳為20以下,尤佳為15以下。 When the metallic element M is iron, from the viewpoint of making the above advantages even more significant, the X/Y value of the nickel particles is preferably 1 or more, further preferably 1.5 or more, further preferably 3.7 or more, especially preferably 5 or more, and particularly preferably 10 or more. The X/Y value of the nickel particles is preferably 30 or less, further preferably 25 or less, further preferably 20 or less, and particularly preferably 15 or less.

於金屬元素M為鉬之情形時,就使上述優點更加顯著之觀點而言,鎳粒子中之X/Y之值更佳為1以上,進而較佳為1.5以上,進而更佳為3以上,尤佳為3.7以上,特佳為5以上。鎳粒子中之X/Y之值更佳為30以下,進而較佳為15以下,進而更佳為13以下,尤佳為10以下,特佳為7以下。 When the metallic element M is molybdenum, from the viewpoint of making the above advantages even more significant, the X/Y value of the nickel particles is preferably 1 or higher, more preferably 1.5 or higher, more preferably 3 or higher, especially preferably 3.7 or higher, and particularly preferably 5 or higher. The X/Y value of the nickel particles is preferably 30 or lower, more preferably 15 or lower, more preferably 13 or lower, especially preferably 10 or lower, and particularly preferably 7 or lower.

於粒子表面區域,金屬元素M之原子數相對於鎳元素與金 屬元素M之合計原子數之比率之值可於深度方向上固定,或者亦可變動。於上述比率之值於深度方向上不固定之情形時,上述比率之值例如自鎳粒子之表面向中心連續地或階梯狀地減小。尤其是,就鎳粒子之耐燒結性更進一步提高之方面而言,較佳為在藉由XPS對自鎳粒子之最表面起至以SiO2換算之濺射深度為20nm之區域進行測定時,上述比率之值自最表面向濺射深度20nm處遞減。於該情形時,就鎳粒子之耐燒結性更進一步提昇之方面而言,較佳為在將自鎳粒子之最表面起至濺射深度5nm之區域中之上述比率之最大值設為X,且將濺射深度20nm處之上述比率之最大值設為X1時,X/X1之值為0.1以上15以下。 In the particle surface region, the ratio of the number of metal element M atoms to the total number of nickel and metal element M atoms can be fixed or varied in the depth direction. When the ratio is not fixed in the depth direction, it decreases continuously or in a stepwise manner from the surface of the nickel particle towards the center. In particular, for further improvement of the sintering resistance of the nickel particles, it is preferable that when measuring the region from the outermost surface of the nickel particle to a sputtering depth of 20 nm (converted from SiO2) using XPS, the ratio decreases from the outermost surface towards the sputtering depth of 20 nm. In this case, in terms of further improving the sintering resistance of nickel particles, it is preferable that when the maximum value of the above ratio in the region from the outermost surface of the nickel particles to a sputtering depth of 5 nm is set as X, and the maximum value of the above ratio at a sputtering depth of 20 nm is set as X1, the value of X/X1 is 0.1 or more and 15 or less.

於金屬元素M為鉍之情形時,就與上述相同之觀點而言,X/X1之值更佳為1以上,進而較佳為1.5以上,進而更佳為2以上。又,X/X1之值更佳為10以下,進而較佳為7.8以下,進而更佳為6.1以下,尤佳為4以下,特佳為3以下,最佳為2.5以下。 When the metallic element M is bismuth, following the same principles as above, the value of X/X1 is preferably 1 or higher, more preferably 1.5 or higher, and even more preferably 2 or higher. Furthermore, the value of X/X1 is preferably 10 or lower, more preferably 7.8 or lower, even more preferably 6.1 or lower, particularly preferably 4 or lower, especially preferably 3 or lower, and most preferably 2.5 or lower.

於金屬元素M為銅之情形時,就與上述相同之觀點而言,X/X1之值更佳為0.1以上,進而較佳為0.5以上,進而更佳為1以上。又,X/X1之值更佳為10以下,進而較佳為7.8以下,進而更佳為6.1以下,尤佳為5以下,特佳為3以下。 When the metallic element M is copper, following the same principles as above, the value of X/X1 is preferably 0.1 or higher, more preferably 0.5 or higher, and even more preferably 1 or higher. Furthermore, the value of X/X1 is preferably 10 or lower, more preferably 7.8 or lower, even more preferably 6.1 or lower, particularly preferably 5 or lower, and especially preferably 3 or lower.

於金屬元素M為鐵之情形時,就與上述相同之觀點而言,X/X1之值更佳為0.1以上,進而較佳為0.5以上,進而更佳為1以上。又,X/X1之值更佳為10以下,進而較佳為7.8以下,進而更佳為6.1以下,尤佳為5以下,特佳為2以下。 When the metallic element M is iron, following the same principles as above, the value of X/X1 is preferably 0.1 or higher, more preferably 0.5 or higher, and even more preferably 1 or higher. Furthermore, the value of X/X1 is preferably 10 or lower, more preferably 7.8 or lower, even more preferably 6.1 or lower, particularly preferably 5 or lower, and especially preferably 2 or lower.

於金屬元素M為鉬之情形時,就與上述相同之觀點而言,X/X1之值更佳為0.1以上,進而較佳為1以上,進而更佳為2以上。又,X/X1之值更 佳為10以下,進而較佳為7.8以下,進而更佳為6.1以下,尤佳為5以下,特佳為3以下。 When the metallic element M is molybdenum, following the same principles as above, the value of X/X1 is preferably 0.1 or higher, more preferably 1 or higher, and even more preferably 2 or higher. Furthermore, the value of X/X1 is preferably 10 or lower, more preferably 7.8 or lower, even more preferably 6.1 or lower, particularly preferably 5 or lower, and especially preferably 3 or lower.

X1之測定方法於下述實施例中進行說明。 The method for measuring X1 is illustrated in the following embodiments.

於金屬元素M為鉍之情形時,關於X1本身之值,就更進一步提高鎳粒子之耐燒結性之觀點而言,更佳為0.2以上,進而較佳為0.5以上,進而更佳為0.7以上,尤佳為1.7以上,特佳為2以上,最佳為5以上。又,X1本身之值更佳為15以下,進而較佳為10以下,進而更佳為7以下。 When the metallic element M is bismuth, regarding the value of X1 itself, from the viewpoint of further improving the sintering resistance of nickel particles, it is preferably 0.2 or higher, more preferably 0.5 or higher, more preferably 0.7 or higher, especially preferably 1.7 or higher, particularly preferably 2 or higher, and most preferably 5 or higher. Furthermore, the value of X1 itself is preferably 15 or lower, more preferably 10 or lower, and even more preferably 7 or lower.

於金屬元素M為銅之情形時,關於X1本身之值,就更進一步提高鎳粒子之耐燒結性之觀點而言,更佳為0.2以上,進而較佳為0.5以上,進而更佳為0.7以上,尤佳為1以上,特佳為1.7以上,進而特佳為3以上,最佳為5以上。又,X1本身之值更佳為20以下,進而較佳為15以下,進而更佳為10以下。 When the metallic element M is copper, regarding the value of X1 itself, from the viewpoint of further improving the sintering resistance of nickel particles, it is preferably 0.2 or higher, more preferably 0.5 or higher, more preferably 0.7 or higher, especially preferably 1 or higher, particularly preferably 1.7 or higher, particularly preferably 3 or higher, and most preferably 5 or higher. Furthermore, the value of X1 itself is preferably 20 or lower, more preferably 15 or lower, and more preferably 10 or lower.

於金屬元素M為鐵之情形時,關於X1本身之值,就更進一步提高鎳粒子之耐燒結性之觀點而言,更佳為0.2以上,進而較佳為0.5以上,進而更佳為0.7以上,尤佳為1以上,特佳為1.7以上,進而特佳為2以上,最佳為4以上。又,X1本身之值更佳為15以下,進而較佳為10以下,進而更佳為6以下。 When the metallic element M is iron, regarding the value of X1 itself, from the viewpoint of further improving the sintering resistance of nickel particles, it is preferably 0.2 or higher, more preferably 0.5 or higher, more preferably 0.7 or higher, especially preferably 1 or higher, particularly preferably 1.7 or higher, particularly preferably 2 or higher, and most preferably 4 or higher. Furthermore, the value of X1 itself is preferably 15 or lower, more preferably 10 or lower, and more preferably 6 or lower.

於金屬元素M為鉬之情形時,關於X1本身之值,就更進一步提高鎳粒子之耐燒結性之觀點而言,更佳為0.2以上,進而較佳為0.5以上,進而更佳為0.7以上,尤佳為1以上,特佳為1.7以上,進而特佳為2以上,最佳為4以上。又,X1本身之值更佳為15以下,進而較佳為10以下,進而更佳為6以下,尤佳為5以下。 When the metallic element M is molybdenum, regarding the value of X1 itself, from the viewpoint of further improving the sintering resistance of nickel particles, it is preferably 0.2 or higher, more preferably 0.5 or higher, more preferably 0.7 or higher, especially preferably 1 or higher, particularly preferably 1.7 or higher, even more preferably 2 or higher, and most preferably 4 or higher. Furthermore, the value of X1 itself is preferably 15 or lower, more preferably 10 or lower, even more preferably 6 or lower, and especially preferably 5 or lower.

本發明之鎳粒子之累積個數50個數%時之個數累積粒徑D50 之值較佳為20nm以上200nm以下。換言之,本發明之鎳粒子較佳為微粒。藉由使鎳粒子之粒徑D50處於該範圍內,於將本發明之鎳粒子用於各種用途、例如用作MLCC之內部電極之情形時,有該內部電極間不易產生短路之優點。就使該優點更加顯著之觀點而言,鎳粒子之粒徑D50更佳為20nm以上150nm以下,進而較佳為40nm以上150nm以下,進而更佳為40nm以上100nm以下。鎳粒子之粒徑D50係藉由利用掃描式電子顯微鏡(SEM)對該鎳粒子進行觀察而測得。詳細而言,藉由SEM以放大倍率50000倍拍攝鎳粒子,求出所拍攝之鎳粒子之面積。根據該面積算出圓當量直徑。基於所算出之圓當量直徑求出粒度分佈。粒度分佈之曲線圖之橫軸為圓當量直徑,縱軸為個數頻度。於以此方式獲得之粒度分佈曲線中,將累積個數50個數%時之個數累積粒徑定義為D50The cumulative particle size D50 of the nickel particles of the present invention, when the cumulative number of nickel particles is 50%, is preferably 20 nm to 200 nm. In other words, the nickel particles of the present invention are preferably microparticles. By keeping the particle size D50 of the nickel particles within this range, when the nickel particles of the present invention are used for various applications, such as as internal electrodes of MLCCs, there is an advantage that short circuits are less likely to occur between the internal electrodes. From the viewpoint of making this advantage more significant, the particle size D50 of the nickel particles is more preferably 20 nm to 150 nm, more preferably 40 nm to 150 nm, and more preferably 40 nm to 100 nm. The particle size D50 of nickel particles was measured by observing the particles using scanning electron microscopy (SEM). Specifically, the nickel particles were photographed at 50,000x magnification using SEM, and the area of the photographed particles was determined. The equivalent circular diameter was calculated from this area. The particle size distribution was then determined based on the calculated equivalent circular diameter. The horizontal axis of the particle size distribution curve represents the equivalent circular diameter, and the vertical axis represents the frequency of particles. In the particle size distribution curve obtained in this way, the cumulative particle size at 50% cumulative number of particles is defined as D50 .

