TWI892037B - Surface treatment agent - Google Patents
Surface treatment agentInfo
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- TWI892037B TWI892037B TW111130974A TW111130974A TWI892037B TW I892037 B TWI892037 B TW I892037B TW 111130974 A TW111130974 A TW 111130974A TW 111130974 A TW111130974 A TW 111130974A TW I892037 B TWI892037 B TW I892037B
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/28—Surface treatment of glass, not in the form of fibres or filaments, by coating with organic material
- C03C17/30—Surface treatment of glass, not in the form of fibres or filaments, by coating with organic material with silicon-containing compounds
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- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G65/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
- C08G65/02—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring
- C08G65/04—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring from cyclic ethers only
- C08G65/22—Cyclic ethers having at least one atom other than carbon and hydrogen outside the ring
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- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G65/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
- C08G65/02—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring
- C08G65/32—Polymers modified by chemical after-treatment
- C08G65/329—Polymers modified by chemical after-treatment with organic compounds
- C08G65/336—Polymers modified by chemical after-treatment with organic compounds containing silicon
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- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G67/00—Macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing oxygen or oxygen and carbon, not provided for in groups C08G2/00 - C08G65/00
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- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
- C09D183/04—Polysiloxanes
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- C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
- C09D5/16—Antifouling paints; Underwater paints
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- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
- C09D7/20—Diluents or solvents
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
- C09D7/40—Additives
- C09D7/60—Additives non-macromolecular
- C09D7/63—Additives non-macromolecular organic
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- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K3/00—Materials not provided for elsewhere
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K3/00—Materials not provided for elsewhere
- C09K3/18—Materials not provided for elsewhere for application to surfaces to minimize adherence of ice, mist or water thereto; Thawing or antifreeze materials for application to surfaces
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- Geochemistry & Mineralogy (AREA)
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- Materials Applied To Surfaces To Minimize Adherence Of Mist Or Water (AREA)
- Other Surface Treatments For Metallic Materials (AREA)
Abstract
Description
本揭示係有關表面處理劑。 This disclosure relates to surface treatment agents.
已知某種含有氟聚醚基的矽烷化合物若使用於基材之表面處理,可提供優異的撥水性、撥油性、防污性等。從包含含有氟聚醚基的矽烷化合物之表面處理劑所得的層(以下亦稱為「表面處理層」)係作為所謂功能性薄膜而被施予至例如玻璃、塑膠、纖維、衛生用品、建築資材等各式各樣的基材(專利文獻1)。 It is known that certain silane compounds containing fluoropolyether groups can provide excellent water repellency, oil repellency, and antifouling properties when used for surface treatment of substrates. Layers obtained from surface treatment agents containing silane compounds containing fluoropolyether groups (hereinafter referred to as "surface treatment layers") are applied as so-called functional films to a variety of substrates, such as glass, plastics, fibers, sanitary products, and construction materials (Patent Document 1).
[先前技術文獻] [Prior Art Literature]
[專利文獻] [Patent Literature]
[專利文獻1] 日本特開2015-224293號公報 [Patent Document 1] Japanese Patent Application Laid-Open No. 2015-224293
[專利文獻2] 日本特開2016-132719號公報 [Patent Document 2] Japanese Patent Application Laid-Open No. 2016-132719
專利文獻1及2記載之含有氟聚醚基的矽烷化合物雖可賦予具有優異功能之表面處理層,惟追求具有更高耐磨損性之表面處理層。 While the fluoropolyether-containing silane compounds described in Patent Documents 1 and 2 can provide surface treatment layers with excellent functionality, there is a need for surface treatment layers with even higher wear resistance.
本揭示之目的在於提供一種表面處理劑,其可形成耐磨損性更高的表面處理層。 The purpose of this disclosure is to provide a surface treatment agent that can form a surface treatment layer with higher wear resistance.
本揭示係包含下列態樣。 This disclosure includes the following aspects.
〔1〕一種表面處理劑,係包含:含有氟聚醚基的矽烷化合物,以及低級氟烷基醇;其中,相對於前述含有氟聚醚基的矽烷化合物100質量份,該低級氟烷基醇之含量為30質量份以下。 [1] A surface treatment agent comprising: a silane compound containing a fluoropolyether group, and a lower fluoroalkyl alcohol; wherein the content of the lower fluoroalkyl alcohol is 30 parts by mass or less relative to 100 parts by mass of the silane compound containing a fluoropolyether group.
〔2〕如上述〔1〕所述之表面處理劑,其中,前述含有氟聚醚基的矽烷化合物係下述式(1)或(2)所示的至少1種含有氟聚醚基的矽烷化合物, [2] The surface treatment agent as described in [1] above, wherein the aforementioned silane compound containing a fluoropolyether group is at least one silane compound containing a fluoropolyether group represented by the following formula (1) or (2),
RR F1F1 αα -X-X AA -R-R SiSi ββ (1) (1)
R Si γ -X A -R F2 -X A -R Si γ (2)〔式中, R Si γ -X A -R F2 -X A -R Si γ (2) [Where,
RF1在每次出現時分別獨立地為Rf1-RF-Oq-; R F1 is independently Rf 1 -R F -O q - at each occurrence;
RF2為-Rf2 p-RF-Oq-; RF2 is -Rf2p -RF - Oq- ;
Rf1在每次出現時分別獨立地為可經1個以上之氟原子取代的C1-16烷基; Rf1, at each occurrence, is independently C1-16 alkyl which may be substituted with one or more fluorine atoms;
Rf2係可經1個以上之氟原子取代的C1-6伸烷基; Rf2 is a C1-6 alkylene group which may be substituted by one or more fluorine atoms;
RF在每次出現時分別獨立地為2價氟聚醚基; R F is independently a divalent fluoropolyether group at each occurrence;
p為0或1; p is 0 or 1;
q在每次出現時分別獨立地為0或1; q is independently 0 or 1 each time it occurs;
RSi在每次出現時分別獨立地為1價基,其包含鍵結有「羥基、水解性基、氫原子或1價有機基」的Si原子; R Si, at each occurrence, is independently a monovalent group comprising a Si atom bonded to a hydroxyl group, a hydrolyzable group, a hydrogen atom, or a monovalent organic group;
至少1個RSi係1價基,其包含鍵結有「羥基或水解性基」的Si原子; At least one R Si is a monovalent group comprising a Si atom bonded to a hydroxyl group or a hydrolyzable group;
XA分別獨立地為單鍵或2至10價有機基; X and A are each independently a single bond or a 2- to 10-valent organic group;
α為1至9之整數; α is an integer from 1 to 9;
β為1至9之整數; β is an integer from 1 to 9;
γ分別獨立地為1至9之整數〕。 γ is independently an integer from 1 to 9].
〔3〕如上述〔2〕所述之表面處理劑,其中, [3] The surface treatment agent as described in [2] above, wherein:
Rf1在每次出現時分別獨立地為C1-16全氟烷基, Rf 1 is independently C 1-16 perfluoroalkyl at each occurrence,
Rf2在每次出現時分別獨立地為C1-6全氟伸烷基。 Rf2 is independently, at each occurrence, a C1-6 perfluoroalkylene group.
〔4〕如上述〔2〕或〔3〕所述之表面處理劑,其中, [4] The surface treatment agent as described in [2] or [3] above, wherein:
RF在每次出現時分別獨立地為下列式所示的基, R F is independently represented at each occurrence by the following radical,
-(OC6F12)a-(OC5F10)b-(OC4F8)c-(OC3RFa 6)d-(OC2F4)e-(OCF2)f-〔式中,RFa在每次出現時分別獨立地為氫原子、氟原子或氯原子, -(OC 6 F 12 ) a -(OC 5 F 10 ) b -(OC 4 F 8 ) c -(OC 3 R Fa 6 ) d -(OC 2 F 4 ) e -(OCF 2 ) f - [wherein, R Fa is independently a hydrogen atom, a fluorine atom or a chlorine atom at each occurrence,
a、b、c、d、e及f分別獨立地為0至200之整數,且a、b、c、d、e及f之和為1以上,標註a、b、c、d、e或f並以括弧括起來之各重複單元的存在順序在式中為任意;惟,當全部之RFa為氫原子或氯原子時,a、b、c、e及f之至少1者為1以上〕。 a, b, c, d, e, and f are each independently an integer from 0 to 200, and the sum of a, b, c, d, e, and f is 1 or greater. The order of the repeating units labeled a, b, c, d, e, or f and enclosed in parentheses in the formula is arbitrary; however, when all R Fa are hydrogen atoms or chlorine atoms, at least one of a, b, c, e, and f is 1 or greater.
〔5〕如上述〔4〕所述之表面處理劑,其中,RFa為氟原子。 [5] The surface treatment agent as described in [4] above, wherein R Fa is a fluorine atom.
〔6〕如上述〔2〕或〔3〕所述之表面處理劑,其中, [6] The surface treatment agent as described in [2] or [3] above, wherein:
RF在每次出現時分別獨立地為下述式(f1)、(f2)、(f3)、(f4)、(f5)或(f6)所示的基, RF is independently represented by the following formula (f1), (f2), (f3), (f4), (f5) or (f6) at each occurrence,
-(OC3F6)d-(OC2F4)e- (f1)〔式中,d為1至200之整數,e為0或1〕; -(OC 3 F 6 ) d -(OC 2 F 4 ) e - (f1) [wherein d is an integer from 1 to 200, and e is 0 or 1];
-(OC4F8)c-(OC3F6)d-(OC2F4)e-(OCF2)f- (f2)〔式中,c及d分別獨立地為0至30之整數; -(OC 4 F 8 ) c -(OC 3 F 6 ) d -(OC 2 F 4 ) e -(OCF 2 ) f - (f2) [wherein c and d are each independently an integer from 0 to 30;
e及f分別獨立地為1至200之整數; e and f are each independently an integer between 1 and 200;
c、d、e及f之和為10至200之整數; The sum of c, d, e, and f is an integer between 10 and 200;
標註下標c、d、e或f並以括弧括起來之各重複單元的存在順序在式中為任意〕; The order of the repeated units marked with subscripts c, d, e or f and enclosed in brackets is arbitrary in the formula].
-(R6-R7)g- (f3)〔式中,R6為OCF2或OC2F4; -(R 6 -R 7 ) g - (f3)〔wherein, R 6 is OCF 2 or OC 2 F 4 ;
R7為選自OC2F4、OC3F6、OC4F8、OC5F10及OC6F12中之基,或為選自此等基中的2或3個基的組合; R 7 is a group selected from OC 2 F 4 , OC 3 F 6 , OC 4 F 8 , OC 5 F 10 and OC 6 F 12 , or a combination of two or three groups selected from these groups;
g為2至100之整數〕; g is an integer between 2 and 100].
-(R6-R7)g-Rr-(R7’-R6’)g’- (f4)〔式中,R6為OCF2或OC2F4; -(R 6 -R 7 ) g -R r -(R 7' -R 6' ) g' - (f4)〔wherein, R 6 is OCF 2 or OC 2 F 4 ;
R7為選自OC2F4、OC3F6、OC4F8、OC5F10及OC6F12中之基,或為獨立地選自此等基中的2或3個基的組合; R 7 is a group selected from OC 2 F 4 , OC 3 F 6 , OC 4 F 8 , OC 5 F 10 and OC 6 F 12 , or a combination of two or three groups independently selected from these groups;
R6’為OCF2或OC2F4; R 6′ is OCF 2 or OC 2 F 4 ;
R7’為選自OC2F4、OC3F6、OC4F8、OC5F10及OC6F12中之基,或為獨立地選自此等基中的2或3個基的組合; R 7′ is a group selected from OC 2 F 4 , OC 3 F 6 , OC 4 F 8 , OC 5 F 10 and OC 6 F 12 , or a combination of two or three groups independently selected from these groups;
g為2至100之整數; g is an integer between 2 and 100;
g’為2至100之整數; g’ is an integer between 2 and 100;
Rr為 R r is
式中,*表示鍵結位置〕; Where * represents the bond position].
-(OC6F12)a-(OC5F10)b-(OC4F8)c-(OC3F6)d-(OC2F4)e-(OCF2)f- (f5)〔式中,e為1以上200以下之整數,a、b、c、d及f分別獨立地為0以上200以下之整數;又,標註a、b、c、d、e或f並以括弧括起來之各重複單元的存在順序在式中為任意〕; -(OC 6 F 12 ) a -(OC 5 F 10 ) b -(OC 4 F 8 ) c -(OC 3 F 6 ) d -(OC 2 F 4 ) e -(OCF 2 ) f - (f5) [wherein, e is an integer from 1 to 200, and a, b, c, d, and f are each independently an integer from 0 to 200; and the order of the repetitive units enclosed in parentheses and labeled a, b, c, d, e, or f in the formula is arbitrary].
-(OC6F12)a-(OC5F10)b-(OC4F8)c-(OC3F6)d-(OC2F4)e-(OCF2)f- (f6)〔式中,f為1以上200以下之整數,a、b、c、d及e分別獨立地為0以上200以下之整數;又,標註a、b、c、d、e或f並以括弧括起來之各重複單元的存在順序在式中為任意〕。 -(OC 6 F 12 ) a -(OC 5 F 10 ) b -(OC 4 F 8 ) c -(OC 3 F 6 ) d -(OC 2 F 4 ) e -(OCF 2 ) f - (f6) [wherein, f is an integer from 1 to 200, and a, b, c, d, and e are each independently an integer from 0 to 200; and the order of the repeating units enclosed in parentheses and labeled a, b, c, d, e, or f in the formula is arbitrary].
〔7〕如上述〔2〕至〔6〕中任一項所述之表面處理劑,其中, [7] A surface treatment agent as described in any one of [2] to [6] above, wherein:
RSi為下述式(S1)、(S2)、(S3)、(S4)或(S5)所示的基, R Si is a group represented by the following formula (S1), (S2), (S3), (S4) or (S5),
-SiR-SiR 1111 n1n1 RR 1212 3-n13-n1 (S2) (S2)
-SiR-SiR a1a1 k1k1 RR b1b1 l1l1 RR c1c1 m1m1 (S3) (S3)
-CR-CR d1d1 k2k2 RR e1e1 l2l2 RR f1f1 m2m2 (S4) (S4)
-NR g1 R h1 (S5)〔式中, -NR g1 R h1 (S5) 〔wherein,
R11在每次出現時分別獨立地為羥基或水解性基; R 11 , at each occurrence, is independently a hydroxyl group or a hydrolyzable group;
R12在每次出現時分別獨立地為氫原子或1價有機基; R 12 , at each occurrence, is independently a hydrogen atom or a monovalent organic group;
n1在每個(SiR11 n1R12 3-n1)單元中分別獨立地為0至3之整數; n1 is an integer from 0 to 3 independently in each (SiR 11 n1 R 12 3-n1 ) unit;
X11在每次出現時分別獨立地為單鍵或2價有機基; X11, at each occurrence, independently represents a single bond or a divalent organic group;
R13在每次出現時分別獨立地為氫原子或1價有機基; R 13 , at each occurrence, is independently a hydrogen atom or a monovalent organic group;
t在每次出現時分別獨立地為2以上之整數; t is an integer greater than 2 each time it appears;
R14在每次出現時分別獨立地為氫原子、鹵素原子或-X11-SiR11 n1R12 3-n1; R 14 , at each occurrence, is independently a hydrogen atom, a halogen atom, or -X 11 -SiR 11 n1 R 12 3-n1 ;
R15在每次出現時分別獨立地為單鍵、氧原子、碳數1至6之伸烷基或碳數1至6之伸烷基氧基; R 15 , at each occurrence, is independently a single bond, an oxygen atom, an alkylene group having 1 to 6 carbon atoms, or an alkyleneoxy group having 1 to 6 carbon atoms;
Ra1在每次出現時分別獨立地為-Z1-SiR21 p1R22 q1R23 r1; R a1 is independently -Z 1 -SiR 21 p1 R 22 q1 R 23 r1 at each occurrence;
Z1在每次出現時分別獨立地為氧原子或2價有機基; Z1, at each occurrence, is independently an oxygen atom or a divalent organic group;
R21在每次出現時分別獨立地為-Z1’-SiR21’ p1’R22’ q1’R23’ r1’; R 21 , at each occurrence, independently represents -Z 1' -SiR 21' p1' R 22' q1' R 23' r1' ;
R22在每次出現時分別獨立地為羥基或水解性基; R22, at each occurrence, is independently a hydroxyl group or a hydrolyzable group;
R23在每次出現時分別獨立地為氫原子或1價有機基; R23, at each occurrence, is independently a hydrogen atom or a monovalent organic group;
p1在每次出現時分別獨立地為0至3之整數; p1 is an integer between 0 and 3 each time it appears;
q1在每次出現時分別獨立地為0至3之整數; q1 is an integer from 0 to 3 each time it appears;
r1在每次出現時分別獨立地為0至3之整數; r1 is an integer from 0 to 3 each time it appears;
在SiR21 p1R22 q1R23 r1單元中,p1、q1及r1之合計為3; In the SiR 21 p1 R 22 q1 R 23 r1 unit, the total of p1, q1 and r1 is 3;
Z1’在每次出現時分別獨立地為氧原子或2價有機基; Z 1' is independently an oxygen atom or a divalent organic group at each occurrence;
R21’在每次出現時分別獨立地為-Z1”-SiR22” q1”R23” r1”; R 21′, at each occurrence, independently represents -Z 1″ -SiR 22″ q1″ R 23″ r1″ ;
R22’在每次出現時分別獨立地為羥基或水解性基; R 22' at each occurrence is independently a hydroxyl group or a hydrolyzable group;
R23’在每次出現時分別獨立地為氫原子或1價有機基; R 23' is independently a hydrogen atom or a monovalent organic group at each occurrence;
p1’在每次出現時分別獨立地為0至3之整數; p1’ is an integer between 0 and 3 each time it appears;
q1’在每次出現時分別獨立地為0至3之整數; q1’ is an integer from 0 to 3 each time it appears;
r1’在每次出現時分別獨立地為0至3之整數; r1’ is an integer between 0 and 3 each time it appears;
在SiR21’ p1’R22’ q1’R23’ r1’單元中,p1’、q1’及r1’之合計為3; In the SiR 21′ p1′ R 22′ q1′ R 23′ r1′ unit, the total of p1′, q1′ and r1′ is 3;
Z1”在每次出現時分別獨立地為氧原子或2價有機基; Z 1" is independently an oxygen atom or a divalent organic group at each occurrence;
R22”在每次出現時分別獨立地為羥基或水解性基; R 22″ is independently a hydroxyl group or a hydrolyzable group at each occurrence;
R23”在每次出現時分別獨立地為氫原子或1價有機基; R 23″ is independently a hydrogen atom or a monovalent organic group at each occurrence;
q1”在每次出現時分別獨立地為0至3之整數; "q1" is an integer from 0 to 3 each time it appears;
r1”在每次出現時分別獨立地為0至3之整數; "r1" is an integer from 0 to 3 each time it appears;
在SiR22” q1”R23” r1”單元中,q1”及r1”之合計為3; In the SiR 22” q1” R 23” r1” unit, the sum of q1” and r1” is 3;
Rb1在每次出現時分別獨立地為羥基或水解性基; R b1 , at each occurrence, is independently a hydroxyl group or a hydrolyzable group;
Rc1在每次出現時分別獨立地為氫原子或1價有機基; R c1, at each occurrence, independently represents a hydrogen atom or a monovalent organic group;
k1在每次出現時分別獨立地為0至3之整數; k1 is an integer between 0 and 3 each time it appears;
l1在每次出現時分別獨立地為0至3之整數; l1 is an integer from 0 to 3 each time it appears;
m1在每次出現時分別獨立地為0至3之整數; m1 is an integer from 0 to 3 each time it appears;
在SiRa1 k1Rb1 l1Rc1 m1單元中,k1、l1及m1之合計為3; In the unit SiR a1 k1 R b1 l1 R c1 m1 , the sum of k1, l1, and m1 is 3;
Rd1在每次出現時分別獨立地為-Z2-CR31 p2R32 q2R33 r2; R d1 is independently -Z 2 -CR 31 p2 R 32 q2 R 33 r2 at each occurrence;
Z2在每次出現時分別獨立地為單鍵、氧原子或2價有機基; Z2, at each occurrence, is independently a single bond, an oxygen atom, or a divalent organic group;
R31在每次出現時分別獨立地為-Z2’-CR32’ q2’R33’ r2’; R 31 is independently at each occurrence -Z 2' -CR 32' q2' R 33' r2' ;
R32在每次出現時分別獨立地為-Z3-SiR34 n2R35 3-n2; R 32 is independently at each occurrence -Z 3 -SiR 34 n2 R 35 3-n2 ;
R33在每次出現時分別獨立地為氫原子、羥基或1價有機基; R 33 , at each occurrence, is independently a hydrogen atom, a hydroxyl group, or a monovalent organic group;
p2在每次出現時分別獨立地為0至3之整數; p2 is an integer between 0 and 3 each time it appears;
q2在每次出現時分別獨立地為0至3之整數; q2 is an integer from 0 to 3 independently each time it appears;
r2在每次出現時分別獨立地為0至3之整數; r2 is an integer between 0 and 3 each time it appears;
在SiR31 p2R32 q2R33 r2單元中,p2、q2及r2之合計為3; In the SiR 31 p2 R 32 q2 R 33 r2 unit, the total of p2, q2 and r2 is 3;
Z2’在每次出現時分別獨立地為單鍵、氧原子或2價有機基; Z 2' is independently a single bond, an oxygen atom or a divalent organic group at each occurrence;
R32’在每次出現時分別獨立地為-Z3-SiR34 n2R35 3-n2; R 32′ is independently at each occurrence -Z 3 -SiR 34 n2 R 35 3-n2 ;
R33’在每次出現時分別獨立地為氫原子、羥基或1價有機基; R 33' , at each occurrence, independently represents a hydrogen atom, a hydroxyl group, or a monovalent organic group;
q2’在每次出現時分別獨立地為0至3之整數; q2’ is an integer between 0 and 3 each time it appears;
r2’在每次出現時分別獨立地為0至3之整數; r2’ is an integer between 0 and 3 each time it appears;
在SiR32’ q2’R33’ r2’單元中,q2’及r2’之合計為3; In the SiR 32' q2' R 33' r2' unit, the sum of q2' and r2' is 3;
Z3在每次出現時分別獨立地為單鍵、氧原子或2價有機基; Z 3, at each occurrence, is independently a single bond, an oxygen atom, or a divalent organic group;
R34在每次出現時分別獨立地為羥基或水解性基; R 34 , at each occurrence, is independently a hydroxyl group or a hydrolyzable group;
R35在每次出現時分別獨立地為氫原子或1價有機基; R 35 , at each occurrence, is independently a hydrogen atom or a monovalent organic group;
n2在每次出現時分別獨立地為0至3之整數; n2 is an integer between 0 and 3 each time it appears;
Re1在每次出現時分別獨立地為-Z3-SiR34 n2R35 3-n2; Each occurrence of R e1 is independently -Z 3 -SiR 34 n2 R 35 3-n2 ;
Rf1在每次出現時分別獨立地為氫原子、羥基或1價有機基; R f1 , at each occurrence, independently represents a hydrogen atom, a hydroxyl group, or a monovalent organic group;
k2在每次出現時分別獨立地為0至3之整數; k2 is an integer between 0 and 3 each time it appears;
l2在每次出現時分別獨立地為0至3之整數; l2 is an integer from 0 to 3 each time it appears;
m2在每次出現時分別獨立地為0至3之整數; m2 is an integer from 0 to 3 each time it appears;
在CRd1 k2Re1 l2Rf1 m2單元中,k2、l2及m2之合計為3; In the unit CR d1 k2 R e1 l2 R f1 m2 , the sum of k2, l2, and m2 is 3;
Rg1及Rh1在每次出現時分別獨立地為-Z4-SiR11 n1R12 3-n1、-Z4-SiRa1 k1Rb1 l1Rc1 m1、-Z4-CRd1 k2Re1 l2Rf1 m2; R g1 and R h1, at each occurrence, independently represent -Z 4 -SiR 11 n1 R 12 3-n1 , -Z 4 -SiR a1 k1 R b1 l1 R c1 m1 , -Z 4 -CR d1 k2 R e1 l2 R f1 m2 ;
Z4在每次出現時分別獨立地為單鍵、氧原子或2價有機基; Z 4, at each occurrence, is independently a single bond, an oxygen atom, or a divalent organic group;
惟,在式(S1)、(S2)、(S3)、(S4)及(S5)中,至少存在1個鍵結有「羥基或水解性基」的Si原子〕。 However, in formulas (S1), (S2), (S3), (S4), and (S5), there is at least one Si atom bonded to a "hydroxyl group or a hydrolyzable group."
〔8〕如上述〔2〕至〔7〕中任一項所述之表面處理劑,其中,α、β及γ為1。 [8] The surface treatment agent as described in any one of [2] to [7] above, wherein α , β and γ are 1.
〔9〕如上述〔7〕或〔8〕所述之表面處理劑,其中,RSi為式(S3)、(S4)或(S5)。 [9] The surface treatment agent as described in [7] or [8] above, wherein R Si is the formula (S3), (S4) or (S5).
〔10〕如上述〔7〕至〔9〕中任一項所述之表面處理劑,其中,RSi為式(S3)。 [10] The surface treatment agent as described in any one of [7] to [9] above, wherein R Si is represented by the formula (S3).
〔11〕如上述〔7〕所述之表面處理劑,其包含:RSi為式(S1)之含有氟聚醚基的矽烷化合物,以及RSi為式(S3)、(S4)或(S5)之含有氟聚醚基的矽烷化合物。 [11] The surface treatment agent as described in [7] above, comprising: R Si is a silane compound containing a fluoropolyether group of formula (S1), and R Si is a silane compound containing a fluoropolyether group of formula (S3), (S4) or (S5).
〔12〕如上述〔7〕所述之表面處理劑,其包含:RSi為式(S1)之含有氟聚醚基的矽烷化合物,以及RSi為式(S3)之含有氟聚醚基的矽烷化合物。 [12] The surface treatment agent as described in [7] above, comprising: R Si is a silane compound containing a fluoropolyether group of formula (S1), and R Si is a silane compound containing a fluoropolyether group of formula (S3).
〔13〕如上述〔7〕所述之表面處理劑,其包含:RSi為式(S1)之含有氟聚醚基的矽烷化合物,以及RSi為式(S4)之含有氟聚醚基的矽烷化合物。 [13] The surface treatment agent as described in [7] above, comprising: R Si is a silane compound containing a fluoropolyether group of formula (S1), and R Si is a silane compound containing a fluoropolyether group of formula (S4).
〔14〕如上述〔1〕至〔13〕中任一項所述之表面處理劑,其中,相對於前述含有氟聚醚基的矽烷化合物100質量份,前述低級氟烷基醇之含量為0.1至20質量份。 [14] The surface treatment agent as described in any one of [1] to [13] above, wherein the content of the lower fluoroalkyl alcohol is 0.1 to 20 parts by mass relative to 100 parts by mass of the silane compound containing a fluoropolyether group.
〔15〕如上述〔1〕至〔14〕中任一項所述之表面處理劑,其中,相對於前述含有氟聚醚基的矽烷化合物100質量份,前述低級氟烷基醇之含量為3.0至20質量份。 [15] The surface treatment agent as described in any one of [1] to [14] above, wherein the content of the lower fluoroalkyl alcohol is 3.0 to 20 parts by mass relative to 100 parts by mass of the silane compound containing a fluoropolyether group.
〔16〕如上述〔1〕至〔15〕中任一項所述之表面處理劑,其中,前述低級氟烷基醇係pKa為15.0以下之氟烷基醇。 [16] The surface treatment agent as described in any one of [1] to [15] above, wherein the lower fluoroalkyl alcohol is a fluoroalkyl alcohol having a pKa of 15.0 or less.
〔17〕如上述〔1〕至〔16〕中任一項所述之表面處理劑,其中,前述低級氟烷基醇係pKa為5.0至15.0之氟烷基醇。 [17] The surface treatment agent as described in any one of [1] to [16] above, wherein the lower fluoroalkyl alcohol is a fluoroalkyl alcohol having a pKa of 5.0 to 15.0.
〔18〕如上述〔1〕至〔17〕中任一項所述之表面處理劑,其中,前述低級氟烷基醇係下述式所示的氟烷基醇, [18] The surface treatment agent as described in any one of [1] to [17] above, wherein the aforementioned lower fluoroalkyl alcohol is a fluoroalkyl alcohol represented by the following formula,
CRf4 n4H3-n4-OH〔式中, CRf 4 n4 H 3-n4 -OH〔wherein,
Rf4為碳數1至3之全氟烷基, Rf 4 is a perfluoroalkyl group having 1 to 3 carbon atoms,
n4為1至3之整數〕。 n4 is an integer from 1 to 3].
〔19〕如上述〔1〕至〔18〕中任一項所述之表面處理劑,其中,前述低級氟烷基醇為碳數1至6之氟烷基醇。 [19] The surface treatment agent as described in any one of [1] to [18] above, wherein the lower fluoroalkyl alcohol is a fluoroalkyl alcohol having 1 to 6 carbon atoms.
〔20〕如上述〔1〕至〔19〕中任一項所述之表面處理劑,其中,前述低級氟烷基醇為六氟丙醇、或六氟異丙醇。 [20] The surface treatment agent as described in any one of [1] to [19] above, wherein the lower fluoroalkyl alcohol is hexafluoropropanol or hexafluoroisopropanol.
〔21〕如上述〔1〕至〔20〕中任一項所述之表面處理劑,其更含有:選自含氟油、聚矽氧油及觸媒中之1種以上之其他成分。 [21] The surface treatment agent as described in any one of [1] to [20] above, further comprising: one or more other ingredients selected from fluorinated oil, silicone oil and catalyst.
〔22〕如上述〔1〕至〔21〕中任一項所述之表面處理劑,其更包含:溶劑。 [22] The surface treatment agent as described in any one of [1] to [21] above, further comprising: a solvent.
〔23〕如上述〔1〕至〔22〕中任一項所述之表面處理劑,其係作為防污性塗敷劑或防水性塗敷劑使用。 [23] A surface treatment agent as described in any one of [1] to [22] above, which is used as an antifouling coating or a waterproof coating.
〔24〕一種顆粒,係含有:請求項1至23中任一項所述之表面處理劑。 [24] A particle containing: a surface treatment agent as described in any one of claims 1 to 23.
