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TWI893281B - Cleaning device - Google Patents

Cleaning device

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Publication number
TWI893281B
TWI893281B TW111105879A TW111105879A TWI893281B TW I893281 B TWI893281 B TW I893281B TW 111105879 A TW111105879 A TW 111105879A TW 111105879 A TW111105879 A TW 111105879A TW I893281 B TWI893281 B TW I893281B
Authority
TW
Taiwan
Prior art keywords
main shaft
workpiece
cleaning
spindle
housing
Prior art date
Application number
TW111105879A
Other languages
Chinese (zh)
Other versions
TW202236410A (en
Inventor
畑亮
Original Assignee
日商迪思科股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日商迪思科股份有限公司 filed Critical 日商迪思科股份有限公司
Publication of TW202236410A publication Critical patent/TW202236410A/en
Application granted granted Critical
Publication of TWI893281B publication Critical patent/TWI893281B/en

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Classifications

    • H10P72/0441
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B08CLEANING
    • B08BCLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/02Cleaning by the force of jets or sprays
    • B08B3/022Cleaning travelling work
    • H10P72/0414
    • H10P72/7626
    • H10P72/78

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Physics & Mathematics (AREA)
  • Power Engineering (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Cleaning By Liquid Or Steam (AREA)
  • Confectionery (AREA)
  • Automatic Analysis And Handling Materials Therefor (AREA)
  • Sealing Using Fluids, Sealing Without Contact, And Removal Of Oil (AREA)

Abstract

[課題]提供一種洗淨裝置,其可歷經長期間來將主軸單元側的空間與容置工作夾台之洗淨用腔室之連通阻隔。 [解決手段]阻隔罩殼以及主軸之間的空間與洗淨用腔室之連通的密封部具有和主軸接觸之磁性流體。因此,可在不會使固體彼此接觸的情形下,阻隔該空間與洗淨用腔室之連通。其結果,可以減少伴隨於主軸的旋轉之密封部的磨耗,而可歷經長期間來將該空間與洗淨用腔室之連通阻隔。 [Question] A cleaning device is provided that can permanently isolate the space between the spindle unit and the cleaning chamber housing the worktable. [Solution] The seal that isolates the space between the housing and the spindle from the cleaning chamber contains a magnetic fluid that contacts the spindle. This seal can prevent solids from coming into contact with the space. As a result, wear on the seal caused by spindle rotation is reduced, ensuring that the space is permanently isolated from the cleaning chamber.

Description

洗淨裝置Cleaning device

本發明是有關於一種洗淨裝置。The present invention relates to a cleaning device.

在半導體器件晶片等之各種電子零件的製造步驟中,可使用切削刀片或雷射光束等來對形成有器件之矽晶圓、玻璃基板或樹脂封裝基板等板狀的被加工物進行加工。當像這樣對被加工物進行加工時,會有以下情形:產生切削屑或碎屑等之加工屑並附著在被加工物的正面。In the manufacturing process of various electronic components, such as semiconductor device chips, cutting blades or laser beams are used to process plate-shaped workpieces, such as silicon wafers, glass substrates, and resin package substrates, on which devices are formed. During this process, cutting chips and debris, such as shavings, are generated and adhere to the front surface of the workpiece.

因此,被加工物在加工後可在例如具有洗淨用腔室之洗淨裝置中被洗淨,前述洗淨用腔室容置具有平坦的保持面之工作夾台與對保持面供給洗淨液之噴嘴。一般而言,此工作夾台可在保持面上的空間產生負壓來吸引被加工物,且可在保持面上的空間產生正壓來和被加工物分離,又,可將通過保持面的中心且正交於保持面之直線設為旋轉軸來進行旋轉。Therefore, after processing, the workpiece can be cleaned in a cleaning device, for example, having a cleaning chamber. The cleaning chamber houses a worktable with a flat holding surface and a nozzle that supplies cleaning liquid to the holding surface. Generally speaking, this worktable can generate negative pressure in the space above the holding surface to attract the workpiece, generate positive pressure in the space above the holding surface to separate the workpiece, and can rotate about a straight line passing through the center of the holding surface and perpendicular to the holding surface as its rotation axis.

並且,在此洗淨裝置中,可將被加工物的背面側吸引保持在工作夾台,且以工作夾台已旋轉之狀態來從噴嘴對被加工物的正面供給洗淨液。藉此,可去除已附著於被加工物的正面之切削屑或碎屑。像這樣被使用之工作夾台,是藉由主軸單元而呈可旋轉地被支撐。Furthermore, this cleaning system can hold the back side of the workpiece against the work table by suction, while the work table rotates to supply cleaning liquid to the front side of the workpiece through a nozzle. This removes chips and debris adhering to the front side of the workpiece. The work table used in this manner is rotatably supported by the spindle unit.

主軸單元具有支撐工作夾台之主軸、及將主軸支撐成可旋轉之軸承。並且,藉由使連結於主軸的端部之馬達動作,而使工作夾台與主軸一起旋轉。又,為了防止設置於軸承的內部的潤滑脂(grease)等的潤滑劑朝周圍飛散,在主軸單元中會將主軸及軸承容置於罩殼。The spindle unit consists of a main shaft that supports the work table and bearings that rotatably support the main shaft. The motor connected to the end of the main shaft rotates the work table and the main shaft together. To prevent grease and other lubricants inside the bearings from scattering, the main shaft and bearings are housed in a housing in the spindle unit.

此外,工作夾台的保持面上的空間透過形成於主軸的內部之負壓或正壓供給管、與藉由罩殼及主軸之間的油封所界定出之空間即壓力可變部,而連通於已連接於罩殼之負壓供給管以及正壓供給管。並且,藉由使已連接於負壓供給管之負壓供給源動作而在保持面上的空間產生負壓,又,藉由使已連接於正壓供給管之正壓供給源動作而在保持面上的空間產生正壓。再者,大多會在油封與主軸的界面設置潤滑油,以免阻礙主軸的旋轉。Furthermore, the space on the worktable's retaining surface is connected to the negative and positive pressure supply pipes connected to the housing via a negative or positive pressure supply pipe formed inside the spindle and a space defined by an oil seal between the housing and the spindle, known as a variable pressure section. Furthermore, by operating the negative pressure supply source connected to the negative pressure supply pipe, negative pressure is generated in the space on the retaining surface, while by operating the positive pressure supply source connected to the positive pressure supply pipe, positive pressure is generated in the space on the retaining surface. Furthermore, lubricant is often applied to the interface between the oil seal and the spindle to prevent obstruction of spindle rotation.

在此,主軸具有從罩殼突出,以和工作夾台連結之端部。又,在容置工作夾台之洗淨用腔室中,設置有可供此主軸的端部插入之開口。因此,罩殼以及主軸之間的空間與洗淨用腔室有時會透過此開口而連通。在這種情況下,恐有從軸承飛散之潤滑劑及/或從油封與主軸的界面飛散之潤滑油等混入洗淨用腔室內而附著於被加工物的表面之虞。Here, the spindle has an end that protrudes from the housing to connect to the worktable. Furthermore, the cleaning chamber that houses the worktable has an opening for inserting the spindle end. Therefore, the space between the housing and the spindle and the cleaning chamber may sometimes communicate through this opening. In this case, there is a risk that lubricant scattered from the bearings and/or lubricating oil scattered from the interface between the oil seal and the spindle may enter the cleaning chamber and adhere to the surface of the workpiece.

