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TWI871470B - Substrate detection device, substrate detection method and substrate processing unit - Google Patents

Substrate detection device, substrate detection method and substrate processing unit Download PDF

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TWI871470B
TWI871470B TW110120284A TW110120284A TWI871470B TW I871470 B TWI871470 B TW I871470B TW 110120284 A TW110120284 A TW 110120284A TW 110120284 A TW110120284 A TW 110120284A TW I871470 B TWI871470 B TW I871470B
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substrate
sensors
storage container
sensor
sensor holding
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TW202147479A (en
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稲尾吉浩
泉剛士
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日商新創機電科技股份有限公司
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    • H10P72/0608
    • H10P72/3202
    • H10P74/23
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Abstract

本發明有關基板檢測裝置,即使在收納容器的形狀未被規格化的情況或者基板的形狀為方形基板的情況中的任一情況下,也能夠檢測基板,容易地獲取基板資訊。該基板檢測裝置具備:載置部,其係載置供多個基板沿上下方向排列收納的收納容器;感測器保持部,其係與載置部相對升降;升降驅動部,其係使載置部與所述感測器保持部相對升降;多個感測器,其係在與上下方向相交的方向上分離配置在所述感測器保持部,分別檢測容納於收納容器的基板的端部的不同的部分;以及控制部,其係驅動升降驅動部,使載置部與感測器保持部相對升降,並根據多個感測器對基板的端部的檢測結果獲取收納容器內的基板資訊。The present invention relates to a substrate detection device, which can detect substrates and easily obtain substrate information even in the case where the shape of a storage container is not standardized or the shape of the substrate is a square substrate. The substrate detection device comprises: a loading portion, which is a storage container for storing a plurality of substrates arranged in an up-down direction; a sensor holding portion, which is lifted relative to the loading portion; a lifting drive portion, which causes the loading portion and the sensor holding portion to be lifted relative to each other; a plurality of sensors, which are separately arranged on the sensor holding portion in a direction intersecting the up-down direction, and respectively detect different parts of the end of the substrate accommodated in the storage container; and a control portion, which drives the lifting drive portion to lift the loading portion and the sensor holding portion relative to each other, and obtains substrate information in the storage container based on the detection results of the plurality of sensors on the end of the substrate.

Description

基板檢測裝置、基板檢測方法以及基板處理單元Substrate detection device, substrate detection method and substrate processing unit

本發明有關基板檢測裝置、基板檢測方法以及基板處理單元。 The present invention relates to a substrate detection device, a substrate detection method and a substrate processing unit.

已提出有一種基板檢測裝置,檢測在收納容器中沿上下方向排列而被收納的基板並獲取收納容器內的基板資訊(例如,參閱專利文獻1)。專利文獻1的基板檢測裝置檢測容納在收納容器中的圓形的基板。該檢測裝置使用由投光部與受光部構成的感測器,沿水平方向夾持圓形的基板的一部分從而檢測基板。 A substrate detection device has been proposed, which detects substrates arranged in a vertical direction in a storage container and obtains information about the substrates in the storage container (for example, see Patent Document 1). The substrate detection device of Patent Document 1 detects a circular substrate contained in a storage container. The detection device uses a sensor composed of a light projecting part and a light receiving part to clamp a part of the circular substrate in the horizontal direction to detect the substrate.

[先前技術文獻] [Prior Art Literature] [專利文獻] [Patent Literature]

專利文獻1:日本特開第2009-200444號公報 Patent document 1: Japanese Patent Publication No. 2009-200444

由於專利文獻1的基板檢測裝置具有檢測圓 形的基板的構成,因此在基板為矩形狀的方形基板的情況下,需要拓寬投光部與受光部的間隔。例如,為了檢測容納在收納容器的方形基板,在收納容器內需要用於供投光部及受光部插入的空間,結果導致收納容器的大型化。此外,在收納容器未規格化的情況下,有可能使用沒有供投光部及受光部插入的空間的收納容器,從而發生無法獲取容納在收納容器內的方形基板的基板資訊的狀況。 Since the substrate detection device of Patent Document 1 has a structure for detecting a circular substrate, when the substrate is a rectangular square substrate, it is necessary to widen the interval between the light projecting part and the light receiving part. For example, in order to detect a square substrate contained in a storage container, a space for inserting the light projecting part and the light receiving part is required in the storage container, resulting in a larger storage container. In addition, if the storage container is not standardized, it is possible to use a storage container without a space for inserting the light projecting part and the light receiving part, resulting in a situation where the substrate information of the square substrate contained in the storage container cannot be obtained.

本發明的目的在於提供基板檢測裝置以及基板檢測方法,並進一步提供具備該基板檢測裝置的基板處理單元,該基板檢測裝置即使在收納容器的形狀未規格化的情況或者基板的形狀為方形基板的情況的任一情況下,均可檢測基板,可容易地獲取基板資訊。 The purpose of the present invention is to provide a substrate detection device and a substrate detection method, and further to provide a substrate processing unit equipped with the substrate detection device. The substrate detection device can detect the substrate even in the case where the shape of the storage container is not standardized or the shape of the substrate is a square substrate, and can easily obtain substrate information.

在本發明的方案中,提供了一種基板檢測裝置,具備:載置部,其係載置供多個基板沿上下方向排列收納的收納容器;感測器保持部,其係與載置部相對地升降;升降驅動部,其係使載置部與感測器保持部相對地升降;多個感測器,其係在與上下方向相交的方向上分離配置於感測器保持部,分別檢測容納於收納容器的基板的端部的不同的部分;以及控制部,其係驅動升降驅動部,使載置部與感測器保持部相對地升降,並根據多個感測器對基板的端部的檢測結果獲取收納容器內的基板資訊;感測器保持部具備:四角形狀的框體、用於維持多個感測器的 水平方向或大致水平方向的位置之維持構件、以及從框體垂下之一對的被導引構件;一對的被導引構件分別被導引成可以升降;維持構件經由被一對的被導引構件固定而保持在框體。 In the scheme of the present invention, a substrate detection device is provided, which comprises: a loading part, which is a storage container for loading a plurality of substrates arranged in a vertical direction; a sensor holding part, which is lifted relative to the loading part; a lifting driving part, which makes the loading part and the sensor holding part lift relative to each other; a plurality of sensors, which are separately arranged on the sensor holding part in a direction intersecting the vertical direction, and respectively detect different parts of the end of the substrate accommodated in the storage container; and a control part, which drives the lifting driving part. The lifting drive unit makes the loading unit and the sensor holding unit rise and fall relative to each other, and obtains the substrate information in the storage container according to the detection results of the end of the substrate by multiple sensors; the sensor holding unit has: a quadrangular frame, a holding member for maintaining the horizontal or approximately horizontal position of multiple sensors, and a pair of guided members hanging from the frame; the pair of guided members are respectively guided to be able to rise and fall; the holding member is held in the frame by being fixed by the pair of guided members.

還有,在本發明的方案中,提供了一種基板檢測裝置,具備:載置部,其係載置使多個基板沿上下方向排列收納的收納容器;感測器保持部,其係與載置部相對地升降;升降驅動部,其係使載置部與感測器保持部相對地升降;多個感測器,其係在與上下方向相交的方向上分離配置於感測器保持部,分別檢測容納在收納容器的基板的端部的不同的部分;以及控制部,其係驅動升降驅動部,使載置部與感測器保持部相對地升降,並根據由多個感測器對基板的端部的檢測結果獲取收納容器內的基板資訊。 In addition, in the scheme of the present invention, a substrate detection device is provided, which comprises: a loading part, which is a storage container for loading a plurality of substrates arranged and stored in the vertical direction; a sensor holding part, which is lifted relative to the loading part; a lifting drive part, which causes the loading part and the sensor holding part to be lifted relative to each other; a plurality of sensors, which are separately arranged on the sensor holding part in a direction intersecting the vertical direction, and respectively detect different parts of the end of the substrate contained in the storage container; and a control part, which drives the lifting drive part, causes the loading part and the sensor holding part to be lifted relative to each other, and obtains the substrate information in the storage container according to the detection results of the end of the substrate by the plurality of sensors.

在本發明的方案中,提供了一種基板檢測方法,對在載置於載置部的收納容器中沿上下方向排列收納的多個基板進行檢測,其特徵在於,該基板檢測方法包括:使前述載置部和與被感測器保持部保持的多個感測器在與上下方向相交的方向上分離配置的感測器保持部相對地升降之工序;透過前述多個感測器分別檢測容納於前述收納容器的前述基板的端部的不同的部分之工序;以及根據前述多個感測器對前述基板的端部的檢測結果,獲取前述收納容器內的基板資訊之工序;其中,前述感測器保持部具備:四角形狀的框體、用於維持前述多個感測器的水平方向或大致水平方向的位置之維持構件、以及從前述框 體垂下之一對的被導引構件;前述一對的被導引構件分別被導引成可以升降;前述維持構件經由被前述一對的被導引構件固定而保持在前述框體。 In the scheme of the present invention, a substrate detection method is provided, which detects a plurality of substrates arranged and stored in a storage container placed on a placing portion in a vertical direction, wherein the substrate detection method comprises: a step of relatively raising and lowering the placing portion and a sensor holding portion which is separated and arranged from a plurality of sensors held by a sensor holding portion in a direction intersecting the vertical direction; a step of respectively detecting different portions of the end of the substrate contained in the storage container by the plurality of sensors; and a step of detecting the substrate by the plurality of sensors. And the process of obtaining the substrate information in the storage container according to the detection results of the ends of the substrate by the aforementioned multiple sensors; wherein the aforementioned sensor holding part has: a quadrangular frame, a holding member for maintaining the horizontal or substantially horizontal positions of the aforementioned multiple sensors, and a pair of guided members hanging from the aforementioned frame; the aforementioned pair of guided members are respectively guided to be able to rise and fall; the aforementioned holding member is held in the aforementioned frame by being fixed by the aforementioned pair of guided members.

此外,在本發明的方案中,提供了一種基板檢測方法,是檢測在載置於載置部的收納容器中沿上下方向排列收納的多個基板的方法,且包括:使載置部和與多個感測器在與上下方向相交的方向上分離配置的感測器保持部相對地升降之工序;透過多個感測器分別檢測容納在收納容器的基板的端部的不同的部分之工序;以及根據由多個感測器對基板的端部的檢測結果獲取收納容器內的基板資訊之工序。 In addition, in the scheme of the present invention, a substrate detection method is provided, which is a method for detecting a plurality of substrates arranged and stored in a storage container placed on a placing part in a vertical direction, and includes: a step of relatively lifting and lowering the placing part and a sensor holding part separated and arranged with a plurality of sensors in a direction intersecting the vertical direction; a step of respectively detecting different parts of the end of the substrate stored in the storage container by a plurality of sensors; and a step of obtaining substrate information in the storage container based on the detection results of the end of the substrate by the plurality of sensors.

此外,在本發明的方案中,提供了一種基板處理單元,具備上述的基板檢測裝置、處理基板的基板處理裝置、在基板檢測裝置與基板處理裝置之間輸送基板的輸送裝置。 In addition, in the scheme of the present invention, a substrate processing unit is provided, which has the above-mentioned substrate detection device, a substrate processing device for processing the substrate, and a conveying device for conveying the substrate between the substrate detection device and the substrate processing device.

根據本發明,即使在收納容器的形狀未規格化的情況或者基板的形狀為方形基板的情況的任一情況下,均可檢測基板從而能夠容易地獲取容納在收納容器的基板的基板資訊。 According to the present invention, even in the case where the shape of the storage container is not standardized or the shape of the substrate is a square substrate, the substrate can be detected, thereby easily obtaining the substrate information of the substrate contained in the storage container.

1:基板檢測裝置 1: Substrate detection device

2:收納容器 2: Storage container

3:載置部 3: Loading section

4:感測器保持部 4: Sensor holding part

5:引導部 5: Guidance Department

42:維持構件 42:Maintaining components

C:控制部 C: Control Department

M:升降驅動部 M: Lifting drive unit

R,R1,R2,R3,R4:收納區域 R,R1,R2,R3,R4: Storage area

Se1,Se2:感測器 Se1, Se2: Sensor

W,W1,W2,W3:基板 W,W1,W2,W3: Substrate

U:基板處理單元 U: Substrate processing unit

[圖1]是示出實施方式的基板檢測裝置的一例的主視圖。 [Figure 1] is a front view showing an example of a substrate detection device according to an embodiment.

