TWI878013B - Plating solution - Google Patents
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- TWI878013B TWI878013B TW113103737A TW113103737A TWI878013B TW I878013 B TWI878013 B TW I878013B TW 113103737 A TW113103737 A TW 113103737A TW 113103737 A TW113103737 A TW 113103737A TW I878013 B TWI878013 B TW I878013B
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Abstract
本發明提供一種能夠實現高光澤度鍍敷之鍍敷液。本發明係一種鍍敷液,其包含:金屬離子;及PEI化合物(L),其具有聚伸乙基亞胺主骨架,且具有下述式(LX)所表示之結構部分LX、下述式(LY)所表示之結構部分LY及下述式(LH)所表示之結構部分LH, [化1] (式(LX)中,X為下述式(X1)所表示之結構部分X1,i為1以上之整數) [化2] (式(LY)中,Y為下述式(Y1)所表示之結構部分Y1,j為1以上之整數) [化3] (式(LH)中,k為0或1以上之整數) [化4] (式(X1)中,A為C或S,E為一價金屬離子、H、甲基、乙基或烯丙基,l為1~6之整數,m為1或2) [化5] (式(Y1)中,G為CH 2或CH(OH),n為0或4,Q 1及Q 2分別為H、拉電子基或推電子基)。 The present invention provides a coating solution capable of achieving high gloss coating. The present invention is a coating solution comprising: metal ions; and a PEI compound (L) having a polyethyleneimine main skeleton and having a structural part LX represented by the following formula (LX), a structural part LY represented by the following formula (LY), and a structural part LH represented by the following formula (LH), [Chemical 1] (In formula (LX), X is a structural part X1 represented by the following formula (X1), and i is an integer greater than or equal to 1) (In formula (LY), Y is a structural part Y1 represented by the following formula (Y1), and j is an integer greater than or equal to 1) (In formula (LH), k is an integer greater than 0 or 1) [Formula 4] (In formula (X1), A is C or S, E is a monovalent metal ion, H, methyl, ethyl or allyl, l is an integer from 1 to 6, and m is 1 or 2) [Chemistry 5] (In formula (Y1), G is CH2 or CH(OH), n is 0 or 4, Q1 and Q2 are H, an electron-withdrawing group or an electron-donating group, respectively).
Description
本發明係關於一種鍍敷液。更具體而言係關於一種能夠實現高光澤度鍍敷之鍍敷液。The present invention relates to a coating liquid, and more particularly to a coating liquid capable of achieving high gloss coating.
一般而言,為了對樹脂、金屬、玻璃、陶瓷等基材賦予裝飾性等外觀特性或耐蝕性等功能性,進行鍍敷處理作為表面處理技術之一。其中,電解鍍銅具有高延展性,可防止因溫度變化所伴有之素材之伸縮而產生裂痕,因此其被用作基底鍍敷。於裝飾用途中,要求藉由蝕刻來使粗化之基材表面或源於素材之凹凸平滑,或者要求高光澤性。Generally speaking, plating is used as one of the surface treatment technologies to give decorative appearance or corrosion resistance to substrates such as resins, metals, glass, and ceramics. Among them, electrolytic copper has high ductility and can prevent cracks caused by the expansion and contraction of the material due to temperature changes, so it is used as a base plating. In decorative applications, it is required to make the roughened substrate surface or the unevenness caused by the material smooth by etching, or high gloss is required.
例如,專利文獻1中揭示有一種為了獲得充分之光澤外觀而使用詹納斯綠B等鹼性染料作為平滑劑之電解鍍銅鍍敷液。又,亦揭示有一種如專利文獻2之未使用鹼性染料作為平滑劑之電解鍍銅鍍敷液。專利文獻2中揭示有一種使用苄基氯與至少1種聚伸乙基亞胺之至少1種芳香族反應生成物之電解鍍銅鍍敷液。 [先前技術文獻] [專利文獻] For example, Patent Document 1 discloses an electrolytic copper plating solution that uses an alkaline dye such as Janus Green B as a lubricant in order to obtain a sufficient glossy appearance. In addition, an electrolytic copper plating solution that does not use an alkaline dye as a lubricant, such as Patent Document 2, is also disclosed. Patent Document 2 discloses an electrolytic copper plating solution that uses at least one aromatic reaction product of benzyl chloride and at least one polyethyleneimine. [Prior Art Document] [Patent Document]
[專利文獻1]日本專利特表2020-536168號公報 [專利文獻2]日本專利特表2020-523481號公報 [Patent Document 1] Japanese Patent List No. 2020-536168 [Patent Document 2] Japanese Patent List No. 2020-523481
[發明所欲解決之問題][The problem the invention is trying to solve]
然而,於裝飾用鍍敷製品中,期望光澤度更高之鍍敷。本發明係鑒於此種實際情況而完成者,其目的在於提供一種不使用先前使用之鹼性染料而能夠實現光澤度更高之鍍敷之鍍敷液。 [解決問題之技術手段] However, in decorative coated products, a coating with a higher gloss is desired. The present invention is completed in view of this actual situation, and its purpose is to provide a coating liquid that can achieve a coating with a higher gloss without using the alkaline dye used previously. [Technical means to solve the problem]
本發明人等進行了潛心研究,結果發現,藉由包含特定化合物作為平滑劑,能夠實現高光澤度之鍍敷,從而完成了本發明。The inventors of the present invention have conducted intensive research and found that a coating with high gloss can be achieved by including a specific compound as a smoothing agent, thereby completing the present invention.
(1)本發明之鍍敷液包含:金屬離子;及PEI化合物(L),其具有聚伸乙基亞胺主骨架,且具有下述式(LX)所表示之結構部分LX、下述式(LY)所表示之結構部分LY及下述式(LH)所表示之結構部分LH, [化1] (式(LX)中,X為下述式(X1)所表示之結構部分X1,i為1以上之整數) [化2] (式(LY)中,Y為下述式(Y1)所表示之結構部分Y1,j為1以上之整數) [化3] (式(LH)中,k為0或1以上之整數) [化4] (式(X1)中,A為C或S,E為一價金屬離子、H、甲基、乙基或烯丙基,l為1~6之整數,m為1或2) [化5] (式(Y1)中,G為CH 2或CH(OH),n為0或4,Q 1及Q 2分別為H、拉電子基或推電子基)。 (1) The coating solution of the present invention comprises: metal ions; and a PEI compound (L) having a polyethyleneimine main skeleton and having a structural portion LX represented by the following formula (LX), a structural portion LY represented by the following formula (LY) and a structural portion LH represented by the following formula (LH), [Chemical 1] (In formula (LX), X is a structural part X1 represented by the following formula (X1), and i is an integer greater than or equal to 1) (In formula (LY), Y is a structural part Y1 represented by the following formula (Y1), and j is an integer greater than or equal to 1) (In formula (LH), k is an integer greater than 0 or 1) [Formula 4] (In formula (X1), A is C or S, E is a monovalent metal ion, H, methyl, ethyl or allyl, l is an integer from 1 to 6, and m is 1 or 2) [Chemistry 5] (In formula (Y1), G is CH2 or CH(OH), n is 0 or 4, Q1 and Q2 are H, an electron-withdrawing group or an electron-donating group, respectively).
(2) (1)之鍍敷液較佳為基於上述結構部分LX之i、上述結構部分LY之j及上述結構部分LH之k算出之[i/(i+j+k)]×100為20~90%。(2) The coating solution of (1) is preferably such that [i/(i+j+k)]×100 calculated based on i of the structure portion LX, j of the structure portion LY and k of the structure portion LH is 20 to 90%.
(3) (1)或(2)之鍍敷液較佳為上述金屬離子包含銅離子。 [發明之效果] (3) The plating solution of (1) or (2) is preferably such that the metal ions mentioned above include copper ions. [Effect of the invention]
根據本發明,可提供一種能夠實現高光澤度鍍敷之鍍敷液。According to the present invention, a coating liquid capable of achieving high gloss coating can be provided.
以下,對本發明之實施方式進行說明。The following describes the implementation of the present invention.
[鍍敷液] 本發明之鍍敷液至少包含金屬離子及PEI化合物(L)。本發明之鍍敷液可進而包含酸、鹵化物離子、光澤劑、界面活性劑等。 [Coating solution] The coating solution of the present invention contains at least metal ions and PEI compound (L). The coating solution of the present invention may further contain acid, halogenide ions, brightener, surfactant, etc.
(金屬離子) 作為構成本發明之鍍敷液之金屬離子,並無特別限定,例如可例舉:銅、錫、鈦、鉻、錳、鐵、鎳、鈷、鋅、銀、金、鉑、鈀、銦、鉬、鎢、鉛、錸、銠、釕、鋨、銥、鉍、鋁等之離子。於本發明之鍍敷液中,較佳為金屬離子包含銅離子。 (Metal ions) The metal ions constituting the plating solution of the present invention are not particularly limited, and examples thereof include ions of copper, tin, titanium, chromium, manganese, iron, nickel, cobalt, zinc, silver, gold, platinum, palladium, indium, molybdenum, tungsten, lead, ruthenium, rhodium, ruthenium, nirconium, iridium, bismuth, and aluminum. In the plating solution of the present invention, it is preferred that the metal ions include copper ions.
本發明之鍍敷液之金屬離子係通常將金屬鹽溶解於水等溶劑中而獲得。本發明之鍍敷液較佳為將包含銅之金屬鹽溶解於水中而獲得者。作為包含銅之金屬鹽,並無特別限定,例如可例舉:硫酸銅、焦磷酸銅、乙酸銅等。該等之中,較佳為硫酸銅。The metal ions of the plating solution of the present invention are usually obtained by dissolving a metal salt in a solvent such as water. The plating solution of the present invention is preferably obtained by dissolving a metal salt containing copper in water. The metal salt containing copper is not particularly limited, and examples thereof include copper sulfate, copper pyrophosphate, copper acetate, etc. Among these, copper sulfate is preferred.
關於使用硫酸銅之情形,較佳為硫酸銅五水合物之情形,本發明之鍍敷液中之硫酸銅五水合物之含量並無特別限定,例如為50~300 g/L,較佳為100~280 g/L。When copper sulfate is used, copper sulfate pentahydrate is preferred. The content of copper sulfate pentahydrate in the plating solution of the present invention is not particularly limited, and is, for example, 50 to 300 g/L, preferably 100 to 280 g/L.
(平滑劑) 於本發明中,至少使用PEI化合物(L)作為平滑劑。除PEI化合物(L)以外,本發明亦可添加1種以上之公知之平滑劑。 (Smoothing agent) In the present invention, at least PEI compound (L) is used as a smoothing agent. In addition to PEI compound (L), the present invention may also add one or more known smoothing agents.
<PEI化合物> PEI化合物(L)具有聚伸乙基亞胺主骨架,且具有特定結構部分。具體而言,PEI化合物(L)具有聚伸乙基亞胺主骨架,且具有下述之下述式(LX)所表示之結構部分LX、下述式(LY)所表示之結構部分LY及下述式(LH)所表示之結構部分LH。關於結構部分LX、結構部分LY及結構部分LH,將於下文敍述,分別為至少具有[-(CH 2) 2-N-]骨架之結構部分。 <PEI compound> The PEI compound (L) has a polyethyleneimine main skeleton and has a specific structural part. Specifically, the PEI compound (L) has a polyethyleneimine main skeleton and has a structural part LX represented by the following formula (LX), a structural part LY represented by the following formula (LY), and a structural part LH represented by the following formula (LH). The structural part LX, the structural part LY, and the structural part LH will be described below, and are structural parts having at least a [-(CH 2 ) 2 -N-] skeleton.
此處,聚伸乙基亞胺主骨架意指聚伸乙基亞胺(PEI,polyethyleneimine)之主骨架。PEI化合物(L)具有聚伸乙基亞胺主骨架上鍵結之氫原子H經下述X及Y取代之結構。聚伸乙基亞胺主骨架例如為網狀、支鏈狀或直鏈狀之聚伸乙基亞胺之主骨架。此處,網狀聚伸乙基亞胺意指如下聚伸乙基亞胺:於支鏈狀聚伸乙基亞胺中,分支部分之一部分或全部與其他分支部分或主骨架鍵結,藉此變為網狀。將網狀聚伸乙基亞胺之一例示於下述式(NP)。Here, the polyethyleneimine main skeleton means the main skeleton of polyethyleneimine (PEI). The PEI compound (L) has a structure in which the hydrogen atom H bonded to the polyethyleneimine main skeleton is substituted by the following X and Y. The polyethyleneimine main skeleton is, for example, a main skeleton of polyethyleneimine in a network, branched chain or straight chain. Here, the network polyethyleneimine means a polyethyleneimine in which a part or all of the branch parts in the branched chain polyethyleneimine are bonded to other branch parts or the main skeleton, thereby becoming a network. An example of a network polyethyleneimine is shown in the following formula (NP).
[化 66] [Chemistry 66]
PEI化合物(L)較佳為聚伸乙基亞胺主骨架為網狀或支鏈狀之聚伸乙基亞胺之主骨架。The PEI compound (L) is preferably a polyethyleneimine main skeleton having a network or branched structure.
PEI化合物(L)係如下化合物:具有聚伸乙基亞胺主骨架之聚伸乙基亞胺之數量平均分子量例如為300~70000,較佳為1100~10000,更佳為1100~1800。當聚伸乙基亞胺之數量平均分子量處於上述範圍內時,易於獲得光澤度較高之金屬鍍敷皮膜,因此較佳。此處,具有聚伸乙基亞胺主骨架之聚伸乙基亞胺意指聚伸乙基亞胺主骨架上鍵結之原子僅為氫原子H之情形之聚伸乙基亞胺。The PEI compound (L) is a compound as follows: the number average molecular weight of polyethyleneimine having a polyethyleneimine main skeleton is, for example, 300 to 70,000, preferably 1,100 to 10,000, and more preferably 1,100 to 1,800. When the number average molecular weight of polyethyleneimine is within the above range, it is easy to obtain a metal plating film with a higher gloss, so it is preferred. Here, polyethyleneimine having a polyethyleneimine main skeleton means polyethyleneimine in which the atoms bonded to the polyethyleneimine main skeleton are only hydrogen atoms H.
