TWI888242B - Electrode device - Google Patents
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- TWI888242B TWI888242B TW113128898A TW113128898A TWI888242B TW I888242 B TWI888242 B TW I888242B TW 113128898 A TW113128898 A TW 113128898A TW 113128898 A TW113128898 A TW 113128898A TW I888242 B TWI888242 B TW I888242B
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Abstract
一種電極裝置,包含一電極板,以及數陶瓷管組。該電極板包括彼此相反的一第一板面與一第二板面,以及數個由該第一板面延伸至該第二板面的貫孔。每一該陶瓷管組包括一個塞裝於各別的一個該貫孔中的陶瓷管件,以及一個連接該陶瓷管件的陶瓷塊體。每一該陶瓷塊體的一最大塊體寬度大於各別的一個該陶瓷管件的一最大管體寬度。由於每一該陶瓷塊體的寬度較大而具有可額外連接該電極板的該第一板面的部位,從而可透過提供較大的遮蔽部位與接觸部位來提升對該電極板的防護性以及與該電極板結合的結合強度。An electrode device includes an electrode plate and several ceramic tube groups. The electrode plate includes a first plate surface and a second plate surface opposite to each other, and several through holes extending from the first plate surface to the second plate surface. Each of the ceramic tube groups includes a ceramic tube plugged in a respective one of the through holes, and a ceramic block connected to the ceramic tube. A maximum block width of each of the ceramic blocks is greater than a maximum tube width of a respective one of the ceramic tubes. Since each of the ceramic blocks has a larger width and has a portion that can be additionally connected to the first plate surface of the electrode plate, the protection of the electrode plate and the bonding strength with the electrode plate can be improved by providing a larger shielding portion and a contact portion.
Description
本發明是有關於一種乾蝕刻設備,特別是指一種乾蝕刻設備的電極裝置。The present invention relates to a dry etching device, and in particular to an electrode device of the dry etching device.
參閱圖1、2,一種現有的乾蝕刻設備的電極裝置,適用於作為下電極使用。該電極裝置包括一塊電極板11,以及數個塞裝在該電極板11中的陶瓷管12。1 and 2 , an electrode device of a conventional dry etching apparatus is suitable for use as a lower electrode. The electrode device comprises an
該電極板11包括彼此相反的一第一板面111與一第二板面112,以及數個分別界定出數貫孔113的孔圍面114。The
該第一板面111形成有一個往該第二板面112凹的氣體流道115。The
每一該貫孔113延伸於該第一板面111與該第二板面112間而上下貫通。每一貫孔113的其中一端連通該氣體流道115。Each through
該等陶瓷管12分別塞裝在該等貫孔113中,並黏附該等孔圍面114。每一該陶瓷管12呈直管狀,且各部位的內外管徑相等。The
此種現有的電極裝置的特點在於設置有可保護該等孔圍面114的該等陶瓷管12,可防止該等孔圍面114產生電弧放電(Arcing)的現象,但效果仍不夠好。The feature of the existing electrode device is that the
本發明的目的在於:改善先前技術的至少一個缺點。The purpose of the present invention is to improve at least one disadvantage of the prior art.
本發明電極裝置,包含一電極板,以及數陶瓷管組。該電極板包括彼此相反的一第一板面與一第二板面,以及數個由該第一板面延伸至該第二板面的貫孔。每一該陶瓷管組包括一個塞裝於各別的一個該貫孔中的陶瓷管件,以及一個連接該陶瓷管件的陶瓷塊體。每一該陶瓷塊體的一最大塊體寬度大於各別的一個該陶瓷管件的一最大管體寬度。The electrode device of the present invention comprises an electrode plate and a plurality of ceramic tube groups. The electrode plate comprises a first plate surface and a second plate surface opposite to each other, and a plurality of through holes extending from the first plate surface to the second plate surface. Each of the ceramic tube groups comprises a ceramic tube plugged in a respective one of the through holes, and a ceramic block connected to the ceramic tube. A maximum block width of each of the ceramic blocks is greater than a maximum tube width of a respective one of the ceramic tubes.
本發明的功效在於:由於該陶瓷塊體的該最大塊體寬度大於該陶瓷管件的該最大管體寬度,因此該陶瓷塊體具有可額外覆蓋與接觸該第一板面的部位,從而可透過提供較大的遮蔽部位與接觸部位來提高防護性與結合強度,同時更好地防止電弧現象的發生。The effect of the present invention is that: since the maximum block width of the ceramic block is greater than the maximum tube width of the ceramic tube, the ceramic block has a portion that can additionally cover and contact the first plate surface, thereby improving the protection and bonding strength by providing a larger shielding portion and a contact portion, and at the same time better preventing the occurrence of arcing.
