TWI836431B - Substrate processing device and substrate processing method - Google Patents
Substrate processing device and substrate processing method Download PDFInfo
- Publication number
- TWI836431B TWI836431B TW111118503A TW111118503A TWI836431B TW I836431 B TWI836431 B TW I836431B TW 111118503 A TW111118503 A TW 111118503A TW 111118503 A TW111118503 A TW 111118503A TW I836431 B TWI836431 B TW I836431B
- Authority
- TW
- Taiwan
- Prior art keywords
- substrate
- stage
- elastic sheet
- sheet
- space
- Prior art date
Links
Classifications
-
- H10W72/071—
-
- H10W74/01—
Landscapes
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Encapsulation Of And Coatings For Semiconductor Or Solid State Devices (AREA)
- Liquid Crystal (AREA)
- Lining Or Joining Of Plastics Or The Like (AREA)
Abstract
提供可以充分確保複數元件與基板的接合穩定性的基板處理裝置以及基板處理方法。包括:載台30,設置已配置複數元件4a、4b、4c的基板2;上部構件21,覆蓋載台的上方,與載台之間形成作為加壓空間的處理室6;片材保持部40,在載台與上部構件21之間保持彈性片材80;以及加壓控制部12,加壓處理室6。片材保持部40藉由配置於載台30兩側的推送軸41與捲繞輥42將彈性片材80從載台30的一側搬運到另一側,並將彈性片材80配置於載台30,使基板2被覆蓋。Provided are a substrate processing device and a substrate processing method that can fully ensure the bonding stability between a plurality of components and a substrate. The device comprises: a stage 30 on which a substrate 2 having a plurality of components 4a, 4b, and 4c arranged is placed; an upper member 21 covering the upper portion of the stage and forming a processing chamber 6 as a pressurized space between the stage and the upper member 21; a sheet holding portion 40 holding an elastic sheet 80 between the stage and the upper member 21; and a pressurization control portion 12 for pressurizing the processing chamber 6. The sheet holding portion 40 transports the elastic sheet 80 from one side of the stage 30 to the other side by means of a push shaft 41 and a winding roller 42 arranged on both sides of the stage 30, and arranges the elastic sheet 80 on the stage 30 so that the substrate 2 is covered.
Description
本發明係有關於處理已配置複數元件之基板的基板處理裝置以及基板處理方法。The present invention relates to a substrate processing apparatus and a substrate processing method for processing a substrate on which a plurality of components are arranged.
在基板上形成由複數元件構成的元件陣列的技術中,為了提升複數元件與基板的機械性接合的強度或接合穩定性,使用基板處理裝置進行以平板對已配置複數元件的基板壓入複數元件的處理。近幾年,配置於基板的元件高度小型化至數μm程度,另一方面,平板表面的平坦度有以數十μm級偏差的情況。此時,難以藉由平板以均勻的力量將基板上的複數元件壓入。In the technology of forming an element array composed of a plurality of elements on a substrate, in order to improve the strength or bonding stability of the mechanical bonding between the plurality of elements and the substrate, a substrate processing device is used to press the plurality of elements into a substrate on which the plurality of elements are arranged using a flat plate. processing. In recent years, the height of components placed on a substrate has been miniaturized to the order of several μm. On the other hand, the flatness of the flat surface may vary by tens of μm. At this time, it is difficult to press the plurality of components on the substrate with a uniform force using the flat plate.
例如,專利文獻1記載了以樹脂膜披覆電子元件以及安裝板的技術。樹脂膜具有隨著複數元件的形狀變形的特徵,在意圖解決上述問題時,應考量以樹脂膜等彈性片材將基板上複數元件壓入是有用的。使用這樣的技術時,為了以均勻的力壓入複數元件,需要更多發想。 [先前技術文獻] [專利文獻] For example, Patent Document 1 describes a technology of covering electronic components and mounting boards with resin films. The resin film has the characteristic of deforming according to the shape of the plurality of components. When trying to solve the above problem, it should be considered that it is useful to press the plurality of components on the substrate with an elastic sheet such as a resin film. When using this technology, more thought is needed in order to press in multiple components with uniform force. [Prior technical literature] [Patent Document]
[專利文獻1]日本專利特開2002-217221號公報[Patent Document 1] Japanese Patent Application Laid-Open No. 2002-217221
[發明所欲解決的課題][Problem to be solved by the invention]
有鑑於此實際狀況,本發明的目的為提供可以充分確保複數元件與基板的接合穩定性的基板處理裝置以及基板處理方法。 [用以解決課題的手段] In view of this actual situation, an object of the present invention is to provide a substrate processing apparatus and a substrate processing method that can fully ensure the stability of the bonding between a plurality of components and a substrate. [Means used to solve problems]
為了達成上述目的,關於本發明的基板處理裝置,包括:載台,設置已配置複數元件的基板;上部構件,覆蓋前述載台的上方,與前述載台之間形成加壓空間;片材保持部,在前述載台與前述上部構件之間保持彈性片材;以及加壓控制部,加壓前述加壓空間;其中前述片材保持部藉由配置於前述載台兩側的推送軸與捲繞輥將前述彈性片材從前述載台的一側搬運到另一側,並將前述彈性片材配置於前述載台,使前述基板被覆蓋。In order to achieve the above object, a substrate processing apparatus of the present invention includes: a stage on which a substrate with a plurality of components is arranged; an upper member covering the top of the stage and forming a pressurized space between the stage; and a sheet holding a section that holds the elastic sheet between the stage and the upper member; and a pressure control section that pressurizes the pressurized space; wherein the sheet holding section is controlled by push shafts and rolls arranged on both sides of the stage. The elastic sheet is conveyed around the roller from one side of the stage to the other side, and the elastic sheet is arranged on the stage so that the substrate is covered.
在關於本發明的基板處理裝置中加壓控制部加壓加壓空間,片材保持部藉由配置於載台兩側的推送軸與捲繞輥將彈性片材從載台的一側搬運到另一側,並將彈性片材配置於載台,使基板被覆蓋。在將彈性片材配置於載台使基板被覆蓋的狀態下,藉由以加壓控制部加壓加壓空間,可以基於其壓力將彈性片材往基板按壓,彈性片材與基板或配置於基板的複數元件接觸,可以藉由彈性片材將配置於基板的複數元件壓入。In the substrate processing device of the present invention, the pressurizing control unit pressurizes the pressurizing space, and the sheet holding unit transports the elastic sheet from one side of the stage to the other side through the push shaft and the winding roller arranged on both sides of the stage, and arranges the elastic sheet on the stage so that the substrate is covered. In the state where the elastic sheet is arranged on the stage so that the substrate is covered, the pressurizing control unit pressurizes the pressurizing space, and the elastic sheet can be pressed toward the substrate based on the pressure, so that the elastic sheet contacts the substrate or a plurality of components arranged on the substrate, and the plurality of components arranged on the substrate can be pressed in by the elastic sheet.
另外,在加壓空間加壓時,彈性片材可隨著配置於基板的複數元件的形狀變形,因此,使彈性片材貼合複數元件,可以藉由彈性片材以均勻的力壓入複數元件。另外,由於藉由推送軸與捲繞輥將彈性片材從載台的一側搬運到另一側,可以藉由小型且簡易的構成,在載台與上部構件之間提供彈性片材。以上,根據關於本發明的基板處理裝置,可以充分確保複數元件與基板的接合穩定性。In addition, when the pressurized space is pressurized, the elastic sheet can be deformed along with the shapes of the plurality of components arranged on the substrate, so that the elastic sheet can be made to fit the plurality of components and the plurality of components can be pressed in with a uniform force by the elastic sheet. In addition, since the elastic sheet is transported from one side of the stage to the other side by the push shaft and the winding roller, the elastic sheet can be provided between the stage and the upper member by a small and simple structure. As described above, according to the substrate processing device of the present invention, the bonding stability of the plurality of components and the substrate can be fully ensured.
較佳為,每次在前述載台設置前述基板時,前述推送軸與前述捲繞輥分別進行前述彈性片材的送出以及捲繞。藉由這樣的構成,每次在載台設置基板時,在載台與上部構件之間提供彈性片材的未使用部分,藉由此適當狀態的彈性片材,可以以穩定的狀態將配置於基板的複數元件壓入。Preferably, each time the substrate is placed on the stage, the push shaft and the winding roller respectively deliver and wind the elastic sheet. With such a configuration, each time the substrate is placed on the stage, an unused portion of the elastic sheet is provided between the stage and the upper member, and the elastic sheet in an appropriate state can be used to press a plurality of components arranged on the substrate in a stable state.
較佳為,更包括可升降地貫通前述載台之內部的複數升降銷,前述基板透過複數前述升降銷被搬運到前述載台。藉由設為這樣的構成,可以將基板以穩定的狀態從該傳送位置轉移到載台,可以防止該轉移時基板的損傷等。Preferably, it further includes a plurality of lift pins that can be lifted and lowered through the inside of the stage, and the substrate is transported to the stage through the plurality of lift pins. With such a configuration, the substrate can be transferred from the transfer position to the stage in a stable state, and damage to the substrate during the transfer can be prevented.
較佳為,前述片材保持部相對靠近前述載台,前述彈性片材被配置於前述載台。藉由這樣的構成,可以有效率地進行將彈性片材配置於載台的處理,可以期待操作流水線的高速化。Preferably, the sheet holding portion is relatively close to the stage, and the flexible sheet is arranged on the stage. With such a configuration, the flexible sheet can be arranged on the stage efficiently, and the operation line can be expected to be accelerated.
較佳為,更包括減壓由前述彈性片材與前述載台包圍的片材內空間的減壓控制部。以在載台配置彈性片材使基板被覆蓋的狀態,藉由減壓片材內空間,彈性片材被吸往基板,可以使彈性片材貼合基板或配置於基板的複數元件。在此狀態下,加壓加壓空間,藉由基於其壓力將彈性片材往基板按壓,可以由彈性片材將配置於基板的複數元件以均勻的力壓入。Preferably, the device further comprises a decompression control unit for decompressing the space inside the sheet surrounded by the elastic sheet and the carrier. When the elastic sheet is arranged on the carrier so that the substrate is covered, the elastic sheet is sucked toward the substrate by decompressing the space inside the sheet, so that the elastic sheet can be attached to the substrate or a plurality of components arranged on the substrate. In this state, the pressurized space is pressurized, and the elastic sheet is pressed toward the substrate based on the pressure, so that the elastic sheet can press the plurality of components arranged on the substrate with a uniform force.
較佳為,在比前述基板的設置區域更遠離前述載台之中心的位置上,設置用以將前述彈性片材固定於前述載台的片材固定部。在片材固定部的位置上,在將彈性片材固定於載台的狀態下,藉由加壓加壓空間,可以以穩定的狀態將彈性片材往基板按壓,可以藉由彈性片材將配置於基板的複數元件以更均勻的力壓入。Preferably, a sheet fixing portion for fixing the elastic sheet to the stage is provided at a position further away from the center of the stage than the installation area of the substrate. At the position of the sheet fixing part, with the elastic sheet fixed to the stage, by pressurizing the pressurized space, the elastic sheet can be pressed against the substrate in a stable state. Multiple components arranged on the substrate are pressed in with a more uniform force.
較佳為,前述加壓控制部加壓前述加壓空間,使前述加壓空間內部的氣壓基本上成為前述加壓空間外部之氣壓的2倍。藉由這樣的構成,在加壓加壓空間時,以適當的按壓力將彈性片材往基板按壓,可以藉由彈性片材將複數元件以適當的力往基板壓入。因此,可以防止複數元件從基板脫落,可以充分確保複數元件與基板的接合穩定性。Preferably, the pressurization control unit pressurizes the pressurized space so that the air pressure inside the pressurized space is substantially twice the air pressure outside the pressurized space. With such a configuration, when the pressurized space is pressurized, the elastic sheet is pressed against the substrate with an appropriate pressure, and the plurality of components can be pressed into the substrate with an appropriate force by the elastic sheet. Therefore, the plurality of components can be prevented from falling off the substrate, and the bonding stability between the plurality of components and the substrate can be fully ensured.
為了達成上述目的,關於本發明的基板處理方法包括:將配置複數元件之基板設置於被設置在加壓空間之內部的載台上之步驟;將前述彈性片材配置於前述載台上以覆蓋前述基板之步驟;減壓由前述彈性片材與前述載台包圍的片材內空間之步驟;以及加壓前述加壓空間之步驟。In order to achieve the above object, the substrate processing method of the present invention includes the steps of: arranging a substrate with a plurality of components on a stage provided inside a pressurized space; arranging the elastic sheet on the stage to cover it The steps of the aforementioned substrate; the step of depressurizing the space within the sheet surrounded by the aforementioned elastic sheet and the aforementioned stage; and the step of pressurizing the aforementioned pressurized space.
在關於本發明的基板處理方法中,具有將彈性片材配置於載台上以覆蓋基板的步驟、減壓由彈性片材與載台包圍的片材內空間的步驟,以及加壓加壓空間的步驟。在將彈性片材配置於載台上以覆蓋基板的狀態下,藉由減壓片材內空間,彈性片材被吸往基板,彈性片材可接觸基板或配置於基板的複數元件。在此狀態中,藉由將加壓空間加壓,基於此壓力,彈性片材被往基板按壓,可以藉由彈性片材將配置於基板的複數元件壓入。In the substrate processing method of the present invention, there are steps of placing an elastic sheet on a stage to cover the substrate, depressurizing the space inside the sheet surrounded by the elastic sheet and the stage, and pressurizing the pressurized space. In a state where the elastic sheet is placed on the stage to cover the substrate, the elastic sheet is sucked toward the substrate by depressurizing the space inside the sheet, and the elastic sheet can contact the substrate or a plurality of components placed on the substrate. In this state, by pressurizing the pressurized space, the elastic sheet is pressed toward the substrate based on the pressure, and a plurality of components placed on the substrate can be pressed in by the elastic sheet.
另外,片材內空間減壓時,或者加壓空間加壓時,彈性片材可隨著配置於基板的複數元件的形狀變形。因此,使彈性片材貼合複數元件,可以藉由彈性片材以均勻的力壓入複數元件。因此,根據關於本發明的基板處理方法,可以充分確保複數元件與基板的接合穩定性。In addition, when the space inside the sheet is depressurized or when the pressurized space is pressurized, the elastic sheet can be deformed according to the shape of the multiple components arranged on the substrate. Therefore, by making the elastic sheet fit the multiple components, the multiple components can be pressed into the elastic sheet with a uniform force. Therefore, according to the substrate processing method of the present invention, the bonding stability of the multiple components and the substrate can be fully ensured.