獲得上述「粒度分佈曲線」時,求出5000個以上鎳粒子之圓當量直徑。圓當量直徑之計算使用圖像解析粒度分佈測定軟體(Mountech股份有限公司製造之Mac-View)。作為觀察對象之鎳粒子之最小單位根據藉由SEM是否觀察到被識別為獨立之一個粒子之粒子界面來判斷。因此,即便觀察到包含複數個粒子之凝集塊,於該凝集塊觀察到粒子界面之情形時,亦認定由該粒子界面所劃定之區域為一個粒子。 When obtaining the aforementioned "particle size distribution curve," the circular equivalent diameter of more than 5000 nickel particles was calculated. The circular equivalent diameter was calculated using image resolution particle size distribution measurement software (Mac-View manufactured by Mountech Co., Ltd.). The smallest unit of the nickel particle being observed was determined by whether a particle interface, identified as an independent particle, was observed using SEM. Therefore, even if an agglomerate containing multiple particles was observed, if a particle interface was observed within that agglomerate, the area defined by that particle interface was considered a single particle.

本發明之鎳粒子較佳為微粒,除此以外,粗大粒子之存在比率較小。於將本發明之鎳粒子用於例如MLCC之內部電極之情形時,粗大粒子之存在有時成為該內部電極間短路之一個原因。藉由降低鎳粒子中之粗大粒子之存在比率,可有效防止該短路。就該觀點而言,於本發明之鎳粒子中,具有D50之1.5倍以上之粒徑之粒子之存在比率(以下,亦稱為「粗大粒子存在比率」)較佳為0.5個數%以下,更佳為0.3個數%以下,進 而較佳為0.1個數%以下。 The nickel particles of this invention are preferably microparticles, with a low proportion of coarse particles. When the nickel particles of this invention are used, for example, in the internal electrodes of MLCCs, the presence of coarse particles can sometimes be a cause of short circuits between the internal electrodes. By reducing the proportion of coarse particles in the nickel particles, this short circuit can be effectively prevented. From this perspective, the proportion of particles with a diameter of 1.5 times or more than D50 (hereinafter also referred to as the "coarse particle proportion") in the nickel particles of this invention is preferably 0.5% or less, more preferably 0.3% or less, and even more preferably 0.1% or less.

粗大粒子存在比率越接近0%,越可有效防止內部電極間產生短路,若粗大粒子存在比率低至0.01%左右,則可有效防止內部電極間產生短路。 The closer the percentage of coarse particles is to 0%, the more effectively short circuits between internal electrodes can be prevented. If the percentage of coarse particles is as low as approximately 0.01%, short circuits between internal electrodes can be effectively prevented.

選定具有D50之1.5倍以上之粒徑作為粗大粒子之尺寸之粒子之理由在於,本發明人發現,D50之1.5倍以上之粒徑會導致在形成導電膜時導電膜之表面粗糙,這與MLCC之內部電極間發生短路有極深的關係。 The reason for selecting particles with a diameter greater than 1.5 times that of D50 as the size of coarse particles is that the inventors have found that a particle size greater than 1.5 times that of D50 will cause the surface of the conductive film to be rough when forming the conductive film, which is closely related to the short circuit between the internal electrodes of the MLCC.

本發明之鎳粒子較佳為微粒,粗大粒子之存在比率較低,除此以外,粒徑儘可能均勻。換言之,較佳為粒度分佈曲線陡峭。粒度分佈曲線之陡峭度可藉由粒徑之變異係數進行評價。變異係數係在將粒度分佈中之粒徑之標準偏差設為σ(nm)時,由(σ/D50)×100(%)所定義之值。就降低由該鎳粒子所形成之導電膜之表面粗糙度之觀點而言,本發明之鎳粒子之該變異係數之值較佳為14%以下。就進一步降低導電膜之表面粗糙度之觀點而言,變異係數更佳為13%以下,進而較佳為12%以下。 The nickel particles of this invention are preferably microparticles with a low proportion of coarse particles, and their particle size is as uniform as possible. In other words, the particle size distribution curve is preferably steep. The steepness of the particle size distribution curve can be evaluated by the coefficient of variation of the particle size. The coefficient of variation is a value defined by (σ/D 50 )×100 (%) when the standard deviation of the particle size in the particle size distribution is set to σ (nm). From the viewpoint of reducing the surface roughness of the conductive film formed by the nickel particles, the value of the coefficient of variation of the nickel particles of this invention is preferably 14% or less. From the perspective of further reducing the surface roughness of the conductive film, the variation coefficient is preferably below 13%, and even more preferably below 12%.

變異係數越接近0%,越有助於降低導電膜之表面粗糙度,若變異係數低至8%左右,則可將導電膜之表面粗糙度降低至應充分滿足之程度。 The closer the coefficient of variation is to 0%, the more it helps reduce the surface roughness of the conductive film. If the coefficient of variation is as low as about 8%, the surface roughness of the conductive film can be reduced to a sufficiently satisfactory level.

本發明之鎳粒子較佳為鎳之結晶性較高。鎳之結晶性較高意指本發明之鎳粒子經燒結而開始收縮之溫度上升。換言之,鎳之結晶性較高如上所述意指該鎳粒子顯示出較高之耐燒結性。 The nickel particles of this invention preferably possess high crystallinity. High crystallinity means that the nickel particles of this invention begin to shrink at an increased temperature during sintering. In other words, as described above, high crystallinity of nickel indicates that the nickel particles exhibit higher sintering resistance.

利用微晶尺寸Cs(nm)相對於粒徑D50(nm)之比率Cs/D50對鎳之結晶性進行評價之方法常用於金屬粉末之技術領域中。Cs/D50之值越大,鎳越可評價為其結晶性較高。就該觀點而言,於本發明之鎳粒子中,Cs/D50之值較佳為0.3以上,更佳為0.34以上,進而較佳為0.37以上。 The method of evaluating the crystallinity of nickel using the ratio of crystallite size Cs (nm) to particle size D50 (nm), Cs/ D50 , is commonly used in the field of metal powder technology. The larger the value of Cs/D50, the higher the crystallinity of nickel can be evaluated. From this point of view, in the nickel particles of the present invention, the value of Cs/ D50 is preferably 0.3 or higher, more preferably 0.34 or higher, and even more preferably 0.37 or higher.

Cs/D50之值越大,鎳粒子經燒結而開始收縮之溫度越上升,從而於本發明中,若Cs/D50之值較佳為0.6以下,則可充分提高該溫度,就該觀點而言,Cs/D50之值更佳為0.55以下,進而較佳為0.52以下。 The higher the value of Cs/D 50 , the higher the temperature at which nickel particles begin to shrink after sintering. Therefore, in this invention, if the value of Cs/D 50 is preferably below 0.6, the temperature can be sufficiently increased. From this point of view, the value of Cs/D 50 is more preferably below 0.55, and even more preferably below 0.52.

關於微晶尺寸Cs本身之值,就充分提高鎳粒子經燒結而開始收縮之溫度之觀點而言,較佳為15nm以上70nm以下,更佳為18nm以上70nm以下,進而較佳為20nm以上70nm以下。 Regarding the crystallite size Cs itself, from the viewpoint of sufficiently increasing the temperature at which nickel particles begin to shrink after sintering, it is preferably 15 nm to 70 nm, more preferably 18 nm to 70 nm, and even more preferably 20 nm to 70 nm.

作為微晶尺寸之測定方法,已知金屬粉末之技術領域中之各種方法,本說明書中之微晶尺寸係藉由WPPF(whole powder pattern fitting,全譜擬合)法所測得之值。作為微晶尺寸之測定方法,除WPPF法以外,還已知謝樂法,但於結晶變形程度較大之情形時,基於謝樂法所求出之微晶尺寸之值缺乏可靠性,因此本發明採用此種風險較小之WPPF法。 Various methods are known in the field of metal powder technology for measuring crystallite size. The crystallite size values in this specification are obtained by the WPPF (whole powder pattern fitting) method. Besides the WPPF method, the Seller method is also known for measuring crystallite size; however, in cases of significant crystallization deformation, the crystallite size values obtained using the Seller method lack reliability. Therefore, this invention adopts the less risky WPPF method.

基於WPPF法之鎳之微晶尺寸之測定方法之詳細情況於下述實施例中進行說明。 The details of the method for determining nickel crystallite size based on the WPPF method are explained in the following examples.

本發明之鎳粒子較佳為不過度提高電阻。於將此種鎳粒子用於例如MLCC之內部電極之情形時,可進一步提昇該MLCC之性能。因此,為了不過度提高電阻,較佳為以具有包含鎳-金屬M合金之表面區域之鎳粒子中之純鎳成分增多之方式,控制該鎳粒子之晶體結構。就該觀點而言,於本發明之鎳粒子中,鎳之晶體結構中之晶格之a軸長度較佳為3.520Å以上3.529Å以下,更佳為3.522Å以上3.526Å以下,進而較佳為3.523Å以上3.526Å以下,進而更佳為3.524Å以上3.526Å以下。 The nickel particles of this invention preferably do not excessively increase resistance. When such nickel particles are used, for example, as internal electrodes in MLCCs, the performance of the MLCC can be further improved. Therefore, in order to avoid excessively increasing resistance, it is preferable to control the crystal structure of the nickel particles by increasing the pure nickel content in the nickel particles having a surface region comprising a nickel-metal M alloy. From this perspective, in the nickel particles of this invention, the a-axis length of the nickel lattice in the crystal structure is preferably 3.520 Å to 3.529 Å, more preferably 3.522 Å to 3.526 Å, further preferably 3.523 Å to 3.526 Å, and even more preferably 3.524 Å to 3.526 Å.

鎳粒子之晶體結構中之晶格之a軸長度如下述實施例中所記載般,可藉由使用CuKα1射線之X射線繞射裝置進行測定。對於解析, 如下述實施例中所記載般,藉由WPPF法求出。 The a-axis length of the nickel particle lattice, as described in the following embodiments, can be determined using an X-ray diffraction apparatus for CuKα1 rays. For analytical determination, it is obtained using the WPPF method, as described in the following embodiments.

本發明之鎳之晶體結構之微晶尺寸或晶格之a軸長度可藉由如下方式達成:例如調整該鎳粒子於其表面區域包含金屬元素M之比率,或減小鎳粒子所具有之包含鎳-金屬M合金之表面區域之厚度。除此以外,亦可藉由適當地調整下述鎳粒子之製造方法中之條件而達成,或藉由適當地調整下述鎳粒子之製造方法中之條件而達成來代替上述操作。 The crystallite size or a-axis length of the nickel lattice structure of this invention can be achieved, for example, by adjusting the ratio of metallic element M in the surface region of the nickel particles, or by reducing the thickness of the surface region containing the nickel-metal M alloy. Alternatively, it can be achieved by appropriately adjusting the conditions in the following nickel particle manufacturing method, or by appropriately adjusting the conditions in the following nickel particle manufacturing method, instead of the above operations.

本發明之鎳粒子之耐燒結性之程度能夠以該鎳粒子作為對象並藉由熱機械分析(TMA)進行評價。於本發明中,將以室溫(25℃)為基準之TMA收縮率(%)成為5%之溫度定義為開始收縮溫度。就更進一步提高鎳粒子之耐燒結性之方面而言,該溫度較佳為400℃以上。就使該優點更加顯著之觀點而言,更佳為450℃以上,進而較佳為500℃以上,進而更佳為550℃以上,尤佳為570℃以上。 The sintering resistance of the nickel particles of this invention can be evaluated using the nickel particles themselves via thermomechanical analysis (TMA). In this invention, the temperature at which the TMA shrinkage rate (%) reaches 5% based on room temperature (25°C) is defined as the initial shrinkage temperature. For further improving the sintering resistance of the nickel particles, this temperature is preferably 400°C or higher. From the viewpoint of making this advantage even more significant, it is more preferably 450°C or higher, further preferably 500°C or higher, even more preferably 550°C or higher, and most preferably 570°C or higher.

