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TWI880001B - Grinding method - Google Patents

Grinding method Download PDF

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Publication number
TWI880001B
TWI880001B TW110126832A TW110126832A TWI880001B TW I880001 B TWI880001 B TW I880001B TW 110126832 A TW110126832 A TW 110126832A TW 110126832 A TW110126832 A TW 110126832A TW I880001 B TWI880001 B TW I880001B
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TW
Taiwan
Prior art keywords
grinding
holding
grinding stone
workpiece
assembly
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Application number
TW110126832A
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Chinese (zh)
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TW202206228A (en
Inventor
宮本弘樹
中野惠助
Original Assignee
日商迪思科股份有限公司
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Publication of TW202206228A publication Critical patent/TW202206228A/en
Application granted granted Critical
Publication of TWI880001B publication Critical patent/TWI880001B/en

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Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B7/00Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor
    • B24B7/20Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground
    • B24B7/22Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain
    • B24B7/228Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain for grinding thin, brittle parts, e.g. semiconductors, wafers
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B47/00Drives or gearings; Equipment therefor
    • B24B47/10Drives or gearings; Equipment therefor for rotating or reciprocating working-spindles carrying grinding wheels or workpieces
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B27/00Other grinding machines or devices
    • B24B27/0076Other grinding machines or devices grinding machines comprising two or more grinding tools
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B41/00Component parts such as frames, beds, carriages, headstocks
    • B24B41/06Work supports, e.g. adjustable steadies
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B41/00Component parts such as frames, beds, carriages, headstocks
    • B24B41/06Work supports, e.g. adjustable steadies
    • B24B41/068Table-like supports for panels, sheets or the like
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B47/00Drives or gearings; Equipment therefor
    • B24B47/10Drives or gearings; Equipment therefor for rotating or reciprocating working-spindles carrying grinding wheels or workpieces
    • B24B47/12Drives or gearings; Equipment therefor for rotating or reciprocating working-spindles carrying grinding wheels or workpieces by mechanical gearing or electric power
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B47/00Drives or gearings; Equipment therefor
    • B24B47/20Drives or gearings; Equipment therefor relating to feed movement
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B7/00Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor
    • B24B7/04Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor involving a rotary work-table

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Ceramic Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • Grinding Of Cylindrical And Plane Surfaces (AREA)
  • Constituent Portions Of Griding Lathes, Driving, Sensing And Control (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)

Abstract

[課題]將被加工物磨削加工成均一的厚度。 [解決手段]藉由進行以下之步驟來將被加工物磨削加工成均一的厚度:軸向進給磨削步驟,在如第1磨削磨石的下表面通過載台的上表面的中心之第1磨削磨石與保持面之水平位置的關係下,使第1磨削磨石接近於保持面來對已保持在保持面之被加工物進行軸向進給磨削;及深進緩給磨削步驟,讓第2磨削磨石位於比保持面的上方更靠近水平方向外側,且將第2磨削磨石的下表面定位得比被加工物的上表面更低預定的距離,並使第2磨削磨石與保持組件朝相對地接近之深進緩給方向移動,而以第2磨削磨石的下表面與側面對被加工物進行深進緩給磨削。 [Topic] Grinding the workpiece to a uniform thickness. [Solution] The workpiece is ground to a uniform thickness by performing the following steps: an axial feed grinding step, in which the first grinding stone is brought close to the holding surface to perform axial feed grinding on the workpiece held on the holding surface, when the lower surface of the first grinding stone passes through the center of the upper surface of the carrier, and the lower surface of the second grinding stone is positioned at a predetermined distance lower than the upper surface of the workpiece, and the second grinding stone and the holding assembly are moved in a relative approaching deep feed direction, and the lower surface and side surface of the second grinding stone are used to perform deep feed grinding on the workpiece.

Description

磨削方法Grinding method

本發明是有關於一種磨削方法。The present invention relates to a grinding method.

如專利文獻1所揭示,使用磨削磨石來磨削已保持在保持面之四角形的板狀工件的磨削裝置,是將磨削磨石定位成使環狀的磨削磨石通過板狀工件的中心並以磨削磨石的中心為軸來旋轉,並且使磨削磨石朝接近於板狀工件的方向移動來對以板狀工件的中心為軸而旋轉中的板狀工件進行磨削。As disclosed in Patent Document 1, a grinding device for grinding a quadrilateral plate-like workpiece held on a holding surface using a grinding stone is provided, wherein the grinding stone is positioned so that the annular grinding stone passes through the center of the plate-like workpiece and rotates about the center of the grinding stone, and the grinding stone is moved in a direction approaching the plate-like workpiece to grind the plate-like workpiece rotating about the center of the plate-like workpiece.

在板狀工件的磨削加工中,以下情形會反覆:磨削磨石的下表面接觸於板狀工件之接觸面積變大或變小。並且,和板狀工件之接觸面積較大之部分,相較於接觸面積較小之部分,施加在板狀工件以及磨削磨石的負荷會較大。因此,板狀工件會下沉而使被磨削之量變少。其結果,會產生以下問題:接觸於磨削磨石之板狀工件,厚度會變得其接觸面積較大之部分比較小之部分更厚。 先前技術文獻 專利文獻 In the grinding process of a plate-like workpiece, the following situation will be repeated: the contact area of the lower surface of the grinding stone with the plate-like workpiece becomes larger or smaller. In addition, the load applied to the plate-like workpiece and the grinding stone will be greater in the portion with a larger contact area with the plate-like workpiece than in the portion with a smaller contact area. Therefore, the plate-like workpiece will sink and the amount of grinding will decrease. As a result, the following problem will arise: the thickness of the plate-like workpiece in contact with the grinding stone will become thicker in the portion with a larger contact area than in the portion with a smaller contact area. Prior art literature Patent literature

專利文獻1:日本特開2015-205358號公報Patent document 1: Japanese Patent Application Publication No. 2015-205358

發明欲解決之課題Invention Problems to be Solved

從而,以保持面來保持四角之板狀工件並以磨削磨石進行磨削之磨削裝置,會有以下課題:將磨削後之板狀工件形成為均一的厚度。 用以解決課題之手段 Therefore, a grinding device that uses a holding surface to hold a plate-shaped workpiece at four corners and grinds it with a grinding stone has the following problem: forming the plate-shaped workpiece after grinding into a uniform thickness. Means for solving the problem

