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TWI868192B - Reduced resistivity traces in multilayered printed circuit boards and methods of forming - Google Patents

Reduced resistivity traces in multilayered printed circuit boards and methods of forming Download PDF

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TWI868192B
TWI868192B TW109127104A TW109127104A TWI868192B TW I868192 B TWI868192 B TW I868192B TW 109127104 A TW109127104 A TW 109127104A TW 109127104 A TW109127104 A TW 109127104A TW I868192 B TWI868192 B TW I868192B
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TW202207773A (en
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亞維蘭 伊恩科維奇
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以色列商納米尺寸技術領域股份有限公司
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Abstract

The disclosure relates to methods for forming multilayered printed circuit boards (PCBs), flexible printed circuits (FPCs) and high-density interconnect (HDI) printed circuits and methods of forming these. Specifically, the disclosure relates to methods for direct inkjet printing of traces having predetermined resistivity for use in multilayered printed circuit boards (PCBs), flexible printed circuits (FPCs) and high-density interconnect (HDI) printed circuits, by printing intermediate traces coupled to the external trace with a plurality of blind and/or buried vias.

Description

多層印刷電路板中電阻率減小之跡線及形成方法Traces with reduced resistivity in multi-layer printed circuit boards and methods of forming the same

本揭示案係關於用於形成多層印刷電路板(PCB)、可撓性印刷電路(FPC)及高密度互連(HDI)印刷電路(統稱為經積層製造之電子裝置(AME))之方法,及形成此等AME之方法。具體言之,本揭示案係關於用於噴墨列印具有預定電阻率之跡線以用於多層印刷電路板(PCB)、可撓性印刷電路(FPC)及高密度互連(HDI)印刷電路中的方法。The present disclosure relates to methods for forming multi-layer printed circuit boards (PCBs), flexible printed circuits (FPCs), and high density interconnect (HDI) printed circuits, collectively referred to as multi-layer fabricated electronic devices (AMEs), and methods for forming such AMEs. Specifically, the present disclosure relates to methods for inkjet printing traces having a predetermined resistivity for use in multi-layer printed circuit boards (PCBs), flexible printed circuits (FPCs), and high density interconnect (HDI) printed circuits.

諸如中央處理單元(CPU)及圖形處理單元(GPU)以及電力供應單元(PSU)之高功率電子組件在操作期間會產生大量熱。為了例如藉由在嚴格封裝約束下超頻(overclocking)(換言之,將時鐘頻率增大至高於製造商所使用之標準頻率)而增加計算效能,此等組件中之許多會產生額外的熱,而所提供之冷卻系統(例如,冷卻風扇)無法充分耗散此額外的熱。High-power electronic components such as central processing units (CPUs) and graphics processing units (GPUs) as well as power supply units (PSUs) generate a lot of heat during operation. In order to increase computing performance, for example by overclocking (in other words, increasing the clock frequency above the standard frequency used by the manufacturer) within strict packaging constraints, many of these components generate additional heat that the provided cooling systems (e.g., cooling fans) cannot adequately dissipate.

另外,在例如所有以下領域中愈來愈需要具有小形狀因數之電子裝置:製造業、商業、消費品、軍事、航空、物聯網等。具有此等較小形狀因數之產品依賴於具有極靠近地置放於外表面上、緊密間隔開之數位及類比電路的緊湊PCB。裝置複雜性增加亦可能引起PCB層數顯著增加,以考慮例如增加之功能性要求以及對較小覆蓋區及形狀因數之需求,諸如行動通信裝置及計算裝置中之彼等要求。Additionally, there is an increasing need for electronic devices with small form factors in all of the following fields, such as: manufacturing, commercial, consumer, military, aviation, Internet of Things, etc. Products with these smaller form factors rely on compact PCBs with closely spaced digital and analog circuits placed very closely on the outer surface. Increased device complexity may also cause the number of PCB layers to increase significantly to account for, for example, increased functionality requirements and the need for smaller footprints and form factors, such as those required in mobile communication devices and computing devices.

此外,由於大小不斷縮小且以進階封裝及晶片尺度封裝(CSP)進行封裝之主動裝置增加了複雜性及與小形狀因數之PCB相關聯的問題,因此OEM需要較少「寄生」或「洩放(bleeding)」互連,及與此等(小形狀因數)設計相關聯之較佳良率。所有此等要求需要使此等主動裝置之間的連接長度最小化,而不損害電阻率以及對操作期間各種溫度變化之穩健性。Furthermore, as active devices continue to shrink in size and packaged in advanced packages and chip scale packages (CSPs) increase the complexity and problems associated with small form factor PCBs, OEMs require fewer "parasitic" or "bleeding" interconnects and better yields associated with these (small form factor) designs. All of these requirements require minimizing the connection length between these active devices without compromising resistivity and robustness to various temperature changes during operation.

