TWI869730B - Lead-free and copper-free tin alloys and solder balls for ball grid array packaging - Google Patents
Lead-free and copper-free tin alloys and solder balls for ball grid array packaging Download PDFInfo
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- 229910001128 Sn alloy Inorganic materials 0.000 title claims abstract description 84
- 238000004806 packaging method and process Methods 0.000 title claims description 22
- 229910000679 solder Inorganic materials 0.000 title abstract description 85
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims abstract description 44
- 229910052797 bismuth Inorganic materials 0.000 claims abstract description 26
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 claims abstract description 26
- 229910052787 antimony Inorganic materials 0.000 claims abstract description 24
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 claims abstract description 24
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims abstract description 22
- 229910052732 germanium Inorganic materials 0.000 claims abstract description 22
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 claims abstract description 22
- 229910052759 nickel Inorganic materials 0.000 claims abstract description 22
- 229910052709 silver Inorganic materials 0.000 claims abstract description 22
- 239000004332 silver Substances 0.000 claims abstract description 22
- 230000035939 shock Effects 0.000 abstract description 45
- 238000003466 welding Methods 0.000 abstract description 23
- 238000005382 thermal cycling Methods 0.000 abstract description 14
- 238000007254 oxidation reaction Methods 0.000 abstract description 13
- 230000003647 oxidation Effects 0.000 abstract description 12
- 238000012360 testing method Methods 0.000 description 100
- 229910045601 alloy Inorganic materials 0.000 description 40
- 239000000956 alloy Substances 0.000 description 40
- 230000000052 comparative effect Effects 0.000 description 35
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 20
- 238000009864 tensile test Methods 0.000 description 19
- 238000011156 evaluation Methods 0.000 description 15
- 239000010949 copper Substances 0.000 description 10
- 229910052751 metal Inorganic materials 0.000 description 10
- 239000002184 metal Substances 0.000 description 10
- 239000000758 substrate Substances 0.000 description 10
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 9
- 229910052802 copper Inorganic materials 0.000 description 9
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 6
- 238000004458 analytical method Methods 0.000 description 6
- 239000007943 implant Substances 0.000 description 5
- 238000002513 implantation Methods 0.000 description 5
- 238000000034 method Methods 0.000 description 5
- 229910052710 silicon Inorganic materials 0.000 description 5
- 239000010703 silicon Substances 0.000 description 5
- 238000005476 soldering Methods 0.000 description 5
- 239000012535 impurity Substances 0.000 description 4
- 238000010186 staining Methods 0.000 description 4
- 230000003064 anti-oxidating effect Effects 0.000 description 3
- 230000007547 defect Effects 0.000 description 3
- 238000009863 impact test Methods 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- 230000002950 deficient Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000007769 metal material Substances 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- 238000010998 test method Methods 0.000 description 2
- 230000008646 thermal stress Effects 0.000 description 2
- 238000002441 X-ray diffraction Methods 0.000 description 1
- 230000001133 acceleration Effects 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 239000003292 glue Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012536 packaging technology Methods 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 230000035882 stress Effects 0.000 description 1
- 238000012956 testing procedure Methods 0.000 description 1
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Abstract
一種無鉛無銅錫合金,包含0.01~3.0 wt%的銀、0.01~5.0 wt%的鉍、0~2.0 wt%的銻、0.005~0.1 wt%的鎳、0.005~0.02 wt%的鍺及餘量的錫。本發明的無鉛無銅錫合金經焊接後所得的結構,例如焊錫凸塊,會具備優異的機械衝擊可靠度,同時擁有良好的焊接性、延展性、抗氧化能力及冷熱循環可靠度。A lead-free copper-free tin alloy comprises 0.01-3.0 wt% of silver, 0.01-5.0 wt% of bismuth, 0-2.0 wt% of antimony, 0.005-0.1 wt% of nickel, 0.005-0.02 wt% of germanium and the remainder of tin. The structure obtained by welding the lead-free copper-free tin alloy of the present invention, such as a solder bump, has excellent mechanical shock reliability, and also has good weldability, ductility, oxidation resistance and thermal cycling reliability.
Description
本發明是有關於一種錫合金與由該錫合金所製成之用於球柵陣列封裝的錫球,特別是指一種無鉛無銅錫合金與由該無鉛無銅錫合金所製成之用於球柵陣列封裝的錫球。The present invention relates to a tin alloy and a tin ball made of the tin alloy for ball grid array packaging, and particularly to a lead-free and copper-free tin alloy and a tin ball made of the lead-free and copper-free tin alloy for ball grid array packaging.
隨著半導體元件之I/O數(input/output)的提高,封裝技術由原本只能使用晶片周邊進行封裝的打線結合(wire bonding)演變成至今能使用晶片底部表面進行封裝的球柵陣列(ball grid array;簡稱BGA)封裝,其技術是對半導體元件進行IC焊墊重新佈局(I/O distribution),將焊墊分佈在半導體元件底部從而提高I/O密度。As the number of I/O (input/output) of semiconductor components increases, packaging technology has evolved from wire bonding, which was originally only used for packaging around the chip, to ball grid array (BGA) packaging, which can now be used for packaging on the bottom surface of the chip. The technology is to re-layout the IC pads (I/O distribution) of semiconductor components, distributing the pads on the bottom of the semiconductor components to increase the I/O density.
球柵陣列封裝的導通方式可分為金屬凸塊、導電膠及導電膜等,其中又以屬於金屬凸塊技術之焊錫凸塊(solder bump)為主。而球柵陣列封裝又可分為非晶圓級封裝及晶圓級封裝。The conduction methods of ball grid array packaging can be divided into metal bumps, conductive glue and conductive film, among which solder bumps, which belong to metal bump technology, are the most common. Ball grid array packaging can be divided into non-wafer level packaging and wafer level packaging.
非晶圓級封裝是指矽晶片透過打線或覆晶(flip chip)的方式焊接在有機基板後,在矽晶片及有機基板之間灌入底部填膠(underfill),然後在有機基板的另一端焊接上錫球形成焊錫凸塊,以形成一電子元件。因為有機基板和矽晶片的膨脹係數差距過大,當電子元件本身或環境出現溫度變化時,由熱膨脹係數不匹配(mismatch in coefficient of thermal expansion)所帶來的熱應力會造成電子元件與電路板之間的焊點(焊錫凸塊)出現損壞(有機基板和矽晶片之間的焊點因有底部填膠而通常不會出現損壞)。Non-wafer-level packaging refers to the process of soldering a silicon chip to an organic substrate by wire bonding or flip chip, then filling the gap between the silicon chip and the organic substrate with underfill, and then soldering a solder ball to the other end of the organic substrate to form a solder bump to form an electronic component. Because the difference in the coefficient of expansion between the organic substrate and the silicon chip is too large, when the temperature of the electronic component itself or the environment changes, the thermal stress caused by the mismatch in coefficient of thermal expansion will cause damage to the solder joints (solder bumps) between the electronic component and the circuit board (the solder joints between the organic substrate and the silicon chip are usually not damaged due to the underfill).
