TWI896842B - Cleaning Shed - Google Patents
Cleaning ShedInfo
- Publication number
- TWI896842B TWI896842B TW111102378A TW111102378A TWI896842B TW I896842 B TWI896842 B TW I896842B TW 111102378 A TW111102378 A TW 111102378A TW 111102378 A TW111102378 A TW 111102378A TW I896842 B TWI896842 B TW I896842B
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- air
- wall
- clean room
- airflow
- clean
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Classifications
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F24—HEATING; RANGES; VENTILATING
- F24F—AIR-CONDITIONING; AIR-HUMIDIFICATION; VENTILATION; USE OF AIR CURRENTS FOR SCREENING
- F24F3/00—Air-conditioning systems in which conditioned primary air is supplied from one or more central stations to distributing units in the rooms or spaces where it may receive secondary treatment; Apparatus specially designed for such systems
- F24F3/12—Air-conditioning systems in which conditioned primary air is supplied from one or more central stations to distributing units in the rooms or spaces where it may receive secondary treatment; Apparatus specially designed for such systems characterised by the treatment of the air otherwise than by heating and cooling
- F24F3/16—Air-conditioning systems in which conditioned primary air is supplied from one or more central stations to distributing units in the rooms or spaces where it may receive secondary treatment; Apparatus specially designed for such systems characterised by the treatment of the air otherwise than by heating and cooling by purification, e.g. by filtering; by sterilisation; by ozonisation
- F24F3/167—Clean rooms, i.e. enclosed spaces in which a uniform flow of filtered air is distributed
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F24—HEATING; RANGES; VENTILATING
- F24F—AIR-CONDITIONING; AIR-HUMIDIFICATION; VENTILATION; USE OF AIR CURRENTS FOR SCREENING
- F24F3/00—Air-conditioning systems in which conditioned primary air is supplied from one or more central stations to distributing units in the rooms or spaces where it may receive secondary treatment; Apparatus specially designed for such systems
- F24F3/12—Air-conditioning systems in which conditioned primary air is supplied from one or more central stations to distributing units in the rooms or spaces where it may receive secondary treatment; Apparatus specially designed for such systems characterised by the treatment of the air otherwise than by heating and cooling
- F24F3/16—Air-conditioning systems in which conditioned primary air is supplied from one or more central stations to distributing units in the rooms or spaces where it may receive secondary treatment; Apparatus specially designed for such systems characterised by the treatment of the air otherwise than by heating and cooling by purification, e.g. by filtering; by sterilisation; by ozonisation
- F24F3/163—Clean air work stations, i.e. selected areas within a space which filtered air is passed
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- E—FIXED CONSTRUCTIONS
- E04—BUILDING
- E04H—BUILDINGS OR LIKE STRUCTURES FOR PARTICULAR PURPOSES; SWIMMING OR SPLASH BATHS OR POOLS; MASTS; FENCING; TENTS OR CANOPIES, IN GENERAL
- E04H5/00—Buildings or groups of buildings for industrial or agricultural purposes
- E04H5/02—Buildings or groups of buildings for industrial purposes, e.g. for power-plants or factories
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F24—HEATING; RANGES; VENTILATING
- F24F—AIR-CONDITIONING; AIR-HUMIDIFICATION; VENTILATION; USE OF AIR CURRENTS FOR SCREENING
- F24F13/00—Details common to, or for air-conditioning, air-humidification, ventilation or use of air currents for screening
- F24F13/02—Ducting arrangements
- F24F13/0227—Ducting arrangements using parts of the building, e.g. air ducts inside the floor, walls or ceiling of a building
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F24—HEATING; RANGES; VENTILATING
- F24F—AIR-CONDITIONING; AIR-HUMIDIFICATION; VENTILATION; USE OF AIR CURRENTS FOR SCREENING
- F24F13/00—Details common to, or for air-conditioning, air-humidification, ventilation or use of air currents for screening
- F24F13/08—Air-flow control members, e.g. louvres, grilles, flaps or guide plates
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F24—HEATING; RANGES; VENTILATING
- F24F—AIR-CONDITIONING; AIR-HUMIDIFICATION; VENTILATION; USE OF AIR CURRENTS FOR SCREENING
- F24F13/00—Details common to, or for air-conditioning, air-humidification, ventilation or use of air currents for screening
- F24F13/08—Air-flow control members, e.g. louvres, grilles, flaps or guide plates
- F24F13/082—Grilles, registers or guards
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F24—HEATING; RANGES; VENTILATING
- F24F—AIR-CONDITIONING; AIR-HUMIDIFICATION; VENTILATION; USE OF AIR CURRENTS FOR SCREENING
- F24F13/00—Details common to, or for air-conditioning, air-humidification, ventilation or use of air currents for screening
- F24F13/28—Arrangement or mounting of filters
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F24—HEATING; RANGES; VENTILATING
- F24F—AIR-CONDITIONING; AIR-HUMIDIFICATION; VENTILATION; USE OF AIR CURRENTS FOR SCREENING
- F24F7/00—Ventilation
- F24F7/003—Ventilation in combination with air cleaning
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F24—HEATING; RANGES; VENTILATING
- F24F—AIR-CONDITIONING; AIR-HUMIDIFICATION; VENTILATION; USE OF AIR CURRENTS FOR SCREENING
- F24F7/00—Ventilation
- F24F7/04—Ventilation with ducting systems, e.g. by double walls; with natural circulation
- F24F7/06—Ventilation with ducting systems, e.g. by double walls; with natural circulation with forced air circulation, e.g. by fan positioning of a ventilator in or against a conduit
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F24—HEATING; RANGES; VENTILATING
- F24F—AIR-CONDITIONING; AIR-HUMIDIFICATION; VENTILATION; USE OF AIR CURRENTS FOR SCREENING
- F24F8/00—Treatment, e.g. purification, of air supplied to human living or working spaces otherwise than by heating, cooling, humidifying or drying
- F24F8/10—Treatment, e.g. purification, of air supplied to human living or working spaces otherwise than by heating, cooling, humidifying or drying by separation, e.g. by filtering
- F24F8/108—Treatment, e.g. purification, of air supplied to human living or working spaces otherwise than by heating, cooling, humidifying or drying by separation, e.g. by filtering using dry filter elements
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F24—HEATING; RANGES; VENTILATING
- F24F—AIR-CONDITIONING; AIR-HUMIDIFICATION; VENTILATION; USE OF AIR CURRENTS FOR SCREENING
- F24F11/00—Control or safety arrangements
- F24F11/0001—Control or safety arrangements for ventilation
- F24F2011/0002—Control or safety arrangements for ventilation for admittance of outside air
- F24F2011/0004—Control or safety arrangements for ventilation for admittance of outside air to create overpressure in a room
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Combustion & Propulsion (AREA)
- Mechanical Engineering (AREA)
- General Engineering & Computer Science (AREA)
- Architecture (AREA)
- Civil Engineering (AREA)
- Structural Engineering (AREA)
- Ventilation (AREA)
- Devices For Use In Laboratory Experiments (AREA)
Abstract
提供一種潔淨棚,其形成成為單向層流及均勻循環之氣流特性,能夠適用於ISO 3級至4級甚至更高清潔度,有利於提高產率、降低成本。本發明的高清潔度潔淨棚具備:(A)用於實現高清潔度環境之吹出構造;(B)用於使棚側壁成為均勻的循環路徑之雙壁構造;(C)用於減少由各種裝置產生之氣流的紊亂、滯留及揚塵之整流構造;以及(D)局部抽吸機構,這些藉由考慮了實際條件之(E)數值流體力學(CFD)設計。A cleanroom is provided that has unidirectional laminar airflow and uniform circulation characteristics, capable of achieving ISO Class 3 to Class 4 or even higher cleanliness, thereby improving productivity and reducing costs. The high-cleanliness cleanroom of the present invention comprises: (A) a blow-out structure for achieving a high-cleanliness environment; (B) a double-wall structure for forming a uniform circulation path on the side walls of the cleanroom; (C) a rectifying structure for reducing turbulence, stagnation, and dust emission in the airflow generated by various devices; and (D) a localized suction mechanism. These are designed using (E) numerical fluid dynamics (CFD) with consideration of actual conditions.
Description
本發明係有關一種在半導體製造工藝及有機EL顯示器(OLED)等顯示器的製造工藝中要求高清潔度之潔淨棚。The present invention relates to a clean room that requires high cleanliness in the manufacturing process of semiconductors and displays such as organic EL displays (OLEDs).
在半導體製造工藝和OLED等顯示器的製造工藝中,即使存在微量的灰塵等塵屑,亦會附著在正在製造中的產品上而導致產品缺陷,因此在要求高清潔度環境的區域局部性設置棚(以下稱為“潔淨棚”),並使潔淨棚內處於清潔狀態,以致力於提高產品質量和可靠性,並提高產率。In the manufacturing processes of semiconductors and displays such as OLEDs, even trace amounts of dust and other debris can adhere to the products being manufactured, causing product defects. Therefore, cleanrooms (hereinafter referred to as "cleanrooms") are locally installed in areas requiring a high-quality clean environment and are maintained in a clean state to improve product quality, reliability, and productivity.
潔淨棚的方式之一係層流方式,一邊以層流狀態沿一方向推動內部空氣,一邊排出塵屑。為了使空氣的流動大體從上向下流動,在頂棚的一部分形成由以HEPA(High Efficiency Particulate Air:高效率空氣微粒)過濾器或ULPA(Ultra Low Penetration Air:超低滲透空氣)過濾器為最終之風扇過濾單元(Fan Filter Unit,以下稱為FFU)構成之頂棚吹出部,及地板從由格柵等形成之(雙層地板)的開孔吸入空氣,流體連通於任意的導管或循環軸,通過潔淨棚外部周圍的通風道進行排氣/循環,並將該空氣進行溫度調節、除塵後再從頂棚吹出之下降氣流。這樣,藉由迅速排除在室內產生之塵屑並處理從設備和裝置發出之熱量,能夠將潔淨棚內保持成所希望的高清潔度和溫度。One way to clean a shed is laminar flow, which pushes the air inside in one direction in a laminar flow state while exhausting dust. To ensure that air flows generally from top to bottom, a ceiling outlet is formed in part of the ceiling, consisting of a fan filter unit (FFU) with a HEPA (High Efficiency Particulate Air) filter or ULPA (Ultra Low Penetration Air) filter as the final filter. Air is drawn into the floor through openings formed by grilles (double-layer floor), and the fluid is connected to an arbitrary duct or circulation shaft. It is exhausted/circulated through the ventilation duct around the outside of the clean room, and the air is temperature-controlled and dust-removed before being blown out of the ceiling as a downward airflow. This allows the cleanroom to be maintained at the desired high cleanliness and temperature by quickly removing dust generated indoors and handling heat generated by equipment and devices.
例如,在專利文獻1中揭示了將潔淨室的內部空間的一部分局部設定為高清潔度的局部潔淨棚。依專利文獻1,尤其將排氣口或導出路僅形成於局部潔淨棚的地板部的一部分上,設為單層構造等,藉此能夠降低構建成本。For example, Patent Document 1 discloses a partial clean room in which a portion of the interior space of a clean room is partially set to a high cleanliness level. According to Patent Document 1, exhaust vents or outlets are formed only on a portion of the floor of the partial clean room, forming a single-layer structure, thereby reducing construction costs.
[專利文獻1]日本專利第5513989號[Patent Document 1] Japanese Patent No. 5513989
在本發明中,“清潔度”係指例如潔淨室所採用的美國聯邦標準Federal STD-209E、國際標準ISO 14644-1、JIS標準JISB9920中的清潔度,為方便起見,根據ISO標準對清潔度進行說明。In the present invention, "cleanliness" refers to the cleanliness standards adopted by clean rooms, such as Federal STD-209E, ISO 14644-1, and JIS B9920. For convenience, the cleanliness standards are described based on the ISO standards.