在以下的說明內容中,類似或相同的元件將以相同的編號來表示。In the following description, similar or identical components will be denoted by the same reference numerals.
參閱圖3,本發明電極裝置的一個實施例,可以是一上電極或一下電極。在本實施例中該電極裝置為一下電極。該電極裝置包含一塊電極板2,以及數個塞裝於該電極板2中的陶瓷管組3。Referring to FIG. 3 , an embodiment of the electrode device of the present invention can be an upper electrode or a lower electrode. In this embodiment, the electrode device is a lower electrode. The electrode device comprises an
參閱圖4、5、6,該電極板2包括彼此相反的一位於下方的第一板面21與一位於上方的第二板面22,以及數個分別界定出數貫孔23的孔圍面24。4 , 5 , and 6 , the
該電極板2的該第一板面21形成有一個由下往上朝該第二表面52凹的氣體流道25。該氣體流道25包括數個彼此間隔且分別連通該等貫孔23的容納槽部251,以及數個連通該等容納槽部251且筆直延伸的連接槽部252。The
每一該容納槽部251呈圓槽狀,並由該第一板面21的一個圓槽面部253與一個環槽面部254相配合界定而成。每一該圓槽面部253水平橫向延伸且概呈圓環狀。每一該環槽面部254直立延伸且概呈圓環狀。Each of the
每一該貫孔23由該第一板面21的該圓槽面部253往上延伸至該第二板面22,而上下貫通該電極板2的本體。每一該貫孔23為孔徑一致的一圓柱孔。Each through
每一該陶瓷管組3包括一個塞裝於該各別的一個該貫孔23中的陶瓷管件4,以及一個連接該陶瓷管件4並塞裝於各別的一個該容納槽部251中的陶瓷塊體5。Each of the
每一該陶瓷管件4主要呈圓管狀,並包括一個插設在陶瓷塊體5中的管體部41,以及一個連接該管體部41其中一端的突環部42。Each of the
每一該管體部41包括一外管面411與一內管面412。每一該外管面411黏著於各別的一個該孔圍面24上,並黏著於各別的一個該陶瓷塊體5上。每一該內管面412界定出一連通該氣體流道25的一第一管道413,以及一個相反於該第一管道413的第二管道414。該第一管道413的一第一管徑D1大於該第二管道414的一第二管徑D2。Each of the
每一該突環部42呈圓環狀(見圖4),且每一該突環部42的一環寬W11大於各別的一個該管體部41的一管寬W12。因此,每一該陶瓷管件4藉由額外往外延伸的該突環部42而可黏著於該陶瓷塊體5上。在本第一實施例中,由於該突環部42呈圓環狀,因此每一該陶瓷管件4整體的一最大管體寬度W21即為該環寬W11。Each of the protruding
每一該陶瓷塊體5呈圓環狀,並設置在該氣體流道25各別的一個該容納槽部251中。雖然每一該陶瓷塊體5因為呈圓環狀而具有等方向性並利於安裝,但在本發明的其他實施態樣中,每一該陶瓷塊體5也可以是其他環狀,例如方環狀或六角環狀。每一該陶瓷塊體5定義出一最大塊體寬度W22,且每一該陶瓷塊體5的該最大塊體寬度W22大於各別的一個該陶瓷管件4的該最大管體寬度W21。Each of the
每一該陶瓷塊體5包括一連接該電極板2的該第一板面21的第一表面51、一相反於該第一表面51的第二表面52,以及內外間隔地連接於該第一表面51與該第二表面52間的一內表面53與一外表面54。Each of the
每一該第一表面51黏著於該第一板面21各別的一個該圓槽面部253上。每一該第二表面52形成有一個或數個可供流體流動的流動槽511(見圖4)。該等流動槽511用以連通該等連接槽部252。每一該內表面53界定出一供各別的一個該陶瓷管件4的該管體部41插設的插孔531,且每一該內表面53黏著於該陶瓷管件4的該外管面411。每一該外表面54黏著於該第一板面21各別的一個該環槽面部254上。Each of the
在本第一實施例中,由於每一該陶瓷塊體5的該最大塊體寬度W22大於各別的一個該陶瓷管件4的該最大管體寬度W21,因此相較於單純僅塞裝所述陶瓷管件4來說,塞裝每一該陶瓷管組3能額外多出每一該陶瓷塊體5的該第一表面51覆蓋/接觸該第一板面21的各別的一個該圓槽面部253的部分,並增加每一該陶瓷塊體5的該外表面54覆蓋/接觸該第一板面21各別的一個該環槽面部254的部分。如此一來,由於該電極板2受到遮蔽保護的部分,以及用來黏著接觸的部分增加了,故該電極板2可以受到更充分的保護,且該等陶瓷管組3與該電極板2黏接的結合強度也會跟著提升。同時由於該電極板2被遮蔽的面積增加,也可以更好地防止電弧現象的發生。In the first embodiment, since the maximum block width W22 of each
參閱圖7、8、9,本發明電極裝置的一個第二實施例與該第一實施例類似,不同的地方在於該第二實施例的每一該陶瓷管件4省略了該突環部42(見圖4),並一體連接各別的一個該陶瓷塊體5。具體來說,每一該陶瓷管件4的該管體部41一體連接各別的一個該陶瓷塊體5的該第一表面51。另外,由於每一該陶瓷管件4省略了該突環部42,因此每一該陶瓷管件4的該最大管體寬度W21即為該管體部41的管寬W12。Referring to Figs. 7, 8, and 9, a second embodiment of the electrode device of the present invention is similar to the first embodiment, except that each of the
由於本第二實施例的每一該陶瓷塊體5的該最大塊體寬度W22同樣大於各別的一個該陶瓷管件4的該最大管體寬度W21,因此本第二實施例同樣可以透過該陶瓷塊體5的該第一表面51與該外表面54帶來與該電極板2的該第一板面21的該圓槽面部253及該環槽面部254接觸的額外接觸面積,故本第二實施例同樣具有對該電極板2有較佳的防護效果及該等陶瓷管組3與該電極板2結合性較佳的功效。Since the maximum block width W22 of each of the
綜上所述,本發明電極裝置的功效在於:由於該陶瓷塊體5的該最大塊體寬度W22大於該陶瓷管件4的該最大管體寬度W21,因此該陶瓷塊體5具有可額外連接該第一板面21的部位,從而可透過提供較大的遮蔽部位與接觸部位來提升對該電極板2的防護性,並提高與該電極板2結合的結合強度,也更好地防止了電弧現象的發生。In summary, the electrode device of the present invention has the following effect: since the maximum block width W22 of the
