TWI898281B - System and method for testing memory - Google Patents
System and method for testing memoryInfo
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Abstract
Description
本揭露是關於一種測試記憶體的系統及方法,特別是關於一種測試記憶體的電壓位準的系統及方法。The present disclosure relates to a system and method for testing a memory, and more particularly to a system and method for testing a voltage level of a memory.
隨著記憶體的製程技術快速發展,記憶體的尺寸日益縮小,同時記憶體之電路的密度增加。較高密度的電路有益於記憶體的速度及效能,然而更高的錯誤率及製造上的困難應運而生。為確保產品的可靠度及良率,如何有效地測試記憶體至關重要。With the rapid advancement of memory process technology, memory size is shrinking while the density of memory circuits is increasing. While higher circuit density benefits memory speed and performance, it also leads to higher error rates and manufacturing difficulties. To ensure product reliability and yield, effective memory testing is crucial.
本揭露提供一種測試記憶體的系統。系統包含記憶體裝置及測試機。記憶體裝置包含虛設位元線、第一電壓端、第一開關、電壓供應電路及第二電壓端。第一開關耦接在虛設位元線及第一電壓端之間。電壓供應電路輸出第一電壓至第一電壓端以及透過資料線輸出第一電壓端的電壓位準。第二電壓端操作地耦接虛設位元線,並且接收不同於第一電壓的第二電壓。測試機操作地耦接記憶體裝置,並且執行:產生測試指令以控制電壓供應電路停止輸出第一電壓;導通第一開關;以及根據電壓位準產生測試結果。The present disclosure provides a system for testing a memory. The system includes a memory device and a tester. The memory device includes a virtual bit line, a first voltage terminal, a first switch, a voltage supply circuit, and a second voltage terminal. The first switch is coupled between the virtual bit line and the first voltage terminal. The voltage supply circuit outputs a first voltage to the first voltage terminal and outputs the voltage level of the first voltage terminal via a data line. The second voltage terminal is operatively coupled to the virtual bit line and receives a second voltage different from the first voltage. The tester is operatively coupled to the memory device and performs the following operations: generating a test instruction to control the voltage supply circuit to stop outputting a first voltage; turning on the first switch; and generating a test result according to the voltage level.
在一些實施例中,記憶體裝置更包含第二開關。第二開關耦接在虛設位元線及第二電壓端之間,並且響應於測試機的第一指令導通。In some embodiments, the memory device further includes a second switch coupled between the dummy bit line and the second voltage terminal and turned on in response to a first command from the tester.
在一些實施例中,測試機在輸出第一指令後,比較第二電壓及量測電壓以判斷記憶體裝置是否通過測試。In some embodiments, after outputting the first command, the tester compares the second voltage with the measured voltage to determine whether the memory device passes the test.
在一些實施例中,記憶體裝置更包含第三電壓端及第三開關。第三電壓端接收第三電壓,第三電壓不同於第一電壓及第二電壓。第三開關耦接在虛設位元線及第三電壓端之間,並且響應於測試機的第二指令導通。第二開關響應於第二指令關斷。In some embodiments, the memory device further includes a third voltage terminal and a third switch. The third voltage terminal receives a third voltage that is different from the first voltage and the second voltage. The third switch is coupled between the virtual bit line and the third voltage terminal and is turned on in response to a second command from the tester. The second switch is turned off in response to the second command.
在一些實施例中,第二電壓為記憶體裝置的操作電壓,第三電壓為接地電壓。In some embodiments, the second voltage is an operating voltage of the memory device, and the third voltage is a ground voltage.
在一些實施例中,電壓供應電路包含位元線預充電電路,第一電壓為位元線預充電電壓,記憶體裝置響應於測試指令浮接位元線預充電電路的電壓供應端。In some embodiments, the voltage supply circuit includes a bit line precharge circuit, the first voltage is a bit line precharge voltage, and the memory device floats the voltage supply terminal of the bit line precharge circuit in response to the test command.
本揭露提供一種測試記憶體的方法。方法包含:施加第一電壓至記憶體裝置的第一電壓端;產生第一指令至記憶體裝置以導通第一開關,其中第一開關耦接在虛設位元線及第一電壓端之間;控制記憶體裝置的電壓供應電路停止輸出第二電壓至第二電壓端;導通第二開關,第二開關耦接在虛設位元線及第二電壓端之間;以及量測資料線以取得量測電壓,並且根據量測電壓產生測試結果,其中資料線耦接電壓供應電路。The present disclosure provides a method for testing a memory device. The method includes: applying a first voltage to a first voltage terminal of a memory device; generating a first command to the memory device to turn on a first switch, wherein the first switch is coupled between a virtual bit line and the first voltage terminal; controlling a voltage supply circuit of the memory device to stop outputting a second voltage to a second voltage terminal; turning on a second switch, wherein the second switch is coupled between the virtual bit line and the second voltage terminal; and measuring a data line to obtain a measurement voltage, and generating a test result based on the measurement voltage, wherein the data line is coupled to the voltage supply circuit.
在一些實施例中,方法更包含比較量測電壓及第一電壓以判斷記憶體裝置是否通過測試。In some embodiments, the method further includes comparing the measured voltage to the first voltage to determine whether the memory device passes the test.
在一些實施例中,產生第一指令包含:產生第一指令至記憶體裝置以關斷第三開關。第三開關耦接在虛設位元線及第三電壓端之間。第三電壓端接收不同於第一電壓的第三電壓。In some embodiments, generating the first instruction includes generating the first instruction to the memory device to turn off a third switch, the third switch being coupled between the virtual bit line and a third voltage terminal, the third voltage terminal receiving a third voltage different from the first voltage.
在一些實施例中,第一電壓等於記憶體裝置的記憶體單元儲存高邏輯值時具有的高邏輯電壓,第三電壓等於記憶體單元儲存低邏輯值時具有的低邏輯電壓。In some embodiments, the first voltage is equal to a high logic voltage when a memory cell of the memory device stores a high logic value, and the third voltage is equal to a low logic voltage when the memory cell stores a low logic value.