繼而,對本發明之鎳粒子之較佳製造方法進行說明。於本製造方法中,藉由所謂之多元醇法製造鎳粒子。多元醇法係使用多元醇作為兼做還原劑之溶劑之方法。於多元醇法中,在使鎳之化學物種存在於多元醇中之狀態下進行加熱,發生還原為鎳母粒子之反應,在該還原反應結束前混合金屬元素M之化合物,進一步進行加熱而發生還原為金屬M之反應,使該鎳母粒子形成包含鎳-金屬M合金之表面區域。 Next, a preferred method for manufacturing the nickel particles of this invention will be described. In this method, the nickel particles are manufactured using a so-called polyol method. The polyol method uses a polyol as a solvent that also acts as a reducing agent. In the polyol method, the nickel chemical species are heated in the presence of a polyol to undergo a reduction reaction to nickel master particles. Before the reduction reaction is completed, a compound of metal element M is mixed in and further heated to undergo a reduction reaction to metal M, thereby forming a surface region containing a nickel-metal M alloy in the nickel master particles.

於本製造方法中,就順利獲得目標鎳粒子之觀點而言,較佳為使用氫氧化鎳作為用於生成鎳粒子之鎳之化學物種。氫氧化鎳被添加至包含多元醇、聚乙烯吡咯啶酮(以下,亦稱為「PVP」)及聚乙烯亞胺(以下,亦稱為「PEI」)之混合液中。就使用性之觀點而言,氫氧化鎳較佳為使用具有粒子狀形態者。 In this manufacturing method, from the viewpoint of successfully obtaining the target nickel particles, nickel hydroxide is preferably used as the nickel chemical used to generate the nickel particles. Nickel hydroxide is added to a mixture comprising a polyol, polyvinylpyrrolidone (hereinafter also referred to as "PVP"), and polyethyleneimine (hereinafter also referred to as "PEI"). From a usability perspective, nickel hydroxide in a particulate form is preferred.

如上所述,混合液中所包含之多元醇用作溶劑,且亦用作氫氧化鎳之還原劑。 As mentioned above, the polyol contained in the mixture serves as a solvent and also as a reducing agent for nickel hydroxide.

多元醇例如可使用乙二醇、二乙二醇、三乙二醇、四乙二醇、1,2-丙二醇、二丙二醇、1,2-丁二醇、1,3-丁二醇、1,4-丁二醇、2,3-丁二醇1,5-戊二醇及聚乙二醇等。該等多元醇可單獨使用或組合兩種以上使用。該等多元醇中之乙二醇由於羥基於分子量中所占之比率較大,從而還原性能較高,又,於常溫下為液態,使用性優異,故而較佳。 Polyols such as ethylene glycol, diethylene glycol, triethylene glycol, tetraethylene glycol, 1,2-propanediol, dipropylene glycol, 1,2-butanediol, 1,3-butanediol, 1,4-butanediol, 2,3-butanediol, 1,5-pentanediol, and polyethylene glycol can be used. These polyols can be used alone or in combination of two or more. Ethylene glycol, in particular, has a higher proportion of hydroxyl groups in its molecular weight, resulting in higher reducing properties. Furthermore, it is liquid at room temperature, offering excellent usability, and is therefore preferred.

關於多元醇之使用量,考慮到將其作為還原劑之觀點,根據混合液中之氫氧化鎳之量適宜地調整即可,因此無需設置特別限定。另一方面,於作為溶劑發揮功能之情形時,混合液之性狀根據混合液中之多元醇之濃度而發生變化,因此存在一定之適當濃度範圍。就該觀點而言,混合液中之多元醇之濃度較佳為設定為50質量%以上99.8質量%以下之範圍。 Regarding the amount of polyol used, considering its use as a reducing agent, it can be adjusted appropriately based on the amount of nickel hydroxide in the mixture, therefore no special limitation is needed. On the other hand, when functioning as a solvent, the properties of the mixture change depending on the concentration of the polyol, thus there is a certain suitable concentration range. From this perspective, the concentration of the polyol in the mixture is preferably set in the range of 50% by mass to 99.8% by mass.

PVP用作氫氧化鎳之分散劑。PVP作為分散劑之效果顯著,可使由還原所產生之鎳粒子之粒度分佈陡峭,故而較佳。該等PVP之分子量根據其水溶性之程度或分散能力適當地調整即可。混合液中之PVP之量較佳為相對於將氫氧化鎳換算為鎳之100質量份而設為0.01質量份以上30質量份以下。藉由設定為該範圍,可不過度提高混合液之黏度而充分表現出分散效果。 PVP is used as a dispersant for nickel hydroxide. PVP is highly effective as a dispersant, resulting in a steeper particle size distribution of nickel particles produced by reduction. The molecular weight of these PVPs can be adjusted appropriately according to their water solubility and dispersing ability. The amount of PVP in the mixture is preferably between 0.01 and 30 parts by mass relative to 100 parts by mass of nickel (converted to nickel). By setting it within this range, the viscosity of the mixture can be increased excessively while achieving sufficient dispersion.

PEI具有如下作用:於混合液中生成鎳之核時,減少混合液中之鎳離子數,以免核生成與核生長同時進行。其理由在於:(a)PEI具有與鎳離子具有相互作用之非共用電子對,且可與鎳離子配位鍵結;(b)PEI具有大量上述非共用電子對;及(c)PEI具有可與於混合液中以未溶 解狀態存在之氫氧化鎳之表面具有相互作用之氫鍵部位。 PEI serves the following purpose: during the formation of nickel nuclei in a mixture, it reduces the number of nickel ions in the mixture, preventing nucleus formation and growth from occurring simultaneously. The reasons are: (a) PEI possesses non-shared electron pairs that interact with nickel ions and can coordinate with them; (b) PEI has a large number of these non-shared electron pairs; and (c) PEI has hydrogen bond sites that can interact with the surface of nickel hydroxide present in an undissolved state in the mixture.

藉由使PEI存在於混合液中,可依序進行鎳之核生成及所生成之核之生長。結果,順利獲得微粒且具有均勻粒徑之鎳粒子。相對於此,先前藉由還原製造鎳粒子時,核生成與核生長同時進行,因此容易生成粗大粒子,並且,粒徑容易產生不均。 By introducing PEI into the mixture, nickel nucleation and the growth of the generated nuclei can proceed sequentially. As a result, nickel particles with uniform particle size are successfully obtained. In contrast, in the previous reduction method for producing nickel particles, nucleation and growth occurred simultaneously, which easily resulted in coarse particles and uneven particle size.

就以上觀點而言,相較於使用直鏈狀PEI而言,使用支鏈狀PEI更有利。就相同觀點而言,亦較佳為使用數量平均分子量為600以上10000以下、尤其是800以上5000以下、尤其是1000以上3000以下之PEI。 Based on the above considerations, using branched PEI is more advantageous than using linear PEI. Similarly, it is also preferable to use PEI with a number average molecular weight of 600 to 10,000, particularly 800 to 5,000, and especially 1,000 to 3,000.

尤其是,於本製造方法中,藉由將混合液中所包含之PVP與PEI之比率設定於特定範圍,確實地依序進行鎳之核生成及核生長。詳細而言,較佳為使用相對於1質量份之PEI為30質量份以上200質量份以下之PVP,更佳為使用40質量份以上150質量份以下,進而較佳為使用50質量份以上130質量份以下。 In particular, in this manufacturing method, by setting the ratio of PVP to PEI in the mixture within a specific range, nickel nucleation and growth are reliably and sequentially carried out. Specifically, it is preferable to use PVP at a ratio of 30 to 200 parts by mass relative to 1 part by mass of PEI, more preferably 40 to 150 parts by mass, and even more preferably 50 to 130 parts by mass.

混合液中之PEI之量以PVP與PEI之比率滿足上述範圍作為條件,根據PVP之量而適當地設定。 The amount of PEI in the mixture is set appropriately based on the PVP content, ensuring that the PVP to PEI ratio meets the above-mentioned range.

混合液中亦可含有貴金屬觸媒。藉此,於還原之初始階段,生成貴金屬之微細之核粒子,以該核粒子作為起點,順利地還原鎳。貴金屬觸媒例如可使用貴金屬之水溶性鹽等貴金屬化合物。作為貴金屬之水溶性鹽之例,可例舉鈀、銀、鉑、金等水溶性鹽。於使用鈀作為貴金屬之情形時,例如可使用氯化鈀、硝酸鈀、乙酸鈀、氯化銨鈀等。於使用銀之情形時,例如可使用硝酸銀、乳酸銀、氧化銀、硫酸銀、環己酸銀、乙酸銀等。於使用鉑之情形時,例如可使用氯鉑酸、氯鉑酸鉀、氯鉑酸鈉等。於使用金之情形時,例如可使用氯金酸、氯金酸鈉等。該等中,硝酸 鈀、乙酸鈀、硝酸銀及乙酸銀由於廉價且經濟性較佳,故而適宜使用。貴金屬觸媒能夠以上述化合物之形態或使該化合物溶解於水而成之水溶液之形態添加而使用。混合液中所含有之貴金屬觸媒之量較佳為相對於將氫氧化鎳換算為鎳之100質量份為0.01質量份以上5質量份以下、尤其是0.01質量份以上1質量份以下。 The mixture may also contain a noble metal catalyst. This allows for the initial formation of fine nuclei of the noble metal during the reduction phase, using these nuclei as a starting point for the successful reduction of nickel. The noble metal catalyst can be, for example, water-soluble salts of noble metals or other noble metal compounds. Examples of water-soluble salts of noble metals include those of palladium, silver, platinum, and gold. When using palladium as the noble metal, palladium chloride, palladium nitrate, palladium acetate, and palladium ammonium chloride can be used, for example. When using silver, silver nitrate, silver lactate, silver oxide, silver sulfate, silver cyclohexanoate, and silver acetate can be used, for example. When using platinum, for example, chloroplatinic acid, potassium chloroplatinate, sodium chloroplatinate, etc., can be used. When using gold, for example, chloroauric acid, sodium chloroaurate, etc., can be used. Among these, palladium nitrate, palladium acetate, silver nitrate, and silver acetate are suitable for use due to their low cost and good economic efficiency. The precious metal catalyst can be added in the form of the above-mentioned compounds or in the form of an aqueous solution of the compounds dissolved in water. The amount of precious metal catalyst contained in the mixture is preferably 0.01 parts by mass to 5 parts by mass, especially 0.01 parts by mass to 1 part by mass, relative to 100 parts by mass of nickel hydroxide converted to nickel.

一面對包含以上各成分之混合液進行攪拌,一面進行加熱,而進行氫氧化鎳之還原。加熱溫度亦取決於所使用之多元醇之種類,於大氣壓下以較佳為150℃以上200℃以下、更佳為170℃以上200℃以下、進而較佳為190℃以上200℃以下進行加熱,藉此可順利地將氫氧化鎳還原為鎳母粒子。 The nickel hydroxide reduction is achieved by simultaneously stirring and heating the mixture containing the above components. The heating temperature depends on the type of polyol used, preferably between 150°C and 200°C, more preferably between 170°C and 200°C, and even more preferably between 190°C and 200°C, under atmospheric pressure. This facilitates the successful reduction of nickel hydroxide to nickel precursor particles.

