TWI816661B - Resin composition, adhesive for electronic component, semiconductor device, and electronic component - Google Patents
Resin composition, adhesive for electronic component, semiconductor device, and electronic component Download PDFInfo
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- TWI816661B TWI816661B TW107109845A TW107109845A TWI816661B TW I816661 B TWI816661 B TW I816661B TW 107109845 A TW107109845 A TW 107109845A TW 107109845 A TW107109845 A TW 107109845A TW I816661 B TWI816661 B TW I816661B
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- 239000011342 resin composition Substances 0.000 title claims abstract description 91
- 239000004065 semiconductor Substances 0.000 title claims abstract description 15
- 239000000853 adhesive Substances 0.000 title claims description 10
- 230000001070 adhesive effect Effects 0.000 title claims description 10
- 239000003822 epoxy resin Substances 0.000 claims abstract description 42
- 229920000647 polyepoxide Polymers 0.000 claims abstract description 42
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 claims abstract description 32
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 23
- 239000000454 talc Substances 0.000 claims abstract description 23
- 229910052623 talc Inorganic materials 0.000 claims abstract description 23
- 229910000019 calcium carbonate Inorganic materials 0.000 claims abstract description 16
- -1 thiol compound Chemical class 0.000 claims description 36
- 150000003573 thiols Chemical class 0.000 claims description 25
- 229910052814 silicon oxide Inorganic materials 0.000 claims description 19
- 239000000126 substance Substances 0.000 claims description 15
- 239000004848 polyfunctional curative Substances 0.000 claims description 14
- 150000001875 compounds Chemical class 0.000 claims description 11
- 230000009477 glass transition Effects 0.000 claims description 8
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 7
- 239000001257 hydrogen Substances 0.000 claims description 6
- 229910052739 hydrogen Inorganic materials 0.000 claims description 6
- 229920006295 polythiol Polymers 0.000 claims description 5
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 3
- 125000000217 alkyl group Chemical group 0.000 claims description 3
- 125000004432 carbon atom Chemical group C* 0.000 claims description 3
- 150000002431 hydrogen Chemical class 0.000 claims description 3
- 229910052717 sulfur Inorganic materials 0.000 claims description 3
- 239000011593 sulfur Substances 0.000 claims description 3
- ZJLMKPKYJBQJNH-UHFFFAOYSA-N propane-1,3-dithiol Chemical compound SCCCS ZJLMKPKYJBQJNH-UHFFFAOYSA-N 0.000 claims 2
- 239000003795 chemical substances by application Substances 0.000 abstract description 5
- 125000003396 thiol group Chemical class [H]S* 0.000 abstract description 3
- 239000000377 silicon dioxide Substances 0.000 abstract description 2
- 239000000047 product Substances 0.000 description 52
- 238000012360 testing method Methods 0.000 description 29
- 230000000052 comparative effect Effects 0.000 description 16
- 239000002245 particle Substances 0.000 description 15
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 14
- 239000000463 material Substances 0.000 description 11
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 description 10
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 10
- 230000002209 hydrophobic effect Effects 0.000 description 10
- 239000007788 liquid Substances 0.000 description 9
- 239000004593 Epoxy Substances 0.000 description 8
- 238000001723 curing Methods 0.000 description 8
- 230000006378 damage Effects 0.000 description 8
- 238000005259 measurement Methods 0.000 description 8
- 239000011248 coating agent Substances 0.000 description 7
- 238000000576 coating method Methods 0.000 description 7
- 238000010438 heat treatment Methods 0.000 description 7
- 150000001412 amines Chemical class 0.000 description 6
- TZCXTZWJZNENPQ-UHFFFAOYSA-L barium sulfate Chemical compound [Ba+2].[O-]S([O-])(=O)=O TZCXTZWJZNENPQ-UHFFFAOYSA-L 0.000 description 6
- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical compound C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 description 6
- 239000010445 mica Substances 0.000 description 6
- 229910052618 mica group Inorganic materials 0.000 description 6
- 239000000843 powder Substances 0.000 description 6
- 239000000758 substrate Substances 0.000 description 6
- 125000004122 cyclic group Chemical group 0.000 description 5
- 239000000945 filler Substances 0.000 description 5
- 239000001294 propane Substances 0.000 description 5
- 229920005989 resin Polymers 0.000 description 5
- 239000011347 resin Substances 0.000 description 5
- 229930185605 Bisphenol Natural products 0.000 description 4
- 150000008065 acid anhydrides Chemical group 0.000 description 4
- 238000003776 cleavage reaction Methods 0.000 description 4
- FPAFDBFIGPHWGO-UHFFFAOYSA-N dioxosilane;oxomagnesium;hydrate Chemical compound O.[Mg]=O.[Mg]=O.[Mg]=O.O=[Si]=O.O=[Si]=O.O=[Si]=O.O=[Si]=O FPAFDBFIGPHWGO-UHFFFAOYSA-N 0.000 description 4
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- 230000007017 scission Effects 0.000 description 4
- 229920001187 thermosetting polymer Polymers 0.000 description 4
- 102100027123 55 kDa erythrocyte membrane protein Human genes 0.000 description 3
- 101001057956 Homo sapiens 55 kDa erythrocyte membrane protein Proteins 0.000 description 3
- 229910000831 Steel Inorganic materials 0.000 description 3
- JOBBTVPTPXRUBP-UHFFFAOYSA-N [3-(3-sulfanylpropanoyloxy)-2,2-bis(3-sulfanylpropanoyloxymethyl)propyl] 3-sulfanylpropanoate Chemical compound SCCC(=O)OCC(COC(=O)CCS)(COC(=O)CCS)COC(=O)CCS JOBBTVPTPXRUBP-UHFFFAOYSA-N 0.000 description 3
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 3
- 239000011324 bead Substances 0.000 description 3
- 239000004849 latent hardener Substances 0.000 description 3
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 3
- PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Substances [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 3
- 239000010959 steel Substances 0.000 description 3
- 238000003756 stirring Methods 0.000 description 3
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- LSDPWZHWYPCBBB-UHFFFAOYSA-N Methanethiol Chemical compound SC LSDPWZHWYPCBBB-UHFFFAOYSA-N 0.000 description 2
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical compound C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- 239000007795 chemical reaction product Substances 0.000 description 2
- 239000006185 dispersion Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 239000013500 performance material Substances 0.000 description 2
- 230000000704 physical effect Effects 0.000 description 2
- 229920001296 polysiloxane Polymers 0.000 description 2
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 238000000518 rheometry Methods 0.000 description 2
- 229910052604 silicate mineral Inorganic materials 0.000 description 2
- 239000003381 stabilizer Substances 0.000 description 2
- 125000000446 sulfanediyl group Chemical group *S* 0.000 description 2
- SXVCWHWUDQCLAZ-UHFFFAOYSA-N 1,3-bis(ethylsulfanyl)propane Chemical compound CCSCCCSCC SXVCWHWUDQCLAZ-UHFFFAOYSA-N 0.000 description 1
- QOFFSAGZVFTNLB-UHFFFAOYSA-N 1-[methylsulfanyl(sulfanyl)methyl]sulfanyl-2-(sulfanylmethylsulfanyl)ethanethiol Chemical compound SC(SC(S)SC)CSCS QOFFSAGZVFTNLB-UHFFFAOYSA-N 0.000 description 1
- RNFJDJUURJAICM-UHFFFAOYSA-N 2,2,4,4,6,6-hexaphenoxy-1,3,5-triaza-2$l^{5},4$l^{5},6$l^{5}-triphosphacyclohexa-1,3,5-triene Chemical compound N=1P(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP=1(OC=1C=CC=CC=1)OC1=CC=CC=C1 RNFJDJUURJAICM-UHFFFAOYSA-N 0.000 description 1
- MLHBQCMRBXCFLT-UHFFFAOYSA-N 2,2-bis(sulfanylmethylsulfanyl)ethanethiol Chemical compound SCSC(CS)SCS MLHBQCMRBXCFLT-UHFFFAOYSA-N 0.000 description 1
- VSSFYDMUTATOHG-UHFFFAOYSA-N 2-(2-sulfanylethylsulfanyl)-3-[3-sulfanyl-2-(2-sulfanylethylsulfanyl)propyl]sulfanylpropane-1-thiol Chemical compound SCCSC(CS)CSCC(CS)SCCS VSSFYDMUTATOHG-UHFFFAOYSA-N 0.000 description 1
- XBFUGGOVPHCNEG-UHFFFAOYSA-N 2-ethyl-2-(hydroxymethyl)propane-1,3-diol Chemical compound CCC(CO)(CO)CO.CCC(CO)(CO)CO XBFUGGOVPHCNEG-UHFFFAOYSA-N 0.000 description 1
- NFWWYNCEHOIVKX-UHFFFAOYSA-N 2-ethyl-2-(hydroxymethyl)propane-1,3-diol propane-1-thiol Chemical compound CCCS.CCCS.CCC(CO)(CO)CO NFWWYNCEHOIVKX-UHFFFAOYSA-N 0.000 description 1
- UMXBATVGSBGWII-UHFFFAOYSA-N 2-methylsulfanyl-1,3-dithiolane Chemical compound CSC1SCCS1 UMXBATVGSBGWII-UHFFFAOYSA-N 0.000 description 1
- OCGYTRZLSMAPQC-UHFFFAOYSA-N 3-(2-sulfanylethylsulfanyl)-2-[1-sulfanyl-3-(2-sulfanylethylsulfanyl)propan-2-yl]sulfanylpropane-1-thiol Chemical compound SCCSCC(CS)SC(CS)CSCCS OCGYTRZLSMAPQC-UHFFFAOYSA-N 0.000 description 1
- NXYWIOFCVGCOCB-UHFFFAOYSA-N 3-(2-sulfanylethylsulfanyl)-2-[3-sulfanyl-2-(2-sulfanylethylsulfanyl)propyl]sulfanylpropane-1-thiol Chemical compound SCCSCC(CS)SCC(CS)SCCS NXYWIOFCVGCOCB-UHFFFAOYSA-N 0.000 description 1
- ALRHLSYJTWAHJZ-UHFFFAOYSA-M 3-hydroxypropionate Chemical compound OCCC([O-])=O ALRHLSYJTWAHJZ-UHFFFAOYSA-M 0.000 description 1
- DKIDEFUBRARXTE-UHFFFAOYSA-M 3-mercaptopropionate Chemical compound [O-]C(=O)CCS DKIDEFUBRARXTE-UHFFFAOYSA-M 0.000 description 1