以下揭示內容提供了用於實現提供之標的的不同特徵的許多不同的實施例或示例。以下描述元件及佈置的特定示例用以簡化本案的一實施例。當然,該些僅為示例,並不旨在進行限制。例如,在下面的描述中在第二特徵上方或之上形成第一特徵可包括其中第一及第二特徵直接接觸形成的實施例,並且亦可包括其中在第一與第二特徵之間形成附加特徵的實施例,以使得第一及第二特徵可以不直接接觸。此外,本揭示內容可以在各個示例中重複元件符號或字母。此重複係出於簡單及清楚的目的,其本身並不指定所討論之各種實施例或組態之間的關係。The following disclosure provides many different embodiments or examples for implementing different features of the provided subject matter. Specific examples of components and arrangements are described below to simplify one embodiment of the present invention. Of course, these are merely examples and are not intended to be limiting. For example, forming a first feature above or on a second feature in the description below may include embodiments in which the first and second features are formed in direct contact, and may also include embodiments in which additional features are formed between the first and second features so that the first and second features may not be in direct contact. In addition, the present disclosure may repeat component symbols or letters in various examples. This repetition is for the purpose of simplicity and clarity and does not, in itself, specify a relationship between the various embodiments or configurations discussed.
在本說明書中使用的術語通常具有本領域及在使用每一術語的特定上下文中的普通意義。在本說明書中使用示例,包括本文討論的任何術語的示例,僅為說明性的,絕不限制本案的一實施例或任何示例性術語的範圍及意義。同樣,本案的一實施例不限於本說明書中給定的各種實施例。The terms used in this specification generally have their ordinary meanings in the art and in the specific context in which each term is used. The use of examples in this specification, including examples of any term discussed herein, is illustrative only and in no way limits the scope or meaning of one embodiment of this disclosure or any exemplified term. Similarly, one embodiment of this disclosure is not limited to the various embodiments given in this specification.
更進一步,為了便於描述,本文中可以使用諸如「在...下方」、「在...下」、「下方」、「在...上方」、「上方」之類的空間相對術語,來描述如圖中所示的一個元件或特徵與另一元件或特徵的關係。除了在附圖中示出的定向之外,空間相對術語意在涵蓋裝置在使用或操作中的不同定向。設備可以其他方式定向(旋轉90度或以其他定向),並且在此使用的空間相對描述語亦可被相應地解釋。如本文所使用,術語「及/或」包括一或多個相關聯的所列項目的任何及所有組合。Furthermore, for ease of description, spatially relative terms such as "below," "beneath," "beneath," "above," and "above" may be used herein to describe the relationship of one element or feature to another element or feature as illustrated in the figures. Spatially relative terms are intended to encompass different orientations of the device in use or operation in addition to the orientation shown in the figures. The device may be oriented in other ways (rotated 90 degrees or in other orientations), and the spatially relative descriptors used herein should be interpreted accordingly. As used herein, the term "and/or" includes any and all combinations of one or more of the associated listed items.
如本文所用,「大約」、「約」、「近似」或「基本上」應通常指給定值或範圍的任何近似值,其中其取決於所涉及的各種領域而變化,並且其範疇應與本領域技術人員所理解的最廣泛解釋相一致,以涵蓋所有該些修改及類似的結構。在一些實施例中,它通常應指給定值或範圍的百分之二十以內,優選地為百分之十以內,更優選地為百分之五以內。本文給定的數值為近似的,意味著若未明確說明,則可以推斷出術語「大約」、「約」、「近似」或「基本上」,或者意味著其他近似值。As used herein, "approximately," "about," "approximately," or "substantially" shall generally refer to any approximation of a given value or range, which may vary depending on the various fields involved, and its scope shall be consistent with the broadest interpretation understood by those skilled in the art to encompass all such modifications and similar structures. In some embodiments, it shall generally refer to within 20 percent, preferably within 10 percent, and more preferably within 5 percent of a given value or range. The numerical values given herein are approximate, meaning that if not explicitly stated, the term "approximately," "about," "approximately," or "substantially" can be inferred, or other approximate values can be meant.
參考第1圖。根據本揭露的一些實施例,第1圖是測試記憶體的系統100的一個示意圖。說明而言,系統100包含記憶體裝置110及測試機120。在一些實施例中,記憶體裝置110操作地耦接測試機120。Referring to FIG. 1 , FIG. 1 is a schematic diagram of a system 100 for testing memory according to some embodiments of the present disclosure. Specifically, the system 100 includes a memory device 110 and a tester 120 . In some embodiments, the memory device 110 is operatively coupled to the tester 120 .
根據一些實施例,測試機120是記憶體測試機台,例如動態隨機存取記憶體(dynamic random-access memory,DRAM)或靜態隨機存取記憶體(static random-access memory,SRAM)的測試機台。在一些實施例中,測試機120是可編程的測試機台。如第1圖所示,在一些實施例中,測試機120包含處理器121。According to some embodiments, tester 120 is a memory tester, such as a dynamic random-access memory (DRAM) or static random-access memory (SRAM) tester. In some embodiments, tester 120 is a programmable tester. As shown in FIG. 1 , in some embodiments, tester 120 includes a processor 121.
根據不同的實施例,處理器121是中央處理單元(central processing unit,CPU),或是其他可程式化之一般用途或特殊用途的微控制單元(micro control unit,MCU)、微處理器(microprocessor)、數位信號處理器(digital signal processor,DSP)、可程式化控制器、特殊應用積體電路(application specific integrated circuit,ASIC)、圖形處理器(graphics processing unit,GPU)、算數邏輯單元(arithmetic logic unit,ALU)、複雜可程式邏輯裝置(complex programmable logic device,CPLD)、現場可程式化邏輯閘陣列(field programmable gate array,FPGA)或其他類似元件或上述元件的組合。Depending on the embodiment, the processor 121 is a central processing unit (CPU), or other programmable general-purpose or special-purpose micro control unit (MCU), microprocessor, digital signal processor (DSP), programmable controller, application specific integrated circuit (ASIC), graphics processing unit (GPU), arithmetic logic unit (ALU), complex programmable logic device (CPLD), field programmable gate array (FPGA), or other similar components or combinations of the above components.
在一些實施例中,記憶體裝置110是例如單列直插式記憶體模組(single in-line memory module, SIMM)、雙列直插式記憶體模組(dual in-line memory module, SIMM)、DRAM晶片或SRAM晶片等記憶體裝置。在一些實施例中,記憶體裝置110是第五代雙倍資料率同步動態隨機存取記憶體(double data rate fifth-generation synchronous dynamic random-access memory,DDR5 SDRAM)晶片。In some embodiments, memory device 110 is a memory device such as a single in-line memory module (SIMM), a dual in-line memory module (SIMM), a DRAM chip, or an SRAM chip. In some embodiments, memory device 110 is a fifth-generation double data rate synchronous dynamic random-access memory (DDR5 SDRAM) chip.