本發明是一種使用磨削裝置來磨削被加工物之磨削方法,前述磨削裝置具備:保持組件,可將被加工物保持在保持面且以該保持面的中心為軸來旋轉;磨削組件,將圓環狀的第1磨削磨石、與圍繞該第1磨削磨石之直徑的同心圓環狀的第2磨削磨石裝設於主軸的前端;進退機構,選擇性地讓該第1磨削磨石或該第2磨削磨石接近於該保持面;水平移動組件,使該保持組件與該磨削組件相對地在水平方向上移動;及垂直移動組件,使該保持組件與該磨削組件相對地在相對於該保持面垂直的方向上移動,前述被加工物之磨削方法是由以下步驟所構成: 軸向進給(infeed)磨削步驟,在如以該第1磨削磨石或該第2磨削磨石之任一種的該磨削磨石的下表面通過該保持面的中心之該磨削磨石與該保持面之水平位置的關係下,使該磨削磨石朝接近於該保持面的方向移動,而對已保持在該保持面之被加工物進行軸向進給磨削;及 深進緩給(creep-feed)磨削步驟,讓在該軸向進給磨削步驟中未使用之另一種的該磨削磨石位於比該保持面的上方更靠近水平方向外側,且將該磨削磨石的下表面定位得比被加工物的上表面更低預定的距離,並使該磨削磨石與該保持組件朝相互的水平方向之相對移動方向即深進緩給方向接近,而以該磨削磨石的下表面與側面對該被加工物進行深進緩給磨削。 所期望的是,上述之磨削方法中的被加工物為多角形,且該保持面為沿著被加工物的形狀之形狀。 所期望的是,上述之磨削方法為:該軸向進給磨削步驟是使用該第1磨削磨石,該深進緩給磨削步驟是使用直徑比該第1磨削磨石更大的該第2磨削磨石。 所期望的是,上述之磨削方法為:該保持組件在上表面配置有複數個該保持面,在該軸向進給磨削步驟中定位成該磨削磨石通過該上表面的中心,並以該上表面的中心為軸使該上表面旋轉,來對已保持在各個該保持面之被加工物進行磨削。 所期望的是,上述之磨削方法為:將複數個該保持面在正交於深進緩給方向之水平的方向上排列並配置,且在該深進緩給磨削步驟中,讓該保持面以在正交於該深進緩給方向之水平的方向上排列之狀態固定成不旋轉,並使已配置在比該保持組件的該上表面更靠近外側之該磨削磨石與該保持組件相對地朝該深進緩給方向接近,而以該磨削磨石的下表面與側面來磨削複數個被加工物。 所期望的是,在上述之磨削方法中,該保持面是具有長邊與短邊的長方形,且使該長邊在該深進緩給方向上延伸且複數個該保持面在正交於該深進緩給方向之水平的方向上排列。 發明效果 The present invention is a method for grinding a workpiece using a grinding device. The grinding device comprises: a holding assembly that can hold the workpiece on a holding surface and rotate with the center of the holding surface as an axis; a grinding assembly that installs a first grinding stone in an annular shape and a second grinding stone in an annular shape with a diameter concentric with the first grinding stone at the front end of a spindle; an advance and retreat mechanism that selectively allows the first grinding stone or the second grinding stone to approach the holding surface; a horizontal moving assembly that moves the holding assembly and the grinding assembly in a horizontal direction relative to each other; and a vertical moving assembly that moves the holding assembly and the grinding assembly in a direction perpendicular to the holding surface relative to each other. The method for grinding the workpiece is composed of the following steps: An axial feed grinding step, in which the lower surface of either the first grinding stone or the second grinding stone passes through the center of the holding surface, and the grinding stone is moved toward the holding surface to perform axial feed grinding on the workpiece held on the holding surface; and In the creep-feed grinding step, the grinding stone of another type not used in the axial feed grinding step is positioned closer to the horizontal outer side than the upper side of the holding surface, and the lower surface of the grinding stone is positioned a predetermined distance lower than the upper surface of the workpiece, and the grinding stone and the holding assembly are moved in the relative horizontal direction, i.e., the creep-feed direction, and the workpiece is creep-feed ground with the lower surface and side surface of the grinding stone. It is desirable that the workpiece in the above-mentioned grinding method is polygonal, and the holding surface is shaped along the shape of the workpiece. It is desirable that the above-mentioned grinding method is: the axial feed grinding step uses the first grinding stone, and the deep feed slow feed grinding step uses the second grinding stone having a larger diameter than the first grinding stone. It is desirable that the above-mentioned grinding method is: the holding assembly is provided with a plurality of holding surfaces on the upper surface, and in the axial feed grinding step, the grinding stone is positioned so as to pass through the center of the upper surface, and the upper surface is rotated about the center of the upper surface to grind the workpiece held on each of the holding surfaces. It is expected that the above-mentioned grinding method is: arranging and configuring a plurality of the holding surfaces in a horizontal direction orthogonal to the depth feed direction, and in the depth feed grinding step, the holding surfaces are fixed in a state of being arranged in a horizontal direction orthogonal to the depth feed direction so as not to rotate, and the grinding stone arranged closer to the outside than the upper surface of the holding assembly is approached relative to the holding assembly in the depth feed direction, and the lower surface and side surface of the grinding stone are used to grind a plurality of workpieces. It is expected that in the above-mentioned grinding method, the holding surface is a rectangle having a long side and a short side, and the long side is extended in the depth feed direction and the plurality of the holding surfaces are arranged in a horizontal direction orthogonal to the depth feed direction. Effect of the invention

在本發明之磨削裝置中,可以藉由在進行軸向進給磨削後進行深進緩給磨削,而將四角形的被加工物磨削加工成均一的厚度。特別是在被加工物為長方形的板狀工件的情況下,可以藉由使該板狀工件的長邊在深進緩給方向上延伸而在深進緩給磨削時從短邊來接近第2磨削磨石,而將被加工物加工成均一的厚度。In the grinding device of the present invention, a quadrilateral workpiece can be ground to a uniform thickness by performing deep feed grinding after axial feed grinding. In particular, when the workpiece is a rectangular plate-shaped workpiece, the workpiece can be processed to a uniform thickness by extending the long side of the plate-shaped workpiece in the deep feed direction and approaching the second grinding stone from the short side during deep feed grinding.

用以實施發明之形態The form used to implement the invention

1 磨削裝置 圖1所示之磨削裝置1是使用磨削組件3來對被加工物14進行磨削之磨削裝置。被加工物14是例如長方體形的薄板。磨削裝置1具備有在Y軸方向上延伸設置之基座10、及豎立設置在基座10之上的+Y方向側之支柱11。 1 Grinding device The grinding device 1 shown in FIG. 1 is a grinding device for grinding a workpiece 14 using a grinding assembly 3. The workpiece 14 is, for example, a thin plate in a rectangular shape. The grinding device 1 has a base 10 extending in the Y-axis direction and a support 11 vertically provided on the +Y direction side of the base 10.

於支柱11的-Y方向側的側面配設有可升降地支撐磨削組件3之垂直移動組件4。垂直移動組件4具備有:具有Z軸方向的旋轉軸45的滾珠螺桿40、相對於滾珠螺桿40平行地配設的一對導軌41、以旋轉軸45為軸來使滾珠螺桿40旋轉的Z軸馬達42、內部的螺帽螺合於滾珠螺桿40且側部滑接於導軌41的升降板43、及連結於升降板43且支撐磨削組件3的支持器44。A vertical moving assembly 4 that supports the grinding assembly 3 in a liftable manner is disposed on the side surface of the support 11 on the -Y direction side. The vertical moving assembly 4 includes: a ball screw 40 having a rotation axis 45 in the Z-axis direction, a pair of guide rails 41 disposed parallel to the ball screw 40, a Z-axis motor 42 that rotates the ball screw 40 about the rotation axis 45, a lifting plate 43 whose inner nut is screwed to the ball screw 40 and whose side is slidably connected to the guide rail 41, and a support 44 connected to the lifting plate 43 and supporting the grinding assembly 3.

當藉由Z軸馬達42來驅動滾珠螺桿40,且滾珠螺桿40以旋轉軸45為軸而旋轉時,升降板43會伴隨於此被導軌41所引導而在Z軸方向上升降移動,並且使已保持在支持器44之磨削組件3在Z軸方向上移動。 藉由使用垂直移動組件4使磨削組件3在Z軸方向上升降移動,可以使保持組件2與磨削組件3相對地在相對於保持面211垂直的方向上移動。 When the ball screw 40 is driven by the Z-axis motor 42 and the ball screw 40 rotates about the rotation axis 45, the lifting plate 43 is guided by the guide rail 41 to move up and down in the Z-axis direction, and the grinding assembly 3 held in the support 44 is moved in the Z-axis direction. By using the vertical moving assembly 4 to move the grinding assembly 3 up and down in the Z-axis direction, the holding assembly 2 and the grinding assembly 3 can be moved relative to each other in a direction perpendicular to the holding surface 211.