在單向流的氣流方式的潔淨棚中,要求ISO 3級至4級甚至更高清潔度之情況下,要求在潔淨棚內形成成為均勻的下降氣流的氣流特性,以往,吹出部的過濾器佔有率(頂棚面積中所佔之FFU等過濾器面積的佔有率)至少需要70~80%以上,平均氣流速度需要0.3~0.5m/s。在此基礎上,將潔淨棚內設為正壓,藉由清潔空氣的層流的下降氣流,防止因潔淨棚的壁或簾子等的洩漏而導致之污染物質的流入,並迅速去除由潔淨棚內的人或裝置生成的塵屑。In cleanrooms with unidirectional airflow, ISO Class 3, 4, or even higher cleanliness levels are required. This requires a uniform downward airflow within the cleanroom. Conventionally, this requires a filter occupancy rate (the percentage of the FFU (Flying Fluid Unit) filter area within the ceiling area) of at least 70-80%, and an average airflow velocity of 0.3-0.5 m/s. Based on this, a positive pressure is maintained within the cleanroom, creating a laminar downward flow of clean air. This prevents the influx of contaminants due to leaks from the cleanroom walls and curtains, and rapidly removes dust generated by people and equipment within the cleanroom.
過濾器佔有率越接近100%,越容易形成相同的層流,因此有利於實現高清潔度,但在非常大的潔淨棚中,昂貴的FFU的數量增加,從而成本亦會增加。另一方面,若試圖減少FFU的數量,則因吹出部的過濾器佔有率不足而帶來過濾器之間或側壁部的滯留風險。The closer the filter occupancy rate is to 100%, the easier it is to achieve consistent laminar flow, thus helping to achieve high cleanliness. However, in very large cleanrooms, this increases the number of expensive FFUs, which in turn increases costs. On the other hand, attempting to reduce the number of FFUs increases the risk of stagnation between filters or on the side walls due to insufficient filter occupancy in the blow-out area.
此外,如後述的圖5的上下左圖(a)的以往技術所示,僅藉由一側側壁的返回而進行循環等循環路徑不均勻,或者在地板部的柵格上部存在偏流或滯留。如上,在以往技術中,實際上藉由基於單向層流的完全均勻的氣流填充潔淨棚並不容易。Furthermore, as shown in the upper and lower left images (a) of Figure 5, discussed later, the conventional technology results in an uneven circulation path, such as air returning only along one side of the wall, or air drift or stagnation occurs above the floor grille. As described above, filling a cleanroom with a completely uniform airflow based on unidirectional laminar flow is not easy with conventional technology.
又,在潔淨棚內設置裝置並運轉時,氣流發生紊亂,產生偏流之情況下,會進一步惡化,且滯留區域增加。很難基於裝置的配置預測或改善裝置實際運轉時的揚塵行為,推測滯留區域或滯留之時間,因此成為高成本。多數情況下,這些問題在現場運轉時變得明顯,氣流特性的惡化可能成為清潔度惡化的根本原因。Furthermore, when the equipment is installed and operating within the cleanroom, airflow becomes turbulent, creating biased flow, which further deteriorates and increases the number of stagnant areas. Predicting or improving the dust emission behavior during actual operation based on the equipment's configuration is difficult, and estimating the stagnant areas and duration is costly. In many cases, these issues become apparent during field operation, and deteriorating airflow characteristics can become the root cause of the deterioration in cleanliness.
專利文獻1中揭示的局部潔淨棚內的局部空間的清潔度維持在10級(相當於Federal STD-209E、ISO 4級)左右。然而,在單向層流的氣流方式的潔淨棚中,實際上,如上所述,存在安裝困難和成本的問題,並且在實際機器運轉中存在很多問題,因此難以滿足ISO 3級至4級的標準甚至難以實現比其更高的清潔度。The cleanliness level of the local space within the local cleanroom disclosed in Patent Document 1 is maintained at approximately Class 10 (equivalent to Federal STD-209E, ISO Class 4). However, cleanrooms using unidirectional laminar airflow, as mentioned above, face installation difficulties and cost issues, as well as numerous problems in actual machine operation. Therefore, it is difficult to meet ISO Class 3 to 4 standards, or even achieve higher cleanliness levels.
鑑於上述實際情況,本發明的主要課題為提供一種潔淨棚,其能夠適用於ISO 3級至4級甚至更高清潔度,形成成為單向層流及均勻循環之氣流特性,藉由迅速減少內部裝置及其運轉中產生之揚塵及滯留而有助於提高產率,並且與以往相比將成為成本增加的主要原因之一之FFU的佔有率最大削減50%,藉此有利於降低成本。In view of the above-mentioned practical situation, the main subject of the present invention is to provide a clean room that is suitable for ISO Class 3 to Class 4 or even higher cleanliness, and forms a unidirectional laminar airflow and uniform circulation airflow characteristics. By quickly reducing the dust and stagnation generated by the internal devices and their operation, it helps to improve productivity. Compared with the past, the occupancy rate of FFUs, which is one of the main reasons for cost increases, can be reduced by up to 50%, thereby helping to reduce costs.
為了解決如上問題,本發明的潔淨棚具有以下(A)~(E)的構成。 (A)FFU的過濾器佔有率70%以下,過濾器間隔500mm以下(較佳為300mm以下),下部200mm以內(較佳為下部100mm)設為整面沖孔板(開口率20~40%)的100%的整面整流機構 (B)為了使整體潔淨棚的氣流循環均勻,將至少兩面以上的側壁雙層化(間隙~200mm),不需要開孔的地板且抑制偏流之均勻循環機構 (C)設置用於減少由裝置產生之旁路(在生產線設備中的材料的通道、在工藝區域中的實質上重要的位置)上的氣流的紊亂、捲揚、剝離、渦流生成等的偏流和/或滯留之裝置附帶的整流/導風機構 (D)用於避免/減少由裝置及其運轉產生之旁路周圍的揚塵和氣流的紊亂的局部抽吸機構 (E)如上所述,利用考慮了實際條件之數值流體力學(CFD:計算流體動力學)執行整體空間(A)/(B)、裝置周圍空間(C)、局部空間(D)的階段性設計,在要求ISO 3級至4級區域(主要為旁路)中,向下速度設為0.3m/s左右,空氣齡(當吹出位置設為0s時到達空間內每個位置所需的時間)設為理論值的3倍以下,潔淨棚內正壓設為20~40Pa 藉由以上構成,能夠提供穩定之高清潔度空間。 [發明效果] To address the above issues, the cleanroom of the present invention has the following configurations (A) to (E). (A) A fully regulated airflow mechanism with a filter occupancy ratio of less than 70% for the FFUs, a filter spacing of less than 500mm (preferably less than 300mm), and a perforated plate (opening ratio of 20-40%) within the lower 200mm (preferably 100mm). (B) To ensure uniform airflow throughout the cleanroom, at least two or more side walls are double-layered (with a gap of 200mm or less). This eliminates the need for a perforated floor and prevents skewed airflow. (C) Installation of a rectifying/air-guiding mechanism attached to the device to reduce airflow turbulence, swirl, separation, vortex generation, and/or stagnation in bypasses (material passages within production line equipment, or at materially significant locations within process areas) generated by the device. (D) Installation of a localized suction mechanism to prevent/reduce dust and airflow turbulence around bypasses generated by the device and its operation. (E) As described above, numerical fluid dynamics (CFD) taking into account actual conditions is used to perform a phased design of the overall space (A)/(B), the space surrounding the device (C), and the local space (D). In the case of ISO requirements, In Level 3 and 4 areas (primarily bypass), the downward velocity is set to approximately 0.3 m/s, the air age (the time required to reach each location in the space when the air is blown out at 0 seconds) is set to less than three times the theoretical value, and the positive pressure within the cleanroom is set to 20-40 Pa. This configuration provides a stable, high-quality cleanroom. [Effects of the Invention]
本發明的高清潔度潔淨棚能夠抑制在以往技術中容易產生之空間內的偏流或速度的偏差,尤其能夠避免成為滯留產生原因之無風狀態(≈0m/s)或成為氣流的紊亂和渦流產生原因之過度的氣流速度增加(超過0.5m/s),從而能夠使旁路附近的氣流均勻化(平均氣流速度0.3m/s左右)。The high-definition cleanroom of the present invention can suppress the deviation of airflow or velocity within the space that is easily generated by the previous technology. In particular, it can avoid the windless state (≈0m/s) that causes stagnation or the excessive increase of airflow velocity (over 0.5m/s) that causes airflow turbulence and eddy currents, thereby making the airflow near the bypass uniform (average airflow velocity of approximately 0.3m/s).
又,利用空氣齡(滯留時間)的數值分析(被動標量輸送方程式),將裝置周圍的空氣齡實施為理想下降氣流的3倍以下的有限值,因此能夠排除且最小化在以往技術中難以考慮的旁路上由裝置引起之塵屑的存在。同樣,能夠提供一種潔淨棚,其藉由將滯留在整體棚空間之時間定為有限值,具有自清潔度惡化中快速恢復等自清潔作用。Furthermore, by utilizing numerical analysis of air age (retention time) (using the passive scalar transport equation), the air age around the device is limited to a value less than three times the ideal downflow. This eliminates and minimizes the presence of device-generated dust in bypass paths, which was previously difficult to account for. Similarly, by limiting the retention time within the entire space, a cleanroom can be provided that exhibits self-cleaning properties, such as rapid recovery from deterioration in cleanliness.
藉此,在潔淨棚內形成單向層流及成為均勻循環之氣流特性,迅速降低內部裝置及其運轉中的揚塵及滯留風險,確保空間(重要區域,主要為旁路附近)的穩定之高清潔度。此外,還有助於降低潔淨棚內的溫度/濕度等的偏差。This creates a unidirectional laminar flow and uniformly circulating airflow within the cleanroom, rapidly reducing the risk of dust and stagnation from internal devices and their operation, ensuring stable, high-quality cleanliness within the space (critical areas, primarily near bypasses). It also helps reduce variations in temperature and humidity within the cleanroom.
以下,利用附圖對用於實施本發明的形態進行說明。再者,本發明並不限定以下實施例。Hereinafter, the embodiments of the present invention will be described with reference to the accompanying drawings.
圖1係本發明之潔淨棚的縱剖面圖。潔淨棚1例如即使在潔淨室內亦要求高清潔度的情況等下設置,藉由利用劃分構件(隔板、垂壁等)進行劃分而形成。以下,對本發明之潔淨棚的構成(A)~(E)進行說明。Figure 1 is a longitudinal cross-sectional view of the cleanroom of the present invention. Cleanroom 1 is installed, for example, when high cleanliness is required even within a cleanroom. It is formed by partitioning using partitioning members (partitions, vertical walls, etc.). The following describes the components (A) to (E) of the cleanroom of the present invention.
(A)FFU的過濾器佔有率70%以下,過濾器間隔500mm以下(較佳為300mm以下),下部200mm以內(較佳為下部100mm)設為整面沖孔板(開口率20~40%)的100%的整面整流機構(A) The filter occupancy rate of the FFU is less than 70%, the filter interval is less than 500mm (preferably less than 300mm), and the lower part is within 200mm (preferably 100mm) and is set as a 100% full-surface rectifier with a perforated plate (opening rate 20-40%).
在潔淨棚1的頂棚中,作為空氣清潔機構2,並列設置有複數個具有高密度的ULPA過濾器之FFU,藉由該FFU,能夠將潔淨棚內維持高清潔度。藉由改變FFU的設置位置或數量,能夠與不同寬度的空間對應。FFU的具體構造或循環次數為任意,在本發明的吹出部的機構中,以平均氣流速度為基準考慮。再者,本發明並不限定於FFU,可以設置其他空氣清潔機構。On the ceiling of the cleanroom 1, multiple FFUs equipped with high-density ULPA filters are installed side by side as air cleaning mechanism 2. These FFUs maintain high cleanliness within the cleanroom. By varying the location and number of FFUs, the system can accommodate spaces of varying widths. The specific configuration and number of FFUs are optional; however, the blow-out mechanism of the present invention uses the average airflow velocity as a benchmark. Furthermore, the present invention is not limited to FFUs; other air cleaning mechanisms can be installed.