[圖2]是圖1所示的基板檢測裝置的側視圖。 [Figure 2] is a side view of the substrate detection device shown in Figure 1.

[圖3]是圖1所示的基板檢測裝置的主要部分的立體圖。 [Figure 3] is a three-dimensional diagram of the main parts of the substrate detection device shown in Figure 1.

[圖4]是示出基板檢測裝置的主要部分的一部分上升的情況的立體圖。 [Figure 4] is a three-dimensional diagram showing a state where part of the main part of the substrate detection device is raised.

[圖5]是示出檢測基板的端部的情況的一例的圖。 [Figure 5] is a diagram showing an example of detecting the end of a substrate.

[圖6]是示出根據基板的檢測結果生成的基板資訊的資料的一例的圖。 [Figure 6] is a diagram showing an example of substrate information data generated based on the inspection results of the substrate.

[圖7]是示出實施方式的基板檢測方法的一例的圖。 [Figure 7] is a diagram showing an example of a substrate detection method according to an implementation method.

[圖8]是示出實施方式的基板檢測方法的一例的流程圖。 [Figure 8] is a flow chart showing an example of a substrate detection method according to an implementation method.

[圖9]是示出檢測基板的反翹的情況的一例的圖。 [Figure 9] is a diagram showing an example of detecting the backlash of a substrate.

[圖10]是示出根據基板的檢測結果生成的基板資訊的資料的另一例的圖。 [Figure 10] is a diagram showing another example of substrate information data generated based on the inspection results of the substrate.

[圖11]是示出實施方式的基板檢測方法的另一例的流程圖。 [Figure 11] is a flowchart showing another example of a substrate detection method according to an implementation method.

[圖12]是示出檢測基板的傾斜的情況的一例的圖。 [Figure 12] is a diagram showing an example of detecting the tilt of a substrate.

[圖13]是示出根據基板的檢測結果生成的基板資訊的資料的另一例的圖。 [Figure 13] is a diagram showing another example of substrate information data generated based on the inspection results of the substrate.

[圖14]是示出實施方式的基板處理單元的一例的圖。 [Figure 14] is a diagram showing an example of a substrate processing unit of an embodiment.

以下,參閱附圖對本發明的實施方式進行說明。但是,本發明不限定於該實施方式。此外,在附圖中,為了容易理解實施方式的各構成而放大或強調一部分或者簡化一部分來表示,有時與實際的結構或者形狀、比例尺等不同。在各附圖中,有時使用XYZ正交坐標系說明圖中的方向。在XYZ正交坐標系中,將豎直方向設為Z方向,將水平方向設為X方向及Y方向。此外,在各方向中,箭頭所指的朝向稱為+方向、+側(例如,+X方向、+X側),與箭頭所指的朝向相反的稱為-方向、-側(例如,-X方向、-X側)。 Hereinafter, the embodiment of the present invention will be described with reference to the attached drawings. However, the present invention is not limited to the attached drawings. In addition, in order to facilitate the understanding of each structure of the embodiment, a part is enlarged or emphasized or a part is simplified to represent, which is sometimes different from the actual structure or shape, scale, etc. In each attached drawing, the XYZ orthogonal coordinate system is sometimes used to illustrate the direction in the figure. In the XYZ orthogonal coordinate system, the vertical direction is set as the Z direction, and the horizontal direction is set as the X direction and the Y direction. In addition, in each direction, the direction indicated by the arrow is called the + direction, the + side (for example, the +X direction, the +X side), and the direction opposite to the direction indicated by the arrow is called the - direction, the - side (for example, the -X direction, the -X side).

<基板檢測裝置> <Substrate inspection device>

對實施方式的基板檢測裝置1進行說明。圖1是示出實施方式的基板檢測裝置1的一例的主視圖。圖2是圖1所示的基板檢測裝置1的側視圖。如圖1及圖2所示,基板檢測裝置1具備載置部3、感測器保持部4、升降驅動部M、多個感測器Se1、Se2、控制部C。 The substrate detection device 1 of the embodiment is described. FIG. 1 is a front view showing an example of the substrate detection device 1 of the embodiment. FIG. 2 is a side view of the substrate detection device 1 shown in FIG. 1 . As shown in FIG. 1 and FIG. 2 , the substrate detection device 1 has a loading part 3, a sensor holding part 4, a lifting drive part M, a plurality of sensors Se1, Se2, and a control part C.

載置部3是用於載置收納有基板W(方形基板)的收納容器2的載置台。載置部3例如具備俯視觀察下為四邊形狀的板狀的頂板31、將頂板31支承在地板等設置面G(以下稱為“設置面G”)上的支柱32、在載置部3的正面側(-Y側)以覆蓋正面側的一部分的方式設置的板狀構件33。收納容器2被載置於頂板31的上表面。另外,在頂板31也可以設置有在載置有收納容器2時用於定位收納容器2 的定位構件(例如,定位銷等)。此外,頂板31不限定於板狀的構件,例如也可以是棒狀的構件組合而成的框架狀。 The loading section 3 is a loading table for loading the storage container 2 containing the substrate W (square substrate). The loading section 3 has, for example, a top plate 31 that is a quadrilateral plate when viewed from above, a support 32 that supports the top plate 31 on a setting surface G such as a floor (hereinafter referred to as "setting surface G"), and a plate-shaped member 33 that is provided on the front side (-Y side) of the loading section 3 to cover a portion of the front side. The storage container 2 is loaded on the upper surface of the top plate 31. In addition, a positioning member (for example, a positioning pin, etc.) for positioning the storage container 2 when the storage container 2 is loaded may also be provided on the top plate 31. In addition, the top plate 31 is not limited to a plate-shaped member, and may also be a frame-shaped member composed of rod-shaped members.

支柱32例如使用棒狀的構件,從頂板31的下表面的四角分別垂下而設置。板狀構件33也可以以覆蓋載置部3的正面側的整個面的方式設置。板狀構件33例如固定在頂板31或支柱32的一部分。在板狀構件33的背面側設置有引導下述的感測器保持部4的被引導構件43的引導件34。載置部3具有能夠在載置收納容器2時維持收納容器2的載置狀態的強度。 The support 32 is provided by, for example, using a rod-shaped member, hanging down from the four corners of the lower surface of the top plate 31. The plate-shaped member 33 may also be provided to cover the entire front surface of the mounting portion 3. The plate-shaped member 33 is fixed to, for example, the top plate 31 or a portion of the support 32. A guide member 34 is provided on the back side of the plate-shaped member 33 to guide the guided member 43 of the sensor holding portion 4 described below. The mounting portion 3 has a strength capable of maintaining the mounting state of the storage container 2 when the storage container 2 is mounted.

收納容器2具備:俯視觀察下為四邊形狀的板狀的底部21、俯視觀察下為四邊形狀的板狀的上部23、將上部23支承在底部21的多個支承體22、支承基板W的多個基板支承部24、用於取放基板W的四邊形狀的基板收納口25。底部21及上部23不限定於板狀,例如也可以是棒狀的構件組合而成的框架狀。支承體22例如使用棒狀的構件,從底部21的各邊向上方(+Z側)延伸地設置有多個。此外,支承體22不限定為棒狀,也可以為板狀。支承體22也可以是覆蓋收納容器2的背面側及左右兩側面側那樣的形態。 The storage container 2 has: a bottom 21 that is a quadrilateral plate when viewed from above, an upper portion 23 that is a quadrilateral plate when viewed from above, a plurality of supports 22 that support the upper portion 23 on the bottom 21, a plurality of substrate supports 24 that support the substrate W, and a quadrilateral substrate storage port 25 for taking and placing the substrate W. The bottom 21 and the upper portion 23 are not limited to being plate-shaped, and may be, for example, a frame-shaped structure composed of rod-shaped components. The supports 22 are, for example, rod-shaped components, and a plurality of them are provided extending upward (+Z side) from each side of the bottom 21. In addition, the supports 22 are not limited to being rod-shaped, and may be plate-shaped. The supports 22 may also be in a form that covers the back side and the left and right side surfaces of the storage container 2.

基板支承部24設置為從支承體22朝向收納容器2的內側沿水平方向延伸。多個基板支承部24被配置為在主視圖及側視圖中各個高度上一致。即,多個基板支承部24呈在各個高度上沿X方向及Y方向排列的狀態。基板支承部24與基板W的端部的背面側(下表面側)接觸並支承 基板W。基板支承部24能夠透過在各自的高度上沿X方向及Y方向排列來將基板W支承在水平方向或大致水平方向。 The substrate support 24 is provided to extend in the horizontal direction from the support body 22 toward the inner side of the storage container 2. The plurality of substrate support parts 24 are configured to be consistent at each height in the front view and the side view. That is, the plurality of substrate support parts 24 are arranged in the X direction and the Y direction at each height. The substrate support part 24 contacts the back side (lower surface side) of the end of the substrate W and supports the substrate W. The substrate support part 24 can support the substrate W in the horizontal direction or the substantially horizontal direction by arranging in the X direction and the Y direction at each height.

基板W在各個高度上由基板支承部24支承,在收納容器2中沿上下方向(Z方向)排列而被收納。另外,收納容器2中的基板W的收納塊數可任意設定。收納容器2的大小根據收納的基板W的大小、形狀、塊數而設定。此外,收納容器2的大小有時被規格化設定。收納容器2具備由基板支承部24劃分的多個收納區域R(保管區域、狹槽)。1塊基板W被收納於1個收納區域R。1個收納區域R由沿上下排列的2個基板支承部24的間隔(或者上部23與最上段的基板支承部24的間隔)、與對置的支承體22的間隔來規定。 The substrate W is supported by the substrate support 24 at each height and is arranged in the vertical direction (Z direction) in the storage container 2 to be stored. In addition, the number of storage blocks of substrates W in the storage container 2 can be set arbitrarily. The size of the storage container 2 is set according to the size, shape, and number of blocks of the substrates W to be stored. In addition, the size of the storage container 2 is sometimes standardized. The storage container 2 has a plurality of storage areas R (storage areas, narrow grooves) divided by the substrate support 24. One substrate W is stored in one storage area R. One storage area R is defined by the interval between two substrate support parts 24 arranged vertically (or the interval between the upper part 23 and the uppermost substrate support part 24) and the interval between the opposing support bodies 22.

收納區域R例如被設定為可供輸送裝置所具備的叉(fork)等將基板W抄起並取放的上下方向的尺寸。在本實施方式中,將最下段的收納區域R作為收納區域R1、從收納區域R開始沿朝上方向依次作為收納區域R2、R3、R4…從而區分地示出。另外,在本實施方式中,對多個收納區域R1、R2、R3、R4…進行統稱時,有時稱為收納區域R。 The storage area R is set to a vertical dimension that allows a fork or the like provided by the transport device to pick up and place the substrate W. In this embodiment, the lowest storage area R is referred to as the storage area R1, and the storage areas R2, R3, R4, etc. are sequentially shown upward from the storage area R. In addition, in this embodiment, when a plurality of storage areas R1, R2, R3, R4, etc. are collectively referred to, they are sometimes referred to as the storage area R.

基板收納口25在收納容器2的正面側以四邊形狀開口。基板收納口25的大小根據收納的基板W的大小、形狀而適當設定。另外,圖示的收納容器2為使基板收納口25始終開放的形態,但也可以是例如設置有用於將 收納容器2的基板收納口25開閉的蓋部或遮板(shutter)等的形態。另外,在使用具備蓋部或遮板等的收納容器2的情況下,基板檢測裝置1例如也可以具備使收納容器2的蓋部或遮板等開閉的開閉裝置。 The substrate storage opening 25 opens in a rectangular shape on the front side of the storage container 2. The size of the substrate storage opening 25 is appropriately set according to the size and shape of the substrate W to be stored. In addition, the storage container 2 shown in the figure is in a form in which the substrate storage opening 25 is always open, but it can also be a form in which, for example, a cover or a shutter is provided for opening and closing the substrate storage opening 25 of the storage container 2. In addition, when using a storage container 2 equipped with a cover or a shutter, the substrate detection device 1 can also have an opening and closing device for opening and closing the cover or the shutter of the storage container 2.