較佳為,在前述彈性片材和配置於前述基板的複數前述元件接觸的狀態下,加壓前述加壓空間。藉由這樣的構成,如上述般,基於加壓空間的氣壓,在將彈性片材往基板按壓時,可以以彈性片材將配置於基板的複數元件有效率地壓入。Preferably, the pressurized space is pressurized in a state where the elastic sheet is in contact with the plurality of elements arranged on the substrate. With such a configuration, as described above, when the elastic sheet is pressed against the substrate based on the air pressure of the pressurized space, the plurality of components arranged on the substrate can be efficiently pressed into the substrate using the elastic sheet.
較佳為,在加壓前述加壓空間的期間,藉由加熱前述加壓空間,加熱設置於前述載台的前述基板。藉由設為這樣的構成,可以將配置於基板的複數元件良好地接合到基板。另外,彈性片材變得容易隨著配置於基板的複數元件的形狀變形,在片材內空間減壓時,或加壓空間加壓時,可以提高彈性片材與複數元件的貼合度。Preferably, while the pressurized space is being pressurized, the substrate provided on the stage is heated by heating the pressurized space. With such a configuration, a plurality of elements arranged on the substrate can be bonded to the substrate satisfactorily. In addition, the elastic sheet becomes easy to deform according to the shape of the plurality of components arranged on the substrate. When the space inside the sheet is depressurized or the pressurized space is pressurized, the degree of adhesion between the elastic sheet and the plurality of components can be improved.
較佳為,在加壓前述加壓空間的期間,藉由加熱前述載台,加熱設置於前述載台的前述基板。在設為這樣的構成時,也可以將配置於基板的複數元件良好地接合到基板。另外,彈性片材變得容易隨著配置於基板的複數元件的形狀變形,在片材內空間減壓時,或加壓空間加壓時,可以提高彈性片材與複數元件的貼合度。Preferably, while the pressurized space is being pressurized, the substrate mounted on the stage is heated by heating the stage. Even with such a configuration, a plurality of elements arranged on the substrate can be bonded to the substrate satisfactorily. In addition, the elastic sheet becomes easy to deform according to the shape of the plurality of components arranged on the substrate. When the space inside the sheet is depressurized or the pressurized space is pressurized, the degree of adhesion between the elastic sheet and the plurality of components can be improved.
以下基於圖式所示的實施型態說明本發明。The present invention is described below based on the embodiments shown in the drawings.
如第1圖所示,關於本發明之一實施型態的基板處理裝置10為用以在基板2上形成由複數元件4a、4b、4c構成的元件陣列4(第3圖)的裝置,藉由進行以特定手段對配置複數元件4a、4b、4c的基板2壓入複數元件4a、4b、4c的處理,意圖提升複數元件4a、4b、4c與基板2機械性接合的強度或接和穩定性。意即,基板處理裝置10在基板2上形成元件陣列4時,作為加壓部(加壓裝置)提供功能。基板處理裝置10包括腔室20、載台30以及片材保持部40。在圖式中,X軸對應腔室20的寬度方向,Y軸對應腔室20的深度方向,Z軸對應腔室20的高度方向。As shown in FIG. 1, a substrate processing apparatus 10 according to one embodiment of the present invention is an apparatus for forming an element array 4 (FIG. 3) composed of a plurality of elements 4a, 4b, 4c on a substrate 2, and is intended to enhance the strength or stability of the mechanical connection between the plurality of elements 4a, 4b, 4c and the substrate 2 by pressing the plurality of elements 4a, 4b, 4c into the substrate 2 on which the plurality of elements 4a, 4b, 4c are arranged by a specific means. That is, the substrate processing apparatus 10 provides a function as a pressurizing unit (pressurizing device) when forming the element array 4 on the substrate 2. The substrate processing apparatus 10 includes a chamber 20, a stage 30, and a sheet holding unit 40. In the figure, the X-axis corresponds to the width direction of the chamber 20 , the Y-axis corresponds to the depth direction of the chamber 20 , and the Z-axis corresponds to the height direction of the chamber 20 .
腔室20由金屬等箱體構成,包括上部構件21以及下部構件22。上部構件21以及下部構件22被配置為可上下(Z軸方向)組合。上部構件21以及下部構件22的至少一者可在Z軸方向上移動,在本實施型態中,上部構件21相對於下部構件22上下移動。藉由組合上部構件21以及下部構件22形成處理室6。處理室6為在上部構件21以及下部構件22的內側形成的空間,作為加壓空間被利用。處理室6的內部存在空氣、氮氣、惰性氣體等。The chamber 20 is composed of a metal or other box body and includes an upper member 21 and a lower member 22 . The upper member 21 and the lower member 22 are arranged so as to be assembleable up and down (in the Z-axis direction). At least one of the upper member 21 and the lower member 22 is movable in the Z-axis direction. In this embodiment, the upper member 21 moves up and down relative to the lower member 22 . The processing chamber 6 is formed by combining the upper member 21 and the lower member 22 . The processing chamber 6 is a space formed inside the upper member 21 and the lower member 22 and is used as a pressurized space. Air, nitrogen, inert gas, etc. exist inside the processing chamber 6 .
將基板2等搬入腔室20時,上部構件21相對於下部構件22往上方移動,開放處理室6。在處理室6打開的狀態下,上部構件21以及下部構件22之間形成搬運空間7。藉由片材保持部40,後述之彈性片材80被搬運到搬運空間7,並且被保持。When the substrate 2 and the like are carried into the chamber 20, the upper member 21 moves upward relative to the lower member 22 to open the processing chamber 6. When the processing chamber 6 is opened, a transport space 7 is formed between the upper member 21 and the lower member 22. The elastic sheet 80 described later is carried to the transport space 7 by the sheet holding portion 40 and is held.
對於配置複數元件4a、4b、4c的基板2,在以特定手段進行壓入複數元件4a、4b、4c的處理時,如第9圖所示,上部構件21從第1圖所示的位置相對於下部構件22往下方移動,關閉(密閉)處理室6。因此,處理室6構成密閉空間,作為可以加壓其內部的加壓空間提供功能。When the substrate 2 on which the plurality of components 4a, 4b, 4c are arranged is subjected to a process of pressing the plurality of components 4a, 4b, 4c by a specific means, as shown in Fig. 9, the upper member 21 moves downward relative to the lower member 22 from the position shown in Fig. 1, and closes (seals) the processing chamber 6. Therefore, the processing chamber 6 constitutes a closed space and functions as a pressurized space in which the interior thereof can be pressurized.
如第1圖所示,上部構件21具有基本上由C字形狀構成的剖面形狀,包括頂板部210以及上側腳部211。上部構件21作為腔室20之蓋部提供功能。頂板部210構成上部構件21的頂部,由具有基本上與XY平面平行之形狀的板體構成。頂板部210被形成為覆蓋載台30的上方。上側腳部211基本上相對於頂板部210向垂直方向(下方)延伸,形成於頂板部210的邊緣部。雖然省略詳細圖示,從Z軸負方向側看上部構件21時,上側腳部211被形成為基本上以環狀(基本方形狀)圍繞頂板部210的邊緣部。上側腳部211支撐頂板部210。As shown in FIG. 1 , the upper component 21 has a cross-sectional shape that is basically a C-shape, and includes a top plate portion 210 and an upper leg portion 211. The upper component 21 functions as a cover of the chamber 20. The top plate portion 210 constitutes the top of the upper component 21, and is composed of a plate body having a shape that is basically parallel to the XY plane. The top plate portion 210 is formed to cover the top of the carrier 30. The upper leg portion 211 extends basically in a vertical direction (downward) relative to the top plate portion 210, and is formed at the edge of the top plate portion 210. Although not shown in detail, when the upper member 21 is viewed from the negative Z-axis direction, the upper leg portion 211 is formed to surround the edge of the top plate portion 210 in a substantially ring shape (substantially square shape). The upper leg portion 211 supports the top plate portion 210.
在上部構件21之內側(意即由頂板部210以及上側腳部211包圍的區域)形成第1空間212。在將上部構件21組合到下部構件22的狀態中,第1空間212構成處理室6之上側的一部份。A first space 212 is formed inside the upper member 21 (i.e., an area surrounded by the top plate 210 and the upper leg 211). When the upper member 21 is assembled to the lower member 22, the first space 212 constitutes a portion of the upper side of the processing chamber 6.
在第1空間212的內部中,在頂板部210設置上部加熱裝置91。上部加熱裝置91用以加熱處理室6的內部大氣,例如由加熱器等構成。從上部加熱裝置91產生的熱如後述般,被導熱向設置於載台30的基板2,有助於提升基板2與配置於其上的複數元件4a、4b、4c的接合力。另外,如後述般,在載台30配置彈性片材80以覆蓋基板2(參照第8圖),從上部加熱裝置91產生的熱也導熱到此彈性片材80,可以使彈性片材80的形狀隨著配置於基板2之複數元件4a、4b、4c的形狀變形。In the interior of the first space 212, an upper heating device 91 is provided on the ceiling portion 210. The upper heating device 91 is used to heat the internal atmosphere of the processing chamber 6, and is composed of, for example, a heater. As described later, the heat generated from the upper heating device 91 is conducted to the substrate 2 disposed on the stage 30, which helps to improve the bonding force between the substrate 2 and the plurality of components 4a, 4b, 4c disposed thereon. In addition, as described later, an elastic sheet 80 is disposed on the stage 30 to cover the substrate 2 (see FIG. 8 ), and the heat generated from the upper heating device 91 is also conducted to the elastic sheet 80, so that the shape of the elastic sheet 80 can be deformed along with the shapes of the plurality of components 4a, 4b, 4c disposed on the substrate 2.
下部構件22具有基本上相對於上部構件21對稱的形狀。下部構件22具有基本上由C字形狀構成的剖面形狀,包括底部220以及下側腳部221。底部220構成下部構件22的底部,由具有基本上與XY平面平行之形狀的板體構成。在底部220形成複數貫通孔220a,後述之複數升降銷(lift pin)50可升降地插入複數貫通孔220a。The lower member 22 has a substantially symmetrical shape relative to the upper member 21 . The lower member 22 has a substantially C-shaped cross-sectional shape and includes a bottom portion 220 and a lower leg portion 221 . The bottom 220 constitutes the bottom of the lower member 22 and is composed of a plate body having a shape substantially parallel to the XY plane. A plurality of through-holes 220a are formed in the bottom 220, and a plurality of lift pins 50 (to be described later) are inserted into the plurality of through-holes 220a so as to be able to move up and down.
下側腳部221基本上相對於底部220向垂直方向(上方)延伸,形成於底部220的邊緣部。雖然省略詳細圖示,從Z軸正方向側看下部構件22時,下側腳部221被形成為基本上以環狀(基本方形狀)圍繞底部220的邊緣部。如後所述,在將上部構件21組合到下部構件22的狀態中,下側腳部221直接或透過彈性片材80接觸上側腳部211,支撐上部構件21。另外,上側腳部211以及下側腳部221透過O形環等之密封構件連接為佳。The lower leg 221 basically extends in a vertical direction (upward) relative to the bottom 220 and is formed at the edge of the bottom 220. Although detailed illustration is omitted, when the lower member 22 is viewed from the positive direction of the Z axis, the lower leg 221 is formed to surround the edge of the bottom 220 in a substantially ring shape (substantially square shape). As described later, when the upper member 21 is assembled to the lower member 22, the lower leg 221 contacts the upper leg 211 directly or through the elastic sheet 80 to support the upper member 21. In addition, the upper leg 211 and the lower leg 221 are preferably connected through a sealing member such as an O-ring.
在下部構件22的內側(意即由底部220以及下側腳部221包圍的區域)形成第2空間222。在將上部構件21組合到下部構件22的狀態中,第2空間222構成處理室6之下側的一部份。意即,藉由組合第1空間212以及第2空間222構成處理室6。另外,在上部構件21或下部構件22形成未圖示的管路,透過此管路向處理室6內部送入氣體,可以將處理室6的內部加壓(設為正壓)。 The second space 222 is formed inside the lower member 22 (that is, the area surrounded by the bottom 220 and the lower leg portion 221). When the upper member 21 is assembled to the lower member 22 , the second space 222 constitutes a part of the lower side of the processing chamber 6 . That is, the processing chamber 6 is formed by combining the first space 212 and the second space 222 . In addition, a pipeline (not shown) is formed in the upper member 21 or the lower member 22, and gas is sent into the inside of the processing chamber 6 through this pipeline, so that the inside of the processing chamber 6 can be pressurized (set to a positive pressure).
載台30為用以設置已配置複數元件4a、4b、4c之基板2的平台,由未圖示之支撐構件固定於腔室20(上側腳部211以及下側腳部221)的內側。載台30例如由金屬製扁平板體構成,具有基本上與XY平面平行的面。 The stage 30 is a platform for placing the substrate 2 on which the plurality of components 4a, 4b, and 4c are arranged, and is fixed to the inside of the chamber 20 (the upper leg portion 211 and the lower leg portion 221) by a support member (not shown). The stage 30 is made of, for example, a metal flat plate, and has a surface substantially parallel to the XY plane.
載台30的X軸方向寬度,只比上側腳部211以及下側腳部221各自的內圓周面的X軸方向寬度(意即第1空間212以及第2空間222各自的X軸方向寬度)短特定長度。載台30的Y軸方向寬度,只比上側腳部211以及下側腳部221各自的內圓周面的Y軸方向寬度(意即第1空間212以及第2空間222各自的Y軸方向寬度)短特定長度。 The width of the stage 30 in the X-axis direction is shorter than the width of the inner circumference of each of the upper leg 211 and the lower leg 221 in the X-axis direction (i.e., the width of each of the first space 212 and the second space 222 in the X-axis direction) by a specific length. The width of the stage 30 in the Y-axis direction is shorter than the width of the inner circumference of each of the upper leg 211 and the lower leg 221 in the Y-axis direction (i.e., the width of each of the first space 212 and the second space 222 in the Y-axis direction) by a specific length.
載台30的上方被上部構件21的頂板部210覆蓋,載台30的下方配置下部構件22的底部220。載台30被配置於比下部構件22之下側腳部221的Z軸正方向側端部(頂部)的更上方,在將上部構件21組合到下部構件22的狀態中,載台30位於上部構件21的第1空間212內部。載台30以及上部構件21之間形成的空間構成加壓空間(處理室6)的一部分。 The top of the stage 30 is covered by the top plate 210 of the upper member 21, and the bottom 220 of the lower member 22 is arranged below the stage 30. The stage 30 is arranged above the positive side end (top) of the lower side foot 221 of the lower member 22 in the Z-axis direction, and when the upper member 21 is assembled to the lower member 22, the stage 30 is located inside the first space 212 of the upper member 21. The space formed between the stage 30 and the upper member 21 constitutes a part of the pressurized space (processing chamber 6).
另外,不特別限定載台30的高度位置,可以是與下側腳部221的Z軸正方向側之端部相同的高度。或者,載台30也可以被配置於比下部構件22的下側腳部221的Z軸正方向側之端部(頂部)更下方處。 In addition, the height position of the stage 30 is not particularly limited, and may be the same height as the end of the lower leg 221 on the positive direction side of the Z axis. Alternatively, the stage 30 may be arranged below the end (top) of the lower leg 221 on the positive direction side of the Z axis of the lower component 22.