〔25〕一種物品,係包含:基材;以及該基材上之由上述〔1〕至〔23〕中任一項所述之表面處理劑所形成的層。 [25] An article comprising: a substrate; and a layer formed on the substrate by the surface treatment agent described in any one of [1] to [23] above.
〔26〕如上述〔25〕所述之物品,其中,前述基材為玻璃基材。 [26] The article as described in [25] above, wherein the substrate is a glass substrate.
〔27〕如上述〔25〕所述之物品,其係光學構件。 [27] The article as described in [25] above, which is an optical component.
若依據本揭示,可提供一種表面處理劑,其可賦予具有更高的耐磨損性之表面處理層。 According to the present disclosure, a surface treatment agent can be provided that can impart a surface treatment layer with higher wear resistance.
在本說明書中使用時,所謂「1價有機基」係指含有碳之1價基。1價有機基並無特別限定,可為烴基或其衍生物。所謂烴基之衍生物係指在烴基之末端或分子鏈中具有1個以上之N、O、S、Si、醯胺基、磺醯基、矽氧烷、羰基、羰氧基等之基。又,僅表示為「有機基」時,意指1價有機基。又,所謂「2至10價有機基」係指含有碳之2至10價基。該2至10價有機基並無特別限定,可列舉從有機基進一步使1至9個氫原子脫離而成的2至10價之基。例如,2價有機基並無特別限定,可列舉從有機基進一步使1個氫原子脫離而成的2價基。 As used in this specification, the term "monovalent organic group" refers to a monovalent group containing carbon. The monovalent organic group is not particularly limited and may be a alkyl group or a derivative thereof. The term "alkyl group derivative" refers to a group having one or more N, O, S, Si, amide, sulfonyl, siloxane, carbonyl, carbonyloxy, etc. at the end of the alkyl group or in the molecular chain. In addition, when simply represented as an "organic group", it means a monovalent organic group. In addition, the term "divalent to decavalent organic group" refers to a divalent to decavalent group containing carbon. The divalent to decavalent organic group is not particularly limited and may include divalent to decavalent groups formed by removing 1 to 9 hydrogen atoms from an organic group. For example, the divalent organic group is not particularly limited, and examples thereof include a divalent group formed by removing a hydrogen atom from an organic group.
在本說明書中使用時,所謂「烴基」係指包含碳及氫之基,且為從烴中使1個氫原子脫離的基。如此的烴基並無特別限定,可為經1個以上之取代基取代的C1-20烴基,例如可列舉脂肪族烴基、芳香族烴基等。上述「脂肪族烴基」可為直鏈狀、分支鏈狀或環狀之任一者,可為飽和或不飽和之任一者。又,烴基可包含1個以上之環結構。 As used herein, the term "alkyl" refers to a group consisting of carbon and hydrogen, wherein one hydrogen atom is removed from the alkyl group. Such alkyl groups are not particularly limited and may be C 1-20 alkyl groups substituted with one or more substituents, such as aliphatic alkyl groups and aromatic alkyl groups. These "aliphatic alkyl groups" may be linear, branched, or cyclic, and may be saturated or unsaturated. Furthermore, alkyl groups may contain one or more ring structures.
在本說明書中使用時,「烴基」之取代基並無特別限定,可列舉例如:鹵素原子;選自可經1個以上之鹵素原子取代的C1-6烷基、C2-6烯基、C2-6炔基、C3-10環烷基、C3-10不飽和環烷基、5至10員之雜環基、5至10員之不飽和雜環基、C6-10芳基及5至10員之雜芳基中的1個以上之基。 As used herein, the substituents of "alkyl" are not particularly limited and include, for example, a halogen atom; one or more groups selected from C1-6 alkyl, C2-6 alkenyl, C2-6 alkynyl, C3-10 cycloalkyl, C3-10 unsaturated cycloalkyl, 5-10 membered heterocyclic group, 5-10 membered unsaturated heterocyclic group, C6-10 aryl, and 5-10 membered heteroaryl groups which may be substituted with one or more halogen atoms.
在本說明書中使用時,所謂「水解性基」係指可接受水解反應之基,亦即意指可藉由水解反應而從化合物之主骨架中脫離的基。水解性基之例係可列舉-ORj、-OCORj、-O-N=CRj 2、-NRj 2、-NHRj、-NCO、鹵素(此等式中之Rj表示經取代或未經取代之C1-4烷基)等。 As used herein, the term "hydrolyzable group" refers to a group that is susceptible to hydrolysis, that is, a group that can be separated from the main structure of a compound by hydrolysis. Examples of hydrolyzable groups include -ORj , -OCORj , -ON= CRj2 , -NRj2 , -NHRj , -NCO , and halogen (where Rj in this formula represents a substituted or unsubstituted C1-4 alkyl group).
本揭示之表面處理劑係包含「含有氟聚醚基的矽烷化合物」以及「低級氟烷基醇」之表面處理劑。 The surface treatment agent disclosed herein comprises a "silane compound containing a fluoropolyether group" and a "lower fluoroalkyl alcohol".
本揭示之表面處理劑中,除了含有氟聚醚基的矽烷化合物以外,還更包含低級氟烷基醇,藉此而可賦予耐摩擦性經提升之表面處理層。 The surface treatment agent disclosed herein contains, in addition to a silane compound containing a fluoropolyether group, a lower fluoroalkyl alcohol, thereby providing a surface treatment layer with enhanced abrasion resistance.
(含有氟聚醚基的矽烷化合物) (Silane compound containing a fluoropolyether group)
上述含有氟聚醚基的矽烷化合物係包含氟且可形成具有防污性之表面處理層的化合物。 The fluoropolyether group-containing silane compound is a compound containing fluorine and capable of forming a surface treatment layer having antifouling properties.
在一態樣中,上述含有氟聚醚基的矽烷化合物係下述式(1)或(2)所示的至少1種含有氟聚醚基的矽烷化合物, In one embodiment, the silane compound containing a fluoropolyether group is at least one silane compound containing a fluoropolyether group represented by the following formula (1) or (2),
RR F1F1 αα -X-X AA -R-R SiSi ββ (1) (1)
R Si γ -X A -R F2 -X A -R Si γ (2)〔式中, R Si γ -X A -R F2 -X A -R Si γ (2) [Where,
RF1在每次出現時分別獨立地為Rf1-RF-Oq-; R F1 is independently Rf 1 -R F -O q - at each occurrence;
RF2為-Rf2 p-RF-Oq-; RF2 is -Rf2p -RF - Oq- ;
Rf1在每次出現時分別獨立地為可經1個以上之氟原子取代的C1-16烷基; Rf1, at each occurrence, is independently C1-16 alkyl which may be substituted with one or more fluorine atoms;
Rf2係可經1個以上之氟原子取代的C1-6伸烷基; Rf2 is a C1-6 alkylene group which may be substituted by one or more fluorine atoms;
RF在每次出現時分別獨立地為2價氟聚醚基; R F is independently a divalent fluoropolyether group at each occurrence;
p為0或1; p is 0 or 1;
q在每次出現時分別獨立地為0或1; q is independently 0 or 1 each time it occurs;
RSi在每次出現時分別獨立地為1價基,其包含鍵結有「羥基、水解性基、氫原子或1價有機基」的Si原子; R Si, at each occurrence, is independently a monovalent group comprising a Si atom bonded to a hydroxyl group, a hydrolyzable group, a hydrogen atom, or a monovalent organic group;
至少1個RSi係1價基,其包含鍵結有「羥基或水解性基」之Si原子; At least one R Si is a monovalent group, which includes a Si atom bonded to a hydroxyl group or a hydrolyzable group;
XA分別獨立地為單鍵或2至10價有機基; X and A are each independently a single bond or a 2- to 10-valent organic group;
α為1至9之整數; α is an integer from 1 to 9;
β為1至9之整數; β is an integer from 1 to 9;
γ分別獨立地為1至9之整數〕。 γ is an integer from 1 to 9 independently].
上述式(1)中,RF1在每次出現時分別獨立地為Rf1-RF-Oq-。 In the above formula (1), each occurrence of RF1 is independently Rf1 - RF - Oq- .
上述式(2)中,RF2為-Rf2 p-RF-Oq-。 In the above formula (2), RF2 is -Rf2p - RF - Oq- .
上述式中,Rf1在每次出現時分別獨立地為可經1個以上之氟原子取代的C1-16烷基。 In the above formula, each occurrence of Rf1 is independently a C1-16 alkyl group which may be substituted with one or more fluorine atoms.
上述可經1個以上之氟原子取代的C1-16烷基中,「C1-16烷基」可為直鏈亦可為分支鏈,較佳係直鏈或分支鏈之C1-6烷基(尤其為C1-3烷基),更佳係直鏈之C1-6烷基(尤其為C1-3烷基)。 In the aforementioned C 1-16 alkyl group which may be substituted with one or more fluorine atoms, the "C 1-16 alkyl group" may be a linear or branched chain, preferably a linear or branched chain C 1-6 alkyl group (especially a C 1-3 alkyl group), more preferably a linear chain C 1-6 alkyl group (especially a C 1-3 alkyl group).
上述Rf1較佳係可經1個以上之氟原子取代的C1-16烷基,更佳係CF2H-C1-15全氟伸烷基,又更佳係C1-16全氟烷基。 The aforementioned Rf1 is preferably a C1-16 alkyl group which may be substituted with one or more fluorine atoms, more preferably a CF2HC1-15perfluoroalkylene group , and even more preferably a C1-16perfluoroalkyl group.
上述C1-16全氟烷基可為直鏈亦可為分支鏈,較佳係直鏈或分支鏈之C1-6全氟烷基(尤其為C1-3全氟烷基),更佳係直鏈之C1-6全氟烷基(尤其為C1-3全氟烷基),具體上係-CF3、-CF2CF3、或-CF2CF2CF3。 The aforementioned C 1-16 perfluoroalkyl group may be linear or branched, preferably a linear or branched C 1-6 perfluoroalkyl group (especially a C 1-3 perfluoroalkyl group), more preferably a linear C 1-6 perfluoroalkyl group (especially a C 1-3 perfluoroalkyl group), specifically -CF 3 , -CF 2 CF 3 , or -CF 2 CF 2 CF 3 .
上述式中,Rf2係可經1個以上之氟原子取代的C1-6伸烷基。 In the above formula, Rf 2 is a C 1-6 alkylene group which may be substituted with one or more fluorine atoms.
上述可經1個以上之氟原子取代的C1-6伸烷基中,「C1-6伸烷基」可為直鏈亦可為分支鏈,較佳係直鏈或分支鏈之C1-3伸烷基,更佳係直鏈之C1-3伸烷基。 In the aforementioned C 1-6 alkylene groups which may be substituted with one or more fluorine atoms, the "C 1-6 alkylene group" may be a linear or branched chain, preferably a linear or branched chain C 1-3 alkylene group, more preferably a linear chain C 1-3 alkylene group.
上述Rf2較佳係可經1個以上之氟原子取代的C1-6伸烷基,更佳係C1-6全氟伸烷基,又更佳係C1-3全氟伸烷基。 The above-mentioned Rf2 is preferably a C1-6 alkylene group which may be substituted with one or more fluorine atoms, more preferably a C1-6 perfluoroalkylene group, and even more preferably a C1-3 perfluoroalkylene group.
上述C1-6全氟伸烷基可為直鏈亦可為分支鏈,較佳係直鏈或分支鏈之C1-3全氟伸烷基,更佳係直鏈之C1-3全氟烷基,具體上係-CF2-、-CF2CF2-、或-CF2CF2CF2-。 The C 1-6 perfluoroalkylene group may be linear or branched, preferably a linear or branched C 1-3 perfluoroalkylene group, more preferably a linear C 1-3 perfluoroalkylene group, specifically -CF 2 -, -CF 2 CF 2 -, or -CF 2 CF 2 CF 2 -.
上述式中,p為0或1。在一態樣中,p為0。在另一態樣中,p為1。 In the above formula, p is 0 or 1. In one embodiment, p is 0. In another embodiment, p is 1.
上述式中,q在每次出現時分別獨立地為0或1。在一態樣中,q為0。在另一態樣中q為1。 In the above formula, q is independently 0 or 1 at each occurrence. In one embodiment, q is 0. In another embodiment, q is 1.
上述式(1)及(2)中,RF在每次出現時分別獨立地為2價氟聚醚基。 In the above formulae (1) and (2), each occurrence of RF is independently a divalent fluoropolyether group.
RF較佳係可包含下述式所示的基, RF preferably contains a group represented by the following formula:
-(OCh1RFa 2h1)h3-(OCh2RFa 2h2-2)h4-〔式中, -(OC h1 R Fa 2h1 ) h3 -(OC h2 R Fa 2h2-2 ) h4 -〔wherein,
RFa在每次出現時分別獨立地為氫原子、氟原子或氯原子, R Fa is independently a hydrogen atom, a fluorine atom, or a chlorine atom at each occurrence,
h1為1至6之整數, h1 is an integer from 1 to 6.
h2為4至8之整數, h2 is an integer from 4 to 8.
h3為0以上之整數, h3 is an integer greater than 0.
h4為0以上之整數, h4 is an integer greater than 0.
惟,h3與h4之合計為1以上,較佳係2以上,更佳係5以上,標註h3及h4並以括弧括起來之各重複單元的存在順序在式中為任意〕。 However, the sum of h3 and h4 is 1 or greater, preferably 2 or greater, and more preferably 5 or greater. The order of the repeated units enclosed in parentheses and labeled h3 and h4 in the formula is arbitrary.
在一態樣中,RF可為直鏈狀或分支鏈狀。RF較佳係下述式所示的基, In one embodiment, RF can be a straight chain or a branched chain. RF is preferably a group represented by the following formula:
-(OC6F12)a-(OC5F10)b-(OC4F8)c-(OC3RFa 6)d-(OC2F4)e-(OCF2)f-〔式中, -(OC 6 F 12 ) a -(OC 5 F 10 ) b -(OC 4 F 8 ) c -(OC 3 R Fa 6 ) d -(OC 2 F 4 ) e -(OCF 2 ) f -[where,
RFa在每次出現時分別獨立地為氫原子、氟原子或氯原子; R Fa is independently at each occurrence a hydrogen atom, a fluorine atom or a chlorine atom;
a、b、c、d、e及f分別獨立地為0至200之整數,且a、b、c、d、e及f之和為1以上;標註a、b、c、d、e或f並以括弧括起來之各重複單元的存在順序在式中為任意;惟,當全部之RFa為氫原子或氯原子時,a、b、c、e及f之至少1者為1以上〕。 a, b, c, d, e, and f are each independently an integer from 0 to 200, and the sum of a, b, c, d, e, and f is 1 or greater; the order of the repeating units labeled a, b, c, d, e, or f and enclosed in parentheses in the formula is arbitrary; however, when all R Fa are hydrogen atoms or chlorine atoms, at least one of a, b, c, e, and f is 1 or greater.
RFa較佳係氫原子或氟原子,更佳係氟原子。惟,當全部之RFa為氫原子或氯原子時,a、b、c、e及f之至少1者為1以上。 RFa is preferably a hydrogen atom or a fluorine atom, more preferably a fluorine atom. However, when all RFa are hydrogen atoms or chlorine atoms, at least one of a, b, c, e, and f is 1 or greater.
a、b、c、d、e及f較佳係分別獨立地可為0至100之整數。 a, b, c, d, e, and f are preferably integers between 0 and 100, respectively and independently.
a、b、c、d、e及f之和較佳係5以上,更佳係10以上,例如可為15以上或20以上。a、b、c、d、e及f之和較佳係200以下,更佳係100以下,又更佳係60以下,例如可為50以下或30以下。 The sum of a, b, c, d, e, and f is preferably 5 or more, more preferably 10 or more, for example, 15 or more or 20 or more. The sum of a, b, c, d, e, and f is preferably 200 or less, more preferably 100 or less, and even more preferably 60 or less, for example, 50 or less or 30 or less.
此等重複單元可為直鏈狀亦可為分支鏈狀。例如:-(OC6F12)-可為-(OCF2CF2CF2CF2CF2CF2)-、-(OCF(CF3)CF2CF2CF2CF2)-、-(OCF2CF(CF3)CF2CF2CF2)-、-(OCF2CF2CF(CF3)CF2CF2)-、-(OCF2CF2CF2CF(CF3)CF2)-、-(OCF2CF2CF2CF2CF(CF3))-等。-(OC5F10)-可為-(OCF2CF2CF2CF2CF2)-、-(OCF(CF3)CF2CF2CF2)-、-(OCF2CF(CF3)CF2CF2)-、-(OCF2CF2CF(CF3)CF2)-、-(OCF2CF2CF2CF(CF3))-等。-(OC4F8)-可為-(OCF2CF2CF2CF2)-、-(OCF(CF3)CF2CF2)-、-(OCF2CF(CF3)CF2)-、-(OCF2CF2CF(CF3))-、-(OC(CF3)2CF2)-、-(OCF2C(CF3)2)-、-(OCF(CF3)CF(CF3))-、-(OCF(C2F5)CF2)-及-(OCF2CF(C2F5))-之任一者。-(OC3F6)-(亦即在上述式中之RFa為氟原子)可為-(OCF2CF2CF2)-、-(OCF(CF3)CF2)-及-(OCF2CF(CF3))-之任一者。-(OC2F4)-可為-(OCF2CF2)-及-(OCF(CF3))-之任一者。 These repeating units can be in the form of straight chains or branched chains. For example , - ( OC6F12 )- can be -( OCF2CF2CF2CF2CF2CF2CF2CF2 )-, -(OCF( CF3 ) CF2CF2CF2CF2CF2CF2 )-, -( OCF2CF ( CF3 )CF2CF2CF2CF2 ) -, -(OCF2CF2CF( CF3 ) CF2CF2CF2 )-, -( OCF2CF2CF ( CF3 ) CF2CF2CF2 )-, -( OCF2CF2CF2CF2CF ( CF3 ) CF2CF2 )-, -( OCF2CF2CF2CF2CF ( CF3 ) CF2 )- , - ( OCF2CF2CF2CF2CF( CF3 )CF2 ) -, etc. -(OC 5 F 10 )- can be -(OCF 2 CF 2 CF 2 CF 2 CF 2 )-, -(OCF(CF 3 )CF 2 CF 2 CF 2 )-, -(OCF 2 CF(CF 3 )CF 2 CF 2 )-, -(OCF 2 CF 2 CF(CF 3 )CF 2 )-, -(OCF 2 CF 2 CF 2 CF(CF 3 ))-etc. -(OC 4 F 8 )-can be -(OCF 2 CF 2 CF 2 CF 2 )-, -(OCF(CF 3 )CF 2 CF 2 )-, -(OCF 2 CF(CF 3 )CF 2 )-, -(OCF 2 CF 2 CF(CF 3 ))-, -(OC(CF 3 ) 2 CF 2 )-, -(OCF 2 C(CF 3 ) 2 )-, -(OCF(CF 3 )CF(CF 3 ))-, -(OCF(C 2 F 5 )CF 2 )-, and -(OCF 2 CF(C 2 F 5 ))-. -( OC3F6 )- (i.e., RFa in the above formula is a fluorine atom) can be any of -( OCF2CF2CF2 )-, - ( OCF( CF3 ) CF2 )-, and -( OCF2CF ( CF3 ) )-. - ( OC2F4 )- can be any of -( OCF2CF2 ) - and -(OCF( CF3 ))-.
在一態樣中,上述重複單元為直鏈狀。藉由將上述重複單元設為直鏈狀,可提高表面處理層之表面平滑性、耐磨損性等。 In one embodiment, the repeating units are arranged in a linear chain. By arranging the repeating units in a linear chain, the surface smoothness and wear resistance of the surface treatment layer can be improved.
在一態樣中,上述重複單元為分支鏈狀。藉由將上述重複單元設為分支鏈狀,可增大表面處理層之動摩擦係數。 In one embodiment, the repeating units are in a branched chain shape. By configuring the repeating units in a branched chain shape, the dynamic friction coefficient of the surface treatment layer can be increased.
在一態樣中,RF可包含環結構。 In one aspect, RF may comprise a ring structure.
上述環結構可為下述三員環、四員環、五員環或六員環。 The above-mentioned ring structure can be a three-membered ring, a four-membered ring, a five-membered ring, or a six-membered ring.
上述環結構較佳可為四員環、五員環或六員環,更佳可為四員環或六員環。 The above-mentioned ring structure is preferably a four-membered ring, a five-membered ring, or a six-membered ring, and more preferably a four-membered ring or a six-membered ring.
具有環結構之重複單元較佳係可為下述單元。 The repeating unit having a ring structure may preferably be the following unit.
在一態樣中,RF在每次出現時分別獨立地為下述式(f1)至(f6)之任一者所示的基, In one embodiment, RF is independently represented at each occurrence by any one of the following formulae (f1) to (f6),
-(OC3F6)d-(OC2F4)e- (f1)〔式中,d為1至200之整數,e為0或1〕; -(OC 3 F 6 ) d -(OC 2 F 4 ) e - (f1) [wherein d is an integer from 1 to 200, and e is 0 or 1];
-(OC4F8)c-(OC3F6)d-(OC2F4)e-(OCF2)f- (f2)〔式中,c及d分別獨立地為0以上30以下之整數,e及f分別獨立地為1以上200以下之整數, -(OC 4 F 8 ) c -(OC 3 F 6 ) d -(OC 2 F 4 ) e -(OCF 2 ) f - (f2) [wherein, c and d are each independently an integer from 0 to 30, and e and f are each independently an integer from 1 to 200.]
c、d、e及f之和為2以上, The sum of c, d, e, and f is greater than 2.
標註下標c、d、e或f並以括弧括起來之各重複單元的存在順序在式中為任意〕; The order of the repeated units marked with subscripts c, d, e or f and enclosed in brackets is arbitrary in the formula].
-(R6-R7)g- (f3) 〔式中,R6為OCF2或OC2F4; -(R 6 -R 7 ) g - (f3) [wherein, R 6 is OCF 2 or OC 2 F 4 ;
R7為選自OC2F4、OC3F6、OC4F8、OC5F10及OC6F12中之基,或為獨立地選自此等基中的2或3個基的組合; R 7 is a group selected from OC 2 F 4 , OC 3 F 6 , OC 4 F 8 , OC 5 F 10 and OC 6 F 12 , or a combination of two or three groups independently selected from these groups;
g為2至100之整數〕; g is an integer between 2 and 100].
-(R6-R7)g-Rr-(R7’-R6’)g’- (f4)〔式中,R6為OCF2或OC2F4; -(R 6 -R 7 ) g -R r -(R 7' -R 6' ) g' - (f4)〔wherein, R 6 is OCF 2 or OC 2 F 4 ;
R7為選自OC2F4、OC3F6、OC4F8、OC5F10及OC6F12中之基,或為獨立地選自此等基中的2或3個基的組合; R 7 is a group selected from OC 2 F 4 , OC 3 F 6 , OC 4 F 8 , OC 5 F 10 and OC 6 F 12 , or a combination of two or three groups independently selected from these groups;
R6’為OCF2或OC2F4; R 6′ is OCF 2 or OC 2 F 4 ;
R7’為選自OC2F4、OC3F6、OC4F8、OC5F10及OC6F12中之基,或為獨立地選自此等基中的2或3個基的組合; R 7′ is a group selected from OC 2 F 4 , OC 3 F 6 , OC 4 F 8 , OC 5 F 10 and OC 6 F 12 , or a combination of two or three groups independently selected from these groups;
g為2至100之整數, g is an integer between 2 and 100.
g’為2至100之整數, g’ is an integer between 2 and 100.
Rr為 R r is
-(OC6F12)a-(OC5F10)b-(OC4F8)c-(OC3F6)d-(OC2F4)e-(OCF2)f- (f5)〔式中,e為1以上200以下之整數,a、b、c、d及f分別獨立地為0以上200以下之整數,又,標註a、b、c、d、e或f並以括弧括起來之各重複單元的存在順序在式中為任意〕; -(OC 6 F 12 ) a -(OC 5 F 10 ) b -(OC 4 F 8 ) c -(OC 3 F 6 ) d -(OC 2 F 4 ) e -(OCF 2 ) f - (f5) [wherein, e is an integer from 1 to 200, a, b, c, d, and f are each independently an integer from 0 to 200, and the order of the repetitive units enclosed in parentheses and labeled a, b, c, d, e, or f in the formula is arbitrary].
-(OC6F12)a-(OC5F10)b-(OC4F8)c-(OC3F6)d-(OC2F4)e-(OCF2)f- (f6)〔式中,f為1以上200以下之整數,a、b、c、d及e分別獨立地為0以上200以下之整數,又,標註a、b、c、d、e或f並以括弧括起來之各重複單元的存在順序在式中為任意〕。 -(OC 6 F 12 ) a -(OC 5 F 10 ) b -(OC 4 F 8 ) c -(OC 3 F 6 ) d -(OC 2 F 4 ) e -(OCF 2 ) f - (f6) [wherein, f is an integer from 1 to 200, a, b, c, d, and e are each independently an integer from 0 to 200, and the order of the repeating units denoted by a, b, c, d, e, or f and enclosed in parentheses in the formula is arbitrary].
在上述式(f1)中,d較佳係5至200,更佳係10至100,又更佳係15至50,例如為25至35之整數。在一態樣中,e為1。在另一態樣中,e為0。 在上述式(f1)中,-(OC3F6)d-較佳係-(OCF2CF2CF2)d-或-(OCF(CF3)CF2)d-所示的基,更佳係-(OCF2CF2CF2)d-所示的基。 In the above formula (f1), d is preferably 5 to 200, more preferably 10 to 100, and even more preferably 15 to 50, for example, an integer of 25 to 35. In one embodiment, e is 1. In another embodiment, e is 0. In the above formula (f1), - ( OC3F6 ) d- is preferably a group represented by - ( OCF2CF2CF2 ) d- or -(OCF( CF3 ) CF2 ) d- , and more preferably a group represented by -( OCF2CF2CF2 ) d- .
上述式(f2)中,e及f分別獨立地較佳為5至200,更佳係10至200之整數。又,c、d、e及f之和較佳係5以上,更佳係10以上,例如可為15以上或20以上。在一態樣中,上述式(f2)較佳係-(OCF2CF2CF2CF2)c-(OCF2CF2CF2)d-(OCF2CF2)e-(OCF2)f-所示的基。在另一態樣中,式(f2)可為-(OC2F4)e-(OCF2)f-所示的基。 In formula (f2), e and f are each independently preferably an integer of 5 to 200, more preferably an integer of 10 to 200. Furthermore, the sum of c, d, e, and f is preferably 5 or greater, more preferably 10 or greater, for example, 15 or greater or 20 or greater. In one embodiment, formula ( f2 ) is preferably a group represented by -( OCF2CF2CF2CF2 ) c- ( OCF2CF2CF2 ) d- ( OCF2CF2 ) e- ( OCF2 ) f- . In another embodiment, formula (f2) may be a group represented by - ( OC2F4 ) e- ( OCF2 ) f- .
在上述式(f3)中,R6較佳係OC2F4。在上述(f3)中,R7較佳係選自OC2F4、OC3F6及OC4F8中之基,或為獨立地選自此等基中的2或3個基的組合,更佳係選自OC3F6及OC4F8中之基。獨立地選自OC2F4、OC3F6及OC4F8中之2或3個基之組合並無特別限定,惟可列舉例如:-OC2F4OC3F6-、-OC2F4OC4F8-、-OC3F6OC2F4-、-OC3F6OC3F6-、-OC3F6OC4F8-、-OC4F8OC4F8-、-OC4F8OC3F6-、-OC4F8OC2F4-、-OC2F4OC2F4OC3F6-、-OC2F4OC2F4OC4F8-、-OC2F4OC3F6OC2F4-、-OC2F4OC3F6OC3F6-、-OC2F4OC4F8OC2F4-、-OC3F6OC2F4OC2F4-、-OC3F6OC2F4OC3F6-、-OC3F6OC3F6OC2F4-及-OC4F8OC2F4OC2F4-等。在上述式(f3)中,g較佳係3以上,更佳係5以上之整數。上述g較佳係50以下之整數。在上述式(f3)中,OC2F4、OC3F6、OC4F8、OC5F10及OC6F12可為直鏈或分支鏈之任一者,較佳係直鏈。在該態樣中,上述式(f3)較佳係-(OC2F4-OC3F6)g-或-(OC2F4-OC4F8)g-。 In the above formula (f3), R6 is preferably OC2F4 . In the above formula (f3 ) , R7 is preferably a group selected from OC2F4 , OC3F6 and OC4F8 , or a combination of two or three groups independently selected from these groups, and more preferably a group selected from OC3F6 and OC4F8 . The combination of two or three groups independently selected from OC2F4 , OC3F6 , and OC4F8 is not particularly limited , and examples thereof include : -OC2F4OC3F6- , -OC2F4OC4F8- , -OC3F6OC2F4- , -OC3F6OC3F6- , -OC3F6OC4F8- , -OC4F8OC4F8- , -OC4F8OC3F6- , -OC4F8OC2F4- , -OC2F4OC2F4OC3F6- , -OC2F4OC2F4OC4F8- , -OC2F4OC3F6OC2F4 -, -OC 2 F 4 OC 3 F 6 OC 3 F 6 -, -OC 2 F 4 OC 4 F 8 OC 2 F 4 -, -OC 3 F 6 OC 2 F 4 OC 2 F 4 -, -OC 3 F 6 OC 2 F 4 OC 3 F 6 -, -OC 3 F 6 OC 3 F 6 OC 2 F 4 -, and -OC 4 F 8 OC 2 F 4 OC 2 F 4 - . In the above formula (f3), g is preferably an integer of 3 or greater, more preferably an integer of 5 or greater. The above g is preferably an integer of 50 or less. In formula (f3), OC2F4 , OC3F6 , OC4F8 , OC5F10 , and OC6F12 may be direct chains or branched chains , preferably direct chains. In this embodiment, formula (f3) is preferably - ( OC2F4 -OC3F6 ) g- or - ( OC2F4 - OC4F8 ) g- .