因此,在具有這種工作夾台的裝置中,一般而言,會設置有阻隔工作夾台側的空間與主軸單元側的空間之連通的密封構件(參照例如專利文獻1)。此密封構件是藉由例如V型環來構成,且設置成其唇部接觸於可旋轉之被密封部。 先前技術文獻 專利文獻 Therefore, in devices equipped with such a work chuck, a sealing member is typically provided to block the connection between the space on the work chuck side and the space on the spindle unit side (see, for example, Patent Document 1). This sealing member is constructed, for example, from a V-ring, with its lip contacting the rotatable sealed portion. Prior Art Patent Document

專利文獻1:日本特開2018-73930號公報Patent Document 1: Japanese Patent Application Publication No. 2018-73930

發明欲解決之課題Invention problem to be solved

在密封構件與可旋轉的被密封部接觸之情況下,因為密封構件會隨著被密封部的旋轉而磨耗,所以要歷經長期間來阻隔工作夾台側的空間與主軸單元側的空間之連通是困難的。When the sealing member contacts the rotatable sealed part, it is difficult to block the connection between the space on the work table side and the space on the spindle unit side over a long period of time because the sealing member will wear as the sealed part rotates.

有鑒於這一點,本發明之目的在於提供一種可以歷經長期間來將主軸單元側的空間與容置工作夾台之洗淨用腔室之連通阻隔之洗淨裝置。 用以解決課題之手段 In light of this, the present invention aims to provide a cleaning device that can permanently isolate the space on the side of the spindle unit from the cleaning chamber housing the worktable. Means for Solving the Problem

根據本發明,可提供一種洗淨裝置,在洗淨用腔室中洗淨被加工物,前述洗淨裝置具備:工作夾台,以保持面保持該被加工物;噴嘴,對已保持在該工作夾台之該被加工物供給洗淨液;及主軸單元,將該工作夾台支撐成可旋轉,前述洗淨用腔室容置該工作夾台以及該噴嘴, 該主軸單元具有:主軸,支撐該工作夾台;軸承,可旋轉地支撐該主軸;及罩殼,容置該主軸的一部分以及該軸承, 在該罩殼以及該主軸之間設有壓力可變部以及開放部, 該壓力可變部設置在連接於該罩殼之負壓供給管以及正壓供給管、與形成在該主軸的內部且連通於該保持面上的空間之負壓或正壓供給管之間,並且配置在比該軸承更遠離該工作夾台之位置, 該開放部設置在該軸承以及該壓力可變部之間,並且可透過形成於該罩殼之貫通孔或連接於該罩殼之開放管而開放, 該主軸具有從該罩殼突出之端部, 該洗淨用腔室的一部分是被具備供該主軸的該端部插入之開口的罩蓋構件所界定, 在該罩蓋構件以及該主軸的該端部之間設置有會阻隔該罩殼以及該主軸之間的空間與該洗淨用腔室之連通的密封部, 該密封部具有:環狀的磁環(magnet ring),設置在界定出該罩蓋構件之該開口的內周面;及磁性流體,設置在該磁環的內側,且和該主軸的該端部接觸。 According to the present invention, a cleaning device is provided for cleaning a workpiece in a cleaning chamber. The cleaning device comprises: a worktable for holding the workpiece with a holding surface; a nozzle for supplying a cleaning liquid to the workpiece held on the worktable; and a spindle unit for rotatably supporting the worktable. The cleaning chamber houses the worktable and the nozzle. The spindle unit comprises: a spindle for supporting the worktable; a bearing for rotatably supporting the spindle; and a housing for housing a portion of the spindle and the bearing. A variable pressure portion and an open portion are provided between the housing and the spindle. The variable pressure portion is disposed between a negative pressure supply pipe and a positive pressure supply pipe connected to the housing, and a negative pressure supply pipe or a positive pressure supply pipe formed within the spindle and connected to the retaining surface, and is positioned farther from the work table than the bearing. The opening portion is disposed between the bearing and the variable pressure portion and is accessible via a through-hole formed in the housing or an opening pipe connected to the housing. The spindle has an end protruding from the housing. A portion of the cleaning chamber is defined by a cover member having an opening for inserting the end of the spindle. A seal is disposed between the cover member and the end of the spindle to block communication between the space between the housing and the spindle and the cleaning chamber. The seal comprises an annular magnet ring disposed on the inner circumference of the cover member defining the opening; and a magnetic fluid disposed inside the magnet ring and in contact with the end of the spindle.

此外,在本發明中,較佳的是,該主軸的該端部具有:圓柱狀的被密封部,和該磁性流體接觸;及圓柱狀的延伸部,從該被密封部朝該工作夾台側延伸且和該被密封部相同直徑。 發明效果 Furthermore, in the present invention, the end portion of the main shaft preferably includes: a cylindrical sealed portion in contact with the magnetic fluid; and a cylindrical extension portion extending from the sealed portion toward the work table side and having the same diameter as the sealed portion. Effects of the Invention

在本發明中,是阻隔罩殼以及主軸之間的空間與洗淨用腔室之連通的密封部具有和主軸接觸之磁性流體。因此,在本發明中,可在不會使固體彼此接觸的情形下,阻隔該空間與洗淨用腔室之連通。其結果,可以減少伴隨於主軸的旋轉之密封部的磨耗,而可歷經長期間來將該空間與洗淨用腔室之連通阻隔。In the present invention, the seal that blocks the connection between the space between the housing and the spindle and the cleaning chamber contains a magnetic fluid in contact with the spindle. Therefore, the present invention can block the connection between the space and the cleaning chamber without causing solids to come into contact. As a result, wear on the seal associated with spindle rotation is reduced, allowing the space to be blocked from the cleaning chamber for a long period of time.

此外,在本發明中,在軸承以及壓力可變部之間設置有開放部。藉此,即使在因應於壓力可變部中的壓力之變動而產生有從壓力可變部往開放部之洩漏的情況下,仍可抑制軸承周邊的壓力之變動。因此,可抑制設置於軸承的內部之潤滑脂等的潤滑劑之飛散。Furthermore, in the present invention, an open portion is provided between the bearing and the variable pressure section. This prevents pressure fluctuations in the variable pressure section from leaking from the variable pressure section to the open portion, thereby suppressing pressure fluctuations around the bearing. This also prevents scattering of lubricants such as grease inside the bearing.

又,在設置有這種開放部的情況下,密封部周邊的壓力之變動也會被抑制。因此,可防止包含於密封部之磁性流體流出之情形。其結果,可以歷經長期間來將罩殼以及主軸之間的空間與洗淨用腔室之連通阻隔。Furthermore, the presence of this opening suppresses pressure fluctuations around the seal, preventing the magnetic fluid contained within the seal from leaking out. Consequently, the space between the housing and the spindle can be effectively blocked from the cleaning chamber over a long period of time.

用以實施發明之形態Form used to implement the invention

參照附圖,說明本發明的實施形態。圖1是示意地顯示具有洗淨裝置之加工裝置(切削裝置)之一例的立體圖。再者,圖1所示之X軸方向(前後方向)以及Y軸方向(左右方向)是在水平面上互相正交之方向,又,Z軸方向(上下方向)是正交於X軸方向以及Y軸方向之方向(鉛直方向)。The embodiments of the present invention will be described with reference to the accompanying drawings. FIG1 is a perspective view schematically showing an example of a processing device (cutting device) equipped with a cleaning device. Furthermore, the X-axis direction (front-back direction) and the Y-axis direction (left-right direction) shown in FIG1 are mutually orthogonal on a horizontal plane. Furthermore, the Z-axis direction (up-down direction) is a direction perpendicular to the X-axis and Y-axis directions (a vertical direction).