PEI化合物(L)大多係藉由使具有聚伸乙基亞胺主骨架之聚伸乙基亞胺、結構部分LX之X之原料、及結構部分LY之Y之原料反應而獲得。於此情形時,在對作為原料之聚伸乙基亞胺加成結構部分LX之X之原料及結構部分LY之Y之原料時,作為原料之聚伸乙基亞胺不發生聚合,PEI化合物(L)之分子量相應地增加結構部分LX之X之原料及結構部分LY之Y之原料的加成量。PEI compound (L) is often obtained by reacting polyethyleneimine having a polyethyleneimine main skeleton, a raw material of X of the structural part LX, and a raw material of Y of the structural part LY. In this case, when the raw material of X of the structural part LX and the raw material of Y of the structural part LY are added to the polyethyleneimine as a raw material, the polyethyleneimine as a raw material does not polymerize, and the molecular weight of the PEI compound (L) increases accordingly by the amount of the raw material of X of the structural part LX and the raw material of Y of the structural part LY added.
於本發明中,將PEI化合物(L)中之在聚伸乙基亞胺主骨架上鍵結之氫原子H經X取代後之部分稱為結構部分LX。又,將PEI化合物(L)中之與聚伸乙基亞胺主骨架鍵結之氫原子H經Y取代後之部分稱為結構部分LY。進而,將PEI化合物(L)中之在聚伸乙基亞胺主骨架上鍵結之氫原子H保持原樣存在之部分稱為結構部分LH。再者,PEI化合物(L)至少包含結構部分LX及結構部分LY,且視需要包含結構部分LH。In the present invention, the portion of the PEI compound (L) in which the hydrogen atom H bonded to the polyethyleneimine main skeleton is replaced by X is referred to as the structural portion LX. In addition, the portion of the PEI compound (L) in which the hydrogen atom H bonded to the polyethyleneimine main skeleton is replaced by Y is referred to as the structural portion LY. Furthermore, the portion of the PEI compound (L) in which the hydrogen atom H bonded to the polyethyleneimine main skeleton remains intact is referred to as the structural portion LH. Furthermore, the PEI compound (L) comprises at least the structural portion LX and the structural portion LY, and optionally comprises the structural portion LH.
[結構部分LX] 結構部分LX為下述式(LX)所表示之結構部分。 [Structural part LX] The structural part LX is a structural part represented by the following formula (LX).
[化 77] [Chemistry 77]
式(LX)中,X為下述式(X1)所表示之結構部分X1,i為1以上之整數。In the formula (LX), X is a structural part X1 represented by the following formula (X1), and i is an integer greater than or equal to 1.
[化 88] [Chemistry 88]
式(X1)中,A為C或S,E為一價金屬離子、H、甲基、乙基或烯丙基,l為1~6之整數,m為1或2。E較佳為一價金屬離子、H、或烯丙基。l較佳為3~4之整數。作為一價金屬離子,例如可例舉:Li、Na、K、Rb、Cs、Fr等。In formula (X1), A is C or S, E is a monovalent metal ion, H, methyl, ethyl or allyl, l is an integer of 1 to 6, and m is 1 or 2. E is preferably a monovalent metal ion, H or allyl. l is preferably an integer of 3 to 4. Examples of the monovalent metal ion include Li, Na, K, Rb, Cs, and Fr.
作為結構部分X1所表示之結構部分之較佳實施方式,例如可例舉下述式(X11)所表示之結構部分X111、X112、X113及X114所表示之結構部分。Preferred embodiments of the structural moiety represented by the structural moiety X1 include, for example, structural moieties X111, X112, X113, and X114 represented by the following formula (X11).
[化 99] [Chemistry 99]
結構部分X111、X112及X114之上端部分對應於結構部分X1之左端部分。結構部分X113之左端部分對應於結構部分X1之左端部分。The upper ends of the structural parts X111, X112 and X114 correspond to the left end of the structural part X1. The left end of the structural part X113 corresponds to the left end of the structural part X1.
[結構部分LY] 結構部分LY為下述式(LY)所表示之結構部分。 [Structural part LY] The structural part LY is a structural part represented by the following formula (LY).
[化 1010] [Chemical 1010]
式(LY)中,Y為下述式(Y1)所表示之結構部分Y1,j為1以上之整數。In the formula (LY), Y is a structural part Y1 represented by the following formula (Y1), and j is an integer greater than or equal to 1.
[化11] 式(Y1)中,G為CH 2或CH(OH),n為0或4,Q 1及Q 2分別為H、拉電子基或推電子基。於n為0之情形時,結構部分Y1之芳基為包含1個苯環之結構。於n為4之情形時,結構部分Y1之芳基為包含1個萘環之結構。 [Chemistry 11] In formula (Y1), G is CH2 or CH(OH), n is 0 or 4, Q1 and Q2 are H, an electron-withdrawing group or an electron-donating group, respectively. When n is 0, the aryl group of the structural part Y1 is a structure containing one benzene ring. When n is 4, the aryl group of the structural part Y1 is a structure containing one naphthyl ring.
再者,式(Y1)中,結構部分Y1之芳基之Q 1及Q 2分別為H、拉電子基或推電子基,並無特別限定。作為拉電子基,例如可例舉:氯基-Cl、氟基-F、硝基-NO 2、羥基-OH等。作為推電子基,例如可例舉:甲基-CH 3、甲氧基-OCH 3等。於Q 1及Q 2為除氫原子H以外之取代基之情形時,作為自聚伸乙基亞胺主骨架上鍵結之部分觀察到之取代基之取代位置,例如可例舉:鄰位、間位、對位等。 Furthermore, in formula (Y1), Q1 and Q2 of the aryl group of the structural part Y1 are H, an electron-withdrawing group or an electron-pushing group, respectively, and are not particularly limited. Examples of the electron-withdrawing group include chloro -Cl, fluoro -F, nitro -NO2 , hydroxyl -OH, etc. Examples of the electron-pushing group include methyl -CH3 , methoxy -OCH3 , etc. When Q1 and Q2 are substituents other than hydrogen atom H, the substitution position of the substituent observed from the portion bonded to the polyethyleneimine main skeleton may include ortho, meta, para, etc.
作為結構部分Y1所表示之結構部分之較佳實施方式,例如可例舉下述式(Y11)所表示之結構部分Y111、Y112、Y113及Y114所表示之結構部分。Preferred embodiments of the structural moiety represented by the structural moiety Y1 include, for example, structural moieties Y111, Y112, Y113, and Y114 represented by the following formula (Y11).
[化 1112] [Chemistry 1112]
結構部分Y111、Y112及Y113之上端部分對應於結構部分Y1之上端部分。結構部分Y114之右側上端部分對應於結構部分Y1之上端部分。The upper end portions of the structural portions Y111, Y112 and Y113 correspond to the upper end portion of the structural portion Y1. The upper end portion of the right side of the structural portion Y114 corresponds to the upper end portion of the structural portion Y1.
由於式(Y1)中之Q 1及Q 2分別為H、拉電子基或推電子基,故而式(Y11)所表示之結構部分Y111、Y112、Y113及Y114之芳基中可鍵結有除氫原子H以外之取代基。於結構部分Y111、Y112、Y113及Y114之芳基之Q 1及Q 2為除氫原子H以外之取代基之情形時,取代基之種類、數量、及位置並無特別限制,例如可例舉:氯基-Cl、氟基-F、甲基-CH 3、甲氧基-OCH 3等。 Since Q1 and Q2 in formula (Y1) are H, an electron-withdrawing group or an electron-donating group, respectively, the aryl groups of the structural moieties Y111, Y112, Y113 and Y114 represented by formula (Y11) may be bonded with a substituent other than hydrogen atom H. When Q1 and Q2 of the aryl groups of the structural moieties Y111, Y112, Y113 and Y114 are substituents other than hydrogen atom H, the type, amount and position of the substituent are not particularly limited, and examples thereof include chloro -Cl, fluoro -F, methyl -CH 3 , methoxy -OCH 3 and the like.
作為式(Y1)中之Q 1及Q 2為除氫原子H以外之取代基之結構部分之較佳實施方式,例如可例舉下述式(Y11A)所表示之各結構部分。 Preferred embodiments in which Q1 and Q2 in formula (Y1) are structural moieties that are substituents other than hydrogen atom H include, for example, the structural moieties represented by the following formula (Y11A).
[化13] [Chemistry 13]
結構部分Y111-Cl、Y111-F、Y111-CH3及Y111-OCH3之上端部分對應於結構部分Y1之上端部分。The upper end portions of the structural portions Y111-Cl, Y111-F, Y111-CH3 and Y111-OCH3 correspond to the upper end portion of the structural portion Y1.
作為式(Y1)中之Q 1及Q 2為除氫原子H以外之取代基之結構部分之尤佳實施方式,例如可例舉下述式(Y11B)所表示之各結構部分。 As a particularly preferred embodiment in which Q1 and Q2 in formula (Y1) are a structural moiety that is a substituent other than a hydrogen atom H, for example, each structural moiety represented by the following formula (Y11B) can be exemplified.
[化 1214] [Chemistry 1214]
結構部分Y111-oCl、Y111-pF、Y111-mCH3及Y111-mOCH3之上端部分對應於結構部分Y1之上端部分。The upper end portions of the structural portions Y111-oCl, Y111-pF, Y111-mCH3 and Y111-mOCH3 correspond to the upper end portion of the structural portion Y1.
結構部分Y111-oCl(-CH 2C 6H 4Cl)、結構部分Y111-pF(-CH 2C 6H 4F)、結構部分Y111-mCH3(-CH 2C 6H 4CH 3)、及結構部分Y111-mOCH3(-CH 2C 6H 4OCH 3)分別如下:於結構部分Y111之芳基(苄基)中,式(Y1)中之Q 1及Q 2中之一者為H,另一者為鄰位之Cl、對位之F、間位之CH 3、間位之OCH 3。 The structural portion Y111-oCl (-CH 2 C 6 H 4 Cl), the structural portion Y111-pF (-CH 2 C 6 H 4 F), the structural portion Y111-mCH3 (-CH 2 C 6 H 4 CH 3 ), and the structural portion Y111-mOCH3 (-CH 2 C 6 H 4 OCH 3 ) are respectively as follows: in the aryl group (benzyl group) of the structural portion Y111, one of Q 1 and Q 2 in the formula (Y1) is H, and the other is Cl at the ortho position, F at the para position, CH 3 at the meta position, or OCH 3 at the meta position.
[結構部分LH] 結構部分LH為下述式(LH)所表示之結構部分。 [Structural part LH] The structural part LH is a structural part represented by the following formula (LH).
[化 1315] [Chemistry 1315]
式(LH)中,k為0或1以上之整數。再者,於k為0之情形時,PEI化合物(L)為不含結構部分LH之化合物。In formula (LH), k is an integer greater than or equal to 0 or 1. When k is 0, the PEI compound (L) is a compound that does not contain the structural part LH.
關於PEI化合物(L),基於上述結構部分LX之i、上述結構部分LY之j、及上述結構部分LH之k算出之[i/(i+j+k)]×100為20~90%,較佳為30~80%。當[i/(i+j+k)]×100處於上述範圍內時,易於獲得光澤度較高之金屬鍍敷皮膜,因此較佳。再者,上述[i/(i+j+k)]×100例如可藉由NMR(Nuclear Magnetic Resonance,核磁共振)等進行測定。Regarding the PEI compound (L), [i/(i+j+k)]×100 calculated based on i of the above structural part LX, j of the above structural part LY, and k of the above structural part LH is 20 to 90%, preferably 30 to 80%. When [i/(i+j+k)]×100 is within the above range, it is easy to obtain a metal plating film with higher gloss, which is preferred. Furthermore, the above [i/(i+j+k)]×100 can be measured by, for example, NMR (Nuclear Magnetic Resonance) or the like.
本發明之鍍敷液例如包含PEI化合物(L)0.5~50 mg/L,較佳為包含1~30 mg/L。當鍍敷液中之PEI化合物(L)之濃度處於上述範圍內時,易於獲得光澤度較高之金屬鍍敷皮膜,因此較佳。The coating solution of the present invention contains, for example, 0.5-50 mg/L of PEI compound (L), preferably 1-30 mg/L. When the concentration of PEI compound (L) in the coating solution is within the above range, it is easy to obtain a metal coating film with higher gloss, which is preferred.
(酸) 本發明之鍍敷液可包含酸。酸並無特別限定,例如可與鍍敷液之組成或鍍敷對象相應地使用無機酸及/或有機酸中之所需者。作為無機酸,例如可例舉:以硫酸、硝酸、鹽酸為代表之氫鹵酸;以磷酸、氯酸為代表之含氧酸等。作為有機酸,例如可例舉:甲磺酸、丙磺酸等烷磺酸類;羥乙磺酸、丙醇磺酸等烷醇磺酸類;檸檬酸、酒石酸、甲酸等脂肪族或芳香族羧酸等。其中,於鍍敷液之金屬離子之原料為硫酸銅之情形時,較佳為包含硫酸作為酸。 (Acid) The plating solution of the present invention may contain an acid. The acid is not particularly limited. For example, inorganic acids and/or organic acids may be used in accordance with the composition of the plating solution or the plating object. Examples of inorganic acids include: hydrohalogen acids represented by sulfuric acid, nitric acid, and hydrochloric acid; oxygen-containing acids represented by phosphoric acid and chloric acid. Examples of organic acids include: alkanesulfonic acids such as methanesulfonic acid and propanesulfonic acid; alkanolsulfonic acids such as hydroxyethanesulfonic acid and propanolsulfonic acid; aliphatic or aromatic carboxylic acids such as citric acid, tartaric acid, and formic acid. Among them, when the raw material of the metal ion of the plating solution is copper sulfate, it is preferred to include sulfuric acid as the acid.
於酸為硫酸之情形時,硫酸之含量並無特別限定,例如為20~200 g/L,較佳為30~150 g/L。When the acid is sulfuric acid, the content of the sulfuric acid is not particularly limited, and is, for example, 20 to 200 g/L, preferably 30 to 150 g/L.
(鹵化物離子) 為了進行光澤金屬鍍敷或整平,本發明之鍍敷液亦可包含鹵化物離子。鹵化物離子並無特別限定,例如可例舉:氯、溴、碘等。其中,較佳為氯化物離子。 (Halide ions) In order to perform glossy metal plating or leveling, the plating solution of the present invention may also contain halide ions. The halide ions are not particularly limited, and examples thereof include chlorine, bromine, iodine, etc. Among them, chloride ions are preferred.
於鹵化物離子為氯化物離子之情形時,氯化物離子之含量並無特別限定,例如為10~120 mg/L,較佳為20~100 mg/L。When the halogenide ions are chloride ions, the content of chloride ions is not particularly limited, and is, for example, 10 to 120 mg/L, preferably 20 to 100 mg/L.