如上述,在以往技術中,為了實現ISO 3級至4級、甚至更高清潔度,FFU的過濾器佔有率在吹出部中至少需要70~80%以上。剩餘的20~30%成為FFU的吹出口的框架框或設置空白。As mentioned above, in order to achieve ISO Class 3 to 4 or even higher cleanliness, the filter of the FFU must occupy at least 70-80% of the air outlet. The remaining 20-30% becomes the frame of the FFU air outlet or is set as blank.
FFU的氣流速度一般在0.1~0.7m/s的範圍內,未成為相同的氣流特性的情況下,潔淨棚內的氣流發生紊亂,成為飛揚塵屑之原因。另一方面,ISO 3級至4級的單向流的氣流方式中的平均氣流速度需要0.3~0.5m/s作為相同的吹出。因此,為了整流化或降低過濾器佔有率,在FFU的吹出口設置沖孔板,擴大吹出面積後,使從FFU吹出的被淨化之空氣擴散到周圍。The airflow velocity of an FFU is generally in the range of 0.1 to 0.7 m/s. Without uniform airflow characteristics, the airflow within the cleanroom becomes turbulent, causing dust to fly. Meanwhile, the average airflow velocity in ISO Class 3 and 4 unidirectional airflow systems requires a uniform airflow of 0.3 to 0.5 m/s. Therefore, to achieve uniform airflow or reduce the filter occupancy rate, a perforated plate is installed at the FFU's air outlet to expand the airflow area and diffuse the purified air blown out from the FFU into the surrounding area.
沖孔板的開口率為30%左右,起到暫時阻擋氣流、從開口部向周圍吹出氣流之整流化的作用。作為一般的FFU的機構,沒有該沖孔板,或在端面存在安裝用設置空白的沖孔板,或者FFU與沖孔板為一體型,在任何情況下,用於設置FFU自身或沖孔板一體型的單元的框架框端部或設置空白部分的框架等佔過濾器佔有率的剩餘20~30%。The perforated plate has an opening ratio of approximately 30%, temporarily blocking the airflow and rectifying the airflow that is blown out from the opening to the surrounding area. In a typical FFU structure, there is no perforated plate, or there is a perforated plate with a blank space for installation on the end face, or the FFU and perforated plate are integrated. In any case, the frame ends or the blank space used to install the FFU itself or the perforated plate in the integrated unit account for the remaining 20-30% of the filter's occupancy.
如上,以往,即使過濾器佔有率為70~80%,無論吹出部有無沖孔板,剩餘的20~30%為用於並列設置複數個FFU之框架框或設置空白,因此在該部分沒有進行整流,從而作為吹出設計不充分。因此,若為通常從事清潔設計之技術人員,則從潔淨棚內部看到頂棚時,考慮為何將可以看到框架框或設置空白之部分限制在20%以內。As mentioned above, in the past, even if the filter occupies 70-80%, regardless of whether the blow-out area has a perforated plate, the remaining 20-30% is used for the frame frame or blank space for juxtaposing multiple FFUs. Therefore, there is no rectification in this area, making it an inadequate blow-out design. Therefore, if a technician who usually works in clean room design considers the reason why the visible frame frame or blank space is limited to 20% when looking at the ceiling from the inside of the clean room,
另一方面,在本發明中,將FFU的過濾器佔有率降低到70%以下,例如50~60%,與以往技術相比,將FFU的台數最大削減50%。如上述,若試圖減少FFU的數量,則因吹出部的過濾器佔有率不足而帶來過濾器之間或側壁部的滯留風險。因此,在本發明中,僅將FFU先安裝於頂棚。在設置在頂棚之FFU的下部100mm(從設置於頂棚之FFU朝向地板面下方100mm)整面施工沖孔板3(開口率20~40%)。沖孔板經過整面開孔加工,使設置框架成為最小寬度,或者連該框架亦取消而設為幾乎100%的整面整流機構。On the other hand, in the present invention, the filter occupancy rate of the FFU is reduced to below 70%, for example, to 50-60%, and the number of FFUs is reduced by a maximum of 50% compared to conventional technologies. As mentioned above, if the number of FFUs is attempted to be reduced, the insufficient filter occupancy rate of the blow-out section will bring about the risk of stagnation between filters or on the side walls. Therefore, in the present invention, the FFU is only installed on the ceiling first. A perforated plate 3 (with an opening rate of 20-40%) is constructed on the entire surface 100mm below the FFU installed on the ceiling (100mm below the floor surface from the FFU installed on the ceiling). The perforated plate is processed with holes on the entire surface to minimize the width of the installation frame, or even the frame is eliminated to create an almost 100% full-surface rectification mechanism.
具體而言,在安裝FFU時,雖然放置框架或面板,但在其間設置100mm高度的長螺栓或螺母,以在FFU的設置框架和沖孔面上設置100mm的間隙之狀態進行固定。藉此,FFU和沖孔面被分離,框架不會在沖孔面上移動,在整面完成了沖孔面。其結果,即使過濾器佔有率為50~60%,亦能夠實現100%的整流化。Specifically, when installing the FFU, a frame or panel is placed, but 100mm long bolts or nuts are placed between them, securing the FFU with a 100mm gap between the frame and the punched surface. This separates the FFU from the punched surface, preventing the frame from moving on the punched surface, and ensuring a consistent punched surface. As a result, even with a filter occupancy rate of 50-60%, 100% rectification can be achieved.
此外,關於FFU2、沖孔板3的安裝進行詳細說明。安裝FFU2時,與沖孔板3分離,因此需要不會惡化清潔度的安裝步驟。首先,可以舉出在設置FFU2之框架上沒有與頂棚連通之間隙,具體而言,作為材質使用不會揚塵的墊圈(襯墊)、例如EPDM(三元乙丙橡膠),以便將設置部密封在鋁型材或鋼板等框架上。接著,重新對用於安裝沖孔板3的螺栓或螺母、已設置的框架及沖孔板3進行仔細清潔清掃。其原因在於,設置被分離之FFU2與沖孔板3後,難以實施清掃,對確保吹出構造的質量來說是必需的。又,該整流用沖孔板3預先實施去毛刺、脫脂處理、整面開孔加工,根據適當尺寸進行防止撓曲的彎曲加工等。將這些沖孔板3組裝到預先準備好的安裝孔時,不允許沖孔板3之間的間隙,以1mm以下等最小限度的間隙固定排列。關於產生間隙之部分,設有堵板。藉由這種方式,從潔淨棚內部,頂棚面成為以相同的開孔加工實施之整面沖孔面,以完善吹出部的整流化機構。又,頂棚面為整面沖孔面的情況下,有時在該面的任一位置上安裝照明、報知器、感測器、防墜落機構等門窗。這些安裝位置基本上設置、排列在潔淨棚的兩端,在旁路上方不安裝由氣流紊亂引起之門窗。The installation of the FFU 2 and perforated plate 3 is explained in detail. When installing the FFU 2, it is separated from the perforated plate 3, so cleanliness must be maintained. First, ensure that there are no gaps between the frame on which the FFU 2 is installed and the ceiling. Specifically, use a dust-proof gasket (liner), such as EPDM (ethylene propylene diene monomer), to seal the installation area against the frame, such as aluminum profiles or steel plates. Next, thoroughly clean the bolts and nuts used to install the perforated plate 3, as well as the installed frame and perforated plate 3. The reason is that after the separated FFU2 and punching plate 3 are installed, it is difficult to clean them, which is necessary to ensure the quality of the blowing structure. In addition, the punching plate 3 for rectification is pre-deburred, degreased, and processed with holes on the entire surface, and is bent according to the appropriate size to prevent warping. When these punching plates 3 are assembled into pre-prepared mounting holes, no gaps between the punching plates 3 are allowed, and they are fixedly arranged with a minimum gap of less than 1 mm. A blocking plate is provided for the portion where the gap occurs. In this way, from the inside of the clean shed, the top surface becomes a full-surface punching surface implemented with the same hole processing to complete the rectification mechanism of the blowing part. In addition, if the roof surface is a fully perforated surface, lighting, alarms, sensors, anti-fall mechanisms, doors and windows are sometimes installed at any position on the surface. These installation locations are basically set and arranged at the two ends of the clean room. Doors and windows that cause air turbulence are not installed above the bypass.
以往技術中用於FFU之沖孔板一體型機構與本發明的不同點為,FFU的過濾面與沖孔面之間的間隔窄,稍微增加了吹出面積。再者,下部設為100mm,但並不限定於此,可以設為150mm或200mm。若FFU與沖孔面的間隔長,則容易整流,但另一方面,由於設置潔淨棚內部的裝置之空間的容積減少,因此期望將200mm作為上限。The difference between the perforated plate-type FFU used in conventional technology and the present invention is that the gap between the FFU's filter surface and the perforated surface is narrower, slightly increasing the airflow area. Furthermore, the lower portion is set at 100mm, but this is not limited to this and can be set to 150mm or 200mm. A longer gap between the FFU and the perforated surface facilitates flow regulation, but on the other hand, it reduces the space available for equipment inside the cleanroom, so a 200mm upper limit is desirable.
又,在本發明中,將舖滿頂棚之FFU的過濾器的間隔設置為300mm以下。雖然過濾器間隔以300mm以下為基本,但是為了在非常寬的頂棚區域將過濾器佔有率設為70%以下,在設計上,例如,藉由墻壁和FFU的間隔或FFU自身的大小、過濾器間的調整等,有可能在一部分擴寬為400~500mm。若過濾器間較寬,則氣流的變動及偏差會變大,在沖孔面上使氣流速度的時間及空間變動穩定這一點上,由於沖孔板的開口率及下降氣流的均勻化等的調整較難,因此期望以不超過500mm的間隔安裝。Furthermore, in the present invention, the spacing between filters in the FFUs that fill the ceiling is set to 300mm or less. Although the filter spacing is 300mm or less as a basic rule, in order to keep the filter occupancy rate below 70% in very wide ceiling areas, it is possible to expand the width to 400-500mm in some areas based on design considerations, such as the spacing between the wall and the FFUs, the size of the FFUs themselves, and the spacing between filters. If the filter space is wide, the airflow fluctuation and deviation will become larger. In order to stabilize the temporal and spatial fluctuations of the airflow velocity on the perforated surface, it is difficult to adjust the opening rate of the perforated plate and the uniformity of the downward airflow. Therefore, it is expected that the filters should be installed at intervals of no more than 500mm.
依此,在實際應用中,例如,在將FFU的吹出溫度調溫到23攝氏度左右(之後,溫度均設為“攝氏度”)之狀態下,被除塵之高清潔度空氣通過沖孔板,在裝置周圍和旁路上,以0.1~0.5m/s,更佳為0.3~0.4m/s的平均氣流速度向下方供給。Accordingly, in actual application, for example, when the outlet temperature of the FFU is adjusted to about 23 degrees Celsius (thereafter, the temperature is set to "degrees Celsius"), the high-purity air to be dust-removed passes through the perforated plate and is supplied downward around the device and in the bypass at an average airflow speed of 0.1 to 0.5 m/s, preferably 0.3 to 0.4 m/s.
除了用於實現上述清潔度環境之吹出構造之外,藉由後述的基於(B)雙重壁構造之均勻循環,在整體潔淨棚中形成成為單向層流以及均勻循環之氣流特性,並藉由後述的以機器、裝置為中心之(C)中央部的整流或(D)局部排出,即使過濾器佔有率較以往最多減少50%,亦能夠適用於ISO 3級至4級甚至更高清潔度。In addition to the blow-out structure used to achieve the aforementioned cleanliness, the uniform circulation based on the double-wall structure (B) described later creates unidirectional laminar flow and uniform circulation throughout the cleanroom. Furthermore, through the central rectification (C) or local exhaust (D) centered around the equipment and devices described later, even with a filter ratio reduced by up to 50% compared to conventional systems, ISO Class 3 to 4 cleanliness levels, or even higher, can be achieved.