圖1所示之切削裝置2具備支撐各構成要素之基台4。在基台4的上表面形成有長邊方向平行於X軸方向之矩形的開口4a。在開口4a內,設置有移動工作台6、及伴隨於移動工作台6之移動而伸縮之蛇腹狀的防塵防滴罩蓋8。在防塵防滴罩蓋8的下方設置有使移動工作台6沿著X軸方向移動之X軸方向移動機構(未圖示)。The cutting device 2 shown in Figure 1 includes a base 4 that supports its various components. A rectangular opening 4a, with its longitudinal sides parallel to the X-axis, is formed on the top surface of the base 4. Within the opening 4a are located a movable table 6 and a dust and drip-proof cover 8, which expands and contracts with the movement of the movable table 6. Below the dust and drip-proof cover 8 is an X-axis movement mechanism (not shown) that moves the movable table 6 along the X-axis.

在移動工作台6之上表面,設置有工作夾台10。工作夾台10具有露出於上方之圓盤狀的多孔板10a,且具有對被放置於多孔板10a之被加工物進行吸引保持之功能。多孔板10a的上表面為大致平坦,並成為保持被加工物之保持面。在工作夾台10的內部形成有吸引路(未圖示),前述吸引路將一端連接於設置在工作夾台10的外部之噴射器等的吸引源(未圖示)。A work clamp 10 is mounted on the upper surface of the movable worktable 6. The work clamp 10 includes a disc-shaped porous plate 10a exposed above, which is used to attract and retain workpieces placed on the plate 10a. The top surface of the porous plate 10a is generally flat, serving as a holding surface for the workpiece. A suction path (not shown) is formed within the work clamp 10, one end of which is connected to a suction source (not shown), such as an ejector, located outside the work clamp 10.

吸引路的另一端會到達多孔板10a。因此,若在已將被加工物放置在保持面的狀態下使此吸引源動作,即可將被加工物吸引保持於工作夾台10。此外,工作夾台10已連結於馬達等之工作夾台用旋轉驅動源(未圖示)。當使此工作夾台用旋轉驅動源動作時,工作夾台10會以通過保持面的中心且正交於保持面之直線作為旋轉軸來旋轉。The other end of the suction path reaches the porous plate 10a. Therefore, when the suction source is activated while the workpiece is placed on the holding surface, the workpiece can be sucked and held on the work clamp 10. Furthermore, the work clamp 10 is connected to a rotary drive source (not shown), such as a motor. When this rotary drive source is activated, the work clamp 10 rotates about a straight line passing through the center of the holding surface and perpendicular to the holding surface as its rotation axis.

在基台4的上表面之開口4a的附近,設置有支撐構造12。支撐構造12具備從基台4的上表面沿著Z軸方向延伸之豎立設置部12a、與從豎立設置部12a的上端部沿著Y軸方向延伸成越過開口4a之臂部12b。在臂部12b的前表面側設置有Y軸方向移動機構14。A support structure 12 is provided near the opening 4a on the top surface of the base 4. This support structure 12 comprises a vertical portion 12a extending from the top surface of the base 4 in the Z-axis direction, and an arm portion 12b extending from the upper end of the vertical portion 12a in the Y-axis direction, extending beyond the opening 4a. A Y-axis movement mechanism 14 is provided on the front surface of the arm portion 12b.

Y軸方向移動機構14具備固定在臂部12b的前表面且沿著Y軸方向延伸之一對Y軸導軌16。在一對Y軸導軌16的前表面側,以可沿著一對Y軸導軌16滑動之態樣連結有Y軸移動板18。The Y-axis direction moving mechanism 14 has a pair of Y-axis guide rails 16 fixed to the front surface of the arm 12b and extending along the Y-axis direction. A Y-axis moving plate 18 is connected to the front surface side of the pair of Y-axis guide rails 16 so as to be slidable along the pair of Y-axis guide rails 16.

又,在一對Y軸導軌16之間配置有沿著Y軸方向延伸之螺桿軸20。於螺桿軸20的一端部連結有用於使螺桿軸20旋轉之馬達(未圖示)。在螺桿軸20之形成有螺旋狀之溝的表面,設置有容置滾珠之螺帽部(未圖示),而構成滾珠螺桿,前述滾珠會在旋轉之螺桿軸20的表面滾動。A screw shaft 20 extending along the Y-axis is disposed between the pair of Y-axis guide rails 16. A motor (not shown) is connected to one end of the screw shaft 20 to rotate it. A nut (not shown) is provided on the surface of the screw shaft 20, where the spiral groove is formed, to accommodate balls, forming a ball screw. These balls roll on the surface of the rotating screw shaft 20.

亦即,當螺桿軸20旋轉時,滾珠會在螺帽部內循環而使螺帽部沿著Y軸方向移動。又,此螺帽部已固定於Y軸移動板18的後表面側。因此,只要以連結於螺桿軸20的一端部之馬達使螺桿軸20旋轉,Y軸移動板18即和螺帽部一起沿著Y軸方向移動。That is, when the screw shaft 20 rotates, the balls circulate within the nut, causing the nut to move along the Y-axis. Furthermore, this nut is fixed to the rear surface of the Y-axis moving plate 18. Therefore, simply rotating the screw shaft 20 with the motor connected to one end of the screw shaft 20 causes the Y-axis moving plate 18 and the nut to move along the Y-axis.

在Y軸移動板18的前表面側,設置有Z軸方向移動機構22。Z軸方向移動機構22具備固定在Y軸移動板18的前表面且沿著Z軸方向而延伸之一對Z軸導軌24。在一對Z軸導軌24的前表面側,以可沿著一對Z軸導軌24滑動之態樣連結有Z軸移動板26。A Z-axis movement mechanism 22 is mounted on the front surface of the Y-axis movement plate 18. The Z-axis movement mechanism 22 includes a pair of Z-axis guide rails 24 fixed to the front surface of the Y-axis movement plate 18 and extending along the Z-axis direction. A Z-axis movement plate 26 is connected to the front surface of the pair of Z-axis guide rails 24 so as to be slidable along the pair of Z-axis guide rails 24.

又,在一對Z軸導軌24之間配置有沿著Z軸方向延伸之螺桿軸28。於螺桿軸28的一端部連結有用於使螺桿軸28旋轉之馬達30。在螺桿軸28之形成有螺旋狀之溝的表面,設置有容置滾珠之螺帽部(未圖示),而構成滾珠螺桿,前述滾珠會在旋轉之螺桿軸28的表面滾動。A screw shaft 28 extending along the Z axis is disposed between the pair of Z-axis guide rails 24. A motor 30 is connected to one end of the screw shaft 28 to rotate it. A nut (not shown) that houses balls is provided on the surface of the screw shaft 28, where the spiral grooves are formed, forming a ball screw. The balls roll on the surface of the rotating screw shaft 28.

亦即,當螺桿軸28旋轉時,滾珠會在螺帽部內循環而使螺帽部沿著Z軸方向移動。又,此螺帽部已固定於Z軸移動板26的後表面側。因此,只要以馬達30使螺桿軸28旋轉,Z軸移動板26即和螺帽部一起沿著Z軸方向移動。That is, when the screw shaft 28 rotates, the balls circulate within the nut, causing the nut to move along the Z-axis. Furthermore, the nut is fixed to the rear surface of the Z-axis moving plate 26. Therefore, as long as the motor 30 rotates the screw shaft 28, the Z-axis moving plate 26 and the nut will move along the Z-axis.