磨削組件3具備有:具有Z軸方向的旋轉軸35的主軸30、將主軸30支撐成可旋轉的殼體39、及以旋轉軸35為軸而驅動主軸30旋轉的主軸馬達38。 如圖2所示,在主軸30連結有汽缸63。汽缸63具備有大徑部630、與形成在大徑部630的下端之小徑部631。在小徑部631的下端連結有第1安裝座331。又,大徑部630的內部容置有桿件620、與連結在桿件620的上端之圓板活塞621,且在桿件620的下端連結有第2安裝座332。此外,在大徑部630的下表面與第1安裝座331之間配設有連結兩者的導引部449,在第2安裝座332形成有於導引部449貫通的貫通孔。 在第1安裝座331裝設有第1磨削輪31。又,在第2安裝座332裝設有第2磨削輪32。 The grinding assembly 3 includes: a spindle 30 having a rotating shaft 35 in the Z-axis direction, a housing 39 that supports the spindle 30 so that it can rotate, and a spindle motor 38 that drives the spindle 30 to rotate with the rotating shaft 35 as an axis. As shown in FIG. 2 , a cylinder 63 is connected to the spindle 30. The cylinder 63 includes a large diameter portion 630 and a small diameter portion 631 formed at the lower end of the large diameter portion 630. A first mounting seat 331 is connected to the lower end of the small diameter portion 631. In addition, a rod 620 and a disc piston 621 connected to the upper end of the rod 620 are accommodated inside the large diameter portion 630, and a second mounting seat 332 is connected to the lower end of the rod 620. In addition, a guide portion 449 is provided between the lower surface of the large diameter portion 630 and the first mounting seat 331 to connect the two, and a through hole penetrating the guide portion 449 is formed in the second mounting seat 332. The first grinding wheel 31 is mounted on the first mounting seat 331. Also, the second grinding wheel 32 is mounted on the second mounting seat 332.

如圖1所示,第1磨削輪31具備有第1輪基台311、與在第1輪基台311的下表面配置排列成圓環狀之大致長方體形狀的複數個第1磨削磨石310。 第2磨削輪32具備有第2輪基台321、與在第2輪基台321的下表面配置排列成圓環狀之大致長方體形狀的複數個第2磨削磨石320。複數個第2磨削磨石320所形成之圓環具有如圍繞複數個第1磨削磨石310所形成之圓環的大小的直徑。又,第2磨削磨石320所形成之圓環是和第1磨削磨石310同心的圓環。 第1磨削磨石310的粒徑與第2磨削磨石320的粒徑可為相同,亦可為不同。 藉由使用主軸馬達38使主軸30旋轉,而使第1磨削輪31以及第2磨削輪32旋轉。 As shown in FIG. 1 , the first grinding wheel 31 has a first wheel base 311 and a plurality of first grinding stones 310 arranged in a substantially rectangular shape in a ring shape on the lower surface of the first wheel base 311. The second grinding wheel 32 has a second wheel base 321 and a plurality of second grinding stones 320 arranged in a substantially rectangular shape in a ring shape on the lower surface of the second wheel base 321. The ring formed by the plurality of second grinding stones 320 has a diameter as large as the ring formed around the plurality of first grinding stones 310. In addition, the ring formed by the second grinding stone 320 is a ring concentric with the first grinding stone 310. The particle size of the first grinding stone 310 and the particle size of the second grinding stone 320 may be the same or different. The first grinding wheel 31 and the second grinding wheel 32 are rotated by rotating the spindle 30 using the spindle motor 38.

圖2所示的桿件620及圓板活塞621會構成上下組件62,上下組件62可在大徑部630的內部的空間中朝Z軸方向上下移動。圓板活塞621連接於空氣供給源60,且在圓板活塞621與空氣供給源60之間配設有切換控制部61。切換控制部61是例如控制閥,且具有以下功能:切換使從空氣供給源60所供給之空氣從圓板活塞621的上方噴出、或從圓板活塞621的下方噴出。The rod 620 and the disc piston 621 shown in FIG. 2 constitute an upper and lower assembly 62, and the upper and lower assembly 62 can move up and down in the Z-axis direction in the space inside the large diameter portion 630. The disc piston 621 is connected to the air supply source 60, and a switching control unit 61 is provided between the disc piston 621 and the air supply source 60. The switching control unit 61 is, for example, a control valve, and has the following function: switching the air supplied from the air supply source 60 to be ejected from the top of the disc piston 621 or from the bottom of the disc piston 621.

例如,當使用切換控制部61將從空氣供給源60所供給的空氣切換成從圓板活塞621的下方朝+Z方向噴射而從圓板活塞621的下方噴射空氣時,會藉由空氣將圓板活塞621朝+Z方向賦與勢能且圓板活塞621、桿件620、以及第2安裝座332會受到導引部449所導引並且一體地朝+Z方向上升。藉此,成為以下情形:第2安裝座332逐漸朝+Z方向上升,且第1磨削磨石310比第2磨削磨石320更接近於保持面211。 又,當使用切換控制部61將從空氣供給源60所供給之空氣切換成從圓板活塞621的上方朝-Z方向噴射而從圓板活塞621的上方噴射空氣時,會藉由空氣將圓板活塞621朝-Z方向賦與勢能且圓板活塞621、桿件620、以及第2安裝座332會受到導引部449所導引並且一體地朝-Z方向下降。藉此,成為以下情形:第2安裝座332逐漸朝-Z方向下降,且第2磨削磨石320比第1磨削磨石310更接近於保持面211。 像這樣,空氣供給源60、切換控制部61、以及上下組件62會構成進退機構6,前述進退機構6控制第1磨削磨石310與第2磨削磨石320的高度位置之關係而選擇性地使第1磨削磨石310或第2磨削磨石320接近於保持面211。 For example, when the air supplied from the air supply source 60 is switched to be ejected from the bottom of the disc piston 621 in the +Z direction using the switching control unit 61, the disc piston 621 is given potential energy in the +Z direction by the air, and the disc piston 621, the rod 620, and the second mounting seat 332 are guided by the guide portion 449 and rise in the +Z direction as a whole. As a result, the second mounting seat 332 gradually rises in the +Z direction, and the first grinding stone 310 is closer to the holding surface 211 than the second grinding stone 320. Furthermore, when the switching control unit 61 is used to switch the air supplied from the air supply source 60 to be ejected from the top of the disc piston 621 in the -Z direction, the disc piston 621 is given potential energy in the -Z direction by the air, and the disc piston 621, the rod 620, and the second mounting seat 332 are guided by the guide portion 449 and integrally descend in the -Z direction. As a result, the second mounting seat 332 gradually descends in the -Z direction, and the second grinding stone 320 is closer to the holding surface 211 than the first grinding stone 310. In this way, the air supply source 60, the switching control unit 61, and the upper and lower components 62 constitute the advance and retreat mechanism 6, which controls the height position relationship between the first grinding stone 310 and the second grinding stone 320 to selectively bring the first grinding stone 310 or the second grinding stone 320 close to the holding surface 211.

如圖1所示,在基座10之上配設有保持組件2。保持組件2可為例如保持被加工物14之工作夾台。 保持組件2具備有圓板狀的載台21與支撐載台21的框體22。在載台21的上表面210配設有例如保持被加工物14之複數個(在圖1中為4個)保持面211。保持面211是形成為例如具有在Y軸方向上延伸之長邊212、與在X軸方向上延伸之短邊213的長方形狀,且在載台21的上表面210於X軸方向上排列並配置。 As shown in FIG. 1 , a holding assembly 2 is provided on the base 10. The holding assembly 2 may be, for example, a work clamp for holding the workpiece 14. The holding assembly 2 has a disc-shaped carrier 21 and a frame 22 for supporting the carrier 21. A plurality of (four in FIG. 1 ) holding surfaces 211 for holding, for example, the workpiece 14 are provided on the upper surface 210 of the carrier 21. The holding surface 211 is formed in a rectangular shape, for example, with a long side 212 extending in the Y-axis direction and a short side 213 extending in the X-axis direction, and is arranged and configured in the X-axis direction on the upper surface 210 of the carrier 21.