繼而,在氫氧化鎳之還原反應結束之前,向上述混合液中混合金屬元素M之化合物。換言之,於殘存有一部分氫氧化鎳之狀態下,向上述混合液中混合金屬元素M之化合物。此處所謂之「氫氧化鎳之還原反應結束前」係指將加入量之氫氧化鎳還原80mol%以上之前。 Next, before the reduction reaction of nickel hydroxide is completed, a compound of metal element M is mixed into the above mixture. In other words, the compound of metal element M is mixed into the above mixture while a portion of nickel hydroxide remains. Here, "before the reduction reaction of nickel hydroxide is completed" means before the added nickel hydroxide is reduced to 80 mol% or more.

於金屬元素M為鉍之情形時,於下述金屬元素M之化合物之還原反應中,就順利地於鎳母粒子形成包含鎳-金屬M合金之表面區域之觀點而言,該化合物較佳為使用選自由硝酸鉍、氯化鉍、硝酸鉍五水合物、氫氧化鉍、氧化鉍及碳酸鉍所組成之群中之至少一種,尤佳為使用氯化鉍。 When the metal element M is bismuth, in the reduction reaction of the following metal element M compound, from the viewpoint of successfully forming a surface region containing a nickel-metal M alloy on the nickel masterbatch particles, the compound is preferably at least one selected from the group consisting of bismuth nitrate, bismuth chloride, bismuth nitrate pentahydrate, bismuth hydroxide, bismuth oxide, and bismuth carbonate, with bismuth chloride being particularly preferred.

於金屬元素M為銅之情形時,就與上述相同之觀點而言,該化合物較佳為使用選自由硝酸銅三水合物、硫酸銅五水合物、乙酸銅一水合物、氫氧化銅、氧化亞銅及氧化銅所組成之群中之至少一種,尤佳為使用硫酸銅五水合物。 When the metallic element M is copper, from the same perspective as above, the compound is preferably made of at least one selected from the group consisting of copper nitrate trihydrate, copper sulfate pentahydrate, copper acetate monohydrate, copper hydroxide, copper monoxide, and copper oxide, with copper sulfate pentahydrate being particularly preferred.

於金屬元素M為鐵之情形時,就與上述相同之觀點而言,該化合物 較佳為使用選自由硝酸鐵九水合物、氯化鐵六水合物、硫酸鐵七水合物、氫氧化鐵及氧化鐵所組成之群中之至少一種,尤佳為使用硫酸鐵七水合物。 When the metallic element M is iron, from the same perspective as above, the compound is preferably made of at least one selected from the group consisting of ferric nitrate nonahydrate, ferric chloride hexahydrate, ferric sulfate heptahydrate, ferric hydroxide, and ferric oxide, with ferric sulfate heptahydrate being particularly preferred.

於金屬元素M為鉬之情形時,就與上述相同之觀點而言,該化合物較佳為使用選自由鉬酸鈉、鉬酸鉀、鉬酸鈣及鉬酸銨所組成之群中之至少一種,尤佳為使用鉬酸鈉。 When the metallic element M is molybdenum, for the same reasons mentioned above, the compound is preferably made of at least one selected from the group consisting of sodium molybdate, potassium molybdate, calcium molybdate, and ammonium molybdate, with sodium molybdate being particularly preferred.

於金屬元素M為鉍之情形時,就順利地於鎳母粒子形成包含鎳與鉍之合金之表面區域之觀點而言,混合液中之鉍化合物之量較佳為換算為鉍,且相對於加入之1質量份之鎳量,設為0.003質量份以上,更佳為設為0.004質量份以上,進而較佳為設為0.01質量份以上,進而更佳為設為0.02質量份以上。又,混合液中之鉍化合物之量較佳為換算為鉍,且相對於加入之1質量份之鎳量,設為0.20質量份以下,更佳為設為0.16質量份以下,進而較佳為設為0.13質量份以下,進而更佳為設為0.12質量份以下。 When the metallic element M is bismuth, from the viewpoint of successfully forming a surface region containing an alloy of nickel and bismuth on the nickel masterbatch particles, the amount of bismuth compound in the mixture is preferably converted to bismuth, and is set to 0.003 parts by mass or more, more preferably 0.004 parts by mass or more, even more preferably 0.01 parts by mass or more, and even more preferably 0.02 parts by mass or more, relative to 1 part by mass of nickel added. Furthermore, the amount of bismuth compound in the mixture is preferably converted to bismuth, and is set to 0.20 parts by mass or less, more preferably 0.16 parts by mass or less, even more preferably 0.13 parts by mass or less, and even more preferably 0.12 parts by mass or less, relative to 1 part by mass of nickel added.

於金屬元素M為銅之情形時,就順利地於鎳母粒子形成包含鎳與銅之合金之表面區域之觀點而言,混合液中之銅化合物之量較佳為換算為銅,且相對於加入之1質量份之鎳量,設為0.004質量份以上,更佳為設為0.01質量份以上,進而較佳為設為0.022質量份以上,進而更佳為設為0.045質量份以上。又,混合液中之銅化合物之量較佳為換算為銅,且相對於加入之1質量份之鎳量,設為0.12質量份以下,更佳為設為0.082質量份以下,進而較佳為設為0.07質量份以下,進而更佳為設為0.06質量份以下。 When the metal element M is copper, from the viewpoint of successfully forming a surface region containing an alloy of nickel and copper in the nickel master particles, the amount of copper compound in the mixture is preferably converted to copper, and is set to 0.004 parts by mass or more, more preferably 0.01 parts by mass or more, even more preferably 0.022 parts by mass or more, and even more preferably 0.045 parts by mass or more, relative to 1 part by mass of nickel added. Furthermore, the amount of copper compound in the mixture is preferably converted to copper, and relative to 1 part by mass of nickel added, it is set to 0.12 parts by mass or less, more preferably 0.082 parts by mass or less, even more preferably 0.07 parts by mass or less, and even more preferably 0.06 parts by mass or less.

於金屬元素M為鐵之情形時,就順利地於鎳母粒子形成包 含鎳與鐵之合金之表面區域之觀點而言,混合液中之鐵化合物之量較佳為換算為鐵,且相對於加入之1質量份之鎳量,設為0.0009質量份以上,更佳為設為0.0028質量份以上,進而較佳為設為0.004質量份以上,進而更佳為設為0.0047質量份以上。又,混合液中之鐵化合物之量較佳為換算為鐵,且相對於加入之1質量份之鎳量,設為0.12質量份以下,更佳為設為0.08質量份以下,進而較佳為設為0.06質量份以下,進而更佳為設為0.030質量份以下,尤佳為設為0.020質量份以下。 When the metallic element M is iron, from the viewpoint of successfully forming a surface region containing an alloy of nickel and iron in the nickel master particles, the amount of iron compound in the mixture is preferably converted to iron, and relative to 1 part by mass of nickel added, it is set to 0.0009 parts by mass or more, more preferably 0.0028 parts by mass or more, even more preferably 0.004 parts by mass or more, and even more preferably 0.0047 parts by mass or more. Furthermore, the amount of iron compound in the mixture is preferably converted to iron, and relative to 1 part by mass of nickel added, it is set to 0.12 parts by mass or less, more preferably 0.08 parts by mass or less, further preferably 0.06 parts by mass or less, more preferably 0.030 parts by mass or less, and most preferably 0.020 parts by mass or less.

於金屬元素M為鉬之情形時,就順利地於鎳母粒子形成包含鎳與鉬之合金之表面區域之觀點而言,混合液中之鉬化合物之量較佳為換算為鉬,且相對於加入之1質量份之鎳量,設為0.004質量份以上,更佳為設為0.01質量份以上,進而較佳為設為0.013質量份以上,進而更佳為設為0.016質量份以上。又,混合液中之鉬化合物之量較佳為換算為鉬,且相對於加入之1質量份之鎳量,設為0.12質量份以下,更佳為設為0.07質量份以下,進而較佳為設為0.06質量份以下,進而更佳為設為0.051質量份以下,尤佳為設為0.034質量份以下。 When the metallic element M is molybdenum, from the viewpoint of successfully forming a surface region containing an alloy of nickel and molybdenum on the nickel master particles, the amount of molybdenum compound in the mixture is preferably converted to molybdenum, and is set to 0.004 parts by mass or more, more preferably 0.01 parts by mass or more, even more preferably 0.013 parts by mass or more, and even more preferably 0.016 parts by mass or more, relative to 1 part by mass of nickel added. Furthermore, the amount of molybdenum compound in the mixture is preferably converted to molybdenum, and relative to 1 part by mass of nickel added, it is set to 0.12 parts by mass or less, more preferably 0.07 parts by mass or less, further preferably 0.06 parts by mass or less, more preferably 0.051 parts by mass or less, and most preferably 0.034 parts by mass or less.

繼而,一面對包含以上金屬元素M之化合物之混合液進行攪拌,一面進行加熱,而進行上述混合液中之氫氧化鎳及該化合物之還原。藉由該還原反應,將混合液中殘存之氫氧化鎳還原為鎳,於金屬元素M為鉍之情形時,將金屬元素M之化合物還原為鉍。或者,於金屬元素M為銅之情形時,將金屬元素M之化合物還原為銅。或者,於金屬元素M為鐵之情形時,將金屬元素M之化合物還原為鐵。或者,於金屬元素M為鉬之情形時,將金屬元素M之化合物還原為鉬。於該還原反應中,藉由同時還原氫氧化鎳與金屬元素M之化合物,於鎳母粒子之表面形成包含鎳元素 與金屬M均質固溶而成之鎳-金屬M合金之表面區域。再者,只要可發揮本發明之效果,就容許金屬元素M之一部分以金屬元素M之單質之狀態、金屬元素M之化合物之狀態、或將其等組合兩種以上之狀態存在。 Next, while stirring and heating the mixture containing the compound of the aforementioned metal element M, the nickel hydroxide and the compound in the mixture are reduced. Through this reduction reaction, the residual nickel hydroxide in the mixture is reduced to nickel. If metal element M is bismuth, the compound of metal element M is reduced to bismuth. Alternatively, if metal element M is copper, the compound of metal element M is reduced to copper. Alternatively, if metal element M is iron, the compound of metal element M is reduced to iron. Alternatively, if metal element M is molybdenum, the compound of metal element M is reduced to molybdenum. In this reduction reaction, by simultaneously reducing nickel hydroxide and the compound of metallic element M, a surface region of a nickel-metal M alloy containing nickel and metallic M homogeneously dissolved in solid solution is formed on the surface of the nickel master particles. Furthermore, as long as the effects of this invention can be achieved, a portion of metallic element M can exist in the state of elemental metallic element M, in the state of a compound of metallic element M, or in a combination of two or more states.

上述混合液之加熱溫度亦取決於所使用之多元醇或金屬元素M之化合物之種類,於大氣壓下,較佳為150℃以上200℃以下,更佳為170℃以上200℃以下,進而較佳為190℃以上200℃以下。藉由使加熱溫度處於該範圍內,可同時還原氫氧化鎳及金屬元素M之化合物,順利地於鎳母粒子之表面形成包含鎳-金屬M合金之表面區域。 The heating temperature of the above-mentioned mixture also depends on the type of polyol or metal element M compound used. Under atmospheric pressure, it is preferably between 150°C and 200°C, more preferably between 170°C and 200°C, and even more preferably between 190°C and 200°C. By keeping the heating temperature within this range, both nickel hydroxide and the metal element M compound can be simultaneously reduced, successfully forming a surface region containing a nickel-metal M alloy on the surface of the nickel masterbatch particles.