另外,載台30的X軸方向寬度也可以和上側腳部211以及下側腳部221的各內圓周面的X軸方向寬度相等,載台30的Y軸方向寬度也可以和上側腳部211以及下側腳部221的各內圓周面的Y軸方向寬度相等。此時,上側腳部211與載台30的邊緣部(端面)接觸,由載台30、頂板部210以及上側腳部211形成密閉空間。此密閉空間可以作為加壓空間利用。 In addition, the X-axis direction width of the stage 30 may be equal to the X-axis direction width of each inner circumferential surface of the upper leg 211 and the lower leg 221 , and the Y-axis direction width of the stage 30 may be equal to the upper leg 211 And the Y-axis direction width of each inner circumferential surface of the lower leg portion 221 is equal. At this time, the upper leg portion 211 is in contact with the edge portion (end surface) of the stage 30 , and a sealed space is formed by the stage 30 , the top plate portion 210 , and the upper leg portion 211 . This confined space can be utilized as a pressurized space.
在載台30的背面設置下部加熱裝置92。下部加熱裝置92用以加熱載台30,由例如加熱器等構成。從下部加熱裝置92產生的熱被導熱向設置於載台30的基板2,有助於提升基板2與配置於其上的複數元件4a、4b、4c的接合力。另外,如後述般,在載台30配置彈性片材80以覆蓋基板2,從下部加熱裝置92產生的熱也導熱到此彈性片材80,可以使彈性片材80的形狀隨著配置於基板2之複數元件4a、4b、4c的形狀變形。A lower heating device 92 is provided on the back of the stage 30. The lower heating device 92 is used to heat the stage 30 and is composed of, for example, a heater. The heat generated from the lower heating device 92 is conducted to the substrate 2 provided on the stage 30, which helps to improve the bonding force between the substrate 2 and the plurality of components 4a, 4b, 4c arranged thereon. In addition, as described later, an elastic sheet 80 is arranged on the stage 30 to cover the substrate 2, and the heat generated from the lower heating device 92 is also conducted to the elastic sheet 80, so that the shape of the elastic sheet 80 can be deformed along with the shapes of the plurality of components 4a, 4b, 4c arranged on the substrate 2.
載台30包括複數第1抽吸孔31、第2抽吸孔32以及片材固定部33(第3圖)。如第2圖所示,複數第1抽吸孔31之每一者被形成於載台30之基板設置區域34的外緣部34a。基板設置區域34在基本上由方形構成的載台30中,是設置基板2的區域,為符合基板2之形狀的形狀(在本實施型態中基本上為方形)。雖然詳細內容將描述於後,在載台30設置基板2的狀態中,載台30由彈性片材80覆蓋(參照第3圖),彈性片材80以及載台30之間形成片材內空間8(第5圖)。第1抽吸孔31作為用以抽吸此片材內空間8內部之氣體(內部大氣)的抽吸孔提供功能,被配置於可抽吸片材內空間8內部之氣體的位置。The carrier 30 includes a plurality of first suction holes 31, a second suction hole 32, and a sheet fixing portion 33 (FIG. 3). As shown in FIG. 2, each of the plurality of first suction holes 31 is formed at an outer edge portion 34a of a substrate setting area 34 of the carrier 30. The substrate setting area 34 is an area where the substrate 2 is set in the carrier 30 which is basically formed of a square, and has a shape that conforms to the shape of the substrate 2 (basically a square in the present embodiment). Although the details will be described later, in a state where the substrate 2 is set on the carrier 30, the carrier 30 is covered by an elastic sheet 80 (refer to FIG. 3), and a sheet space 8 is formed between the elastic sheet 80 and the carrier 30 (FIG. 5). The first suction hole 31 functions as a suction hole for sucking the gas (internal atmosphere) inside the space 8 inside the sheet, and is arranged at a position where the gas inside the space 8 inside the sheet can be sucked.
關於第1抽吸孔31的大小,例如第1抽吸孔31的形狀為長方形時,第1抽吸孔31的短邊長度以0.3~10.0mm為佳,以0.5~1.5mm為更佳。另外,第1抽吸孔31的長邊長度優以2.0~15.0mm為佳,以3.0~5.0mm為更佳。Regarding the size of the first suction hole 31, for example, when the shape of the first suction hole 31 is a rectangle, the length of the short side of the first suction hole 31 is preferably 0.3~10.0 mm, and more preferably 0.5~1.5 mm. In addition, the length of the long side of the first suction hole 31 is preferably 2.0 to 15.0 mm, and more preferably 3.0 to 5.0 mm.
將第1抽吸孔31的短邊長度設定於上述範圍時,第1抽吸孔31的短邊長度不會過短,可以有效率地抽吸片材內空間8(第5圖)內部的氣體。另外,透過第1抽吸孔31抽吸片材內空間8內部的氣體時,雖然彈性片材80被吸往第1抽吸孔31,此時可以防止彈性片材80透過第1抽吸孔31被過度抽吸,可以防止在使用彈性片材80的基板2加壓處理後,難以從基板2或載台30將彈性片材80剝離等缺陷的發生。When the short side length of the first suction hole 31 is set within the above range, the short side length of the first suction hole 31 will not be too short, and the gas inside the sheet inner space 8 (FIG. 5) can be efficiently sucked. In addition, when the gas inside the sheet inner space 8 is sucked through the first suction hole 31, although the elastic sheet 80 is sucked toward the first suction hole 31, it is possible to prevent the elastic sheet 80 from being excessively sucked through the first suction hole 31, and it is possible to prevent the occurrence of defects such as difficulty in peeling the elastic sheet 80 from the substrate 2 or the stage 30 after the substrate 2 using the elastic sheet 80 is pressurized.
另外,將第1抽吸孔31的長邊長度設定於上述範圍時,第1抽吸孔31的長邊長度不會過短,可以有效率地抽吸片材內空間8內部的氣體。另外,第1抽吸孔31的長邊長度不會過長,可以防止基板2的面內的溫度分布產生偏差,均勻維持基板2各部分的適當性,提升基板2與配置於其上的複數元件4a、4b、4c的接合可靠度。In addition, when the long side length of the first suction hole 31 is set within the above range, the long side length of the first suction hole 31 will not be too short, and the gas inside the sheet inner space 8 can be efficiently sucked. In addition, the long side length of the first suction hole 31 will not be too long, which can prevent the temperature distribution in the surface of the substrate 2 from deviating, evenly maintain the suitability of each part of the substrate 2, and improve the bonding reliability between the substrate 2 and the plurality of components 4a, 4b, 4c arranged thereon.
另外,第1抽吸孔31的形狀為橢圓形時,可以將上述長方形短邊長度應用於橢圓的短軸長度,將上述長方形長邊長度應用於橢圓的長軸長度。另外,第1抽吸孔31的形狀為其他形狀時亦同,可以將上述長方形短邊長度應用於由其他形狀構成的第1抽吸孔31之Y軸方向長度,將上述長方形長邊長度應用於由其他形狀構成的第1抽吸孔31之X軸方向長度。In addition, when the shape of the first suction hole 31 is an ellipse, the length of the short side of the rectangle can be applied to the length of the short axis of the ellipse, and the length of the long side of the rectangle can be applied to the length of the long axis of the ellipse. In addition, when the shape of the first suction hole 31 is other shapes, the same is true. The length of the short side of the rectangle can be applied to the length of the first suction hole 31 in the Y-axis direction formed by other shapes, and the length of the long side of the rectangle can be applied to the length of the first suction hole 31 in the X-axis direction formed by other shapes.
在圖示的例子中,複數第1抽吸孔31中的幾個沿著基本上呈方形的基板設置區域34之第1邊34a1或第3邊34a3,向Y軸方向以特定間隔被配置為直線狀。複數第1抽吸孔31中的幾個沿著基本上呈方形的基板設置區域34之第2邊34a2或第4邊34a4,向X軸方向以特定間隔被配置為直線狀。In the example shown in the figure, some of the plurality of first suction holes 31 are arranged at specific intervals in the Y-axis direction along the first side 34a1 or the third side 34a3 of the substantially square substrate installation area 34. Linear shape. Some of the plurality of first suction holes 31 are linearly arranged at specific intervals in the X-axis direction along the second side 34a2 or the fourth side 34a4 of the substantially square substrate installation area 34.
第1抽吸孔31的數量不限於圖示的數量,可以適當地變更。另外,複數第1抽吸孔31之每一者的間距也可以適當地變更,例如複數第1抽吸孔31之每一者以比其直徑(沿著基板設置區域34的外緣部34a的延伸方向的直徑)更短的距離鄰接配置。The number of the first suction holes 31 is not limited to the number shown in the figure, and can be changed appropriately. In addition, the pitch of each of the plurality of first suction holes 31 may also be appropriately changed. For example, the pitch of each of the plurality of first suction holes 31 may be smaller than the diameter of each of the plurality of first suction holes 31 (along the outer edge portion 34a of the substrate installation area 34). diameter in the extending direction) are adjacently arranged at a shorter distance.
從Z軸方向看第1抽吸孔31時,第1抽吸孔31基本上具有橢圓形狀。但是,第1抽吸孔31的形狀不限於此,可以基本上為橢圓形、基本上為三角形、基本上為方形,或是其他多角形。例如,第1抽吸孔31的形狀可以是在與基板設置區域34之外緣部34a之延伸方向垂直的方向(沿著X軸方向或Y軸方向從基板設置區域34的外緣部34a離開的方向)具有長軸的略橢圓形。或者,與第1抽吸孔31之外緣部34a之延伸方向垂直的方向的寬度,可以比沿著第1抽吸孔31之外緣部34a之延伸方向的方向的寬度更大。When the first suction hole 31 is viewed from the Z-axis direction, the first suction hole 31 has a substantially elliptical shape. However, the shape of the first suction hole 31 is not limited to this, and may be substantially elliptical, substantially triangular, substantially square, or other polygonal shapes. For example, the shape of the first suction hole 31 may be in a direction perpendicular to the extending direction of the outer edge 34a of the substrate installation area 34 (away from the outer edge 34a of the substrate installation area 34 along the X-axis direction or the Y-axis direction). direction) a slightly elliptical shape with a long axis. Alternatively, the width in the direction perpendicular to the extending direction of the outer edge portion 34 a of the first suction hole 31 may be larger than the width in the direction along the extending direction of the outer edge portion 34 a of the first suction hole 31 .
如圖中的放大圖所示,複數第1抽吸孔31之每一者被形成為橫跨載台30之基板設置區域34的外緣部34a之內外。意即,第1抽吸孔31的一部份位於比基板設置區域34之外緣部34a更外側(遠離30之中心側)處,第1抽吸孔31剩下的一部份位於比基板設置區域34之外緣部34a更內側(靠近載台30之中心側)處。As shown in the enlarged view of the figure, each of the plurality of first suction holes 31 is formed across the outer edge portion 34 a of the substrate installation area 34 of the stage 30 . That is, a part of the first suction hole 31 is located further outside the outer edge 34a of the substrate installation area 34 (away from the center side of 30), and the remaining part of the first suction hole 31 is located farther than the substrate. The outer edge portion 34a of the area 34 is provided further inside (closer to the center side of the stage 30).
雖然在圖示的例子中,在第1抽吸孔31中,位於比基板設置區域34之外緣部34a更外側的部份之面積,比位於基板設置區域34之外緣部34a更內側的部份之面積更小,但也可以更大,或他們的面積可以相等。In the example shown in the figure, in the first suction hole 31, the area of the portion located outside the outer edge portion 34a of the substrate installation area 34 is larger than the area located inside the outer edge portion 34a of the substrate installation area 34. The area of the parts is smaller, but they can also be larger, or their areas can be equal.
在基板設置區域34設置基板2時,在複數第1抽吸孔31之每一者中,位於比基板設置區域34之外緣部34a更內側的第1抽吸孔31之一部分被基板2覆蓋。意即,在將基板2設置於基板設置區域34的狀態下,複數第1抽吸孔31之每一者橫跨設置於基板設置區域34的基板2的外緣部(邊緣部)。When the substrate 2 is installed in the substrate installation area 34 , in each of the plurality of first suction holes 31 , a part of the first suction hole 31 located inside the outer edge 34 a of the substrate installation area 34 is covered by the substrate 2 . That is, when the substrate 2 is installed in the substrate installation area 34 , each of the plurality of first suction holes 31 spans the outer edge portion (edge portion) of the substrate 2 provided in the substrate installation area 34 .
即使基板2被配置為比基板設置區域34之外緣部34a更往X軸方向側及/或Y軸方向側偏移一些位置,複數第1抽吸孔31也被形成為不因此產生障礙。意即,由於複數第1抽吸孔31之每一者被配置為橫跨基板設置區域34之外緣部34,即使基板2被配置為比基板設置區域34之外緣部34a更往X軸方向側及/或Y軸方向側位置偏移,只要第1抽吸孔31沒有完全關閉,可以透過複數第1抽吸孔31之每一者進行抽吸。如此,藉由將複數第1抽吸孔31配置為橫跨基板設置區域34之外緣部34,可以容許基板2相對於基板設置區域34的位置偏移。Even if the substrate 2 is arranged to be slightly shifted toward the X-axis direction side and/or the Y-axis direction side from the outer edge portion 34a of the substrate installation area 34, the plurality of first suction holes 31 are formed so as not to cause obstruction. That is, since each of the plurality of first suction holes 31 is disposed across the outer edge 34 of the substrate installation region 34 , even if the substrate 2 is disposed further toward the X-axis than the outer edge 34 a of the substrate installation region 34 If the position of the direction side and/or the Y-axis direction side is offset, as long as the first suction hole 31 is not completely closed, suction can be performed through each of the plurality of first suction holes 31. In this way, by arranging the plurality of first suction holes 31 across the outer edge portion 34 of the substrate installation area 34 , positional deviation of the substrate 2 relative to the substrate installation area 34 can be tolerated.
在將基板2設置於基板設置區域34的狀態下,第1抽吸孔31之中,位於比基板設置區域34之外緣部34更往內側的部分被基板2關閉,另一方面,位於比基板設置區域34之外緣部34更往外側的部分成為被開放的狀態。因此,對上述片材內空間8(第5圖)之透過第1抽吸孔31的抽吸,主要在位於比基板設置區域34之外緣部34更往外側的部分進行。When the substrate 2 is installed in the substrate installation area 34 , the portion of the first suction hole 31 located inward from the outer edge 34 of the substrate installation area 34 is closed by the substrate 2 . The outer edge portion 34 of the substrate installation area 34 is open. Therefore, suction through the first suction hole 31 of the sheet inner space 8 (Fig. 5) is mainly performed at a portion located outside the outer edge portion 34 of the substrate installation area 34.