以上所述者,僅為本發明的實施例而已,不能以此限定本發明的申請專利範圍,且依本發明申請專利範圍及專利說明書簡單等效變化與修飾之態樣,亦應為本發明申請專利範圍所涵蓋。The above is only an embodiment of the present invention, and cannot be used to limit the scope of the patent application of the present invention. In addition, simple equivalent changes and modifications according to the scope of the patent application of the present invention and the patent specification should also be covered by the scope of the patent application of the present invention.
2:電極板 21:第一板面 25:氣體流道 251:容納槽部 252:連接槽部 253:圓槽面部 254:環槽面部 22:第二板面 23:貫孔 24:孔圍面 3:陶瓷管組 4:陶瓷管件 41:管體部 411:外管面 412:內管面 413:第一管道 414:第二管道 42:突環部 5:陶瓷塊體 51:第一表面 511:流動槽 52:第二表面 53:內表面 531:插孔 54:外表面 D1:第一管徑 D2:第二管徑 W11:環寬 W12:管寬 W21:最大管體寬度 W22:最大塊體寬度2: Electrode plate 21: First plate surface 25: Gas flow channel 251: Accommodation groove 252: Connection groove 253: Circular groove surface 254: Ring groove surface 22: Second plate surface 23: Through hole 24: Hole surface 3: Ceramic tube assembly 4: Ceramic tube fitting 41: Tube body 411: Outer tube surface 412: Inner tube surface 413: First pipe 414: Second pipe 42: Protruding ring 5: Ceramic block 51: First surface 511: Flow groove 52: Second surface 53: Inner surface 531: Socket 54: Outer surface D1: First pipe diameter D2: Second pipe diameter W11: Ring width W12: tube width W21: maximum tube width W22: maximum block width
本發明其他的特徵及功效,將於參照圖式的實施方式中清楚地呈現,其中: 圖1是一個不完整的立體圖,說明一個現有的電極裝置; 圖2是一個不完整的剖視圖,說明該電極裝置使用一段時間後的狀態; 圖3是一個不完整的立體圖,說明本發明電極裝置的一個第一實施例; 圖4是一個不完整且部分分解的立體分解圖,說明一電極板與數陶瓷管組的結合關係,並說明每一該陶瓷管組的一陶瓷管件與一陶瓷塊體的結合關係; 圖5是一個不完整的剖視圖,沿著一氣體流道的延伸方向剖切,說明該等陶瓷管組設置在該電極板中的狀態; 圖6是一個不完整的剖視圖,沿著垂直該氣體流道的延伸方向剖切; 圖7是一個不完整且部分分解的立體分解圖,說明本發明電極裝置的一個第二實施例; 圖8是一個不完整的剖視圖,沿著該氣體流道的延伸方向剖切,;及 圖9是一個不完整的剖視圖,沿著垂直該氣體流道的延伸方向剖切。 Other features and effects of the present invention will be clearly presented in the implementation method with reference to the drawings, in which: FIG. 1 is an incomplete three-dimensional diagram illustrating an existing electrode device; FIG. 2 is an incomplete cross-sectional diagram illustrating the state of the electrode device after being used for a period of time; FIG. 3 is an incomplete three-dimensional diagram illustrating a first embodiment of the electrode device of the present invention; FIG. 4 is an incomplete and partially decomposed three-dimensional exploded diagram illustrating the combination relationship between an electrode plate and several ceramic tube groups, and illustrating the combination relationship between a ceramic tube of each ceramic tube group and a ceramic block; FIG. 5 is an incomplete cross-sectional diagram, cut along the extension direction of a gas flow channel, illustrating the state of the ceramic tube groups arranged in the electrode plate; FIG. 6 is an incomplete cross-sectional view cut along the direction perpendicular to the extension of the gas flow channel; FIG. 7 is an incomplete and partially decomposed three-dimensional exploded view illustrating a second embodiment of the electrode device of the present invention; FIG. 8 is an incomplete cross-sectional view cut along the direction perpendicular to the extension of the gas flow channel; and FIG. 9 is an incomplete cross-sectional view cut along the direction perpendicular to the extension of the gas flow channel.