上述式(f4)中,R6、R7及g係與上述式(f3)中之記載為相同意義,且具有相同之態樣。R6’、R7’及g’係分別與上述式(f3)記載之R6、R7及g為相同意義且具有相同之態樣。Rr較佳係 In the above formula (f4), R 6 , R 7 and g have the same meanings and the same configurations as those described in the above formula (f3). R 6 ' , R 7 ' and g' have the same meanings and the same configurations as those described in the above formula (f3). R r is preferably
上述式(f5)中,e較佳係1以上100以下,更佳係5以上100以下之整數。a、b、c、d、e及f之和較佳係5以上,更佳係10以上,例如為10以上100以下。 In the above formula (f5), e is preferably an integer greater than or equal to 1 and less than or equal to 100, and more preferably an integer greater than or equal to 5 and less than or equal to 100. The sum of a, b, c, d, e, and f is preferably greater than or equal to 5, and more preferably greater than or equal to 10, for example, greater than or equal to 100 and less than or equal to 100.
在上述式(f6)中,f較佳係1以上100以下,更佳係5以上100以下之整數。a、b、c、d、e及f之和較佳係5以上,更佳係10以上,例如為10以上100以下。 In the above formula (f6), f is preferably an integer greater than or equal to 1 and less than or equal to 100, and more preferably an integer greater than or equal to 5 and less than or equal to 100. The sum of a, b, c, d, e, and f is preferably greater than or equal to 5, and more preferably greater than or equal to 10, for example, greater than or equal to 100 and less than or equal to 100.
在一態樣中,上述RF為上述式(f1)所示的基。 In one embodiment, the above-mentioned RF is a group represented by the above-mentioned formula (f1).
在一態樣中,上述RF為上述式(f2)所示的基。 In one embodiment, the above-mentioned RF is a group represented by the above-mentioned formula (f2).
在一態樣中,上述RF為上述式(f3)或(f4)所示的基。 In one embodiment, the above-mentioned RF is a group represented by the above-mentioned formula (f3) or (f4).
在一態樣中,上述RF為上述式(f3)所示的基。 In one embodiment, the above-mentioned RF is a group represented by the above-mentioned formula (f3).
在一態樣中,上述RF為上述式(f4)所示的基。 In one embodiment, the above-mentioned RF is a group represented by the above-mentioned formula (f4).
在一態樣中,上述RF為上述式(f5)所示的基。 In one embodiment, the above-mentioned RF is a group represented by the above-mentioned formula (f5).
在一態樣中,上述RF為上述式(f6)所示的基。 In one embodiment, the above-mentioned RF is a group represented by the above-mentioned formula (f6).
在上述RF中,e對於f之比(以下稱為「e/f比」)為0.1至10,較佳係0.2至5,更佳係0.2至2,又更佳係0.2至1.5,再更佳係0.2至0.85。藉由使e/f比設為10以下,而使由該化合物所得到的表面處理層之平滑性、耐磨損性及耐化學性(例如對人工汗液之耐久性)更提高。e/f比愈小,使表面處理層之平滑性及耐磨損性愈更加提高。另一方面,藉由使e/f比設為0.1以上,可更提高化合物之安定性。e/f比愈大,化合物之安定性愈更加提高。 In the above RF , the ratio of e to f (hereinafter referred to as the "e/f ratio") is 0.1 to 10, preferably 0.2 to 5, more preferably 0.2 to 2, even more preferably 0.2 to 1.5, and even more preferably 0.2 to 0.85. By setting the e/f ratio to 10 or less, the smoothness, abrasion resistance, and chemical resistance (e.g., durability to artificial sweat) of the surface treatment layer obtained from the compound are further improved. The smaller the e/f ratio, the greater the improvement in the smoothness and abrasion resistance of the surface treatment layer. On the other hand, by setting the e/f ratio to 0.1 or greater, the stability of the compound can be further improved. The greater the e/f ratio, the greater the improvement in the stability of the compound.
在上述含有氟聚醚基的矽烷化合物中,RF1及RF2部分之數平均分子量並無特別限定,例如為500至30,000,較佳係1,500至30,000,更佳係2,000至10,000。在本說明書中,RF1及RF2之數平均分子量係設為由19F-NMR所測定的值。 The number average molecular weight of the RF1 and RF2 moieties in the fluoropolyether-containing silane compound is not particularly limited, and is, for example, 500 to 30,000, preferably 1,500 to 30,000, and more preferably 2,000 to 10,000. In this specification, the number average molecular weight of RF1 and RF2 is the value measured by 19 F-NMR.
在另一態樣中,RF1及RF2部分之數平均分子量係500至30,000,較佳係1,000至20,000,更佳係2,000至15,000,又更佳係2,000至10,000,例如,可為3,000至6,000。 In another aspect, the number-average molecular weight of the RF1 and RF2 moieties is 500 to 30,000, preferably 1,000 to 20,000, more preferably 2,000 to 15,000, and even more preferably 2,000 to 10,000, for example, 3,000 to 6,000.
在另一態樣中,RF1及RF2部分之數平均分子量為4,000至30,000,較佳可為5,000至10,000,更佳可為6,000至10,000。 In another aspect, the number-average molecular weight of the RF1 and RF2 moieties is 4,000 to 30,000, preferably 5,000 to 10,000, and more preferably 6,000 to 10,000.
在上述式(1)及(2)中,RSi在每次出現時分別獨立地為1價基,其包含鍵結有「羥基、水解性基、氫原子或1價有機基」的Si原子;並且,至少1個RSi係1價基,其包含鍵結有「羥基或水解性基」之Si原子。 In the above formulas (1) and (2), R Si is independently a monovalent group at each occurrence, which includes a Si atom bonded to a hydroxyl group, a hydrolyzable group, a hydrogen atom, or a monovalent organic group; and at least one R Si is a monovalent group, which includes a Si atom bonded to a hydroxyl group or a hydrolyzable group.
在此,所謂「水解性基」係指可接受水解反應之基,亦即意指可藉由水解反應而從化合物之主骨架中脫離的基。水解性基之例子係可列舉-ORj、-OCORj、-O-N=CRj 2、-NRj 2、-NHRj、-NCO、鹵素(在此等式中,Rj表示經取代或未經取代之C1-4烷基)等。 Here, the term "hydrolyzable group" refers to a group that is susceptible to hydrolysis, that is, a group that can be separated from the main structure of the compound by hydrolysis. Examples of hydrolyzable groups include -ORj , -OCORj , -ON = CRj2 , -NRj2 , -NHRj , -NCO, halogen (in this formula, Rj represents a substituted or unsubstituted C1-4 alkyl group), etc.
在較佳態樣中,RSi係1價基,其包含鍵結有「羥基或水解性基」之Si原子。 In a preferred embodiment, R Si is a monovalent group comprising a Si atom bonded with a hydroxyl group or a hydrolyzable group.
在較佳態樣中,RSi為下述式(S1)、(S2)、(S3)或(S4)所示的基。 In a preferred embodiment, R Si is a group represented by the following formula (S1), (S2), (S3) or (S4).
-SiR-SiR 1111 n1n1 RR 1212 3-n13-n1 (S2) (S2)
-SiR-SiR a1a1 k1k1 RR b1b1 l1l1 RR c1c1 m1m1 (S3) (S3)
-CR-CR d1d1 k2k2 RR e1e1 l2l2 RR f1f1 m2m2 (S4) (S4)
-NR-NR g1g1 RR h1h1 (S5)(S5)
上述式中,R11在每次出現時分別獨立地為羥基或水解性基。 In the above formula, each occurrence of R 11 is independently a hydroxyl group or a hydrolyzable group.
R11較佳係在每次出現時分別獨立地為水解性基。 Preferably, each occurrence of R 11 is independently a hydrolyzable group.
R11較佳係在每次出現時分別獨立地為-ORj、-OCORj、-O-N=CRj 2、-NRj 2、-NHRj、-NCO、或鹵素(此等式中,Rj表示經取代或未經取代之C1-4烷基),更佳係-ORj(亦即烷氧基)。Rj係可列舉:甲基、乙基、丙基、異丙基、正丁基、異丁基等未經取代之烷基;氯甲基等經取代之烷基。彼等之中,以烷基為佳,尤其以未經取代之烷基為佳,以甲基或乙基為更佳。在一態樣中,Rj為甲基,在另一態樣中,Rj為乙基。 R 11 preferably represents, at each occurrence, independently -OR j , -OCOR j , -ON=CR j 2 , -NR j 2 , -NHR j , -NCO, or a halogen (in this formula, R j represents a substituted or unsubstituted C 1-4 alkyl group), more preferably -OR j (i.e., an alkoxy group). R j includes, for example, unsubstituted alkyl groups such as methyl, ethyl, propyl, isopropyl, n-butyl, and isobutyl; and substituted alkyl groups such as chloromethyl. Among these, alkyl groups are preferred, with unsubstituted alkyl groups being particularly preferred, and methyl or ethyl being more preferred. In one embodiment, R j is methyl, and in another embodiment, R j is ethyl.
上述式中,R12在每次出現時分別獨立地為氫原子或1價有機基。該1價有機基係上述水解性基除外之1價有機基。 In the above formula, R 12 is independently a hydrogen atom or a monovalent organic group at each occurrence. The monovalent organic group is a monovalent organic group excluding the above-mentioned hydrolyzable group.
在R12中,1價有機基較佳係C1-20烷基,更佳係C1-6烷基,又更佳係甲基。 In R 12 , the monovalent organic group is preferably a C 1-20 alkyl group, more preferably a C 1-6 alkyl group, and even more preferably a methyl group.
上述式中,n1係在每個(SiR11 n1R12 3-n1)單元中分別獨立地為0至3之整數。惟,當RSi為式(S1)或(S2)所示的基時,在式(1)及式(2)之末端的RSi部分(以下亦僅稱為式(1)及式(2)之「末端部分」)中,至少存在1個n1為1至3之(SiR11 n1R12 3-n1)單元。亦即,在該末端部分中,全部之n1不會同時為0。換言之,在式(1)及式(2)之末端部分中,至少存在1個鍵結有「羥基或水解性基」之Si原子。 In the above formula, n1 is an integer from 0 to 3 in each (SiR 11 n1 R 12 3-n1 ) unit. However, when R Si is a group represented by formula (S1) or (S2), there is at least one (SiR 11 n1 R 12 3-n1 ) unit in which n1 is 1 to 3 in the terminal R Si portion of formula (1) and formula (2) (hereinafter referred to as the "terminal portion" of formula ( 1 ) and formula (2 )). That is, in the terminal portion, all n1s are not simultaneously 0. In other words, in the terminal portion of formula (1) and formula (2), there is at least one Si atom bonded to a "hydroxyl group or hydrolyzable group."
n1係在每個(SiR11 n1R12 3-n1)單元中分別獨立地較佳係1至3之整數,更佳係2至3,又更佳係3。 In each (SiR 11 n1 R 12 3-n1 ) unit, n1 is independently preferably an integer from 1 to 3, more preferably from 2 to 3, and even more preferably 3.
在上述式中,X11在每次出現時分別獨立地為單鍵或2價有機基。該2價有機基較佳係-R28-Ox-R29-(式中,R28及R29在每次出現時分別獨立地為單鍵或C1-20伸烷基,x為0或1)。該C1-20伸烷基可為直鏈亦可為分支鏈,較佳係直鏈。該C1-20伸烷基較佳係C1-10伸烷基,更佳係C1-6伸烷基,又更佳係C1-3伸烷基。 In the above formula, X <11> , at each occurrence, independently represents a single bond or a divalent organic group. The divalent organic group is preferably -R <28> -O <x> -R <29> - (wherein, R <28> and R <29> , at each occurrence, independently represent a single bond or a C <1-20> alkylene group, and x is 0 or 1). The C <1-20> alkylene group may be a straight chain or a branched chain, preferably a straight chain. The C <1-20> alkylene group is preferably a C <1-10> alkylene group, more preferably a C <1-6> alkylene group, and even more preferably a C <1-3> alkylene group.
在一態樣中,X11在每次出現時分別獨立地為-C1-6伸烷基-O-C1-6伸烷基-或-O-C1-6伸烷基-。 In one aspect, each occurrence of X 11 is independently -C 1-6 alkylene-OC 1-6 alkylene- or -OC 1-6 alkylene-.
在較佳態樣中,X11在每次出現時分別獨立地為單鍵或直鏈之C1-6伸烷基,較佳係單鍵或直鏈之C1-3伸烷基,更佳係單鍵或直鏈之C1-2伸烷基,又更佳係直鏈之C1-2伸烷基。 In a preferred embodiment, each occurrence of X 11 is independently a single bond or a straight chain C 1-6 alkylene group, more preferably a single bond or a straight chain C 1-3 alkylene group, more preferably a single bond or a straight chain C 1-2 alkylene group, and even more preferably a straight chain C 1-2 alkylene group.
在上述式中,R13在每次出現時分別獨立地為氫原子或1價有機基。該1價有機基較佳係C1-20烷基。該C1-20烷基係可為直鏈亦可為分支鏈,惟較佳係直鏈。 In the above formula, each occurrence of R 13 is independently a hydrogen atom or a monovalent organic group. The monovalent organic group is preferably a C 1-20 alkyl group. The C 1-20 alkyl group may be a straight chain or a branched chain, but is preferably a straight chain.
在較佳態樣中,R13在每次出現時分別獨立地為氫原子或直鏈之C1-6烷基,較佳係氫原子或直鏈之C1-3烷基,更佳係氫原子或甲基。 In a preferred embodiment, R 13 is independently each occurrence a hydrogen atom or a linear C 1-6 alkyl group, more preferably a hydrogen atom or a linear C 1-3 alkyl group, and more preferably a hydrogen atom or a methyl group.
在上述式中,t在每次出現時分別獨立地為2以上之整數。 In the above formula, t is an integer greater than 2 each time it appears.
在較佳態樣中,t在每次出現時分別獨立地為2至10之整數,較佳係2至6之整數。 In a preferred embodiment, t is independently an integer between 2 and 10 at each occurrence, and more preferably an integer between 2 and 6.
在上述式中,R14在每次出現時分別獨立地為氫原子、鹵素原子或-X11-SiR11 n1R12 3-n1。該鹵素原子較佳係碘原子、氯原子或氟原子,更佳係氟原子。在較佳態樣中,R14為氫原子。 In the above formula, R 14 is independently a hydrogen atom, a halogen atom, or -X 11 -SiR 11 n1 R 12 3-n1 at each occurrence. The halogen atom is preferably an iodine atom, a chlorine atom, or a fluorine atom, more preferably a fluorine atom. In a preferred embodiment, R 14 is a hydrogen atom.
在上述式中,R15在每次出現時分別獨立地為單鍵、氧原子、碳數1至6之伸烷基、或碳數1至6之伸烷基氧基。 In the above formula, R 15 is independently, at each occurrence, a single bond, an oxygen atom, an alkylene group having 1 to 6 carbon atoms, or an alkyleneoxy group having 1 to 6 carbon atoms.
在一態樣中,R15在每次出現時分別獨立地為氧原子、碳數1至6之伸烷基、或碳數1至6之伸烷基氧基。 In one embodiment, each occurrence of R 15 is independently an oxygen atom, an alkylene group having 1 to 6 carbon atoms, or an alkyleneoxy group having 1 to 6 carbon atoms.
在較佳態樣中,R15為單鍵。 In the best case, the R 15 is a single button.
在一態樣中,式(S1)係下述式(S1-a), In one embodiment, formula (S1) is the following formula (S1-a),
R11、R12、R13、X11及n1係與上述式(S1)中之記載為相同意義; R 11 , R 12 , R 13 , X 11 and n1 have the same meanings as those described in the above formula (S1);
t1及t2在每次出現時分別獨立地為1以上之整數,較佳係1至10之整數,更佳係2至10之整數,例如為1至5之整數或2至5之整數; t1 and t2 are each independently an integer greater than 1, preferably an integer from 1 to 10, more preferably an integer from 2 to 10, for example, an integer from 1 to 5 or an integer from 2 to 5;
標註t1及t2並以括弧括起來之各重複單元的存在順序在式中為任意〕。 The order of the repeated units marked t1 and t2 and enclosed in parentheses is arbitrary in the formula.
在較佳態樣中,式(S1)為下述式(S1-b), In a preferred embodiment, formula (S1) is the following formula (S1-b),
上述式中,Ra1在每次出現時分別獨立地為-Z1-SiR21 p1R22 q1R23 r1。 In the above formula, each occurrence of Ra1 is independently -Z1 - SiR21p1R22q1R23r1 .
上述Z1在每次出現時分別獨立地為氧原子或2價有機基。又,以下記載為Z1之結構係右側鍵結於(SiR21 p1R22 q1R23 r1)。 Each occurrence of Z 1 is independently an oxygen atom or a divalent organic group. In the following description, the structure of Z 1 is right-side bonded to (SiR 21 p1 R 22 q1 R 23 r1 ).
在較佳態樣中,Z1為2價有機基。 In a preferred embodiment, Z 1 is a divalent organic group.
在較佳態樣中,Z1不包含「會與Z1所鍵結之Si原子形成矽氧烷鍵者」。較佳係在式(S3)中之(Si-Z1-Si)不包含矽氧烷鍵。 In a preferred embodiment, Z 1 does not include "a group that forms a siloxane bond with the Si atom to which Z 1 is bonded." Preferably, (Si-Z 1 -Si) in formula (S3) does not include a siloxane bond.
上述Z1較佳係C1-6伸烷基、-(CH2)z1-O-(CH2)z2-(式中,z1為0至6之整數,例如為1至6之整數;z2為0至6之整數,例如為1至6之整數)、或-(CH2)z3-伸苯基-(CH2)z4-(式中,z3為0至6之整數,例如為1至6之整數;z4為0至6之整數,例如為1至6之整數)。該C1-6伸烷基可為直鏈亦可為分支鏈,惟較佳係直鏈。此等基係例如可經選自氟原子、C1-6烷基、C2-6烯基及C2-6炔基中之1個以上的取代基所取代,惟較佳係未經取代者。 Z1 is preferably a C1-6 alkylene group, -( CH2 ) z1 -O-( CH2 ) z2- (wherein z1 is an integer from 0 to 6, for example, an integer from 1 to 6; z2 is an integer from 0 to 6, for example, an integer from 1 to 6), or -( CH2 ) z3 -phenylene-( CH2 ) z4- (wherein z3 is an integer from 0 to 6, for example, an integer from 1 to 6; z4 is an integer from 0 to 6, for example, an integer from 1 to 6). The C1-6 alkylene group may be a straight chain or a branched chain, but is preferably a straight chain. These groups may be substituted with one or more substituents selected from, for example, a fluorine atom, a C1-6 alkyl group, a C2-6 alkenyl group, and a C2-6 alkynyl group, but are preferably unsubstituted.
在較佳態樣中,Z1為C1-6伸烷基或-(CH2)z3-伸苯基-(CH2)z4-,較佳係-伸苯基-(CH2)z4-。Z1為如此之基時,耐光性(尤其耐紫外線性)可變得更高。 In a preferred embodiment, Z 1 is a C 1-6 alkylene group or -(CH 2 ) z 3 -phenylene-(CH 2 ) z 4 -, preferably -phenylene-(CH 2 ) z 4 -. When Z 1 is such a group, light resistance (especially UV resistance) can be further improved.
在另一較佳態樣中,上述Z1為C1-3伸烷基。在一態樣中,Z1可為-CH2CH2CH2-。在另一態樣中,Z1可為-CH2CH2-。 In another preferred embodiment, Z 1 is a C 1-3 alkylene group. In one embodiment, Z 1 can be -CH 2 CH 2 CH 2 -. In another embodiment, Z 1 can be -CH 2 CH 2 -.
上述R21在每次出現時分別獨立地為-Z1’-SiR21’ p1’R22’ q1’R23’ r1’。 Each occurrence of R 21 is independently -Z 1' -SiR 21' p1' R 22' q1' R 23' r1' .
上述Z1’在每次出現時分別獨立地為氧原子或2價有機基。又,以下記載為Z1’之結構係右側鍵結於(SiR21’ p1’R22’ q1’R23’ r1’)。 Each occurrence of Z 1' is independently an oxygen atom or a divalent organic group. In the following description, the structure of Z 1' is right-side bonded to (SiR 21' p1' R 22' q1' R 23' r1' ).
在較佳態樣中,Z1’為2價有機基。 In a preferred embodiment, Z 1' is a divalent organic group.
在較佳態樣中,Z1’不包含「會與Z1’所鍵結之Si原子形成矽氧烷鍵者」。較佳係在式(S3)中之(Si-Z1’-Si)不包含矽氧烷鍵。 In a preferred embodiment, Z 1′ does not include a group that forms a siloxane bond with the Si atom to which Z 1′ is bonded. Preferably, (Si—Z 1′ —Si) in formula (S3) does not include a siloxane bond.
上述Z1’較佳係C1-6伸烷基、-(CH2)z1’-O-(CH2)z2’-(式中,z1’為0至6之整數,例如為1至6之整數;z2’為0至6之整數,例如為1至6之整數)、或-(CH2)z3’-伸苯基-(CH2)z4’-(式中,z3’為0至6之整數,例如為1至6之整數;z4’為0至6之整數,例如為1至6之整數)。該C1-6伸烷基可為直鏈亦可為分支鏈,惟較佳係直鏈。此等基係例如可經選自氟原子、C1-6烷基、C2-6烯基及C2-6炔基中之1個以上的取代基所取代,惟較佳係未經取代者。 The aforementioned Z 1' is preferably a C 1-6 alkylene group, -(CH 2 ) z 1' -O-(CH 2 ) z 2' - (wherein z 1' is an integer from 0 to 6, for example, an integer from 1 to 6; z 2' is an integer from 0 to 6, for example, an integer from 1 to 6), or -(CH 2 ) z 3' -phenylene-(CH 2 ) z 4' - (wherein z 3' is an integer from 0 to 6, for example, an integer from 1 to 6; z 4' is an integer from 0 to 6, for example, an integer from 1 to 6). The C 1-6 alkylene group may be a straight chain or a branched chain, but is preferably a straight chain. These groups may be substituted with one or more substituents selected from, for example, a fluorine atom, a C 1-6 alkyl group, a C 2-6 alkenyl group, and a C 2-6 alkynyl group, but are preferably unsubstituted.
在較佳態樣中,Z1’為C1-6伸烷基或-(CH2)z3’-伸苯基-(CH2)z4’-,較佳係-伸苯基-(CH2)z4’-。Z1’為如此之基時,耐光性(尤其耐紫外線性)可變得更高。 In a preferred embodiment, Z 1' is a C 1-6 alkylene group or -(CH 2 ) z 3' -phenylene-(CH 2 ) z 4' -, preferably -phenylene-(CH 2 ) z 4' -. When Z 1' is such a group, light resistance (especially UV resistance) can be further improved.
在另一較佳態樣中,上述Z1’為C1-3伸烷基。在一態樣中,Z1’可為-CH2CH2CH2-。在另一態樣中,Z1’可為-CH2CH2-。 In another preferred embodiment, Z 1' is a C 1-3 alkylene group. In one embodiment, Z 1' can be -CH 2 CH 2 CH 2 -. In another embodiment, Z 1' can be -CH 2 CH 2 -.
上述R21’在每次出現時分別獨立地為-Z1”-SiR22” q1”R23” r1”。 Each occurrence of R 21′ is independently -Z 1″ -SiR 22″ q1″ R 23″ r1″ .
上述Z1”在每次出現時分別獨立地為氧原子或2價有機基。又,以下記載為Z1”之結構係右側鍵結於(SiR22” q1”R23” r1”)。 Each occurrence of Z 1" is independently an oxygen atom or a divalent organic group. In the following description, the structure of Z 1" is right-side bonded to (SiR 22" q1" R 23" r1" ).
在較佳態樣中,Z1”為2價有機基。 In a preferred embodiment, Z 1″ is a divalent organic group.
在較佳態樣中,Z1”不包含「會與Z1”所鍵結之Si原子形成矽氧烷鍵者」。較佳係在式(S3)中之(Si-Z1”-Si)不包含矽氧烷鍵。 In a preferred embodiment, Z 1″ does not include “a group that forms a siloxane bond with the Si atom to which Z 1″ is bonded.” Preferably, (Si-Z 1″ -Si) in formula (S3) does not include a siloxane bond.
上述Z1”較佳係C1-6伸烷基、-(CH2)z1”-O-(CH2)z2”-(在式中,z1”為0至6之整數,例如為1至6之整數;z2”為0至6之整數,例如為1至6之整數)、或-(CH2)z3”-伸苯基-(CH2)z4”-(式中,z3”為0至6之整數,例如為1至6之整數;z4”為0至6之整數,例如為1至6之整數)。該C1-6伸烷基可為直鏈亦可為分支鏈,惟較佳係直鏈。此等基係例如可經選自氟原子、C1-6烷基、C2-6烯基及C2-6炔基中之1個以上的取代基所取代,惟較佳係未經取代者。 The above-mentioned Z1 " is preferably a C1-6 alkylene group, -( CH2 ) z1" -O-( CH2 ) z2" - (wherein z1" is an integer from 0 to 6, for example, an integer from 1 to 6; z2" is an integer from 0 to 6, for example, an integer from 1 to 6), or -( CH2 ) z3" -phenylene-( CH2 ) z4" - (wherein z3" is an integer from 0 to 6, for example, an integer from 1 to 6; z4" is an integer from 0 to 6, for example, an integer from 1 to 6). The C1-6 alkylene group may be a straight chain or a branched chain, but is preferably a straight chain. These groups may be substituted, for example, by one or more substituents selected from a fluorine atom, a C1-6 alkyl group, a C2-6 alkenyl group, and a C2-6 alkynyl group, but are preferably unsubstituted.
在較佳態樣中,Z1”為C1-6伸烷基或-(CH2)z3”-伸苯基-(CH2)z4”-,較佳係-伸苯基-(CH2)z4”-。Z1”為如此之基時,耐光性(尤其耐紫外線性)可變得更高。 In a preferred embodiment, Z 1″ is a C 1-6 alkylene group or -(CH 2 ) z3″ -phenylene-(CH 2 ) z4″ -, preferably -phenylene-(CH 2 ) z4″ -. When Z 1″ is such a group, light resistance (especially UV resistance) can be further improved.
在另一較佳態樣中,上述Z1”為C1-3伸烷基。在一態樣中,Z1”可為-CH2CH2CH2-。在另一態樣中,Z1”可為-CH2CH2-。 In another preferred embodiment, Z 1″ is a C 1-3 alkylene group. In one embodiment, Z 1″ can be -CH 2 CH 2 CH 2 -. In another embodiment, Z 1″ can be -CH 2 CH 2 -.
上述R22”在每次出現時分別獨立地為羥基或水解性基。 Each occurrence of R 22" is independently a hydroxyl group or a hydrolyzable group.
上述R22”較佳係在每次出現時分別獨立地為水解性基。 Preferably, each occurrence of R 22" is independently a hydrolyzable group.
上述R22”較佳係在每次出現時分別獨立地為-ORj、-OCORj、-O-N=CRj 2、-NRj 2、-NHRj、-NCO、或鹵素(此等式中,Rj表示經取代或未經取代之C1-4烷基),更佳係-ORj(亦即烷氧基)。Rj可列舉:甲基、乙基、丙基、異丙基、正丁基、異丁基等未經取代之烷基;氯甲基等經取代之烷基。彼等之中,以烷基為佳,尤其以未經取代之烷基為佳,以甲基或乙基為更佳。在一態樣中,Rj為甲基,在另一態樣中,Rj為乙基。 The above-mentioned R 22" is preferably independently -OR j , -OCOR j , -ON=CR j 2 , -NR j 2 , -NHR j , -NCO, or halogen (in this formula, R j represents a substituted or unsubstituted C 1-4 alkyl group), more preferably -OR j (i.e., alkoxy group). R j can be listed as: unsubstituted alkyl groups such as methyl, ethyl, propyl, isopropyl, n-butyl, isobutyl; substituted alkyl groups such as chloromethyl. Among them, alkyl groups are preferred, especially unsubstituted alkyl groups, and methyl or ethyl groups are more preferred. In one embodiment, R j is methyl, and in another embodiment, R j is ethyl.
上述R23”在每次出現時分別獨立地為氫原子或1價有機基。該1價有機基係上述水解性基除外之1價有機基。 The above R 23″ is independently a hydrogen atom or a monovalent organic group at each occurrence. The monovalent organic group is a monovalent organic group excluding the above-mentioned hydrolyzable group.
在上述R23”中,1價有機基較佳係C1-20烷基,更佳係C1-6烷基,又更佳係甲基。 In the above R 23″ , the monovalent organic group is preferably a C 1-20 alkyl group, more preferably a C 1-6 alkyl group, and even more preferably a methyl group.
上述q1”在每次出現時分別獨立地為0至3之整數,上述r1”在每次出現時分別獨立地為0至3之整數。又,在(SiR22” q1”R23” r1”)單元中,q1”與r1”之合計為3。 The above-mentioned q1″ is an integer from 0 to 3 each time it appears, and the above-mentioned r1″ is an integer from 0 to 3 each time it appears. Moreover, in the unit (SiR 22″ q1″ R 23″ r1″ ), the total of q1″ and r1″ is 3.
上述q1”係在每個(SiR22” q1”R23” r1”)單元中分別獨立地較佳係1至3之整數,更佳係2至3,又更佳係3。 The above-mentioned q1″ is preferably an integer from 1 to 3, more preferably 2 to 3, and even more preferably 3, independently in each (SiR 22″ q1″ R 23″ r1″ ) unit.
上述R22’在每次出現時分別獨立地為羥基或水解性基。 Each occurrence of R 22′ is independently a hydroxyl group or a hydrolyzable group.
R22’較佳係在每次出現時分別獨立地為水解性基。 Preferably, each occurrence of R 22′ is independently a hydrolyzable group.
R22’較佳係在每次出現時分別獨立地為-ORj、-OCORj、-O-N=CRj 2、-NRj 2、-NHRj、-NCO、或鹵素(此等式中,Rj表示經取代或未經取代之C1-4烷基),更佳係-ORj(亦即烷氧基)。Rj係可列舉:甲基、乙基、丙基、異丙基、正丁基、異丁基等未經取代之烷基;氯甲基等經取代之烷基。彼等之中,以烷基為佳,尤其以未經取代之烷基為佳,以甲基或乙基為更佳。在一態樣中,Rj為甲基,在另一態樣中,Rj為乙基。 R 22′ preferably represents, at each occurrence, independently -OR j , -OCOR j , -ON═CR j 2 , -NR j 2 , -NHR j , -NCO, or a halogen (in this formula, R j represents a substituted or unsubstituted C 1-4 alkyl group), more preferably -OR j (i.e., an alkoxy group). R j includes, for example, unsubstituted alkyl groups such as methyl, ethyl, propyl, isopropyl, n-butyl, and isobutyl; and substituted alkyl groups such as chloromethyl. Among these, alkyl groups are preferred, with unsubstituted alkyl groups being particularly preferred, and methyl or ethyl being more preferred. In one embodiment, R j is methyl, and in another embodiment, R j is ethyl.