另外,在圖示的例子中,雖然在載台30形成複數第1抽吸孔31,第1抽吸孔31的數量也可以為1個。例如,可以在載台30形成沿著基板設置區域34之外緣部34a延伸(或環繞)的基本上為環形狀的第1抽吸孔31。In the example shown in the figure, although a plurality of first suction holes 31 are formed on the stage 30, the number of the first suction hole 31 may be 1. For example, a substantially annular first suction hole 31 extending along (or surrounding) the outer edge 34a of the substrate installation area 34 may be formed on the stage 30.
如第1圖所示,複數第1抽吸孔31之每一者連接第1抽吸管60。複數第1抽吸管60之每一者往下方延伸,其一部份埋設於下部構件22的底部220。透過第1抽吸孔31被抽吸的氣體通過第1抽吸管60被排出於腔室20的外部。複數第1抽吸管60之每一者連接未圖示的抽吸裝置。另外,複數第1抽吸管60也可以互相結合,構成1根抽吸管。此時,若可以藉由抽吸裝置對這1根抽吸管進行抽吸,可以減少抽吸裝置的數量。As shown in FIG. 1, each of the plurality of first suction holes 31 is connected to the first suction pipe 60. Each of the plurality of first suction pipes 60 extends downward, and a portion thereof is buried in the bottom 220 of the lower member 22. The gas sucked through the first suction hole 31 is discharged to the outside of the chamber 20 through the first suction pipe 60. Each of the plurality of first suction pipes 60 is connected to a suction device not shown. In addition, the plurality of first suction pipes 60 may be combined with each other to form one suction pipe. In this case, if the suction pipe can be sucked by the suction device, the number of suction devices can be reduced.
第2抽吸孔32基本上在載台30的中央部形成,被配置於複數第1抽吸孔31的內側。在基板2被設置於載台30的狀態中,藉由透過第2抽吸孔32進行抽吸,可以將基板2吸往載台30,藉由吸附固定於載台30。另外,將基板2吸附於載台30固定的作用,也可以藉由透過複數第1抽吸孔31的抽吸得到。The second suction hole 32 is basically formed in the center of the stage 30 and is arranged inside the plurality of first suction holes 31 . In a state where the substrate 2 is placed on the stage 30 , by suctioning through the second suction hole 32 , the substrate 2 can be sucked to the stage 30 and fixed to the stage 30 by suction. In addition, the effect of adsorbing and fixing the substrate 2 to the stage 30 can also be obtained by suction through the plurality of first suction holes 31 .
如第3圖所示,第2抽吸孔32被形成於載台30之基板設置區域34的內側,被配置於比第1抽吸孔31更往內側(靠近載台30之中心側)。第2抽吸孔32被配置於基本上可抽吸設置於載台30之基板2的中央部的位置為佳。第2抽吸孔32的數量可以是1個,也可以是複數。As shown in FIG. 3 , the second suction hole 32 is formed inside the substrate placement area 34 of the stage 30 and is arranged further inside (close to the center side of the stage 30) than the first suction hole 31. It is preferable that the second suction hole 32 is arranged at a position where the center of the substrate 2 placed on the stage 30 can be sucked. The number of the second suction holes 32 may be one or more.
如第1圖所示,第2抽吸孔32連接第2抽吸管70。第2抽吸管70向下方延伸,其一部份埋設於下部構件22的底部220。透過第2抽吸孔32抽吸的氣體通過第2抽吸管70被排出於腔室20的外部。第2抽吸管70連接未圖示的抽吸裝置。As shown in FIG. 1 , the second suction hole 32 is connected to the second suction pipe 70 . The second suction pipe 70 extends downward, and is partially buried in the bottom 220 of the lower member 22 . The gas sucked through the second suction hole 32 is discharged to the outside of the chamber 20 through the second suction pipe 70 . The second suction pipe 70 is connected to a suction device (not shown).
如第3圖所示,片材固定部33基本上被形成為方形狀,被設置於比複數第1抽吸孔31更遠離載台之中心的位置(複數第1抽吸孔31的外側)。片材固定部33再比基板設置區域34之外緣部34a更遠離載台中心的位置(外緣部34a的外側),且被設置於載台30之邊緣部的內側。片材固定部33,被設置為圍繞基板設置區域34之外緣部34a,被配置於接近外緣部34a的位置。片材固定部33的形狀不限於圖示的形狀,可以適當地變更。As shown in FIG. 3 , the sheet fixing portion 33 is basically formed in a square shape and is provided at a position further away from the center of the stage than the first suction holes 31 (outside the first suction holes 31 ). . The sheet fixing portion 33 is located further away from the center of the stage than the outer edge portion 34 a of the substrate installation area 34 (outside the outer edge portion 34 a ), and is provided inside the edge portion of the stage 30 . The sheet fixing part 33 is provided so as to surround the outer edge part 34a of the substrate installation area 34 and is disposed close to the outer edge part 34a. The shape of the sheet fixing part 33 is not limited to the shape shown in the figure, and can be changed appropriately.
如後所述,在本實施型態中,在載台30設置基板2的狀態中,載台30由彈性片材80覆蓋(第8圖)。片材固定部33具有將配置於此載台30的彈性片材80固定於載台30的功能。如第5圖所示,片材固定部33由例如形成於載台30的複數第3抽吸孔33a構成,藉由透過複數第3抽吸孔33a的抽吸,彈性片材80在片材固定部33的位置貼合於載台30,被固定於載台30。另外,第3抽吸孔33a連接第3抽吸管100。As described later, in the present embodiment, in a state where the substrate 2 is placed on the stage 30, the stage 30 is covered with the elastic sheet 80 (FIG. 8). The sheet fixing portion 33 has a function of fixing the elastic sheet 80 disposed on the stage 30 to the stage 30. As shown in FIG. 5, the sheet fixing portion 33 is composed of, for example, a plurality of third suction holes 33a formed on the stage 30, and the elastic sheet 80 is attached to the stage 30 at the position of the sheet fixing portion 33 by suction through the plurality of third suction holes 33a, and is fixed to the stage 30. In addition, the third suction hole 33a is connected to the third suction pipe 100.
在圖示的例子中,雖然有複數第3抽吸孔33a設置於片材固定部33,片材固定部33也可以設置單一第3抽吸孔33a。此時,第3抽吸孔33a可以是沿著片材固定部33延伸(或環繞)的基本上為環狀的抽吸孔。In the example shown in the figure, although a plurality of third suction holes 33a are provided in the sheet fixing portion 33, a single third suction hole 33a may be provided in the sheet fixing portion 33. In this case, the third suction hole 33a may be a substantially annular suction hole extending along (or surrounding) the sheet fixing portion 33.
另外,片材固定部33也可以由接著劑(接著部)或緊扣件等接合構件構成,彈性片材80可以透過這些接合構件被固定於載台30。另外,也可以在片材固定部33的位置形成沿著片材固定部33環繞的溝,在該溝之內部形成複數第3抽吸孔33a。藉由設為這樣的構成,在片材固定部33的位置將彈性片材80固定於載台30時,可以提高後述之片材內空間8的氣密性,可以防止氣體從片材內空間8的外部進入片材內空間8的內部。In addition, the sheet fixing portion 33 may also be formed of a bonding member such as an adhesive (bonding portion) or a fastener, and the elastic sheet 80 may be fixed to the carrier 30 through these bonding members. In addition, a groove surrounding the sheet fixing portion 33 may be formed at the position of the sheet fixing portion 33, and a plurality of third suction holes 33a may be formed inside the groove. By setting such a structure, when the elastic sheet 80 is fixed to the carrier 30 at the position of the sheet fixing portion 33, the airtightness of the sheet inner space 8 described later can be improved, and gas can be prevented from entering the sheet inner space 8 from the outside of the sheet inner space 8.
片材固定部33與配置複數第1抽吸孔31的基板設置區域34之外緣部34a之間的距離L(參照第3圖以及第5圖)以5~25mm為佳,以10~20mm為更佳。另外,上述距離L與基板2之厚度T1的比值L/T1(參照第5圖) 以5~250為佳,以15~70為更佳。將上述距離L或上述比值L/T1設定於上述範圍時,上述距離L不會變得過長,可以有效率地抽吸片材內空間8(第5圖)之內部的氣體。另外,上述距離L不會變得過短,可以防止彈性片材80咬入基板2之外緣部34a,可以防止在使用彈性片材80的基板2加壓處理後,發生難以從基板2或載台30將彈性片材80剝離等缺陷的發生。另外,基板2的厚度T1(參照第4圖)以0.1~1.0mm為佳,以0.3~0.7mm為更佳。The distance L between the sheet fixing part 33 and the outer edge part 34a of the substrate installation area 34 where the plurality of first suction holes 31 is arranged (see Figures 3 and 5) is preferably 5 to 25 mm, and 10 to 20 mm. For the better. In addition, the ratio L/T1 (refer to Figure 5) of the distance L and the thickness T1 of the substrate 2 is preferably 5 to 250, and more preferably 15 to 70. When the distance L or the ratio L/T1 is set in the above range, the distance L does not become too long, and the gas inside the sheet inner space 8 (Fig. 5) can be efficiently sucked. In addition, the above-mentioned distance L will not become too short, and the elastic sheet 80 can be prevented from biting into the outer edge 34a of the substrate 2, which can prevent the substrate 2 from being difficult to remove from the substrate 2 or the substrate 2 after the pressure treatment using the elastic sheet 80. Defects such as the elastic sheet 80 peeling off the stage 30 may occur. In addition, the thickness T1 of the substrate 2 (see Figure 4) is preferably 0.1 to 1.0 mm, and more preferably 0.3 to 0.7 mm.
如第1圖所示,在載台30形成複數貫通孔35,複數升降銷50以直立狀態插入複數貫通孔35。複數升降銷50分別可升降地貫通載台30的內部。另外,複數升降銷50也插入形成於下部構件22之底部220的複數貫通孔220a的內部,可升降地貫通底部220之內部。升降銷50由棒狀構件構成,在Z軸方向具有特定長度。As shown in FIG. 1 , a plurality of through holes 35 are formed in the stage 30 , and a plurality of lifting pins 50 are inserted into the plurality of through holes 35 in an upright state. The plurality of lifting pins 50 pass through the inside of the stage 30 so as to be able to move up and down. In addition, the plurality of lifting pins 50 are also inserted into the plurality of through holes 220a formed in the bottom 220 of the lower member 22, and pass through the inside of the bottom 220 in a manner that can lift and lower. The lifting pin 50 is composed of a rod-shaped member and has a specific length in the Z-axis direction.
複數升降銷50支撐基板2,同時實現轉移基板2的任務。複數升降銷50在其頂部配置基板2的狀態中,在比基板2之邊緣部更內側處支撐基板2。另外,複數升降銷50的數量只要能以穩定的狀態支撐基板2,即不特別限定。The plurality of lift pins 50 supports the substrate 2 and also realizes the task of transferring the substrate 2. The plurality of lift pins 50 supports the substrate 2 at the inner side of the edge of the substrate 2 when the substrate 2 is arranged on the top thereof. The number of the plurality of lift pins 50 is not particularly limited as long as the substrate 2 can be supported in a stable state.
在上部構件21與下部構件22之間形成搬運空間7的狀態中,藉由例如機械手臂等通過搬運空間7將基板2從腔室20之外部搬運到處理室6的內部。In a state where the transfer space 7 is formed between the upper member 21 and the lower member 22 , the substrate 2 is transferred from the outside of the chamber 20 to the inside of the processing chamber 6 through the transfer space 7 by, for example, a robot arm.
搬運到處理室6的基板2被配置於複數升降銷50的頂部,被複數升降銷50支撐。此時,複數升降銷50突出載台30的上方,複數升降銷50的頂部位於從載台30的表面只與上方間隔特定距離的位置。基板2在載台30上方,被傳送到複數升降銷50的頂部。The substrate 2 transported to the processing chamber 6 is arranged on the top of the plurality of lift pins 50 and supported by the plurality of lift pins 50. At this time, the plurality of lift pins 50 protrude above the stage 30, and the top of the plurality of lift pins 50 is located at a position separated from the surface of the stage 30 by a specific distance. The substrate 2 is transported to the top of the plurality of lift pins 50 above the stage 30.
在此狀態下,複數升降銷50下降移動,在複數升降銷50的頂部到達載台30上面時,基板2被設置於載台30,結束基板2的轉移。如此,藉由透過複數升降銷50將基板2以上下方向向載台30轉移,可以將基板2以穩定的狀態從該傳送位置轉移到載台30,可以防止該轉移時基板2的損傷等。In this state, the plurality of lift pins 50 move downward, and when the tops of the plurality of lift pins 50 reach the top of the stage 30, the substrate 2 is placed on the stage 30, and the transfer of the substrate 2 is completed. In this way, by transferring the substrate 2 in the vertical direction toward the stage 30 through the plurality of lift pins 50, the substrate 2 can be transferred from the transfer position to the stage 30 in a stable state, and damage to the substrate 2 during the transfer can be prevented.
片材保持部40包括推送軸41、捲繞輥42以及複數滑輪43。推送軸41被配置於比載台30更往X軸負方向側,捲繞輥42被配置於比載台30更往X軸正方向側。複數滑輪43被配置於配置推送軸41的載台30的X軸負方向側。推送軸41、捲繞輥42以及複數滑輪43之任一者都被配置於腔室20的外側,推送軸41以及捲繞輥42在載台30與上部構件21之間(搬運空間7的一部份)保持且施加張力,使彈性片材80以與XY平面平行的狀態被拉伸。 The sheet holding section 40 includes a push shaft 41, a winding roller 42, and a plurality of pulleys 43. The push shaft 41 is arranged on the negative side of the X-axis than the stage 30, and the winding roller 42 is arranged on the positive side of the X-axis than the stage 30. The plurality of pulleys 43 are arranged on the negative side of the X-axis of the stage 30 on which the push shaft 41 is arranged. Any of the push shaft 41, the winding roller 42, and the plurality of pulleys 43 are arranged on the outer side of the chamber 20, and the push shaft 41 and the winding roller 42 are held and tensioned between the stage 30 and the upper member 21 (a part of the transport space 7), so that the elastic sheet 80 is stretched in a state parallel to the XY plane.
推送軸41以及捲繞輥42分別被配置為可自由旋轉,同時被配置為可往Z軸方向自由移動(可升降)。推送軸41在特定時序將彈性片材80往配置捲繞輥42側送出。捲繞輥42在此時序捲繞藉由推送軸41送出的彈性片材80。因此,藉由推送軸41與捲繞輥42,可以透過搬運空間7將彈性片材80從載台30的X軸方向的一側搬運到另一側。 The push shaft 41 and the winding roller 42 are each configured to be freely rotatable and simultaneously configured to be freely movable in the Z-axis direction (can be raised and lowered). The push shaft 41 sends the elastic sheet 80 out to the side where the winding roller 42 is arranged at a specific timing. The winding roller 42 winds the elastic sheet 80 sent out by the push shaft 41 at this timing. Therefore, the push shaft 41 and the winding roller 42 can transport the elastic sheet 80 from one side of the stage 30 in the X-axis direction to the other side through the transport space 7 .