- DWKUCGVJAUKGCG-UHFFFAOYSA-N 3-propylsulfanylpropane-1-thiol Chemical compound CCCSCCCS DWKUCGVJAUKGCG-UHFFFAOYSA-N 0.000 description 1
- BNWSMHWYJOEVPV-PTFDWCFRSA-N CC(CC(OC[C@H]([C@H](C(CC(C)(C)C)O)O)O)=O)S Chemical compound CC(CC(OC[C@H]([C@H](C(CC(C)(C)C)O)O)O)=O)S BNWSMHWYJOEVPV-PTFDWCFRSA-N 0.000 description 1
- OTMSDBZUPAUEDD-UHFFFAOYSA-N Ethane Chemical compound CC OTMSDBZUPAUEDD-UHFFFAOYSA-N 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 description 1
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 1
- BTBBHPVXZBNHJT-JPPRQWMHSA-N SCCC(=O)O.C(C(C)(C)C)C([C@H](O)[C@H](O)CO)O Chemical compound SCCC(=O)O.C(C(C)(C)C)C([C@H](O)[C@H](O)CO)O BTBBHPVXZBNHJT-JPPRQWMHSA-N 0.000 description 1
- 239000006087 Silane Coupling Agent Substances 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Chemical compound NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 description 1
- MKKUIBKEXGEELZ-UHFFFAOYSA-N [1,2-bis(sulfanylmethylsulfanyl)-2-[[5-[1,2,2-tris(sulfanylmethylsulfanyl)ethylsulfanylmethylsulfanyl]-1,3-dithiolan-4-yl]sulfanylmethylsulfanyl]ethyl]sulfanylmethanethiol Chemical compound SCSC(SCS)C(SCS)SCSC1SCSC1SCSC(SCS)C(SCS)SCS MKKUIBKEXGEELZ-UHFFFAOYSA-N 0.000 description 1
- RFAWDNBGSZZKPZ-UHFFFAOYSA-N [1,3-bis(sulfanylmethylsulfanyl)-3-[[6-[1,3,3-tris(sulfanylmethylsulfanyl)propylsulfanylmethylsulfanyl]-1,3-dithian-4-yl]sulfanylmethylsulfanyl]propyl]sulfanylmethanethiol Chemical compound SCSC(SCS)CC(SCS)SCSC1CC(SCSC(CC(SCS)SCS)SCS)SCS1 RFAWDNBGSZZKPZ-UHFFFAOYSA-N 0.000 description 1
- SGSQVJZTWMQMBM-UHFFFAOYSA-N [2-[[1,3-dithietan-2-yl-[1,2,2-tris(sulfanylmethylsulfanyl)ethylsulfanylmethylsulfanyl]methyl]sulfanylmethylsulfanyl]-1,2-bis(sulfanylmethylsulfanyl)ethyl]sulfanylmethanethiol Chemical compound SCSC(SCS)C(SCS)SCSC(SCSC(SCS)C(SCS)SCS)C1SCS1 SGSQVJZTWMQMBM-UHFFFAOYSA-N 0.000 description 1
- QNSUVMHSJGIMDL-UHFFFAOYSA-N [6-(sulfanylmethylsulfanyl)-1,3-dithian-4-yl]sulfanylmethanethiol Chemical compound SCSC1CC(SCS)SCS1 QNSUVMHSJGIMDL-UHFFFAOYSA-N 0.000 description 1
- 238000005054 agglomeration Methods 0.000 description 1
- 230000002776 aggregation Effects 0.000 description 1
- 125000002723 alicyclic group Chemical group 0.000 description 1
- 239000004844 aliphatic epoxy resin Substances 0.000 description 1
- 125000001931 aliphatic group Chemical group 0.000 description 1
- IHUNBGSDBOWDMA-AQFIFDHZSA-N all-trans-acitretin Chemical compound COC1=CC(C)=C(\C=C\C(\C)=C\C=C\C(\C)=C\C(O)=O)C(C)=C1C IHUNBGSDBOWDMA-AQFIFDHZSA-N 0.000 description 1
- 150000008064 anhydrides Chemical class 0.000 description 1
- 239000002518 antifoaming agent Substances 0.000 description 1
- 239000003963 antioxidant agent Substances 0.000 description 1
- 150000001642 boronic acid derivatives Chemical class 0.000 description 1
- 239000004202 carbamide Substances 0.000 description 1
- 239000006229 carbon black Substances 0.000 description 1
- 230000006835 compression Effects 0.000 description 1
- 238000007906 compression Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- GUJOJGAPFQRJSV-UHFFFAOYSA-N dialuminum;dioxosilane;oxygen(2-);hydrate Chemical class O.[O-2].[O-2].[O-2].[Al+3].[Al+3].O=[Si]=O.O=[Si]=O.O=[Si]=O.O=[Si]=O GUJOJGAPFQRJSV-UHFFFAOYSA-N 0.000 description 1
- 239000012776 electronic material Substances 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 239000003063 flame retardant Substances 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 125000000524 functional group Chemical group 0.000 description 1
- VPVSTMAPERLKKM-UHFFFAOYSA-N glycoluril Chemical class N1C(=O)NC2NC(=O)NC21 VPVSTMAPERLKKM-UHFFFAOYSA-N 0.000 description 1
- 238000013007 heat curing Methods 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 150000002460 imidazoles Chemical class 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 229910052500 inorganic mineral Inorganic materials 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 239000012948 isocyanate Substances 0.000 description 1
- NLYAJNPCOHFWQQ-UHFFFAOYSA-N kaolin Chemical class O.O.O=[Al]O[Si](=O)O[Si](=O)O[Al]=O NLYAJNPCOHFWQQ-UHFFFAOYSA-N 0.000 description 1
- 238000004898 kneading Methods 0.000 description 1
- 238000007561 laser diffraction method Methods 0.000 description 1
- 238000000691 measurement method Methods 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 125000005358 mercaptoalkyl group Chemical group 0.000 description 1
- 239000011707 mineral Substances 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 125000004433 nitrogen atom Chemical group N* 0.000 description 1
- 150000007524 organic acids Chemical class 0.000 description 1
- 235000005985 organic acids Nutrition 0.000 description 1
- 239000005416 organic matter Substances 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000007962 solid dispersion Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 230000008961 swelling Effects 0.000 description 1
- 238000005979 thermal decomposition reaction Methods 0.000 description 1
- 239000013008 thixotropic agent Substances 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 150000003672 ureas Chemical class 0.000 description 1
- 238000009736 wetting Methods 0.000 description 1
Landscapes
- Compositions Of Macromolecular Compounds (AREA)
- Die Bonding (AREA)
- Epoxy Resins (AREA)
- Adhesives Or Adhesive Processes (AREA)
Abstract
Description
本發明係關於樹脂組成物、半導體裝置及電子零件。特別是關於適用於電子零件用接著劑之樹脂組成物、含有該樹脂組成物的硬化物之半導體裝置及電子零件。 The present invention relates to resin compositions, semiconductor devices and electronic components. In particular, it relates to a resin composition suitable for use as an adhesive for electronic components, a semiconductor device and electronic components containing a cured product of the resin composition.
現今所使用之可攜式終端等之中,係內裝有電子零件。就該可攜式終端等而言,有許多用途係要求抗掉落衝擊性。 The portable terminals used today are equipped with electronic components. There are many uses for such portable terminals and the like that require drop impact resistance.
專利文獻1提出一種熱硬化性環氧樹脂組成物,其特徴係以提升抗掉落衝擊性為目的,於含有環氧樹脂與其硬化劑之熱硬化性環氧樹脂組成物中含有微小聚矽氧凝膠珠粒(micro silicone gel beads)。 Patent Document 1 proposes a thermosetting epoxy resin composition, which is characterized by containing micropolysiloxane in the thermosetting epoxy resin composition containing epoxy resin and its hardener for the purpose of improving drop impact resistance. Micro silicone gel beads.
然而,該以含有微小聚矽氧凝膠珠粒為特徴之熱硬化性環氧樹脂組成物係藉由樹脂的黏彈性特性進行改善,而有無法於低溫以短時間硬化、熱膨張係數大之 問題。因此,不適合使用於電子零件(例如,音圈馬達(Voice Coil Motor,即VCM,用於相機之對焦等)用接著劑、振動模組(vibrate module)所用之接著劑。 However, the thermosetting epoxy resin composition, which is characterized by containing tiny polysiloxane gel beads, is improved by the viscoelastic properties of the resin. However, it cannot be cured in a short time at low temperatures and has a large thermal expansion coefficient. problem. Therefore, it is not suitable for use in adhesives for electronic parts (such as voice coil motors (VCM, used for camera focusing, etc.)) and adhesives for vibration modules.
[專利文獻1]日本特開2015-887號公報 [Patent Document 1] Japanese Patent Application Publication No. 2015-887
本發明係有鑑於上述問題而創研者,目的為提供一種可於短時間內硬化且硬化後的抗掉落衝擊性優異之樹脂組成物、以及含有該樹脂組成物的硬化物之半導體裝置以及電子零件。 The present invention was created in view of the above problems, and aims to provide a resin composition that can be cured in a short time and has excellent drop impact resistance after curing, and a semiconductor device containing a cured product of the resin composition. Electronic parts.
本發明者等為了解決上述課題而精心進行檢討,發現包含(A)環氧樹脂、(B)硫醇系硬化劑及特定量之(C)滑石的樹脂組成物係可於短時間內硬化且硬化後的抗掉落衝擊性優異。 The present inventors conducted careful examinations to solve the above problems and found that a resin composition containing (A) epoxy resin, (B) thiol-based hardener, and a specific amount of (C) talc can be cured in a short time and Excellent drop impact resistance after hardening.
本發明係關於因具有以下構成而解決了上述問題的樹脂組成物、電子零件用接著劑、半導體裝置及電子零件。 The present invention relates to a resin composition, an adhesive for electronic components, a semiconductor device, and an electronic component that solve the above-mentioned problems by having the following structures.
[1]一種樹脂組成物,係包含(A)環氧樹脂、(B)硫醇系硬化劑及(C)滑石,其中,相對於樹脂組成物100質量份,(C)成分為5至20質量份。 [1] A resin composition containing (A) epoxy resin, (B) thiol-based hardener and (C) talc, wherein the component (C) is 5 to 20 parts by mass based on 100 parts by mass of the resin composition. parts by mass.
[2]如上述[1]所述之樹脂組成物,更包含(D)碳酸鈣及/或氧化矽。 [2] The resin composition as described in [1] above, further comprising (D) calcium carbonate and/or silicon oxide.
[3]如上述[2]所述之樹脂組成物,其中,相對於樹脂組成物100質量份,(C)成分與(D)成分之合計為5至40質量份。 [3] The resin composition according to the above [2], wherein the total of component (C) and component (D) is 5 to 40 parts by mass relative to 100 parts by mass of the resin composition.
[4]如上述[1]至[3]之任一項所述之樹脂組成物,其中,樹脂組成物的硬化物之玻璃轉移溫度(Tg)為25℃至50℃。 [4] The resin composition according to any one of [1] to [3] above, wherein the glass transition temperature (Tg) of the cured product of the resin composition is 25°C to 50°C.
[5]如上述[1]至[4]之任一項所述之樹脂組成物,其中,(B)成分包含:分子中不具酯鍵之硫醇化合物。 [5] The resin composition according to any one of the above [1] to [4], wherein the component (B) contains a thiol compound without an ester bond in the molecule.
[6]一種電子零件用接著劑,係包含上述[1]至[5]之任一項所述之樹脂組成物。 [6] An adhesive for electronic parts containing the resin composition described in any one of the above [1] to [5].