上述R23’在每次出現時分別獨立地為氫原子或1價有機基。該1價有機基係上述水解性基除外之1價有機基。 Each occurrence of R 23′ is independently a hydrogen atom or a monovalent organic group. The monovalent organic group is a monovalent organic group excluding the hydrolyzable group.
在R23’中,1價有機基較佳係C1-20烷基,更佳係C1-6烷基,又更佳係甲基。 In R 23′ , the monovalent organic group is preferably a C 1-20 alkyl group, more preferably a C 1-6 alkyl group, and even more preferably a methyl group.
上述p1’在每次出現時分別獨立地為0至3之整數,q1’在每次出現時分別獨立地為0至3之整數,r1’在每次出現時分別獨立地為0至3之整數。又,在(SiR21’ p1’R22’ q1’R23’ r1’)單元中,p’、q1’與r1’之合計為3。 Each occurrence of p1' is independently an integer between 0 and 3, each occurrence of q1' is independently an integer between 0 and 3, and each occurrence of r1' is independently an integer between 0 and 3. Furthermore, in the unit (SiR 21' p1' R 22' q1' R 23' r1' ), the sum of p', q1', and r1' is 3.
在一態樣中,p1’為0。 In one embodiment, p1’ is 0.
在一態樣中,p1’係在每個(SiR21’ p1’R22’ q1’R23’ r1’)單元中可分別獨立地為1至3之整數,2至3之整數,或3。在較佳態樣中,p1’為3。 In one embodiment, p1′ in each (SiR 21′ p1′ R 22′ q1′ R 23′ r1′ ) unit can be independently an integer from 1 to 3, an integer from 2 to 3, or 3. In a preferred embodiment, p1′ is 3.
在一態樣中,q1’係在每個(SiR21’ p1’R22’ q1’R23’ r1’)單元中分別獨立地為1至3之整數,較佳係2至3之整數,更佳係3。 In one embodiment, q1' in each (SiR 21' p1' R 22' q1' R 23' r1' ) unit is independently an integer from 1 to 3, preferably an integer from 2 to 3, and more preferably 3.
在一態樣中,p1’為0,q1’係在每個(SiR21’ p1’R22’ q1’R23’ r1’)單元中分別獨立地為1至3之整數,較佳係2至3之整數,更佳係3。 In one embodiment, p1' is 0, and q1' is independently an integer from 1 to 3 in each (SiR 21' p1' R 22' q1' R 23' r1' ) unit, preferably an integer from 2 to 3, and more preferably 3.
上述R22在每次出現時分別獨立地為羥基或水解性基。 Each occurrence of R 22 is independently a hydroxyl group or a hydrolyzable group.
R22較佳係在每次出現時分別獨立地為水解性基。 Preferably, each occurrence of R22 is independently a hydrolyzable group.
R22較佳係在每次出現時分別獨立地為-ORj、-OCORj、-O-N=CRj 2、-NRj 2、-NHRj、-NCO、或鹵素(此等式中,Rj表示經取代或未經取代之C1-4烷基),更佳係-ORj(亦即烷氧基)。Rj係可列舉:甲基、乙基、丙基、異丙基、正丁基、異丁基等未經取代之烷基;氯甲基等經取代之烷基。彼等之中,以烷基為佳,尤其以未經取代之烷基為佳,以甲基或乙基為更佳。在一態樣中,Rj為甲基,在另一態樣中,Rj為乙基。 R 22 preferably represents, at each occurrence, independently -OR j , -OCOR j , -ON=CR j 2 , -NR j 2 , -NHR j , -NCO, or a halogen (in this formula, R j represents a substituted or unsubstituted C 1-4 alkyl group), more preferably -OR j (i.e., an alkoxy group). R j includes, for example, unsubstituted alkyl groups such as methyl, ethyl, propyl, isopropyl, n-butyl, and isobutyl; and substituted alkyl groups such as chloromethyl. Among these, alkyl groups are preferred, with unsubstituted alkyl groups being particularly preferred, and methyl or ethyl being more preferred. In one embodiment, R j is methyl, and in another embodiment, R j is ethyl.
上述R23在每次出現時分別獨立地為氫原子或1價有機基。該1價有機基為上述水解性基除外之1價有機基。 Each occurrence of R 23 is independently a hydrogen atom or a monovalent organic group. The monovalent organic group is a monovalent organic group excluding the hydrolyzable group.
在R23中,1價有機基較佳係C1-20烷基,更佳係C1-6烷基,又更佳係甲基。 In R 23 , the monovalent organic group is preferably a C 1-20 alkyl group, more preferably a C 1-6 alkyl group, and even more preferably a methyl group.
上述p1在每次出現時分別獨立地為0至3之整數,q1在每次出現時分別獨立地為0至3之整數,r1在每次出現時分別獨立地為0至3之整數。又,在(SiR21 p1R22 q1R23 r1)單元中,p1、q1與r1之合計為3。 Each occurrence of p1 is independently an integer between 0 and 3, each occurrence of q1 is independently an integer between 0 and 3, and each occurrence of r1 is independently an integer between 0 and 3. In the unit (SiR 21 p1 R 22 q1 R 23 r1 ), the total of p1, q1, and r1 is 3.
在一態樣中,p1為0。 In one embodiment, p1 is 0.
在一態樣中,p1係在每個(SiR21 p1R22 q1R23 r1)單元中分別獨立地為1至3之整數,可為2至3之整數,或可為3。在較佳態樣中,p1為3。 In one embodiment, p1 in each (SiR 21 p1 R 22 q1 R 23 r1 ) unit is independently an integer from 1 to 3, and may be an integer from 2 to 3, or may be 3. In a preferred embodiment, p1 is 3.
在一態樣中,q1係在每個(SiR21 p1R22 q1R23 r1)單元中分別獨立地為1至3之整數,較佳係2至3之整數,更佳係3。 In one embodiment, q1 in each (SiR 21 p1 R 22 q1 R 23 r1 ) unit is independently an integer from 1 to 3, preferably an integer from 2 to 3, and more preferably 3.
在一態樣中,p1為0,q1係在每個(SiR21 p1R22 q1R23 r1)單元中分別獨立地為1至3之整數,較佳係2至3之整數,更佳係3。 In one embodiment, p1 is 0, and q1 is independently an integer from 1 to 3 in each (SiR 21 p1 R 22 q1 R 23 r1 ) unit, preferably an integer from 2 to 3, and more preferably 3.
上述式中,Rb1在每次出現時分別獨立地為羥基或水解性基。 In the above formula, each occurrence of R b1 is independently a hydroxyl group or a hydrolyzable group.
上述Rb1較佳係在每次出現時分別獨立地為水解性基。 Preferably, each occurrence of R b1 is independently a hydrolyzable group.
上述Rb1較佳係在每次出現時分別獨立地為-ORj、-OCORj、-O-N=CRj 2、-NRj 2、-NHRj、-NCO、或鹵素(此等式中,Rj表示經取代或未經取代之C1-4烷基),更佳係-ORj(亦即烷氧基)。Rj係可列舉:甲基、乙基、丙基、異丙基、正丁基、異丁基等未經取代之烷基;氯甲基等經取代之烷基。彼等之中,以烷基為佳,尤其以未經取代之烷基為佳,以甲基或乙基為更佳。在一態樣中,Rj為甲基,在另一態樣中,Rj為乙基。 The aforementioned R b1 preferably represents, at each occurrence, independently -OR j , -OCOR j , -ON=CR j 2 , -NR j 2 , -NHR j , -NCO, or a halogen (in this formula, R j represents a substituted or unsubstituted C 1-4 alkyl group), more preferably -OR j (i.e., an alkoxy group). Examples of R j include unsubstituted alkyl groups such as methyl, ethyl, propyl, isopropyl, n-butyl, and isobutyl; and substituted alkyl groups such as chloromethyl. Among these, alkyl groups are preferred, with unsubstituted alkyl groups being particularly preferred, and methyl or ethyl groups being more preferred. In one embodiment, R j is methyl, and in another embodiment, R j is ethyl.
在上述式中,Rc1在每次出現時分別獨立地為氫原子或1價有機基。該1價有機基為上述水解性基除外之1價有機基。 In the above formula, each occurrence of R c1 is independently a hydrogen atom or a monovalent organic group. The monovalent organic group is a monovalent organic group excluding the above-mentioned hydrolyzable group.
上述Rc1中,1價有機基較佳係C1-20烷基,更佳係C1-6烷基,又更佳係甲基。 In the above R c1 , the monovalent organic group is preferably a C 1-20 alkyl group, more preferably a C 1-6 alkyl group, and even more preferably a methyl group.
上述k1在每次出現時分別獨立地為0至3之整數,l1在每次出現時分別獨立地為0至3之整數,m1在每次出現時分別獨立地為0至3之整數。又,在(SiRa1 k1Rb1 l1Rc1 m1)單元中,k1、l1與m1之合計為3。 Each occurrence of k1 is independently an integer between 0 and 3, each occurrence of l1 is independently an integer between 0 and 3, and each occurrence of m1 is independently an integer between 0 and 3. Furthermore, in the unit (SiR a1 k1 R b1 l1 R c1 m1 ), the sum of k1, l1, and m1 is 3.
在一態樣中,k1係在每個(SiRa1 k1Rb1 l1Rc1 m1)單元中分別獨立地為1至3之整數,較佳係2或3,更佳係3。在較佳態樣中,k1為3。 In one embodiment, k1 is independently an integer from 1 to 3 in each (SiR a1 k1 R b1 l1 R c1 m1 ) unit, preferably 2 or 3, and more preferably 3. In a preferred embodiment, k1 is 3.
上述式(1)及(2)中,RSi為式(S3)所示的基時,較佳係在式(1)及式(2)之末端部分中,至少存在2個鍵結有「羥基或水解性基」之Si原子。 In the above formulae (1) and (2), when R Si is a group represented by formula (S3), it is preferred that at least two Si atoms bonded to a "hydroxyl group or a hydrolyzable group" exist in the terminal portions of formulae (1) and (2).
在較佳態樣中,式(S3)所示的基具有-Z1-SiR22 q1R23 r1(式中,q1為1至3之整數,較佳係2或3,更佳係3;r1為0至2之整數)、-Z1’-SiR22’ q1’R23’ r1’(式中,q1’為1至3之整數,較佳係2或3,更佳係3;r1’為0至2之整數)、或-Z1”-SiR22” q1”R23” r1”(式中,q1”為1至3之整數,較佳係2或3,更佳係3;r1”為0至2之整數)中之任一者。Z1、Z1’、Z1”、R22、R23、R22’、R23’、R22”及R23”係與上述為相同意義。 In a preferred embodiment, the group represented by formula (S3) has any one of -Z 1 -SiR 22 q1 R 23 r1 (wherein q1 is an integer from 1 to 3, preferably 2 or 3, more preferably 3; r1 is an integer from 0 to 2), -Z 1' -SiR 22' q1' R 23' r1' (wherein q1' is an integer from 1 to 3, preferably 2 or 3, more preferably 3; r1' is an integer from 0 to 2), or -Z 1" -SiR 22" q1" R 23" r1" (wherein q1" is an integer from 1 to 3, preferably 2 or 3, more preferably 3; r1" is an integer from 0 to 2). Z 1 , Z 1' , Z 1" , R 22 , R 23 , R 22' , R R 23' , R 22" and R 23" have the same meaning as above.
在較佳態樣中,當式(S3)中存在有R21’時,在至少1個(較佳係全部)R21’中,q1”為1至3之整數,較佳係2或3,更佳係3。 In a preferred embodiment, when R 21′ is present in formula (S3), in at least one (preferably all) R 21′ , q1″ is an integer from 1 to 3, preferably 2 or 3, and more preferably 3.
在較佳態樣中,當式(S3)中存在有R21時,在至少1個(較佳係全部)R21中,p1’為0,q1’為1至3之整數,較佳係2或3,更佳係3。 In a preferred embodiment, when R 21 is present in formula (S3), in at least one (preferably all) R 21 , p1' is 0, and q1' is an integer from 1 to 3, preferably 2 or 3, and more preferably 3.
在較佳態樣中,當式(S3)中存在有Ra1時,在至少1個(較佳係全部)Ra1中,p1為0,q1為1至3之整數,較佳係2或3,更佳係3。 In a preferred embodiment, when Ra1 is present in formula (S3), in at least one (preferably all) Ra1 , p1 is 0, and q1 is an integer from 1 to 3, preferably 2 or 3, and more preferably 3.
在較佳態樣中,在式(S3)中,k1為2或3,較佳係3,p1為0,q1為2或3,較佳係3。 In a preferred embodiment, in formula (S3), k1 is 2 or 3, preferably 3, p1 is 0, and q1 is 2 or 3, preferably 3.
Rd1在每次出現時分別獨立地為-Z2-CR31 p2R32 q2R33 r2。 R d1 is independently -Z 2 -CR 31 p2 R 32 q2 R 33 r2 at each occurrence.
Z2在每次出現時分別獨立地為單鍵、氧原子或2價有機基。又,以下記載為Z2之結構係右側鍵結於(CR31 p2R32 q2R33 r2)。 Each occurrence of Z 2 is independently a single bond, an oxygen atom, or a divalent organic group. In the following description, the structure of Z 2 is right-side bonded to (CR 31 p2 R 32 q2 R 33 r2 ).
在較佳態樣中,Z2為2價有機基。 In a preferred embodiment, Z 2 is a divalent organic group.
上述Z2較佳係C1-6伸烷基、-(CH2)z5-O-(CH2)z6-(式中,z5為0至6之整數,例如為1至6之整數;z6為0至6之整數,例如為1至6之整數)、或-(CH2)z7-伸苯基-(CH2)z8-(式中,z7為0至6之整數,例如為1至6之整數;z8為0至6之整數,例如為1至6之整數)。該C1-6伸烷基可為直鏈亦可為分支鏈,惟較佳係直鏈。此等基係例如可經選自氟原子、C1-6烷基、C2-6烯基及C2-6炔基中之1個以上的取代基所取代,惟較佳係未經取代者。 The aforementioned Z2 is preferably a C1-6 alkylene group, -( CH2 ) z5 -O-( CH2 ) z6- (wherein z5 is an integer from 0 to 6, for example, an integer from 1 to 6; z6 is an integer from 0 to 6, for example, an integer from 1 to 6), or -( CH2 ) z7 -phenylene-( CH2 ) z8- (wherein z7 is an integer from 0 to 6, for example, an integer from 1 to 6; z8 is an integer from 0 to 6, for example, an integer from 1 to 6). The C1-6 alkylene group may be a straight chain or a branched chain, but is preferably a straight chain. These groups may be substituted with one or more substituents selected from, for example, a fluorine atom, a C1-6 alkyl group, a C2-6 alkenyl group, and a C2-6 alkynyl group, but are preferably unsubstituted.
在較佳態樣中,Z2為C1-6伸烷基或-(CH2)z7-伸苯基-(CH2)z8-,較佳係-伸苯基-(CH2)z8-。Z2為如此之基時,耐光性(尤其耐紫外線性)可變得更高。 In a preferred embodiment, Z 2 is a C 1-6 alkylene group or -(CH 2 ) z 7 -phenylene-(CH 2 ) z 8 -, preferably -phenylene-(CH 2 ) z 8 -. When Z 2 is such a group, light resistance (especially UV resistance) can be further improved.
在另一較佳態樣中,上述Z2為C1-3伸烷基。在一態樣中,Z2可為-CH2CH2CH2-。在另一態樣中,Z2可為-CH2CH2-。 In another preferred embodiment, Z 2 is a C 1-3 alkylene group. In one embodiment, Z 2 can be -CH 2 CH 2 CH 2 -. In another embodiment, Z 2 can be -CH 2 CH 2 -.
R31在每次出現時分別獨立地為-Z2’-CR32’ q2’R33’ r2’。 Each occurrence of R 31 is independently -Z 2' -CR 32' q2' R 33' r2' .
Z2’在每次出現時分別獨立地為單鍵、氧原子或2價有機基。又,以下記載為Z2’之結構係右側鍵結於(CR32’ q2’R33’ r2’)。 Each occurrence of Z 2' is independently a single bond, an oxygen atom, or a divalent organic group. In the following description, the structure of Z 2' is right-side bonded to (CR 32' q2' R 33' r2' ).
上述Z2’較佳係C1-6伸烷基、-(CH2)z5’-O-(CH2)z6’-(式中,z5’為0至6之整數,例如為1至6之整數;z6’為0至6之整數,例如為1至6之整數)、或-(CH2)z7’-伸苯基-(CH2)z8’-(式中,z7’為0至6之整數,例如為1至6之整數;z8’為0至6之整數,例如為1至6之整數)。該C1-6伸烷基可為直鏈亦可為分支鏈,惟較佳係直鏈。此等基係例如可經選自氟原子、C1-6烷基、C2-6烯基及C2-6炔基中之1個以上的取代基所取代,惟較佳係未經取代者。 The aforementioned Z 2' is preferably a C 1-6 alkylene group, -(CH 2 ) z 5 ' -O-(CH 2 ) z 6 ' -(wherein z 5 ' is an integer from 0 to 6, for example, an integer from 1 to 6; z 6 ' is an integer from 0 to 6, for example, an integer from 1 to 6), or -(CH 2 ) z 7 ' -phenylene-(CH 2 ) z 8 ' -(wherein z 7 ' is an integer from 0 to 6, for example, an integer from 1 to 6; z 8 ' is an integer from 0 to 6, for example, an integer from 1 to 6). The C 1-6 alkylene group may be a straight chain or a branched chain, but is preferably a straight chain. These groups may be substituted with one or more substituents selected from, for example, a fluorine atom, a C 1-6 alkyl group, a C 2-6 alkenyl group, and a C 2-6 alkynyl group, but are preferably unsubstituted.
在較佳態樣中,Z2’為C1-6伸烷基或-(CH2)z7’-伸苯基-(CH2)z8’-,較佳係-伸苯基-(CH2)z8’-。Z2’為如此之基時,耐光性(尤其耐紫外線性)可變得更高。 In a preferred embodiment, Z 2' is a C 1-6 alkylene group or -(CH 2 ) z7' -phenylene-(CH 2 ) z8' -, preferably -phenylene-(CH 2 ) z8' -. When Z 2' is such a group, light resistance (especially UV resistance) can be further improved.
在另一較佳態樣中,上述Z2’為C1-3伸烷基。在一態樣中,Z2’可為-CH2CH2CH2-。在另一態樣中,Z2’可為-CH2CH2-。 In another preferred embodiment, Z 2' is a C 1-3 alkylene group. In one embodiment, Z 2' can be -CH 2 CH 2 CH 2 -. In another embodiment, Z 2' can be -CH 2 CH 2 -.
上述R32’在每次出現時分別獨立地為-Z3-SiR34 n2R35 3-n2。 Each occurrence of R 32′ is independently -Z 3 -SiR 34 n2 R 35 3-n2 .
上述Z3在每次出現時分別獨立地為單鍵、氧原子或2價有機基。又,以下記載為Z3之結構係右側鍵結於(SiR34 n2R35 3-n2)。 Each occurrence of Z 3 is independently a single bond, an oxygen atom, or a divalent organic group. In the following description, the structure of Z 3 is right-side bonded to (SiR 34 n2 R 35 3-n2 ).
在一態樣中,Z3為氧原子。 In one embodiment, Z 3 is an oxygen atom.
在一態樣中,Z3為2價有機基。 In one embodiment, Z 3 is a divalent organic group.
上述Z3較佳係C1-6伸烷基、-(CH2)z5”-O-(CH2)z6”-(式中,z5”為0至6之整數,例如為1至6之整數;z6”為0至6之整數,例如為1至6之整數)、或-(CH2)z7”-伸苯基-(CH2)z8”-(式中,z7”為0至6之整數,例如為1至6之整數;z8”為0至6之整數,例如為1至6之整數)。該C1-6伸烷基可為直鏈亦可為分支鏈,惟較佳係直鏈。此等基係例如可經選自氟原子、C1-6烷基、C2-6烯基及C2-6炔基中之1個以上之取代基所取代,惟較佳係未經取代者。 The above-mentioned Z 3 is preferably a C 1-6 alkylene group, -(CH 2 ) z5” -O-(CH 2 ) z6” - (wherein z5” is an integer from 0 to 6, for example, an integer from 1 to 6; z6” is an integer from 0 to 6, for example, an integer from 1 to 6), or -(CH 2 ) z7” -phenylene-(CH 2 ) z8” - (wherein z7” is an integer from 0 to 6, for example, an integer from 1 to 6; z8” is an integer from 0 to 6, for example, an integer from 1 to 6). The C 1-6 alkylene group may be a straight chain or a branched chain, but is preferably a straight chain. These groups may be substituted, for example, by one or more substituents selected from a fluorine atom, a C 1-6 alkyl group, a C 2-6 alkenyl group, and a C 2-6 alkynyl group, but are preferably unsubstituted.
在較佳態樣中,Z3為C1-6伸烷基或-(CH2)z7”-伸苯基-(CH2)z8”-,較佳係-伸苯基-(CH2)z8”-。Z3為如此之基時,耐光性(尤其耐紫外線性)可變得更高。 In a preferred embodiment, Z 3 is a C 1-6 alkylene group or -(CH 2 ) z7″ -phenylene-(CH 2 ) z8″ -, preferably -phenylene-(CH 2 ) z8″ -. When Z 3 is such a group, light resistance (especially UV resistance) can be further improved.
在另一較佳態樣中,上述Z3為C1-3伸烷基。在一態樣中,Z3可為-CH2CH2CH2-。在另一態樣中,Z3可為-CH2CH2-。 In another preferred embodiment, Z 3 is a C 1-3 alkylene group. In one embodiment, Z 3 can be -CH 2 CH 2 CH 2 -. In another embodiment, Z 3 can be -CH 2 CH 2 -.
上述R34在每次出現時分別獨立地為羥基或水解性基。 Each occurrence of R 34 is independently a hydroxyl group or a hydrolyzable group.
R34較佳係在每次出現時分別獨立地為水解性基。 Preferably, each occurrence of R 34 is independently a hydrolyzable group.
R34較佳係在每次出現時分別獨立地為-ORj、-OCORj、-O-N=CRj 2、-NRj 2、-NHRj、-NCO、或鹵素(此等式中,Rj表示經取代或未經取代之C1-4烷基),更佳為-ORj(亦即烷氧基)。Rj係可列舉:甲基、乙基、丙基、異丙基、正丁基、 異丁基等未經取代之烷基;氯甲基等經取代之烷基。彼等之中,以烷基為佳,尤其以未經取代之烷基為佳,以甲基或乙基為更佳。在一態樣中,Rj為甲基,在另一態樣中,Rj為乙基。 R 34 preferably represents, at each occurrence, -OR j , -OCOR j , -ON=CR j 2 , -NR j 2 , -NHR j , -NCO, or a halogen (in this formula, R j represents a substituted or unsubstituted C 1-4 alkyl group), more preferably -OR j (i.e., an alkoxy group). R j includes, for example, unsubstituted alkyl groups such as methyl, ethyl, propyl, isopropyl, n-butyl, and isobutyl; and substituted alkyl groups such as chloromethyl. Among these, alkyl groups are preferred, with unsubstituted alkyl groups being particularly preferred, and methyl or ethyl being more preferred. In one embodiment, R j is methyl, and in another embodiment, R j is ethyl.
上述R35在每次出現時分別獨立地為氫原子或1價有機基。該1價有機基係上述水解性基除外之1價有機基。 Each occurrence of R 35 is independently a hydrogen atom or a monovalent organic group. The monovalent organic group is a monovalent organic group excluding the hydrolyzable group.
上述R35中,1價有機基較佳係C1-20烷基,更佳係C1-6烷基,又更佳係甲基。 In the above R 35 , the monovalent organic group is preferably a C 1-20 alkyl group, more preferably a C 1-6 alkyl group, and even more preferably a methyl group.
上述式中,n2係在每個(SiR34 n2R35 3-n2)單元中分別獨立地為0至3之整數。惟,RSi為式(S4)所示的基時,在式(1)及式(2)之末端部分中,至少存在1個n2為1至3之(SiR34 n2R35 3-n2)單元。亦即,在該末端部分中,全部之n2不會同時為0。換言之,在式(1)及式(2)之末端部分中,至少存在1個鍵結有羥基或水解性基之Si原子。 In the above formula, n2 is an integer from 0 to 3 independently in each (SiR 34 n2 R 35 3-n2 ) unit. However, when R Si is a radical represented by formula (S4), at least one (SiR 34 n2 R 35 3-n2 ) unit in which n2 is 1 to 3 exists in the terminal portion of formula (1) and formula (2). That is, not all n2 in the terminal portion are 0 at the same time. In other words, at least one Si atom bonded to a hydroxyl group or a hydrolyzable group exists in the terminal portion of formula (1) and formula (2).
n2係在每個(SiR34 n2R35 3-n2)單元中分別獨立地較佳為1至3之整數,更佳為2至3,又更佳為3。 In each (SiR 34 n2 R 35 3-n2 ) unit, n2 is independently preferably an integer from 1 to 3, more preferably from 2 to 3, and even more preferably 3.
上述R33’在每次出現時分別獨立地為氫原子、羥基或1價有機基。該1價有機基係上述水解性基除外之1價有機基。 Each occurrence of R 33′ is independently a hydrogen atom, a hydroxyl group, or a monovalent organic group. The monovalent organic group is a monovalent organic group excluding the hydrolyzable group.
在上述R33’中,1價有機基較佳係C1-20烷基或-(CsH2s)t1-(O-CsH2s)t2(式中,s為1至6之整數,較佳係2至4之整數;t1為1或0,較佳係0;t2為1至20之整數,較佳係2至10之整數,更佳係2至6之整數),更佳係C1-20烷基,又更佳係C1-6烷基,特佳係甲基。 In the above-mentioned R 33′ , the monovalent organic group is preferably a C 1-20 alkyl group or -(C s H 2s ) t1 -(OC s H 2s ) t2 (wherein, s is an integer from 1 to 6, preferably an integer from 2 to 4; t1 is 1 or 0, preferably 0; t2 is an integer from 1 to 20, preferably an integer from 2 to 10, more preferably an integer from 2 to 6), more preferably a C 1-20 alkyl group, still more preferably a C 1-6 alkyl group, and particularly preferably a methyl group.
在一態樣中,R33’為羥基。 In one embodiment, R 33′ is hydroxy.
在另一態樣中,R33’為1價有機基,較佳係C1-20烷基,更佳係C1-6烷基。 In another embodiment, R 33′ is a monovalent organic group, preferably a C 1-20 alkyl group, more preferably a C 1-6 alkyl group.
上述q2’在每次出現時分別獨立地為0至3之整數,上述r2’在每次出現時分別獨立地為0至3之整數。又,在(CR32’ q2’R33’ r2’)單元中,q2’與r2’之合計為3。 Each occurrence of q2' is independently an integer between 0 and 3, and each occurrence of r2' is independently an integer between 0 and 3. In the unit (CR 32' q2' R 33' r2' ), the sum of q2' and r2' is 3.
q2’係在每個(CR32’ q2’R33’ r2’)單元中分別獨立地較佳為1至3之整數,更佳為2至3,又更佳為3。 q2' is preferably an integer from 1 to 3, more preferably 2 to 3, and even more preferably 3, independently in each (CR 32' q2' R 33' r2' ) unit.
R32在每次出現時分別獨立地為-Z3-SiR34 n2R35 3-n2。該-Z3-SiR34 n2R35 3-n2係與上述R32’中之記載為相同意義。 Each occurrence of R 32 is independently -Z 3 -SiR 34 n2 R 35 3-n2 . Said -Z 3 -SiR 34 n2 R 35 3-n2 has the same meaning as described above for R 32′ .
上述R33在每次出現時分別獨立地為氫原子、羥基或1價有機基。該1價有機基為上述水解性基除外之1價有機基。 Each occurrence of R 33 is independently a hydrogen atom, a hydroxyl group, or a monovalent organic group. The monovalent organic group is a monovalent organic group excluding the hydrolyzable group.
在上述R33中,1價有機基較佳係C1-20烷基或-(CsH2s)t1-(O-CsH2s)t2(式中,s為1至6之整數,較佳係2至4之整數;t1為1或0,較佳係0;t2為1至20之整數,較佳係2至10之整數,更佳係2至6之整數),更佳係C1-20烷基,又更佳係C1-6烷基,特佳係甲基。 In the above-mentioned R 33 , the monovalent organic group is preferably a C 1-20 alkyl group or -(C s H 2s ) t1 -(OC s H 2s ) t2 (wherein, s is an integer from 1 to 6, preferably an integer from 2 to 4; t1 is 1 or 0, preferably 0; t2 is an integer from 1 to 20, preferably an integer from 2 to 10, more preferably an integer from 2 to 6), more preferably a C 1-20 alkyl group, still more preferably a C 1-6 alkyl group, and particularly preferably a methyl group.
在一態樣中,R33為羥基。 In one embodiment, R 33 is hydroxy.
在另一態樣中,R33為1價有機基,較佳係C1-20烷基,更佳係C1-6烷基。 In another embodiment, R 33 is a monovalent organic group, preferably a C 1-20 alkyl group, more preferably a C 1-6 alkyl group.
上述p2在每次出現時分別獨立地為0至3之整數,q2在每次出現時分別獨立地為0至3之整數,r2在每次出現時分別獨立地為0至3之整數。又,在(CR31 p2R32 q2R33 r2)單元中,p2、q2及r2之合計為3。 Each occurrence of p2 is independently an integer between 0 and 3, each occurrence of q2 is independently an integer between 0 and 3, and each occurrence of r2 is independently an integer between 0 and 3. In the unit (CR 31 p2 R 32 q2 R 33 r2 ), the sum of p2, q2, and r2 is 3.
在一態樣中,p2為0。 In one embodiment, p2 is 0.
在一態樣中,p2係在每個(CR31 p2R32 q2R33 r2)單元中可分別獨立地為1至3之整數,2至3之整數,或3。在較佳態樣中,p2為3。 In one embodiment, p2 in each (CR 31 p2 R 32 q2 R 33 r2 ) unit can be an integer from 1 to 3, an integer from 2 to 3, or 3. In a preferred embodiment, p2 is 3.
