TWI900201B - Wet process apparatus - Google Patents

Abstract

A wet process apparatus includes a spinning platform, a liquid supply device, and a process unit. The process unit is arranged around the spinning platform and can move relative to the spinning platform in a first direction, and the process unit includes a plurality of process rings. Each process ring includes at least a liquid recycle device and a gas recycle device. The liquid recycle device includes a liquid drain port and a drain pipe connected to the liquid drain port, and process liquid flows from the liquid drain port to the drain pipe. The gas recycle device includes an exhaust port, an exhaust pipe connected to the exhaust port, and a filter element. The exhaust port is located above the liquid drain port. The filter element installed in the exhaust pipe is used to filter and prevent liquid contained in gas-liquid mixture from discharging from the exhaust pipe.

Description

Wet process equipment

This application relates to a wet process equipment, in particular to a single wafer wet process equipment.

The manufacturing process for products such as semiconductor wafers, packages, display panels, and LEDs requires a wafer (substrate) processing system to supply processing fluids, such as chemicals or deionized water, to the substrate surface for etching, cleaning, and coating. Within this substrate processing system, wet processing equipment is required to collect, drain, and recycle the used process fluids.

When existing wafer (substrate) wet processing equipment handles different processes, the process liquids used in different processes cannot be recovered separately, which wastes process liquids and increases the difficulty and cost of recycling. In response to the above problems, some companies have adopted different recovery loop designs, but these designs cannot independently collect gas-liquid mixtures, and the equipment specifications are quite complex. Because different gas-liquid mixtures contain liquids of different properties (such as acids, bases, solvents, etc.), if they are mixed together, it is easy to produce additional chemical reactions, which in turn causes harm to personnel or equipment, and also increases the difficulty of handling recovered gases. Furthermore, if the mixed mixture flows back into multiple liquid recovery modules, it will cause cross-contamination between the chemical liquids collected by the liquid recovery modules and the mixture.

One purpose of this application is to provide a wet process equipment for use in wafer (substrate) processing, which can process multiple processes in the same machine and can separately and independently recover the process liquids and process gases in these processes to improve recovery efficiency.

Another object of the present application is to provide a wet process equipment having a gas recovery device with a replaceable filter element, which can filter and remove liquid from the gas-liquid mixture to avoid cross-contamination of the gas-liquid mixture.

To achieve the above-mentioned purpose, the present application provides a wet process equipment, which is applied to a processing process of a wafer or substrate. The wet process equipment includes a turntable, a liquid supply device and a recovery unit. The turntable is used to support the wafer or substrate. The liquid supply device is arranged above the turntable and is used to supply a variety of process liquids to the wafer or substrate. The recovery unit is arranged around the turntable and can be moved relative to the turntable along a first direction, and the recovery unit includes a plurality of recovery rings, each of which is used to collect one of the process liquids and its entrained gas-liquid mixture. Each recovery loop includes: at least one liquid recovery device, including a drain port and a drain pipe, the drain pipe is connected to the drain port, and the process liquid flows from the drain port to the drain pipe; and at least one gas recovery device, including an exhaust port, an exhaust pipe and a filter element, the exhaust pipe is connected to the exhaust port, and the exhaust port is located above the drain port. The filter element is arranged in the exhaust pipe and is used to filter and remove the liquid in the gas-liquid mixture from the exhaust pipe.

Preferably, the liquid discharge port of the liquid recovery device and the gas discharge port of the gas recovery device are arranged at staggered positions in their orthographic projections on a horizontal plane.

Preferably, the number of the liquid recovery device and the gas recovery device is plural, and the orthographic projection positions of the plurality of liquid recovery devices and the plurality of exhaust ports of the plurality of gas recovery devices on the horizontal plane are staggered.

Preferably, the liquid drain pipe is tilted downward relative to the top surface of the turntable, and the exhaust pipe is tilted upward relative to the top surface of the turntable.

Preferably, the exhaust pipe includes a connecting pipe portion and an extending pipe portion, and the filter element is disposed between the connecting pipe portion and the extending pipe portion and is closely attached to an inner wall surface of the exhaust pipe.