其後,視需要將所獲得之鎳粒子之分散液中之多元醇置換為水,繼而,將所置換之水再置換為甲醇,洗淨該鎳粒子,進行真空乾燥。能夠以此方式製造本發明之鎳粒子。 Subsequently, if necessary, the polyol in the obtained nickel particle dispersion is replaced with water, and then the replaced water is replaced with methanol to wash the nickel particles, followed by vacuum drying. This method enables the production of the nickel particles of the present invention.

於製造包含金屬元素M之鎳粒子之情形時,可向鎳原料中添加金屬元素M之原料而進行PVD法或CVD法。此時之鎳粒子整體形成鎳-金屬M合金。但是,於欲提高該鎳粒子之耐燒結性之情形時,存在如下問題:作為鎳粒子整體中之金屬元素M之鉍、銅、鐵及/或鉬之含量過度提高,結果,電阻提高。除此以外,還存在如下問題:由於鎳粒子之粒徑不均勻,故而在使用該鎳粒子形成導電膜時導電膜之表面粗糙,成為MLCC之內部電極間產生短路之原因之一。又,作為製造包含金屬元素M之鎳粒子之另一方法,已知一種如專利文獻2中所記載地將氫氧化鎳全部還原後添加金屬元素M之化合物之方法。於該情形時,若使用鉍及/或銅作為金屬元素M,則於鎳粒子之表面形成熔點比鎳低之鉍及/或銅單質層。但是,該鎳粒子之耐燒結性由於粒子之表面包含鉍及/或銅單質層而不高。又,於使用鐵及/或鉬作為金屬元素M之情形時,由於單質鐵及鉬 容易氧化,而於鎳粒子之表面形成包含鐵氧化物及/或鉬氧化物之層。於製造MLCC時對形成有此種層之鎳粒子進行焙燒之情形時,該層中所包含之氧化物被介電層吸收,故而該鎳粒子之耐燒結性亦不高。相對於此,根據包含鎳母粒子及配置於其表面之鎳-金屬M合金之本發明之鎳粒子,可不過度提高電阻而提高耐燒結性。進而,若使用本發明之鎳粒子形成導電膜,則可使該導電膜之表面平滑。根據該等理由,如上所述,較佳為於殘存有一部分氫氧化鎳之狀態下,同時還原該氫氧化鎳與金屬元素M之化合物而製造鎳粒子。 When manufacturing nickel particles containing metallic element M, PVD or CVD methods can be used to add metallic element M to the nickel raw material. The nickel particles then form a nickel-metal M alloy. However, when attempting to improve the sintering resistance of these nickel particles, the following problem arises: excessively increasing the content of bismuth, copper, iron, and/or molybdenum (metallic element M) in the nickel particles results in increased electrical resistance. Furthermore, the uneven particle size of the nickel particles leads to a rough surface on the conductive film when used to form a conductive film, becoming one of the causes of short circuits between the internal electrodes of the MLCC. Furthermore, as another method for manufacturing nickel particles containing metallic element M, a method is known as described in Patent 2, which involves completely reducing nickel hydroxide and then adding a compound containing metallic element M. In this case, if bismuth and/or copper are used as metallic element M, a layer of elemental bismuth and/or copper with a melting point lower than nickel is formed on the surface of the nickel particles. However, the sintering resistance of the nickel particles is not high due to the presence of an elemental bismuth and/or copper layer on the particle surface. Also, when iron and/or molybdenum are used as metallic element M, since elemental iron and molybdenum are easily oxidized, a layer containing iron oxide and/or molybdenum oxide is formed on the surface of the nickel particles. When nickel particles with such a layer are calcined during MLCC manufacturing, the oxides contained in that layer are absorbed by the dielectric layer, resulting in low sintering resistance. In contrast, the nickel particles of this invention, comprising nickel master particles and a nickel-metal M alloy disposed on their surface, improve sintering resistance without excessively increasing resistance. Furthermore, if the nickel particles of this invention are used to form a conductive film, the surface of the conductive film can be made smooth. For these reasons, as described above, it is preferable to manufacture the nickel particles while simultaneously reducing the compound of nickel hydroxide and metal element M, even with a residual amount of nickel hydroxide.

由以上方法所製造之鎳粒子利用如下特徵而用於各種領域:微粒且粒徑均勻,並且於該鎳粒子之表面具有包含鎳-金屬M合金之表面區域。尤其是適宜用於形成MLCC之內部電極。 Nickel particles manufactured by the above method are suitable for various applications due to their microparticle size and uniform particle size, and the presence of a surface region containing a nickel-metal M alloy on the surface of the nickel particles. They are particularly suitable for forming the internal electrodes of MLCCs.

以上,對於本發明,基於其較佳實施方式進行了說明,但本發明不限於上述實施方式。 The present invention has been described above based on its preferred embodiments, but the present invention is not limited to the above-described embodiments.

關於上述實施方式,進而揭示以下之鎳粒子及其製造方法。 Regarding the above-described implementation method, the following nickel particles and their manufacturing method are further disclosed.

[1]一種鎳粒子,其係具有包含鎳與金屬元素M之合金之表面區域者,且上述金屬元素M為選自鉍、銅、鐵及鉬中之至少一種,上述金屬元素M相對於上述鎳粒子整體之含量為0.09質量%以上15.8質量%以下,在藉由X射線光電子分光分析對在上述鎳粒子之深度方向上自最表面起至以SiO2換算之濺射深度為5nm之區域進行測定時,將該區域中之金屬元素M之原子數相對於鎳元素與金屬元素M之合計原子數之比率之最大值 設為X(at%),在藉由ICP發光分光分析法對上述鎳粒子進行測定時,將金屬元素M之原子數相對於鎳元素與金屬元素M之合計原子數之比率設為Y(at%),此時,X/Y之值為0.5以上35以下。 [1] A nickel particle having a surface region comprising an alloy containing nickel and a metallic element M, wherein the metallic element M is selected from at least one of bismuth, copper, iron and molybdenum, and the content of the metallic element M relative to the total nickel particle is 0.09% by mass or more and 15.8% by mass or less, and the content of the metallic element M relative to the total nickel particle is determined by X-ray photoelectron spectrophotometry from the outermost surface to the SiO2 content. When measuring the region with a converted sputtering depth of 5 nm, the maximum value of the ratio of the number of atoms of metal element M in that region to the total number of atoms of nickel and metal element M is set as X (at%). When measuring the nickel particles by ICP emission spectrophotometry, the ratio of the number of atoms of metal element M to the total number of atoms of nickel and metal element M is set as Y (at%). At this time, the value of X/Y is 0.5 or more and 35 or less.

[2]如[1]中所記載之鎳粒子,其中在基於由掃描式電子顯微鏡測定所算出之圓當量直徑之粒度分佈中,將累積個數50個數%時之個數累積粒徑設為D50時,D50為20nm以上200nm以下,且在將上述粒度分佈中之粒徑之標準偏差設為σ(nm)時,變異係數(σ/D50)(%)之值為14%以下,變異係數(%)=(σ/D50)×100。 [2] As described in [1], in the particle size distribution based on the circular equivalent diameter calculated by scanning electron microscopy, when the cumulative particle size of the cumulative number of particles is set to D 50 , D 50 is 20 nm or more and 200 nm or less, and when the standard deviation of the particle size in the above particle size distribution is set to σ (nm), the value of the coefficient of variation (σ/D 50 ) (%) is 14% or less, and the coefficient of variation (%) = (σ/D 50 ) × 100.

[3]如[1]或[2]中所記載之鎳粒子,其中在基於由掃描式電子顯微鏡測定所算出之圓當量直徑之粒度分佈中,將累積個數50個數%時之個數累積粒徑設為D50時,具有D50之1.5倍以上之粒徑之粒子之存在比率為0.5個數%以下。 [3] As described in [1] or [2], in the particle size distribution based on the circular equivalent diameter calculated by scanning electron microscopy, when the cumulative particle size is set to D 50 when the cumulative number of particles is 50%, the proportion of particles with a diameter of more than 1.5 times D 50 is less than 0.5%.

[4]如[1]至[3]中任一項所記載之鎳粒子,其中在基於由掃描式電子顯微鏡測定所算出之圓當量直徑之粒度分佈中,將累積個數50個數%時之個數累積粒徑設為D50,且將藉由WPPF法所測得之微晶尺寸設為Cs(nm)時,Cs/D50之值為0.3以上0.6以下。 [4] Nickel particles described in any of [1] to [3], wherein in the particle size distribution based on the circular equivalent diameter calculated by scanning electron microscopy, the cumulative particle size when the cumulative number is 50% is set to D 50 , and the value of Cs/D 50 when the crystallite size measured by the WPPF method is set to Cs (nm) is 0.3 or more and 0.6 or less.

[5]一種鎳粒子之製造方法,其係對包含氫氧化鎳粒子、多元醇、聚乙烯吡咯啶酮及聚乙烯亞胺之混合液進行加熱而製造鎳粒子之方法,使用相對於1質量份之聚乙烯亞胺為30質量份以上200質量份以下之聚乙烯吡咯啶酮, 藉由上述加熱將上述氫氧化鎳粒子還原為鎳母粒子,於殘存有一部分上述氫氧化鎳粒子之狀態下,將上述混合液與金屬元素M之化合物混合,將該化合物還原為金屬M,而於上述鎳母粒子形成包含鎳與金屬元素M之合金之表面區域,且上述金屬元素M為選自鉍、銅、鐵及鉬中之至少一種。 [5] A method for manufacturing nickel particles, comprising heating a mixture containing nickel hydroxide particles, a polyol, polyvinylpyrrolidone, and polyethyleneimine to produce nickel particles, wherein polyvinylpyrrolidone is used in an amount of 30 to 200 parts by mass relative to 1 part by mass of polyethyleneimine; the nickel hydroxide particles are reduced to nickel master particles by heating; while a portion of the nickel hydroxide particles remains, the mixture is mixed with a compound of metal element M, and the compound is reduced to metal M, thereby forming a surface region of an alloy containing nickel and metal element M on the nickel master particles, wherein the metal element M is selected from at least one of bismuth, copper, iron, and molybdenum.

[6]一種積層陶瓷電容器,其將如[1]至[4]中任一項所記載之鎳粒子用於內部電極。 [6] A multilayer ceramic capacitor that uses nickel particles as described in any of [1] to [4] as internal electrodes.

實施例 Implementation Examples

以下,藉由實施例更加詳細地對本發明進行說明。然而,本發明之範圍不限於該實施例。除非特別說明,否則「%」意指「質量%」。 The invention will now be described in more detail with reference to embodiments. However, the scope of the invention is not limited to these embodiments. Unless otherwise stated, "%" means "mass %".

