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TWI888619B - Sheet for forming protective film and method for producing the same - Google Patents

Sheet for forming protective film and method for producing the same Download PDF

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Publication number
TWI888619B
TWI888619B TW110129617A TW110129617A TWI888619B TW I888619 B TWI888619 B TW I888619B TW 110129617 A TW110129617 A TW 110129617A TW 110129617 A TW110129617 A TW 110129617A TW I888619 B TWI888619 B TW I888619B
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protective film
film forming
film
peeling
sheet
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TW110129617A
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Chinese (zh)
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TW202218869A (en
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小橋力也
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日商琳得科股份有限公司
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    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J7/00Adhesives in the form of films or foils
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • B32B27/06Layered products comprising a layer of synthetic resin as the main or only constituent of a layer, which is next to another layer of the same or of a different material
    • B32B27/08Layered products comprising a layer of synthetic resin as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • B32B27/06Layered products comprising a layer of synthetic resin as the main or only constituent of a layer, which is next to another layer of the same or of a different material
    • B32B27/10Layered products comprising a layer of synthetic resin as the main or only constituent of a layer, which is next to another layer of the same or of a different material of paper or cardboard
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B3/00Layered products comprising a layer with external or internal discontinuities or unevennesses, or a layer of non-planar shape; Layered products comprising a layer having particular features of form
    • B32B3/26Layered products comprising a layer with external or internal discontinuities or unevennesses, or a layer of non-planar shape; Layered products comprising a layer having particular features of form characterised by a particular shape of the outline of the cross-section of a continuous layer; characterised by a layer with cavities or internal voids ; characterised by an apertured layer
    • B32B3/266Layered products comprising a layer with external or internal discontinuities or unevennesses, or a layer of non-planar shape; Layered products comprising a layer having particular features of form characterised by a particular shape of the outline of the cross-section of a continuous layer; characterised by a layer with cavities or internal voids ; characterised by an apertured layer characterised by an apertured layer, the apertures going through the whole thickness of the layer, e.g. expanded metal, perforated layer, slit layer regular cells B32B3/12
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B38/00Ancillary operations in connection with laminating processes
    • B32B38/04Punching, slitting or perforating
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B7/00Layered products characterised by the relation between layers; Layered products characterised by the relative orientation of features between layers, or by the relative values of a measurable parameter between layers, i.e. products comprising layers having different physical, chemical or physicochemical properties; Layered products characterised by the interconnection of layers
    • B32B7/04Interconnection of layers
    • B32B7/06Interconnection of layers permitting easy separation
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J7/00Adhesives in the form of films or foils
    • C09J7/30Adhesives in the form of films or foils characterised by the adhesive composition
    • C09J7/38Pressure-sensitive adhesives [PSA]
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J7/00Adhesives in the form of films or foils
    • C09J7/40Adhesives in the form of films or foils characterised by release liners
    • H10W74/01
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B38/00Ancillary operations in connection with laminating processes
    • B32B38/04Punching, slitting or perforating
    • B32B2038/042Punching
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J2301/00Additional features of adhesives in the form of films or foils
    • C09J2301/30Additional features of adhesives in the form of films or foils characterized by the chemical, physicochemical or physical properties of the adhesive or the carrier
    • C09J2301/312Additional features of adhesives in the form of films or foils characterized by the chemical, physicochemical or physical properties of the adhesive or the carrier parameters being the characterizing feature

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Adhesive Tapes (AREA)
  • Adhesives Or Adhesive Processes (AREA)
  • Dicing (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Physics & Mathematics (AREA)
  • Laminated Bodies (AREA)

Abstract

本發明提供一種即使在沖孔加工時的切口寬度較窄的情況下也能夠充分抑制廢料去除的不良的保護膜形成用片及其製造方法。該保護膜形成用片為長條片,並具有保護膜形成膜和設置在所述保護膜形成膜的一個面上的第一剝離膜,該保護膜形成用片的特徵在於,於23℃用2kgf的荷重將兩片保護膜形成膜貼附2分鐘後的附著力為19N/25mm以下。The present invention provides a protective film forming sheet and a method for manufacturing the same, which can fully suppress waste removal defects even when the incision width is narrow during punching. The protective film forming sheet is a long sheet and has a protective film forming film and a first peeling film provided on one surface of the protective film forming film. The protective film forming sheet is characterized in that the adhesion of two protective film forming films after being attached at 23°C with a load of 2kgf for 2 minutes is 19N/25mm or less.

Description

保護膜形成用片及其製造方法Sheet for forming protective film and method for producing the same

本發明關於一種保護膜形成用片及其製造方法。特別關於一種具備適合使用於保護半導體晶圓等工件或加工工件而得到的半導體晶片等加工品之保護膜形成膜的保護膜形成用片、以及該保護膜形成用片的製造方法。 The present invention relates to a protective film forming sheet and a method for manufacturing the same. In particular, the present invention relates to a protective film forming sheet having a protective film forming film suitable for protecting a workpiece such as a semiconductor wafer or a processed product such as a semiconductor chip obtained by processing the workpiece, and a method for manufacturing the protective film forming sheet.

近年來,藉由被稱作倒裝晶片鍵合的安裝法製造半導體裝置。在該安裝法中,在安裝具有形成有凸塊(bump)等凸狀電極的電路面的半導體晶片時,使半導體晶片的電路面側反轉(面朝下(face down))接合在晶片搭載部。因此,半導體裝置具有半導體晶片的未形成電路的背面側露出的結構。 In recent years, semiconductor devices have been manufactured using a mounting method called flip chip bonding. In this mounting method, when mounting a semiconductor chip having a circuit surface with convex electrodes such as bumps, the circuit surface side of the semiconductor chip is reversed (face down) and bonded to the chip mounting portion. Therefore, the semiconductor device has a structure in which the back side of the semiconductor chip where no circuit is formed is exposed.

因此,為了在搬運時等的衝擊下保護半導體晶片,多數情況下會在半導體晶片的背面側形成由有機材料形成的硬質保護膜。為了形成這種保護膜,使用有作為其前驅體的未固化的樹脂膜(以下稱為「保護膜形成膜」)。保護膜形成膜貼附在半導體晶圓的背面,並與晶圓一同被切割而晶片化。藉由使保護膜形成膜固化,可得到在背面具有保護膜的晶片。 Therefore, in order to protect the semiconductor chip from impact during transportation, a hard protective film made of an organic material is usually formed on the back side of the semiconductor chip. To form this protective film, an uncured resin film (hereinafter referred to as a "protective film forming film") is used as its precursor. The protective film forming film is attached to the back of the semiconductor wafer and is cut together with the wafer to form a chip. By curing the protective film forming film, a chip with a protective film on the back can be obtained.

作為保護膜形成膜的產品形態,已知有如圖1所示在第一剝離膜12上以可剝離的方式層疊有保護膜形成膜11的雙層結構的保護膜形成用片10、或者如圖3所示在兩片剝離膜(12、13)之間挾持有保護膜形成膜11的三層結構的保護膜形成用片20。此外,上述保護膜形成用片為長條且被捲繞成卷狀進行保管、運輸。這種保護膜形成用片有時也會將保護膜形成膜預先沖孔加工為與工件(半導體晶圓等被黏物的總稱)大致相同的形狀而貼附在工件上。這種經過沖孔 加工的保護膜形成用片將沖孔加工為規定的封閉形狀的保護膜形成膜16層疊在第一剝離膜12上(圖2),或將其夾持在兩片剝離膜(12、13)之間(圖4)。 As a product form of the protective film forming film, there is known a protective film forming sheet 10 having a double-layer structure in which a protective film forming film 11 is releasably stacked on a first peeling film 12 as shown in FIG1, or a protective film forming sheet 20 having a triple-layer structure in which a protective film forming film 11 is sandwiched between two peeling films (12, 13) as shown in FIG3. In addition, the above-mentioned protective film forming sheet is a long strip and is stored and transported in a roll shape. In this protective film forming sheet, the protective film forming film is sometimes pre-punched into a shape roughly the same as a workpiece (a general term for adherends such as semiconductor wafers) and attached to the workpiece. The punched protective film forming sheet is stacked with a protective film forming film 16 punched into a predetermined closed shape on the first release film 12 (Fig. 2), or sandwiched between two release films (12, 13) (Fig. 4).

經過沖孔加工的保護膜形成用片藉由利用沖模將保護膜形成膜沖裁為規定的封閉形狀而製造,並以去除經過沖孔加工的保護膜形成膜16的周邊的無用部分17的方式而使用。在為由保護膜形成膜11與第一剝離膜12構成的雙層結構的保護膜形成用片時,以將保護膜形成膜11完全沖裁為規定的封閉形狀且不完全沖裁第一剝離膜12的方式切出切口14,並使規定的封閉形狀的保護膜形成膜16殘留在第一剝離膜12上,去除周邊的無用部分17。在為保護膜形成膜11夾持在兩片剝離膜(12、13)之間的三層結構的保護膜形成用片時,以將保護膜形成膜11與一側的第二剝離膜13完全沖裁為規定的封閉形狀且不完全沖裁另一側的第一剝離膜12的方式切出切口14,並使規定的封閉形狀的保護膜形成膜16殘留在第一剝離膜12上,去除周邊的無用部分17與第二剝離膜13。 The punched protective film forming sheet is manufactured by punching the protective film forming film into a predetermined closed shape using a punching die, and is used in a manner that removes the unnecessary portion 17 around the punched protective film forming film 16. In the case of a double-layered protective film forming sheet composed of the protective film forming film 11 and the first release film 12, the cut 14 is made in a manner that the protective film forming film 11 is completely punched into a predetermined closed shape and the first release film 12 is not completely punched, and the protective film forming film 16 of the predetermined closed shape remains on the first release film 12, and the unnecessary portion 17 around the edge is removed. In the case of a three-layer protective film forming sheet in which the protective film forming film 11 is sandwiched between two release films (12, 13), the protective film forming film 11 and the second release film 13 on one side are completely punched into a prescribed closed shape and the first release film 12 on the other side is not completely punched, and the incision 14 is cut so that the protective film forming film 16 of the prescribed closed shape remains on the first release film 12, and the useless portion 17 around the second release film 13 is removed.

以雙層結構的保護膜形成用片的情況為例進一步進行詳細說明。如圖5所示,對由保護膜形成膜11與第一剝離膜12構成的保護形成用片10,以將保護膜形成膜11完全沖裁為規定的封閉形狀且不完全沖裁第一剝離膜12的方式切出切口14,製成經過沖孔加工的保護膜形成用片。該步驟被稱為「沖孔加工步驟」。 The following is a detailed description of the case of a double-layer protective film forming sheet. As shown in FIG5 , a protective film forming sheet 10 composed of a protective film forming film 11 and a first release film 12 is punched by completely punching the protective film forming film 11 into a predetermined closed shape and not completely punching the first release film 12, thereby making a punched protective film forming sheet. This step is called a "punching step".

然後,為了用於將經過沖孔加工的保護膜形成用片貼附在工件上,去除沖裁為規定的封閉形狀的保護膜形成膜16的周邊的無用部分17(圖6)。該步驟被稱為「廢料去除步驟」。結果可得到具有能夠用於貼附在工件上的、在第一剝離膜12上被沖裁為規定的封閉形狀的保護膜形成膜16的層疊體。 Then, in order to attach the punched protective film forming sheet to the workpiece, the useless portion 17 around the protective film forming film 16 punched into a predetermined closed shape is removed (Fig. 6). This step is called a "waste removal step". As a result, a laminate having a protective film forming film 16 punched into a predetermined closed shape on the first release film 12 that can be attached to the workpiece can be obtained.

在為三層結構的保護膜形成用片時,除了在沖孔加工步驟中在保護膜形成膜11上具有另一個剝離膜13(第二剝離膜13),且第二剝離膜13也被完全沖裁為規定的封閉形狀,以及在廢料去除步驟中去除第二剝離膜13以外,與雙 層結構的保護膜形成用片的情況相同。 In the case of a three-layer protective film forming sheet, the same as the case of a two-layer protective film forming sheet is used, except that another peeling film 13 (second peeling film 13) is provided on the protective film forming film 11 in the punching process step, and the second peeling film 13 is also completely punched into a prescribed closed shape, and the second peeling film 13 is removed in the waste material removal step.

作為保護膜形成用片,要求能夠穩定地進行沖孔加工步驟(操作穩定性)。特別是在對保護膜形成膜進行沖孔加工之後,要求去除無用部分的廢料去除步驟的操作穩定性。更具體而言,在廢料去除步驟中,要求不產生應殘留的保護膜形成膜16意外地與無用部分17一同從第一剝離膜12上剝離的問題(以下,稱為「廢料去除的不良」)。 As a protective film forming sheet, it is required to be able to perform the punching process step stably (operation stability). In particular, after the protective film forming film is punched, the waste material removal step of removing the useless part is required to have operational stability. More specifically, in the waste material removal step, it is required that the protective film forming film 16 that should be left is not accidentally peeled off from the first peeling film 12 together with the useless part 17 (hereinafter referred to as "waste material removal defect")

為了解決上述問題,例如,專利文獻1提出了將剝離膜與保護膜形成膜之間的剝離力控制在規定範圍。 In order to solve the above problems, for example, Patent Document 1 proposes controlling the peeling force between the peeling film and the protective film forming film within a specified range.

[現有技術文獻] [Prior art literature]

[專利文獻] [Patent Literature]

專利文獻1:國際公開WO2017/145735 Patent document 1: International publication WO2017/145735

若發生廢料去除的不良,則需要停止生產線並廢棄不良品,產品的生產率下降,成本增大。因此,要求進一步抑制廢料去除的不良。 If waste removal failure occurs, the production line needs to be stopped and the defective products need to be discarded, which reduces product productivity and increases costs. Therefore, it is required to further suppress waste removal failure.

本發明的發明人進一步不懈研究廢料去除不良的原因,得到了以下見解。 The inventors of the present invention have further studied the causes of poor waste removal and obtained the following insights.

在沖孔加工步驟之後至廢料去除步驟之前,以控制保護膜形成用片的張力等為目的,保護膜形成用片10會通過導輥等多個輥。此時,如圖7所示,保護膜形成用片10有時會以切口14的上部側(沖模所進入的一側的面)為輥19側的方式彎曲。彎曲結果會導致在特別是與片10的短邊方向幾乎平行的切口部分,切口14的寬度變窄,同時保護膜形成膜16被擠壓而發生少許變形,這作為部分原因有時會導致鄰接的保護膜形成膜16與無用部分17發生接觸、附著。 After the punching process and before the waste material removal process, the protective film forming sheet 10 passes through multiple rollers such as guide rollers for the purpose of controlling the tension of the protective film forming sheet. At this time, as shown in FIG. 7, the protective film forming sheet 10 is sometimes bent in such a way that the upper side of the cut 14 (the side where the punch enters) is the side of the roller 19. As a result of the bending, the width of the cut 14 becomes narrower, especially in the cut portion that is almost parallel to the short side direction of the sheet 10, and the protective film forming film 16 is squeezed and slightly deformed, which sometimes causes the adjacent protective film forming film 16 to contact and adhere to the useless part 17.

在通過輥19後,多數情況下保護膜形成膜16與無用部分17的附著部會再度分離,但有時也會不分離而維持附著。若以保護膜形成膜16與無用部分17附著的狀態進行廢料去除,則應殘留在第一剝離膜12上的保護膜形成膜16會意外地與應去除的無用部分17一同從第一剝離膜12上剝離,發生廢料去除的不良。 After passing through the roller 19, in most cases, the attachment portion of the protective film forming film 16 and the useless portion 17 will separate again, but sometimes they will not separate and remain attached. If waste material removal is performed with the protective film forming film 16 and the useless portion 17 attached, the protective film forming film 16 that should remain on the first peeling film 12 will be accidentally peeled off from the first peeling film 12 together with the useless portion 17 that should be removed, resulting in poor waste material removal.

本發明鑒於上述實際情況而成,其目的在於提供一種即使在沖孔加工時的切口寬度較窄的情況下也能夠充分抑制廢料去除的不良的保護膜形成用片及其製造方法。 The present invention is made in view of the above-mentioned actual situation, and its purpose is to provide a protective film forming sheet and a manufacturing method thereof that can fully suppress the defect of waste material removal even when the cut width is narrow during punching.

本發明的方案如下所述。 The scheme of the present invention is as follows.

(1)一種保護膜形成用片,其為長條片,並具有保護膜形成膜和設置在所述保護膜形成膜的一個面上的第一剝離膜,其中,於23℃用2kgf的荷重將兩片保護膜形成膜貼附2分鐘後的附著力為19N/25mm以下。 (1) A protective film forming sheet, which is a long sheet and has a protective film forming film and a first release film provided on one surface of the protective film forming film, wherein the adhesion after two protective film forming films are attached at 23°C with a load of 2 kgf for 2 minutes is 19 N/25 mm or less.

(2)根據(1)所述的保護膜形成用片,其中,所述第一剝離膜的與保護膜形成膜相接的面的表面彈性模數為17MPa以下。 (2) The protective film forming sheet according to (1), wherein the surface elastic modulus of the first release film in contact with the protective film forming film is 17 MPa or less.

(3)根據(1)或(2)所述的保護膜形成用片,其中,在所述保護膜形成用片上,以在俯視所述保護膜形成用片時保護膜形成用片的一部分具有規定的封閉形狀的方式形成有切口,所述切口在所述保護膜形成用片的厚度方向貫穿所述保護膜形成膜並到達至所述第一剝離膜的一部分。 (3) The protective film forming sheet according to (1) or (2), wherein a cut is formed on the protective film forming sheet so that a portion of the protective film forming sheet has a predetermined closed shape when the protective film forming sheet is viewed from above, and the cut penetrates the protective film forming film in the thickness direction of the protective film forming sheet and reaches a portion of the first release film.

(4)根據(3)所述的保護膜形成用片,其中,所述保護膜形成膜與所述第一剝離膜的界面上的所述切口的寬度為8μm以上。 (4) The protective film forming sheet according to (3), wherein the width of the cut at the interface between the protective film forming film and the first release film is 8 μm or more.

(5)一種經過沖孔加工的保護膜形成用片的製造方法,其具有以使上述(1)或 (2)所述的保護膜形成用片的一部分具有規定的封閉形狀的方式形成切口的步驟,所述切口在所述保護膜形成用片的厚度方向貫穿所述保護膜形成膜並到達至所述第一剝離膜的一部分。 (5) A method for manufacturing a punched protective film forming sheet, comprising the step of forming a cut so that a portion of the protective film forming sheet described in (1) or (2) above has a predetermined closed shape, wherein the cut penetrates the protective film forming film in the thickness direction of the protective film forming sheet and reaches a portion of the first release film.

(6)根據(5)所述的經過沖孔加工的保護膜形成用片的製造方法,其中,所述保護膜形成膜與所述第一剝離膜的界面上的所述切口的寬度為8μm以上。 (6) The method for manufacturing a punched protective film-forming sheet according to (5), wherein the width of the cut at the interface between the protective film-forming film and the first release film is 8 μm or more.

根據本發明,可提供一種即使在沖孔加工時的切口寬度較窄的情況下也能夠充分抑制廢料去除的不良的保護膜形成用片及其製造方法。 According to the present invention, a protective film forming sheet and a method for manufacturing the same can be provided, which can fully suppress the defect of waste material removal even when the cut width is narrow during punching.