[7]一種樹脂組成物的硬化物,係包含(A)環氧樹脂、(B)硫醇系硬化劑及(C)滑石,其中,相對於樹脂組成物100質量份,(C)成分為5至20質量份。 [7] A cured product of a resin composition containing (A) epoxy resin, (B) thiol-based hardener and (C) talc, wherein (C) component is 5 to 20 parts by mass.
[8]一種半導體裝置,係包含上述[7]所述之硬化物。 [8] A semiconductor device including the cured product according to the above [7].
[9]一種電子零件,係包含上述[7]所述之硬化物、或上述[8]所述之半導體裝置。 [9] An electronic component including the hardened material according to the above [7] or the semiconductor device according to the above [8].
依據本發明[1],可提供一種可於短時間內硬化且硬化後的抗掉落衝擊性優異之樹脂組成物。 According to the present invention [1], it is possible to provide a resin composition that can be cured in a short time and has excellent drop impact resistance after curing.
依據本發明[7],可提供一種可於短時間內硬化且硬化後的抗掉落衝擊性優異之樹脂組成物的硬化物。 According to the present invention [7], it is possible to provide a cured product of a resin composition that can be cured in a short time and has excellent drop impact resistance after curing.
依據本發明[8],可提供一種可靠性高的半 導體裝置,係包含可於短時間內硬化且硬化後的抗掉落衝擊性優異之樹脂組成物的硬化物。依據本發明[9],可提供一種可靠性高的電子零件,係包含可於短時間內硬化且硬化後的抗掉落衝擊性優異之樹脂組成物的硬化物。 According to the present invention [8], a highly reliable semiconductor device can be provided, which is a cured product including a resin composition that can be cured in a short time and has excellent drop impact resistance after curing. According to the present invention [9], it is possible to provide a highly reliable electronic component, which is a cured product including a resin composition that can be cured in a short time and has excellent drop impact resistance after curing.
[樹脂組成物] [Resin composition]
本發明之樹脂組成物係包含(A)環氧樹脂、(B)硫醇系硬化劑及(C)滑石,其中,相對於樹脂組成物100質量份,(C)成分為5至20質量份。 The resin composition of the present invention contains (A) epoxy resin, (B) thiol hardener and (C) talc, wherein (C) component is 5 to 20 parts by mass relative to 100 parts by mass of the resin composition. .
作為(A)成分之環氧樹脂,係對樹脂組成物賦予硬化性、耐熱性、接著性等。(A)成分可列舉:矽氧烷改性環氧樹脂、液狀雙酚A型環氧樹脂、液狀雙酚F型環氧樹脂、液狀萘型環氧樹脂、液狀氫化雙酚型環氧樹脂、液狀脂環式環氧樹脂、液狀醇醚型環氧樹脂、液狀環狀脂肪族型環氧樹脂、液狀茀型環氧樹脂、液狀矽氧烷系環氧樹脂等。(A)成分係以具有柔軟的骨架之環氧樹脂為較佳。具有柔軟的骨架之環氧樹脂,可列舉例如矽氧烷改性環氧樹脂。使用具有雙酚骨格之環氧樹脂(例如,雙酚A型環氧樹脂、雙酚F型環氧樹脂)時,係以所組合之(B)成分為具有柔軟的骨架之硫醇系硬化劑為較佳。藉由(A)成分、(B)成分的至少一者具有柔軟的骨架,可將樹脂組成物的硬化物之玻璃轉移溫度(Tg)設為25℃至50℃。更具體而言,藉 由[1]「使用不含苯環之環氧樹脂作為(A)成分,且使用具有環狀構造之硫醇系硬化劑作為(B)成分」、[2]「使用包含苯環之環氧樹脂作為(A)成分,且使用不具有環狀構造之硫醇系硬化劑作為(B)成分」,即可將樹脂組成物的硬化物之玻璃轉移溫度(Tg)設為25℃至50℃。在將包含苯環之環氧樹脂與不含苯環之環氧樹脂併用而作為(A)成分時,只要因應其併用程度而適當地選擇(B)成分即可。同樣地,在將具有環狀構造之硫醇硬化劑與不具有環狀構造之硫醇硬化劑併用而作為(B)成分時,只要因應其併用程度而適當地選擇(A)成分即可。樹脂組成物的硬化物的Tg若未達25℃,則剪切強度(shear strength)容易變低,若超過50℃,則剪切強度雖變高但剝離強度容易降低。(A)成分的市售品可列舉:Momentive Performance Materials Japan合同公司製之矽氧烷改性環氧樹脂(品名:TSL9906)、新日鐵化學製之雙酚A型環氧樹脂(品名:YD-128)、新日鐵化學製之雙酚F型環氧樹脂(品名:YDF8170)、DIC製萘型環氧樹脂(品名:HP4032D)、三菱化學製之胺基酚型環氧樹脂(品級:JER630、JER630LSD)等。(A)成分可單獨使用,亦可將2種以上併用。 The epoxy resin as component (A) imparts curability, heat resistance, adhesiveness, etc. to the resin composition. (A) Components include: siloxane modified epoxy resin, liquid bisphenol A type epoxy resin, liquid bisphenol F type epoxy resin, liquid naphthalene type epoxy resin, liquid hydrogenated bisphenol type Epoxy resin, liquid alicyclic epoxy resin, liquid alcohol ether type epoxy resin, liquid cyclic aliphatic epoxy resin, liquid fluorine type epoxy resin, liquid siloxane-based epoxy resin wait. The component (A) is preferably an epoxy resin with a soft skeleton. Examples of the epoxy resin having a soft skeleton include siloxane-modified epoxy resin. When using an epoxy resin with a bisphenol skeleton (for example, bisphenol A-type epoxy resin, bisphenol F-type epoxy resin), the combined component (B) is a thiol-based hardener with a soft skeleton. For better. Since at least one of the component (A) and the component (B) has a soft skeleton, the glass transition temperature (Tg) of the cured product of the resin composition can be set to 25°C to 50°C. More specifically, by [1] "Use an epoxy resin that does not contain a benzene ring as the (A) component, and use a thiol-based hardener with a cyclic structure as the (B) component", [2] "Use The glass transition temperature (Tg) of the cured product of the resin composition can be set by using an epoxy resin containing a benzene ring as the component (A) and using a thiol-based hardener without a cyclic structure as the component (B). is 25℃ to 50℃. When an epoxy resin containing a benzene ring and an epoxy resin not containing a benzene ring are used together as the component (A), the component (B) may be appropriately selected depending on the degree of their combined use. Similarly, when a mercaptan hardening agent having a cyclic structure and a mercaptan hardening agent not having a cyclic structure are used together as the component (B), the component (A) may be appropriately selected depending on the degree of the combination. If the Tg of the cured product of the resin composition is less than 25°C, the shear strength will tend to be low. If it exceeds 50°C, the shear strength will be high but the peel strength will tend to be low. Examples of commercially available products of component (A) include: siloxane-modified epoxy resin (product name: TSL9906) manufactured by Momentive Performance Materials Japan Contract Co., Ltd., bisphenol A-type epoxy resin (product name: YD) manufactured by Nippon Steel Chemical Co., Ltd. -128), Nippon Steel Chemical's bisphenol F-type epoxy resin (product name: YDF8170), DIC's naphthalene-type epoxy resin (product name: HP4032D), Mitsubishi Chemical's aminophenol-type epoxy resin (grade : JER630, JER630LSD), etc. (A) Component can be used individually or in combination of 2 or more types.
作為(B)成分之硫醇系硬化劑,係對樹脂組成物賦予低溫短時間硬化性。從耐濕性之觀點來看,(B)成分係以通式(1)所表示之硫醇化合物為較佳:
(式中,R1、及R2分別獨立地為氫、碳數1至10的烷基、或苯基,n為0至10之整數)。 (In the formula, R 1 and R 2 are each independently hydrogen, an alkyl group having 1 to 10 carbon atoms, or a phenyl group, and n is an integer from 0 to 10).
更佳為以化學式(2)或化學式(3)所表示之於含氮雜環化合物的4個氮原子分別鍵結有作為官能基之(-CH2-CH2-SH)或(-CH2-CH2-CH2-SH)而成的多官能含氮雜環化合物:
而且,(B)成分亦可為分子中不具酯鍵之其 它硫醇化合物。此化合物如通式(4)所示:
(式中,R3、R4、R5及R6分別獨立地為氫或CnH2nSH(n為2至6),且R3、R4、R5及R6中之至少一者為CnH2nSH(n為2至6))。從硬化性之觀點來看,通式(4)之硫醇化合物係以n為2至4為較佳;從硬化物的物性與硬化速度的均衡之觀點來看,係以n為3之巰丙基為較佳。而且,通式(4)之硫醇化合物亦可為巰烷基數目為單一或不同者之混合物。從硬化性之觀點來看,通式(4)之硫醇化合物係以巰丙基為2至4個者為較佳;從硬化物的物性與硬化速度的均衡之觀點來看,係以巰丙基為3個者為最佳。此硫醇化合物係因其本身具有十分柔軟的骨架,故在欲使硬化物的彈性模數變低之情形為有效。藉由添加此硫醇化合物,可調控硬化物的彈性模數,故可提高硬化後的接著強度(尤其是剝離強度)。於式(4)所表示之化合物之例中,除了新戊四醇三丙烷硫醇(商品名稱:PEPT,SC有機化學股份公司製)以外,可包含三羥甲基丙烷二丙烷硫醇等。此等之中,係以新戊四醇三丙烷硫醇為特佳。分子中不具酯鍵之其它硫醇化合物,亦可使用於分子內具有2個以上硫 鍵之3官能以上的多硫醇(polythiol)化合物。