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TWI896911B - Surface treatment agent - Google Patents

Surface treatment agent

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TWI896911B
TWI896911B TW111139883A TW111139883A TWI896911B TW I896911 B TWI896911 B TW I896911B TW 111139883 A TW111139883 A TW 111139883A TW 111139883 A TW111139883 A TW 111139883A TW I896911 B TWI896911 B TW I896911B
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TW202336025A (en
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丸橋和希
三橋尚志
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日商大金工業股份有限公司
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Abstract

The present invention provides a compound represented by the following formula (1) (wherein each symbol has the same meaning as described in the specification).
Rb 2N-Rd-CO-(RF2-CO-NRc-Ra(RAc m)-NRc-CO)x-RF2-CO-Rd-NRb 2 (1)

Description

表面處理劑 Surface treatment agent

本揭示係關於新穎的含氟聚醚基之丙烯酸化合物、以及含有該化合物之表面處理劑。 This disclosure relates to novel fluoropolyether-containing acrylic compounds and surface treatment agents containing the same.

某種含氟聚醚基之矽烷化合物已知於使用在基板的表面處理時,可提供優異的撥水性、撥油性、防污性等。從含有含氟聚醚基之矽烷化合物的表面處理劑所得到的層(以下亦稱為「表面處理層」),係作為所謂的功能性薄膜而被施用於例如玻璃、塑膠、纖維、衛生用品、建築資材等各式各樣的基材上(專利文獻1)。 Certain fluorinated polyether-containing silane compounds are known to provide excellent water-repellency, oil-repellency, and antifouling properties when used in substrate surface treatment. Layers obtained from surface treatment agents containing fluorinated polyether-containing silane compounds (hereinafter referred to as "surface treatment layers") are applied as so-called functional films to a variety of substrates, such as glass, plastics, fibers, sanitary products, and building materials (Patent Document 1).

[先前技術文獻] [Prior Art Literature]

[專利文獻] [Patent Literature]

[專利文獻1]日本特開2003-238577號公報 [Patent Document 1] Japanese Patent Application Laid-Open No. 2003-238577

專利文獻1所記載之含氟聚醚基之矽烷化合物雖可賦予具有優異功能之表面處理層,惟仍謀求具有更高的耐久性之表面處理層。 While the fluorinated polyether-containing silane compound described in Patent Document 1 can provide a surface treatment layer with excellent functionality, a surface treatment layer with even higher durability is still desired.

本揭示之目的係提供一種可提供耐久性優異之表面處理層的含氟聚醚基化合物。 The purpose of this disclosure is to provide a fluorinated polyether-based compound that can provide a surface treatment layer with excellent durability.

本揭示係包含下列態樣。 This disclosure includes the following aspects.

[1]一種化合物,係下述式(1)所表示者, [1] A compound represented by the following formula (1):

Rb 2N-Rd-CO-(RF2-CO-NRc-Ra(RAc m)-NRc-CO)x-RF2-CO-Rd-NRb 2 (1) R b 2 NR d -CO-(R F2 -CO-NR c -R a (R Ac m )-NR c -CO) x -R F2 -CO-R d -NR b 2 (1)

式中, In the formula,

RF2分別獨立地為-Rf2 p-RF-Oq-, RF2 is independently -Rf2p - RF - Oq- ,

Rf2為可經1個以上的氟原子取代之C1-6伸烷基, Rf2 is a C1-6 alkylene group which may be substituted by one or more fluorine atoms,

RF為二價氟聚醚基, RF is a divalent fluoropolyether group,

p為0或1, p is 0 or 1,

q為0或1, q is 0 or 1,

Ra分別獨立地為(m+2)價有機基, R a are each independently an (m+2)-valent organic group,

m為1至4的整數, m is an integer from 1 to 4,

Rb分別獨立地為RSi、RAc或RcR b is independently R Si , R Ac or R c ,

RSi分別獨立地為-XC-SiR1 n’R2 3-n’R Si are independently -X C -SiR 1 n' R 2 3-n' ,

XC為碳數1至10的二價有機基, X C is a divalent organic group having 1 to 10 carbon atoms,

R1分別獨立地為羥基或水解性基, R 1 is independently a hydroxyl group or a hydrolyzable group,

R2分別獨立地為氫原子或一價有機基, R2 are each independently a hydrogen atom or a monovalent organic group,

n’為1至3的整數, n’ is an integer from 1 to 3,

RAc分別獨立地為-XD-XE(-XF-OCO-CR5=CH2)m’R Ac are each independently -X D -X E (-X F -OCO-CR 5 ═CH 2 ) m' ,

XD為二價有機基, X D is a divalent organic group,

XE為單鍵或(m’+1)價基, X E is a single bond or (m'+1) valence base,

XF分別獨立地為碳數1至10的二價有機基, X and F are each independently a divalent organic group having 1 to 10 carbon atoms,

R5為氫原子或碳數1至8的一價有機基, R5 is a hydrogen atom or a monovalent organic group having 1 to 8 carbon atoms,

m’為1至10的整數, m’ is an integer from 1 to 10,

Rc分別獨立地為氫原子或C1-6烷基, R c are each independently a hydrogen atom or a C 1-6 alkyl group,

Rd分別獨立地為單鍵或二價有機基, R d are each independently a single bond or a divalent organic group,

x為1以上的整數。 x is an integer greater than 1.

[2]如上述[1]所述之化合物,其中,RF分別獨立地為下式所表示之基, [2] The compound as described in [1] above, wherein R and F are each independently a group represented by the following formula:

-(OC6F12)a-(OC5F10)b-(OC4F8)c-(OC3RFa 6)d-(OC2F4)e-(OCF2)f- -(OC 6 F 12 ) a -(OC 5 F 10 ) b -(OC 4 F 8 ) c -(OC 3 R Fa 6 ) d -(OC 2 F 4 ) e -(OCF 2 ) f -

式中,RFa分別獨立地為氫原子、氟原子或氯原子, Wherein, R Fa are independently a hydrogen atom, a fluorine atom or a chlorine atom,

a、b、c、d、e及f分別獨立地為0至200的整數,a、b、c、d、e及f之和為1以上,標註a、b、c、d、e或f並以括弧括起之各重複單元的存在順序於式中為任意,惟於所有的RFa皆為氫原子或氯原子時,a、b、c、e及f的至少1個為1以上。 a, b, c, d, e, and f are each independently an integer from 0 to 200, the sum of a, b, c, d, e, and f is 1 or greater, and the order of the repeating units labeled a, b, c, d, e, or f and enclosed in parentheses in the formula is arbitrary, except that when all R Fa are hydrogen atoms or chlorine atoms, at least one of a, b, c, e, and f is 1 or greater.

[3]如上述[1]或[2]所述之化合物,其中,RFa為氟原子。 [3] The compound as described in [1] or [2] above, wherein R Fa is a fluorine atom.

[4]如上述[1]至[3]中任一項所述之化合物,其中,RF分別獨立地為下述式(f1)、(f2)、(f3)、(f4)、(f5)或(f6)所表示之基, [4] The compound as described in any one of [1] to [3] above, wherein RF is independently a group represented by the following formula (f1), (f2), (f3), (f4), (f5) or (f6),

-(OC3F6)d-(OC2F4)e- (f1) -(OC 3 F 6 ) d -(OC 2 F 4 ) e - (f1)

式中,d為1至200的整數,e為0至2的整數,標註下標d或e並以括弧括起之各重複單元的存在順序於式中為任意; In the formula, d is an integer from 1 to 200, e is an integer from 0 to 2, and the order of the repetitive units marked with the subscript d or e and enclosed in parentheses is arbitrary;

-(OC4F8)c-(OC3F6)d-(OC2F4)e-(OCF2)f- (f2) -(OC 4 F 8 ) c -(OC 3 F 6 ) d -(OC 2 F 4 ) e -(OCF 2 ) f - (f2)

式中,c及d分別獨立地為0至30的整數, In the formula, c and d are independently integers ranging from 0 to 30.

e及f分別獨立地為1至200的整數, e and f are independently integers between 1 and 200.

c、d、e及f之和為10至200的整數, The sum of c, d, e, and f is an integer between 10 and 200.

標註下標c、d、e或f並以括弧括起之各重複單元的存在順序於式中為任意; The order of the repeated units marked with subscripts c, d, e or f and enclosed in brackets is arbitrary in the formula;

-(R6-R7)g-R9- (f3) -(R 6 -R 7 ) g -R 9 - (f3)

式中,R6為OCF2或OC2F4Wherein, R 6 is OCF 2 or OC 2 F 4 ,

R7為選自OC2F4、OC3F6、OC4F8、OC5F10及OC6F12之基,或為選自此等基之2或3個基的組合, R 7 is a group selected from OC 2 F 4 , OC 3 F 6 , OC 4 F 8 , OC 5 F 10 and OC 6 F 12 , or a combination of 2 or 3 groups selected from these groups,

R9為單鍵,或為選自OCF2、OC2F4、OC3F6、OC4F8、OC5F10及OC6F12之基, R 9 is a single bond, or is a group selected from OCF 2 , OC 2 F 4 , OC 3 F 6 , OC 4 F 8 , OC 5 F 10 and OC 6 F 12 ,

g為2至100的整數; g is an integer from 2 to 100;

-(R6-R7)g-Rr-(R7’-R6’)g’- (f4) -(R 6 -R 7 ) g -R r -(R 7' -R 6' ) g' - (f4)

式中,R6為OCF2或OC2F4Wherein, R 6 is OCF 2 or OC 2 F 4 ,

R7為選自OC2F4、OC3F6、OC4F8、OC5F10及OC6F12之基,或為獨立地選自此等基之2或3個基的組合, R 7 is a group selected from OC 2 F 4 , OC 3 F 6 , OC 4 F 8 , OC 5 F 10 and OC 6 F 12 , or a combination of 2 or 3 groups independently selected from these groups,

R6’為OCF2或OC2F4R 6' is OCF 2 or OC 2 F 4 ,

R7’為選自OC2F4、OC3F6、OC4F8、OC5F10及OC6F12之基,或為獨立地選自此等基之2或3個基的組合, R 7′ is a group selected from OC 2 F 4 , OC 3 F 6 , OC 4 F 8 , OC 5 F 10 and OC 6 F 12 , or a combination of two or three groups independently selected from these groups,

g為2至100的整數, g is an integer from 2 to 100.

g’為2至100的整數,Rr為如下列化學式所示者, g' is an integer from 2 to 100, and R r is as shown in the following chemical formula,

式中,*表示鍵結位置;-(OC6F12)a-(OC5F10)b-(OC4F8)c-(OC3F6)d-(OC2F4)e-(OCF2)f- (f5) Where * represents the bonding position; -(OC 6 F 12 ) a -(OC 5 F 10 ) b -(OC 4 F 8 ) c -(OC 3 F 6 ) d -(OC 2 F 4 ) e -(OCF 2 ) f - (f5)

式中,e為1以上200以下的整數,a、b、c、d及f分別獨立地為0以上200以下的整數,a、b、c、d、e及f之和至少為1,再者,標註a、b、c、d、e或f並以括弧括起之各重複單元的存在順序於式中為任意,-(OC6F12)a-(OC5F10)b-(OC4F8)c-(OC3F6)d-(OC2F4)e-(OCF2)f- (f6) In the formula, e is an integer from 1 to 200, a, b, c, d, and f are each independently an integer from 0 to 200, and the sum of a, b, c, d, e, and f is at least 1. Furthermore, the order of the repeating units labeled a, b, c, d, e, or f and enclosed in parentheses in the formula is arbitrary. -(OC 6 F 12 ) a -(OC 5 F 10 ) b -(OC 4 F 8 ) c -(OC 3 F 6 ) d -(OC 2 F 4 ) e -(OCF 2 ) f - (f6)

式中,f為1以上200以下的整數,a、b、c、d及e分別獨立地為0以上200以下的整數,a、b、c、d、e及f之和至少為1,再者,標註a、b、c、d、e或f並以括弧括起之各重複單元的存在順序於式中為任意。 In the formula, f is an integer from 1 to 200, a, b, c, d, and e are each independently an integer from 0 to 200, and the sum of a, b, c, d, e, and f is at least 1. Furthermore, the order of the repetitive units enclosed in parentheses and labeled a, b, c, d, e, or f in the formula is arbitrary.

[5]如上述[1]至[4]中任一項所述之化合物,其中,Rf2分別獨立地為C1-6全氟伸烷基。 [5] The compound as described in any one of [1] to [4] above, wherein Rf2 is independently a C1-6 perfluoroalkylene group.

[6]如上述[1]至[5]中任一項所述之化合物,其中,Ra分別獨立地為下述式所表示之基, [6] The compound according to any one of [1] to [5] above, wherein each of Ra is independently a group represented by the following formula:

-R9-(Ra’-R9)k- -R 9 -(R a '-R 9 ) k -

式中, In the formula,

R9分別獨立地為C1-6伸烷基, R 9 are each independently C 1-6 alkylene,

Ra’分別獨立地為3價有機基, R a' is independently a trivalent organic group,

k為1至4的整數。 k is an integer from 1 to 4.

[7]如上述[6]所述之化合物,其中,Ra’分別獨立地為含有N原子或O原子之3價有機基。 [7] The compound described in [6] above, wherein Ra ' is independently a trivalent organic group containing a N atom or an O atom.

[8]如上述[6]所述之化合物,其中,Ra’分別獨立地為可於碳-碳原子間含有胺基鍵、醯胺鍵、胺基甲酸酯鍵、脲鍵、醚鍵或酯鍵之3價有機基。 [8] The compound as described in [6] above, wherein Ra ' is independently a trivalent organic group which may contain an amine bond, an amide bond, a carbamate bond, a urea bond, an ether bond or an ester bond between carbon atoms.

[9]如上述[6]至[8]中任一項所述之化合物,其中,Ra’分別獨立地為下述基, [9] The compound according to any one of [6] to [8], wherein each of Ra ' is independently the following:

式中,R8為氫原子或C1-6烷基。 In the formula, R 8 is a hydrogen atom or a C 1-6 alkyl group.

[10]如上述[6]至[9]中任一項所述之化合物,其中,Ra’為N。 [10] The compound according to any one of [6] to [9] above, wherein Ra ' is N.

[11]如上述[6]至[10]中任一項所述之化合物,其中,k為1。 [11] The compound as described in any one of [6] to [10] above, wherein k is 1.

[12]如上述[6]至[10]中任一項所述之化合物,其中,k為2。 [12] The compound as described in any one of [6] to [10] above, wherein k is 2.

[13]如上述[1]至[12]中任一項所述之化合物,其中,至少1個Rb為RSi[13] The compound as described in any one of [1] to [12] above, wherein at least one R b is R Si .

[14]如上述[1]至[13]中任一項所述之化合物,其中,與位於各末端之N原子鍵結之Rb的1個為RSi,其他為Rc[14] The compound as described in any one of [1] to [13] above, wherein one of the R b groups bonded to the N atom at each terminal is R Si and the others are R c .

[15]如上述[1]至[13]中任一項所述之化合物,其中,與位於各末端之N原子鍵結之Rb的1個為RSi,其他為RAc[15] The compound as described in any one of [1] to [13] above, wherein one of the R b groups bonded to the N atom at each terminal is R Si and the others are R Ac .

[16]如上述[1]至[15]中任一項所述之化合物,其中,XC為: [16] The compound as described in any one of [1] to [15] above, wherein X C is:

C1-6伸烷基、 C 1-6 alkylene,

-(CH2)z1-O-(CH2)z2-(式中,z1為0至6的整數,z2為0至6的整數)、或 -(CH 2 ) z1 -O-(CH 2 ) z2 - (wherein z1 is an integer from 0 to 6, and z2 is an integer from 0 to 6), or

-(CH2)z3-伸苯基-(CH2)z4-(式中,z3為0至6的整數,z4為0至6的整數)。 -(CH 2 ) z 3 -phenylene-(CH 2 ) z 4 - (wherein z 3 is an integer from 0 to 6, and z 4 is an integer from 0 to 6).

[17]如上述[1]至[16]中任一項所述之化合物,其中,XC為C1-6伸烷基。 [17] The compound according to any one of [1] to [16] above, wherein X C is a C 1-6 alkylene group.

[18]如上述[1]至[17]中任一項所述之化合物,其中,n’為2或3。 [18] The compound as described in any one of [1] to [17] above, wherein n' is 2 or 3.

[19]如上述[1]至[18]中任一項所述之化合物,其中,n’為3。 [19] The compound as described in any one of [1] to [18] above, wherein n' is 3.

[20]如上述[1]至[19]中任一項所述之化合物,其中,XD為-O-、-CO-、-COO-、-OCO-、-CONH-、-NHCO-、-OCONH-、-NHCOO-、-NH-CO-NH-、-CH2CH(OH)CH2-或-CH(CH2OH)CH2-。 [20] The compound according to any one of [1] to [19] above, wherein X D is -O-, -CO-, -COO-, -OCO-, -CONH-, -NHCO-, -OCONH-, -NHCOO-, -NH-CO-NH-, -CH 2 CH(OH)CH 2 -, or -CH(CH 2 OH)CH 2 -.

[21]如上述[1]至[20]中任一項所述之化合物,其中,XD為-CONH-、-CH2CH(OH)CH2-或-CH(CH2OH)CH2-。 [21] The compound according to any one of [1] to [20] above, wherein X D is -CONH-, -CH 2 CH(OH)CH 2 -, or -CH(CH 2 OH)CH 2 -.

[22]如上述[1]至[21]中任一項所述之化合物,其中,XD為-CONH-。 [22] The compound according to any one of [1] to [21] above, wherein X D is -CONH-.

[23]如上述[1]至[22]中任一項所述之化合物,其中,XE為單鍵。 [23] The compound as described in any one of [1] to [22] above, wherein X E is a single bond.

[24]如上述[1]至[23]中任一項所述之化合物,其中,XE為-XG-XH[24] The compound as described in any one of [1] to [23] above, wherein X E is -X G -X H ,

XG為: X G is:

單鍵、 Single key,

C1-6伸烷基、 C 1-6 alkylene,

-(CH2)z9-O-(CH2)z10-(式中,z9為0至6的整數,z10為0至6的整數)、或 -(CH 2 ) z9 -O-(CH 2 ) z10 -(wherein z9 is an integer from 0 to 6, and z10 is an integer from 0 to 6), or

-(CH2)z11-伸苯基-(CH2)z12-(式中,z11為0至6的整數,z12為0至6的整數), -(CH 2 ) z11 -phenylene-(CH 2 ) z12 - (wherein z11 is an integer from 0 to 6, and z12 is an integer from 0 to 6),

XH為如下列化學式所示者, XH is represented by the following chemical formula,

R8為氫原子或C1-6烷基。 R8 is a hydrogen atom or a C1-6 alkyl group.

[25]如上述[1]至[24]中任一項所述之化合物,其中,XF為: [25] The compound as described in any one of [1] to [24] above, wherein X F is:

C1-6伸烷基、 C 1-6 alkylene,

-(CH2)z5-O-(CH2)z6-(式中,z5為0至6的整數,z6為0至6的整數)、或 -(CH 2 ) z5 -O-(CH 2 ) z6 - (wherein z5 is an integer from 0 to 6, and z6 is an integer from 0 to 6), or

-(CH2)z7-伸苯基-(CH2)z8-(式中,z7為0至6的整數,z8為0至6的整數)。 -(CH 2 ) z7 -phenylene-(CH 2 ) z8 - (wherein z7 is an integer from 0 to 6, and z8 is an integer from 0 to 6).

[26]如上述[1]至[25]中任一項所述之化合物,其中,Rc分別獨立地為氫原子或C1-6烷基。 [26] The compound as described in any one of [1] to [25] above, wherein R c is independently a hydrogen atom or a C 1-6 alkyl group.

[27]如上述[1]至[26]中任一項所述之化合物,其中,Rd分別獨立地為單鍵或-(CH2)z17-NR10-(CH2)z18-(式中,R10為氫原子或C1-6烷基,z17為0至6的整數,z18為0至6的整數)。 [27] The compound as described in any one of [1] to [26] above, wherein R d is independently a single bond or -(CH 2 ) z17 -NR 10 -(CH 2 ) z18 - (wherein R 10 is a hydrogen atom or a C 1-6 alkyl group, z17 is an integer from 0 to 6, and z18 is an integer from 0 to 6).

[28]如上述[1]至[27]中任一項所述之化合物,其中,x為1以上5以下的整數。 [28] The compound as described in any one of [1] to [27] above, wherein x is an integer of 1 to 5.

[29]一種表面處理劑,係含有上述[1]至[28]中任一項所述之化合物。 [29] A surface treatment agent containing the compound described in any one of [1] to [28] above.

[30]如上述[29]所述之表面處理劑,其係更含有選自含氟油、聚矽氧油及觸媒之1種以上的其他成分。 [30] The surface treatment agent as described in [29] above further contains one or more other components selected from fluorinated oil, silicone oil and catalyst.

[31]如上述[29]或[30]所述之表面處理劑,其係作為防污性塗佈劑或防水性塗佈劑使用。 [31] The surface treatment agent as described in [29] or [30] above, which is used as an antifouling coating agent or a water-repellent coating agent.

[32]一種物品,係包含基材、以及由上述[1]至[28]中任一項所述之化合物或上述[29]至[31]中任一項所述之表面處理劑形成於該基材的表面上之層。 [32] An article comprising a substrate and a layer formed on the surface of the substrate by the compound described in any one of [1] to [28] or the surface treatment agent described in any one of [29] to [31].

根據本揭示,可提供一種能夠提供優異耐久性之表面處理層的含氟聚醚基之丙烯酸化合物。 According to the present disclosure, a fluoropolyether-based acrylic compound capable of providing a surface treatment layer with excellent durability can be provided.

在本說明書使用時,「一價有機基」意指含有碳之一價基。一價有機基並無特別限定,可為烴基或其衍生物。所謂烴基的衍生物,意指於烴基的末端或分子鏈中具有1個以上的N、O、S、Si、醯胺、磺醯基、矽氧烷、羰基、羰氧基等基。此外,在僅表示為「有機基」時,意指一價有機基。再者,所謂「二價有機基」意指含有碳之二價基。該二價有機基並無特別限定,可列舉從有機基進一步使1個氫原子脫離而成之二價基。 As used in this specification, a "monovalent organic group" refers to a univalent group containing carbon. Monovalent organic groups are not particularly limited and may be alkyl groups or their derivatives. Alkyl group derivatives include groups having one or more N, O, S, Si, amide, sulfonyl, siloxane, carbonyl, or carbonyloxy groups at the end of the alkyl group or within the molecular chain. Furthermore, when simply referring to an "organic group," it refers to a monovalent organic group. Furthermore, a "divalent organic group" refers to a divalent group containing carbon. These divalent organic groups are not particularly limited and may include divalent groups formed by removing a hydrogen atom from an organic group.