以下揭示內容解決了此等缺點。The following disclosure solves these shortcomings.

在各種例示性實施中,揭示了用於共同地形成多層印刷電路板(PCB)、可撓性印刷電路(FPC)及高密度互連(HDI)印刷電路(可能與額外積體電路一起,統稱為經積層製造之電子裝置(AME))之方法及系統以及形成此等AME之方法。具體言之,本揭示案係關於用於噴墨列印具有預定電阻率之跡線以用於多層AME的方法。In various exemplary implementations, methods and systems for collectively forming multi-layer printed circuit boards (PCBs), flexible printed circuits (FPCs), and high density interconnect (HDI) printed circuits (possibly together with additional integrated circuits, collectively referred to as interlayer fabricated electronic devices (AMEs)) and methods of forming such AMEs are disclosed. Specifically, the disclosure relates to methods for inkjet printing traces having a predetermined resistivity for use in multi-layer AMEs.

在一例示性實施中,本文中提供一種減小一多層經積層製造之電子裝置(AME)中之至少兩個已連接組件之間的跡線電阻率之方法,其包含:在一中間層上形成至少一個跡線,藉此形成一中間跡線;形成一跡線,其經大小設定且經組態以在以下中之至少一者上可操作地耦接至少兩個組件:該多層AME之一外部頂端層及外部基底層,藉此形成至少一個外部跡線;及形成一預定數目個以下中之至少一者:一盲通孔(blind via)及一埋通孔(buried via),該預定數目個通孔經大小設定且經組態以電耦接該多層AME之至少一個中間跡線及一對應外部跡線。In an exemplary implementation, a method of reducing trace resistivity between at least two connected components in a multi-layered electronic device (AME) is provided herein, comprising: forming at least one trace on an intermediate layer, thereby forming an intermediate trace; forming a trace sized and configured to operably couple at least two components on at least one of: an external top layer and an external base layer of the multi-layered AME, thereby forming at least one external trace; and forming a predetermined number of at least one of: a blind via and a buried via, the predetermined number of vias sized and configured to electrically couple at least one intermediate trace and a corresponding external trace of the multi-layered AME.

在另一實施例中,本文中提供一種多層AME,其包含:至少一個中間跡線,其在一中間層上;一外部跡線,其經大小設定且經組態以在以下中之至少一者上可操作地耦接至少兩個組件:該多層AME之一外部頂端層及一外部基底層;及一預定數目個以下中之至少一者:一盲通孔及一埋通孔,該盲通孔及該埋通孔電耦接該至少一個中間跡線及該外部跡線。In another embodiment, a multi-layer AME is provided herein, comprising: at least one intermediate trace on an intermediate layer; an external trace sized and configured to operably couple at least two components on at least one of: an external top layer and an external base layer of the multi-layer AME; and at least one of a predetermined number of: a blind via and a buried via, the blind via and the buried via electrically coupling the at least one intermediate trace and the external trace.