此種硫醇化合物可列舉例如:1,2,3-參(巰甲基硫基)丙烷、1,2,3-參(2-巰乙基硫基)丙烷、1,2,3-參(3-巰丙基硫基)丙烷、4-巰甲基-1,8-二巰基-3,6-二硫雜辛烷、5,7-二巰基甲基-1,11-二巰基-3,6,9-三硫雜十一烷、4,7-二巰基甲基-1,11-二巰基-3,6,9-三硫雜十一烷、4,8-二巰基甲基-1,11-二巰基-3,6,9-三硫雜十一烷、肆(巰甲基硫基甲基)甲烷、肆(2-巰乙基硫基甲基)甲烷、肆(3-巰丙基硫基甲基)甲烷、1,1,3,3-肆(巰甲基硫基)丙烷、1,1,2,2-肆(巰甲基硫基)乙烷、4,6-雙(巰甲基硫基)-1,3-二硫雜環己烷、1,1,5,5-肆(巰甲基硫基)-3-硫雜戊烷、1,1,6,6-肆(巰甲基硫基)-3,4-二硫雜己烷、2,2-雙(巰甲基硫基)乙烷硫醇、3-巰甲基硫基-1,7-二巰基-2,6-二硫雜庚烷、3,6-雙(巰甲基硫基)-1,9-二巰基-2,5,8-三硫雜壬烷、3-巰甲基硫基-1,6-二巰基-2,5-二硫雜己烷、1,1,9,9-肆(巰甲基硫基)-5-(3,3-雙(巰甲基硫基)-1-硫雜丙基)3,7-二硫雜壬烷、參(2,2-雙(巰甲基硫基)乙基)甲烷、參(4,4-雙(巰甲基硫基)-2-硫雜丁基)甲烷、肆(2,2-雙(巰甲基硫基)乙基)甲烷、肆(4,4-雙(巰甲基硫基)-2-硫雜丁基)甲烷、3,5,9,11-肆(巰甲基硫基)-1,13-二巰基-2,6,8,12-四硫雜十三烷、3,5,9,11,15,17-陸(巰甲基硫基)-1,19-二巰基-2,6,8,12,14,18-六硫雜十九烷、9-(2,2-雙(巰甲基硫基)乙基)-3,5,13,15-肆(巰甲基硫基)-1,17-二巰基-2,6,8,10,12,16-六硫雜十七烷、3,4,8,9-肆(巰甲基硫基)-1,11-二巰基-2,5,7,10-四硫雜十一烷、3,4,8,9,13,14-陸(巰甲基硫基)- 1,16-二巰基-2,5,7,10,12,15-六硫雜十六烷、8-[雙(巰甲基硫基)甲基]-3,4,12,13-肆(巰甲基硫基)-1,15-二巰基-2,5,7,9,11,14-六硫雜十五烷、4,6-雙[3,5-雙(巰甲基硫基)-7-巰基-2,6-二硫雜庚基硫基]-1,3-二硫雜環己烷、4-[3,5-雙(巰甲基硫基)-7-巰基-2,6-二硫雜庚硫基]-6-巰甲基硫基-1,3-二硫雜環己烷、1,1-雙[4-(6-巰甲基硫基)-1,3-二硫雜環己烷基硫基]-1,3-雙(巰甲基硫基)丙烷、1-[4-(6-巰甲基硫基)-1,3-二硫雜環己烷基硫基]-3-[2,2-雙(巰甲基硫基)乙基]-7,9-雙(巰甲基硫基)-2,4,6,10-四硫雜十一烷、1,5-雙[4-(6-巰甲基硫基)-1,3-二硫雜環己烷基硫基]-3-[2-(1,3-二硫雜環丁烷基)]甲基-2,4-二硫雜戊烷、3-[2-(1,3-二硫雜環丁烷基)]甲基-7,9-雙(巰甲基硫基)-1,11-二巰基-2,4,6,10-四硫雜十一烷、9-[2-(1,3-二硫雜環丁烷基)]甲基-3,5,13,15-肆(巰甲基硫基)-1,17-二巰基-2,6,8,10,12,16-六硫雜十七烷、3-[2-(1,3-二硫雜環丁烷基)]甲基-7,9,13,15-肆(巰甲基硫基)-1,17-二巰基-2,4,6,10,12,16-六硫雜十七烷、3,7-雙[2-(1,3-二硫雜環丁烷基)]甲基-1,9-二巰基-2,4,6,8-四硫雜壬烷等脂肪族多硫醇化合物;4,6-雙{3-[2-(1,3-二硫雜環丁烷基)]甲基-5-巰基-2,4-二硫雜戊基硫基}-1,3-二硫雜環己烷、4,6-雙[4-(6-巰甲基硫基)-1,3-二硫雜環己烷基硫基]-6-[4-(6-巰甲基硫基)-1,3-二硫雜環己烷基硫基]-1,3-二硫雜環己烷、4-[3,4,8,9-肆(巰甲基硫基)-11-巰基-2,5,7,10-四硫雜十一基]-5-巰甲基硫基-1,3-二硫雜環戊烷、4,5-雙[3,4-雙(巰甲基硫基)-6-巰基-2,5-二硫 雜己基硫基]-1,3-二硫雜環戊烷、4-[3,4-雙(巰甲基硫基)-6-巰基-2,5-二硫雜己基硫基]-5-巰甲基硫基-1,3-二硫雜環戊烷、4-[3-雙(巰甲基硫基)甲基-5,6-雙(巰甲基硫基)-8-巰基-2,4,7-三硫雜辛基]-5-巰甲基硫基-1,3-二硫雜環戊烷、2-{雙[3,4-雙(巰甲基硫基)-6-巰基-2,5-二硫雜己基硫基]甲基}-1,3-二硫雜環丁烷、2-[3,4-雙(巰甲基硫基)-6-巰基-2,5-二硫雜己基硫基]巰甲基硫基甲基-1,3-二硫雜環丁烷、2-[3,4,8,9-肆(巰甲基硫基)-11-巰基-2,5,7,10-四硫雜十一基硫基]巰甲基硫基甲基-1,3-二硫雜環丁烷、2-[3-雙(巰甲基硫基)甲基-5,6-雙(巰甲基硫基)-8-巰基-2,4,7-三硫雜辛基]巰甲基硫基甲基-1,3-二硫雜環丁烷、4,5-雙{1-[2-(1,3-二硫雜環丁烷基)]-3-巰基-2-硫雜丙基硫基}-1,3-二硫雜環戊烷、4-{1-[2-(1,3-二硫雜環丁烷基)]-3-巰基-2-硫雜丙基硫基}-5-[1,2-雙(巰甲基硫基)-4-巰基-3-硫雜丁基硫基]-1,3-二硫雜環戊烷、2-{雙[4-(5-巰甲基硫基-1,3-二硫雜環戊烷基)硫基]甲基}-1,3-二硫雜環丁烷、4-[4-(5-巰甲基硫基-1,3-二硫雜環戊烷基)硫基]-5-{1-[2-(1,3-二硫雜環丁烷基)]-3-巰基-2-硫雜丙基硫基}-1,3-二硫雜環戊烷等具有環式構造之多硫醇化合物。 (In the formula, R 3 , R 4 , R 5 and R 6 are each independently hydrogen or C n H 2n SH (n is 2 to 6), and at least one of R 3 , R 4 , R 5 and R 6 The one is C n H 2n SH (n is 2 to 6)). From the perspective of curability, the thiol compound of general formula (4) is preferably one in which n is 2 to 4; from the perspective of the balance between the physical properties of the cured product and the curing speed, the thiol compound in which n is 3 is preferred. Propyl is preferred. Moreover, the thiol compound of the general formula (4) may also be a mixture having a single or different number of mercaptoalkyl groups. From the perspective of curability, the thiol compound of general formula (4) is preferably one with 2 to 4 mercaptopropyl groups; from the perspective of the balance between the physical properties of the cured product and the curing speed, the thiol compound of general formula (4) is preferably one with mercaptopropyl groups. The one with 3 propyl groups is the best. Since this thiol compound itself has a very soft skeleton, it is effective when the elastic modulus of the cured product is to be lowered. By adding this thiol compound, the elastic modulus of the hardened product can be controlled, thereby improving the bonding strength (especially the peel strength) after hardening. Examples of the compound represented by formula (4) may include trimethylolpropane dipropanethiol, etc., in addition to neopentylerythritol tripropanethiol (trade name: PEPT, manufactured by SC Organic Chemical Co., Ltd.). Among these, neopentylerythritol tripropanethiol is particularly preferred. Other thiol compounds without ester bonds in the molecule can also be used in trifunctional or higher polythiol compounds with more than 2 sulfur bonds in the molecule. Examples of such thiol compounds include: 1,2,3-shen(mercaptomethylthio)propane, 1,2,3-shen(2-mercaptoethylthio)propane, and 1,2,3-shen(mercaptoethylthio)propane. (3-Mercaptopropylthio)propane, 4-mercaptomethyl-1,8-dimercapto-3,6-dithianoctane, 5,7-dimercaptomethyl-1,11-dimercapto- 3,6,9-trithiaundecane, 4,7-dimercaptomethyl-1,11-dimercapto-3,6,9-trithiaundecane, 4,8-dimercaptomethyl -1,11-dimercapto-3,6,9-trithiaundecane, 4(mercaptomethylthiomethyl)methane, 4(2-mercaptoethylthiomethyl)methane, 4(3 -Mercaptopropylthiomethyl)methane, 1,1,3,3-(mercaptomethylthio)propane, 1,1,2,2-(mercaptomethylthio)ethane, 4, 6-bis(mercaptomethylthio)-1,3-dithiacyclohexane, 1,1,5,5-bis(mercaptomethylthio)-3-thiolatane, 1,1, 6,6-Si(mercaptomethylthio)-3,4-dithiahexane, 2,2-bis(mercaptomethylthio)ethanethiol, 3-mercaptomethylthio-1, 7-dimercapto-2,6-dithiapane, 3,6-bis(mercaptomethylthio)-1,9-dimercapto-2,5,8-trithionane, 3-mercapto Methylthio-1,6-dimercapto-2,5-dithiahexane, 1,1,9,9-4(mercaptomethylthio)-5-(3,3-bis(mercaptomethyl) (Sulfanylthio)-1-thiapropyl)3,7-dithianonane, Shen(2,2-bis(mercaptomethylthio)ethyl)methane, Shen(4,4-bis(mercapto) Methylthio)-2-thiabutyl)methane, 4(2,2-bis(mercaptomethylthio)ethyl)methane, 4(4,4-bis(mercaptomethylthio)-2 -Thiabutyl)methane, 3,5,9,11-(mercaptomethylthio)-1,13-dimercapto-2,6,8,12-tetrathiatridecane, 3,5 ,9,11,15,17-lu(mercaptomethylthio)-1,19-dimercapto-2,6,8,12,14,18-hexathianonadecane, 9-(2,2 -Bis(mercaptomethylthio)ethyl)-3,5,13,15-bis(mercaptomethylthio)-1,17-dimercapto-2,6,8,10,12,16-hexa Thiaheptadecane, 3,4,8,9-(mercaptomethylthio)-1,11-dimercapto-2,5,7,10-tetrathiaundecane, 3,4,8 ,9,13,14-lu(mercaptomethylthio)-1,16-dimercapto-2,5,7,10,12,15-hexathiahexadecane, 8-[bis(mercaptomethyl thio)methyl]-3,4,12,13-(mercaptomethylthio)-1,15-dimercapto-2,5,7,9,11,14-hexathiapentadecane, 4,6-bis[3,5-bis(mercaptomethylthio)-7-mercapto-2,6-dithiaheptylsulfanyl]-1,3-dithiacyclohexane, 4-[ 3,5-bis(mercaptomethylthio)-7-mercapto-2,6-dithiapinethio]-6-mercaptomethylthio-1,3-dithiacyclohexane, 1, 1-bis[4-(6-mercaptomethylthio)-1,3-dithiacyclohexanylthio]-1,3-bis(mercaptomethylthio)propane, 1-[4- (6-Mercaptomethylthio)-1,3-dithiacyclohexanylthio]-3-[2,2-bis(mercaptomethylthio)ethyl]-7,9-bis( Mercaptomethylthio)-2,4,6,10-tetrathiaundecane, 1,5-bis[4-(6-mercaptomethylthio)-1,3-dithiacyclohexane Methylthio]-3-[2-(1,3-dithiobutanyl)]methyl-2,4-dithiolan, 3-[2-(1,3-dithia cyclobutyl)]methyl-7,9-bis(mercaptomethylthio)-1,11-dimercapto-2,4,6,10-tetrathiaundecane, 9-[2-( 1,3-dithietanyl)]methyl-3,5,13,15-(mercaptomethylthio)-1,17-dimercapto-2,6,8,10,12, 16-Hexathiaheptadecane, 3-[2-(1,3-dithietanyl)]methyl-7,9,13,15-4(mercaptomethylthio)-1, 17-dimercapto-2,4,6,10,12,16-hexathiaheptadecane, 3,7-bis[2-(1,3-dithietanyl)]methyl-1 , 9-dimercapto-2,4,6,8-tetrathianonane and other aliphatic polythiol compounds; 4,6-bis{3-[2-(1,3-dithietanyl )]methyl-5-mercapto-2,4-dithiopentylthio}-1,3-dithiacyclohexane, 4,6-bis[4-(6-mercaptomethylthio) -1,3-dithialylthio]-6-[4-(6-mercaptomethylthio)-1,3-dithialylthio]-1,3- Dithiane, 4-[3,4,8,9-(mercaptomethylthio)-11-mercapto-2,5,7,10-tetrathiaundecyl]-5-mercapto Methylthio-1,3-dithiolane, 4,5-bis[3,4-bis(mercaptomethylthio)-6-mercapto-2,5-dithiahexylthio] -1,3-dithiolane, 4-[3,4-bis(mercaptomethylthio)-6-mercapto-2,5-dithiohexylthio]-5-mercaptomethylthio Base-1,3-dithiolane, 4-[3-bis(mercaptomethylthio)methyl-5,6-bis(mercaptomethylthio)-8-mercapto-2,4, 7-trithiocyl]-5-mercaptomethylthio-1,3-dithiolane, 2-{bis[3,4-bis(mercaptomethylthio)-6-mercapto- 2,5-dithiahexylthio]methyl}-1,3-dithietane, 2-[3,4-bis(mercaptomethylthio)-6-mercapto-2,5- Dithiahexylthio]mercaptomethylthiomethyl-1,3-dithiadine, 2-[3,4,8,9-(mercaptomethylthio)-11-mercapto- 2,5,7,10-tetrathiaundecylthio]mercaptomethylthiomethyl-1,3-dithietane, 2-[3-bis(mercaptomethylthio)methyl Base-5,6-bis(mercaptomethylthio)-8-mercapto-2,4,7-trithianoctyl]mercaptomethylthiomethyl-1,3-dithiacyclobutane, 4,5-Bis{1-[2-(1,3-dithiobutanyl)]-3-mercapto-2-thiapropylthio}-1,3-dithiolane , 4-{1-[2-(1,3-dithiobutanyl)]-3-mercapto-2-thiapropylthio}-5-[1,2-bis(mercaptomethyl) thio)-4-mercapto-3-thiabutylthio]-1,3-dithiolane, 2-{bis[4-(5-mercaptomethylthio-1,3-di Thiolyl)thio]methyl}-1,3-dithialane, 4-[4-(5-mercaptomethylthio-1,3-dithiolanyl) )thio]-5-{1-[2-(1,3-dithiobutanyl)]-3-mercapto-2-thiapropylthio}-1,3-dithiocyclo Pentane and other polythiol compounds with ring structure.