(光澤劑) 本發明之鍍敷液可包含光澤劑。光澤劑並無特別限定,例如可例舉:苯甲醛、鄰氯苯甲醛、2,4,6-三氯苯甲醛、間氯苯甲醛、對硝基苯甲醛、對羥基苯甲醛、糠醛、1-萘甲醛、2-萘甲醛、2-羥基-1-萘甲醛、3-苊甲醛、亞苄基丙酮、亞吡啶基丙酮、亞糠基丙酮、桂皮醛、茴香醛、水楊醛、巴豆醛、丙烯醛、戊二醛、三聚乙醛、香草醛等各種醛;三𠯤、咪唑、吲哚、喹啉、2-乙烯基吡啶、苯胺、啡啉、二甲基菲繞啉、吡啶甲酸、硫脲類、N-(3-羥基亞丁基)-對磺胺酸、N-亞丁基磺胺酸、N-亞桂皮醯基磺胺酸、2,4-二胺基-6-(2'-甲基咪唑基(1'))乙基-1,3,5-三𠯤、2,4-二胺基-6-(2'-乙基-4-甲基咪唑基(1'))乙基-1,3,5-三𠯤、2,4-二胺基-6-(2'-十一烷基咪唑基(1'))乙基-1,3,5-三𠯤、水楊酸苯酯;或苯并噻唑、2-巰基苯并噻唑、2-甲基苯并噻唑、2-胺基苯并噻唑、2-胺基-6-甲氧基苯并噻唑、2-甲基-5-氯苯并噻唑、2-羥基苯并噻唑、2-胺基-6-甲基苯并噻唑、2-氯苯并噻唑、2,5-二甲基苯并噻唑、5-羥基-2-甲基苯并噻唑等苯并噻唑類;雙(3-磺丙基鈉)-二硫化物(SPS,bis(sodium sulfopropyl)disulfide)及其鹽等硫化物類等。 (Glossing agent) The coating solution of the present invention may contain a glossing agent. The glossing agent is not particularly limited, and examples thereof include: benzaldehyde, o-chlorobenzaldehyde, 2,4,6-trichlorobenzaldehyde, m-chlorobenzaldehyde, p-nitrobenzaldehyde, p-hydroxybenzaldehyde, furfural, 1-naphthaldehyde, 2-naphthaldehyde, 2-hydroxy-1-naphthaldehyde, 3-acenaphthaldehyde, benzylideneacetone, pyridylideneacetone, furfurylideneacetone, cinnamaldehyde, anisaldehyde, salicylic aldehyde, crotonaldehyde , acrolein, glutaraldehyde, paraldehyde, vanillin and other aldehydes; tris(III), imidazole, indole, quinoline, 2-vinylpyridine, aniline, phenanthroline, dimethylphenanthroline, picolinic acid, thioureas, N-(3-hydroxybutylene)-p-sulfanilic acid, N-butylenesulfanilic acid, N-cinnamylsulfanilic acid, 2,4-diamino-6-(2'-methylimidazolyl (1')) ethyl-1,3,5-triazine, 2,4-diamino-6-(2'-ethyl-4-methylimidazolyl (1'))ethyl-1,3,5-triazine, 2,4-diamino-6-(2'-undecylimidazolyl (1'))ethyl-1,3,5-triazine, phenyl salicylate; or benzothiazole, 2-hydroxybenzothiazole, 2-methylbenzothiazole, 2-amino Benzothiazoles such as benzothiazole, 2-amino-6-methoxybenzothiazole, 2-methyl-5-chlorobenzothiazole, 2-hydroxybenzothiazole, 2-amino-6-methylbenzothiazole, 2-chlorobenzothiazole, 2,5-dimethylbenzothiazole, and 5-hydroxy-2-methylbenzothiazole; sulfides such as bis(sodium sulfopropyl)disulfide (SPS) and its salts, etc.
光澤劑之含量並無特別限定,例如為1~50 mg/L,較佳為3~30 mg/L。The content of the glossing agent is not particularly limited, and is, for example, 1 to 50 mg/L, preferably 3 to 30 mg/L.
(界面活性劑) 本發明之鍍敷液可包含界面活性劑。界面活性劑並無特別限定,例如可例舉非離子性界面活性劑或兩性界面活性劑等。非離子性界面活性劑並無特別限定,例如可例舉聚醚化合物等。聚醚化合物並無特別限定,例如可例舉:聚伸烷基二醇、具有烷基之聚醚化合物、包含親水性之環氧乙烷單元與疏水性之環氧丙烷單元及環氧乙烷單元之三嵌段共聚物的界面活性劑等。 (Surfactant) The coating solution of the present invention may contain a surfactant. The surfactant is not particularly limited, and examples thereof include non-ionic surfactants or amphoteric surfactants. The non-ionic surfactant is not particularly limited, and examples thereof include polyether compounds. The polyether compound is not particularly limited, and examples thereof include: polyalkylene glycol, polyether compounds having alkyl groups, and surfactants of triblock copolymers containing hydrophilic ethylene oxide units, hydrophobic propylene oxide units, and ethylene oxide units.
界面活性劑之含量並無特別限定,例如為1~300 mg/L,較佳為5~200 mg/L。The content of the surfactant is not particularly limited, and is, for example, 1 to 300 mg/L, preferably 5 to 200 mg/L.
(製造方法) 本發明之鍍敷液所含之PEI化合物(L)係例如使具有聚伸乙基亞胺主骨架之聚伸乙基亞胺、結構部分LX之X之原料、及結構部分LY之Y之原料進行親核加成反應而獲得。 (Manufacturing method) The PEI compound (L) contained in the coating solution of the present invention is obtained by, for example, subjecting polyethyleneimine having a polyethyleneimine main skeleton, a raw material of X in the structural part LX, and a raw material of Y in the structural part LY to a nucleophilic addition reaction.
本發明之鍍敷液可使用上述PEI化合物(L)作為平滑劑,利用公知之方法進行製造。The coating solution of the present invention can be produced by a known method using the above-mentioned PEI compound (L) as a lubricant.
[鍍敷方法] 以下,對使用本發明之鍍敷液之鍍敷方法進行說明。於本鍍敷方法中,使用本發明之鍍敷液,於基體上進行電鍍。 [Plating method] The following is a description of a plating method using the plating solution of the present invention. In this plating method, electroplating is performed on a substrate using the plating solution of the present invention.
(基體) 基體並無特別限定,例如可例舉於黃銅、銅、鎳、鐵、鋅、鋅合金、鋼鐵、樹脂等基材形成金屬等導電層而成者等。 (Substrate) The substrate is not particularly limited, and examples thereof include a substrate such as brass, copper, nickel, iron, zinc, zinc alloy, steel, resin, etc., on which a conductive layer such as a metal is formed.
(溫度) 本發明之鍍敷液可將電鍍時之液溫設為例如15~45℃,較佳為設為20~35℃左右。 (Temperature) The plating liquid of the present invention can set the liquid temperature during electroplating to, for example, 15 to 45°C, preferably about 20 to 35°C.
(電流密度) 本發明之鍍敷液可將電鍍時之電流密度設為例如0.5~15 A/dm 2,較佳為設為1~10 A/dm 2左右。 (Current Density) The plating solution of the present invention can set the current density during electroplating to, for example, 0.5 to 15 A/dm 2 , preferably about 1 to 10 A/dm 2 .
(鍍敷時間) 本發明之鍍敷液可將電鍍時之鍍敷時間設為例如5分鐘以上,較佳為設為15分鐘以上。 (Coating time) The coating liquid of the present invention can set the coating time during electroplating to, for example, more than 5 minutes, preferably more than 15 minutes.
根據本發明,可獲得能夠實現高光澤度鍍敷之鍍敷液。 [實施例] According to the present invention, a coating liquid capable of achieving high gloss coating can be obtained. [Example]
以下,藉由實施例對本發明進一步詳細地進行說明,但本發明並不限定於該等實施例。The present invention is described in further detail below by way of embodiments, but the present invention is not limited to these embodiments.
[實施例1] (PEI化合物) <中間物(Int.1)之製造> 將聚伸乙基亞胺(數量平均分子量300)水溶液(0.90 M)加熱至70~90℃,逐次少量添加相對於胺值為0.6當量之氯乙酸鈉,並反應2小時。恢復至室溫,獲得聚伸乙基亞胺-氯乙酸鈉加成物之40重量%水溶液(Int.1)。再者,利用 1HNMR(Hydrogen-1 Nuclear Magnetic Resonance,氫-核磁共振),以4.1 ppm附近之訊號之消失來確認反應之進行。 [Example 1] (PEI compound) <Production of intermediate (Int.1)> Heat a polyethyleneimine (number average molecular weight 300) aqueous solution (0.90 M) to 70-90°C, add sodium chloroacetate in small amounts corresponding to 0.6 equivalents of the amine value, and react for 2 hours. Return to room temperature to obtain a 40 wt% aqueous solution of polyethyleneimine-sodium chloroacetate adduct (Int.1). Furthermore, 1 HNMR (Hydrogen-1 Nuclear Magnetic Resonance) is used to confirm the progress of the reaction by the disappearance of the signal near 4.1 ppm.
<PEI化合物(試樣No.A1)之製造> 將100重量份之上述聚伸乙基亞胺-氯乙酸鈉加成物之水溶液(Int.1)及76重量份之苛性鈉水溶液(8.5 M)加熱至90℃,逐次少量添加20重量份之苄基氯,並反應2小時。恢復至室溫,獲得PEI化合物(試樣No.A1)之水溶液。將PEI化合物(試樣No.A1)之詳情示於表1。再者,利用 1HNMR,以4.5 ppm附近之訊號之消失來確認反應之進行。 <Preparation of PEI compound (sample No. A1)> 100 parts by weight of the aqueous solution of the above-mentioned polyethyleneimine-sodium chloroacetate adduct (Int. 1) and 76 parts by weight of a caustic sodium aqueous solution (8.5 M) were heated to 90°C, 20 parts by weight of benzyl chloride were added in small amounts gradually, and the mixture was reacted for 2 hours. The mixture was returned to room temperature to obtain an aqueous solution of the PEI compound (sample No. A1). The details of the PEI compound (sample No. A1) are shown in Table 1. Furthermore, the progress of the reaction was confirmed by the disappearance of the signal near 4.5 ppm using 1 HNMR.
[表1]
(鍍敷液之製備) 製備包含220 g/L之硫酸銅五水合物、70 g/L之硫酸、60 mg/L之氯化物離子Cl -、100 mg/L之作為界面活性劑之富士膠片和光純藥股份有限公司製造之聚乙二醇20000、8.3 mg/L之作為光澤劑之雙(磺丙基鈉)-二硫化物(SPS)、及3.0 mg/L之作為平滑劑之PEI化合物(試樣No.A1)的銅鍍敷液(試樣No.E1)。 (Preparation of plating solution) A copper plating solution (Sample No. E1) containing 220 g/L of copper sulfate pentahydrate, 70 g/L of sulfuric acid, 60 mg/L of chloride ions Cl - , 100 mg/L of polyethylene glycol 20000 manufactured by Fuji Film Co., Ltd. Wako Pure Chemical Industries, Ltd. as a surfactant, 8.3 mg/L of bis(sulfopropyl sodium)-disulfide (SPS) as a glossing agent, and 3.0 mg/L of PEI compound (Sample No. A1) as a smoothing agent was prepared.
(電鍍試驗) <預處理> 首先,將赫爾槽(Hull Cell)黃銅板於55℃下使用JCU股份有限公司製造之EBAPREP SK-144(脫脂)浸漬5分鐘後,將其於常溫下使用JCU股份有限公司製造之EBAVATE V-345(酸活性)浸漬0.5分鐘。 (Electroplating test) <Pretreatment> First, the Hull Cell brass plate was immersed in EBAPREP SK-144 (degreased) manufactured by JCU Co., Ltd. at 55°C for 5 minutes, and then immersed in EBAVATE V-345 (acid activated) manufactured by JCU Co., Ltd. at room temperature for 0.5 minutes.
<電鍍> 使用預處理後之赫爾槽黃銅板、及銅鍍敷液(試樣No.E1),藉由赫爾槽試驗於常溫下進行10分鐘陰極電解(總電流2 A)。其後,利用JCU股份有限公司製造之EBAFIN G-800於常溫下進行0.5分鐘防銹處理,結果獲得於黃銅板表面形成有鍍銅皮膜之評估樣品(試樣No.S1)。 <Electroplating> Using the pre-treated Hull cell brass plate and copper plating solution (sample No. E1), the Hull cell test was conducted for 10 minutes of cathodic electrolysis (total current 2 A) at room temperature. Afterwards, 0.5 minutes of anti-rust treatment was performed at room temperature using EBAFIN G-800 manufactured by JCU Co., Ltd., and an evaluation sample (sample No. S1) with a copper-plated film formed on the surface of the brass plate was obtained.
(評估) 將評估樣品(試樣No.S1)設置於BYK-Gardner股份有限公司製造之Micro-Tri-Gloss光澤度計。以20°之入射角將光照射至評估樣品之電流密度3 A/dm 2之部分來測定光澤度。將光澤度示於表1。 (Evaluation) The evaluation sample (sample No. S1) was placed in a Micro-Tri-Gloss gloss meter manufactured by BYK-Gardner Co., Ltd. The gloss was measured by irradiating light at an incident angle of 20° to the portion of the evaluation sample where the current density was 3 A/dm 2. The gloss is shown in Table 1.
[實施例2] (PEI化合物) <PEI化合物(試樣No.A2)之製造> 將100重量份之實施例1中製造之聚伸乙基亞胺-氯乙酸鈉加成物之水溶液(Int.1)及83重量份之苛性鈉水溶液(7.5 M)加熱至90℃,逐次少量添加25重量份之2-氯苄氯,並反應2小時。恢復至室溫,結果獲得PEI化合物(試樣No.A2)之水溶液。將PEI化合物(試樣No.A2)之詳情示於表1。再者,利用 1HNMR,以4.5 ppm附近之訊號之消失來確認反應之進行。 [Example 2] (PEI compound) <Preparation of PEI compound (Sample No. A2)> 100 parts by weight of the aqueous solution of the polyethyleneimine-sodium chloroacetate adduct prepared in Example 1 (Int. 1) and 83 parts by weight of a caustic sodium aqueous solution (7.5 M) were heated to 90°C, 25 parts by weight of 2-chlorobenzyl chloride were added in small amounts gradually, and the mixture was reacted for 2 hours. The mixture was returned to room temperature to obtain an aqueous solution of a PEI compound (Sample No. A2). The details of the PEI compound (Sample No. A2) are shown in Table 1. Furthermore, the progress of the reaction was confirmed by the disappearance of the signal near 4.5 ppm using 1 HNMR.