於各個保持面211連接有未圖示之吸引源。例如藉由在保持面211載置有被加工物14的狀態下使用該吸引源來發揮吸引力,可將所產生之吸引力傳達到保持面211而從保持面211吸引已載置於保持面211之被加工物14。藉此,可以將被加工物14吸引保持於保持面211。Each holding surface 211 is connected to a suction source (not shown). For example, by using the suction source to exert suction force when the workpiece 14 is placed on the holding surface 211, the generated suction force can be transmitted to the holding surface 211 to attract the workpiece 14 placed on the holding surface 211. In this way, the workpiece 14 can be attracted and held on the holding surface 211.

在基座10的內部配設有內部基座100。在內部基座100之上配設有使保持組件2在水平方向上移動之水平移動組件5。 水平移動組件5具備有:具有Y軸方向的旋轉軸55的滾珠螺桿50、相對於滾珠螺桿50平行地配設的一對導軌51、連結於滾珠螺桿50且以旋轉軸55為軸來使滾珠螺桿50旋動的Y軸馬達52、及底部的螺帽螺合於滾珠螺桿50且沿著導軌51在Y軸方向上移動的可動板53。 當滾珠螺桿50被Y軸馬達52驅動而以旋轉軸55為軸來旋轉滾珠螺桿50時,會成為可動板53受到導軌51所引導而在Y軸方向上水平地移動之構成。 An inner base 100 is provided inside the base 10. A horizontal moving assembly 5 for moving the holding assembly 2 in the horizontal direction is provided on the inner base 100. The horizontal moving assembly 5 comprises: a ball screw 50 having a rotation axis 55 in the Y-axis direction, a pair of guide rails 51 provided parallel to the ball screw 50, a Y-axis motor 52 connected to the ball screw 50 and rotating the ball screw 50 about the rotation axis 55, and a movable plate 53 having a nut at the bottom screwed to the ball screw 50 and moving in the Y-axis direction along the guide rails 51. When the ball screw 50 is driven by the Y-axis motor 52 and rotates around the rotation shaft 55, the movable plate 53 is guided by the guide rail 51 and moves horizontally in the Y-axis direction.

在可動板53的上表面530配設有使保持組件2旋轉的旋轉組件26,且在旋轉組件26的周圍配設有環狀的基台23。 在基台23的同一圓周上之等間隔的位置上,形成有例如3個(在圖1中顯示有2個)貫通孔230,且在可動板53的上表面530豎立設置有支撐基台23的3支(圖1中顯示有2支)支撐柱24。各個貫通孔230是被各自的支撐柱24所貫通,且支撐柱24固定在可動板53的上表面530。各個支撐柱24具有例如未圖示之伸縮機構,且成為以下情形:可藉由各個支撐柱24在Z軸方向上適當升降來調整保持組件2的傾斜度。 A rotating assembly 26 for rotating the holding assembly 2 is provided on the upper surface 530 of the movable plate 53, and a ring-shaped base 23 is provided around the rotating assembly 26. For example, three (two are shown in FIG. 1 ) through holes 230 are formed at evenly spaced positions on the same circumference of the base 23, and three (two are shown in FIG. 1 ) supporting columns 24 for supporting the base 23 are vertically provided on the upper surface 530 of the movable plate 53. Each through hole 230 is penetrated by its own supporting column 24, and the supporting column 24 is fixed to the upper surface 530 of the movable plate 53. Each support column 24 has a telescopic mechanism, for example, not shown in the figure, and the following situation is achieved: the inclination of the holding assembly 2 can be adjusted by appropriately raising and lowering each support column 24 in the Z-axis direction.

當可動板53在Y軸方向上移動時,會成為以下情形:伴隨於此而使被可動板53所支撐之旋轉組件26、基台23、以及保持組件2和可動板53一體地在Y軸方向上水平地移動。 可以藉由使用水平移動組件5使保持組件2在Y軸方向上水平移動,而使保持組件2與磨削組件3相對地在水平方向上移動。 When the movable plate 53 moves in the Y-axis direction, the rotating assembly 26 supported by the movable plate 53, the base 23, and the holding assembly 2 and the movable plate 53 move horizontally in the Y-axis direction as a whole. The holding assembly 2 can be moved horizontally in the Y-axis direction by using the horizontal moving assembly 5, so that the holding assembly 2 and the grinding assembly 3 can be moved horizontally relative to each other.

旋轉組件26具備有例如未圖示之馬達等。可藉由使該馬達作動,而成為以下情形:保持組件2以通過其中心2000之Z軸方向的軸心為軸來旋轉。The rotating assembly 26 includes, for example, a motor (not shown). By operating the motor, the holding assembly 2 can be rotated about the axis in the Z-axis direction passing through the center 2000 thereof.

在保持組件2之周圍配設有罩蓋27以及蛇腹28,前述蛇腹28伸縮自如地連結於罩蓋27。當例如保持組件2在Y軸方向上移動時,會成為罩蓋27和保持組件2一起在Y軸方向上移動且蛇腹28伸縮之情形。A cover 27 and bellows 28 are provided around the holding assembly 2, and the bellows 28 is retractably connected to the cover 27. For example, when the holding assembly 2 moves in the Y-axis direction, the cover 27 and the holding assembly 2 move together in the Y-axis direction and the bellows 28 retracts.

2 磨削方法 (軸向進給磨削步驟) 針對使用磨削裝置1來進行被加工物14之磨削加工的方法進行說明。首先,事先使進退機構6的切換控制部61作動,並且藉由從空氣供給源60供給空氣,而從圓板活塞621的下方朝+Z方向噴射空氣來使第2安裝座332上升。藉此,第2磨削磨石320相對於第1磨削磨石310朝+Z方向移動,而成為第1磨削磨石310比第2磨削磨石320更接近於保持面211之狀態。 2 Grinding method (Axial feed grinding step) A method for grinding the workpiece 14 using the grinding device 1 is described. First, the switching control unit 61 of the advance and retreat mechanism 6 is activated in advance, and air is supplied from the air supply source 60, and air is ejected from the bottom of the circular plate piston 621 in the +Z direction to raise the second mounting seat 332. As a result, the second grinding stone 320 moves in the +Z direction relative to the first grinding stone 310, and the first grinding stone 310 is closer to the holding surface 211 than the second grinding stone 320.

然後,將被加工物14載置於保持組件2的複數個保持面211的每一個上,並使該吸引源作動。藉此,將所產生之吸引力傳達至保持面211而將被加工物14吸引保持於保持面211。Then, the workpiece 14 is placed on each of the plurality of holding surfaces 211 of the holding assembly 2, and the suction source is activated. Thus, the generated suction force is transmitted to the holding surface 211, and the workpiece 14 is sucked and held on the holding surface 211.

又,使用旋轉組件26使保持組件2旋轉而使已保持在保持面211之被加工物14旋轉,並且事先使用主軸馬達38來使第1磨削磨石310以及第2磨削磨石320旋轉。Furthermore, the holding unit 2 is rotated by the rotating unit 26 to rotate the workpiece 14 held on the holding surface 211 , and the first grinding stone 310 and the second grinding stone 320 are rotated by the spindle motor 38 in advance.

接著,使用水平移動組件5使保持組件2朝+Y方向移動,而如圖3所示,將被加工物14定位到如第1磨削磨石310的下表面312通過載台21的上表面210的中心2000之位置。Next, the holding assembly 2 is moved in the +Y direction using the horizontal moving assembly 5 , and the workpiece 14 is positioned at a position where the lower surface 312 of the first grinding stone 310 passes through the center 2000 of the upper surface 210 of the stage 21 , as shown in FIG. 3 .