[實施例1] [Implementation Example 1]

向500ml之燒杯中加入445g之乙二醇、64g之氫氧化鎳粒子、12g之聚乙烯吡咯啶酮、0.14g之聚乙烯亞胺及0.13ml之硝酸鈀水溶液(濃度:100g/l)而製備混合液。聚乙烯亞胺為支鏈狀,數量平均分子量為1800。一面對混合液進行攪拌,一面進行加熱,於大氣壓下以198℃進行5小時還原反應。於該時間點,相對於加入量之氫氧化鎳,氫氧化鎳之還原進行了80mol%。繼而,其後添加0.3g之氯化鉍,於大氣壓下以198℃進而進行10小時還原反應。停止加熱使還原結束,自然放置冷卻至室溫。以此方式,獲得大量鎳粒子。 A mixture was prepared by adding 445g of ethylene glycol, 64g of nickel hydroxide particles, 12g of polyvinylpyrrolidone, 0.14g of polyethyleneimine, and 0.13ml of palladium nitrate aqueous solution (concentration: 100g/L) to a 500ml beaker. The polyethyleneimine was branched and had a number average molecular weight of 1800. The mixture was stirred and heated at 198°C for 5 hours under atmospheric pressure for a reduction reaction. At this time point, the reduction of nickel hydroxide was 80 mol% relative to the amount of nickel hydroxide added. Subsequently, 0.3g of bismuth chloride was added, and a reduction reaction was carried out at 198°C for 10 hours under atmospheric pressure. Stop heating to end the reduction process, then allow it to cool naturally to room temperature. This method yields a large quantity of nickel particles.

於包含所獲得之鎳粒子之分散液之燒杯底部配置磁鐵,將該鎳粒子吸引至磁鐵。於該狀態下,去除上述分散液之上清液。 A magnet is placed at the bottom of a beaker containing a dispersion of the obtained nickel particles to attract the particles. The supernatant of the dispersion is then removed.

自燒杯底部移除磁鐵後,添加50g之純水並將分散液攪拌10分鐘。 其後,再次於燒杯底部配置磁鐵而將鎳粒子吸引至磁鐵。於該狀態下,去除上述分散液之上清液。將一系列操作重複5次。 After removing the magnet from the bottom of the beaker, add 50g of purified water and stir the dispersion for 10 minutes. Then, place the magnet back at the bottom of the beaker to attract the nickel particles. In this state, remove the supernatant from the dispersion. Repeat this process 5 times.

繼而,添加50g之甲醇並將分散液攪拌10分鐘。藉由使用磁鐵而反覆進行3次上清液之去除,將分散液中之溶劑置換為甲醇。其後,於80℃下進行真空乾燥,獲得鎳粒子。 Next, 50g of methanol was added and the dispersion was stirred for 10 minutes. The supernatant was repeatedly removed three times using a magnet to replace the solvent in the dispersion with methanol. Subsequently, the dispersion was vacuum-dried at 80°C to obtain nickel particles.

[實施例2至6] [Implementation Examples 2 to 6]

使硝酸鈀水溶液之添加量及氯化鉍之添加量、以及自開始加熱混合液起至向該混合液中添加氯化鉍之時間如表1所示。除此以外,以與實施例1相同之方式獲得鎳粒子。 The amounts of palladium nitrate aqueous solution and bismuth chloride added, as well as the time from the start of heating the mixture to the addition of bismuth chloride, are shown in Table 1. Otherwise, nickel particles were obtained in the same manner as in Example 1.

[實施例7] [Implementation Example 7]

添加硫酸銅五水合物來代替氯化鉍。使硝酸鈀水溶液之添加量及硫酸銅五水合物之添加量如表1所示。除此以外,以與實施例1相同之方式獲得鎳粒子。 Copper sulfate pentahydrate was added instead of bismuth chloride. The amounts of palladium nitrate aqueous solution and copper sulfate pentahydrate added are shown in Table 1. Otherwise, nickel particles were obtained in the same manner as in Example 1.

[實施例8] [Implementation Example 8]

添加硫酸鐵七水合物來代替氯化鉍。使硝酸鈀水溶液之添加量及硫酸鐵七水合物之添加量如表1所示。除此以外,以與實施例1相同之方式獲得鎳粒子。 Ferrous sulfate heptahydrate was added instead of bismuth chloride. The amounts of palladium nitrate aqueous solution and ferric sulfate heptahydrate added are shown in Table 1. Otherwise, nickel particles were obtained in the same manner as in Example 1.

[實施例9] [Implementation Example 9]

添加鉬酸鈉來代替氯化鉍。使硝酸鈀水溶液之添加量及鉬酸鈉之添加量如表1所示。除此以外,以與實施例1相同之方式獲得鎳粒子。 Sodium molybdate was added instead of bismuth chloride. The amounts of palladium nitrate aqueous solution and sodium molybdate added are shown in Table 1. Otherwise, nickel particles were obtained in the same manner as in Example 1.

[比較例1] [Comparative example 1]

向500ml之燒杯中加入445g之乙二醇、64g之氫氧化鎳粒子、8g之聚乙烯吡咯啶酮、0.14g之聚乙烯亞胺及0.13ml之硝酸鈀水溶液(濃度: 100g/l)而製備混合液。聚乙烯亞胺為支鏈狀,數量平均分子量為1800。一面對混合液進行攪拌,一面進行加熱,於198℃下進行6.5小時還原反應。停止加熱使還原結束,自然放置冷卻至室溫。以此方式,獲得大量鎳粒子。 A mixture was prepared by adding 445g of ethylene glycol, 64g of nickel hydroxide particles, 8g of polyvinylpyrrolidone, 0.14g of polyethyleneimine, and 0.13ml of palladium nitrate aqueous solution (concentration: 100g/L) to a 500ml beaker. The polyethyleneimine was branched and had a number-average molecular weight of 1800. The mixture was stirred and heated at 198°C for 6.5 hours for a reduction reaction. Heating was then stopped to allow the reduction to complete, and the mixture was allowed to cool naturally to room temperature. This method yielded a large quantity of nickel particles.

於包含所獲得之鎳粒子之分散液之燒杯底部配置磁鐵,將該鎳粒子吸引至磁鐵。於該狀態下,去除上述分散液之上清液。 A magnet is placed at the bottom of a beaker containing a dispersion of the obtained nickel particles to attract the particles. The supernatant of the dispersion is then removed.

自燒杯底部移除磁鐵後,添加50g之純水並將分散液攪拌10分鐘。其後,再次於燒杯底部配置磁鐵而將鎳粒子吸引至磁鐵。於該狀態下,去除上述分散液之上清液。將一系列操作重複5次。 After removing the magnet from the bottom of the beaker, add 50g of purified water and stir the dispersion for 10 minutes. Then, place the magnet back at the bottom of the beaker to attract the nickel particles. In this state, remove the supernatant from the dispersion. Repeat this process 5 times.

繼而,添加50g之甲醇並將分散液攪拌10分鐘。藉由使用磁鐵而反覆進行3次上清液之去除,將分散液中之溶劑置換為甲醇。其後,於80℃下進行真空乾燥,獲得鎳粒子之粉末。 Next, 50g of methanol was added and the dispersion was stirred for 10 minutes. The supernatant was repeatedly removed three times using a magnet to replace the solvent in the dispersion with methanol. Subsequently, the dispersion was vacuum-dried at 80°C to obtain nickel particle powder.

[比較例2] [Comparative example 2]

在進行氫氧化鎳之還原反應之前添加氯化鉍,除此以外,以與實施例1相同之方式獲得鎳粒子。 Bismuth chloride was added before the reduction reaction of nickel hydroxide, and nickel particles were otherwise obtained in the same manner as in Example 1.

[比較例3] [Comparative example 3]

向500ml之燒杯中加入445g之乙二醇、64g之氫氧化鎳粒子、8g之聚乙烯吡咯啶酮、0.14g之聚乙烯亞胺及0.13ml之硝酸鈀水溶液(濃度:100g/l)而製備混合液。聚乙烯亞胺為支鏈狀,數量平均分子量為1800。一面對混合液進行攪拌,一面進行加熱,於198℃下進行6.5小時還原反應。停止加熱使還原結束,自然放置冷卻至室溫。以此方式,獲得大量鎳粒子。 A mixture was prepared by adding 445g of ethylene glycol, 64g of nickel hydroxide particles, 8g of polyvinylpyrrolidone, 0.14g of polyethyleneimine, and 0.13ml of palladium nitrate aqueous solution (concentration: 100g/L) to a 500ml beaker. The polyethyleneimine was branched and had a number-average molecular weight of 1800. The mixture was stirred and heated at 198°C for 6.5 hours to allow the reduction reaction to complete. Heating was then stopped, and the mixture was allowed to cool naturally to room temperature. This method yielded a large quantity of nickel particles.

於包含所獲得之鎳粒子之分散液之燒杯底部配置磁鐵,將該鎳粒子 吸引至磁鐵。於該狀態下,去除上述分散液之上清液。 A magnet is placed at the bottom of a beaker containing a dispersion of the obtained nickel particles, attracting the nickel particles to the magnet. Under these conditions, the supernatant of the dispersion is removed.

自燒杯底部移除磁鐵後,添加50g之純水並將分散液攪拌10分鐘。其後,再次於燒杯底部配置磁鐵而將鎳粒子吸引至磁鐵。於該狀態下,去除上述分散液之上清液。將一系列操作重複5次。 After removing the magnet from the bottom of the beaker, add 50g of purified water and stir the dispersion for 10 minutes. Then, place the magnet back at the bottom of the beaker to attract the nickel particles. In this state, remove the supernatant from the dispersion. Repeat this process 5 times.

向該分散液中添加300g之純水及一水合肼並升溫至60℃後,添加1g之錫酸鈉三水合物,攪拌5小時,藉由錫對鎳粒子實施表面處理。 Add 300g of purified water and hydrazine monohydrate to the dispersion and heat to 60°C. Then add 1g of sodium stannate trihydrate and stir for 5 hours to perform surface treatment on the nickel particles using tin.

於包含所獲得之鎳粒子之分散液之燒杯底部配置磁鐵,將該鎳粒子吸引至磁鐵。於該狀態下,去除上述分散液之上清液。 A magnet is placed at the bottom of a beaker containing a dispersion of the obtained nickel particles to attract the particles. The supernatant of the dispersion is then removed.

自燒杯底部移除磁鐵後,添加50g之純水並將分散液攪拌10分鐘。其後,再次於燒杯底部配置磁鐵而將鎳粒子吸引至磁鐵。於該狀態下,去除上述分散液之上清液。將一系列操作重複5次。 After removing the magnet from the bottom of the beaker, add 50g of purified water and stir the dispersion for 10 minutes. Then, place the magnet back at the bottom of the beaker to attract the nickel particles. In this state, remove the supernatant from the dispersion. Repeat this process 5 times.

繼而,添加50g之甲醇並將分散液攪拌10分鐘。藉由使用磁鐵而反覆進行3次上清液之去除,將分散液中之溶劑置換為甲醇。其後,於80℃下進行真空乾燥,獲得藉由錫實施了表面處理之鎳粒子之粉末。如下述[評價1]中所記載地確認鎳粒子之表面區域不含鎳與錫之合金,形成有錫表面層。 Next, 50 g of methanol was added and the dispersion was stirred for 10 minutes. The supernatant was repeatedly removed three times using a magnet to replace the solvent in the dispersion with methanol. Subsequently, the dispersion was vacuum-dried at 80°C to obtain nickel particle powder with a tin surface treatment. As described in [Evaluation 1] below, the surface region of the nickel particles was confirmed to be free of nickel-tin alloy, forming a tin surface layer.

[評價1] [Review 1]

對於實施例1至9及比較例1至3所獲得之鎳粒子,藉由以下XPS分析方法求出X之值及X1之值。 For the nickel particles obtained in Examples 1 to 9 and Comparative Examples 1 to 3, the values of X and X1 were determined using the following XPS analysis method.