2:電極板 2: Electrode plate
21:第一板面 21: First board
251:容納槽部 251: Storage tank
253:圓槽面部 253: Round groove face
254:環槽面部 254: Groove face
22:第二板面 22: Second board
23:貫孔 23: Through hole
24:孔圍面 24: Hole circumference
3:陶瓷管組 3: Ceramic tube assembly
4:陶瓷管件 4: Ceramic pipe fittings
41:管體部 41: Tube body
411:外管面 411: Outer tube surface
412:內管面 412: Inner tube surface
413:第一管道 413: First pipeline
414:第二管道 414: Second pipeline
42:突環部 42:Protruding ring part
5:陶瓷塊體 5: Ceramic block
51:第一表面 51: First surface
511:流動槽 511: Flow trough
52:第二表面 52: Second surface
53:內表面 53: Inner surface
531:插孔 531: Socket
54:外表面 54: External surface
D1:第一管徑 D1: First diameter
D2:第二管徑 D2: Second diameter
W11:環寬 W11: Ring Wide
W12:管寬 W12: Pipe width
W21:最大管體寬度 W21: Maximum tube width
W22:最大塊體寬度 W22: Maximum block width
Claims (8)
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| TW113128898A TWI888242B (en) | 2024-08-02 | 2024-08-02 | Electrode device |
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| TW113128898A TWI888242B (en) | 2024-08-02 | 2024-08-02 | Electrode device |
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Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20110162799A1 (en) * | 2009-12-28 | 2011-07-07 | Tokyo Electron Limited | Plasma processing apparatus and electrode used therein |
| CN209708939U (en) * | 2019-06-25 | 2019-11-29 | 重庆臻宝实业有限公司 | Upper electrode is used in etching |
| CN110965048A (en) * | 2019-12-04 | 2020-04-07 | 江苏菲沃泰纳米科技有限公司 | Coating equipment and electrode device and application thereof |
| TW202122644A (en) * | 2019-12-04 | 2021-06-16 | 大陸商江蘇菲沃泰納米科技股份有限公司 | Coating equipment, electrode device thereof and application thereof |
| TW202141616A (en) * | 2020-04-22 | 2021-11-01 | 周業投資股份有限公司 | Upper electrode device preventing plasma and corrosive gas from entering via the boundary areas and eroding the electrode plate |
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- 2024-08-02 TW TW113128898A patent/TWI888242B/en active
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20110162799A1 (en) * | 2009-12-28 | 2011-07-07 | Tokyo Electron Limited | Plasma processing apparatus and electrode used therein |
| CN209708939U (en) * | 2019-06-25 | 2019-11-29 | 重庆臻宝实业有限公司 | Upper electrode is used in etching |
| CN110965048A (en) * | 2019-12-04 | 2020-04-07 | 江苏菲沃泰纳米科技有限公司 | Coating equipment and electrode device and application thereof |
| TW202122644A (en) * | 2019-12-04 | 2021-06-16 | 大陸商江蘇菲沃泰納米科技股份有限公司 | Coating equipment, electrode device thereof and application thereof |
| TW202141616A (en) * | 2020-04-22 | 2021-11-01 | 周業投資股份有限公司 | Upper electrode device preventing plasma and corrosive gas from entering via the boundary areas and eroding the electrode plate |
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