再者,在圖1中,將頂棚與FFU的空氣吸入部的間隙設為500mm,但並不限於此,為了避免頂棚與FFU的空氣吸入部的間隙為極端的負壓、風量降低以及溫度等的混合不足,期望確保在200mm以上,更較佳為300mm以上。Furthermore, in Figure 1, the gap between the ceiling and the air intake of the FFU is set to 500mm, but it is not limited to this. In order to avoid the gap between the ceiling and the air intake of the FFU being extremely negative, resulting in reduced air volume and insufficient mixing of temperature, it is expected to ensure that it is above 200mm, and more preferably above 300mm.
又,將FFU過濾器佔有率設為70%以下,例如設為50~60%,但是若過濾器佔有率低於40%,需要加大吹出部氣流速度,容易產生偏差,難以實現100%整面整流機構。因此,為了作為吹出構造不產生0.5m/s以上的過度的氣流速度,過濾器佔有率設為至少40%以上,較佳為50%以上。如上所述,在以往技術中,過濾器佔有率至少需要70~80%以上,過濾器佔有率為70%以下時,難以適用於ISO 3級至4級甚至更高的高清潔度,但是,藉由使用本發明的技術,能夠以過濾器佔有率40%以上且70%以下實現高清潔度。Furthermore, the FFU filter occupancy rate is set below 70%, for example, to 50-60%. However, if the filter occupancy rate is less than 40%, the airflow velocity in the blow-out section needs to be increased, which easily causes deviations and makes it difficult to achieve a 100% full-surface straightening mechanism. Therefore, in order to avoid excessive airflow velocities exceeding 0.5 m/s as a blow-out structure, the filter occupancy rate is set to at least 40%, preferably at least 50%. As mentioned above, in previous technologies, the filter occupancy rate must be at least 70-80%. When the filter occupancy rate is below 70%, it is difficult to achieve high cleanliness of ISO Class 3 to 4 or even higher. However, by using the technology of the present invention, high cleanliness can be achieved with a filter occupancy rate of at least 40% and below 70%.
(B)為了使整體潔淨棚的氣流循環均勻,將至少兩面以上的側壁雙層化(間隙~200mm),不需要開孔的地板且抑制偏流之均勻循環機構(B) In order to make the airflow circulation uniform throughout the clean room, at least two or more side walls should be double-layered (gap ~ 200mm), and a uniform circulation mechanism that does not require a perforated floor and suppresses biased airflow should be used.
以往,藉由在潔淨棚的地板上舖滿格柵或沖孔金屬板等開孔地板,形成複數個通風口,並且經由該開孔地板形成底層。如上,地板成為高架地板(雙層地板)。在潔淨棚外部周圍,形成將從複數個通風口流出到底層之空氣引導至FFU的通風道(返回道)。從潔淨棚流出到底層之氣流流入到形成在底層壁上之返回口,通過與潔淨棚內部分開劃分之潔淨棚外部周圍的通風道進行循環,並通過FFU。藉由利用FFU形成之循環氣流,形成從潔淨棚的頂棚朝向地板之下降氣流。Conventionally, the floor of a cleanroom is covered with perforated flooring, such as grating or perforated metal, to create multiple vents, and a base layer is formed through this perforated flooring. This creates a raised floor (double-layer floor). Around the outside of the cleanroom, a duct (return duct) is formed to guide the air flowing out of the multiple vents to the base layer to the FFUs. The airflow from the cleanroom to the base layer flows into the return port formed on the base wall, circulates through the duct surrounding the cleanroom exterior, which is separated from the inside of the cleanroom, and passes through the FFUs. The circulating airflow created by the FFUs creates a downward airflow from the ceiling of the cleanroom toward the floor.
在一般的潔淨棚中,藉由過濾器在潔淨棚的內部與外部產生一定的壓力差。因此,通過過濾器後的氣流的氣流速度在潔淨棚的整體頂棚幾乎均等化。為了提高潔淨棚的清潔度,使氣流在潔淨棚的內部與外部之間循環,在潔淨棚內揚塵之塵屑立即排出到潔淨棚外為較佳。藉由下降氣流,能夠立即去除在潔淨棚內揚塵之塵屑,但實際上,藉由裝置的設置或運轉,在局部形成清潔度低的區域(滯留等)。尤其,在無塵室內氣流滯留之區域中,由塵屑引起之污染加劇,因此需要調整氣流以避免產生氣流滯留之區域。In a typical cleanroom, filters create a pressure difference between the interior and exterior of the cleanroom. Consequently, the airflow velocity of the air passing through the filters is nearly uniform across the entire ceiling. To improve cleanroom cleanliness, it's ideal to circulate air between the interior and exterior, allowing dust and debris inside the cleanroom to be immediately discharged outside. While downward airflow can immediately remove dust and debris inside the cleanroom, in reality, the placement and operation of this device can create areas of low cleanliness (such as stagnation). In particular, in areas of stagnant airflow within a cleanroom, contamination caused by dust increases, and therefore airflow needs to be adjusted to avoid areas of stagnant airflow.
在本發明中,藉由將覆蓋潔淨棚1之壁面設為由內壁4和外壁5構成之雙重壁構造,將潔淨棚1的至少兩面以上的側壁雙重化。壁之間的間隙的上限為200mm,較佳為100~200mm,在壁彼此的間隙中形成空間。在潔淨棚的側壁上,內壁4採用鋁型材,一般為將PVC面板,在防爆區域中為將SUS面板等從潔淨棚內側安裝在鋁型材上,構成內壁無凹凸的潔淨棚,在其下部靠近地板面的部分,以利用調節器打開距地板100~200mm的間隙之狀態設置吸入口。從該吸入口吸入潔淨棚內的空氣,通過與由隔熱面板構成之外壁5之間的間隙在上方形成返回道,使潔淨棚內的空氣向FFU2循環,藉此使雙重壁的間隙充滿通過旁路後的空氣。藉此,將潔淨棚的至少兩面以上的側壁設為均勻的循環路徑。再者,本構成在內壁4的短邊(寬度)為6500mm以下(較佳為5000mm以下)的情況下實現,關於長邊(長度方向的長度)的尺寸沒有特別要求。In the present invention, the wall covering the clean shed 1 is constructed as a double-wall structure consisting of an inner wall 4 and an outer wall 5, thereby duplexing at least two or more of the side walls of the clean shed 1. The upper limit of the gap between the walls is 200 mm, preferably 100-200 mm, and a space is formed in the gap between the walls. On the side walls of the clean shed, the inner wall 4 is made of aluminum profiles, generally PVC panels. In explosion-proof areas, SUS panels are installed on the aluminum profiles from the inside of the clean shed to form a clean shed with smooth inner walls. In the lower part near the floor, an air inlet is provided, which is opened by a regulator to a gap of 100-200 mm from the floor. Air from the cleanroom is drawn in through this intake port and forms a return path upward through the gap between the outer wall 5, which is constructed of insulating panels. This allows the air inside the cleanroom to circulate to the FFU 2, thereby filling the gap between the double-walled walls with air that has bypassed the bypass. This creates a uniform circulation path along at least two of the cleanroom's sidewalls. Furthermore, this configuration is achieved with the short side (width) of the inner wall 4 being no greater than 6500 mm (preferably no greater than 5000 mm), and there are no specific requirements for the long side (length).
關於該雙重壁構造所附帶之門窗等,基本上安裝於不阻礙下降氣流的位置。例如正壓阻尼器,在以往技術中一般設置在潔淨棚上方的側壁上,在剛吹出後可能會產生向正壓阻尼器的偏流或流動路徑,另一方面,在本發明中,由於安裝在雙重壁的外壁5上,因此不會產生偏流等。關於門,基本上內壁4及外壁5均設於同一位置,外壁5為拉門,內壁4為絞鏈門。進入時,兩扇門暫時處於同時打開狀態,但由於潔淨室內有充分的正壓,並且係均勻循環構造,因此清潔度迅速恢復。內壁4的門並不是必須的,可以取下構成為內壁的面板進入。The doors and windows attached to the double-wall structure are generally installed in locations that do not obstruct the downward airflow. For example, positive pressure dampers, typically installed on the sidewall above the cleanroom in conventional technology, can cause deflection or flow paths toward the dampers immediately after air is blown out. However, in the present invention, these are installed on the outer wall 5 of the double-wall structure, eliminating this deflection. Regarding the doors, the inner and outer walls 4, 5, are generally located in the same position. The outer wall 5 is a sliding door, while the inner wall 4 is a hinged door. Upon entry, both doors are temporarily opened simultaneously. However, due to the sufficient positive pressure within the cleanroom and the uniform circulation structure, cleanliness is quickly restored. The door of the inner wall 4 is not necessary, and the panel constituting the inner wall can be removed for entry.
又,當潔淨棚與其它潔淨棚連接之情況下,內壁4及外壁5均在同一位置設有連接口。此時,雙重壁構造的間隙設有隔板等通道,以與循環空氣劃分。關於與窗、維修口、配線面板以及空調等連接之凸緣,由於安裝在外壁5上,因此在下降氣流區域的內壁4上,如擾亂氣流的門窗為最小限度,關於報知器、各種感測器,亦盡量避免設置在旁路上。Furthermore, when the shed is connected to other sheds, both the inner and outer walls 4, 5, are equipped with connection ports at the same location. In this case, the gaps between the double-walled structures are provided with partitions and other channels to separate the circulating air. Flanges connecting windows, maintenance hatches, wiring panels, and air conditioners are mounted on the outer wall 5. Therefore, the presence of doors and windows on the inner wall 4, in the downdraft area, that could disrupt airflow, is minimized. Alarms and various sensors are also avoided as much as possible in bypass paths.
關於內壁4的氣密性,施工成避免擾亂氣流之縫隙或縫隙等開口,沒有向與外壁5的壁彼此的縫隙的漏出,下降氣流形成至下方。關於外壁5,對於以鋁等為材質安裝之地板軌道,利用內襯等適當調整水平對齊後,依序在側面、頂棚密集排列以防靜電鋼板為外板之隔熱不燃面板。面板彼此的接縫藉由以矽等為材質之填縫來密封。關於外壁5的氣密性,密封成將與地板的接縫及面板彼此的接縫充分填縫,以使內部壓力至少能夠承受50Pa以上。The inner wall 4 is constructed to ensure airtightness, avoiding any gaps or openings that could disrupt airflow. This prevents leakage into the gaps between the inner wall and the outer wall 5, ensuring downward airflow. Regarding the outer wall 5, the floor rails, which are installed using materials such as aluminum, are properly aligned horizontally using inner liners. Then, densely packed with anti-static steel plates, non-combustible panels, are installed on the sides and ceiling. The joints between the panels are sealed using caulking materials such as silicone. The outer wall 5 is sealed airtight by fully caulking the joints with the floor and between the panels to ensure an internal pressure of at least 50 Pa.
藉由基於FFU2之空氣的吹入,潔淨棚1內成為正壓,頂棚內的FFU2的空氣吸入部成為負壓,因此雙重壁的間隙空間的壓力與潔淨棚內等同或較低。藉此,潔淨棚內的氣密性能變高,從而能夠確實地防止空氣從潔淨棚的外部流入內部。又,藉由提高劃分性能和氣密性能,能夠抑制外部氣量及內部循環風量的增加,從而能夠實現降低運行成本。The air blown in by FFU2 creates a positive pressure inside cleanroom 1, while the air intake of FFU2 in the ceiling becomes negative. Consequently, the pressure in the interstitial space between the double walls is equal to or lower than that inside the cleanroom. This improves the airtightness within the cleanroom, reliably preventing air from flowing into the cleanroom from outside. Furthermore, by improving compartmentalization and airtightness, increases in both external air volume and internal circulation air volume can be suppressed, thereby reducing operating costs.