(鍍敷液之製備) 除使用PEI化合物(試樣No.A2)代替PEI化合物(試樣No.A1)以外,以與實施例1相同之方式製備銅鍍敷液(試樣No.E2)。 (Preparation of plating solution) A copper plating solution (sample No. E2) was prepared in the same manner as in Example 1 except that a PEI compound (sample No. A2) was used instead of a PEI compound (sample No. A1).
(電鍍試驗) 除使用銅鍍敷液(試樣No.E2)代替銅鍍敷液(試樣No.E1)以外,以與實施例1相同之方式進行陰極電解,結果獲得於黃銅板表面形成有鍍銅皮膜之評估樣品(試樣No.S2)。 (Electroplating test) Except for using copper plating solution (sample No. E2) instead of copper plating solution (sample No. E1), cathodic electrolysis was performed in the same manner as in Example 1, and an evaluation sample (sample No. S2) with a copper-plated film formed on the surface of the brass plate was obtained.
(評估) 以與實施例1相同之方式測定光澤度。將光澤度示於表1。 (Evaluation) The gloss was measured in the same manner as in Example 1. The gloss is shown in Table 1.
[實施例3] (PEI化合物) <中間物(Int.2)之製造> 將聚伸乙基亞胺(數量平均分子量1100)水溶液(0.22 M)加熱至70~90℃,逐次少量添加相對於胺值為0.6當量之氯乙酸鈉,並反應2小時。恢復至室溫,獲得聚伸乙基亞胺-氯乙酸鈉加成物之32.9重量%水溶液(Int.2)。再者,利用 1HNMR,以4.1 ppm附近之訊號之消失來確認反應之進行。 [Example 3] (PEI compound) <Production of intermediate (Int.2)> Heat a polyethyleneimine (number average molecular weight 1100) aqueous solution (0.22 M) to 70-90°C, add sodium chloroacetate in small amounts to 0.6 equivalents relative to the amine value, and react for 2 hours. Return to room temperature to obtain a 32.9 wt% aqueous solution of polyethyleneimine-sodium chloroacetate adduct (Int.2). Furthermore, the progress of the reaction was confirmed by the disappearance of the signal near 4.1 ppm using 1 HNMR.
<PEI化合物(試樣No.A3)之製造> 將100重量份之上述聚伸乙基亞胺-氯乙酸鈉加成物之水溶液(Int.2)及29重量份之苛性鈉水溶液(7.8 M)加熱至90℃,逐次少量添加6重量份之苄基氯,並反應2小時。恢復至室溫,結果獲得PEI化合物(試樣No.A3)之水溶液。將PEI化合物(試樣No.A3)之詳情示於表1。再者,利用 1HNMR,以4.5 ppm附近之訊號之消失來確認反應之進行。 <Preparation of PEI compound (sample No. A3)> 100 parts by weight of the aqueous solution of the above-mentioned polyethyleneimine-sodium chloroacetate adduct (Int. 2) and 29 parts by weight of a caustic sodium aqueous solution (7.8 M) were heated to 90°C, 6 parts by weight of benzyl chloride were added in small amounts, and the mixture was reacted for 2 hours. The mixture was returned to room temperature to obtain an aqueous solution of a PEI compound (sample No. A3). The details of the PEI compound (sample No. A3) are shown in Table 1. Furthermore, the progress of the reaction was confirmed by the disappearance of the signal near 4.5 ppm using 1 HNMR.
(鍍敷液之製備) 除使用PEI化合物(試樣No.A3)代替PEI化合物(試樣No.A1)以外,以與實施例1相同之方式製備銅鍍敷液(試樣No.E3)。 (Preparation of plating solution) A copper plating solution (sample No. E3) was prepared in the same manner as in Example 1 except that a PEI compound (sample No. A3) was used instead of a PEI compound (sample No. A1).
(電鍍試驗) 除使用銅鍍敷液(試樣No.E3)代替銅鍍敷液(試樣No.E1)以外,以與實施例1相同之方式進行陰極電解,結果獲得於黃銅板表面形成有鍍銅皮膜之評估樣品(試樣No.S3)。 (Electroplating test) Except that copper plating solution (sample No. E3) was used instead of copper plating solution (sample No. E1), cathodic electrolysis was performed in the same manner as in Example 1. As a result, an evaluation sample (sample No. S3) having a copper-plated film formed on the surface of the brass plate was obtained.
(評估) 以與實施例1相同之方式測定光澤度。將光澤度示於表1。 (Evaluation) The gloss was measured in the same manner as in Example 1. The gloss is shown in Table 1.
[實施例4] (PEI化合物) <中間物(Int.3)之製造> 將聚伸乙基亞胺(數量平均分子量1800)水溶液(0.30 M)加熱至70~90℃,逐次少量添加相對於胺值為0.6當量之氯乙酸鈉(7.0 M),並反應2小時。恢復至室溫,獲得聚伸乙基亞胺-氯乙酸鈉加成物之40重量%水溶液(Int.3)。再者,利用 1HNMR,以4.1 ppm附近之訊號之消失來確認反應之進行。 [Example 4] (PEI compound) <Production of intermediate (Int.3)> Heat a polyethyleneimine (number average molecular weight 1800) aqueous solution (0.30 M) to 70-90°C, add sodium chloroacetate (7.0 M) in small amounts with respect to the amine value of 0.6 equivalents, and react for 2 hours. Return to room temperature to obtain a 40 wt% aqueous solution of polyethyleneimine-sodium chloroacetate adduct (Int.3). Furthermore, the progress of the reaction was confirmed by the disappearance of the signal near 4.1 ppm using 1 HNMR.
<PEI化合物(試樣No.A4)之製造> 將100重量份之上述聚伸乙基亞胺-氯乙酸鈉加成物之水溶液(Int.3)及90重量份之苛性鈉水溶液(6.6 M)加熱至90℃,逐次少量添加70重量份之苄基氯,並反應2小時。恢復至室溫,結果獲得PEI化合物(試樣No.A4)之水溶液。將PEI化合物(試樣No.A4)之詳情示於表1。再者,利用 1HNMR,以4.5 ppm附近之訊號之消失來確認反應之進行。 <Preparation of PEI compound (sample No. A4)> 100 parts by weight of the aqueous solution of the above-mentioned polyethyleneimine-sodium chloroacetate adduct (Int. 3) and 90 parts by weight of a caustic sodium aqueous solution (6.6 M) were heated to 90°C, 70 parts by weight of benzyl chloride were added in small amounts gradually, and the mixture was reacted for 2 hours. The mixture was returned to room temperature to obtain an aqueous solution of a PEI compound (sample No. A4). The details of the PEI compound (sample No. A4) are shown in Table 1. Furthermore, the progress of the reaction was confirmed by the disappearance of the signal near 4.5 ppm using 1 HNMR.
(鍍敷液之製備) 除使用PEI化合物(試樣No.A4)代替PEI化合物(試樣No.A1)以外,以與實施例1相同之方式製備銅鍍敷液(試樣No.E4)。 (Preparation of plating solution) A copper plating solution (sample No. E4) was prepared in the same manner as in Example 1 except that a PEI compound (sample No. A4) was used instead of a PEI compound (sample No. A1).
(電鍍試驗) 除使用銅鍍敷液(試樣No.E4)代替銅鍍敷液(試樣No.E1)以外,以與實施例1相同之方式進行陰極電解,結果獲得於黃銅板表面形成有鍍銅皮膜之評估樣品(試樣No.S4)。 (Electroplating test) Except for using copper plating solution (sample No. E4) instead of copper plating solution (sample No. E1), cathodic electrolysis was performed in the same manner as in Example 1, and an evaluation sample (sample No. S4) with a copper-plated film formed on the surface of the brass plate was obtained.
(評估) 以與實施例1相同之方式測定光澤度。將光澤度示於表1。 (Evaluation) The gloss was measured in the same manner as in Example 1. The gloss is shown in Table 1.
[實施例5] (PEI化合物) <PEI化合物(試樣No.A5)之製造> 將100重量份之實施例4中製造之聚伸乙基亞胺-氯乙酸鈉加成物之水溶液(Int.3)及68重量份之苛性鈉水溶液(9.6 M)加熱至90℃,逐次少量添加23重量份之4-氟氯苄,並反應2小時。恢復至室溫,結果獲得PEI化合物(試樣No.A5)之水溶液。將PEI化合物(試樣No.A5)之詳情示於表1。再者,利用 1HNMR,以4.5 ppm附近之訊號之消失來確認反應之進行。 [Example 5] (PEI compound) <Preparation of PEI compound (Sample No. A5)> 100 parts by weight of the aqueous solution of the polyethyleneimine-sodium chloroacetate adduct prepared in Example 4 (Int. 3) and 68 parts by weight of a caustic sodium aqueous solution (9.6 M) were heated to 90°C, 23 parts by weight of 4-fluorobenzyl chloride were added in small amounts gradually, and the mixture was reacted for 2 hours. The mixture was returned to room temperature to obtain an aqueous solution of a PEI compound (Sample No. A5). The details of the PEI compound (Sample No. A5) are shown in Table 1. Furthermore, the progress of the reaction was confirmed by the disappearance of the signal near 4.5 ppm using 1 HNMR.
(鍍敷液之製備) 除使用PEI化合物(試樣No.A5)代替PEI化合物(試樣No.A1)以外,以與實施例1相同之方式製備銅鍍敷液(試樣No.E5)。 (Preparation of plating solution) A copper plating solution (sample No. E5) was prepared in the same manner as in Example 1 except that a PEI compound (sample No. A5) was used instead of a PEI compound (sample No. A1).
(電鍍試驗) 除使用銅鍍敷液(試樣No.E5)代替銅鍍敷液(試樣No.E1)以外,以與實施例1相同之方式進行陰極電解,結果獲得於黃銅板表面形成有鍍銅皮膜之評估樣品(試樣No.S5)。 (Electroplating test) Except for using copper plating solution (sample No. E5) instead of copper plating solution (sample No. E1), cathodic electrolysis was performed in the same manner as in Example 1, and an evaluation sample (sample No. S5) with a copper-plated film formed on the surface of the brass plate was obtained.
(評估) 以與實施例1相同之方式測定光澤度。將光澤度示於表1。 (Evaluation) The gloss was measured in the same manner as in Example 1. The gloss is shown in Table 1.
[實施例6] (PEI化合物) <PEI化合物(試樣No.A6)之製造> 將100重量份之實施例4中製造之聚伸乙基亞胺-氯乙酸鈉加成物之水溶液(Int.3)及68重量份之苛性鈉水溶液(9.6 M)加熱至90℃,逐次少量添加22重量份之3-甲基氯苄,並反應2小時。恢復至室溫,結果獲得PEI化合物(試樣No.A6)之水溶液。將PEI化合物(試樣No.A6)之詳情示於表1。再者,利用 1HNMR,以4.5 ppm附近之訊號之消失來確認反應之進行。 [Example 6] (PEI compound) <Preparation of PEI compound (Sample No. A6)> 100 parts by weight of the aqueous solution of the polyethyleneimine-sodium chloroacetate adduct prepared in Example 4 (Int. 3) and 68 parts by weight of a caustic sodium aqueous solution (9.6 M) were heated to 90°C, 22 parts by weight of 3-methylbenzyl chloride were added in small amounts gradually, and the mixture was reacted for 2 hours. The mixture was returned to room temperature to obtain an aqueous solution of a PEI compound (Sample No. A6). The details of the PEI compound (Sample No. A6) are shown in Table 1. Furthermore, the progress of the reaction was confirmed by the disappearance of the signal near 4.5 ppm using 1 HNMR.
(鍍敷液之製備) 除使用PEI化合物(試樣No.A6)代替PEI化合物(試樣No.A1)以外,以與實施例1相同之方式製備銅鍍敷液(試樣No.E6)。 (Preparation of plating solution) A copper plating solution (sample No. E6) was prepared in the same manner as in Example 1 except that a PEI compound (sample No. A6) was used instead of a PEI compound (sample No. A1).
(電鍍試驗) 除使用銅鍍敷液(試樣No.E6)代替銅鍍敷液(試樣No.E1)以外,以與實施例1相同之方式進行陰極電解,結果獲得於黃銅板表面形成有鍍銅皮膜之評估樣品(試樣No.S6)。 (Electroplating test) Except for using copper plating solution (sample No. E6) instead of copper plating solution (sample No. E1), cathodic electrolysis was performed in the same manner as in Example 1, and an evaluation sample (sample No. S6) with a copper-plated film formed on the surface of the brass plate was obtained.
(評估) 以與實施例1相同之方式測定光澤度。將光澤度示於表1。 (Evaluation) The gloss was measured in the same manner as in Example 1. The gloss is shown in Table 1.
[實施例7] (PEI化合物) <PEI化合物(試樣No.A7)之製造> 將100重量份之實施例4中製造之聚伸乙基亞胺-氯乙酸鈉加成物之水溶液(Int.3)及69重量份之苛性鈉水溶液(9.6 M)加熱至90℃,逐次少量添加25重量份之3-甲氧基氯苄,並反應2小時。恢復至室溫,結果獲得PEI化合物(試樣No.A7)之水溶液。將PEI化合物(試樣No.A7)之詳情示於表1。再者,利用 1HNMR,以4.5 ppm附近之訊號之消失來確認反應之進行。 [Example 7] (PEI compound) <Preparation of PEI compound (Sample No. A7)> 100 parts by weight of the aqueous solution of the polyethyleneimine-sodium chloroacetate adduct prepared in Example 4 (Int. 3) and 69 parts by weight of a caustic sodium aqueous solution (9.6 M) were heated to 90°C, 25 parts by weight of 3-methoxybenzyl chloride were added in small amounts gradually, and the mixture was reacted for 2 hours. The mixture was returned to room temperature to obtain an aqueous solution of a PEI compound (Sample No. A7). The details of the PEI compound (Sample No. A7) are shown in Table 1. Furthermore, the progress of the reaction was confirmed by the disappearance of the signal near 4.5 ppm using 1 HNMR.
(鍍敷液之製備) 除使用PEI化合物(試樣No.A7)代替PEI化合物(試樣No.A1)以外,以與實施例1相同之方式製備銅鍍敷液(試樣No.E7)。 (Preparation of plating solution) A copper plating solution (sample No. E7) was prepared in the same manner as in Example 1 except that a PEI compound (sample No. A7) was used instead of a PEI compound (sample No. A1).
(電鍍試驗) 除使用銅鍍敷液(試樣No.E7)代替銅鍍敷液(試樣No.E1)以外,以與實施例1相同之方式進行陰極電解,結果獲得於黃銅板表面形成有鍍銅皮膜之評估樣品(試樣No.S7)。 (Electroplating test) Except that copper plating solution (sample No. E7) was used instead of copper plating solution (sample No. E1), cathodic electrolysis was performed in the same manner as in Example 1. As a result, an evaluation sample (sample No. S7) having a copper-plated film formed on the surface of the brass plate was obtained.