在Z軸移動板26的下部固定有切削單元32。切削單元32具有長度方向會平行於Y軸方向之筒狀的主軸殼體34。在主軸殼體34容置有長度方向平行於Y軸方向之圓柱狀的主軸(未圖示)。此主軸以可旋轉的狀態被主軸殼體34所支撐。A cutting unit 32 is fixed to the lower portion of the Z-axis moving plate 26. The cutting unit 32 comprises a cylindrical spindle housing 34, the longitudinal direction of which is parallel to the Y-axis. The spindle housing 34 houses a cylindrical spindle (not shown), the longitudinal direction of which is parallel to the Y-axis. This spindle is rotatably supported by the spindle housing 34.

主軸的前端部突出於主軸殼體34之外,且在此前端部裝設有具有環狀的切刃之切削刀片36。又,主軸的基端部已連結於內置於主軸殼體34之馬達等之切削刀片用旋轉驅動源(未圖示)。The front end of the spindle protrudes from the spindle housing 34, and a cutting blade 36 having an annular cutting edge is mounted on the front end. In addition, the base end of the spindle is connected to a rotational drive source (not shown) for the cutting blade, such as a motor built into the spindle housing 34.

在X軸方向上相鄰於切削單元32的位置設置有已固定於Z軸移動板26的下部之拍攝單元38。拍攝單元38包含例如LED(發光二極體,Light Emitting Diode)等之光源、接物透鏡、CCD(電荷耦合器件,Charge Coupled Device)影像感測器或CMOS(互補式金屬氧化物半導體,Complementary Metal Oxide Semiconductor)影像感測器等之拍攝元件。A camera unit 38 is mounted on the lower portion of the Z-axis moving plate 26, adjacent to the cutting unit 32 along the X-axis. The camera unit 38 includes a light source such as an LED (light-emitting diode), an objective lens, and a CCD (charge-coupled device) or CMOS (complementary metal oxide semiconductor) image sensor.

切削裝置2中的被加工物的加工是以例如以下的順序來進行。首先,拍攝單元38會拍攝已被吸引保持在工作夾台10之被加工物。接著,依據藉由此拍攝所得到的圖像,來進行切削單元32與被加工物的對位。具體而言,是Y軸方向移動機構14及/或Z軸方向移動機構22會調整切削單元32的位置,且/或X軸方向移動機構及/或工作夾台用旋轉驅動源會調整吸引保持被加工物之工作夾台10的位置及/或方向。The processing of the workpiece in the cutting device 2 is carried out in the following order, for example. First, the imaging unit 38 images the workpiece that is attracted and held by the work clamp 10. Then, based on the image obtained by the imaging, the cutting unit 32 and the workpiece are aligned. Specifically, the Y-axis moving mechanism 14 and/or the Z-axis moving mechanism 22 adjust the position of the cutting unit 32, and/or the X-axis moving mechanism and/or the work clamp rotary drive source adjust the position and/or direction of the work clamp 10 that attracts and holds the workpiece.

接著,使切削刀片36在已旋轉的狀態下接觸於被加工物。具體而言,是在切削刀片用旋轉驅動源已使在前端部裝設有切削刀片36之主軸旋轉的狀態下,Y軸方向移動機構14及/或Z軸方向移動機構22使切削單元32移動,且/或X軸方向移動機構及/或工作夾台用旋轉驅動源使吸引保持被加工物之工作夾台10移動。藉此,可對被加工物施行所期望之加工。Next, the cutting blade 36 is brought into contact with the workpiece while being rotated. Specifically, while the spindle, with the cutting blade 36 mounted on its tip, is being rotated by the cutting blade rotation drive source, the Y-axis movement mechanism 14 and/or the Z-axis movement mechanism 22 move the cutting unit 32, and/or the X-axis movement mechanism and/or the workpiece rotation drive source move the workpiece 10, which is suctioning and holding the workpiece. In this way, the workpiece can be subjected to the desired processing.

又,在基台4的上表面的支撐構造12的前方的位置,設置有洗淨裝置40。圖2是示意地顯示洗淨裝置40之部分破斷立體圖。洗淨裝置40具有工作夾台42。工作夾台42具有露出於上方之圓盤狀的多孔板42a,且具有對被放置於多孔板42a之被加工物進行吸引保持之功能。多孔板42a的上表面為大致平坦,並成為保持被加工物之保持面。A cleaning device 40 is installed on the upper surface of the base 4, in front of the support structure 12. Figure 2 is a partially broken perspective view schematically showing the cleaning device 40. The cleaning device 40 includes a work clamp 42. The work clamp 42 has a disc-shaped porous plate 42a exposed above, and has the function of sucking and holding the workpiece placed on the porous plate 42a. The upper surface of the porous plate 42a is generally flat and serves as a holding surface for the workpiece.

在工作夾台42的周圍設置有包圍工作夾台42之洗淨用腔室本體44。洗淨用腔室本體44具有圓筒狀的外周壁44a、從外周壁44a的下端部朝徑方向內側延伸之環狀的底壁44b、及從底壁44b的內端部豎立設置之圓筒狀的內周壁44c。A cleaning chamber body 44 is provided around the work clamp 42 to surround the work clamp 42. The cleaning chamber body 44 has a cylindrical outer wall 44a, an annular bottom wall 44b extending radially inward from the lower end of the outer wall 44a, and a cylindrical inner wall 44c extending vertically from the inner end of the bottom wall 44b.

並且,在外周壁44a設置有排氣口(未圖示),此排氣口已透過排氣管46而連接於排氣泵(未圖示)。又,在底壁44b設置有排水口48,於排水口48連接有朝下方延伸之排水管50。又,在底壁44b的下表面固定有複數支(例如3支)支撐腳52。複數個支撐腳52沿著底壁44b的圓周方向呈大致等間隔地設置,且支撐洗淨用腔室本體44。An exhaust port (not shown) is provided on the outer wall 44a and is connected to an exhaust pump (not shown) via an exhaust pipe 46. A drain port 48 is provided on the bottom wall 44b, connected to a downwardly extending drain pipe 50. Furthermore, a plurality of (e.g., three) support legs 52 are fixed to the lower surface of the bottom wall 44b. These support legs 52 are arranged at approximately equal intervals along the circumference of the bottom wall 44b and support the cleaning chamber body 44.

又,在洗淨用腔室本體44的上方設有圓盤狀的蓋子(未圖示)。此蓋子的直徑比外周壁44a的內徑更長。並且,可藉由將此蓋子的下表面配置成和外周壁44a的上表面相接,而防止附著於被加工物之切削屑或使用於洗淨之洗淨液在被加工物的洗淨時飛散到基台4的上表面之情形。A disc-shaped lid (not shown) is installed above the cleaning chamber body 44. The diameter of this lid is longer than the inner diameter of the outer peripheral wall 44a. Furthermore, by placing the lower surface of this lid in contact with the upper surface of the outer peripheral wall 44a, it prevents chips adhering to the workpiece or cleaning fluid used for cleaning from scattering onto the upper surface of the base 4 during cleaning of the workpiece.

在外周壁44a的內側配置有洗淨單元54以及乾燥單元56。洗淨單元54以及乾燥單元56的每一個具有可插入底壁44b之管狀的軸部54a、56a。軸部54a、56a是在工作夾台42的外側於相對於工作夾台42的保持面垂直的方向上延伸之管狀的構件。並且,於軸部54a、56a的下端側連結有用於使軸部54a、56a旋轉之馬達等的旋轉驅動源(未圖示)。Inside the outer peripheral wall 44a, a washing unit 54 and a drying unit 56 are arranged. Each of the washing unit 54 and the drying unit 56 has a tubular shaft 54a, 56a that can be inserted into the bottom wall 44b. The shafts 54a, 56a are tubular members that extend perpendicularly to the holding surface of the work table 42, outside the work table 42. A rotational drive source (not shown), such as a motor, is connected to the lower ends of the shafts 54a, 56a to rotate the shafts 54a, 56a.