在本說明書使用時,所謂「烴基」意指含有碳及氫之基且從烴進一步使1個氫原子脫離而成之基。該烴基並無特別限定,可列舉可經1個以上的取代基取代之C1-20烴基,例如脂肪族烴基、芳香族烴基等。上述「脂肪族烴基」可為直鏈狀、分枝鏈狀及環狀中任一者,亦可為飽和及不飽和中任一者。再者,烴基可含有1個以上的環結構。 As used herein, the term "alkyl" refers to a group containing carbon and hydrogen, formed by removing one hydrogen atom from a hydrocarbon. The alkyl group is not particularly limited and includes C 1-20 alkyl groups that may be substituted with one or more substituents, such as aliphatic alkyl groups and aromatic alkyl groups. The aforementioned "aliphatic alkyl groups" may be linear, branched, or cyclic, and may be saturated or unsaturated. Furthermore, the alkyl group may contain one or more ring structures.

在本說明書使用時,「烴基」的取代基並無特別限定,可列舉例如:選自鹵素原子;可經1個以上的鹵素原子所取代之C1-6烷基、C2-6烯基、C2-6炔基、C3-10環烷基、C3-10不飽和環烷基、5至10員雜環基、5至10員不飽和雜環基、C6-10芳基及5至10員雜芳基中之1個以上的基。 As used herein, the substituents of "alkyl" are not particularly limited and include, for example, halogen atoms; one or more groups selected from the group consisting of C1-6 alkyl groups, C2-6 alkenyl groups, C2-6 alkynyl groups, C3-10 cycloalkyl groups, C3-10 unsaturated cycloalkyl groups, 5-10 membered heterocyclic groups, 5-10 membered unsaturated heterocyclic groups, C6-10 aryl groups, and 5-10 membered heteroaryl groups which may be substituted with one or more halogen atoms.

於本說明書中所謂「水解性基」意指可接受水解反應之基,亦即,藉由水解反應可從化合物的主骨架脫離之基。水解性基之例子可列舉:-ORh、-OCORh、-O-N=CRh 2、-NRh 2、-NHRh、鹵素等,於此等式中,Rh表示取代或未取代的C1-4烷基。 As used herein, a "hydrolyzable group" refers to a group that is susceptible to hydrolysis, that is, a group that can be detached from the main structure of a compound by hydrolysis. Examples of hydrolyzable groups include -OR h , -OCOR h , -ON=CR h 2 , -NR h 2 , -NHR h , and halogens. In these formulas, R h represents a substituted or unsubstituted C 1-4 alkyl group.

本揭示之含氟聚醚基之丙烯酸化合物為下述式(1)所表示之含氟聚醚基之丙烯酸化合物, The fluorinated polyether group-containing acrylic compound disclosed herein is a fluorinated polyether group-containing acrylic compound represented by the following formula (1):

Rb 2N-Rd-CO-(RF2-CO-NRc-Ra(RAc m)-NRc-CO)x-RF2-CO-Rd-NRb 2 (1) R b 2 NR d -CO-(R F2 -CO-NR c -R a (R Ac m )-NR c -CO) x -R F2 -CO-R d -NR b 2 (1)

式中, In the formula,

RF2分別獨立地為-Rf2 p-RF-Oq-, RF2 is independently -Rf2p - RF - Oq- ,

Rf2為可經1個以上的氟原子取代之C1-6伸烷基, Rf2 is a C1-6 alkylene group which may be substituted by one or more fluorine atoms,

RF為二價氟聚醚基, RF is a divalent fluoropolyether group,

p為0或1, p is 0 or 1,

q為0或1, q is 0 or 1,

Ra分別獨立地為(m+2)價有機基, R a are each independently an (m+2)-valent organic group,

m為1至4的整數, m is an integer from 1 to 4,

Rb分別獨立地為RSi、RAc或RcR b is independently R Si , R Ac or R c ,

RSi分別獨立地為-XC-SiR1 n’R2 3-n’R Si are independently -X C -SiR 1 n' R 2 3-n' ,

XC為碳數1至10的二價有機基, X C is a divalent organic group having 1 to 10 carbon atoms,

R1分別獨立地為羥基或水解性基, R 1 is independently a hydroxyl group or a hydrolyzable group,

R2分別獨立地為氫原子或一價有機基, R2 are each independently a hydrogen atom or a monovalent organic group,

n’為1至3的整數, n’ is an integer from 1 to 3,

RAc分別獨立地為-XD-XE(-XF-OCO-CR5=CH2)m’R Ac are each independently -X D -X E (-X F -OCO-CR 5 ═CH 2 ) m' ,

XD為二價有機基, X D is a divalent organic group,

XE為單鍵或(m’+1)價基, X E is a single bond or (m'+1) valence base,

XF分別獨立地為碳數1至10的二價有機基, X and F are each independently a divalent organic group having 1 to 10 carbon atoms,

R5為氫原子或碳數1至8的一價有機基, R5 is a hydrogen atom or a monovalent organic group having 1 to 8 carbon atoms,

m’為1至10的整數, m’ is an integer from 1 to 10,

Rc分別獨立地為氫原子或C1-6烷基, R c are each independently a hydrogen atom or a C 1-6 alkyl group,

Rd分別獨立地為單鍵或二價有機基, R d are each independently a single bond or a divalent organic group,

x為1以上的整數。 x is an integer greater than 1.

於上述式(1)中,RF2為-Rf2 p-RF-Oq-。 In the above formula (1), RF2 is -Rf2p - RF - Oq- .

於上述式中,Rf2為可經1個以上的氟原子取代之C1-6伸烷基。 In the above formula, Rf2 is a C1-6 alkylene group which may be substituted with one or more fluorine atoms.

上述可經1個以上的氟原子取代之C1-6伸烷基中的「C1-6伸烷基」可為直鏈或分枝鏈,較佳為直鏈或分枝鏈的C1-3伸烷基,更佳為直鏈的C1-3伸烷基。 The "C 1-6 alkylene" in the aforementioned C 1-6 alkylene group which may be substituted with one or more fluorine atoms may be a linear or branched chain, preferably a linear or branched chain C 1-3 alkylene group, and more preferably a linear chain C 1-3 alkylene group.

上述Rf2較佳為經1個以上的氟原子取代之C1-6伸烷基,更佳為C1-6全氟伸烷基,更佳為C1-3全氟伸烷基。 The above-mentioned Rf2 is preferably a C1-6 alkylene group substituted with one or more fluorine atoms, more preferably a C1-6 perfluoroalkylene group, and even more preferably a C1-3 perfluoroalkylene group.

上述C1-6全氟伸烷基可為直鏈或分枝鏈,較佳為直鏈或分枝鏈的C1-3全氟伸烷基,更佳為直鏈的C1-3全氟烷基,具體為-CF2-、-CF2CF2-或-CF2CF2CF2-。 The C 1-6 perfluoroalkylene group may be a linear or branched chain, preferably a linear or branched C 1-3 perfluoroalkylene group, more preferably a linear C 1-3 perfluoroalkylene group, specifically -CF 2 -, -CF 2 CF 2 -, or -CF 2 CF 2 CF 2 -.

於上述式中,p為0或1。於一態樣中,p為0。於其他態樣中,p為1。 In the above formula, p is 0 or 1. In one embodiment, p is 0. In another embodiment, p is 1.

於上述式中,q分別獨立地為0或1。於一態樣中,q為0。於其他態樣中,q為1。 In the above formula, q is independently 0 or 1. In one embodiment, q is 0. In another embodiment, q is 1.

於上述式(1)中,RF分別獨立地為二價氟聚醚基。 In the above formula (1), R and F are each independently a divalent fluoropolyether group.

RF較佳係可含有下述式所表示之基, RF may preferably contain a group represented by the following formula:

-(OCH1RFa 2h1)h3-(OCH2RFa 2h2-2)h4- -(OCH 1 R Fa 2h1 ) h3 -(OCH 2 R Fa 2h2-2 ) h4 -

式中, In the formula,

RFa於每次出現中分別獨立地為氫原子、氟原子或氯原子, R Fa is independently at each occurrence a hydrogen atom, a fluorine atom, or a chlorine atom,

h1為1至6的整數, h1 is an integer from 1 to 6.

h2為4至8的整數, h2 is an integer from 4 to 8.

h3為0以上的整數, h3 is an integer greater than 0.

h4為0以上的整數, h4 is an integer greater than 0.

惟,h3與h4之合成為1以上,較佳為2以上,更佳為5以上,標註h3及h4並以括弧括起之各重複單元的存在順序於式中為任意。 However, the sum of h3 and h4 is 1 or greater, preferably 2 or greater, and more preferably 5 or greater. The order of the repetitive units marked with h3 and h4 and enclosed in parentheses in the formula is arbitrary.

於一態樣中,RF可為直鏈狀或分枝鏈狀。RF較佳為下式所表示之基: In one embodiment, RF can be a linear chain or a branched chain. RF is preferably a group represented by the following formula:

-(OC6F12)a-(OC5F10)b-(OC4F8)c-(OC3RFa 6)d-(OC2F4)e-(OCF2)f- -(OC 6 F 12 ) a -(OC 5 F 10 ) b -(OC 4 F 8 ) c -(OC 3 R Fa 6 ) d -(OC 2 F 4 ) e -(OCF 2 ) f -

式中,RFa分別獨立地為氫原子、氟原子或氯原子, Wherein, R Fa are independently a hydrogen atom, a fluorine atom or a chlorine atom,

a、b、c、d、e及f分別獨立地為0至200的整數,a、b、c、d、e及f之和為1以上;標註a、b、c、d、e或f並以括弧括起之各重複單元的存在順序於式中為任意。惟,於所有的RFa皆為氫原子或氯原子時,a、b、c、e及f的至少1個為1以上。 a, b, c, d, e, and f are each independently an integer from 0 to 200, and the sum of a, b, c, d, e, and f is 1 or greater. The order of the repeating units enclosed in parentheses and labeled a, b, c, d, e, or f in the formula is arbitrary. However, when all R Fa are hydrogen atoms or chlorine atoms, at least one of a, b, c, e, and f is 1 or greater.

RFa較佳為氫原子或氟原子,更佳為氟原子。惟,於所有的RFa皆為氫原子或氯原子時,a、b、c、e及f的至少1個為1以上。 R Fa is preferably a hydrogen atom or a fluorine atom, more preferably a fluorine atom. However, when all R Fa are hydrogen atoms or chlorine atoms, at least one of a, b, c, e, and f is 1 or more.

a、b、c、d、e及f較佳可分別獨立地為0至100的整數。 Preferably, a, b, c, d, e, and f can each independently be an integer between 0 and 100.

a、b、c、d、e及f之和較佳為5以上,更佳為10以上,例如可為15以上或20以上。a、b、c、d、e及f之和較佳為200以下,更佳為100以下,更佳為60以下,例如可為50以下或30以下。 The sum of a, b, c, d, e, and f is preferably 5 or more, more preferably 10 or more, for example, 15 or more or 20 or more. The sum of a, b, c, d, e, and f is preferably 200 or less, more preferably 100 or less, and even more preferably 60 or less, for example, 50 or less or 30 or less.

此等重複單元可為直鏈狀或分枝鏈狀。例如,-(OC6F12)-可為-(OCF2CF2CF2CF2CF2CF2)-、-(OCF(CF3)CF2CF2CF2CF2)-、-(OCF2CF(CF3)CF2CF2CF2)-、-(OCF2CF2CF(CF3)CF2CF2)-、-(OCF2CF2CF2CF(CF3)CF2)-、-(OCF2CF2CF2CF2CF(CF3))-等。-(OC5F10)-可為-(OCF2CF2CF2CF2CF2)-、-(OCF(CF3)CF2CF2CF2)-、-(OCF2CF(CF3)CF2CF2)-、-(OCF2CF2CF(CF3)CF2)-、-(OCF2CF2CF2CF(CF3))-等。-(OC4F8)-可為-(OCF2CF2CF2 CF2)-、-(OCF(CF3)CF2CF2)-、-(OCF2CF(CF3)CF2)-、-(OCF2CF2CF(CF3))-、-(OC(CF3)2CF2)-、-(OCF2C(CF3)2)-、-(OCF(CF3)CF(CF3))-、-(OCF(C2F5)CF2)-及-(OCF2CF(C2F5))-中任一者。-(OC3F6)-(亦即,上述式中,RFa為氟原子)可為-(OCF2CF2CF2)-、-(OCF(CF3)CF2)-及-(OCF2CF(CF3))-中任一者。-(OC2F4)-可為-(OCF2CF2)-及-(OCF(CF3))-中任一者。 These repeating units can be in the form of linear chains or branched chains. For example , - ( OC6F12 )- can be -( OCF2CF2CF2CF2CF2CF2CF2CF2 )-, -(OCF( CF3 ) CF2CF2CF2CF2CF2CF2 ) -, -( OCF2CF ( CF3 )CF2CF2CF2CF2 ) - , -( OCF2CF2CF ( CF3 ) CF2CF2CF2 )-, -( OCF2CF2CF ( CF3 ) CF2CF2CF2 )-, -(OCF2CF2CF2CF2CF( CF3 ) CF2CF2 )-, -( OCF2CF2CF2CF2CF ( CF3 ) CF2 )- , - ( OCF2CF2CF2CF2CF( CF3 ) CF2 ) -, etc. -(OC 5 F 10 )- can be -(OCF 2 CF 2 CF 2 CF 2 CF 2 )-, -(OCF(CF 3 )CF 2 CF 2 CF 2 )-, -(OCF 2 CF(CF 3 )CF 2 CF 2 )-, -(OCF 2 CF 2 CF(CF 3 )CF 2 )-, -(OCF 2 CF 2 CF 2 CF(CF 3 ))-etc. -(OC 4 F 8 )-can be -(OCF 2 CF 2 CF 2 CF 2 )-, -(OCF(CF 3 )CF 2 CF 2 )-, -(OCF 2 CF(CF 3 )CF 2 )-, -(OCF 2 CF 2 CF(CF 3 ))-, -(OC(CF 3 ) 2 CF 2 )-, -(OCF 2 C(CF 3 ) 2 )-, -(OCF(CF 3 )CF(CF 3 ))-, -(OCF(C 2 F 5 )CF 2 )-, and -(OCF 2 CF(C 2 F 5 ))-. -(OC 3 F 6 )- (that is, in the above formula, R Fa is a fluorine atom) can be any of -(OCF 2 CF 2 CF 2 )-, -(OCF(CF 3 )CF 2 )-, and -(OCF 2 CF(CF 3 ))-. -(OC 2 F 4 )- can be any of -(OCF 2 CF 2 )- and -(OCF(CF 3 ))-.

於一態樣中,上述重複單元為直鏈狀。藉由將上述重複單元設為直鏈狀,可提升表面處理層的表面平滑性、磨耗耐久性等。 In one embodiment, the repeating units are arranged in a linear chain. This arrangement improves the surface smoothness and wear resistance of the surface treatment layer.

於一態樣中,上述重複單元為分枝鏈狀。藉由將上述重複單元設為分枝鏈狀,可增大表面處理層的動摩擦係數。 In one embodiment, the repeating units are in a branched chain shape. By configuring the repeating units in a branched chain shape, the dynamic friction coefficient of the surface treatment layer can be increased.

於一態樣中,RF可含有環結構。 In one aspect, RF may contain a ring structure.

上述環結構可為下述三員環、四員環、五員環或六員環。 The above-mentioned ring structure can be a three-membered ring, a four-membered ring, a five-membered ring, or a six-membered ring.

式中,*表示鍵結位置。 In the formula, * represents the bond position.

上述環結構較佳為四員環、五員環或六員環,更佳可為四員環或六員環。 The above-mentioned ring structure is preferably a four-membered ring, a five-membered ring, or a six-membered ring, and more preferably a four-membered ring or a six-membered ring.

具有環結構之重複單元較佳可為下述單元。 The repeating unit having a ring structure may preferably be the following unit.

式中,*表示鍵結位置。 In the formula, * represents the bond position.

於一態樣中,RF分別獨立地為下述式(f1)至(f6)中任一式所表示之基。 In one embodiment, R and F are each independently a group represented by any one of the following formulae (f1) to (f6).

-(OC3F6)d-(OC2F4)e- (f1) -(OC 3 F 6 ) d -(OC 2 F 4 ) e - (f1)

式中,d為1至200的整數,e為0至2的整數,標註下標d或e並以括弧括起之各重複單元的存在順序於式中為任意; In the formula, d is an integer from 1 to 200, e is an integer from 0 to 2, and the order of the repetitive units marked with the subscript d or e and enclosed in parentheses is arbitrary;

-(OC4F8)c-(OC3F6)d-(OC2F4)e-(OCF2)f- (f2) -(OC 4 F 8 ) c -(OC 3 F 6 ) d -(OC 2 F 4 ) e -(OCF 2 ) f - (f2)

式中,c及d分別獨立地為0至30的整數,e及f分別獨立地為1至200的整數, In the formula, c and d are independently integers from 0 to 30, e and f are independently integers from 1 to 200,

c、d、e及f之和為2以上, The sum of c, d, e, and f is greater than 2.

標註下標c、d、e或f並以括弧括起之各重複單元的存在順序於式中為任意; The order of the repeated units marked with subscripts c, d, e or f and enclosed in brackets is arbitrary in the formula;

-(R6-R7)g-R9- (f3) -(R 6 -R 7 ) g -R 9 - (f3)

式中,R6為OCF2或OC2F4Wherein, R 6 is OCF 2 or OC 2 F 4 ,

R7為選自OC2F4、OC3F6、OC4F8、OC5F10及OC6F12之基,或為獨立地選自此等基之2或3個基的組合, R 7 is a group selected from OC 2 F 4 , OC 3 F 6 , OC 4 F 8 , OC 5 F 10 and OC 6 F 12 , or a combination of 2 or 3 groups independently selected from these groups,

R9為單鍵,或為選自OCF2、OC2F4、OC3F6、OC4F8、OC5F10及OC6F12之基, R 9 is a single bond, or is a group selected from OCF 2 , OC 2 F 4 , OC 3 F 6 , OC 4 F 8 , OC 5 F 10 and OC 6 F 12 ,

g為2至100的整數; g is an integer between 2 and 100;

-(R6-R7)g-Rr-(R7’-R6’)g’- (f4) -(R 6 -R 7 ) g -R r -(R 7' -R 6' ) g' - (f4)

式中,R6為OCF2或OC2F4Wherein, R 6 is OCF 2 or OC 2 F 4 ,

R7為選自OC2F4、OC3F6、OC4F8、OC5F10及OC6F12之基,或為獨立地選自此等基之2或3個基的組合, R 7 is a group selected from OC 2 F 4 , OC 3 F 6 , OC 4 F 8 , OC 5 F 10 and OC 6 F 12 , or a combination of 2 or 3 groups independently selected from these groups,

R6’為OCF2或OC2F4R 6' is OCF 2 or OC 2 F 4 ,

R7’為選自OC2F4、OC3F6、OC4F8、OC5F10及OC6F12之基,或為獨立地選自此等基之2或3個基的組合, R 7′ is a group selected from OC 2 F 4 , OC 3 F 6 , OC 4 F 8 , OC 5 F 10 and OC 6 F 12 , or a combination of two or three groups independently selected from these groups,

g為2至100的整數, g is an integer from 2 to 100.

g’為2至100的整數, g’ is an integer from 2 to 100.

Rr為如下列化學式所示者: R r is represented by the following chemical formula:

式中,*表示鍵結位置; In the formula, * represents the bond position;

-(OC6F12)a-(OC5F10)b-(OC4F8)c-(OC3F6)d-(OC2F4)e-(OCF2)f- (f5) -(OC 6 F 12 ) a -(OC 5 F 10 ) b -(OC 4 F 8 ) c -(OC 3 F 6 ) d -(OC 2 F 4 ) e -(OCF 2 ) f - (f5)

式中,e為1以上200以下的整數,a、b、c、d及f分別獨立地為0以上200以下的整數,再者,標註a、b、c、d、e或f並以括弧括起之各重複單元的存在順序於式中為任意; In the formula, e is an integer from 1 to 200, and a, b, c, d, and f are each independently an integer from 0 to 200. Furthermore, the order of the repetitive units enclosed in parentheses and labeled a, b, c, d, e, or f is arbitrary in the formula;

-(OC6F12)a-(OC5F10)b-(OC4F8)c-(OC3F6)d-(OC2F4)e-(OCF2)f- (f6) -(OC 6 F 12 ) a -(OC 5 F 10 ) b -(OC 4 F 8 ) c -(OC 3 F 6 ) d -(OC 2 F 4 ) e -(OCF 2 ) f - (f6)

式中,f為1以上200以下的整數,a、b、c、d及e分別獨立地為0以上200以下的整數,再者,標註a、b、c、d、e或f並以括弧括起之各重複單元的存在順序於式中為任意。 In the formula, f is an integer from 1 to 200, and a, b, c, d, and e are each independently an integer from 0 to 200. Furthermore, the order of the repetitive units enclosed in parentheses and labeled a, b, c, d, e, or f is arbitrary.

於上述式(f1)中,d較佳為5至200,更佳為10至100,更佳為15至50,例如為25至35的整數。於一態樣中,e為1。於其他態樣 中,e為0。於另外態樣中,e為2。於一態樣中,上述式(f1)為以-(OCF2CF2CF2)d-(OCF2CF2)e-或-(OCF(CF3)CF2)d-(OCF(CF3))e-所表示之基。於其他態樣中,上述式(f1)為以-(OC3F6)d1-(OC2F4)e1-(OC3F6)d2-(OC2F4)e2-所表示之基(式中,d1及d2分別獨立地為1至200的整數,d1與d2之合計為200以下,e1及e2分別獨立地為0或1)。 In the above formula (f1), d is preferably 5 to 200, more preferably 10 to 100, and even more preferably 15 to 50, for example, an integer of 25 to 35. In one embodiment, e is 1. In another embodiment, e is 0. In another embodiment, e is 2. In one embodiment, the above formula ( f1 ) is a group represented by - ( OCF2CF2CF2 ) d- ( OCF2CF2 ) e- or -(OCF( CF3 ) CF2 ) d- (OCF( CF3 )) e- . In another embodiment, the above formula (f1) is a group represented by -(OC 3 F 6 ) d1 -(OC 2 F 4 ) e1 -(OC 3 F 6 ) d2 -(OC 2 F 4 ) e2 - (wherein d1 and d2 are each independently an integer from 1 to 200, the total of d1 and d2 is not more than 200, and e1 and e2 are each independently 0 or 1).

於一態樣中,式(f1)為-(OCF2CF2CF2)d-(OCF2CF2)e-,較佳為-(OCF2CF2CF2)d-(OCF2CF2)-。 In one embodiment, formula (f1) is -(OCF 2 CF 2 CF 2 ) d -(OCF 2 CF 2 ) e -, preferably -(OCF 2 CF 2 CF 2 ) d -(OCF 2 CF 2 )-.

於其他態樣中,式(f1)為以-(OCF(CF3)CF2)d-(OCF(CF3))e-所表示之基,較佳為-(OCF(CF3)CF2)d-(OCF(CF3))-。 In another embodiment, formula (f1) is a group represented by -(OCF(CF 3 )CF 2 ) d -(OCF(CF 3 )) e -, preferably -(OCF(CF 3 )CF 2 ) d -(OCF(CF 3 ))-.