不具酯鍵之硫醇系硬化劑係因為是疏水性,故與疏水性的滑石之潤濕性良好、密著性優異,所以為較佳。此外,習知的硫醇系硬化劑(例如,SC有機化學製之新戊四醇肆(3-巰基丙酸酯)(商品名稱:PEMP)、SC有機化學製之三羥甲基丙烷參(3-巰基丙酸酯)(商品名稱: TMMP)、昭和電工製之新戊四醇肆(3-巰基丁酸酯)(商品名稱:Karenz MT PE1)等)皆含有酯鍵,由於該酯鍵容易水解,故有耐濕性差之情形。相對於此,不含酯鍵之(B)成分係能夠抑制耐濕性試驗後的強度降低。(B)成分中具有酯鍵之化合物的比例,較佳係於(B)成分100質量份中為50質量份以下。(B)成分的市售品可列舉:四國化成工業製之硫醇甘脲(thiol glycoluril)衍生物[商品名稱:TS-G(相當於化學式(2),硫醇當量:100g/eq)、C3 TS-G(相當於化學式(3),硫醇當量:114g/eq)]、SC有機化學製之硫醇化合物 新戊四醇三丙烷硫醇[品名:PEPT(相當於通式(4)中之巰丙基為3個者,硫醇當量:124g/eq)]。此外,若為酸酐系、胺系,則難以低溫硬化,而且,此等系中,由於玻璃轉移溫度(Tg)變高(約為60℃以上),故剝離強度變低。(B)成分可為單獨使用,亦可將2種以上併用。 Thiol-based hardeners without ester bonds are preferred because they are hydrophobic and have good wettability and excellent adhesion to hydrophobic talc. In addition, conventional thiol-based hardeners (for example, neopentylerythritol (3-mercaptopropionate) (trade name: PEMP) manufactured by SC Organic Chemicals, trimethylolpropane (trimethylolpropane) manufactured by SC Organic Chemicals ( 3-Mercaptopropionate) (trade name: TMMP), neopentylerythritol 4 (3-mercaptobutyrate) (trade name: Karenz MT PE1) manufactured by Showa Denko (trade name: Karenz MT PE1), etc.) all contain ester bonds. It is easily hydrolyzed, so it may have poor moisture resistance. On the other hand, the component (B) containing no ester bond can suppress the decrease in strength after the moisture resistance test. The proportion of the compound having an ester bond in the component (B) is preferably 50 parts by mass or less per 100 parts by mass of the component (B). Examples of commercially available products of component (B) include: thiol glycoluril derivative manufactured by Shikoku Chemical Industry Co., Ltd. [trade name: TS-G (equivalent to chemical formula (2), thiol equivalent: 100g/eq) , C3 TS-G (equivalent to chemical formula (3), thiol equivalent: 114g/eq)], thiol compound neopenterythritol tripropanethiol manufactured by SC Organic Chemicals [product name: PEPT (equivalent to general formula (4) ) has three mercaptopropyl groups, and the thiol equivalent is: 124g/eq)]. In addition, if it is an acid anhydride type or an amine type, it is difficult to harden at low temperature, and in these systems, the glass transition temperature (Tg) becomes high (approximately 60° C. or higher), so the peel strength becomes low. (B) Component may be used individually or in combination of 2 or more types.
作為(C)成分之滑石,係對樹脂組成物賦予耐熱性、低熱膨張性、耐衝撃性。滑石為屬於矽酸鹽礦物之礦物,形狀係板狀且長寬比高,具有層狀構造。礦物具有於特定方向破裂之性質(解理性),當其為滑石時,會於層間產生解理。因此,咸認硬化物之破壞係以如下所述方式發生。 Talc as the component (C) imparts heat resistance, low thermal expansion, and impact resistance to the resin composition. Talc is a silicate mineral with a plate-like shape, a high aspect ratio, and a layered structure. Minerals have the property of breaking in specific directions (cleavage). When it is talc, cleavage will occur between the layers. Therefore, it is believed that the destruction of hardened materials occurs in the following manner.
在使硬化物掉落而強制性地進行損毀之試驗結束後,觀察硬化物的破開面,若在滑石少至未達5質量份的系中,破開面較為平坦,可知樹脂的脆性損毀較多。脆性損毀,咸認其係一鼓作氣地進行損毀時所能見到的模 式,故無法吸收衝撃的能量。另一方面,本發明之樹脂組成物的硬化物之抗掉落衝擊性良好,當觀察硬化物的破開面時,破開面係非常地粗糙。可推測此係因為滑石在吸收衝撃時在層間產生解理,該部分會使損毀的行進方向有所分岐而使損毀路徑變長,故能夠吸收衝撃能量,因此而提升了抗掉落衝擊性。此外,由於本發明中係使用滑石,故(B)成分較佳為使用不含酯鍵者。在(B)成分包含酯鍵之樹脂組成物的硬化物,係由於酯鍵水解而產生親水部,故與疏水性之滑石的密著性容易變低。本發明中,關於抗掉落衝擊性,在後述實施例記載的〈抗掉落衝擊性之測定〉中,掉落高度係以450mm以上為較佳,以600mm以上為更佳。 After the test in which the hardened material was dropped and forcibly damaged, the cracked surface of the hardened material was observed. If the cracked surface was relatively flat in a system containing less than 5 parts by mass of talc, this indicates brittle damage of the resin. More. Brittle damage is considered to be a pattern seen when damage is carried out in one go, so it is unable to absorb the energy of the impact. On the other hand, the cured product of the resin composition of the present invention has good drop impact resistance, and when the fracture surface of the cured product is observed, the fracture surface is very rough. It can be speculated that this is because talc produces cleavage between layers when absorbing impact. This part will diverge the direction of damage and lengthen the damage path. Therefore, it can absorb impact energy, thus improving the resistance to falling impacts. In addition, since talc is used in the present invention, component (B) is preferably one that does not contain an ester bond. The cured product of a resin composition containing an ester bond in the component (B) generates a hydrophilic portion due to hydrolysis of the ester bond, so the adhesion to hydrophobic talc tends to decrease. In the present invention, regarding the drop impact resistance, in the "Measurement of Drop Impact Resistance" described in the Examples described below, the drop height is preferably 450 mm or more, and more preferably 600 mm or more.