晶圓級封裝是指直接在矽晶圓上進行大部分或是全部的封裝測試程序後,再進行切割製成單顆晶片,晶片不通過有機基板,而是直接在晶片上進行IC焊墊重新佈局,然後焊接上錫球,以形成焊錫凸塊。由於封裝後的晶片尺吋與裸晶片幾乎一致,故稱為晶圓級晶片尺吋封裝(wafer level chip scale package;簡稱WLCSP)。然而,由於矽晶片和電路板的膨脹係數差距過大,作為兩者間之連接體的焊點(焊錫凸塊)需能承受電子元件本身或環境出現溫度變化時所帶來的熱應力,此外,因晶圓級封裝多運用在有輕薄短小的行動裝置上,故焊點(焊錫凸塊)也需具有承受高機械衝擊的能力。Wafer-level packaging refers to performing most or all of the packaging and testing procedures directly on the silicon wafer before cutting it into individual chips. The chip does not pass through the organic substrate, but the IC pads are re-arranged directly on the chip, and then solder balls are soldered to form solder bumps. Since the size of the packaged chip is almost the same as that of the bare chip, it is called wafer level chip scale package (WLCSP for short). However, due to the large difference in expansion coefficients between silicon chips and circuit boards, the solder joints (solder bumps) that serve as the connector between the two must be able to withstand the thermal stress caused by temperature changes in the electronic components themselves or the environment. In addition, because wafer-level packaging is mostly used in thin and short mobile devices, the solder joints (solder bumps) must also be able to withstand high mechanical shocks.
現有的錫合金是以合金強度及冷熱循環可靠度為主要特性訴求。然而,在追求提升合金強度及冷熱循環可靠度同時,往往會使錫合金具有較低的延展性,導致錫合金具備較差的機械衝擊可靠度。The main characteristics of existing tin alloys are alloy strength and thermal cycle reliability. However, in the pursuit of improving alloy strength and thermal cycle reliability, the tin alloys often have lower ductility, resulting in poor mechanical shock reliability.
因此,如何找到一種能製備用於球柵陣列(BGA)封裝之錫球的錫合金,且該錫合金經焊接後所得的結構(例如焊錫凸塊)會具備優異的機械衝擊可靠度,同時擁有良好的焊接性、延展性、抗氧化能力及冷熱循環可靠度,成為目前致力研究的目標。Therefore, how to find a tin alloy that can be used to prepare solder balls for ball grid array (BGA) packaging, and the structure obtained after welding of the tin alloy (such as solder bumps) will have excellent mechanical shock reliability, while having good weldability, ductility, oxidation resistance and thermal cycling reliability, has become the current research target.
因此,本發明之第一目的,即在提供一種無鉛無銅錫合金。該無鉛無銅錫合金能製成用於球柵陣列(BGA)封裝之錫球,且該無鉛無銅錫合金經焊接後所得的結構(例如焊錫凸塊)會具備優異的機械衝擊可靠度,同時擁有良好的焊接性、延展性、抗氧化能力及冷熱循環可靠度。Therefore, the first object of the present invention is to provide a lead-free and copper-free tin alloy. The lead-free and copper-free tin alloy can be made into tin balls for ball grid array (BGA) packaging, and the structure obtained by welding the lead-free and copper-free tin alloy (such as solder bump) will have excellent mechanical shock reliability, and at the same time have good weldability, ductility, oxidation resistance and thermal cycling reliability.
於是,本發明無鉛無銅錫合金,以該無鉛無銅錫合金的總重為100 wt%計,包含: 0.01~3.0 wt%的銀; 0.01~5.0 wt%的鉍; 0~2.0 wt%的銻; 0.005~0.1 wt%的鎳; 0.005~0.02 wt%的鍺;及 餘量的錫。 Therefore, the lead-free copper-free tin alloy of the present invention, based on the total weight of the lead-free copper-free tin alloy being 100 wt%, comprises: 0.01~3.0 wt% of silver; 0.01~5.0 wt% of bismuth; 0~2.0 wt% of antimony; 0.005~0.1 wt% of nickel; 0.005~0.02 wt% of germanium; and the remainder of tin.
因此,本發明之第二目的,即在提供一種用於球柵陣列封裝的錫球。Therefore, the second object of the present invention is to provide a solder ball for ball grid array packaging.
於是,本發明用於球柵陣列封裝的錫球,是由前述的無鉛無銅錫合金所製成。Therefore, the tin ball used for ball grid array packaging of the present invention is made of the aforementioned lead-free and copper-free tin alloy.
本發明之功效在於:由於本發明的無鉛無銅錫合金同時包含0.01~3.0 wt%的銀、0.01~5.0 wt%的鉍、0~2.0 wt%的銻、0.005~0.1 wt%的鎳、0.005~0.02 wt%的鍺及餘量的錫。因此,本發明的無鉛無銅錫合金能製成用於球柵陣列(BGA)封裝之錫球,且該無鉛無銅錫合金經焊接後所得的結構(例如焊錫凸塊)會具備優異的機械衝擊可靠度,同時擁有良好的焊接性、延展性、抗氧化能力及冷熱循環可靠度。The effect of the present invention is that: since the lead-free copper-free tin alloy of the present invention simultaneously contains 0.01-3.0 wt% of silver, 0.01-5.0 wt% of bismuth, 0-2.0 wt% of antimony, 0.005-0.1 wt% of nickel, 0.005-0.02 wt% of germanium and the remainder of tin, the lead-free copper-free tin alloy of the present invention can be made into tin balls for ball grid array (BGA) packaging, and the structure (such as solder bump) obtained by welding the lead-free copper-free tin alloy will have excellent mechanical shock reliability, and at the same time have good weldability, ductility, oxidation resistance and thermal cycling reliability.
以下將就本發明內容進行詳細說明:The following is a detailed description of the content of the invention:
本發明的無鉛無銅錫合金,以該無鉛無銅錫合金的總重為100 wt%計,包含0.01~3.0 wt%的銀、0.01~5.0 wt%的鉍、0~2.0 wt%的銻、0.005~0.1 wt%的鎳、0.005~0.02 wt%的鍺,及餘量的錫。The lead-free copper-free tin alloy of the present invention comprises 0.01-3.0 wt% of silver, 0.01-5.0 wt% of bismuth, 0-2.0 wt% of antimony, 0.005-0.1 wt% of nickel, 0.005-0.02 wt% of germanium, and the balance of tin, based on the total weight of the lead-free copper-free tin alloy being 100 wt%.