10:保護膜形成用片 10: Sheet for forming protective film

11:保護膜形成膜 11: Protective film forming film

12:第一剝離膜 12: First peeling membrane

13:第二剝離膜 13: Second peeling membrane

14:切口 14: Incision

16:經過沖孔加工的保護膜形成膜 16: Protective film formed by punching process

17:無用部分 17: Useless part

19:輥 19: Roller

20:保護膜形成用片 20: Sheet for forming protective film

21:晶圓 21: Wafer

22:切割片 22: Cutting disc

30:帶保護膜的晶片 30: Chip with protective film

31:晶片 31: Chip

32:保護膜 32: Protective film

33:凸狀電極 33: Convex electrode

50:基板 50:Substrate

D:寬度 D: Width

圖1為實施方案的保護膜形成用片的剖面示意圖 Figure 1 is a schematic cross-sectional view of a protective film forming sheet according to an implementation scheme.

圖2為示出對實施方案的保護膜形成用片進行沖孔加工後的狀態的剖面示意圖。 FIG2 is a schematic cross-sectional view showing the state of the protective film forming sheet of the embodiment after punching.

圖3為另一個實施方案的保護膜形成用片的剖面示意圖。 Figure 3 is a schematic cross-sectional view of a protective film forming sheet according to another embodiment.

圖4為示出對另一個實施方案的保護膜形成用片進行沖孔加工後的狀態的剖面示意圖。 FIG4 is a schematic cross-sectional view showing the state of a protective film forming sheet after punching according to another embodiment.

圖5為沖孔加工步驟後的保護膜形成用片的概略透視圖。 Figure 5 is a schematic perspective view of the protective film forming sheet after the punching process.

圖6為表示廢料去除步驟的概略透視圖。 Figure 6 is a schematic perspective view showing the waste removal step.

圖7為示出沖孔加工步驟後的保護膜形成用片通過輥的狀態的剖面圖。 FIG7 is a cross-sectional view showing the state of the protective film forming sheet passing through the roller after the punching process step.

圖8為具有將本實施方案的保護膜形成膜保護膜化而得到的保護膜的晶片的一個例子的剖面示意圖。 FIG8 is a schematic cross-sectional view of an example of a chip having a protective film obtained by converting the protective film forming film of the present embodiment into a protective film.

圖9為用於說明將本實施方案的保護膜形成用片貼附在晶圓上的步驟的剖面示意圖。 FIG9 is a schematic cross-sectional view for explaining the step of attaching the protective film forming sheet of this embodiment to the wafer.

圖10為用於說明將帶保護膜的晶圓單顆化(singulation)的步驟的剖面示意圖。 FIG10 is a schematic cross-sectional view for explaining the singulation step of a wafer with a protective film.

圖11為用於說明將帶保護膜的晶片配置在基板上的步驟的剖面示意圖。 FIG11 is a schematic cross-sectional view for explaining the step of placing a chip with a protective film on a substrate.

首先,對本說明書中使用的主要術語進行說明。 First, let’s explain the main terms used in this manual.

工件為貼附在本實施方案的保護膜形成膜上並待加工的板狀體。作為工件,例如可列舉出晶圓、面板。具體而言,可列舉出半導體晶圓、半導體面板。作為工件的加工品,例如可列舉出將晶圓單顆化而得到的晶片。具體而言,可例示出將半導體晶圓單顆化而得到的半導體晶片。此時,保護膜形成在晶圓及晶片的背面側。 The workpiece is a plate-like body to be processed and attached to the protective film forming film of the present embodiment. Examples of the workpiece include wafers and panels. Specifically, semiconductor wafers and semiconductor panels can be listed. Examples of processed products of the workpiece include chips obtained by singulating a wafer. Specifically, semiconductor chips obtained by singulating a semiconductor wafer can be exemplified. At this time, the protective film is formed on the back side of the wafer and the chip.

晶圓等工件的「表面」是指形成有電路及凸塊等凸狀電極等的面,「背面」是指未形成電路、電極(例如凸塊等凸狀電極)等的面。 The "surface" of a workpiece such as a wafer refers to the surface on which circuits and convex electrodes such as bumps are formed, and the "backside" refers to the surface on which circuits, electrodes (such as convex electrodes such as bumps) are not formed.

在本說明書中,例如「(甲基)丙烯酸酯」用作表示「丙烯酸酯」及「甲基丙烯酸酯」這兩者的術語,其他類似術語也相同。 In this specification, for example, "(meth)acrylate" is used as a term to represent both "acrylate" and "methacrylate", and the same applies to other similar terms.

剝離膜為以可剝離的方式支撐保護膜形成膜的膜。對於膜,並不限定厚度,以包含片的概念使用。 The peelable film is a film that supports the protective film in a peelable manner. The film is not limited in thickness and is used as a sheet.

保護膜形成膜用組合物、剝離劑層用組合物的相關說明中的質量比基於有效成分(固體成分),只要沒有特別說明,則溶劑不計算在內。 The mass ratios in the descriptions of the protective film-forming composition and the peeling agent layer composition are based on the active ingredients (solid components), and the solvent is not included unless otherwise specified.

以下,根據具體的實施方案,依照以下的順序對本發明進行詳細說明。 Below, according to the specific implementation scheme, the present invention is described in detail in the following order.

(1.保護膜形成膜) (1. Protective film forming film)

如圖1、圖5所示,本實施方案的保護膜形成用片10為具有保護膜形成膜11和設置在保護膜形成膜11的一個面上的第一剝離膜12的長條片,其通常被卷收為卷狀。 As shown in FIG. 1 and FIG. 5 , the protective film forming sheet 10 of the present embodiment is a long sheet having a protective film forming film 11 and a first release film 12 disposed on one surface of the protective film forming film 11, and is usually rolled up into a roll.

保護膜形成膜11藉由貼附在工件上並進行保護膜化,從而形成用於保護工件或工件的加工品的保護膜。 The protective film forming film 11 is attached to the workpiece and formed into a protective film, thereby forming a protective film for protecting the workpiece or the processed product of the workpiece.

「進行保護膜化」是指使保護膜形成膜11成為具有充分的用以保護工件或工件的加工品的特性的狀態。具體而言,當本實施方案的保護膜形成膜為固化性時,「進行保護膜化」是指將未固化的保護膜形成膜製成固化物。換言之,經過保護膜化的保護膜形成膜為保護膜形成膜的固化物,其與保護膜形成膜不同。 "Protecting" means making the protective film-forming film 11 into a state having sufficient properties for protecting the workpiece or the processed product of the workpiece. Specifically, when the protective film-forming film of the present embodiment is curable, "Protecting" means making the uncured protective film-forming film into a cured product. In other words, the protective film-forming film that has been protective is a cured product of the protective film-forming film, which is different from the protective film-forming film.

在固化性保護膜形成膜上疊合工件之後,使保護膜形成膜固化,由此能夠將保護膜牢固地黏合在工件上,能夠形成具有耐久性的保護膜。 After the workpiece is superimposed on the curable protective film forming film, the protective film forming film is cured, thereby making it possible to firmly adhere the protective film to the workpiece and form a durable protective film.

當保護膜形成膜11不含固化性成分而以非固化的狀態使用時,在將本實施方案的保護膜形成膜貼附在工件上的時刻,該保護膜形成膜被保護膜化。換言之,保護膜也可與保護膜形成膜相同。 When the protective film forming film 11 does not contain a curable component and is used in a non-cured state, when the protective film forming film of this embodiment is attached to the workpiece, the protective film forming film is converted into a protective film. In other words, the protective film may be the same as the protective film forming film.

在不要求高保護性能的情況下,由於無需使保護膜形成膜固化,因此保護膜形成膜可以為非固化性。 When high protective performance is not required, the protective film-forming film does not need to be cured, so the protective film-forming film can be non-curable.

在本實施方案中,優選保護膜形成膜為固化性。因此,優選保護膜為固化物。作為固化物,例如可例示出熱固化物、能量射線固化物。在本實施方案中,更優選保護膜為熱固化物。 In the present embodiment, the protective film-forming film is preferably curable. Therefore, the protective film is preferably a cured product. Examples of cured products include thermosetting products and energy ray cured products. In the present embodiment, the protective film is more preferably a thermosetting product.

此外,保護膜形成膜優選在常溫(23℃)下具有黏著性或優選藉由加熱而發揮出黏著性。由此,能夠在將工件與保護膜形成膜疊合時將兩者貼合。因此,可在使保護膜形成膜固化之前確實地進行定位。 In addition, the protective film forming film preferably has adhesiveness at room temperature (23°C) or preferably exhibits adhesiveness by heating. Thus, the workpiece and the protective film forming film can be attached to each other when they are superimposed. Therefore, positioning can be performed reliably before the protective film forming film is cured.

保護膜形成膜可以由一層(單層)構成,也可以由兩層以上的多個層構成。當保護膜形成膜具有多個層時,這些多個層可彼此相同,也可彼此不同,構成這些多個層的層的組合沒有特別限定。 The protective film forming film may be composed of one layer (single layer) or multiple layers of two or more layers. When the protective film forming film has multiple layers, these multiple layers may be the same as each other or different from each other, and the combination of layers constituting these multiple layers is not particularly limited.

在本實施方案中,優選保護膜形成膜為一層(單層)。若保護膜形 成膜由多個層構成,則在發生溫度變化的步驟(回流處理時或使用裝置時)中,存在因層間的熱伸縮性的差異而發生層間剝離的風險,若為一層則能夠降低該風險。 In this embodiment, the protective film forming film is preferably a single layer (monolayer). If the protective film forming film is composed of multiple layers, there is a risk of interlayer peeling due to the difference in thermal expansion between the layers in the step where the temperature changes (during the reflow treatment or when the device is used). If it is a single layer, this risk can be reduced.

保護膜形成膜的厚度沒有特別限制,但優選為100μm以下,更優選為70μm以下,進一步優選為45μm以下,特別優選為30μm以下。若保護膜形成膜的厚度在上述範圍內,則即使在沖孔加工步驟後通過輥時,經過沖孔加工的保護膜形成膜與無用部分發生了接觸、附著,在通過輥之後也易於再度分離。此外,保護膜形成膜的厚度優選為5μm以上,更優選為10μm以上,進一步優選為15μm以上。若保護膜形成膜的厚度在上述範圍內,則得到的保護膜的保護性能變得良好。 The thickness of the protective film forming film is not particularly limited, but is preferably less than 100 μm, more preferably less than 70 μm, further preferably less than 45 μm, and particularly preferably less than 30 μm. If the thickness of the protective film forming film is within the above range, even if the protective film forming film after the punching process contacts and adheres to the useless part when passing through the roller after the punching process, it is easy to separate again after passing through the roller. In addition, the thickness of the protective film forming film is preferably more than 5 μm, more preferably more than 10 μm, and further preferably more than 15 μm. If the thickness of the protective film forming film is within the above range, the protective performance of the obtained protective film becomes good.

另外,保護膜形成膜的厚度是指保護膜形成膜整體的厚度。例如,由多個層構成的保護膜形成膜的厚度是指構成保護膜形成膜的所有層的合計厚度。 In addition, the thickness of the protective film forming film refers to the thickness of the protective film forming film as a whole. For example, the thickness of a protective film forming film composed of multiple layers refers to the total thickness of all layers constituting the protective film forming film.

以下,對形成在作為工件的加工品的晶片上的保護膜進行說明。具體而言,利用圖8所示的帶保護膜的晶片30,對本實施方案的保護膜形成膜進行保護膜化而形成的保護膜進行說明。 The following describes the protective film formed on a wafer as a workpiece. Specifically, the protective film formed by converting the protective film forming film of the present embodiment into a protective film using the wafer 30 with a protective film shown in FIG. 8 is described.

如圖8所示,帶保護膜的晶片30在晶片31的背面側(在圖8中為上方側)形成有保護膜32,在晶片31的表面側(在圖8中為下方側)形成有凸狀電極33。 As shown in FIG8 , the chip 30 with a protective film has a protective film 32 formed on the back side of the chip 31 (the upper side in FIG8 ), and a convex electrode 33 formed on the surface side of the chip 31 (the lower side in FIG8 ).

晶片31的表面側形成有電路,且凸狀電極33以與電路電連接的方式形成在該表面側。帶保護膜的晶片30以形成有凸狀電極33的面與晶片搭載用基板相對的方式而配置。然後,藉由規定的加熱處理(回流處理),經由凸狀電極33,與該基板電連接並機械連接,從而得以安裝。作為凸狀電極33,可例示出凸塊、柱狀(pillar)電極等。 A circuit is formed on the surface side of the chip 31, and a convex electrode 33 is formed on the surface side in a manner electrically connected to the circuit. The chip 30 with a protective film is arranged in a manner such that the surface on which the convex electrode 33 is formed faces the chip mounting substrate. Then, by a predetermined heat treatment (reflow treatment), the convex electrode 33 is electrically and mechanically connected to the substrate, thereby being mounted. Examples of the convex electrode 33 include a bump, a pillar electrode, and the like.

(1.1 保護膜形成膜彼此的附著力) (1.1 Adhesion between protective film forming films)

在本實施方案中,藉由將構成保護膜形成用片的保護膜形成膜彼此貼附時的附著力控制在規定範圍內,抑制廢料去除的不良。具體而言,本實施方案的特徵在於,於23℃用2kgf的荷重將兩片保護膜形成膜貼附2分鐘後的附著力為19N/25mm以下。該附著力優選為15N/25mm以下,進一步優選為11N/25mm以下。此外,若該附著力過小,則有時工件的保持性能會下降,因此附著力優選為0.1N/25mm以上,進一步優選為1N/25mm以上,特別優選為3N/25mm以上。另外,將附著力的測定設為將保護膜形成膜彼此貼附2分鐘後的理由在於,在進行廢料去除及對工件的貼附的裝置中,在保護膜形成用片通過輥19的步驟中,切口的部分與輥19相接並停止的時間約為2分鐘。 In the present embodiment, the adhesion of the protective film-forming films constituting the protective film-forming sheet when attached to each other is controlled within a specified range, thereby suppressing the defective removal of waste materials. Specifically, the present embodiment is characterized in that the adhesion after attaching two protective film-forming films at 23°C with a load of 2kgf for 2 minutes is 19N/25mm or less. The adhesion is preferably 15N/25mm or less, and more preferably 11N/25mm or less. In addition, if the adhesion is too small, the holding performance of the workpiece may sometimes decrease, so the adhesion is preferably 0.1N/25mm or more, more preferably 1N/25mm or more, and particularly preferably 3N/25mm or more. In addition, the reason for measuring the adhesion force after the protective film forming films are attached to each other for 2 minutes is that in the device for removing waste materials and attaching to the workpiece, in the step of the protective film forming sheet passing through the roller 19, the time for the cut part to contact the roller 19 and stop is about 2 minutes.

如上所述,藉由將保護膜形成膜彼此的附著力控制在規定範圍內,即使在沖孔加工步驟後彎曲保護膜形成用片,經過沖孔加工的保護膜形成膜16與無用部分17發生附著,保護膜形成膜16與無用部分17也能夠在保護膜形成用片通過輥之後再度分離,可降低廢料去除的不良。 As described above, by controlling the adhesion between the protective film forming films within a specified range, even if the protective film forming sheet is bent after the punching process, the protective film forming film 16 and the useless portion 17 after the punching process are attached, and the protective film forming film 16 and the useless portion 17 can be separated again after the protective film forming sheet passes through the roller, which can reduce the defect of waste material removal.

(1.2 保護膜形成膜用組合物) (1.2 Composition for forming protective film)

只要保護膜形成膜具有上述的物性,則保護膜形成膜的組成沒有特別限定。在本實施方案中,構成保護膜形成膜的組合物(保護膜形成膜用組合物)優選為至少含有聚合物成分(A)、固化性成分(B)、及填充材料(E)的樹脂組合物。聚合物成分被視作聚合性化合物進行聚合反應而形成的成分。此外,固化性成分為可進行固化(聚合)反應的成分。另外,本發明中的聚合反應還包括縮聚反應。 As long as the protective film forming film has the above-mentioned physical properties, the composition of the protective film forming film is not particularly limited. In the present embodiment, the composition constituting the protective film forming film (composition for protective film forming film) is preferably a resin composition containing at least a polymer component (A), a curable component (B), and a filler (E). The polymer component is regarded as a component formed by a polymerization reaction of a polymerizable compound. In addition, the curable component is a component that can undergo a curing (polymerization) reaction. In addition, the polymerization reaction in the present invention also includes a condensation reaction.

此外,聚合物成分中含有的成分有時也屬於固化性成分。在本實施方案中,當保護膜形成膜用組合物含有這種既屬於聚合物成分也屬於固化性成分的成分時,視作保護膜形成膜用組合物含有聚合物成分及固化性成分。 In addition, the components contained in the polymer component are sometimes also curable components. In this embodiment, when the protective film forming film composition contains such a component that is both a polymer component and a curable component, the protective film forming film composition is regarded as containing a polymer component and a curable component.

(1.2.1 聚合物成分) (1.2.1 Polymer composition)

聚合物成分(A)使保護膜形成膜具有膜形成性(成膜性),並給予其適度的黏 性,使得保護膜形成膜確實地均勻貼附在工件上。聚合物成分的重量平均分子量通常在5萬~200萬的範圍內,優選在10萬~150萬的範圍內,特別優選在20萬~100萬的範圍內。若重量平均分子量過低,則有保護膜形成膜彼此的附著力增大的傾向。另一方面,若重量平均分子量過高,則與其他成分的互溶性變差,結果會妨礙形成均一的膜。作為這種聚合物成分,例如可使用丙烯酸樹脂、氨基甲酸酯樹脂(urethane resin)、苯氧基樹脂、矽氧樹脂、飽和聚酯樹脂等,特別優選使用丙烯酸樹脂。 The polymer component (A) makes the protective film-forming film film-forming (film-forming) and gives it appropriate viscosity so that the protective film-forming film is reliably and evenly attached to the workpiece. The weight average molecular weight of the polymer component is usually in the range of 50,000 to 2 million, preferably in the range of 100,000 to 1.5 million, and particularly preferably in the range of 200,000 to 1 million. If the weight average molecular weight is too low, the adhesion between the protective film-forming films tends to increase. On the other hand, if the weight average molecular weight is too high, the miscibility with other components deteriorates, resulting in the formation of a uniform film. As such a polymer component, for example, acrylic resins, urethane resins, phenoxy resins, silicone resins, saturated polyester resins, etc. can be used, and acrylic resins are particularly preferred.

另外,在本說明書中,只要沒有特別說明,則「重量平均分子量」為藉由凝膠滲透層析(GPC)法測定的聚苯乙烯換算值。作為藉由該方法進行的測定,例如可使用在TOSOH CORPORATION製造的高速GPC裝置「HLC-8120GPC」中依次連接有高速管柱「TSK gurd column HXL-H」、「TSK Gel GMHXL」、「TSK Gel G2000 HXL」(以上,均為TOSOH CORPORATION製造)的設備,在管柱溫度為40℃、進液速度為1.0mL/分鐘的條件下,以示差折射計為檢測器進行測定。 In addition, in this specification, unless otherwise specified, the "weight average molecular weight" is a polystyrene conversion value measured by gel permeation chromatography (GPC). As a measurement by this method, for example, a high-speed GPC device "HLC-8120GPC" manufactured by TOSOH CORPORATION is used, in which high-speed columns "TSK gurd column H XL -H", "TSK Gel GMH XL ", and "TSK Gel G2000 H XL " (all manufactured by TOSOH CORPORATION) are connected in sequence, and the measurement is performed under the conditions of a column temperature of 40°C and a liquid feeding rate of 1.0 mL/min, using a differential refractometer as a detector.