在一態樣中,q2係在每個(CR31 p2R32 q2R33 r2)單元中分別獨立地為1至3之整數,較佳係2至3之整數,更佳係3。 In one embodiment, q2 is independently an integer from 1 to 3 in each (CR 31 p2 R 32 q2 R 33 r2 ) unit, preferably an integer from 2 to 3, and more preferably 3.
在一態樣中,P2為0,q2係在每個(CR31 p2R32 q2R33 r2)單元中分別獨立地為1至3之整數,較佳係2至3之整數,更佳係3。 In one embodiment, P2 is 0, and q2 is an integer from 1 to 3, preferably an integer from 2 to 3, and more preferably 3, independently in each (CR 31 p2 R 32 q2 R 33 r2 ) unit.
上述Re1在每次出現時分別獨立地為-Z3-SiR34 n2R35 3-n2。該-Z3-SiR34 n2R35 3-n2係與上述R32’中之記載為相同意義。 Each occurrence of R e1 is independently -Z 3 -SiR 34 n2 R 35 3-n2 . -Z 3 -SiR 34 n2 R 35 3-n2 has the same meaning as described above for R 32' .
上述Rf1在每次出現時分別獨立地為氫原子、羥基或1價有機基。該1價有機基為上述水解性基除外之1價有機基。 Each occurrence of Rf1 is independently a hydrogen atom, a hydroxyl group, or a monovalent organic group. The monovalent organic group is a monovalent organic group excluding the hydrolyzable group.
在上述Rf1中,1價有機基較佳係C1-20烷基或-(CsH2s)t1-(O-CsH2s)t2(式中,s為1至6之整數,較佳係2至4之整數;t1為1或0,較佳係0;t2為1至20之整數,較佳係2至10之整數,更佳係2至6之整數),更佳係C1-20烷基,又更佳係C1-6烷基,特佳係甲基。 In the above-mentioned R f1 , the monovalent organic group is preferably a C 1-20 alkyl group or -(C s H 2s ) t1 -(OC s H 2s ) t2 (wherein, s is an integer from 1 to 6, preferably an integer from 2 to 4; t1 is 1 or 0, preferably 0; t2 is an integer from 1 to 20, preferably an integer from 2 to 10, more preferably an integer from 2 to 6), more preferably a C 1-20 alkyl group, still more preferably a C 1-6 alkyl group, and particularly preferably a methyl group.
在一態樣中,Rf1為羥基。 In one embodiment, R f1 is hydroxy.
在另一態樣中,Rf1為1價有機基,較佳係C1-20烷基,更佳係C1-6烷基。 In another embodiment, Rf1 is a monovalent organic group, preferably a C1-20 alkyl group, more preferably a C1-6 alkyl group.
上述k2在每次出現時分別獨立地為0至3之整數,l2在每次出現時分別獨立地為0至3之整數,m2在每次出現時分別獨立地為0至3之整數。又,在(CRd1 k2Re1 l2Rf1 m2)單元中,k2、l2及m2之合計係為3。 Each occurrence of k2 is independently an integer between 0 and 3, each occurrence of l2 is independently an integer between 0 and 3, and each occurrence of m2 is independently an integer between 0 and 3. In the unit (CR d1 k2 R e1 l2 R f1 m2 ), the sum of k2, l2, and m2 is 3.
在上述式(1)及(2)中,RSi為式(S4)所示的基時,較佳係在式(1)及式(2)之末端部分中,至少存在2個鍵結有羥基或水解性基之Si原子。 In the above formulae (1) and (2), when R Si is a group represented by formula (S4), it is preferred that at least two Si atoms bonded to a hydroxyl group or a hydrolyzable group exist in the terminal portions of formulae (1) and (2).
在一態樣中,RSi為式(S4)所示的基時,n2為1至3(較佳係2或3,更佳係3)之(SiR34 n2R35 3-n2)單元係在式(1)及式(2)之各末端部分中存在2個以上,例如存在2至27個,較佳係存在2至9個,更佳係存在2至6個,又更佳係存在2至3個,特佳係存在3個。 In one embodiment, when R Si is a base represented by formula (S4), there are 2 or more (SiR 34 n2 R 35 3-n2 ) units in which n2 is 1 to 3 (preferably 2 or 3, more preferably 3) in each terminal portion of formula (1) and formula (2), for example, there are 2 to 27, preferably there are 2 to 9, more preferably there are 2 to 6, even more preferably there are 2 to 3, and particularly preferably there are 3.
在較佳態樣中,當式(S4)中存在有R32’時,在至少1個(較佳係全部)R32’中,n2為1至3之整數,較佳係2或3,更佳係3。 In a preferred embodiment, when R 32′ is present in formula (S4), in at least one (preferably all) R 32′ , n2 is an integer from 1 to 3, preferably 2 or 3, and more preferably 3.
在較佳態樣中,當式(S4)中存在有R32時,在至少1個(較佳係全部)R32中,n2為1至3之整數,較佳係2或3,更佳係3。 In a preferred embodiment, when R 32 is present in formula (S4), in at least one (preferably all) R 32 , n2 is an integer from 1 to 3, preferably 2 or 3, and more preferably 3.
在較佳態樣中,當式(S4)中存在有Re1時,在至少1個(較佳係全部)Ra1中,n2為1至3之整數,較佳係2或3,更佳係3。 In a preferred embodiment, when R e1 is present in formula (S4), in at least one (preferably all) R a1 , n2 is an integer from 1 to 3, preferably 2 or 3, and more preferably 3.
在較佳態樣中,在式(S4)中,k2為0,l2為2或3,較佳係3,n2為2或3,較佳係3。 In a preferred embodiment, in formula (S4), k2 is 0, l2 is 2 or 3, preferably 3, and n2 is 2 or 3, preferably 3.
上述Rg1及Rh1在每次出現時分別獨立地為-Z4-SiR11 n1R12 3-n1、-Z4-SiRa1 k1Rb1 l1Rc1 m1、-Z4-CRd1 k2Re1 l2Rf1 m2。在此,R11、R12、Ra1、Rb2、Rc1、Rd1、Re1、Rf1、n1、k1、l1、m1、k2、l2及m2係與上述為相同意義。 R g1 and R h1, at each occurrence, independently represent -Z 4 -SiR 11 n1 R 12 3-n1 , -Z 4 -SiR a1 k1 R b1 l1 R c1 m1 , and -Z 4 -CR d1 k2 R e1 l2 R f1 m2 . Here, R 11 , R 12 , Ra1 , R b2 , R c1 , R d1 , Re1, R f1 , n1 , k1, l1, m1, k2, l2, and m2 have the same meanings as described above.
在較佳態樣中,Rg1及Rh1分別獨立地為-Z4-SiR11 n1R12 3-n1。 In a preferred embodiment, R g1 and R h1 are each independently -Z 4 -SiR 11 n1 R 12 3-n1 .
上述Z4在每次出現時分別獨立地為單鍵、氧原子或2價有機基。又,以下記載為Z4之結構係右側鍵結於(SiR11 n1R12 3-n1)。 Each occurrence of Z 4 is independently a single bond, an oxygen atom, or a divalent organic group. In the following description, the structure of Z 4 is right-side bonded to (SiR 11 n1 R 12 3-n1 ).
在一態樣中,Z4為氧原子。 In one embodiment, Z 4 is an oxygen atom.
在一態樣中,Z4為2價有機基。 In one embodiment, Z 4 is a divalent organic group.
上述Z4較佳係C1-6伸烷基、-(CH2)z5”-O-(CH2)z6”-(式中,z5”為0至6之整數,例如為1至6之整數;z6”為0至6之整數,例如為1至6之整數)、 或-(CH2)z7”-伸苯基-(CH2)z8”-(式中,z7”為0至6之整數,例如為1至6之整數;z8”為0至6之整數,例如為1至6之整數)。該C1-6伸烷基可為直鏈亦可為分支鏈,惟較佳係直鏈。此等基係例如可經選自氟原子、C1-6烷基、C2-6烯基及C2-6炔基中之1個以上之取代基所取代,惟較佳係未經取代者。 The aforementioned Z 4 is preferably a C 1-6 alkylene group, -(CH 2 ) z5” -O-(CH 2 ) z6” - (wherein z5” is an integer from 0 to 6, for example, an integer from 1 to 6; z6” is an integer from 0 to 6, for example, an integer from 1 to 6), or -(CH 2 ) z7” -phenylene-(CH 2 ) z8” - (wherein z7” is an integer from 0 to 6, for example, an integer from 1 to 6; z8” is an integer from 0 to 6, for example, an integer from 1 to 6). The C 1-6 alkylene group may be a straight chain or a branched chain, but is preferably a straight chain. These groups may be substituted, for example, by one or more substituents selected from a fluorine atom, a C 1-6 alkyl group, a C 2-6 alkenyl group, and a C 2-6 alkynyl group, but are preferably unsubstituted.
在較佳態樣中,Z4為C1-6伸烷基或-(CH2)z7”-伸苯基-(CH2)z8”-,較佳係-伸苯基-(CH2)z8”-。Z3為如此之基時,耐光性(尤其耐紫外線性)可變得更高。 In a preferred embodiment, Z 4 is a C 1-6 alkylene group or -(CH 2 ) z7″ -phenylene-(CH 2 ) z8″ -, preferably -phenylene-(CH 2 ) z8″ -. When Z 3 is such a group, light resistance (especially UV resistance) can be further improved.
在另一較佳態樣中,上述Z4為C1-3伸烷基。在一態樣中,Z4可為-CH2CH2CH2-。在另一態樣中,Z4可為-CH2CH2-。 In another preferred embodiment, Z 4 is a C 1-3 alkylene group. In one embodiment, Z 4 can be -CH 2 CH 2 CH 2 -. In another embodiment, Z 4 can be -CH 2 CH 2 -.
在一態樣中,RSi為式(S2)、(S3)、(S4)或(S5)所示的基。此等化合物可形成具有高的表面平滑性之表面處理層。 In one embodiment, R Si is a group represented by formula (S2), (S3), (S4), or (S5). These compounds can form a surface treatment layer with high surface smoothness.
在一態樣中,RSi為式(S3)、(S4)或(S5)所示的基。此等化合物係因在一末端具有複數個水解性基,故可形成能牢固地密著於基材且具有高的耐磨損性之表面處理層。 In one embodiment, R Si is a group represented by formula (S3), (S4), or (S5). These compounds have multiple hydrolyzable groups at one end, and thus can form a surface treatment layer that can firmly adhere to the substrate and has high wear resistance.
在一態樣中,RSi為式(S3)或(S4)所示的基。此等化合物係因在一末端可具有從一個Si原子或C原子分支出的複數個水解性基,故可形成具有更高的耐磨損性之表面處理層。 In one embodiment, R Si is a group represented by formula (S3) or (S4). These compounds can form a surface treatment layer with higher wear resistance because they can have multiple hydrolyzable groups branching from a Si atom or a C atom at one end.
在一態樣中,RSi為式(S1)所示的基。 In one embodiment, R Si is a group represented by formula (S1).
在一態樣中,RSi為式(S2)所示的基。 In one embodiment, R Si is a group represented by formula (S2).
在一態樣中,RSi為式(S3)所示的基。 In one embodiment, R Si is a group represented by formula (S3).
在一態樣中,RSi為式(S4)所示的基。 In one embodiment, R Si is a group represented by formula (S4).
在一態樣中,RSi為式(S5)所示的基。 In one embodiment, R Si is a group represented by formula (S5).
在上述式(1)及(2)中,XA係被理解為將「主要提供撥水性及表面平滑性等之氟聚醚部分(RF1及RF2)」與「提供與基材之鍵結能力的部分(RSi)」予以連結之連結基。因此,該XA只要是可使式(1)及(2)所示的化合物安定存在者,即可為單鍵,或亦可為任何基。 In the above formulas (1) and (2), XA is understood to be a linking group that connects the fluoropolyether moieties ( RF1 and RF2 ) that primarily provide hydrophobicity and surface smoothness with the moiety ( RSi ) that provides bonding ability to the substrate. Therefore, XA may be a single bond or any other group as long as it allows the compounds represented by formulas (1) and (2) to exist stably.
在上述式(1)中,α為1至9之整數,β為1至9之整數。此等α及β可依照XA之價數而變化。α及β之和係與XA之價數相同。例如,XA為10價有機基時,α及β之和為10,例如α為9且β為1,α為5且β為5,或α為1且β為9。又,XA為2價有機基時,α及β為1。 In the above formula (1), α is an integer from 1 to 9, and β is an integer from 1 to 9. These α and β may vary depending on the valence of XA . The sum of α and β is the same as the valence of XA . For example, when XA is a devalent organic group, the sum of α and β is 10, such as α is 9 and β is 1, α is 5 and β is 5, or α is 1 and β is 9. Furthermore, when XA is a divalent organic group, α and β are 1.
上述式(2)中,γ為1至9之整數。γ可依照XA之價數而變化。亦即,γ為從XA之價數減去1之值。 In the above formula (2), γ is an integer from 1 to 9. γ can vary according to the valence of X A. In other words, γ is the value obtained by subtracting 1 from the valence of X A.
XA分別獨立地為單鍵或2至10價有機基; X and A are each independently a single bond or a 2- to 10-valent organic group;
在上述XA中之2至10價有機基較佳係2至8價有機基。在一態樣中,該2至10價有機基較佳係2至4價有機基,更佳係2價有機基。在另一態樣中,該2至10價有機基較佳係3至8價有機基,更佳係3至6價有機基。 The 2- to 10-valent organic group in XA is preferably a 2- to 8-valent organic group. In one embodiment, the 2- to 10-valent organic group is preferably a 2- to 4-valent organic group, more preferably a 2-valent organic group. In another embodiment, the 2- to 10-valent organic group is preferably a 3- to 8-valent organic group, more preferably a 3- to 6-valent organic group.
在一態樣中,XA為單鍵或2價有機基,α為1,β為1。 In one embodiment, XA is a single bond or a divalent organic group, α is 1, and β is 1.
在一態樣中,XA為單鍵或2價有機基,γ為1。 In one embodiment, XA is a single bond or a divalent organic group, and γ is 1.
在一態樣中,XA為3至6價有機基,α為1,β為2至5。 In one embodiment, XA is a 3- to 6-valent organic group, α is 1, and β is 2 to 5.
在一態樣中,XA為3至6價有機基,γ為2至5。 In one embodiment, X A is a 3- to 6-valent organic group, and γ is 2 to 5.
在一態樣中,XA為3價有機基,α為1,β為2。 In one embodiment, XA is a trivalent organic group, α is 1, and β is 2.
在一態樣中,XA為3價有機基,γ為2。 In one embodiment, XA is a trivalent organic group, and γ is 2.
XA為單鍵或2價有機基時,式(1)及(2)為如下述式(1’)及(2’)所示。 When X A is a single bond or a divalent organic group, formulae (1) and (2) are represented by the following formulae (1') and (2').
RF1-XA-RSi (1’) R F1 -X A -R Si (1')
RSi-XA-RF2-XA-RSi (2’) R Si -X A -R F2 -X A -R Si (2')
在一態樣中,XA為單鍵。 In one aspect, XA is a single key.
在另一態樣中,XA為2價有機基。 In another embodiment, XA is a divalent organic group.
在一態樣中,XA係可列舉例如:單鍵、或下述式所示的2價有機基, In one embodiment, XA can be, for example, a single bond, or a divalent organic group represented by the following formula:
-(R51)p5-(X51)q5-〔式中, -(R 51 ) p5 -(X 51 ) q5 -〔wherein,
R51表示單鍵、-(CH2)s5-、或者是鄰伸苯基或間伸苯基或對伸苯基,較佳係-(CH2)s5-; R 51 represents a single bond, -(CH 2 ) s 5 -, or an o-phenyl group, an m-phenyl group, or a p-phenyl group, preferably -(CH 2 ) s 5 -;
s5為1至20之整數,較佳係1至6之整數,更佳係1至3之整數,又更佳係1或2; s5 is an integer from 1 to 20, preferably an integer from 1 to 6, more preferably an integer from 1 to 3, and even more preferably 1 or 2;
X51表示-(X52)l5-; X 51 represents -(X 52 ) l5 -;
X52在每次出現時分別獨立地表示選自由-O-、-S-、鄰伸苯基或間伸苯基或對伸苯基、-C(O)O-、-Si(R53)2-、-(Si(R53)2O)m5-Si(R53)2-、-CONR54-、-O-CONR54-、-NR54-及-(CH2)n5-所成的群中之基; X52, at each occurrence, independently represents a group selected from the group consisting of -O-, -S-, o-phenyl, m-phenyl, or p-phenyl, -C(O)O-, -Si( R53 ) 2- , -(Si( R53 ) 2O ) m5 -Si( R53 ) 2- , -CONR54- , -O- CONR54- , -NR54- , and -( CH2 ) n5- ;
R53在每次出現時分別獨立表示地苯基、C1-6烷基或C1-6烷氧基,較佳係苯基或C1-6烷基,更佳係甲基; R 53 , at each occurrence, independently represents phenyl, C 1-6 alkyl or C 1-6 alkoxy, preferably phenyl or C 1-6 alkyl, more preferably methyl;
R54在每次出現時分別獨立地表示氫原子、苯基或C1-6烷基(較佳係甲基); R 54 , at each occurrence, independently represents a hydrogen atom, a phenyl group, or a C 1-6 alkyl group (preferably a methyl group);
m5在每次出現時分別獨立地為1至100之整數,較佳係1至20之整數; Each time m5 appears, it is independently an integer between 1 and 100, preferably an integer between 1 and 20;
n5在每次出現時分別獨立地為1至20之整數,較佳係1至6之整數,更佳係1至3之整數; n5 is independently an integer from 1 to 20 each time it appears, preferably an integer from 1 to 6, and more preferably an integer from 1 to 3;
l5為1至10之整數,較佳係1至5之整數,更佳係1至3之整數; l5 is an integer from 1 to 10, preferably an integer from 1 to 5, and more preferably an integer from 1 to 3;
p5為0或1; p5 is 0 or 1;
q5為0或1; q5 is 0 or 1;
在此,p5及q5之至少一者為1,標註p5或q5並以括弧括起來之各重複單元的存在順序為任意〕。 Here, at least one of p5 and q5 is 1, and the order of the repeated units marked with p5 or q5 and enclosed in parentheses is arbitrary.
在此,XA(典型上係XA之氫原子)係可經選自氟原子、C1-3烷基及C1-3氟烷基中之1個以上之取代基所取代。在較佳態樣中,XA未經此等基取代。 Here, X A (typically a hydrogen atom of X A ) may be substituted with one or more substituents selected from a fluorine atom, a C 1-3 alkyl group, and a C 1-3 fluoroalkyl group. In a preferred embodiment, X A is not substituted with these substituents.
在較佳態樣中,上述XA分別獨立地為-(R51)p5-(X51)q5-R52-。R52表示單鍵、-(CH2)t5-,或者是鄰伸苯基或間伸苯基或對伸苯基,較佳係-(CH2)t5-。t5為1至20之整數,較佳係2至6之整數,更佳係2至3之整數。在此,R52(典型上係R52之氫原子)可經選自氟原子、C1-3烷基及C1-3氟烷基中之1個以上之取代基所取代。在較佳態樣中,R56未經此等基取代。 In a preferred embodiment, the aforementioned XA are each independently -( R51 ) p5- ( X51 ) q5 - R52- . R52 represents a single bond, -( CH2 ) t5- , or an o-phenyl group, an m-phenyl group, or a p-phenyl group, preferably -( CH2 ) t5- . T5 is an integer from 1 to 20, preferably an integer from 2 to 6, and more preferably an integer from 2 to 3. Here, R52 (typically a hydrogen atom of R52 ) may be substituted with one or more substituents selected from a fluorine atom, a C1-3 alkyl group, and a C1-3 fluoroalkyl group. In a preferred embodiment, R56 is not substituted with such substituents.
較佳係上述XA分別獨立地可為單鍵、C1-20伸烷基、-R51-X53-R52-、或-X54-R5-〔式中,R51及R52係與上述為相同意義, Preferably, the above X A can be independently a single bond, a C 1-20 alkylene group, -R 51 -X 53 -R 52 -, or -X 54 -R 5 - [wherein, R 51 and R 52 have the same meanings as above,
X53表示-O-、-S-、-C(O)O-、 -CONR54-、-O-CONR54-、-Si(R53)2-、-(Si(R53)2O)m5-Si(R53)2-、-O-(CH2)u5-(Si(R53)2O)m5-Si(R53)2-、-O-(CH2)u5-Si(R53)2-O-Si(R53)2-CH2CH2-Si(R53)2-O-Si(R53)2-、-O-(CH2)u5-Si(OCH3)2OSi(OCH3)2-、-CONR54-(CH2)u5-(Si(R53)2O)m5-Si(R53)2-、-CONR54-(CH2)u5-N(R54)-、或-CONR54-(鄰伸苯基、間伸苯基或對伸苯基)-Si(R53)2-(式中,R53、R54及m5係與上述為相同意義, X 53 represents -O-, -S-, -C(O)O-, -CONR 54 -, -O-CONR 54 -, -Si(R 53 ) 2 -, -(Si(R 53 ) 2 O) m5 -Si(R 53 ) 2 -, -O-(CH 2 ) u5 -(Si(R 53 ) 2 O) m5 -Si(R 53 ) 2 -, -O-(CH 2 ) u5 -Si(R 53 ) 2 -O-Si(R 53 ) 2 -CH 2 CH 2 -Si(R 53 ) 2 -O-Si(R 53 ) 2 -, -O-(CH 2 ) u5 -Si(OCH 3 ) 2 OSi(OCH 3 ) 2 -, -CONR 54 -(CH 2 ) u5 -(Si(R 53 ) 2 O) m5 -Si(R 53 ) 2 -, -CONR 54 -(CH 2 ) u5 -N(R 54 )-, or -CONR 54 -(o-phenyl, m-phenyl or p-phenyl)-Si(R 53 ) 2 - (wherein R 53 , R 54 and m5 have the same meanings as above,
u5為1至20之整數,較佳係2至6之整數,更佳係2至3之整數), u5 is an integer from 1 to 20, preferably from 2 to 6, and more preferably from 2 to 3).
X54表示-S-、-C(O)O-、-CONR54-、-O-CONR54-、-CONR54-(CH2)u5-(Si(R54)2O)m5-Si(R54)2-、-CONR54-(CH2)u5-N(R54)-、或-CONR54-(鄰伸苯基、間伸苯基或對伸苯基)-Si(R54)2-(式中,各記號係與上述為相同意義)〕。 X54 represents -S-, -C(O)O-, -CONR54- , -O-CONR54-, -CONR54-( CH2 ) u5- (Si( R54 ) 2O ) m5-Si( R54 ) 2- , -CONR54- ( CH2 ) u5 - N ( R54 )-, or -CONR54- (o-phenyl, m - phenyl or p-phenyl)-Si( R54 ) 2- (wherein each symbol has the same meaning as above)].
更佳係上述XA分別獨立地為 單鍵、C1-20伸烷基、-(CH2)s5-X53-、-(CH2)s5-X53-(CH2)t5--X54-、或-X54-(CH2)t5-〔式中,X53、X54、s5及t5係與上述為相同意義〕。 More preferably, XA is independently a single bond, C1-20 alkylene, -( CH2 ) s5 - X53- , -( CH2 )s5- X53- ( CH2 ) t5 - X54- , or -X54- ( CH2 ) t5- [wherein X53 , X54 , s5 and t5 have the same meanings as above].
更佳係上述XA分別獨立地可為單鍵、C1-20伸烷基、-(CH2)s5-X53-(CH2)t5-、或-X54-(CH2)t5-〔式中,各記號係與上述為相同意義〕。 More preferably, the above-mentioned X A can independently be a single bond, a C 1-20 alkylene group, -(CH 2 ) s 5 -X 53 -(CH 2 ) t 5 -, or -X 54 -(CH 2 ) t 5 - [wherein each symbol has the same meaning as above].
在較佳態樣中,上述XA係分別獨立地可為單鍵C1-20伸烷基、-(CH2)s5-X53-、或-(CH2)s5-X53-(CH2)t5-〔式中, In a preferred embodiment, the above X A can be independently a single bond C 1-20 alkylene group, -(CH 2 ) s5 -X 53 -, or -(CH 2 ) s5 -X 53 -(CH 2 ) t5 - [wherein,
X53為-O-、-CONR54-、或-O-CONR54-, X 53 is -O-, -CONR 54 -, or -O-CONR 54 -,
R54在每次出現時分別獨立地表示氫原子、苯基或C1-6烷基, R 54 , at each occurrence, independently represents a hydrogen atom, a phenyl group or a C 1-6 alkyl group,
s5為1至20之整數, s5 is an integer from 1 to 20.
t5為1至20之整數〕。 t5 is an integer between 1 and 20].
在較佳態樣中,上述XA係分別獨立地可為-(CH2)s5-O-(CH2)t5--CONR54-(CH2)t5-〔式中, In a preferred embodiment, the above XA can be independently -(CH 2 ) s 5 -O-(CH 2 ) t 5 --CONR 54 -(CH 2 ) t 5 - [wherein,
R54在每次出現時分別獨立地表示氫原子、苯基或C1-6烷基, R 54 , at each occurrence, independently represents a hydrogen atom, a phenyl group or a C 1-6 alkyl group,
s5為1至20之整數, s5 is an integer from 1 to 20.
t5為1至20之整數〕。 t5 is an integer between 1 and 20].
在一態樣中,上述XA分別獨立地為單鍵、C1-20伸烷基、-(CH2)s5-O-(CH2)t5-、-(CH2)s5-(Si(R53)2O)m5-Si(R53)2-(CH2)t5-、-(CH2)s5-O-(CH2)u5-(Si(R53)2O)m5-Si(R53)2-(CH2)t5-、或-(CH2)s5-O-(CH2)t5-Si(R53)2-(CH2)u5-Si(R53)2-(CvH2v)-〔式中,R53、m5、s5、t5及u5係與上述為相同意義,v5為1至20之整數,較佳係2至6之整數,更佳係2至3之整數〕。 In one embodiment, XA is independently a single bond, C1-20 alkylene, -( CH2 ) s5 -O-(CH2) t5- , -( CH2 ) s5- (Si( R53 ) 2O ) m5 -Si( R53 ) 2- ( CH2 ) t5- , -( CH2 ) s5 -O-( CH2 ) u5- (Si( R53 ) 2O ) m5 -Si( R53 ) 2- ( CH2 ) t5- , or -( CH2 ) s5 -O-( CH2 ) t5 -Si( R53 ) 2- (CH2) u5 -Si( R53 ) 2- ( CvH2v )- [wherein , R53 , m5, s5, t5 and u5 have the same meanings as above, and v5 is an integer from 1 to 20, preferably an integer from 2 to 6, and more preferably an integer from 2 to 3].
上述式中,-(CvH2v)-可為直鏈,亦可為分支鏈,例如可為-CH2CH2-、-CH2CH2CH2-、-CH(CH3)-、-CH(CH3)CH2-。 In the above formula, -(C v H 2v )- may be a straight chain or a branched chain, for example, -CH 2 CH 2 -, -CH 2 CH 2 CH 2 -, -CH(CH 3 )-, or -CH(CH 3 )CH 2 -.
上述XA分別獨立地可經選自氟原子、C1-3烷基及C1-3氟烷基(較佳係C1-3全氟烷基)中之1個以上之取代基所取代。在一態樣中,XA為未經取代者。 The above X A may be independently substituted with one or more substituents selected from fluorine atoms, C 1-3 alkyl groups and C 1-3 fluoroalkyl groups (preferably C 1-3 perfluoroalkyl groups). In one embodiment, X A is unsubstituted.
又,上述XA係在各式之左側鍵結於RF1或RF2,右側鍵結於RSi。 In addition, the above XA is bonded to RF1 or RF2 on the left side and to RSi on the right side in each formula.
在一態樣中,XA分別獨立地可為-O-C1-6伸烷基以外。 In one embodiment, X A each independently can be other than -OC 1-6 alkylene.
在另一態樣中,XA可列舉例如選自下述者中之基, In another aspect, XA can be, for example, a group selected from the following:
D為選自下列者中之基:-CH2O(CH2)2-、-CH2O(CH2)3-、-CF2O(CH2)3-、-(CH2)2-、-(CH2)3-、-(CH2)4-、-CONH-(CH2)3-、-CON(CH3)-(CH2)3-、-CON(Ph)-(CH2)3-(式中,Ph係指苯基)及 D is a group selected from the group consisting of -CH2O ( CH2 ) 2- , -CH2O( CH2 ) 3- , -CF2O (CH2)3-, -(CH2)2-, -(CH2)3-, -(CH2)4- , -CONH- ( CH2 ) 3- , -CON( CH3 )-( CH2 ) 3- , -CON(Ph)-( CH2 ) 3- (wherein Ph is a phenyl group) and
E為-(CH2)n-(n為2至6之整數), E is -(CH 2 ) n - (n is an integer from 2 to 6),
D係鍵結於分子主鏈之RF1或RF2,E係鍵結於RSi〕。 D is bonded to RF1 or RF2 of the main chain of the molecule, and E is bonded to RSi ].