需先說明的是,本發明的無鉛無銅錫合金實質上不包含鉛(Pb)及不包含銅(Cu)。前述實質上不包含鉛及不包含銅是指原則上只要非蓄意在錫合金中添加鉛及銅者(例如於製造過程中無意但不可避免的雜質或接觸),因此,基於本發明主旨即可被視為實質上不包含鉛及銅,或可視為無鉛無銅。wt%指的是重量百分比,本文中的wt%同指重量百分比。另外,本發明及專利範圍所述之數值範圍的限定總是包括端值。It should be noted that the lead-free and copper-free tin alloy of the present invention does not substantially contain lead (Pb) and does not contain copper (Cu). The aforementioned substantially does not contain lead and does not contain copper means that in principle, as long as lead and copper are not intentionally added to the tin alloy (for example, unintentional but unavoidable impurities or contact during the manufacturing process), therefore, based on the subject matter of the present invention, it can be regarded as substantially free of lead and copper, or can be regarded as lead-free and copper-free. wt% refers to weight percentage, and wt% in this article also refers to weight percentage. In addition, the limitations of the numerical range described in the present invention and the patent scope always include the end value.
此外,「餘量的錫」的用語為了避免誤解,不應被理解為排除其它於製造過程中無意但不可避免的雜質。因此,若假設雜質存在時,「餘量的錫」應被理解為補足該無鉛無銅錫合金至100 wt%的重量百分比例且是由錫加上不可避免的雜質所組成。In addition, the term "balance of tin" should not be understood to exclude other unintentional but unavoidable impurities in the manufacturing process in order to avoid misunderstanding. Therefore, if it is assumed that impurities exist, "balance of tin" should be understood to make up the weight percentage of the lead-free and copper-free tin alloy to 100 wt% and consist of tin plus unavoidable impurities.
較佳地,該無鉛無銅錫合金包含1.5~2.5 wt%的銀。更佳地,該無鉛無銅錫合金包含1.75~2.25 wt%的銀。Preferably, the lead-free copper-free tin alloy contains 1.5-2.5 wt % of silver. More preferably, the lead-free copper-free tin alloy contains 1.75-2.25 wt % of silver.
較佳地,該無鉛無銅錫合金包含2~3 wt%的鉍。更佳地,該無鉛無銅錫合金包含2.25~2.75 wt%的鉍。Preferably, the lead-free copper-free tin alloy contains 2-3 wt% bismuth. More preferably, the lead-free copper-free tin alloy contains 2.25-2.75 wt% bismuth.
較佳地,該無鉛無銅錫合金包含0.5~1.5 wt%的銻。更佳地,該無鉛無銅錫合金包含0.75~1.25 wt%的銻。Preferably, the lead-free copper-free tin alloy contains 0.5-1.5 wt% antimony. More preferably, the lead-free copper-free tin alloy contains 0.75-1.25 wt% antimony.
較佳地,該無鉛無銅錫合金包含0.045~0.055 wt%的鎳。更佳地,該無鉛無銅錫合金包含0.0475~0.0525 wt%的鎳。Preferably, the lead-free copper-free tin alloy contains 0.045-0.055 wt % nickel. More preferably, the lead-free copper-free tin alloy contains 0.0475-0.0525 wt % nickel.
較佳地,該無鉛無銅錫合金包含0.005~0.015 wt%的鍺。更佳地,該無鉛無銅錫合金包含0.0075~0.0125 wt%的鍺。Preferably, the lead-free copper-free tin alloy contains 0.005-0.015 wt % of germanium. More preferably, the lead-free copper-free tin alloy contains 0.0075-0.0125 wt % of germanium.
較佳地,鉍和銻的總重為1.0~4.5 wt%。又較佳地,鉍和銻的總重為3.0~4.0 wt%。更佳地,鉍和銻的總重為3.0~3.75 wt%。又更佳地,鉍和銻的總重為3.25~3.75 wt%。Preferably, the total weight of bismuth and antimony is 1.0-4.5 wt%. More preferably, the total weight of bismuth and antimony is 3.0-4.0 wt%. More preferably, the total weight of bismuth and antimony is 3.0-3.75 wt%. More preferably, the total weight of bismuth and antimony is 3.25-3.75 wt%.
<< 實施例Embodiment 1~11~1 11 與比較例Comparison example 1~1~ 99 >>
製備無鉛無銅錫合金Preparation of lead-free, copper-free, tin alloy
實施例1~11與比較例1~9的無鉛無銅錫合金是依據下表1所示的金屬成分與重量百分比(wt%),以及下列步驟所製得: The lead-free, copper-free, tin alloys of Examples 1 to 11 and Comparative Examples 1 to 9 are prepared according to the metal composition and weight percentage (wt%) shown in Table 1 below, and the following steps:
步驟 (1) :依據對應的金屬成分及重量百分比,準備對應的金屬材料。 Step (1) : Prepare corresponding metal materials according to the corresponding metal components and weight percentages.
步驟 (2) :將已經準備好的金屬材料加熱熔化及鑄造,形成實施例1~11與比較例1~9的無鉛無銅錫合金。
表1
<< 合金性質測試Alloy property test >>
先說明的是,實施例與比較例的無鉛無銅錫合金是藉由推力測試評估焊接性;藉由拉伸測試評估合金延展性;藉由板階焊接測試評估抗氧化能力;藉由冷熱循環測試評估焊點及接合結構的熱疲勞抗性(即冷熱循環可靠度);藉由機械衝擊測試評估焊點及接合結構的抗機械衝擊能力(即機械衝擊可靠度)。First, it is explained that the weldability of the lead-free copper-free tin alloy of the embodiment and the comparative example is evaluated by a thrust test; the ductility of the alloy is evaluated by a tensile test; the oxidation resistance is evaluated by a plate-level welding test; the thermal fatigue resistance of the solder joint and the joint structure (i.e., the thermal cycle reliability) is evaluated by a thermal cycle test; and the mechanical shock resistance of the solder joint and the joint structure (i.e., the mechanical shock reliability) is evaluated by a mechanical shock test.
推力測試、板階焊接測試、冷熱循環測試及機械衝擊測試的測試方法如下:The test methods for thrust test, plate-level welding test, hot and cold cycle test and mechanical shock test are as follows:
[[ 推力測試Thrust test ]]
以球徑0.45 mm的實施例或比較例之無鉛無銅錫合金所製得之錫球對球柵陣列(BGA)零件進行植球(零件尺寸為14 mm×14 mm,植球迴焊曲線峰值溫度為240℃)。完成植球後,以推拉力測試機進行焊錫凸塊的推力測試(推刀移動速度為100 μm/s)。每組合金BGA樣本推15顆焊錫凸塊並記錄其推力強度。將15顆焊錫凸塊的推力強度取平均值作為實驗結果。The solder balls made of lead-free and copper-free tin alloys of the embodiment or comparative example with a ball diameter of 0.45 mm were used to implant the ball grid array (BGA) components (component size was 14 mm×14 mm, and the peak temperature of the implant reflow curve was 240°C). After the implantation, the push force test of the solder bump was performed using a push-pull force tester (the pusher moving speed was 100 μm/s). 15 solder bumps were implanted on each group of alloy BGA samples and their push force strength was recorded. The average push force strength of the 15 solder bumps was taken as the experimental result.