再者,雙重壁的間隔的上限設為200mm,但並不限於此,例如在想要將雙重壁的間隙作為人的導線之情況等,可以根據設計條件適當地變更為200mm以上。但是,間隙越大,整體潔淨棚越大,或潔淨棚內部的容積越減小。又,雖然在圖1中將壓力損失設為100Pa以下,但並不限於此,因為與FFU2的風量及風扇的溫度上升有關,所以可根據FFU2的規格來決定。此外,不限於四邊形的潔淨棚,即使係多邊形的潔淨棚中,亦將至少兩面以上的側壁作為雙重壁。Furthermore, the upper limit of the double-wall spacing is set at 200mm, but this is not limited to this. For example, if the gap between the double walls is intended to serve as a guide for people, it can be appropriately increased to 200mm or more depending on design conditions. However, a larger gap increases the overall size of the cleanroom, or the volume within the cleanroom decreases. Furthermore, while the pressure loss is set to 100Pa or less in Figure 1, this is not a limitation. This is related to the air volume of FFU2 and the temperature rise of the fan, and can be determined based on the specifications of FFU2. Furthermore, not only in quadrilateral cleanrooms, but even in polygonal cleanrooms, at least two or more side walls should be double-walled.
在專利文獻1中,設置有使僅在局部潔淨棚的地板面的一部分上形成之排氣口或導出路導出之空氣向一般空間的上部回流之回流路。回流路在局部潔淨棚的長度方向的端部上,構成為與導出路連通之導管,通過局部潔淨棚的側方,形成為到達一般空間的頂棚附近,因此向頂棚開放,而並不完全像本發明成為雙重壁。Patent Document 1 provides a return path for returning air discharged from an exhaust port or duct formed only on a portion of the floor of the partial clean room to the upper portion of the general space. The return path is formed as a duct at the longitudinal end of the partial clean room, connected to the duct. It passes through the side of the partial clean room and reaches near the ceiling of the general space. Therefore, it is open to the ceiling and does not form a complete double wall like the present invention.
以往,由光柵或沖孔金屬板等開孔的地板構成而整體地板部設為雙重地板,並且將空氣與潔淨棚中的塵屑一起從地板的開孔引入到地板下的空間以形成向下的氣流,然而,這亦限制了地板下空間的應用。在本發明中,藉由在比旁路更下方設置均勻吸入之循環構造(雙重壁),不需要開孔的地板等,亦不需要如以往技術那樣設為雙重地板,還不需要如專利文獻1那樣將排氣口及導出路形成為地板部的一部分,因此能夠進一步降低建設成本,節省空間,並能夠增加清潔空間的容積。Conventional systems have used perforated floors, such as gratings or perforated metal plates, with the entire floor section formed as a double floor. Air, along with dust from the cleanroom, is drawn through the floor openings into the underfloor space, creating a downward airflow. However, this also limits the application of the underfloor space. In the present invention, by providing a uniformly drawn circulation structure (double wall) below the bypass, perforated floors are no longer necessary, nor is the double floor required in conventional systems. Furthermore, there is no need to form exhaust vents and outlets as part of the floor section, as in Patent Document 1. This further reduces construction costs, saves space, and increases the volume of the cleanroom.
圖2係比較藉由樹脂流體力學(CFD)分析之(a)以往技術與(b)本發明的空氣速度的流線之圖。在圖2中,上圖係潔淨棚的縱剖面圖,下左圖係俯視圖,下右圖係立體圖。傾斜的流動為偏流。如用橢圓包圍,在以往技術中,在地板面的返回口產生偏流而成為不均勻的循環,而本發明中將其減少,藉由上述(A)及(B)的構成,形成均勻的下降氣流和均勻的循環。該方法構成如下組合機構,亦即,著眼於在整體潔淨棚中將作為流體的變形運動的三個要素之伸縮、旋轉、剪切的效果均最小化,作為將成為流體的運動量輸送的基礎之對流及擴散中的對流效果成功地帶來優勢。Figure 2 compares the air velocity streamlines of (a) the conventional technology and (b) the present invention, analyzed using resin fluid dynamics (CFD). In Figure 2, the top figure is a longitudinal cross-section of the cleanroom, the lower left figure is a top-down view, and the lower right figure is a perspective view. Inclined flow is called biased flow. If surrounded by an ellipse, conventional technology creates biased flow at the return port on the floor, resulting in uneven circulation. However, this is reduced in the present invention, resulting in a uniform downward airflow and uniform circulation through the structures of (A) and (B). This method constitutes a combined mechanism that focuses on minimizing the effects of expansion, rotation, and shear, the three elements of fluid deformation motion, in the entire clean room, and successfully brings advantages to convection and diffusion, which are the basis for transporting the fluid's motion.
(A)均勻的吹出構造或(B)不具有開孔地板之雙重壁循環機構對於從事潔淨棚業務之技術人員來說只要一看就很容易想到,實際上,適用這些(A)(B)組合構造之潔淨棚在現場前所未有,關於本構造,由多年來從事構建之發明者等連後述之(C)(D)(E)也包括在內藉由數值流體力學(CFD)進行了深入研究之結果,最終獲得了本發明,該構建為不僅要求高清潔度,而且還以高水平滿足溫度、除濕和惰性氣體環境之氣密循環棚機構的構建。For technicians working in the cleanroom business, it is easy to imagine (A) a uniform blowout structure or (B) a double-wall circulation mechanism without a perforated floor. In fact, cleanrooms that use these (A) and (B) combined structures have never been seen before. Regarding this structure, the inventors who have been engaged in construction for many years have conducted in-depth research using numerical fluid dynamics (CFD), including the (C), (D), and (E) described later. The result is the present invention, which is an airtight circulation mechanism that not only requires high cleanliness, but also meets the requirements of temperature, dehumidification, and inert gas environment at a high level.
(C)設置用於減少由裝置產生之旁路上的氣流的紊亂、捲揚、剝離、渦流生成等的偏流和/或滯留之裝置附帶的整流/導風機構(C) A flow straightening/air guiding mechanism attached to the device for reducing turbulence, swirling, separation, vortex generation, etc. of the airflow in the bypass generated by the device and/or stagnation
在潔淨棚1內配置有需要高清潔度之裝置6。藉由裝置的配置或形狀、運轉,且藉由氣流的紊亂或自裝置外觀的流動的剝離、藉此產生之渦流生成或裝置自身阻礙下降氣流而產生之偏流,會產生跟隨氣流之塵屑的捲揚。例如,在作為OLED製造的主要工藝之噴墨裝置中,托架(以下,稱為CA。內置有墨水,墨水被塗在其正下方。)係承擔裝置中樞機能之處,會誘發氣流的紊亂、或難以控制溫度等,需要氣流的整流化。因此,藉由在CA周圍設置整流導件(導風板),或者設置用於避免CA周邊裝置附近的滯留(低氣流速度區域)的曲線狀整流導件、用於消除滯留憂慮區域自身的罩或阻擋該區域流入流出之簾子,來改善旁路上的氣流,減少局部滯留。又,在半導體製造的光阻劑的填充步驟等中,由於在旁路上存在複雜的構造物、驅動源,因此,藉由用於避免偏流或滯留、維持下降氣流之整流導件的設置或用於消除滯留憂慮區域自身的罩,改善氣流,減少局部滯留。Cleanroom 1 houses equipment 6 requiring high cleanliness. The equipment's configuration, shape, and operation can cause dust to be swept along with the airflow. This can be caused by turbulence in the airflow, swirl generated by the airflow being detached from the equipment's exterior, or by the equipment itself obstructing the downward airflow, resulting in swaying. For example, in inkjet equipment, a key process in OLED manufacturing, the carriage (hereinafter referred to as CA, containing the ink directly beneath it) is the core function of the equipment. This can induce airflow turbulence and make temperature control difficult, necessitating airflow rectification. Therefore, by installing flow guides (air deflectors) around the CA, or by installing curved flow guides to prevent stagnation (low airflow velocity areas) near the CA's peripheral devices, or by using covers to eliminate stagnation-related areas, or by using curtains to block inflow and outflow from these areas, airflow in the bypass can be improved and localized stagnation can be reduced. Furthermore, in the photoresist filling step of semiconductor manufacturing, for example, the bypass contains complex structures and drive sources. Therefore, by installing flow guides to prevent biased flow or stagnation and maintain downward airflow, or by using covers to eliminate stagnation-related areas, airflow can be improved and localized stagnation can be reduced.
FFU的吹出溫度例如精密管理為23℃±0.1℃~±0.5℃,但裝置的內部發熱的行為難以掌握。因此,為了降低來自裝置的導熱風險,在裝置上附帶設置整流罩或整流導板、導風板等整流/導風機構7,以整流裝置周圍來抑制滯留。考慮到裝置的大小、運轉狀況、設置位置等,適當選定整流/導風機構7的材質或形態、構造、設置方法等。The FFU's outlet temperature is precisely controlled to, for example, 23°C ± 0.1°C to ± 0.5°C. However, the internal heat generation behavior of the device is difficult to monitor. Therefore, to reduce the risk of heat transfer from the device, a flow straightening/air guide mechanism 7, such as a fairing, flow guide, or air deflector, is attached to the device to prevent heat stagnation around the device. The material, shape, structure, and installation method of the flow straightening/air guide mechanism 7 are appropriately selected based on the device's size, operating conditions, and installation location.
圖3係比較藉由樹脂流體力學(CFD)分析之(a)以往技術與(b)本發明的速度向量之圖。圖3係包含裝置6之潔淨棚的縱剖面圖,如由圓角四邊形包圍,在以往技術中,藉由裝置6的存在,氣流速度增加,產生剝離(由橢圓包圍之部分)和渦流,但是,在本發明中,藉由整流/導風機構7(裝置6的上部成為圓形,其自身由裝置罩整流)減少紊亂,並抑制剝離。Figure 3 compares velocity vectors from resin flow dynamics (CFD) analysis using (a) conventional technology and (b) the present invention. Figure 3 shows a longitudinal cross-section of a cleanroom containing device 6, as shown by the rounded quadrilateral. In conventional technology, the presence of device 6 increases airflow velocity, causing slack (the portion surrounded by the ellipse) and eddy currents. However, in the present invention, the use of a straightening/air guide mechanism 7 (the upper portion of device 6 is rounded, itself slack-free by the device cover) reduces turbulence and suppresses slack.
再者,導入/設置整流/導風機構7時,由於多為附帶在旁路上的裝置6自身上,因此,在裝置設計中,不僅要以流體力學效果為依據適用這些整流/導風機構7,還需要對伴隨其材質、形狀、固定之裝置側進行風險管理。例如,由安裝了整流導件而引起之振動的產生、來自安裝部的揚塵、工藝運轉時的干擾、對性能自身的影響或對用整流罩覆蓋裝置引起之發熱的影響等,需要採用基於數值流體力學(CFD)進行設計時的對策。Furthermore, since the flow straightening/air guiding mechanism 7 is often attached to the bypass device 6 itself, the device design requires not only fluid dynamics-based application of the flow straightening/air guiding mechanism 7 but also risk management associated with its material, shape, and mounting. For example, design measures based on numerical fluid dynamics (CFD) are required to address vibrations caused by the installation of the flow straightening guide, dust emission from the mounting area, interference with process operation, performance impacts, and heat generation caused by the device covered by the flow straightening cover.
又,在基於數值流體力學(CFD)進行設計時,整流/導風機構7以減少來自藉由裝置6產生之下降氣流帶來的剝離或其後的滯留之構思為起點,考慮如何在流體的變形運動的三個要素中亦將旋轉、剪切的效果在局部區域中最小化。亦即,著眼於抑制由氣流的速度差或障礙物引起之運動量缺損引起之渦流的產生,考慮一邊保持成為流體的運動量輸送的基礎之對流效果,一邊不使擴散佔優勢的整流/導風機構來決定構造及設置位置。Furthermore, during the design process based on numerical fluid dynamics (CFD), the straightening/air-guiding mechanism 7 was designed with the goal of reducing delamination and subsequent stagnation caused by the descending airflow generated by the device 6. The goal was to minimize the effects of rotation and shear in localized areas, among the three elements of fluid deformation. Specifically, the design focused on suppressing the generation of eddy currents caused by airflow velocity differences or momentum loss due to obstacles. The structure and placement of the straightening/air-guiding mechanism were determined to ensure that diffusion was not dominant while maintaining the convection effect that is the foundation of fluid momentum transport.