上述XA之具體例係可列舉例如:單鍵、-CH2OCH2-、 -CH2O(CH2)2-、-CH2O(CH2)3-、-CH2O(CH2)4-、-CH2O(CH2)5-、-CH2O(CH2)6-、-CH2O(CH2)3Si(CH3)2OSi(CH3)2(CH2)2-、-CH2O(CH2)3Si(CH3)2OSi(CH3)2OSi(CH3)2(CH2)2-、-CH2O(CH2)3Si(CH3)2O(Si(CH3)2O)2Si(CH3)2(CH2)2-、-CH2O(CH2)3Si(CH3)2O(Si(CH3)2O)3Si(CH3)2(CH2)2-、-CH2O(CH2)3Si(CH3)2O(Si(CH3)2O)10Si(CH3)2(CH2)2-、-CH2O(CH2)3Si(CH3)2O(Si(CH3)2O)20Si(CH3)2(CH2)2-、-CH2OCF2CHFOCF2-、-CH2OCF2CHFOCF2CF2-、-CH2OCF2CHFOCF2CF2CF2-、-CH2OCH2CF2CF2OCF2-、-CH2OCH2CF2CF2OCF2CF2-、-CH2OCH2CF2CF2OCF2CF2CF2-、-CH2OCH2CF2CF2OCF(CF3)CF2OCF2-、-CH2OCH2CF2CF2OCF(CF3)CF2OCF2CF2-、-CH2OCH2CF2CF2OCF(CF3)CF2OCF2CF2CF2-、-CH2OCH2CHFCF2OCF2-、-CH2OCH2CHFCF2OCF2CF2-、 -CH2OCH2CHFCF2OCF2CF2CF2-、-CH2OCH2CHFCF2OCF(CF3)CF2OCF2-、-CH2OCH2CHFCF2OCF(CF3)CF2OCF2CF2-、-CH2OCH2CHFCF2OCF(CF3)CF2OCF2CF2CF2-、-CH2OCF2CHFOCF2CF2CF2-C(O)NH-CH2-、-CH2OCH2(CH2)7CH2Si(OCH3)2OSi(OCH3)2(CH2)2Si(OCH3)2OSi(OCH3)2(CH2)2-、-CH2OCH2CH2CH2Si(OCH3)2OSi(OCH3)2(CH2)3-、-CH2OCH2CH2CH2Si(OCH2CH3)2OSi(OCH2CH3)2(CH2)3-、-CH2OCH2CH2CH2Si(OCH3)2OSi(OCH3)2(CH2)2-、-CH2OCH2CH2CH2Si(OCH2CH3)2OSi(OCH2CH3)2(CH2)2-、-(CH2)2-Si(CH3)2-(CH2)2-、-CH2-、-(CH2)2-、-(CH2)3-、-(CH2)4-、-(CH2)5-、-(CH2)6-、-CO-、-CONH-、-CONH-CH2-、-CONH-(CH2)2-、-CONH-(CH2)3-、 -CONH-(CH2)4-、-CONH-(CH2)5-、-CONH-(CH2)6-、-CON(CH3)-CH2-、-CON(CH3)-(CH2)2-、-CON(CH3)-(CH2)3-、-CON(CH3)-(CH2)4-、-CON(CH3)-(CH2)5-、-CON(CH3)-(CH2)6-、-CON(Ph)-CH2-(式中,Ph係指苯基)、-CON(Ph)-(CH2)2-(式中,Ph係指苯基)、-CON(Ph)-(CH2)3-(式中,Ph係指苯基)、-CON(Ph)-(CH2)4-(式中,Ph係指苯基)、-CON(Ph)-(CH2)5-(式中,Ph係指苯基)、-CON(Ph)-(CH2)6-(式中,Ph係指苯基)、-CONH-(CH2)2NH(CH2)3-、-CONH-(CH2)6NH(CH2)3-、-CH2O-CONH-(CH2)3-、-CH2O-CONH-(CH2)6-、-S-(CH2)3-、-(CH2)2S(CH2)3-、-CONH-(CH2)3Si(CH3)2OSi(CH3)2(CH2)2-、 -CONH-(CH2)3Si(CH3)2OSi(CH3)2OSi(CH3)2(CH2)2-、-CONH-(CH2)3Si(CH3)2O(Si(CH3)2O)2Si(CH3)2(CH2)2-、-CONH-(CH2)3Si(CH3)2O(Si(CH3)2O)3Si(CH3)2(CH2)2-、-CONH-(CH2)3Si(CH3)2O(Si(CH3)2O)10Si(CH3)2(CH2)2-、-CONH-(CH2)3Si(CH3)2O(Si(CH3)2O)20Si(CH3)2(CH2)2-、-C(O)O-(CH2)3-、-C(O)O-(CH2)6-、-CH2-O-(CH2)3-Si(CH3)2-(CH2)2-Si(CH3)2-(CH2)2-、-CH2-O-(CH2)3-Si(CH3)2-(CH2)2-Si(CH3)2-CH(CH3)-、-CH2-O-(CH2)3-Si(CH3)2-(CH2)2-Si(CH3)2-(CH2)3-、-CH2-O-(CH2)3-Si(CH3)2-(CH2)2-Si(CH3)2-CH(CH3)-CH2-、-OCH2-、-O(CH2)3-、-OCFHCF2-、 Specific examples of the above-mentioned XA include: single bond, -CH2OCH2- , -CH2O(CH2) 2- , -CH2O (CH2) 3- , -CH2O( CH2 )4- , -CH2O ( CH2 ) 5- , -CH2O ( CH2 ) 6- , -CH2O( CH2 ) 3Si ( CH3 )2OSi(CH3) 2 ( CH2 ) 2- , -CH2O( CH2 )3Si ( CH3)2OSi( CH3 ) 2OSi(CH3)2 ( CH2 ) 2- , -CH2O( CH2 ) 3Si ( CH3 ) 2OSi ( CH3 ) 2OSi ( CH3 ) 2 ( CH2 ) 2- , -CH2O ( CH2 ) 3Si ( CH3 ) 2O (Si( CH3 ) 2O ) 2Si ( CH3 ) 2 (CH 2 ) 2 -, -CH 2 O(CH 2 ) 3 Si(CH 3 ) 2 O(Si(CH 3 ) 2 O) 3 Si(CH 3 ) 2 (CH 2 ) 2 -, -CH 2 O(CH 2 ) 3 Si(CH 3 ) 2 O(Si(CH 3 ) 2 O) 10 Si(CH 3 ) 2 (CH 2 ) 2 -, -CH 2 O(CH 2 ) 3 Si(CH 3 ) 2 O(Si(CH 3 ) 2 O) 20 Si(CH 3 ) 2 (CH 2 ) 2 -, -CH 2 OCF 2 CHFOCF 2 -, -CH 2 OCF 2 CHFOCF 2 CF 2 -, -CH 2 OCF 2 CHFOCF 2 CF 2 CF 2 -, -CH 2 OCH 2 CF 2 CF 2 OCF 2 -, -CH 2 OCH 2 CF 2 CF 2 OCF 2 CF 2 -, -CH 2 OCH 2 CF 2 CF 2 OCF 2 CF 2 CF 2 -, -CH 2 OCH 2 CF 2 CF 2 OCF(CF 3 )CF 2 OCF 2 -, -CH 2 OCH 2 CF 2 CF 2 OCF(CF 3 )CF 2 OCF 2 CF 2 -, -CH 2 OCH 2 CF 2 CF 2 OCF(CF 3 )CF 2 OCF 2 CF 2 CF 2 -, -CH 2 OCH 2 CHFCF 2 OCF 2 -, -CH 2 OCH 2 CHFCF 2 OCF 2 CF 2 -, -CH 2 OCH 2 CHFCF 2 OCF 2 CF 2 CF 2 -, -CH 2 OCH 2 CHFCF 2 OCF(CF 3 )CF 2 OCF 2 -, -CH 2 OCH 2 CHFCF 2 OCF(CF 3 )CF 2 OCF 2 CF 2 -, -CH 2 OCH 2 CHFCF 2 OCF(CF 3 )CF 2 OCF 2 CF 2 CF 2 -, -CH 2 OCF 2 CHFOCF 2 CF 2 CF 2 -C(O)NH-CH 2 -, -CH 2 OCH 2 (CH 2 ) 7 CH 2 Si(OCH 3 ) 2 OSi(OCH 3 ) 2 (CH 2 ) 2 Si(OCH 3 ) 2 OSi(OCH 3 ) 2 (CH 2 ) 2 -, -CH 2 OCH 2 CH 2 CH 2 Si(OCH 3 ) 2 OSi(OCH 3 ) 2 (CH 2 ) 3 -, -CH 2 OCH 2 CH 2 CH 2 Si(OCH 2 CH 3 ) 2 OSi(OCH 2 CH 3 ) 2 (CH 2 ) 3 -, -CH 2 OCH 2 CH 2 CH 2 Si(OCH 3 ) 2 OSi(OCH 3 ) 2 (CH 2 ) 2 -, -CH 2 OCH 2 CH 2 CH 2 Si(OCH 2 CH 3 ) 2 OSi(OCH 2 CH 3 ) 2 (CH 2 ) 2 -, -(CH 2 ) 2 -Si(CH 3 ) 2 -(CH 2 ) 2 -, -CH 2 -, -(CH 2 ) 2 -, -(CH 2 ) 3 -, -(CH 2 ) 4 -, -(CH 2 ) 5 -, -(CH 2 ) 6 -, -CO-, -CONH-, -CONH-CH 2 -, -CONH-(CH 2 ) 2 -, -CONH-(CH 2 ) 3 -, -CONH-(CH 2 ) 4 -, -CONH-(CH 2 ) 5 -, -CONH-(CH 2 ) 6 -, -CON(CH 3 )-CH 2 -, -CON(CH 3 )-(CH 2 ) 2 -, -CON(CH 3 )-(CH 2 ) 3 -, -CON(CH 3 )-(CH 2 ) 4 -, -CON(CH 3 )-(CH 2 ) 5 -, -CON(CH 3 )-(CH 2 ) 6 -, -CON(Ph)-CH 2 -(where Ph refers to phenyl), -CON(Ph)-(CH 2 ) 2 -(wherein Ph represents a phenyl group), -CON(Ph)-(CH 2 ) 3 -(wherein Ph represents a phenyl group), -CON(Ph)-(CH 2 ) 4 -(wherein Ph represents a phenyl group), -CON(Ph)-(CH 2 ) 5 -(wherein Ph represents a phenyl group), -CON(Ph)-(CH 2 ) 6 -(wherein Ph represents a phenyl group), -CONH-(CH 2 ) 2 NH(CH 2 ) 3 -, -CONH-(CH 2 ) 6 NH(CH 2 ) 3 -, -CH 2 O-CONH-(CH 2 ) 3 -, -CH 2 O-CONH-(CH 2 ) 6 -, -S-(CH 2 ) 3 -, -(CH 2 ) 2 S(CH 2 ) 3 -, -CONH-(CH 2 ) 3 Si(CH 3 ) 2 OSi(CH 3 ) 2 (CH 2 ) 2 -, -CONH-(CH 2 ) 3 Si(CH 3 ) 2 OSi(CH 3 ) 2 OSi(CH 3 ) 2 (CH 2 ) 2 -, -CONH-(CH 2 ) 3 Si(CH 3 ) 2 O(Si(CH 3 ) 2 O) 2 Si(CH 3 ) 2 (CH 2 ) 2 -, -CONH-(CH 2 ) 3 Si(CH 3 ) 2 O(Si(CH 3 ) 2 O) 3 Si(CH 3 ) 2 (CH 2 ) 2 -, -CONH-(CH 2 ) 3 Si(CH 3 ) 2 O(Si(CH 3 ) 2 O) 10 Si(CH 3 ) 2 (CH 2 ) 2 -, -CONH-(CH 2 ) 3 Si(CH 3 ) 2 O(Si(CH 3 ) 2 O) 20 Si(CH 3 ) 2 (CH 2 ) 2 -, -C(O)O-(CH 2 ) 3 -, -C(O)O-(CH 2 ) 6 -, -CH 2 -O-(CH 2 ) 3 -Si(CH 3 ) 2 -(CH 2 ) 2 -Si(CH 3 ) 2 -(CH 2 ) 2 -, -CH 2 -O-(CH 2 ) 3 -Si(CH 3 ) 2 -(CH 2 ) 2 -Si(CH 3 ) 2 -CH(CH 3 )-, -CH 2 -O-(CH 2 ) 3 -Si(CH 3 ) 2 -(CH 2 ) 2 -Si(CH 3 ) 2 -(CH 2 ) 3 -, -CH 2 -O-(CH 2 ) 3 -Si(CH 3 ) 2 -(CH 2 ) 2 -Si(CH 3 ) 2 -CH(CH 3 )-CH 2 -, -OCH 2 -, -O(CH 2 ) 3 -, -OCFHCF 2 -,
在再另一態樣中,XA分別獨立地為式:-(R16)x1-(CFR17)y1-(CH2)z1-所示的基。式中,x1、y1及z1分別獨立地為0至10之整數,x1、y1及z1之和為1以上,並以括弧括起來之各重複單元的存在順序在式中為任意。 In yet another embodiment, X and A are each independently a group represented by the formula: -(R 16 ) x 1 -(CFR 17 ) y 1 -(CH 2 ) z 1 -, wherein x 1 , y 1 , and z 1 are each independently an integer from 0 to 10, the sum of x 1 , y 1 , and z 1 is 1 or greater, and the order of the repeating units enclosed in parentheses is arbitrary.
上述式中,R16在每次出現時分別獨立地為氧原子、伸苯基、伸咔唑基、-NR18-(式中,R18表示氫原子或有機基)或2價有機基。較佳係R18為氧原子或2價極性基。 In the above formula, R 16 is independently an oxygen atom, a phenylene group, a carbazolyl group, -NR 18 - (wherein R 18 represents a hydrogen atom or an organic group), or a divalent organic group. Preferably, R 18 is an oxygen atom or a divalent polar group.
上述「2價之極性基」並無特別限定,惟可列舉-C(O)-、-C(=NR19)-及-C(O)NR19-(此等式中,R19表示氫原子或低級烷基)。該「低級烷基」係指例如碳數1至6之烷基,例如為甲基、乙基、正丙基,此等可經1個以上之氟原子所取代。 The aforementioned "divalent polar group" is not particularly limited, but examples thereof include -C(O)-, -C(=NR 19 )-, and -C(O)NR 19 - (in this formula, R 19 represents a hydrogen atom or a lower alkyl group). The "lower alkyl group" refers to an alkyl group having 1 to 6 carbon atoms, such as methyl, ethyl, and n-propyl, which may be substituted with one or more fluorine atoms.
在上述式中,R17在每次出現時分別獨立地為氫原子、氟原子或低級氟烷基,較佳係氟原子。該「低級氟烷基」係指例如碳數1至6(較佳係碳數1至3)之氟烷基,較佳係碳數1至3之全氟烷基,更佳係三氟甲基、五氟乙基,又更佳係三氟甲基。 In the above formula, R 17 , at each occurrence, independently represents a hydrogen atom, a fluorine atom, or a lower fluoroalkyl group, preferably a fluorine atom. The "lower fluoroalkyl group" refers to, for example, a fluoroalkyl group having 1 to 6 carbon atoms (preferably 1 to 3 carbon atoms), preferably a perfluoroalkyl group having 1 to 3 carbon atoms, more preferably a trifluoromethyl group, a pentafluoroethyl group, and even more preferably a trifluoromethyl group.
在再另一態樣中,XA之例子可列舉下列基: In yet another aspect, examples of XA include the following groups:
R41分別獨立地為氫原子、苯基、碳數1至6之烷基或C1-6烷氧基,較佳係甲基; R 41 is independently a hydrogen atom, a phenyl group, a C 1-6 alkyl group, or a C 1-6 alkoxy group, preferably a methyl group;
在各XA基中,當T中之任意一些為鍵結於「分子主鏈之RF1或RF2」的下列基且其他T中之一些係鍵結於「分子主鏈之RSi」而存在時,其餘之T係分別獨立地為甲基、苯基、C1-6烷氧基、或自由基清除基、或紫外線吸收基;-CH2O(CH2)2-、-CH2O(CH2)3-、-CF2O(CH2)3-、-(CH2)2-、-(CH2)3-、-(CH2)4-、-CONH-(CH2)3-、-CON(CH3)-(CH2)3-、-CON(Ph)-(CH2)3-(式中,Ph係指苯基)、或 In each XA group, when any of T is the following group bonded to " RF1 or RF2 of the molecular main chain" and some of the other T is bonded to " RSi of the molecular main chain", the remaining T are independently methyl, phenyl, C1-6 alkoxy, or free radical scavenging group, or ultraviolet absorbing group; -CH2O ( CH2 ) 2- , -CH2O ( CH2 ) 3- , -CF2O( CH2 ) 3- , -( CH2 ) 2- , -( CH2 ) 3- , -( CH2 ) 4- , -CONH-( CH2 ) 3- , -CON( CH3 )-( CH2 ) 3- , -CON(Ph ) -( CH2 ) 3- (wherein Ph is phenyl), or
就自由基清除基而言,只要為可清除因光照射而產生的自由基者即可,並無特別限定,可列舉例如:二苯甲酮類、苯并三唑類、苯甲酸酯類、水 楊酸苯酯類、巴豆酸類、丙二酸酯類、有機丙烯酸酯類、受阻胺類、受阻酚類、或三類之殘基。 As for the free radical scavenging group, there is no particular limitation as long as it can scavenge free radicals generated by light irradiation, and examples thereof include benzophenones, benzotriazoles, benzoates, phenyl salicylates, crotonic acids, malonates, organic acrylates, hindered amines, hindered phenols, or tris(III)s. The remnant of the class.
就紫外線吸收基而言,只要為可吸收紫外線者即可,並無特別限定,可列舉例如:苯并三唑類、羥基二苯甲酮類、經取代及經未經取代之苯甲酸或水楊酸化合物之酯類、丙烯酸酯或桂皮酸烷氧基酯類、草醯胺類、草醯苯胺類、苯并酮(Benzoxazinone)類、苯并唑(Benzoxazole)類之殘基。 As for the ultraviolet absorbing group, there is no particular limitation as long as it can absorb ultraviolet rays. Examples thereof include benzotriazoles, hydroxybenzophenones, esters of substituted and unsubstituted benzoic acid or salicylic acid compounds, acrylates or cinnamic acid alkoxy esters, oxalamides, oxalanilides, benzotriazoles, Benzoxazinone, benzo Benzoxazole residue.
在較佳態樣中,較佳的自由基清除基或紫外線吸收基係可列舉如: In a preferred embodiment, preferred free radical scavenging groups or UV absorbing groups can be listed as follows:
在該態樣中,XA分別獨立地可為3至10價有機基。 In this aspect, X and A each independently can be a 3- to 10-valent organic group.
在又另一態樣中,XA之例子可列舉下述基: In yet another aspect, examples of XA include the following groups:
R25鍵結於至少1個RF1,R26及R27分別鍵結於至少1個RSi〕。 R 25 is bonded to at least one R F1 , and R 26 and R 27 are each bonded to at least one R Si ].
在一態樣中,上述R25為單鍵、C1-20伸烷基、C3-20伸環烷基、C5-20伸芳基、-R57-X58-R59-、-X58-R59-、或-R57-X58-。上述R57及R59分別獨立地為單鍵、C1-20伸烷基、C3-20伸環烷基、或C5-20伸芳基。上述X58為-O-、-S-、-CO-、-O-CO-或-COO-。 In one embodiment, R 25 is a single bond, a C 1-20 alkylene group, a C 3-20 cycloalkylene group, a C 5-20 arylene group, -R 57 -X 58 -R 59 -, -X 58 -R 59 -, or -R 57 -X 58 -. R 57 and R 59 are each independently a single bond, a C 1-20 alkylene group, a C 3-20 cycloalkylene group, or a C 5-20 arylene group. X 58 is -O-, -S-, -CO-, -O-CO-, or -COO-.
在一態樣中,上述R26及R27分別獨立地為「烴」或「在烴之末端或主鏈具有選自N、O及S中之至少1個原子之基」,較佳係可列舉C1-6烷基、-R36-R37-R36-、-R36-CHR38 2-等。在此,R36分別獨立地為單鍵或碳數1至6之烷基,較佳係碳數1至6之烷基。R37為N、O或S,較佳係N或O。R38為-R45-R46-R45-、-R46-R45-或-R45-R46-。在此,R45分別獨立地為碳數1至6之烷基。R46為N、O或S,較佳係O。 In one embodiment, R 26 and R 27 are each independently a "hydrocarbon" or a "group having at least one atom selected from N, O, and S at the end or main chain of the hydrocarbon," preferably a C 1-6 alkyl group, -R 36 -R 37 -R 36 -, or -R 36 -CHR 38 2 -. Here, R 36 is each independently a single bond or an alkyl group having 1 to 6 carbon atoms, preferably an alkyl group having 1 to 6 carbon atoms. R 37 is N, O, or S, preferably N or O. R 38 is -R 45 -R 46 -R 45 -, -R 46 -R 45 -, or -R 45 -R 46 -. Here, R 45 is each independently a alkyl group having 1 to 6 carbon atoms. R46 is N, O or S, preferably O.
在該態樣中,XA分別獨立地可為3至10價有機基。 In this aspect, X and A each independently can be a 3- to 10-valent organic group.
在又另一態樣中,XA之例可列舉如下述式所示的基, In yet another aspect, examples of XA include groups represented by the following formula:
上述Xa係直接鍵結於異三氰酸環之單鍵或二價連結基。Xa較佳係單鍵、伸烷基、或包含「選自由醚鍵、酯鍵、醯胺鍵及硫醚鍵所成的群中之至少1種鍵」之二價基,更佳係單鍵、碳數1至10之伸烷基、或包含「選自由醚鍵、酯鍵、醯胺鍵及硫醚鍵所成的群中之至少1種鍵」之碳數1至10的二價烴基。 The aforementioned Xa represents a single bond or a divalent linking group directly bonded to the isotricyanoic acid ring. Xa is preferably a single bond, an alkylene group, or a divalent group containing at least one bond selected from the group consisting of an ether bond, an ester bond, an amide bond, and a thioether bond. More preferably, it is a single bond, an alkylene group having 1 to 10 carbon atoms, or a divalent hydrocarbon group having 1 to 10 carbon atoms containing at least one bond selected from the group consisting of an ether bond, an ester bond, an amide bond, and a thioether bond.
Xa更佳係下述式所示的基, More preferably, Xa is a group represented by the following formula:
-(CX121X122)x1-(Xa1)y1-(CX123X124)z1-(式中,X121至X124分別獨立地為H、F、OH、或、-OSi(OR121)3(式中,3個R121分別獨立地為碳數1至4之烷基), -(CX 121 X 122 ) x1 -(X a1 ) y1 -(CX 123 X 124 ) z1 -(wherein, X 121 to X 124 are independently H, F, OH, or -OSi(OR 121 ) 3 (wherein, three R 121 are independently alkyl having 1 to 4 carbon atoms),
上述Xa1為-C(=O)NH-、-NHC(=O)-、-O-、-C(=O)O-、-OC(=O)-、-OC(=O)O-、或、-NHC(=O)NH-(各鍵結之左側鍵結於CX121X122), The above-mentioned X a1 is -C(=O)NH-, -NHC(=O)-, -O-, -C(=O)O-, -OC(=O)-, -OC(=O)O-, or -NHC(=O)NH- (the left side of each bond is bonded to CX 121 X 122 ),
x1為0至10之整數,y1為0或1,z1為1至10之整數)。 x1 is an integer between 0 and 10, y1 is 0 or 1, and z1 is an integer between 1 and 10).
上述Xa1係以-O-或-C(=O)O-為佳。 The above-mentioned X a1 is preferably -O- or -C(=O)O-.
上述Xa特佳係下述各式所示的基: The above-mentioned Xa is particularly preferably a group represented by the following formula:
-(CF2)m11-(CH2)m12-O-(CH2)m13-(式中,m11為1至3之整數,m12為1至3之整數,m13為1至3之整數); -(CF 2 ) m11 -(CH 2 ) m12 -O-(CH 2 ) m13 -(wherein, m11 is an integer from 1 to 3, m12 is an integer from 1 to 3, and m13 is an integer from 1 to 3);
-(CF2)m14-(CH2)m15-O-CH2CH(OH)-(CH2)m16-(式中,m14為1至3之整數,m15為1至3之整數,m16為1至3之整數); -(CF 2 ) m14 -(CH 2 ) m15 -O-CH 2 CH(OH)-(CH 2 ) m16 -(wherein, m14 is an integer from 1 to 3, m15 is an integer from 1 to 3, and m16 is an integer from 1 to 3);
-(CF2)m17-(CH2)m18-(式中,m17為1至3之整數,m18為1至3之整數); -(CF 2 ) m17 -(CH 2 ) m18 -(wherein, m17 is an integer from 1 to 3, and m18 is an integer from 1 to 3);
-(CF2)m19-(CH2)m20-O-CH2CH(OSi(OCH3)3)-(CH2)m21-(式中,m19為1至3之整數,m20為1至3之整數,m21為1至3之整數);或, -(CF 2 ) m19 -(CH 2 ) m20 -O-CH 2 CH(OSi(OCH 3 ) 3 )-(CH 2 ) m21 -(wherein, m19 is an integer from 1 to 3, m20 is an integer from 1 to 3, and m21 is an integer from 1 to 3); or,
-(CH2)m22-(式中,m22為1至3之整數)。 -(CH 2 ) m22 - (wherein m22 is an integer from 1 to 3).
上述Xa並無特別限定,具體上係可列舉如:-CH2-、-C2H4-、-C3H6-、-C4H8-、-C4H8-O-CH2-、-CO-O-CH2-CH(OH)-CH2-、-(CF2)n5-(n5為0至4之整數)、-(CF2)n5-(CH2)m5-(n5及m5分別獨立地為0至4之整數)、-CF2CF2CH2OCH2CH(OH)CH2-、-CF2CF2CH2OCH2CH(OSi(OCH3)3)CH2-等。 The aforementioned Xa is not particularly limited. Specific examples include: -CH2- , -C2H4- , -C3H6- , -C4H8-, -C4H8- O - CH2- , -CO - O - CH2 -CH(OH) -CH2- , -( CF2 ) n5- (n5 is an integer from 0 to 4), -( CF2 ) n5- ( CH2 ) m5- ( n5 and m5 are independently an integer from 0 to 4), -CF2CF2CH2OCH2CH ( OH) CH2- , -CF2CF2CH2OCH2CH (OSi( OCH3 ) 3 ) CH2- , and the like .
在該態樣中,XA分別獨立地可為2或3價有機基。 In this aspect, XA can each independently be a divalent or trivalent organic group.
上述式(1)或式(2)所示的含有氟聚醚基的矽烷化合物並無特別限定,可具有5×102至1×105之平均分子量。在如此之範圍中,從耐磨損性之觀點而言,較佳係具有2,000至32,000之平均分子量,更佳係具有2,500至12,000之平均分子量。又,該「平均分子量」係指數平均分子量,「平均分子量」係設為由19F-NMR所測定的值。 The fluoropolyether group-containing silane compound represented by formula (1) or formula (2) is not particularly limited and may have an average molecular weight of 5×10 2 to 1×10 5 . Within this range, from the perspective of wear resistance, an average molecular weight of 2,000 to 32,000 is preferred, and an average molecular weight of 2,500 to 12,000 is more preferred. The "average molecular weight" refers to the number average molecular weight, and the "average molecular weight" is the value measured by 19 F-NMR.
在一態樣中,本揭示之表面處理劑中,含有氟聚醚基的矽烷化合物係式(1)所示的化合物。 In one embodiment, in the surface treatment agent disclosed herein, the silane compound containing a fluoropolyether group is a compound represented by formula (1).
在另一態樣中,本揭示之表面處理劑中,含有氟聚醚基的矽烷化合物係式(2)所示的化合物。 In another embodiment, in the surface treatment agent disclosed herein, the silane compound containing a fluoropolyether group is a compound represented by formula (2).
在另一態樣中,本揭示之表面處理劑中,含有氟聚醚基的矽烷化合物係式(1)所示的化合物及式(2)所示的化合物。 In another embodiment, in the surface treatment agent disclosed herein, the silane compound containing a fluoropolyether group is a compound represented by formula (1) and a compound represented by formula (2).
本揭示之表面處理劑中,相對於式(1)所示的化合物與式(2)所示的化合物之合計,式(2)所示的化合物較佳係0.1莫耳%以上35莫耳%以下。相對於式(1)所示的化合物與式(2)所示的化合物之合計,式(2)所示的化合物的含量之下限較佳係可為0.1莫耳%,更佳係可為0.2莫耳%,又更佳係可為0.5莫耳%,再更佳係可為1莫耳%,特佳係可為2莫耳%,尤其可為5莫耳%。相對於式(1)所示的化合物與式(2)所示的化合物之合計,式(2)所示的化合物的含量之上限較佳係可為35莫耳%,更佳係可為30莫耳%,又更佳係可為20莫耳%,再更佳係可為15莫耳%或10莫耳%。相對於式(1)所示的化合物與式(2)所示的化合物之合計,式(2)所示的化合物較佳係0.1莫耳%以上30莫耳%以下,更佳係0.1莫耳%以上20莫耳%以下,又更佳係0.2莫耳%以上10莫耳%以下,再更佳係0.5莫耳%以上10莫耳%以下,特佳係1莫耳%以上10莫耳%以下,例如為2莫耳% 以上10莫耳%以下或5莫耳%以上10莫耳%以下。藉由將式(2)所示的化合物設為如此之範圍,可更提高耐磨損性。 In the surface treatment agent disclosed herein, the compound represented by formula (2) is preferably present in an amount of 0.1 mol% to 35 mol% relative to the total of the compound represented by formula (1) and the compound represented by formula (2). The lower limit of the content of the compound represented by formula (2) relative to the total of the compound represented by formula (1) and the compound represented by formula (2) is preferably 0.1 mol%, more preferably 0.2 mol%, even more preferably 0.5 mol%, even more preferably 1 mol%, particularly preferably 2 mol%, and especially preferably 5 mol%. The upper limit of the content of the compound represented by formula (2) relative to the total of the compound represented by formula (1) and the compound represented by formula (2) is preferably 35 mol%, more preferably 30 mol%, even more preferably 20 mol%, and even more preferably 15 mol% or 10 mol%. The compound represented by formula (2) is preferably present in an amount of 0.1 mol% to 30 mol% relative to the total of the compound represented by formula (1) and the compound represented by formula (2), more preferably 0.1 mol% to 20 mol% or less, even more preferably 0.2 mol% to 10 mol% or less, still more preferably 0.5 mol% to 10 mol% or less, and particularly preferably 1 mol% to 10 mol% or less, for example, 2 mol% to 10 mol% or 5 mol% to 10 mol% or less. By setting the compound represented by formula (2) within this range, wear resistance can be further improved.
在一態樣中,本揭示之表面處理劑包含「2種以上之式(1)或(2)所示的含有氟聚醚基的矽烷化合物」。藉由包含複數種含有氟聚醚基的矽烷化合物,可更提高耐摩擦性。 In one embodiment, the surface treatment agent disclosed herein comprises "two or more silane compounds containing a fluoropolyether group represented by formula (1) or (2)". By including a plurality of silane compounds containing a fluoropolyether group, abrasion resistance can be further improved.
在一態樣中,本揭示之表面處理劑包含「2種以上之式(1)或(2)所示的含有氟聚醚基的矽烷化合物,其中,RSi為選自式(S1)、(S2)、(S3)、(S4)及(S5)中之基且為相異之基者」。藉由包含具有相異的RSi之含有氟聚醚基的矽烷化合物,可更提高耐摩擦性。 In one embodiment, the surface treatment agent disclosed herein comprises "two or more fluoropolyether group-containing silane compounds represented by formula (1) or (2), wherein R Si is a group selected from formulas (S1), (S2), (S3), (S4), and (S5), and is different from each other." By including fluoropolyether group-containing silane compounds having different R Si , abrasion resistance can be further improved.