判定標準:平均推力強度超過13牛頓則判定為植球焊接性良好並標示為「○」,平均推力強度介於11~13牛頓之間則判定為植球焊接性可接受並標示為「△」,平均推力強度小於11牛頓則判定為植球焊接性不足並標示為「X」。Judgment criteria: If the average thrust strength exceeds 13 Newtons, the ball soldering is judged to be good and marked as "○", if the average thrust strength is between 11 and 13 Newtons, the ball soldering is judged to be acceptable and marked as "△", and if the average thrust strength is less than 11 Newtons, the ball soldering is judged to be insufficient and marked as "X".
[[ 拉伸測試Tensile test ]]
進行實施例或比較例之無鉛無銅錫合金的拉伸測試,拉伸樣本製作及測試方法參照規範ASTM E8進行,拉伸速率為6mm/min,以拉伸測試之伸長率結果比較合金的延展性,本測試中各合金進行三個拉伸樣本的測試,再將所得三個伸長率結果取平均值。The lead-free, copper-free, tin-free alloys of the embodiments or comparative examples were subjected to tensile tests. The tensile specimen preparation and test method were performed in accordance with the ASTM E8 standard. The tensile rate was 6 mm/min. The elongation results of the tensile test were used to compare the ductility of the alloys. In this test, three tensile specimens were tested for each alloy, and the average of the three elongation results was taken.
判定標準:平均伸長率大於25%則判定為合金具備良好延展性並標示為「○」,平均伸長率介於20~25%之間則判定為合金延展性可接受並標示為「△」,平均伸長率小於20%則判定為合金延展性不足並標示為「X」。Judgment criteria: If the average elongation is greater than 25%, the alloy is judged to have good ductility and marked as "○", if the average elongation is between 20~25%, the alloy is judged to have acceptable ductility and marked as "△", and if the average elongation is less than 20%, the alloy is judged to have insufficient ductility and marked as "X".
[[ 板階焊接Plate welding 測試Test ]]
以球徑0.63 mm的實施例或比較例之無鉛無銅錫合金所製得之錫球對球柵陣列(BGA)零件進行植球(零件尺寸為35 mm×35 mm,植球迴焊曲線峰值溫度為250℃)。完成植球後,BGA零件先進行高溫高濕(85℃/85% RH)放置240小時後,再與相對應電路板樣本進行迴焊焊接(迴焊曲線峰值溫度為245℃)。本測試目的是測試實施例或比較例之無鉛無銅錫合金所製得之錫球植球後形成之焊錫凸塊於板階製程的抗氧化能力。高溫高濕製程即用於加速零件上焊錫凸塊的氧化反應。合金抗氧化能力會影響其焊錫凸塊與電路板焊接時的焊接性。若合金抗氧化能力不足而使得焊錫凸塊與電路板焊接時的焊接性不佳則會增加板階製程後發生雙球不良的發生率。The ball grid array (BGA) components were implanted with solder balls made of lead-free copper-free tin alloys of the embodiments or comparative examples with a ball diameter of 0.63 mm (component size was 35 mm×35 mm, and the peak temperature of the implant reflow curve was 250°C). After implantation, the BGA components were placed in high temperature and high humidity (85°C/85% RH) for 240 hours, and then reflowed with the corresponding circuit board samples (the peak temperature of the reflow curve was 245°C). The purpose of this test is to test the oxidation resistance of the solder bumps formed after implantation of the solder balls made of lead-free copper-free tin alloys of the embodiments or comparative examples in the board-level process. The high temperature and high humidity process is used to accelerate the oxidation reaction of the solder bumps on the parts. The oxidation resistance of the alloy will affect the weldability of the solder bumps and the circuit board. If the alloy's oxidation resistance is insufficient, resulting in poor weldability between the solder bumps and the circuit board, the incidence of double ball defects will increase after the board-level process.
本測試針對板階後樣本進行X-ray分析雙球發生比例。判定標準:雙球發生比例小於10%則判定為板階焊接性(即抗氧化能力)良好並標示為「○」,雙球發生比例介於10~20%則判定為板階焊接性(即抗氧化能力)可接受並標示為「△」,雙球發生比例大於20%則判定為板階焊接性(即抗氧化能力)失敗並標示為「X」。This test is to perform X-ray analysis on the double ball occurrence ratio of the sample after the plate is stepped. Judgment standard: if the double ball occurrence ratio is less than 10%, it is judged that the plate step weldability (i.e., anti-oxidation ability) is good and marked as "○", if the double ball occurrence ratio is between 10~20%, it is judged that the plate step weldability (i.e., anti-oxidation ability) is acceptable and marked as "△", and if the double ball occurrence ratio is greater than 20%, it is judged that the plate step weldability (i.e., anti-oxidation ability) fails and is marked as "X".