作為(C)成分之滑石粉末的形狀較佳為板狀、扁平狀。滑石粉末的長寬比較佳為5以上20以下。長寬比若未達5,則上述損毀路徑變短,無法充分地吸收衝撃能量,故抗掉落衝擊性可能較差。長寬比若超過20,則有變得難以使(C)成分均勻地分散於樹脂組成物中之虞。長寬比可依據下述方式求得:將樹脂組成物的硬化物於500至600℃加熱,使有機物進行熱分解,將熱分解所得之硬化物的殘餘部分(灰分)以掃描式電子顯微鏡(SEM)進行觀察,觀察50個滑石粉末,由長徑之平均值與厚度的平均值之比求出長寬比。滑石粉末的平均粒徑(面方向的長度)雖無特別限定,惟從(C)成分於樹脂組成物中之分散性、及樹脂組成物的低黏度化之觀點來看,係以1至15μm為較佳,以1至10μm為更佳。若未達1μm,則樹脂組成物的黏度 上昇,有樹脂組成物之處理性劣化之虞。若超過15μm,則有變得難以使(C)成分均勻地分散於樹脂組成物中之虞。其中,(C)成分的平均粒徑係指藉由雷射繞射法測定之體積基準的中值徑。其它成分的平均粒徑亦是以同樣方式測定。市售品可列舉松村產業製滑石(品名:5000PJ)等。(C)成分可單獨使用,亦可將2種以上併用。此外,與滑石同樣屬於矽酸鹽礦物者,其中:[1]蒙脫石係因雜質濃度高,故不適合作為電子材料,容易膨潤;[2]高嶺土係雜質濃度高,表面的狀態包含親水性部分與相反側之疏水性部分(矽酸鹽),親水性部分與樹脂之潤濕會變差;[3]雲母,雖然其構造與滑石相似(3層:疏水/親水/疏水),惟滑石會從疏水性部分彼此間的界面進行解理,相對於此,雲母之解理則容易在親水性層/疏水性層的界面產生,因此,親水部分顯現於界面,與樹脂之潤濕性會變差。 The shape of the talc powder as component (C) is preferably plate-like or flat. The aspect ratio of the talc powder is preferably not less than 5 and not more than 20. If the aspect ratio is less than 5, the above-mentioned damage path becomes shorter and the impact energy cannot be fully absorbed, so the drop impact resistance may be poor. If the aspect ratio exceeds 20, it may become difficult to disperse the component (C) uniformly in the resin composition. The aspect ratio can be obtained as follows: The cured product of the resin composition is heated at 500 to 600°C to thermally decompose the organic matter, and the remaining portion (ash) of the cured product obtained by thermal decomposition is analyzed with a scanning electron microscope ( SEM) was used to observe 50 pieces of talc powder, and the aspect ratio was calculated from the ratio of the average length of the length to the average thickness. The average particle diameter (length in the plane direction) of the talc powder is not particularly limited, but from the viewpoint of the dispersibility of component (C) in the resin composition and the low viscosity of the resin composition, it is 1 to 15 μm. is preferably 1 to 10 μm. If it is less than 1 μm, the viscosity of the resin composition increases, and there is a risk of physical deterioration of the resin composition. If it exceeds 15 μm, it may become difficult to disperse the component (C) uniformly in the resin composition. Here, the average particle diameter of component (C) refers to the volume-based median diameter measured by laser diffraction method. The average particle diameters of other components are also measured in the same manner. Examples of commercially available products include talc produced by Matsumura Industrial Co., Ltd. (product name: 5000PJ). (C) Component can be used individually or in combination of 2 or more types. In addition, they are silicate minerals like talc. Among them: [1] Montmorillonite series is not suitable as an electronic material due to its high impurity concentration and is prone to swelling; [2] Kaolin series has high impurity concentration and its surface state is hydrophilic. The wetting between the hydrophobic part (silicate) and the hydrophilic part on the opposite side of the resin will become worse; [3] Mica, although its structure is similar to talc (3 layers: hydrophobic/hydrophilic/hydrophobic), but talc Cleavage occurs at the interface between the hydrophobic parts. In contrast, mica cleaves easily at the interface between the hydrophilic layer/hydrophobic layer. Therefore, the hydrophilic part appears at the interface, which affects the wettability of the resin. get worse.
從樹脂組成物的黏度之觀點來看,相對於樹脂組成物100質量份,(A)成分係以10至70質量份為較佳。 From the viewpoint of the viscosity of the resin composition, the amount of component (A) is preferably 10 to 70 parts by mass relative to 100 parts by mass of the resin composition.
相對於(A)成分之1環氧當量,(B)成分的硫醇當量係以0.5至2.5當量為較佳,以0.6至1.8當量為更佳。(B)成分的硫醇當量係指將(B)成分的分子量除以「1分子中之硫醇基的數目」所得之數。藉由將(B)成分的硫醇當量與(A)成分的環氧當量設於上述範圍內,可防止硬化後的樹脂組成物的硬度不足及靭性不足。 The thiol equivalent of component (B) is preferably 0.5 to 2.5 equivalents, more preferably 0.6 to 1.8 equivalents relative to 1 epoxy equivalent of component (A). The thiol equivalent of component (B) refers to the number obtained by dividing the molecular weight of component (B) by "the number of thiol groups in 1 molecule". By setting the thiol equivalent of component (B) and the epoxy equivalent of component (A) within the above range, insufficient hardness and insufficient toughness of the cured resin composition can be prevented.
相對於樹脂組成物100質量份,(C)成分為 5至20質量份,較佳為5至15質量份。若(C)成分未達5質量份,則會使抗掉落衝擊性降低。而且,從抗掉落衝擊性之觀點來看,(C)成分若為15質量份即具效果,即便超過15質量份,其效果亦無變化,惟隨著(C)成分增加,樹脂組成物的黏度會變高,而會產生所謂搖變性(搖變指數)變得容易經時改變之問題,使處理性劣化而致使缺乏實用性。此乃因為(C)的形狀為板狀或扁平狀之故。因此,(C)成分為20質量份以下,較佳為15質量以下。 The component (C) is 5 to 20 parts by mass, preferably 5 to 15 parts by mass, based on 100 parts by mass of the resin composition. If the content of component (C) is less than 5 parts by mass, the drop impact resistance will be reduced. Moreover, from the viewpoint of drop impact resistance, the effect is achieved when the component (C) is 15 parts by mass. Even if it exceeds 15 parts by mass, the effect does not change. However, as the component (C) increases, the resin composition The viscosity will increase, which will cause the problem that the so-called thixotropy (thixotropy index) will easily change over time, which will deteriorate the handleability and lead to lack of practicality. This is because the shape of (C) is plate-like or flat. Therefore, the component (C) is 20 parts by mass or less, preferably 15 parts by mass or less.
從抗掉落衝擊性提升之觀點來看,樹脂組成物係以更包含(D)碳酸鈣及/或氧化矽為較佳。相較於將單一的填料進行分散者,將粒子形狀/特性不同的填料進行混練者係有更使分散性提升之情形。咸認相較於單獨使用滑石時,藉由併用碳酸鈣及/或氧化矽會使樹脂組成物中填料的分散狀態更為均勻,而變得容易提升抗掉落衝擊性。從耐濕性之觀點來看,(D)成分係以碳酸鈣為較佳。此外,就(D)成分而言,相較於包含氧化矽時,在包含碳酸鈣時,耐濕試驗(溫度:85℃,濕度:85%,100小時)後的剪切強度係顯著變高。咸認此係因為碳酸鈣是親水性,故於(B)成分中不含酯鍵時之樹脂組成物的硬化物不會產生親水部,因此,在剪切強度試驗時,容易於硬化物內造成凝集損毀的起點之故。相對於此,咸認因為氧化矽係相較於碳酸鈣而為較疏水性,故與樹脂之潤濕性良好,且在剪切強度試驗時,於被黏附物和硬化物之間容易產生界面剝離,耐濕試驗後的剪切強度變低。市售之碳酸鈣粉末可列舉宇 部materials製之碳酸鈣粉末(品名:CS4ND)。 From the viewpoint of improving drop impact resistance, the resin composition preferably further contains (D) calcium carbonate and/or silicon oxide. Compared with dispersing a single filler, kneading fillers with different particle shapes/characteristics can improve dispersion. It is believed that the combined use of calcium carbonate and/or silicon oxide will make the dispersion state of the filler in the resin composition more uniform, making it easier to improve the drop impact resistance compared to using talc alone. From the viewpoint of moisture resistance, calcium carbonate is preferred as component (D). In addition, when component (D) contains calcium carbonate compared to when it contains silicon oxide, the shear strength after the humidity resistance test (temperature: 85°C, humidity: 85%, 100 hours) is significantly higher. . It is believed that this is because calcium carbonate is hydrophilic. Therefore, when component (B) does not contain an ester bond, the cured product of the resin composition will not produce hydrophilic parts. Therefore, during the shear strength test, it is easy to form a hydrophilic part in the cured product. Causes the starting point of agglomeration damage. In contrast, it is believed that silicon oxide is more hydrophobic than calcium carbonate, so it has good wettability with resin, and it is easy to create an interface between the adherend and the hardened object during the shear strength test. The shear strength after peeling and moisture resistance test becomes low. Examples of commercially available calcium carbonate powder include calcium carbonate powder manufactured by Ube Materials (product name: CS4ND).
氧化矽粉末可列舉:膠質氧化矽、疏水性氧化矽、微細氧化矽、奈米氧化矽等。此外,藉由添加氧化矽,會使硬化後的樹脂組成物之吸濕試驗後的剪切強度有降低之情形,而需留意。 Examples of silicon oxide powder include: colloidal silicon oxide, hydrophobic silicon oxide, fine silicon oxide, nanometer silicon oxide, etc. In addition, by adding silicon oxide, the shear strength of the cured resin composition after the moisture absorption test may be reduced, so please be careful.
(D)成分的平均粒徑雖無特別限定,惟從於樹脂組成物中之(D)成分的分散性及樹脂組成物的低黏度化之觀點來看,係以0.1至15μm為較佳。若未達0.1μm,則樹脂組成物的黏度上昇,有樹脂組成物的處理性劣化之虞。若超過15μm,則有變得難以使(D)成分均勻地分散於樹脂組成物中之虞。市售之碳酸鈣粉末,可列舉宇部materials製之碳酸鈣粉末(品名:CS4ND,平均粒徑:12μm)。市售之氧化矽粉末(氧化矽填料)可列舉:admatechs製之氧化矽(製品名稱:SO-E2,平均粒徑:0.5μm)、龍森製之氧化矽(製品名稱:MP-8FS,平均粒徑:0.7μm)、DENKA製之氧化矽(品名:FB-5D,平均粒徑:5μm)等。(D)成分可單獨使用,亦可將2種以上併用。 Although the average particle diameter of component (D) is not particularly limited, from the viewpoint of dispersibility of component (D) in the resin composition and low viscosity of the resin composition, it is preferably 0.1 to 15 μm. If it is less than 0.1 μm, the viscosity of the resin composition increases, and there is a risk that the handleability of the resin composition may deteriorate. If it exceeds 15 μm, it may become difficult to disperse the component (D) uniformly in the resin composition. Commercially available calcium carbonate powder includes calcium carbonate powder manufactured by Ube Materials (product name: CS4ND, average particle size: 12 μm). Commercially available silicon oxide powder (silica filler) includes: silicon oxide manufactured by admatechs (product name: SO-E2, average particle size: 0.5 μm), silicon oxide manufactured by Longsen (product name: MP-8FS, average particle size: Particle size: 0.7 μm), DENKA silicon oxide (product name: FB-5D, average particle size: 5 μm), etc. (D) Component can be used individually or in combination of 2 or more types.
相對於樹脂組成物100質量份,(C)成分與(D)成分之合計係以5至40質量份為較佳。(C)成分與(D)成分之合計若未達5質量份,則會成為本發明之範圍外,硬化物的抗掉落衝擊性差。若超過40質量份,則樹脂組成物的黏度容易變高,硬化物的剝離強度、抗掉落衝擊性變得容易降低。 The total amount of component (C) and component (D) is preferably 5 to 40 parts by mass relative to 100 parts by mass of the resin composition. If the total amount of the component (C) and the component (D) is less than 5 parts by mass, it will fall outside the scope of the present invention, and the cured product will have poor drop impact resistance. If it exceeds 40 parts by mass, the viscosity of the resin composition tends to increase, and the peel strength and drop impact resistance of the cured product tend to decrease.
樹脂組成物中,除了硬化促進劑以外,於 不損及本發明的目的之範圍中,可進一步視所需而調配穩定化劑、(C)成分和(D)成分以外的填料(例如氧化鋁)、穩定化劑(例如有機酸、硼酸酯、金屬螯合物)、碳黑、鈦黑、矽烷偶合劑、離子捕集劑、調平劑、抗氧化劑、消泡劑、搖變劑、其它添加劑等。而且,亦可於樹脂組成物調配黏度調整劑、難燃劑、或溶劑等。 In the resin composition, in addition to the hardening accelerator, a stabilizer and a filler (such as alumina) other than the component (C) and the component (D) may be further blended as necessary within the scope that does not impair the object of the present invention. ), stabilizers (such as organic acids, borate esters, metal chelates), carbon black, titanium black, silane coupling agents, ion collectors, leveling agents, antioxidants, defoaming agents, thixotropic agents, Other additives, etc. Moreover, a viscosity adjuster, a flame retardant, a solvent, etc. may also be blended into the resin composition.