在又一實施例中,本文中提供一種使用噴墨印表機來製造一多層印刷電路板(PCB)中之至少兩個已連接組件之間電阻率減小之一跡線的電腦化方法,其包含:提供一噴墨列印系統,其包含:一第一列印頭,其可操作以分配一介電油墨組合物;一第二列印頭,其可操作以分配一導電油墨組合物;一輸送機,其可操作地耦接至該第一列印頭及該第二列印頭,該輸送機經組態以將一基板輸送至該第一列印頭及該第二列印頭中之每一者;及一電腦輔助製造(「CAM」)模組,其包括一中心處理模組(CPM),該CAM與該第一列印頭及該第二列印頭中之每一者通信,其中該CPM進一步包含:至少一個處理器,其與一非暫時性儲存媒體通信,儲存於該非暫時性儲存媒體上之一組可執行指令經組態以在經執行時使該CPM執行以下步驟:接收表示具有電阻率減小之跡線之多層AME的一3D可視化檔案;及產生具有複數個檔案之一檔案庫,每一檔案表示用於列印LPF之一實質上2D層且一元檔案至少表示列印次序;其中該CAM模組經組態以控制該輸送機、該第一列印頭及該第二列印頭中之每一者;提供該介電油墨組合物及該導電油墨組合物;使用該CAM模組,自該庫獲得表示用於列印具有該等電阻率減小之跡線之該多層AME之第一層的一第一檔案,該第一檔案包含表示以下中之至少一者之一圖案的列印指令:該介電油墨及該導電油墨;使用該第一列印頭,形成對應於該介電油墨之該圖案;使用電磁輻射源,固化對應於該多層PCB之該2D層中之介電油墨表示的該圖案;使用該第二列印頭,形成對應於該導電油墨之該圖案;利用熱來燒結對應於該導電油墨之該圖案;使用該CAM模組,自該庫獲得表示用於列印具有該等電阻率減小之跡線之該多層AME之一後續層的一後續檔案,該後續檔案包含表示以下中之至少一者之一圖案的列印指令:該介電油墨及該導電油墨;重複以下步驟:使用該第一列印頭,形成對應於該介電油墨之該圖案,直至使用該CAM模組自2D檔案庫獲得後續實質上2D層的步驟,其中在最終實質上2D層中燒結導電油墨圖案後,該多層AME經組態以包含:至少一個中間跡線,其在一中間層上;至少一個外部跡線,其經大小設定且經組態以在以下中之至少一者上可操作地耦接至少兩個組件:該多層AME之一外部頂端層及外部基底層;及一預定數目個以下中之至少一者:一盲通孔及一埋通孔,該盲通孔及該埋通孔電耦接該至少一個中間跡線與該外部跡線;及移除該基板。In yet another embodiment, a computerized method for using an inkjet printer to fabricate a trace with reduced resistivity between at least two connected components in a multi-layer printed circuit board (PCB) is provided herein, comprising: providing an inkjet printing system, comprising: a first print head operable to dispense a dielectric ink composition; a second print head operable to dispense a conductive ink composition; a conveyor operably coupled to the first print head and the second print head, the conveyor configured to transport a substrate to each of the first print head and the second print head; and a computer-aided manufacturing ("CAM") module including a central processing module (CPM), the CAM being coupled to one of the first print head and the second print head. each, wherein the CPM further comprises: at least one processor in communication with a non-transitory storage medium, a set of executable instructions stored on the non-transitory storage medium being configured to cause the CPM to perform the following steps when executed: receiving a 3D visualization file representing multiple layers of AME having traces with reduced resistivity; and generating a file library having a plurality of files, each file representing a substantially 2D layer for printing LPF and a meta file representing at least a printing order; wherein the CAM module is configured to control each of the conveyor, the first print head and the second print head; providing the dielectric ink composition and the conductive ink composition; using the CAM module, obtaining from the library a file representing a plurality of layers of AME having traces with reduced resistivity; and A first file of a first layer of the multi-layer AME having traces with reduced resistivity, the first file comprising print instructions representing a pattern of at least one of the following: the dielectric ink and the conductive ink; using the first print head to form the pattern corresponding to the dielectric ink; using an electromagnetic radiation source to cure the pattern represented by the dielectric ink in the 2D layer corresponding to the multi-layer PCB; using the second print head to form the pattern corresponding to the conductive ink; using heat to sinter the pattern corresponding to the conductive ink; using the CAM module, obtaining from the library a subsequent file representing a subsequent layer of the multi-layer AME having traces with reduced resistivity, the subsequent file comprising print instructions representing a pattern of at least one of the following: the dielectric ink and the conductive ink; The method comprises the steps of: forming a first print head and a second ...

當結合圖式及實例閱讀時,用於在多層印刷電路板中形成電阻率可選擇地減小之跡線的方法之此等及其他特徵將自以下詳細描述變得顯而易見,該等圖式及實例為例示性的,而非限制性的。These and other features of the method for forming traces with selectively reduced resistivity in a multi-layer printed circuit board will become apparent from the following detailed description when read in conjunction with the drawings and examples, which are intended to be illustrative and not limiting.

本文中提供用於在多層印刷電路板中形成電阻率可選擇地減小之跡線之方法的例示性實施。Exemplary implementations of methods for forming traces with selectively reduced resistivity in multi-layer printed circuit boards are provided herein.

通常,計算PCB跡線電阻如同使用具有已知參數之歐姆定律(V=I/R)一樣簡單。此外,可藉由提供所需製造輪廓且同時使用標準公式計算電阻來估計板上之最終跡線之電阻:(方程式1) 其中    - R為以ohm∙m為單位之電阻率; -ρ 為材料特定電阻率係數; - L為跡線長度; - h為跡線厚度; - W為跡線寬度; - a為(材料特定)電阻率溫度係數;且 - ΔT為操作溫度與參考溫度之間的溫差,通常為25℃。Typically, calculating the resistance of a PCB trace is as simple as using Ohm's law (V=I/R) with known parameters. Additionally, the resistance of the final trace on the board can be estimated by providing the desired manufacturing outline and calculating the resistance using the standard formula: (Equation 1) Where - R is the resistivity in ohm∙m; - ρ is the material specific resistivity coefficient; - L is the trace length; - h is the trace thickness; - W is the trace width; - a is the (material specific) resistivity temperature coefficient; and - ΔT is the temperature difference between the operating temperature and the reference temperature, typically 25°C.