作為丙烯酸樹脂,例如可列舉出由(甲基)丙烯酸酯單體與衍生自(甲基)丙烯酸衍生物的結構單元構成的(甲基)丙烯酸酯共聚物。其中,作為(甲基)丙烯酸酯單體,可優選列舉出烷基的碳原子數為1~18的(甲基)丙烯酸烷基酯,具體而言,可列舉出(甲基)丙烯酸甲酯、(甲基)丙烯酸乙酯、(甲基)丙烯酸丙酯、(甲基)丙烯酸丁酯等。此外,作為(甲基)丙烯酸衍生物,例如可列舉出(甲基)丙烯酸、(甲基)丙烯酸縮水甘油酯、(甲基)丙烯酸羥乙酯等。 As an acrylic resin, for example, a (meth)acrylate copolymer composed of a (meth)acrylate monomer and a structural unit derived from a (meth)acrylate derivative can be listed. Among them, as a (meth)acrylate monomer, a (meth)acrylate alkyl ester having an alkyl group with 1 to 18 carbon atoms can be preferably listed, and specifically, methyl (meth)acrylate, ethyl (meth)acrylate, propyl (meth)acrylate, butyl (meth)acrylate, etc. can be listed. In addition, as a (meth)acrylate derivative, for example, (meth)acrylic acid, glycidyl (meth)acrylate, hydroxyethyl (meth)acrylate, etc. can be listed.

在本實施方案中,優選使用甲基丙烯酸縮水甘油酯等向丙烯酸樹脂中導入縮水甘油基。導入了縮水甘油基的丙烯酸樹脂與後述的作為熱固性成分的環氧樹脂的互溶性增高,保護膜形成膜的固化後的玻璃轉化溫度(Tg)變高,耐熱性增高。此外,在本實施方案中,為了控制對工件的黏合性或黏著物性,優選使用丙烯酸羥乙酯等向丙烯酸樹脂中導入羥基。 In this embodiment, glycidyl methacrylate or the like is preferably used to introduce glycidyl groups into the acrylic resin. The acrylic resin into which the glycidyl groups are introduced has higher solubility with the epoxy resin described later as a thermosetting component, and the glass transition temperature (Tg) of the protective film-forming film after curing becomes higher, and the heat resistance increases. In addition, in this embodiment, in order to control the adhesion or adhesiveness to the workpiece, hydroxyethyl acrylate or the like is preferably used to introduce hydroxyl groups into the acrylic resin.

丙烯酸樹脂的玻璃轉化溫度優選為-70℃~40℃,進一步優選為-35℃~35℃,更優選為-20℃~30℃,更加優選為-10℃~25℃,特別優選為-5℃~20℃。藉由將丙烯酸樹脂的玻璃轉化溫度設為上述範圍,可抑制保護膜形成膜及保護膜的加熱時的流動性,因而易於得到平滑的保護膜。若玻璃轉化溫度過低,則有保護膜形成膜彼此的附著力增大的傾向。若玻璃轉化溫度過高,則與其他成分的互溶性變差,結果會妨礙形成均一的膜。 The glass transition temperature of the acrylic resin is preferably -70°C to 40°C, more preferably -35°C to 35°C, more preferably -20°C to 30°C, more preferably -10°C to 25°C, and particularly preferably -5°C to 20°C. By setting the glass transition temperature of the acrylic resin to the above range, the fluidity of the protective film formation film and the protective film during heating can be suppressed, so that a smooth protective film can be easily obtained. If the glass transition temperature is too low, there is a tendency for the adhesion between the protective film formation films to increase. If the glass transition temperature is too high, the miscibility with other components deteriorates, which will hinder the formation of a uniform film.

當丙烯酸樹脂具有m種(m為2以上的整數)結構單元時,可以以如下方式計算出該丙烯酸樹脂的玻璃轉化溫度。即,對於衍生出丙烯酸樹脂中的結構單元的m種單體,分別依次分配由1至m的任一非重複的序號,並將它們命名為「單體m」時,能夠使用如下所示的Fox公式計算出丙烯酸樹脂的玻璃轉化溫度(Tg)。 When an acrylic resin has m types (m is an integer greater than or equal to 2) of structural units, the glass transition temperature of the acrylic resin can be calculated as follows. That is, when the m types of monomers from which the structural units in the acrylic resin are derived are assigned non-repeating numbers from 1 to m and named "monomer m", the glass transition temperature (Tg) of the acrylic resin can be calculated using the Fox formula shown below.

Figure 110129617-A0305-12-0011-1
Figure 110129617-A0305-12-0011-1

式中,Tg為丙烯酸樹脂的玻璃轉化溫度,m為2以上的整數,Tgk為單體m的均聚物的玻璃轉化溫度,Wk為丙烯酸樹脂中的衍生自單體m的結構單元m的質量分數,且Wk滿足下式。 In the formula, Tg is the glass transition temperature of the acrylic resin, m is an integer greater than 2, Tgk is the glass transition temperature of the homopolymer of monomer m, Wk is the mass fraction of the structural unit m derived from monomer m in the acrylic resin, and Wk satisfies the following formula.

Figure 110129617-A0305-12-0011-2
Figure 110129617-A0305-12-0011-2

式中,m及Wk與上述m及Wk相同。 In the formula, m and Wk are the same as the above m and Wk.

作為Tgk,可以使用高分子數據手冊(高分子Data Handbook)、黏著手冊(黏著Handbook)或聚合物手冊(Polymer Handbook)等中記載的值。例如,丙烯酸甲酯的均聚物的Tgk為10℃、丙烯酸正丁酯的均聚物的Tgk為-54℃、甲基丙烯酸甲酯的均聚物的Tgk為105℃、丙烯酸2-羥基乙酯的均聚物的Tgk為-15℃、 甲基丙烯酸縮水甘油酯的均聚物的Tgk為41℃、丙烯酸2-乙基己酯的Tgk為-70℃。 As Tgk, the values listed in the Polymer Data Handbook, Adhesive Handbook, or Polymer Handbook can be used. For example, the Tgk of the homopolymer of methyl acrylate is 10°C, the Tgk of the homopolymer of n-butyl acrylate is -54°C, the Tgk of the homopolymer of methyl methacrylate is 105°C, the Tgk of the homopolymer of 2-hydroxyethyl acrylate is -15°C, the Tgk of the homopolymer of glycidyl methacrylate is 41°C, and the Tgk of 2-ethylhexyl acrylate is -70°C.

將保護膜形成膜用組合物的總重量設為100質量份時,聚合物成分的含量優選為5~80質量份,進一步優選為8~70質量份,更優選為10~60質量份,更加優選為12~55質量份,進一步優選為14~50質量份,特別優選為15~45質量份。藉由使聚合物成分的含量在上述範圍內,可將增大保護膜形成膜彼此的附著力的低分子量成分的量限制在適宜的範圍內,因此使得保護膜形成膜用組合物的材料設計變得容易。 When the total weight of the protective film forming film composition is set to 100 parts by mass, the content of the polymer component is preferably 5 to 80 parts by mass, more preferably 8 to 70 parts by mass, more preferably 10 to 60 parts by mass, more preferably 12 to 55 parts by mass, further preferably 14 to 50 parts by mass, and particularly preferably 15 to 45 parts by mass. By making the content of the polymer component within the above range, the amount of low molecular weight components that increase the adhesion between the protective film forming films can be limited to an appropriate range, thereby making the material design of the protective film forming film composition easy.

(1.2.2 熱固性成分) (1.2.2 Thermosetting components)

固化性成分(B)使保護膜形成膜固化,從而形成硬質的保護膜。作為固化性成分,可使用熱固性成分、能量射線固化性成分或它們的混合物。在藉由照射能量射線使其固化時,本實施方案的保護膜形成膜由於含有後述的填充材料及著色劑等,透光率下降。因此,例如當保護膜形成膜的厚度變厚時,能量射線固化容易變得不充分。 The curable component (B) cures the protective film-forming film to form a hard protective film. As the curable component, a thermosetting component, an energy ray curable component, or a mixture thereof can be used. When curing by irradiating energy rays, the protective film-forming film of the present embodiment contains fillers and coloring agents described later, and the light transmittance decreases. Therefore, for example, when the thickness of the protective film-forming film becomes thicker, the energy ray curing tends to become insufficient.

另一方面,即使熱固性的保護膜形成膜的厚度變厚,也能夠藉由加熱而充分固化,因此能夠形成保護性能高的保護膜。此外,藉由使用加熱烘箱等常規加熱設備,可一次性加熱多片保護膜形成膜,使其熱固化。 On the other hand, even if the thickness of the thermosetting protective film forming film increases, it can be fully cured by heating, so a protective film with high protective performance can be formed. In addition, by using conventional heating equipment such as a heating oven, multiple protective film forming films can be heated at one time to thermally cure them.

因此,在本實施方案中,固化性成分最好為熱固性。即,本實施方案的保護膜形成膜優選為熱固性。 Therefore, in this embodiment, the curable component is preferably thermosetting. That is, the protective film forming film of this embodiment is preferably thermosetting.

可藉由以下方式判斷保護膜形成膜是否為熱固性。首先,將常溫(23℃)的保護膜形成膜加熱至高於常溫的溫度,接著冷卻至常溫,由此形成加熱並冷卻後的保護膜形成膜。接著,在相同溫度下,比較加熱並冷卻後的保護膜形成膜的硬度和加熱前的保護膜形成膜的硬度,當加熱並冷卻後的保護膜形成膜更硬時,判斷該保護膜形成膜為熱固性。 Whether the protective film forming film is thermosetting can be determined in the following manner. First, the protective film forming film at room temperature (23°C) is heated to a temperature higher than room temperature, and then cooled to room temperature, thereby forming a heated and cooled protective film forming film. Then, at the same temperature, the hardness of the heated and cooled protective film forming film is compared with the hardness of the protective film forming film before heating. When the heated and cooled protective film forming film is harder, it is determined that the protective film forming film is thermosetting.

作為熱固性成分,例如優選使用環氧樹脂、熱固性聚醯亞胺樹 脂、不飽和聚酯樹脂及這些樹脂的混合物。另外,熱固性聚醯亞胺樹脂是指藉由進行熱固化形成聚醯亞胺樹脂的低分子量、低黏性的單體或前驅體聚合物的總稱。熱固性聚醯亞胺樹脂的非限制性的具體實例,例如記載於纖維學會誌「纖維與工業」,Vol.50,No.3(1994),P106-P118中。 As the thermosetting component, for example, epoxy resin, thermosetting polyimide resin, unsaturated polyester resin and a mixture of these resins are preferably used. In addition, thermosetting polyimide resin refers to a general term for low molecular weight, low viscosity monomers or precursor polymers that form polyimide resins by thermal curing. Non-limiting specific examples of thermosetting polyimide resins are described in, for example, the Journal of the Fiber Society "Fibers and Industry", Vol. 50, No. 3 (1994), P106-P118.

作為熱固性成分的環氧樹脂具有受熱時進行三維網狀化、形成強固的覆膜的性質。作為這種環氧樹脂,可使用公知的各種環氧樹脂。在本實施方案中,環氧樹脂的分子量(式量)優選為300以上且小於50000、為300以上且小於10000、300以上且小於5000、300以上且小於3000。此外,環氧樹脂的環氧當量優選為50~5000g/eq,更優選為100~2000g/eq,進一步優選為150~1000g/eq。 Epoxy resin as a thermosetting component has the property of being three-dimensionally networked when heated and forming a strong coating. As such epoxy resin, various known epoxy resins can be used. In the present embodiment, the molecular weight (formula weight) of the epoxy resin is preferably 300 or more and less than 50,000, 300 or more and less than 10,000, 300 or more and less than 5,000, or 300 or more and less than 3,000. In addition, the epoxy equivalent of the epoxy resin is preferably 50 to 5,000 g/eq, more preferably 100 to 2,000 g/eq, and further preferably 150 to 1,000 g/eq.

作為這種環氧樹脂,具體而言,可列舉出雙酚A、雙酚F、間苯二酚、苯酚酚醛清漆(phenol novolak)、甲酚酚醛清漆(cresol novolak)等酚類的縮水甘油醚;丁二醇、聚乙二醇、聚丙二醇等醇類的縮水甘油醚;鄰苯二甲酸、間苯二甲酸、四氫鄰苯二甲酸等羧酸的縮水甘油醚;用縮水甘油基取代苯胺異氰脲酸酯(aniline isocyanurate)等的與氮原子鍵合的活性氫而成的縮水甘油型或烷基縮水甘油型的環氧樹脂;乙烯基環己烷二環氧化物、3,4-環氧環己基甲基-3,4-二環己烷羧酸酯、2-(3,4-環氧)環己基-5,5-螺(3,4-環氧)環己烷-間二氧六環等藉由將分子內的碳碳雙鍵例如氧化而導入有環氧基的所謂脂環式環氧化物。除此以外,也可以使用具有聯苯骨架、二環己二烯骨架、萘骨架等的環氧樹脂。 As such epoxy resins, specifically, there can be cited glycidyl ethers of phenols such as bisphenol A, bisphenol F, resorcinol, phenol novolak, cresol novolak, etc.; glycidyl ethers of alcohols such as butanediol, polyethylene glycol, polypropylene glycol, etc.; glycidyl ethers of carboxylic acids such as phthalic acid, isophthalic acid, tetrahydrophthalic acid, etc.; glycidyl ethers of aniline isocyanurate substituted with a glycidyl group; Glycidyl or alkylglycidyl epoxy resins formed by active hydrogen bonded to nitrogen atoms such as isocyanurate; so-called alicyclic epoxy resins having epoxy groups introduced by, for example, oxidizing the carbon-carbon double bond in the molecule, such as vinylcyclohexanediepoxide, 3,4-epoxycyclohexylmethyl-3,4-dicyclohexanecarboxylate, 2-(3,4-epoxy)cyclohexyl-5,5-spiro(3,4-epoxy)cyclohexane-m-dioxane, etc. In addition, epoxy resins having biphenyl skeletons, dicyclohexadiene skeletons, naphthalene skeletons, etc. can also be used.

當使用熱固性成分作為固化性成分(B)時,優選同時使用固化劑(C)作為助劑。作為針對環氧樹脂的固化劑,優選熱活性型潛伏性環氧樹脂固化劑。「熱活性型潛伏性環氧樹脂固化劑」為,於常溫(23℃)下難以與環氧樹脂反應,但藉由加熱至某種溫度以上而活性化,從而與環氧樹脂進行反應的類型的固化劑。對於熱活性型潛伏性環氧樹脂固化劑的活性化方法,有在基於加熱的化學反應中產生活性種(陰離子、陽離子)的方法;在常溫附近下穩定分散於環氧 樹脂中,但在高溫下與環氧樹脂互溶、溶解並引發固化反應的方法;利用分子篩封入型的固化劑在高溫下溶出並引發固化反應的方法;基於微膠囊的方法等。 When a thermosetting component is used as the curing component (B), it is preferred to use a curing agent (C) as an auxiliary agent. As a curing agent for epoxy resin, a heat-activated latent epoxy resin curing agent is preferred. "Heat-activated latent epoxy resin curing agent" is a type of curing agent that is difficult to react with epoxy resin at room temperature (23°C), but is activated by heating to a certain temperature or above, thereby reacting with epoxy resin. There are several methods for activating heat-activated latent epoxy resin curing agents: a method of generating active species (anions and cations) in a chemical reaction based on heating; a method of stably dispersing in epoxy resin at room temperature, but being miscible with epoxy resin at high temperature, dissolving and initiating a curing reaction; a method of using a molecular sieve encapsulated curing agent to dissolve at high temperature and initiate a curing reaction; and a method based on microcapsules.

在所例示的方法中,優選在常溫附近下穩定分散於環氧樹脂中,但在高溫下與環氧樹脂互溶、溶解並引發固化反應的方法。 Among the methods exemplified, a method that stably disperses in epoxy resin at around room temperature but miscibles with epoxy resin at high temperature, dissolves and initiates a curing reaction is preferred.

作為熱活性型潛伏性環氧樹脂固化劑的具體實例,能夠列舉出各種鎓鹽、二元酸二醯肼化合物、二氰二胺、胺加成物固化劑、咪唑化合物等高熔點活性氫化合物等。這些熱活性型潛伏性環氧樹脂固化劑可以單獨使用一種,或者也可以組合使用兩種以上。在本實施方式中,特別優選二氰二胺。 As specific examples of heat-active latent epoxy resin curing agents, various onium salts, dibasic acid dihydrazide compounds, dicyandiamide, amine adduct curing agents, imidazole compounds and other high melting point active hydrogen compounds can be listed. These heat-active latent epoxy resin curing agents can be used alone or in combination of two or more. In this embodiment, dicyandiamide is particularly preferred.

此外,作為針對環氧樹脂的固化劑,還優選酚醛樹脂。作為酚醛樹脂,可無特別限制地使用烷基酚、多元酚、萘酚等酚類與醛類等的縮合物等。具體而言,可以使用苯酚酚醛清漆樹脂、鄰甲酚酚醛清漆樹脂、對甲酚酚醛清漆樹脂、叔丁基苯酚酚醛清漆樹脂、雙環戊二烯甲酚樹脂、聚對乙烯基酚醛樹脂、雙酚A型酚醛清漆樹脂、或它們的改質物等。 In addition, phenolic resin is also preferred as a curing agent for epoxy resin. As phenolic resin, condensates of phenols such as alkylphenol, polyphenol, naphthol and aldehydes can be used without particular limitation. Specifically, phenol novolac resin, o-cresol novolac resin, p-cresol novolac resin, tert-butylphenol novolac resin, dicyclopentadiene cresol resin, polyvinyl phenolic resin, bisphenol A novolac resin, or modified products thereof can be used.

這些酚醛樹脂中所含的酚羥基,能夠藉由加熱而易於與上述的環氧樹脂的環氧基進行加成反應,從而形成抗衝擊性高的固化物。 The phenolic hydroxyl groups contained in these phenolic resins can easily undergo addition reaction with the epoxy groups of the above-mentioned epoxy resins by heating, thereby forming a cured product with high impact resistance.

相對於環氧樹脂100質量份,固化劑(C)的含量優選為0.01~30質量份,進一步優選為0.1~20質量份,更優選為0.2~15質量份,特別優選為0.3~10質量份。藉由將固化劑(C)的含量設為上述範圍,保護膜的網狀結構變得緻密,易於得到作為保護膜的、保護工件的性能。 The content of the curing agent (C) is preferably 0.01 to 30 parts by mass, more preferably 0.1 to 20 parts by mass, more preferably 0.2 to 15 parts by mass, and particularly preferably 0.3 to 10 parts by mass relative to 100 parts by mass of the epoxy resin. By setting the content of the curing agent (C) to the above range, the network structure of the protective film becomes dense, and it is easy to obtain the performance of the protective film and the workpiece protection.