硬化促進劑係以潛在型硬化劑為較佳。所謂潛在型硬化促進劑,係指於室溫呈惰性之狀態下藉由加熱而活化以發揮作為硬化促進劑的功能之化合物,可列舉例如:於常溫為固體之咪唑化合物;胺化合物與環氧化合物之反應生成物(胺-環氧加成系)等固體分散型胺加成系潛在型硬化促進劑;胺化合物與異氰酸酯化合物或尿素化合物之反應生成物(尿素型加成系)等。硬化促進劑可與(B)成分組合而使樹脂組成物低溫快速硬化。 The preferred hardening accelerator is latent hardener. The so-called latent hardening accelerator refers to a compound that is activated by heating in an inert state at room temperature to function as a hardening accelerator. Examples include: imidazole compounds that are solid at room temperature; amine compounds and epoxy compounds Solid dispersion type amine addition system latent hardening accelerator such as reaction products of compounds (amine-epoxy addition system); reaction products of amine compounds and isocyanate compounds or urea compounds (urea type addition system), etc. The hardening accelerator can be combined with component (B) to quickly harden the resin composition at low temperature.
樹脂組成物,例如可以是藉由將(A)成分至(C)成分及其它添加劑等同時或分別地依需要一邊施予加熱處理一邊進行攪拌、熔融、混合、分散而得到。此等進行混合、攪拌、分散等之裝置雖無特別限定,惟可使用具備攪拌、加熱裝置之擂潰機、亨歇爾混合器、三輥研磨機、球磨機、行星式混合器、珠磨機等。而且,亦可將此等裝置適當地組合而使用。 The resin composition can be obtained, for example, by stirring, melting, mixing, and dispersing components (A) to (C) and other additives simultaneously or separately as necessary while subjecting them to heat treatment. Although the devices for mixing, stirring, dispersing, etc. are not particularly limited, crushers, Henschel mixers, three-roller mills, ball mills, planetary mixers, and bead mills equipped with stirring and heating devices can be used. wait. Furthermore, these devices can also be used in appropriate combinations.
以此方式所得到的樹脂組成物為熱硬化性。樹脂組成物之熱硬化係以於60至90℃進行30至120分鐘為較佳。 The resin composition obtained in this way is thermosetting. Thermal hardening of the resin composition is preferably carried out at 60 to 90°C for 30 to 120 minutes.
如上所述,從剝離強度之觀點來看,樹脂組成物的硬化物之玻璃轉移溫度(Tg)係以25℃至50℃為較佳。惟由於亦有不要求高剝離強度之用途,故本發明之範圍並不限定於此Tg。 As mentioned above, from the viewpoint of peel strength, the glass transition temperature (Tg) of the cured product of the resin composition is preferably 25°C to 50°C. However, since there are also applications that do not require high peel strength, the scope of the present invention is not limited to this Tg.
[樹脂組成物的硬化物] [Hardened product of resin composition]
本發明之樹脂組成物的硬化物係包含:(A)環氧樹脂、(B)硫醇系硬化劑及(C)滑石,其中,相對於樹脂組成物100質量份,(C)成分為5至20質量份。 The cured material of the resin composition of the present invention includes: (A) epoxy resin, (B) thiol-based hardener and (C) talc, wherein (C) component is 5 parts per 100 parts by mass of the resin composition. to 20 parts by mass.
就(A)成分、(B)成分、(C)成分而言,係如上述,就可添加(D)成分、其它成分一事而言,亦如上述。 The (A) component, (B) component, and (C) component are as described above, and the same applies to the fact that (D) component and other components can be added.
[半導體裝置、電子零件] [Semiconductor devices, electronic components]
本發明的半導體裝置係因包含上述樹脂組成物的硬化物,故為抗掉落衝擊性優異、可靠性高者。 Since the semiconductor device of the present invention contains a cured product of the above-mentioned resin composition, it has excellent drop impact resistance and high reliability.
本發明的電子零件係因包含上述硬化物或上述半導體裝置,故為抗掉落衝擊性優異、可靠性高者。 Since the electronic component of the present invention contains the above-mentioned hardened material or the above-mentioned semiconductor device, it has excellent drop impact resistance and high reliability.
以下,係藉由實施例說明本發明,惟本發明並不限定於此等實施例。此外,以下的實施例中,若無特別註明,份、%即表示質量份、質量%。 In the following, the present invention is illustrated by examples, but the present invention is not limited to these examples. In addition, in the following examples, unless otherwise specified, parts and % mean parts by mass and % by mass.
(A)成分的矽氧烷骨格環氧樹脂係使用:Momentive Performance Materials Japan合同公司製之矽氧烷骨格環氧樹脂(品名:TSL9906,環氧當量:181g/eq);(A)成分的雙酚F型環氧樹脂係使用:新日鐵住金化學製之雙酚F型環氧樹脂(品名:YDF8170,環氧當量: 158g/eq);(B)成分的硫醇1(C3 TS-G)係使用:四國化成工業製之甘脲(glycoluril)衍生物(品名:C3 TS-G,硫醇當量:114g/eq);(B)成分的硫醇2(PEMP)係使用:SC有機化學製之新戊四醇肆(3-驗基丙酸酯)(商品名:PEMP,硫醇當量:128g/eq);(B)成分的硫醇3(PEPT)係使用:SC有機化學製之新戊四醇三丙烷硫醇(商品名稱:PEPT,硫醇當量:124g/eq);(B’)成分的酸酐係使用:日立化成製之酸酐(品名:HN5500,酸酐當量:168g/eq);(B’)成分的胺係使用:日本化藥製之胺(品名:KAYAHARD AA,胺當量:64g/eq);(C)成分的滑石係使用:松村產業製之滑石(品名:5000PJ,平均粒徑:4μm);(C’)成分的雲母係使用:YAMAGUCHI MICA製之雲母(品名:SJ-005,平均粒徑:5μm);(C’)成分的硫酸鋇係使用:堺化學製之硫酸鋇(品名:H,平均粒徑:8μm);(D)成分的碳酸鈣係使用:宇部materials製之碳酸鈣(品名:CS4ND,平均粒徑:12μm);氧化矽係使用:admatechs製之氧化矽(品名:SO-E2,平均粒徑:0.5μm);其它成分的硬化促進劑(NOVACURE)係使用:旭化成 E-materials製之潛在型硬化劑[品名:HXA9322HP,2/3(質量比)為雙酚A型/F型混合環氧樹脂(環氧當量:180g/eq)之潛在型硬化劑,環氧當量:180×3/2g/eq]。 The siloxane lattice epoxy resin of component (A) uses: siloxane lattice epoxy resin manufactured by Momentive Performance Materials Japan (product name: TSL9906, epoxy equivalent: 181g/eq); Phenol F type epoxy resin system uses: bisphenol F type epoxy resin manufactured by Nippon Steel and Sumitomo Metal Chemical Co., Ltd. (product name: YDF8170, epoxy equivalent: 158g/eq); (B) thiol 1 (C3 TS-G) of the component ) system uses: glycoluril derivative manufactured by Shikoku Chemical Industry (product name: C3 TS-G, thiol equivalent: 114g/eq); (B) component thiol 2 (PEMP) system uses: SC Organic Neopenterythritol 4 (3-hydroxypropionate) chemically produced (trade name: PEMP, thiol equivalent: 128g/eq); (B) thiol 3 (PEPT) system used: SC Organic Chemicals Neopenterythritol tripropanethiol (trade name: PEPT, thiol equivalent: 124g/eq); (B') component of the acid anhydride system uses: Hitachi Chemical Anhydride (product name: HN5500, acid anhydride equivalent: 168g/eq) ); The amine system used in component (B'): Nippon Kayaku Co., Ltd.'s amine (product name: KAYAHARD AA, amine equivalent: 64g/eq); The talc system used in component (C): Talc manufactured by Matsumura Sangyo Co., Ltd. (product name: 5000PJ) , average particle size: 4 μm); (C') component mica used: mica manufactured by YAMAGUCHI MICA (product name: SJ-005, average particle size: 5 μm); (C') component barium sulfate used: Sakai Chemical Barium sulfate made from (product name: H, average particle size: 8 μm); calcium carbonate system for component (D) used: calcium carbonate made by Ube materials (product name: CS4ND, average particle size: 12 μm); silicon oxide system used: admatechs Made of silicon oxide (product name: SO-E2, average particle size: 0.5μm); the other components of the hardening accelerator (NOVACURE) are: latent hardener made by Asahi Kasei E-materials [product name: HXA9322HP, 2/3 ( Mass ratio) is a latent hardener for bisphenol A/F mixed epoxy resin (epoxy equivalent: 180g/eq), epoxy equivalent: 180×3/2g/eq].
[實施例1至12、比較例1至8] [Examples 1 to 12, Comparative Examples 1 to 8]
以表1至3所示之調配將原料進行混合後,於室溫使用三輥研磨機進行分散,製作實施例1至12、比較例1至8之樹脂組成物。 The raw materials were mixed according to the preparation shown in Tables 1 to 3, and then dispersed using a three-roller mill at room temperature to prepare the resin compositions of Examples 1 to 12 and Comparative Examples 1 to 8.
〈剪切強度之測定〉 〈Measurement of shear strength〉
《剪切強度之測定所使用的構件》 "Components used in the determination of shear strength"
‧構件1:SUS基板 ‧Component 1: SUS substrate
‧零件2:氧化鋁片料尺寸3mm×1.5mm×0.5mm ‧Part 2: Alumina sheet size 3mm×1.5mm×0.5mm
《剪切強度之測定方法》 "Method for determination of shear strength"
(i)於SUS基板上塗佈所調製之樹脂組成物(試料)作為接著劑。塗佈尺寸為3mm×1.5mm×0.06mm。 (i) Coat the prepared resin composition (sample) on the SUS substrate as an adhesive. The coating size is 3mm×1.5mm×0.06mm.
(ii)於所塗佈之試料上載置氧化鋁片料,作為試驗片。 (ii) Place an alumina sheet on the coated sample to serve as a test piece.
(iii)將試驗片投入已加熱至80℃之爐中,將試料加熱硬化30分鐘。 (iii) Put the test piece into a furnace heated to 80°C, and heat and harden the sample for 30 minutes.
惟,比較例7係於150℃加熱硬化60分鐘。比較例8係於150℃加熱硬化120分鐘。 However, Comparative Example 7 was heated and hardened at 150°C for 60 minutes. Comparative Example 8 was heated and hardened at 150°C for 120 minutes.
(iv)將試料加熱硬化後,從爐中取出試驗片,使用萬能型推拉力試驗機(Dage公司製),於室溫測定剪切強度。 (iv) After heating and hardening the sample, the test piece was taken out of the furnace and the shear strength was measured at room temperature using a universal push-pull force testing machine (manufactured by Dage Corporation).