在一態樣中,本揭示之表面處理劑包含「式(1)或(2)所示的含有氟聚醚基的矽烷化合物,其中,RSi為式(S1)所示的基者」及「式(1)或(2)所示的含有氟聚醚基的矽烷化合物,其中,RSi為選自式(S3)、(S4)及(S5)中之基者」。藉由併用「式(1)或(2)所示的含有氟聚醚基的矽烷化合物,其中,RSi為式(S1)所示的基者」及「式(1)或(2)所示的含有氟聚醚基的矽烷化合物,其中,RSi為選自式(S3)、(S4)及(S5)中之基者」,可更提高耐摩擦性。 In one embodiment, the surface treatment agent disclosed herein comprises a silane compound containing a fluoropolyether group represented by formula (1) or (2), wherein R Si is a group represented by formula (S1) and a silane compound containing a fluoropolyether group represented by formula (1) or (2), wherein R Si is a group selected from formulas (S3), (S4), and (S5). By using the silane compound containing a fluoropolyether group represented by formula (1) or (2), wherein R Si is a group represented by formula (S1) and the silane compound containing a fluoropolyether group represented by formula (1) or (2), wherein R Si is a group selected from formulas (S3), (S4), and (S5), the friction resistance can be further improved.
在一態樣中,本揭示之表面處理劑包含「式(1)或(2)所示的含有氟聚醚基的矽烷化合物,其中,RSi為式(S1)所示的基者」及「式(1)或(2)所示的含有氟聚醚基的矽烷化合物,其中,RSi為選自式(S3)及(S4)中之基者」。藉由併用「式(1)或(2)所示的含有氟聚醚基的矽烷化合物,其中,RSi為式(S1)所示的基者」及「式(1)或(2)所示的含有氟聚醚基的矽烷化合物,其中,RSi為選自式(S3)及(S4)中之基者」,可更提高耐摩擦性。 In one embodiment, the surface treatment agent disclosed herein comprises a silane compound containing a fluoropolyether group represented by formula (1) or (2), wherein R Si is a group represented by formula (S1) and a silane compound containing a fluoropolyether group represented by formula (1) or (2), wherein R Si is a group selected from formulas (S3) and (S4). By using the silane compound containing a fluoropolyether group represented by formula (1) or (2), wherein R Si is a group represented by formula (S1) and the silane compound containing a fluoropolyether group represented by formula (1) or (2), wherein R Si is a group selected from formulas (S3) and (S4), the friction resistance can be further improved.
在一態樣中,本揭示之表面處理劑包含「式(1)或(2)所示的含有氟聚醚基的矽烷化合物,其中,RSi為式(S1)所示的基者」及「式(1)或(2)所示的含有氟聚醚基的矽烷化合物,其中,RSi為式(S3)所示的基者」。藉由併用「式(1)或(2)所示的含有氟聚醚基的矽烷化合物,其中,RSi為式(S1)所示的基者」及「式(1)或(2)所示的含有氟聚醚基的矽烷化合物,其中,RSi為式(S3)所示的基者」,可更提高耐摩擦性。 In one embodiment, the surface treatment agent disclosed herein comprises a silane compound containing a fluoropolyether group represented by formula (1) or (2), wherein R Si is a group represented by formula (S1) and a silane compound containing a fluoropolyether group represented by formula (1) or (2), wherein R Si is a group represented by formula (S3). By using the silane compound containing a fluoropolyether group represented by formula (1) or (2), wherein R Si is a group represented by formula (S1) and the silane compound containing a fluoropolyether group represented by formula (1) or (2), wherein R Si is a group represented by formula (S3), the friction resistance can be further improved.
在一態樣中,本揭示之表面處理劑包含「式(1)或(2)所示的含有氟聚醚基的矽烷化合物,其中,RSi為式(S1)所示的基者」及「式(1)或(2)所示的含有氟聚醚基的矽烷化合物,其中,RSi為式(S4)所示的基者」。藉由併用「式(1)或(2)所示的含有氟聚醚基的矽烷化合物,其中,RSi為式(S1)所示的基者」及「式(1)或(2)所示的含有氟聚醚基的矽烷化合物,其中,RSi為式(S4)所示的基者」,可更提高耐摩擦性。 In one embodiment, the surface treatment agent disclosed herein comprises a silane compound containing a fluoropolyether group represented by formula (1) or (2), wherein R Si is a group represented by formula (S1) and a silane compound containing a fluoropolyether group represented by formula (1) or (2), wherein R Si is a group represented by formula (S4). By using the silane compound containing a fluoropolyether group represented by formula (1) or (2), wherein R Si is a group represented by formula (S1) and the silane compound containing a fluoropolyether group represented by formula (1) or (2), wherein R Si is a group represented by formula (S4), the friction resistance can be further improved.
上述式(1)或(2)所示的化合物係可藉由其本身即為公知之方法,例如國際公開第97/07155號、日本特表2008-534696號、日本特開2014-218639號、日本特開2017-82194號等記載之方法而得到。 The compound represented by the above formula (1) or (2) can be obtained by a method known per se, for example, the method described in International Publication No. 97/07155, Japanese Unexamined Patent Application No. 2008-534696, Japanese Unexamined Patent Application No. 2014-218639, and Japanese Unexamined Patent Application No. 2017-82194.
相對於表面處理劑整體,上述式(1)或(2)所示的化合物含量較佳係可為0.01至50.0質量%,更佳係可為0.1至30.0質量%,又更佳係可為1.0至25.0質量%,特佳係可為5.0至20.0質量%。藉由將上述含有氟聚醚基的矽烷化合物之含量設為上述範圍,可得到更高的撥水撥油性。 The content of the compound represented by formula (1) or (2) relative to the entire surface treatment agent is preferably 0.01 to 50.0 mass%, more preferably 0.1 to 30.0 mass%, even more preferably 1.0 to 25.0 mass%, and particularly preferably 5.0 to 20.0 mass%. By setting the content of the silane compound containing a fluoropolyether group within the above range, higher water- and oil-repellency can be obtained.
(低級氟烷基醇) (lower fluoroalkyl alcohol)
上述低級氟烷基醇係可提高由本揭示之表面處理劑所形成的表面處理層之耐磨損性的化合物。 The aforementioned lower fluoroalkyl alcohol is a compound that can improve the wear resistance of the surface treatment layer formed by the surface treatment agent disclosed herein.
上述低級氟烷基醇較佳係具有15.0以下之pKa,更佳係具有13.0以下之pKa,又更佳係具有12.5以下之pKa。藉由具有如此之pKa,可形成耐摩擦性更優異之表面處理層。 The lower fluoroalkyl alcohol preferably has a pKa of 15.0 or less, more preferably 13.0 or less, and even more preferably 12.5 or less. Such a pKa allows for the formation of a surface treatment layer with superior abrasion resistance.
上述低級氟烷基醇較佳係具有5.0以上之pKa,更佳係具有7.0以上之pKa,又更佳係具有8.0以上之pKa,再更佳係具有9.0以上之pKa。藉由具有如此之pKa,表面處理劑之保存安定性會提高。 The lower fluoroalkyl alcohol preferably has a pKa of 5.0 or greater, more preferably 7.0 or greater, even more preferably 8.0 or greater, and even more preferably 9.0 or greater. Such a pKa improves the storage stability of the surface treatment agent.
上述低級氟烷基醇較佳係具有5.0至15.0之pKa,更佳係具有7.0至13.0之pKa,又更佳係具有9.0至13.0之pKa。藉由具有如此之pKa,可形成耐摩擦性更優異的表面處理層,且表面處理劑之保存安定性會提高。 The lower fluoroalkyl alcohol preferably has a pKa of 5.0 to 15.0, more preferably 7.0 to 13.0, and even more preferably 9.0 to 13.0. Having such a pKa allows for the formation of a surface treatment layer with superior abrasion resistance, and also enhances the storage stability of the surface treatment agent.
上述低級氟烷基醇較佳係一元醇。 The above-mentioned lower fluoroalkyl alcohol is preferably a monohydric alcohol.
上述低級氟烷基醇較佳係下述式所示的氟烷基醇, The above-mentioned lower fluoroalkyl alcohol is preferably a fluoroalkyl alcohol represented by the following formula:
CRf4 n4H3-n4-OH〔式中, CRf 4 n4 H 3-n4 -OH〔wherein,
Rf4為碳數1至3之全氟烷基, Rf 4 is a perfluoroalkyl group having 1 to 3 carbon atoms,
n4為1至3之整數〕。 n4 is an integer from 1 to 3].
在較佳態樣中,上述低級氟烷基醇係碳數1至6,較佳係2至6,更佳係2至4,特佳係3之氟烷基醇。 In a preferred embodiment, the lower fluoroalkyl alcohol is a fluoroalkyl alcohol having 1 to 6 carbon atoms, more preferably 2 to 6 carbon atoms, more preferably 2 to 4 carbon atoms, and particularly preferably 3 carbon atoms.
在較佳態樣中,上述低級氟烷基醇係下述式所示的氟烷基醇, In a preferred embodiment, the lower fluoroalkyl alcohol is a fluoroalkyl alcohol represented by the following formula:
CRf4 n4H3-n4-OH〔式中, CRf 4 n4 H 3-n4 -OH〔wherein,
Rf4為碳數1至3之全氟烷基, Rf 4 is a perfluoroalkyl group having 1 to 3 carbon atoms,
n4為1至3之整數; n4 is an integer from 1 to 3;
碳數之合計為2至6,較佳係2至4,更佳係3〕。 The total number of carbon atoms is 2 to 6, preferably 2 to 4, and more preferably 3].
在特佳的態樣中,上述低級氟烷基醇為六氟丙醇、或六氟異丙醇。 In a particularly preferred embodiment, the lower fluoroalkyl alcohol is hexafluoropropanol or hexafluoroisopropanol.
相對於上述含有氟聚醚基的矽烷化合物100質量份,低級氟烷基醇之含量可為30質量份以下,較佳係可為25質量份以下,更佳係可為20質量份以下,例如可為15質量份以下或10質量份以下。又,相對於上述含有氟聚醚基的矽烷化合物100質量份,低級氟烷基醇之含量較佳係可為0.01質量份以上,更佳係可為0.1質量份以上,又更佳係可為1.0質量份以上,再更佳係可為3.0質量份以上,特佳係可為10質量份以上。本揭示之表面處理劑係藉由含有如此量之低級氟烷基醇,可形成耐摩擦性更高的表面處理層。 The content of the lower fluoroalkyl alcohol per 100 parts by mass of the fluoropolyether group-containing silane compound can be 30 parts by mass or less, preferably 25 parts by mass or less, more preferably 20 parts by mass or less, for example, 15 parts by mass or less or 10 parts by mass or less. Furthermore, the content of the lower fluoroalkyl alcohol per 100 parts by mass of the fluoropolyether group-containing silane compound can be preferably 0.01 parts by mass or more, more preferably 0.1 parts by mass or more, even more preferably 1.0 parts by mass or more, even more preferably 3.0 parts by mass or more, and particularly preferably 10 parts by mass or more. The surface treatment agent disclosed herein, by containing such an amount of the lower fluoroalkyl alcohol, can form a surface treatment layer with enhanced abrasion resistance.
在較佳態樣中,相對於上述含有氟聚醚基的矽烷化合物100質量份,低級氟烷基醇之含量可為0.01至30質量份,較佳可為0.1至20質量份,更佳可為3.0至20質量份,又更佳可為10至20質量份。 In a preferred embodiment, the content of the lower fluoroalkyl alcohol can be 0.01 to 30 parts by mass, more preferably 0.1 to 20 parts by mass, more preferably 3.0 to 20 parts by mass, and even more preferably 10 to 20 parts by mass, relative to 100 parts by mass of the silane compound containing a fluoropolyether group.
相對於表面處理劑整體,上述低級氟烷基醇之含量為0.5至10.0質量%。本揭示之表面處理劑係因依上述含量包含上述醯胺化合物,而可形成具有高的耐磨損性之表面處理層。 The content of the lower fluoroalkyl alcohol is 0.5 to 10.0% by mass relative to the entire surface treatment agent. The surface treatment agent disclosed herein comprises the amide compound in the above-mentioned content, thereby forming a surface treatment layer having high wear resistance.
本揭示之表面處理劑係因含有上述含有氟聚醚基的矽烷化合物,而可對表面處理層賦予撥水撥油性,並因含有上述低級氟烷基醇,而可對表面處理層賦予高的耐磨損性。 The surface treatment agent disclosed herein can impart water- and oil-repellency to the surface treatment layer due to the presence of the aforementioned silane compound containing a fluoropolyether group, and can impart high abrasion resistance to the surface treatment layer due to the presence of the aforementioned lower fluoroalkyl alcohol.
本揭示之表面處理劑係可包含:溶劑、可被理解為含氟油之(非反應性之)氟聚醚化合物,較佳係全氟(聚)醚化合物(以下統稱為「含氟油」)、可被理解為聚矽氧油之(非反應性之)聚矽氧化合物(以下稱為「聚矽氧油」)、醇類、相容劑、觸媒、界面活性劑、聚合抑制劑、敏化劑等。 The surface treatment agent disclosed herein may include: a solvent, a (non-reactive) fluoropolyether compound which can be understood as a fluorinated oil, preferably a perfluoro(poly)ether compound (hereinafter collectively referred to as "fluorinated oil"), a (non-reactive) polysilicone compound which can be understood as a polysilicone oil (hereinafter referred to as "polysilicone oil"), an alcohol, a compatibilizer, a catalyst, a surfactant, a polymerization inhibitor, a sensitizer, etc.
上述溶劑可列舉例如:己烷、環己烷、庚烷、辛烷、壬烷、癸烷、十一烷、十二烷、礦油精等脂肪族烴類;苯、甲苯、二甲苯、萘、溶劑油等芳香族烴類;乙酸甲酯、乙酸乙酯、乙酸丙酯、乙酸正丁酯、乙酸異丙酯、乙酸異丁酯、乙酸溶纖劑、丙二醇甲基醚乙酸酯、乙酸卡必醇、草酸二乙酯、丙酮酸乙酯、2-羥基丁酸乙酯、乙醯乙酸乙酯、乙酸戊酯、乳酸甲酯、乳酸乙酯、3-甲氧基丙酸甲酯、3-甲氧基丙酸乙酯、2-羥基異丁酸甲酯、2-羥基丁酪酸乙酯等酯類;丙酮、甲基乙基酮、甲基異丁基酮、2-己酮、環己酮、甲基胺基酮、2-庚酮等酮類;乙基溶纖劑、甲基溶纖劑、甲基溶纖劑乙酸酯、乙基溶纖劑乙酸酯、丙二醇單甲基醚、丙二醇單乙基醚、丙二醇單丁基醚、丙二醇單甲基醚乙酸酯、丙二醇單乙基醚乙酸酯、丙二醇單丁基醚乙酸酯、二丙二醇二甲基醚、乙二醇單烷基醚等甘醇醚類;甲醇、乙醇、異丙醇、正丁醇、異丁醇、第三丁醇、第二丁醇、3-戊醇、辛醇、3-甲基-3-甲氧基丁醇、第三戊醇等醇類;乙二醇、丙二醇等甘醇類;四氫呋喃、四氫哌喃、二烷等環狀醚類;N,N-二甲基甲醯胺、N,N-二甲基乙醯胺等醯胺類;甲基溶纖劑、溶纖劑、異丙基溶纖劑、丁基溶纖劑、二乙二醇單甲基醚等醚醇類;二乙二醇單乙基醚乙酸酯;1,1,2-三氯-1,2,2-三氟乙烷、1,2-二氯-1,1,2,2-四氟乙烷、二甲基亞碸、1,1-二氯-1,2,2,3,3-五氟丙烷(HCFC225)、ZEORORAH、HFE7100、HFE7200、HFE7300等含氟溶劑等。或者可列舉此等之2種以上的混合溶劑等。 Examples of the above-mentioned solvents include: aliphatic hydrocarbons such as hexane, cyclohexane, heptane, octane, nonane, decane, undecane, dodecane, and mineral spirits; aromatic hydrocarbons such as benzene, toluene, xylene, naphthalene, and solvent oil; esters such as methyl acetate, ethyl acetate, propyl acetate, n-butyl acetate, isopropyl acetate, isobutyl acetate, acetic acid solvent, propylene glycol methyl ether acetate, carbitol acetate, diethyl oxalate, ethyl pyruvate, ethyl 2-hydroxybutyrate, ethyl acetylacetate, amyl acetate, methyl lactate, ethyl lactate, methyl 3-methoxypropionate, ethyl 3-methoxypropionate, methyl 2-hydroxyisobutyrate, and ethyl 2-hydroxybutyrate; and esters such as acetone, methyl ethyl ketone, Ketones such as methyl isobutyl ketone, 2-hexanone, cyclohexanone, methylaminoketone, and 2-heptanone; glycol ethers such as ethyl solvent, methyl solvent, methyl solvent acetate, ethyl solvent acetate, propylene glycol monomethyl ether, propylene glycol monoethyl ether, propylene glycol monobutyl ether, propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate, propylene glycol monobutyl ether acetate, dipropylene glycol dimethyl ether, and ethylene glycol monoalkyl ether; alcohols such as methanol, ethanol, isopropyl alcohol, n-butanol, isobutanol, tert-butanol, sec-butanol, 3-pentanol, octanol, 3-methyl-3-methoxybutanol, and tert-pentanol; glycols such as ethylene glycol and propylene glycol; tetrahydrofuran, tetrahydropyran, dihydropyran, Cyclic ethers such as alkanes; amides such as N,N-dimethylformamide and N,N-dimethylacetamide; ether alcohols such as methyl solvent, solvent, isopropyl solvent, butyl solvent, and diethylene glycol monomethyl ether; diethylene glycol monoethyl ether acetate; fluorinated solvents such as 1,1,2-trichloro-1,2,2-trifluoroethane, 1,2-dichloro-1,1,2,2-tetrafluoroethane, dimethyl sulfoxide, 1,1-dichloro-1,2,2,3,3-pentafluoropropane (HCFC225), ZEORORAH, HFE7100, HFE7200, and HFE7300. Alternatively, a mixture of two or more of these solvents may be used.
就含氟油而言,並無特別限定,可列舉例如下述通式(3)所示的化合物(全氟(聚)醚化合物), There is no particular limitation on fluorine-containing oils, and examples thereof include compounds represented by the following general formula (3) (perfluoro(poly)ether compounds),
Rf5-(OC4F8)a’-(OC3F6)b’-(OC2F4)c’-(OCF2)d’-Rf6‧‧‧(3) Rf 5 -(OC 4 F 8 ) a' -(OC 3 F 6 ) b' -(OC 2 F 4 ) c' -(OCF 2 ) d' -Rf 6 ‧‧‧(3)
式中,Rf5表示可經1個以上之氟原子取代的碳數1至16之烷基(較佳係C1-16之全氟烷基),Rf6表示可經1個以上之氟原子取代的碳數1至16之烷基(較佳係C1-16全氟烷基)、氟原子或氫原子,Rf5及Rf6更佳係分別獨立地為C1-3全氟烷基。 In the formula, Rf5 represents an alkyl group having 1 to 16 carbon atoms (preferably a C1-16 perfluoroalkyl group) which may be substituted by one or more fluorine atoms, and Rf6 represents an alkyl group having 1 to 16 carbon atoms (preferably a C1-16 perfluoroalkyl group) which may be substituted by one or more fluorine atoms, a fluorine atom, or a hydrogen atom. Rf5 and Rf6 are more preferably each independently a C1-3 perfluoroalkyl group.
a’、b’、c’及d’分別表示構成聚合物之主骨架的全氟(聚)醚之4種重複單元數,互相獨立地為0以上300以下之整數,且a’、b’、c’及d’之和至少為1,較佳係1至300,更佳係20至300。標註下標a’、b’、c’或d’並以括弧括起來之各重複單元的存在順序在式中為任意。在此等重複單元之中,-(OC4F8)-可為-(OCF2CF2CF2CF2)-、-(OCF(CF3)CF2CF2)-、-(OCF2CF(CF3)CF2)-、-(OCF2CF2CF(CF3))-、-(OC(CF3)2CF2)-、-(OCF2C(CF3)2)-、-(OCF(CF3)CF(CF3))-、-(OCF(C2F5)CF2)-及(OCF2CF(C2F5))-之任一者,惟較佳係-(OCF2CF2CF2CF2)-。-(OC3F6)-可為-(OCF2CF2CF2)-、-(OCF(CF3)CF2)-及(OCF2CF(CF3))-之任一者,較佳係-(OCF2CF2CF2)-。-(OC2F4)-可為-(OCF2CF2)-及(OCF(CF3))-之任一者,惟較佳係-(OCF2CF2)-。 a', b', c', and d' each represent the number of four repeating units of the perfluoro(poly)ether constituting the main backbone of the polymer, and are independently integers from 0 to 300. The sum of a', b', c', and d' is at least 1, preferably from 1 to 300, and more preferably from 20 to 300. The order of the repeating units enclosed in parentheses and denoted by the subscripts a', b', c', or d' in the formula is arbitrary. In these repeating units, -(OC4F8)- can be any of -(OCF2CF2CF2CF2CF2)-, -(OCF(CF3)CF2CF2)-, -(OCF2CF(CF3)CF2 ) - , - ( OCF2CF2CF ( CF3))-, -(OC(CF3)2CF2 ) - , - ( OCF2C ( CF3 ) 2 ) - , -(OCF( CF3 )CF( CF3 ))-, -(OCF( C2F5 ) CF2 )-, and ( OCF2CF ( C2F5 ))-, but preferably - ( OCF2CF2CF2CF2CF2 )- . -(OC 3 F 6 )- can be any of -(OCF 2 CF 2 CF 2 )-, -(OCF(CF 3 )CF 2 )-, and (OCF 2 CF(CF 3 ))-, and is preferably -(OCF 2 CF 2 CF 2 )-. -(OC 2 F 4 )- can be any of -(OCF 2 CF 2 )- and (OCF(CF 3 ))-, and is preferably -(OCF 2 CF 2 )-.
就上述通式(3)所示的全氟(聚)醚化合物之例而言,可列舉以下之通式(3a)及(3b)之任一者所示的化合物(可為1種或2種以上之混合物)。 As examples of the perfluoro(poly)ether compound represented by the general formula (3), there can be cited compounds represented by either of the following general formulas (3a) and (3b) (which may be a mixture of one or more).
Rf5-(OCF2CF2CF2)b”-Rf6‧‧‧(3a) Rf 5 -(OCF 2 CF 2 CF 2 ) b” -Rf 6 ‧‧‧(3a)
Rf5-(OCF2CF2CF2CF2)a”-(OCF2CF2CF2)b”-(OCF2CF2)c”-(OCF2)d”-Rf6‧‧‧(3b) Rf 5 -(OCF 2 CF 2 CF 2 CF 2 ) a” -(OCF 2 CF 2 CF 2 ) b” -(OCF 2 CF 2 ) c” -(OCF 2 ) d” -Rf 6 ‧‧‧(3b)
在此等式中,Rf5及Rf6係如上述;在式(3a)中,b”為1以上100以下之整數;在式(3b)中,a”及b”分別獨立地為0以上30以下之整數,c”及d”分別獨立地為1以上300以下之整數。標註下標a”、b”、c”、d”並以括弧括起來之各重複單元之存在順序在式中為任意。 In this equation, Rf5 and Rf6 are as described above; in formula (3a), b" is an integer from 1 to 100; in formula (3b), a" and b" are each independently an integer from 0 to 30, and c" and d" are each independently an integer from 1 to 300. The order of the repetitive units enclosed in parentheses and denoted by the subscripts a", b", c", and d" in the formula is arbitrary.
又,從另一觀點而言,含氟油可為通式Rf3-F(式中,Rf3為C5-16全氟烷基)所示的化合物。又,亦可為氯三氟乙烯寡聚物。 From another perspective, the fluorinated oil may be a compound represented by the general formula Rf 3 -F (wherein Rf 3 is a C 5-16 perfluoroalkyl group). Alternatively, it may be a chlorotrifluoroethylene oligomer.
上述含氟油可具有500至10000之平均分子量。含氟油之分子量係可使用GPC而測定。 The fluorinated oil may have an average molecular weight of 500 to 10,000. The molecular weight of the fluorinated oil can be determined using GPC.
相對於本揭示之表面處理劑,含氟油係可包含例如0.01至50質量%,較佳係可包含0.1至30質量%,例如可包含1至15質量%。 With respect to the surface treatment agent disclosed herein, the fluorine-containing oil may be included in an amount of, for example, 0.01 to 50 mass%, preferably 0.1 to 30 mass%, for example 1 to 15 mass%.
在一態樣中,本揭示之表面處理劑係實質上不含有含氟油。所謂實質上不含有含氟油係指完全不含有含氟油、或可含有極微量之含氟油。 In one embodiment, the surface treatment agent disclosed herein is substantially free of fluorinated oil. "Substantially free of fluorinated oil" means that it contains no fluorinated oil at all, or may contain a very small amount of fluorinated oil.
在一態樣中,可使含氟油之平均分子量大於含有氟聚醚基的矽烷化合物之平均分子量。藉由設為如此之平均分子量,尤其在藉由真空蒸鍍法形成表面處理層時,可得到更優異的耐磨損性與表面平滑性。 In one embodiment, the average molecular weight of the fluorinated oil can be greater than the average molecular weight of the silane compound containing a fluoropolyether group. This average molecular weight can achieve superior wear resistance and surface smoothness, particularly when forming a surface treatment layer by vacuum evaporation.
在一態樣中,可使含氟油之平均分子量小於含有氟聚醚基的矽烷化合物之平均分子量。藉由設為如此之平均分子量,可抑制由該化合物所得到的表面處理層之透明性的降低,並形成具有高的耐磨損性及高的表面平滑性之硬化物。 In one embodiment, the average molecular weight of the fluorinated oil can be lower than the average molecular weight of the silane compound containing a fluoropolyether group. By setting this average molecular weight, the transparency of the surface-treated layer obtained from the compound can be suppressed, and a cured product with high abrasion resistance and excellent surface smoothness can be formed.
含氟油係有助於提高由本揭示之表面處理劑所形成的層之表面平滑性。 Fluorine-containing oil helps improve the surface smoothness of the layer formed by the surface treatment agent disclosed herein.
就上述聚矽氧油而言,可使用例如矽氧烷鍵為2,000以下的直鏈狀或環狀之聚矽氧油。直鏈狀之聚矽氧油可為所謂之直鏈聚矽氧油及改性聚矽氧油。直鏈聚矽氧油係可列舉二甲基聚矽氧油、甲基苯基聚矽氧油、甲基氫聚矽氧油。改性聚矽氧油係可列舉使直鏈聚矽氧油經烷基、芳烷基、聚醚、高級脂肪 酸酯、氟烷基、胺基、環氧基、羧基、醇等而改性者。環狀之聚矽氧油可列舉例如環狀二甲基矽氧烷油等。 As for the aforementioned silicone oils, linear or cyclic silicone oils with a siloxane bond number of 2,000 or less can be used. Linear silicone oils include so-called linear silicone oils and modified silicone oils. Examples of linear silicone oils include dimethyl silicone oil, methylphenyl silicone oil, and methylhydro silicone oil. Modified silicone oils include linear silicone oils modified with alkyl groups, arylalkyl groups, polyethers, higher fatty acid esters, fluoroalkyl groups, amino groups, epoxy groups, carboxyl groups, alcohols, and the like. Examples of cyclic silicone oils include cyclodimethylsiloxane oil.
在本揭示之表面處理劑中,相對於上述本揭示之含有氟聚醚基的矽烷化合物之合計100質量份(2種以上時係此等之合計,以下亦同),該聚矽氧油係可包含例如0至300質量份,較佳係50至200質量份。 In the surface treatment agent disclosed herein, the polysilicone oil may be included in an amount of, for example, 0 to 300 parts by mass, preferably 50 to 200 parts by mass, relative to a total of 100 parts by mass of the fluoropolyether group-containing silane compounds disclosed herein (the total amount when two or more types are present, and the same applies hereinafter).
聚矽氧油係有助於提升表面處理層之表面平滑性。 Silicone oil helps improve the surface smoothness of the surface treatment layer.
就上述醇類而言,例如為碳數1至6之非氟醇,可列舉例如甲醇、乙醇、異丙醇、第三丁醇等。藉由將此等醇類添加至表面處理劑中,而提升表面處理劑之安定性,又,使含有全氟聚醚基的矽烷化合物與溶劑之相容性獲得改善。 The aforementioned alcohols are, for example, non-fluorinated alcohols with 1 to 6 carbon atoms, such as methanol, ethanol, isopropyl alcohol, and tert-butyl alcohol. Adding these alcohols to the surface treatment agent enhances the stability of the surface treatment agent and improves the compatibility of the perfluoropolyether-containing silane compound with the solvent.
上述相容劑係可列舉2,2,2-三氟乙醇、2,2,3,3,3-五氟-1-丙醇或2,2,3,3,4,4,5,5-八氟-1-戊醇等經氟取代之醇,較佳係末端為CF2H之經氟取代之醇、1,3-雙(三氟甲基)苯等經氟取代之芳基,較佳係經氟取代之苯等。 Examples of the compatibilizer include fluorine-substituted alcohols such as 2,2,2-trifluoroethanol, 2,2,3,3,3-pentafluoro-1-propanol, and 2,2,3,3,4,4,5,5-octafluoro-1-pentanol, preferably fluorine-substituted alcohols with a terminal CF 2 H group, fluorine-substituted aryls such as 1,3-bis(trifluoromethyl)benzene, and preferably fluorine-substituted benzene.
上述觸媒係可列舉酸(例如乙酸、三氟乙酸等)、鹼(例如氨、三乙基胺、二乙基胺等)、過渡金屬(例如Ti、Ni、Sn等)等。 Examples of the catalyst include acids (e.g., acetic acid, trifluoroacetic acid, etc.), bases (e.g., ammonia, triethylamine, diethylamine, etc.), and transition metals (e.g., Ti, Ni, Sn, etc.).