又,藉由ICP發光分光分析法求出鉍元素、銅元素、鐵元素及鉬元素相對於鎳粒子整體之含量及Y之值。 Furthermore, the relative abundances of bismuth, copper, iron, and molybdenum in the nickel particles and the value of Y were determined using ICP-ELISA.

又,藉由上述方法測定粒度分佈,求出粒徑D50、粗大粒子存在比率及變異係數。 Furthermore, by using the above method to determine the particle size distribution, the particle size D50 , the proportion of coarse particles, and the coefficient of variation are obtained.

又,藉由以下方法求出基於WPPF法之鎳之a軸長度及微晶尺寸Cs。 Furthermore, the a-axis length and crystallite size Cs of nickel based on the WPPF method were determined using the following method.

又,藉由上述方法確認鎳粒子之表面區域是否包含鎳與鉍之合金、是否包含鎳與銅之合金、是否包含鎳與鐵之合金、或是否包含鎳與鉬之合金。 Furthermore, the above method is used to confirm whether the surface region of the nickel particles contains an alloy of nickel and bismuth, an alloy of nickel and copper, an alloy of nickel and iron, or an alloy of nickel and molybdenum.

[X射線光電子分光分析(XPS)測定] [X-ray photoelectron spectroscopy (XPS) determination]

XPS用之測定對象試樣使用利用壓製機將鎳粒子成形為顆粒狀而成者。詳細而言,向具有Φ5.2mm及高度2.5mm之尺寸之鋁製容器中加入10mg左右之粒子試樣。繼而,使用壓製機(AS ONE製造,商品號:1-312-01)及適配器(商品號:1-312-03),以規定行程(25mm)與鋁製容器一同進行加壓。繼而,取出支持於鋁製容器之鎳粒子之顆粒成形物。 The test sample used in XPS is formed by granulating nickel particles using a pressing machine. Specifically, approximately 10 mg of the particle sample is added to an aluminum container with dimensions of 5.2 mm in diameter and 2.5 mm in height. Then, using a pressing machine (manufactured by AS ONE, product number: 1-312-01) and an adapter (product number: 1-312-03), pressure is applied to the aluminum container at a specified stroke (25 mm). The granulated nickel particles supported in the aluminum container are then removed.

對於所獲得之顆粒成形物,進行最表面測定及藉由Ar單體離子濺射進行之自試樣表面向內部之深度方向測定。測定條件如下所示。 The obtained granular material underwent surface surface measurement and depth measurement from the sample surface inwards via Ar monomer ion sputtering. The measurement conditions are shown below.

.測定裝置:ULVAC-PHI股份有限公司製造之VersaProbeIII • Measuring device: VersaProbeIII manufactured by ULVAC-PHI Co., Ltd.

.激發X射線:單色化Al-Kα射線(1486.7eV) • Excited X-rays: Monochromatic Al-Kα rays (1486.7 eV)

.輸出:50W Output: 50W

.加速電壓:15kV Accelerating voltage: 15kV

.X射線照射直徑:200μmΦ X-ray irradiation diameter: 200 μm

.X射線掃描面積:1000μm×300μm X-ray scan area: 1000μm × 300μm

.檢測角度:45° • Detection angle: 45°

.通過能量:26.0eV • Energy transmitted: 26.0 eV

.能階:0.1eV/step • Energy level: 0.1 eV/step

.濺射離子種類:Ar單體離子 Sprayed ion type: Ar monomer ions

.濺射速率:3.3nm/min(SiO2換算) Spray rate: 3.3 nm/min ( SiO2 conversion)

.濺射間隔:20s Splash interval: 20s

.測定元素:C1s、Ni2p3、Sn3d5、Bi4f、Cu2p、Fe3p、Mo3d Elemental determination: C 1s , Ni 2p3 , Sn 3d5 , Bi 4f , Cu 2p , Fe 3p , Mo 3d

.能量修正值:C1s中之C-C鍵及C-H鍵(284.8eV) • Energy correction value: C1s C1s CC and CH bonds (284.8 eV)

[XPS資料之解析] [Analysis of XPS Data]

使用資料解析軟體(ULVAC-PHI公司製造之「MultiPack Ver9.9」)進行XPS資料之解析。後台模式使用Shirley。 XPS data was parsed using data parsing software (MultiPack Ver9.9 manufactured by ULVAC-PHI). Shirley was used in the background.

[X之值] [Value of X]

於實施例1至6中,將Bi4f之原子數相對於Ni2p3與Bi4f共計2種元素之合計原子數之比率設為X(at%)。於實施例7中,將Cu2p之原子數相對於Ni2p3與Cu2p共計2種元素之合計原子數之比率設為X(at%)。於實施例8中,將Fe3p之原子數相對於Ni2p3與Fe3p共計2種元素之合計原子數之比率設為X(at%)。於實施例9中,將Mo3d之原子數相對於Ni2p3與Mo3d共計2種元素之合計原子數之比率設為X(at%)。 In Embodiments 1 to 6, the ratio of the number of Bi 4f atoms to the total number of atoms of Ni 2p3 and Bi 4f is set as X (at%). In Embodiment 7, the ratio of the number of Cu 2p atoms to the total number of atoms of Ni 2p3 and Cu 2p is set as X (at%). In Embodiment 8, the ratio of the number of Fe 3p atoms to the total number of atoms of Ni 2p3 and Fe 3p is set as X (at%). In Embodiment 9, the ratio of the number of Mo 3d atoms to the total number of atoms of Ni 2p3 and Mo 3d is set as X (at%).

[a軸長度及微晶尺寸Cs之測定] [Determination of a-axis length and crystallite size Cs]

藉由X射線繞射測定並根據源自所獲得之鎳之繞射峰,使用WPPF法算出實施例及比較例所獲得之鎳粒子之a軸長度及微晶尺寸Cs。 The a-axis length and crystallite size Cs of the nickel particles obtained in the embodiments and comparative examples were calculated using the WPPF method by X-ray diffraction determination and based on the diffraction peaks originating from the obtained nickel.

裝置名SmartLab(9KW):RIGAKU公司製造 Device name: SmartLab (9KW); Manufactured by RIGAKU Corporation

<裝置構成> <Device Configuration>

波長 Wavelength

.靶:Cu Target: Cu

.波長類型:Kα1 Wavelength type: Kα1

.Kα1:1.54059(Å) Kα1: 1.54059 (Å)

.Kα2:1.54441(Å) Kα2: 1.54441 (Å)

.Kβ:1.39225(Å) Kβ: 1.39225 (Å)

.Kα1與Kα2之強度比:0.4970 The strength ratio of Kα1 to Kα2 is 0.4970.

.水平偏光率:0.500 Horizontal polarization: 0.500

繞射裝置 Diffraction device

.測角計:SmartLab • Goniometer: SmartLab

.附加基板:僅Z平台 Additional substrate: Z-platform only

.配件:ASC6-反射 Accessories: ASC6-Reflector

<測定條件> <Measurement Conditions>

.光學系統屬性:集中法 Optical system properties: Luminous method

.CBO選擇狹縫:BB • CBO Select Narrow Gaps: BB

.入射平行狹縫:Soller_slit_5.0deg Incident parallel narrow gap: Soller_slit_5.0deg

.入射狹縫:2/3deg Incident narrow slit: 2/3 degree

.長邊限制狹縫:10.0mm Long side narrow gap: 10.0mm

.受光狹縫1:20.000mm • Light-receiving narrow gap 1: 20.000mm

.受光平行狹縫:Soller_slit_5.0deg • Parallel light-receiving narrow gap: Soller_slit_5.0deg

.受光狹縫2:20.000mm • Light-receiving narrow gap 2: 20.000mm

.衰減器:Open Attenuator: Open

.檢測器:D/teXUltra250 • Detector: D/teX Ultra250

.掃描軸:2θ/θ Scanning axis: 2θ/θ

.掃描模式:連續 Scanning Mode: Continuous

.掃描範圍:5.0000~140.0000deg • Scan range: 5.0000~140.0000 degrees

.步長:0.0100deg • Step size: 0.0100 deg

.掃描速度/測量時間:2.015572deg/min • Scanning speed/measurement time: 2.015572 dec/min

.資料點數:13501點 Data Points: 13501

.管電壓:45kV Pipe voltage: 45kV

.管電流:200mA Tube current: 200mA

.HV:0.00 HV: 0.00

<X射線繞射用試樣之製備> Preparation of Samples for X-ray Diffraction

將測定對象之鎳粒子密鋪於測定支架,以包含鎳粒子之層之厚度為0.5mm且測定表面平滑之方式,使用玻璃板進行平滑化。 Nickel particles, representing the target material, are densely packed onto a measuring holder. The surface is smoothed using a glass plate to achieve a nickel particle layer thickness of 0.5 mm and a smooth surface.

使用以上述測定條件所獲得之X射線繞射圖案,於以下條件下,藉由解析用軟體進行解析。解析時,使用由美國國家標準與技術研究院(NIST)所提供之標準物質即六硼化鑭粉末(SRM660 Series)所獲得之資料進行修正。a軸長度及微晶尺寸Cs使用WPPF法計算出。 The X-ray diffraction patterns obtained under the above-described measurement conditions were analyzed using analytical software under the following conditions. During analysis, data obtained from lanthanum hexaboride powder (SRM660 Series), a standard material provided by the National Institute of Standards and Technology (NIST), were used for correction. The a-axis length and crystallite size Cs were calculated using the WPPF method.

<測定資料解析條件> <Measurement Data Analysis Conditions>

.解析用軟體:Rigaku製造之PDXL2 • Analysis software: Rigaku's PDXL2

.解析方法:WPPF法 Analysis method: WPPF method

.資料處理:自動輪廓處理 Data processing: Automatic contour processing

(Rigaku公司,PDXL用戶指南p.305) (Rigaku Corporation, PDXL User Guide, p. 305)

[評價2] [Review 2]

對於實施例1至9及比較例1至3所獲得之鎳粒子,藉由以下方法,測定鎳粒子之開始收縮溫度、包含鎳粒子之燒結膜之比電阻及表面粗糙度Rz。將以上結果示於以下表1。 For the nickel particles obtained in Examples 1 to 9 and Comparative Examples 1 to 3, the initial shrinkage temperature of the nickel particles, the specific resistance of the sintered film containing the nickel particles, and the surface roughness Rz were measured using the following methods. The results are shown in Table 1 below.

[開始收縮溫度之測定] [Measurement of the initial contraction temperature]

TMA之測定裝置使用Seiko Instruments股份有限公司製造之 TMA/SS6000。將0.2~0.3g之鎳粒子裝入至Φ5.0mm之不鏽鋼製之模具容器中,以對鎳粒子施加92MPa之壓力之方式進行加壓成形而製作顆粒。對所獲得之顆粒之顆粒長度進行測定,用作測定對象試樣。將其置於測定裝置,於負載49mN、1體積%氫氣/99體積%氮氣氛圍下以5℃/min對試樣進行升溫。自室溫(25℃)起開始測定,獲得表示溫度與收縮率(%)之關係之曲線圖。根據所獲得之曲線圖,求出開始收縮溫度。 The TMA measuring apparatus used was the TMA/SS6000 manufactured by Seiko Instruments Co., Ltd. 0.2~0.3g of nickel particles were loaded into a 5.0mm stainless steel mold container and pressurized to form granules by applying a pressure of 92MPa. The particle length of the obtained granules was measured and used as the test sample. The sample was placed in the measuring apparatus and heated at 5°C/min under a load of 49mN and an atmosphere of 1% hydrogen/99% nitrogen. Measurements were taken starting at room temperature (25°C), and a graph showing the relationship between temperature and shrinkage rate (%) was obtained. The temperature at which shrinkage began was determined based on the obtained graph.

