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TWI801081B - Device, method and film thickness measuring device for detecting changes in reflected light - Google Patents

Device, method and film thickness measuring device for detecting changes in reflected light Download PDF

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Publication number
TWI801081B
TWI801081B TW111100537A TW111100537A TWI801081B TW I801081 B TWI801081 B TW I801081B TW 111100537 A TW111100537 A TW 111100537A TW 111100537 A TW111100537 A TW 111100537A TW I801081 B TWI801081 B TW I801081B
Authority
TW
Taiwan
Prior art keywords
film thickness
reflected light
thickness measuring
detecting changes
measuring device
Prior art date
Application number
TW111100537A
Other languages
Chinese (zh)
Other versions
TW202235814A (en
Inventor
王奇
李仲禹
王政
Original Assignee
大陸商上海精測半導體技術有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 大陸商上海精測半導體技術有限公司 filed Critical 大陸商上海精測半導體技術有限公司
Publication of TW202235814A publication Critical patent/TW202235814A/en
Application granted granted Critical
Publication of TWI801081B publication Critical patent/TWI801081B/en

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G01B11/0616—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
    • G01B11/0625—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating with measurement of absorption or reflection
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G01B11/0616—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
    • G01B11/0641—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating with measurement of polarization
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G01B11/0616—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
    • G01B11/0675—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating using interferometry
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/1702—Systems in which incident light is modified in accordance with the properties of the material investigated with opto-acoustic detection, e.g. for gases or analysing solids
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/21—Polarisation-affecting properties
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/8422—Investigating thin films, e.g. matrix isolation method

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Biochemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Mathematical Physics (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
TW111100537A 2021-03-04 2022-01-06 Device, method and film thickness measuring device for detecting changes in reflected light TWI801081B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CN202110241306.6A CN113048895B (en) 2021-03-04 2021-03-04 Apparatus and method for detecting change of reflected light, and film thickness measuring apparatus
CN202110241306.6 2021-03-04

Publications (2)

Publication Number Publication Date
TW202235814A TW202235814A (en) 2022-09-16
TWI801081B true TWI801081B (en) 2023-05-01

Family

ID=76510234

Family Applications (1)

Application Number Title Priority Date Filing Date
TW111100537A TWI801081B (en) 2021-03-04 2022-01-06 Device, method and film thickness measuring device for detecting changes in reflected light

Country Status (3)

Country Link
KR (1) KR102757216B1 (en)
CN (1) CN113048895B (en)
TW (1) TWI801081B (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114279346B (en) * 2021-12-18 2024-04-16 上海精测半导体技术有限公司 Optical measurement device, optical measurement method, and photoacoustic film thickness measurement system
CN120488973B (en) * 2025-07-15 2025-09-12 翌颖科技(上海)有限公司 High-precision reflective film thickness measuring method and system

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW201303258A (en) * 2011-06-27 2013-01-16 克萊譚克公司 Irradiation control

Family Cites Families (12)

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JP2600114B2 (en) * 1994-11-28 1997-04-16 工業技術院長 Measurement method by accurate ellipse approximation resistant to noise
JP5182090B2 (en) * 2006-08-02 2013-04-10 株式会社ニコン Defect detection apparatus and defect detection method
US8368897B2 (en) * 2008-08-22 2013-02-05 Ciencia, Inc. Versatile surface plasmon resonance analyzer with an integral surface plasmon resonance enhanced fluorescence mode
JP2012088267A (en) * 2010-10-22 2012-05-10 Nikon Corp Inspection apparatus
WO2013168457A1 (en) * 2012-05-07 2013-11-14 株式会社ニコン Surface position measurement device, surface position measurement method, exposure device, and device production method
CN102679894B (en) * 2012-06-11 2014-07-09 北京理工大学 Method for measuring central thickness of reflecting type differential confocal lens
KR102134943B1 (en) * 2013-09-16 2020-08-26 케이엘에이 코포레이션 Ellipsometer apparatus for performing metrology of a semiconductor sample
WO2018007126A1 (en) * 2016-07-07 2018-01-11 Asml Netherlands B.V. Method and apparatus for calculating electromagnetic scattering properties of finite periodic structures
JP6550101B2 (en) * 2017-07-13 2019-07-24 Ｊｆｅテクノリサーチ株式会社 Film thickness measuring method and film thickness measuring apparatus
EP3441773B1 (en) * 2017-08-11 2022-11-23 Anton Paar GmbH Characterizing a height profile of a sample by side view imaging
CN109520973A (en) * 2018-11-13 2019-03-26 北京理工大学 Postposition is divided pupil laser differential confocal microscopic detection method and device
CN111551129B (en) * 2020-06-11 2021-12-07 中国科学院长春光学精密机械与物理研究所 Medium-low-order surface shape detection device and system of large-caliber plane mirror and storage medium

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW201303258A (en) * 2011-06-27 2013-01-16 克萊譚克公司 Irradiation control

Also Published As

Publication number Publication date
KR102757216B1 (en) 2025-01-21
CN113048895A (en) 2021-06-29
TW202235814A (en) 2022-09-16
CN113048895B (en) 2022-08-16
KR20220125160A (en) 2022-09-14

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