(D)用於避免/減少由裝置及其運轉產生之旁路周圍的揚塵和氣流的紊亂的局部抽吸機構(D) Local extraction mechanism to avoid/reduce dust and airflow turbulence around the bypass generated by the device and its operation
藉由設備6運轉,組件彼此的接觸和來自驅動源的揚塵在旁路周圍產生。例如,在OLED製造的塗佈工藝中,在旁路中,隨著基於傳送之工作台移動,塵屑從驅動部捲揚。因此,在裝置6的地板下部分沿旁路設置由排氣導管等構成之局部抽吸機構8,以任意間隔設置抽吸口,局部抽吸並排出,藉此防止塵屑飛揚。局部抽吸機構8的抽吸口可具有最大10m/s左右的抽吸氣流速度,但設計為在其周圍逐漸減速,在旁路附近,由局部抽吸機構8產生之向下方流動的氣流速度成為0.5m/s以下。所產生之塵屑藉由基於朝向地板下的整個區域向下的局部抽吸排出之氣流被排出而不會捲揚到旁路上。依此,實現了避免並減少旁路附近的滞留。As the device 6 operates, components come into contact with each other and dust is generated around the bypass due to dust being blown up by the drive source. For example, in the coating process of OLED manufacturing, dust is swept up from the drive unit as the conveyor-based workbench moves in the bypass. Therefore, a local suction mechanism 8 composed of an exhaust duct and the like is installed under the floor of the device 6 along the bypass. Suction ports are provided at arbitrary intervals to locally suction and discharge dust, thereby preventing dust from flying. The suction ports of the local suction mechanism 8 can have a maximum suction airflow velocity of approximately 10 m/s, but are designed to gradually decelerate around them. Near the bypass, the downward airflow velocity generated by the local suction mechanism 8 becomes less than 0.5 m/s. The dust generated is discharged by the air flow based on the local suction discharge downwards towards the entire area under the floor without being swept onto the bypass. In this way, stagnation near the bypass is avoided and reduced.
局部抽吸機構8除地板下之外,在裝置的側面或與裝置連接的部分,使用柔性導管或硬導管、將其連接之帶抽吸口之箱等適當地設置。為了不使平均氣流速度為0.3m/s的下降氣流的氣流形成過度紊亂,在旁路附近將由局部抽吸機構產生之朝向下方的流動的氣流速度設定為0.5m/s以下,但並不限於此,適當選擇局部排出的方法或場所、抽吸氣流速度等。In addition to under the floor, local suction mechanism 8 is appropriately installed on the side of the device or at a location connected to the device using flexible or rigid ducting, a box with a suction port, or the like. To prevent excessive turbulence in the downward airflow, which has an average velocity of 0.3 m/s, the downward airflow generated by the local suction mechanism near the bypass is set to a velocity of 0.5 m/s or less. However, this is not a limitation. The local exhaust method, location, and suction airflow velocity should be appropriately selected.
圖4係比較藉由數值流體力學(CFD)分析之(a)以往技術與(b)本發明的空氣齢(滯留時間)(當吹出位置設為0s時到達空間內的每個位置所需的時間)之圖。圖4係包含裝置6的潔淨棚的縱剖面圖,如由圓角四邊形包圍,在以往技術中,裝置6周圍的空氣齡變長,存在滯留風險,但在本發明中,藉由在裝置6的地板下設置局部抽吸機構8,減少空氣齡,並降低滯留風險。Figure 4 compares the air age (retention time) (the time required to reach each location within the space when the blowing position is set to 0 seconds) of (a) the prior art and (b) the present invention, analyzed using numerical fluid dynamics (CFD). Figure 4 is a longitudinal cross-section of the cleanroom including device 6. As shown by the rounded rectangle, in the prior art, the air age around device 6 increases, posing a risk of stagnation. However, in the present invention, the installation of a localized suction mechanism 8 under the floor of device 6 reduces air age and mitigates the risk of stagnation.
再者,導入並設置局部抽吸機構8時,在附帶在旁路上的裝置6附近或裝置6自身上之情況下,在裝置設計中,不僅要以流體力學效果為依據適用該抽吸效果,還需要與整流/導風機構7同樣地對伴隨其材質、設置位置之裝置側實施風險管理。例如,由安裝了局部抽吸機構8而引起之振動的產生、來自安裝部的揚塵、工藝運轉時的干擾、對由氣流形成引起之性能自身的影響等,需要採用基於數值流體力學(CFD)進行設計時的對策。又,即使將局部抽吸機構8安裝在裝置6下部之情況下,亦與相同的層流的下降氣流相反,為了防止在旁路高度產生向上的氣流,考慮在下方以均勻的氣流速度形成氣流的同時,實施以裝置側的揚塵位置為中心取得效果之安裝條件很重要。Furthermore, when introducing and installing a localized suction mechanism 8, whether attached to a bypass device 6 or mounted on the device 6 itself, the device design must not only utilize the suction effect based on fluid dynamics, but also implement risk management on the device side associated with its material and installation location, similar to the flow straightening/air guiding mechanism 7. For example, design measures based on numerical fluid dynamics (CFD) are required to address vibrations caused by the installation of the localized suction mechanism 8, dust emission from the mounting area, interference with process operations, and the impact on performance caused by airflow formation. Furthermore, even when the local suction mechanism 8 is installed at the bottom of the device 6, in order to prevent the generation of an upward airflow at the bypass height, which is opposite to the descending airflow of the same laminar flow, it is important to consider forming an airflow at a uniform airflow speed at the bottom while implementing installation conditions that achieve the effect centered on the dust emission position on the side of the device.
又,在基於數值流體力學(CFD)進行設計時,以局部抽吸機構8如何恢復通過裝置6而從理想的下降氣流惡化之包括紊亂或渦流、滯留的裝置依存的氣流特性作為構思的起點,與整流/導風機構7同樣地,考慮如何在流體的變形運動的三個要素中將旋轉、剪切的效果在局部區域中降低,進而藉由局部抽吸產生運動量,來重新誘導氣流。亦即,著眼於抑制由氣流的速度差引起之新渦流的產生,考慮一邊誘導成為流體的運動量輸送的基礎之對流效果一邊不使擴散佔優勢的局部抽吸位置及風量來決定構造及設置位置。Furthermore, during the design process based on numerical fluid dynamics (CFD), the starting point for the conception of the localized suction mechanism 8 was how to restore the device-dependent airflow characteristics, including turbulence, eddy currents, and stagnation, that deteriorate from the ideal downdraft through the device 6. Similar to the rectifying/air-guiding mechanism 7, the consideration was how to reduce the effects of rotation and shear in localized areas, among the three elements of fluid deformation motion, and thereby re-direct the airflow by generating motion through localized suction. Specifically, with a focus on suppressing the generation of new eddy currents caused by airflow velocity differences, the structure and placement were determined by considering the location and air volume of the localized suction, while simultaneously inducing convection, the fundamental mechanism for transporting fluid motion, while preventing diffusion from dominating.
在考慮了裝置之數值流體力學(CFD)中,大體分為能夠在無裝置的條件及有裝置的條件下實施。其中,在本發明中有作為標準適用對象之裝置的條件下,形狀再現性成為很大程度上左右數值預測精確度之必要條件之一。在本發明中,對於想要設置在高清潔度的環境中的裝置,在用一般的3DCAD獲得實際模型之後,考慮對氣流特性的贡獻程度,將模型修正為數值分析用。具體而言,為被認為對氣流特性的影響度小之螺栓和螺母、安裝孔的省略、組件彼此或裝置彼此的微小間隙(例如10mm以下)的省略、由組件或裝置殼體的彎曲而產生之輕微曲率的省略等。對這些進行修正,在充分保留應該考慮對氣流特性的影響之組件和形狀之狀態下實施數值分析。Numerical fluid dynamics (CFD) that takes devices into consideration is generally divided into those that can be implemented without devices and those that can be implemented with devices. Among these, in the case of devices that are standardly applicable in this invention, shape reproducibility becomes one of the necessary conditions that largely influences the accuracy of numerical predictions. In this invention, for devices that are intended to be installed in a high-purity environment, after obtaining an actual model using general 3D CAD, the model is modified for numerical analysis, taking into account the degree of contribution to airflow characteristics. Specifically, this includes the omission of bolts and nuts that are considered to have little impact on airflow characteristics, the omission of mounting holes, the omission of small gaps (e.g., less than 10 mm) between components or devices, and the omission of slight curvatures caused by the bending of components or device housings. These are corrected and numerical analysis is performed while fully retaining the components and shapes that should be considered to affect the airflow characteristics.
此外,在本發明中的數值流體力學(CFD)中,以有限體積法為離散化方法,藉由流體的支配方程式(那微史托克方程式)獲得速度及壓力。又,根據能量方程式及化學種類輸送方程式分別得到溫度及質量分數,在空氣齡中採用被動標量輸送方程式。在粒子運動中,對於使用拉格朗日法之運動方程式,在與流體方程式相同的解算器內,使壓力耦合進行計算並評價。紊流模型採用RANS(Reynolds-AveragedNavier Stokes equation:雷諾平均方程式、時間平均模型)型二方程式模型SSTk-ω模型,進行低雷諾數的修正。這考慮到下降氣流的比較慢的氣流速度以及排氣、循環區域的較快的氣流速度的存在,作為適合較寬雷諾數帶之模型採用。格子類型使用以四面體網格為基礎之多面體網格,但是這些由作為對象之裝置的複雜性以及整體格子數決定,因此並不限於此。在分析裝置運轉時,在移動區域大多使用六面體網格。網格的質量根據偏斜度進行評價,在裝置的詳細部分中,亦以0.98以下保證質量。基本上,實施穩定分析,在考慮裝置的移動等對氣流的影響之情況下,實施非穩定分析。在考慮溫度的影響之情況下,考慮裝置的發熱、FFU的發熱、來自潔淨棚壁面的導熱等熱源進行分析。在考慮濕度和混合氣體的濃度之情況下,利用化學種類輸送方程式考慮混合氣體的對流擴散。當考慮塵屑的行為之情況下,使用拉格朗日法給出粒子密度、粒徑、個數(流量)、噴出位置、噴出速度並進行計算。此時,根據紊流擴散中的速度變動,藉由概率性跟蹤來表現粒子的產生。在塵屑中,亦可知大體表現出跟隨氣流之行為,但作為滯留區域的行為,還考慮到考慮了氣溶膠性質的佈朗運動且球形的阻力定律來進行計算。Furthermore, in the numerical fluid dynamics (CFD) of this invention, the finite volume method is used as a discretization technique, and velocity and pressure are obtained from the governing equations of the fluid (the Navier-Stokes equations). Furthermore, temperature and mass fraction are derived from the energy equation and chemical species transport equation, respectively, and a passive scalar transport equation is employed for the air age. For particle motion, the Lagrangian equations of motion are calculated and evaluated by coupling pressure with the fluid equations within the same solver. The turbulence model adopts the RANS (Reynolds-Averaged Navier Stokes equation: Reynolds-averaged equation, time-averaged model) two-equation SSTk-ω model, with corrections for low Reynolds numbers. This is done to take into account the presence of slower airflow in the downflow and faster airflow in the exhaust and circulation areas, and to adopt a model suitable for a wider Reynolds number band. The grid type uses a polyhedral grid based on a tetrahedral grid, but this is determined by the complexity of the device being tested and the total number of grids, so it is not limited to this. When analyzing the operation of the device, hexahedral grids are mostly used in the moving area. The quality of the grid is evaluated based on the skewness, and even in the detailed part of the device, the quality is guaranteed to be below 0.98. Basically, a stable analysis is performed, and an unstable analysis is performed when considering the impact of the movement of the device on the airflow. Taking into account the influence of temperature, the analysis considers heat sources such as heat generated by the equipment, heat generated by the FFU, and heat conduction from the cleanroom walls. The chemical species transport equation is used to account for the convective diffusion of the mixed gas, taking into account humidity and the concentration of the mixed gas. The Lagrangian method is used to calculate particle density, particle size, number (flow rate), ejection location, and ejection velocity, taking into account the behavior of dust. Particle generation is then represented by probabilistic tracking based on velocity fluctuations during turbulent diffusion. Dust particles also exhibit generally observed behavior that follows the airflow, but the behavior of the stagnant region is also calculated using the Brownian motion and spherical drag laws that take into account the properties of aerosols.