Preferably, the gas recovery device further includes a sleeve, which is detachably sleeved between the connecting pipe portion and the extension pipe portion, and the filter element is disposed in the sleeve.

Preferably, the opposite ends of the sleeve respectively cover the outer surfaces of the connecting tube portion and the extension tube portion.

Preferably, the exhaust pipe further includes a cover and a replacement opening, the cover can movably and sealingly cover the replacement opening, and the filter element can be replaceably disposed in the exhaust pipe through the replacement opening.

Preferably, there is a retreat space between the filter element and the exhaust port.

Preferably, each of the recovery rings includes a bottom plate, the bottom plate includes a guide surface, and the guide surface is inclined downward relative to the bottom plate and adjacent to the drain port, wherein the drain pipe is located lower than the guide surface relative to the bottom plate.

Preferably, the wet process equipment further includes a base, a plurality of supporting columns and a driving mechanism, wherein the plurality of supporting columns are arranged on the base and connected in series to the plurality of recovery rings, and the driving mechanism is used to drive the plurality of supporting columns to move synchronously along the first direction relative to the turntable.

In the embodiments of this application, the gas recovery device and liquid recovery device of the wet process equipment are staggered horizontally and vertically within each recovery loop to prevent cross-contamination of the gas-liquid mixture. Furthermore, each layer of recovery loops is independently installed, allowing for independent maintenance or replacement of individual layers, further increasing recovery efficiency. In particular, the gas recovery device is equipped with a replaceable filter element that effectively filters and removes liquid from the gas-liquid mixture, thereby preventing it from being discharged through the exhaust pipe.

The following descriptions of the various embodiments refer to the accompanying drawings to illustrate specific embodiments in which the present application may be implemented. Directional terms used in this application, such as "upper," "lower," "front," "back," "left," "right," "inner," "outer," and "side," refer only to the directions in the accompanying drawings. Therefore, these directional terms are intended to facilitate explanation and understanding of this application and are not intended to limit this application.

This application is particularly described with the following examples, which are used for illustration only. For those skilled in the art, various changes and modifications can be made without departing from the spirit and scope of this disclosure. Therefore, the scope of protection of this disclosure shall be determined by the appended patent claims. Throughout the specification and patent claims, unless the content clearly indicates otherwise, the meaning of "a" and "the" includes that such description includes "one or at least one" of the elements or components. In addition, as used in this application, unless it is clear from the specific context that the plural is excluded, the singular article also includes the description of plural elements or components. Moreover, when applied in this description and throughout the following patent claims, unless the content clearly indicates otherwise, the meaning of "in which" may include "in which" and "on which".

The following clearly and completely describes the technical solutions in the embodiments of this application, in conjunction with the accompanying figures. Obviously, the described embodiments are only a portion of the embodiments of this application, not all of them. All other embodiments derived by technical experts based on the embodiments of this application without inventive effort are also within the scope of protection of this application.

The present application provides a single wafer or substrate wet process equipment that can be applied to semiconductor front-end processes, semiconductor advanced packaging processes, compound semiconductor processes, optoelectronic processes, etc. Referring to Figures 1 and 2, Figure 1 is a schematic diagram of the three-dimensional structure of the wet process equipment 1 of an embodiment of the present application, and Figure 2 is a top view of the wet process equipment 1 of Figure 1. As shown in Figures 1 and 2, the wet process equipment 1 of the present application includes a turntable 10, a recovery unit 20, a base 50 and a liquid supply device 60 (as shown in Figure 3). In detail, the turntable 10 and the recovery unit 20 are arranged on the base 50, and the liquid supply device 60 can be movably arranged above the turntable 10. In some embodiments, the top of the turntable 10 includes a vacuum chuck, and the suction force applied by the vacuum chuck allows a wafer or substrate (not shown) to be fixed to the top of the turntable 10. The turntable 10 is equipped with a drive mechanism for driving the turntable 10 to rotate around the axis. In other embodiments, other methods can also be used to fix the wafer on the turntable, such as using a clamping device. On the other hand, the liquid supply device 60 can apply a plurality of process liquids to the wafer through a nozzle. Specifically, the liquid supply device 60 also includes a plurality of liquid transmission pipelines. With this design, the liquid supply device 60 can be controlled to apply the corresponding process liquid to the wafer (substrate) on the turntable 10 according to the process requirements, so as to perform different processes such as etching or cleaning on the wafer.