圖3是圖1所示的基板檢測裝置1的主要部分的立體圖,圖4是圖1所示的基板檢測裝置1的主要部分的一部分上升的情況的立體圖。如圖3及圖4所示,基板檢測裝置1具備感測器保持部4與引導部5。感測器保持部4保持2個(多個)感測器Se1、Se2,透過驅動升降驅動部M(參閱圖1及圖2)使其被引導部5所引導來進行升降。感測器保持部4具備框體41、維持構件42、一對被引導構件43、軸(shaft)44。 FIG3 is a perspective view of the main part of the substrate detection device 1 shown in FIG1, and FIG4 is a perspective view of a part of the main part of the substrate detection device 1 shown in FIG1 rising. As shown in FIG3 and FIG4, the substrate detection device 1 has a sensor holding part 4 and a guide part 5. The sensor holding part 4 holds two (plural) sensors Se1 and Se2, and is guided by the guide part 5 to be raised and lowered by driving the lifting drive part M (see FIG1 and FIG2). The sensor holding part 4 has a frame 41, a holding member 42, a pair of guided members 43, and a shaft 44.

引導部5固定在地板等設置面G(參閱圖1或圖2)而設置,可升降地保持感測器保持部4。引導部5有具有L字形狀的板狀體,被固定在設置面G並向上方(+Z方向)延伸。向引導部5的上方延伸的部分為板狀,在其-Y側的面中,利用未圖示的引導機構可升降地支承軸44。此外,在引導部5的+Y側的面設有背板,以提高引導部5的剛度。引導部5引導軸44,並經由軸44支承框體41、維持構件42以及被引導構件43。即,引導部5對感測器保持部4相對於設置面G可升降地支承。 The guide part 5 is fixed to a setting surface G such as a floor (see FIG. 1 or FIG. 2) and is provided to hold the sensor holding part 4 in a manner that can be raised or lowered. The guide part 5 has an L-shaped plate-like body, which is fixed to the setting surface G and extends upward (in the +Z direction). The portion extending upward from the guide part 5 is plate-like, and the shaft 44 is supported in a manner that can be raised or lowered by a guide mechanism not shown in the figure on the -Y side thereof. In addition, a back plate is provided on the +Y side of the guide part 5 to increase the rigidity of the guide part 5. The guide part 5 guides the shaft 44, and supports the frame 41, the holding member 42, and the guided member 43 via the shaft 44. That is, the guide part 5 supports the sensor holding part 4 in a manner that can be raised or lowered relative to the setting surface G.

感測器保持部4的框體41透過板狀的框體上部41A、板狀的框體下部41B、將框體上部41A的兩端和與其對應的框體下部41B的兩端連結的棒狀構件41C、41D形 成為四邊形狀(矩形狀)。透過由多個構件使框體41構成為四邊形狀,能夠提高感測器保持部4的剛度。 The frame 41 of the sensor holding part 4 is formed into a quadrilateral shape (rectangular shape) by a plate-shaped frame upper part 41A, a plate-shaped frame lower part 41B, and rod-shaped components 41C and 41D connecting the two ends of the frame upper part 41A and the two ends of the corresponding frame lower part 41B. By forming the frame 41 into a quadrilateral shape by a plurality of components, the rigidity of the sensor holding part 4 can be improved.

維持構件42對2個感測器Se1、Se2以在水平方向或大致水平方向(以下稱為“水平方向等”)上排列的方式維持。維持構件42是沿水平方向延伸的板狀,且具備用於將感測器Se1、Se2分別固定的未圖示的固定件(例如托架等)。維持構件42的中央部分安裝在軸44的上部。維持構件42在水平方向等的各個端部被安裝於一對被引導構件43。 The holding member 42 holds the two sensors Se1 and Se2 in a horizontal direction or a substantially horizontal direction (hereinafter referred to as "horizontal direction, etc."). The holding member 42 is a plate extending in the horizontal direction and has a fixing member (such as a bracket, etc.) not shown in the figure for fixing the sensors Se1 and Se2 respectively. The central portion of the holding member 42 is mounted on the upper portion of the shaft 44. The holding member 42 is mounted on a pair of guided members 43 at each end in the horizontal direction, etc.

被引導構件43保持維持構件42。被引導構件43是方形的棒狀的構件,從框體上部41A的下表面垂下而設置有一對。一對被引導構件43在X方向上分離設置。維持構件42透過固定於一對被引導構件43而被保持在水平方向上。一對被引導構件43被引導件34(參閱圖1)分別引導而可升降。透過使一對被引導構件43被引導件34引導,從而能夠使感測器保持部4高精度地升降。 The guided member 43 holds the holding member 42. The guided member 43 is a square rod-shaped member, and a pair of the guided members 43 are suspended from the lower surface of the upper part 41A of the frame. The pair of guided members 43 are separated and set in the X direction. The holding member 42 is held in the horizontal direction by being fixed to the pair of guided members 43. The pair of guided members 43 are guided by the guide members 34 (see Figure 1) respectively and can be raised and lowered. By guiding the pair of guided members 43 by the guide members 34, the sensor holding part 4 can be raised and lowered with high precision.

軸44為沿上下方向延伸的板狀的構件,沿引導部5的-Y側的面配置,被引導部5的未圖示的引導機構引導而可升降。在軸44的上部固定有維持構件42。作為引導部5的引導機構,例如可例舉以下構成:即,在軸44的Y方向的兩側面分別設置有上下方向的一對槽部,且嵌入該一對槽部的凸部被設置在引導部5。透過軸44升降,框體41及維持構件42也升降。軸44透過升降驅動部M(參閱圖1或圖2)的驅動力升降。即,感測器保持部4透過升降驅動部M 的驅動力升降。 The shaft 44 is a plate-shaped member extending in the vertical direction, arranged along the -Y side surface of the guide portion 5, and can be raised and lowered by being guided by the unillustrated guide mechanism of the guide portion 5. A holding member 42 is fixed to the upper part of the shaft 44. As the guide mechanism of the guide portion 5, for example, the following structure can be cited: that is, a pair of grooves in the vertical direction are respectively provided on both side surfaces of the shaft 44 in the Y direction, and a convex portion embedded in the pair of grooves is provided on the guide portion 5. By raising and lowering the shaft 44, the frame 41 and the holding member 42 are also raised and lowered. The shaft 44 is raised and lowered by the driving force of the lifting drive portion M (see Figure 1 or Figure 2). That is, the sensor holding portion 4 is raised and lowered by the driving force of the lifting drive portion M .

升降驅動部M根據控制部C的指令來驅動,例如可使用利用了電機的齒條齒輪機構或滾珠絲杠機構。透過使用伺服電機作為電機,控制部C能夠根據伺服電機的驅動信號獲取軸44的升降量(或高度位置)。此外,升降驅動部M也可以具備獲取軸44相對於引導部5的升降量(高度位置)的編碼器。在該情況下,控制部C能夠根據編碼器的輸出獲取軸44的升降量(或高度位置)。另外,升降驅動部M的電機可以設置在引導部5,也可以設置在軸44。另外,升降驅動部M也可以使用液壓缸等液壓裝置。 The lifting drive unit M is driven according to the instruction of the control unit C, and for example, a pinion gear mechanism or a ball screw mechanism using an electric motor can be used. By using a servo motor as the motor, the control unit C can obtain the lifting amount (or height position) of the shaft 44 according to the drive signal of the servo motor. In addition, the lifting drive unit M can also have an encoder for obtaining the lifting amount (height position) of the shaft 44 relative to the guide unit 5. In this case, the control unit C can obtain the lifting amount (or height position) of the shaft 44 according to the output of the encoder. In addition, the motor of the lifting drive unit M can be set on the guide unit 5 or on the shaft 44. In addition, the lifting drive unit M can also use a hydraulic device such as a hydraulic cylinder.

感測器Se1、Se2分別檢測容納在收納容器2的基板W的端部的不同的部分。感測器Se1、Se2利用未圖示的固定件沿水平方向等分離排列並固定於維持構件42。另外,感測器Se1、Se2只要排列在與上下方向相交的方向,就不限定於排列方向為水平方向等,也可以從水平方向等傾斜。2個感測器Se1、Se2在X方向上以距離d3(參閱圖12)的間隔分離而被固定。距離d3比基板W的X方向的長度短。此外,2個感測器Se1、Se2被配置為從Y方向觀察時比基板支承部24更靠近內側(參閱圖12)。透過該配置,能夠避免感測器Se1、Se2檢測基板支承部24的情況。 Sensors Se1 and Se2 detect different parts of the end of the substrate W accommodated in the storage container 2. Sensors Se1 and Se2 are arranged equally in the horizontal direction and fixed to the holding member 42 by a fixing member not shown. In addition, as long as the sensors Se1 and Se2 are arranged in a direction intersecting the up and down direction, the arrangement direction is not limited to the horizontal direction, etc., and can also be equally inclined from the horizontal direction. The two sensors Se1 and Se2 are separated and fixed at a distance d3 (see Figure 12) in the X direction. The distance d3 is shorter than the length of the substrate W in the X direction. In addition, the two sensors Se1 and Se2 are arranged to be closer to the inner side than the substrate support part 24 when viewed from the Y direction (see Figure 12). Through this configuration, it is possible to avoid the situation where the sensors Se1 and Se2 detect the substrate support part 24.

感測器Se1、Se2透過固定在維持構件42而維持沿水平方向等排列的狀態。此外,由於感測器保持部4具有四邊形狀的框體41而提高了剛度,即使感測器保持部4升降,感測器Se1、Se2彼此的位置關係也不容易變動。 在本實施方式中,示出了使用2個感測器Se1、Se2的方式,但也可以是使用3個以上的感測器的方式。在使用3個以上的感測器的情況下,例如可以是多個感測器沿水平方向等排列成一列的方式,也可以是2個感測器沿水平方向等排列,剩下的感測器配置在偏離水平方向等的方式。 The sensors Se1 and Se2 are fixed to the holding member 42 to maintain the state of being arranged in the horizontal direction. In addition, since the sensor holding part 4 has a quadrilateral frame 41, the rigidity is improved, and even if the sensor holding part 4 is raised or lowered, the positional relationship between the sensors Se1 and Se2 is not easily changed. In this embodiment, a method of using two sensors Se1 and Se2 is shown, but a method of using more than three sensors may also be used. When using more than three sensors, for example, a method of arranging a plurality of sensors in a row in the horizontal direction, or a method of arranging two sensors in the horizontal direction, and the remaining sensors are arranged in a direction deviating from the horizontal direction, etc.

感測器Se1、Se2例如是光學式的反射型感測器,能夠使用測長感測器等。圖5是示出由感測器Se1檢測基板W的端部P的情況的一例的圖。如圖5所示,感測器Se1分別具有投光部Se1A及受光部Se1B。在感測器Se1中,透過利用受光部Se1B對從投光部Se1A射出的檢測用的光照射在基板W的端部P而反射的反射光進行受光,由此檢測基板W。此外,透過使用測長感測器作為感測器Se1,能夠測量從基準位置(例如感測器Se1的位置)到基板W的端部P為止的Y方向的距離。另外,感測器Se2是與感測器Se1同樣的構成,可直接應用上述感測器Se1的說明。 Sensors Se1 and Se2 are, for example, optical reflective sensors, and length measuring sensors can be used. FIG5 is a diagram showing an example of a situation where the sensor Se1 detects the end P of the substrate W. As shown in FIG5, the sensor Se1 has a light projecting unit Se1A and a light receiving unit Se1B. In the sensor Se1, the substrate W is detected by receiving the reflected light emitted from the light projecting unit Se1A and irradiated on the end P of the substrate W by the light receiving unit Se1B. In addition, by using a length measuring sensor as the sensor Se1, the distance in the Y direction from the reference position (for example, the position of the sensor Se1) to the end P of the substrate W can be measured. In addition, the sensor Se2 has the same structure as the sensor Se1, and the description of the above-mentioned sensor Se1 can be directly applied.