[[ 冷熱循環測試Hot and cold cycle test ]]
以球徑0.45 mm的實施例或比較例之無鉛無銅錫合金所製得之錫球對球柵陣列(BGA)零件進行植球(零件尺寸為14 mm×14 mm,植球迴焊曲線峰值溫度為250℃)。完成植球後,BGA零件再與相對應電路板樣本進行迴焊焊接(迴焊曲線峰值溫度為245℃),並對完成焊接後的樣本進行冷熱循環測試(測試條件為-40~125℃,升、降溫速率為15℃/min,持溫時間為10分鐘,共進行600循環)。接著,將完成冷熱循環後的樣本進行紅墨水分析。紅墨水分析方法為先將樣本浸泡紅墨水,待墨水乾燥完成後進行零件拔除,最後針對零件拔除後的焊點斷面進行顯微觀察。每個樣本皆對整顆零件共192個焊點進行觀察。各種實施例或比較例之無鉛無銅錫合金錫球分別製作一顆BGA零件的焊接樣本進行紅墨水測試,並各對192個焊點進行斷面觀察。本測試目的是測試實施例或比較例之無鉛無銅錫合金錫球焊點及焊點與銅基材接合結構之熱疲勞抗性。若合金焊點本身及對銅基材接合結構的熱疲勞抗性不足,則會導致焊點或接合結構於反覆冷熱循環應力下產生熱疲勞破壞,進而影響焊點可靠度。本測試對冷熱循環後的樣本進行紅墨水分析,若焊點於冷熱循環測試過程中產生缺陷或斷裂,則紅墨水測試後焊點斷面會產生染墨現象。焊點斷面發生染墨的程度及數量即代表焊點及接合結構的發生破壞的程度及數量,因而可藉由比較不同樣本焊點染墨的狀況評判焊點及接合結構的熱疲勞抗性。The ball grid array (BGA) parts were implanted with tin balls made of lead-free and copper-free tin alloys of the embodiment or comparative example with a ball diameter of 0.45 mm (part size was 14 mm×14 mm, and the peak temperature of the implant reflow curve was 250°C). After implantation, the BGA parts were reflowed with the corresponding circuit board samples (the peak temperature of the reflow curve was 245°C), and the samples after welding were subjected to a hot and cold cycle test (the test conditions were -40~125°C, the heating and cooling rates were 15°C/min, the temperature holding time was 10 minutes, and a total of 600 cycles were performed). Then, the samples after the hot and cold cycle were subjected to red ink analysis. The red ink analysis method is to soak the sample in red ink first, remove the part after the ink is dried, and finally perform microscopic observation on the cross section of the solder joint after the part is removed. Each sample is observed for a total of 192 solder joints of the entire part. A BGA part welding sample is made of each lead-free and copper-free tin alloy tin ball in each embodiment or comparative example for red ink test, and each 192 solder joints are observed in cross section. The purpose of this test is to test the thermal fatigue resistance of the lead-free and copper-free tin alloy tin ball solder joints and the solder joint and copper substrate bonding structure of the embodiment or comparative example. If the alloy solder joint itself and the copper substrate bonding structure have insufficient thermal fatigue resistance, the solder joint or bonding structure will be damaged by thermal fatigue under repeated hot and cold cycle stress, thus affecting the reliability of the solder joint. This test performs red ink analysis on the samples after hot and cold cycle. If the solder joint has defects or fractures during the hot and cold cycle test, the cross section of the solder joint will be stained with ink after the red ink test. The degree and amount of ink staining on the cross section of the solder joint represents the degree and amount of damage to the solder joint and bonding structure. Therefore, the thermal fatigue resistance of the solder joint and bonding structure can be judged by comparing the ink staining of different sample solder joints.
判定標準:所有焊點染墨面積皆未超過斷面面積的50%則判定為合金焊點及接合結構的熱疲勞抗性良好並標示為「○」,染墨面積超過50%的焊點數量小於10顆則判定為合金焊點及接合結構的熱疲勞抗性可接受並標示為「△」,染墨面積超過50%的焊點數量為10顆以上則判定為合金焊點及接合結構的熱疲勞抗性不佳並標示為「X」。Judgment standard: If the ink-stained area of all solder joints does not exceed 50% of the cross-sectional area, the thermal fatigue resistance of the alloy solder joints and the joint structure is judged to be good and marked as "○". If the number of solder joints with ink-stained area exceeding 50% is less than 10, the thermal fatigue resistance of the alloy solder joints and the joint structure is judged to be acceptable and marked as "△". If the number of solder joints with ink-stained area exceeding 50% is more than 10, the thermal fatigue resistance of the alloy solder joints and the joint structure is judged to be poor and marked as "X".
[[ 機械衝擊測試Mechanical shock test ]]
以球徑0.45 mm的實施例或比較例之無鉛無銅錫合金所製得之錫球對球柵陣列(BGA)零件進行植球(零件尺寸為14 mm×14 mm,植球迴焊曲線峰值溫度為250℃)。完成植球後,BGA零件再與相對應電路板樣本進行迴焊焊接(迴焊曲線峰值溫度為245℃),並對完成焊接後樣本進行機械衝擊測試(測試條件為1500 g加速度,0.5 ms衝擊停留時間,共進行50次衝擊)。接著,將完成機械衝擊測試後的樣本進行紅墨水分析。紅墨水分析方法為先將樣本浸泡紅墨水,待墨水乾燥完成後進行零件拔除,最後針對零件拔除後的焊點斷面進行顯微觀察,每個樣本皆對整顆零件共192個焊點進行觀察。各種實施例或比較例之無鉛無銅錫合金錫球分別製作一顆BGA零件的焊接樣本進行紅墨水測試,並各對192個焊點進行斷面觀察。本測試目的是測試實施例或比較例之無鉛無銅錫合金錫球植球後所形成之焊錫凸塊焊點以及凸塊焊點與銅基材接合結構之抗機械衝擊能力。若合金焊點本身及對銅基材接合結構的抗機械衝擊能力不足,則會導致焊點或接合結構無法承受機械衝擊力而產生破壞,進而影響焊點可靠度。本測試對機械衝擊測試後的樣本進行紅墨水分析,若焊點於機械衝擊測試過程中產生缺陷或斷裂,則紅墨水測試後焊點斷面會產生染墨現象。焊點斷面發生染墨的程度及數量即代表焊點及接合結構的發生破壞的程度及數量,因而可藉由比較不同樣本焊點染墨的狀況評判焊點及接合結構的抗機械衝擊能力。The ball grid array (BGA) component is implanted with a tin ball made of a lead-free copper-free tin alloy of the embodiment or comparative example with a ball diameter of 0.45 mm (component size is 14 mm×14 mm, and the peak temperature of the implant reflow curve is 250°C). After the implantation, the BGA component is reflowed with the corresponding circuit board sample (the peak temperature of the reflow curve is 245°C), and the sample after the welding is subjected to a mechanical shock test (the test conditions are 1500 g acceleration, 0.5 ms shock dwell time, and a total of 50 shocks). Then, the sample after the mechanical shock test is subjected to red ink analysis. The red ink analysis method is to soak the sample in red ink first, remove the part after the ink is dried, and finally perform microscopic observation on the cross section of the solder joint after the part is removed. Each sample is observed for a total of 192 solder joints of the entire part. The lead-free and copper-free tin alloy tin balls of various embodiments or comparative examples are used to make a welding sample of a BGA part for red ink testing, and each 192 solder joints are observed in cross section. The purpose of this test is to test the mechanical impact resistance of the solder bumps formed after the lead-free and copper-free tin alloy tin balls of the embodiments or comparative examples are implanted, and the bumps and copper substrate bonding structures. If the alloy solder joint itself and the copper substrate bonding structure are not able to resist mechanical shock, the solder joint or bonding structure will not be able to withstand the mechanical shock force and will be damaged, thus affecting the reliability of the solder joint. This test performs red ink analysis on the samples after the mechanical shock test. If the solder joint has defects or fractures during the mechanical shock test, the cross section of the solder joint will be stained with ink after the red ink test. The degree and amount of ink staining on the cross section of the solder joint represents the degree and amount of damage to the solder joint and bonding structure. Therefore, the mechanical shock resistance of the solder joint and bonding structure can be judged by comparing the ink staining of different sample solder joints.