如第1圖所示,在一些實施例中,記憶體裝置110包含記憶體陣列111及控制電路112。記憶體陣列111包含多個記憶體單元(儲存電路)113。多個記憶體單元113排列為一個二維的記憶體陣列。根據不同實施例,記憶體單元113包含揮發性記憶體單元、非揮發性記憶體單元及上述元件的組合。As shown in FIG. 1 , in some embodiments, memory device 110 includes a memory array 111 and a control circuit 112. Memory array 111 includes a plurality of memory cells (storage circuits) 113. Memory cells 113 are arranged in a two-dimensional memory array. Depending on the embodiment, memory cells 113 may include volatile memory cells, non-volatile memory cells, or a combination thereof.
實務上,記憶體陣列111更包含多個字元線WL及多個位元線BL。在一些實施例中,此些字元線WL及位元線BL包含導電結構,例如金屬導線。在一些實施例中,如第1圖所示,記憶體陣列111中的每一列耦接相應的一字元線WL,而記憶體陣列111中的每一行耦接相應的一位元線BL。In practice, memory array 111 further includes a plurality of word lines WL and a plurality of bit lines BL. In some embodiments, these word lines WL and bit lines BL comprise conductive structures, such as metal wires. In some embodiments, as shown in FIG. 1 , each column in memory array 111 is coupled to a corresponding word line WL, and each row in memory array 111 is coupled to a corresponding bit line BL.
根據本揭露的一些實施例,控制電路112藉由控制及/或感測此些字元線WL及位元線BL上的訊號對記憶體陣列111執行操作,例如讀取(read)操作或寫入 (write)操作等。在一些實施例中,控制電路112根據指令(command),例如測試機120產生的指令,對記憶體陣列111執行操作。舉例而言,測試機120產生對應一記憶體位址的讀取指令至記憶體裝置110,而控制電路112根據此記憶體位址自相應的記憶體單元113取出讀取資料。在一些實施例中,控制電路112包含列位址解碼器、行位址解碼器及感測放大器(sense amplifier)。According to some embodiments of the present disclosure, control circuit 112 performs operations, such as read operations or write operations, on memory array 111 by controlling and/or sensing signals on word lines WL and bit lines BL. In some embodiments, control circuit 112 performs operations on memory array 111 based on commands, such as commands generated by tester 120. For example, tester 120 generates a read command corresponding to a memory address to memory device 110, and control circuit 112 retrieves data from corresponding memory cell 113 based on the memory address. In some embodiments, the control circuit 112 includes a column address decoder, a row address decoder, and a sense amplifier.
第1圖的組態係為了說明性目的而給出。第1圖的各種實施在本案的預料範疇內。舉例而言,在一些實施例中,記憶體陣列111是三維的記憶體陣列。The configuration of FIG. 1 is provided for illustrative purposes. Various implementations of FIG. 1 are within the contemplated scope of the present invention. For example, in some embodiments, the memory array 111 is a three-dimensional memory array.
參考第2圖。根據本揭露的一些實施例,第2圖是對應第1圖的記憶體陣列111在一佈局視角的一個示意圖。相對於第1圖的實施例,為了易於理解,在第2圖中的相似構件用相同參考編號來標示。為了簡潔起見,本文中省略已在以上段落中詳細論述的類似構件的具體操作,除非有需要介紹與第2圖中展示的構件的合作關係。Refer to FIG. 2 . According to some embodiments of the present disclosure, FIG. 2 is a schematic diagram illustrating a layout perspective of memory array 111 corresponding to FIG. For ease of understanding, similar components in FIG. 2 are labeled with the same reference numbers as those in FIG. For the sake of brevity, the detailed operations of similar components discussed in detail above are omitted herein unless they are necessary to explain their cooperative relationship with the components shown in FIG. 2 .
說明而言,在一佈局視角中,記憶體列111沿著方向x分為多個區段S0~SN。根據本揭示的一些實施例,記憶體列111的每一個位元線BL是設置在相鄰的兩個區段(例如,區段S0及區段S1)之間。換言之,在每兩個相鄰的區段之間配置一個位元線BL。在一些實施例中,每一位元線BL沿著垂直於方向x的方向y延伸,並且包含多個沿著方向x的分支。在一些實施例中,每一位元線BL的多個分支延伸至各自相鄰的兩個區段之中。To illustrate, in one layout perspective, memory row 111 is divided into multiple segments S0-SN along direction x. According to some embodiments of the present disclosure, each bit line BL of memory row 111 is disposed between two adjacent segments (e.g., segment S0 and segment S1). In other words, one bit line BL is disposed between every two adjacent segments. In some embodiments, each bit line BL extends along direction y, perpendicular to direction x, and includes multiple branches extending along direction x. In some embodiments, each bit line BL's multiple branches extend into each of the two adjacent segments.
如第2圖所示,記憶體陣列111更包含不同於位元線BL的多個虛設位元線(dummy bit line)DBL。根據一些實施例,位元線BL用以傳輸資料以對記憶體陣列111執行操作,而虛設位元線DBL則不用於傳輸資料。具體而言,控制電路112用以藉由位元線BL傳輸資料訊號至記憶體單元113以改變記憶體單元113儲存的資料(邏輯狀態)而不使用虛設位元線DBL上的訊號。換句話說,記憶體單元113不會根據虛設位元線DBL上的訊號改變記憶體單元113儲存的資料。As shown in FIG. 2 , memory array 111 further includes a plurality of dummy bit lines DBL, distinct from bit lines BL. According to some embodiments, bit lines BL are used to transmit data to perform operations on memory array 111, while dummy bit lines DBL are not used for data transmission. Specifically, control circuit 112 is used to transmit data signals to memory cells 113 via bit lines BL to change the data (logical state) stored in memory cells 113 without using signals on dummy bit lines DBL. In other words, memory cells 113 do not change the data stored in memory cells 113 based on signals on dummy bit lines DBL.
在一些實施例中,虛設位元線DBL用以維持位元線BL的圖型一致性(pattern uniformity)。例如,在記憶體陣列111的外圍部分形成虛設位元線DBL(包圍位元線BL),使得最外側的位元線BL與其他位元線BL具有相似的外部條件。In some embodiments, dummy bit lines DBL are used to maintain pattern uniformity of bit lines BL. For example, dummy bit lines DBL are formed at the periphery of the memory array 111 (surrounding bit lines BL) so that the outermost bit lines BL have similar external conditions to the other bit lines BL.