(評估) 以與實施例1相同之方式測定光澤度。將光澤度示於表1。 (Evaluation) The gloss was measured in the same manner as in Example 1. The gloss is shown in Table 1.
[實施例8] (PEI化合物) <PEI化合物(試樣No.A8)之製造> 將100重量份之實施例4中製造之聚伸乙基亞胺-氯乙酸鈉加成物之水溶液(Int.3)及54重量份之苛性鈉水溶液(13.3 M)加熱至90℃,添加28重量份之2-(氯甲基)萘,並反應2小時。恢復至室溫並添加168重量份之純水,結果獲得PEI化合物(試樣No.A8)之水溶液。將PEI化合物(試樣No.A8)之詳情示於表1。再者,利用 1HNMR,以4.5 ppm附近之訊號之消失來確認反應之進行。 [Example 8] (PEI compound) <Preparation of PEI compound (Sample No. A8)> 100 parts by weight of the aqueous solution of the polyethyleneimine-sodium chloroacetate adduct prepared in Example 4 (Int. 3) and 54 parts by weight of an aqueous caustic sodium solution (13.3 M) were heated to 90°C, 28 parts by weight of 2-(chloromethyl)naphthalene were added, and the mixture was reacted for 2 hours. The mixture was returned to room temperature and 168 parts by weight of pure water were added to obtain an aqueous solution of a PEI compound (Sample No. A8). The details of the PEI compound (Sample No. A8) are shown in Table 1. Furthermore, the progress of the reaction was confirmed by the disappearance of the signal near 4.5 ppm using 1 HNMR.
(鍍敷液之製備) 除使用PEI化合物(試樣No.A8)代替PEI化合物(試樣No.A1)以外,以與實施例1相同之方式製備銅鍍敷液(試樣No.E8)。 (Preparation of plating solution) A copper plating solution (sample No. E8) was prepared in the same manner as in Example 1 except that a PEI compound (sample No. A8) was used instead of a PEI compound (sample No. A1).
(電鍍試驗) 除使用銅鍍敷液(試樣No.E8)代替銅鍍敷液(試樣No.E1)以外,以與實施例1相同之方式進行陰極電解,結果獲得於黃銅板表面形成有鍍銅皮膜之評估樣品(試樣No.S8)。 (Electroplating test) Except for using copper plating solution (sample No. E8) instead of copper plating solution (sample No. E1), cathodic electrolysis was performed in the same manner as in Example 1, and an evaluation sample (sample No. S8) with a copper-plated film formed on the surface of the brass plate was obtained.
(評估) 以與實施例1相同之方式測定光澤度。將光澤度示於表1。 (Evaluation) The gloss was measured in the same manner as in Example 1. The gloss is shown in Table 1.
[實施例9] (PEI化合物) <PEI化合物(試樣No.A9)之製造> 將100重量份之實施例4中製造之聚伸乙基亞胺-氯乙酸鈉加成物之水溶液(Int.3)及75重量份之苛性鈉水溶液(8.4 M)加熱至90℃,添加27重量份之4-硝基氯苄,並反應2小時。恢復至室溫並添加169重量份之純水,獲得PEI化合物(試樣No.A9)之水溶液。將PEI化合物(試樣No.A9)之詳情示於表1。再者,利用 1HNMR,以4.5 ppm附近之訊號之消失來確認反應之進行。 [Example 9] (PEI compound) <Preparation of PEI compound (Sample No. A9)> 100 parts by weight of the aqueous solution of the polyethyleneimine-sodium chloroacetate adduct prepared in Example 4 (Int. 3) and 75 parts by weight of an aqueous caustic sodium solution (8.4 M) were heated to 90°C, 27 parts by weight of 4-nitrobenzyl chloride were added, and the mixture was reacted for 2 hours. The mixture was returned to room temperature and 169 parts by weight of pure water were added to obtain an aqueous solution of a PEI compound (Sample No. A9). The details of the PEI compound (Sample No. A9) are shown in Table 1. Furthermore, the progress of the reaction was confirmed by the disappearance of the signal near 4.5 ppm using 1 HNMR.
(鍍敷液之製備) 除使用PEI化合物(試樣No.A9)代替PEI化合物(試樣No.A1)以外,以與實施例1相同之方式製備銅鍍敷液(試樣No.E9)。 (Preparation of plating solution) A copper plating solution (sample No. E9) was prepared in the same manner as in Example 1 except that a PEI compound (sample No. A9) was used instead of a PEI compound (sample No. A1).
(電鍍試驗) 除使用銅鍍敷液(試樣No.E9)代替銅鍍敷液(試樣No.E1)以外,以與實施例1相同之方式進行陰極電解,結果獲得於黃銅板表面形成有鍍銅皮膜之評估樣品(試樣No.S9)。 (Electroplating test) Except that copper plating solution (sample No. E9) was used instead of copper plating solution (sample No. E1), cathodic electrolysis was performed in the same manner as in Example 1. As a result, an evaluation sample (sample No. S9) having a copper-plated film formed on the surface of the brass plate was obtained.
(評估) 以與實施例1相同之方式測定光澤度。將光澤度示於表1。 (Evaluation) The gloss was measured in the same manner as in Example 1. The gloss is shown in Table 1.
[實施例10] (PEI化合物) <PEI化合物(試樣No.A10)之製造> 將100重量份之實施例4中製造之聚伸乙基亞胺-氯乙酸鈉加成物之水溶液(Int.3)及5重量份之香草醛加熱至80~90℃,並反應2小時。恢復至室溫,結果獲得PEI化合物(試樣No.A10)之水溶液。將PEI化合物(試樣No.A10)之詳情示於表1。再者,利用 13CNMR(Carbon-13 Nuclear Magnetic Resonance,13碳核磁共振),以191 ppm附近之訊號之消失來確認反應之進行。 [Example 10] (PEI compound) <Preparation of PEI compound (Sample No. A10)> Heat 100 parts by weight of the aqueous solution of polyethyleneimine-sodium chloroacetate adduct prepared in Example 4 (Int. 3) and 5 parts by weight of vanillin to 80-90°C and react for 2 hours. Return to room temperature to obtain an aqueous solution of PEI compound (Sample No. A10). The details of the PEI compound (Sample No. A10) are shown in Table 1. Furthermore, using 13 CNMR (Carbon-13 Nuclear Magnetic Resonance, 13 carbon nuclear magnetic resonance), the progress of the reaction is confirmed by the disappearance of the signal near 191 ppm.
(鍍敷液之製備) 除使用PEI化合物(試樣No.A10)代替PEI化合物(試樣No.A1)以外,以與實施例1相同之方式製備銅鍍敷液(試樣No.E10)。 (Preparation of plating solution) A copper plating solution (sample No. E10) was prepared in the same manner as in Example 1 except that a PEI compound (sample No. A10) was used instead of a PEI compound (sample No. A1).
(電鍍試驗) 除使用銅鍍敷液(試樣No.E10)代替銅鍍敷液(試樣No.E1)以外,以與實施例1相同之方式進行陰極電解,結果獲得於黃銅板表面形成有鍍銅皮膜之評估樣品(試樣No.S10)。 (Electroplating test) Except that copper plating solution (sample No. E10) was used instead of copper plating solution (sample No. E1), cathodic electrolysis was performed in the same manner as in Example 1. As a result, an evaluation sample (sample No. S10) having a copper-plated film formed on the surface of the brass plate was obtained.
(評估) 以與實施例1相同之方式測定光澤度。將光澤度示於表1。 (Evaluation) The gloss was measured in the same manner as in Example 1. The gloss is shown in Table 1.
[實施例11] (PEI化合物) <中間物(Int.4)之製造> 將聚伸乙基亞胺(數量平均分子量10000)水溶液(0.017 M)加熱至70~90℃,逐次少量添加相對於胺值為0.6當量之氯乙酸鈉,並反應2小時。恢復至室溫,結果獲得聚伸乙基亞胺-氯乙酸鈉加成物之40重量%水溶液(Int.4)。再者,利用 1HNMR,以4.1 ppm附近之訊號之消失來確認反應之進行。 [Example 11] (PEI compound) <Production of intermediate (Int.4)> Heat a polyethyleneimine (number average molecular weight 10000) aqueous solution (0.017 M) to 70-90°C, add sodium chloroacetate in small amounts corresponding to 0.6 equivalents of the amine value, and react for 2 hours. Return to room temperature to obtain a 40 wt% aqueous solution of polyethyleneimine-sodium chloroacetate adduct (Int.4). Furthermore, the progress of the reaction was confirmed by the disappearance of the signal near 4.1 ppm using 1 HNMR.
<PEI化合物(試樣No.A11)之製造> 將100重量份之上述聚伸乙基亞胺-氯乙酸鈉加成物之水溶液(Int.4)及66重量份之苛性鈉水溶液(10.2 M)加熱至90℃,逐次少量添加20重量份之苄基氯,並反應2小時。恢復至室溫,結果獲得PEI化合物(試樣No.A11)之水溶液。將PEI化合物(試樣No.A11)之詳情示於表1。再者,利用 1HNMR,以4.5 ppm附近之訊號之消失來確認反應之進行。 <Production of PEI compound (sample No. A11)> 100 parts by weight of the aqueous solution of the above-mentioned polyethyleneimine-sodium chloroacetate adduct (Int. 4) and 66 parts by weight of a caustic sodium aqueous solution (10.2 M) were heated to 90°C, 20 parts by weight of benzyl chloride were added in small amounts, and the mixture was reacted for 2 hours. The mixture was returned to room temperature to obtain an aqueous solution of a PEI compound (sample No. A11). The details of the PEI compound (sample No. A11) are shown in Table 1. Furthermore, the progress of the reaction was confirmed by the disappearance of the signal near 4.5 ppm using 1 HNMR.
(鍍敷液之製備) 除使用PEI化合物(試樣No.A11)代替PEI化合物(試樣No.A1)以外,以與實施例1相同之方式製備銅鍍敷液(試樣No.E11)。 (Preparation of plating solution) A copper plating solution (sample No. E11) was prepared in the same manner as in Example 1 except that a PEI compound (sample No. A11) was used instead of a PEI compound (sample No. A1).
(電鍍試驗) 除使用銅鍍敷液(試樣No.E11)代替銅鍍敷液(試樣No.E1)以外,以與實施例1相同之方式進行陰極電解,結果獲得於黃銅板表面形成有鍍銅皮膜之評估樣品(試樣No.S11)。 (Electroplating test) Except that copper plating solution (sample No. E11) was used instead of copper plating solution (sample No. E1), cathodic electrolysis was performed in the same manner as in Example 1, and an evaluation sample (sample No. S11) having a copper-plated film formed on the surface of the brass plate was obtained.
(評估) 以與實施例1相同之方式測定光澤度。將光澤度示於表1。 (Evaluation) The gloss was measured in the same manner as in Example 1. The gloss is shown in Table 1.
[實施例12] (PEI化合物) <中間物(Int.5)之製造> 將聚伸乙基亞胺(數量平均分子量70000)水溶液(0.004 M)加熱至70~90℃,逐次少量添加相對於胺值為0.6當量之氯乙酸鈉,並反應2小時。恢復至室溫,獲得聚伸乙基亞胺-氯乙酸鈉加成物之17重量%水溶液(Int.5)。再者,利用 1HNMR,以4.1 ppm附近之訊號之消失來確認反應之進行。 [Example 12] (PEI compound) <Production of intermediate (Int.5)> A 0.004 M aqueous solution of polyethyleneimine (number average molecular weight 70000) was heated to 70-90°C, and sodium chloroacetate was added in small amounts in an amount of 0.6 equivalents relative to the amine value, and the mixture was reacted for 2 hours. The mixture was returned to room temperature to obtain a 17 wt% aqueous solution of polyethyleneimine-sodium chloroacetate adduct (Int.5). Furthermore, the progress of the reaction was confirmed by the disappearance of the signal near 4.1 ppm using 1 HNMR.
<PEI化合物(試樣No.A12)之製造> 將100重量份之上述聚伸乙基亞胺-氯乙酸鈉加成物之水溶液(Int.5)及130重量份之苛性鈉水溶液(2.8 M)加熱至90℃,逐次少量添加5重量份之2-氯苄氯,並反應2小時。恢復至室溫,結果獲得PEI化合物(試樣No.A12)之水溶液。將PEI化合物(試樣No.A12)之詳情示於表1。再者,利用 1HNMR,以4.5 ppm附近之訊號之消失來確認反應之進行。 <Preparation of PEI compound (sample No. A12)> 100 parts by weight of the aqueous solution of the above-mentioned polyethyleneimine-sodium chloroacetate adduct (Int. 5) and 130 parts by weight of a caustic sodium aqueous solution (2.8 M) were heated to 90°C, 5 parts by weight of 2-chlorobenzyl chloride were added in small amounts, and the mixture was reacted for 2 hours. The mixture was returned to room temperature to obtain an aqueous solution of a PEI compound (sample No. A12). The details of the PEI compound (sample No. A12) are shown in Table 1. Furthermore, the progress of the reaction was confirmed by the disappearance of the signal near 4.5 ppm using 1 HNMR.
(鍍敷液之製備) 除使用PEI化合物(試樣No.A12)代替PEI化合物(試樣No.A1)以外,以與實施例1相同之方式製備銅鍍敷液(試樣No.E12)。 (Preparation of plating solution) A copper plating solution (sample No. E12) was prepared in the same manner as in Example 1 except that a PEI compound (sample No. A12) was used instead of a PEI compound (sample No. A1).
(電鍍試驗) 除使用銅鍍敷液(試樣No.E12)代替銅鍍敷液(試樣No.E1)以外,以與實施例1相同之方式進行陰極電解,結果獲得於黃銅板表面形成有鍍銅皮膜之評估樣品(試樣No.S12)。 (Electroplating test) Except for using copper plating solution (sample No. E12) instead of copper plating solution (sample No. E1), cathodic electrolysis was performed in the same manner as in Example 1, and an evaluation sample (sample No. S12) with a copper-plated film formed on the surface of the brass plate was obtained.
(評估) 以與實施例1相同之方式測定光澤度。將光澤度示於表1。 (Evaluation) The gloss was measured in the same manner as in Example 1. The gloss is shown in Table 1.