在軸部54a、56a的上端部連接有臂部54b、56b。臂部54b、56b是以相當於從軸部54a、56a的上端部到工作夾台42的中央為止之距離的長度在相對於工作夾台42的保持面平行的方向上延伸之管狀的構件。在臂部54b、56b的前端部(未和軸部54a、56a連接之側的臂部54b、56b的端部)設置有朝向下方之噴嘴54c、56c。Arms 54b and 56b are connected to the upper ends of shafts 54a and 56a. Arms 54b and 56b are tubular members that extend parallel to the holding surface of work table 42, a length equal to the distance from the upper ends of shafts 54a and 56a to the center of work table 42. Downward-facing nozzles 54c and 56c are provided at the front ends of arms 54b and 56b (the ends of arms 54b and 56b not connected to shafts 54a and 56a).

此外,軸部54a以及臂部54b已連通於洗淨液供給源(未圖示)。因此,例如,若在使軸部54a旋轉成將噴嘴54c定位於工作夾台42的上方後,從洗淨液供給源對軸部54a以及臂部54b供給洗淨液時,即可從噴嘴54c將洗淨液供給到工作夾台42的保持面。Furthermore, the shaft 54a and arm 54b are connected to a cleaning liquid supply source (not shown). Therefore, for example, if the shaft 54a is rotated to position the nozzle 54c above the work table 42, and cleaning liquid is supplied from the cleaning liquid supply source to the shaft 54a and arm 54b, the cleaning liquid can be supplied from the nozzle 54c to the holding surface of the work table 42.

又,軸部56a以及臂部56b已連通於空氣供給源(未圖示)。因此,例如,若在使軸部56a旋轉成將噴嘴56c定位在工作夾台42的上方後,從空氣供給源對軸部56a以及臂部56b供給空氣時,即可從噴嘴56c將空氣供給到工作夾台42的保持面。Furthermore, the shaft 56a and arm 56b are connected to an air supply source (not shown). Therefore, for example, if the shaft 56a is rotated to position the nozzle 56c above the work table 42, and air is supplied from the air supply source to the shaft 56a and arm 56b, air can be supplied from the nozzle 56c to the holding surface of the work table 42.

主軸單元58會在存在於內周壁44c的內側之圓筒狀的空間朝上方通過。主軸單元58具有由肥粒鐵系或麻田散鐵系之不鏽鋼等所構成之主軸60。主軸60是將上端側連結於工作夾台42,而支撐工作夾台42。又,在主軸60的下端部連結有馬達62,當使馬達62動作時,工作夾台42即以通過保持面的中心且正交於保持面之直線作為旋轉軸來旋轉。The spindle unit 58 passes upward through the cylindrical space inside the inner peripheral wall 44c. The spindle unit 58 includes a spindle 60 made of, for example, a ferrous or ferrous alloy stainless steel. The spindle 60 is connected at its upper end to the work chuck 42, thereby supporting the work chuck 42. Furthermore, a motor 62 is connected to the lower end of the spindle 60. When the motor 62 is activated, the work chuck 42 rotates about a straight line passing through the center of the retaining surface and perpendicular to the retaining surface.

馬達62是以可朝上下方向移動的態樣被支撐機構64所支撐。支撐機構64具備安裝於馬達62之複數個(例如3個)氣缸66,在各個氣缸66的下部連結有支撐腳68。並且,若使複數個氣缸66同時動作時,馬達62及工作夾台42即會升降。The motor 62 is supported vertically by a support mechanism 64. The support mechanism 64 comprises a plurality (e.g., three) of air cylinders 66 mounted on the motor 62. A support leg 68 is connected to the bottom of each air cylinder 66. Simultaneously operating the plurality of air cylinders 66 causes the motor 62 and the work clamp 42 to move upward and downward.

例如,在洗淨裝置40中的被加工物的搬出搬入時,可使支撐機構64動作而將工作夾台42定位到預定的搬出搬入位置,在被加工物的洗淨時,會將工作夾台42定位到比搬出搬入位置更下方之洗淨位置。再者,在圖2中,示意地顯示有工作夾台42位於搬出搬入位置之狀態的洗淨裝置40。For example, when loading or unloading workpieces into the cleaning apparatus 40, the support mechanism 64 can be actuated to position the workpiece clamp 42 at a predetermined loading or unloading position. During cleaning of the workpieces, the workpiece clamp 42 is positioned below the loading or unloading position. FIG. 2 schematically illustrates the cleaning apparatus 40 with the workpiece clamp 42 positioned at the loading or unloading position.

在主軸60的周圍設置有罩殼70以及罩蓋構件72。圖3是示意地顯示主軸60、罩殼70以及罩蓋構件72等的部分剖面側視圖,圖4是圖3的局部放大圖。再者,在圖3以及圖4中,示意地顯示有工作夾台42位於洗淨位置之狀態的洗淨裝置40。A housing 70 and a cover member 72 are provided around the main spindle 60. Figure 3 is a partially cutaway side view schematically showing the main spindle 60, the housing 70, the cover member 72, and the like, and Figure 4 is a partially enlarged view of Figure 3. Furthermore, Figures 3 and 4 schematically show the cleaning device 40 with the work table 42 in the cleaning position.

罩殼70具有外徑比內周壁44c的內徑更短的圓筒狀的形狀,並且已透過連結構件(未圖示)而固定於馬達62。在罩殼70的上部的內周面固定有軸承74的外圈。軸承74是其內圈和主軸60接觸而將主軸60支撐成可旋轉。The housing 70 has a cylindrical shape with an outer diameter shorter than the inner diameter of the inner peripheral wall 44c and is secured to the motor 62 via a connecting member (not shown). The outer ring of a bearing 74 is secured to the inner peripheral surface of the upper portion of the housing 70. The inner ring of the bearing 74 contacts the main shaft 60, rotatably supporting the main shaft 60.

又,在罩殼70以朝上下排列的方式設置有在徑方向上貫通於罩殼70之3個貫通孔。此3個貫通孔當中於最接近於軸承74之貫通孔連接有管狀的開放管76。開放管76會將罩殼70以及主軸60之間的環狀的空間(開放部)A、與罩殼70的外側的空間連通。再者,亦可沒有開放管76。亦即,開放部A亦可透過貫通於罩殼70的貫通孔而連通於罩殼70的外側的空間。Furthermore, three through-holes are arranged vertically in the housing 70, extending radially therethrough. Of these three through-holes, the one closest to the bearing 74 is connected to a tubular opening 76. Opening 76 connects the annular space (opening) A between the housing 70 and the spindle 60 with the space outside the housing 70. Alternatively, opening 76 may be omitted. In other words, opening A may be connected to the space outside the housing 70 via the through-holes.

在其餘的2個貫通孔分別連接有管狀的負壓供給管78以及正壓供給管80。負壓供給管78會將罩殼70以及主軸60之間的比開放部A更遠離軸承74之環狀的空間(壓力可變部)B、與噴射器等之負壓供給源(吸引源)連通。又,正壓供給管80會連通壓力可變部B與氣體供給源等之正壓供給源。The remaining two through-holes are connected to a tubular negative pressure supply pipe 78 and a positive pressure supply pipe 80, respectively. Negative pressure supply pipe 78 connects the annular space (variable pressure section) B between the housing 70 and the main shaft 60, which is farther from the bearing 74 than the opening A, to a negative pressure supply source (suction source) such as an ejector. Positive pressure supply pipe 80 connects the variable pressure section B to a positive pressure supply source such as a gas supply source.