當使用二氰二胺作為固化劑(C)時,優選進一步同時使用固化促進劑(D)。作為固化促進劑,例如優選2-甲基咪唑、2-苯基咪唑、2-苯基-4-甲基咪唑、2-苯基-4,5-二羥甲基咪唑、2-苯基-4-甲基-5-羥甲基咪唑等咪唑類(一個以上氫原子被除氫原子之外的基團取代而成的咪唑)。其中,特別優選2-苯基-4-甲基-5-羥甲基咪唑。 When dicyandiamide is used as a curing agent (C), it is preferred to use a curing accelerator (D) at the same time. As a curing accelerator, for example, imidazoles (imidazoles in which one or more hydrogen atoms are replaced by groups other than hydrogen atoms) such as 2-methylimidazole, 2-phenylimidazole, 2-phenyl-4-methylimidazole, 2-phenyl-4,5-dihydroxymethylimidazole, and 2-phenyl-4-methyl-5-hydroxymethylimidazole are preferred. Among them, 2-phenyl-4-methyl-5-hydroxymethylimidazole is particularly preferred.

相對於環氧樹脂100質量份,固化促進劑的含量優選為0.01~30質量份,進一步優選為0.1~20質量份,更優選為0.2~15質量份,特別優選為0.3~10質量份。通過將固化促進劑(D)的含量設為上述範圍,保護膜的網狀結構變得緻密,因此易於得到作為保護膜的、保護工件的性能。 The content of the curing accelerator is preferably 0.01 to 30 parts by mass, more preferably 0.1 to 20 parts by mass, more preferably 0.2 to 15 parts by mass, and particularly preferably 0.3 to 10 parts by mass relative to 100 parts by mass of the epoxy resin. By setting the content of the curing accelerator (D) to the above range, the network structure of the protective film becomes dense, so it is easy to obtain the performance of the protective film and the workpiece protection.

將保護膜形成膜用組合物的總重量設為100質量份時,熱固性成分及固化劑的合計含量優選為3~80質量份,進一步優選為5~60質量份,更優選為7~50質量份,進一步優選為9~40質量份,特別優選為10~30質量份。若以上述比例摻合熱固性成分與固化劑,則能夠在固化前表現出適度的黏性,穩定地進行貼附操作。此外,在固化後,易於得到作為保護膜的、保護工件的性能。 When the total weight of the protective film-forming film composition is set to 100 parts by mass, the total content of the thermosetting component and the curing agent is preferably 3 to 80 parts by mass, further preferably 5 to 60 parts by mass, more preferably 7 to 50 parts by mass, further preferably 9 to 40 parts by mass, and particularly preferably 10 to 30 parts by mass. If the thermosetting component and the curing agent are mixed in the above ratio, it can show appropriate viscosity before curing and can be attached stably. In addition, after curing, it is easy to obtain the performance of protecting the workpiece as a protective film.

作為熱固性成分及固化劑,若使用低分子量的化合物,則有時保護膜形成膜的黏性會上升,保護膜形成膜彼此的附著力增大。因此,優選以將黏性控制至適當值的方式在上述範圍內選擇熱固性成分及固化劑的種類及其摻合量。 If low molecular weight compounds are used as thermosetting components and curing agents, the viscosity of the protective film forming film may increase, and the adhesion between the protective film forming films may increase. Therefore, it is preferred to select the type of thermosetting components and curing agents and their blending amount within the above range in a manner that controls the viscosity to an appropriate value.

(1.2.3 能量射線固化性成分) (1.2.3 Energy ray curing components)

當固化性成分(B)為能量射線固化性成分時,能量射線固化性成分優選未固化,優選具有黏著性,更優選未固化且具有黏著性。 When the curable component (B) is an energy ray curable component, the energy ray curable component is preferably uncured, preferably has adhesiveness, and more preferably is uncured and has adhesiveness.

能量射線固化性成分為藉由照射能量射線而固化的成分,為用於賦予保護膜形成膜成膜性、可撓性等的成分。 The energy ray-curable component is a component that is cured by irradiating energy rays and is used to impart film-forming properties, flexibility, etc. to the protective film.

作為能量射線固化性成分,例如優選具有能量射線固化性基團的化合物。作為這種化合物,可列舉出公知的能量射線固化性成分。 As the energy-ray-curable component, for example, a compound having an energy-ray-curable group is preferably used. As such a compound, well-known energy-ray-curable components can be listed.

作為能量射線固化性成分,若使用低分子量的化合物,則有時保護膜形成膜的黏性會上升,保護膜形成膜彼此的附著力增大。因此,優選以將黏性控制至適當值的方式選擇能量射線固化性成分的種類及其摻合量。 If a low molecular weight compound is used as an energy ray curable component, the viscosity of the protective film forming film may increase, and the adhesion between the protective film forming films may increase. Therefore, it is preferable to select the type of energy ray curable component and its blending amount in a way that the viscosity is controlled to an appropriate value.

(1.2.4 填充材料) (1.2.4 Filling materials)

藉由使保護膜形成膜含有填充材料(E),使保護膜形成膜保護膜化而得到的保護膜的熱膨脹係數的調整變得容易,藉由使該熱膨脹係數接近工件的熱膨脹係數,使用保護膜形成膜得到的封裝的黏合可靠性進一步增高。此外,藉由使保護膜形成膜含有填充材料(E),可得到硬質的保護膜,進一步降低保護膜的吸濕率,封裝的黏合可靠性進一步增高。 By making the protective film forming film contain a filler (E), it becomes easy to adjust the thermal expansion coefficient of the protective film obtained by making the protective film forming film into a protective film, and by making the thermal expansion coefficient close to the thermal expansion coefficient of the workpiece, the bonding reliability of the package obtained using the protective film forming film is further improved. In addition, by making the protective film forming film contain a filler (E), a hard protective film can be obtained, and the moisture absorption rate of the protective film is further reduced, and the bonding reliability of the package is further improved.

填充材料(E)可以為有機填充材料及無機填充材料中的任意一種,從高溫下的形狀穩定性的角度出發,優選為無機填充材料。 The filler (E) may be any of an organic filler and an inorganic filler, but is preferably an inorganic filler from the perspective of shape stability at high temperatures.

作為優選的無機填充材料,例如可列舉出二氧化矽、氧化鋁、滑石、碳酸鈣、紅氧化鐵、碳化矽、氮化硼等粉末;將這些無機填充材料球形化而得到的珠子;這些無機填充材料的表面改質物;這些無機填充材料的單晶纖維;玻璃纖維等。其中,優選二氧化矽及經過表面改質的二氧化矽。作為經過表面改質的二氧化矽,優選使用偶合劑進行了表面改質,更優選使用矽烷偶合劑進行了表面改質。 Preferred inorganic fillers include, for example, powders such as silica, alumina, talc, calcium carbonate, red iron oxide, silicon carbide, and boron nitride; beads obtained by spheronizing these inorganic fillers; surface modified products of these inorganic fillers; single crystal fibers of these inorganic fillers; glass fibers, etc. Among them, silica and surface-modified silica are preferred. As surface-modified silica, it is preferred to use a coupling agent for surface modification, and it is more preferred to use a silane coupling agent for surface modification.

填充材料的平均粒徑優選為0.02~10μm,進一步優選為0.05~5μm,特別優選為0.10~3μm。 The average particle size of the filler material is preferably 0.02~10μm, more preferably 0.05~5μm, and particularly preferably 0.10~3μm.

藉由將填充材料的平均粒徑設為上述值,保護膜形成膜用組合物的操作性變得良好。因此,保護膜形成膜用組合物及保護膜形成膜的品質易於穩定。 By setting the average particle size of the filler to the above value, the operability of the protective film-forming composition becomes good. Therefore, the quality of the protective film-forming composition and the protective film-forming film is easy to stabilize.

另外,只要沒有特別說明,則本說明書中的「平均粒徑」是指藉由雷射繞射散射法而求得的粒度分佈曲線中累計值50%處的粒徑(D50)的值。 In addition, unless otherwise specified, the "average particle size" in this manual refers to the particle size (D50) at the 50% cumulative value in the particle size distribution curve obtained by the laser diffraction scattering method.

將保護膜形成膜用組合物的總重量設為100質量份時,填充材料的含量優選為15~80質量份,進一步優選為30~75質量份,更加優選為40~70質量份,特別優選為45~65質量份。 When the total weight of the protective film-forming film composition is set to 100 parts by mass, the content of the filler is preferably 15 to 80 parts by mass, further preferably 30 to 75 parts by mass, more preferably 40 to 70 parts by mass, and particularly preferably 45 to 65 parts by mass.

藉由將填充材料的含量設為上述值,易於將保護膜形成膜彼此的 附著力控制在適當的範圍內。若填充劑的含量過少,則保護膜形成膜的黏性增加,保護膜形成膜彼此的附著力過度增大。另一方面,若填充劑的摻合量過多,則有時保護膜形成膜的保形性會下降,由於在輥上的彎曲而使膜無法保持形狀,保護膜形成膜的黏性及對工件的黏著性過度下降。 By setting the content of the filler to the above value, it is easy to control the adhesion between the protective film forming films within an appropriate range. If the content of the filler is too small, the viscosity of the protective film forming film increases, and the adhesion between the protective film forming films increases excessively. On the other hand, if the amount of the filler is too much, the conformability of the protective film forming film may decrease, and the film may not be able to maintain its shape due to bending on the roll, and the viscosity of the protective film forming film and the adhesion to the workpiece may decrease excessively.

此外,保護膜形成膜優選含有兩種以上的填充材料。即,填充材料(E)優選為兩種以上的填充材料的混合物。「含有兩種以上的填充材料」可以含有兩種以上材質不同的填充材料,可以含有兩種以上平均粒徑不同的填充材料。 In addition, the protective film forming film preferably contains two or more fillers. That is, the filler (E) is preferably a mixture of two or more fillers. "Containing two or more fillers" may contain two or more fillers of different materials, and may contain two or more fillers with different average particle sizes.

在本實施方案中,優選含有兩種以上平均粒徑不同的填充材料。藉由使保護膜形成膜中含有平均粒徑不同的填充材料,易於在平均粒徑較大的填充材料的空隙中配置平均粒徑較小的填充材料。結果可得到上述效果,並且易於將保護膜形成膜彼此的附著力設定在上述範圍內。 In this embodiment, it is preferred to contain two or more fillers with different average particle sizes. By making the protective film forming film contain fillers with different average particle sizes, it is easy to arrange fillers with smaller average particle sizes in the gaps of fillers with larger average particle sizes. As a result, the above-mentioned effects can be obtained, and it is easy to set the adhesion between the protective film forming films within the above-mentioned range.

當含有兩種以上平均粒徑不同的填充材料時,優選平均粒徑最大的填充材料的平均粒徑為平均粒徑最小的填充材料的平均粒徑的1.5倍~100倍,更優選為2~20倍,進一步優選為3~18倍。 When there are two or more fillers with different average particle sizes, the average particle size of the filler with the largest average particle size is preferably 1.5 to 100 times the average particle size of the filler with the smallest average particle size, more preferably 2 to 20 times, and even more preferably 3 to 18 times.

另外,可藉由觀察保護膜或保護膜形成膜的剖面來確認保護膜或保護膜形成膜是否含有兩種以上平均粒徑不同的填充材料。 In addition, by observing the cross section of the protective film or the protective film-forming film, it can be confirmed whether the protective film or the protective film-forming film contains two or more fillers with different average particle sizes.

(1.2.5 偶合劑) (1.2.5 Coupling agent)

保護膜形成膜優選含有偶合劑(F)。藉由含有偶合劑,能夠在保護膜形成膜固化後不損害保護膜的耐熱性,並提高保護膜與工件的黏合性,同時能夠提高耐水性(耐濕熱性)。作為偶合劑,從其通用性與成本優勢的角度出發,優選矽烷偶合劑。 The protective film forming film preferably contains a coupling agent (F). By containing a coupling agent, the heat resistance of the protective film can be improved after the protective film forming film is cured without damaging the heat resistance of the protective film, and the adhesion between the protective film and the workpiece can be improved. At the same time, the water resistance (wet and heat resistance) can be improved. As a coupling agent, silane coupling agents are preferred from the perspective of its versatility and cost advantage.

作為矽烷偶合劑,例如可列舉出γ-縮水甘油醚氧基丙基三甲氧基矽烷、γ-縮水甘油醚氧基丙基甲基二乙氧基矽烷、β-(3,4-環氧環己基)乙基三甲氧 基矽烷、γ-(甲基丙烯醯氧丙基)三甲氧基矽烷、γ-氨基丙基三甲氧基矽烷、N-6-(氨基乙基)-γ-氨基丙基三甲氧基矽烷、N-6-(氨基乙基)-γ-氨基丙基甲基二乙氧基矽烷、N-苯基-γ-氨基丙基三甲氧基矽烷、γ-脲基丙基三乙氧基矽烷、γ-巰基丙基三甲氧基矽烷、γ-巰基丙基甲基二甲氧基矽烷、雙(3-三乙氧基甲矽烷基丙基)四硫化物、甲基三甲氧基矽烷、甲基三乙氧基矽烷、乙烯基三甲氧基矽烷、乙烯基三乙醯氧基矽烷、咪唑矽烷等。這些矽烷偶合劑可單獨使用一種,或者可混合使用兩種以上。 As the silane coupling agent, for example, γ-glycidyloxypropyl trimethoxysilane, γ-glycidyloxypropyl methyldiethoxysilane, β-(3,4-epoxycyclohexyl)ethyl trimethoxysilane, γ-(methacryloxypropyl)trimethoxysilane, γ-aminopropyl trimethoxysilane, N-6-(aminoethyl)-γ-aminopropyl trimethoxysilane, N-6-(aminoethyl)- )-γ-aminopropylmethyldiethoxysilane, N-phenyl-γ-aminopropyltrimethoxysilane, γ-ureidopropyltriethoxysilane, γ-butylpropyltrimethoxysilane, γ-butylpropylmethyldimethoxysilane, bis(3-triethoxysilylpropyl)tetrasulfide, methyltrimethoxysilane, methyltriethoxysilane, vinyltrimethoxysilane, vinyltriacetoxysilane, imidazolesilane, etc. These silane coupling agents can be used alone or in combination of two or more.

將保護膜形成膜用組合物的總重量設為100質量份時,偶合劑的含量優選為0.01~20質量份、0.1~10質量份、0.2~5質量份、0.3~3質量份。 When the total weight of the protective film-forming film composition is set to 100 parts by mass, the content of the coupling agent is preferably 0.01 to 20 parts by mass, 0.1 to 10 parts by mass, 0.2 to 5 parts by mass, or 0.3 to 3 parts by mass.

(1.2.6 著色劑) (1.2.6 Colorants)

保護膜形成膜優選含有著色劑(G)。由此,由於晶片等工件的加工品的背面被遮蓋,因此能夠遮斷電子設備內產生的各種電磁波,能夠減少晶片等工件的加工品的故障。此外,當發生了廢料去除的不良時,能夠立刻透過肉眼發現。 The protective film forming film preferably contains a colorant (G). As a result, since the back of the processed product such as a chip is covered, various electromagnetic waves generated in the electronic device can be blocked, and the failure of the processed product such as the chip can be reduced. In addition, when a defect in waste removal occurs, it can be immediately discovered with the naked eye.

作為著色劑(G),例如可使用無機類顏料、有機類顏料、有機類染料等公知的著色劑。在本實施方案中,優選無機類顏料。 As the coloring agent (G), for example, known coloring agents such as inorganic pigments, organic pigments, and organic dyes can be used. In the present embodiment, inorganic pigments are preferred.

作為無機類顏料,例如可列舉出碳黑、鈷類色素、鐵類色素、鉻類色素、鈦類色素、釩類色素、鋯類色素、鉬類色素、釕類色素、鉑類色素、ITO(氧化銦錫)類色素、ATO(氧化銻錫)類色素等。其中,特別優選使用碳黑。藉由碳黑能夠遮斷較寬波長範圍的電磁波。 Examples of inorganic pigments include carbon black, cobalt pigments, iron pigments, chromium pigments, titanium pigments, vanadium pigments, zirconium pigments, molybdenum pigments, ruthenium pigments, platinum pigments, ITO (indium tin oxide) pigments, and ATO (antimony tin oxide) pigments. Among them, carbon black is particularly preferred. Carbon black can block electromagnetic waves in a wider wavelength range.

保護膜形成膜中的著色劑(特別是碳黑)的摻合量因保護膜形成膜的厚度而異,例如,當保護膜形成膜的厚度為20μm時,將保護膜形成膜用組合物的總重量設為100質量份時,著色劑的含量優選為0.01~10質量份,進一步優選為0.03~7質量份,更優選為0.05~4質量份。 The amount of colorant (especially carbon black) blended in the protective film-forming film varies depending on the thickness of the protective film-forming film. For example, when the thickness of the protective film-forming film is 20 μm, the content of the colorant is preferably 0.01 to 10 parts by mass, more preferably 0.03 to 7 parts by mass, and even more preferably 0.05 to 4 parts by mass, based on the total weight of the protective film-forming film composition being 100 parts by mass.

著色劑(特別是碳黑)的平均粒徑優選為1~500nm,特別優選為 3~100nm,進一步優選為5~50nm。若著色劑的平均粒徑在上述範圍內,則易於將透光率控制在所需範圍內。 The average particle size of the colorant (especially carbon black) is preferably 1 to 500 nm, particularly preferably 3 to 100 nm, and further preferably 5 to 50 nm. If the average particle size of the colorant is within the above range, it is easy to control the transmittance within the desired range.

(1.2.7 其他添加劑) (1.2.7 Other additives)

在不損害本發明的效果的範圍內,保護膜形成膜用組合物例如可含有作為其他添加劑的光聚合引發劑、交聯劑、增塑劑、抗靜電劑、抗氧化劑、吸雜劑、增黏劑、剝離劑等。 The protective film-forming film composition may contain, as other additives, photopolymerization initiators, crosslinking agents, plasticizers, antistatic agents, antioxidants, impurity absorbers, thickeners, and stripping agents, etc., within the scope of not impairing the effects of the present invention.

其中,優選保護膜形成膜用組合物中的剝離劑的含量少於規定量。在本實施方案中,相對於保護膜形成膜的總質量,優選小於0.00099質量%。若剝離劑的含量過多,則有保護膜與工件的黏合可靠性下降的傾向。作為剝離劑,例如可例示出醇酸類剝離劑、矽氧(silicone)類剝離劑、氟類剝離劑、不飽和聚酯類剝離劑、聚烯烴類剝離劑、蠟類剝離劑。 Among them, it is preferred that the content of the stripping agent in the protective film forming film composition is less than the prescribed amount. In the present embodiment, it is preferably less than 0.00099% by mass relative to the total mass of the protective film forming film. If the content of the stripping agent is too much, the adhesion reliability between the protective film and the workpiece tends to decrease. Examples of the stripping agent include alkyd stripping agents, silicone stripping agents, fluorine stripping agents, unsaturated polyester stripping agents, polyolefin stripping agents, and wax stripping agents.

(1.2.8 保護膜形成膜彼此的附著力的控制) (1.2.8 Control of adhesion between protective film forming films)

如上所述,本實施方案的特徵在於,藉由將構成保護膜形成用片的保護膜形成膜彼此貼附時的附著力控制在規定範圍內,並由此抑制廢料去除的不良。 As described above, the feature of the present embodiment is that the adhesion between the protective film forming films constituting the protective film forming sheet when attached to each other is controlled within a specified range, thereby suppressing the defective removal of waste materials.