[實施例13] (PEI化合物) <中間物(Int.6)之製造> 將聚伸乙基亞胺(數量平均分子量1800)水溶液(0.17 M)加熱至70~90℃,使之與相對於胺值為0.3當量之1,3-丙烷磺內酯反應2小時。恢復至室溫,獲得聚伸乙基亞胺-1,3-丙烷磺內酯加成物之34質量%水溶液(Int.6)。再者,利用 1HNMR,以4.49 ppm附近之訊號之消失來確認反應之進行。 [Example 13] (PEI compound) <Production of intermediate (Int.6)> An aqueous solution (0.17 M) of polyethyleneimine (number average molecular weight 1800) was heated to 70-90°C and reacted with 1,3-propane sultone having an amine value of 0.3 equivalents for 2 hours. The mixture was returned to room temperature to obtain a 34% aqueous solution (Int.6) of polyethyleneimine-1,3-propane sultone adduct. Furthermore, the progress of the reaction was confirmed by the disappearance of the signal near 4.49 ppm using 1 HNMR.
<PEI化合物(試樣No.A13)之製造> 將100重量份之上述聚伸乙基亞胺-1,3-丙烷磺內酯加成物之水溶液(Int.6)、150重量份之純水、及20重量份之4-氟氯苄加熱至90℃,並反應2小時。恢復至室溫,結果獲得PEI化合物(試樣No.A13)之水溶液。將PEI化合物(試樣No.A13)之詳情示於表1。再者,利用 1HNMR,以4.5 ppm附近之訊號之消失來確認反應之進行。 <Production of PEI compound (sample No. A13)> 100 parts by weight of the aqueous solution of the above-mentioned polyethyleneimine-1,3-propane sultone adduct (Int. 6), 150 parts by weight of pure water, and 20 parts by weight of 4-fluorobenzyl chloride were heated to 90°C and reacted for 2 hours. The solution was returned to room temperature to obtain an aqueous solution of PEI compound (sample No. A13). The details of the PEI compound (sample No. A13) are shown in Table 1. Furthermore, the progress of the reaction was confirmed by the disappearance of the signal near 4.5 ppm using 1 HNMR.
(鍍敷液之製備) 除使用PEI化合物(試樣No.A13)代替PEI化合物(試樣No.A1)以外,以與實施例1相同之方式製備銅鍍敷液(試樣No.E13)。 (Preparation of plating solution) A copper plating solution (sample No. E13) was prepared in the same manner as in Example 1 except that a PEI compound (sample No. A13) was used instead of a PEI compound (sample No. A1).
(電鍍試驗) 除使用銅鍍敷液(試樣No.E13)代替銅鍍敷液(試樣No.E1)以外,以與實施例1相同之方式進行陰極電解,結果獲得於黃銅板表面形成有鍍銅皮膜之評估樣品(試樣No.S13)。 (Electroplating test) Except that copper plating solution (sample No. E13) was used instead of copper plating solution (sample No. E1), cathodic electrolysis was performed in the same manner as in Example 1. As a result, an evaluation sample (sample No. S13) having a copper-plated film formed on the surface of the brass plate was obtained.
(評估) 以與實施例1相同之方式測定光澤度。將光澤度示於表1。 (Evaluation) The gloss was measured in the same manner as in Example 1. The gloss is shown in Table 1.
[實施例14] (PEI化合物) <PEI化合物(試樣No.A14)之製造> 將100重量份之實施例13中製造之聚伸乙基亞胺-1,3-丙烷磺內酯加成物之水溶液(Int.6)、150重量份之純水、及22重量份之3-甲氧基氯苄加熱至90℃,並反應2小時。恢復至室溫,結果獲得PEI化合物(試樣No.A14)之水溶液。將PEI化合物(試樣No.A14)之詳情示於表1。再者,利用 1HNMR,以4.5 ppm附近之訊號之消失來確認反應之進行。 [Example 14] (PEI compound) <Preparation of PEI compound (Sample No. A14)> 100 parts by weight of the aqueous solution of polyethyleneimine-1,3-propane sultone adduct prepared in Example 13 (Int. 6), 150 parts by weight of pure water, and 22 parts by weight of 3-methoxybenzyl chloride were heated to 90°C and reacted for 2 hours. The solution was returned to room temperature to obtain an aqueous solution of PEI compound (Sample No. A14). The details of the PEI compound (Sample No. A14) are shown in Table 1. Furthermore, the progress of the reaction was confirmed by the disappearance of the signal near 4.5 ppm using 1 HNMR.
(鍍敷液之製備) 除使用PEI化合物(試樣No.A14)代替PEI化合物(試樣No.A1)以外,以與實施例1相同之方式製備銅鍍敷液(試樣No.E14)。 (Preparation of plating solution) A copper plating solution (sample No. E14) was prepared in the same manner as in Example 1 except that a PEI compound (sample No. A14) was used instead of a PEI compound (sample No. A1).
(電鍍試驗) 除使用銅鍍敷液(試樣No.E14)代替銅鍍敷液(試樣No.E1)以外,以與實施例1相同之方式進行陰極電解,結果獲得於黃銅板表面形成有鍍銅皮膜之評估樣品(試樣No.S14)。 (Electroplating test) Except that copper plating solution (sample No. E14) was used instead of copper plating solution (sample No. E1), cathodic electrolysis was performed in the same manner as in Example 1. As a result, an evaluation sample (sample No. S14) having a copper-plated film formed on the surface of the brass plate was obtained.
(評估) 以與實施例1相同之方式測定光澤度。將光澤度示於表1。 (Evaluation) The gloss was measured in the same manner as in Example 1. The gloss is shown in Table 1.
[實施例15] (PEI化合物) <PEI化合物(試樣No.A15)之製造> 將100重量份之實施例13中製造之聚伸乙基亞胺-1,3-丙烷磺內酯加成物之水溶液(Int.6)、200重量份之純水、及23重量份之4-硝基氯苄加熱至90℃,並反應2小時。恢復至室溫,結果獲得PEI化合物(試樣No.A15)之水溶液。將PEI化合物(試樣No.A15)之詳情示於表1。再者,利用 1HNMR,以4.5 ppm附近之訊號之消失來確認反應之進行。 [Example 15] (PEI compound) <Preparation of PEI compound (Sample No. A15)> 100 parts by weight of the aqueous solution of polyethyleneimine-1,3-propane sultone adduct prepared in Example 13 (Int. 6), 200 parts by weight of pure water, and 23 parts by weight of 4-nitrobenzyl chloride were heated to 90°C and reacted for 2 hours. The solution was returned to room temperature to obtain an aqueous solution of PEI compound (Sample No. A15). The details of the PEI compound (Sample No. A15) are shown in Table 1. Furthermore, the progress of the reaction was confirmed by the disappearance of the signal near 4.5 ppm using 1 HNMR.
(鍍敷液之製備) 除使用PEI化合物(試樣No.A15)代替PEI化合物(試樣No.A1)以外,以與實施例1相同之方式製備銅鍍敷液(試樣No.E15)。 (Preparation of plating solution) A copper plating solution (sample No. E15) was prepared in the same manner as in Example 1 except that a PEI compound (sample No. A15) was used instead of a PEI compound (sample No. A1).
(電鍍試驗) 除使用銅鍍敷液(試樣No.E15)代替銅鍍敷液(試樣No.E1)以外,以與實施例1相同之方式進行陰極電解,結果獲得於黃銅板表面形成有鍍銅皮膜之評估樣品(試樣No.S15)。 (Electroplating test) Except that copper plating solution (sample No. E15) was used instead of copper plating solution (sample No. E1), cathodic electrolysis was performed in the same manner as in Example 1, and an evaluation sample (sample No. S15) having a copper-plated film formed on the surface of the brass plate was obtained.
(評估) 以與實施例1相同之方式測定光澤度。將光澤度示於表1。 (Evaluation) The gloss was measured in the same manner as in Example 1. The gloss is shown in Table 1.
[實施例16] (PEI化合物) <中間物(Int.7)之製造> 將聚伸乙基亞胺(數量平均分子量10000)水溶液(0.015 M)加熱至70~90℃,使之與相對於胺值為0.3當量之1,3-丙烷磺內酯反應2小時。恢復至室溫,獲得聚伸乙基亞胺-1,3-丙烷磺內酯加成物之23重量%水溶液(Int.7)。再者,利用 1HNMR,以4.49 ppm附近之訊號之消失來確認反應之進行。 [Example 16] (PEI compound) <Production of intermediate (Int.7)> An aqueous solution (0.015 M) of polyethyleneimine (number average molecular weight 10000) was heated to 70-90°C and reacted with 1,3-propane sultone having an amine value of 0.3 equivalents for 2 hours. The mixture was returned to room temperature to obtain a 23 wt% aqueous solution of polyethyleneimine-1,3-propane sultone adduct (Int.7). Furthermore, the progress of the reaction was confirmed by the disappearance of the signal near 4.49 ppm using 1 HNMR.
<PEI化合物(試樣No.A16)之製造> 將100重量份之上述聚伸乙基亞胺-1,3-丙烷磺內酯加成物之水溶液(Int.7)及6重量份之苄基氯加熱至80~90℃,並反應3小時。恢復至室溫,結果獲得PEI化合物(試樣No.A16)之水溶液。將PEI化合物(試樣No.A16)之詳情示於表1。再者,利用 1HNMR,以4.5 PPM附近之訊號之消失來確認反應之進行。 <Production of PEI compound (Sample No. A16)> 100 parts by weight of the aqueous solution of the above-mentioned polyethyleneimine-1,3-propane sultone adduct (Int. 7) and 6 parts by weight of benzyl chloride were heated to 80-90°C and reacted for 3 hours. The solution was returned to room temperature to obtain an aqueous solution of PEI compound (Sample No. A16). The details of the PEI compound (Sample No. A16) are shown in Table 1. Furthermore, the progress of the reaction was confirmed by the disappearance of the signal near 4.5 PPM using 1 HNMR.
(鍍敷液之製備) 除使用PEI化合物(試樣No.A16)代替PEI化合物(試樣No.A1)以外,以與實施例1相同之方式製備銅鍍敷液(試樣No.E16)。 (Preparation of plating solution) A copper plating solution (sample No. E16) was prepared in the same manner as in Example 1 except that a PEI compound (sample No. A16) was used instead of a PEI compound (sample No. A1).
(電鍍試驗) 除使用銅鍍敷液(試樣No.E16)代替銅鍍敷液(試樣No.E1)以外,以與實施例1相同之方式進行陰極電解,結果獲得於黃銅板表面形成有鍍銅皮膜之評估樣品(試樣No.S16)。 (Electroplating test) Except that copper plating solution (sample No. E16) was used instead of copper plating solution (sample No. E1), cathodic electrolysis was performed in the same manner as in Example 1. As a result, an evaluation sample (sample No. S16) having a copper-plated film formed on the surface of the brass plate was obtained.
(評估) 以與實施例1相同之方式測定光澤度。將光澤度示於表1。 (Evaluation) The gloss was measured in the same manner as in Example 1. The gloss is shown in Table 1.
[實施例17] (PEI化合物) <中間物(Int.8)之製造> 將聚伸乙基亞胺(數量平均分子量1100)水溶液(0.12 M)加熱至70~90℃,使之與相對於胺值為0.2當量之氯乙酸烯丙酯反應2小時。恢復至室溫,結果獲得聚伸乙基亞胺-氯乙酸烯丙酯加成物之17重量%水溶液(Int.8)。再者,利用 1HNMR,以4.1 ppm附近之訊號之消失來確認反應之進行。 [Example 17] (PEI compound) <Production of intermediate (Int.8)> An aqueous solution (0.12 M) of polyethyleneimine (number average molecular weight 1100) was heated to 70-90°C and reacted with 0.2 equivalents of allyl chloroacetate relative to the amine value for 2 hours. The mixture was returned to room temperature to obtain a 17 wt% aqueous solution of polyethyleneimine-allyl chloroacetate adduct (Int.8). Furthermore, the progress of the reaction was confirmed by the disappearance of the signal near 4.1 ppm using 1 HNMR.
<PEI化合物(試樣No.A17)之製造> 將100重量份之上述聚伸乙基亞胺-氯乙酸烯丙酯加成物之水溶液(Int.8)及23重量份之苛性鈉水溶液(1.9M)加熱至90℃,逐次少量添加6重量份之苄基氯,並反應2小時。恢復至室溫,結果獲得PEI化合物(試樣No.A17)之水溶液。將PEI化合物(試樣No.A17)之詳情示於表2。再者,利用 1HNMR,以4.5 ppm附近之訊號之消失來確認反應之進行。 <Preparation of PEI compound (sample No. A17)> 100 parts by weight of the aqueous solution of the above-mentioned polyethyleneimine-allyl chloroacetate adduct (Int. 8) and 23 parts by weight of a caustic sodium aqueous solution (1.9M) were heated to 90°C, 6 parts by weight of benzyl chloride were added in small amounts, and the mixture was reacted for 2 hours. The mixture was returned to room temperature to obtain an aqueous solution of a PEI compound (sample No. A17). The details of the PEI compound (sample No. A17) are shown in Table 2. Furthermore, the progress of the reaction was confirmed by the disappearance of the signal near 4.5 ppm using 1 HNMR.
[表2]
(鍍敷液之製備) 除使用PEI化合物(試樣No.A17)代替PEI化合物(試樣No.A1)以外,以與實施例1相同之方式製備銅鍍敷液(試樣No.E17)。 (Preparation of plating solution) A copper plating solution (sample No. E17) was prepared in the same manner as in Example 1 except that a PEI compound (sample No. A17) was used instead of a PEI compound (sample No. A1).
(電鍍試驗) 除使用銅鍍敷液(試樣No.E17)代替銅鍍敷液(試樣No.E1)以外,以與實施例1相同之方式進行陰極電解,結果獲得於黃銅板表面形成有鍍銅皮膜之評估樣品(試樣No.S17)。 (Electroplating test) Except that copper plating solution (sample No. E17) was used instead of copper plating solution (sample No. E1), cathodic electrolysis was performed in the same manner as in Example 1. As a result, an evaluation sample (sample No. S17) having a copper-plated film formed on the surface of the brass plate was obtained.
(評估) 以與實施例1相同之方式測定光澤度。將光澤度示於表2。 (Evaluation) The gloss was measured in the same manner as in Example 1. The gloss is shown in Table 2.
[實施例18] (PEI化合物) <中間物(Int.9)之製造> 將聚伸乙基亞胺(數量平均分子量1800)水溶液(0.10 M)加熱至70~90℃,使之與相對於胺值為0.4當量之氯乙酸烯丙酯反應2小時。恢復至室溫,獲得聚伸乙基亞胺-氯乙酸烯丙酯加成物之19重量%水溶液(Int.9)。再者,利用 1HNMR,以4.1 ppm附近之訊號之消失來確認反應之進行。 [Example 18] (PEI compound) <Production of intermediate (Int.9)> An aqueous solution (0.10 M) of polyethyleneimine (number average molecular weight 1800) was heated to 70-90°C and reacted with 0.4 equivalents of allyl chloroacetate relative to the amine value for 2 hours. The mixture was returned to room temperature to obtain a 19 wt% aqueous solution of polyethyleneimine-allyl chloroacetate adduct (Int.9). Furthermore, the progress of the reaction was confirmed by the disappearance of the signal near 4.1 ppm using 1 HNMR.