此外,在開放部A以及壓力可變部B之交界、與壓力可變部B的下方之外部空間與壓力可變部B之交界,分別設置有環狀的油封82a、82b。又,壓力可變部B可連通於已形成在主軸60的內部之負壓或正壓供給管60a。負壓或正壓供給管60a是透過已形成在工作夾台42的內部之流路(未圖示)而連通於工作夾台42的保持面上的空間。Annular oil seals 82a and 82b are installed at the boundary between the open portion A and the variable pressure portion B, and at the boundary between the external space below the variable pressure portion B and the variable pressure portion B. Furthermore, the variable pressure portion B is connected to a negative or positive pressure supply pipe 60a formed inside the spindle 60. The negative or positive pressure supply pipe 60a is connected to the space on the retaining surface of the work clamp 42 via a flow path (not shown) formed inside the work clamp 42.

罩蓋構件72具有環狀的頂壁72a、與從頂壁72a的外端部朝下方延伸之圓筒狀的側壁72b。再者,頂壁72a的內徑比軸承74的內徑更長。又,頂壁72a的外徑以及側壁72b的內徑比內周壁44c的外徑更長。The cover member 72 has an annular top wall 72a and a cylindrical side wall 72b extending downward from the outer end of the top wall 72a. The inner diameter of the top wall 72a is longer than the inner diameter of the bearing 74. Furthermore, the outer diameters of the top wall 72a and the inner diameters of the side wall 72b are longer than the outer diameter of the inner peripheral wall 44c.

於頂壁72a的內側已插入有從罩殼70突出之主軸60的上端部。換言之,罩蓋構件72具備供主軸60的上端部插入之開口。又,在罩蓋構件72以及主軸60的上端部之間,設置有環狀的密封部84,前述環狀的密封部84會將罩殼70以及主軸60之間的空間(例如開放部A以及壓力可變部B)與工作夾台42側的空間之連通阻隔。The upper end of the spindle 60, protruding from the housing 70, is inserted into the inner side of the top wall 72a. In other words, the cover member 72 has an opening for inserting the upper end of the spindle 60. Furthermore, an annular seal 84 is provided between the cover member 72 and the upper end of the spindle 60. This annular seal 84 blocks the space between the housing 70 and the spindle 60 (e.g., the open portion A and the variable pressure portion B) from communicating with the space on the side of the work clamp 42.

密封部84具有設置在頂壁72a的內周面之環狀的磁環84a。磁環84a是由永久磁鐵所形成,並且設置成N極以及S極分別接觸於一對環狀的球形件(ball piece)84b。又,於球形件84b以及主軸60之間設置有磁性流體84c。The seal 84 includes an annular magnetic ring 84a mounted on the inner circumference of the top wall 72a. The magnetic ring 84a is formed from a permanent magnet, with its north and south poles contacting a pair of annular spherical pieces 84b. A magnetic fluid 84c is provided between the spherical pieces 84b and the main shaft 60.

磁性流體84c是沿著在磁環84a以及球形件84b與主軸60之間所構成之磁通線而被保持。再者,磁性流體84c是例如包含磁鐵礦(magnetite)或錳鋅鐵氧體(manganese zinc ferrite)等強磁性微粒子以及界面活性劑之烷基萘基底(alkyl naphthalene base)磁性流體。或者,磁性流體84c亦可為包含強磁性微粒子以及界面活性劑的氟油基底磁性流體。Magnetic fluid 84c is retained along the magnetic flux lines formed between magnetic ring 84a, spherical member 84b, and main shaft 60. Furthermore, magnetic fluid 84c is, for example, an alkyl naphthalene-based magnetic fluid containing ferromagnetic particles such as magnetite or manganese zinc ferrite and a surfactant. Alternatively, magnetic fluid 84c can be a fluorine oil-based magnetic fluid containing ferromagnetic particles and a surfactant.

在此,恐有因為主軸60在洗淨裝置40的搬運時傾斜等,而使流體即磁性流體84c擴展至主軸60與球形件84b之間的空間的外側之虞。較佳的是,主軸60具有即使在這種情況下仍然形成可以抑制磁性流體84c的流出之磁場的形狀。Here, there is a risk that the fluid, namely the magnetic fluid 84c, may spread to the outside of the space between the main shaft 60 and the spherical member 84b due to the main shaft 60 tilting during transportation of the cleaning device 40. Preferably, the main shaft 60 has a shape that forms a magnetic field that can suppress the outflow of the magnetic fluid 84c even in such a situation.

較佳的是,例如,從罩殼70突出而插入於罩蓋構件72的開口(頂壁72a的內側)之主軸60的上端部具有和磁性流體84c接觸之圓柱狀的被密封部、與從此被密封部朝上方延伸之和被密封部相同直徑的延伸部。即使在像這樣地設置有延伸部的情況下,且即使磁性流體84c從主軸60與球形件84b之間的空間朝上方擴展的情況下,仍可抑制磁性流體84c的流出。Preferably, for example, the upper end of the main shaft 60, which protrudes from the housing 70 and is inserted into the opening (inside the top wall 72a) of the cover member 72, has a cylindrical sealed portion that contacts the magnetic fluid 84c, and an extension portion extending upward from this sealed portion and having the same diameter as the sealed portion. Even with this extension portion, even if the magnetic fluid 84c expands upward from the space between the main shaft 60 and the spherical member 84b, the outflow of the magnetic fluid 84c can be suppressed.

又,當主軸60旋轉時,會因主軸60與磁性流體84c的摩擦而產生摩擦熱。並且,若主軸60因摩擦熱而被加熱,會有例如油封82a、82b劣化之疑慮。Furthermore, when the main shaft 60 rotates, friction between the main shaft 60 and the magnetic fluid 84c generates frictional heat. Furthermore, if the main shaft 60 is heated by frictional heat, there is a concern that the oil seals 82a and 82b may deteriorate.

因此,磁環84a的磁力宜在可以將上述之兩空間之連通阻隔之量的磁性流體84c保持於球形件84b以及主軸60之間的限度內設得較弱。例如,磁環84a的磁力宜為400~800G。Therefore, the magnetic force of the magnetic ring 84a is preferably set to be relatively weak within the limit of being able to maintain the amount of magnetic fluid 84c between the spherical member 84b and the main shaft 60 to block the communication between the two spaces. For example, the magnetic force of the magnetic ring 84a is preferably 400-800G.

同樣地,磁環84a的厚度宜在可以將上述之兩空間之連通阻隔之量的磁性流體84c保持於球形件84b以及主軸60之間的限度內設得較薄。例如,如圖4所示,宜將磁環84a的厚度設得較薄,以將和一對球形件84b接觸之磁性流體84c在不會分離的情形下一體化。具體而言,磁環84a的厚度宜為3~5mm。Similarly, the thickness of the magnetic ring 84a should be set relatively thin, within the limits required to maintain a sufficient amount of magnetic fluid 84c between the spherical members 84b and the main shaft 60 to prevent the two spaces from being connected. For example, as shown in Figure 4, the thickness of the magnetic ring 84a should be set relatively thin to integrate the magnetic fluid 84c in contact with the pair of spherical members 84b without separating. Specifically, the thickness of the magnetic ring 84a is preferably 3-5 mm.

