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TWI801081B - 探測反射光變化的裝置、方法及膜厚測量裝置 - Google Patents

探測反射光變化的裝置、方法及膜厚測量裝置 Download PDF

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Publication number
TWI801081B
TWI801081B TW111100537A TW111100537A TWI801081B TW I801081 B TWI801081 B TW I801081B TW 111100537 A TW111100537 A TW 111100537A TW 111100537 A TW111100537 A TW 111100537A TW I801081 B TWI801081 B TW I801081B
Authority
TW
Taiwan
Prior art keywords
film thickness
reflected light
thickness measuring
detecting changes
measuring device
Prior art date
Application number
TW111100537A
Other languages
English (en)
Other versions
TW202235814A (zh
Inventor
王奇
李仲禹
王政
Original Assignee
大陸商上海精測半導體技術有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 大陸商上海精測半導體技術有限公司 filed Critical 大陸商上海精測半導體技術有限公司
Publication of TW202235814A publication Critical patent/TW202235814A/zh
Application granted granted Critical
Publication of TWI801081B publication Critical patent/TWI801081B/zh

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Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G01B11/0616—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
    • G01B11/0625—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating with measurement of absorption or reflection
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G01B11/0616—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
    • G01B11/0641—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating with measurement of polarization
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G01B11/0616—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
    • G01B11/0675—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating using interferometry
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/1702—Systems in which incident light is modified in accordance with the properties of the material investigated with opto-acoustic detection, e.g. for gases or analysing solids
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/21—Polarisation-affecting properties
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/8422—Investigating thin films, e.g. matrix isolation method

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Biochemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Mathematical Physics (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
TW111100537A 2021-03-04 2022-01-06 探測反射光變化的裝置、方法及膜厚測量裝置 TWI801081B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CN202110241306.6A CN113048895B (zh) 2021-03-04 2021-03-04 探测反射光变化的装置、方法及膜厚测量装置
CN202110241306.6 2021-03-04

Publications (2)

Publication Number Publication Date
TW202235814A TW202235814A (zh) 2022-09-16
TWI801081B true TWI801081B (zh) 2023-05-01

Family

ID=76510234

Family Applications (1)

Application Number Title Priority Date Filing Date
TW111100537A TWI801081B (zh) 2021-03-04 2022-01-06 探測反射光變化的裝置、方法及膜厚測量裝置

Country Status (3)

Country Link
KR (1) KR102757216B1 (zh)
CN (1) CN113048895B (zh)
TW (1) TWI801081B (zh)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114279346B (zh) * 2021-12-18 2024-04-16 上海精测半导体技术有限公司 光测量装置、方法及光声膜厚测量系统
CN120488973B (zh) * 2025-07-15 2025-09-12 翌颖科技(上海)有限公司 一种高精密反射式膜厚测量方法及系统

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW201303258A (zh) * 2011-06-27 2013-01-16 克萊譚克公司 照射控制

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2600114B2 (ja) * 1994-11-28 1997-04-16 工業技術院長 ノイズに強い正確な楕円近似による計測方法
JP5182090B2 (ja) * 2006-08-02 2013-04-10 株式会社ニコン 欠陥検出装置及び欠陥検出方法
US8368897B2 (en) * 2008-08-22 2013-02-05 Ciencia, Inc. Versatile surface plasmon resonance analyzer with an integral surface plasmon resonance enhanced fluorescence mode
JP2012088267A (ja) * 2010-10-22 2012-05-10 Nikon Corp 検査装置
WO2013168457A1 (ja) * 2012-05-07 2013-11-14 株式会社ニコン 面位置計測装置、面位置計測方法、露光装置、およびデバイス製造方法
CN102679894B (zh) * 2012-06-11 2014-07-09 北京理工大学 反射式差动共焦透镜中心厚度测量方法
KR102134943B1 (ko) * 2013-09-16 2020-08-26 케이엘에이 코포레이션 반도체 샘플의 계측을 수행하기 위한 타원편광 측정기 장치
WO2018007126A1 (en) * 2016-07-07 2018-01-11 Asml Netherlands B.V. Method and apparatus for calculating electromagnetic scattering properties of finite periodic structures
JP6550101B2 (ja) * 2017-07-13 2019-07-24 Ｊｆｅテクノリサーチ株式会社 膜厚測定方法及び膜厚測定装置
EP3441773B1 (en) * 2017-08-11 2022-11-23 Anton Paar GmbH Characterizing a height profile of a sample by side view imaging
CN109520973A (zh) * 2018-11-13 2019-03-26 北京理工大学 后置分光瞳激光差动共焦显微检测方法及装置
CN111551129B (zh) * 2020-06-11 2021-12-07 中国科学院长春光学精密机械与物理研究所 大口径平面镜的中、低阶面形检测装置、系统及存储介质

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW201303258A (zh) * 2011-06-27 2013-01-16 克萊譚克公司 照射控制

Also Published As

Publication number Publication date
KR102757216B1 (ko) 2025-01-21
CN113048895A (zh) 2021-06-29
TW202235814A (zh) 2022-09-16
CN113048895B (zh) 2022-08-16
KR20220125160A (ko) 2022-09-14

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