感測器Se1、Se2透過驅動升降驅動部M使感測器保持部4升降而如圖4所示地與感測器保持部4一起升降。感測器Se1、Se2透過感測器保持部4的升降而在收納容器2的基板收納口25側升降。即,透過感測器Se1、Se2在收納容器2的基板收納口25側(正面側)升降,感測器Se1、Se2與收納容器2的各收納區域R相對地升降,能夠透過感測器Se1、Se2依次檢測被收納於各收納區域R的基板W。另外,感測器Se1、Se2可以在相對於收納容器2(載置部3)上升時進行基板W的檢測,也可以在相對於收納容器 2下降時進行基板W的檢測。 Sensors Se1 and Se2 are lifted and lowered together with the sensor holding part 4 by driving the lifting driving part M to lift and lower the sensor holding part 4 as shown in FIG. 4. Sensors Se1 and Se2 are lifted and lowered on the substrate storage port 25 side of the storage container 2 by lifting and lowering the sensor holding part 4. That is, by lifting and lowering the sensors Se1 and Se2 on the substrate storage port 25 side (front side) of the storage container 2, the sensors Se1 and Se2 are lifted and lowered relative to each storage area R of the storage container 2, and the substrates W stored in each storage area R can be detected sequentially by the sensors Se1 and Se2. In addition, the sensors Se1 and Se2 can detect the substrate W when they are lifted relative to the storage container 2 (loading part 3), and can also detect the substrate W when they are lowered relative to the storage container 2.

此外,透過使用由投光部Se1A射出的檢測用的光的光斑直徑較小的感測器Se1、Se2(例如測長感測器),即使基板W是較薄的基板(例如厚度為0.1~2mm左右),也能夠檢測基板W的端部P。此外,透過縮小檢測用的光的光斑直徑,從而可測量基板W的厚度。例如,可根據光斑直徑較小的光照射在基板W的下端時的感測器Se1的高度、與光從基板W的上端偏離時的感測器Se1的高度的差,檢測基板W的厚度。 In addition, by using sensors Se1 and Se2 (e.g., length measuring sensors) with smaller spot diameters of the detection light emitted by the light projecting unit Se1A, the end P of the substrate W can be detected even if the substrate W is a thin substrate (e.g., a thickness of about 0.1 to 2 mm). In addition, by reducing the spot diameter of the detection light, the thickness of the substrate W can be measured. For example, the thickness of the substrate W can be detected based on the difference between the height of the sensor Se1 when the light with a smaller spot diameter is irradiated on the lower end of the substrate W and the height of the sensor Se1 when the light deviates from the upper end of the substrate W.

感測器Se1、Se2的輸出被輸入到控制部C。另外,並不限定於使用光學式的反射型感測器作為感測器Se1、Se2。例如,也可以使用任意的可檢測基板W的端部P的感測器(例如電容感測器等)。此外,多個感測器Se1、Se2不限定於使用同種感測器,也可以使用不同的感測器。 The outputs of sensors Se1 and Se2 are input to the control unit C. In addition, it is not limited to using optical reflective sensors as sensors Se1 and Se2. For example, any sensor that can detect the end P of the substrate W (such as a capacitive sensor, etc.) can also be used. In addition, multiple sensors Se1 and Se2 are not limited to using the same type of sensors, and different sensors can also be used.

在本實施方式中,例舉透過升降驅動部M的驅動力使感測器保持部4相對於載置部3升降的構成進行了說明,但不限定於此方式。可應用使載置部3與感測器保持部4相對升降的任意的構成。例如,可以是感測器保持部4(感測器Se1、Se2)沿上下方向固定、載置部3(收納容器2)相對於感測器保持部4升降的構成,也可以是感測器保持部4及載置部3雙方都升降的構成。在載置部3升降的構成的情況下,基板檢測裝置1也可以具備載置部3的升降裝置。 In this embodiment, the structure in which the sensor holding part 4 is lifted relative to the placing part 3 by the driving force of the lifting driving part M is used as an example for explanation, but it is not limited to this structure. Any structure that causes the placing part 3 and the sensor holding part 4 to be lifted relative to each other can be applied. For example, the sensor holding part 4 (sensors Se1, Se2) can be fixed in the up-down direction, and the placing part 3 (storage container 2) can be lifted relative to the sensor holding part 4, or both the sensor holding part 4 and the placing part 3 can be lifted. In the case of the structure in which the placing part 3 is lifted, the substrate detection device 1 can also have a lifting device for the placing part 3.

控制部C統籌控制基板檢測裝置1。控制部C控制感測器Se1、Se2及升降驅動部M。控制部C透過使升降驅動部M驅動,使感測器保持部4相對於載置部3相對升降。此外,控制部C與感測器保持部4的升降同步地驅動感測器Se1、Se2。控制部C獲取升降驅動部M的驅動量(或驅動信號),並從由感測器Se1、Se2輸出的信號中獲取基板W的基板資訊。即,使收納容器2與感測器Se1、Se2沿上下方向升降(上升或者下降)的同時,透過感測器Se1、Se2檢測收納在各收納區域R的基板W。 The control unit C coordinates and controls the substrate detection device 1. The control unit C controls the sensors Se1, Se2 and the lifting drive unit M. The control unit C drives the sensor holding unit 4 to rise and fall relative to the loading unit 3 by driving the lifting drive unit M. In addition, the control unit C drives the sensors Se1 and Se2 synchronously with the lifting and falling of the sensor holding unit 4. The control unit C obtains the driving amount (or driving signal) of the lifting drive unit M, and obtains the substrate information of the substrate W from the signal output by the sensors Se1 and Se2. That is, while the storage container 2 and the sensors Se1 and Se2 are lifted and lowered (rising or falling) in the up and down directions, the substrates W stored in each storage area R are detected by the sensors Se1 and Se2.

控制部C具備記憶部E。控制部C使記憶部E存儲獲取的基板資訊。此外,控制部C參閱感測器Se1、Se2檢測到基板W的端部P時的升降驅動部M的驅動量,與預先將基板W收納在各收納區域R時的標準位置進行比較。例如根據將基板W收納在各個收納區域R1、R2、R3、R4、…Rn時(將基板W載置於基板支承部24時),基板W距設置面G的高度來管理標準位置。例如,在收納區域R1的情況下標準位置為高度H1R。同樣地,在收納區域R2、R3、R4、…、Rn的情況下各標準位置為高度H2R、H3R、H4R、…、HnR。對高度H2R、H3R、H4R、…、HnR省略圖示。這些高度H1R~HnR例如預先被測量並存儲在記憶部E。另外,基於沒有反翹等變形的基板W測量標準位置。 The control unit C is provided with a memory unit E. The control unit C causes the memory unit E to store the acquired substrate information. In addition, the control unit C refers to the driving amount of the lifting drive unit M when the sensors Se1 and Se2 detect the end P of the substrate W, and compares it with the standard position when the substrate W is previously stored in each storage area R. For example, the standard position is managed according to the height of the substrate W from the setting surface G when the substrate W is stored in each storage area R1, R2, R3, R4, ... Rn (when the substrate W is placed on the substrate support 24). For example, in the case of the storage area R1, the standard position is a height H1R. Similarly, in the case of the storage areas R2, R3, R4, ..., Rn, the standard positions are heights H2R, H3R, H4R, ..., HnR. Illustration of the heights H2R, H3R, H4R, ..., HnR is omitted. These heights H1R to HnR are measured in advance and stored in the memory unit E. In addition, the standard position is measured based on the substrate W without deformation such as warping.

控制部C根據感測器Se1、Se2檢測到基板W的端部P時的升降驅動部M的驅動量計算感測器Se1、Se2 的高度,將該高度與各收納區域R的標準位置的高度H1R等進行比較。感測器Se1、Se2的高度是載置部3與感測器保持部4的相對位置的一例。若感測器Se1、Se2的高度與高度H1R等的差處於誤差範圍(預先設定的容許範圍),則控制部C判定在該收納區域R有基板W。控制部C在感測器Se1、Se2從收納區域R1上升到最上段的收納區域(從最上段的收納區域下降到收納區域R1)的期間反復進行這樣的判定。控制部C獲取各收納區域R中的基板W的有無的資訊作為基板資訊。 The control unit C calculates the height of the sensors Se1 and Se2 based on the driving amount of the lifting drive unit M when the sensors Se1 and Se2 detect the end P of the substrate W, and compares the height with the height H1R of the standard position of each storage area R. The height of the sensors Se1 and Se2 is an example of the relative position of the mounting unit 3 and the sensor holding unit 4. If the difference between the height of the sensors Se1 and Se2 and the height H1R is within the error range (pre-set allowable range), the control unit C determines that there is a substrate W in the storage area R. The control unit C repeatedly performs such determination while the sensors Se1 and Se2 rise from the storage area R1 to the uppermost storage area (and descend from the uppermost storage area to the storage area R1). The control unit C obtains information on the presence or absence of substrates W in each storage area R as substrate information.

圖6是示出根據基板W的檢測結果由控制部C生成的基板資訊的資料的一例的圖。如圖6所示,作為存儲在記憶部E的基板資訊,右列的欄中儲存有示出收納區域R的資料,左列的欄中儲存有示出各收納區域R中有無基板W的資料。例如,圖1及圖2所示的例中的基板資訊示出在收納區域R1、R3及R4中基板W為“有”,在收納區域R2中基板為“無”。基板資訊不僅是基板W的有無,也可以增加基板W的反翹、基板W的傾斜等。另外,關於基板W的反翹、基板W的傾斜的說明將在下文敘述。 FIG6 is a diagram showing an example of substrate information data generated by the control unit C based on the detection result of the substrate W. As shown in FIG6, as the substrate information stored in the memory unit E, the columns in the right column store data showing the storage area R, and the columns in the left column store data showing whether there is a substrate W in each storage area R. For example, the substrate information in the example shown in FIG1 and FIG2 shows that the substrate W is "yes" in the storage areas R1, R3 and R4, and the substrate is "no" in the storage area R2. The substrate information is not only the presence or absence of the substrate W, but also the back warp of the substrate W, the inclination of the substrate W, etc. can be added. In addition, the description of the back warp of the substrate W and the inclination of the substrate W will be described below.

<基板檢測方法> <Substrate detection method>

接著,對實施方式的基板檢測方法進行說明。圖7是示出實施方式的基板檢測方法的一例的圖。實施方式的基板檢測方法例如可使用上述的基板檢測裝置1。實施方式的基板檢測方法檢測是在載置於載置部3的收 納容器2中沿上下方向排列而被收納的多個基板W的方法,且包括:使載置部3與配置有感測器Se1、Se2的感測器保持部4相對地升降;透過感測器Se1、Se2分別檢測容納在收納容器2的基板W的端部P的不同的部分;根據由感測器Se1、Se2得到的基板W的端部P的檢測結果來獲取收納容器2內的基板資訊。 Next, the substrate detection method of the embodiment is described. FIG. 7 is a diagram showing an example of the substrate detection method of the embodiment. The substrate detection method of the embodiment can use the substrate detection device 1 described above, for example. The substrate detection method of the embodiment is a method for detecting a plurality of substrates W arranged in the vertical direction and stored in a storage container 2 placed on a placing portion 3, and includes: raising and lowering the placing portion 3 and a sensor holding portion 4 equipped with sensors Se1 and Se2 relative to each other; detecting different parts of the end P of the substrate W stored in the storage container 2 by sensors Se1 and Se2 respectively; and obtaining substrate information in the storage container 2 based on the detection results of the end P of the substrate W obtained by sensors Se1 and Se2.