在一些實施例中,記憶體陣列111的多個虛設位元線DBL包含配置在記憶體陣列111兩端(例如方向x上的兩端)的兩個虛設位元線 DBL,例如,第2圖中區段S0左側的虛設位元線 DBL及區段SN右側的虛設位元線 DBL。根據本揭示一些實施例,上述位於記憶體陣列111兩端的虛設位元線 DBL沿方向y延伸,並且具有多個分支延伸至相鄰的區段(例如區段S0及區段SN)內。在一些實施例中,上述位於記憶體陣列111兩端的虛設位元線 DBL在方向y上最外側的分支是位於相鄰的區段(例如區段S0及區段SN)的邊緣上。此外,在方向y上,相鄰的位元線BL的分支是在上述方向y上最外側的分支之間。舉例而言,如第2圖所示,區段S0及區段S1之間的位元線BL在區段S0中的分支,是在區段S0左側的虛設位元線 DBL在方向y上最外側的兩個分支之內。In some embodiments, the multiple dummy bit lines DBL of the memory array 111 include two dummy bit lines DBL located at opposite ends of the memory array 111 (e.g., at opposite ends in direction x), such as the dummy bit line DBL on the left side of segment S0 and the dummy bit line DBL on the right side of segment SN in FIG. According to some embodiments of the present disclosure, the dummy bit lines DBL located at opposite ends of the memory array 111 extend along direction y and have multiple branches extending into adjacent segments (e.g., segment S0 and segment SN). In some embodiments, the outermost branches of the dummy bit lines DBL at both ends of the memory array 111 in the direction y are located on the edges of adjacent segments (e.g., segment S0 and segment SN). Furthermore, the branches of adjacent bit lines BL in the direction y are located between the outermost branches in the direction y. For example, as shown in FIG. 2 , the branch of the bit line BL in segment S0 between segments S0 and S1 is located within the two outermost branches of the dummy bit line DBL on the left side of segment S0 in the direction y.
在一些實施例中,部分虛設位元線DBL是配置在記憶體陣列111的區段間。根據一些實施例,在記憶體陣列111中,每隔兩個區段會配置一個虛設位元線DBL。例如在第2圖所示的實施例中,沿著方向x,在區段S0及區段S1之後配置一個虛設位元線DBL,在區段S3及區段S4之後配置一個虛設位元線DBL,並以此類推。In some embodiments, some dummy bit lines DBL are arranged between segments of the memory array 111. According to some embodiments, a dummy bit line DBL is arranged between every three segments in the memory array 111. For example, in the embodiment shown in FIG. 2 , along direction x, a dummy bit line DBL is arranged after segments S0 and S1, a dummy bit line DBL is arranged after segments S3 and S4, and so on.
如第2圖所示,區段間的虛設位元線DBL(例如區段S1及區段S2間的虛設位元線DBL)具有多個分支。在一些實施例中,區段間的虛設位元線DBL具有四個分支,位於記憶體陣列111的邊緣上並延伸至相鄰的區段中。根據一些實施例,虛設位元線DBL的分支是在位元線BL的分支的外側。舉例而言,在一區段(例如區段S0)中,虛設位元線DBL的分支在方向y上包圍所有位元線BL的分支。As shown in FIG. 2 , the inter-segment dummy bit line DBL (e.g., the dummy bit line DBL between segments S1 and S2) has multiple branches. In some embodiments, the inter-segment dummy bit line DBL has four branches, located at the edge of the memory array 111 and extending into adjacent segments. According to some embodiments, the branches of the dummy bit line DBL are located outside the branches of the bit lines BL. For example, in a segment (e.g., segment S0), the branches of the dummy bit line DBL surround all the branches of the bit lines BL in the direction y.
第2圖的組態係為了說明性目的而給出。第2圖的各種實施在本案的預料範疇內。舉例而言,在一些實施例中,區段間的位元線BL及虛設位元線DBL(例如區段S1及區段S2間的位元線BL及虛設位元線DBL)沿方向y延伸的部分在佈局視角上重疊。The configuration of FIG. 2 is provided for illustrative purposes. Various implementations of FIG. 2 are contemplated within the scope of the present disclosure. For example, in some embodiments, portions of bit lines BL and dummy bit lines DBL between segments (e.g., bit lines BL and dummy bit lines DBL between segments S1 and S2) extending along direction y overlap in terms of layout perspective.
一併參考第3圖及第4圖,根據本揭露的一些實施例,第3圖是記憶體裝置110接收一指令之後,記憶體裝置110的一部份110a之範例的電路圖。而第4圖是記憶體裝置110接收不同於第3圖的指令之後,記憶體裝置110的一部份110a之範例的電路圖。相對於第1圖及第2圖的實施例,為了易於理解,在第3圖及的4圖中的相似構件用相同參考編號來標示。Referring to FIG. 3 and FIG. 4 together, according to some embodiments of the present disclosure, FIG. 3 is a circuit diagram of an exemplary portion 110 a of the memory device 110 after the memory device 110 receives a command. FIG. 4 is a circuit diagram of an exemplary portion 110 a of the memory device 110 after the memory device 110 receives a command different from that shown in FIG. For ease of understanding, similar components in FIG. 3 and FIG. 4 are labeled with the same reference numerals as those in the embodiments of FIG. 1 and FIG. 2 .
說明而言,記憶體裝置110的部分110a包含電壓端301、電壓端302、電壓端304、開關sw1、開關sw2、開關sw3、資料線/墊DQ、電壓供應電路310及電壓供應電路320。在一些實施例中,記憶體裝置110包含多個部分110a。具體而言,根據一些實施例,每個虛設位元線DBL各自對應一個部分110a。To illustrate, portion 110a of memory device 110 includes voltage terminal 301, voltage terminal 302, voltage terminal 304, switch sw1, switch sw2, switch sw3, data line/pad DQ, voltage supply circuit 310, and voltage supply circuit 320. In some embodiments, memory device 110 includes multiple portions 110a. Specifically, according to some embodiments, each dummy bit line DBL corresponds to a portion 110a.
如第3圖所示,開關sw1耦接在虛設位元線DBL及電壓端301之間。開關sw2耦接在虛設位元線DBL及電壓端302之間。開關sw3耦接在虛設位元線DBL及電壓端303之間。電壓端301耦接電壓供應電路310。資料線/墊DQ耦接電壓供應電路310。在一些實施例中,資料線/墊DQ用以輸出節點N1的電壓。在一些實施例中,資料線/墊DQ用來傳輸輸入或輸出記憶體裝置110的資料。As shown in FIG3 , switch sw1 is coupled between dummy bit line DBL and voltage terminal 301. Switch sw2 is coupled between dummy bit line DBL and voltage terminal 302. Switch sw3 is coupled between dummy bit line DBL and voltage terminal 303. Voltage terminal 301 is coupled to voltage supply circuit 310. Data line/pad DQ is coupled to voltage supply circuit 310. In some embodiments, data line/pad DQ is used to output the voltage of node N1. In some embodiments, data line/pad DQ is used to transmit data into or out of memory device 110.