判定標準:所有焊點染墨面積皆未超過斷面面積的50%則判定為合金焊點及接合結構的抗機械衝擊能力良好並標示為「○」,染墨面積超過50%的焊點數量小於10顆則判定為合金焊點及接合結構的抗機械衝擊能力可接受並標示為「△」,染墨面積超過50%的焊點數量為10顆以上則判定為合金焊點及接合結構的抗機械衝擊能力不佳並標示為「X」。Judgment standard: If the ink-stained area of all solder joints does not exceed 50% of the cross-sectional area, the mechanical impact resistance of the alloy solder joints and the bonding structure is judged to be good and marked as "○". If the number of solder joints with an ink-stained area exceeding 50% is less than 10, the mechanical impact resistance of the alloy solder joints and the bonding structure is judged to be acceptable and marked as "△". If the number of solder joints with an ink-stained area exceeding 50% is more than 10, the mechanical impact resistance of the alloy solder joints and the bonding structure is judged to be poor and marked as "X".
針對圖1至4的說明如下:圖1的相片為比較例1所形成雙球不良焊點的切片,圖2的相片為實施例1所形成正常焊點的切片,圖3的相片為比較例1所形成焊點的染墨面積超過斷面面積的50%之觀察結果,圖4的相片則為實施例1所形成焊點的染墨面積未超過斷面面積的50%之觀察結果。The explanations for Figures 1 to 4 are as follows: the photograph of Figure 1 is a cross-section of a double-ball defective solder joint formed in Comparative Example 1, the photograph of Figure 2 is a cross-section of a normal solder joint formed in Example 1, the photograph of Figure 3 is an observation result that the ink-stained area of the solder joint formed in Comparative Example 1 exceeds 50% of the cross-sectional area, and the photograph of Figure 4 is an observation result that the ink-stained area of the solder joint formed in Example 1 does not exceed 50% of the cross-sectional area.
另外說明的是,將同一實施例或同一比較例進行前述推力測試、板階焊接測試、冷熱循環測試及機械衝擊測試的四個測試,如果測試結果中出現任一個「X」,則於表1中「整體評核結果」欄位標示為「X」,代表此實施例或比較例不符合本發明的要求;如果測試結果中出現任一個「△」,則於表1中「整體評核結果」欄位標示為「△」,代表此實施例或比較例符合本發明的要求;如果三個測試結果中皆出現「○」,則於表1中「整體評核結果」欄位標示為「○」,代表此實施例不僅符合本發明的要求且為最佳實施例。It is also noted that when the same embodiment or the same comparative example is subjected to the aforementioned four tests of thrust test, plate-level welding test, hot and cold cycle test and mechanical impact test, if any "X" appears in the test results, the "overall evaluation result" column in Table 1 is marked as "X", indicating that this embodiment or comparative example does not meet the requirements of the present invention; if any "△" appears in the test results, the "overall evaluation result" column in Table 1 is marked as "△", indicating that this embodiment or comparative example meets the requirements of the present invention; if "○" appears in all three test results, the "overall evaluation result" column in Table 1 is marked as "○", indicating that this embodiment not only meets the requirements of the present invention but is also the best embodiment.
<< 合金性質測試結果與討論Alloy property test results and discussion >>
以下分別依據不同的銀含量、不同的鉍含量、不同的銻含量、不同的鎳含量、不同的鍺含量,以及不同的銅含量所得的結果分別進行討論。 The following discusses the results obtained based on different silver contents, different bismuth contents, different antimony contents, different nickel contents, different germanium contents, and different copper contents.
[ 不同銀含量 ]表2(節錄自表1)
由表2可知,銀之重量百分比會影響拉伸測試結果(即合金延展性)、合金焊點及接合結構的熱疲勞抗性(即冷熱循環可靠度)與抗機械衝擊能力(即機械衝擊可靠度)。過低的銀之重量百分比會使得無鉛無銅錫合金無法通過冷熱循環測試。過高的銀之重量百分會使得無鉛無銅錫合金無法通過拉伸測試與機械衝擊測試。As shown in Table 2, the weight percentage of silver will affect the tensile test results (i.e., alloy ductility), the thermal fatigue resistance (i.e., thermal cycling reliability) and mechanical shock resistance (i.e., mechanical shock reliability) of the alloy solder joints and joint structures. Too low a weight percentage of silver will make the lead-free copper-free tin alloy fail to pass the thermal cycling test. Too high a weight percentage of silver will make the lead-free copper-free tin alloy fail to pass the tensile test and mechanical shock test.
比較例1不含銀,其冷熱循環測試標示為「X」,表示過低重量百分比(小於0.01 wt%)的銀會導致合金的冷熱循環可靠度不佳;比較例2採用4.0 wt%的銀,其拉伸測試與機械衝擊測試標示為「X」,表示過量重量百分比(大於3.0 wt%)的銀會導致合金的延展性與機械衝擊可靠度不佳;實施例2採用0.01 wt%的銀、實施例1採用2.0 wt%的銀、實施例3採用3.0 wt%的銀,其於表2「整體評核結果」欄位皆標示為「△」或「○」,代表無鉛無銅錫合金中包含0.01~3.0 wt%的銀能符合本發明的要求。Comparative Example 1 does not contain silver, and its thermal cycling test is marked with "X", indicating that too low a weight percentage of silver (less than 0.01 wt%) will result in poor thermal cycling reliability of the alloy; Comparative Example 2 uses 4.0 wt% of silver, and its tensile test and mechanical shock test are marked with "X", indicating that excessive weight percentage of silver (greater than 3.0 wt%) will result in poor ductility and mechanical shock reliability of the alloy; Example 2 uses 0.01 wt% of silver, Example 1 uses 2.0 wt% of silver, and Example 3 uses 3.0 wt% of silver, and they are all marked with "△" or "○" in the "Overall Evaluation Result" column of Table 2, indicating that the lead-free and copper-free tin alloy contains 0.01~3.0 wt% of silver. wt% of silver can meet the requirements of the present invention.
[ 不同鉍含量 ]表3(節錄自表1)
由表3可知,鉍之重量百分比會影響合金的拉伸測試結果(即合金延展性)、合金焊點及接合結構的熱疲勞抗性(即冷熱循環可靠度)與抗機械衝擊能力(即機械衝擊可靠度)。過低的鉍之重量百分比會使得無鉛無銅錫合金無法通過冷熱循環測試。過高的鉍之重量百分會使得無鉛無銅錫合金無法通過拉伸測試與機械衝擊測試。As shown in Table 3, the weight percentage of bismuth will affect the tensile test results of the alloy (i.e., alloy ductility), the thermal fatigue resistance of the alloy solder joints and the bonding structure (i.e., thermal cycling reliability), and the mechanical shock resistance (i.e., mechanical shock reliability). Too low a weight percentage of bismuth will cause the lead-free, copper-free, tin alloy to fail the thermal cycling test. Too high a weight percentage of bismuth will cause the lead-free, copper-free, tin alloy to fail the tensile test and mechanical shock test.