在已保持在保持面211之被加工物14以中心2000為旋轉中心而旋轉中,且第1磨削磨石310以旋轉軸35為軸而旋轉中的狀態下,使用垂直移動組件4使磨削組件3朝-Z方向下降。若藉由使第1磨削磨石310朝-Z方向下降來使其逐漸接近於保持面211,第1磨削磨石310的下表面312即接觸於被加工物14的上表面140。在第1磨削磨石310的下表面312已接觸於被加工物14的上表面140的狀態下,進一步使第1磨削磨石310逐漸朝-Z方向下降,藉此對被加工物14進行軸向進給磨削。在圖4及圖5中所顯示的是以下情形:已保持在保持面211之被加工物14一邊以上表面210的中心2000為軸而旋轉一邊接觸於第1磨削磨石310。While the workpiece 14 held on the holding surface 211 is rotating about the center 2000 and the first grinding stone 310 is rotating about the rotation axis 35, the grinding unit 3 is lowered in the -Z direction using the vertical movement unit 4. When the first grinding stone 310 is gradually brought close to the holding surface 211 by being lowered in the -Z direction, the lower surface 312 of the first grinding stone 310 contacts the upper surface 140 of the workpiece 14. When the lower surface 312 of the first grinding stone 310 contacts the upper surface 140 of the workpiece 14, the first grinding stone 310 is further lowered in the -Z direction, thereby performing axial feed grinding on the workpiece 14. 4 and 5 show the following situation: the workpiece 14 held on the holding surface 211 is in contact with the first grinding stone 310 while rotating about the center 2000 of the upper surface 210 as an axis.

在被加工物14的軸向進給磨削中,是例如將未圖示之高度規等定位到在載台21的上表面210通過相對於保持面211形成為面齊平之測定面218的圓周軌道即測定軌道219上的位置、與被加工物14的上表面140,並測定保持面211的高度與被加工物14的上表面140的高度,且計算兩種高度之差,藉此進行被加工物14的厚度之測定。將被加工物14磨削為預定的厚度後即結束軸向進給磨削。In the axial feed grinding of the workpiece 14, for example, a height gauge not shown is positioned on a circumferential track 219 formed by a measuring surface 218 flush with the holding surface 211 on the upper surface 210 of the stage 21, and the upper surface 140 of the workpiece 14 is aligned, and the height of the holding surface 211 and the height of the upper surface 140 of the workpiece 14 are measured, and the difference between the two heights is calculated, thereby measuring the thickness of the workpiece 14. The axial feed grinding is terminated after the workpiece 14 is ground to a predetermined thickness.

(深進緩給磨削步驟) 如上述地進行軸向進給磨削後,使用圖1所示之垂直移動組件4使磨削組件3朝+Z方向上升,而使第1磨削磨石310從被加工物14離開。然後,使用水平移動組件5使保持組件2朝-Y方向移動,而使第1磨削磨石310及第2磨削磨石320從保持面211的上方朝水平方向外側退避。 (Advanced slow-feed grinding step) After the axial feed grinding is performed as described above, the grinding assembly 3 is raised in the +Z direction using the vertical moving assembly 4 shown in FIG. 1, so that the first grinding stone 310 is separated from the workpiece 14. Then, the holding assembly 2 is moved in the -Y direction using the horizontal moving assembly 5, so that the first grinding stone 310 and the second grinding stone 320 are retreated from the upper side of the holding surface 211 to the outside in the horizontal direction.

之後,使用進退機構6使第2磨削磨石320相對於第1磨削磨石310下降,而形成為第2磨削磨石320比第1磨削磨石310更接近於保持面211之狀態。Thereafter, the second grinding stone 320 is lowered relative to the first grinding stone 310 using the advancing and retreating mechanism 6 , so that the second grinding stone 320 is closer to the holding surface 211 than the first grinding stone 310 .

接著,使用垂直移動組件4使磨削組件3朝-Z方向下降,而將第2磨削磨石320定位在如第2磨削磨石320的下表面322變得比被加工物14的上表面140更低預定的距離之高度位置。Next, the grinding unit 3 is lowered in the −Z direction using the vertical moving unit 4 to position the second grinding stone 320 at a height position where the lower surface 322 of the second grinding stone 320 is lower than the upper surface 140 of the workpiece 14 by a predetermined distance.

又,藉由使用旋轉組件26使保持組件2旋轉適當的角度,而設成如圖6所示地在X軸方向上排列有4個保持面211之狀態,並在此狀態下停止由旋轉組件26所進行之保持組件2的旋轉來讓保持組件2不旋轉。藉此,4個保持面211會以在X軸方向上排列之狀態被固定。Furthermore, by rotating the holding assembly 2 by an appropriate angle using the rotating assembly 26, a state in which four holding surfaces 211 are arranged in the X-axis direction is set as shown in FIG6, and in this state, the rotation of the holding assembly 2 by the rotating assembly 26 is stopped to prevent the holding assembly 2 from rotating. In this way, the four holding surfaces 211 are fixed in a state in which they are arranged in the X-axis direction.

然後,使用水平移動組件5使保持組件2朝+Y方向移動。藉此,已配置在載台21的上表面210的外側之第2磨削磨石320與保持組件2朝相互之水平方向的相對移動方向即深進緩給方向(Y軸方向)接近,且第2磨削磨石320與已保持在保持面211之被加工物14在Y軸方向上逐漸接近。Then, the holding assembly 2 is moved in the +Y direction using the horizontal moving assembly 5. As a result, the second grinding stone 320 disposed on the outer side of the upper surface 210 of the stage 21 and the holding assembly 2 move in the relative horizontal direction, that is, the deep feed direction (Y-axis direction), and the second grinding stone 320 and the workpiece 14 held on the holding surface 211 gradually approach each other in the Y-axis direction.

當第2磨削磨石320與已保持在保持面211之被加工物14在Y軸方向上逐漸接近時,會如圖7所示,第2磨削磨石320的側面323與下表面322接觸於被加工物14的上表面140而對被加工物14進行深進緩給磨削。如圖8所示,當保持組件2朝+Y方向移動至如已保持在保持面211之4個被加工物14的整個面已被磨削之水平位置後,即可結束深進緩給磨削。When the second grinding stone 320 and the workpiece 14 held on the holding surface 211 gradually approach each other in the Y-axis direction, as shown in FIG7 , the side surface 323 and the lower surface 322 of the second grinding stone 320 contact the upper surface 140 of the workpiece 14 to perform deep slow feed grinding on the workpiece 14. As shown in FIG8 , when the holding assembly 2 moves in the +Y direction to a horizontal position where the entire surface of the four workpieces 14 held on the holding surface 211 has been ground, the deep slow feed grinding is terminated.

在磨削裝置1中,可以藉由在進行軸向進給磨削後進行深進緩給磨削之作法,而將四角形的被加工物14磨削加工成均一的厚度。又,特別是在被加工物14為長方形的板狀工件的情況下,可以藉由在深進緩給磨削時使其從短邊213來接近第2磨削磨石320,而將被加工物14加工成均一的厚度。In the grinding device 1, the quadrilateral workpiece 14 can be ground to a uniform thickness by performing deep feed grinding after axial feed grinding. In particular, when the workpiece 14 is a rectangular plate-like workpiece, the workpiece 14 can be processed to a uniform thickness by approaching the second grinding stone 320 from the short side 213 during deep feed grinding.

再者,在上述之磨削方法中,亦可在使用第2磨削磨石320來進行被加工物14的軸向進給磨削後,使用第1磨削磨石310來進行被加工物14的深進緩給磨削。Furthermore, in the above-mentioned grinding method, after the axial feed grinding of the workpiece 14 is performed using the second grinding stone 320 , the deep feed grinding of the workpiece 14 may be performed using the first grinding stone 310 .