[比電阻之測定] [Specific resistance measurement]

使0.1g之乙基纖維素溶解於4g之萜品醇中,繼而添加5g之鎳粒子而獲得混合物。使用自轉、公轉混合機(Thinky股份有限公司製造之「去泡攪拌太郎(註冊商標)」)對該混合物進行混合。繼而,使該混合物通過三輥研磨機4次而將其壓碎。三輥研磨機之間隙設定為8μm。以此方式獲得塗佈液。 0.1 g of ethyl cellulose was dissolved in 4 g of terpineol, followed by the addition of 5 g of nickel particles to obtain a mixture. This mixture was then mixed using a rotary mixer (Thinky Co., Ltd.'s "Defoaming Stirring Taro" (registered trademark)). The mixture was then crushed four times by passing it through a three-roll mill. The mill's clearance was set to 8 μm. A coating solution was obtained in this manner.

將該塗佈液塗佈於氧化鋁基板而形成塗膜。塗膜之厚度為30μm。將該塗膜於1體積%氫氣/99體積%氮氣氛圍下以800℃燒結60分鐘而獲得燒結膜。對於該燒結膜,使用三菱Analytech公司製造之四探針法比電阻測定裝置Loresta MCP-T600,測定比電阻(Ω.cm)。 The coating solution was applied to an alumina substrate to form a coating film. The coating film thickness was 30 μm. The coating film was sintered at 800°C for 60 minutes under a 1% hydrogen/99% nitrogen atmosphere to obtain a sintered film. The specific resistance (Ω·cm) of the sintered film was measured using a Loresta MCP-T600 four-probe resistivity measuring apparatus manufactured by Mitsubishi Analytech.

[表面粗糙度Rz之測定] [Measurement of Surface Roughness Rz]

使用SURFCOM 130A測定上述燒結膜之表面粗糙度Rz。測定條件設為評價長度6.0mm、測定速度0.6mm/s。 The surface roughness Rz of the sintered film was measured using a SURFCOM 130A. The measurement conditions were set as follows: evaluation length 6.0 mm, measurement speed 0.6 mm/s.

由表1所示之結果可知,藉由XPS之測定可確認實施例1至9所獲得之鎳粒子於其表面區域包含金屬狀態之鉍元素、銅元素、鐵元素或鉬元素。進而,實施例所獲得之鎳粒子之a軸長度超出未使用鉍元素、銅元素、鐵元素及鉬元素之化合物之比較例1所獲得之鎳粒子之a軸長度。由該等結果可知,實施例1至6所獲得之鎳粒子於其表面區域包含鎳與鉍之合金。又,可知實施例7所獲得之鎳粒子於其表面區域包含鎳與銅之合金。又,可知實施例8所獲得之鎳粒子於其表面區域包含鎳與鐵之合金。又,可知實施例9所獲得之鎳粒子於其表面區域包含鎳與鉬之合金。 As shown in Table 1, XPS measurements confirm that the nickel particles obtained in Examples 1 to 9 contain metallic bismuth, copper, iron, or molybdenum in their surface regions. Furthermore, the a-axis length of the nickel particles obtained in the Examples exceeds that of the nickel particles obtained in Comparative Example 1, which did not use compounds containing bismuth, copper, iron, and molybdenum. These results indicate that the nickel particles obtained in Examples 1 to 6 contain an alloy of nickel and bismuth in their surface regions. Additionally, it is known that the nickel particles obtained in Example 7 contain an alloy of nickel and copper in their surface regions. Furthermore, it is known that the nickel particles obtained in Example 8 contain an alloy of nickel and iron in their surface region. It is also known that the nickel particles obtained in Example 9 contain an alloy of nickel and molybdenum in their surface region.

又,由表1所示之結果可知,實施例1至9所獲得之鎳粒子與比較例1至3所獲得之鎳粒子相比,顯示出較高之開始收縮溫度。由此可知,實施例1至9所獲得之鎳粒子顯示出較高之耐燒結性。 Furthermore, as shown in Table 1, the nickel particles obtained in Examples 1 to 9 exhibit a higher initial shrinkage temperature compared to the nickel particles obtained in Comparative Examples 1 to 3. This indicates that the nickel particles obtained in Examples 1 to 9 exhibit higher sintering resistance.

尤其是,由實施例1至5與實施例6之對比可知,藉由控制鎳粒子中所包含之鉍之量,可控制由該鎳粒子所獲得之燒結膜之比電阻。 In particular, a comparison between Examples 1 to 5 and Example 6 shows that the specific resistance of the sintered film obtained from the nickel particles can be controlled by controlling the amount of bismuth contained in the nickel particles.

又,製造具有形成有鎳與鉍之合金之表面區域之鎳粒子的實施例1至6與於鎳粒子整體形成有鎳與鉍之合金之比較例2相比,燒結膜之表面更平滑。由此可知,根據具有包含鎳與鉍之合金之表面區域之鎳粒子,燒結膜之表面粗糙度降低。 Furthermore, in Examples 1 to 6, where nickel particles are fabricated with surface regions containing an alloy of nickel and bismuth, compared to Comparative Example 2 where the nickel particles are entirely formed with an alloy of nickel and bismuth, the surface of the sintered film is smoother. Therefore, it can be seen that the surface roughness of the sintered film is reduced by using nickel particles with surface regions containing an alloy of nickel and bismuth.

[產業上之可利用性] [Industry-level applicability]

根據本發明,提供一種不過度提高電阻而耐燒結性較高之鎳粒子。 According to the present invention, a nickel particle with high sintering resistance is provided without excessively increasing resistance.

Claims (6)

一種鎳粒子,其係具有包含鎳與金屬元素M之合金之表面區域者,且 上述金屬元素M為選自鉍、銅、鐵及鉬中之至少一種, 上述金屬元素M相對於上述鎳粒子整體之含量為0.09質量%以上15.8質量%以下, 在藉由X射線光電子分光分析對在上述鎳粒子之深度方向上自最表面起至以SiO 2換算之濺射深度為5 nm之區域進行測定時,將該區域中之金屬元素M之原子數相對於鎳元素與金屬元素M之合計原子數之比率之最大值設為X(at%), 在藉由ICP發光分光分析法對上述鎳粒子進行測定時,將金屬元素M之原子數相對於鎳元素與金屬元素M之合計原子數之比率設為Y(at%),此時, X/Y之值為0.5以上35以下。 A nickel particle having a surface region comprising an alloy of nickel and a metallic element M, wherein the metallic element M is selected from at least one of bismuth, copper, iron, and molybdenum, and the content of the metallic element M relative to the total nickel particle is 0.09% by mass or more and 15.8% by mass or less, wherein when X-ray photoelectron spectrometry is used to measure the region from the outermost surface of the nickel particle to a sputtering depth of 5 nm (converted to SiO2) , the maximum value of the ratio of the number of atoms of metallic element M in that region to the total number of atoms of nickel and metallic element M is set as X (at%). When determining the nickel particles using ICP emission spectrophotometry, the ratio of the number of atoms of metal element M to the total number of atoms of nickel and metal element M is set as Y (at%). In this case, the value of X/Y is between 0.5 and 35. 如請求項1之鎳粒子,其中在基於由掃描式電子顯微鏡測定所算出之圓當量直徑的粒度分佈中,將累積個數50個數%時之個數累積粒徑設為D 50時,D 50為20 nm以上200 nm以下,且 在將上述粒度分佈中之粒徑之標準偏差設為σ(nm)時,變異係數(σ/D 50)(%)之值為14%以下, 變異係數(%)=(σ/D 50)×100。 For nickel particles as claimed in Item 1, in the particle size distribution based on the circular equivalent diameter calculated by scanning electron microscopy, when the cumulative particle size is set to D 50 when the cumulative number of particles is 50%, D 50 is 20 nm to 200 nm, and when the standard deviation of the particle size in the above particle size distribution is set to σ (nm), the value of the coefficient of variation (σ/D 50 ) (%) is 14% or less, and the coefficient of variation (%) = (σ/D 50 ) × 100. 如請求項1之鎳粒子,其中在基於由掃描式電子顯微鏡測定所算出之圓當量直徑的粒度分佈中,將累積個數50個數%時之個數累積粒徑設為D 50時,具有D 50之1.5倍以上之粒徑之粒子之存在比率為0.5個數%以下。 For example, in the nickel particles of claim 1, in the particle size distribution based on the circular equivalent diameter calculated by scanning electron microscopy, when the cumulative particle size is set to D 50 when the cumulative number of particles is 50%, the proportion of particles with a particle size of 1.5 times or more of D 50 is less than 0.5%. 如請求項1之鎳粒子,其中在基於由掃描式電子顯微鏡測定所算出之圓當量直徑的粒度分佈中,將累積個數50個數%時之個數累積粒徑設為D 50,且將藉由WPPF法所測得之微晶尺寸設為Cs(nm)時,Cs/D 50之值為0.3以上0.6以下。 For nickel particles as claimed in claim 1, in the particle size distribution based on the circular equivalent diameter calculated by scanning electron microscopy, the cumulative particle size when the cumulative number of particles is 50% is set to D50 , and when the crystallite size measured by the WPPF method is set to Cs (nm), the value of Cs/ D50 is 0.3 or more and 0.6 or less. 一種鎳粒子之製造方法,其係對包含氫氧化鎳粒子、多元醇、聚乙烯吡咯啶酮及聚乙烯亞胺之混合液進行加熱而製造鎳粒子之方法, 使用相對於1質量份之聚乙烯亞胺為30質量份以上200質量份以下之聚乙烯吡咯啶酮, 藉由上述加熱將上述氫氧化鎳粒子還原為鎳母粒子, 於殘存有一部分上述氫氧化鎳粒子之狀態下,將上述混合液與金屬元素M之化合物混合,將該化合物還原為金屬M,而於上述鎳母粒子形成包含鎳與金屬元素M之合金之表面區域,且 上述金屬元素M為選自鉍、銅、鐵及鉬中之至少一種。 A method for manufacturing nickel particles involves heating a mixture comprising nickel hydroxide particles, a polyol, polyvinylpyrrolidone, and polyethyleneimine to produce nickel particles. The method uses 30 to 200 parts by mass of polyvinylpyrrolidone relative to 1 part by mass of polyethyleneimine. The nickel hydroxide particles are reduced to nickel masterbatch particles by heating. While a portion of the nickel hydroxide particles remains, the mixture is mixed with a compound of metallic element M, and the compound is reduced to metallic M. This forms a surface region of an alloy comprising nickel and metallic element M on the nickel masterbatch particles. The metallic element M is selected from at least one of bismuth, copper, iron, and molybdenum. 一種積層陶瓷電容器,其將如請求項1至4中任一項之鎳粒子用於內部電極。A multilayer ceramic capacitor that uses nickel particles as described in any of claims 1 to 4 for its internal electrodes.
TW112124552A 2022-09-30 2023-06-30 Nickel particles and their manufacturing methods, and multilayer ceramic capacitors TWI903181B (en)

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JP2017171957A (en) 2016-03-18 2017-09-28 住友金属鉱山株式会社 Nickel powder, production method of nickel powder, inner electrode paste using nickel powder, and electronic component

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