<PEI化合物(試樣No.A18)之製造> 將100重量份之上述聚伸乙基亞胺-氯乙酸烯丙酯加成物之水溶液(Int.9)及19重量份之苛性鈉水溶液(4.4 M)加熱至90℃,逐次少量添加5重量份之苄基氯,並反應2小時。恢復至室溫並添加107重量份之純水,結果獲得PEI化合物(試樣No.A18)之水溶液。將PEI化合物(試樣No.A18)之詳情示於表2。再者,利用 1HNMR,以4.5 ppm附近之訊號之消失來確認反應之進行。 <Preparation of PEI compound (sample No. A18)> 100 parts by weight of the aqueous solution of the above-mentioned polyethyleneimine-allyl chloroacetate adduct (Int. 9) and 19 parts by weight of a caustic sodium aqueous solution (4.4 M) were heated to 90°C, 5 parts by weight of benzyl chloride were added in small amounts, and the mixture was reacted for 2 hours. The mixture was returned to room temperature and 107 parts by weight of pure water were added to obtain an aqueous solution of a PEI compound (sample No. A18). The details of the PEI compound (sample No. A18) are shown in Table 2. Furthermore, the progress of the reaction was confirmed by the disappearance of the signal near 4.5 ppm using 1 HNMR.
(鍍敷液之製備) 除使用PEI化合物(試樣No.A18)代替PEI化合物(試樣No.A1)以外,以與實施例1相同之方式製備銅鍍敷液(試樣No.E18)。 (Preparation of plating solution) A copper plating solution (sample No. E18) was prepared in the same manner as in Example 1 except that a PEI compound (sample No. A18) was used instead of a PEI compound (sample No. A1).
(電鍍試驗) 除使用銅鍍敷液(試樣No.E18)代替銅鍍敷液(試樣No.E1)以外,以與實施例1相同之方式進行陰極電解,結果獲得於黃銅板表面形成有鍍銅皮膜之評估樣品(試樣No.S18)。 (Electroplating test) Except that copper plating solution (sample No. E18) was used instead of copper plating solution (sample No. E1), cathodic electrolysis was performed in the same manner as in Example 1. As a result, an evaluation sample (sample No. S18) having a copper-plated film formed on the surface of the brass plate was obtained.
(評估) 以與實施例1相同之方式測定光澤度。將光澤度示於表2。 (Evaluation) The gloss was measured in the same manner as in Example 1. The gloss is shown in Table 2.
[實施例19] (PEI化合物) <中間物(Int.10)之製造> 將聚伸乙基亞胺(數量平均分子量1800)水溶液(0.10 M)加熱至70~90℃,使之與相對於胺值為0.2當量之氯乙酸烯丙酯反應2小時。恢復至室溫,獲得聚伸乙基亞胺-氯乙酸烯丙酯加成物之15重量%水溶液(Int.10)。再者,利用 1HNMR,以4.1 ppm附近之訊號之消失來確認反應之進行。 [Example 19] (PEI compound) <Production of intermediate (Int.10)> An aqueous solution (0.10 M) of polyethyleneimine (number average molecular weight 1800) was heated to 70-90°C and reacted with 0.2 equivalents of allyl chloroacetate relative to the amine value for 2 hours. The mixture was returned to room temperature to obtain a 15 wt% aqueous solution of polyethyleneimine-allyl chloroacetate adduct (Int.10). Furthermore, the progress of the reaction was confirmed by the disappearance of the signal near 4.1 ppm using 1 HNMR.
<PEI化合物(試樣No.A19)之製造> 將100重量份之上述聚伸乙基亞胺-氯乙酸烯丙酯加成物之水溶液(Int.10)及80重量份之苛性鈉水溶液(0.8 M)加熱至90℃,逐次少量添加10重量份之2-氯苄氯,並反應2小時。恢復至室溫,結果獲得PEI化合物(試樣No.A19)之水溶液。將PEI化合物(試樣No.A19)之詳情示於表2。再者,利用 1HNMR,以4.5 ppm附近之訊號之消失來確認反應之進行。 <Preparation of PEI compound (sample No. A19)> 100 parts by weight of the aqueous solution of the above-mentioned polyethyleneimine-allyl chloroacetate adduct (Int. 10) and 80 parts by weight of a caustic sodium aqueous solution (0.8 M) were heated to 90°C, 10 parts by weight of 2-chlorobenzyl chloride were added in small amounts, and the mixture was reacted for 2 hours. The mixture was returned to room temperature to obtain an aqueous solution of PEI compound (sample No. A19). The details of the PEI compound (sample No. A19) are shown in Table 2. Furthermore, the progress of the reaction was confirmed by the disappearance of the signal near 4.5 ppm using 1 HNMR.
(鍍敷液之製備) 除使用PEI化合物(試樣No.A19)代替PEI化合物(試樣No.A1)以外,以與實施例1相同之方式製備銅鍍敷液(試樣No.E19)。 (Preparation of plating solution) A copper plating solution (sample No. E19) was prepared in the same manner as in Example 1 except that a PEI compound (sample No. A19) was used instead of a PEI compound (sample No. A1).
(電鍍試驗) 除使用銅鍍敷液(試樣No.E19)代替銅鍍敷液(試樣No.E1)以外,以與實施例1相同之方式進行陰極電解,結果獲得於黃銅板表面形成有鍍銅皮膜之評估樣品(試樣No.S19)。 (Electroplating test) Except that copper plating solution (sample No. E19) was used instead of copper plating solution (sample No. E1), cathodic electrolysis was performed in the same manner as in Example 1. As a result, an evaluation sample (sample No. S19) having a copper-plated film formed on the surface of the brass plate was obtained.
(評估) 以與實施例1相同之方式測定光澤度。將光澤度示於表2。 (Evaluation) The gloss was measured in the same manner as in Example 1. The gloss is shown in Table 2.
[實施例20] (PEI化合物) <PEI化合物(試樣No.A20)之製造> 將100重量份之實施例19中製造之聚伸乙基亞胺-氯乙酸烯丙酯加成物之水溶液(Int.10)及76重量份之苛性鈉水溶液(1.7 M)加熱至90℃,使該等與9重量份之4-氟氯苄反應2小時。恢復至室溫,結果獲得PEI化合物(試樣No.A20)之水溶液。將PEI化合物(試樣No.A20)之詳情示於表2。再者,利用 1HNMR,以4.5 ppm附近之訊號之消失來確認反應之進行。 [Example 20] (PEI compound) <Preparation of PEI compound (Sample No. A20)> 100 parts by weight of the aqueous solution of polyethyleneimine-allyl chloroacetate adduct prepared in Example 19 (Int. 10) and 76 parts by weight of caustic sodium aqueous solution (1.7 M) were heated to 90°C and reacted with 9 parts by weight of 4-fluorobenzyl chloride for 2 hours. The solution was returned to room temperature to obtain an aqueous solution of PEI compound (Sample No. A20). The details of the PEI compound (Sample No. A20) are shown in Table 2. Furthermore, the progress of the reaction was confirmed by the disappearance of the signal near 4.5 ppm using 1 HNMR.
(鍍敷液之製備) 除使用PEI化合物(試樣No.A20)代替PEI化合物(試樣No.A1)以外,以與實施例1相同之方式製備銅鍍敷液(試樣No.E20)。 (Preparation of plating solution) A copper plating solution (sample No. E20) was prepared in the same manner as in Example 1 except that a PEI compound (sample No. A20) was used instead of a PEI compound (sample No. A1).
(電鍍試驗) 除使用銅鍍敷液(試樣No.E20)代替銅鍍敷液(試樣No.E1)以外,以與實施例1相同之方式進行陰極電解,結果獲得於黃銅板表面形成有鍍銅皮膜之評估樣品(試樣No.S20)。 (Electroplating test) Except for using copper plating solution (sample No. E20) instead of copper plating solution (sample No. E1), cathodic electrolysis was performed in the same manner as in Example 1, and an evaluation sample (sample No. S20) with a copper-plated film formed on the surface of the brass plate was obtained.
(評估) 以與實施例1相同之方式測定光澤度。將光澤度示於表2。 (Evaluation) The gloss was measured in the same manner as in Example 1. The gloss is shown in Table 2.
[實施例21] (PEI化合物) <PEI化合物(試樣No.A21)之製造> 將100重量份之實施例19中製造之聚伸乙基亞胺-氯乙酸烯丙酯加成物之水溶液(Int.10)及86重量份之苛性鈉水溶液(1.4 M)加熱至90℃,使該等與8重量份之3-甲基氯苄反應2小時。恢復至室溫,結果獲得PEI化合物(試樣No.A21)之水溶液。將PEI化合物(試樣No.A21)之詳情示於表2。再者,利用 1HNMR,以4.5 ppm附近之訊號之消失來確認反應之進行。 [Example 21] (PEI compound) <Preparation of PEI compound (Sample No. A21)> 100 parts by weight of the aqueous solution of polyethyleneimine-allyl chloroacetate adduct prepared in Example 19 (Int. 10) and 86 parts by weight of caustic sodium aqueous solution (1.4 M) were heated to 90°C and reacted with 8 parts by weight of 3-methylbenzyl chloride for 2 hours. The solution was returned to room temperature to obtain an aqueous solution of PEI compound (Sample No. A21). The details of the PEI compound (Sample No. A21) are shown in Table 2. Furthermore, the progress of the reaction was confirmed by the disappearance of the signal near 4.5 ppm using 1 HNMR.
(鍍敷液之製備) 除使用PEI化合物(試樣No.A21)代替PEI化合物(試樣No.A1)以外,以與實施例1相同之方式製備銅鍍敷液(試樣No.E21)。 (Preparation of plating solution) A copper plating solution (sample No. E21) was prepared in the same manner as in Example 1 except that a PEI compound (sample No. A21) was used instead of a PEI compound (sample No. A1).
(電鍍試驗) 除使用銅鍍敷液(試樣No.E21)代替銅鍍敷液(試樣No.E1)以外,以與實施例1相同之方式進行陰極電解,結果獲得於黃銅板表面形成有鍍銅皮膜之評估樣品(試樣No.S21)。 (Electroplating test) Except that copper plating solution (sample No. E21) was used instead of copper plating solution (sample No. E1), cathodic electrolysis was performed in the same manner as in Example 1, and an evaluation sample (sample No. S21) having a copper-plated film formed on the surface of the brass plate was obtained.
(評估) 以與實施例1相同之方式測定光澤度。將光澤度示於表2。 (Evaluation) The gloss was measured in the same manner as in Example 1. The gloss is shown in Table 2.
[實施例22] (PEI化合物) <PEI化合物(試樣No.A22)之製造> 將100重量份之實施例19中製造之聚伸乙基亞胺-氯乙酸烯丙酯加成物之水溶液(Int.10)及63重量份之苛性鈉水溶液(2 M)加熱至90℃,使該等與10重量份之3-甲氧基氯苄反應2小時。恢復至室溫,結果獲得PEI化合物(試樣No.A22)之水溶液。將PEI化合物(試樣No.A22)之詳情示於表2。再者,利用 1HNMR,以4.5 ppm附近之訊號之消失來確認反應之進行。 [Example 22] (PEI compound) <Preparation of PEI compound (Sample No. A22)> 100 parts by weight of the aqueous solution of polyethyleneimine-allyl chloroacetate adduct prepared in Example 19 (Int. 10) and 63 parts by weight of an aqueous solution of caustic sodium (2 M) were heated to 90°C and reacted with 10 parts by weight of 3-methoxybenzyl chloride for 2 hours. The solution was returned to room temperature to obtain an aqueous solution of PEI compound (Sample No. A22). The details of the PEI compound (Sample No. A22) are shown in Table 2. Furthermore, the progress of the reaction was confirmed by the disappearance of the signal near 4.5 ppm using 1 HNMR.
(鍍敷液之製備) 除使用PEI化合物(試樣No.A22)代替PEI化合物(試樣No.A1)以外,以與實施例1相同之方式製備銅鍍敷液(試樣No.E22)。 (Preparation of plating solution) A copper plating solution (sample No. E22) was prepared in the same manner as in Example 1 except that a PEI compound (sample No. A22) was used instead of a PEI compound (sample No. A1).
(電鍍試驗) 除使用銅鍍敷液(試樣No.E22)代替銅鍍敷液(試樣No.E1)以外,以與實施例1相同之方式進行陰極電解,結果獲得於黃銅板表面形成有鍍銅皮膜之評估樣品(試樣No.S22)。 (Electroplating test) Except that copper plating solution (sample No. E22) was used instead of copper plating solution (sample No. E1), cathodic electrolysis was performed in the same manner as in Example 1. As a result, an evaluation sample (sample No. S22) with a copper-plated film formed on the surface of the brass plate was obtained.
(評估) 以與實施例1相同之方式測定光澤度。將光澤度示於表2。 (Evaluation) The gloss was measured in the same manner as in Example 1. The gloss is shown in Table 2.
[實施例23] (PEI化合物) <PEI化合物(試樣No.A23)之製造> 將100重量份之實施例19中製造之聚伸乙基亞胺-氯乙酸烯丙酯加成物之水溶液(Int.10)及42重量份之苛性鈉水溶液(1.5 M)加熱至90℃,使該等與10重量份之4-硝基氯苄反應2小時。恢復至室溫,結果獲得PEI化合物(試樣No.A23)之水溶液。將PEI化合物(試樣No.A23)之詳情示於表2。再者,利用 1HNMR,以4.5 ppm附近之訊號之消失來確認反應之進行。 [Example 23] (PEI compound) <Preparation of PEI compound (Sample No. A23)> 100 parts by weight of the aqueous solution of polyethyleneimine-allyl chloroacetate adduct prepared in Example 19 (Int. 10) and 42 parts by weight of a caustic sodium aqueous solution (1.5 M) were heated to 90°C and reacted with 10 parts by weight of 4-nitrobenzyl chloride for 2 hours. The solution was returned to room temperature to obtain an aqueous solution of PEI compound (Sample No. A23). The details of the PEI compound (Sample No. A23) are shown in Table 2. Furthermore, the progress of the reaction was confirmed by the disappearance of the signal near 4.5 ppm using 1 HNMR.