於其他態樣中,式(f1)為-(OC3F6)d1-(OC2F4)e1-(OC3F6)d2-(OC2F4)e2-,較佳為-(OC3F6)d1-(OC2F4)-(OC3F6)d2-(OC2F4),更佳為-(OCF(CF3)CF2)d1-(OCF2CF2)-(OCF(CF3)CF2)d2-(OCF(CF3))-。 In other aspects, formula (f1) is -(OC 3 F 6 ) d1 -(OC 2 F 4 ) e1 -(OC 3 F 6 ) d2 -(OC 2 F 4 ) e2 -, preferably -(OC 3 F 6 ) d1 -(OC 2 F 4 )-(OC 3 F 6 ) d2 -(OC 2 F 4 ), and more preferably -(OCF(CF 3 )CF 2 ) d1 -(OCF 2 CF 2 )-(OCF(CF 3 )CF 2 ) d2 -(OCF(CF 3 ))-.

於上述式(f2)中,e及f較佳係分別獨立地為5至200,更佳為10至200的整數。再者,c、d、e及f之和較佳為5以上,更佳為10以上,例如可為15以上或20以上。於一態樣中,上述式(f2)較佳為以-(OCF2CF2CF2CF2)c-(OCF2CF2CF2)d-(OCF2CF2)e-(OCF2)f-所表示之基。於其他態樣中,式(f2)可為以-(OC2F4)e-(OCF2)f-所表示之基。 In the above formula (f2), e and f are preferably each independently an integer of 5 to 200, more preferably an integer of 10 to 200. Furthermore, the sum of c, d, e, and f is preferably 5 or greater, more preferably 10 or greater, for example , 15 or greater or 20 or greater. In one embodiment, the above formula (f2) is preferably a group represented by -( OCF2CF2CF2CF2 ) c- ( OCF2CF2CF2 ) d- ( OCF2CF2 ) e- ( OCF2 ) f- . In another embodiment, the formula (f2) may be a group represented by - ( OC2F4 ) e- ( OCF2 ) f- .

於上述式(f3)中,R6較佳為OC2F4。於上述(f3)中,R7較佳為選自OC2F4、OC3F6及OC4F8之基,或為獨立地選自此等基之2或3個基的組合,更佳為選自OC3F6及OC4F8之基。獨立地選自OC2F4、OC3F6及OC4F8之2或3個基的組合並無特別限定,可列舉例如:-OC2F4OC3F6-、-OC2F4OC4F8-、-OC3F6OC2F4-、-OC3F6OC3F6-、-OC3F6OC4F8-、-OC4F8 OC4F8-、-OC4F8OC3F6-、-OC4F8OC2F4-、-OC2F4OC2F4OC3F6-、-OC2F4OC2F4OC4F8-、-OC2F4OC3F6OC2F4-、-OC2F4OC3F6OC3F6-、-OC2F4OC4F8OC2F4-、-OC3F6OC2F4OC2F4-、-OC3F6OC2F4OC3F6-、-OC3F6OC3F6OC2F4-及-OC4F8OC2F4OC2F4-等。於一態樣中,R9為單鍵。於其他態樣中,R9為選自OCF2、OC2F4、OC3F6、OC4F8、OC5F10及OC6F12之基。於上述式(f3)中,g較佳為3以上,更佳為5以上的整數。上述g較佳為50以下的整數。於上述式(f3)中,OC2F4、OC3F6、OC4F8、OC5F10及OC6F12可為直鏈或分枝鏈中任一種,較佳為直鏈。於此態樣中,上述(R6-R7)g較佳為-(OC2F4-OC3F6)g-或-(OC2F4-OC4F8)g-。 In the above formula (f3), R6 is preferably OC2F4 . In the above formula (f3 ) , R7 is preferably a group selected from OC2F4 , OC3F6 and OC4F8 , or a combination of two or three groups independently selected from these groups, more preferably a group selected from OC3F6 and OC4F8 . The combination of two or three groups independently selected from OC2F4 , OC3F6 , and OC4F8 is not particularly limited . Examples thereof include : -OC2F4OC3F6- , -OC2F4OC4F8- , -OC3F6OC2F4- , -OC3F6OC3F6- , -OC3F6OC4F8- , -OC4F8OC4F8- , -OC4F8OC3F6- , -OC4F8OC2F4- , -OC2F4OC2F4OC3F6- , -OC2F4OC2F4OC4F8- , -OC2F4OC3F6OC2F4 . -, -OC2F4OC3F6OC3F6- , -OC2F4OC4F8OC2F4- , -OC3F6OC2F4OC2F4- , -OC3F6OC2F4OC3F6- , -OC3F6OC3F6OC2F4- , and -OC4F8OC2F4OC2F4- . In one embodiment , R9 is a single bond. In another embodiment, R9 is a group selected from OCF2, OC2F4, OC3F6, OC4F8 , OC5F10 , and OC6F12 . In formula ( f3 ) , g is preferably 3 or greater , and more preferably an integer of 5 or greater . The g is preferably an integer less than 50. In formula (f3), OC2F4 , OC3F6 , OC4F8, OC5F10, and OC6F12 may be a straight chain or a branched chain, preferably a straight chain. In this embodiment, (R6-R7 ) g is preferably - ( OC2F4 - OC3F6 ) g- or - ( OC2F4 - OC4F8 ) g- .

於上述式(f4)中,R6、R7及g與上述式(f3)的記載為相同意義且具有同樣的態樣。R6’、R7’及g’分別與上述式(f3)所記載之R6、R7及g為相同意義且具有同樣的態樣。Rr較佳為如下列化學式所示者: In formula (f4), R 6 , R 7 , and g have the same meanings and the same configurations as those described in formula (f3). R 6 , R 7′ , and g′ have the same meanings and the same configurations as those described in formula (f3). R r is preferably represented by the following chemical formula:

式中,*表示鍵結位置; In the formula, * represents the bond position;

更佳為如下列化學式所示者: More preferably, it is represented by the following chemical formula:

式中,*表示鍵結位置。 In the formula, * represents the bond position.

於上述式(f5)中,e較佳為1以上100以下,更佳為5以上100以下的整數。a、b、c、d、e及f之和較佳為5以上,更佳為10以上,例如10以上100以下。 In the above formula (f5), e is preferably an integer greater than or equal to 1 and less than or equal to 100, more preferably an integer greater than or equal to 5 and less than or equal to 100. The sum of a, b, c, d, e, and f is preferably greater than or equal to 5, more preferably greater than or equal to 10, for example, greater than or equal to 10 and less than or equal to 100.

於上述式(f6)中,f較佳為1以上100以下,更佳為5以上100以下的整數。a、b、c、d、e及f之和較佳為5以上,更佳為10以上,例如10以上100以下。 In the above formula (f6), f is preferably an integer of 1 to 100, more preferably 5 to 100. The sum of a, b, c, d, e, and f is preferably 5 to 10, more preferably 10 to 100.

於一態樣中,上述RF為以上述式(f1)或(f2)所表示之基。 In one embodiment, the above-mentioned RF is a group represented by the above-mentioned formula (f1) or (f2).

於一態樣中,上述RF為以上述式(f1)所表示之基。 In one embodiment, the above-mentioned RF is a group represented by the above-mentioned formula (f1).

於一態樣中,上述RF為以上述式(f2)所表示之基。 In one embodiment, the above-mentioned RF is a group represented by the above-mentioned formula (f2).

於一態樣中,上述RF為以上述式(f3)所表示之基。 In one embodiment, the above-mentioned RF is a group represented by the above-mentioned formula (f3).

於一態樣中,上述RF為以上述式(f4)所表示之基。 In one embodiment, the above-mentioned RF is a group represented by the above-mentioned formula (f4).

於一態樣中,上述RF為以上述式(f5)所表示之基。 In one embodiment, the above-mentioned RF is a group represented by the above-mentioned formula (f5).

於一態樣中,上述RF為以上述式(f6)所表示之基。 In one embodiment, the above-mentioned RF is a group represented by the above-mentioned formula (f6).

於上述RF中,e相對於f之比(以下稱為「e/f比」)為0.1至10,較佳為0.2至5,更佳為0.2至2,更佳為0.2至1.5,再更佳為0.2至0.85。藉由將e/f比設為10以下,更為提升由此化合物所得到之表面處理層的平滑性、磨耗耐久性及耐化學性(例如相對於人工汗之耐久性)。e/f比 愈小,表面處理層的平滑性及磨耗耐久性愈提升。另一方面,藉由將e/f比設為0.1以上,可進一步提高化合物的穩定性。e/f比愈大,化合物的穩定性愈提升。 In the above RF , the ratio of e to f (hereinafter referred to as the "e/f ratio") is 0.1 to 10, preferably 0.2 to 5, more preferably 0.2 to 2, even more preferably 0.2 to 1.5, and even more preferably 0.2 to 0.85. By setting the e/f ratio to 10 or less, the smoothness, abrasion resistance, and chemical resistance (e.g., durability against artificial sweat) of the surface treatment layer obtained from this compound are further improved. The smaller the e/f ratio, the greater the improvement in the smoothness and abrasion resistance of the surface treatment layer. On the other hand, by setting the e/f ratio to 0.1 or greater, the stability of the compound can be further improved. The larger the e/f ratio, the greater the stability of the compound.

於一態樣中,上述e/f比較佳為0.2至0.95,更佳為0.2至0.9。 In one embodiment, the e/f ratio is preferably 0.2 to 0.95, more preferably 0.2 to 0.9.

於一態樣中,從耐熱性之觀點而言,上述e/f比較佳為1.0以上,更佳為1.0至2.0。 In one aspect, from the perspective of heat resistance, the e/f ratio is preferably 1.0 or greater, and more preferably 1.0 to 2.0.

於上述含氟聚醚基之丙烯酸化合物中,RF2部分的數量平均分子量並無特別限定,例如為500至30,000,較佳為1,500至30,000,更佳為2,000至10,000。於本說明書中,RF2的數量平均分子量係設為藉由19F-NMR所測得之值。 The number average molecular weight of the RF2 moiety in the fluoropolyether group-containing acrylic compound is not particularly limited, and is, for example, 500 to 30,000, preferably 1,500 to 30,000, and more preferably 2,000 to 10,000. In this specification, the number average molecular weight of RF2 is the value measured by 19 F-NMR.

於上述式(1)中,Ra分別獨立地為(m+2)價有機基。 In the above formula (1), Ra is independently an organic group with a valence of (m+2).

於一態樣中,Ra為下述式所表示之基: In one embodiment, Ra is a group represented by the following formula:

-R9-(Ra’-R9)k- -R 9 -(R a' -R 9 ) k -

式中: Where:

R9分別獨立地為C1-6伸烷基, R 9 are each independently C 1-6 alkylene,

Ra’分別獨立地為3價有機基, R a' is independently a trivalent organic group,

k為1至4的整數。 k is an integer from 1 to 4.

於該基中,R9較佳為C1-4伸烷基,更佳為C2-4伸烷基。 In this group, R 9 is preferably a C 1-4 alkylene group, more preferably a C 2-4 alkylene group.

於較佳態樣中,k為1至2的整數。 In a preferred embodiment, k is an integer between 1 and 2.

於一態樣中,k為1。 In one embodiment, k is 1.

於一態樣中,k為2。 In one embodiment, k is 2.

於一態樣中,Ra’分別獨立地為含有N原子或O原子之3價基。 In one embodiment, Ra ' is independently a trivalent group containing a N atom or an O atom.

於較佳態樣中,Ra’分別獨立地為可於碳-碳原子間含有胺基鍵、醯胺鍵、胺基甲酸酯鍵、脲鍵、醚鍵或酯鍵之3價有機基。 In a preferred embodiment, Ra ' is independently a trivalent organic group that may contain an amine bond, an amide bond, a urethane bond, a urea bond, an ether bond, or an ester bond between carbon atoms.

於一態樣中,Ra’分別獨立地為下述基: In one embodiment, Ra ' is independently the following:

式中,R8為氫原子或C1-6烷基(較佳為甲基或乙基,更佳為甲基)。上述-CR8(-O-)-的O與RAc鍵結。 In the formula, R 8 is a hydrogen atom or a C 1-6 alkyl group (preferably a methyl group or an ethyl group, more preferably a methyl group). The O in the above-CR 8 (-O-)- is bonded to R Ac .

於一態樣中,Ra’為N。 In one embodiment, Ra ' is N.

於一態樣中,Ra’為-CR8(-O-)-。 In one embodiment, Ra ' is -CR8 (-O-)-.

於上述式(1)中,m為1至4的整數。 In the above formula (1), m is an integer from 1 to 4.

於較佳態樣中,m為1或2。 In a preferred embodiment, m is 1 or 2.

於一態樣中,m為1。 In one embodiment, m is 1.

於一態樣中,m為2。 In one embodiment, m is 2.

於上述式(1)中,Rb分別獨立地為RSi、RAc、或RcIn the above formula (1), R b is independently R Si , R Ac , or R c .

上述式(1)中,至少1個Rb為RSiIn the above formula (1), at least one R b is R Si .

於較佳態樣中,與位於式(1)的各末端之N原子鍵結之Rb的至少1個為RSiIn a preferred embodiment, at least one of the R b groups bonded to the N atoms at each terminal of formula (1) is R Si .

於一態樣中,與位於式(1)的各末端之N原子鍵結之Rb的1個為RSi,其他為RcIn one embodiment, one of the R b groups bonded to the N atom at each terminal of formula (1) is R Si , and the others are R c .

於其他態樣中,與位於式(1)的各末端之N原子鍵結之Rb的1個為RSi,其他為RAcIn another embodiment, one of the R b groups bonded to the N atom at each terminal of formula (1) is R Si , and the others are R Ac .

上述RSi分別獨立地為-XC-SiR1 n’R2 3-n’The above R Si are each independently -X C -SiR 1 n' R 2 3-n' .

上述XC為碳數1至10的二價有機基。 The above-mentioned X C is a divalent organic group having 1 to 10 carbon atoms.

於一態樣中,XC為: In one embodiment, X C is:

C1-6伸烷基、-(CH2)z1-O-(CH2)z2-(式中,z1為0至6的整數,例如為1至6的整數,z2為0至6的整數,例如為1至6的整數)、或-(CH2)z3-伸苯基-(CH2)z4-(式中,z3為0至6的整數,例如為1至6的整數,z4為0至6的整數,例如為1至6的整數)。 C1-6 alkylene, -( CH2 ) z1 -O-( CH2 ) z2- (wherein z1 is an integer from 0 to 6, for example, an integer from 1 to 6, and z2 is an integer from 0 to 6, for example, an integer from 1 to 6), or -( CH2 ) z3 -phenylene-( CH2 ) z4- (wherein z3 is an integer from 0 to 6, for example, an integer from 1 to 6, and z4 is an integer from 0 to 6, for example, an integer from 1 to 6).

此等基可經選自例如氟原子、C1-6烷基、C2-6烯基及C2-6炔基中之1個以上的取代基所取代,惟較佳是未取代。此等基的右側與Si鍵結。 These groups may be substituted with one or more substituents selected from, for example, a fluorine atom, a C 1-6 alkyl group, a C 2-6 alkenyl group, and a C 2-6 alkynyl group, but are preferably unsubstituted. The right side of these groups is bonded to Si.

上述C1-6伸烷基可為直鏈或分枝鏈,較佳為直鏈。 The aforementioned C 1-6 alkylene group may be a straight chain or a branched chain, preferably a straight chain.

於較佳態樣中,XC為C1-6伸烷基,較佳為C2-4伸烷基。 In a preferred embodiment, X C is C 1-6 alkylene, more preferably C 2-4 alkylene.

上述R1分別獨立地為羥基或水解性基。 The above R 1s are each independently a hydroxyl group or a hydrolyzable group.

R1較佳係分別獨立地為水解性基。 Preferably, R 1 is independently a hydrolyzable group.

R1較佳係分別獨立地為-ORh、-OCORh、-O-N=CRh 2、-NRh 2、-NHRh、-NCO或鹵素(此等式中,Rh表示取代或未取代的C1-4烷基),更佳為-ORh(亦即烷氧基)。Rh可列舉:甲基、乙基、丙基、異丙基、正丁基、異丁基等未取代烷基;氯甲基等取代烷基。該等當中,較佳為烷基,尤其是未取代烷基,更佳為甲基或乙基。於一態樣中,Rh為甲基,於其他態樣中,Rh為乙基。 R 1 is preferably independently -OR h , -OCOR h , -ON═CR h 2 , -NR h 2 , -NHR h , -NCO, or a halogen (in this formula, R h represents a substituted or unsubstituted C 1-4 alkyl group), more preferably -OR h (i.e., an alkoxy group). R h can be exemplified by unsubstituted alkyl groups such as methyl, ethyl, propyl, isopropyl, n-butyl, and isobutyl; and substituted alkyl groups such as chloromethyl. Among these, alkyl groups are preferred, especially unsubstituted alkyl groups, and methyl or ethyl groups are more preferred. In one embodiment, R h is methyl, and in another embodiment, R h is ethyl.

上述R2分別獨立地為氫原子或一價有機基。該一價有機基為排除上述水解性基之一價有機基。 The above R 2 are each independently a hydrogen atom or a monovalent organic group. The monovalent organic group is a monovalent organic group excluding the above hydrolyzable group.

於R2中,一價有機基較佳為C1-20烷基,更佳為C1-6烷基,更佳為甲基。 In R 2 , the monovalent organic group is preferably a C 1-20 alkyl group, more preferably a C 1-6 alkyl group, and even more preferably a methyl group.

上述式中,n’於每個(SiR1 n’R2 3-n’)單元中分別獨立地為1至3的整數,較佳為2或3,更佳為3。 In the above formula, n' in each (SiR 1 n' R 2 3-n' ) unit is independently an integer from 1 to 3, preferably 2 or 3, and more preferably 3.

於上述式(1)中,RAc分別獨立地為-XD-XE(-XF-OCO-CR5=CH2)m’In the above formula (1), R Ac is independently -X D -X E (-X F -OCO-CR 5 ═CH 2 ) m' .

上述XD為二價有機基。 The above-mentioned XD is a divalent organic group.

XD較佳為-O-、-CO-、-COO-、-OCO-、-CONH-、-NHCO-、-OCONH-、-NHCOO-、-NH-CO-NH-、-CH2CH(OH)CH2-或-CH(CH2OH)CH2-,更佳為-CONH-、-CH2CH(OH)CH2-或-CH(CH2OH)CH2-,更佳為-CONH-。此等基的右側與XE鍵結。 XD is preferably -O-, -CO-, -COO-, -OCO-, -CONH-, -NHCO-, -OCONH-, -NHCOO-, -NH-CO-NH-, -CH2CH (OH) CH2- , or -CH( CH2OH ) CH2- , more preferably -CONH-, -CH2CH (OH) CH2- , or -CH( CH2OH ) CH2- , and even more preferably -CONH-. The right side of these groups is bonded to XE .

上述XE為單鍵或(m’+1)價基。 The above XE is a single bond or an (m'+1) valent group.

於一態樣中,XE為單鍵。 In one embodiment, X E is a single key.

於一態樣中,XE為以-XG-XH所表示之三或四價基, In one embodiment, XE is a trivalent or tetravalent group represented by -XG - XH .

XG為: X G is:

單鍵、 Single key,

C1-6伸烷基、 C 1-6 alkylene,

-(CH2)z9-O-(CH2)z10-(式中,z9為0至6的整數,例如為1至6的整數,z10為0至6的整數,例如為1至6的整數)、或 -(CH 2 ) z9 -O-(CH 2 ) z10 - (wherein z9 is an integer from 0 to 6, for example, an integer from 1 to 6, and z10 is an integer from 0 to 6, for example, an integer from 1 to 6), or

-(CH2)z11-伸苯基-(CH2)z12-(式中,z11為0至6的整數,例如為1至6的整數,z12為0至6的整數,例如為1至6的整數), -(CH 2 ) z11 -phenylene-(CH 2 ) z12 - (wherein z11 is an integer from 0 to 6, for example, an integer from 1 to 6, and z12 is an integer from 0 to 6, for example, an integer from 1 to 6),

XH為如下列化學式所示者: XH is represented by the following chemical formula:

R8為氫原子或C1-6烷基。 R8 is a hydrogen atom or a C1-6 alkyl group.

上述C1-6伸烷基可為直鏈或分枝鏈,較佳為直鏈。 The aforementioned C 1-6 alkylene group may be a straight chain or a branched chain, preferably a straight chain.

於較佳態樣中,上述C1-6伸烷基為C2-4伸烷基。 In a preferred embodiment, the aforementioned C 1-6 alkylene group is a C 2-4 alkylene group.

上述C1-6烷基較佳為C1-3烷基,更佳為甲基。 The aforementioned C 1-6 alkyl group is preferably a C 1-3 alkyl group, more preferably a methyl group.

上述XF分別獨立地為碳數1至10的二價有機基。 The above X and F are each independently a divalent organic group having 1 to 10 carbon atoms.

於一態樣中,XF為: In one embodiment, X F is:

C1-6伸烷基、 C 1-6 alkylene,

-(CH2)z5-O-(CH2)z6-(式中,z5為0至6的整數,例如為1至6的整數,z6為0至6的整數,例如為1至6的整數)、或 -(CH 2 ) z5 -O-(CH 2 ) z6 - (wherein z5 is an integer from 0 to 6, for example, an integer from 1 to 6, and z6 is an integer from 0 to 6, for example, an integer from 1 to 6), or

-(CH2)z7-伸苯基-(CH2)z8-(式中,z7為0至6的整數,例如為1至6的整數,z8為0至6的整數,例如為1至6的整數)。 -(CH 2 ) z7 -phenylene-(CH 2 ) z8 - (wherein z7 is an integer from 0 to 6, for example, an integer from 1 to 6, and z8 is an integer from 0 to 6, for example, an integer from 1 to 6).

此等基可經選自例如氟原子、C1-6烷基、C2-6烯基及C2-6炔基之1個以上的取代基所取代,惟較佳係未取代。此等基的左側與XE鍵結。 These groups may be substituted with one or more substituents selected from, for example, a fluorine atom, a C 1-6 alkyl group, a C 2-6 alkenyl group, and a C 2-6 alkynyl group, but are preferably unsubstituted. The left side of these groups is bonded to X E.

上述C1-6伸烷基可為直鏈或分枝鏈。於一態樣中,C1-6伸烷基為直鏈。於其他態樣中,C1-6伸烷基為分枝鏈。 The aforementioned C 1-6 alkylene group may be a straight chain or a branched chain. In one embodiment, the C 1-6 alkylene group is a straight chain. In another embodiment, the C 1-6 alkylene group is a branched chain.

於較佳態樣中,XF為C1-6伸烷基,較佳為C2-4伸烷基。 In a preferred embodiment, XF is a C 1-6 alkylene group, more preferably a C 2-4 alkylene group.

於其他較佳態樣中,XF為-O-(CH2)z6-,較佳為-O-(CH2)2-4-。 In other preferred embodiments, X F is -O-(CH 2 ) z 6 -, more preferably -O-(CH 2 ) 2-4 -.

上述R5為氫原子或碳數1至8的一價有機基。 The above R 5 is a hydrogen atom or a monovalent organic group having 1 to 8 carbon atoms.

上述一價有機基較佳為C1-8烷基、C3-8環烷基或C5-8芳基,更佳為C1-6烷基或苯基,更佳為C1-3烷基,特佳為甲基。 The monovalent organic group is preferably a C 1-8 alkyl group, a C 3-8 cycloalkyl group or a C 5-8 aryl group, more preferably a C 1-6 alkyl group or a phenyl group, even more preferably a C 1-3 alkyl group, and particularly preferably a methyl group.