在一些實施例中,電壓供應電路320耦接電壓端301及電壓供應電路310。電壓供應電路320用以提供電壓至電壓端301及電壓供應電路310。在一些實施例中,電壓供應電路320提供電壓VARY。In some embodiments, the voltage supply circuit 320 is coupled to the voltage terminal 301 and the voltage supply circuit 310. The voltage supply circuit 320 is configured to provide a voltage to the voltage terminal 301 and the voltage supply circuit 310. In some embodiments, the voltage supply circuit 320 provides a voltage VARY.
電壓供應電路310用以產生電壓VBLP至電壓端301。在一些實施例中,電壓供應電路310包含位元線預充電(bit line precharge)電路,而電壓VBLP是記憶體裝置110的位元線預充電(bit line precharge)電壓。在一些實施例中,電壓供應電路310更包含電壓調節器(regulator)。The voltage supply circuit 310 is used to generate a voltage VBLP to the voltage terminal 301. In some embodiments, the voltage supply circuit 310 includes a bit line precharge circuit, and the voltage VBLP is the bit line precharge voltage of the memory device 110. In some embodiments, the voltage supply circuit 310 further includes a voltage regulator.
根據本揭露的一些實施例,電壓端302用以接收電壓VARY,而電壓端303用以接收電壓VSS。在一些實施例中,電壓VARY是記憶體陣列111的操作電壓,電壓VSS是記憶體陣列111的參考電壓或接地電壓。在一些實施例中,電壓VARY具有對應記憶體單元的高邏輯狀態的高電壓位準(例如1.1伏特),而電壓VSS具有對應記憶體單元的低邏輯狀態的低電壓位準(例如0伏特)。在一些實施例中,電壓VARY等於記憶體單元113儲存一高邏輯值時具有的一高邏輯電壓,電壓VSS等於該記憶體單元113儲存一低邏輯值時具有的一低邏輯電壓。According to some embodiments of the present disclosure, voltage terminal 302 is configured to receive voltage VARY, and voltage terminal 303 is configured to receive voltage VSS. In some embodiments, voltage VARY is an operating voltage for memory array 111, and voltage VSS is a reference voltage or ground voltage for memory array 111. In some embodiments, voltage VARY has a high voltage level (e.g., 1.1 volts) corresponding to a high logic state of a memory cell, while voltage VSS has a low voltage level (e.g., 0 volts) corresponding to a low logic state of a memory cell. In some embodiments, the voltage VARY is equal to a high logic voltage when the memory cell 113 stores a high logic value, and the voltage VSS is equal to a low logic voltage when the memory cell 113 stores a low logic value.
根據一些實施例,電壓VARY大於電壓VBLP,電壓VBLP大於電壓VSS。在一些實施例中,電壓VBLP的電壓位準為電壓VARY的一半。According to some embodiments, voltage VARY is greater than voltage VBLP, which is greater than voltage VSS. In some embodiments, voltage VBLP is half the voltage VARY.
操作上,記憶體裝置110藉由改變虛設位元線DBL上的電壓位準以避免或減少對位元線BL的干擾。舉例而言,記憶體裝置110將電壓VARY或電壓VSS施加至虛設位元線DBL以避免電容耦合效應對相鄰的位元線BL的干擾。在一些實施例中,電壓VARY、VSS由控制電路112提供至虛設位元線DBL。在一些實施例中,控制電路112控制開關sw2及開關sw3以將電壓VARY或電壓VSS施加至虛設位元線DBL上。In operation, memory device 110 changes the voltage level on virtual bit line DBL to avoid or reduce interference with bit line BL. For example, memory device 110 applies voltage VARY or voltage VSS to virtual bit line DBL to prevent capacitive coupling from interfering with adjacent bit line BL. In some embodiments, voltages VARY and VSS are provided to virtual bit line DBL by control circuit 112. In some embodiments, control circuit 112 controls switches sw2 and sw3 to apply voltage VARY or voltage VSS to virtual bit line DBL.
在一些實施例中,記憶體裝置110根據所接收的指令(例如接收自測試機120的指令)或當前對記憶體陣列執行的操作控制開關sw2及開關sw3。根據一些實施例,在操作中,記憶體裝置110僅導通開關sw2及開關sw3中的一者。說明而言,在第3圖所示的實施例中,記憶體裝置110響應於一指令導通開關sw2並關斷開關sw3。相反地,在第4圖所示的實施例中,記憶體裝置110響應於另一指令關斷開關sw2並導通開關sw3。In some embodiments, memory device 110 controls switches sw2 and sw3 based on a received instruction (e.g., an instruction received from tester 120) or an operation currently being performed on the memory array. According to some embodiments, during operation, memory device 110 turns on only one of switches sw2 and sw3. To illustrate, in the embodiment shown in FIG. 3 , memory device 110 turns on switch sw2 and turns off switch sw3 in response to one instruction. Conversely, in the embodiment shown in FIG. 4 , memory device 110 turns off switch sw2 and turns on switch sw3 in response to another instruction.
在一些應用中,測試機120用以量測虛設位元線DBL上的電壓位準。在一些實施例中,測試機120根據資料線/墊DQ上的電壓位準,判斷虛設位元線DBL上的電壓位準。在一些實施例中,為了量測虛設位元線DBL上的電壓位準,測試機120傳輸測試指令至記憶體裝置110,記憶體裝置110響應於測試指令浮接(floating)電壓供應電路310的輸入端IN或輸出端/電壓供應端。換句話說,電壓供應電路310響應於測試指令停止輸出電壓VBLP至電壓端301,節點N1具有浮接電位。In some applications, the tester 120 is used to measure the voltage level on the dummy bit line DBL. In some embodiments, the tester 120 determines the voltage level on the dummy bit line DBL based on the voltage level on the data line/pad DQ. In some embodiments, to measure the voltage level on the dummy bit line DBL, the tester 120 transmits a test command to the memory device 110. In response to the test command, the memory device 110 floats the input terminal IN or the output terminal/voltage supply terminal of the voltage supply circuit 310. In other words, in response to the test command, the voltage supply circuit 310 stops outputting the voltage VBLP to the voltage terminal 301, and the node N1 has a floating potential.