控制部C驅動升降驅動部M,使感測器保持部4上升。隨著感測器保持部4的上升,由感測器保持部4保持的感測器Se1、Se2也上升。另外,感測器Se1、Se2位於載置部3的頂板31的下方作為初始位置。此外,控制部C驅動升降驅動部M,並使感測器Se1、Se2驅動。感測器Se1、Se2根據來自控制部C的指令,從各自的投光部Se1A等射出檢測用的光。另外,在圖7中,省略感測器Se2的記載。 The control unit C drives the lifting drive unit M to raise the sensor holding unit 4. As the sensor holding unit 4 rises, the sensors Se1 and Se2 held by the sensor holding unit 4 also rise. In addition, the sensors Se1 and Se2 are located below the top plate 31 of the placement unit 3 as the initial position. In addition, the control unit C drives the lifting drive unit M and drives the sensors Se1 and Se2. The sensors Se1 and Se2 emit detection light from their respective light-emitting units Se1A and the like according to the instructions from the control unit C. In addition, in FIG. 7, the description of the sensor Se2 is omitted.

在感測器Se1到達高度H1時,從投光部Se1A射出的光在基板W的端部被反射並入射至受光部Se1B。感測器Se1將示出由受光部Se1B受光的信號發送至控制部C。控制部C若從感測器Se1接收到受光的信號,則在接收到信號的定時根據此時的升降驅動部M的驅動量計算感測器Se1的高度H1。控制部C判斷該高度H1與哪個收納區域R相對應。控制部C例如參閱存儲在記憶部E的各收納區域R的標準位置的高度H1R等(參閱圖5)來判斷與哪個收納區域R相對應。然後,控制部C判斷在特定的收納區域R中存在基板W。 When the sensor Se1 reaches the height H1, the light emitted from the light projecting part Se1A is reflected at the end of the substrate W and enters the light receiving part Se1B. The sensor Se1 sends a signal indicating the light received by the light receiving part Se1B to the control part C. If the control part C receives the light received signal from the sensor Se1, it calculates the height H1 of the sensor Se1 according to the driving amount of the lifting drive part M at the time of receiving the signal. The control part C determines which storage area R the height H1 corresponds to. The control part C, for example, refers to the height H1R of the standard position of each storage area R stored in the memory part E (see Figure 5) to determine which storage area R corresponds to. Then, the control part C determines that the substrate W exists in the specific storage area R.

隨著感測器Se1的上升反復進行這樣的控制部C的動作。在圖7中,示出在與高度H1相對應的收納區域R1中有基板W1,在與高度H2相對應的收納區域R2中沒有基板W,在與高度H3相對應的收納區域R3中有基板W2,在與高度H4相對應的收納區域R4中有基板W3。控制部C分別對與高度H1~高度H4相對應的收納區域R1~R4生成如圖5所示那樣的與收納容器2中的基板W的有無相關的基板資訊(映射資料)。即,控制部C基於感測器Se1、Se2的檢測結果獲取收納容器2內的基板W的位置。控制部C將生成的基板資訊存儲至記憶部E。此外,控制部C也可以將存儲在記憶部E的基板資訊提供給其他的基板處理裝置,或者輸送基板W的輸送裝置等。 As the sensor Se1 rises, the control unit C repeats such actions. FIG7 shows that there is a substrate W1 in the storage area R1 corresponding to the height H1, there is no substrate W in the storage area R2 corresponding to the height H2, there is a substrate W2 in the storage area R3 corresponding to the height H3, and there is a substrate W3 in the storage area R4 corresponding to the height H4. The control unit C generates substrate information (mapping data) related to the presence or absence of the substrate W in the storage container 2 as shown in FIG5 for the storage areas R1 to R4 corresponding to the heights H1 to H4, respectively. That is, the control unit C obtains the position of the substrate W in the storage container 2 based on the detection results of the sensors Se1 and Se2. The control unit C stores the generated substrate information in the memory unit E. In addition, the control unit C can also provide the substrate information stored in the memory unit E to other substrate processing devices, or a transport device for transporting the substrate W, etc.

在本實施方式中,使用2個感測器Se1、Se2檢測在基板W的端部中不同的部分。因此,透過使用2個感測器Se1、Se2,能夠可靠地檢測基板W。此外,透過由2個感測器Se1、Se2檢測,能夠確保檢測結果的冗餘性。此外,也可以是將2個感測器Se1、Se2中的一方用於主檢測,另一方用於副檢測的方式。此外,如上所述地,在由投光部Se1A射出的檢測用的光的光斑直徑較小的情況下,控制部C也可以計算基板W的厚度,並將該結果追加至基板資訊。此外,在感測器Se1、Se2為測長感測器的情況下,控制部C也可以從感測器Se1、Se2獲取與各基板W的Y方向的位置相關的資訊,並將基板W的Y方向的位置追加至基板資訊。 In the present embodiment, two sensors Se1 and Se2 are used to detect different parts at the end of the substrate W. Therefore, by using the two sensors Se1 and Se2, the substrate W can be reliably detected. In addition, by detecting with the two sensors Se1 and Se2, the redundancy of the detection result can be ensured. In addition, it is also possible to use one of the two sensors Se1 and Se2 for main detection and the other for sub-detection. In addition, as described above, when the spot diameter of the detection light emitted by the light projection unit Se1A is small, the control unit C can also calculate the thickness of the substrate W and append the result to the substrate information. In addition, when the sensors Se1 and Se2 are length measuring sensors, the control unit C can also obtain information related to the Y-direction position of each substrate W from the sensors Se1 and Se2, and add the Y-direction position of the substrate W to the substrate information.

此外,在本實施方式中,能夠使用由感測器Se1、Se2得到的檢測結果來檢測基板W的反翹。圖8是示出實施方式的基板檢測方法的一例的流程圖。圖9是示出檢測基板W的反翹的情況的一例的圖。在圖8中,包括上述實施方式的基板檢測方法,對檢測基板W的反翹的情況進行說明。首先,如上所述,控制部C驅動升降驅動部M,並驅動感測器Se1、Se2。接著,控制部C判斷感測器Se1、Se2是否檢測到基板W(步驟S1)。 In addition, in this embodiment, the detection results obtained by sensors Se1 and Se2 can be used to detect the back-curling of substrate W. FIG. 8 is a flowchart showing an example of a substrate detection method of the embodiment. FIG. 9 is a diagram showing an example of detecting the back-curling of substrate W. FIG. 8 includes the substrate detection method of the above-mentioned embodiment, and the case of detecting the back-curling of substrate W is described. First, as described above, control unit C drives lifting drive unit M and drives sensors Se1 and Se2. Then, control unit C determines whether sensors Se1 and Se2 detect substrate W (step S1).

在步驟S1中,控制部C接收示出感測器Se1、Se2的受光部Se1B受光的資訊,基於該資訊判斷是否檢測到基板W。控制部C獲取升降驅動部M的驅動量,識別出感測器Se1、Se2位於怎樣的高度。因此,在步驟S1中未檢測到基板W的情況下(步驟S1為否),控制部C將在與感測器Se1、Se2的高度相對應的收納區域R中沒有基板W設定為基板資訊(步驟S2)。接著,控制部C判斷感測器Se1、Se2是否到達最上部(步驟S3)。 In step S1, the control unit C receives information indicating that the light receiving unit Se1B of the sensors Se1 and Se2 receives light, and determines whether the substrate W is detected based on the information. The control unit C obtains the driving amount of the lifting drive unit M and recognizes the height of the sensors Se1 and Se2. Therefore, if the substrate W is not detected in step S1 (step S1 is no), the control unit C sets the absence of the substrate W in the storage area R corresponding to the height of the sensors Se1 and Se2 as the substrate information (step S2). Then, the control unit C determines whether the sensors Se1 and Se2 have reached the top (step S3).

在感測器Se1、Se2到達最上部的情況下(步驟S3為是),控制部C結束一系列的處理。此外,在感測器Se1、Se2未到達最上部的情況下(步驟S3為否),控制部C返回步驟S1,判斷感測器Se1、Se2是否檢測到基板W。 When sensors Se1 and Se2 reach the top (step S3 is yes), the control unit C ends a series of processing. In addition, when sensors Se1 and Se2 do not reach the top (step S3 is no), the control unit C returns to step S1 to determine whether sensors Se1 and Se2 detect substrate W.

在步驟S1中感測器Se1、Se2檢測到基板W的情況下(步驟S1為是),控制部C將在與感測器Se1、Se2的高度相對應的收納區域R中有基板W設定為基板資訊(步驟S4)。控制部C將示出在特定的收納區域R(例如收納區域 R1)中有基板W的資訊存儲至記憶部E。接著,控制部C將檢測到基板W時的感測器Se1、Se2的高度H與存儲在記憶部E的標準位置進行比較。例如,在收納區域R1中有基板W的情況下,控制部C將感測器Se1、Se2的高度H1與標準位置的高度H1R進行比較。 When sensors Se1 and Se2 detect substrate W in step S1 (step S1 is yes), control unit C sets the presence of substrate W in storage area R corresponding to the height of sensors Se1 and Se2 as substrate information (step S4). Control unit C stores information indicating that there is substrate W in a specific storage area R (for example, storage area R1) in memory unit E. Next, control unit C compares the height H of sensors Se1 and Se2 when substrate W is detected with the standard position stored in memory unit E. For example, when there is substrate W in storage area R1, control unit C compares the height H1 of sensors Se1 and Se2 with the height H1R of the standard position.

控制部C判斷感測器Se1、Se2的高度H與標準位置的高度H1R的偏差是否在容許範圍內(步驟S5)。容許範圍預先由操作員等設定並存儲在記憶部E。如圖9所示,在容納在收納區域R1的基板W1有反翹的情況下,基板W的端部Q從沒有反翹的情況的位置向上方偏離距離d1。感測器Se1、Se2檢測向上方偏離的端部Q。該高度H1有時從標準位置的高度H1R偏離距離d1。在步驟S5中,控制部C判斷偏離的距離d1是否在容許範圍內。另外,圖9中示出了感測器Se1,但對感測器Se2也同樣地將在高度H1受光的信號輸出至控制部C。 The control unit C determines whether the deviation between the height H of the sensors Se1 and Se2 and the height H1R of the standard position is within the allowable range (step S5). The allowable range is set in advance by the operator and stored in the memory unit E. As shown in FIG9, when the substrate W1 accommodated in the storage area R1 is warped, the end Q of the substrate W deviates upward by a distance d1 from the position when it is not warped. The sensors Se1 and Se2 detect the end Q deviated upward. The height H1 sometimes deviates from the height H1R of the standard position by a distance d1. In step S5, the control unit C determines whether the deviated distance d1 is within the allowable range. In addition, although sensor Se1 is shown in FIG9 , sensor Se2 also outputs the signal of light received at height H1 to control unit C in the same manner.

在偏離超過容許範圍的情況下(步驟S6為否),控制部C將示出收納在特定的收納區域R的基板W上有反翹的資訊設定為基板資訊(步驟S7)。此外,在偏離在容許範圍內的情況下(步驟S6為是),控制部C將示出收納在特定的收納區域R的基板W上沒有反翹的資訊設定為基板資訊(步驟S8)。控制部C將示出在基板W上有反翹的資訊或者示出在基板W上沒有反翹的資訊存儲至記憶部E。控制部C在步驟S7中設定為在基板W上有反翹後,或者在步驟S8中設定為在基板W上沒有反翹後,透過步驟S3判斷 感測器Se1、Se2是否到達最上部,到達最上部時結束一系列的處理,未到達最上部時返回步驟S1並執行各個處理。 If the deviation exceeds the allowable range (No in step S6), the control unit C sets information indicating that the substrate W stored in the specific storage area R is warped as the substrate information (step S7). If the deviation is within the allowable range (Yes in step S6), the control unit C sets information indicating that the substrate W stored in the specific storage area R is not warped as the substrate information (step S8). The control unit C stores the information indicating that the substrate W is warped or the information indicating that the substrate W is not warped in the memory unit E. After the control unit C is set to have a backflip on the substrate W in step S7, or is set to have no backflip on the substrate W in step S8, it determines in step S3 whether the sensors Se1 and Se2 have reached the top. If they have reached the top, a series of processes are terminated. If they have not reached the top, it returns to step S1 and executes each process.