保護膜形成膜彼此的附著力可藉由構成保護膜形成膜的各成分的種類及其摻合量進行控制。 The adhesion between the protective film-forming films can be controlled by the types of components constituting the protective film-forming films and their blending amounts.

若聚合物成分(A)的重量平均分子量低,則有附著力增大的傾向。若聚合物成分(A)的玻璃轉化溫度低,則有附著力增大的傾向。此外,若使用低分子量的化合物作為固化性成分(B)、固化劑(C)、固化促進劑(D)、能量射線固化性成分,則有附著力增大的傾向。若填充劑(E)的摻合量多,則有附著力下降的傾向。 If the weight average molecular weight of the polymer component (A) is low, the adhesion tends to increase. If the glass transition temperature of the polymer component (A) is low, the adhesion tends to increase. In addition, if a low molecular weight compound is used as a curable component (B), a curing agent (C), a curing accelerator (D), or an energy ray curable component, the adhesion tends to increase. If the blending amount of the filler (E) is large, the adhesion tends to decrease.

藉由將保護膜形成膜部分固化,也可控制附著力。例如藉由將固化性成分(B)部分固化,能夠降低附著力。將保護膜形成膜部分固化的時機沒有特別限定,例如只要是在對保護膜形成用片進行沖孔加工時通過輥19之前的階段即 可。然而,從將後述的剝離力F1及F2設置在適當的範圍內的角度、以及對工件的黏著性的角度出發,保護膜形成膜優選如後述的實施例所述未進行部分固化。 Adhesion can also be controlled by partially curing the protective film forming film. For example, by partially curing the curable component (B), adhesion can be reduced. The timing of partially curing the protective film forming film is not particularly limited, for example, as long as it is the stage before the protective film forming sheet passes through the roller 19 when punching. However, from the perspective of setting the peeling forces F1 and F2 described later within an appropriate range and the perspective of adhesion to the workpiece, the protective film forming film is preferably not partially cured as described in the embodiment described later.

(2.保護膜形成用片) (2. Sheet for forming protective film)

保護膜形成膜在使用前,可以如圖1所示,以在第一剝離膜12上層疊有可剝離的保護膜形成膜11的雙層結構的保護形成用片10的形態被卷收、保管。此外,也可以如圖3所示,以在兩片剝離膜(第一剝離膜12、第二剝離膜13)之間夾持有保護膜形成膜11的三層結構的保護膜形成用片20的形態(另一個實施方案)被卷收、保管。剝離膜在使用保護膜形成膜時被剝離。 Before use, the protective film forming film can be rolled up and stored in the form of a double-layered protective film forming sheet 10 in which a peelable protective film forming film 11 is stacked on a first peeling film 12 as shown in FIG1. In addition, it can also be rolled up and stored in the form of a three-layered protective film forming sheet 20 in which the protective film forming film 11 is sandwiched between two peeling films (a first peeling film 12 and a second peeling film 13) as shown in FIG3 (another embodiment). The peeling film is peeled off when the protective film forming film is used.

上述保護膜形成用片為長條且被捲繞成卷狀進行保管、運輸。作為這種保護膜形成用片,還已知有預先將保護膜形成膜沖孔加工為與工件大致相同的形狀的保護膜形成用片。這種經過沖孔加工的保護膜形成用片的沖孔加工為規定的封閉形狀的保護膜形成膜16被層疊在第一剝離膜12上(圖2),或夾持在兩片剝離膜(12、13)之間(圖4)。 The protective film forming sheet is long and is rolled into a roll for storage and transportation. As such a protective film forming sheet, there is also known a protective film forming sheet in which the protective film forming film is punched into a shape roughly the same as the workpiece. The protective film forming film 16 punched into a predetermined closed shape of the punched protective film forming sheet is stacked on the first release film 12 (Figure 2), or sandwiched between two release films (12, 13) (Figure 4).

第一剝離膜可以由一層(單層)或兩層以上的基材構成,從控制剝離性的角度出發,基材的表面可經過剝離處理。即,基材的表面可被改質,也可在基材的表面形成並非來自基材的材料。在本實施方案中,優選第一剝離膜具有基材與剝離劑層。藉由具有剝離劑層,易於控制第一剝離膜中形成有剝離劑層的面的物性。在本實施方案中,在基材的一個面上塗佈含有後述的剝離劑層用組合物的塗佈劑之後,將該塗膜乾燥並固化,由此形成剝離劑層。由此可得到第一剝離膜。 The first peeling film can be composed of one layer (single layer) or two or more layers of substrate. From the perspective of controlling the peeling property, the surface of the substrate can be subjected to a peeling treatment. That is, the surface of the substrate can be modified, and a material that is not from the substrate can also be formed on the surface of the substrate. In this embodiment, it is preferred that the first peeling film has a substrate and a peeling agent layer. By having a peeling agent layer, it is easy to control the physical properties of the surface of the first peeling film on which the peeling agent layer is formed. In this embodiment, after a coating agent containing a peeling agent layer composition described later is applied on one surface of the substrate, the coating film is dried and cured to form a peeling agent layer. Thus, the first peeling film can be obtained.

第一剝離膜12的厚度沒有特別限定,但優選為30~100μm,進一步優選為40~80μm,更優選為45~70μm。 The thickness of the first peeling film 12 is not particularly limited, but is preferably 30 to 100 μm, more preferably 40 to 80 μm, and even more preferably 45 to 70 μm.

藉由使第一剝離膜12的厚度的下限值為上述值,能夠防止在使用切割刀切下保護膜形成膜時,切割刀貫穿第一剝離膜12而切斷第一剝離膜12。此 外,在保護膜形成用片10被放卷且保護膜形成膜11被切出後,在被運輸至下一道步驟之前,保護膜形成用片10會通過裝置內的導輥等輥,但藉由使第一剝離膜12的厚度的上限值為上述值,能夠防止保護膜形成膜11從第一剝離膜12上剝離。 By setting the lower limit of the thickness of the first release film 12 to the above value, it is possible to prevent the cutter from penetrating the first release film 12 and cutting the first release film 12 when the protective film forming film is cut with a cutter. In addition, after the protective film forming sheet 10 is unwound and the protective film forming film 11 is cut out, before being transported to the next step, the protective film forming sheet 10 passes through the guide rollers and other rollers in the device, but by setting the upper limit of the thickness of the first release film 12 to the above value, it is possible to prevent the protective film forming film 11 from being peeled off from the first release film 12.

另外,第一剝離膜12的厚度是指第一剝離膜整體的厚度。例如,由多個層構成的第一剝離膜的厚度是指構成第一剝離膜的所有層的合計厚度。 In addition, the thickness of the first peeling film 12 refers to the thickness of the first peeling film as a whole. For example, the thickness of the first peeling film composed of multiple layers refers to the total thickness of all layers constituting the first peeling film.

作為第一剝離膜12的基材,可列舉出樹脂膜及紙等。作為樹脂膜的樹脂,可列舉出聚對苯二甲酸乙二醇酯、聚乙烯、聚丙烯、聚丁烯、聚丁二烯、聚甲基戊烯、聚氯乙烯、氯乙烯共聚物、聚對苯二甲酸丁二醇酯、聚氨酯、乙烯-乙酸乙烯酯共聚物、離聚物樹脂、乙烯(甲基)丙烯酸共聚物、聚苯乙烯、聚碳酸酯、氟樹脂、低密度聚乙烯、線性低密度聚乙烯及三乙醯纖維素等。作為紙,可列舉出優質紙、塗佈紙(coat paper)、玻璃紙及層壓紙等。這些基材可單獨使用一種,也可同時使用兩種以上。其中,從廉價且具有剛性的角度出發,優選聚對苯二甲酸乙二醇酯膜。 As the base material of the first release film 12, resin films and paper can be listed. As the resin of the resin film, polyethylene terephthalate, polyethylene, polypropylene, polybutylene, polybutadiene, polymethylpentene, polyvinyl chloride, vinyl chloride copolymer, polybutylene terephthalate, polyurethane, ethylene-vinyl acetate copolymer, polymer resin, ethylene (meth) acrylic acid copolymer, polystyrene, polycarbonate, fluororesin, low-density polyethylene, linear low-density polyethylene and triacetyl cellulose can be listed. As the paper, high-quality paper, coating paper (coat paper), glass paper and laminated paper can be listed. These base materials can be used alone or in combination of two or more. Among them, polyethylene terephthalate film is preferred because it is cheap and has high rigidity.

第一剝離膜12的至少一個面(與保護膜形成膜層疊的面)可藉由剝離劑層用組合物進行了剝離處理。剝離劑層的厚度優選為30nm以上200nm以下,更優選為50nm以上180nm以下。 At least one surface of the first peeling film 12 (the surface overlapping the protective film forming film layer) can be peeled by a peeling agent layer composition. The thickness of the peeling agent layer is preferably greater than 30nm and less than 200nm, and more preferably greater than 50nm and less than 180nm.

第一剝離膜12的與保護膜形成膜11相接的面的表面彈性模數(23℃)優選為17MPa以下,進一步優選為14MPa以下,更優選為13MPa以下特別優選為12MPa以下。表面彈性模數為表面的變形容易程度的指標。藉由將第一剝離膜12的與保護膜形成膜11相接的面的表面彈性模數設在上述範圍內,能夠在沖孔加工步驟中,在按壓沖模然後將其拉起時,抑制在保護膜形成膜11與第一剝離膜12之間產生浮起(1~4mm左右的剝離)。認為這是由於第一剝離膜12的表面比較柔軟,即使存在基於沖模的壓縮與基於其脫離的脫壓,第一剝離膜表面也會追隨保護膜形成膜的變形。藉由抑制浮起的發生,可進一步減少廢料去除的 不良。第一剝離膜12的與保護膜形成膜11相接的面的表面彈性模數的下限沒有特別限定,但若表面彈性模數過低,則剝離力有時會增大,因此優選為3MPa以上,進一步優選為4MPa以上,特別優選為5MPa以上。 The surface elastic modulus (23°C) of the surface of the first peeling film 12 in contact with the protective film forming film 11 is preferably 17 MPa or less, further preferably 14 MPa or less, more preferably 13 MPa or less, and particularly preferably 12 MPa or less. The surface elastic modulus is an indicator of the ease of deformation of the surface. By setting the surface elastic modulus of the surface of the first peeling film 12 in contact with the protective film forming film 11 within the above range, it is possible to suppress the occurrence of floating (peeling of about 1 to 4 mm) between the protective film forming film 11 and the first peeling film 12 when the punch is pressed and then pulled up in the punching process. This is believed to be because the surface of the first peeling film 12 is relatively soft, and even if there is compression based on the punch and decompression based on its decompression, the surface of the first peeling film will follow the deformation of the protective film forming film. By suppressing the occurrence of floating, the defective removal of waste materials can be further reduced. The lower limit of the surface elastic modulus of the first peeling film 12 in contact with the protective film forming film 11 is not particularly limited, but if the surface elastic modulus is too low, the peeling force may increase, so it is preferably 3MPa or more, more preferably 4MPa or more, and particularly preferably 5MPa or more.

23℃下的第一剝離膜12的與保護膜形成膜11相接的面的表面彈性模數可使用具備懸臂的原子力顯微鏡而測定。即,對第一剝離膜12的與保護膜形成膜11相接的面進行懸臂的按壓和拉離,得到力曲線。對得到的力曲線進行基於JKR理論式的擬合,求出彈性模數,作為本發明的表面彈性模數。具體的測定方法會在後述的實施例中詳細說明。 The surface elastic modulus of the first peeling film 12 at 23°C on the surface in contact with the protective film forming film 11 can be measured using an atomic force microscope equipped with a cantilever. That is, the surface of the first peeling film 12 in contact with the protective film forming film 11 is pressed and pulled by the cantilever to obtain a force curve. The obtained force curve is fitted based on the JKR theoretical formula to obtain the elastic modulus, which is used as the surface elastic modulus of the present invention. The specific measurement method will be described in detail in the embodiments described below.

為了將後述的剝離力F1設置在適當的範圍內,並將第一剝離膜12的表面彈性模數設置在上述範圍內,在本實施方案中,作為剝離劑層用組合物,例如優選醇酸類脫模劑、矽氧類脫模劑、氟類脫模劑、不飽和聚酯類脫模劑、聚烯烴類脫模劑、蠟類脫模劑,其中,優選矽氧類脫模劑,特別優選含有矽氧類脫模劑與重剝離添加劑。 In order to set the peeling force F1 described later within an appropriate range and set the surface elastic modulus of the first peeling film 12 within the above range, in this embodiment, the composition used as the peeling agent layer is preferably an alkyd release agent, a silicone release agent, a fluorine release agent, an unsaturated polyester release agent, a polyolefin release agent, or a wax release agent, among which a silicone release agent is preferred, and a silicone release agent and a heavy peeling additive are particularly preferred.

作為矽氧類脫模劑,可使用摻合有具有二甲基聚矽氧烷作為基本骨架的矽氧的矽氧脫模劑。 As a silicone-based mold release agent, a silicone mold release agent mixed with silicone having dimethyl polysiloxane as a basic skeleton can be used.

該矽氧可以為加成反應型、縮合反應型以及紫外線固化型及電子束固化型等能量射線固化型中的任意一種,但優選為加成反應型矽氧。加成反應型矽氧反應性高,生產率優異,且與縮合反應型相比,具有製造後的剝離力的變化小、無固化收縮等優點。 The silicone can be any one of the addition reaction type, condensation reaction type, and energy ray curing type such as ultraviolet curing type and electron beam curing type, but addition reaction type silicone is preferred. Addition reaction type silicone has high reactivity and excellent productivity, and compared with condensation reaction type, it has the advantages of small change in peeling force after manufacturing and no curing shrinkage.

作為加成反應型矽氧的具體實例,可列舉出在分子的末端和/或側鏈具備2個以上乙烯基、烯丙基、丙烯基及己烯基等碳原子數為2~10的烯基的有機聚矽氧烷。從降低表面彈性模數的角度出發,優選加成反應型矽氧中的烯基數少。 As specific examples of addition-reaction-type siloxanes, there can be cited organic polysiloxanes having two or more alkenyl groups with 2 to 10 carbon atoms, such as vinyl, allyl, propenyl, and hexenyl, at the ends and/or side chains of the molecules. From the perspective of reducing the surface elastic modulus, it is preferred that the number of alkenyl groups in the addition-reaction-type siloxanes is small.

將剝離劑層用組合物(不包括後述的催化劑)的總重量設為100質 量份時,由二甲基聚矽氧烷構成的矽氧的含量優選小於100質量份,進一步優選小於90質量份,更優選小於80質量份,特別優選小於70質量份。 When the total weight of the stripping agent layer composition (excluding the catalyst described below) is set to 100 parts by mass, the content of siloxane composed of dimethyl polysiloxane is preferably less than 100 parts by mass, further preferably less than 90 parts by mass, more preferably less than 80 parts by mass, and particularly preferably less than 70 parts by mass.

在使用這種加成反應型矽氧時,優選同時使用交聯劑及催化劑。 When using this addition reaction type silane, it is preferred to use a crosslinking agent and a catalyst at the same time.

作為交聯劑,例如可列舉出在一分子中至少具有2個與氫原子鍵合的矽原子的有機聚矽氧烷。從降低表面彈性模數的角度出發,優選剝離劑層用組合物中的交聯劑含量少。 As a crosslinking agent, for example, an organic polysiloxane having at least two silicon atoms bonded to hydrogen atoms in one molecule can be cited. From the perspective of reducing the surface elastic modulus, it is preferred that the crosslinking agent content in the stripping agent layer composition is small.

作為交聯劑的具體實例,可列舉出二甲基氫矽氧烷基末端封端二甲基矽氧烷-甲基氫矽氧烷共聚物、三甲基矽氧烷基末端封端二甲基矽氧烷-甲基氫矽氧烷共聚物、三甲基矽氧烷基末端封端甲基氫聚矽氧烷、聚(氫倍半矽氧烷)等。 As specific examples of crosslinking agents, there can be cited dimethylhydrosiloxane-methylhydrosiloxane copolymers end-capped with dimethylhydrosiloxane, trimethylhydrosiloxane-methylhydrosiloxane copolymers end-capped with dimethylhydrosiloxane, trimethylhydrosiloxane-methylhydropolysiloxane, poly(hydrosilsesquioxane), etc.

作為催化劑,可列舉出微粒狀鉑、吸附在碳粉末載體上的微粒狀鉑、氯鉑酸、醇改質氯鉑酸、氯鉑酸的烯烴絡合物、鈀及銠等鉑族金屬類化合物等。 As catalysts, there are microparticles of platinum, microparticles of platinum adsorbed on a carbon powder carrier, chloroplatinic acid, alcohol-modified chloroplatinic acid, olefin compounds of chloroplatinic acid, and platinum group metal compounds such as palladium and rhodium.

藉由使用這種催化劑,能夠更加有效進行剝離劑層用組合物的固化反應。 By using this catalyst, the curing reaction of the stripper layer composition can be carried out more effectively.

從將表面彈性模數設在上述範圍內的角度以及將後述的剝離力F1設在適當範圍內的角度出發,將剝離劑層用組合物(不包括催化劑)的總重量設為100質量份時,矽氧類脫模劑的含量優選為30~100質量份,進一步優選為50~100質量份。 From the perspective of setting the surface elastic modulus within the above range and setting the peeling force F1 described later within an appropriate range, when the total weight of the stripping agent layer composition (excluding the catalyst) is set to 100 parts by mass, the content of the silicone release agent is preferably 30 to 100 parts by mass, and more preferably 50 to 100 parts by mass.

重剝離添加劑用於增大後述的剝離力F1。作為重剝離添加劑,例如可列舉出矽氧樹脂、矽烷偶合劑等有機矽烷,其中,優選矽氧樹脂。 The heavy-stripping additive is used to increase the stripping force F1 described later. Examples of heavy-stripping additives include silicone resins, silane coupling agents and other organic silanes, among which silicone resins are preferred.

作為矽氧樹脂,例如優選使用MQ樹脂,其含有作為單官能度矽氧烷單元[R3SiO1/2]的M單元與作為四官能度矽氧烷單元[SiO4/2]的Q單元。另外,M單元中的3個R各自獨立地表示氫原子、羥基或有機基團。從易於抑制矽氧轉移的角度出發,M單元中的3個R中的1個以上優選為羥基或乙烯基,更優選為乙 烯基。從降低表面彈性模數的角度出發,優選剝離劑層用組合物中的矽氧樹脂(特別是MQ樹脂)的含量少。 As the silicone resin, for example, MQ resin is preferably used, which contains an M unit as a monofunctional siloxane unit [R 3 SiO 1/2 ] and a Q unit as a tetrafunctional siloxane unit [SiO 4/2 ]. In addition, the three Rs in the M unit each independently represent a hydrogen atom, a hydroxyl group or an organic group. From the perspective of easily suppressing siloxane migration, one or more of the three Rs in the M unit are preferably a hydroxyl group or a vinyl group, and more preferably a vinyl group. From the perspective of reducing the surface elastic modulus, the content of the silicone resin (especially the MQ resin) in the stripping agent composition is preferably small.