接著,記憶體裝置110響應於測試指令導通開關sw1。在一些實施例中,當電壓供應電路310停止輸出電壓至電壓端301(節點N1)且開關sw1導通時,節點N1的電壓位準等於虛設位元線DBL上的電壓位準。而記憶體裝置110藉由資料線/墊DQ輸出節點N1的電壓(此時資料線/墊DQ的電壓位準等於節點N1的電壓位準)。在一些實施例中,測試機120量測資料線/墊DQ的電壓位準以判斷節點N1的電壓位準,並進一步判斷虛設位元線DBL上的電壓位準。Next, memory device 110 turns on switch sw1 in response to the test command. In some embodiments, when voltage supply circuit 310 stops outputting voltage to voltage terminal 301 (node N1) and switch sw1 turns on, the voltage level at node N1 equals the voltage level on dummy bit line DBL. Memory device 110 then outputs the voltage at node N1 via data line/pad DQ (at this point, the voltage level of data line/pad DQ equals the voltage level at node N1). In some embodiments, the tester 120 measures the voltage level of the data line/pad DQ to determine the voltage level of the node N1, and further determines the voltage level of the dummy bit line DBL.
第3圖及第4圖的組態係為了說明性目的而給出。第3圖及第4圖的各種實施在本案的預料範疇內。舉例而言,在一些實施例中,多個虛設位元線DBL共用一個電壓供應電路310及/或一個電壓供應電路320。The configurations of FIG3 and FIG4 are provided for illustrative purposes. Various implementations of FIG3 and FIG4 are within the contemplated scope of the present invention. For example, in some embodiments, multiple dummy bit lines DBL share a voltage supply circuit 310 and/or a voltage supply circuit 320.
根據一些實施例,測試機120更用以對記憶體裝置110執行測試。在此測試中,測試機120首先產生一指令以控制記憶體裝置110施加電壓VARY或電壓VSS至虛設位元線DBL。接著,測試機120量測虛設位元線DBL上的電壓位準,並根據此電壓位準產生測試結果。測試結果指示記憶體裝置110是否正確地根據指令施加電壓VARY或電壓VSS至虛設位元線DBL。測試方式的細節將於下方段落中參考第5圖作說明。According to some embodiments, the tester 120 is further configured to perform a test on the memory device 110. During this test, the tester 120 first generates a command to control the memory device 110 to apply the voltage VARY or the voltage VSS to the dummy bit line DBL. The tester 120 then measures the voltage level on the dummy bit line DBL and generates a test result based on this voltage level. The test result indicates whether the memory device 110 correctly applies the voltage VARY or the voltage VSS to the dummy bit line DBL according to the command. Details of the test method will be described in the following paragraphs with reference to FIG. 5.
現參考第5圖,根據本揭露的一些實施例,第5圖是測試記憶體的方法500的一個流程圖。方法500包含操作(或步驟)501~505。方法500中的至少一些操作可以用來測試記憶體裝置110。Referring now to FIG. 5 , FIG. 5 is a flow chart of a method 500 for testing a memory device according to some embodiments of the present disclosure. Method 500 includes operations (or steps) 501 - 505 . At least some of the operations in method 500 may be used to test memory device 110 .
一併參考第1圖至第4圖,在操作501中,記憶體裝置110施加電壓VARY至電壓端302及/或施加電壓VSS至電壓端303。1 to 4 , in operation 501 , the memory device 110 applies a voltage VARY to the voltage terminal 302 and/or applies a voltage VSS to the voltage terminal 303 .
在操作502中,測試機120產生指令(例如寫入指令或讀取指令)至記憶體裝置110以控制記憶體裝置110導通開關sw2或開關sw3。In operation 502 , the tester 120 generates a command (eg, a write command or a read command) to the memory device 110 to control the memory device 110 to turn on the switch sw2 or the switch sw3 .
在一些實施例中,測試機120在操作502中產生所述指令至記憶體裝置110以控制記憶體裝置110導通開關sw2並關斷開關sw3。在不同實施例中,測試機120在操作502中產生所述指令至記憶體裝置110是為著控制記憶體裝置110導通開關sw3並關斷開關sw2。In some embodiments, the tester 120 generates the instruction to the memory device 110 in operation 502 to control the memory device 110 to turn on switch sw2 and turn off switch sw3. In other embodiments, the tester 120 generates the instruction to the memory device 110 in operation 502 to control the memory device 110 to turn on switch sw3 and turn off switch sw2.
在操作503中,測試機120控制電壓供應電路310停止輸出電壓VBLP至電壓端301。在一些實施例中,記憶體裝置110響應於操作502中所述的測試指令浮接電壓供應電路310的輸入端/電壓供應端。In operation 503, the tester 120 controls the voltage supply circuit 310 to stop outputting the voltage VBLP to the voltage terminal 301. In some embodiments, the memory device 110 floats the input terminal/voltage supply terminal of the voltage supply circuit 310 in response to the test command described in operation 502.
在操作504中,測試機120產生測試指令至記憶體裝置110,而記憶體裝置110響應於測試指令導通開關sw1。In operation 504, the test engine 120 generates a test command to the memory device 110, and the memory device 110 turns on the switch sw1 in response to the test command.
在操作505中,測試機120量測資料線/墊DQ上的電壓作為量測電壓,並根據此量測電壓產生記憶體裝置110的測試結果。In operation 505, the tester 120 measures the voltage on the data line/pad DQ as a measurement voltage and generates a test result of the memory device 110 based on the measurement voltage.
在一些實施例中,當測試機120在操作504中產生的指令是為著控制記憶體裝置110導通開關sw2時,處理器121比較量測電壓及電壓VARY以產生記憶體裝置110的測試結果。其中,當量測電壓等於電壓VARY時,處理器121判斷記憶體裝置110通過測試,換句話說記憶體裝置110正確地根據指令施加電壓VARY至虛設位元線DBL。反之,當量測電壓不等於電壓VARY時,處理器121判斷記憶體裝置110不通過測試。In some embodiments, when the instruction generated by the tester 120 in operation 504 is to control the memory device 110 to turn on the switch sw2, the processor 121 compares the measured voltage with the voltage VARY to generate a test result for the memory device 110. When the measured voltage is equal to the voltage VARY, the processor 121 determines that the memory device 110 has passed the test. In other words, the memory device 110 has correctly applied the voltage VARY to the dummy bit line DBL according to the instruction. Conversely, when the measured voltage is not equal to the voltage VARY, the processor 121 determines that the memory device 110 has failed the test.