表I提供了一些常用跡線材料之r及a的實例: I :材料特定電阻率參數: 材料 ρ (ohm∙m) α (℃-1 1.6x10-8 0.0039 1.7x10-8 0.0038 2.2x10-8 0.0034 Table I provides some examples of r and a for some commonly used trace materials: Table I : Material specific resistivity parameters: Material ρ (ohm∙m) α (℃ -1 ) Copper 1.6x10-8 0.0039 Silver 1.7x10-8 0.0038 gold 2.2x10-8 0.0034

因此,在高組件密度之情形下,有時伴隨諸如PSU及GPU之高溫產生組件以及縮短跡線長度之要求,預期較高跡線電阻率為合理的。另外,此等計算僅可判定近似值。在生產之後的實際值會在一定程度上有所不同。Therefore, in the case of high component densities, which are sometimes accompanied by high temperature generating components such as PSUs and GPUs and the requirement to shorten trace lengths, it is reasonable to expect higher trace resistivity. In addition, these calculations can only determine approximate values. The actual values after production will vary to some extent.

諸如轉換器(例如A/D、D/A)之高功率組件及耦接此等組件之電路會受到此等約束及電阻率之任何意外變化的極大影響,從而可能導致功率損失。在此類功率電路中,未經補償AME跡線電阻可能在功率波動(power surge)之情況下充當熔絲且燒毀跡線,從而對電路造成永久性損壞。此外,在高速數位板PCB中,跡線電阻以及寄生電容可能產生振盪且對電路系統產生電磁(EM)干擾。High power components such as converters (e.g. A/D, D/A) and the circuits that couple these components are greatly affected by these constraints and any unexpected changes in resistivity, which may result in power loss. In such power circuits, uncompensated AME trace resistance may act as a fuse and burn the trace under power surge conditions, causing permanent damage to the circuit. In addition, in high-speed digital board PCBs, trace resistance and parasitic capacitance may generate oscillations and generate electromagnetic (EM) interference to the circuit system.

本文中所描述之方法可用以在連續製程中使用噴墨列印裝置或使用若干遍次(pass)來形成具有電阻率可選擇地減小之跡線的多層AME。通常,用以形成板之介電材料為單獨形成的,且被提供為基板以用於將導電層及介電層進一步列印於該基板之頂部上。使用本文所描述之列印方法,有可能達成電阻率可選擇地減小之跡線,從而允許提高組件密度以及增加設計靈活性。The method described herein can be used to form a multi-layer AME with selectively reduced resistivity traces using an inkjet printing device in a continuous process or using several passes. Typically, the dielectric material used to form the board is formed separately and provided as a substrate for further printing of conductive and dielectric layers on top of the substrate. Using the printing method described herein, it is possible to achieve selectively reduced resistivity traces, allowing for increased component density and increased design flexibility.

用於形成本文中所揭示之多層AME的傳統方法為用以產生諸如RFID天線及電路板之電子組件的熟知方法,且涉及多步驟消減製程,其涉及銅/銀膜之蝕刻或衝壓。另外或替代地,本文中所描述之系統、方法及組合物可用以在連續製程中(換言之,在單一遍次中)或在使用噴墨列印裝置或使用若干遍次之半連續積層製造(AM)製程中使用列印頭與導電及介電油墨組合物之組合來形成/製造具有電阻率可選擇地(換言之,經預計算而不影響外部層或中間層中之其他組件)減小之跡線的多層AME。Conventional methods for forming the multi-layer AME disclosed herein are well-known methods for producing electronic components such as RFID antennas and circuit boards, and involve multi-step subtractive processes involving etching or stamping of copper/silver films. Additionally or alternatively, the systems, methods, and compositions described herein can be used to form/fabricate multi-layer AMEs with traces whose resistivity is selectively reduced (in other words, calculated without affecting other components in outer or intermediate layers) using a combination of a print head and a conductive and dielectric ink composition in a continuous process (in other words, in a single pass) or in a semi-continuous additive manufacturing (AM) process using an inkjet printing device or using several passes.