圖10是示出根據基板W的檢測結果生成的基板資訊的資料的另一例的圖。圖10包含了透過上述步驟S7或步驟S8設定的資訊(與基板W的反翹相關的資訊)。此外,圖10所示的基板資訊的資料是對圖6所示的基板資訊的資料追加與基板W的反翹相關的資訊的資料。如圖10所示,控制部C分別對收納區域R1、R2、R3、R4、…除了追加基板W的有無之外還追加與該基板W是否反翹相關的資訊。 FIG. 10 is a diagram showing another example of substrate information data generated based on the detection result of the substrate W. FIG. 10 includes information set by the above-mentioned step S7 or step S8 (information related to the back-curling of the substrate W). In addition, the substrate information data shown in FIG. 10 is data obtained by adding information related to the back-curling of the substrate W to the substrate information data shown in FIG. 6. As shown in FIG. 10, the control unit C adds information related to whether the substrate W is back-curled in addition to the presence or absence of the substrate W to the storage areas R1, R2, R3, R4, ... respectively.

在圖10所示的基板資訊的資料中,追加有示出收納在收納區域R1的基板W1中有反翹的資訊。此外,追加有示出收納在收納區域R3的基板W2中沒有反翹的資訊。此外,追加有示出收納在收納區域R4的基板W3中沒有反翹的資訊。另外,由於在收納區域R2中未收納基板W,因此未示出與基板W的反翹相關的資訊。 In the data of substrate information shown in FIG. 10 , information showing that the substrate W1 stored in the storage area R1 is warped is added. In addition, information showing that the substrate W2 stored in the storage area R3 is not warped is added. In addition, information showing that the substrate W3 stored in the storage area R4 is not warped is added. In addition, since the substrate W is not stored in the storage area R2, the information related to the warping of the substrate W is not shown.

如此,透過追加與基板W的反翹相關的資訊作為基板資訊,能夠管理被各收納區域R所收納的基板W的詳情。因此,例如透過由控制部C將該基板資訊提供給基板W的輸送裝置,輸送裝置能夠識別出成為輸送對象的基板W發生反翹,其結果為,能夠執行輸送中止或者不同的輸送方法的選擇等。 In this way, by adding information related to the back-flipping of the substrate W as substrate information, it is possible to manage the details of the substrates W stored in each storage area R. Therefore, for example, by providing the substrate information to the transport device of the substrate W through the control unit C, the transport device can recognize that the substrate W to be transported has back-flipped, and as a result, it can execute transport suspension or selection of a different transport method, etc.

此外,在本實施方式中,能夠使用由感測器Se1、Se2得到的檢測結果檢測基板W的傾斜。圖11是示出 實施方式的基板檢測方法的另一例的流程圖。圖12是示出檢測基板W的傾斜的情況的一例的圖。另外,在圖11所示的流程圖中,對於與圖8所示的流程圖同樣的處理賦予相同的附圖標記,並省略或簡化其說明。如圖8所示,控制部C在透過步驟S4設定為在收納區域R有基板W後,判斷由感測器Se1、Se2檢測的基板W的各自的高度H是否不同(步驟S9)。即,控制部C判斷由感測器Se1檢測的基板W的高度H與由感測器Se2檢測的基板W的高度H是否不同。 In addition, in this embodiment, the tilt of the substrate W can be detected using the detection results obtained by the sensors Se1 and Se2. FIG. 11 is a flowchart showing another example of the substrate detection method of the embodiment. FIG. 12 is a diagram showing an example of detecting the tilt of the substrate W. In addition, in the flowchart shown in FIG. 11, the same figure mark is given to the same processing as the flowchart shown in FIG. 8, and its description is omitted or simplified. As shown in FIG. 8, after the control unit C is set to have a substrate W in the storage area R through step S4, it determines whether the height H of the substrate W detected by the sensors Se1 and Se2 is different (step S9). That is, the control unit C determines whether the height H of the substrate W detected by the sensor Se1 is different from the height H of the substrate W detected by the sensor Se2.

在圖12中,示出了基板W2被傾斜地收納的情況的一例。如圖12所示,基板W2的-X側的端部被收納區域R2的基板支承部24支承,並且+X側的端部被收納區域R3的基板支承部24支承,呈在基板W2發生傾斜(角度θ)的狀態。由於感測器Se1、Se2以在X方向上隔開距離d3而被保持的狀態上升,因此,首先由感測器Se2檢測基板W2,隨後在感測器Se1、Se2上升了距離d2時,感測器Se1檢測基板W2。感測器Se1、Se2在不同的定時將檢測的結果輸出至控制部C。 FIG12 shows an example of a situation where the substrate W2 is stored at an angle. As shown in FIG12, the end of the -X side of the substrate W2 is supported by the substrate support portion 24 of the storage area R2, and the end of the +X side is supported by the substrate support portion 24 of the storage area R3, and the substrate W2 is tilted (angle θ). Since the sensors Se1 and Se2 are raised in a state of being kept at a distance d3 in the X direction, the sensor Se2 first detects the substrate W2, and then when the sensors Se1 and Se2 rise a distance d2, the sensor Se1 detects the substrate W2. The sensors Se1 and Se2 output the detection results to the control unit C at different timings.

控制部C根據升降驅動部M的驅動量計算感測器Se1檢測到基板W2時的高度H21,並計算感測器Se2檢測到基板W2時的高度H22。控制部C在步驟S9中,將計算出的高度H21與高度H22進行比較並判斷是否不同。控制部C在如圖12所示的基板W2傾斜的情況下,判斷為高度H21與高度H22不同。在高度H21與高度H22不同的情況下(步驟S9為是),控制部C判斷高度H21與高度H22的偏差是 否在容許範圍內(步驟S10)。另外,在高度H21與高度H22沒有不同的情況下(步驟S9為否),控制部C執行步驟S3之後的處理。 The control unit C calculates the height H21 when the sensor Se1 detects the substrate W2 based on the driving amount of the lifting drive unit M, and calculates the height H22 when the sensor Se2 detects the substrate W2. In step S9, the control unit C compares the calculated height H21 with the height H22 and determines whether they are different. When the substrate W2 is tilted as shown in FIG. 12, the control unit C determines that the height H21 is different from the height H22. When the height H21 is different from the height H22 (step S9 is yes), the control unit C determines whether the deviation between the height H21 and the height H22 is within the allowable range (step S10). In addition, when the height H21 and the height H22 are not different (step S9 is No), the control unit C executes the processing after step S3.

在步驟S10中,控制部C判斷高度H21與高度H22的偏差(距離d2)是否在存儲於記憶部E的容許範圍內。該容許範圍例如由操作員等預先存儲在記憶部E,基於將基板W適當地載置於1個收納區域R中的情況下的誤差範圍等來設定。控制部C判斷高度H21與高度H22的任一方(預先獲取的基板W的標準位置)與另一方的偏差是否在容許範圍內。另外,在步驟S10中,控制部C也可以判斷基板W2的傾斜角度θ是否在容許範圍內來代替判斷高度H21與高度H22的偏差是否在容許範圍內。關於計算基板W2的傾斜角度θ的方法在下文敘述。 In step S10, the control unit C determines whether the deviation (distance d2) between the height H21 and the height H22 is within the allowable range stored in the memory unit E. The allowable range is, for example, pre-stored in the memory unit E by an operator or the like, and is set based on the error range when the substrate W is properly placed in one storage area R. The control unit C determines whether the deviation between one of the heights H21 and H22 (the standard position of the substrate W obtained in advance) and the other is within the allowable range. In addition, in step S10, the control unit C may also determine whether the tilt angle θ of the substrate W2 is within the allowable range instead of determining whether the deviation between the heights H21 and H22 is within the allowable range. The method for calculating the tilt angle θ of the substrate W2 is described below.

在高度的偏差超過容許範圍的情況下(步驟S10為否),控制部C將示出收納在特定的收納區域R的基板W中有傾斜的資訊設定為基板資訊(步驟S11)。此外,在高度的偏差在容許範圍內的情況下(步驟S10為是),控制部C將示出收納在特定的收納區域R的基板W中沒有傾斜的資訊設定為基板資訊(步驟S12)。控制部C將示出基板W中有傾斜的資訊或者示出基板W中沒有傾斜的資訊存儲至記憶部E。控制部C在步驟S11中設定為在基板W中有傾斜之後,或者在步驟S12中設定為在基板W中沒有傾斜之後,透過步驟S3判斷感測器Se1、Se2是否到達最上部,到達最上部時結束一系列的處理,未到達最上部時返回步驟S1執 行各處理。 When the height deviation exceeds the allowable range (No in step S10), the control unit C sets information indicating that the substrate W stored in the specific storage area R is tilted as substrate information (step S11). In addition, when the height deviation is within the allowable range (Yes in step S10), the control unit C sets information indicating that the substrate W stored in the specific storage area R is not tilted as substrate information (step S12). The control unit C stores the information indicating that the substrate W is tilted or the information indicating that the substrate W is not tilted in the memory unit E. After the control unit C sets the substrate W to be tilted in step S11 or sets the substrate W to be not tilted in step S12, it determines whether the sensors Se1 and Se2 have reached the top through step S3. If they have reached the top, a series of processes are terminated. If they have not reached the top, it returns to step S1 to perform each process.

圖13是示出根據基板W的檢測結果生成的基板資訊的資料的另一例的圖。圖13包含了透過上述步驟S11或步驟S12設定的資訊(與基板W的傾斜相關的資訊)。此外,圖13所示的基板資訊的資料是對圖6所示的基板資訊的資料追加有與基板W的傾斜相關的資訊的資料。如圖13所示,控制部C分別對收納區域R1、R2、R3、R4、…除了追加基板W的有無之外還追加與該基板W是否傾斜相關的資訊。另外,如圖12所示,由於基板W2跨越收納區域R2、R3而被傾斜地收納,因此在圖13所示的基板資訊的資料中,示出了表示在收納區域R2、R3各自有基板W的資訊。 FIG. 13 is a diagram showing another example of substrate information data generated based on the detection result of substrate W. FIG. 13 includes information set by the above-mentioned step S11 or step S12 (information related to the inclination of substrate W). In addition, the substrate information data shown in FIG. 13 is data obtained by adding information related to the inclination of substrate W to the substrate information data shown in FIG. 6. As shown in FIG. 13, the control unit C adds information related to whether the substrate W is inclined in addition to the presence or absence of substrate W to the storage areas R1, R2, R3, R4, ..., respectively. In addition, as shown in FIG. 12, since substrate W2 is stored obliquely across storage areas R2 and R3, the substrate information data shown in FIG. 13 shows information indicating that there is a substrate W in each of storage areas R2 and R3.

在圖13所示的基板資訊的資料中,追加了示出收納在收納區域R1的基板W1中沒有傾斜的資訊。此外,追加了示出收納在收納區域R2的基板W2中有傾斜的資訊。此外,追加了示出收納在收納區域R3的基板W2中有傾斜的資訊。此外,追加了示出收納在收納區域R4的基板W3中沒有傾斜的資訊。另外,由於在收納區域R2、R3中為相同的基板W2,因此也可以設定示出在收納區域R2、R3的任一方中基板W2傾斜的資訊作為基板資訊。 In the data of substrate information shown in FIG. 13, information indicating that the substrate W1 stored in the storage area R1 is not tilted is added. In addition, information indicating that the substrate W2 stored in the storage area R2 is tilted is added. In addition, information indicating that the substrate W2 stored in the storage area R3 is tilted is added. In addition, information indicating that the substrate W3 stored in the storage area R4 is not tilted is added. In addition, since the same substrate W2 is in the storage areas R2 and R3, information indicating that the substrate W2 is tilted in either of the storage areas R2 and R3 can also be set as substrate information.

如此,透過追加與基板W的傾斜相關的資訊作為基板資訊,能夠管理收納在各收納區域R的基板W的詳情。因此,例如透過由控制部C將該基板資訊提供給基板W的輸送裝置,輸送裝置能夠識別出成為輸送對象的基 板W發生傾斜,其結果為,能夠執行輸送中止或者不同的輸送方法的選擇等。 In this way, by adding information related to the tilt of the substrate W as substrate information, the details of the substrates W stored in each storage area R can be managed. Therefore, for example, by providing the substrate information to the transport device of the substrate W through the control unit C, the transport device can recognize that the substrate W to be transported is tilted, and as a result, it can stop the transport or select a different transport method.