於一態樣中,R5為氫原子。 In one embodiment, R 5 is a hydrogen atom.

於一態樣中,R5為甲基。 In one embodiment, R 5 is methyl.

上述m’為1至10的整數,較佳為1至3的整數,更佳為1。 The above m' is an integer from 1 to 10, preferably an integer from 1 to 3, and more preferably 1.

於較佳態樣中,RAc為-CONH-XF-OCO-CR5=CH2In a preferred embodiment, R Ac is -CONH-X F -OCO-CR 5 =CH 2 .

於上述式(1)中,Rc分別獨立地為氫原子或C1-6烷基。 In the above formula (1), R c is independently a hydrogen atom or a C 1-6 alkyl group.

上述C1-6烷基較佳為C1-3烷基,特佳為甲基。C1-6烷基可為直鏈或分枝鏈。 The C 1-6 alkyl group is preferably a C 1-3 alkyl group, particularly preferably a methyl group. The C 1-6 alkyl group may be a straight chain or a branched chain.

於一態樣中,Rc為氫原子。 In one embodiment, R c is a hydrogen atom.

於一態樣中,Rc為甲基。 In one embodiment, R c is methyl.

於上述式(1)中,Rd分別獨立地為單鍵或二價有機基。 In the above formula (1), R d is independently a single bond or a divalent organic group.

於一態樣中,Rd為單鍵。 In one aspect, Rd is a single bond.

於其他態樣中,Rd為二價有機基。 In other aspects, Rd is a divalent organic group.

Rd中的二價有機基為: The divalent organic group in R d is:

C1-10伸烷基,較佳為C2-6伸烷基、 C 1-10 alkylene, preferably C 2-6 alkylene,

-(CH2)z13-O-(CH2)z14-(式中,z13為0至6的整數,例如為1至6的整數,z14為0至6的整數,例如為1至6的整數)、 -(CH 2 ) z13 -O-(CH 2 ) z14 - (wherein z13 is an integer from 0 to 6, for example, an integer from 1 to 6, and z14 is an integer from 0 to 6, for example, an integer from 1 to 6),

-(CH2)z15-伸苯基-(CH2)z16-(式中,z15為0至6的整數,例如為1至 6的整數,z16為0至6的整數,例如為1至6的整數)、或 -(CH 2 ) z15 -phenylene-(CH 2 ) z16 - (wherein z15 is an integer from 0 to 6, for example, an integer from 1 to 6, and z16 is an integer from 0 to 6, for example, an integer from 1 to 6), or

-(CH2)z17-NR10-(CH2)z18-(式中,R10為氫原子或C1-6烷基,z17為0至6的整數,z18為0至6的整數)。此等基可經選自例如氟原子、C1-6烷基、C2-6烯基及C2-6炔基之1個以上的取代基所取代,惟較佳係未取代。此等基的左側與CO鍵結。 -(CH 2 ) z 17 -NR 10 -(CH 2 ) z 18 - (wherein R 10 is a hydrogen atom or a C 1-6 alkyl group, z 17 is an integer from 0 to 6, and z 18 is an integer from 0 to 6). These groups may be substituted with one or more substituents selected from, for example, a fluorine atom, a C 1-6 alkyl group, a C 2-6 alkenyl group, and a C 2-6 alkynyl group, but are preferably unsubstituted. The left side of these groups is bonded to CO.

Rd中的二價有機基較佳為-(CH2)z17-NR10-(CH2)z18-(式中,R10為氫原子或C1-6烷基,z17為0至6的整數,z18為0至6的整數),更佳為-NR10-(CH2)z18-(式中,R10為氫原子或C1-6烷基,z18為1至6的整數)。 The divalent organic group in R d is preferably -(CH 2 ) z17 -NR 10 -(CH 2 ) z18 - (wherein R 10 is a hydrogen atom or a C 1-6 alkyl group, z17 is an integer from 0 to 6, and z18 is an integer from 0 to 6), and more preferably -NR 10 -(CH 2 ) z18 - (wherein R 10 is a hydrogen atom or a C 1-6 alkyl group, and z18 is an integer from 1 to 6).

上述C1-10伸烷基可為直鏈或分枝鏈,較佳為直鏈。 The aforementioned C 1-10 alkylene group may be a straight chain or a branched chain, preferably a straight chain.

於上述式(1)中,x為1以上的整數。 In the above formula (1), x is an integer greater than 1.

於一態樣中,X較佳為1以上100以下的整數,更佳為1以上10以下的整數,更佳為1以上5以下的整數,例如為2以上10以下的整數,更佳為2以上5以下的整數。 In one embodiment, X is preferably an integer greater than or equal to 1 and less than or equal to 100, more preferably an integer greater than or equal to 1 and less than or equal to 10, and even more preferably an integer greater than or equal to 1 and less than or equal to 5, for example, an integer greater than or equal to 2 and less than or equal to 10, and even more preferably an integer greater than or equal to 2 and less than or equal to 5.

上述以式(1)所表示之含氟聚醚基之丙烯酸化合物並無特別限定,可具有5×102至2×105的數量平均分子量。於該範圍中,從磨耗耐久性之觀點而言,較佳為具有2×103至1×105,更佳為3×103至2×104的數量平均分子量。該「數量平均分子量」係設為藉由19F-NMR所測得之值。 The fluorinated polyether group-containing acrylic compound represented by formula (1) is not particularly limited and may have a number average molecular weight of 5×10 2 to 2×10 5 . Within this range, from the perspective of wear durability, it is preferably 2×10 3 to 1×10 5 , and more preferably 3×10 3 to 2×10 4 . The "number average molecular weight" is a value measured by 19 F-NMR.

於一態樣中,上述以式(1)所表示之含氟聚醚基之丙烯酸化合物係將下述式所表示之化合物, In one embodiment, the fluorinated polyether group-containing acrylic compound represented by formula (1) is a compound represented by the following formula,

R21OOC-RF2-COOR21 R 21 OOC-R F2 -COOR 21

[式中,R21為氫原子或甲基,RF2與關於式(1)之記載為相同意義] [In the formula, R21 is a hydrogen atom or a methyl group, and RF2 has the same meaning as described in formula (1)]

與下述化學式所表示之化合物進行反應, React with the compound represented by the following chemical formula,

NH2-R9-(NH-R9)k-NH2 NH 2 -R 9 -(NH-R 9 ) k -NH 2

[式中,R9及k與關於式(1)之記載為相同意義] [Wherein, R 9 and k have the same meaning as described in formula (1)]

而得到下述式所表示之化合物 The compound represented by the following formula is obtained

R21OOC-(RF2-CONH-R9-(NH-R9)k-NHCO)x-RF2-COOR21 R 21 OOC-(R F2 -CONH-R 9 -(NH-R 9 ) k -NHCO) x -R F2 -COOR 21

[式中,R21為氫原子或或甲基,RF2、R9及k與關於式(1)之記載為相同意義]。 [In the formula, R 21 is a hydrogen atom or a methyl group, and R F2 , R 9 and k have the same meanings as described in relation to formula (1)].

接著,將所得到之化合物,與下式所表示之化合物進行反應, Next, the obtained compound is reacted with the compound represented by the following formula:

NR23 mH2-m-R22-SiR1 n’R2 3-n’ NR 23 m H 2-m -R 22 -SiR 1 n' R 2 3-n'

[式中,R23為C1-6的烷基或苯基,m為0或1,R22為二價基,R1、R2及n’與關於式(1)之記載為相同意義] [In the formula, R 23 is a C 1-6 alkyl group or a phenyl group, m is 0 or 1, R 22 is a divalent group, and R 1 , R 2 and n' have the same meanings as described in relation to formula (1)]

而得到下述式所表示之化合物, The compound represented by the following formula is obtained:

R2 3-n’R1 n’Si-R22-HNOC-(RF2-CONH-R9-(NH-R9)k-NHCO)x-RF2-CONH-R22-SiR1 n’R2 3-n’R 2 3-n' R 1 n' Si-R 22 -HNOC-(R F2 -CONH-R 9 -(NH-R 9 ) k -NHCO) x -R F2 -CONH-R 22 -SiR 1 n' R 2 3-n' .

接著,將所得到之化合物,與下述式所表示之化合物進行反應, Next, the obtained compound is reacted with the compound represented by the following formula:

R34-R35-OCOCH=CH2 R 34 -R 35 -OCOCH=CH 2

[式中,R34為-NCO、-COOH等反應性基, [wherein, R 34 is a reactive group such as -NCO, -COOH, etc.,

R35為二價基] R 35 is a divalent group]

藉此可得到式(1)所表示之化合物。 In this way, the compound represented by formula (1) can be obtained.

於一態樣中,上述以式(1)所表示之含氟聚醚基之丙烯酸化合物係將下述式所表示之化合物, In one embodiment, the fluorinated polyether group-containing acrylic compound represented by formula (1) is a compound represented by the following formula,

R21OOC-RF2-COOR21 R 21 OOC-R F2 -COOR 21

[式中,R21為氫原子或甲基,RF2與關於式(1)之記載為相同意義] [In the formula, R21 is a hydrogen atom or a methyl group, and RF2 has the same meaning as described in formula (1)]

與下述化學式所表示之化合物進行反應, React with the compound represented by the following chemical formula,

NH2-R9-(CH(OH)-R9)k-NH2 NH 2 -R 9 -(CH(OH)-R 9 ) k -NH 2

[式中,R9及k與關於式(1)之記載為相同意義] [Wherein, R 9 and k have the same meaning as described in formula (1)]

而得到下述式所表示之化合物 The compound represented by the following formula is obtained

R21OOC-(RF2-CONH-R9-(CH(OH)-R9)k-NHCO)x-RF2-COOR21 R 21 OOC-(R F2 -CONH-R 9 -(CH(OH)-R 9 ) k -NHCO) x -R F2 -COOR 21

[式中,R21為氫原子或甲基,RF2、R9及k與關於式(1)之記載為相同意義]。 [In the formula, R 21 is a hydrogen atom or a methyl group, and R F2 , R 9 and k have the same meanings as described in relation to formula (1)].

接著,將所得到之化合物,與下式所表示之化合物進行反應, Next, the obtained compound is reacted with the compound represented by the following formula:

NR23 mH2-m-R22-SiR1 n’R2 3-n’ NR 23 m H 2-m -R 22 -SiR 1 n' R 2 3-n'

[式中,R23為C1-6的烷基或苯基,m為0或1,R22為二價基,R1、R2及n’與關於式(1)之記載為相同意義] [In the formula, R 23 is a C 1-6 alkyl group or a phenyl group, m is 0 or 1, R 22 is a divalent group, and R 1 , R 2 and n' have the same meanings as described in relation to formula (1)]

而得到下述式所表示之化合物, The compound represented by the following formula is obtained:

R2 3-n’R1 n’Si-R22-HNOC-(RF2-CONH-R9-(CH(OH)-R9)k-NHCO)x-RF2-CONH-R22-SiR1 n’R2 3-n’R 2 3-n' R 1 n' Si-R 22 -HNOC-(R F2 -CONH-R 9 -(CH(OH)-R 9 ) k -NHCO) x -R F2 -CONH-R 22 -SiR 1 n' R 2 3-n' .

接著,將所得到之化合物,與下述式所表示之化合物進行反應, Next, the obtained compound is reacted with the compound represented by the following formula:

R34-R35-OCOCH=CH2 R 34 -R 35 -OCOCH=CH 2

[式中,R34為-NCO、-COOH等反應性基, [wherein, R 34 is a reactive group such as -NCO, -COOH, etc.,

R35為二價基] R 35 is a divalent group]

藉此可得到式(1)所表示之化合物。 In this way, the compound represented by formula (1) can be obtained.

於一態樣中,上述式(1)所表示之含氟聚醚基之丙烯酸化合物係將下述式所表示之化合物, In one embodiment, the fluorinated polyether group-containing acrylic compound represented by the above formula (1) is a compound represented by the following formula,

R21OOC-RF2-COOR21 R 21 OOC-R F2 -COOR 21

[式中,R21為氫原子或甲基,RF2與關於式(1)之記載為相同意義] [In the formula, R21 is a hydrogen atom or a methyl group, and RF2 has the same meaning as described in formula (1)]

與下述化學式所表示之化合物進行反應, React with the compound represented by the following chemical formula,

NH2-R9-(NH-R9)k-NH2 NH 2 -R 9 -(NH-R 9 ) k -NH 2

式中,R9及k與關於式(1)之記載為相同意義; Wherein, R 9 and k have the same meaning as described in formula (1);

而得到下述式所表示之化合物, The compound represented by the following formula is obtained:

R21OOC-(RF2-CONH-R9-(NH-R9)k-NHCO)x-RF2-COOR21 R 21 OOC-(R F2 -CONH-R 9 -(NH-R 9 ) k -NHCO) x -R F2 -COOR 21

[式中,R21為氫原子或甲基,RF2、R9及k與關於式(1)之記載為相同意義]。 [In the formula, R 21 is a hydrogen atom or a methyl group, and R F2 , R 9 and k have the same meanings as described in relation to formula (1)].

接著,將所得到之化合物,與下述式所表示之化合物進行反應, Next, the obtained compound is reacted with the compound represented by the following formula:

NH2-R9’-NH2 NH 2 -R 9' -NH 2

[式中,R9’與關於R9之記載為相同意義] [Wherein, R 9′ has the same meaning as described for R 9 ]

而得到下述式所表示之化合物, The compound represented by the following formula is obtained:

R21OOC-(RF2-CONH-R9-(NH-R9)k-NHCO)x-(RF2-CONH-R9’-NHCO)x’-RF2-COOR21 R 21 OOC-(R F2 -CONH-R 9 -(NH-R 9 ) k -NHCO) x -(R F2 -CONH-R 9' -NHCO) x' -R F2 -COOR 21

[式中,R21為氫原子或甲基,RF2、R9及k與關於式(1)之記載為相同意義,R9’與關於R9之記載為相同意義]。 [In the formula, R 21 is a hydrogen atom or a methyl group, R F2 , R 9 and k have the same meanings as described in relation to formula (1), and R 9′ has the same meanings as described in relation to R 9 ].

接著,將所得到之化合物,與下述式所表示之化合物進行反應, Next, the obtained compound is reacted with the compound represented by the following formula:

NR23 mH2-m-R22-SiR1 n’R2 3-n’ NR 23 m H 2-m -R 22 -SiR 1 n' R 2 3-n'

[式中,R23為C1-6的烷基或苯基,m為0或1,R22為二價基,R1、R2及n’與關於式(1)之記載為相同意義] [In the formula, R 23 is a C 1-6 alkyl group or a phenyl group, m is 0 or 1, R 22 is a divalent group, and R 1 , R 2 and n' have the same meanings as described in relation to formula (1)]

而得到下述式所表示之化合物, The compound represented by the following formula is obtained:

R2 3-n’R1 n’Si-R22-HNOC-(RF2-CONH-R9-(NH-R9)k-NHCO)x-(RF2-CONH-R9’-NHCO)x’-RF2-CONH-R22-SiR1 n’R2 3-n’R 2 3-n' R 1 n' Si-R 22 -HNOC-(R F2 -CONH-R 9 -(NH-R 9 ) k -NHCO) x -(R F2 -CONH-R 9' -NHCO) x' -R F2 -CONH-R 22 -SiR 1 n' R 2 3-n' .

接著,將所得到之化合物,與下述式所表示之化合物進行反應, Next, the obtained compound is reacted with the compound represented by the following formula:

R34-R35-OCOCH=CH2 R 34 -R 35 -OCOCH=CH 2

[式中,R34為-NCO、-COOH等反應性基, [wherein, R 34 is a reactive group such as -NCO, -COOH, etc.,

R35為二價基] R 35 is a divalent group]

藉此可得到式(1)所表示之化合物。 In this way, the compound represented by formula (1) can be obtained.

上述反應之各步驟的反應條件可由所屬技術領域具有通常知識者來適當地設定。 The reaction conditions for each step of the above reaction can be appropriately set by those skilled in the art.

接著,說明本揭示之表面處理劑。 Next, the surface treatment agent disclosed herein is described.

本揭示之表面處理劑係含有式(1)所表示之含至少1種氟聚醚基之丙烯酸化合物。 The surface treatment agent disclosed herein contains an acrylic compound represented by formula (1) containing at least one fluoropolyether group.

於一態樣中,本揭示之表面處理劑中,含氟聚醚基之丙烯酸化合物為式(1)所表示之化合物。 In one embodiment, in the surface treatment agent disclosed herein, the fluorinated polyether group-containing acrylic compound is a compound represented by formula (1).

相對於表面處理劑整體,上述式(1)所表示之化合物的含量較佳為0.1至50.0質量%,更佳為1.0至30.0質量%,更佳為5.0至25.0質量%,特佳可為10.0至20.0質量%。藉由將上述含氟聚醚基之丙烯酸化合物的含量設為上述範圍,可得到更高的撥水撥油性及磨耗耐久性。 The content of the compound represented by formula (1) is preferably 0.1 to 50.0 mass%, more preferably 1.0 to 30.0 mass%, even more preferably 5.0 to 25.0 mass%, and particularly preferably 10.0 to 20.0 mass% relative to the entire surface treatment agent. By setting the content of the fluorinated polyether group-containing acrylic compound within the above range, higher water and oil repellency and wear durability can be obtained.

本揭示之表面處理劑可含有:溶劑、可理解為含氟油之(非反應性的)氟聚醚化合物,較佳為全氟(聚)醚化合物(以下統稱為「含氟油」)、可理解為聚矽氧油之(非反應性的)聚矽氧化合物(以下稱為「聚矽氧油」)、醇類、觸媒、界面活性劑、聚合抑制劑、敏化劑等。 The surface treatment agent disclosed herein may contain: a solvent, a (non-reactive) fluoropolyether compound which can be understood as a fluorinated oil, preferably a perfluoro(poly)ether compound (hereinafter collectively referred to as "fluorinated oil"), a (non-reactive) polysilicone compound which can be understood as a polysilicone oil (hereinafter referred to as "polysilicone oil"), an alcohol, a catalyst, a surfactant, a polymerization inhibitor, a sensitizer, etc.

上述溶劑可列舉例如:己烷、環己烷、庚烷、辛烷、壬烷、癸烷、十一烷、十二烷、礦物精等脂肪族烴類;苯、甲苯、二甲苯、萘、溶劑油(Solvent Naphtha)等芳香族烴類;乙酸甲酯、乙酸乙酯、乙酸丙酯、乙酸正丁酯、乙酸異丙酯、乙酸異丁酯、乙酸溶纖劑、丙二醇甲醚乙酸酯、乙酸卡必醇、草酸二乙酯、丙酮酸乙酯、丁酸乙基-2-羥酯、乙醯乙酸乙酯、乙酸戊酯、乳酸甲酯、乳酸乙酯、3-甲氧基丙酸甲酯、3-甲氧基丙酸乙酯、2-羥基異丁酸甲酯、2-羥基異丁酸乙酯等酯類;丙酮、丁酮、甲基異丁酮、2-己酮、環己酮、甲基胺酮、2-庚酮等酮類;乙基溶纖劑、甲基溶纖劑、甲基溶纖劑乙酸酯、乙基溶纖劑乙酸酯、丙二醇單甲醚、丙二醇單乙醚、丙二醇單丁醚、丙二醇單甲醚乙酸酯、丙二醇單乙醚乙酸酯、丙二醇單丁醚乙酸酯、二丙二醇二甲醚、乙二醇單烷醚等二醇醚類;甲醇、乙醇、異丙醇、正丁醇、異丁醇、第三丁醇、第二丁醇、3-戊醇、辛醇、3-甲基-3-甲氧基丁醇、第三戊醇等醇類;乙二醇、丙二醇等二醇類;四氫呋喃(Tetrahydrofuran)、四氫吡喃(Tetrahydropyran)、二噁烷等環狀醚類;N,N-二甲基甲醯胺、N,N-二甲基乙醯胺等醯胺類;甲基溶纖劑、溶纖劑、異丙基溶纖劑、丁基溶纖劑、二乙二醇單甲醚等醚醇類;二乙二醇單乙醚乙酸酯;1,1,2-三氯-1,2,2-三氟乙烷、1,2-二氯-1,1,2,2-四氟乙烷、二甲基亞碸、1,1-二氯-1,2,2,3,3-五氟丙烷(HCFC225)、Zeorora H、HFE7100、HFE7200、HFE7300、CF3CH2OH、CF3CF2CH2OH、(CF3)2CHOH等含氟溶劑等。或是可列舉此等之2種以上的混合溶劑等。 Examples of the above-mentioned solvent include aliphatic hydrocarbons such as hexane, cyclohexane, heptane, octane, nonane, decane, undecane, dodecane, and mineral spirits; aromatic hydrocarbons such as benzene, toluene, xylene, naphthalene, and solvent naphtha; methyl acetate, ethyl acetate, propyl acetate, n-butyl acetate, isopropyl acetate, isobutyl acetate, solvent acetate, propylene glycol methyl ether acetate, carbitol acetate, diethyl oxalate, ethyl pyruvate, ethyl 2-hydroxy butyrate, ethyl acetylacetate, amyl acetate, methyl lactate, ethyl lactate, methyl 3-methoxypropionate, ethyl 3-methoxypropionate, and methyl 2-hydroxyisobutyrate. , 2-hydroxyisobutyrate and other esters; acetone, butanone, methyl isobutyl ketone, 2-hexanone, cyclohexanone, methylamine ketone, 2-heptanone and other ketones; ethyl solvent, methyl solvent, methyl solvent acetate, ethyl solvent acetate, propylene glycol monomethyl ether, propylene glycol monoethyl ether, propylene glycol monobutyl ether, propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate, propylene glycol monobutyl ether acetate, dipropylene glycol dimethyl ether, ethylene glycol monoalkane ethers; alcohols such as methanol, ethanol, isopropyl alcohol, n-butanol, isobutyl alcohol, tert-butanol, sec-butanol, 3-pentanol, octanol, 3-methyl-3-methoxybutanol, tert-pentanol; diols such as ethylene glycol and propylene glycol; cyclic ethers such as tetrahydrofuran, tetrahydropyran, and dioxane; N,N-dimethylformamide, N, Amides such as N-dimethylacetamide; ether alcohols such as methyl solvent, cellulose solvent, isopropyl solvent, butyl solvent, and diethylene glycol monomethyl ether; diethylene glycol monoethyl ether acetate; fluorinated solvents such as 1,1,2-trichloro-1,2,2-trifluoroethane, 1,2-dichloro-1,1,2,2-tetrafluoroethane, dimethyl sulfoxide, 1,1-dichloro-1,2,2,3,3-pentafluoropropane (HCFC225), Zeorora H, HFE7100, HFE7200 , HFE7300 , CF3CH2OH , CF3CF2CH2OH , and ( CF3 ) 2CHOH . A mixture of two or more of these solvents may also be mentioned.

含氟油並無特別限定,可列舉例如下列通式(3)所表示之化合物(全氟(聚)醚化合物)。 The fluorine-containing oil is not particularly limited, and examples thereof include compounds represented by the following general formula (3) (perfluoro(poly)ether compounds).