比較例3不含鉍,其冷熱循環測試標示為「X」,表示過低重量百分比(小於0.01 wt%)的鉍會導致合金的冷熱循環可靠度不佳;比較例4採用6.0 wt%的鉍,其拉伸測試與機械衝擊測試標示為「X」,表示過量重量百分比(大於5.0 wt%)的鉍會導致合金的延展性與機械衝擊可靠度不佳;實施例4採用0.01 wt%的鉍、實施例1採用2.5 wt%的鉍、實施例5採用5.0 wt%的鉍,其於表3「整體評核結果」欄位皆標示為「△」或「○」,代表無鉛無銅錫合金中包含0.01~5.0 wt%的鉍能符合本發明的要求。Comparative Example 3 does not contain bismuth, and its thermal cycle test is marked as "X", indicating that too low a weight percentage of bismuth (less than 0.01 wt%) will result in poor thermal cycle reliability of the alloy; Comparative Example 4 uses 6.0 wt% of bismuth, and its tensile test and mechanical impact test are marked as "X", indicating that excessive weight percentage of bismuth (greater than 5.0 wt%) will result in poor ductility and mechanical impact reliability of the alloy; Example 4 uses 0.01 wt% of bismuth, Example 1 uses 2.5 wt% of bismuth, and Example 5 uses 5.0 wt% of bismuth, which are all marked as "△" or "○" in the "Overall Evaluation Result" column of Table 3, indicating that the lead-free, copper-free, and tin-free alloy contains 0.01~5.0 wt% of bismuth. wt% of bismuth can meet the requirements of the present invention.
[ 不同銻含量 ]表4(節錄自表1)
由表4可知,銻之重量百分比會影響推力測試結果(即焊接性)、拉伸測試結果(即合金延展性)、焊點及接合結構的熱疲勞抗性(即冷熱循環可靠度)與抗機械衝擊能力(即機械衝擊可靠度)。較低的銻之重量百分比會使得無鉛無銅錫合金在冷熱循環測試中表現可接受。過高的銻之重量百分會使得無鉛無銅錫合金無法通過推力測試、拉伸測試與機械衝擊測試。As shown in Table 4, the weight percentage of antimony affects the thrust test results (i.e. weldability), tensile test results (i.e. alloy ductility), thermal fatigue resistance of solder joints and joint structures (i.e. thermal cycle reliability) and mechanical shock resistance (i.e. mechanical shock reliability). A lower weight percentage of antimony will make the lead-free copper-free tin alloy perform acceptable in the thermal cycle test. Too high a weight percentage of antimony will make the lead-free copper-free tin alloy fail the thrust test, tensile test and mechanical shock test.
比較例5採用3.0 wt%的銻,其推力測試、拉伸測試與機械衝擊測試標示為「X」,表示過量重量百分比(大於2.0 wt%)的銻會導致合金的焊接性、延展性與機械衝擊可靠度不佳;實施例6採用0 wt%的銻、實施例1採用1.0 wt%的銻、實施例7採用2.0 wt%的銻,其於表4「整體評核結果」欄位皆標示為「△」或「○」,代表無鉛無銅錫合金中包含0~2.0 wt%的銻能符合本發明的要求。Comparative Example 5 uses 3.0 wt% antimony, and its thrust test, tensile test and mechanical impact test are marked as "X", indicating that excessive weight percentage (greater than 2.0 wt%) of antimony will lead to poor weldability, ductility and mechanical impact reliability of the alloy; Example 6 uses 0 wt% antimony, Example 1 uses 1.0 wt% antimony, and Example 7 uses 2.0 wt% antimony, and they are all marked as "△" or "○" in the "Overall Evaluation Result" column of Table 4, indicating that the lead-free copper-free tin alloy containing 0~2.0 wt% antimony can meet the requirements of the present invention.
[ 不同鎳 含量 ]表5(節錄自表1)
由表5可知,鎳之重量百分比會影響合金焊點及接合結構的熱疲勞抗性(即冷熱循環可靠度)與抗機械衝擊能力(即機械衝擊可靠度)。過低的鎳之重量百分比會使得無鉛無銅錫合金無法通過冷熱循環測試。過高的鎳之重量百分會使得無鉛無銅錫合金無法通過機械衝擊測試。As shown in Table 5, the weight percentage of nickel affects the thermal fatigue resistance (i.e., thermal cycling reliability) and mechanical shock resistance (i.e., mechanical shock reliability) of the alloy solder joint and the joint structure. Too low a weight percentage of nickel will make the lead-free copper-free tin alloy fail to pass the thermal cycling test. Too high a weight percentage of nickel will make the lead-free copper-free tin alloy fail to pass the mechanical shock test.
比較例6不含鎳,其冷熱循環測試標示為「X」,表示過低重量百分比(小於0.005 wt%)的鎳會導致合金的冷熱循環可靠度不佳;比較例7採用0.2 wt%的鎳,其機械衝擊測試標示為「X」,表示過量重量百分比(大於0.1 wt%)的鎳會導致合金的機械衝擊可靠度不佳;實施例8採用0.005 wt%的鎳、實施例1採用0.05 wt%的鎳、實施例9採用0.1 wt%的鎳,其於表5「整體評核結果」欄位皆標示為「△」或「○」,代表無鉛無銅錫合金中包含0.005~3.1 wt%的鎳能符合本發明的要求。Comparative Example 6 does not contain nickel, and its thermal cycle test is marked as "X", indicating that too low a nickel percentage (less than 0.005 wt%) will result in poor thermal cycle reliability of the alloy; Comparative Example 7 uses 0.2 wt% nickel, and its mechanical shock test is marked as "X", indicating that excessive nickel percentage (greater than 0.1 wt%) will result in poor mechanical shock reliability of the alloy; Example 8 uses 0.005 wt% nickel, Example 1 uses 0.05 wt% nickel, and Example 9 uses 0.1 wt% nickel, and they are all marked as "△" or "○" in the "Overall Evaluation Result" column of Table 5, indicating that the lead-free and copper-free tin alloy contains 0.005~3.1 wt% nickel can meet the requirements of the present invention.