而且,吸濕試驗後的剪切強度,係將試驗片於溫度85℃、濕度(RH)85%放置100小時後,於室溫測定之剪切強 度。結果示於表1至3。 Furthermore, the shear strength after the moisture absorption test is the shear strength measured at room temperature after leaving the test piece at a temperature of 85°C and a humidity (RH) of 85% for 100 hours. The results are shown in Tables 1 to 3.
〈剝離強度之測定〉 〈Measurement of Peel Strength〉
《剝離強度之測定所使用的構件》 "Components used in the measurement of peel strength"
‧構件1:SUS基板 ‧Component 1: SUS substrate
‧零件2:SUS帶,尺寸:5mm×15mm×0.02mm ‧Part 2: SUS strap, size: 5mm×15mm×0.02mm
《剝離強度之測定方法》 "Method for determination of peel strength"
(i)於SUS基板上塗佈所調製之樹脂組成物(試料)作為接著劑。塗佈尺寸為寬度:5mm×長度:15mm×厚度:0.1mm。 (i) Coat the prepared resin composition (sample) on the SUS substrate as an adhesive. The coating dimensions are width: 5mm × length: 15mm × thickness: 0.1mm.
(ii)於所塗佈之試料上載置SUS帶,作為試驗片。 (ii) Place the SUS tape on the coated sample to serve as a test piece.
(iii)將試驗片投入已加熱至80℃之爐中,將試料加熱硬化30分鐘。 (iii) Put the test piece into a furnace heated to 80°C, and heat and harden the sample for 30 minutes.
惟,比較例7係於150℃加熱硬化60分鐘。比較例8係於150℃加熱硬化120分鐘。 However, Comparative Example 7 was heated and hardened at 150°C for 60 minutes. Comparative Example 8 was heated and hardened at 150°C for 120 minutes.
(iv)將試料加熱硬化後,從爐中取出試驗片,於室溫使用拉伸壓縮試驗機(Minebea公司製)測定剝離強度。剝離強度係以1N/mm以上為較佳,以5N/mm以上為更佳。結果示於表1至3。 (iv) After heating and hardening the sample, the test piece was taken out of the furnace and the peel strength was measured using a tensile and compression testing machine (manufactured by Minebea Co., Ltd.) at room temperature. The peel strength is preferably 1 N/mm or more, and more preferably 5 N/mm or more. The results are shown in Tables 1 to 3.
〈抗掉落衝擊性之測定〉 〈Measurement of drop impact resistance〉
《抗掉落衝擊試驗之測定所使用的構件》 "Components used in the determination of drop impact resistance test"
‧構件1:SUS基板 ‧Component 1: SUS substrate
‧零件2:鍍鎳塊(Ni coat block),尺寸:寬度:9mm×長度:9mm×厚度:4mm ‧Part 2: Ni coat block, size: width: 9mm×length: 9mm×thickness: 4mm
《抗掉落衝擊試驗之測定方法》 "Measurement Method of Drop Impact Resistance Test"
(i)於SUS基板上塗佈所調製之樹脂組成物(試料)作為接著劑。塗佈尺寸為寬度:9mm×長度:9mm×厚度:0.3mm。 (i) Coat the prepared resin composition (sample) on the SUS substrate as an adhesive. The coating size is width: 9mm × length: 9mm × thickness: 0.3mm.
(ii)於所塗佈之試料上載置鍍鎳塊,作為試驗片。 (ii) Place a nickel-plated block on the coated sample to serve as a test piece.
(iii)將試驗片投入已加熱至80℃之爐中,將試料加熱硬化30分鐘。 (iii) Put the test piece into a furnace heated to 80°C, and heat and harden the sample for 30 minutes.
惟,比較例7係於150℃加熱硬化60分鐘。比較例8係於150℃加熱硬化120分鐘。 However, Comparative Example 7 was heated and hardened at 150°C for 60 minutes. Comparative Example 8 was heated and hardened at 150°C for 120 minutes.
(iv)將試料加熱硬化後,從爐中取出試驗片,於室溫使用掉落衝擊試驗機(日立Technologies and Services公司製),將鍍鎳塊從SUS板剝離之高度設為掉落高度。掉落高度,係從200mm開始至500mm為止是每次提高高度100mm,在500mm以上則是每次提高高度50mm,而進行試驗。此外,掉落次數,係於各個高度進行5次,若未剝離,則進行下一個高度之試驗。試驗係以2個試樣進行(N=2)。抗掉落衝擊性係以450mm以上為較佳。結果示於表1至3。另外,表中係記載將2個試樣的平均值之第3位予以四捨五入後之數值。 (iv) After heating and hardening the sample, the test piece was taken out of the furnace and a drop impact tester (manufactured by Hitachi Technologies and Services) was used at room temperature. The height at which the nickel plating block was peeled off from the SUS plate was taken as the drop height. The drop height was tested by increasing the height by 100mm each time from 200mm to 500mm, and above 500mm by increasing the height by 50mm each time. In addition, the number of drops is 5 times at each height. If it does not peel off, the test is carried out at the next height. The test was conducted with 2 samples (N=2). The drop impact resistance is preferably above 450mm. The results are shown in Tables 1 to 3. In addition, the table records the value obtained by rounding off the third digit of the average value of two samples.
〈玻璃轉移溫度(Tg)之測定〉 〈Measurement of glass transition temperature (Tg)〉
使用動態黏彈性測定(DMA)測定所製作之樹脂組成物之玻璃轉移溫度(Tg)。以使加熱硬化後的膜厚成為250±100μm之方式,對於表面已施加有離型劑之玻璃板塗佈樹脂組成物而形成塗膜,並於80℃加熱硬化30分鐘。於室溫將該塗膜從玻璃板剝離後,以切割器裁切成預定尺寸 (5mm×40mm)。此外,以砂紙處理而使切口處平滑。將此塗膜使用SII Nano Technology公司製之DMS6100進行測定(昇溫速度:3℃/分鐘,測定範圍:-40至220℃)。讀取tanδ之譜峰溫度以作為Tg。結果示於表1至3。 Dynamic viscoelasticity measurement (DMA) was used to measure the glass transition temperature (Tg) of the produced resin composition. The resin composition was applied to the glass plate to which the release agent was applied on the surface so that the film thickness after heat curing would be 250 ± 100 μm to form a coating film, and the coating film was heated and cured at 80° C. for 30 minutes. After the coating film was peeled off from the glass plate at room temperature, it was cut into predetermined sizes (5 mm × 40 mm) with a cutter. Also, use sandpaper to smooth the cuts. This coating film was measured using DMS6100 manufactured by SII Nano Technology (heating rate: 3°C/min, measurement range: -40 to 220°C). Read the peak temperature of tan δ as Tg. The results are shown in Tables 1 to 3.
由表1至3可知,使用包含(A)至(C)成分的樹脂組成物之實施例1至12皆為剪切強度、抗掉落衝擊性良好者。再者,於實施例1至9、11、12中,剝離強度較高。此外,於表1中雖未記載,惟實施例5的耐濕試驗(溫度:85℃、濕度:85%、100小時)後的剪切強度為100N,實施例7的剪切強度為30N,係以實施例5為較高。而且,僅使用「具有酯鍵之硫醇化合物」作為(B)成分之實施例12的耐濕試驗後的剪切強度為10N,相對於此,實施例1之耐濕試驗後的剪切強度為60N,實施例11之耐濕試驗後的剪切強度為50N,於耐濕試驗後之剪切強度仍為高。相對於此,(C)成分為過少的比較例1係抗掉落衝擊性差。(C)成分為過多的比較例2係搖變指數之經時變化率過大而被判斷為缺乏實用性,而未進行評估(表中雖未記載,但24小時後的搖變指數之變化率為50%)。使用雲母取代(C)成分的比較例3,其剝離強度低且抗掉落衝擊性亦差。使用硫酸鋇取代(C)成分的比較例4、使用(D)碳酸鈣而未使用(C)成分之比較例5,係抗掉落衝擊性差。使用(D)氧化矽而未使用(C)成分之比較例6、使用酸酐取代(B)成分的比較例7、使用胺取代(B)成分的比較例8,係可能是因剝離強度低、硬化溫度高、內部應力大之影響,故抗掉落衝擊性亦差。 As can be seen from Tables 1 to 3, Examples 1 to 12 using resin compositions containing components (A) to (C) all have good shear strength and drop impact resistance. Furthermore, in Examples 1 to 9, 11, and 12, the peel strength was high. In addition, although it is not shown in Table 1, the shear strength after the humidity resistance test (temperature: 85°C, humidity: 85%, 100 hours) of Example 5 is 100N, and the shear strength of Example 7 is 30N. It is higher than Example 5. Moreover, the shear strength after the moisture resistance test of Example 12 using only the "thiol compound having an ester bond" as the component (B) was 10 N. In contrast, the shear strength after the moisture resistance test of Example 1 is 60N, the shear strength after the moisture resistance test of Example 11 is 50N, and the shear strength after the moisture resistance test is still high. On the other hand, Comparative Example 1 with too little component (C) had poor drop impact resistance. (C) Comparative Example 2, which contains too many ingredients, was judged to lack practicality because the rate of change of the rheometry index over time was too large and was not evaluated (although it is not shown in the table, the rate of change of the rheometry index after 24 hours is 50%). Comparative Example 3 in which mica was used instead of component (C) had low peel strength and poor drop impact resistance. Comparative Example 4 using barium sulfate instead of component (C) and Comparative Example 5 using (D) calcium carbonate without using component (C) showed poor drop impact resistance. Comparative Example 6 using (D) silicon oxide without using (C) component, Comparative Example 7 using acid anhydride instead of (B) component, and Comparative Example 8 using amine instead of (B) component may be due to low peel strength. Due to the high hardening temperature and large internal stress, the drop impact resistance is also poor.
本發明之樹脂組成物可於短時間內硬化,且硬化後的抗掉落衝擊性優異,而非常地有用。而且,含有該樹脂組成物的硬化物之半導體裝置、電子零件係抗掉落衝擊性優異,為可靠性高者。 The resin composition of the present invention can be cured in a short time and has excellent drop impact resistance after curing, so it is very useful. Furthermore, semiconductor devices and electronic components containing cured materials of this resin composition have excellent drop impact resistance and are highly reliable.
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| US20050032938A1 (en) * | 2003-08-04 | 2005-02-10 | Flint Theodore R. | Epoxy compositions |
| JP6742027B2 (en) * | 2015-09-10 | 2020-08-19 | ナミックス株式会社 | Resin composition |
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| JPS53133243A (en) * | 1977-04-26 | 1978-11-20 | Pentel Kk | Epoxy resin adhesive |
| JPS5571763A (en) * | 1978-11-24 | 1980-05-30 | Dainippon Toryo Co Ltd | Epoxy resin coating composition |
| JPS55102624A (en) * | 1979-02-01 | 1980-08-06 | Mitsubishi Petrochem Co Ltd | Epoxy resin composition having excellent curability |
| JPS61162516A (en) * | 1985-01-08 | 1986-07-23 | Toray Ind Inc | Composition for repairing urethane bumper |
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