Rf5-(OC4F8)a’-(OC3F6)b’-(OC2F4)c’-(OCF2)d’-Rf6...(3) Rf 5 -(OC 4 F 8 ) a' -(OC 3 F 6 ) b' -(OC 2 F 4 ) c' -(OCF 2 ) d' -Rf 6 . . . (3)

式中,Rf5表示可經1個以上的氟原子取代之碳數1至16烷基(較佳為C1-16的全氟烷基),Rf6表示可經1個以上的氟原子取代之碳數1至16烷基(較佳為C1-16全氟烷基)、氟原子或氫原子,Rf5及Rf6更佳係分別獨立地為C1-3全氟烷基。 In the formula, Rf5 represents a C1-16 alkyl group which may be substituted with one or more fluorine atoms (preferably a C1-16 perfluoroalkyl group), Rf6 represents a C1-16 alkyl group which may be substituted with one or more fluorine atoms (preferably a C1-16 perfluoroalkyl group), a fluorine atom or a hydrogen atom, and Rf5 and Rf6 are more preferably each independently a C1-3 perfluoroalkyl group.

a’、b’、c’及d’分別表示構成聚合物的主骨架之全氟(聚)醚的4種重複單元數,且相互獨立地為0以上300以下的整數,a’、b’、c’及d’之和至少為1,較佳為1至300,更佳為20至300。標註下標a’、b’、c’或d’並以括弧括起之各重複單元的存在順序於式中為任意。此等重複單元中,-(OC4F8)-可為-(OCF2CF2CF2CF2)-、-(OCF(CF3)CF2CF2)-、-(OCF2CF(CF3)CF2)-、-(OCF2CF2CF(CF3))-、-(OC(CF3)2CF2)-、-(OCF2C(CF3)2)-、-(OCF(CF3)CF(CF3))-、-(OCF(C2F5)CF2)-及(OCF2CF(C2F5))-中任一者,較佳為-(OCF2CF2CF2CF2)-。-(OC3F6)-可為-(OCF2CF2CF2)-、-(OCF(CF3)CF2)-及(OCF2CF(CF3))-中任一者,較佳為-(OCF2CF2CF2)-。-(OC2F4)-可為-(OCF2CF2)-及(OCF(CF3))-中任一者,較佳為-(OCF2CF2)-。 a', b', c', and d' each represent the number of four repeating units of perfluoro(poly)ether constituting the main backbone of the polymer and are independently integers of 0 to 300. The sum of a', b', c', and d' is at least 1, preferably 1 to 300, and more preferably 20 to 300. The order of the repeating units enclosed in parentheses and denoted by the subscripts a', b', c', or d' in the formula is arbitrary. In these repeating units, -( OC4F8 )- can be any of -( OCF2CF2CF2CF2CF2 )-, -(OCF(CF3 ) CF2CF2 )-, -( OCF2CF ( CF3 ) CF2 )-, -( OCF2CF2CF ( CF3 ) )-, - ( OC (CF3 ) 2CF2 )-, -( OCF2C ( CF3 ) 2 ) -, -(OCF( CF3 )CF(CF3))-, -(OCF( C2F5 ) CF2 )-, and ( OCF2CF ( C2F5 ) )-, and is preferably - ( OCF2CF2CF2CF2CF2 ) - . -(OC 3 F 6 )- may be any of -(OCF 2 CF 2 CF 2 )-, -(OCF(CF 3 )CF 2 )-, and (OCF 2 CF(CF 3 ))-, and is preferably -(OCF 2 CF 2 CF 2 )-. -(OC 2 F 4 )- may be any of -(OCF 2 CF 2 )- and (OCF(CF 3 ))-, and is preferably -(OCF 2 CF 2 )-.

上述通式(3)所表示之全氟(聚)醚化合物的例子可列舉:下列通式(3a)及(3b)中任一者所表示之化合物(可為1種或2種以上的混合物)。 Examples of the perfluoro(poly)ether compound represented by the general formula (3) include compounds represented by any one of the following general formulas (3a) and (3b) (which may be a mixture of one or more).

Rf5-(OCF2CF2CF2)b"-Rf6...(3a) Rf 5 -(OCF 2 CF 2 CF 2 ) b" -Rf 6 ...(3a)

Rf5-(OCF2CF2CF2CF2)a”-(OCF2CF2CF2)b”-(OCF2CF2)c”-(OCF2)d”-Rf6...(3b) Rf 5 -(OCF 2 CF 2 CF 2 CF 2 ) a” -(OCF 2 CF 2 CF 2 ) b” -(OCF 2 CF 2 ) c” -(OCF 2 ) d” -Rf 6 . . . (3b)

此等式中,Rf5及Rf6如上所述;於式(3a)中,b”為1以上100以下的整數;於式(3b)中,a”及b”分別獨立地為0以上30以下的整數,c”及d” 分別獨立地為1以上300以下的整數。標註下標a”、b”、c”、d”並以括弧括起之各重複單元的存在順序於式中為任意。 In this equation, Rf5 and Rf6 are as described above; in formula (3a), b" is an integer from 1 to 100; in formula (3b), a" and b" are each independently an integer from 0 to 30, and c" and d" are each independently an integer from 1 to 300. The order of the repetitive units enclosed in parentheses and denoted by the subscripts a", b", c", and d" is arbitrary in the formula.

再者,從其他觀點而言,含氟油可為通式Rf3-F(式中,Rf3為C5-16全氟烷基)所表示之化合物。再者,亦可為氯三氟乙烯寡聚物。 Furthermore, from another perspective, the fluorinated oil may be a compound represented by the general formula Rf 3 -F (wherein Rf 3 is a C 5-16 perfluoroalkyl group). Furthermore, it may be a chlorotrifluoroethylene oligomer.

上述含氟油可具有500至10000的平均分子量。含氟油的分子量可使用GPC測定。 The fluorinated oil may have an average molecular weight of 500 to 10,000. The molecular weight of the fluorinated oil can be measured using GPC.

相對於本揭示之表面處理劑,含氟油可含有例如0至50質量%,較佳為0至30質量%,更佳為0至5質量%。於一態樣中,本揭示之表面處理劑實質上不含含氟油。所謂實質上不含含氟油,意指完全不含含氟油或可含有極微量的含氟油。 The surface treatment agent disclosed herein may contain fluorinated oil in an amount of, for example, 0 to 50% by mass, preferably 0 to 30% by mass, and more preferably 0 to 5% by mass. In one embodiment, the surface treatment agent disclosed herein is substantially free of fluorinated oil. "Substantially free of fluorinated oil" means that it contains no fluorinated oil at all or may contain only a very small amount of fluorinated oil.

於一態樣中,可將含氟油的平均分子量設為大於含氟聚醚基之丙烯酸化合物的平均分子量。藉由設為此平均分子量,尤其在藉由真空蒸鍍法來形成表面處理層時,可得到更優異的磨耗耐久性及表面平滑性。 In one embodiment, the average molecular weight of the fluorinated oil can be set to be greater than the average molecular weight of the fluorinated polyether-containing acrylic compound. This average molecular weight allows for superior wear resistance and surface smoothness, particularly when the surface treatment layer is formed by vacuum deposition.

於一態樣中,可將含氟油的平均分子量設為小於含氟聚醚基之丙烯酸化合物的平均分子量。藉由設為此平均分子量,可抑制從該化合物所得到之表面處理層之透明性的降低,並形成具有高磨耗耐久性及高表面平滑性之硬化物。 In one embodiment, the average molecular weight of the fluorinated oil can be set to be lower than the average molecular weight of the fluorinated polyether-containing acrylic compound. This average molecular weight can suppress the degradation of the transparency of the surface-treated layer obtained from the compound, and form a cured product with high abrasion durability and high surface smoothness.

含氟油係有益於提升由本揭示之表面處理劑所形成之層的表面平滑性。 Fluorine-containing oil is beneficial for improving the surface smoothness of the layer formed by the surface treatment agent disclosed herein.

上述聚矽氧油可使用例如矽氧烷鍵為2,000以下之直鏈狀或環狀的聚矽氧油。直鏈狀的聚矽氧油可為所謂純聚矽氧油(straight silicone oil)及改性聚矽氧油。純聚矽氧油可列舉:二甲基聚矽氧油、甲基苯基聚矽 氧油、甲基氫聚矽氧油。改性聚矽氧油可列舉:藉由烷基、芳烷基、聚醚、高級脂肪酸酯、氟烷基、胺基、環氧基、羧基、醇等將純聚矽氧油進行改性者。環狀聚矽氧油可列舉例如環狀二甲基矽氧烷油等。 The silicone oils mentioned above may be linear or cyclic silicone oils with a siloxane bond count of 2,000 or less. Straight silicone oils include so-called straight silicone oils and modified silicone oils. Examples of straight silicone oils include dimethyl silicone oil, methylphenyl silicone oil, and methylhydrosilicone oil. Examples of modified silicone oils include pure silicone oils modified with alkyl groups, arylalkyl groups, polyethers, higher fatty acid esters, fluoroalkyl groups, amino groups, epoxy groups, carboxyl groups, alcohols, and the like. Examples of cyclic silicone oils include cyclodimethylsiloxane oil.

本揭示之表面處理劑中,相對於上述本揭示之含氟聚醚基之丙烯酸化合物的合計100質量份(2種以上時為此等之合計,以下亦同),該聚矽氧油例如可以0至300質量份,較佳以50至200質量份含有。 In the surface treatment agent disclosed herein, the polysilicone oil may be contained in an amount of, for example, 0 to 300 parts by mass, preferably 50 to 200 parts by mass, relative to a total of 100 parts by mass of the fluorinated polyether group-containing acrylic compound disclosed herein (the total amount when two or more types are present, and the same applies hereinafter).

聚矽氧油係有益於提升表面處理層的表面平滑性。 Silicone oil is beneficial for improving the surface smoothness of the surface treatment layer.

上述醇類例如為可經1個以上的氟原子取代之碳數1至6的醇,可列舉例如:甲醇、乙醇、異丙醇、第三丁醇、CF3CH2OH、CF3CF2CH2OH、(CF3)2CHOH。藉由將此等醇類添加於表面處理劑,以提升表面處理劑的穩定性,並且改善含全氟聚醚基之丙烯酸化合物與溶劑之相溶性。 The alcohols are, for example , alcohols with 1 to 6 carbon atoms that may be substituted with one or more fluorine atoms, such as methanol, ethanol, isopropyl alcohol, tert- butyl alcohol, CF3CH2OH , CF3CF2CH2OH , and ( CF3 ) 2CHOH . Adding these alcohols to the surface treatment agent enhances the stability of the surface treatment agent and improves the compatibility of the perfluoropolyether-containing acrylic compound with the solvent.

上述醇較佳為2,2,3,3,3-五氟-1-丙醇或2,2,2-三氟乙醇。 The above alcohol is preferably 2,2,3,3,3-pentafluoro-1-propanol or 2,2,2-trifluoroethanol.

上述觸媒可列舉酸(例如乙酸、三氟乙酸等)、鹼(例如氨、三乙胺、二乙胺等)、過渡金屬(例如Ti、Ni、Sn等)等。 Examples of the catalyst include acids (e.g., acetic acid, trifluoroacetic acid, etc.), bases (e.g., ammonia, triethylamine, diethylamine, etc.), and transition metals (e.g., Ti, Ni, Sn, etc.).

觸媒係促進本揭示之含氟聚醚基之丙烯酸化合物的水解、脫水縮合或聚合,促進藉由本揭示之表面處理劑所形成之層的形成。 The catalyst promotes the hydrolysis, dehydration condensation, or polymerization of the fluoropolyether-containing acrylic compound disclosed herein, thereby promoting the formation of the layer formed by the surface treatment agent disclosed herein.

其他成分除了上述之外,亦可列舉例如:四乙氧矽烷、甲基三甲氧矽烷、3-胺丙基三甲氧矽烷、3-環氧丙氧基丙基三甲氧矽烷、甲基三乙醯氧矽烷等。 In addition to the above, other ingredients include tetraethoxysilane, methyltrimethoxysilane, 3-aminopropyltrimethoxysilane, 3-glycidoxypropyltrimethoxysilane, and methyltriacetoxysilane.

本揭示之表面處理劑可含浸於多孔質物質(例如多孔質的陶瓷材料)、金屬纖維(例如鋼絲絨)經固定為棉狀者而構成為顆粒。該顆粒例如可使用在真空蒸鍍。 The surface treatment agent disclosed herein can be impregnated into a porous material (e.g., a porous ceramic material) or metal fibers (e.g., steel wool) fixed in a cotton-like state to form particles. These particles can be used, for example, in vacuum deposition.

本揭示之表面處理劑除了上述成分之外,亦可微量地含有例如Pt、Rh、Ru、1,3-二乙烯基四甲基二矽氧烷、三苯基膦、NaCl、KCl、矽烷的縮合物等雜質。 In addition to the above-mentioned components, the surface treatment agent disclosed herein may also contain trace amounts of impurities such as Pt, Rh, Ru, 1,3-divinyltetramethyldisiloxane, triphenylphosphine, NaCl, KCl, and silane condensates.

以下說明本揭示之物品。 The following describes the items disclosed in this article.

本揭示之物品係包含:基材、以及於該基材表面上由本揭示之表面處理劑所形成之層(表面處理層)。 The article disclosed herein comprises: a substrate, and a layer (surface treatment layer) formed on the surface of the substrate by the surface treatment agent disclosed herein.

本揭示中可使用之基材例如可由玻璃、樹脂(天然或合成樹脂,例如可為一般的塑膠材料)、金屬、陶瓷、半導體(矽、鍺等)、纖維(織物、不織布等)、毛皮、皮革、木材、陶瓷器、石材等,建築構件等、衛生用品之任意的適當材料構成。 The substrates that can be used in the present disclosure can be made of any suitable material, such as glass, resin (natural or synthetic resin, such as a common plastic material), metal, ceramic, semiconductor (silicon, germanium, etc.), fiber (woven, non-woven, etc.), fur, leather, wood, ceramic, stone, building components, and sanitary products.

例如,在應製造之物品為光學構件時,構成基材的表面之材料可為光學構件用材料,例如玻璃或透明塑膠等。再者,在應製造之物品為光學構件時,可於基材的表面(最外層)形成某些層(或膜),例如硬塗層或抗反射層等。抗反射層可使用單層抗反射層及多層抗反射層中任一種。可使用於抗反射層之無機物的例子可列舉:SiO2、SiO、ZrO2、TiO2、TiO、Ti2O3、Ti2O5、Al2O3、Ta2O5、Ta3O5、Nb2O5、HfO2、Si3N4、CeO2、MgO、Y2O3、SnO2、MgF2、WO3等。此等無機物可單獨使用或組合此等的2種以上(例如混合物)而使用。在構成為多層抗反射層時,於該最外層較佳係使用SiO2及/或SiO。在應製造之物品為觸控面板用的光學玻璃零件時,可於 基材(玻璃)之表面的一部分上具有透明電極,例如使用氧化銦錫(ITO:Indium Tin Oxide)或氧化銦鋅等之薄膜。再者,基材可因應其具體性規格等,具有絕緣層、黏著層(Pressure-sensitive Layer)、保護層、裝飾框層(I-CON)、霧化膜層、硬塗膜層、偏光膜、相位差膜及液晶顯示模組等。 For example, when the article to be manufactured is an optical component, the material constituting the surface of the substrate can be a material used for optical components, such as glass or transparent plastic. Furthermore, when the article to be manufactured is an optical component, a layer (or film), such as a hard coat or antireflection layer, can be formed on the surface (outermost layer) of the substrate. The antireflection layer can be either a single-layer antireflection layer or a multi-layer antireflection layer. Examples of inorganic materials that can be used in the antireflection layer include SiO2 , SiO, ZrO2, TiO2 , TiO , Ti2O3 , Ti2O5 , Al2O3, Ta2O5 , Ta3O5 , Nb2O5 , HfO2 , Si3N4 , CeO2 , MgO , Y2O3 , SnO2 , MgF2 , and WO3 . These inorganic materials can be used alone or in combination ( e.g., as a mixture). When a multi - layer antireflection layer is formed, SiO2 and/or SiO are preferably used in the outermost layer. When the product is an optical glass component for a touch panel, a transparent electrode can be formed on a portion of the surface of the substrate (glass), using, for example, a thin film of indium tin oxide (ITO) or indium zinc oxide. Furthermore, depending on its specific specifications, the substrate can also have an insulating layer, an adhesive layer (pressure-sensitive layer), a protective layer, a decorative frame layer (I-CON), an atomized film layer, a hard coat film layer, a polarizing film, a retardation film, and a liquid crystal display module.

上述基材的形狀並無特別限定,可為例如板狀、膜及其他形態。再者,應形成表面處理劑層之基材的表面區域只要是基材表面的至少一部分即可,可因應應製造之物品的用途及具體規格等來適當地決定。 The shape of the substrate is not particularly limited and may be, for example, a plate, film, or other forms. Furthermore, the surface area of the substrate on which the surface treatment agent layer is to be formed may be at least a portion of the substrate surface and can be appropriately determined based on the intended use and specific specifications of the manufactured article.

於一態樣中,該基材之至少其表面部分可為由原先具有羥基之材料所構成者。該材料可列舉玻璃,又,可列舉:表面形成有自然氧化膜或熱氧化膜之金屬(尤其是卑金屬)、陶瓷、半導體等。或是,如樹脂等般雖具有羥基但不充分時,或原先不具有羥基時,可藉由對基材施以某種前處理而在基材的表面上導入或增加羥基。該前處理的例子可列舉電漿處理(例如電暈放電)或離子束照射。電漿處理可在基材表面上導入或增加羥基,並且亦適合應用在淨化基材表面(去除雜質等)者。再者,該前處理的其他例子可列舉:藉由LB法(Langmuir-Blodgett法)或化學吸附法等,預先以單分子膜的型態將具有碳-碳不飽和鍵之界面吸附劑形成於基材表面,然後在包含氧或氮等之環境下將不飽和鍵進行開裂之方法。 In one embodiment, at least a portion of the surface of the substrate may be made of a material that originally has a hydroxyl group. Examples of such materials include glass, and examples include metals (especially base metals), ceramics, semiconductors, etc., with natural oxide films or thermal oxide films formed on the surface. Alternatively, when a resin or the like has a hydroxyl group but not enough, or when it originally does not have a hydroxyl group, hydroxyl groups can be introduced or increased on the surface of the substrate by subjecting the substrate to a certain pretreatment. Examples of such pretreatments include plasma treatment (such as coma discharge) or ion beam irradiation. Plasma treatment can introduce or increase hydroxyl groups on the surface of the substrate, and is also suitable for use in purifying the surface of the substrate (removing impurities, etc.). Other examples of pretreatment include forming an interfacial adsorbent with carbon-carbon unsaturated bonds in the form of a monolayer on the substrate surface using the Langmuir-Blodgett method (LB) or chemical adsorption, and then cleaving the unsaturated bonds in an environment containing oxygen or nitrogen.

於其他態樣中,該基材之至少其表面部分可由具有1個以上其他反應性基,例如Si-H基之聚矽氧化合物,或含有烷氧矽烷之材料所構成。 In other aspects, at least a surface portion of the substrate may be composed of a polysiloxane having one or more other reactive groups, such as Si-H groups, or a material containing an alkoxysilane.

於較佳態樣中,上述基材為玻璃。該玻璃較佳為藍寶石玻璃、鈉鈣玻璃、鹼鋁矽酸鹽玻璃、硼矽酸玻璃、無鹼玻璃、結晶玻璃、石英玻 璃,特佳為經化學強化之鈉鈣玻璃、經化學強化之鹼鋁矽酸鹽玻璃、以及經化學鍵結之硼矽酸玻璃。 In a preferred embodiment, the substrate is glass. The glass is preferably sapphire glass, sodium calcium glass, alkali aluminosilicate glass, borosilicate glass, alkali-free glass, crystallized glass, or quartz glass. Particularly preferred are chemically strengthened sodium calcium glass, chemically strengthened alkali aluminosilicate glass, and chemically bonded borosilicate glass.

本揭示之物品可藉由將上述本揭示之表面處理劑的層形成於上述基材的表面上,且因應所需對此層進行後處理,藉此從本揭示之表面處理劑來形成層而製造。 The article disclosed herein can be manufactured by forming a layer of the surface treatment agent disclosed herein on the surface of the substrate and, if necessary, performing post-treatment on the layer to form a layer from the surface treatment agent disclosed herein.

本揭示之表面處理劑的層形成可以被覆該表面之方式,藉由將上述表面處理劑適用於基材的表面而實施。被覆方法並無特別限定。可使用例如濕潤被覆法及乾燥被覆法。 The surface treatment agent disclosed herein can be applied to the surface of a substrate by forming a layer of the surface treatment agent. The coating method is not particularly limited. For example, wet coating and dry coating methods can be used.

濕潤被覆法的例子可列舉:浸漬塗佈、旋轉塗佈、流動塗佈、噴霧塗佈、輥塗佈、凹版塗佈及類似的方法。 Examples of wet coating methods include dip coating, spin coating, flow coating, spray coating, roll coating, gravure coating, and similar methods.

乾燥被覆法的例子可列舉蒸鍍(通常為真空蒸鍍)、濺鍍、CVD及類似的方法。蒸鍍法(通常為真空蒸鍍法)的具體例可列舉:電阻加熱、電子束、使用微波等之高頻加熱、離子束及類似的方法。CVD方法的具體例可列舉:電漿CVD、光學CVD、熱CVD及類似的方法。 Examples of dry coating methods include evaporation (usually vacuum evaporation), sputtering, CVD, and similar methods. Specific examples of evaporation methods (usually vacuum evaporation) include resistance heating, electron beam, high-frequency heating using microwaves, ion beam, and similar methods. Specific examples of CVD methods include plasma CVD, optical CVD, thermal CVD, and similar methods.

再者,亦可藉由常壓電漿法來被覆。 Furthermore, coating can also be achieved using the atmospheric pressure plasma method.