將剝離劑層用組合物(不包括催化劑)的總重量設為100質量份時,重剝離添加劑的含量優選為0~50質量份,進一步優選為5~45質量份,特別優選為10~40質量份。 When the total weight of the stripping agent layer composition (excluding the catalyst) is set to 100 parts by mass, the content of the heavy stripping additive is preferably 0 to 50 parts by mass, further preferably 5 to 45 parts by mass, and particularly preferably 10 to 40 parts by mass.

從調整黏度、提高對基材的塗佈性的角度出發,剝離劑層用組合物優選作為除了含有上述各種有效成分以外還含有稀釋溶劑的塗佈劑進行使用。在本說明書中,「有效成分」是指在含有作為物件的組合物的塗佈劑中所含有的成分中除去稀釋溶劑以外的成分。 From the perspective of adjusting the viscosity and improving the coating properties on the substrate, the composition for the stripping agent layer is preferably used as a coating agent containing a diluent solvent in addition to the above-mentioned various active ingredients. In this specification, "active ingredient" refers to the ingredients contained in the coating agent containing the composition as an object, excluding the diluent solvent.

作為稀釋溶劑,可列舉出甲苯等芳香族烴、乙酸乙酯等脂肪酸酯、甲基乙基酮等酮、己烷、庚烷等脂肪族烴等有機溶劑等。這些稀釋溶劑可單獨使用一種,也可同時使用兩種以上。 As diluent solvents, there are organic solvents such as aromatic hydrocarbons such as toluene, fatty acid esters such as ethyl acetate, ketones such as methyl ethyl ketone, and aliphatic hydrocarbons such as hexane and heptane. These diluent solvents may be used alone or in combination of two or more.

含有剝離劑層用組合物的塗佈劑的有效成分(固體成分)濃度優選為0.3~10質量%,更優選為0.5~5質量%,進一步優選為0.5~3質量%。 The concentration of the active ingredient (solid content) of the coating agent containing the peeling agent composition is preferably 0.3 to 10% by mass, more preferably 0.5 to 5% by mass, and further preferably 0.5 to 3% by mass.

在不損害本發明的效果的範圍內,剝離劑層用組合物可含有在剝離劑層中通常使用的添加劑。作為這種添加劑,可列舉出染料及分散劑等。 The composition for the stripping agent layer may contain additives commonly used in stripping agent layers within the range that does not impair the effect of the present invention. Examples of such additives include dyes and dispersants.

在本實施方案的保護膜形成用片10中,優選將保護膜形成膜11沖孔加工為規定的形狀。即,優選在所述保護膜形成用片上以在俯視保護膜形成用片10時保護膜形成用片10的一部分具有規定的封閉形狀的方式形成有切口14。另外,從在工件上貼附保護膜形成膜時保護膜形成膜不從工件上溢出的角度出發,優選沖孔加工後的保護膜形成膜的形狀小於工件的形狀。 In the protective film forming sheet 10 of the present embodiment, the protective film forming film 11 is preferably punched into a predetermined shape. That is, the cutout 14 is preferably formed on the protective film forming sheet in such a manner that a portion of the protective film forming sheet 10 has a predetermined closed shape when the protective film forming sheet 10 is viewed from above. In addition, from the perspective that the protective film forming film does not overflow from the workpiece when the protective film forming film is attached to the workpiece, the shape of the protective film forming film after punching is preferably smaller than the shape of the workpiece.

(3.保護膜形成用片的製造方法) (3. Method for manufacturing a protective film forming sheet)

保護膜形成膜的製造方法沒有特別限定。該膜可使用含有上述保護膜形成膜用組合物的塗佈劑而製造。塗佈劑可藉由利用公知的方法混合構成保護膜形 成膜用組合物的成分而製備。 The method for producing the protective film-forming film is not particularly limited. The film can be produced using a coating agent containing the above-mentioned protective film-forming film composition. The coating agent can be prepared by mixing the components constituting the protective film-forming film composition using a known method.

使用輥塗機、刮刀塗佈機、輥刀塗佈機、氣刀塗佈機、模塗機、棒塗機、凹版塗佈機、幕塗機等塗佈機,將得到的塗佈劑塗佈在第一剝離膜12的剝離面上並使其乾燥,可得到在第一剝離膜12上具有保護膜形成膜11的、本實施方案的保護膜形成用片10。另外,也可在其他的樹脂膜上塗佈塗佈劑並使其乾燥,將得到的保護膜形成膜轉印至第一剝離膜上。在欲得到另一個實施方案的保護膜形成用片20時,在與第一剝離膜12層疊的保護膜形成膜11的露出面上貼合第二剝離膜13,得到在兩片剝離膜中夾持有保護膜形成膜11的保護膜形成用片20。 The obtained coating agent is applied to the release surface of the first release film 12 using a coating machine such as a roll coater, a doctor blade coater, a roll knife coater, an air knife coater, a die coater, a rod coater, a gravure coater, a curtain coater, and the like, and then dried to obtain the protective film-forming sheet 10 of the present embodiment having the protective film-forming film 11 on the first release film 12. Alternatively, the coating agent may be applied to another resin film and dried to transfer the obtained protective film-forming film to the first release film. When obtaining a protective film forming sheet 20 of another embodiment, a second release film 13 is bonded to the exposed surface of the protective film forming film 11 stacked with the first release film 12, thereby obtaining a protective film forming sheet 20 in which the protective film forming film 11 is sandwiched between two release films.

(4.經過沖孔加工的保護膜形成用片的製造方法) (4. Method for manufacturing a punched protective film forming sheet)

針對對保護膜形成用片10進行沖孔加工並在第一剝離膜12上得到沖孔加工為規定的封閉形狀的保護膜形成膜16的方法進行說明。 A method for punching the protective film forming sheet 10 and obtaining a protective film forming film 16 punched into a predetermined closed shape on the first release film 12 is described.

(4.1 沖孔加工步驟) (4.1 Punching process steps)

首先,準備圖1所示的未經過沖孔加工的保護膜形成用片10。利用沖模(未圖示),自保護膜形成用片10的保護膜形成膜11側的面,以貫穿保護膜形成膜11並到達至第一剝離膜12的表面的一部分的方式切出切口14。將以到達至表面的一部分的方式切出切口而未完全切斷的操作稱為半切(half-cut)。結果在保護膜形成用片10的表面的一部分上以具有規定的封閉形狀的方式形成切口14(參照圖2、圖5)。此處,在將保護膜形成膜轉印至半導體晶圓上的情況下,規定的封閉形狀為與晶圓大致相同的形狀。即,以成為與保護膜形成膜11所貼附的工件的形狀或與應形成保護膜的區域大致相同的形狀的方式形成切口14。該步驟被稱為「沖孔加工步驟」。 First, prepare the protective film forming sheet 10 shown in FIG. 1 which has not been punched. Use a punch (not shown) to cut a cut 14 from the protective film forming film 11 side of the protective film forming sheet 10 in a manner that penetrates the protective film forming film 11 and reaches a portion of the surface of the first peeling film 12. The operation of cutting a cut in a manner that reaches a portion of the surface without completely cutting is called a half-cut. As a result, a cut 14 is formed on a portion of the surface of the protective film forming sheet 10 in a manner having a prescribed closed shape (see FIG. 2 and FIG. 5). Here, when the protective film forming film is transferred to a semiconductor wafer, the prescribed closed shape is a shape substantially the same as that of the wafer. That is, the cutout 14 is formed in a shape roughly the same as the shape of the workpiece to which the protective film forming film 11 is attached or the shape of the area where the protective film is to be formed. This step is called a "punching process step".

藉由沖孔加工步驟,保護膜形成膜11被分為沖孔加工為規定的封閉形狀的保護膜形成膜16、及在其周圍的連續的無用部分17。在保護膜形成用 片10的長邊方向上,在多處設有沖孔加工為規定的封閉形狀的保護膜形成膜16。 By the punching process, the protective film forming film 11 is divided into a protective film forming film 16 punched into a predetermined closed shape and a continuous useless portion 17 around it. In the long side direction of the protective film forming sheet 10, the protective film forming film 16 punched into a predetermined closed shape is provided at multiple locations.

在沖孔加工步驟中,可適當使用公知的沖模。沖孔加工以完全切斷保護膜形成膜11且不完全切斷第一剝離膜12的方式進行半切而進行。 In the punching process step, a known punching die can be appropriately used. The punching process is performed by half-cutting in a manner that completely cuts the protective film forming film 11 and does not completely cut the first peeling film 12.

如圖2、圖4所示,切口14的剖面形狀大致為楔型,切口14的寬度在沖模所進入的保護膜形成膜11的上表面側較寬,且在下表面側(保護膜形成膜11與第一剝離膜12的界面)變窄。切口14的寬度沒有特別限定,但從防止經過沖孔加工的保護膜形成膜16與無用部分17的接觸、附著的角度出發,或從縮短接觸、附著的時間的角度出發,保護膜形成膜11的下表面部(即,第一剝離膜12的上表面部)的切口14的寬度D優選為8μm以上,更優選為10μm以上,進一步優選為15μm以上,特別優選為20μm以上。作為寬度D,可將保護膜形成用片沿厚度方向切斷,並將剖面的第一剝離膜12的上表面部的切口的寬度作為寬度D進行測定。寬度D的上限值沒有特別限定,但考慮到能夠確實地切斷保護膜形成膜的切割刀的寬度,通常為100μm以下,優選為80μm以下,更優選為60μm以下,進一步優選為40μm以下。為了形成這種切口14,作為沖模,優選使用具有前端部的刀刃寬度較寬的切割刀的沖模。 As shown in FIG. 2 and FIG. 4 , the cross-sectional shape of the cut 14 is generally wedge-shaped, and the width of the cut 14 is wider on the upper surface side of the protective film forming film 11 where the punch enters, and narrows on the lower surface side (the interface between the protective film forming film 11 and the first peeling film 12). The width of the cut 14 is not particularly limited, but from the perspective of preventing the contact and adhesion between the punched protective film forming film 16 and the useless portion 17, or from the perspective of shortening the contact and adhesion time, the width D of the cut 14 on the lower surface of the protective film forming film 11 (i.e., the upper surface of the first peeling film 12) is preferably 8 μm or more, more preferably 10 μm or more, further preferably 15 μm or more, and particularly preferably 20 μm or more. As the width D, the protective film forming sheet can be cut in the thickness direction, and the width of the cut on the upper surface of the first peeling film 12 of the cross section can be measured as the width D. The upper limit of the width D is not particularly limited, but considering the width of the cutter that can reliably cut the protective film forming film, it is usually 100 μm or less, preferably 80 μm or less, more preferably 60 μm or less, and further preferably 40 μm or less. In order to form such a cut 14, it is preferred to use a cutter with a wider blade width at the front end as a punch.

經過上述步驟,可得到經過沖孔加工的保護膜形成用片10。在保護膜形成用片上,以在從保護膜形成膜11的上表面俯視經過沖孔加工的保護膜形成用片10時,保護膜形成用片的一部分具有規定的封閉形狀(例如,與半導體晶圓的平面形狀大致相同的形狀)的方式形成有切口14,且切口14在保護膜形成用片10的厚度方向到達至第一剝離膜12的一部分。即,在第一剝離膜12的與保護膜形成膜11相接的表面上也形成有切口。藉由使切割刀到達至第一剝離膜12,能夠將保護膜形成膜11完全切斷。 After the above steps, a punched protective film forming sheet 10 can be obtained. On the protective film forming sheet, a cut 14 is formed in such a way that a portion of the protective film forming sheet has a predetermined closed shape (for example, a shape roughly the same as the plane shape of the semiconductor wafer) when the punched protective film forming sheet 10 is viewed from the upper surface of the protective film forming film 11, and the cut 14 reaches a portion of the first release film 12 in the thickness direction of the protective film forming sheet 10. That is, a cut is also formed on the surface of the first release film 12 that is in contact with the protective film forming film 11. By making the dicing knife reach the first release film 12, the protective film forming film 11 can be completely cut.

(4.2 廢料去除步驟) (4.2 Waste removal steps)

在沖孔加工步驟之後至廢料去除步驟之前,以控制保護膜形成用片的張力 等為目的,保護膜形成用片10會通過導輥等多個輥。 After the punching process and before the waste material removal process, the protective film forming sheet 10 passes through multiple rollers such as guide rollers for the purpose of controlling the tension of the protective film forming sheet.

如圖6所示,在廢料去除步驟中,從第一剝離膜12上剝離連續的無用部分17,使經過沖孔加工的保護膜形成膜16殘留在第一剝離膜12上。被剝離的無用部分17被捲繞在提廢用輥上。 As shown in FIG6 , in the waste removal step, the continuous useless portion 17 is peeled off from the first peeling film 12, so that the protective film forming film 16 that has been punched remains on the first peeling film 12. The peeled useless portion 17 is wound on the waste roller.

根據本實施方案的保護膜形成用片10,由於保護膜形成膜彼此的附著力低,即使在沖孔加工步驟後通過輥19等時經過沖孔加工的保護膜形成膜16與無用部分17發生了接觸、附著,在通過輥之後,保護膜形成膜16與無用部分17也可再度分離。結果可抑制廢料去除步驟中的廢料去除的不良。 According to the protective film forming sheet 10 of the present embodiment, since the adhesion between the protective film forming films is low, even if the punched protective film forming film 16 and the useless portion 17 come into contact and adhere when passing through the roller 19 after the punching process, the protective film forming film 16 and the useless portion 17 can be separated again after passing through the roller. As a result, the defective waste removal in the waste removal step can be suppressed.

經過沖孔加工的保護膜形成用片10可捲繞成卷狀進行保管、運輸。 The protective film forming sheet 10 that has been punched can be rolled into a roll for storage and transportation.

(5.工件的加工方法) (5. Processing method of workpiece)

作為使用有本實施方案的經過沖孔加工的保護膜形成用片的工件的加工方法的一個例子,對在基板上配置有對貼附有保護膜形成膜的晶圓進行加工而得到的帶保護膜的晶片的封裝的製造方法進行說明。 As an example of a method for processing a workpiece using a punched protective film forming sheet according to the present embodiment, a method for manufacturing a package of a chip with a protective film obtained by processing a wafer with a protective film formed thereon on a substrate is described.

本實施方案的裝置的製造方法至少具有以下的步驟1至步驟9。 The manufacturing method of the device of this embodiment has at least the following steps 1 to 9.

步驟1:對保護膜形成用片10進行沖孔加工的步驟 Step 1: Punching the protective film forming sheet 10

步驟2:經過沖孔加工的保護膜形成用片通過輥間的步驟 Step 2: The punched protective film forming sheet passes between rollers

步驟3:去除保護膜形成用片10的無用部分17的步驟 Step 3: Step of removing the useless portion 17 of the protective film forming sheet 10

步驟4:將保護膜形成用片10的保護膜形成膜11貼附在晶圓背面的步驟 Step 4: A step of attaching the protective film forming film 11 of the protective film forming sheet 10 to the back of the wafer

步驟5:將貼附的保護膜形成膜保護膜化的步驟 Step 5: The step of forming the attached protective film into a protective film

步驟6:從保護膜或保護膜形成膜上剝離第一剝離膜的步驟 Step 6: Step of peeling off the first peeling film from the protective film or protective film forming film

步驟7:將背面具有保護膜或保護膜形成膜的晶圓單顆化,得到多個帶保護膜或保護膜形成膜的晶片的步驟 Step 7: Singulate the wafer having a protective film or a protective film-forming film on the back to obtain a plurality of wafers with protective films or protective film-forming films

步驟8:將帶保護膜或保護膜形成膜的晶片配置在基板上的步驟 Step 8: The step of placing the chip with the protective film or the protective film forming film on the substrate

步驟9:對配置在基板上的帶保護膜或保護膜形成膜的晶片與基板進行加熱的步驟 Step 9: A step of heating the chip with a protective film or a protective film-forming film disposed on the substrate and the substrate

步驟1~步驟3如上所述。步驟5可在步驟6之前進行,也可在步驟6~步驟9中的任意一道步驟之後進行。即,將保護膜形成膜保護膜化的步驟可在將保護膜形成膜貼附在晶圓上之後的任意階段進行。 Step 1 to step 3 are as described above. Step 5 can be performed before step 6, or after any step from step 6 to step 9. That is, the step of converting the protective film forming film into a protective film can be performed at any stage after the protective film forming film is attached to the wafer.

參照圖式,對具有上述步驟1至步驟9的裝置的製造方法進行說明。 Referring to the drawings, the manufacturing method of the device having the above steps 1 to 9 is described.

圖2、圖4、圖5如上所述示出了步驟1的概略。圖6示出了步驟3的概略。 Figures 2, 4, and 5 show the outline of step 1 as described above. Figure 6 shows the outline of step 3.

如圖9所示,在晶圓21的背面貼附保護膜形成用片10的保護膜形成膜11(步驟4)。然後,將貼附的保護膜形成膜11保護膜化,形成保護膜32(步驟5),得到帶保護膜的晶圓。當保護膜形成膜11為熱固性時,以規定溫度對保護膜形成膜11加熱適當的時間即可。此外,當保護膜形成膜11為能量射線固化性時,使用能量射線透射膜作為第一剝離膜12且自第一剝離膜12側入射能量射線即可。 As shown in FIG. 9 , a protective film forming film 11 of a protective film forming sheet 10 is attached to the back of a wafer 21 (step 4). Then, the attached protective film forming film 11 is protected to form a protective film 32 (step 5), and a wafer with a protective film is obtained. When the protective film forming film 11 is thermosetting, the protective film forming film 11 can be heated at a specified temperature for an appropriate time. In addition, when the protective film forming film 11 is energy ray curable, an energy ray transmitting film can be used as the first peeling film 12 and the energy ray can be incident from the side of the first peeling film 12.

另外,保護膜形成膜11的固化也可在後述的切割步驟後進行,也可在從切割片上拾取帶保護膜形成膜的晶片後使保護膜形成膜11固化。 In addition, the protective film forming film 11 can be cured after the dicing step described later, or the protective film forming film 11 can be cured after the wafer with the protective film forming film is picked up from the dicing sheet.

然後,將帶保護膜的晶圓21轉印至公知的切割片22上,對帶保護膜的晶圓21進行切割,如圖10所示,得到具有保護膜32的晶片31(帶保護膜的晶片30)(步驟7)。然後,根據需要沿平面方向擴展切割片22,利用吸嘴(未圖示)等從切割片22上拾取帶保護膜的晶片30。 Then, the wafer 21 with the protective film is transferred to a known cutting sheet 22, and the wafer 21 with the protective film is cut, as shown in FIG10, to obtain a chip 31 with a protective film 32 (chip 30 with a protective film) (step 7). Then, the cutting sheet 22 is expanded along the plane direction as needed, and the chip 30 with the protective film is picked up from the cutting sheet 22 using a suction nozzle (not shown).

可將拾取的帶保護膜的晶片30搬運至下一道步驟,也可暫時將其收納保管在盤、膠帶等上,並在規定期間後搬運至下一道步驟。 The picked-up chip 30 with protective film can be transported to the next step, or it can be temporarily stored on a tray, tape, etc. and transported to the next step after a specified period of time.