又,載台21的上表面210亦可並非長方形狀的保持面211在相同方向上排列之構成。例如,亦可使各保持面211為長方形,且方向並未對齊於一個方向,亦可讓長方形的大小不一致。此外,各保持面211的形狀亦可為長方形以外的多角形,亦可為圓形或橢圓形。Furthermore, the upper surface 210 of the stage 21 may not be a rectangular holding surface 211 arranged in the same direction. For example, each holding surface 211 may be a rectangle, and the directions may not be aligned in one direction, or the sizes of the rectangles may be different. In addition, the shape of each holding surface 211 may be a polygon other than a rectangle, or may be a circle or an ellipse.

磨削裝置1亦可為具備圖9所示之第2保持組件8來取代保持組件2之裝置。如圖9所示,第2保持組件8具備有圓板狀的吸引部80、與支撐吸引部80的框體81。吸引部80的上表面是保持圓板狀的第2被加工物15的保持面800,且框體81的上表面810會和保持面800形成為面齊平。 又,吸引部80已連接於未圖示之吸引源。例如可以藉由在已將第2被加工物15載置於保持面800的狀態下使該吸引源作動,而將所產生之吸引力傳達到保持面800,並將第2被加工物15吸引保持於保持面800。 The grinding device 1 may also be a device having a second holding assembly 8 as shown in FIG. 9 to replace the holding assembly 2. As shown in FIG. 9, the second holding assembly 8 has a disk-shaped suction portion 80 and a frame 81 supporting the suction portion 80. The upper surface of the suction portion 80 is a holding surface 800 for holding the disk-shaped second workpiece 15, and the upper surface 810 of the frame 81 is formed flush with the holding surface 800. In addition, the suction portion 80 is connected to a suction source not shown. For example, by activating the suction source when the second workpiece 15 is placed on the holding surface 800, the generated suction force can be transmitted to the holding surface 800, and the second workpiece 15 can be sucked and held on the holding surface 800.

在對已保持在第2保持組件8之第2被加工物15進行磨削加工時,首先是使用進退機構6先讓第1磨削磨石310比第2磨削磨石320更接近於保持面800,並且將第2被加工物15保持在第2保持組件8的保持面800。 又,使用主軸馬達38先使第1磨削磨石310以及第2磨削磨石320旋轉,並使用旋轉組件26先使已保持在第2保持組件8之第2被加工物15旋轉。 此外,使用水平移動組件5使第2保持組件8朝+Y方向移動,而將第2保持組件8與磨削組件3之水平位置的關係調節成:第1磨削磨石310的下表面312通過保持面800的中心8000。 然後,使用垂直移動組件4使磨削組件3朝-Z方向下降而使第1磨削磨石310接近於保持面800,並使第1磨削磨石310的下表面312與已保持在保持面800之第2被加工物15接觸。藉此,對第2被加工物15進行軸向進給磨削。 When grinding the second workpiece 15 held in the second holding assembly 8, the first advance and retreat mechanism 6 is used to make the first grinding stone 310 closer to the holding surface 800 than the second grinding stone 320, and the second workpiece 15 is held on the holding surface 800 of the second holding assembly 8. In addition, the first grinding stone 310 and the second grinding stone 320 are rotated by the spindle motor 38, and the second workpiece 15 held in the second holding assembly 8 is rotated by the rotating assembly 26. In addition, the second holding assembly 8 is moved in the +Y direction by the horizontal moving assembly 5, and the horizontal position relationship between the second holding assembly 8 and the grinding assembly 3 is adjusted so that the lower surface 312 of the first grinding stone 310 passes through the center 8000 of the holding surface 800. Then, the grinding assembly 3 is lowered in the -Z direction using the vertical moving assembly 4 so that the first grinding stone 310 approaches the holding surface 800, and the lower surface 312 of the first grinding stone 310 contacts the second workpiece 15 held on the holding surface 800. In this way, the second workpiece 15 is axially fed and ground.

軸向進給磨削結束後,使用垂直移動組件4使磨削組件3朝+Z方向上升,而使第1磨削磨石310以及第2磨削磨石320相對於第2被加工物15朝+Z方向離開。又,使用水平移動組件5使已保持在第2保持組件8之第2被加工物15朝-Y方向移動,而使第2被加工物15相對於第1磨削磨石310以及第2磨削磨石320朝-Y方向離開。藉此,可將第2磨削磨石320的下表面322定位在比保持面800的上方更靠近水平方向外側。After the axial feed grinding is completed, the grinding assembly 3 is raised in the +Z direction by using the vertical moving assembly 4, so that the first grinding stone 310 and the second grinding stone 320 are moved away in the +Z direction relative to the second workpiece 15. In addition, the second workpiece 15 held by the second holding assembly 8 is moved in the -Y direction by using the horizontal moving assembly 5, so that the second workpiece 15 is moved away in the -Y direction relative to the first grinding stone 310 and the second grinding stone 320. In this way, the lower surface 322 of the second grinding stone 320 can be positioned closer to the horizontal outer side than the upper side of the holding surface 800.

之後,使用進退機構6使第2磨削磨石320比第1磨削磨石310更接近於保持面800,並且使用垂直移動組件4使磨削組件3更朝-Z方向移動,而將第2磨削磨石320的高度位置調節成:第2磨削磨石320的下表面322變得比第2被加工物15的上表面150更低預定的距離。Thereafter, the second grinding stone 320 is brought closer to the holding surface 800 than the first grinding stone 310 by using the advance/retract mechanism 6, and the grinding assembly 3 is moved further toward the -Z direction by using the vertical moving assembly 4, thereby adjusting the height position of the second grinding stone 320 so that the lower surface 322 of the second grinding stone 320 becomes a predetermined distance lower than the upper surface 150 of the second workpiece 15.

然後,使用水平移動組件5使已保持在第2保持組件8之第2被加工物15朝+Y方向移動,而使第2磨削磨石320與第2保持組件8相對地朝深進緩給方向接近。藉此,第2磨削磨石320的下表面322與側面323會接觸於第2被加工物15的上表面150,而對第2被加工物15進行深進緩給磨削。Then, the second workpiece 15 held by the second holding assembly 8 is moved in the +Y direction by the horizontal moving assembly 5, so that the second grinding stone 320 and the second holding assembly 8 are relatively close to each other in the deep feed direction. Thereby, the lower surface 322 and the side surface 323 of the second grinding stone 320 contact the upper surface 150 of the second workpiece 15, and the second workpiece 15 is deep feed ground.

即使是圓板狀的第2被加工物15,也可以藉由選擇具有適合於其形狀之形狀的保持面800的第2保持組件8,並進行軸向進給磨削與深進緩給磨削,而將第2被加工物15磨削加工成均一的厚度。Even if the second workpiece 15 is in the shape of a disk, the second workpiece 15 can be ground to a uniform thickness by selecting the second holding assembly 8 having a holding surface 800 that is suitable for the shape of the second workpiece 15 and performing axial feed grinding and deep feed grinding.

再者,在上述之磨削方法中,亦可在使用第2磨削磨石320來進行第2被加工物15的軸向進給磨削後,使用第1磨削磨石310來進行第2被加工物15的深進緩給磨削。Furthermore, in the above-mentioned grinding method, after the axial feed grinding of the second workpiece 15 is performed using the second grinding stone 320 , the deep feed grinding of the second workpiece 15 may be performed using the first grinding stone 310 .