Referring to Figures 3 and 4 in conjunction with Figures 1 and 2, Figures 3 and 4 are schematic cross-sectional views of the wet process equipment 1 of the present application, respectively. As shown in Figures 1 to 3, the recovery unit 20 is disposed around the turntable 10 and is movable relative to the turntable 10 along a first direction D1. In this embodiment, the first direction D1 is a direction perpendicular to the base 50. As shown in Figure 1, the recovery unit 20 includes a plurality of recovery rings 21, each of which is used to collect process liquid thrown out from the wafer surface on the turntable 10 due to centrifugal force, and discharge the process liquid, and at the same time, discharge the gas-liquid mixture entrained in the process liquid. In some embodiments, as shown in FIG1 , a plurality of recycling rings 21 are sequentially arranged from top to bottom along the first direction D1 as a first recycling ring 211, a second recycling ring 212, a third recycling ring 213, and a fourth recycling ring 214. In other embodiments, a different number of recycling rings may be used depending on the process requirements. Specifically, in this embodiment, the first recycling ring 211, the second recycling ring 212, the third recycling ring 213, and the fourth recycling ring 214 respectively correspond to the processes of the first etching, the first cleaning (after the first etching), the second etching, and the second cleaning (after the second etching) when in use, but are not limited thereto. In other embodiments, if photoresist stripping is required after the second etching, a second layer of recycling rings for photoresist stripping and post-photoresist stripping cleaning may be added.

Referring to FIG3 , each recovery ring 21 , namely the first recovery ring 211 , the second recovery ring 212 , the third recovery ring 213 , and the fourth recovery ring 214 , respectively, includes an annular base plate 22 and an annular upper cover 23 provided corresponding to the annular base plate 22 . It should be noted that this embodiment of the application only illustrates the main structure of the recovery ring for illustrative purposes, and other basic structures of the recovery ring known to those skilled in the art are not described in detail herein. As shown in FIG1 , FIG3 , and FIG4 , each recovery ring 21 includes a liquid recovery device 30 and a plurality of gas recovery devices 40 . In this embodiment, four gas recovery devices 40 are used as an example. In some embodiments, each recovery ring 21 has a corresponding number of liquid recovery devices 30 and a corresponding number of gas recovery devices 40, and the number of the two can be different depending on the design requirements. Preferably, the provision of a plurality of liquid recovery devices 30 and a plurality of gas recovery devices 40 can increase the liquid discharge efficiency and the exhaust efficiency.

Referring to Figure 5 and in conjunction with Figures 3 to 4, Figure 5 is a schematic diagram of the planar configuration of the liquid recovery device 30 and the gas recovery device 40. In some embodiments, each liquid recovery device 30 includes a drain port 31 and a drain pipe 32. Specifically, the drain port 31 is formed between the upper cover 23 and the bottom plate 22 of the recovery ring 21, and the drain pipe 32 is connected to the drain port 31 through a connector 33, so that the process liquid flows from the drain port 31 to the drain pipe 32. In this embodiment, a hose can be used for the drain pipe 32, and the drain pipe 32 made of the hose material is fixedly connected to the recovery ring 21 through the connector 33 under normal conditions, and can be removed for cleaning or replacement when maintenance is required. As shown in Figure 3, the drain pipe 32 of each recovery ring 21 is independently provided, which can increase the process liquid recovery rate.