觸媒係促進本揭示之含有氟聚醚基的矽烷化合物之水解及脫水縮合,並促進由本揭示之表面處理劑所形成的層之形成。 The catalyst promotes the hydrolysis and dehydration condensation of the fluoropolyether-containing silane compound disclosed herein, and also promotes the formation of a layer formed by the surface treatment agent disclosed herein.
就其他成分而言,除了上述者以外,尚可列舉例如:四乙氧基矽烷、甲基三甲氧基矽烷、3-胺基丙基三甲氧基矽烷、3-環氧丙氧基丙基三甲氧基矽烷、甲基三乙醯氧基矽烷等。 As for other ingredients, in addition to the above, examples include: tetraethoxysilane, methyltrimethoxysilane, 3-aminopropyltrimethoxysilane, 3-glycidoxypropyltrimethoxysilane, methyltriacetoxysilane, etc.
本揭示之表面處理劑係可含浸於多孔質物質(例如多孔質之陶瓷材料)、金屬纖維(例如使鋼綿固定成棉狀者)而製成顆粒。該顆粒係例如可使用於真空蒸鍍。 The surface treatment agent disclosed herein can be impregnated into a porous material (e.g., a porous ceramic material) or metal fiber (e.g., steel wool fixed into a cotton-like shape) to form particles. These particles can be used, for example, in vacuum evaporation.
本揭示之表面處理劑中,除了上述成分以外,就雜質而言,例如可含有微量之Pt、Rh、Ru、1,3-二乙烯基四甲基二矽氧烷、三苯基膦、NaCl、KCl、矽烷之縮合物等。 In addition to the aforementioned components, the surface treatment agent disclosed herein may contain impurities such as trace amounts of Pt, Rh, Ru, 1,3-divinyltetramethyldisiloxane, triphenylphosphine, NaCl, KCl, and silane condensates.
以下,說明有關本揭示之物品。 The following describes the items related to this disclosure.
本揭示之物品係包含:基材;以及該基材表面上之由本揭示之表面處理劑所形成之層(表面處理層)。 The article disclosed herein comprises: a substrate; and a layer formed on the surface of the substrate by the surface treatment agent disclosed herein (surface treatment layer).
本揭示中可使用的基材係例如可由玻璃、樹脂(可為天然或合成樹脂,例如一般的塑膠材料)、金屬、陶瓷、半導體(矽、鍺等)、纖維(織物、不織布等)、毛皮、皮革、木材、陶磁器、石材等、建築構件等衛生用品、任意之適合的材料所構成。 The substrates that can be used in the present disclosure can be made of, for example, glass, resin (which can be natural or synthetic resin, such as common plastic materials), metal, ceramic, semiconductor (silicon, germanium, etc.), fiber (woven, non-woven, etc.), fur, leather, wood, ceramics, stone, sanitary products such as building components, or any other suitable material.
例如,在要製造的物品為光學構件時,構成基材表面的材料可為光學構件用材料,例如玻璃或透明塑膠等。又,在要製造的物品為光學構件時,可於基材之表面(最外層)形成某種層(或膜),例如硬塗層或抗反射層等。抗反射層係可使用單層抗反射層及多層抗反射層之任一者。可使用於抗反射層中的無機物之例係可列舉SiO2、SiO、ZrO2、TiO2、TiO、Ti2O3、Ti2O5、Al2O3、Ta2O5、Ta3O5,Nb2O5、HfO2、Si3N4、CeO2、MgO、Y2O3、SnO2、MgF2、WO3等。此等無機物係可單獨使用,或可組合此等之2種以上(例如形成為混合物)而使用。在設為多層抗反射層時,在其最外層係以使用SiO2及/或SiO為佳。在要製造的物品為觸控面板用之光學玻璃構件時,可於基材(玻璃)之表面的一部分具有透明 電極,例如使用氧化銦錫(ITO)或氧化銦鋅等而成之薄膜。又,基材係依照其具體的規格等而可具有絕緣層、黏著層、保護層、裝飾框層(I-CON)、霧化膜層、硬塗膜層、偏光膜、相位差膜及液晶顯示模組等。 For example, when the article to be manufactured is an optical component, the material constituting the substrate surface can be a material commonly used for optical components, such as glass or transparent plastic. Furthermore, when the article to be manufactured is an optical component, a layer (or film), such as a hard coat or antireflection layer, can be formed on the surface (outermost layer) of the substrate. The antireflection layer can be either a single-layer antireflection layer or a multi-layer antireflection layer. Examples of inorganic materials that can be used in the antireflection layer include SiO2 , SiO, ZrO2 , TiO2 , TiO , Ti2O3 , Ti2O5, Al2O3, Ta2O5, Ta3O5, Nb2O5, HfO2, Si3N4, CeO2, MgO, Y2O3 , SnO2 , MgF2 , and WO3 . These inorganic materials can be used alone or in combination ( e.g., as a mixture). When a multi - layer antireflection layer is provided, SiO2 and/or SiO are preferably used as the outermost layer. When the product is an optical glass component for a touch panel, a transparent electrode can be formed on a portion of the surface of the substrate (glass), such as a thin film made of indium tin oxide (ITO) or indium zinc oxide. Furthermore, depending on the specific specifications, the substrate can also have insulating layers, adhesive layers, protective layers, decorative frames (I-CON), atomized films, hard coat layers, polarizing films, retardation films, and liquid crystal display modules.
上述基材之形狀並無特別限定,例如可為板狀、膜、其他形態。又,要形成表面處理層的基材之表面區域,只要為基材表面之至少一部分即可,可依照要製造的物品之用途及具體的規格等而適當決定。 The shape of the substrate is not particularly limited and may be, for example, a plate, film, or other form. Furthermore, the surface area of the substrate where the surface treatment layer is to be formed only needs to be at least a portion of the substrate surface and can be appropriately determined based on the intended use and specific specifications of the product being manufactured.
在一態樣中,就該基材而言,至少其表面部分可為由原本具有羥基之材料所構成者。該材料係可列舉玻璃,又,可列舉在表面形成有自然氧化膜或熱氧化膜的金屬(尤其卑金屬)、陶瓷、半導體等。或者如樹脂般即使具有羥基但亦不充分時或原本即不具有羥基時,可藉由對基材施予某種前處理,而對基材表面導入或增加羥基。該前處理之例係可列舉電漿處理(例如電暈放電)或離子束照射。為了可在基材表面導入或增加羥基並能使基材表面清淨化(去除異物等),而亦適合利用電漿處理。又,該前處理之另一例係可列舉如下的方法:使具有碳-碳不飽和鍵結基之界面吸附劑藉由LB法(Langmuir-Blodgett法,亦即朗謬-布洛傑法)或化學吸附法等,而在基材表面預先以單分子膜之形態形成,然後在包含氧或氮等的環境下使不飽和鍵進行開裂的方法。 In one embodiment, as for the substrate, at least a portion of its surface may be made of a material that originally has a hydroxyl group. Examples of such materials include glass, and examples include metals (especially base metals), ceramics, semiconductors, etc., with natural oxide films or thermal oxide films formed on their surfaces. Alternatively, when the substrate has insufficient hydroxyl groups, or when the substrate originally does not have hydroxyl groups, a certain pretreatment may be applied to the substrate to introduce or increase hydroxyl groups on the substrate surface. Examples of such pretreatments include plasma treatment (e.g., coma discharge) or ion beam irradiation. Plasma treatment is also suitable for introducing or increasing hydroxyl groups on the substrate surface and for cleaning the substrate surface (removing foreign matter, etc.). Another example of this pretreatment method is to form an interfacial adsorbent having carbon-carbon unsaturated bond groups in the form of a monolayer on the substrate surface using the Langmuir-Blodgett method (LB method) or chemical adsorption, and then cleave the unsaturated bonds in an environment containing oxygen or nitrogen.
在另一態樣中,就該基材而言,至少其表面部分可為由具有1個以上之另一反應性基(例如Si-H基)的聚矽氧化合物、或包含烷氧基矽烷之材料所構成者。 In another aspect, at least a surface portion of the substrate may be composed of a polysiloxane having one or more reactive groups (e.g., Si-H groups) or a material containing an alkoxysilane.
在較佳態樣中,上述基材為玻璃。該玻璃係以藍寶石玻璃、鈉鈣玻璃、鹼鋁矽酸鹽玻璃、硼矽酸玻璃、無鹼玻璃、結晶玻璃、石英玻璃為佳,以 經化學強化之鈉鈣玻璃、經化學強化之鹼鋁矽酸鹽玻璃、及經化學鍵結之硼矽酸玻璃為特佳。 In a preferred embodiment, the substrate is glass. The glass is preferably sapphire glass, sodium calcium glass, alkali aluminosilicate glass, borosilicate glass, alkali-free glass, crystallized glass, or quartz glass. Chemically strengthened sodium calcium glass, chemically strengthened alkali aluminosilicate glass, and chemically bonded borosilicate glass are particularly preferred.
本揭示之物品可在上述基材之表面形成上述本揭示的表面處理劑之層,並將該層依需要而進行後處理,藉此,可由本揭示之表面處理劑來形成層,據以製造。 The article disclosed herein can be manufactured by forming a layer of the surface treatment agent disclosed herein on the surface of the substrate and then post-treating the layer as needed. Thus, a layer can be formed using the surface treatment agent disclosed herein.
本揭示之表面處理劑之層形成,係可藉由對基材之表面以被覆該表面之方式來應用上述表面處理劑而實施。被覆方法並無特別限定。例如可使用濕潤被覆法及乾燥被覆法。 The surface treatment agent layer disclosed herein can be formed by applying the surface treatment agent to the surface of a substrate to coat the surface. The coating method is not particularly limited. For example, wet coating and dry coating methods can be used.
濕潤被覆法之例子係可列舉浸漬塗敷、旋轉塗敷、流動塗敷、噴灑塗敷、輥塗敷、凹版塗敷及類似之方法。 Examples of wet coating methods include dip coating, spin coating, flow coating, spray coating, roll coating, gravure coating, and similar methods.
乾燥被覆法之例子係可列舉蒸鍍(通常為真空蒸鍍)、濺鍍、CVD及類似之方法。蒸鍍法(通常為真空蒸鍍法)之具體例係可列舉使用電阻加熱、電子束、微波等高頻加熱、離子束及類似之方法。CVD方法之具體例係可列舉電漿-CVD、光學CVD、熱CVD及類似之方法。 Examples of dry coating methods include evaporation (usually vacuum evaporation), sputtering, CVD, and similar methods. Specific examples of evaporation methods (usually vacuum evaporation) include methods using resistance heating, electron beams, high-frequency heating such as microwaves, ion beams, and similar methods. Specific examples of CVD methods include plasma-CVD, optical CVD, thermal CVD, and similar methods.
再者,亦可依據常壓電漿法來進行被覆。 Furthermore, coating can also be performed using the atmospheric pressure plasma method.
使用濕潤被覆法時,本揭示之表面處理劑可經溶劑稀釋後應用於基材表面。從本揭示之組成物的安定性及溶劑之揮發性的觀點而言,較佳係使用下列溶劑:碳數5至12之全氟脂肪族烴(例如全氟己烷、全氟甲基環己烷及全氟-1,3-二甲基環己烷);聚氟芳香族烴(例如雙(三氟甲基)苯);聚氟脂肪族烴(例如C6F13CH2CH3(例如旭硝子股份有限公司製之ASAHIKLIN(註冊商標)AC-6000)、1,1,2,2,3,3,4-七氟環戊烷(例如日本ZEON股份有限公司製之ZEORORA(註冊商標)H);氫氟醚(HFE)(例如全氟丙基甲基醚(C3F7OCH3)(例如住友3M股份有限公 司製之Novec(商標)7000)、全氟丁基甲基醚(C4F9OCH3)(例如住友3M股份有限公司製之Novec(商標)7100)、全氟丁基乙基醚(C4F9OC2H5)(例如住友3M股份有限公司製之Novec(商標)7200)、全氟己基甲基醚(C2F5CF(OCH3)C3F7)(例如住友3M股份有限公司製之Novec(商標)7300)等烷基全氟烷基醚(全氟烷基及烷基可為直鏈或分支狀)、或者CF3CH2OCF2CHF2(例如旭硝子股份有限公司製之ASAHIKLIN(註冊商標)AE-3000))等。此等溶劑係可單獨使用、或作為2種以上之混合物而使用。其中,以氫氟醚為佳,以全氟丁基甲基醚(C4F9OCH3)及/或全氟丁基乙基醚(C4F9OC2H5)為特佳。 When using the wet coating method, the surface treatment agent disclosed herein can be diluted with a solvent and then applied to the substrate surface. From the perspective of the stability of the composition of the present disclosure and the volatility of the solvent, the following solvents are preferably used: perfluoroaliphatic hydrocarbons having 5 to 12 carbon atoms (e.g., perfluorohexane, perfluoromethylcyclohexane, and perfluoro-1,3-dimethylcyclohexane); polyfluoroaromatic hydrocarbons (e.g., bis(trifluoromethyl)benzene); polyfluoroaliphatic hydrocarbons (e.g., C 6 F 13 CH 2 CH 3 (e.g., ASAHIKLIN (registered trademark) AC-6000 manufactured by Asahi Glass Co., Ltd.), 1,1,2,2,3,3,4-heptafluorocyclopentane (e.g., ZEORORA (registered trademark) H manufactured by ZEON Co., Ltd. of Japan); hydrofluoroethers (HFE) (e.g., perfluoropropyl methyl ether (C 3 F 7 OCH 3 ) (e.g., Novec (trademark) 7000 manufactured by Sumitomo 3M Co., Ltd.), perfluorobutyl methyl ether (C 4 F 9 OCH 3 ) (e.g., Novec (trademark) 7100 manufactured by Sumitomo 3M Co., Ltd.), perfluorobutyl ethyl ether (C 4 F 9 OC 2 H 5 ) (e.g., Novec (trademark) 7200 manufactured by Sumitomo 3M Co., Ltd.), perfluorohexyl methyl ether (C 2 F 5 CF(OCH 3 )C 3 F 7 ) (e.g., Novec (trademark) 7300 manufactured by Sumitomo 3M Co., Ltd.), etc., alkyl perfluoroalkyl ethers (the perfluoroalkyl group and the alkyl group may be linear or branched), or CF 3 CH 2 OCF 2 CHF 2 (For example, ASAHIKLIN (registered trademark) AE-3000 manufactured by Asahi Glass Co., Ltd.) These solvents can be used alone or as a mixture of two or more. Among them, hydrofluoroethers are preferred, with perfluorobutyl methyl ether (C 4 F 9 OCH 3 ) and/or perfluorobutyl ethyl ether (C 4 F 9 OC 2 H 5 ) being particularly preferred.
使用乾燥被覆法時,本揭示之表面處理劑可直接供給至乾燥被覆法,或可經上述溶劑稀釋後再供給至乾燥被覆法。 When using the dry coating method, the surface treatment agent disclosed herein can be supplied directly to the dry coating method, or it can be diluted with the above-mentioned solvent before being supplied to the dry coating method.
表面處理劑之層形成,較佳係以在層中使本揭示之表面處理劑與用於水解及脫水縮合之觸媒一起存在之方式來實施。簡便上,在使用濕潤被覆法時,係在將本揭示之表面處理劑經溶劑稀釋後且即將應用於基材表面之前,可在本揭示之表面處理劑之稀釋液中添加觸媒。在使用乾燥被覆法時,可使「經添加觸媒後之本揭示的表面處理劑」直接進行蒸鍍(通常為真空蒸鍍)處理,或者使用在鐵或銅等金屬多孔體中含浸「經添加觸媒後的本揭示之表面處理劑」而成的顆粒狀物質來進行蒸鍍(通常為真空蒸鍍)處理。 The surface treatment agent layer is preferably formed by combining the surface treatment agent disclosed herein with a catalyst for hydrolysis and dehydration condensation. Conveniently, when using a wet coating method, the catalyst can be added to the diluted surface treatment agent after it is diluted with a solvent and immediately before application to the substrate surface. When using a dry coating method, the surface treatment agent disclosed herein, after the catalyst has been added, can be directly subjected to evaporation (typically vacuum evaporation), or granules prepared by impregnating the surface treatment agent disclosed herein with a catalyst into a porous metal such as iron or copper can be subjected to evaporation (typically vacuum evaporation).
觸媒係可使用任意之適合的酸或鹼。酸觸媒係可使用例如乙酸、甲酸、三氟乙酸等。又,鹼觸媒係可使用例如氨、有機胺類等。 Any suitable acid or base can be used as the catalyst. Examples of acid catalysts include acetic acid, formic acid, and trifluoroacetic acid. Examples of alkaline catalysts include ammonia and organic amines.
本揭示之物品所含有的表面處理層係具有高的耐磨損性兩者。又,上述表面處理層除了具有高的耐磨損性以外,雖依使用之表面處理劑的組成而定,惟亦可具有撥水性、撥油性、防污性(例如防止指紋等污垢的附著)、防水 性(防止水滲入電子構件等)、表面平滑性(或潤滑性,例如指紋等污垢的擦除性、或對手指之優異觸感)、耐化學藥品性等,可適合用來作為功能性薄膜。 The surface treatment layer included in the article disclosed herein exhibits both high wear resistance and excellent abrasion resistance. Furthermore, depending on the composition of the surface treatment agent used, this surface treatment layer may also exhibit water repellency, oil repellency, antifouling properties (e.g., preventing fingerprints and other dirt from adhering), water repellency (preventing water from penetrating electronic components), surface smoothness (or lubricity, such as the ability to wipe away fingerprints and other dirt, or providing a pleasant feel to the touch), and chemical resistance, making it suitable for use as a functional film.
因此,再者,本揭示亦有關於在最外層具有上述表面處理層之光學材料。 Therefore, the present disclosure also relates to an optical material having the above-mentioned surface treatment layer on the outermost layer.
就光學材料而言,除了後述例示之顯示器等相關的光學材料以外,較佳係尚可列舉各式各樣的光學材料:例如,在陰極線管(CRT;例如,個人電腦監視器)、液晶顯示器、電漿顯示器、有機EL顯示器、無機薄膜EL點矩陣顯示器、背面投影型顯示器、螢光顯示管(VFD)、場發射顯示器(FED;Field Emission Display)等顯示器或其等的顯示器之保護板、或在其等之表面經施予抗反射膜處理者。 Optical materials, in addition to the display-related optical materials exemplified below, are preferably a variety of optical materials: for example, materials used in cathode ray tubes (CRTs; for example, personal computer monitors), liquid crystal displays, plasma displays, organic EL displays, inorganic thin-film EL dot matrix displays, rear projection displays, fluorescent tubes (VFDs), field emission displays (FEDs), and other displays, or in protective plates for such displays, or materials having an anti-reflection coating applied to their surfaces.
本揭示之物品並無特別限定,可為光學構件。光學構件之例係可列舉如下者:眼鏡等的透鏡;PDP、LCD等顯示器的前面保護板、抗反射板、偏光板、防眩板;行動電話、行動資訊終端等機器之觸控板片;藍光(Blu-ray(註冊商標))光碟、DVD光碟、CD-R、MO等光碟的光碟面;光纖;鐘錶之顯示面等。 The articles disclosed herein are not particularly limited and may be optical components. Examples of optical components include: lenses for glasses, etc.; front protective plates, anti-reflective plates, polarizing plates, and anti-glare plates for displays such as PDPs and LCDs; touch panels for mobile phones and mobile information terminals; the optical surfaces of Blu-ray discs, DVDs, CD-Rs, MOs, etc.; optical fibers; and the display surface of watches.
又,本揭示之物品可為醫療機器或醫療材料。 Furthermore, the article disclosed herein may be a medical device or medical material.
上述層之厚度並無特別限定。在為光學構件之情形時,從光學性能、耐磨損性及防污性之觀點而言,較佳係上述層之厚度為1至50nm、1至30nm,較佳係1至15nm之範圍。 The thickness of the above layer is not particularly limited. In the case of optical components, from the perspectives of optical performance, abrasion resistance, and antifouling properties, the thickness of the above layer is preferably in the range of 1 to 50 nm, 1 to 30 nm, and more preferably 1 to 15 nm.
以上詳述了本揭示之物品。又,本揭示之物品及物品之製造方法等並不限定於上述所例示者。 The above details the articles disclosed herein. Furthermore, the articles disclosed herein and their manufacturing methods are not limited to the examples described above.
[實施例] [Example]
以下,在實施例中說明有關本揭示之物品,惟本揭示係不受以下之實施例所限定。又,在本實施例中,構成氟聚醚之重複單元的存在順序為任意,以下所示的化學式係表示平均組成。 The following examples illustrate the articles of the present disclosure, but the present disclosure is not limited to the following examples. Furthermore, in these examples, the order of the repeating units constituting the fluoropolyether is arbitrary, and the chemical formula shown below represents the average composition.
準備下述化合物作為含有氟聚醚基的矽烷化合物。 Prepare the following compound as a silane compound containing a fluoropolyether group.
化合物(A):
(m≒21、n≒35)(又,平均組成係含有0.27個(CF2CF2CF2CF2O)之重複單元及0.42個(CF2CF2CF2O)之重複單元,惟由於為微量故予以省略。又,含有3.2%的在兩末端具有-C(CH2CH2CH2Si(OCH3)3)之化合物,惟由於為微量故予以省略)。 (m≒21, n≒35) (Also, the average composition contains 0.27 repeating units of (CF 2 CF 2 CF 2 CF 2 O) and 0.42 repeating units of (CF 2 CF 2 CF 2 O), but these are omitted due to their trace amounts. Also, 3.2% of a compound having -C(CH 2 CH 2 CH 2 Si(OCH 3 ) 3 ) at both terminals is contained, but these are omitted due to their trace amounts).
化合物(B);
(m≒26、n≒24)(又,平均組成係含有1.32個(CF2CF2CF2CF2O)之重複單元及0.70個(CF2CF2CF2O)之重複單元,惟由於為微量故予以省略。又,含有8.0%的在兩末端具有-N(CH2CH2CH2Si(OCH3)3)2之化合物,惟由於為微量故予以省略)。 (m≒26, n≒24) (Also, the average composition contains 1.32 repeating units of (CF 2 CF 2 CF 2 CF 2 O) and 0.70 repeating units of (CF 2 CF 2 CF 2 O), but these are omitted due to their trace amounts. Also, 8.0% of a compound having -N(CH 2 CH 2 CH 2 Si(OCH 3 ) 3 ) 2 at both ends is contained, but these are omitted due to their trace amounts).
化合物(C):
(n≒20、t=1至6,平均約為3) (n≒20, t=1 to 6, average approximately 3)
化合物(D):CF3(OCF2CF2)m(OCF2)nOCF3 Compound (D): CF 3 (OCF 2 CF 2 ) m (OCF 2 ) n OCF 3
(m≒22、n≒21) (m≒22, n≒21)
(稀釋液之調製) (Preparation of diluent)
就含有氟聚醚基的矽烷化合物之稀釋劑(X)而言,係使上述化合物(A)、化合物(B)、化合物(C)及化合物(D)分別溶解於氫氟醚(3M公司製、NOVEC HFE-7200)成為濃度20質量%,而調製稀釋液(X1)、(X2)、(X3)及(X4)。 As for the diluent (X) for the silane compound containing a fluoropolyether group, the aforementioned compound (A), compound (B), compound (C), and compound (D) were dissolved in hydrofluoric acid (3M Company, NOVEC HFE-7200) to a concentration of 20% by mass, thereby preparing diluents (X1), (X2), (X3), and (X4).
就醇之稀釋劑(Y)而言,係使五氟丙醇、六氟異丙醇、乙醇及異丙醇分別溶解於氫氟醚(3M公司製、NOVEC HFE-7200)成為濃度20質量%,而調製稀釋液(Y1)、(Y2)、(Y3)及(Y4)。 As for the alcohol diluent (Y), pentafluoropropanol, hexafluoroisopropanol, ethanol, and isopropanol were dissolved in hydrofluoric acid (3M, NOVEC HFE-7200) to a concentration of 20% by mass, and diluents (Y1), (Y2), (Y3), and (Y4) were prepared.
就含有氟聚醚基的矽烷化合物之稀釋劑(X)而言,係使上述化合物(A)、化合物(B)、化合物(C)及化合物(D)分別溶解於氫氟醚(3M公司製、NOVEC HFE-7200)成為濃度0.1質量%,而調製稀釋液(X5)、(X6)、(X7)及(X8)。 As for the diluent (X) for the silane compound containing a fluoropolyether group, the aforementioned compound (A), compound (B), compound (C), and compound (D) were dissolved in hydrofluoric acid (3M Company, NOVEC HFE-7200) to a concentration of 0.1 mass %, thereby preparing diluents (X5), (X6), (X7), and (X8).
就醇之稀釋劑(Y)而言,係使五氟丙醇、六氟異丙醇、乙醇及異丙醇分別溶解於氫氟醚(3M公司製、NOVEC HFE-7200)成為濃度0.1質量%,而調製稀釋液(Y5)、(Y6)、(Y7)及(Y8)。 As for the alcohol diluent (Y), pentafluoropropanol, hexafluoroisopropanol, ethanol, and isopropanol were dissolved in hydrofluoric acid (3M, NOVEC HFE-7200) to a concentration of 0.1% by mass to prepare diluents (Y5), (Y6), (Y7), and (Y8).
(表面處理劑之調製1) (Preparation of surface treatment agent 1)
依下述表1所示的比率混合稀釋液(X)及稀釋液(Y),而調製表面處理劑1至9。表面處理劑1至5為實施例,表面處理劑6至9為比較例。 Surface treatment agents 1 to 9 were prepared by mixing diluent (X) and diluent (Y) in the ratios shown in Table 1 below. Surface treatment agents 1 to 5 are examples, and surface treatment agents 6 to 9 are comparative examples.
[表1]
(表面處理層之形成) (Formation of surface treatment layer)
將上述所調製的表面處理劑1至9分別真空蒸鍍於化學強化玻璃(CORNING公司製、Gorilla Glass、厚度0.7mm)上。真空蒸鍍法之條件係電阻加熱式蒸鍍機(SHINCRON製)、腔室大小1,900mm 、真空度5.0E-05、電流值240A、電壓10V、基材溫度40℃。其次,使經蒸鍍之化學強化玻璃靜置在溫度150℃之環境下30分鐘,然後放置冷卻至室溫,在玻璃基材上形成表面處理層。 The surface treatment agents 1 to 9 prepared above were vacuum-deposited onto chemically strengthened glass (Gorilla Glass, manufactured by CORNING, thickness 0.7 mm). The vacuum deposition method was performed using a resistance heating evaporator (manufactured by SHINCRON) with a chamber size of 1,900 mm. , vacuum 5.0E-05, current 240A, voltage 10V, substrate temperature 40°C. Next, the evaporated chemically strengthened glass was placed at 150°C for 30 minutes and then allowed to cool to room temperature to form a surface treatment layer on the glass substrate.
(表面處理層之特性評定) (Evaluation of surface treatment layer characteristics)
如下述般評定所得到的表面處理層之特性。結果呈示於下述表2中。 The properties of the resulting surface treatment layer were evaluated as follows. The results are shown in Table 2 below.
<靜態接觸角> <Static contact angle>
(初期評定) (Initial Assessment)
就初期評定而言,在形成表面處理層之後,在該表面尚未有任何接觸之狀態,測定水之靜態接觸角。 For initial evaluation, the static contact angle of water is measured after the surface treatment layer is formed and before any contact is made with the surface.
(耐SW磨損性試驗) (SW abrasion resistance test)
SW:(Bonstar鋼綿,#0000) SW: (Bonstar Steel Cotton, #0000)
接地面積:10mm Ground contact area: 10mm
移動距離(單程):60mm Travel distance (one way): 60mm
移動速度:60循環/分鐘 Movement speed: 60 cycles/minute
荷重:1kgf Load: 1kgf
[表2]
(表面處理劑之調製2) (Preparation of surface treatment agent 2)
依下述表3所示的比率混合稀釋液(X)及稀釋液(Y),而調製表面處理劑10至16。表面處理劑10至12為實施例,表面處理劑13至16為比較例。 Surface treatment agents 10 to 16 were prepared by mixing diluent (X) and diluent (Y) in the ratios shown in Table 3 below. Surface treatment agents 10 to 12 are examples, and surface treatment agents 13 to 16 are comparative examples.
[表3]
(表面處理層之形成2) (Formation of surface treatment layer 2)
在將基材玻璃以電漿洗淨到水接觸角成為10°以下之後,以2流體噴嘴以48g/m2之塗佈量在玻璃上塗佈稀釋液。塗佈後,在150℃進行30分鐘之時效處理(aging process),形成表面處理層。 After plasma cleaning the substrate glass until the water contact angle is below 10°, the diluted solution is applied to the glass using a two-fluid nozzle at a coating weight of 48g/ m² . After application, the surface is aged at 150°C for 30 minutes to form a surface treatment layer.
(表面處理層之特性評定) (Evaluation of surface treatment layer characteristics)
與上述同樣地評定所得到的表面處理層之特性。結果呈示於下述表4中。 The properties of the resulting surface treatment layer were evaluated in the same manner as above. The results are shown in Table 4 below.
[表4]
[產業上之可利用性] [Industrial Availability]
本揭示之物品係可適合利用來作為各種各樣的用途,例如觸控面板等的光學構件。 The article disclosed herein can be used in a variety of applications, such as optical components for touch panels.
Claims (25)
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| JP5668887B1 (en) * | 2013-08-23 | 2015-02-12 | ダイキン工業株式会社 | Perfluoro (poly) ether group-containing bifunctional compound, composition containing perfluoro (poly) ether group-containing bifunctional compound, and methods for producing them |
| JP2015224293A (en) | 2014-05-28 | 2015-12-14 | 信越化学工業株式会社 | Fluorine-containing coating agent and article treated with the coating agent |
| JP6435871B2 (en) | 2015-01-19 | 2018-12-12 | ダイキン工業株式会社 | Surface treatment agent containing perfluoro (poly) ether group-containing silane compound |
| JP2018065946A (en) * | 2016-10-20 | 2018-04-26 | キヤノン株式会社 | Coating material and method for producing the same |
| WO2019088117A1 (en) * | 2017-10-31 | 2019-05-09 | ダイキン工業株式会社 | Curable composition |
| EP3705528B1 (en) * | 2017-10-31 | 2025-01-15 | Daikin Industries, Ltd. | Curable composition |
| EP4001364A4 (en) * | 2019-07-17 | 2024-02-14 | Daikin Industries, Ltd. | SURFACE TREATMENT AGENT |
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