又,即使在例如於第2被加工物15的上表面150形成有複數個四角形狀的晶片,且該晶片已被樹脂所密封的情形下,也可以同樣地在對該樹脂進行軸向進給磨削後進行深進緩給磨削來使該晶片露出,而在該晶片的露出面形成相同方向的磨削痕跡。Furthermore, even in the case where a plurality of quadrilateral chips are formed on the upper surface 150 of the second workpiece 15 and the chips are sealed with resin, the chips can be exposed by performing axial feed grinding on the resin and then deep feed grinding, thereby forming grinding marks in the same direction on the exposed surface of the chip.

1:磨削裝置 2:保持組件 10:基座 11:支柱 14:被加工物 15:第2被加工物 100:內部基座 140:被加工物的上表面 150:第2被加工物的上表面 21:載台 210:載台的上表面 211,800:保持面 212:長邊 213:短邊 218:測定面 219:測定軌道 22,81:框體 220,810:框體的上表面 23:基台 230:貫通孔 24:支撐柱 26:旋轉組件 27:罩蓋 28:蛇腹 2000,8000:中心 3:磨削組件 30:主軸 31:第1磨削輪 310:第1磨削磨石 311:第1輪基台 312:下表面 313:側面 32:第2磨削輪 320:第2磨削磨石 321:第2輪基台 322:下表面 323:側面 331:第1安裝座 332:第2安裝座 35,45,55:旋轉軸 38:主軸馬達 39:殼體 4:垂直移動組件 40,50:滾珠螺桿 41,51:導軌 42:Z軸馬達 43:升降板 44:支持器 449:導引部 5:水平移動組件 52:Y軸馬達 53:可動板 530:可動板的上表面 6:進退機構 60:空氣供給源 61:切換控制部 62:上下組件 620:桿件 621:圓板活塞 63:汽缸 630:大徑部 631:小徑部 8:第2保持組件 80:吸引部 X,+X,-X,+Y,-Y,Z,+Z,-Z:方向 1: Grinding device 2: Holding assembly 10: Base 11: Pillar 14: Workpiece 15: Second workpiece 100: Inner base 140: Upper surface of workpiece 150: Upper surface of second workpiece 21: Carrier 210: Upper surface of carrier 211,800: Holding surface 212: Long side 213: Short side 218: Measuring surface 219: Measuring track 22,81: Frame 220,810: Upper surface of frame 23: Base 230: Through hole 24: Support column 26: Rotating assembly 27: Cover 28: Bellows 2000,8000: Center 3: Grinding assembly 30: Spindle 31: 1st grinding wheel 310: 1st grinding stone 311: 1st wheel base 312: Lower surface 313: Side surface 32: 2nd grinding wheel 320: 2nd grinding stone 321: 2nd wheel base 322: Lower surface 323: Side surface 331: 1st mounting seat 332: 2nd mounting seat 35,45,55: Rotary shaft 38: Spindle motor 39: Housing 4: Vertical movement assembly 40,50: Ball screw 41,51: Guide rail 42: Z-axis motor 43: Lifting plate 44: Support 449: Guide part 5: Horizontal moving assembly 52: Y-axis motor 53: Movable plate 530: Upper surface of movable plate 6: Advance and retraction mechanism 60: Air supply source 61: Switching control unit 62: Upper and lower assembly 620: Rod 621: Circular piston 63: Cylinder 630: Large diameter part 631: Small diameter part 8: Second holding assembly 80: Suction part X, +X, -X, +Y, -Y, Z, +Z, -Z: Direction

圖1是表示磨削裝置之整體的立體圖。 圖2是表示磨削組件與保持組件的剖面圖。 圖3是表示軸向進給磨削時之保持組件與磨削組件的位置關係的平面圖。 圖4是表示軸向進給磨削時之保持組件與磨削組件的位置關係的平面圖。 圖5是表示軸向進給磨削時之保持組件與磨削組件的位置關係的平面圖。 圖6是表示深進緩給磨削時之保持組件與磨削組件的位置關係的平面圖。 圖7是表示深進緩給磨削時之保持組件與磨削組件的位置關係的平面圖。 圖8是表示深進緩給磨削時之保持組件與磨削組件的位置關係的平面圖。 圖9是表示磨削裝置之整體的立體圖。 FIG. 1 is a perspective view showing the entire grinding device. FIG. 2 is a cross-sectional view showing a grinding assembly and a holding assembly. FIG. 3 is a plan view showing the positional relationship between the holding assembly and the grinding assembly during axial feed grinding. FIG. 4 is a plan view showing the positional relationship between the holding assembly and the grinding assembly during axial feed grinding. FIG. 5 is a plan view showing the positional relationship between the holding assembly and the grinding assembly during axial feed grinding. FIG. 6 is a plan view showing the positional relationship between the holding assembly and the grinding assembly during deep slow feed grinding. FIG. 7 is a plan view showing the positional relationship between the holding assembly and the grinding assembly during deep slow feed grinding. FIG. 8 is a plan view showing the positional relationship between the holding assembly and the grinding assembly during deep slow feed grinding. Figure 9 is a three-dimensional diagram showing the entire grinding device.

1:磨削裝置 1: Grinding device

10:基座 10: Base

11:支柱 11: Pillar

14:被加工物 14: Object to be processed

100:內部基座 100: Internal base

140:被加工物的上表面 140: Upper surface of the workpiece

2:保持組件 2: Keep components

21:載台 21: Carrier

210:載台的上表面 210: Upper surface of the carrier

211:保持面 211: Keep the face

212:長邊 212: Long side

213:短邊 213: Short side

22:框體 22: Frame

220:框體的上表面 220: Upper surface of the frame

23:基台 23: Base

230:貫通孔 230:Through hole

24:支撐柱 24: Support column

26:旋轉組件 26: Rotating assembly

27:罩蓋 27: Cover

28:蛇腹 28: Snake Belly

2000:中心 2000: Center

3:磨削組件 3: Grinding components

30:主軸 30: Main axis

31:第1磨削輪 31: 1st grinding wheel

310:第1磨削磨石 310: First grinding stone

311:第1輪基台 311: 1st round base

312:下表面 312: Lower surface

313:側面 313: Side

32:第2磨削輪 32: 2nd grinding wheel

320:第2磨削磨石 320: Second grinding stone

321:第2輪基台 321: 2nd round base

322:下表面 322: Lower surface

323:側面 323: Side

332:第2安裝座 332: 2nd mounting seat

35,45,55:旋轉軸 35,45,55: Rotation axis

38:主軸馬達 38: Spindle motor

39:殼體 39: Shell

4:垂直移動組件 4: Vertical movement assembly

40,50:滾珠螺桿 40,50: Ball screw

41,51:導軌 41,51:Guide rails

42:Z軸馬達 42: Z-axis motor

43:升降板 43: Lifting plate

44:支持器 44:Supporter

5:水平移動組件 5: Horizontal movement component

52:Y軸馬達 52:Y-axis motor

53:可動板 53: Movable plate

530:可動板的上表面 530: Upper surface of movable plate

6:進退機構 6: Advance and retreat mechanism

60:空氣供給源 60: Air supply source

61:切換控制部 61: Switching control unit

+X,-X,+Y,-Y,+Z,-Z:方向 +X,-X,+Y,-Y,+Z,-Z: Direction

Claims (3)