推送軸41以及捲繞輥42在每次基板2被設置於載台30時,一邊在搬運空間7保持彈性片材80,一邊分別進行彈性片材80的送出以及捲繞。另外,推送軸41以及捲繞輥42在每次基板2被設置於載台30時,在載台30配置彈性片材80,使基板2被覆蓋。 The push shaft 41 and the winding roller 42 respectively feed and wind the elastic sheet 80 while holding the elastic sheet 80 in the conveyance space 7 every time the substrate 2 is placed on the stage 30 . In addition, the push shaft 41 and the winding roller 42 arrange the elastic sheet 80 on the stage 30 so that the substrate 2 is covered every time the substrate 2 is placed on the stage 30 .
更詳細而言,推送軸41以及捲繞輥42在分別進行彈性片材80的送出以及捲繞後,如第8圖所示藉由向下方移動接近載台30,一邊覆蓋於基板2的上面,一邊將彈性片材80配置於載台30上面。彈性片材80在藉由推送軸41以及捲繞輥42施加張力的狀態下,彈性片材80可以以特定按壓力按壓基板2或配置於基板2的複數元件4a、4b、4c,或者也可以不按壓只接觸。 More specifically, after feeding out and winding the elastic sheet 80 respectively, the push shaft 41 and the winding roller 42 move downward to approach the stage 30 as shown in FIG. 8 while covering the upper surface of the substrate 2 , while disposing the elastic sheet 80 on the stage 30 . The elastic sheet 80 may press the substrate 2 or the plurality of elements 4a, 4b, 4c arranged on the substrate 2 with a specific pressing force in a state where tension is applied by the push shaft 41 and the winding roller 42, or it may No pressing, just contact.
如第3圖所示,在彈性片材80被配置於載台30的狀態下,基板2全體被彈性片材80覆蓋,同時彈性片材80在片材固定部33的位置被固定於載台30上面。因此,如第5圖所示,在片材固定部33的內側形成由彈性片材80與載台30包圍的片材內空間8。 As shown in FIG. 3 , when the elastic sheet 80 is arranged on the stage 30 , the entire substrate 2 is covered with the elastic sheet 80 , and the elastic sheet 80 is fixed to the stage at the position of the sheet fixing part 33 . 30 above. Therefore, as shown in FIG. 5 , the sheet inner space 8 surrounded by the elastic sheet 80 and the stage 30 is formed inside the sheet fixing part 33 .
更詳細而言,片材內空間8被形成於片材固定部33與基板2的邊緣部之間(圖中以L顯示的部分),以及基板2的上方。片材內空間8以對其外側的空間氣密地密封為佳,具有高密閉性。在片材內空間8的內部,彈性片材80的背面也可以與配置於基板2的複數元件4a、4b、4c接觸。 In more detail, the space 8 inside the sheet is formed between the sheet fixing portion 33 and the edge of the substrate 2 (the portion shown by L in the figure), and above the substrate 2. The space 8 inside the sheet is preferably hermetically sealed to the space outside it, and has high airtightness. Inside the space 8 inside the sheet, the back side of the elastic sheet 80 can also contact the multiple elements 4a, 4b, 4c arranged on the substrate 2.
片材內空間8的高度,從片材固定部33的位置往基板2的邊緣部緩緩變高,在基板2的邊緣部的位置,基板2的厚度略等於複數元件4a、4b、4c的厚度的總和。片材內空間8的X軸方向長度略等於基本上呈方形的片材固定部33的X軸方向寬度,片材內空間8從片材固定部33的X軸方向的一端延伸到另一端。片材內空間8的Y軸方向長度略等於片材固定部33的Y軸方向寬度,片材內空間8從片材固定部33的Y軸方向的一端延伸到另一端。The height of the space 8 in the sheet gradually increases from the position of the sheet fixing portion 33 toward the edge of the substrate 2. At the edge of the substrate 2, the thickness of the substrate 2 is approximately equal to the sum of the thicknesses of the plurality of elements 4a, 4b, and 4c. The length of the space 8 in the X-axis direction of the sheet is approximately equal to the width of the sheet fixing portion 33 in the X-axis direction, which is substantially square. The space 8 in the sheet extends from one end of the sheet fixing portion 33 in the X-axis direction to the other end. The length of the space 8 in the Y-axis direction of the sheet is approximately equal to the width of the sheet fixing portion 33 in the Y-axis direction. The space 8 in the sheet extends from one end of the sheet fixing portion 33 in the Y-axis direction to the other end.
在片材內空間8的內部,第1抽吸孔31的一部份被基板2的邊緣部覆蓋,另一方面,由於第1抽吸孔31剩下的一部份開放,透過第1抽吸孔31,可以抽吸片材內空間8內部的氣體。因此,片材內空間8的內部減壓(變成負壓),彈性片材80貼合基板2的邊緣部般被吸(吸附)往基板2的同時,一邊隨著配置於基板2之元件4a、4b、4c的形狀變形,一邊接觸元件4a、4b、4c。Inside the sheet inner space 8, a part of the first suction hole 31 is covered by the edge of the substrate 2. On the other hand, since the remaining part of the first suction hole 31 is open, the first suction hole 31 is exposed through the first suction hole 31. The suction hole 31 can suck the gas inside the space 8 inside the sheet. Therefore, the internal pressure of the inner space 8 of the sheet is reduced (becomes a negative pressure), and the elastic sheet 80 is sucked (adsorbed) toward the substrate 2 as if it is attached to the edge of the substrate 2. At the same time, the component 4a arranged on the substrate 2 is moved along with the elastic sheet 80. , 4b, 4c are deformed in shape while contacting the elements 4a, 4b, 4c.
因此,進行透過第1抽吸孔31的抽吸後,與透過第1抽吸孔31進行抽吸前相比,片材內空間8的體積變小。在本實施型態中,在透過第1抽吸孔31進行抽吸,片材內空間8的體積變小後,如後所述,藉由加壓後述之處理室6的內部,可以藉由彈性片材80以均勻的力壓入被配置於基板2的複數元件4a、4b、4c。另外,抽吸使片材內空間8的內部成為真空是為佳。Therefore, after suction through the first suction hole 31, the volume of the space 8 in the sheet becomes smaller than before suction through the first suction hole 31. In the present embodiment, after suction through the first suction hole 31 reduces the volume of the space 8 in the sheet, as described later, by pressurizing the interior of the processing chamber 6 described later, the plurality of elements 4a, 4b, 4c arranged on the substrate 2 can be pressed in with a uniform force by the elastic sheet 80. In addition, it is preferable that the interior of the space 8 in the sheet is vacuumed by suction.
彈性片材80由長尺狀片材(薄膜)形成,由充分地比基板2的厚度更薄的片材構成。彈性片材80的厚度T2(參照第4圖)以10~100μm為佳,以30~70μm為更佳。The elastic sheet 80 is formed of a long-shaped sheet (film) that is sufficiently thinner than the thickness of the substrate 2 . The thickness T2 (see Figure 4) of the elastic sheet 80 is preferably 10 to 100 μm, and more preferably 30 to 70 μm.
彈性片材80由具有彎曲性的薄膜構件構成,使用PET薄膜、氟系薄膜、PEN等樹脂薄膜。從柔軟性以及耐熱性的觀點,使用氟系薄膜為佳。藉由使用氟系薄膜,彈性片材80對配置於基板2的複數元件4a、4b、4c貼合,可以比較均勻地加壓配置於基板2的複數元件4a、4b、4c。The elastic sheet 80 is made of a flexible film member, and a resin film such as PET film, fluorine-based film, or PEN is used. From the viewpoint of flexibility and heat resistance, it is preferable to use a fluorine-based film. By using the fluorine-based film, the elastic sheet 80 is bonded to the plurality of components 4a, 4b, and 4c arranged on the substrate 2, and the plurality of components 4a, 4b, and 4c arranged on the substrate 2 can be pressed relatively uniformly.
另外,從強度或耐熱性觀點,使用PEN薄膜作為彈性片材80為佳。藉由使用PEN薄膜作為彈性片材80,可以用比較大的力壓入配置於基板2的複數元件4a、4b、4c。In addition, from the viewpoint of strength and heat resistance, it is preferable to use a PEN film as the elastic sheet 80. By using a PEN film as the elastic sheet 80, the plurality of elements 4a, 4b, 4c arranged on the substrate 2 can be pressed in with a relatively large force.
脫模性良好的彈性片材80為佳。在本實施型態中,片材保持部40向下方移動,如接觸基板2的表面般,在載台30配置彈性片材80後,解除載台30或基板2與彈性片材80的接觸狀態,向上方移動。意即,片材保持部40被配置為使彈性片材80可脫離(可剝離)載台30或基板2。Elastic sheet 80 with good mold releasability is preferred. In this embodiment, the sheet holding portion 40 moves downward to contact the surface of the substrate 2. After the elastic sheet 80 is placed on the stage 30, the contact state between the stage 30 or the substrate 2 and the elastic sheet 80 is released. , moves upward. That is, the sheet holding part 40 is configured so that the elastic sheet 80 is detachable (peelable) from the stage 30 or the substrate 2 .
因此,為使彈性片材80可以容易從基板2或配置於基板2的複數元件4a、4b、4c脫離,以使用脫模性好的氟系薄膜為佳,或在彈性片材80形成離型層,更提高脫模性為佳。Therefore, in order to make the elastic sheet 80 easily detachable from the substrate 2 or the plurality of elements 4a, 4b, 4c arranged on the substrate 2, it is better to use a fluorine-based film with good mold releasability, or to form a release mold on the elastic sheet 80. layer, it is better to improve the mold releasability.
在本實施型態中,基板2的材質為塗布環氧樹脂的玻璃基板。但是基板2的材質不限於此,例如可以由玻璃環氧樹脂基板或作為玻璃基板的二氧化矽(SiO 2)或氧化鋁(Al 2O 3)構成,或者或者,或者作為可撓性基板可以由以下所構成:彈性體如聚醯亞胺、聚醯胺、聚丙烯、聚醚醚酮、胺甲酸乙酯、矽酮、聚對苯二甲酸乙二醇酯、聚萘二甲酸乙二醇酯等等的聚合物,還有以玻璃棉等構成亦可。 In the present embodiment, the material of the substrate 2 is a glass substrate coated with epoxy resin. However, the material of the substrate 2 is not limited thereto, and can be, for example, a glass epoxy substrate or silicon dioxide (SiO 2 ) or alumina (Al 2 O 3 ) as a glass substrate, or, as a flexible substrate, can be made of the following: an elastic body such as a polymer of polyimide, polyamide, polypropylene, polyetheretherketone, urethane, silicone, polyethylene terephthalate, polyethylene naphthalate, etc., and can also be made of glass wool, etc.
在基板2的表面預先形成例如未圖示的導電性接合材料。此導電性接合材料藉由異向性導電粒子連接或凸壓焊接連接等,將基板2與元件4a、4b、4c電性以及機械性連接,藉由加熱硬化。可以舉例如ACF、ACP、NCF或NCP作為導電性接合材料。導電性接合材料的厚度,以1.0~10000μm為佳。另外,也可以使用包含錫(Sn)等金屬的低熔點接合材料代替導電性接合材料進行加熱加壓接合。此時,該低熔點接合材料的厚度為0.1~10000μm。For example, a conductive bonding material (not shown) is formed in advance on the surface of the substrate 2 . This conductive bonding material electrically and mechanically connects the substrate 2 to the components 4a, 4b, and 4c through anisotropic conductive particle connection or bump welding connection, and is hardened by heating. Examples of the conductive bonding material include ACF, ACP, NCF, and NCP. The thickness of the conductive bonding material is preferably 1.0~10000μm. In addition, a low melting point bonding material containing metal such as tin (Sn) may be used instead of the conductive bonding material for heat and pressure bonding. At this time, the thickness of the low melting point joining material is 0.1 to 10000 μm.
在基板2,線路以特定模式形成,可以透過導電性接合材料將元件4a、4b、4c的電極連接到此線路。On the substrate 2, a circuit is formed in a specific pattern, and the electrodes of the components 4a, 4b, and 4c can be connected to the circuit through a conductive bonding material.
元件4a、4b、4c以陣列狀被配置於基板2上。陣列狀是指依照被決定的模式在複數行複數列配置元件4a、4b、4c的狀態,行方向與列方向的間隔可以相同,或者也可以不同。 Elements 4a, 4b, 4c are arranged in an array on substrate 2. An array means that elements 4a, 4b, 4c are arranged in a plurality of rows and columns according to a determined pattern, and the spacing in the row direction and the column direction can be the same or different.
元件4a、4b和4c被布置在顯示用顯示基板上作為RGB的各像素,或者被布置於照明基板作為背光的發光體。元件4a為紅光元件、元件4b為綠光元件、元件4c為藍光元件。但是,被配置於基板2的元件不限於這些元件。 The elements 4a, 4b, and 4c are arranged on a display substrate as each pixel of RGB, or on a lighting substrate as a luminous body of a backlight. Element 4a is a red light element, element 4b is a green light element, and element 4c is a blue light element. However, the elements arranged on the substrate 2 are not limited to these elements.
在本實施型態中的元件4a、4b、4c為微發光元件(微LED元件),其尺寸(寬度×深度)為例如5μm×5μm~50μm×50μm。另外,元件4a~4c的厚度(高度)例如為50μm以下。 In this embodiment, the components 4a, 4b, and 4c are micro-luminescent components (micro-LED components), and their dimensions (width × depth) are, for example, 5μm × 5μm to 50μm × 50μm. In addition, the thickness (height) of the components 4a to 4c is, for example, less than 50μm.
如第6圖所示,基板處理裝置10包括驅動部11、加壓控制部12、減壓控制部13以及溫度控制部14。驅動部11對於例如第1圖所示之腔室20的上部構件21或片材保持部40,或者複數升降銷50執行用以可上下方向升降地驅動的處理。加壓控制部12,在組合上部構件21與下部構件22,在處理室6內部形成密閉空間(加壓空間)時(參照第9圖),執行加壓處理室6的內部(設為正壓)的處理。加壓控制部12優選的加壓處理室6,使處理室6內部的氣壓成為10Pa~0.5MPa為佳。 As shown in FIG. 6 , the substrate processing apparatus 10 includes a drive unit 11 , a pressure control unit 12 , a pressure reduction control unit 13 , and a temperature control unit 14 . The driving unit 11 performs a process for driving the upper member 21 of the chamber 20 or the sheet holding unit 40 or the plurality of lifting pins 50 so as to be able to move up and down in the vertical direction, for example. When the upper member 21 and the lower member 22 are combined to form a sealed space (pressurized space) inside the processing chamber 6 (see FIG. 9 ), the pressurization control unit 12 performs pressurizing the inside of the processing chamber 6 (setting it to a positive pressure). ) processing. It is preferable that the pressure control unit 12 pressurizes the processing chamber 6 so that the air pressure inside the processing chamber 6 is 10 Pa to 0.5 MPa.