在使用濕潤被覆法時,本揭示之表面處理劑可在以溶劑稀釋後適用在基材表面。從本揭示之組成物的穩定性及溶劑的揮發性之觀點而言,適合使用下列溶劑:碳數5至12的全氟脂肪族烴(例如全氟己烷、全氟甲基環己烷及全氟-1,3-二甲基環己烷);聚氟芳香族烴(例如雙(三氟甲基)苯);聚氟脂肪族烴(例如C6F13CH2CH3(例如旭硝子股份有限公司製的Asahiklin(註冊商標)AC-6000)、1,1,2,2,3,3,4-七氟環戊烷(例如Zeon Japan股份有限公司製的Zeorora(註冊商標)H);氫氟醚(HFE)(例如全氟丙基甲醚 (C3F7OCH3)(例如Sumitomo 3M股份有限公司製的Novec(商標)7000)、全氟丁基甲醚(C4F9OCH3)(例如Sumitomo 3M股份有限公司製的Novec(商標)7100)、全氟丁基乙醚(C4F9OC2H5)(例如Sumitomo 3M股份有限公司製的Novec(商標)7200)、全氟己基甲醚(C2F5CF(OCH3)C3F7)(例如Sumitomo 3M股份有限公司製的Novec(商標)7300)等烷基全氟烷醚(全氟烷基及烷基可為直鏈或分枝狀)、或CF3CH2OCF2CHF2(例如旭硝子股份有限公司製的Asahiklin(註冊商標)AE-3000))等。此等溶劑可單獨使用或作為2種以上的混合物而使用。當中較佳為氫氟醚,特佳為全氟丁基甲醚(C4F9OCH3)及/或全氟丁基甲醚(C4F9OCH3)。 When using the wet coating method, the surface treatment agent disclosed herein can be applied to the substrate surface after being diluted with a solvent. From the viewpoint of the stability of the composition of the present disclosure and the volatility of the solvent, the following solvents are suitable: perfluoroaliphatic hydrocarbons having 5 to 12 carbon atoms (e.g., perfluorohexane, perfluoromethylcyclohexane, and perfluoro-1,3-dimethylcyclohexane); polyfluoroaromatic hydrocarbons (e.g., bis(trifluoromethyl)benzene); polyfluoroaliphatic hydrocarbons (e.g., C 6 F 13 CH 2 CH 3 (e.g., Asahiklin (registered trademark) AC-6000 manufactured by Asahi Glass Co., Ltd.), 1,1,2,2,3,3,4-heptafluorocyclopentane (e.g., Zeorora (registered trademark) H manufactured by Zeon Japan Co., Ltd.); hydrofluoroethers (HFEs) (e.g., perfluoropropyl methyl ether (C 3 F 7 OCH 3 ) (e.g., Sumitomo Alkyl perfluoroalkyl ethers (perfluoroalkyl groups and alkyl groups may be linear or branched) such as Novec (trademark) 7000 manufactured by 3M Co., Ltd.), perfluorobutyl methyl ether (C 4 F 9 OCH 3 ) (e.g., Novec (trademark) 7100 manufactured by Sumitomo 3M Co., Ltd.), perfluorobutyl ethyl ether (C 4 F 9 OC 2 H 5 ) (e.g., Novec (trademark) 7200 manufactured by Sumitomo 3M Co., Ltd.), and perfluorohexyl methyl ether (C 2 F 5 CF(OCH 3 )C 3 F 7 ) (e.g., Novec (trademark) 7300 manufactured by Sumitomo 3M Co., Ltd.), or CF 3 CH 2 OCF 2 CHF 2 (For example, Asahiklin (registered trademark) AE-3000 manufactured by Asahi Glass Co., Ltd.) etc. These solvents can be used alone or as a mixture of two or more. Among them, hydrofluoroethers are preferred, and perfluorobutyl methyl ether (C 4 F 9 OCH 3 ) and/or perfluorobutyl methyl ether (C 4 F 9 OCH 3 ) are particularly preferred.

在使用乾燥被覆法時,本揭示之表面處理劑可直接使用在乾燥被覆法,或以上述溶劑稀釋後使用在乾燥被覆法。 When using the dry coating method, the surface treatment agent disclosed herein can be used directly in the dry coating method, or diluted with the above-mentioned solvent before use in the dry coating method.

表面處理劑的層形成,較佳係於層中以使本揭示之表面處理劑與用以水解及脫水縮合之觸媒共同存在之方式來實施。簡便而言,於藉由濕潤被覆法來進行時,在以溶劑稀釋本揭示之表面處理劑後,可於即將適用在基材表面時將觸媒添加於本揭示之表面處理劑的稀釋液。於藉由乾燥被覆法來進行時,可將添加有觸媒之本揭示之表面處理劑直接進行蒸鍍(通常為真空蒸鍍)處理,或是使添加有觸媒之本揭示之表面處理劑含浸於鐵或銅等金屬多孔體而成為顆粒狀物質,使用此顆粒狀物質來進行蒸鍍(通常為真空蒸鍍)處理。 The surface treatment agent layer is preferably formed by coexisting the surface treatment agent disclosed herein with a catalyst for hydrolysis and dehydration condensation. Simply put, when using a wet coating method, the surface treatment agent disclosed herein is diluted with a solvent, and the catalyst can be added to the diluted surface treatment agent before applying it to the substrate surface. When using the dry coating method, the surface treatment agent of the present disclosure with a catalyst added thereto can be directly subjected to evaporation (usually vacuum evaporation), or the surface treatment agent of the present disclosure with a catalyst added thereto can be impregnated into a porous metal such as iron or copper to form a granular material, which is then used for evaporation (usually vacuum evaporation).

觸媒可使用任意適當的酸或鹼。酸觸媒可使用例如乙酸、甲酸、三氟乙酸等。再者,鹼觸媒可使用例如氨、有機胺類等。 Any appropriate acid or base can be used as the catalyst. Examples of acid catalysts include acetic acid, formic acid, and trifluoroacetic acid. Examples of alkaline catalysts include ammonia and organic amines.

本揭示之物品所含有之表面處理層係具有高磨耗耐久性。再者,上述表面處理層除了高磨耗耐久性之外,雖因所使用之表面處理劑的組成而不同,惟亦可具有撥水性、撥油性、防污性(例如防止指紋等髒污的附著)、防水性(防止水往電子零件等之浸入)、表面平滑性(或潤滑性,例如指紋等髒污的拭除性,或是對手指而言的優異觸感)、耐藥性等,而適合作為功能性薄膜使用。 The surface treatment layer contained in the article disclosed herein has high wear resistance. Furthermore, depending on the composition of the surface treatment agent used, this surface treatment layer may also exhibit water repellency, oil repellency, anti-fouling properties (for example, preventing the adhesion of fingerprints and other contaminants), water repellency (preventing water from penetrating electronic components, etc.), surface smoothness (or lubricity, such as the ability to wipe away fingerprints and other contaminants or providing a pleasant touch to fingers), and chemical resistance, making it suitable for use as a functional film.

因此,本揭示亦進一步關於在最外層具有上述表面處理層之光學材料。 Therefore, the present disclosure further relates to an optical material having the above-mentioned surface treatment layer on the outermost layer.

光學材料除了與後述例示的顯示器等相關之光學材料之外,較佳可列舉各式各樣的光學材料:例如陰極射線管(CRT;例如電腦螢幕)、液晶顯示器、電漿顯示器、有機EL顯示器、無機薄膜EL點矩陣顯示器、背投影型顯示器、真空螢光顯示器(VFD;Vacuum Fluorescent Display)、場放射顯示器(FED;Field Emission Display)等顯示器或該等顯示器的保護板、或於該等的表面上施以抗反射膜處理者。 In addition to optical materials related to displays exemplified below, various optical materials are preferably used, including cathode ray tubes (CRTs; e.g., computer monitors), liquid crystal displays, plasma displays, organic EL displays, inorganic thin-film EL dot matrix displays, rear projection displays, vacuum fluorescent displays (VFDs), field emission displays (FEDs), and other displays, or protective plates for such displays, or surfaces thereof treated with an anti-reflection film.

本揭示之物品並無特別限定,可為光學構件。光學構件的例子可列舉下列者:眼鏡等鏡片;PDP、LCD等顯示器的前面保護板、抗反射板、偏光板、防眩板;行動電話、可攜式資訊終端等機器的觸控面板片;藍光(Blu-ray(註冊商標))光碟、DVD光碟、CD-R、MO等光碟的碟片面;光纖;時鐘的顯示面等。 The articles disclosed herein are not particularly limited and may be optical components. Examples of optical components include: lenses for glasses, etc.; front screens, anti-reflective sheets, polarizing sheets, and anti-glare sheets for displays such as PDPs and LCDs; touch panels for devices such as mobile phones and portable information terminals; the disc surfaces of optical discs such as Blu-ray discs, DVD discs, CD-R discs, and MO discs; optical fibers; and the display surface of clocks.

再者,本揭示之物品可為醫療機器或醫療材料。再者,具有藉由本揭示所得到之層的物品亦可為汽車的內外裝構件。外裝構件的例子 可列舉下列者:車窗、頭燈罩、車外鏡頭罩。內裝構件的例子可列舉下列者:儀錶板外罩、導航系統觸控面板、裝飾內裝構件。 Furthermore, the articles disclosed herein may be medical devices or medical materials. Furthermore, articles comprising the layers obtained by the present disclosure may be interior or exterior components of automobiles. Examples of exterior components include: windows, headlight housings, and mirror caps. Examples of interior components include: instrument panel covers, navigation system touch panels, and decorative interior components.

上述層的厚度並無特別限定。於光學構件時,從光學性能、磨耗耐久性及防污性之點而言,上述層的厚度較佳為1至50nm、1至30nm,更佳為1至15nm的範圍。 The thickness of the above layer is not particularly limited. In optical components, from the perspectives of optical performance, abrasion resistance, and antifouling properties, the thickness of the above layer is preferably in the range of 1 to 50 nm, 1 to 30 nm, and more preferably 1 to 15 nm.

以上,已詳細說明本揭示之物品。惟本揭示之物品及物品的製造方法等並不限定於上述例示。 The above describes the articles disclosed herein in detail. However, the articles disclosed herein and their manufacturing methods are not limited to the examples above.

[實施例] [Example]

以下,於實施例說明本揭示之化合物,惟本揭示並不限定於下列實施例。於本實施例中,構成氟聚醚之重複單元的存在順序為任意,下列所示之化學式係表示平均組成。 The following examples illustrate the compounds disclosed herein, but the present disclosure is not limited to the following examples. In these examples, the order of the repeating units constituting the fluoropolyether is arbitrary, and the chemical formula shown below represents the average composition.

合成例1 Synthesis example 1

將以平均組成CH3OCOCF2O(CF2O)12(CF2CF2O)12CF2COOCH3所表示之全氟聚醚改性酯體10.0g、1,3-雙(三氟甲基)苯5.0g及二乙三胺0.20g,投入於安裝有迴流冷卻器、溫度計及攪拌機之100mL的三頸燒瓶,並在氮氣流下於25℃攪拌1小時。接著,在添加3-胺基丙基三甲氧矽烷0.68g後,於25℃攪拌1小時。然後於減壓下餾除揮發份,藉此得到下式所表示之含全氟聚醚基之矽烷化合物(A)。 10.0 g of a perfluoropolyether - modified ester with an average composition of CH₃OCOCF₂O ( CF₂O ) ₁₂ ( CF₂CF₂O ) ₁₂CF₂COOCH₃ , 5.0 g of 1,3-bis(trifluoromethyl)benzene, and 0.20 g of diethylenetriamine were placed in a 100 mL three-necked flask equipped with a reflux cooler, a thermometer, and a stirrer. The mixture was stirred at 25°C for 1 hour under a nitrogen flow. Subsequently, 0.68 g of 3-aminopropyltrimethoxysilane was added, followed by stirring at 25°C for 1 hour. The volatiles were then distilled off under reduced pressure to obtain the perfluoropolyether-containing silane compound (A) represented by the following formula.

(CH3O)3SiCH2CH2CH2NHCOCF2O(CF2CF2O)12(CF2O)12CF2CONHCH2CH2NHCH2CH2NHCOCF2O(CF2CF2O)12(CF2O)12CF2CONHCH2CH2CH2Si(OCH3)3 (CH 3 O) 3 SiCH 2 CH 2 CH 2 NHCOCF 2 O(CF 2 CF 2 O) 12 (CF 2 O) 12 CF 2 CONHCH 2 CH 2 NHCH 2 CH 2 NHCOCF 2 O(CF 2 CF 2 O) 12 (CF 2 O) 12 CF 2 CONHCH 2 CH 2 CH 2 Si(OCH 3 ) 3

合成例2 Synthesis example 2

將合成例1中所得到之含全氟聚醚基之矽烷化合物(A)10.0g及丙烯酸2-異氰酸乙酯(昭和電工股份有限公司製Karenz(註冊商標)AOI)0.27g,投入於安裝有迴流冷卻器、溫度計及攪拌機之100mL的三頸燒瓶,並在氮氣流下於25℃攪拌1小時,而得到下式所表示之含全氟聚醚基之矽烷化合物(B)。 10.0 g of the perfluoropolyether group-containing silane compound (A) obtained in Synthesis Example 1 and 0.27 g of 2-ethyl isocyanate acrylate (Karenz (registered trademark) AOI, manufactured by Showa Denko Co., Ltd.) were placed in a 100 mL three-necked flask equipped with a reflux cooler, a thermometer, and a stirrer. The mixture was stirred at 25°C for 1 hour under a nitrogen flow to obtain the perfluoropolyether group-containing silane compound (B) represented by the following formula.

(CH3O)3SiCH2CH2CH2NHCOCF2O(CF2CF2O)12(CF2O)12CF2CONHCH2CH2N(X)CH2CH2NHCOCF2O(CF2CF2O)12(CF2O)12CF2CONHCH2CH2CH2Si(OCH3)3 (CH 3 O) 3 SiCH 2 CH 2 CH 2 NHCOCF 2 O(CF 2 CF 2 O) 12 (CF 2 O) 12 CF 2 CONHCH 2 CH 2 N(X)CH 2 CH 2 NHCOCF 2 O(CF 2 CF 2 O) 12 (CF 2 O) 12 CF 2 CONHCH 2 CH 2 CH 2 Si(OCH 3 ) 3

-X=-CONHCH2CH2OCOCH=CH2 -X=-CONHCH 2 CH 2 OCOCH=CH 2

合成例3 Synthesis example 3

將合成例1中所得到之含全氟聚醚基之矽烷化合物(A)10.0g及異氰酸1,1-(雙丙烯醯氧基甲基)乙酯(昭和電工股份有限公司製Karenz(註冊商標)BEI)0.46g,投入於安裝有迴流冷卻器、溫度計及攪拌機之100mL的三頸燒瓶,並在氮氣流下於25℃攪拌1小時,而得到下式所表示之含全氟聚醚基之矽烷化合物(C)。 10.0 g of the perfluoropolyether group-containing silane compound (A) obtained in Synthesis Example 1 and 0.46 g of 1,1-(diacryloyloxymethyl)ethyl isocyanate (Karenz (registered trademark) BEI, manufactured by Showa Denko Co., Ltd.) were placed in a 100 mL three-necked flask equipped with a reflux cooler, a thermometer, and a stirrer. The mixture was stirred at 25°C for 1 hour under a nitrogen flow to obtain the perfluoropolyether group-containing silane compound (C) represented by the following formula.

(CH3O)3SiCH2CH2CH2NHCOCF2O(CF2CF2O)12(CF2O)12CF2CONHCH2CH2N(X)CH2CH2NHCOCF2O(CF2CF2O)12(CF2O)12CF2CONHCH2CH2CH2Si(OCH3)3 (CH 3 O) 3 SiCH 2 CH 2 CH 2 NHCOCF 2 O(CF 2 CF 2 O) 12 (CF 2 O) 12 CF 2 CONHCH 2 CH 2 N(X)CH 2 CH 2 NHCOCF 2 O(CF 2 CF 2 O) 12 (CF 2 O) 12 CF 2 CONHCH 2 CH 2 CH 2 Si(OCH 3 ) 3

-X=-CONHC(CH3)(CH2OCOCH=CH2)2 -X=-CONHC(CH 3 )(CH 2 OCOCH=CH 2 ) 2

合成例4 Synthesis example 4

將以平均組成CH3OCOCF2O(CF2O)12(CF2CF2O)12CF2COOCH3所表示之全氟聚醚改性酯體10.0g、1,3-雙(三氟甲基)苯5.0g及三乙四胺0.28g,投入於安裝有迴流冷卻器、溫度計及攪拌機之100mL的三頸燒瓶,並在氮 氣流下於25℃攪拌1小時。接著,添加3-胺基丙基三甲氧矽烷0.68g後,於25℃攪拌1小時。然後於減壓下餾除揮發份,藉此得到下式所表示之含全氟聚醚基之矽烷化合物(D)。 10.0 g of a perfluoropolyether - modified ester with an average composition of CH₃OCOCF₂O ( CF₂O ) ₁₂ ( CF₂CF₂O ) ₁₂CF₂COOCH₃ , 5.0 g of 1,3-bis(trifluoromethyl)benzene, and 0.28 g of triethylenetetramine were placed in a 100 mL three-neck flask equipped with a reflux cooler, a thermometer, and a stirrer. The mixture was stirred at 25°C for 1 hour under a nitrogen flow. Subsequently, 0.68 g of 3-aminopropyltrimethoxysilane was added, and the mixture was stirred at 25°C for 1 hour. The volatiles were then distilled off under reduced pressure to obtain the perfluoropolyether-containing silane compound (D) represented by the following formula.

(CH3O)3SiCH2CH2CH2NHCOCF2O(CF2CF2O)12(CF2O)12CF2CONHCH2CH2NHCH2CH2NHCH2CH2NHCOCF2O(CF2CF2O)12(CF2O)12CF2CONHCH2CH2CH2Si(OCH3)3 (CH 3 O) 3 SiCH 2 CH 2 CH 2 NHCOCF 2 O(CF 2 CF 2 O) 12 (CF 2 O) 12 CF 2 CONHCH 2 CH 2 NHCH 2 CH 2 NHCH 2 CH 2 NHCOCF 2 O(CF 2 CF 2 O) 12 (CF 2 O) 12 CF 2 CONHCH 2 CH 2 CH 2 Si(OCH 3 ) 3

合成例5 Synthesis example 5

將合成例4中所得到之含全氟聚醚基之矽烷化合物(D)10.0g及丙烯酸2-異氰酸乙酯(昭和電工股份有限公司製Karenz(註冊商標)AOI)0.54g,投入於安裝有迴流冷卻器、溫度計及攪拌機之100mL的三頸燒瓶,並在氮氣流下於25℃攪拌1小時,而得到下式所表示之含全氟聚醚基之矽烷化合物(E)。 10.0 g of the perfluoropolyether group-containing silane compound (D) obtained in Synthesis Example 4 and 0.54 g of 2-ethyl isocyanate acrylate (Karenz (registered trademark) AOI, manufactured by Showa Denko Co., Ltd.) were placed in a 100 mL three-necked flask equipped with a reflux cooler, a thermometer, and a stirrer. The mixture was stirred at 25°C for 1 hour under a nitrogen flow to obtain the perfluoropolyether group-containing silane compound (E) represented by the following formula.

(CH3O)3SiCH2CH2CH2NHCOCF2O(CF2CF2O)12(CF2O)12CF2CONHCH2CH2N(X)CH2CH2N(X)CH2CH2NHCOCF2O(CF2CF2O)12(CF2O)12CF2CONHCH2CH2CH2Si(OCH3)3 (CH 3 O) 3 SiCH 2 CH 2 CH 2 NHCOCF 2 O(CF 2 CF 2 O) 12 (CF 2 O) 12 CF 2 CONHCH 2 CH 2 N(X)CH 2 CH 2 N(X)CH 2 CH 2 NHCOCF 2 O(CF 2 CF 2 O) 12 (CF 2 O) 12 CF 2 CONHCH 2 CH 2 CH 2 Si(OCH 3 ) 3

-X=-CONHCH2CH2OCOCH=CH2 -X=-CONHCH 2 CH 2 OCOCH=CH 2

合成例6 Synthesis example 6

將以平均組成CH3OCOCF(CF3){OCF2CF(CF3)}mOCF2CF2O{CF(CF3)CF2O}nCF(CF3)COOCH3(m+n≒34)所表示之全氟聚醚改性酯體10.0g、六氟苯5.0g及二乙三胺0.085g,投入於安裝有迴流冷卻器、溫度計及攪拌機之100mL的三頸燒瓶,並在氮氣流下於70℃攪拌13小時。接著,添加3-胺基丙基三甲氧矽烷0.29g後,於70℃攪拌12小時。然後於 減壓下餾除揮發份,藉此得到下式所表示之含全氟聚醚基之矽烷化合物(F)。 10.0 g of a perfluoropolyether-modified ester represented by the average composition CH 3 OCOCF(CF 3 ){OCF 2 CF(CF 3 ) } m OCF 2 CF 2 O{CF(CF 3 )CF 2 O} n CF(CF 3 )COOCH 3 (m+n ≒ 34), 5.0 g hexafluorobenzene, and 0.085 g diethylenetriamine were placed in a 100 mL three-neck flask equipped with a reflux cooler, thermometer, and stirrer. The mixture was stirred at 70°C for 13 hours under a nitrogen stream. Subsequently, 0.29 g of 3-aminopropyltrimethoxysilane was added, and the mixture was stirred at 70°C for 12 hours. The volatile matter is then distilled off under reduced pressure to obtain a perfluoropolyether group-containing silane compound (F) represented by the following formula.

(CH3O)3SiCH2CH2CH2NHCOCF(CF3){OCF2CF(CF3)}mOCF2CF2O{CF(CF3)CF2O}nCF(CF3)CONHCH2CH2NHCH2CH2NHCOCF(CF3){OCF2CF(CF3)}mOCF2CF2O{CF(CF3)CF2O}nCF(CF3)CONHCH2CH2CH2Si(OCH3)3 (CH 3 O) 3 SiCH 2 CH 2 CH 2 NHCOCF(CF 3 ){OCF 2 CF(CF 3 )} m OCF 2 CF 2 O{CF(CF 3 )CF 2 O} n CF(CF 3 )CONHCH 2 CH 2 NHCH 2 CH 2 NHCOCF(CF 3 ){OCF 2 CF(CF 3 )} m OCF 2 CF 2 O{CF(CF 3 )CF 2 O} n CF(CF 3 )CONHCH 2 CH 2 CH 2 Si(OCH 3 ) 3

合成例7 Synthesis Example 7

將合成例6中所得到之含全氟聚醚基之矽烷化合物(F)10.0g及丙烯酸2-異氰酸乙酯(昭和電工股份有限公司製Karenz(註冊商標)AOI)0.12g,投入於安裝有迴流冷卻器、溫度計及攪拌機之100mL的三頸燒瓶,並在氮氣流下於25℃攪拌1小時,而得到下式所表示之含全氟聚醚基之矽烷化合物(G)。 10.0 g of the perfluoropolyether group-containing silane compound (F) obtained in Synthesis Example 6 and 0.12 g of 2-ethyl isocyanate acrylate (Karenz (registered trademark) AOI, manufactured by Showa Denko Co., Ltd.) were placed in a 100 mL three-necked flask equipped with a reflux cooler, a thermometer, and a stirrer. The mixture was stirred at 25°C for 1 hour under a nitrogen flow to obtain the perfluoropolyether group-containing silane compound (G) represented by the following formula.