一種磨削方法,是使用磨削裝置來磨削被加工物,前述磨削裝置具備:保持組件,可將被加工物保持在保持面且以該保持面的中心為軸來旋轉;磨削組件,將圓環狀的第1磨削磨石、與圍繞該第1磨削磨石之直徑的同心圓環狀的第2磨削磨石裝設於主軸的前端;進退機構,選擇性地讓該第1磨削磨石或該第2磨削磨石接近於該保持面;水平移動組件,使該保持組件與該磨削組件相對地在水平方向上移動;及垂直移動組件,使該保持組件與該磨削組件相對地在相對於該保持面垂直的方向上移動,前述磨削方法是由以下步驟所構成: 軸向進給磨削步驟,在如以該第1磨削磨石或該第2磨削磨石之任一種的該磨削磨石的下表面通過該保持面的中心之該磨削磨石與該保持面之水平位置的關係下,使該磨削磨石朝接近於該保持面的下方向移動,而對已保持在該保持面之被加工物進行軸向進給磨削;及 深進緩給磨削步驟,讓在該軸向進給磨削步驟中未使用之另一種的該磨削磨石位於比該保持面的上方更靠近水平方向外側,且將該磨削磨石的下表面定位得比被加工物的上表面更低預定的距離,並使該磨削磨石與該保持組件朝相互的水平方向的相對移動方向即深進緩給方向接近,而以該磨削磨石的下表面與側面對該被加工物進行深進緩給磨削, 其中被加工物為多角形,且該保持面為沿著被加工物的形狀之形狀, 該保持組件在上表面配置有複數個該保持面, 該軸向進給磨削步驟是定位成該磨削磨石通過該上表面的中心,並以該上表面的中心為軸來使該上表面旋轉, 複數個該保持面在正交於該深進緩給方向之水平的方向上排列並配置, 該深進緩給磨削步驟讓該保持面以在正交於該深進緩給方向之水平的方向上排列之狀態固定成不旋轉,並使已配置在比該保持組件的該上表面更靠近水平方向外側之該磨削磨石與該保持組件相對地朝該深進緩給方向接近,而以該磨削磨石的下表面與側面來磨削複數個被加工物。 A grinding method is to use a grinding device to grind a workpiece, the grinding device having: a holding assembly that can hold the workpiece on a holding surface and rotate around the center of the holding surface; a grinding assembly that installs a first grinding stone in an annular shape and a second grinding stone in an annular shape with a diameter concentric with the first grinding stone at the front end of a spindle; an advance and retreat mechanism that selectively allows the first grinding stone or the second grinding stone to approach the holding surface; a horizontal moving assembly that moves the holding assembly and the grinding assembly in a horizontal direction relative to each other; and a vertical moving assembly that moves the holding assembly and the grinding assembly in a direction perpendicular to the holding surface relative to each other. The grinding method is composed of the following steps: An axial feed grinding step, in which the lower surface of either the first grinding stone or the second grinding stone passes through the center of the holding surface, and the grinding stone is moved downward close to the holding surface, thereby axially feeding and grinding the workpiece held on the holding surface; and The deep feed slow feed grinding step is to position the other grinding stone not used in the axial feed grinding step closer to the horizontal outer side than the upper side of the holding surface, and to position the lower surface of the grinding stone a predetermined distance lower than the upper surface of the workpiece, and to make the grinding stone and the holding assembly approach each other in the relative horizontal movement direction, i.e., the deep feed slow feed direction, and to perform deep feed slow feed grinding on the workpiece with the lower surface and side surface of the grinding stone, wherein the workpiece is a polygon, and the holding surface is a shape along the shape of the workpiece, the holding assembly is provided with a plurality of the holding surfaces on the upper surface, the axial feed grinding step is to position the grinding stone so that it passes through the center of the upper surface, and to rotate the upper surface with the center of the upper surface as the axis, The plurality of holding surfaces are arranged and configured in a horizontal direction orthogonal to the depth feed direction. The depth feed grinding step allows the holding surfaces to be fixed in a state of being arranged in a horizontal direction orthogonal to the depth feed direction so as not to rotate, and allows the grinding stone arranged on the outer side of the holding assembly in the horizontal direction to approach the holding assembly relative to the depth feed direction, and grinds the plurality of workpieces with the lower surface and side surface of the grinding stone. 如請求項1之磨削方法,其中該保持面是具有長邊與短邊的長方形, 該長邊在該深進緩給方向上延伸且複數個該保持面在正交於該深進緩給方向之水平的方向上排列。 A grinding method as claimed in claim 1, wherein the retaining surface is a rectangle having a long side and a short side, the long side extends in the depth feed direction and a plurality of the retaining surfaces are arranged in a horizontal direction orthogonal to the depth feed direction. 一種磨削方法,是使用磨削裝置來磨削被加工物,前述磨削裝置具備:保持組件,可將被加工物保持在保持面且以該保持面的中心為軸來旋轉;磨削組件,將圓環狀的第1磨削磨石、與圍繞該第1磨削磨石之直徑的同心圓環狀的第2磨削磨石裝設於主軸的前端;進退機構,選擇性地讓該第1磨削磨石或該第2磨削磨石接近於該保持面;水平移動組件,使該保持組件與該磨削組件相對地在水平方向上移動;及垂直移動組件,使該保持組件與該磨削組件相對地在相對於該保持面垂直的方向上移動,前述磨削方法是由以下步驟所構成: 軸向進給磨削步驟,在如以該第1磨削磨石或該第2磨削磨石之任一種的該磨削磨石的下表面通過該保持面的中心之該磨削磨石與該保持面之水平位置的關係下,使該磨削磨石朝接近於該保持面的下方向移動,而對已保持在該保持面之被加工物進行軸向進給磨削;及 深進緩給磨削步驟,讓在該軸向進給磨削步驟中未使用之另一種的該磨削磨石位於比該保持面的上方更靠近水平方向外側,且將該磨削磨石的下表面定位得比被加工物的上表面更低預定的距離,並使該磨削磨石與該保持組件朝相互的水平方向的相對移動方向即深進緩給方向接近,而以該磨削磨石的下表面與側面對該被加工物進行深進緩給磨削, 其中被加工物為多角形,且該保持面為沿著被加工物的形狀之形狀, 在該軸向進給磨削步驟中是使用該第1磨削磨石, 在該深進緩給磨削步驟中是使用直徑比該第1磨削磨石更大的該第2磨削磨石, 該保持面是具有長邊與短邊的長方形, 該長邊在該深進緩給方向上延伸且複數個該保持面在正交於該深進緩給方向之水平的方向上排列。 A grinding method is to use a grinding device to grind a workpiece, the grinding device having: a holding assembly that can hold the workpiece on a holding surface and rotate around the center of the holding surface; a grinding assembly that installs a first grinding stone in an annular shape and a second grinding stone in an annular shape with a diameter concentric with the first grinding stone at the front end of a spindle; an advance and retreat mechanism that selectively allows the first grinding stone or the second grinding stone to approach the holding surface; a horizontal moving assembly that moves the holding assembly and the grinding assembly in a horizontal direction relative to each other; and a vertical moving assembly that moves the holding assembly and the grinding assembly in a direction perpendicular to the holding surface relative to each other. The grinding method is composed of the following steps: An axial feed grinding step, in which the lower surface of either the first grinding stone or the second grinding stone passes through the center of the holding surface, and the grinding stone is moved downward close to the holding surface, thereby axially feeding and grinding the workpiece held on the holding surface; and In the deep feed slow feed grinding step, the grinding stone not used in the axial feed grinding step is positioned closer to the horizontal outer side than the upper side of the holding surface, and the lower surface of the grinding stone is positioned a predetermined distance lower than the upper surface of the workpiece, and the grinding stone and the holding assembly are moved in the relative horizontal direction, i.e., the deep feed slow feed direction, and the workpiece is deep fed slow feed ground with the lower surface and side surface of the grinding stone, wherein the workpiece is a polygon, and the holding surface is a shape along the shape of the workpiece, the first grinding stone is used in the axial feed grinding step, the second grinding stone having a larger diameter than the first grinding stone is used in the deep feed slow feed grinding step, The holding surface is a rectangle having a long side and a short side, the long side extending in the depth buffering direction and a plurality of the holding surfaces are arranged in a horizontal direction orthogonal to the depth buffering direction.
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