減壓控制部13在基板2載置於載台30時(參照第7圖)透過第2抽吸孔32以及第2抽吸管70執行進行抽吸的處理。另外,減壓控制部13在彈性片材80被配置於載台30時(參照第5圖以及第8圖),透過第3抽吸孔33a以及第3抽吸管100執行進行抽吸的處理。另外,減壓控制部13在基板2被彈性片材80覆蓋形成片材內空間8時(參照第8圖以及第9圖),執行減壓(設為負壓)片材內空間8之內部的處理。 The depressurization control unit 13 performs a suction process through the second suction hole 32 and the second suction pipe 70 when the substrate 2 is placed on the stage 30 (refer to FIG. 7). In addition, the depressurization control unit 13 performs a suction process through the third suction hole 33a and the third suction pipe 100 when the elastic sheet 80 is arranged on the stage 30 (refer to FIG. 5 and FIG. 8). In addition, the depressurization control unit 13 performs a process of depressurizing (setting to negative pressure) the interior of the sheet inner space 8 when the substrate 2 is covered by the elastic sheet 80 to form the sheet inner space 8 (refer to FIG. 8 and FIG. 9).
溫度控制部14由上部加熱裝置91以及下部加熱裝置92控制加熱溫度。雖然上部加熱裝置91以及下部加熱裝置92之每一者的設定溫度因彈性片材80與接合材料的材質而異,舉例而言為100~200℃。 The temperature control unit 14 controls the heating temperature using the upper heating device 91 and the lower heating device 92 . Although the set temperature of each of the upper heating device 91 and the lower heating device 92 varies depending on the materials of the elastic sheet 80 and the bonding material, for example, it is 100~200°C.
接下來一邊參照第1圖以及第7圖~第9圖等,說明在基板2上形成元件陣列4的方法。以下,以彈性片材80壓入配置於基板2的複數元件4a、4b、4c前後的工程為中心進行說明。Next, a method of forming the device array 4 on the substrate 2 will be described with reference to Fig. 1 and Fig. 7 to Fig. 9. The following description will focus on the process before and after the elastic sheet 80 is pressed into the plurality of devices 4a, 4b, 4c arranged on the substrate 2.
首先,如第1圖所示,上部構件21的上側腳部211被配置為相對於下部構件22的下側腳部221只與上方間隔特定距離的位置,在上部構件21與下部構件22之間形成搬運空間7。另外,以片材保持部40保持彈性片材80,使彈性片材80被配置於搬運空間7的內部。另外,預先藉由推送軸41以及捲繞輥42進行彈性片材80的送出以及捲繞,將彈性片材80的未使用部分配置給搬運空間7。關於複數升降銷50,預先以突出載台30之上方的狀態待機。First, as shown in FIG. 1 , the upper leg portion 211 of the upper member 21 is disposed at a specific distance above the lower leg portion 221 of the lower member 22 , between the upper member 21 and the lower member 22 . Create a handling space7. In addition, the elastic sheet 80 is held by the sheet holding part 40 so that the elastic sheet 80 is arranged inside the conveyance space 7 . In addition, the elastic sheet 80 is fed out and wound by the push shaft 41 and the winding roller 42 in advance, and the unused portion of the elastic sheet 80 is arranged in the conveyance space 7 . The plurality of lift pins 50 are in a state of protruding above the stage 30 and are waiting in advance.
接下來,使用機械手臂(圖示省略)將配置複數元件4a、4b、4c的基板2(參照第3圖)搬運往搬運空間7,載置於複數升降銷50的頂部。Next, a robot arm (not shown) is used to transport the substrate 2 (see FIG. 3 ) on which the plurality of components 4a, 4b, and 4c is arranged to the transport space 7 and place it on the top of the plurality of lifting pins 50.
接下來,如第7圖所示,將保持基板2的狀態的複數升降銷50向下方移動,將基板2設置於設置在處理室6內部的載台30。複數升降銷50下降移動,在各自的頂部到達載台30的上面時,基板2被設置於載台30,結束基板2往載台30的轉移。Next, as shown in FIG. 7 , the plurality of lift pins 50 holding the substrate 2 are moved downward to place the substrate 2 on the stage 30 provided inside the processing chamber 6. The plurality of lift pins 50 move downward, and when the tops of the respective lift pins 50 reach the top of the stage 30, the substrate 2 is placed on the stage 30, and the transfer of the substrate 2 to the stage 30 is completed.
接下來,進行透過第2抽吸孔32以及第2抽吸管70的抽吸,將設置於載台30的基板2吸附固定在載台30上。另外,關於透過第2抽吸孔32以及第2抽吸管70的抽吸,也可以在基板2被設置於載台30之前的時間點開始。Next, suction is performed through the second suction hole 32 and the second suction pipe 70 to adsorb and fix the substrate 2 placed on the stage 30. In addition, suction through the second suction hole 32 and the second suction pipe 70 may be started before the substrate 2 is placed on the stage 30.
接下來,如第8圖所示,使在載台30的上方待機的片材保持部40只下降特定距離,將彈性片材80配置於載台30以覆蓋基板2。片材保持部40的下降移動藉由推送軸41、捲繞輥42以及滑輪43下降進行。Next, as shown in FIG. 8 , the sheet holding part 40 waiting above the stage 30 is lowered by a specific distance, and the elastic sheet 80 is arranged on the stage 30 to cover the substrate 2 . The downward movement of the sheet holding unit 40 is performed by lowering the push shaft 41 , the winding roller 42 and the pulley 43 .
接下來,如第5圖所示,在片材固定部33的位置將彈性片材80固定於載台30。例如,藉由透過第3抽吸孔33a以及第3抽吸管100的抽吸,藉由將設置於載台30的彈性片材80吸附固定在載台30上,在片材固定部33的內側形成片材內空間8。另外,關於透過第3抽吸孔33a以及第3抽吸管100的抽吸,也可以在彈性片材80被設置於載台30之前的時間點開始。Next, as shown in FIG. 5 , the elastic sheet 80 is fixed to the stage 30 at the position of the sheet fixing part 33 . For example, by suction through the third suction hole 33a and the third suction pipe 100, the elastic sheet 80 provided on the stage 30 is suction-fixed to the stage 30, and the elastic sheet 80 provided on the stage 30 is fixed on the stage 30. The inner side forms an inner space 8 of the sheet. In addition, the suction through the third suction hole 33a and the third suction pipe 100 may be started before the elastic sheet 80 is installed on the stage 30.
接下來,進行透過複數第1抽吸孔31以及複數第1抽吸管60的抽吸,抽吸片材內空間8內部的氣體。因此,片材內空間8的內部被減壓,形成片材內空間8的彈性片材80被吸往載台30或基板2。結果,片材內空間8的體積縮小,同時在基板2的邊緣部吸附彈性片材80。另外,彈性片材80與被配置於基板2的複數元件4a、4b、4c貼合般接觸。Next, suction is performed through the plurality of first suction holes 31 and the plurality of first suction tubes 60 to suck the gas inside the sheet inner space 8 . Therefore, the inside of the sheet inner space 8 is decompressed, and the elastic sheet 80 forming the sheet inner space 8 is sucked toward the stage 30 or the substrate 2 . As a result, the volume of the space 8 inside the sheet is reduced, and the elastic sheet 80 is attracted to the edge of the substrate 2 . In addition, the elastic sheet 80 is in bonding contact with the plurality of elements 4a, 4b, and 4c arranged on the substrate 2.
另外,關於透過複數第1抽吸孔31以及複數第2抽吸管70的抽吸也可以在形成片材內空間8之前的時間點開始。由第3抽吸孔33a等抽吸的時序可以與由第1抽吸孔31抽吸的時序相同,或者也可以不同。在本實施型態中,由第2抽吸孔32等進行抽吸後,開始由第3抽吸孔33a等的抽吸,之後開始由第1抽吸孔31等的抽吸。In addition, the suction through the plurality of first suction holes 31 and the plurality of second suction tubes 70 may be started at a time point before the space 8 in the sheet is formed. The timing of suction through the third suction hole 33a and the like may be the same as the timing of suction through the first suction hole 31, or may be different. In this embodiment, after suction is performed through the second suction hole 32 and the like, suction through the third suction hole 33a and the like is started, and then suction through the first suction hole 31 and the like is started.
接下來,如第9圖所示,上部構件21向下方移動,以將彈性片材80夾在中間的狀態使上部構件21的上側腳部211接觸下部構件22的下側腳部221。因此,處理室6成為密閉空間,提供作為加壓空間的功能。Next, as shown in FIG. 9 , the upper member 21 moves downward so that the upper leg portion 211 of the upper member 21 contacts the lower leg portion 221 of the lower member 22 with the elastic sheet 80 sandwiched therebetween. Therefore, the processing chamber 6 becomes a sealed space and functions as a pressurized space.
接下來,以彈性片材80覆蓋基板2的狀態(彈性片材80與被配置於基板2的複數元件4a、4b、4c接觸的狀態),透過被形成於腔室20的未圖示之管線將氣體送入處理室6的內部,加壓處理室6的內部。因此,形成片材內空間8的內部被減壓,另一方面,片材內空間8的外部(處理室6)被加壓的狀態,片材內空間8(第5圖)的內部與外部之間產生壓力差。Next, with the elastic sheet 80 covering the substrate 2 (the elastic sheet 80 in contact with the plurality of elements 4a, 4b, and 4c arranged on the substrate 2), the pipelines (not shown) formed in the chamber 20 are passed through. The gas is sent into the inside of the processing chamber 6 to pressurize the inside of the processing chamber 6 . Therefore, the inside of the sheet inner space 8 is depressurized, while the outside of the sheet inner space 8 (the processing chamber 6 ) is pressurized, and the inside and outside of the sheet inner space 8 (Fig. 5) are There is a pressure difference between them.
結果,形成片材內空間8的彈性片材80以更大的力壓入基板2或被配置於基板2的複數元件4a、4b、4c,片材內空間8的體積明顯地縮小。另外,彈性片材80隨著配置於基板2之複數元件4a、4b、4c的形狀變形,使彈性片材80以高貼合度貼合複數元件4a、4b、4c,可以藉由彈性片材80以均勻的力壓入複數元件4a、4b、4c。As a result, the elastic sheet 80 forming the sheet inner space 8 is pressed into the substrate 2 or the plurality of components 4a, 4b, 4c arranged on the substrate 2 with a greater force, and the volume of the sheet inner space 8 is significantly reduced. In addition, the elastic sheet 80 deforms along with the shape of the plurality of components 4a, 4b, 4c arranged on the substrate 2, so that the elastic sheet 80 fits the plurality of components 4a, 4b, 4c with a high degree of adhesion, and the elastic sheet 80 can be pressed into the plurality of components 4a, 4b, 4c with a uniform force.
另外,在本實施型態中,彈性片材80不是藉由物理手段(例如平板或彈性體等物體)壓入,是基於片材內空間8之內外的壓力差被按壓。因此,不受形成於平板或彈性體等的表面的凹凸或傾斜的影響,可以按壓彈性片材80,可以藉由彈性片材80以均勻且適度的力壓入複數元件4a、4b、4c。 In addition, in this embodiment, the elastic sheet 80 is not pressed in by physical means (such as a flat plate or an elastic body), but is pressed based on the pressure difference between the inside and outside of the space 8 in the sheet. Therefore, the elastic sheet 80 can be pressed without being affected by unevenness or inclination formed on the surface of a flat plate, an elastomer, etc., and the plurality of elements 4a, 4b, 4c can be pressed in with a uniform and moderate force by the elastic sheet 80.
加壓處理室6內部的期間,由上部加熱裝置91加熱處理室6內部的同時,由下部加熱裝置92加熱載台30。因此,可以以良好平衡加熱設置於載台30的基板2的上面側以及下面側,透過導電性接合材料,可以將被配置於基板2的複數元件4a、4b、4c良好地接合到基板2。另外,藉由從上部加熱裝置91以及下部加熱裝置92接受的熱,彈性片材80變得容易隨著配置於基板2之複數元件4a、4b、4c的形狀變形,可以提高彈性片材80與複數元件4a、4b、4c的貼合度。 While the inside of the pressurized processing chamber 6 is being heated, the upper heating device 91 heats the inside of the processing chamber 6 and at the same time, the lower heating device 92 heats the stage 30 . Therefore, the upper surface side and the lower surface side of the substrate 2 provided on the stage 30 can be heated in a good balance, and the plurality of elements 4a, 4b, and 4c arranged on the substrate 2 can be well bonded to the substrate 2 through the conductive bonding material. In addition, by receiving heat from the upper heating device 91 and the lower heating device 92, the elastic sheet 80 becomes easy to deform in accordance with the shapes of the plurality of elements 4a, 4b, and 4c arranged on the substrate 2, and the elastic sheet 80 and the elastic sheet 80 can be improved. The fit of multiple components 4a, 4b, 4c.
由上部加熱裝置91以及下部加熱裝置92加熱時也透過複數第1抽吸孔31進行抽吸。因此,伴隨著彈性片材80因為加熱的變形,可以防止在彈性片材80與基板2之間形成間隙,可以提高彈性片材80與配置於基板2的複數元件4a、4b、4c的貼合度。另外,由上部加熱裝置91以及下部加熱裝置92加熱時,雖然有接合複數元件4a、4b、4c與基板2的接合材料(導電性接合材料)被分解,產生分解氣體的情況,藉由維持上述抽吸狀態,可以由複數第1抽吸孔31抽吸分解並去除氣體。 When heating by the upper heating device 91 and the lower heating device 92, suction is also performed through the plurality of first suction holes 31. Therefore, along with the deformation of the elastic sheet 80 due to heating, it is possible to prevent the formation of a gap between the elastic sheet 80 and the substrate 2, and the adhesion between the elastic sheet 80 and the plurality of components 4a, 4b, 4c arranged on the substrate 2 can be improved. In addition, when heating by the upper heating device 91 and the lower heating device 92, although the bonding material (conductive bonding material) bonding the plurality of components 4a, 4b, 4c to the substrate 2 is decomposed and decomposition gas is generated, by maintaining the above-mentioned suction state, the gas can be decomposed and removed by suction through the plurality of first suction holes 31.
另外,由上部加熱裝置91以及下部加熱裝置92的加熱可以與處理室6內部加壓的開始同時,或比它更早進行。 In addition, the heating by the upper heating device 91 and the lower heating device 92 can be performed simultaneously with the start of pressurization inside the processing chamber 6, or earlier than it.