Referring to FIG. 6 , FIG. 6 is a schematic cross-sectional view of the recovery ring 21. In some embodiments, as shown in FIG. 6 , the bottom plate 22 of the recovery ring 21 includes a guide surface 221 that is tilted downward relative to the bottom plate 22 and adjacent to the drain port 31. Specifically, as shown in FIG. 3 , one end of a drain pipe 32 is connected to the recovery ring 21, which has a downwardly tilted outer edge, via a connector 33. This allows the drain pipe 32 to tilt downward relative to the top surface of the turntable 10, and the position of the drain pipe 32 relative to the bottom plate 22 is lower than the guide surface 221 (as shown in FIG. 6 ). This facilitates the flow of process liquid from the bottom plate 22 through the guide surface 221 into the drain pipe 32.

In other embodiments, a drain tube made of a non-soft tubing material (e.g., a rigid tube) may also be used. Specifically, the rigid drain tube and recovery ring may each be equipped with a corresponding quick-connect device. During use, as shown in Figure 9, the drain tube 32 can be quickly and directly connected to the recovery ring using a sleeve connection (e.g., a ferrule structure). This allows the drain tube to remain securely attached to the recovery ring under normal circumstances, facilitating maintenance and cleaning after each process. Furthermore, when the drain tube's quick-connect device is disconnected, it can be sealed by a latch to prevent liquid leakage.

As shown in Figures 3 to 5, each gas recovery device 40 includes an exhaust port 41, an exhaust pipe 42, and a filter element 43. Specifically, the exhaust port 41 is formed on the upper cover 23 of the recovery ring 21, and one end of the exhaust pipe 42 is connected to the exhaust port 41, and the other end is used to connect to the exhaust equipment. Each uses an independent exhaust system to collect and discharge gas, preventing the interaction of gases from chemical solutions of different properties (such as acids, bases, organic solvents, etc.) and affecting industrial safety. In this embodiment, as shown in Figure 1, each recovery ring 21 is equipped with four gas recovery devices 40, which are arranged at equal distances around the turntable 10 to collect gas from various areas around the recovery ring 21 and increase exhaust efficiency. As shown in Figures 3-4 and 6, the exhaust pipe 42 is tilted upward relative to the top of the turntable 10 to facilitate gas discharge, and the exhaust port 41 is located above the liquid discharge port 31. Furthermore, the exhaust port 41 is separated from the liquid discharge port 31 to prevent the exhaust pipe 42 from extracting process liquid flowing through the liquid discharge port 31 during the pumping process.

In some embodiments, as shown in FIG5 , the recovery ring 21 is equipped with multiple liquid recovery devices 30. Specifically, the drain ports 31 of the liquid recovery devices 30 and the exhaust ports 41 of the gas recovery devices 40 are arranged in a staggered arrangement relative to their orthographic projections on a horizontal plane. In other words, the staggered arrangement of the multiple drain ports 31 and the multiple exhaust ports 41 of the recovery ring 21 further prevents the gas recovery devices 40 from draining process liquids flowing through the drain ports 31 during the pumping process.

Referring to FIG. 7 in conjunction with FIG. 4 , FIG. 7 is a partially enlarged schematic diagram of portion A of the wet process equipment 1 of FIG. Specifically, in the embodiment of the present application, a filter element 43 is disposed within the exhaust pipe 42 to filter and remove liquid from the gas-liquid mixture, thereby preventing the liquid from being discharged through the exhaust pipe 42 . Specifically, the filter element 43 can be replaceably disposed within the exhaust passage of the exhaust pipe 42 . The filter element 43 can be made of an acid- and alkali-resistant material, including but not limited to polypropylene (PP), polystyrene (PS), PFA, polytetrafluoroethylene (PTFE), and polyvinylidene difluoride (PVDF), depending on process requirements. As shown in Figures 4 and 7, the exhaust pipe 42 includes a connecting pipe portion 421 and an extension pipe portion 422, and the filter element 43 is disposed between the connecting pipe portion 421 and the extension pipe portion 422, and is closely attached to an inner wall surface 42a of the exhaust pipe 42. In this embodiment, the gas recovery device 40 further includes a sleeve 45, and the filter element 43 is disposed within the sleeve 45. Specifically, the sleeve 45 can be detachably sleeved between the connecting pipe portion 421 and the extension pipe portion 422 by means of a tight fit, screwing, or snap connection. Preferably, the opposite ends of the sleeve 45 respectively cover the outer surfaces 42b of the connecting pipe portion 421 and the extension pipe portion 422 to ensure a tight fit between the sleeve 45 and the exhaust pipe 42. When the filter element 43 needs to be replaced, the filter element 43 can be replaced easily and quickly by simply removing the sleeve 45 from the exhaust pipe 42 .