相同地,當測試機120在操作504中產生的指令是為著控制記憶體裝置110導通開關sw3時,處理器121比較量測電壓及電壓VSS以產生記憶體裝置110的測試結果。其中,當量測電壓等於電壓VSS時,處理器121判斷記憶體裝置110通過測試,換句話說記憶體裝置110正確地根據指令施加電壓VSS至虛設位元線DBL。反之,當量測電壓不等於電壓VSS時,處理器121判斷記憶體裝置110不通過測試。Similarly, when the instruction generated by the tester 120 in operation 504 is to control the memory device 110 to turn on the switch sw3, the processor 121 compares the measured voltage with the voltage VSS to generate a test result for the memory device 110. If the measured voltage is equal to the voltage VSS, the processor 121 determines that the memory device 110 has passed the test. In other words, the memory device 110 has correctly applied the voltage VSS to the dummy bit line DBL according to the instruction. Conversely, if the measured voltage is not equal to the voltage VSS, the processor 121 determines that the memory device 110 has failed the test.
方法500僅是一個示例,並不意圖限制本揭露。因此應當理解在第5圖的方法500之前、之間和之後可提供更多操作。方法500中的一些操作可以被取代或是移除。並且可以預期方法500的操作可以替代地以第5圖所示之外的順序執行。例如,根據一些實施例,操作501是在操作504之後。Method 500 is merely an example and is not intended to limit the present disclosure. Therefore, it should be understood that more operations may be provided before, during, or after method 500 in FIG. 5 . Some operations in method 500 may be replaced or removed. Furthermore, it is contemplated that the operations of method 500 may be performed in an order other than that shown in FIG. 5 . For example, according to some embodiments, operation 501 may be performed after operation 504.
在一些實施例中,測試機120藉由量測一電壓供應電路320的耗電流判斷目前虛設位元線DBL上的電壓。舉例而言,在開關sw2導通、開關sw1及開關sw3關斷,電壓VARY被施加至虛設位元線DBL的情況下,電壓供應電路320的耗電流最高;在開關sw1導通、開關sw2及開關sw3關斷,電壓VBLP被施加至虛設位元線DBL的情況下,電壓供應電路320的耗電流為中;在開關sw3導通、開關sw1及開關sw2關斷,電壓VSS被施加至虛設位元線DBL的情況下,電壓供應電路320的耗電流最低。在一些實施例中,處理器121比較當記憶體裝置110接收目前的指令後電壓供應電路320的耗電流,以及先前記憶體裝置110接收其他指令後電壓供應電路320的耗電流來判斷虛設位元線DBL上的電壓位準。In some embodiments, the tester 120 determines the voltage on the current dummy bit line DBL by measuring the current consumption of a voltage supply circuit 320 . For example, when switch sw2 is on, switches sw1 and sw3 are off, and voltage VARY is applied to virtual bit line DBL, the current consumption of voltage supply circuit 320 is the highest. When switch sw1 is on, switches sw2 and sw3 are off, and voltage VBLP is applied to virtual bit line DBL, the current consumption of voltage supply circuit 320 is medium. When switch sw3 is on, switches sw1 and sw2 are off, and voltage VSS is applied to virtual bit line DBL, the current consumption of voltage supply circuit 320 is the lowest. In some embodiments, the processor 121 determines the voltage level on the dummy bit line DBL by comparing the current consumption of the voltage supply circuit 320 after the memory device 110 receives the current command with the current consumption of the voltage supply circuit 320 after the memory device 110 previously received other commands.
在一些實施例中,測試機120 對記憶體裝置110執行一不完整資料測試以判斷虛設位元線DBL上的電壓位準。具體而言,測試機120 寫入不完整的低邏輯值至相鄰虛設位元線DBL的位元線BL,接著測試機120讀取位元線BL上的資料,當測試機120讀取的資料為高邏輯值時,測試機120判斷虛設位元線DBL上的電壓為電壓VARY。In some embodiments, tester 120 performs an incomplete data test on memory device 110 to determine the voltage level on dummy set bit line DBL. Specifically, tester 120 writes an incomplete low logic value to a bit line BL adjacent to dummy set bit line DBL. Then, tester 120 reads the data on bit line BL. If the data read by tester 120 is a high logic value, tester 120 determines that the voltage on dummy set bit line DBL is voltage VARY.
例如,電壓VARY(完整的高邏輯值)的電壓位準為1.1伏特,電壓VSS(完整的低邏輯值)的電壓位準為0伏特。測試機120 寫入不完整的低邏輯值(電壓位準為0.45伏特)至相鄰虛設位元線DBL的位元線BL,接著測試機120讀取位元線BL上的資料。當讀取的資料為高邏輯值時,可以判斷此資料是因為虛設位元線DBL上的高電壓產生的電容耦合效應而翻轉為高邏輯值,測試機120判斷虛設位元線DBL上的電壓為電壓VARY。For example, the voltage level of voltage VARY (complete high logic value) is 1.1 volts, and the voltage level of voltage VSS (complete low logic value) is 0 volts. Tester 120 writes an incomplete low logic value (voltage level of 0.45 volts) to bit line BL adjacent to dummy bit line DBL. Tester 120 then reads the data on bit line BL. If the read data is a high logic value, it can be determined that the data flipped to a high logic value due to the capacitive coupling effect generated by the high voltage on dummy bit line DBL. Tester 120 determines that the voltage on dummy bit line DBL is voltage VARY.
同樣地,測試機120藉由 寫入不完整的高邏輯值至相鄰虛設位元線DBL的位元線BL,並讀取位元線BL上的資料以判斷虛設位元線DBL的電壓位準,當測試機120讀取的資料為低邏輯值時,測試機120判斷虛設位元線DBL上的電壓為電壓VSS。Similarly, the tester 120 writes an incomplete high logic value to the bit line BL adjacent to the dummy bit line DBL and reads the data on the bit line BL to determine the voltage level of the dummy bit line DBL. When the data read by the tester 120 is a low logic value, the tester 120 determines that the voltage on the dummy bit line DBL is VSS.
例如,電壓VARY(完整的高邏輯值)的電壓位準為1.1伏特,電壓VSS(完整的低邏輯值)的電壓位準為0伏特。測試機120 寫入不完整的高邏輯值(電壓位準為0.55伏特)至相鄰虛設位元線DBL的位元線BL,接著測試機120讀取位元線BL上的資料。當讀取的資料為低邏輯值時,可以判斷此資料是因為虛設位元線DBL上的低電壓產生的電容耦合效應而翻轉為低邏輯值,測試機120判斷虛設位元線DBL上的電壓為電壓VSS。For example, the voltage level of VARY (a complete high logic value) is 1.1 volts, and the voltage level of VSS (a complete low logic value) is 0 volts. The tester 120 writes an incomplete high logic value (a voltage level of 0.55 volts) to the bit line BL adjacent to the dummy bit line DBL. The tester 120 then reads the data on the bit line BL. If the read data is a low logic value, it can be determined that the data flipped to a low logic value due to the capacitive coupling effect generated by the low voltage on the dummy bit line DBL. The tester 120 then determines that the voltage on the dummy bit line DBL is VSS.