如第9圖所示,以彈性片材80將基板2只壓入特定時間後,進行從處理室6取出基板2的處理。意即,如第8圖所示,使上部構件21只向上方移動特定距離,打開處理室6。接下來,如第7圖所示,使片材保持部40只上升特定距離,在載台30的上方待機。因此,被配置於載台30以覆蓋基板2的彈性片材80從載台30脫離(剝離)。另外,在此時間點,也可以藉由推送軸41以及捲繞輥42進行彈性片材80的送出以及捲繞,將彈性片材80的未使用部分配置給搬運空間7。As shown in FIG. 9 , after the substrate 2 is pressed in by the elastic sheet 80 for a specific time, the substrate 2 is taken out from the processing chamber 6. That is, as shown in FIG. 8 , the upper component 21 is moved upward only a specific distance to open the processing chamber 6. Next, as shown in FIG. 7 , the sheet holding portion 40 is raised only a specific distance and waits above the stage 30. Therefore, the elastic sheet 80 arranged on the stage 30 to cover the substrate 2 is detached (peeled off) from the stage 30. In addition, at this point in time, the elastic sheet 80 can also be sent out and wound by the push shaft 41 and the winding roller 42, and the unused portion of the elastic sheet 80 can be arranged in the transport space 7.
接下來,如第1圖所示,使複數升降銷50向上方移動。複數升降銷50上升移動,各自的頂部到達載台30的上面時,基板2被載置於複數升降銷50的頂部,由複數升降銷50支撐。此狀態下,將複數升降銷50上升到載台30上方只突出特定距離的位置並待機。之後,藉由使用機械手臂(圖示省略)從搬運空間7取出基板2,可以得到複數元件4a、4b、4c以均勻的力被固定於基板2的元件陣列4。Next, as shown in FIG. 1, the plurality of lift pins 50 are moved upward. When the plurality of lift pins 50 move upward and the tops of the respective lift pins reach the top of the stage 30, the substrate 2 is placed on the tops of the plurality of lift pins 50 and supported by the plurality of lift pins 50. In this state, the plurality of lift pins 50 are raised to a position protruding only a certain distance above the stage 30 and are kept on standby. Afterwards, by using a robot arm (not shown) to take out the substrate 2 from the transport space 7, a component array 4 in which the plurality of components 4a, 4b, 4c are fixed to the substrate 2 with a uniform force can be obtained.
如上所述,在關於本實施型態的基板處理裝置10中,第6圖所示的加壓控制部12加壓第9圖所示的處理室6,如第9圖所示,片材保持部40藉由配置於載台30兩側的推送軸41與捲繞輥42將彈性片材80從載台30的一側搬運到另一側,並將彈性片材80配置於載台30以覆蓋基板2。在將彈性片材80配置於載台30以覆蓋基板2的狀態下,藉由加壓控制部12加壓處理室6,可以基於其壓力將彈性片材80往基板2按壓,彈性片材80與基板2或配置於基板2的複數元件4a、4b、4c接觸,可以藉由彈性片材80將配置於基板2的複數元件4a、4b、4c壓入。As described above, in the substrate processing device 10 according to the present embodiment, the pressurization control unit 12 shown in FIG. 6 pressurizes the processing chamber 6 shown in FIG. 9 , and as shown in FIG. 9 , the sheet holding unit 40 transports the elastic sheet 80 from one side of the carrier 30 to the other side via the push shaft 41 and the winding roller 42 arranged on both sides of the carrier 30, and arranges the elastic sheet 80 on the carrier 30 to cover the substrate 2. When the elastic sheet 80 is arranged on the stage 30 to cover the substrate 2, the processing chamber 6 is pressurized by the pressurization control unit 12, and the elastic sheet 80 can be pressed toward the substrate 2 based on the pressure. The elastic sheet 80 contacts the substrate 2 or the multiple components 4a, 4b, 4c arranged on the substrate 2, and the multiple components 4a, 4b, 4c arranged on the substrate 2 can be pressed in by the elastic sheet 80.
另外,處理室6加壓時,彈性片材80可能隨著配置於基板2的複數元件4a、4b、4c的形狀變形,因此,使彈性片材80貼合複數元件4a、4b、4c,可以藉由彈性片材80以均勻的力壓入複數元件4a、4b、4c。另外,由於藉由推送軸41與捲繞輥42將彈性片材80從載台30的一側搬運到另一側,可以藉由小型且簡易的構成,在載台30與上部構件21之間提供彈性片材80。以上,根據關於本實施型態的基板處理裝置10,可以充分確保複數元件4a、4b、4c與基板2接合的穩定性。In addition, when the processing chamber 6 is pressurized, the elastic sheet 80 may deform along with the shapes of the plurality of components 4a, 4b, and 4c arranged on the substrate 2. Therefore, the elastic sheet 80 can be attached to the plurality of components 4a, 4b, and 4c. The plurality of components 4a, 4b, and 4c are pressed into the elastic sheet 80 with a uniform force. In addition, since the elastic sheet 80 is conveyed from one side of the stage 30 to the other side by the push shaft 41 and the winding roller 42, a small and simple structure can be used between the stage 30 and the upper member 21. An elastic sheet 80 is provided. As described above, according to the substrate processing apparatus 10 of this embodiment, the stability of the bonding between the plurality of elements 4a, 4b, and 4c and the substrate 2 can be sufficiently ensured.
另外,在本實施型態中,每次在載台30設置基板2時,推送軸41以及捲繞輥42分別進行彈性片材80的送出以及捲繞。因此,每次在載台30設置基板2時,在載台30與上部構件21之間提供彈性片材80的未使用部分,藉由此適當狀態的彈性片材80,可以以穩定的狀態將配置於基板2的複數元件4a、4b、4c壓入。In addition, in this embodiment, each time the substrate 2 is placed on the stage 30, the push shaft 41 and the winding roller 42 carry out feeding and winding of the elastic sheet 80, respectively. Therefore, every time the substrate 2 is placed on the stage 30, an unused portion of the elastic sheet 80 is provided between the stage 30 and the upper member 21. With the elastic sheet 80 in an appropriate state, the elastic sheet 80 can be placed in a stable state. The plurality of components 4a, 4b, and 4c arranged on the substrate 2 are press-fitted.
另外,在本實施型態中,片材保持部40相對靠近載台30,彈性片材80被配置於載台30。因此,可以有效率地進行將彈性片材80配置於載台30的處理,可以期待操作流水線的高速化。In addition, in this embodiment, the sheet holding part 40 is relatively close to the stage 30 , and the elastic sheet 80 is arranged on the stage 30 . Therefore, the process of arranging the elastic sheet 80 on the stage 30 can be efficiently performed, and an increase in the speed of the operation line can be expected.
另外,在本實施型態中,包括減壓由彈性片材80與載台30包圍的片材內空間8的減壓控制部13(第6圖)。在將彈性片材80配置於載台30以覆蓋基板2的狀態下,藉由減壓片材內空間8,彈性片材80被吸往基板2,可以使彈性片材80貼合基板2或被配置於基板2的複數元件4a、4b、4c。在此狀態下,藉由加壓處理室6,基於其壓力將彈性片材80往基板2按壓,可以藉由彈性片材80將配置於基板2的複數元件4a、4b、4c以均勻的力壓入。In addition, this embodiment includes a decompression control unit 13 (Fig. 6) that depressurizes the inner space 8 of the sheet surrounded by the elastic sheet 80 and the stage 30. When the elastic sheet 80 is arranged on the stage 30 to cover the substrate 2 , by decompressing the inner space 8 of the sheet, the elastic sheet 80 is sucked toward the substrate 2 , so that the elastic sheet 80 can be attached to the substrate 2 or A plurality of elements 4a, 4b, and 4c are arranged on the substrate 2. In this state, the elastic sheet 80 is pressed against the substrate 2 based on the pressure of the pressurized processing chamber 6, and the plurality of components 4a, 4b, and 4c arranged on the substrate 2 can be pressed with a uniform force by the elastic sheet 80. Press in.
另外,在本實施型態中,如第3圖所示,在比基板設置區域34更遠離載台30之中心的位置(基板設置區域34的外側),設置用以將彈性片材80固定於載台30的片材固定部33。在片材固定部33的位置,在將彈性片材80固定於載台30的狀態下,藉由加壓處理室6,可以以穩定的狀態將彈性片材80往基板2按壓,可以藉由彈性片材80將配置於基板2的複數元件4a、4b、4c以更均勻的力壓入。In addition, in this embodiment, as shown in FIG. 3 , an elastic sheet 80 is provided at a position further away from the center of the stage 30 than the substrate installation area 34 (outside the substrate installation area 34 ). The sheet fixing portion 33 of the stage 30 . At the position of the sheet fixing part 33, with the elastic sheet 80 fixed to the stage 30, the elastic sheet 80 can be pressed against the substrate 2 in a stable state by the pressurized processing chamber 6. The elastic sheet 80 presses the plurality of elements 4a, 4b, and 4c arranged on the substrate 2 with a more uniform force.
另外,在本實施型態中,第6圖所示的加壓控制部12加壓處理室6,使第1圖所示的處理室6內部的氣壓基本上成為處理室6外部之氣壓的2倍。因此,加壓處理室6時,以適當的按壓力將彈性片材80往基板2按壓,可以藉由彈性片材80以適當的力將複數元件4a、4b、4c壓入基板2。因此,可以防止複數元件4a、4b、4c從基板2脫落,可以充分確保複數元件4a、4b、4c與基板2的接合穩定性。In addition, in the present embodiment, the pressurization control unit 12 shown in FIG. 6 pressurizes the processing chamber 6 so that the air pressure inside the processing chamber 6 shown in FIG. 1 is substantially twice the air pressure outside the processing chamber 6. Therefore, when the processing chamber 6 is pressurized, the elastic sheet 80 is pressed toward the substrate 2 with an appropriate pressing force, and the plurality of components 4a, 4b, 4c can be pressed into the substrate 2 with an appropriate force by the elastic sheet 80. Therefore, the plurality of components 4a, 4b, 4c can be prevented from falling off the substrate 2, and the bonding stability of the plurality of components 4a, 4b, 4c and the substrate 2 can be fully ensured.
另外,在關於本實施型態的基板處理方法中,包括將彈性片材80配置於載台30上以覆蓋基板2之步驟;減壓由彈性片材80與載台30包圍的片材內空間8之步驟;以及加壓處理室6之步驟。在將彈性片材80配置於載台30上以覆蓋基板2的狀態下,藉由減壓片材內空間8,彈性片材80被吸往基板2,可以使彈性片材80接觸基板2或配置於基板2的複數元件4a、4b、4c。在這個狀態中,藉由加壓處理室6,基於此壓力,彈性片材80往基板2按壓,可以以彈性片材80壓入配置於基板2的複數元件4a、4b、4c。 In addition, the substrate processing method of this embodiment includes the steps of arranging the elastic sheet 80 on the stage 30 to cover the substrate 2; and decompressing the space inside the sheet surrounded by the elastic sheet 80 and the stage 30. Step 8; and step 6 of the pressurized processing chamber. When the elastic sheet 80 is placed on the stage 30 to cover the substrate 2 , the elastic sheet 80 is sucked toward the substrate 2 by decompressing the inner space 8 of the sheet, so that the elastic sheet 80 can contact the substrate 2 or A plurality of elements 4a, 4b, and 4c are arranged on the substrate 2. In this state, the elastic sheet 80 is pressed against the substrate 2 by the pressurized processing chamber 6 based on the pressure, and the plurality of components 4a, 4b, and 4c arranged on the substrate 2 can be pressed into the elastic sheet 80.
另外,在本實施型態中,在彈性片材80接觸配置於基板2的複數元件4a、4b、4c的狀態下,加壓處理室6。因此,如上述般,基於處理室6的氣壓,在將彈性片材80往基板2按壓時,可以藉由彈性片材80將配置於基板2的複數元件4a、4b、4c有效率地壓入。 In addition, in this embodiment, the processing chamber 6 is pressurized in a state where the elastic sheet 80 is in contact with the plurality of elements 4a, 4b, and 4c arranged on the substrate 2. Therefore, as described above, when the elastic sheet 80 is pressed against the substrate 2 based on the air pressure of the processing chamber 6 , the plurality of components 4 a , 4 b , and 4 c arranged on the substrate 2 can be efficiently pressed in by the elastic sheet 80 .
另外,本發明不限於上述實施型態,可以在本發明的範圍內做各種改變。 In addition, the present invention is not limited to the above-mentioned implementation forms, and various changes can be made within the scope of the present invention.
在上述實施型態中,第1圖所示的上側腳部211或下側腳部221在比複數第1抽吸孔31更遠離載台30之中心的位置(例如載台30的邊緣部)與載台30接觸,也可以形成加壓空間。藉由設為這樣的構成,可以利用以載台30、頂板部210以及上側腳部211或下側腳部221包圍的空間作為加壓空間。由於該加壓空間的體積比由第1空間212以及第2空間222構成的處理室6的體積更小,可以有效率地提高該加壓空間的氣壓,可以基於該加壓空間與片材內空間8的壓力差,藉由彈性片材80以適度的力壓入配置於基板2的複數元件4a、4b、4c。 In the above embodiment, the upper leg portion 211 or the lower leg portion 221 shown in FIG. 1 is located further away from the center of the stage 30 than the plurality of first suction holes 31 (for example, the edge of the stage 30 ). In contact with the stage 30, a pressurized space can also be formed. With such a configuration, the space surrounded by the stage 30 , the top plate 210 , and the upper leg 211 or the lower leg 221 can be used as a pressurized space. Since the volume of the pressurized space is smaller than the volume of the processing chamber 6 composed of the first space 212 and the second space 222, the air pressure of the pressurized space can be effectively increased. The pressure difference in the space 8 causes the elastic sheet 80 to press the plurality of components 4a, 4b, and 4c arranged on the substrate 2 with a moderate force.
在上述實施型態中,如第3圖所示,雖然片材固定部33被設置於載台30,也可以被設置於腔室20。例如,片材固定部33也可以被形成於如第1圖所示的下部構件22的下側腳部221上面。此時,作為片材固定部33的態樣,除了上述實施型態描述的態樣之外,例示如下述般的態樣。例如,在下側腳部221的上面形成凹部,同時在對應該凹部的位置,在上側腳部211的下面設置凸部或夾具。設為這樣的構成時,上部構件21下降,與下側腳部221接觸時,設置於上側腳部211的凸部或夾具嵌合凹部。因此,由於位於上側腳部211與下側腳部221之間的彈性片材80,以形成於上側腳部211的凸部或夾具在形成於下側腳部221的凹部內部壓入,可以將彈性片材80固定在上側腳部211與下側腳部221之間。In the above embodiment, as shown in FIG. 3 , the sheet fixing part 33 is provided on the stage 30 , but may also be provided on the chamber 20 . For example, the sheet fixing part 33 may be formed on the lower leg part 221 of the lower member 22 as shown in FIG. 1 . At this time, as an aspect of the sheet fixing part 33, in addition to the aspect described in the above embodiment, the following aspects are exemplified. For example, a concave portion is formed on the upper surface of the lower leg portion 221, and a protrusion or a clip is provided on the lower surface of the upper leg portion 211 at a position corresponding to the concave portion. In such a configuration, when the upper member 21 is lowered and comes into contact with the lower leg portion 221, the convex portion or the clip fitting recessed portion provided in the upper leg portion 211 is used. Therefore, since the elastic sheet 80 located between the upper leg 211 and the lower leg 221 is pressed into the recess formed in the lower leg 221 with the protrusion or clip formed on the upper leg 211, it is possible to The elastic sheet 80 is fixed between the upper leg 211 and the lower leg 221 .