Referring to Figures 8A and 8B, Figure 8A is a partially enlarged schematic diagram of an exhaust duct and a cover of a wet process equipment according to another embodiment of the present application, and Figure 8B is a three-dimensional schematic diagram of Figure 8A with the cover opened. In this embodiment, the exhaust duct 42 includes a cover 423 and a replacement opening 424. Specifically, the replacement opening 424 is formed on the exhaust duct 42, and the cover 423 can movably and sealingly cover the replacement opening 424. Utilizing the above structure, the filter element 43 can be directly placed in the exhaust duct 42 through the replacement opening 424. When the filter element 43 needs to be replaced, the filter element 43 can be easily and quickly replaced by simply opening the cover 423. Specifically, the filter element 43 shown in the embodiments of Figures 7 and 8A and 8B of this application has a setback space 401 (as shown in Figures 6 and 7 ) between it and the exhaust port 41. This setback space 401 is, for example, at least 0.5 centimeters, and preferably 1 centimeter or more, from the corner between the exhaust pipe 42 and the upper cover 23 of the recovery ring 21. The provision of setback space 401 prevents process fluid from directly contacting the filter element 43.

Continuing with reference to Figures 3 and 4, the wet process equipment 1 of the present application further includes a plurality of support columns 51 and a drive mechanism 52. Specifically, the plurality of support columns 51 are disposed on the base 50 and are connected in series to the plurality of recovery rings 21. The single drive mechanism 52 is used to drive the plurality of support columns 51 to move synchronously along the first direction D1 relative to the turntable 10, while simultaneously driving the recovery ring 21 to move up and down along the first direction D1 relative to the turntable 10. Furthermore, since each recovery ring 21 includes a liquid recovery device 30 and four gas recovery devices 40, when the recovery ring 21 is raised or lowered, the liquid recovery device 30 and the gas recovery device 40 will also rise or fall together. By controlling the lifting device composed of the driving mechanism 52 and the supporting column 51, the designated first recovery ring 211, the second recovery ring 212, the third recovery ring 213 or the fourth recovery ring 214 can be moved to align with the turntable 10, wherein alignment means that the drain port 31 of one of the first recovery ring 211, the second recovery ring 212, the third recovery ring 213 or the fourth recovery ring 214 is aligned with the wafer on the turntable 10 ( The liquid supply device 60 applies process liquid to the wafer (substrate) on the turntable 10, and when the turntable 10 rotates, the process liquid thrown off the surface of the wafer (substrate) due to centrifugal force can be collected by one of the adjacent first recovery ring 211, second recovery ring 212, third recovery ring 213 or fourth recovery ring 214. At the same time, the gas-liquid mixture entrained in the process liquid is also discharged from the exhaust port 41.

In summary, the gas recovery device and liquid recovery device of the wet process equipment disclosed in this application are staggered horizontally and vertically within each recovery loop to prevent cross-contamination of the gas-liquid mixture. Furthermore, each layer of recovery loops is independently installed, allowing for independent maintenance or replacement of individual layers, further increasing recovery efficiency. In particular, the gas recovery device is equipped with a replaceable filter element that effectively filters and removes liquid from the gas-liquid mixture, thereby preventing it from being discharged through the exhaust pipe.

Although this application has been described above with reference to preferred embodiments, the aforementioned preferred embodiments are not intended to limit this application. Persons skilled in the art may make various changes and modifications without departing from the spirit and scope of this application. Therefore, the scope of protection of this application shall be based on the scope defined in the claims.