[ 不同鍺含量 ]表6(節錄自表1)
由表6可知,鍺之重量百分比會影響合金的推力測試結果(即焊接性)與板階焊接測試結果(即抗氧化能力)。過低的鍺之重量百分比會使得無鉛無銅錫合金無法通過板階焊接測試。過高的鍺之重量百分會使得無鉛無銅錫合金無法通過推力測試。As shown in Table 6, the weight percentage of germanium affects the thrust test results (i.e., weldability) and plate-level welding test results (i.e., oxidation resistance) of the alloy. Too low a weight percentage of germanium will cause the lead-free copper-free tin alloy to fail the plate-level welding test. Too high a weight percentage of germanium will cause the lead-free copper-free tin alloy to fail the thrust test.
比較例8不含鍺,其板階焊接環測試標示為「X」,表示過低重量百分比(小於0.005 wt%)的鍺會導致合金的抗氧化能力不佳;比較例9採用0.05 wt%的鍺,其推力測試標示為「X」,表示過量重量百分比(大於0.02 wt%)的鍺會導致合金的焊接性不佳;實施例10採用0.005 wt%的鍺、實施例1採用0.01 wt%的鍺、實施例11採用0.02 wt%的鍺,其於表6「整體評核結果」欄位皆標示為「△」或「○」,代表無鉛無銅錫合金中包含0.005~0.02 wt%的鍺能符合本發明的要求。Comparative Example 8 does not contain germanium, and its plate-level welding ring test is marked with "X", indicating that too low a weight percentage (less than 0.005 wt%) of germanium will result in poor oxidation resistance of the alloy; Comparative Example 9 uses 0.05 wt% of germanium, and its thrust test is marked with "X", indicating that excessive weight percentage (greater than 0.02 wt%) of germanium will result in poor weldability of the alloy; Example 10 uses 0.005 wt% of germanium, Example 1 uses 0.01 wt% of germanium, and Example 11 uses 0.02 wt% of germanium, and they are all marked with "△" or "○" in the "Overall Evaluation Result" column of Table 6, indicating that the lead-free copper-free tin alloy containing 0.005~0.02 wt% of germanium can meet the requirements of the present invention.
[[ 總結Summary ]]
根據前述的結果與討論可知,實施例1~11的無鉛無銅錫合金之「整體評核結果」欄位皆標示為「△」或「○」,表示其同時能通過推力測試、板階焊接測試、冷熱循環測試及機械衝擊測試,說明若以本發明的無鉛無銅錫合金(實施例1~11)製成用於球柵陣列(BGA)封裝之錫球,該無鉛無銅錫合金經焊接後所得的結構(例如焊錫凸塊)會具備優異的機械衝擊可靠度,同時擁有良好的焊接性、延展性、抗氧化能力及冷熱循環可靠度。According to the above results and discussions, the "Overall Evaluation Result" column of the lead-free copper-free tin alloys of Examples 1 to 11 is marked as "△" or "○", indicating that they can pass the thrust test, board-level welding test, thermal cycling test and mechanical shock test at the same time. This shows that if the lead-free copper-free tin alloy (Examples 1 to 11) of the present invention is used to make solder balls for ball grid array (BGA) packaging, the structure (such as solder bump) obtained after the lead-free copper-free tin alloy is welded will have excellent mechanical shock reliability, and at the same time have good weldability, ductility, oxidation resistance and thermal cycling reliability.
綜上所述,由於本發明的無鉛無銅錫合金同時包含0.01~3.0 wt%的銀、0.01~5.0 wt%的鉍、0~2.0 wt%的銻、0.005~0.1 wt%的鎳、0.005~0.02 wt%的鍺及餘量的錫。因此,本發明的無鉛無銅錫合金能製成用於球柵陣列(BGA)封裝之錫球,且該無鉛無銅錫合金經焊接後所得的結構(例如焊錫凸塊)會具備優異的機械衝擊可靠度,同時擁有良好的焊接性、延展性、抗氧化能力及冷熱循環可靠度,故確實能達成本發明之目的。In summary, the lead-free copper-free tin alloy of the present invention contains 0.01-3.0 wt% of silver, 0.01-5.0 wt% of bismuth, 0-2.0 wt% of antimony, 0.005-0.1 wt% of nickel, 0.005-0.02 wt% of germanium and the remainder of tin. Therefore, the lead-free and copper-free tin alloy of the present invention can be made into tin balls for ball grid array (BGA) packaging, and the structure obtained by welding the lead-free and copper-free tin alloy (such as solder bump) will have excellent mechanical shock reliability, and at the same time have good weldability, ductility, oxidation resistance and thermal cycle reliability, so the purpose of the present invention can be achieved.
惟以上所述者,僅為本發明之實施例而已,當不能以此限定本發明實施之範圍,凡是依本發明申請專利範圍及專利說明書內容所作之簡單的等效變化與修飾,皆仍屬本發明專利涵蓋之範圍內。However, the above is only an example of the implementation of the present invention, and it should not be used to limit the scope of the implementation of the present invention. All simple equivalent changes and modifications made according to the scope of the patent application of the present invention and the content of the patent specification are still within the scope of the patent of the present invention.
本發明之其他的特徵及功效,將於參照圖式的實施方式中清楚地呈現,其中: 圖1是一相片,說明比較例1所形成雙球不良焊點的切片; 圖2是一相片,說明實施例1所形成正常焊點的切片; 圖3是一相片,說明比較例1所形成焊點的染墨面積超過斷面面積的50%之觀察結果;及 圖4是一相片,說明實施例1所形成焊點的染墨面積未超過斷面面積的50%之觀察結果。 Other features and effects of the present invention will be clearly presented in the embodiments with reference to the drawings, wherein: FIG. 1 is a photograph illustrating a cross section of a double ball defective solder joint formed in Comparative Example 1; FIG. 2 is a photograph illustrating a cross section of a normal solder joint formed in Example 1; FIG. 3 is a photograph illustrating the observation result that the ink-stained area of the solder joint formed in Comparative Example 1 exceeds 50% of the cross-sectional area; and FIG. 4 is a photograph illustrating the observation result that the ink-stained area of the solder joint formed in Example 1 does not exceed 50% of the cross-sectional area.
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| TW202035726A (en) * | 2019-03-27 | 2020-10-01 | 日商千住金屬工業股份有限公司 | Welding alloys, welding balls, welding preforms, welding pastes and welding joints |
| TWI714420B (en) * | 2020-01-06 | 2020-12-21 | 昇貿科技股份有限公司 | Lead-free copper-free tin alloy and tin balls for ball grid array packaging |
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| TW202035726A (en) * | 2019-03-27 | 2020-10-01 | 日商千住金屬工業股份有限公司 | Welding alloys, welding balls, welding preforms, welding pastes and welding joints |
| TWI714420B (en) * | 2020-01-06 | 2020-12-21 | 昇貿科技股份有限公司 | Lead-free copper-free tin alloy and tin balls for ball grid array packaging |
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