另外,作為基板資訊不限定於設定為示出基板W有無傾斜的資訊。例如,也可以除了設定示出基板W有無傾斜的資訊還設定示出基板W的傾斜的角度θ的資訊,或者設定示出基板W的傾斜的角度θ的資訊來代替示出基板W有無的傾斜的資訊。如圖12所示,感測器Se1、Se2的X方向的間隔為距離d3。由於感測器Se1、Se2如上所述地被維持構件42固定,因此距離d3不會變動。此外,感測器Se1檢測到基板W2時的高度為高度H21,感測器Se2檢測到基板W2時的高度為高度H22。該高度H21與高度H22的差為距離d2。控制部C利用該距離d2與距離d3,根據下式計算角度θ。 In addition, the substrate information is not limited to the information set to indicate whether the substrate W is tilted. For example, in addition to the information indicating whether the substrate W is tilted, information indicating the angle θ of the tilt of the substrate W may be set, or information indicating the angle θ of the tilt of the substrate W may be set instead of the information indicating whether the substrate W is tilted. As shown in FIG12 , the interval between the sensors Se1 and Se2 in the X direction is the distance d3. Since the sensors Se1 and Se2 are fixed by the holding member 42 as described above, the distance d3 does not change. In addition, the height when the sensor Se1 detects the substrate W2 is the height H21, and the height when the sensor Se2 detects the substrate W2 is the height H22. The difference between the height H21 and the height H22 is the distance d2. The control unit C calculates the angle θ according to the following formula using the distance d2 and the distance d3.

tanθ=d2/d3 tanθ=d2/d3

控制部C也可以如上所述地除了設定示出基板W有無傾斜的資訊之外還設定計算出的角度θ作為基板資訊,或者設定計算出的角度θ來代替基板W有無傾斜的資訊作為基板資訊。 As described above, the control unit C may also set the calculated angle θ as substrate information in addition to the information indicating whether the substrate W is tilted, or may set the calculated angle θ as substrate information instead of the information indicating whether the substrate W is tilted.

<基板處理單元> <Substrate processing unit>

圖14是示出實施方式的基板處理單元U的一例的圖。如圖14所示,本實施方式的基板處理單元U包含處理基板W的多個基板處理裝置。基板處理單元U作為基板處理裝置具有,載盒台(Cassette station)CS1、CS2、翻 轉裝置FP1、FP2、乾燥清潔裝置DU、剝離裝置ST、鐳射照射裝置LA、鹼清洗裝置LC、清洗裝置CC、輸送裝置TR1、TR2。由基板處理單元U處理的基板W例如將電子構件等經由黏接層及分離層黏貼在玻璃板等支承體上而形成。 FIG. 14 is a diagram showing an example of a substrate processing unit U of an embodiment. As shown in FIG. 14 , the substrate processing unit U of the present embodiment includes a plurality of substrate processing devices for processing substrates W. The substrate processing unit U has, as a substrate processing device, cassette stations CS1 and CS2, flip devices FP1 and FP2, a dry cleaning device DU, a stripping device ST, a laser irradiation device LA, an alkaline cleaning device LC, a cleaning device CC, and conveying devices TR1 and TR2. The substrate W processed by the substrate processing unit U is formed by, for example, bonding electronic components to a support such as a glass plate via an adhesive layer and a separation layer.

在基板處理單元U中,在+Y側朝向-X方向依次配置有載盒台CS1、CS2、翻轉裝置FP1、FP2、乾燥清潔裝置DU。在基板處理單元U中,在-Y側朝向-X方向依次配置有剝離裝置ST、鐳射照射裝置LA、輸送裝置TR2、鹼清洗裝置LC、清洗裝置CC。+Y側的載盒台CS1等與-Y側的剝離裝置ST等在Y方向上隔開間隔,在該間隔中配置有輸送裝置TR1。 In the substrate processing unit U, the cassette carriers CS1 and CS2, the flip devices FP1 and FP2, and the drying and cleaning device DU are sequentially arranged from the +Y side toward the -X direction. In the substrate processing unit U, the stripping device ST, the laser irradiation device LA, the conveying device TR2, the alkaline cleaning device LC, and the cleaning device CC are sequentially arranged from the -Y side toward the -X direction. The cassette carrier CS1 and the like on the +Y side are separated from the stripping device ST and the like on the -Y side by a gap in the Y direction, and the conveying device TR1 is arranged in the gap.

載盒台CS1具備本實施方式的基板檢測裝置1。載盒台CS1用於將基板W從收納容器2驅趕至基板處理單元U內。載盒台CS2具備可載置收納容器2的載置台,用於將由基板處理單元U處理後的基板W收納至收納容器2。另外,載盒台CS2也可以與載盒台CS1同樣地具備基板檢測裝置1。 The cassette stage CS1 is provided with the substrate detection device 1 of the present embodiment. The cassette stage CS1 is used to drive the substrate W from the storage container 2 into the substrate processing unit U. The cassette stage CS2 is provided with a loading table capable of loading the storage container 2, and is used to load the substrate W processed by the substrate processing unit U into the storage container 2. In addition, the cassette stage CS2 may also be provided with the substrate detection device 1 like the cassette stage CS1.

翻轉裝置FP1、FP2分別進行基板W的翻轉。翻轉裝置FP1、FP2為了透過鐳射照射裝置LA對基板W照射鐳射而將基板W翻轉。另外,透過使用2台翻轉裝置FP1、FP2,能夠高效地進行基板W的翻轉處理。此外,翻轉裝置FP1、FP2也可以是其中任意1台。翻轉裝置FP1、FP2也可以包含將基板W定位的對齊(alignment)裝置。鐳 射照射裝置LA對基板W照射鐳射。鐳射照射裝置LA例如從基板W的支承體側照射鐳射來使基板W的分離層變質。分離層變質的基板W成為支承體與電子構件等可分離的狀態。即,基板W變得可將電子構件等從支承體剝離。 The flipping devices FP1 and FP2 flip the substrate W respectively. The flipping devices FP1 and FP2 flip the substrate W in order to irradiate the substrate W with laser light by the laser irradiation device LA. In addition, by using two flipping devices FP1 and FP2, the flipping process of the substrate W can be efficiently performed. In addition, the flipping devices FP1 and FP2 may be any one of them. The flipping devices FP1 and FP2 may also include an alignment device for positioning the substrate W. The laser irradiation device LA irradiates the substrate W with laser light. The laser irradiation device LA irradiates the substrate W with laser light, for example, from the support body side of the substrate W to modify the separation layer of the substrate W. The substrate W with the modified separation layer becomes a state in which the support body and the electronic components can be separated. That is, the substrate W becomes capable of peeling electronic components etc. from the supporting body.

剝離裝置ST將支承體從基板W剝離。剝離裝置ST例如透過將分離層變質狀態下的基板W固定於固定台,並由吸附裝置將支承體吸附提起,從而將支承體從基板W剝離。鹼清洗裝置LC透過鹼清洗劑清洗基板W。鹼清洗劑能夠使用公知的鹼清洗劑。鹼清洗劑例如可例舉氫氧化鉀、氫氧化鈉、碳酸鉀、碳酸鈉、碳酸氫鈉、矽酸鈉、直鏈狀烷基胺、支鏈狀烷基胺、環式胺和氫氧化季銨化合物等。此外,作為鹼清洗劑中包含的添加劑,可例舉非離子表面活性劑、螯合劑及陰離子性表面活性劑等。鹼清洗裝置LC將剝離了支承體的基板W上所附著的黏接層溶解並去除。另外,剝離裝置ST也可以具備將從基板W剝離的支承體回收的支承體輸送裝置。 The stripping device ST strips the support body from the substrate W. For example, the stripping device ST fixes the substrate W in a degraded state of the separation layer on a fixing table, and lifts the support body by adsorption by the adsorption device, thereby stripping the support body from the substrate W. The alkali cleaning device LC cleans the substrate W by an alkali cleaning agent. The alkali cleaning agent can use a known alkali cleaning agent. Examples of the alkali cleaning agent include potassium hydroxide, sodium hydroxide, potassium carbonate, sodium carbonate, sodium bicarbonate, sodium silicate, linear alkylamine, branched alkylamine, cyclic amine, and quaternary ammonium hydroxide compound. In addition, examples of additives contained in the alkaline cleaning agent include non-ionic surfactants, chelating agents, and anionic surfactants. The alkaline cleaning device LC dissolves and removes the adhesive layer attached to the substrate W from which the support body is peeled off. In addition, the peeling device ST may also have a support body transport device for recovering the support body peeled off from the substrate W.

清洗裝置CC使用清洗杯清洗基板W。清洗裝置CC例如,對基板W供給液體從而將附著在剝離了支承體的基板W的黏接層、分離層去除。用於清洗的液體例如可例舉烴類有機溶劑、含氮類有機溶劑、醚類溶劑、酯類溶劑、水(純水)等。乾燥清潔裝置DU對基板W乾燥清潔。另外,也可以使用可去除附著在基板W的黏接層、分離層的等離子清洗裝置來代替清洗裝置CC、鹼清洗裝置LC。乾燥清潔裝置DU例如對基板W供給乾燥空氣、氮氣等氣體來 去除附著在基板W的液體。乾燥清潔裝置DU例如使基板W乾燥。 The cleaning device CC uses a cleaning cup to clean the substrate W. The cleaning device CC, for example, supplies liquid to the substrate W to remove the adhesive layer and the separation layer attached to the substrate W from which the support body is peeled. Examples of the liquid used for cleaning include hydrocarbon organic solvents, nitrogen-containing organic solvents, ether solvents, ester solvents, water (pure water), etc. The dry cleaning device DU performs dry cleaning on the substrate W. In addition, a plasma cleaning device that can remove the adhesive layer and the separation layer attached to the substrate W can be used instead of the cleaning device CC and the alkaline cleaning device LC. The dry cleaning device DU, for example, supplies dry air, nitrogen, and other gases to the substrate W to remove the liquid attached to the substrate W. The dry cleaning device DU, for example, dries the substrate W.

輸送裝置TR1、TR2在各裝置間輸送基板W。輸送裝置TR1、TR2例如是具備可保持基板W的臂的輸送機器人。如圖14所示,輸送裝置TR1可在X方向上移動。輸送裝置TR2可以與輸送裝置TR1同樣地可在X方向上移動,也可以固定配置在鐳射照射裝置LA與鹼清洗裝置LC之間。可以使輸送裝置TR1、TR2雙方同時運轉,也可以使任意一方運轉。 The transport devices TR1 and TR2 transport the substrate W between the devices. The transport devices TR1 and TR2 are, for example, transport robots equipped with arms capable of holding the substrate W. As shown in FIG. 14 , the transport device TR1 can move in the X direction. The transport device TR2 can move in the X direction like the transport device TR1, or can be fixedly arranged between the laser irradiation device LA and the alkaline cleaning device LC. The transport devices TR1 and TR2 can be operated simultaneously, or either one can be operated.

接著,對在基板處理單元U中透過輸送裝置TR1輸送基板W的一例進行說明。輸送裝置TR1將基板W從載盒台CS1(基板檢測裝置1)的收納容器2中驅趕出。然後,輸送裝置TR1將驅趕出的基板W輸送至翻轉裝置FP1或翻轉裝置FP2。然後,輸送裝置TR1將被翻轉裝置FP1等翻轉的基板W輸送至鐳射照射裝置LA。然後,輸送裝置TR1將由鐳射照射裝置LA照射了鐳射的基板W輸送至剝離裝置ST。然後,輸送裝置TR1將被剝離裝置ST剝離了支承體後的基板W輸送至鹼清洗裝置LC。然後,輸送裝置TR1將鹼清洗結束後的基板W輸送至清洗裝置CC。然後,輸送裝置TR1將清洗後的基板W輸送至乾燥清潔裝置DU。輸送裝置TR1將乾燥後的基板W收納至載荷台CS2的收納容器2。 Next, an example of transporting the substrate W through the transport device TR1 in the substrate processing unit U is described. The transport device TR1 drives the substrate W out of the storage container 2 of the cassette stage CS1 (substrate detection device 1). Then, the transport device TR1 transports the driven substrate W to the flip device FP1 or the flip device FP2. Then, the transport device TR1 transports the substrate W flipped by the flip device FP1 and the like to the laser irradiation device LA. Then, the transport device TR1 transports the substrate W irradiated with laser by the laser irradiation device LA to the stripping device ST. Then, the transport device TR1 transports the substrate W after the support body is stripped by the stripping device ST to the alkaline cleaning device LC. Then, the transport device TR1 transports the substrate W after alkaline cleaning to the cleaning device CC. Then, the transport device TR1 transports the cleaned substrate W to the drying and cleaning device DU. The transport device TR1 stores the dried substrate W in the storage container 2 of the loading platform CS2.