再者,如圖3所示,罩蓋構件72的頂壁72a的下表面,在工作夾台42位於洗淨位置的狀態下,會充分地接近於洗淨用腔室本體44的內周壁44c的上表面。因此,在洗淨裝置40中,可藉由洗淨用腔室本體44、配置成接觸於洗淨用腔室本體44的外周壁44a的上表面之蓋子、罩蓋構件72、與密封部84來界定洗淨用腔室。Furthermore, as shown in FIG3 , the lower surface of the top wall 72a of the cover member 72 is sufficiently close to the upper surface of the inner peripheral wall 44c of the cleaning chamber body 44 when the work table 42 is in the cleaning position. Therefore, in the cleaning apparatus 40, the cleaning chamber is defined by the cleaning chamber body 44, the lid disposed in contact with the upper surface of the outer peripheral wall 44a of the cleaning chamber body 44, the cover member 72, and the sealing portion 84.

包含於切削裝置2之洗淨裝置40中的被加工物之洗淨,是以例如以下的順序來進行。首先,如上述地將經加工之被加工物放置到位於搬出搬入位置之工作夾台42。接著,在使工作夾台42移動至洗淨位置後,使工作夾台42吸引保持被加工物。The cleaning process of the workpiece in the cleaning device 40 included in the cutting device 2 is performed, for example, in the following sequence. First, the workpiece is placed on the work clamp 42 positioned at the loading/unloading position as described above. Then, after the work clamp 42 is moved to the cleaning position, the work clamp 42 is caused to suction and hold the workpiece.

接著,將蓋子配置成接觸於洗淨用腔室本體44的外周壁44a的上表面來構成洗淨用腔室,並且使軸部54a旋轉成將洗淨單元54的噴嘴54c定位在被加工物的上方。接著,在已透過排氣管46對洗淨用腔室進行排氣的狀態下,一邊使工作夾台42旋轉一邊從噴嘴54c對被加工物供給洗淨液。藉此,可去除已附著於被加工物的正面之切削屑等。Next, the lid is placed in contact with the upper surface of the outer wall 44a of the cleaning chamber body 44 to form the cleaning chamber. The shaft 54a is rotated to position the nozzle 54c of the cleaning unit 54 above the workpiece. With the cleaning chamber evacuated via the exhaust pipe 46, the worktable 42 is rotated while cleaning liquid is supplied from the nozzle 54c to the workpiece. This removes chips and other debris adhering to the front surface of the workpiece.

接著,使軸部54a旋轉成使洗淨單元54的噴嘴54c從被加工物的上方退避,並且使軸部56a旋轉成將乾燥單元56的噴嘴56c定位在被加工物的上方。接著,一邊旋轉工作夾台42一邊從噴嘴56c對被加工物供給空氣。藉此,可將已附著於被加工物的正面之洗淨液等去除。Next, the shaft 54a is rotated to retract the nozzle 54c of the cleaning unit 54 from above the workpiece, and the shaft 56a is rotated to position the nozzle 56c of the drying unit 56 above the workpiece. Next, while the work table 42 is rotated, air is supplied from the nozzle 56c to the workpiece. This removes any cleaning liquid or other substances that have adhered to the front surface of the workpiece.

接著,使軸部56a旋轉成使乾燥單元56的噴嘴56c從被加工物的上方退避。接著,在使工作夾台42移動至搬出搬入位置後,將被加工物從工作夾台42搬出。藉由以上,被加工物的洗淨即完成。Next, the shaft 56a is rotated so that the nozzle 56c of the drying unit 56 is retracted from above the workpiece. Next, the workpiece is unloaded from the workpiece 42 after the workpiece 42 is moved to the loading/unloading position. This completes the cleaning of the workpiece.

在洗淨裝置40中,將罩殼70以及主軸60之間的空間(例如開放部A以及壓力可變部B)與洗淨用腔室之連通阻隔之密封部84具有和主軸60接觸之磁性流體84c。因此,在洗淨裝置40中,可在不會使固體彼此接觸的情形下,阻隔該空間與洗淨用腔室之連通。其結果,可以減少伴隨於主軸60的旋轉之密封部84的磨耗,而可歷經長期間來將該空間與洗淨用腔室之連通阻隔。In the cleaning apparatus 40, the seal 84 that blocks the space between the housing 70 and the spindle 60 (e.g., the open portion A and the variable pressure portion B) from the cleaning chamber includes a magnetic fluid 84c that contacts the spindle 60. Therefore, in the cleaning apparatus 40, the space can be blocked from the cleaning chamber without causing solids to come into contact. As a result, wear of the seal 84 associated with the rotation of the spindle 60 is reduced, allowing the space to be blocked from the cleaning chamber for a long period of time.

此外,在洗淨裝置40中,於軸承74及壓力可變部B之間設置有開放部A。藉此,即使在因應於壓力可變部B中的壓力之變動而產生有從壓力可變部B往開放部A之洩漏的情況下,仍可抑制軸承74周邊的壓力之變動。因此,可抑制設置於軸承74的內部之潤滑脂等之潤滑劑的飛散。Furthermore, in the cleaning device 40, an opening A is provided between the bearing 74 and the variable pressure section B. This prevents pressure fluctuations in the variable pressure section B, even if leakage occurs from the variable pressure section B to the opening A. This suppresses pressure fluctuations around the bearing 74. This also prevents scattering of lubricants such as grease located within the bearing 74.

又,在設置有這種開放部A的情況下,密封部84周邊的壓力之變動也會被抑制。因此,可防止包含於密封部84之磁性流體84c流出之情形。其結果,可以歷經長期間來將罩殼70以及主軸60之間的空間與洗淨用腔室之連通阻隔。Furthermore, the provision of this opening A suppresses fluctuations in pressure around the seal portion 84. This prevents the magnetic fluid 84c contained within the seal portion 84 from leaking out. Consequently, the space between the housing 70 and the spindle 60 can be effectively blocked from communicating with the cleaning chamber over a long period of time.

再者,上述之實施形態之構造以及方法等,只要在不脫離本發明的目的之範圍內,皆可以合宜變更來實施。Furthermore, the structures and methods of the above-mentioned embodiments may be appropriately modified and implemented without departing from the scope of the purpose of the present invention.

2:切削裝置 4:基台 4a:開口 6:移動工作台 8:防塵防滴罩蓋 10,42:工作夾台 10a,42a:多孔板 12:支撐構造 12a:豎立設置部 12b:臂部 14:Y軸方向移動機構 16:Y軸導軌 18:Y軸移動板 20:螺桿軸 22:Z軸方向移動機構 24:Z軸導軌 26:Z軸移動板 28:螺桿軸 30,62:馬達 32:切削單元 34:主軸殼體 36:切削刀片 38:拍攝單元 40:洗淨裝置 44:洗淨用腔室本體 44a:外周壁 44b:底壁 44c:內周壁 46:排氣管 48:排水口 50:排水管 52:支撐腳 54:洗淨單元 54a,56a:軸部 54b,56b:臂部 54c,56c:噴嘴 56:乾燥單元 58:主軸單元 60:主軸 60a:負壓或正壓供給管 64:支撐機構 66:氣缸 68:支撐腳 70:罩殼 72:罩蓋構件 72a:頂壁 72b:側壁 74:軸承 76:開放管 78:負壓供給管 80:正壓供給管 82a,82b:油封 84:密封部 84a:磁環 84b:球形件 84c:磁性流體 A:開放部 B:壓力可變部 X,Y,Z:方向 2: Cutting device 4: Base 4a: Opening 6: Moving table 8: Dust and drip proof cover 10, 42: Work clamp 10a, 42a: Perforated plate 12: Support structure 12a: Vertical mounting unit 12b: Arm 14: Y-axis movement mechanism 16: Y-axis guide rail 18: Y-axis movement plate 20: Screw shaft 22: Z-axis movement mechanism 24: Z-axis guide rail 26: Z-axis movement plate 28: Screw shaft 30, 62: Motor 32: Cutting unit 34: Spindle housing 36: Cutting blade 38: Camera unit 40: Washing device 44: Washing chamber body 44a: Outer wall 44b: Bottom wall 44c: Inner wall 46: Exhaust pipe 48: Drain outlet 50: Drain pipe 52: Support leg 54: Washing unit 54a, 56a: Shaft 54b, 56b: Arm 54c, 56c: Nozzle 56: Drying unit 58: Spindle unit 60: Spindle 60a: Negative or positive pressure supply pipe 64: Support mechanism 66: Cylinder 68: Support leg 70: Housing 72: Cover member 72a: Top wall 72b: Side wall 74: Bearing 76: Open pipe 78: Negative pressure supply pipe 80: Positive pressure supply pipe 82a, 82b: Oil seal 84: Sealing part 84a: Magnetic ring 84b: Spherical part 84c: Magnetic fluid A: Open part B: Variable pressure part X, Y, Z: Directions