如圖11所示,搬運至下一道步驟的帶保護膜的晶片30被吸嘴搬運至基板50上,在基板上的端子部從吸嘴上脫離,並被配置在凸塊等凸狀電極33 與焊盤(pad)等端子部可進行連接的位置上(步驟8)。此時,與帶保護膜的晶片30不同的其他晶片也可安裝在基板50上。因此,可以在該基板上安裝多個晶片。 As shown in FIG. 11 , the chip 30 with a protective film transported to the next step is transported to the substrate 50 by the suction nozzle, and the terminal portion on the substrate is detached from the suction nozzle and arranged at a position where the convex electrode 33 such as a bump can be connected to the terminal portion such as a pad (step 8). At this time, other chips different from the chip 30 with a protective film can also be mounted on the substrate 50. Therefore, multiple chips can be mounted on the substrate.

對配置在基板上的規定位置的帶保護膜的晶片進行加熱處理(回流處理)(步驟9)。作為回流處理條件,例如優選最高加熱溫度為180~350℃,回流時間為2~10分鐘。 The chip with the protective film arranged at a predetermined position on the substrate is subjected to a heat treatment (reflow treatment) (step 9). As the reflow treatment conditions, for example, the preferred maximum heating temperature is 180-350°C and the reflow time is 2-10 minutes.

在回流處理中,帶保護膜的晶片30的凸狀電極33熔融,與基板上的端子部電連接並機械連接,帶保護膜的晶片30被安裝在基板上。 During the reflow process, the convex electrode 33 of the chip 30 with the protective film melts and is electrically and mechanically connected to the terminal portion on the substrate, and the chip 30 with the protective film is mounted on the substrate.

(6.變形例) (6. Variations)

以上,對於本發明的實施方案,以在第一剝離膜12上具有保護膜形成膜11的雙層結構的保護膜形成用片為例進行了說明,但也可在保護膜形成膜11的露出面上層疊有第二剝離膜13。即,保護膜形成用片也可以為在第一剝離膜12與第二剝離膜13之間夾持有保護膜形成膜11的形態的保護膜形成用片20(參照圖3、圖4)。此時,對於第二剝離膜13,在將保護膜形成膜11貼附在工件上之前將其剝離即可。 In the above, the embodiment of the present invention is described by taking as an example a protective film forming sheet having a double-layer structure with a protective film forming film 11 on a first peeling film 12, but a second peeling film 13 may be stacked on the exposed surface of the protective film forming film 11. That is, the protective film forming sheet may also be a protective film forming sheet 20 in which the protective film forming film 11 is sandwiched between the first peeling film 12 and the second peeling film 13 (see FIG. 3 and FIG. 4). In this case, the second peeling film 13 may be peeled off before the protective film forming film 11 is attached to the workpiece.

保護膜形成用片20的保護膜形成膜11的材質及其優選的形態與上述實施方案相同,且第一剝離膜12也與對上述實施方案進行說明時的情況相同。 The material and preferred form of the protective film forming film 11 of the protective film forming sheet 20 are the same as those of the above-mentioned embodiment, and the first peeling film 12 is also the same as that described in the above-mentioned embodiment.

此外,在本實施方案中,在保護膜形成用片20中,將從保護膜形成膜11上剝離第一剝離膜12時的剝離力設為F1、並將從保護膜形成膜11上剝離第二剝離膜13時的剝離力設為F2時,F1與F2優選滿足F1>F2的關係。藉由滿足這種關係,在從保護膜形成用片20上去除第二剝離膜13時,應殘留的保護膜形成膜16不會與第二剝離膜13一同被去除,保護膜形成膜16容易殘留在第一剝離膜12上,可進一步抑制廢料去除的不良。 In addition, in the present embodiment, in the protective film forming sheet 20, when the peeling force when peeling the first peeling film 12 from the protective film forming film 11 is set to F1, and when the peeling force when peeling the second peeling film 13 from the protective film forming film 11 is set to F2, F1 and F2 preferably satisfy the relationship of F1>F2. By satisfying this relationship, when removing the second peeling film 13 from the protective film forming sheet 20, the protective film forming film 16 that should be left will not be removed together with the second peeling film 13, and the protective film forming film 16 is easy to remain on the first peeling film 12, which can further suppress the defect of waste material removal.

因此,第一剝離膜12為剝離力強的重剝離膜,第二剝離膜13為剝離力弱的輕剝離膜。 Therefore, the first peeling film 12 is a heavy peeling film with strong peeling force, and the second peeling film 13 is a light peeling film with weak peeling force.

另外,剝離力F1優選為50mN/100mm以上,進一步優選為70mN/100mm以上,更優選為90mN/100mm以上,更加優選為110mN/100mm以上,特別優選為130mN/100mm以上。通過使F1在上述範圍內,能夠抑制保護膜形成膜11與第一剝離膜12意外剝離。 In addition, the peeling force F1 is preferably 50mN/100mm or more, further preferably 70mN/100mm or more, more preferably 90mN/100mm or more, more preferably 110mN/100mm or more, and particularly preferably 130mN/100mm or more. By making F1 within the above range, the protective film forming film 11 and the first peeling film 12 can be suppressed from being accidentally peeled off.

剝離力的調整例如可藉由剝離劑層用組合物的種類、剝離劑層的厚度等控制。第二剝離膜13被設計為剝離力小於第一剝離膜12。當第二剝離膜13具有剝離劑層時,只要剝離劑層由可賦予剝離性的材料構成,則沒有特別限制。例如,第二剝離膜13的剝離劑層可與第一剝離膜12的剝離劑層相同,使含有矽氧的剝離劑層用組合物固化而得到。 The adjustment of the peeling force can be controlled, for example, by the type of the peeling agent layer composition, the thickness of the peeling agent layer, etc. The second peeling film 13 is designed to have a peeling force less than that of the first peeling film 12. When the second peeling film 13 has a peeling agent layer, there is no particular limitation as long as the peeling agent layer is made of a material that can impart peeling properties. For example, the peeling agent layer of the second peeling film 13 can be the same as the peeling agent layer of the first peeling film 12, and can be obtained by curing the peeling agent layer composition containing silicon oxide.

第二剝離膜13的剝離劑層用組合物只要滿足上述的F1與F2的關係,則能夠從第一剝離膜12中例示的材料中進行選擇。其中,對於作為重剝離添加劑而例示的材料,優選少於在第一剝離膜12中的含量、或不包含。 As long as the composition for the peeling agent layer of the second peeling film 13 satisfies the above-mentioned relationship between F1 and F2, it can be selected from the materials exemplified in the first peeling film 12. Among them, for the materials exemplified as heavy peeling additives, it is preferred that the content is less than that in the first peeling film 12, or it is not included.

第二剝離膜13的厚度沒有特別限制,但優選為10μm以上75μm以下。此外,第二剝離膜的厚度更優選為18μm以上,進一步優選為24μm以上。此外,第二剝離膜的厚度更優選為60μm以下,進一步優選為45μm以下。從將剝離力F2與剝離力F1設為上述的F1>F2的角度出發,第二剝離膜的厚度優選為第一剝離膜的厚度以下,更優選小於第一剝離膜的厚度。 The thickness of the second peeling film 13 is not particularly limited, but is preferably 10 μm or more and 75 μm or less. In addition, the thickness of the second peeling film is more preferably 18 μm or more, and further preferably 24 μm or more. In addition, the thickness of the second peeling film is more preferably 60 μm or less, and further preferably 45 μm or less. From the perspective of setting the peeling force F2 and the peeling force F1 to the above-mentioned F1>F2, the thickness of the second peeling film is preferably less than the thickness of the first peeling film, and more preferably less than the thickness of the first peeling film.

另外,第二剝離膜的厚度是指第二剝離膜整體的厚度。例如,由多個層構成的第二剝離膜的厚度是指構成第二剝離膜的所有層的合計厚度。 In addition, the thickness of the second peeling film refers to the thickness of the second peeling film as a whole. For example, the thickness of the second peeling film composed of multiple layers refers to the total thickness of all layers constituting the second peeling film.

保護膜形成用片20的製造方法如實施方案中所述,在與第一剝離膜12層疊的保護膜形成膜11的露出面上貼合第二剝離膜13即可。 The manufacturing method of the protective film forming sheet 20 is as described in the embodiment, and the second release film 13 is bonded to the exposed surface of the protective film forming film 11 stacked with the first release film 12.

在對保護膜形成用片20進行沖孔加工時,除了使沖模自第二剝離膜13側進入,並將保護膜形成膜11與第二剝離膜13切斷為規定的封閉形狀以外,與上述實施方案相同。結果在第一剝離膜12上得到經過沖孔加工的保護膜 形成膜16與第二剝離膜13。經過沖孔加工的保護膜形成用片20可被捲繞為卷狀進行保管、運輸。 When punching the protective film forming sheet 20, the punching die is inserted from the side of the second release film 13 and the protective film forming film 11 and the second release film 13 are cut into a predetermined closed shape, which is the same as the above-mentioned embodiment. As a result, the punched protective film forming film 16 and the second release film 13 are obtained on the first release film 12. The punched protective film forming sheet 20 can be rolled up for storage and transportation.

在廢料去除步驟中,同時捲繞第二剝離膜13與無用部分17而將第二剝離膜13與無用部分17去除。此時,經過沖孔加工的被完全切斷後的第二剝離膜13藉由使用長條狀的黏著膠帶再度接合,易於去除第二剝離膜13。結果切斷為規定的封閉形狀的保護膜形成膜16殘留在第一剝離膜12上。 In the waste material removal step, the second peeling film 13 and the useless portion 17 are wound up at the same time to remove the second peeling film 13 and the useless portion 17. At this time, the second peeling film 13 that has been completely cut by punching is rejoined by using a long adhesive tape, making it easy to remove the second peeling film 13. As a result, the protective film forming film 16 cut into a prescribed closed shape remains on the first peeling film 12.

以上,對本發明的實施方案進行了說明,但本發明不受上述實施方案的任何限定,可在本發明的範圍內以各種形態進行改變。 The above is an explanation of the implementation scheme of the present invention, but the present invention is not limited to the above implementation scheme and can be modified in various forms within the scope of the present invention.

[實施例] [Implementation example]

以下,利用實施例對發明進行進一步詳細說明,但本發明不受這些實施例限定。 The invention is further described in detail below using examples, but the invention is not limited to these examples.

(保護膜形成用片的製造) (Manufacturing of protective film forming sheet)

[第一剝離膜(重剝離膜)] [First peeling film (re-peeling film)]

<含有剝離劑層用組合物的塗佈劑> <Coating agent containing a peeling agent composition>

準備下述剝離劑層用組合物原料。 Prepare the following stripping agent composition raw materials.

.含有具備乙烯基的有機聚矽氧烷及具備氫矽烷基(hydrosilyl group)的有機聚矽氧烷的矽氧類脫模劑(Dow Corning Toray Co.,Ltd.製造,BY24-561,固體成分為30質量%) .Silicone-based mold release agent containing organopolysiloxane having a vinyl group and organopolysiloxane having a hydrosilyl group (manufactured by Dow Corning Toray Co., Ltd., BY24-561, solid content 30% by mass)

.二甲基聚矽氧烷(重量平均分子量:2000)(Shin-Etsu Chemical Co.,Ltd.製造,X-62-1387,固體成分為100質量%) .Dimethyl polysiloxane (weight average molecular weight: 2000) (manufactured by Shin-Etsu Chemical Co., Ltd., X-62-1387, solid content 100% by mass)

.作為重剝離添加劑的具備乙烯基的MQ樹脂(Dow Corning Toray Co.,Ltd.製造,SD-7292,固體成分為71質量%) . MQ resin with vinyl as a heavy-stripping additive (manufactured by Dow Corning Toray Co., Ltd., SD-7292, solid content 71% by mass)

.鉑(Pt)催化劑(Dow Corning Toray Co.,Ltd.製造,SRX-212,固體成分為100質量%) . Platinum (Pt) catalyst (manufactured by Dow Corning Toray Co., Ltd., SRX-212, solid content 100% by mass)

以表1中記載的摻合比(固體成分換算),在甲苯與甲基乙基酮的混合溶劑(甲苯/甲基乙基酮=1/1(質量比))中添加上述原料,將總固體成分調整為2質量%,製備含有剝離劑層用組合物的塗佈劑。 The above raw materials were added to a mixed solvent of toluene and methyl ethyl ketone (toluene/methyl ethyl ketone = 1/1 (mass ratio)) at the blending ratio (solid content conversion) listed in Table 1, and the total solid content was adjusted to 2 mass %, to prepare a coating agent containing a composition for a stripping agent layer.

<第一剝離膜的製造> <Manufacturing of the first peeling film>

在PET膜(Mitsubishi Chemical Corporation製造,商品名稱:DIAFOIL(註冊商標)T-100,厚度:50μm)上,以使乾燥後的膜厚為0.15μm的方式,塗佈含有剝離劑層用組合物的塗佈劑,並進行加熱、乾燥,從而在PET膜上形成剝離劑層,製造第一剝離膜(重剝離膜)A~C。 A coating agent containing a peeling agent layer composition was applied on a PET film (manufactured by Mitsubishi Chemical Corporation, trade name: DIAFOIL (registered trademark) T-100, thickness: 50 μm) so that the film thickness after drying was 0.15 μm, and the coating agent was heated and dried to form a peeling agent layer on the PET film, thereby manufacturing the first peeling film (re-peeling film) A~C.

<表面彈性模數的測定> <Determination of surface elastic modulus>

藉由以下方式測定所得到的第一剝離膜的剝離處理面的表面彈性模數。 The surface elastic modulus of the peeling-treated surface of the obtained first peeling film was measured in the following manner.

在原子力顯微鏡(BrukerCorporation製造,MultiMode8)上設置氮化矽素材的懸臂(BrukerCorporation製造,商品名稱:MLCT,前端半徑:20nm,共振頻率:125kHz,彈簧常數:0.6N/m)。將製造的第一剝離膜放置在原子力顯微鏡上,藉由設置的懸臂,以2nm的按壓量、10Hz的掃描速度,對製造的第一剝離膜的剝離劑層的表面進行按壓與拉離。該操作在23℃下進行。對透過該操作得到的力曲線進行基於JKR理論式的擬合,計算出表面彈性模數。對於表面彈性模數,在第一剝離膜的剝離劑層的表面1μm×1μm中測定4096個點,取這些值的平均值並將小數點後一位四捨五入,作為表面彈性模數(MPa)。將結果示於表1。 A cantilever made of silicon nitride material (manufactured by Bruker Corporation, trade name: MLCT, front radius: 20 nm, resonance frequency: 125 kHz, spring constant: 0.6 N/m) was set on an atomic force microscope (manufactured by Bruker Corporation, MultiMode 8). The first peeling film manufactured was placed on the atomic force microscope, and the surface of the peeling agent layer of the first peeling film manufactured was pressed and pulled by the cantilever with a pressure of 2 nm and a scanning speed of 10 Hz. This operation was performed at 23°C. The force curve obtained by this operation was fitted based on the JKR theoretical formula, and the surface elastic modulus was calculated. For the surface elastic modulus, 4096 points were measured in 1μm×1μm on the surface of the peeling agent layer of the first peeling film, and the average of these values was taken and rounded off to one decimal place to obtain the surface elastic modulus (MPa). The results are shown in Table 1.

Figure 110129617-A0305-12-0032-3
Figure 110129617-A0305-12-0032-3

[第二剝離膜(輕剝離膜)] [Second peeling film (light peeling film)]

使用Lintec Corporation製造的「SP-PET 381130(厚度為38μm)」。 "SP-PET 381130 (thickness 38μm)" manufactured by Lintec Corporation was used.

[含有保護膜形成膜用組合物的塗佈劑] [Coating agent containing a protective film-forming composition]

以表2所示的摻合比(固體成分換算)混合下述各成分,以使固體成分濃度為50質量%的方式用甲基乙基酮進行稀釋,製備塗佈劑。 The following components were mixed at the blending ratio (solid content conversion) shown in Table 2, and diluted with methyl ethyl ketone so that the solid content concentration was 50 mass % to prepare a coating agent.

(A)聚合物成分 (A) Polymer components

(A-1)由10質量份的丙烯酸正丁酯、70質量份的丙烯酸甲酯、5質量份的甲基丙烯酸縮水甘油酯及15質量份的丙烯酸2-羥基乙酯共聚而成的(甲基)丙烯酸酯共聚物(重量平均分子量:40萬,玻璃轉化溫度:-1℃) (A-1) (Meth)acrylate copolymer (weight average molecular weight: 400,000, glass transition temperature: -1°C) prepared by copolymerization of 10 parts by mass of n-butyl acrylate, 70 parts by mass of methyl acrylate, 5 parts by mass of glycidyl methacrylate and 15 parts by mass of 2-hydroxyethyl acrylate

(A-2)由10質量份的丙烯酸正丁酯、65質量份的丙烯酸甲酯、12質量份的甲基丙烯酸縮水甘油酯、及13質量份的丙烯酸2-羥基乙酯共聚而成的(甲基)丙烯酸酯共聚物(重量平均分子量:45萬,玻璃轉化溫度:2℃) (A-2) (Meth)acrylate copolymer obtained by copolymerizing 10 parts by mass of n-butyl acrylate, 65 parts by mass of methyl acrylate, 12 parts by mass of glycidyl methacrylate, and 13 parts by mass of 2-hydroxyethyl acrylate (weight average molecular weight: 450,000, glass transition temperature: 2°C)

(B)固化性成分(熱固性成分) (B) Curing component (thermosetting component)

(B-1)雙酚A型環氧樹脂(Mitsubishi Chemical Corporation製造,jER828,環氧當量為184~194g/eq) (B-1) Bisphenol A type epoxy resin (manufactured by Mitsubishi Chemical Corporation, jER828, epoxy equivalent 184~194g/eq)

(B-2)丙烯酸橡膠微粒分散雙酚A型液狀環氧樹脂(Nippon Shokubai Co.,Ltd.製造,BPA328,環氧當量為230g/eq,丙烯酸橡膠含量為20phr) (B-2) Bisphenol A type liquid epoxy resin dispersed with acrylic rubber particles (manufactured by Nippon Shokubai Co., Ltd., BPA328, epoxy equivalent 230g/eq, acrylic rubber content 20phr)

(B-3)二環戊二烯型環氧樹脂(DIC CORPORATION製造,EPICLON HP-7200HH,軟化點為88~98℃,環氧當量為255~260g/eq) (B-3) Dicyclopentadiene epoxy resin (manufactured by DIC CORPORATION, EPICLON HP-7200HH, softening point 88~98℃, epoxy equivalent 255~260g/eq)

(C)固化劑:二氰二胺(Mitsubishi Chemical Corporation製造,DICY7) (C) Curing agent: dicyandiamide (manufactured by Mitsubishi Chemical Corporation, DICY7)

(D)固化促進劑:2-苯基-4,5-二羥基甲基咪唑(SHIKOKU CHEMICALS CORPORATION製造,CUREZOL 2PHZ) (D) Curing accelerator: 2-phenyl-4,5-dihydroxymethylimidazole (manufactured by SHIKOKU CHEMICALS CORPORATION, CUREZOL 2PHZ)

(E)填充材料 (E) Filling materials

(E-1)環氧基修飾球狀二氧化矽填料(Admatechs公司製造,SC2050MA,平均粒徑為0.5μm) (E-1) Epoxy-modified spherical silica filler (manufactured by Admatechs, SC2050MA, average particle size 0.5μm)

(E-2)二氧化矽填料(Admatechs公司製造的「YC100C-MLA」,平均粒徑為0.1μm) (E-2) Silica filler ("YC100C-MLA" manufactured by Admatechs, average particle size 0.1μm)

(F)矽烷偶合劑:γ-縮水甘油醚氧基丙基三甲氧基矽烷(Shin-Etsu Chemical Co.,Ltd.製造,KBM403,甲氧基當量為12.7mmol/g,分子量為236.3) (F) Silane coupling agent: γ-glycidyloxypropyltrimethoxysilane (manufactured by Shin-Etsu Chemical Co., Ltd., KBM403, methoxy equivalent 12.7 mmol/g, molecular weight 236.3)

(G)著色劑:碳黑(Mitsubishi Chemical Corporation製造,MA600B,平均粒徑為28nm) (G) Colorant: Carbon black (manufactured by Mitsubishi Chemical Corporation, MA600B, average particle size 28nm)

Figure 110129617-A0305-12-0034-4
Figure 110129617-A0305-12-0034-4

將製備的保護膜形成膜用組合物塗佈在所述第一剝離膜(上述A~C中的任意一種)的剝離處理面上,於100℃乾燥2分鐘,形成厚度為20μm的保護膜形成膜。然後,將第二剝離膜貼附在保護膜形成膜上,得到在保護膜形成膜的兩面形成有剝離膜的三層結構的保護膜形成用片。作為貼附條件,溫度為60℃,壓力為0.4MPa,速度為1m/分鐘。然後,將保護膜形成用片裁切為208mm的寬度,並捲繞50米的長度,形成卷體。 The prepared protective film-forming film composition is applied to the peeling treatment surface of the first release film (any one of A to C above), and dried at 100°C for 2 minutes to form a protective film-forming film with a thickness of 20 μm. Then, the second release film is attached to the protective film-forming film to obtain a three-layer structure of a protective film-forming sheet with release films formed on both sides of the protective film-forming film. As the attachment conditions, the temperature is 60°C, the pressure is 0.4 MPa, and the speed is 1 m/min. Then, the protective film-forming sheet is cut into a width of 208 mm and rolled into a length of 50 meters to form a roll.