在本發明中,藉由數值分析(被動標量輸送方程式)算出空氣齡(通風效率指標SVE3(SVE:Scale for Ventilation Efficiency)),將裝置周圍的滯留狀況作為空氣齡T[s]進行評價,藉由以理想的下降氣流的3倍以下(3T)的有限值形成旁路上的氣流,能夠將由在以往技術難以考慮的旁路上的裝置引起之粒子的存在最小化。例如,對在裝置工作時從電纜軸等驅動源產生之粒徑d=0.1~5μm以下的塵屑行為進行流體分析發現,塵屑在任何粒徑均可捲揚,粒徑越小,捲揚的概率越高,但塵屑在旁路下方的吸入區域中的出現概率仍然在1.5%以下,可以說塵屑捲揚到旁路上方的可能性明顯較低。如上,在本發明的伴隨氣流紊亂而產生之塵屑的捲揚中,以在旁路上形成向下的氣流為基本的同時,根據旁路上的空氣齡的規定,能夠期待大體上抑制產生塵屑的風險。In this invention, the air age (SVE3 (Scale for Ventilation Efficiency)) is calculated through numerical analysis (passive scalar transport equations), and the stagnation conditions around the device are evaluated as the air age T[s]. By forming the airflow in the bypass with a finite value of less than three times the ideal downflow (3T), it is possible to minimize the presence of particles caused by the device in the bypass, which was difficult to consider with previous technologies. For example, fluid analysis of the behavior of dust particles with a diameter of 0.1 to 5 μm or less, generated from drive sources such as cable shafts during device operation, revealed that dust of any size can be swirled, with the probability of swirling increasing with smaller particle sizes. However, the probability of dust appearing in the suction area below the bypass remains below 1.5%, indicating that the likelihood of dust being swirled above the bypass is significantly lower. As described above, the present invention's method for controlling dust swirling associated with airflow turbulence primarily creates a downward airflow within the bypass, and by regulating the air age within the bypass, it is expected that the risk of dust generation will be substantially reduced.
在專利文獻1中,將由沖孔金屬板構成之通氣道設置在劃分構件的下部,形成在與複數個製造裝置相互間對應之位置上,防止將製造裝置內部的粉塵等捲揚(氣流速度例如為1m/s以下)。然而,該通氣道用於將局部潔淨棚的高清潔度空氣引入一般空間,與本發明的用途不同。In Patent Document 1, air ducts made of perforated metal plates are installed below the partitioning member, at positions corresponding to the positions between the multiple production devices, to prevent dust and other particles from being swirled within the production devices (the airflow velocity is, for example, less than 1 m/s). However, these air ducts are used to introduce high-purity air from a local clean room into the general space, which differs from the purpose of the present invention.
如上,本發明的潔淨棚能夠藉由(C)用於減少由各種裝置產生之氣流的紊亂、滯留及揚塵之整流構造或(D)局部抽吸機構,對在以往技術中容易發生的由旁路周圍的裝置或其運轉而導致之偏流的存在與否和速度的偏差進行抑制,尤其,能夠避免成為滯留發生原因之無風狀態(≈0m/s)或成為氣流紊亂及渦流的產生原因之過度的氣流速度增加(超過0.5m/s),並且能夠使旁路附近的氣流均勻(平均氣流速度為0.3m/s左右)。As described above, the cleanroom of the present invention can suppress the presence or absence of deviations in airflow and speed caused by the devices around the bypass or their operation, which are prone to occur in conventional technologies, by using (C) a rectifying structure for reducing airflow turbulence, stagnation, and dust emission generated by various devices, or (D) a local suction mechanism. In particular, it can avoid windless conditions (≈0 m/s) that cause stagnation and excessive increases in airflow speed (exceeding 0.5 m/s) that cause airflow turbulence and eddies, and can make the airflow near the bypass uniform (average airflow speed of approximately 0.3 m/s).
(E)如以上,將整體空間(A)/(B)、裝置周圍空間(C)、局部空間(D)的階段性設計藉由考慮到實際條件之數值流體力學(CFD)來執行,在ISO 3級至4級要求區域(旁路上方)中,將向下的速度設為0.3m/s左右,將空氣齡設為理論值的3倍以下,且將潔淨棚內正壓設為20~40Pa(E) As above, the phased design of the overall space (A)/(B), the space around the device (C), and the local space (D) is carried out by numerical fluid dynamics (CFD) taking into account actual conditions. In the ISO Class 3 to Class 4 requirement area (above the bypass), the downward velocity is set to approximately 0.3m/s, the air age is set to less than 3 times the theoretical value, and the positive pressure in the clean room is set to 20-40Pa.
依本發明,如上述,自沖孔面的吹出平均氣流速度在旁路中以0.1~0.5m/s,較佳為以0.3~0.4m/s的平均氣流速度形成0.3m/s左右的向下的下降氣流。藉由使吹出氣流速度均勻,能夠在理論上計算幾秒後到達每個位置,亦即空氣齡。例如將平均氣流速度設為0.3m/s,且將從沖孔板吹出部到旁路的距離設為1.5m時,到旁路為止的到達時間(空氣齢T)成為5s。將此作為理想的下降氣流的空氣齡的理論值T。本發明採用數值流體力學(CFD),將裝置周圍(旁路的上方)的空氣齡以理論值的3倍以下,亦即3T以下為基準,設為以旁路的上方的空氣齡處於該範圍內的有限值。換言之,在以0.3m/s為基準規定了氣流速度之條件下需要3T的時間係指,亦即可以說至少具有0.1m/s以上的氣流速度,這可以用作避免在旁路上處於無風狀態(≈0m/s)之一個指標。如果,存在該空氣齡充分大的區域之情況下(10T、20T等),亦即擔心無風狀態(≈0m/s),這直接導致清潔度的惡化。實際上,由於本結構能夠充分適用,因此在本發明中,作為有效標準,規定並使用空氣齡。此外,藉由將旁路上的空間的空氣齡定為有限值,能夠具有自清潔度惡化中快速恢復等自清潔作用。According to the present invention, as described above, the average airflow velocity from the perforated surface in the bypass is 0.1 to 0.5 m/s, preferably 0.3 to 0.4 m/s, forming a downward downdraft of approximately 0.3 m/s. By maintaining a uniform airflow velocity, it is theoretically possible to calculate the number of seconds it will take for the air to reach each location, i.e., the air age. For example, if the average airflow velocity is set to 0.3 m/s and the distance from the perforated plate outlet to the bypass is set to 1.5 m, the arrival time (air age T) at the bypass is 5 seconds. This is the theoretical value of the air age T for the ideal downdraft. This invention uses numerical fluid dynamics (CFD) to define the air age around the device (above the bypass) as less than three times the theoretical value, or 3T, as a finite value, ensuring that the air age above the bypass remains within this range. In other words, under the condition of an airflow velocity of 0.3 m/s, the required time of 3T means that the airflow velocity must be at least 0.1 m/s. This serves as an indicator to avoid a windless state (≈0 m/s) in the bypass. If the air age is sufficiently large (10T, 20T, etc.), there is a concern about a windless state (≈0 m/s), which directly leads to a deterioration in cleanliness. In fact, since this structure is fully applicable, the present invention specifies and uses the air age as an effective standard. In addition, by setting the air age of the bypass space to a finite value, it is possible to achieve self-cleaning functions such as rapid recovery from deterioration of cleanliness.
又,藉由基於FFU之空氣的吹入,潔淨棚內成為正壓。藉此,潔淨棚外部的清潔度低的空氣不會流入潔淨棚。通常,正壓(潔淨棚的內部與外部的壓力差)設為5~20Pa左右,但是在要求高清潔度的情況下,期望高於此,在本發明中設為20~40Pa。如果正壓大於此,則存在當打開潔淨棚的門時風的吹出很明顯、門的打開和關閉受到阻礙、從排氣口和返回口的開口部分產生風噪聲等問題。Furthermore, the air blown in by the FFU creates a positive pressure inside the cleanroom. This prevents low-purity air from outside the cleanroom from flowing into the cleanroom. Typically, positive pressure (the pressure difference between the inside and outside of the cleanroom) is set at approximately 5 to 20 Pa. However, for applications requiring high cleanliness, a higher pressure is desirable, and in the present invention, it is set at 20 to 40 Pa. If the positive pressure exceeds this, there are problems such as noticeable airflow when the cleanroom door is opened, obstructing the door's opening and closing, and generating wind noise from the openings of the exhaust and return ports.
圖5係比較藉由樹脂流體力學(CFD)分析之(a)以往技術與(b)本發明的流線及空氣齢之圖。圖5係包含裝置之潔淨棚的縱剖面圖,上圖表示流線,下圖表示空氣齢。在以往技術中,在一側的側壁或裝置周圍發生了偏流或滯留,但是在本發明中,從潔淨棚的上部朝向下方形成相同的下降氣流,從而減少了滯留區域。Figure 5 compares the streamlines and air aging of (a) the prior art and (b) the present invention, analyzed using resin fluid dynamics (CFD). Figure 5 is a longitudinal cross-section of the clean room containing the device, with the upper figure showing streamlines and the lower figure showing air aging. While the prior art creates deflection or stagnation along the sidewall or around the device, the present invention creates a uniform downward flow from the top of the clean room downward, reducing stagnation areas.
藉由使吹出氣流速度均勻,能夠理論上計算出幾秒鐘後到達地板下,但實際上,利用以往技術難以用完全均勻的氣流填滿潔淨棚內。又,還難以推測設置並運轉裝置時的滯留區域及所滯留之時間。本發明的潔淨棚把握整體潔淨棚的(A)下降氣流及(B)循環,甚至考慮到實際裝置及其運轉條件之氣流紊亂或滯留區域,避免及減少(C)整流及(D)滯留。By making the airflow uniform, it's theoretically possible to calculate how many seconds it will take to reach the floor below. However, in reality, filling the cleanroom with a completely uniform airflow is difficult with conventional technology. Furthermore, it's difficult to predict the stagnation area and duration during setup and operation. The cleanroom of the present invention manages (A) downflow and (B) circulation throughout the cleanroom, even taking into account airflow turbulence or stagnation areas caused by the actual installation and operating conditions, thereby avoiding and reducing (C) straightening and (D) stagnation.
接著,對關於實現本發明之潔淨棚的清潔度之清掃、準備、條件等進行補充。為了實現本發明所示之高清潔度,本潔淨棚施工後的清掃非常重要。在雙重壁構造的清掃中,基本上,在裝置6全部被設置,且在FFU2開始運轉後,從接近頂棚的門窗或內壁4的上表面朝向下方進行清掃。又,在裝置6中亦同樣地在潔淨棚的清掃結束後進行清掃。尤其,仔細地清掃裝置蓋、暴露在空間中之組件/配線等。所使用之清潔清掃用具,例如為濕巾、酒精、清潔輥、ULPA吸塵器、鼓風機等。清掃後,根據入室規則,實施入室時間、人員和作業內容的限制、清潔墊的設置等不使清潔度惡化的管理,逐步使管理水平嚴格,提高清潔度。Next, we will discuss the cleaning, preparation, and conditions required to achieve the cleanliness of the cleanroom of this invention. To achieve the high cleanliness of this invention, cleaning the cleanroom after construction is crucial. When cleaning a double-walled structure, after all units 6 are installed and the FFUs 2 begin operation, clean from the doors and windows near the ceiling or the upper surface of the inner wall 4 downward. Similarly, clean units 6 after the cleanroom is finished. In particular, carefully clean the unit covers and exposed components and wiring. Cleaning tools used include wet wipes, alcohol, cleaning rollers, ULPA vacuum cleaners, and blowers. After cleaning, according to the entry rules, restrictions on entry time, personnel, and work content, and the placement of cleaning mats are implemented to ensure that cleanliness levels do not deteriorate. This will gradually tighten management and improve cleanliness.