另外,不限定於透過1台輸送裝置TR1來輸送基板W。也可以透過2台輸送裝置TR1、TR2來輸送基板W。例如,也可以在特定的裝置間透過輸送裝置TR2輸送 基板W,在特定的裝置間以外透過輸送裝置TR1輸送基板W。此外,也可以將輸送裝置TR1作為主裝置使用,將輸送裝置TR2作為副(或者輔助)裝置使用。此外,基板處理單元U可以是具備1台輸送裝置TR1的構成,也可以是具備3台輸送裝置TR1(TR2)的構成。 In addition, it is not limited to transporting the substrate W through one transport device TR1. The substrate W may also be transported through two transport devices TR1 and TR2. For example, the substrate W may be transported through the transport device TR2 in a specific device room, and the substrate W may be transported through the transport device TR1 outside the specific device room. In addition, the transport device TR1 may be used as a main device, and the transport device TR2 may be used as a secondary (or auxiliary) device. In addition, the substrate processing unit U may be a structure having one transport device TR1, or a structure having three transport devices TR1 (TR2).

以上對實施方式進行了說明,但本發明不限定於上述說明,在不脫離本發明的主旨的範圍內可進行各種變更。例如,雖然對基板W的反翹的檢測方法與基板W的傾斜的檢測方法分別進行了說明,但也可以是檢測基板W的反翹與傾斜雙方的方式。該情況下,也可以對每個收納區域R設定基板W的有無、基板W的反翹、以及基板W的傾斜作為基板資訊。此外,也可以追加基板W的Y方向的位置、以及基板W的厚度的一方或雙方作為基板資訊。 The above is an explanation of the implementation method, but the present invention is not limited to the above explanation, and various changes can be made within the scope of the main purpose of the present invention. For example, although the detection method of the back-curling of the substrate W and the detection method of the tilt of the substrate W are described separately, it is also possible to detect both the back-curling and the tilt of the substrate W. In this case, the presence or absence of the substrate W, the back-curling of the substrate W, and the tilt of the substrate W can also be set as substrate information for each storage area R. In addition, the position of the substrate W in the Y direction and the thickness of the substrate W can also be added as substrate information.

此外,在上述實施方式中,例舉出感測器保持部4由框體41、維持構件42、被引導構件43及軸44構成的方式進行了說明,但不限定於該方案。例如,也可以是感測器保持部4由維持構件42及軸44構成的方式。 In addition, in the above-mentioned embodiment, the sensor holding part 4 is described as being composed of a frame 41, a holding member 42, a guided member 43, and a shaft 44, but the invention is not limited to this scheme. For example, the sensor holding part 4 may be composed of a holding member 42 and a shaft 44.

1:基板檢測裝置1: Substrate inspection device

2:收納容器2: Storage container

3:載置部3: Loading part

4:感測器保持部4: Sensor holding part

5:引導部5: Guidance Department

21:四邊形狀的板狀的底部21: Quadrilateral plate-shaped bottom

22:支承體22: Support body

23:四邊形狀的板狀的上部23: The upper part of the quadrilateral plate

24:基板支承部24: Substrate support

25:基板收納口25: Baseboard storage port

31:頂板31: Top plate

32:支柱32: Pillar

33:板狀構件33: Plate-shaped components

34:引導件34:Guide

41A:板狀的框體上部41A: Plate-shaped upper frame

41B:板狀的框體下部41B: Plate-shaped lower frame

41C,41D:棒狀構件41C, 41D: Rod-shaped components

42:維持構件42:Maintaining components

43:被引導構件43: Guided component

44:軸44: Axis

C:控制部C: Control Department

E:記憶部E: Memory

G:設置面G: Setting surface

M:升降驅動部M: Lifting drive unit

R,R1,R2,R3,R4:收納區域R,R1,R2,R3,R4: Storage area

Se1,Se2:感測器Se1, Se2: Sensor

W,W1,W2,W3:基板W,W1,W2,W3: Substrate

Claims (8)

一種基板檢測裝置,具備:載置部,其係載置供多個基板沿上下方向排列收納的收納容器;感測器保持部,其係與前述載置部相對地升降;升降驅動部,其係使前述載置部與前述感測器保持部相對地升降;多個感測器,其係在與上下方向相交的方向上分離配置於前述感測器保持部,分別檢測容納於前述收納容器的前述基板的端部的不同的部分;以及控制部,其係驅動前述升降驅動部,使前述載置部與前述感測器保持部相對地升降,並根據前述多個感測器對前述基板的端部的檢測結果獲取前述收納容器內的基板資訊;前述感測器保持部具備:四角形狀的框體、用於維持前述多個感測器的水平方向或大致水平方向的位置之維持構件、以及從前述框體垂下之一對的被導引構件;前述一對的被導引構件分別被導引成可以升降;前述維持構件經由被前述一對的被導引構件固定而保持在前述框體。 A substrate detection device comprises: a loading portion, which is a storage container for loading a plurality of substrates arranged in a vertical direction; a sensor holding portion, which is lifted relative to the loading portion; a lifting drive portion, which causes the loading portion and the sensor holding portion to be lifted relative to each other; a plurality of sensors, which are separately arranged on the sensor holding portion in a direction intersecting the vertical direction, and respectively detect different parts of the end of the substrate accommodated in the storage container; and a control portion, which drives the lifting drive portion to cause the loading portion to be lifted relative to the sensor holding portion. The sensor holding part rises and falls relative to the sensor holding part, and obtains the substrate information in the storage container according to the detection results of the multiple sensors on the ends of the substrate; the sensor holding part comprises: a quadrangular frame, a holding member for maintaining the horizontal or substantially horizontal positions of the multiple sensors, and a pair of guided members hanging from the frame; the pair of guided members are respectively guided to be able to rise and fall; the holding member is held in the frame by being fixed by the pair of guided members. 如請求項1的基板檢測裝置,其中,前述多個感測器沿水平方向或大致水平方向分離配置於前述感測器保持部。 As in claim 1, the substrate detection device, wherein the plurality of sensors are separately arranged in the sensor holding portion along a horizontal direction or a substantially horizontal direction. 如請求項1或2的基板檢測裝置,其中, 前述感測器為光學式反射型感測器。 A substrate detection device as claimed in claim 1 or 2, wherein the sensor is an optical reflective sensor. 如請求項1或2的基板檢測裝置,其中,前述控制部基於前述載置部與前述感測器保持部的相對位置、以及前述感測器的檢測結果,獲取前述收納容器內的前述基板的位置。 A substrate detection device as claimed in claim 1 or 2, wherein the control unit obtains the position of the substrate in the storage container based on the relative position of the placement unit and the sensor holding unit and the detection result of the sensor. 如請求項4的基板檢測裝置,其中,前述控制部根據前述收納容器內的前述基板的位置與預先獲取的前述基板的標準位置的偏差,獲取前述基板的反翹及前述基板的傾斜中的一方或雙方。 The substrate detection device of claim 4, wherein the control unit obtains one or both of the warp of the substrate and the tilt of the substrate according to the deviation between the position of the substrate in the storage container and the pre-obtained standard position of the substrate. 如請求項1或2的基板檢測裝置,其中,前述基板為方形基板。 A substrate detection device as claimed in claim 1 or 2, wherein the aforementioned substrate is a square substrate. 一種基板檢測方法,對在載置於載置部的收納容器中沿上下方向排列收納的多個基板進行檢測,其特徵在於,該基板檢測方法包括:使前述載置部和與被感測器保持部保持的多個感測器在與上下方向相交的方向上分離配置的感測器保持部相對地升降之工序;透過前述多個感測器分別檢測容納於前述收納容器的前述基板的端部的不同的部分之工序;以及根據前述多個感測器對前述基板的端部的檢測結果,獲取前述收納容器內的基板資訊之工序;其中,前述感測器保持部具備:四角形狀的框體、用於維持前述多個感測器的水平方向或大致水平方向的位置之維持 構件、以及從前述框體垂下之一對的被導引構件;前述一對的被導引構件分別被導引成可以升降;前述維持構件經由被前述一對的被導引構件固定而保持在前述框體。 A substrate detection method is provided for detecting a plurality of substrates arranged and stored in a storage container placed on a placing portion in a vertical direction, wherein the method comprises: a step of relatively lifting and lowering the placing portion and a sensor holding portion which is separated and arranged from a plurality of sensors held by a sensor holding portion in a direction intersecting the vertical direction; a step of respectively detecting different portions of the end of the substrates stored in the storage container by the plurality of sensors; and a step of detecting the substrates according to the plurality of sensors. The process of obtaining the substrate information in the storage container by using a sensor to detect the end of the substrate; wherein the sensor holding part comprises: a quadrangular frame, a holding member for holding the horizontal or substantially horizontal position of the plurality of sensors, and a pair of guided members hanging from the frame; the pair of guided members are guided to be able to rise and fall respectively; the holding member is held in the frame by being fixed by the pair of guided members. 一種基板處理單元,具備:如請求項1~6中任一項的基板檢測裝置;對前述基板進行處理的基板處理裝置;以及在前述基板檢測裝置與前述基板處理裝置之間輸送前述基板的輸送裝置。 A substrate processing unit, comprising: a substrate detection device as described in any one of claims 1 to 6; a substrate processing device for processing the substrate; and a transport device for transporting the substrate between the substrate detection device and the substrate processing device.
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Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003282675A (en) * 2002-03-20 2003-10-03 Tokyo Seimitsu Co Ltd Wafer mapping device
US20160091306A1 (en) * 2014-09-29 2016-03-31 SCREEN Holdings Co., Ltd. Substrate treating apparatus and substrate treating methods
US20190371638A1 (en) * 2018-05-29 2019-12-05 Taiwan Semiconductor Manufacturing Co., Ltd. Substrate detecting system in a substrate storage container

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0922452A (en) * 1995-07-07 1997-01-21 Sony Corp Thin plate member counting device and counting method
WO1999028952A2 (en) * 1997-11-28 1999-06-10 Fortrend Engineering Corporation Wafer-mapping load port interface
JP2000294617A (en) 1999-04-07 2000-10-20 Dainippon Screen Mfg Co Ltd Device for detecting board inside cassette
TW444260B (en) * 2000-07-13 2001-07-01 Ind Tech Res Inst Wafer mapping method of wafer load port equipment
JP4246420B2 (en) 2000-09-14 2009-04-02 平田機工株式会社 FOUP opener and FOUP opener mapping method
JP4669643B2 (en) * 2001-09-17 2011-04-13 ローツェ株式会社 Wafer mapping apparatus and load port having the same
JP2004119835A (en) * 2002-09-27 2004-04-15 Yaskawa Electric Corp Thin substrate detection device
JP4501755B2 (en) 2005-04-05 2010-07-14 株式会社安川電機 Load port and load port control method
JP5160603B2 (en) * 2010-09-13 2013-03-13 東京エレクトロン株式会社 Substrate processing apparatus, substrate processing method, and storage medium
JP5282808B2 (en) * 2011-09-26 2013-09-04 Tdk株式会社 Load port device and method for detecting workpiece

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003282675A (en) * 2002-03-20 2003-10-03 Tokyo Seimitsu Co Ltd Wafer mapping device
US20160091306A1 (en) * 2014-09-29 2016-03-31 SCREEN Holdings Co., Ltd. Substrate treating apparatus and substrate treating methods
US20190371638A1 (en) * 2018-05-29 2019-12-05 Taiwan Semiconductor Manufacturing Co., Ltd. Substrate detecting system in a substrate storage container

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