在上述實施型態中,如第8圖所示,雖然藉由推送軸41以及捲繞輥42相對地往載台30接近,片材保持部40將彈性片材80配置於載台30以覆蓋基板2,以彈性片材80覆蓋基板2的手段不限於此。例如,基板處理裝置10可以包括覆膜機,由覆膜機以彈性片材80覆蓋基板2。In the above-described embodiment, as shown in FIG. 8 , the push shaft 41 and the winding roller 42 relatively approach the stage 30 , and the sheet holding part 40 arranges the elastic sheet 80 on the stage 30 to cover it. The method of covering the substrate 2 with the elastic sheet 80 is not limited to this. For example, the substrate processing apparatus 10 may include a laminating machine that covers the substrate 2 with the elastic sheet 80 .
在上述實施型態中,如第3圖所示,雖然基板2的形狀基本上為方形,但也可以是圓形或其他多角形。In the above-mentioned embodiment, as shown in FIG. 3 , although the shape of the substrate 2 is basically a square, it may also be a circle or other polygons.
在上述實施型態中,雖然如第8圖所示,彈性片材80下降到載台30的位置後,如第9圖所示,上部構件21下降到下部構件22的位置,但上部構件21下降到下部構件22的位置並在腔室20內形成密閉空間(處理室6)後,彈性片材80也可以下降到載台30的位置。In the above embodiment, after the elastic sheet 80 is lowered to the position of the stage 30 as shown in FIG. 8, the upper member 21 is lowered to the position of the lower member 22 as shown in FIG. 9. However, the upper member 21 After lowering to the position of the lower member 22 and forming a sealed space (processing chamber 6 ) in the chamber 20 , the elastic sheet 80 may also be lowered to the position of the stage 30 .
在上述實施型態中,雖然基板處理裝置10包括上部加熱裝置91以及下部加熱裝置92的2個加熱裝置,也可以只包括任一者。另外,雖然由上部加熱裝置91以及下部加熱裝置92加熱的溫度以相等為佳,但也可以不同。In the above embodiment, although the substrate processing apparatus 10 includes two heating devices, the upper heating device 91 and the lower heating device 92, it may include only one of them. In addition, although the temperatures heated by the upper heating device 91 and the lower heating device 92 are preferably equal, they may also be different.
在上述實施型態中,雖然藉由片材保持部40接近載台30,片材保持部40將彈性片材80配置於載台30以覆蓋基板2,也可以藉由設置基板2的載台30接近片材保持部40(或彈性片材80),片材保持部40將彈性片材80配置於載台30以覆蓋基板2。或者,複數升降銷50在支撐基板2的狀態下,片材保持部40也可藉由接近片材保持部40(或彈性片材80)以彈性片材80覆蓋基板2。In the above embodiment, although the sheet holding part 40 is close to the stage 30 and the elastic sheet 80 is disposed on the stage 30 to cover the substrate 2 , the sheet holding part 40 may also be provided with a stage where the substrate 2 is placed. 30 is close to the sheet holding part 40 (or elastic sheet 80 ), and the sheet holding part 40 arranges the elastic sheet 80 on the stage 30 to cover the substrate 2 . Alternatively, when the plurality of lift pins 50 support the substrate 2 , the sheet holding part 40 may be brought close to the sheet holding part 40 (or the elastic sheet 80 ) to cover the substrate 2 with the elastic sheet 80 .
在上述實施型態中,雖然被配置為複數第1抽吸孔31與片材固定部33(第3抽吸孔33a)只間隔特定距離,但它們也可以被配置為鄰接。In the above embodiment, the plurality of first suction holes 31 and the sheet fixing portion 33 (third suction hole 33a) are arranged with a specific distance apart, but they may be arranged adjacent to each other.
2:基板2:Substrate
4:元件陣列4: Component Array
6:處理室6: Processing room
7:搬運空間7:Transportation space
8:片材內空間8: Space inside the sheet
4a,4b,4c:元件4a, 4b, 4c: components
10:基板處理裝置10: Substrate processing device
11:驅動部11:Drive Department
12:加壓控制部12: Pressurization control part
13:減壓控制部13:Decompression control department
14:溫度控制部14: Temperature control unit
20:腔室20: Chamber
21:上部構件21: Upper member
22:下部構件22: Lower component
30:載台30: Carrier stage
31:第1抽吸孔31: 1st suction hole
32:第2抽吸孔32: Second suction hole
33:片材固定部33: Sheet fixing part
33a:第3抽吸孔33a: 3rd suction hole
34:基板設置區域34: Substrate installation area
34a:外緣部34a: Outer edge part
34a1~34a4:第1邊~第4邊 34a1~34a4: Side 1~Side 4
35:貫通孔 35:Through hole
41:推送軸 41: Push shaft
42:捲繞輥 42: Roller
43:滑輪 43:Pulley
40:片材保持部 40: Sheet holding part
50:升降銷 50: Lift pin
60:第1抽吸管 60: 1st suction tube
70:第2抽吸管 70: Second suction tube
80:彈性片材 80: Elastic sheet
91:上部加熱裝置 91: Upper heating device
92:下部加熱裝置 92: Lower heating device
100:第3抽吸管 100: 3rd suction tube
210:頂板部 210: Top plate
211:上側腳部 211: Upper foot
220:底部 220: Bottom
220a:貫通孔 220a:Through hole
221:下側腳部 221: Lower foot
212:第1空間 212: Space 1
222:第2空間 222: Second Space
T1,T2:厚度 T1, T2: thickness
L:距離 L: Distance
[第1圖] 第1圖為關於本發明一實施型態的基板處理裝置的概略剖面圖。 [第2圖] 第2圖為顯示在第1圖所示之基板處理裝置的載台設置基板時的狀態的概略平面圖。 [第3圖] 第3圖為顯示以彈性片材覆蓋設置第2圖所示之基板的載台時的狀態的概略平面圖。 [第4圖] 第4圖為同時顯示第3圖所示之基板與彈性片材的部分概略剖面圖。 [第5圖] 第5圖為同時顯示第3圖所示之設置於載台的基板與彈性片材的概略剖面圖。 [第6圖] 第6圖為顯示第1圖所示之基板處理裝置的功能構成的圖。 [第7圖] 第7圖為顯示以彈性片材壓入配置於基板的複數元件的步驟的概略剖面圖。 [第8圖] 第8圖為顯示第7圖後續之步驟的概略剖面圖。 [第9圖] 第9圖為顯示第8圖後續之步驟的概略剖面圖。 [FIG. 1] FIG. 1 is a schematic cross-sectional view of a substrate processing device according to an embodiment of the present invention. [FIG. 2] FIG. 2 is a schematic plan view showing a state in which a substrate is set on a stage of the substrate processing device shown in FIG. 1. [FIG. 3] FIG. 3 is a schematic plan view showing a state in which a stage on which the substrate shown in FIG. 2 is set is covered with an elastic sheet. [FIG. 4] FIG. 4 is a schematic cross-sectional view showing a portion of the substrate shown in FIG. 3 and the elastic sheet at the same time. [FIG. 5] FIG. 5 is a schematic cross-sectional view showing a substrate shown in FIG. 3 and the elastic sheet set on the stage at the same time. [FIG. 6] FIG. 6 is a diagram showing the functional configuration of the substrate processing device shown in FIG. 1. [Figure 7] Figure 7 is a schematic cross-sectional view showing a step of pressing a plurality of components arranged on a substrate with an elastic sheet. [Figure 8] Figure 8 is a schematic cross-sectional view showing a step subsequent to Figure 7. [Figure 9] Figure 9 is a schematic cross-sectional view showing a step subsequent to Figure 8.
2:基板 2: Substrate
6:處理室 6: Processing room
7:搬運空間 7: Transportation space
10:基板處理裝置 10:Substrate processing device
20:腔室 20: Chamber
21:上部構件 21: Upper components
22:下部構件 22: Lower components
30:載台 30: Carrier stage
31:第1抽吸孔 31: 1st suction hole
32:第2抽吸孔 32: Second suction hole
35:貫通孔 35:Through hole
41:推送軸 41: Push shaft
42:捲繞輥 42: Roller
43:滑輪 43: Pulley
40:片材固定部 40: Sheet fixing part
50:升降銷 50: Lift pin
60:第1抽吸管 60: 1st suction pipe
70:第2抽吸管 70: Second suction tube
80:彈性片材 80: Elastic sheet
91:上部加熱裝置 91: Upper heating device
92:下部加熱裝置 92: Lower heating device
210:頂板部 210:Roof part
211:上側腳部 211: Upper foot
212:第1空間 212: 1st space
220:底部 220: bottom
220a:貫通孔 220a: Through hole
221:下側腳部 221: Lower foot
222:第2空間 222:Second space
Claims (12)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2021083900A JP7655776B2 (en) | 2021-05-18 | 2021-05-18 | SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD |
| JP2021-083900 | 2021-05-18 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW202303777A TW202303777A (en) | 2023-01-16 |
| TWI836431B true TWI836431B (en) | 2024-03-21 |
Family
ID=84141644
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW111118503A TWI836431B (en) | 2021-05-18 | 2022-05-18 | Substrate processing device and substrate processing method |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JP7655776B2 (en) |
| CN (1) | CN117321746A (en) |
| TW (1) | TWI836431B (en) |
| WO (1) | WO2022244804A1 (en) |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20020097562A1 (en) * | 2000-12-18 | 2002-07-25 | Tdk Corporation | Electronic device and manufacturing same |
| US20050260341A1 (en) * | 2002-01-15 | 2005-11-24 | Tomotaka Nishimoto | Adhesive sheet stamping device, adhesive sheet stamping method, part mounter display panel manufacturing method |
| US20100190293A1 (en) * | 2007-07-23 | 2010-07-29 | Lintec Corporation | Manufacturing Method of Semiconductor Device |
| TW202007742A (en) * | 2018-07-26 | 2020-02-16 | 日商迪思科股份有限公司 | Wafer processing method |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2845226B2 (en) * | 1996-11-26 | 1999-01-13 | 日本電気株式会社 | Thermocompression bonding equipment |
| JP3619186B2 (en) | 2000-12-18 | 2005-02-09 | Tdk株式会社 | Electronic device and manufacturing method thereof |
| JP2003179101A (en) | 2001-12-11 | 2003-06-27 | Sony Corp | Bonding apparatus, manufacturing method of semiconductor device and bonding method |
| JP5732239B2 (en) | 2010-11-30 | 2015-06-10 | デクセリアルズ株式会社 | Thermocompression head, thermocompression bonding equipment, mounting method |
| JP7623788B2 (en) * | 2020-03-04 | 2025-01-29 | Tdk株式会社 | Pressurizing device, manufacturing device and manufacturing method for element array |
| JP7623787B2 (en) * | 2020-03-04 | 2025-01-29 | Tdk株式会社 | Pressurizing device, manufacturing device and manufacturing method for element array |
-
2021
- 2021-05-18 JP JP2021083900A patent/JP7655776B2/en active Active
-
2022
- 2022-05-18 WO PCT/JP2022/020668 patent/WO2022244804A1/en not_active Ceased
- 2022-05-18 TW TW111118503A patent/TWI836431B/en active
- 2022-05-18 CN CN202280035986.9A patent/CN117321746A/en active Pending
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20020097562A1 (en) * | 2000-12-18 | 2002-07-25 | Tdk Corporation | Electronic device and manufacturing same |
| US20050260341A1 (en) * | 2002-01-15 | 2005-11-24 | Tomotaka Nishimoto | Adhesive sheet stamping device, adhesive sheet stamping method, part mounter display panel manufacturing method |
| US20100190293A1 (en) * | 2007-07-23 | 2010-07-29 | Lintec Corporation | Manufacturing Method of Semiconductor Device |
| TW202007742A (en) * | 2018-07-26 | 2020-02-16 | 日商迪思科股份有限公司 | Wafer processing method |
Also Published As
| Publication number | Publication date |
|---|---|
| CN117321746A (en) | 2023-12-29 |
| JP2022177554A (en) | 2022-12-01 |
| JP7655776B2 (en) | 2025-04-02 |
| TW202303777A (en) | 2023-01-16 |
| WO2022244804A1 (en) | 2022-11-24 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| TWI511225B (en) | Substrate transfer device and substrate assembly line | |
| US8136564B2 (en) | Attaching device and attaching apparatus for supporting plate, and attaching method for supporting plate | |
| KR101288989B1 (en) | Apparatus for processing substrate and method for operating the same | |
| KR102326624B1 (en) | Transport arm, transport apparatus and transport method | |
| KR100850238B1 (en) | Substrate Chuck and Substrate Bonding Device | |
| JP6643197B2 (en) | Semiconductor manufacturing apparatus and semiconductor device manufacturing method | |
| JP2010118584A (en) | Mounting device for wafer | |
| TWI525678B (en) | Sheet Adhesive Device and Paste Method | |
| JP2005322815A (en) | Semiconductor manufacturing apparatus and semiconductor device manufacturing method | |
| CN111243999A (en) | Transfer device and transfer method for micro-component | |
| TWI497639B (en) | Substrate chuck unit, substrate processing apparatus including the same, and substrate transferring method | |
| JP5337620B2 (en) | Workpiece adhesive holding device and vacuum bonding machine | |
| TWI836431B (en) | Substrate processing device and substrate processing method | |
| TW202139273A (en) | Manufacturing method of chip bonding device, stripping jig and semiconductor device characterized by reducing chip cracks and defects during pickup period | |
| TWI836432B (en) | Substrate processing equipment | |
| WO2014006956A1 (en) | Film-like resin laminating device | |
| KR101471002B1 (en) | Apparatus and method for treating substrate | |
| JP2006066767A (en) | Electronic component mounting equipment | |
| JP4758780B2 (en) | Semiconductor device manufacturing method and semiconductor device mounting apparatus | |
| JP7782990B2 (en) | Semiconductor device manufacturing method, workpiece integration device, and film laminate | |
| TWI913564B (en) | Manufacturing method of wafer bonding apparatus, peeling fixture and semiconductor device | |
| JP7580129B2 (en) | Substrate superposition device and substrate superposition method | |
| TWI875165B (en) | Forming mold, resin forming device, and method for manufacturing resin formed product | |
| JP5373331B2 (en) | Substrate processing equipment | |
| TW202601803A (en) | Joining device and joining method |