使用所得到的保護膜形成用片,進行下述測定及評價。 The obtained protective film forming sheet was used to perform the following measurements and evaluations.

[保護膜形成膜彼此的附著力] [Adhesion between protective film forming films]

藉由以下方式使保護膜形成膜從保護膜形成用片中露出,並將保護膜形成膜彼此貼附,測定附著力。 The protective film-forming film is exposed from the protective film-forming sheet in the following manner, and the protective film-forming films are attached to each other to measure the adhesion.

<將保護膜形成膜固定在黏著膠帶上> <Fix the protective film forming film on the adhesive tape>

I.將第二剝離膜/保護膜形成膜/第一剝離膜的三層結構的保護膜形成用片的、第二剝離膜剝下。 I. Peel off the second peeling film from the protective film forming sheet having a three-layer structure of second peeling film/protective film forming film/first peeling film.

II.於23℃,在露出的保護膜形成膜上貼附Lintec Corporation製造的黏著膠帶(產品名稱PET50PL Shin:丙烯酸類黏著劑層/50μm PET基材),製成「PET基材/丙烯酸類黏著劑層/保護膜形成膜/第一剝離膜」的層疊體樣本。 II. At 23°C, an adhesive tape manufactured by Lintec Corporation (product name PET50PL Shin: acrylic adhesive layer/50μm PET substrate) was attached to the exposed protective film-forming film to prepare a laminated sample of "PET substrate/acrylic adhesive layer/protective film-forming film/first peeling film".

III.將層疊體樣本切割成寬25mm、長250mm的條狀。 III. Cut the laminated samples into strips with a width of 25 mm and a length of 250 mm.

<將保護膜形成膜固定在SUS板上> <Fixing the protective film forming film on the SUS plate>

I.在SUS板(0.5mm厚×70mm×150mm)的整個面上貼附將PET膜作為芯材的雙面膠帶。 I. Attach a double-sided tape with a PET film as the core material to the entire surface of a SUS plate (0.5mm thick × 70mm × 150mm).

II.將第二剝離膜/保護膜形成膜/第一剝離膜的三層結構的保護膜形成用片的、第二剝離膜剝下。 II. Peel off the second peeling film from the protective film forming sheet having a three-layer structure of second peeling film/protective film forming film/first peeling film.

III.將露出的保護膜形成膜貼附在上述雙面膠帶的黏著劑面的整個面上,得到「SUS板/雙面膠帶/保護膜形成膜/第一剝離膜」的層疊體樣本。 III. The exposed protective film-forming film is attached to the entire adhesive surface of the above-mentioned double-sided tape to obtain a laminated sample of "SUS plate/double-sided tape/protective film-forming film/first release film".

IV.剝下第一剝離膜,使保護膜形成膜露出。 IV. Peel off the first peeling film to expose the protective film forming film.

<附著力的測定> <Measurement of adhesion>

從「PET基材/丙烯酸類黏著劑層/保護膜形成膜/第一剝離膜」的層疊體樣本中剝下第一剝離膜,使保護膜形成膜露出。將「PET基材/丙烯酸類黏著劑層/保護膜形成膜」的層疊體與「SUS板/雙面膠帶/保護膜形成膜」的層疊體,以保護膜形成膜彼此相對的方式進行層疊,利用2kg的輥,於23℃下進行貼合。 The first release film was peeled off from the laminated body sample of "PET substrate/acrylic adhesive layer/protective film forming film/first release film" to expose the protective film forming film. The laminated body of "PET substrate/acrylic adhesive layer/protective film forming film" and the laminated body of "SUS plate/double-sided tape/protective film forming film" were laminated with the protective film forming films facing each other, and were bonded at 23°C using a 2kg roller.

在不加溫的狀態下進行靜置,在貼附後經過2分鐘(±20秒)之後,通過下述測定方法測定附著力。 Leave the sample to stand without heating, and measure the adhesion 2 minutes (±20 seconds) after attachment using the following measurement method.

使用萬能型拉伸試驗機(Shimadzu Corporation製造,產品名稱「AUTOGRAPH AG-IS」),針對70mm的測定距離,以300mm/分鐘的剝離速度、23℃的溫度、180°的剝離角度,測定剝離力。將去除了測定距離的最初10mm與最後10mm的、50mm之間的測定值的平均作為「保護膜形成膜彼此的附著力」。 The peeling force was measured using a universal tensile tester (manufactured by Shimadzu Corporation, product name "AUTOGRAPH AG-IS") at a measuring distance of 70 mm, a peeling speed of 300 mm/min, a temperature of 23°C, and a peeling angle of 180°. The average of the measured values between the first 10 mm and the last 10 mm of the measuring distance and 50 mm was taken as the "adhesion force between the protective film-forming films".

[從保護膜形成膜上剝離第一剝離膜時的剝離力F1] [Peeling force F1 when peeling the first peeling film from the protective film forming film]

從得到的保護膜形成用片中剝離第二剝離膜。藉由熱層壓(70℃、1m/分鐘),在藉由剝離而露出的保護膜形成膜的表面貼附厚度為25μm的良黏合PET(TOYOBO Co.,Ltd.製造,PET25A-4100)的良黏合面,製成層疊體樣本。將層疊體樣本切成100mm的寬度,製成測定用樣本。使用雙面膠帶將測定用樣本的第一剝離膜的背面固定在硬質支撐板上。 The second peeling film was peeled off from the obtained protective film forming sheet. The good adhesive surface of 25 μm thick good adhesive PET (manufactured by TOYOBO Co., Ltd., PET25A-4100) was attached to the surface of the protective film forming film exposed by peeling by hot lamination pressing (70°C, 1 m/min) to prepare a laminate sample. The laminate sample was cut into 100 mm width to prepare a measurement sample. The back of the first peeling film of the measurement sample was fixed to a hard support plate using double-sided tape.

使用萬能型拉伸試驗機(Shimadzu Corporation製造,產品名稱「AUTOGRAPH(註冊商標)AG-IS」),以180°的剝離角度、1m/分鐘的剝離速度,從第一剝離膜上剝離保護膜形成膜/良黏合PET的複合(一體型)體,並測定此時的荷重。測定距離總計100mm,將去除了最初10mm與最後10mm的、80mm之間的測定值的平均作為剝離力F1。將結果示於表2。 Using a universal tensile tester (manufactured by Shimadzu Corporation, product name "AUTOGRAPH (registered trademark) AG-IS"), the protective film forming film/well-adhesive PET composite (integrated) body was peeled off from the first peeling film at a peeling angle of 180° and a peeling speed of 1m/min, and the load at this time was measured. The total measured distance was 100mm, and the average of the measured values between the first 10mm and the last 10mm removed and 80mm was taken as the peeling force F1. The results are shown in Table 2.

[從保護膜形成膜上剝離第二剝離膜時的剝離力F2] [Peeling force F2 when peeling the second peeling film from the protective film forming film]

將得到的保護膜形成用片切成100mm的寬度,製成測定用樣本。使用雙面膠帶將測定用樣本的第一剝離膜的背面固定在硬質支撐板上。 The obtained protective film forming sheet was cut into 100 mm width to prepare a sample for measurement. The back side of the first release film of the sample for measurement was fixed to a hard support plate using double-sided tape.

使用萬能型拉伸試驗機(Shimadzu Corporation製造,產品名稱「AUTOGRAPH(註冊商標)AG-IS」),從測定用樣本中剝離第二剝離膜,以與測定上述F1時相同的條件,測定此時的荷重,作為剝離力F2。 Using a universal tensile testing machine (manufactured by Shimadzu Corporation, product name "AUTOGRAPH (registered trademark) AG-IS"), the second peeling film is peeled off from the test sample, and the load at this time is measured under the same conditions as when measuring F1 above, and is taken as the peeling force F2.

對得到的剝離力F1及F2進行比較,對於所有試樣,確認到F1大於F2。 The obtained peeling forces F1 and F2 were compared, and it was confirmed that F1 was greater than F2 for all samples.

[保護膜形成用片的沖孔加工及廢料去除] [Punching of protective film forming sheets and removal of waste materials]

以200mm晶圓用的規格使用Lintec Corporation製造的RAD-3600F/12,使沖模自保護膜形成用片的第二剝離膜側進入,將保護膜形成膜與第二剝離膜沖裁為圓形(內徑為198mm)。此時,對於第一剝離膜,以不完全沖裁的方式切出切口(沖孔加工步驟)。使用切割刀的刀刃寬度不同的四種沖模,進行切口寬度不同的半切。進行40次沖孔加工。 Using RAD-3600F/12 manufactured by Lintec Corporation with specifications for 200mm wafers, the punch was inserted from the second release film side of the protective film forming sheet to punch the protective film forming film and the second release film into a circular shape (inner diameter of 198mm). At this time, the first release film was cut in an incompletely punched manner (punching process step). Four types of punches with different blade widths of the dicing knife were used to perform half cuts with different cut widths. Punching was performed 40 times.

在沖孔加工步驟後,使保護膜形成用片在多個輥之間移動。然後,將沖裁為圓形的部分殘留在第一剝離膜上,並去除第二剝離膜及沖裁為圓形的部分的周邊無用部分(廢料去除步驟)。此時,利用長條的黏著膠帶將經過沖孔加工的完全被切斷後的第二剝離膜再度接合,在此基礎上去除第二剝離膜。 After the punching process, the protective film forming sheet is moved between multiple rollers. Then, the circular punched portion is left on the first release film, and the second release film and the useless portion around the circular punched portion are removed (waste removal step). At this time, the second release film that has been completely cut after the punching process is rejoined using a long adhesive tape, and the second release film is removed on this basis.

<切口寬度> <Incision width>

以第一剝離膜的切口部不變形的方式沿厚度方向切斷廢料去除步驟後的保護膜形成用片,使保護膜形成用片保持平坦,使用掃描型電子顯微鏡(SEM,KEYENCE CORPORATION製造的「VE-9800」)觀察剖面。測定第一剝離膜與保護膜形成膜的界面上的殘留在第一剝離膜上的切口的寬度。 The protective film forming sheet after the waste material removal step was cut in the thickness direction in a manner that the cut portion of the first release film was not deformed, and the protective film forming sheet was kept flat, and the cross section was observed using a scanning electron microscope (SEM, "VE-9800" manufactured by KEYENCE CORPORATION). The width of the cut remaining on the first release film at the interface between the first release film and the protective film forming film was measured.

從所具有的40個圓形部分中選擇第20個,在該一個圓的圓周上以等間隔在6個點(若將點連接則為正六角形)進行測定。將6個點中的最小值作為「切口寬度」。並將小數點後一位四捨五入。 Select the 20th one from the 40 circular parts, and measure it at 6 points (a regular hexagon if the points are connected) at equal intervals on the circumference of the circle. The minimum value among the 6 points is taken as the "cut width". And round off to one decimal place.

切口寬度越寬,則保護膜形成膜彼此不附著,越能夠順利地進行廢料去除。 The wider the incision width, the less the protective film formation films adhere to each other, and the smoother the waste removal can be performed.

<廢料去除性的評價> <Evaluation of waste removal performance>

在廢料去除步驟時,對所具有的40個圓形部分中,圓形部分的保護膜形成膜隨著無用部分一起浮起的片數進行計數。浮起的片數越少,則表示保護膜形成膜彼此不附著,越能夠順利進行廢料去除。 In the waste removal step, the number of pieces of the protective film forming film of the circular part that float up along with the useless parts among the 40 circular parts is counted. The fewer the number of floating pieces, the more smoothly the waste removal can be performed because the protective film forming films are not attached to each other.

將以上的結果匯總於表3。 The above results are summarized in Table 3.

Figure 110129617-A0305-12-0038-5
Figure 110129617-A0305-12-0038-5

由表3可確認到,若保護膜形成膜彼此的附著力為19N以下,則在沖孔加工步驟後,保護膜形成膜彼此不附著,能夠順利進行廢料去除。此外可知,如實施例7所示,若切口寬度變窄,則有沖孔加工步驟後保護膜形成膜彼此附著而無法順利進行廢料去除的傾向。 It can be confirmed from Table 3 that if the adhesion between the protective film forming films is less than 19N, the protective film forming films will not adhere to each other after the punching process, and waste removal can be performed smoothly. In addition, it can be seen that as shown in Example 7, if the incision width becomes narrower, there is a tendency that the protective film forming films will adhere to each other after the punching process and waste removal cannot be performed smoothly.

[產業利用性] [Industrial Utilization]

如上所述,根據本發明,可提供一種即使在沖孔加工時的切口寬度較窄的情況下也能夠充分抑制廢料去除的不良的保護膜形成用片及其製造方法。 As described above, according to the present invention, a protective film forming sheet and a method for manufacturing the same can be provided, which can sufficiently suppress the defect of waste material removal even when the cut width is narrow during punching.

10:保護膜形成用片 10: Sheet for forming protective film

11:保護膜形成膜 11: Protective film forming film

12:第一剝離膜 12: First peeling membrane

Claims (9)

一種保護膜形成用片,其為長條片,並具有固化性的保護膜形成膜和設置在所述保護膜形成膜的一個面上的第一剝離膜,其中, 於23℃用2kgf的荷重將兩片保護膜形成膜貼附2分鐘後的附著力為19N/25mm以下。 A protective film forming sheet, which is a long sheet and has a curable protective film forming film and a first release film provided on one surface of the protective film forming film, wherein the adhesion after two protective film forming films are attached at 23°C with a load of 2kgf for 2 minutes is 19N/25mm or less. 一種保護膜形成用片,其為長條片,並具有單層的保護膜形成膜和設置在所述保護膜形成膜的一個面上的第一剝離膜,其中, 所述保護膜形成膜以可剝離的方式層疊在所述第一剝離膜上, 於23℃用2kgf的荷重將兩片保護膜形成膜貼附2分鐘後的附著力為19N/25mm以下。 A protective film forming sheet, which is a long sheet and has a single-layer protective film forming film and a first peeling film provided on one surface of the protective film forming film, wherein, the protective film forming film is laminated on the first peeling film in a peelable manner, and the adhesion of two protective film forming films after being attached for 2 minutes at 23°C with a load of 2kgf is less than 19N/25mm. 一種保護膜形成用片,其為長條片,並具有第一剝離膜、第二剝離膜、所述第一剝離膜及所述第二剝離膜之間所夾持的保護膜形成膜,其中, 於23℃用2kgf的荷重將兩片保護膜形成膜貼附2分鐘後的附著力為19N/25mm以下。 A protective film forming sheet, which is a long strip and has a first peeling film, a second peeling film, and a protective film forming film sandwiched between the first peeling film and the second peeling film, wherein the adhesion of the two protective film forming films after being attached for 2 minutes at 23°C with a load of 2kgf is less than 19N/25mm. 一種保護膜形成用片,其為長條片,並具有含有填充材料的保護膜形成膜和設置在所述保護膜形成膜的一個面上的第一剝離膜,其中, 於23℃用2kgf的荷重將兩片保護膜形成膜貼附2分鐘後的附著力為19N/25mm以下。 A protective film forming sheet, which is a long sheet and has a protective film forming film containing a filler and a first release film provided on one surface of the protective film forming film, wherein the adhesion after two protective film forming films are attached at 23°C with a load of 2kgf for 2 minutes is 19N/25mm or less. 如請求項1~4中任一項所述的保護膜形成用片,其中,所述第一剝離膜的與保護膜形成膜相接的面的表面彈性模數為17MPa以下。The protective film forming sheet according to any one of claims 1 to 4, wherein the surface elastic modulus of the first release film in contact with the protective film forming film is 17 MPa or less. 如請求項1~4中任一項所述的保護膜形成用片,其中, 在所述保護膜形成用片上,以在俯視所述保護膜形成用片時,保護膜形成用片的一部分具有規定的封閉形狀的方式形成有切口, 所述切口在所述保護膜形成用片的厚度方向貫穿所述保護膜形成膜並到達至所述第一剝離膜的一部分。 A protective film forming sheet as described in any one of claims 1 to 4, wherein, a cut is formed on the protective film forming sheet in such a manner that a portion of the protective film forming sheet has a predetermined closed shape when the protective film forming sheet is viewed from above, the cut penetrates the protective film forming film in the thickness direction of the protective film forming sheet and reaches a portion of the first release film. 如請求項6所述的保護膜形成用片,其中,所述保護膜形成膜與所述第一剝離膜的界面上的所述切口的寬度為8μm以上。The protective film-forming sheet according to claim 6, wherein a width of the cut at the interface between the protective film-forming film and the first release film is 8 μm or more. 一種經過沖孔加工的保護膜形成用片的製造方法,其具有以使請求項1~4中任一項所述的保護膜形成用片的一部分具有規定的封閉形狀的方式形成切口的步驟, 所述切口在所述保護膜形成用片的厚度方向貫穿所述保護膜形成膜並到達至所述第一剝離膜的一部分。 A method for manufacturing a punched protective film forming sheet, comprising the step of forming a cut in a manner such that a portion of the protective film forming sheet described in any one of claims 1 to 4 has a predetermined closed shape, wherein the cut penetrates the protective film forming film in the thickness direction of the protective film forming sheet and reaches a portion of the first release film. 如請求項8所述的經過沖孔加工的保護膜形成用片的製造方法,其中,所述保護膜形成膜與所述第一剝離膜的界面上的所述切口的寬度為8μm以上。The method for producing a punched protective film-forming sheet according to claim 8, wherein a width of the cut at the interface between the protective film-forming film and the first release film is 8 μm or more.
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