在一些實施例中,藉由測試機120執行方法500,並搭配電壓供應電路320的耗電流量測及所述不完整資料測試以完整地檢驗虛設位元線DBL的電壓位準。In some embodiments, the method 500 is executed by the tester 120 and is combined with the current consumption measurement of the voltage supply circuit 320 and the incomplete data test to fully verify the voltage level of the dummy bit line DBL.
綜上所述,本揭露提供了一種測試記憶體的系統及方法。本揭露的系統及方法提供量測虛設位元線之電壓位準的測試模式。針對虛設位元線之電壓位準的量測有助於避免因虛設位元線的電壓與預期不同而造成偵測卡損壞。在本揭露的方法中,藉由橋接預充電電壓端至虛設位元線,可以直接由記憶體裝置的資料線/墊DQ量測虛設位元線之電壓位準。In summary, the present disclosure provides a system and method for testing a memory device. The system and method provide a test mode for measuring the voltage level of a virtual bit line. Measuring the voltage level of the virtual bit line helps avoid detection failures caused by the virtual bit line voltage being different from the expected voltage. In the disclosed method, by bridging a precharge voltage terminal to the virtual bit line, the voltage level of the virtual bit line can be measured directly from the data line/pad DQ of the memory device.
前文概述了數個實施例的特徵,使得本領域通常知識者可更好地理解本案的一實施例的態樣。本領域通常知識者應瞭解,可易於使用本案的一實施例作為設計或修改其他製程及結構的基礎以便實施本案所介紹的實施例的相同目的及/或實現相同優勢。本領域通常知識者亦應認識到,此類等效結構並未脫離本案的一實施例的精神及範疇,並且可在不脫離本案的一實施例的精神及範疇的情況下在本案的一實施例中執行各種變化、取代及修改。The foregoing summarizes the features of several embodiments so that those skilled in the art can better understand the aspects of one embodiment of the present invention. Those skilled in the art will appreciate that one embodiment of the present invention can be readily used as a basis for designing or modifying other processes and structures to achieve the same objectives and/or advantages as the embodiment described herein. Those skilled in the art will also recognize that such equivalent structures do not depart from the spirit and scope of one embodiment of the present invention, and that various changes, substitutions, and modifications may be made in one embodiment of the present invention without departing from the spirit and scope of one embodiment of the present invention.
100:系統 110:記憶體裝置 110a:部分 111:記憶體陣列 112:控制電路 113:記憶體單元 120:測試機 121:處理器 301:電壓端 302:電壓端 303:電壓端 310:電壓供應電路 320:電壓供應電路 500:方法 501:操作 502:操作 503:操作 504:操作 505:操作 BL:位元線 DBL:虛設位元線 IN:輸入端 N1:節點 DQ:資料線/墊 S0:區段 S1:區段 S2:區段 S3:區段 S4:區段 SN:區段 sw1:開關 sw2:開關 sw3:開關 VBLP:電壓 VARY:電壓 VSS:電壓 WL:字元線 x:方向 y:方向 100: System 110: Memory device 110a: Portion 111: Memory array 112: Control circuit 113: Memory cell 120: Tester 121: Processor 301: Voltage terminal 302: Voltage terminal 303: Voltage terminal 310: Voltage supply circuit 320: Voltage supply circuit 500: Method 501: Operation 502: Operation 503: Operation 504: Operation 505: Operation BL: Bit line DBL: Dummy bit line IN: Input terminal N1: Node DQ: Data line/pad S0: Segment S1: Segment S2: Segment S3: Segment S4: Segment SN: Segment sw1: Switch sw2: Switch sw3: Switch VBLP: Voltage VARY: Voltage VSS: Voltage WL: Word Line x: Direction y: Direction
當結合隨附圖式閱讀時,將自下文的詳細描述最佳地理解本案的一實施例的態樣。應注意,根據工業中的標準實務,並未按比例繪製各特徵。事實上,為了論述清楚,可任意增加或減小各特徵的尺寸。 第1圖根據一些實施例繪示測試記憶體的系統的一個示意圖; 第2圖根據一些實施例繪示對應第1圖的記憶體陣列在一佈局視角的一個示意圖; 第3圖根據一些實施例繪示接收一指令之後,記憶體裝置的一部份的範例的電路圖; 第4圖根據一些實施例繪示收不同於第3圖的指令之後,記憶體裝置的一部份的範例的電路圖;以及 第5圖根據一些實施例繪示測試記憶體的方法的一個流程圖。 Aspects of one embodiment of the present invention will be best understood from the following detailed description when read in conjunction with the accompanying drawings. It should be noted that, in accordance with standard practice in the industry, the various features are not drawn to scale. In fact, the dimensions of the various features may be arbitrarily increased or reduced for clarity of discussion. FIG1 is a schematic diagram of a system for testing memory according to some embodiments; FIG2 is a schematic diagram of a layout view of a memory array corresponding to FIG1 according to some embodiments; FIG3 is a circuit diagram of an example portion of a memory device after receiving an instruction according to some embodiments; FIG4 is a circuit diagram of an example portion of a memory device after receiving an instruction different from that shown in FIG3 according to some embodiments; and FIG5 is a flow chart of a method for testing memory according to some embodiments.
國內寄存資訊(請依寄存機構、日期、號碼順序註記) 無 國外寄存資訊(請依寄存國家、機構、日期、號碼順序註記) 無 Domestic Storage Information (Please enter in order by institution, date, and number) None International Storage Information (Please enter in order by country, institution, date, and number) None
110a:部分 110a: Partial
301:電壓端 301: Voltage terminal
302:電壓端 302: Voltage terminal
303:電壓端 303: Voltage terminal
310:電壓供應電路 310: Voltage supply circuit
320:電壓供應電路 320: Voltage supply circuit
DBL:虛設位元線 DBL: Dummy bit line
IN:輸入端 IN: Input terminal
N1:節點 N1: Node
DQ:資料線/墊 DQ: Data line/pad
sw1:開關 sw1: switch
sw2:開關 sw2: switch
sw3:開關 sw3: switch
VBLP:電壓 VBLP: Voltage
VARY:電壓 VARY: Voltage
VSS:電壓 VSS: voltage
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