又,為實現本發明所示之高清潔度,裝置側的揚塵對策亦很重要。亦即,除了在潔淨棚內形成之(A)下降氣流及(B)以循環為基礎的氣流特性外,為了有效適用(C)整流/導風板及(D)局部抽吸機構,考慮了與數值流體力學(CFD)相關之條件。例如,從揚塵材料/構件的使用、可能阻礙下降氣流之構造物、誘發紊亂之構造物、構件彼此的干擾、接觸之構件的運轉/移動、振動之構造物、空氣驅動之機器、通過配線之配管等中空配管以及導管或維護的流線/作業內容/頻度、所使用之工具/機器/材料等中,藉由使用數值流體力學(CFD)應回避之項目及設計指針,區分應回避之項目。例如,在本發明的(C)及(D)的構成中,各種裝置以確保避開了旁路之配線路徑、配線等的佈線或者容納在蓋內的方式實施而進行充分的清潔。Furthermore, to achieve the high cleanliness levels demonstrated by this invention, dust suppression measures on the equipment side are also crucial. Specifically, in addition to (A) the downdraft and (B) the circulation-based airflow characteristics formed within the cleanroom, conditions related to numerical fluid dynamics (CFD) were considered to effectively utilize (C) the flow straighteners/air guides and (D) the localized suction mechanism. For example, avoidance items are identified using numerical fluid dynamics (CFD) and design guidelines, including the use of dust-producing materials/components, structures that may obstruct downward airflow, structures that induce turbulence, interference between components, the movement/movement of contacting components, vibrating structures, air-driven machinery, hollow pipes such as those used for wiring, and the flow lines, work content, and frequency of pipe or maintenance, as well as the tools/machines/materials used. For example, in the configurations (C) and (D) of the present invention, various devices are implemented to ensure adequate cleaning by ensuring that wiring routes and wiring, etc., are routed in a manner that avoids bypasses or is contained within a cover.
藉由上述構成,可以說藉由作為與裝置的一體型潔淨棚進行產業應用,不僅在裝置停止時,而且在運轉時亦能夠提供更穩定地維持高清潔度之環境。With the above configuration, it can be said that by being used in industrial applications as an integrated clean room with the device, it can provide a more stable environment that maintains high cleanliness not only when the device is stopped, but also when it is running.
以上,對根據本發明的潔淨室的實施方式進行了說明,但本發明並不限定於上述實施形態,能夠在不脫離其主旨的範圍內進行適當變更。 [產業上之可利用性] While the above describes the embodiments of the clean room according to the present invention, the present invention is not limited to the above embodiments and can be modified appropriately without departing from the spirit and scope of the present invention. [Industrial Applicability]
與空間的大小無關,作為一種大概穩定之氣流特性,本發明之潔淨棚能夠提供近年來對高清潔度要求不斷提高的半導體製造工藝的上游工序(光阻劑的填充步驟等)、有機EL的塗佈、密封、貼合步驟等高清潔度環境。又,不僅在新增潔淨棚時,而且在改造現有製造步驟時亦能夠選擇性地適用本發明的構成。Regardless of the size of the space, the cleanroom of this invention, with its generally stable airflow characteristics, can provide a high-cleanliness environment for upstream processes in semiconductor manufacturing (such as photoresist filling) and organic EL coating, sealing, and lamination, where high cleanliness requirements have been increasing in recent years. Furthermore, the structure of this invention can be selectively applied not only when adding new cleanrooms, but also when modifying existing manufacturing processes.
本發明成為尤其進一步有利於降低在引入批量生產線時產生之巨大成本之棚結構。與以往相比,高清潔度的潔淨棚所需之FFU的台數最大削減50%作為初始成本,與此同時,成為還能夠期待降低與運行成本相關之電力之節能設計。雖然雙重壁等附屬組件相關之成本增加,但由於實現了自清潔作用強的魯棒氣流特性,因此能夠期待降低產率惡化的風險,並且藉由由棚環境惡化引起之運轉後的設備停止頻度或產率改善所產生之成本低於以往技術。This invention provides a shed structure that is particularly beneficial for reducing the significant costs associated with introducing mass production lines. Compared to conventional systems, the number of FFUs required for a high-quality clean shed can be reduced by up to 50% as initial cost. This energy-saving design also promises to reduce electricity consumption, which contributes to operating costs. While costs associated with additional components such as the double wall increase, the robust airflow characteristics with a strong self-cleaning effect can be expected to reduce the risk of yield degradation. Furthermore, the cost of post-operation equipment shutdowns due to shed environmental degradation and improved yields is lower than with conventional technologies.
此外,本發明係不僅是氣流的均勻化,而且是溫度分布、混合氣體濃度分布的均勻化的基礎之流場,例如,亦能夠適用為吹出溫度、濃度的均勻化及避免棚內熱或高濃度氣體的滯留的基本策略,對於需要迅速達到目標溫度或目標濃度時有效。Furthermore, the present invention provides a flow field that not only uniforms airflow, but also uniforms temperature distribution and mixed gas concentration distribution. For example, it can also be applied as a basic strategy for uniforming blown-out temperature and concentration and preventing the stagnation of hot or high-concentration gases in the greenhouse. This is effective when it is necessary to quickly reach a target temperature or concentration.
這亦是能夠應用展開作為具有氣密性之循環棚構造之本發明之特徵,例如,可以說係除了滿足清潔度ISO 3級之外,還充分能夠將水分濃度和氧濃度設置為1ppm的氣氛之技術。例如,在本機構中適用精密的溫度環境、除濕環境或惰性氣體環境之情況下,為了使由隔熱面板構成之外壁5的氣密性更高,能夠承受200Pa左右的內壓,藉由填縫進行密封。又,對頂部區域的溫度和濃度進行控制的氣體(SG, Supply Gas:供給氣體)通過任意設置之導管或配管流入。藉由數值流體力學(CFD)決定流入位置或流速在設置FFU2之頂棚區域內充分混合,在通過FFU2後,以清潔且均勻的溫度、水分濃度、惰性氣體濃度實現整面下降氣流。又,一部分氣體作為RG(Return Gas:返回氣體)循環到空調,除濕機,精製機。該導管或配管安裝在外壁5的側壁上,並且在潔淨棚內進行相同的氣體置換。在本發明的(A)整面吹出以及(B)雙重壁循環機構,具備能夠擴展到這些用途的程度的基本構造,並且根據實際要求的性能,藉由數值流體力學(CFD)來實施由頂棚部的流體的紊流混合、循環位置而引起之潔淨棚內部的偏流或滯留預測。如上,本發明除了清潔度之外,對於如溫度或除濕、惰性氣體環境等環境維持條件更加嚴格的潔淨棚,提供滿足這些之潔淨棚的基本構造。This is also a feature of the present invention that allows for its application as an airtight circulation shed structure. For example, it can be said that this technology not only meets ISO Class 3 cleanliness standards but also fully enables the creation of an atmosphere with a moisture and oxygen concentration of 1 ppm. For example, when this mechanism is used in a precise temperature environment, a dehumidified environment, or an inert gas environment, the outer wall 5, formed of insulating panels, is sealed by caulking to further enhance its airtightness and withstand an internal pressure of approximately 200 Pa. Furthermore, a gas (SG, Supply Gas) that controls the temperature and concentration of the top area flows in through an optionally installed conduit or piping. The inflow location and flow rate are determined using CFD. The air is thoroughly mixed within the ceiling area where the FFU2 is installed. After passing through the FFU2, it achieves a clean, uniform downward flow with a uniform temperature, moisture concentration, and inert gas concentration. A portion of the gas is circulated as RG (Return Gas) to the air conditioner, dehumidifier, and refiner. This duct or piping is installed on the side of the outer wall 5 and performs the same gas exchange within the cleanroom. The (A) full-surface blowout and (B) double-wall circulation mechanisms of the present invention possess a basic structure that can be expanded to these applications. Based on the actual performance requirements, numerical fluid dynamics (CFD) is used to predict flow deviations or stagnation within the cleanroom caused by turbulent mixing and circulation positions of the fluid in the ceiling. As described above, in addition to cleanliness, the present invention provides a basic cleanroom structure that meets even more stringent environmental maintenance requirements, such as temperature, dehumidification, and inert gas environments.
1:潔淨棚 2:空氣清潔機構 3:沖孔板 4:內壁 5:外壁 6:裝置 7:整流/導風機構 8:局部抽吸機構 1: Cleanroom 2: Air purifier 3: Perforated plate 4: Inner wall 5: Outer wall 6: Device 7: Airflow/air guide mechanism 8: Localized suction mechanism
圖1係表示本發明的潔淨棚的構成之圖。 圖2係比較了(a)以往技術與(b)本發明的空氣速度的流線之圖。 圖3係比較了(a)以往技術與(b)本發明的速度向量之圖。 圖4係比較了(a)以往技術與(b)本發明的空氣齡之圖。 圖5係比較了(a)以往技術與(b)本發明的流線及空氣齡之圖。 Figure 1 shows the configuration of the cleanroom of the present invention. Figure 2 compares the air velocity streamlines of (a) the prior art and (b) the present invention. Figure 3 compares the velocity vectors of (a) the prior art and (b) the present invention. Figure 4 compares the air age of (a) the prior art and (b) the present invention. Figure 5 compares the streamlines and air age of (a) the prior art and (b) the present invention.
1:潔淨棚2:空氣清潔機構(覆蓋範圍:≤70%)3:沖孔板4:內壁5:外壁6:裝置7:整流/導風機構8:局部抽吸機構(A):用於實現高清潔度環境之吹出構造(B):用於使棚側壁成為均勻的循環路徑之雙壁構造(C):用於減少由各種裝置產生之氣流的紊亂、滯留及揚塵之整流構造(D):局部抽吸機構1: Cleanroom 2: Air cleaning mechanism (coverage: ≤70%) 3: Perforated plate 4: Inner wall 5: Outer wall 6: Device 7: Rectification/air guide mechanism 8: Local suction mechanism (A): Blowing structure for achieving a high-quality clean environment (B): Double-wall structure for creating a uniform circulation path along the side of the shed (C): Rectification structure for reducing airflow turbulence, stagnation, and dust generation generated by various devices (D): Local suction mechanism
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| JP2021117217A JP7102032B2 (en) | 2021-07-15 | 2021-07-15 | Clean booth |
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| DE2104193B2 (en) | 1971-01-29 | 1976-07-01 | Elbatainer Kunststoff- Und Verpackungsgesellschaft Mbh, 7505 Ettlingen | LID CLOSURE FOR CONTAINER WITH RELATIVELY LARGE OPENING |
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- 2022-02-10 KR KR1020220017339A patent/KR20230012402A/en active Pending
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0525241U (en) * | 1991-03-20 | 1993-04-02 | 新日本空調株式会社 | A curved perforated plate blowing structure in a portable clean booth |
| JP2001336798A (en) * | 2000-05-30 | 2001-12-07 | Keitaro Mori | Clean booth |
| JP2003294285A (en) * | 2002-04-03 | 2003-10-15 | Fuji Photo Film Co Ltd | Explosion-proof fan filter unit |
| TWM589276U (en) * | 2018-08-07 | 2020-01-11 | 大陸商亞翔系統集成科技(蘇州)股份有限公司 | A clean room |
Also Published As
| Publication number | Publication date |
|---|---|
| KR20230012402A (en) | 2023-01-26 |
| TW202305291A (en) | 2023-02-01 |
| CN115614855A (en) | 2023-01-17 |
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