The above detailed description of the wet process equipment for wafer and substrate processing provided by the embodiments of this application is provided. Specific examples are used herein to illustrate the principles and implementation of this application. The description of the above embodiments is intended solely to facilitate understanding of the method and core concepts of this application. Furthermore, those skilled in the art will appreciate that variations in the specific implementation and scope of application may occur based on the principles of this application. In summary, this description should not be construed as limiting this application.

1: Wet process equipment 10: Rotating table 20: Recovery unit 21: Recovery ring 211: First recovery ring 212: Second recovery ring 213: Third recovery ring 214: Fourth recovery ring 22: Bottom plate 221: Flow guide surface 23: Top cover 30: Liquid recovery device 31: Drain port 32: Drain pipe 33: Connector 40: Gas recovery device 401: Recessed space 41: Exhaust port 42: Exhaust pipe 42a: Inner wall 42b: Outer surface 421: Connecting tube 422: Extension tube 423: Cover 424: Replacement opening 43: Filter element 45: Casing 50: Base 51: Support Column 52: Drive Mechanism 60: Liquid Supply Device D1: First Direction

Figure 1 is a schematic diagram of the three-dimensional structure of the wet process equipment of this application. Figure 2 is a top view of the wet process equipment of Figure 1. Figure 3 is a schematic cross-sectional view of the wet process equipment of this application. Figure 4 is another schematic cross-sectional view of the wet process equipment of this application. Figure 5 is a schematic diagram of the planar layout of the liquid recovery device and gas recovery device of the wet process equipment of this application. Figure 6 is a schematic cross-sectional view of the recovery ring of the wet process equipment of this application. Figure 7 is a schematic enlarged partial view of section A of the wet process equipment of Figure 4. Figure 8A is a schematic enlarged partial view of the exhaust pipe and cover of the wet process equipment of this application. Figure 8B is a schematic three-dimensional view of the cover of Figure 8A with the cover opened. Figure 9 is a top-down diagram of the wet process equipment in this application.

1: Wet process equipment

10: Rotating table

20: Recycling Unit

21: Recycling Ring

211: Recycling Ring

212: Recycling Ring

213: Recycling Ring

214: Recycling Ring

30: Liquid recovery device

32:Drain pipe

40: Gas recovery device

42: Exhaust pipe

45: Casing

50: Base

Claims (9)