(CH3O)3SiCH2CH2CH2NHCOCF(CF3){OCF2CF(CF3)}mOCF2CF2O{CF(CF3)CF2O}nCF(CF3)CONHCH2CH2N(X)CH2CH2NHCOCF(CF3){OCF2CF(CF3)}mOCF2CF2O{CF(CF3)CF2O}nCF(CF3)CONHCH2CH2CH2Si(OCH3)3 (CH 3 O) 3 SiCH 2 CH 2 CH 2 NHCOCF(CF 3 ){OCF 2 CF(CF 3 )} m OCF 2 CF 2 O{CF(CF 3 )CF 2 O} n CF(CF 3 )CONHCH 2 CH 2 N(X)CH 2 CH 2 NHCOCF(CF 3 ){OCF 2 CF(CF 3 )} m OCF 2 CF 2 O{CF(CF 3 )CF 2 O} n CF(CF 3 )CONHCH 2 CH 2 CH 2 Si(OCH 3 ) 3

-X=-CONHCH2CH2OCOCH=CH2 -X=-CONHCH 2 CH 2 OCOCH=CH 2

合成例8 Synthesis example 8

將合成例1中所得到之含全氟聚醚基之矽烷化合物(A)10.0g及丙烯酸4-羥基丁酯縮水甘油醚(Mitsubishi Chemical股份有限公司製4HBAGE)0.38g,投入於安裝有迴流冷卻器、溫度計及攪拌機之100mL的三頸燒瓶,並在氮氣流下於50℃攪拌3小時,而得到下式所表示之含全氟聚醚基之矽烷化合物(H)。 10.0 g of the perfluoropolyether-containing silane compound (A) obtained in Synthesis Example 1 and 0.38 g of 4-hydroxybutyl acrylate glycidyl ether (4HBAGE, manufactured by Mitsubishi Chemical Co., Ltd.) were placed in a 100 mL three-necked flask equipped with a reflux cooler, a thermometer, and a stirrer. The mixture was stirred at 50°C for 3 hours under a nitrogen flow to obtain the perfluoropolyether-containing silane compound (H) represented by the following formula.

(CH3O)3SiCH2CH2CH2NHCOCF2O(CF2CF2O)12(CF2O)12CF2CONHCH2CH2N(X)CH2CH2NHCOCF2O(CF2CF2O)12(CF2O)12CF2CONHCH2CH2CH2Si(OCH3)3 (CH 3 O) 3 SiCH 2 CH 2 CH 2 NHCOCF 2 O(CF 2 CF 2 O) 12 (CF 2 O) 12 CF 2 CONHCH 2 CH 2 N(X)CH 2 CH 2 NHCOCF 2 O(CF 2 CF 2 O) 12 (CF 2 O) 12 CF 2 CONHCH 2 CH 2 CH 2 Si(OCH 3 ) 3

-X為下述-X1與-X2之混合物(X1:X2=80:20) -X is a mixture of -X1 and -X2 ( X1 : X2 = 80:20)

-X1=-CH2CH(OH)CH2OCH2CH2CH2CH2OCOCH=CH2 -X 1 =-CH 2 CH(OH)CH 2 OCH 2 CH 2 CH 2 CH 2 OCOCH=CH 2

-X2=-CH(CH2OH)CH2OCH2CH2CH2CH2OCOCH=CH2 -X 2 =-CH(CH 2 OH)CH 2 OCH 2 CH 2 CH 2 CH 2 OCOCH=CH 2

合成例9 Synthesis example 9

將以平均組成CH3OCOCF2O(CF2O)12(CF2CF2O)12CF2COOCH3所表示之全氟聚醚改性酯體10.0g、1,3-雙(三氟甲基)苯5.0g及1,3-二胺基-2-丙醇0.20g,投入於安裝有迴流冷卻器、溫度計及攪拌機之100mL的三頸燒瓶,並在氮氣流下於25℃攪拌1小時。接著,添加3-胺基丙基三甲氧矽烷0.68g後,於25℃攪拌1小時。然後於減壓下餾除揮發份,藉此得到下式所表示之含全氟聚醚基之矽烷化合物(I)。 10.0 g of a perfluoropolyether - modified ester with an average composition of CH₃OCOCF₂O ( CF₂O ) ₁₂ ( CF₂CF₂O ) ₁₂CF₂COOCH₃ , 5.0 g of 1,3-bis(trifluoromethyl)benzene, and 0.20 g of 1,3-diamino-2-propanol were placed in a 100 mL three-necked flask equipped with a reflux cooler, a thermometer, and a stirrer. The mixture was stirred at 25 °C for 1 hour under a nitrogen flow. Subsequently, 0.68 g of 3-aminopropyltrimethoxysilane was added, and the mixture was stirred at 25°C for 1 hour. The volatiles were then distilled off under reduced pressure to obtain the perfluoropolyether-containing silane compound (I) represented by the following formula.

(CH3O)3SiCH2CH2CH2NHCOCF2O(CF2CF2O)12(CF2O)12CF2CONHCH2CH(OH)CH2NHCOCF2O(CF2CF2O)12(CF2O)12CF2CONHCH2CH2CH2Si(OCH3)3 (CH 3 O) 3 SiCH 2 CH 2 CH 2 NHCOCF 2 O(CF 2 CF 2 O) 12 (CF 2 O) 12 CF 2 CONHCH 2 CH(OH)CH 2 NHCOCF 2 O(CF 2 CF 2 O) 12 (CF 2 O) 12 CF 2 CONHCH 2 CH 2 CH 2 Si(OCH 3 ) 3

合成例10 Synthesis example 10

將合成例9中所得到之含全氟聚醚基之矽烷化合物(I)10.0g、丙烯酸2-異氰酸乙酯(昭和電工股份有限公司製Karenz(註冊商標)AOI)0.27g及二月桂酸二丁基錫0.012g,投入於安裝有迴流冷卻器、溫度計及攪拌機之100mL的三頸燒瓶,並在氮氣流下於50℃攪拌2小時,而得到下式所表示之含全氟聚醚基之矽烷化合物(J)。 10.0 g of the perfluoropolyether group-containing silane compound (I) obtained in Synthesis Example 9, 0.27 g of 2-ethyl isocyanate acrylate (Karenz (registered trademark) AOI, manufactured by Showa Denko Co., Ltd.), and 0.012 g of dibutyltin dilaurate were placed in a 100 mL three-necked flask equipped with a reflux cooler, a thermometer, and a stirrer. The mixture was stirred at 50°C for 2 hours under a nitrogen flow to obtain the perfluoropolyether group-containing silane compound (J) represented by the following formula.

(CH3O)3SiCH2CH2CH2NHCOCF2O(CF2CF2O)12(CF2O)12CF2CONHCH2CH(OX)CH2NHCOCF2O(CF2CF2O)12(CF2O)12CF2CONHCH2CH2CH2Si(OCH3)3 (CH 3 O) 3 SiCH 2 CH 2 CH 2 NHCOCF 2 O(CF 2 CF 2 O) 12 (CF 2 O) 12 CF 2 CONHCH 2 CH(OX)CH 2 NHCOCF 2 O(CF 2 CF 2 O) 12 (CF 2 O) 12 CF 2 CONHCH 2 CH 2 CH 2 Si(OCH 3 ) 3

-X=-CONHCH2CH2OCOCH=CH2 -X=-CONHCH 2 CH 2 OCOCH=CH 2

合成例11 Synthesis example 11

將以平均組成CH3OCOCF2O(CF2O)12(CF2CF2O)12CF2COOCH3所表示之全氟聚醚改性酯體10.0g、1,3-雙(三氟甲基)苯5.0g及二乙三胺0.20g,投入於安裝有迴流冷卻器、溫度計及攪拌機之100mL的三頸燒瓶,並在氮氣流下於25℃攪拌1小時。接著,添加3-(2-胺基乙基胺基)丙基三甲氧矽烷0.85g後,於25℃攪拌1小時。然後於減壓下餾除揮發份,藉此得到下式所表示之含全氟聚醚基之矽烷化合物(K)。 10.0 g of a perfluoropolyether - modified ester with an average composition of CH₃OCOCF₂O ( CF₂O ) ₁₂ ( CF₂CF₂O ) ₁₂CF₂COOCH₃ , 5.0 g of 1,3-bis(trifluoromethyl)benzene, and 0.20 g of diethylenetriamine were placed in a 100 mL three-necked flask equipped with a reflux cooler, a thermometer, and a stirrer. The mixture was stirred at 25°C for 1 hour under a nitrogen flow. Subsequently, 0.85 g of 3-(2-aminoethylamino)propyltrimethoxysilane was added, and the mixture was stirred at 25°C for 1 hour. The volatiles were then distilled off under reduced pressure to obtain the perfluoropolyether-containing silane compound (K) represented by the following formula.

(CH3O)3SiCH2CH2CH2NHCH2CH2NHCOCF2O(CF2CF2O)12(CF2O)12CF2CONHCH2CH2NHCH2CH2NHCOCF2O(CF2CF2O)12(CF2O)12CF2CONHCH2CH2NHCH2CH2CH2Si(OCH3)3 (CH 3 O) 3 SiCH 2 CH 2 CH 2 NHCH 2 CH 2 NHCOCF 2 O(CF 2 CF 2 O) 12 (CF 2 O) 12 CF 2 CONHCH 2 CH 2 NHCH 2 CH 2 NHCOCF 2 O(CF 2 CF 2 O) 12 (CF 2 O) 12 CF 2 CONHCH 2 CH 2 NHCH 2 CH 2 CH 2 Si(OCH 3 ) 3

合成例12 Synthesis example 12

將合成例11中所得到之含全氟聚醚基之矽烷化合物(K)10.0g及丙烯酸2-異氰酸乙酯(昭和電工股份有限公司製Karenz(註冊商標)AOI)0.81g,投入於安裝有迴流冷卻器、溫度計及攪拌機之100mL的三頸燒瓶,並在氮氣流下於25℃攪拌2小時,而得到下式所表示之含全氟聚醚基之矽烷化合物(L)。 10.0 g of the perfluoropolyether group-containing silane compound (K) obtained in Synthesis Example 11 and 0.81 g of 2-ethyl isocyanate acrylate (Karenz (registered trademark) AOI, manufactured by Showa Denko Co., Ltd.) were placed in a 100 mL three-necked flask equipped with a reflux cooler, a thermometer, and a stirrer. The mixture was stirred at 25°C for 2 hours under a nitrogen flow to obtain the perfluoropolyether group-containing silane compound (L) represented by the following formula.

(CH3O)3SiCH2CH2CH2N(X)CH2CH2NHCOCF2O(CF2CF2O)12(CF2O)12CF2CONHCH2CH2N(X)CH2CH2NHCOCF2O(CF2CF2O)12(CF2O)12CF2CONHCH2CH2N(X)CH2CH2CH2Si(OCH3)3 (CH 3 O) 3 SiCH 2 CH 2 CH 2 N(X)CH 2 CH 2 NHCOCF 2 O(CF 2 CF 2 O) 12 (CF 2 O) 12 CF 2 CONHCH 2 CH 2 N(X)CH 2 CH 2 NHCOCF 2 O(CF 2 CF 2 O) 12 (CF 2 O) 12 CF 2 CONHCH 2 CH 2 N(X)CH 2 CH 2 CH 2 Si(OCH 3 ) 3

-X=-CONHCH2CH2OCOCH=CH2 -X=-CONHCH 2 CH 2 OCOCH=CH 2

合成例13 Synthesis example 13

將以平均組成CH3OCOCF2CF2O(CF2CF2CF2O)16CF2CF2COOCH3所表示之全氟聚醚改性酯體10.0g、1,3-雙(三氟甲基)苯5.0g及二乙三胺0.17g,投入於安裝有迴流冷卻器、溫度計及攪拌機之100mL的三頸燒瓶,並在氮氣流下於25℃攪拌1小時。接著,添加3-胺基丙基三甲氧矽烷0.60g後,於25℃攪拌1小時。然後於減壓下餾除揮發份,藉此得到下式所表示之含全氟聚醚基之矽烷化合物(M)。 10.0 g of a perfluoropolyether-modified ester with an average composition of CH₃OCOCF₂CF₂O ( CF₂CF₂O ) ₁₆CF₂COOCH₃ , 5.0 g of 1,3-bis(trifluoromethyl)benzene, and 0.17 g of diethylenetriamine were placed in a 100 mL three -necked flask equipped with a reflux cooler, a thermometer, and a stirrer. The mixture was stirred at 25°C for 1 hour under a nitrogen flow. Subsequently, 0.60 g of 3-aminopropyltrimethoxysilane was added, and the mixture was stirred at 25°C for 1 hour. The volatiles were then distilled off under reduced pressure to obtain the perfluoropolyether-containing silane compound (M) represented by the following formula.

(CH3O)3SiCH2CH2CH2NHCOCF2CF2O(CF2CF2CF2O)16CF2CF2CONHCH2CH2NHCH2CH2NHCOCF2CF2O(CF2CF2CF2O)16CF2CF2CONHCH2CH2CH2Si(OCH3)3 (CH 3 O) 3 SiCH 2 CH 2 CH 2 NHCOCF 2 CF 2 O(CF 2 CF 2 CF 2 O) 16 CF 2 CF 2 CONHCH 2 CH 2 NHCH 2 CH 2 NHCOCF 2 CF 2 O(CF 2 CF 2 CF 2 O) 16 CF 2 CF 2 CONHCH 2 CH 2 CH 2 Si(OCH 3 ) 3

合成例14 Synthesis Example 14

將合成例13中所得到之含全氟聚醚基之矽烷化合物(M)10.0g及丙烯酸2-異氰酸乙酯(昭和電工股份有限公司製Karenz(註冊商標)AOI)0.24g,投入於安裝有迴流冷卻器、溫度計及攪拌機之100mL的三頸燒瓶,並在氮氣流下於25℃攪拌1小時,而得到下式所表示之含全氟聚醚基之矽烷化合物(N)。 10.0 g of the perfluoropolyether group-containing silane compound (M) obtained in Synthesis Example 13 and 0.24 g of 2-ethyl isocyanate acrylate (Karenz (registered trademark) AOI, manufactured by Showa Denko Co., Ltd.) were placed in a 100 mL three-necked flask equipped with a reflux cooler, a thermometer, and a stirrer. The mixture was stirred at 25°C for 1 hour under a nitrogen flow to obtain the perfluoropolyether group-containing silane compound (N) represented by the following formula.

(CH3O)3SiCH2CH2CH2NHCOCF2CF2O(CF2CF2CF2O)16CF2CF2CONHCH2CH2N(X)CH2CH2NHCOCF2CF2O(CF2CF2CF2O)16CF2CF2CONHCH2CH2CH2Si(OCH3)3 (CH 3 O) 3 SiCH 2 CH 2 CH 2 NHCOCF 2 CF 2 O(CF 2 CF 2 CF 2 O) 16 CF 2 CF 2 CONHCH 2 CH 2 N(X)CH 2 CH 2 NHCOCF 2 CF 2 O(CF 2 CF 2 CF 2 O) 16 CF 2 CF 2 CONHCH 2 CH 2 CH 2 Si(OCH 3 ) 3

-X=-CONHCH2CH2OCOCH=CH2 -X=-CONHCH 2 CH 2 OCOCH=CH 2

實施例1 Example 1

以濃度成為20wt%之方式,將上述合成例2中所得到之化合物(B)溶解於Novec 7200(3M公司製),而調製出表面處理劑。 Compound (B) obtained in Synthesis Example 2 was dissolved in Novec 7200 (manufactured by 3M) to a concentration of 20 wt% to prepare a surface treatment agent.

將上述所調製之表面處理劑分別真空蒸鍍於化學強化玻璃(Corning公司製、「Gorilla」玻璃、厚度0.7mm)上。真空蒸鍍法的條件:電阻加熱式蒸鍍機處理室大小1,900mmφ、真空度5.0E-05、電流值240A、電壓10V、基材溫度40℃。接著,將蒸鍍後的化學強化玻璃於溫度150℃的環境下靜置30分鐘,然後放置冷卻至室溫。接著在空氣環境下,以1000mJ/cm2的強度將含有365nm的UV光之光線照射在蒸鍍後的化學強化玻璃,而在玻璃基材上形成表面處理層。 The prepared surface treatment agents were vacuum-evaporated onto chemically strengthened glass (Corning "Gorilla Glass," 0.7 mm thick). Vacuum evaporation conditions were: a 1,900 mm diameter chamber in a resistive heating evaporator, a vacuum level of 5.0E-05, a current of 240 A, a voltage of 10 V, and a substrate temperature of 40°C. The evaporated chemically strengthened glass was then allowed to stand at 150°C for 30 minutes and then allowed to cool to room temperature. The evaporated chemically strengthened glass was then irradiated with 365 nm UV light at an intensity of 1000 mJ/ cm² in an air atmosphere to form a surface treatment layer on the glass substrate.

實施例2 Example 2

除了使用上述合成例3中所得到之化合物(C)來取代化合物(B)之外,其他與實施例1相同地施作,而調製表面處理劑並形成表面處理層。 The surface treatment agent was prepared and the surface treatment layer was formed in the same manner as in Example 1, except that the compound (C) obtained in Synthesis Example 3 was used instead of the compound (B).

實施例3 Example 3

除了使用上述合成例5中所得到之化合物(E)來取代化合物(B)之外,其他與實施例1相同地施作,而調製表面處理劑並形成表面處理層。 The surface treatment agent was prepared and the surface treatment layer was formed in the same manner as in Example 1, except that the compound (E) obtained in Synthesis Example 5 was used instead of the compound (B).

實施例4 Example 4

除了使用上述合成例7中所得到之化合物(G)來取代化合物(B)之外,其他與實施例1相同地施作,而調製表面處理劑並形成表面處理層。 The surface treatment agent was prepared and the surface treatment layer was formed in the same manner as in Example 1, except that the compound (G) obtained in Synthesis Example 7 was used instead of the compound (B).

實施例5 Example 5

除了使用上述合成例8中所得到之化合物(H)來取代化合物(B)之外,其他與實施例1相同地施作,而調製表面處理劑並形成表面處理層。 The surface treatment agent was prepared and the surface treatment layer was formed in the same manner as in Example 1, except that the compound (H) obtained in Synthesis Example 8 was used instead of the compound (B).

實施例6 Example 6

除了使用上述合成例10中所得到之化合物(J)來取代化合物(B)之外,其他與實施例1相同地施作,而調製表面處理劑並形成表面處理層。 The surface treatment agent was prepared and the surface treatment layer was formed in the same manner as in Example 1, except that the compound (J) obtained in Synthesis Example 10 was used instead of the compound (B).

實施例7 Example 7

除了使用上述合成例12中所得到之化合物(L)來取代化合物(B)之外,其他與實施例1相同地施作,而調製表面處理劑並形成表面處理層。 The surface treatment agent was prepared and the surface treatment layer was formed in the same manner as in Example 1, except that the compound (L) obtained in Synthesis Example 12 was used instead of the compound (B).

實施例8 Example 8

除了使用上述合成例14中所得到之化合物(N)來取代化合物(B)之外,其他與實施例1相同地施作,而調製表面處理劑並形成表面處理層。 The surface treatment agent was prepared and the surface treatment layer was formed in the same manner as in Example 1, except that the compound (N) obtained in Synthesis Example 14 was used instead of the compound (B).

比較例1 Comparative example 1

以濃度成為20wt%之方式,將下述化合物(O)溶解於Novec 7200(3M公司製),而調製出表面處理劑。 The following compound (O) was dissolved in Novec 7200 (manufactured by 3M) to a concentration of 20 wt% to prepare a surface treatment agent.

(CH3O)3SiCH2CH2CH2NHCOCF2O(CF2CF2O)12(CF2O)12CF2CONHCH2CH2CH2Si(OCH3)3 (CH 3 O) 3 SiCH 2 CH 2 CH 2 NHCOCF 2 O(CF 2 CF 2 O) 12 (CF 2 O) 12 CF 2 CONHCH 2 CH 2 CH 2 Si(OCH 3 ) 3

將上述所調製之表面處理劑分別真空蒸鍍於化學強化玻璃(Corning公司製、「Gorilla」玻璃、厚度0.7mm)上。真空蒸鍍法的條件:電阻加熱式蒸鍍機處理室大小1,900mmφ、真空度5.0E-05、電流值240A、電壓10V、基材溫度40℃。接著將蒸鍍後的化學強化玻璃於溫度150℃的環境下靜置30分鐘,然後放置冷卻至室溫,而在玻璃基材上形成表面處理層。 The prepared surface treatment agents were vacuum-deposited onto chemically strengthened glass (Corning "Gorilla" Glass, 0.7mm thick). Vacuum deposition conditions were: a 1,900mmφ chamber in a resistive heating evaporator, a vacuum level of 5.0E-05, a current of 240A, a voltage of 10V, and a substrate temperature of 40°C. The chemically strengthened glass was then placed at 150°C for 30 minutes and then allowed to cool to room temperature, forming a surface treatment layer on the glass substrate.

比較例2 Comparative example 2

除了使用下述化合物(P)來取代化合物(O)之外,其他與比較例1相同地施作,而調製表面處理劑並形成表面處理層。 The surface treatment agent was prepared and the surface treatment layer was formed in the same manner as in Comparative Example 1, except that the following compound (P) was used instead of compound (O).

(CH3O)3SiCH2CH2CH2NHCOCF2CF2O(CF2CF2CF2O)16CF2CF2CONHCH2CH2CH2Si(OCH3)3 (CH 3 O) 3 SiCH 2 CH 2 CH 2 NHCOCF 2 CF 2 O(CF 2 CF 2 CF 2 O) 16 CF 2 CF 2 CONHCH 2 CH 2 CH 2 Si(OCH 3 ) 3

比較例3 Comparative example 3

除了使用下述化合物(Q)來取代化合物(O)之外,其他與比較例1相同地施作,而調製表面處理劑並形成表面處理層。 The surface treatment agent was prepared and the surface treatment layer was formed in the same manner as in Comparative Example 1, except that the following compound (Q) was used instead of compound (O).

(CH3O)3SiCH2CH2CH2NHCOCF2O(CF2CF2O)12(CF2O)12CF2CONHCH2CH2CH2NHCOCF2O(CF2CF2O)12(CF2O)12CF2CONHCH2CH2CH2Si(OCH3)3 (CH 3 O) 3 SiCH 2 CH 2 CH 2 NHCOCF 2 O(CF 2 CF 2 O) 12 (CF 2 O) 12 CF 2 CONHCH 2 CH 2 CH 2 NHCOCF 2 O(CF 2 CF 2 O) 12 (CF 2 O) 12 CF 2 CONHCH 2 CH 2 CH 2 Si(OCH 3 ) 3

比較例4 Comparative example 4

除了使用下述化合物(R)來取代化合物(O)之外,其他與比較例1相同地施作,而調製表面處理劑並形成表面處理層。 The surface treatment agent was prepared and the surface treatment layer was formed in the same manner as in Comparative Example 1, except that the following compound (R) was used instead of compound (O).

(CH3O)3SiCH2CH2CH2NHCOCF(CF3){OCF2CF(CF3)}mOCF2CF2O{CF(CF3)CF2O}nCF(CF3)CONHCH2CH2CH2Si(OCH3)3 (CH 3 O) 3 SiCH 2 CH 2 CH 2 NHCOCF(CF 3 ){OCF 2 CF(CF 3 )} m OCF 2 CF 2 O{CF(CF 3 )CF 2 O} n CF(CF 3 )CONHCH 2 CH 2 CH 2 Si(OCH 3 ) 3

〈評估〉 <evaluate>

對於上述所得到之附表面處理層玻璃基體,分別以下列方式進行水接觸角的測定、鹼試驗的評估。 The surface-treated glass substrate obtained above was subjected to water contact angle measurement and alkaline test evaluation using the following methods.