圖1是示意地顯示加工裝置之一例的立體圖。 圖2是示意地顯示洗淨裝置之一例的部分破斷立體圖。 圖3是示意地顯示主軸、罩殼以及罩蓋構件等的部分剖面側視圖。 圖4是圖3的局部放大圖。 Figure 1 is a perspective view schematically showing an example of a processing device. Figure 2 is a partially broken perspective view schematically showing an example of a cleaning device. Figure 3 is a partially cutaway side view schematically showing the spindle, housing, and cover member. Figure 4 is an enlarged view of a portion of Figure 3.

60:主軸 60a:負壓或正壓供給管 70:罩殼 72a:頂壁 74:軸承 76:開放管 78:負壓供給管 80:正壓供給管 82a,82b:油封 84:密封部 84a:磁環 84b:球形件 84c:磁性流體 A:開放部 B:壓力可變部 60: Main shaft 60a: Negative or positive pressure supply pipe 70: Housing 72a: Top wall 74: Bearing 76: Open pipe 78: Negative pressure supply pipe 80: Positive pressure supply pipe 82a, 82b: Oil seal 84: Sealing part 84a: Magnetic ring 84b: Spherical element 84c: Magnetic fluid A: Open part B: Variable pressure part

Claims (5)

一種洗淨裝置,在洗淨用腔室中洗淨被加工物,前述洗淨裝置具備:工作夾台,以保持面保持被加工物;噴嘴,對已保持在該工作夾台之該被加工物供給洗淨液;及主軸單元,將該工作夾台支撐成可旋轉,前述洗淨用腔室容置該工作夾台以及該噴嘴,前述洗淨裝置的特徵在於:該主軸單元具有:主軸,支撐該工作夾台;軸承,可旋轉地支撐該主軸;及罩殼,容置該主軸的一部分以及該軸承,在該罩殼以及該主軸之間設有壓力可變部以及開放部,該壓力可變部設置在連接於該罩殼之負壓供給管以及正壓供給管、與形成在該主軸的內部且連通於該保持面上的空間之負壓或正壓供給管之間,並且配置在比該軸承更遠離該工作夾台之位置,該開放部設置在該軸承以及該壓力可變部之間,並且可透過形成於該罩殼之貫通孔或連接於該罩殼之開放管而開放,該主軸具有從該罩殼突出的端部,該洗淨用腔室的一部分是被具備供該主軸的該端部插入之開口的罩蓋構件所界定,在該罩蓋構件以及該主軸的該端部之間設置有會阻隔該罩殼以及該主軸之間的空間與該洗淨用腔室之連通的密封部,該密封部具有:環狀的磁環,設置在界定出該罩蓋構件之該開口的內周面;及磁性流體,設置在該磁環的內側,且和該主軸的該端部接觸,該磁環的磁力為400~800G。A cleaning device cleans a workpiece in a cleaning chamber. The cleaning device comprises: a workpiece holding the workpiece with a holding surface; a nozzle supplying a cleaning liquid to the workpiece held on the workpiece; and a spindle unit rotatably supporting the workpiece. The cleaning chamber accommodates the workpiece and the nozzle. The cleaning device is characterized in that: the spindle unit The work clamp comprises a main shaft supporting the work clamp; a bearing rotatably supporting the main shaft; and a housing accommodating a portion of the main shaft and the bearing, a pressure variable portion and an open portion being provided between the housing and the main shaft, the pressure variable portion being provided between a negative pressure supply pipe and a positive pressure supply pipe connected to the housing, and a negative pressure or positive pressure supply formed inside the main shaft and connected to a space on the holding surface. The main shaft has an end protruding from the housing, and a portion of the cleaning chamber is defined by a cover member having an opening for inserting the end of the main shaft. A sealing portion is provided between the cover member and the end of the main shaft to block the connection between the space between the cover and the main shaft and the cleaning chamber. The sealing portion comprises: an annular magnetic ring provided on the inner circumference defining the opening of the cover member; and a magnetic fluid provided on the inner side of the magnetic ring and in contact with the end of the main shaft. The magnetic force of the magnetic ring is 400-800G. 如請求項1之洗淨裝置,其中該主軸的該端部具有:圓柱狀的被密封部,和該磁性流體接觸;及圓柱狀的延伸部,從該被密封部朝該工作夾台側延伸且和該被密封部相同直徑。A cleaning device as claimed in claim 1, wherein the end of the main shaft has: a cylindrical sealed portion in contact with the magnetic fluid; and a cylindrical extending portion extending from the sealed portion toward the side of the work table and having the same diameter as the sealed portion. 如請求項1或2之洗淨裝置,其中該磁環的厚度為3~5mm。The cleaning device of claim 1 or 2, wherein the magnetic ring has a thickness of 3 to 5 mm. 如請求項1或2之洗淨裝置,其中在該軸承及該密封部之間的空間與該洗淨用腔室之間,未設置除了設置有阻隔其等之連通的該密封部的連通路之外的連通路。The cleaning apparatus of claim 1 or 2, wherein no communication path other than the communication path provided with the sealing portion that blocks the communication therebetween is provided between the space between the bearing and the sealing portion and the cleaning chamber. 如請求項3之洗淨裝置,其中在該軸承及該密封部之間的空間與該洗淨用腔室之間,未設置除了設置有阻隔其等之連通的該密封部的連通路之外的連通路。The cleaning device of claim 3, wherein no communication path other than the communication path provided with the sealing portion that blocks the communication therebetween is provided between the space between the bearing and the sealing portion and the cleaning chamber.
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JP2005332889A (en) * 2004-05-18 2005-12-02 Kobe Steel Ltd Pressure treatment device
JP2018073930A (en) * 2016-10-27 2018-05-10 株式会社ディスコ Cleaning device
US20180130695A1 (en) * 2014-03-26 2018-05-10 SCREEN Holdings Co., Ltd. Substrate processing apparatus

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JP2003229398A (en) 2002-02-05 2003-08-15 Dainippon Screen Mfg Co Ltd Substrate treatment device
JP6258741B2 (en) 2014-03-26 2018-01-10 株式会社Screenホールディングス Substrate processing equipment

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005332889A (en) * 2004-05-18 2005-12-02 Kobe Steel Ltd Pressure treatment device
US20180130695A1 (en) * 2014-03-26 2018-05-10 SCREEN Holdings Co., Ltd. Substrate processing apparatus
JP2018073930A (en) * 2016-10-27 2018-05-10 株式会社ディスコ Cleaning device

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