A wet process equipment is applied to a processing process of a wafer or substrate, and the wet process equipment includes: a turntable for carrying the wafer or substrate; a liquid supply device, arranged above the turntable, for supplying a variety of process liquids to the wafer or substrate; and a recovery unit, arranged around the turntable and movable relative to the turntable along a first direction, and the recovery unit includes a plurality of recovery rings, each of which is used to collect one of the process liquids and its entrained gas-liquid mixture, wherein each of the recovery rings includes: at least one liquid recovery device, including a drain port and a drain pipe, the drain pipe is connected to the drain port, and the process liquid is discharged by the drain pipe. The liquid outlet flows to the drain pipe; and at least one gas recovery device, including an exhaust port, an exhaust pipe and a filter element, the exhaust pipe is connected to the exhaust port, and the exhaust port is located above the liquid outlet, the filter element is arranged in the exhaust pipe, and is used to filter and remove the liquid in the gas-liquid mixture from the exhaust pipe; wherein the liquid outlet of the liquid recovery device and the exhaust port of the gas recovery device are staggered at the orthographic projection position on a horizontal plane, the number of the liquid recovery device and the gas recovery device are respectively plural, and the plural liquid outlets of the plural liquid recovery devices and the plural exhaust ports of the plural gas recovery devices are staggered at the orthographic projection position on the horizontal plane. A wet process equipment is applied to a processing process of a wafer or substrate, and the wet process equipment includes: a turntable for carrying the wafer or substrate; a liquid supply device, arranged above the turntable, for supplying a plurality of process liquids to the wafer or substrate; and a recovery unit, arranged around the turntable and movable relative to the turntable along a first direction, and the recovery unit includes a plurality of recovery rings, each of which is used to collect one of the process liquids and its entrained gas-liquid mixture, wherein each of the recovery rings includes: at least one A liquid recovery device includes a drain port and a drain pipe, the drain pipe is connected to the drain port, and the process liquid flows from the drain port to the drain pipe; and at least one gas recovery device includes an exhaust port, an exhaust pipe and a filter element, the exhaust pipe is connected to the exhaust port, and the exhaust port is located above the drain port. The filter element is arranged in the exhaust pipe and is used to filter and remove the liquid in the gas-liquid mixture from the exhaust pipe, wherein the drain pipe is tilted downward relative to the top surface of the turntable, and the exhaust pipe is tilted upward relative to the top surface of the turntable. A wet process equipment is applied to a processing process of a wafer or substrate, and the wet process equipment includes: a turntable for carrying the wafer or substrate; a liquid supply device, arranged above the turntable, for supplying a plurality of process liquids to the wafer or substrate; and a recovery unit, arranged around the turntable and movable relative to the turntable along a first direction, and the recovery unit includes a plurality of recovery rings, each of which is used to collect one of the process liquids and the gas-liquid mixture entrained therein, wherein each of the recovery rings includes: at least one liquid recovery device, including The invention relates to a gas recovery device comprising a liquid drain port and a liquid drain pipe, wherein the liquid drain pipe is connected to the liquid drain port, and the process liquid flows from the liquid drain port to the liquid drain pipe; and at least one gas recovery device, comprising an exhaust port, an exhaust pipe and a filter element, wherein the exhaust pipe is connected to the exhaust port, and the exhaust port is located above the liquid drain port, and the filter element is arranged in the exhaust pipe and is used to filter and remove the liquid in the gas-liquid mixture from the exhaust pipe, wherein the exhaust pipe includes a connecting pipe portion and an extension pipe portion, and the filter element is arranged between the connecting pipe portion and the extension pipe portion and is close to an inner wall surface of the exhaust pipe. The wet process equipment as described in claim 3, wherein the gas recovery device further includes a sleeve, which is detachably sleeved between the connecting pipe portion and the extension pipe portion, and the filter element is disposed in the sleeve. A wet process equipment as described in claim 4, wherein the opposite ends of the sleeve respectively cover the outer surfaces of the connecting tube portion and the extension tube portion. A wet process equipment is applied to a wafer or substrate processing process, the wet process equipment comprising: a turntable for carrying the wafer or substrate; a liquid supply device disposed above the turntable for supplying a plurality of process liquids to the wafer or substrate; and a recovery unit disposed around the turntable and movable relative to the turntable in a first direction, the recovery unit comprising a plurality of recovery rings, each of the recovery rings being used to collect one of the process liquids and a gas-liquid mixture thereof, wherein each of the recovery rings comprises: at least one liquid recovery device comprising a liquid drain The invention relates to a gas recovery device, comprising a gas outlet, a gas outlet and a drain pipe, the gas outlet is connected to the gas outlet, and the process liquid flows from the gas outlet to the gas outlet; and at least one gas recovery device, comprising an exhaust port, an exhaust pipe and a filter element, the exhaust pipe is connected to the exhaust port, and the exhaust port is located above the liquid outlet, the filter element is arranged in the exhaust pipe, and is used to filter and remove the liquid in the gas-liquid mixture from the exhaust pipe, wherein the exhaust pipe further includes a cover and a replacement opening, the cover can movably and sealingly cover the replacement opening, and the filter element can be replaceably arranged in the exhaust pipe through the replacement opening. The wet process equipment as described in claim 1, wherein a retreat space is provided between the filter element and the exhaust port. A wet process equipment as described in claim 1, wherein each recovery ring includes a bottom plate, the bottom plate includes a guide surface, and the guide surface is inclined downward relative to the bottom plate and adjacent to the drain port, wherein the drain pipe is positioned lower than the guide surface relative to the bottom plate. The wet process equipment as described in claim 1 further includes a base, a plurality of support columns and a driving mechanism, wherein the plurality of support columns are arranged on the base and connected in series with the plurality of recovery rings, and the driving mechanism is used to drive the plurality of support columns to move synchronously along the first direction relative to the turntable.