(鹼浸漬試驗) (Alkali leaching test)

將直徑1cm的PTFE製O型環設置在上述實施例1至8以及比較例1至4經表面處理後之基材的表面上,並將8N的NaOH溶液(鹼水溶液)滴入於上述O型環內以使表面處理層的表面與鹼水溶液接觸,而使用在鹼浸漬試驗。在鹼浸漬試驗經過20至300分鐘後,拭除鹼水溶液並以純水、乙醇進行洗淨後,測定相對於水之接觸角。水的靜態接觸角係使2μL純水的 水滴著滴於上述鹼浸漬試驗後之玻璃基體的表面上,並使用接觸角計(協和界面化學公司製:自動接觸角計DropMaster 701)來測定相對於水之接觸角。鹼浸漬試驗後之水的靜態接觸角的測定處係在5處進行。水之靜態接觸角的測定值在300分鐘以內降低時,於中途停止鹼浸漬試驗。將浸漬時間與5處的接觸角平均值之關表示於下表。 A 1cm diameter PTFE O-ring was placed on the surface of the substrates treated in Examples 1 to 8 and Comparative Examples 1 to 4. An 8N NaOH solution (alkaline aqueous solution) was dripped into the O-ring to bring the treated surface into contact with the alkaline aqueous solution. The O-ring was then used in an alkaline immersion test. After 20 to 300 minutes of alkaline immersion, the alkaline aqueous solution was removed and the substrates were rinsed with pure water and ethanol. The contact angle relative to water was then measured. The static contact angle of water was determined by dropping 2 μL of pure water onto the surface of the glass substrate after the alkali immersion test. The contact angle relative to water was measured using a contact angle meter (Kyowa Interface Chemical Co., Ltd.: Automatic Contact Angle Meter DropMaster 701). The static contact angle of water after the alkali immersion test was measured at five locations. If the measured static contact angle of water decreased within 300 minutes, the alkali immersion test was terminated. The relationship between immersion time and the average contact angle at the five locations is shown in the table below.

[表1] [Table 1]

(磨耗耐久性試驗) (Abrasion durability test)

水平地配置形成有表面處理層之樣本物品,使下述摩擦件與表面處理層的表面(接觸面為直徑1cm的圓)接觸,於其上方賦予5N的荷重,然後在施加荷重之狀態下以40mm/秒的速度使摩擦件來回行進。使摩擦件來回行進最大為4000次,於來回次數(摩擦次數)每1000次時測定水的靜態接觸角(°)。在水之靜態接觸角的測定值未達60°之時間點中止試驗。水之靜態接觸角的測定係與上述鹼試驗同樣地實施。將結果表示於下述表。 A sample article with a surface treatment layer was placed horizontally. The following friction material was placed in contact with the surface of the surface treatment layer (the contact surface was a 1 cm diameter circle). A 5 N load was applied to the friction material. The friction material was then reciprocated at a speed of 40 mm/s while the load was applied. The friction material was reciprocated up to 4000 times. The static contact angle (°) with water was measured every 1000 reciprocating times (rubbing times). The test was terminated when the measured static contact angle with water fell below 60°. The static contact angle with water was measured in the same manner as in the alkaline test described above. The results are shown in the table below.

˙摩擦件 Friction parts

以浸漬在下述所示之組成的人工汗液後之棉布被覆下述所示之聚矽氧橡膠加工品的表面(直徑1cm)者,作為摩擦件使用。 The surface of the silicone rubber product (1 cm in diameter) shown below is covered with cotton cloth soaked in artificial sweat of the composition shown below and used as a friction member.

人工汗液的組成: Composition of artificial sweat:

無水磷酸氫二鈉:2g Anhydrous disodium hydrogen phosphate: 2g

氯化鈉:20g Sodium chloride: 20g

85%乳酸:2g 85% lactic acid: 2g

組胺酸鹽酸鹽:5g Histidine hydrochloride: 5g

蒸餾水:1Kg。 Distilled water: 1 kg.

聚矽氧橡膠加工品: Silicone rubber processed products:

將Tigers Polymer公司製、聚矽氧橡膠栓SR-51加工為直徑1cm、厚度1cm的圓柱狀者。 Process the Tigers Polymer silicone rubber plug SR-51 into a cylindrical shape with a diameter of 1 cm and a thickness of 1 cm.

[表2] [Table 2]

[產業上之可應用性] [Industrial Applicability]

本揭示之含氟聚醚基之丙烯酸化合物係適合利用在用以於各式各樣之基材,尤其是要求磨耗耐久性之光學構件的表面上形成表面處理層。 The fluoropolyether-containing acrylic compound disclosed herein is suitable for forming surface treatment layers on various substrates, especially optical components requiring wear resistance and durability.

Claims (32)

一種化合物,係下述式(1)所表示者, 式中, R F2分別獨立地為-Rf 2 p-R F-O q-, Rf 2為可經1個以上的氟原子取代之C 1-6伸烷基, R F為二價氟聚醚基, p為0或1, q為0或1, R a分別獨立地為(m+2)價有機基, m為1至4的整數, R b分別獨立地為R Si、R Ac或R c, R Si分別獨立地為-X C-SiR 1 n’R 2 3-n’, X C為碳數1至10的二價有機基, R 1分別獨立地為羥基或水解性基, R 2分別獨立地為氫原子或一價有機基, n’為1至3的整數, R Ac分別獨立地為-X D-X E(-X F-OC(=O)-CR 5=CH 2) m’, X D為二價有機基, X E為單鍵或(m’+1)價基, X F分別獨立地為碳數1至10的二價有機基, R 5為氫原子或碳數1至8的一價有機基, m’為1至10的整數, R c分別獨立地為氫原子或C 1-6烷基, R d分別獨立地為單鍵或二價有機基, x為1以上的整數。 A compound represented by the following formula (1): wherein R F2 is independently -Rf 2 p -R F -O q -, Rf 2 is a C 1-6 alkylene group which may be substituted with one or more fluorine atoms, R F is a divalent fluoropolyether group, p is 0 or 1, q is 0 or 1, Ra is independently an (m+2)-valent organic group, m is an integer from 1 to 4, R b is independently R Si , R Ac or R c , R Si is independently -X C -SiR 1 n' R 2 3-n' , X C is a divalent organic group having 1 to 10 carbon atoms, R 1 is independently a hydroxyl group or a hydrolyzable group, R 2 is independently a hydrogen atom or a monovalent organic group, n' is an integer from 1 to 3, and R Ac is independently -X D -X E (-X F -OC(=O)-CR 5 =CH 2 ) m' , XD is a divalent organic group, XE is a single bond or a (m'+1)-valent group, XF each independently represents a divalent organic group having 1 to 10 carbon atoms, R5 is a hydrogen atom or a monovalent organic group having 1 to 8 carbon atoms, m' is an integer from 1 to 10, Rc each independently represents a hydrogen atom or a C1-6 alkyl group, Rd each independently represents a single bond or a divalent organic group, and x is an integer greater than 1. 如請求項1所述之化合物,其中,R F分別獨立地為下式所表示之基, -(OC 6F 12) a-(OC 5F 10) b-(OC 4F 8) c-(OC 3R Fa 6) d-(OC 2F 4) e-(OCF 2) f- 式中,R Fa分別獨立地為氫原子、氟原子或氯原子, a、b、c、d、e及f分別獨立地為0至200的整數,a、b、c、d、e及f之和為1以上,標註a、b、c、d、e或f並以括弧括起之各重複單元的存在順序於式中為任意,惟於所有的R Fa為氫原子或氯原子時,a、b、c、e及f的至少1個為1以上。 The compound of claim 1, wherein R F each independently represents a group represented by the following formula: -(OC 6 F 12 ) a -(OC 5 F 10 ) b -(OC 4 F 8 ) c -(OC 3 R Fa 6 ) d -(OC 2 F 4 ) e -(OCF 2 ) f - wherein R Fa each independently represents a hydrogen atom, a fluorine atom, or a chlorine atom, a, b, c, d, e, and f each independently represents an integer from 0 to 200, the sum of a, b, c, d, e, and f is 1 or greater, and the order of presence of the repeating units labeled a, b, c, d, e, or f and enclosed in parentheses in the formula is arbitrary, provided that when all R Fa are hydrogen atoms or chlorine atoms, at least one of a, b, c, e, and f is 1 or greater. 如請求項2所述之化合物,其中,R Fa為氟原子。 The compound as described in claim 2, wherein R Fa is a fluorine atom. 如請求項1至3中任一項所述之化合物,其中,R F分別獨立地為下述式 (f1)、(f2)、(f3)、(f4)、(f5)或(f6)所表示之基, -(OC 3F 6) d-(OC 2F 4) e-  (f1) 式中,d為1至200的整數,e為0至2的整數,標註下標d或e並以括弧括起之各重複單元的存在順序於式中為任意; -(OC 4F 8) c-(OC 3F 6) d-(OC 2F 4) e-(OCF 2) f-  (f2) 式中,c及d分別獨立地為0至30的整數, e及f分別獨立地為1至200的整數, c、d、e及f之和為10至200的整數, 標註下標c、d、e或f並以括弧括起之各重複單元的存在順序於式中為任意; -(R 6-R 7) g-R 9-  (f3) 式中,R 6為OCF 2或OC 2F 4, R 7為選自OC 2F 4、OC 3F 6、OC 4F 8、OC 5F 10及OC 6F 12之基,或為選自此等基之2或3個基的組合, R 9為單鍵,或為選自OCF 2、OC 2F 4、OC 3F 6、OC 4F 8、OC 5F 10及OC 6F 12之基, g為2至100的整數; -(R 6-R 7) g-R r-(R 7’-R 6’) g’-  (f4) 式中,R 6為OCF 2或OC 2F 4, R 7為選自OC 2F 4、OC 3F 6、OC 4F 8、OC 5F 10及OC 6F 12之基,或為獨立地選自此等基之2或3個基的組合, R 6’為OCF 2或OC 2F 4, R 7’為選自OC 2F 4、OC 3F 6、OC 4F 8、OC 5F 10及OC 6F 12之基,或為獨立地選自此等基之2或3個基的組合, g為2至100的整數, g’為2至100的整數, R r為如下列化學式所示者, 式中,*表示鍵結位置; -(OC 6F 12) a-(OC 5F 10) b-(OC 4F 8) c-(OC 3F 6) d-(OC 2F 4) e-(OCF 2) f-  (f5) 式中,e為1以上200以下的整數,a、b、c、d及f分別獨立地為0以上200以下的整數,a、b、c、d、e及f之和至少為1,再者,標註a、b、c、d、e或f並以括弧括起之各重複單元的存在順序於式中為任意; -(OC 6F 12) a-(OC 5F 10) b-(OC 4F 8) c-(OC 3F 6) d-(OC 2F 4) e-(OCF 2) f-  (f6) 式中,f為1以上200以下的整數,a、b、c、d及e分別獨立地為0以上200以下的整數,a、b、c、d、e及f之和至少為1,再者,標註a、b、c、d、e或f並以括弧括起之各重複單元的存在順序於式中為任意。 The compound according to any one of claims 1 to 3, wherein RF is independently a group represented by the following formula (f1), (f2), (f3), (f4), (f5) or (f6): -(OC 3 F 6 ) d -(OC 2 F 4 ) e - (f1) wherein d is an integer from 1 to 200, and e is an integer from 0 to 2, and the order of occurrence of the repeating units marked with the subscript d or e and enclosed in parentheses in the formula is arbitrary; -(OC 4 F 8 ) c -(OC 3 F 6 ) d -(OC 2 F 4 ) e -(OCF 2 ) f - (f2) wherein c and d are independently an integer from 0 to 30, and e and f are independently an integer from 1 to 200. The sum of c, d, e, and f is an integer from 10 to 200. The order of the repeating units denoted by the subscript c, d, e, or f and enclosed in parentheses is arbitrary in the formula; -(R 6 -R 7 ) g -R 9 - (f3) wherein R 6 is OCF 2 or OC 2 F 4 , R 7 is a group selected from OC 2 F 4 , OC 3 F 6 , OC 4 F 8 , OC 5 F 10 , and OC 6 F 12 , or a combination of two or three groups selected from these groups, R 9 is a single bond or a group selected from OCF 2 , OC 2 F 4 , OC 3 F 6 , OC 4 F 8 , OC 5 F 10 , and OC 6 F 12 , and g is an integer from 2 to 100; -(R 6 -R 7 ) g -R 9 - (f3 ) wherein R 6 is OCF 2 or OC 2 F 4 , R 7 is a group selected from OC 2 F 4 , OC 3 F 6 , OC 4 F 8 , OC 5 F 10 , and OC 6 F 12 , and g is an integer from 2 to 100; ) g -R r -(R 7' -R 6' ) g' - (f4) wherein, R 6 is OCF 2 or OC 2 F 4 , R 7 is a group selected from OC 2 F 4 , OC 3 F 6 , OC 4 F 8 , OC 5 F 10 and OC 6 F 12 , or a combination of two or three groups independently selected from these groups, R 6' is OCF 2 or OC 2 F 4 , R 7' is a group selected from OC 2 F 4 , OC 3 F 6 , OC 4 F 8 , OC 5 F 10 and OC 6 F 12 , or a combination of two or three groups independently selected from these groups, g is an integer from 2 to 100, g' is an integer from 2 to 100, R r is represented by the following chemical formula, In the formula, * represents the bond position; -(OC 6 F 12 ) a -(OC 5 F 10 ) b -(OC 4 F 8 ) c -(OC 3 F 6 ) d -(OC 2 F 4 ) e -(OCF 2 ) f - (f5) In the formula, e is an integer greater than or equal to 1 and less than or equal to 200, a, b, c, d, and f are each independently an integer greater than or equal to 0 and less than or equal to 200, and the sum of a, b, c, d, e , and f is at least 1. Furthermore, the order of the repeated units marked with a, b, c, d, e, or f and enclosed in parentheses in the formula is arbitrary; -(OC 6 F 12 ) a -(OC 5 F 10 ) b -(OC 4 F 8 ) c -(OC 3 F 6 ) d -(OC 2 F 4 ) e -(OCF 2 ) f - (f5 ) In the formula, e is an integer greater than or equal to 1 and less than or equal to 200, a, b, c, d, and f are each independently an integer greater than or equal to 0 and less than or equal to 200, and the sum of a , b, c, d, e, and f is at least 1. Furthermore, the order of the repeated units marked with a, b, c, d , e, or f and enclosed in parentheses in the formula is arbitrary ; 2 ) f - (f6) wherein f is an integer greater than or equal to 1 and less than or equal to 200, a, b, c, d, and e are each independently an integer greater than or equal to 0 and less than or equal to 200, and the sum of a, b, c, d, e, and f is at least 1. Furthermore, the order of the repetitive units enclosed in parentheses and labeled a, b, c, d, e, or f in the formula is arbitrary. 如請求項1至3中任一項所述之化合物,其中,Rf 2分別獨立地為C 1-6全氟伸烷基。 The compound as described in any one of claims 1 to 3, wherein Rf2 is independently C1-6 perfluoroalkylene. 如請求項1至3中任一項所述之化合物,其中,R a分別獨立地為下述式所表示之基, -R 9-(R a’-R 9) k- 式中, R 9分別獨立地為C 1-6伸烷基, R a’分別獨立地為3價有機基, k為1至4的整數。 The compound as described in any one of claims 1 to 3, wherein Ra is independently a group represented by the following formula: -R9- (Ra' - R9 ) k- wherein R9 is independently a C1-6 alkylene group, Ra ' is independently a trivalent organic group, and k is an integer from 1 to 4. 如請求項6所述之化合物,其中,R a’分別獨立地為含有N原子或O原子之3價有機基。 The compound as described in claim 6, wherein Ra ' is independently a trivalent organic group containing a N atom or an O atom. 如請求項6所述之化合物,其中,R a’分別獨立地為可於碳-碳原子間含有胺基鍵、醯胺鍵、胺基甲酸酯鍵、脲鍵、醚鍵或酯鍵之3價有機基。 The compound as described in claim 6, wherein Ra ' is independently a trivalent organic group that may contain an amine bond, an amide bond, a carbamate bond, a urea bond, an ether bond, or an ester bond between carbon atoms. 如請求項6所述之化合物,其中,R a’分別獨立地為下述基, 式中,R 8為氫原子或C 1-6烷基。 The compound as described in claim 6, wherein Ra ' is independently the following group, In the formula, R 8 is a hydrogen atom or a C 1-6 alkyl group. 如請求項6所述之化合物,其中,R a’為N。 The compound as described in claim 6, wherein Ra ' is N. 如請求項6所述之化合物,其中,k為1。The compound as described in claim 6, wherein k is 1. 如請求項6所述之化合物,其中,k為2。The compound as described in claim 6, wherein k is 2. 如請求項1至3中任一項所述之化合物,其中,至少1個R b為R SiThe compound as described in any one of claims 1 to 3, wherein at least one R b is R Si . 如請求項1至3中任一項所述之化合物,其中,與位於各末端之N原子鍵結之R b的1個為R Si,其他為R cThe compound as described in any one of claims 1 to 3, wherein one of the R b groups bonded to the N atom at each terminal is R Si , and the others are R c . 如請求項1至3中任一項所述之化合物,其中,與位於各末端之N原子鍵結之R b的1個為R Si,其他為R AcThe compound as described in any one of claims 1 to 3, wherein one of the R b groups bonded to the N atom at each terminal is R Si , and the others are R Ac . 如請求項1至3中任一項所述之化合物,其中,X C為: C 1-6伸烷基, -(CH 2) z1-O-(CH 2) z2-(式中,z1為0至6的整數,z2為0至6的整數),或 -(CH 2) z3-伸苯基-(CH 2) z4-(式中,z3為0至6的整數,z4為0至6的整數)。 The compound as described in any one of claims 1 to 3, wherein X C is: C 1-6 alkylene, -(CH 2 ) z1 -O-(CH 2 ) z2 - (wherein z1 is an integer from 0 to 6, and z2 is an integer from 0 to 6), or -(CH 2 ) z3 -phenylene-(CH 2 ) z4 - (wherein z3 is an integer from 0 to 6, and z4 is an integer from 0 to 6). 如請求項1至3中任一項所述之化合物,其中,X C為 C 1-6伸烷基。 The compound according to any one of claims 1 to 3, wherein X C is a C 1-6 alkylene group. 如請求項1至3中任一項所述之化合物,其中,n’為2或3。The compound as described in any one of claims 1 to 3, wherein n' is 2 or 3. 如請求項1至3中任一項所述之化合物,其中,n’為3。The compound as described in any one of claims 1 to 3, wherein n' is 3. 如請求項1至3中任一項所述之化合物,其中,X D為-O-、-CO-、-COO-、-OC(=O)-、-CONH-、-NHCO-、-OCONH-、-NHCOO-、-NH-CO-NH-、-CH 2CH(OH)CH 2-或-CH(CH 2OH)CH 2-。 The compound of any one of claims 1 to 3, wherein X D is -O-, -CO-, -COO-, -OC(=O)-, -CONH-, -NHCO-, -OCONH-, -NHCOO-, -NH-CO-NH-, -CH 2 CH(OH)CH 2 -, or -CH(CH 2 OH)CH 2 -. 如請求項1至3中任一項所述之化合物,其中,X D為-CONH-、-CH 2CH(OH)CH 2-或-CH(CH 2OH)CH 2-。 The compound according to any one of claims 1 to 3, wherein X D is -CONH-, -CH 2 CH(OH)CH 2 -, or -CH(CH 2 OH)CH 2 -. 如請求項1至3中任一項所述之化合物,其中,X D為-CONH-。 The compound as described in any one of claims 1 to 3, wherein X D is -CONH-. 如請求項1至3中任一項所述之化合物,其中,X E為單鍵。 The compound as described in any one of claims 1 to 3, wherein XE is a single bond. 如請求項1至3中任一項所述之化合物,其中, X E為-X G-X H; X G為: 單鍵, C 1-6伸烷基, -(CH 2) z9-O-(CH 2) z10-(式中,z9為0至6的整數,z10為0至6的整數),或 -(CH 2) z11-伸苯基-(CH 2) z12-(式中,z11為0至6的整數,z12為0至6的整數); X H為如下列化學式所示者, ; R 8為氫原子或C 1-6烷基。 The compound of any one of claims 1 to 3, wherein XE is -XG - XH ; XG is: a single bond, C1-6 alkylene, -( CH2 ) z9 -O-( CH2 ) z10- (wherein z9 is an integer from 0 to 6, and z10 is an integer from 0 to 6), or -( CH2 ) z11 -phenylene-( CH2 ) z12- (wherein z11 is an integer from 0 to 6, and z12 is an integer from 0 to 6); XH is represented by the following chemical formula, ; R 8 is a hydrogen atom or a C 1-6 alkyl group. 如請求項1至3中任一項所述之化合物,其中,X F為: C 1-6伸烷基, -(CH 2) z5-O-(CH 2) z6-(式中,z5為0至6的整數,z6為0至6的整數),或 -(CH 2) z7-伸苯基-(CH 2) z8-(式中,z7為0至6的整數,z8為0至6的整數)。 The compound as described in any one of claims 1 to 3, wherein XF is: C1-6 alkylene, -( CH2 ) z5 -O-( CH2 ) z6- (wherein z5 is an integer from 0 to 6, and z6 is an integer from 0 to 6), or -( CH2 ) z7 -phenylene-( CH2 ) z8- (wherein z7 is an integer from 0 to 6, and z8 is an integer from 0 to 6). 如請求項1至3中任一項所述之化合物,其中,R c分別獨立地為氫原子或C 1-6烷基。 The compound as described in any one of claims 1 to 3, wherein R c is independently a hydrogen atom or a C 1-6 alkyl group. 如請求項1至3中任一項所述之化合物,其中,R d分別獨立地為單鍵或-(CH 2) z17-NR 10-(CH 2) z18-(式中,R 10為氫原子或C 1-6烷基,z17為0至6的整數,z18為0至6的整數)。 The compound of any one of claims 1 to 3, wherein R d is independently a single bond or -(CH 2 ) z17 -NR 10 -(CH 2 ) z18 - (wherein R 10 is a hydrogen atom or a C 1-6 alkyl group, z17 is an integer from 0 to 6, and z18 is an integer from 0 to 6). 如請求項1至3中任一項所述之化合物,其中,x為1以上5以下的整數。The compound according to any one of claims 1 to 3, wherein x is an integer of 1 to 5. 一種表面處理劑,係含有請求項1至12、及14至28中任一項所述之化合物,其中,與位於各末端之N原子鍵結之R b中至少1個為R SiA surface treating agent comprises the compound according to any one of claims 1 to 12 and 14 to 28, wherein at least one of the R b groups bonded to the N atom at each terminal is R Si . 如請求項29所述之表面處理劑,係更含有選自含氟油、聚矽氧油及觸媒中之1種以上的其他成分。The surface treatment agent as described in claim 29 further contains one or more other ingredients selected from fluorinated oil, silicone oil, and a catalyst. 如請求項29或30所述之表面處理劑,其係作為防污性塗佈劑或防水性塗佈劑使用。The surface treatment agent as described in claim 29 or 30, which is used as an antifouling coating agent or a waterproof coating agent. 一種含有表面處理劑層的物品,係包含基材、以及由請求項1至28中任一項所述之化合物或請求項29至31中任一項所述之表面處理劑形成於該基材的表面上之層。An article containing a surface treatment agent layer comprises a substrate and a layer formed on the surface of the substrate by the compound described in any one of claims 1 to 28 or the surface treatment agent described in any one of claims 29 to 31.
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