(鍍敷液之製備) 除使用PEI化合物(試樣No.A23)代替PEI化合物(試樣No.A1)以外,以與實施例1相同之方式製備銅鍍敷液(試樣No.E23)。 (Preparation of plating solution) A copper plating solution (sample No. E23) was prepared in the same manner as in Example 1 except that a PEI compound (sample No. A23) was used instead of a PEI compound (sample No. A1).
(電鍍試驗) 除使用銅鍍敷液(試樣No.E23)代替銅鍍敷液(試樣No.E1)以外,以與實施例1相同之方式進行陰極電解,結果獲得於黃銅板表面形成有鍍銅皮膜之評估樣品(試樣No.S23)。 (Electroplating test) Except that copper plating solution (sample No. E23) was used instead of copper plating solution (sample No. E1), cathodic electrolysis was performed in the same manner as in Example 1. As a result, an evaluation sample (sample No. S23) with a copper-plated film formed on the surface of the brass plate was obtained.
(評估) 以與實施例1相同之方式測定光澤度。將光澤度示於表2。 (Evaluation) The gloss was measured in the same manner as in Example 1. The gloss is shown in Table 2.
[實施例24] (PEI化合物) <中間物(Int.11)之製造> 將聚伸乙基亞胺(數量平均分子量10000)水溶液(0.11 M)加熱至70~90℃,使之與相對於胺值為0.2當量之氯乙酸烯丙酯反應2小時。恢復至室溫,獲得聚伸乙基亞胺-氯乙酸烯丙酯加成物之12重量%水溶液(Int.11)。再者,利用 1HNMR,以4.1 ppm附近之訊號之消失來確認反應之進行。 [Example 24] (PEI compound) <Production of intermediate (Int.11)> An aqueous solution (0.11 M) of polyethyleneimine (number average molecular weight 10000) was heated to 70-90°C and reacted with 0.2 equivalents of allyl chloroacetate relative to the amine value for 2 hours. The mixture was returned to room temperature to obtain a 12 wt% aqueous solution of polyethyleneimine-allyl chloroacetate adduct (Int.11). Furthermore, the progress of the reaction was confirmed by the disappearance of the signal near 4.1 ppm using 1 HNMR.
<PEI化合物(試樣No.A24)之製造> 將100重量份之上述聚伸乙基亞胺-氯乙酸烯丙酯加成物之水溶液(Int.11)加熱至90℃,使之與5重量份之苄基氯反應2小時。恢復至室溫,結果獲得PEI化合物(試樣No.A24)之水溶液。將PEI化合物(試樣No.A24)之詳情示於表2。再者,利用 1HNMR,以4.5 ppm附近之訊號之消失來確認反應之進行。 <Production of PEI compound (Sample No. A24)> 100 parts by weight of the aqueous solution of the above-mentioned polyethyleneimine-allyl chloroacetate adduct (Int. 11) was heated to 90°C and reacted with 5 parts by weight of benzyl chloride for 2 hours. The solution was returned to room temperature to obtain an aqueous solution of PEI compound (Sample No. A24). The details of the PEI compound (Sample No. A24) are shown in Table 2. Furthermore, the progress of the reaction was confirmed by the disappearance of the signal near 4.5 ppm using 1 HNMR.
(鍍敷液之製備) 除使用PEI化合物(試樣No.A24)代替PEI化合物(試樣No.A1)以外,以與實施例1相同之方式製備銅鍍敷液(試樣No.E24)。 (Preparation of plating solution) A copper plating solution (sample No. E24) was prepared in the same manner as in Example 1 except that a PEI compound (sample No. A24) was used instead of a PEI compound (sample No. A1).
(電鍍試驗) 除使用銅鍍敷液(試樣No.E24)代替銅鍍敷液(試樣No.E1)以外,以與實施例1相同之方式進行陰極電解,結果獲得於黃銅板表面形成有鍍銅皮膜之評估樣品(試樣No.S24)。 (Electroplating test) Except for using copper plating solution (sample No. E24) instead of copper plating solution (sample No. E1), cathodic electrolysis was performed in the same manner as in Example 1, and an evaluation sample (sample No. S24) with a copper-plated film formed on the surface of the brass plate was obtained.
(評估) 以與實施例1相同之方式測定光澤度。將光澤度示於表2。 (Evaluation) The gloss was measured in the same manner as in Example 1. The gloss is shown in Table 2.
[實施例25] (PEI化合物) <中間物(Int.12)之製造> 將聚伸乙基亞胺(數量平均分子量1800)水溶液(0.13 M)加熱至70~90℃,使之與相對於胺值為0.6當量之1,4-丁烷磺內酯反應2小時。恢復至室溫,獲得聚伸乙基亞胺-1,4-丁烷磺內酯加成物之38重量%水溶液(Int.12)。再者,利用 1HNMR,以4.49 ppm附近之訊號之消失來確認反應之進行。 [Example 25] (PEI compound) <Production of intermediate (Int.12)> An aqueous solution (0.13 M) of polyethyleneimine (number average molecular weight 1800) was heated to 70-90°C and reacted with 1,4-butane sultone having an amine value of 0.6 equivalents for 2 hours. The mixture was returned to room temperature to obtain a 38 wt% aqueous solution of polyethyleneimine-1,4-butane sultone adduct (Int.12). Furthermore, the progress of the reaction was confirmed by the disappearance of the signal near 4.49 ppm using 1 HNMR.
<PEI化合物(試樣No.A25)之製造> 將100重量份之上述聚伸乙基亞胺-1,4-丁烷磺內酯加成物之水溶液(Int.12)及7重量份之苄基氯加熱至80~90℃,並反應3小時。恢復至室溫,結果獲得PEI化合物(試樣No.A25)之水溶液。將PEI化合物(試樣No.A25)之詳情示於表2。再者,利用 1HNMR,以4.5 ppm附近之訊號之消失來確認反應之進行。 <Preparation of PEI compound (sample No. A25)> 100 parts by weight of the aqueous solution of the above-mentioned polyethyleneimine-1,4-butane sultone adduct (Int. 12) and 7 parts by weight of benzyl chloride were heated to 80-90°C and reacted for 3 hours. The solution was returned to room temperature to obtain an aqueous solution of PEI compound (sample No. A25). The details of the PEI compound (sample No. A25) are shown in Table 2. Furthermore, the progress of the reaction was confirmed by the disappearance of the signal near 4.5 ppm using 1 HNMR.
(鍍敷液之製備) 除使用PEI化合物(試樣No.A25)代替PEI化合物(試樣No.A1)以外,以與實施例1相同之方式製備銅鍍敷液(試樣No.E25)。 (Preparation of plating solution) A copper plating solution (sample No. E25) was prepared in the same manner as in Example 1 except that a PEI compound (sample No. A25) was used instead of a PEI compound (sample No. A1).
(電鍍試驗) 除使用銅鍍敷液(試樣No.E25)代替銅鍍敷液(試樣No.E1)以外,以與實施例1相同之方式進行陰極電解,結果獲得於黃銅板表面形成有鍍銅皮膜之評估樣品(試樣No.S25)。 (Electroplating test) Except that copper plating solution (sample No. E25) was used instead of copper plating solution (sample No. E1), cathodic electrolysis was performed in the same manner as in Example 1. As a result, an evaluation sample (sample No. S25) having a copper-plated film formed on the surface of the brass plate was obtained.
(評估) 以與實施例1相同之方式測定光澤度。將光澤度示於表2。 (Evaluation) The gloss was measured in the same manner as in Example 1. The gloss is shown in Table 2.
[實施例26] (鍍敷液之製備) 除使用富士膠片和光純藥股份有限公司製造之聚乙二醇4000代替富士膠片和光純藥股份有限公司製造之聚乙二醇20000以外,以與實施例1相同之方式製備銅鍍敷液(試樣No.E26)。 銅鍍敷液(試樣No.E26)係於實施例4所製備之銅鍍敷液(試樣No.E4)中僅變更界面活性劑而得者。 [Example 26] (Preparation of plating solution) A copper plating solution (sample No. E26) was prepared in the same manner as in Example 1, except that polyethylene glycol 4000 manufactured by Fuji Film Wako Pure Chemical Industries, Ltd. was used instead of polyethylene glycol 20000 manufactured by Fuji Film Wako Pure Chemical Industries, Ltd. The copper plating solution (sample No. E26) was obtained by changing only the surfactant in the copper plating solution (sample No. E4) prepared in Example 4.
(電鍍試驗) 除使用銅鍍敷液(試樣No.E26)代替銅鍍敷液(試樣No.E1)以外,以與實施例1相同之方式進行陰極電解,結果獲得於黃銅板表面形成有鍍銅皮膜之評估樣品(試樣No.S26)。 (Electroplating test) Except that copper plating solution (sample No. E26) was used instead of copper plating solution (sample No. E1), cathodic electrolysis was performed in the same manner as in Example 1. As a result, an evaluation sample (sample No. S26) with a copper-plated film formed on the surface of the brass plate was obtained.
(評估) 以與實施例1相同之方式測定光澤度。將光澤度示於表2。 (Evaluation) The gloss was measured in the same manner as in Example 1. The gloss is shown in Table 2.
[實施例27] (鍍敷液之製備) 除使用ADEKA股份有限公司製造之非離子性界面活性劑Adeka Pluronic(註冊商標)L-64代替富士膠片和光純藥股份有限公司製造之聚乙二醇20000以外,以與實施例1相同之方式製備銅鍍敷液(試樣No.E27)。 銅鍍敷液(試樣No.E27)係於實施例4所製備之銅鍍敷液(試樣No.E4)中僅變更界面活性劑而得者。 [Example 27] (Preparation of plating solution) A copper plating solution (sample No. E27) was prepared in the same manner as in Example 1, except that the non-ionic surfactant Adeka Pluronic (registered trademark) L-64 manufactured by ADEKA Co., Ltd. was used instead of polyethylene glycol 20000 manufactured by Fuji Film Wako Pure Chemical Industries, Ltd. The copper plating solution (sample No. E27) was obtained by changing only the surfactant in the copper plating solution (sample No. E4) prepared in Example 4.
(電鍍試驗) 除使用銅鍍敷液(試樣No.E27)代替銅鍍敷液(試樣No.E1)以外,以與實施例1相同之方式進行陰極電解,結果獲得於黃銅板表面形成有鍍銅皮膜之評估樣品(試樣No.S27)。 (Electroplating test) Except that copper plating solution (sample No. E27) was used instead of copper plating solution (sample No. E1), cathodic electrolysis was performed in the same manner as in Example 1. As a result, an evaluation sample (sample No. S27) with a copper-plated film formed on the surface of the brass plate was obtained.
(評估) 以與實施例1相同之方式測定光澤度。將光澤度示於表2。 (Evaluation) The gloss was measured in the same manner as in Example 1. The gloss is shown in Table 2.
[比較例1] (鍍敷液之製備) 製備包含220 g/L之硫酸銅五水合物、70 g/L之硫酸、60 mg/L之氯化物離子Cl -、100 mg/L之作為界面活性劑之富士膠片和光純藥股份有限公司製造之聚乙二醇20000、8.3 mg/L之作為光澤劑之雙(磺丙基鈉)-二硫化物(SPS)、及3.0 mg/L之作為平滑劑之詹納斯綠B的銅鍍敷液(試樣No.E28)。 [Comparative Example 1] (Preparation of plating solution) A copper plating solution containing 220 g/L of copper sulfate pentahydrate, 70 g/L of sulfuric acid, 60 mg/L of chloride ions Cl - , 100 mg/L of polyethylene glycol 20000 manufactured by Fuji Film Co., Ltd. Wako Pure Chemical Industries, Ltd. as a surfactant, 8.3 mg/L of bis(sulfopropyl sodium)-disulfide (SPS) as a brightener, and 3.0 mg/L of Janus Green B as a smoothing agent was prepared (Sample No. E28).
(電鍍試驗) 除使用銅鍍敷液(試樣No.E28)代替銅鍍敷液(試樣No.E1)以外,以與實施例1相同之方式進行陰極電解,結果獲得於黃銅板表面形成有鍍銅皮膜之評估樣品(試樣No.S28)。 (Electroplating test) Except that copper plating solution (sample No. E28) was used instead of copper plating solution (sample No. E1), cathodic electrolysis was performed in the same manner as in Example 1. As a result, an evaluation sample (sample No. S28) having a copper-plated film formed on the surface of the brass plate was obtained.
(評估) 以與實施例1相同之方式測定光澤度。將光澤度示於表2。 (Evaluation) The gloss was measured in the same manner as in Example 1. The gloss is shown in Table 2.
[比較例2] (鍍敷液之製備) 製備包含220 g/L之硫酸銅五水合物、70 g/L之硫酸、60 mg/L之氯化物離子Cl -、100 mg/L之作為界面活性劑之富士膠片和光純藥股份有限公司製造之聚乙二醇20000、8.3 mg/L之作為光澤劑之雙(磺丙基鈉)-二硫化物(SPS)、及3.0 mg/L之作為平滑劑之苄基氯與聚伸烷基亞胺之芳香族反應生成物的銅鍍敷液(試樣No.E29)。 [Comparative Example 2] (Preparation of plating solution) A copper plating solution containing 220 g/L of copper sulfate pentahydrate, 70 g/L of sulfuric acid, 60 mg/L of chloride ions Cl - , 100 mg/L of polyethylene glycol 20000 manufactured by Fuji Film Co., Ltd. Wako Pure Chemical Industries, Ltd. as a surfactant, 8.3 mg/L of bis(sulfopropyl sodium)-disulfide (SPS) as a brightener, and 3.0 mg/L of an aromatic reaction product of benzyl chloride and polyalkylene imine as a lubricant was prepared (Sample No. E29).
(電鍍試驗) 除使用銅鍍敷液(試樣No.E29)代替銅鍍敷液(試樣No.E1)以外,以與實施例1相同之方式進行陰極電解,結果獲得於黃銅板表面形成有鍍銅皮膜之評估樣品(試樣No.S29)。 (Electroplating test) Except for using copper plating solution (sample No. E29) instead of copper plating solution (sample No. E1), cathodic electrolysis was performed in the same manner as in Example 1, and an evaluation sample (sample No. S29) with a copper-plated film formed on the surface of the brass plate was obtained.
(評估) 以與實施例1相同之方式測定光澤度。將光澤度示於表2。 (Evaluation) The gloss was measured in the same manner as in Example 1. The gloss is shown in Table 2.
由表1及表2可知,實施例(試樣No.E1~E27)中製作之評估樣品與比較例(試樣No.E28及E29)相比,光澤度變高。As can be seen from Tables 1 and 2, the evaluation samples prepared in the embodiments (samples No. E1 to E27) have higher gloss than the comparative examples (samples No. E28 and E29).
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