儘管參考了噴墨油墨及其分配系統,但是在所揭示方法之實施中亦可考慮其他積層製造(AM)方法。在例示性實施例中,具有電阻率可選擇地減小之跡線的多層PCB可同樣藉由選擇性雷射燒結(SLS)製程來製造,但亦可單獨或組合地使用任何其他合適的積層製造製程(亦被稱作快速原型設計、快速製造及3D列印方法)。此等製程可為例如直接金屬雷射燒結(DMLS)、電子束熔融(EBM)、選擇性熱燒結(SHS)或立體微影(SLA)。Although reference is made to inkjet inks and dispensing systems thereof, other additive manufacturing (AM) methods are also contemplated in the implementation of the disclosed methods. In an exemplary embodiment, a multi-layer PCB having traces with selectively reduced resistivity may likewise be manufactured by a selective laser sintering (SLS) process, but any other suitable additive manufacturing process (also known as rapid prototyping, rapid manufacturing, and 3D printing methods) may also be used, alone or in combination. Such processes may be, for example, direct metal laser sintering (DMLS), electron beam melting (EBM), selective thermal sintering (SHS), or stereolithography (SLA).

具有電阻率可選擇地減小之跡線的多層PCB可由任何合適的積層製造材料製成,該材料諸如金屬粉末(例如,銀、金、鈷鉻、鋼、鋁、鈦及/或鎳合金)、經氣體霧化之金屬粉末、熱塑性塑膠粉末(例如,聚乳酸(PLA)、丙烯腈丁二烯苯乙烯(ABS)及/或高密度聚乙烯(HDPE))、光聚合物樹脂(例如,可UV固化光聚合物,諸如PMMA)、熱固性樹脂、熱塑性樹脂或實現如本文中所描述之功能性的任何其他合適材料。Multi-layer PCBs with traces having optionally reduced resistivity can be made from any suitable laminated fabrication material, such as metal powders (e.g., silver, gold, cobalt chromium, steel, aluminum, titanium and/or nickel alloys), gas atomized metal powders, thermoplastic plastic powders (e.g., polylactic acid (PLA), acrylonitrile butadiene styrene (ABS) and/or high-density polyethylene (HDPE)), photopolymer resins (e.g., UV-curable photopolymers such as PMMA), thermosetting resins, thermoplastic resins, or any other suitable material that achieves the functionality described herein.

取決於金屬顆粒之類型(例如,銀、銅、金、鉑、鋁等)及縱橫比(指金屬顆粒之長度與其各別厚度或直徑之間的比),相比於純塊狀金屬,在用於噴墨列印之導電油墨組合物中,可達到之最大理論電導率可為同一金屬之體電導率之分數,例如,介於約10%與約90%之間,或介於約20%與約80%之間,或者在又一實例中,介於約30%與約70%之間,或為50%。Depending on the type of metal particles (e.g., silver, copper, gold, platinum, aluminum, etc.) and the aspect ratio (the ratio between the length of the metal particles and their respective thickness or diameter), the maximum theoretical conductivity achievable in a conductive ink composition for inkjet printing can be a fraction of the bulk conductivity of the same metal, for example, between about 10% and about 90%, or between about 20% and about 80%, or in another example, between about 30% and about 70%, or 50%, compared to a pure bulk metal.

舉例而言,用以形成跡線之導電材料為銀奈米顆粒。銀(Ag)在諸如銀、銅、金、鋁及鎳之導電金屬中具有最高的電導率(參見例如表I)。此外,銀在經氧化時仍保持導電性,而銅並不如此。在本揭示案之內容背景中,奈米顆粒為具有小於1微米,例如小於約0.5微米或小於約0.2微米之體積平均粒度(D3,2 ,其對於獲得恰當縱橫比而言可為重要的)的經界定顆粒。奈米顆粒可有利於噴墨列印應用,從而即使在極高導電材料含量或負載之情況下亦能夠實現低油墨黏度(因此確保超出2D(在單一層上)及3D(針對跡線上跡線(trace-on-trace))鍵展透臨限值(bond percolation threshold)),以及防止噴墨列印頭分配器上之噴嘴堵塞。For example, the conductive material used to form the traces is silver nanoparticles. Silver (Ag) has the highest electrical conductivity among conductive metals such as silver, copper, gold, aluminum, and nickel (see, e.g., Table I). In addition, silver remains conductive when oxidized, while copper does not. In the context of the present disclosure, nanoparticles are defined particles having a volume average particle size (D 3,2 , which may be important for obtaining a proper aspect ratio) of less than 1 micron, e.g., less than about 0.5 micron or less than about 0.2 micron. Nanoparticles can benefit inkjet printing applications by enabling low ink viscosity even at very high conductive material content or loading (thus ensuring that 2D (on a single layer) and 3D (for trace-on-trace) bond percolation thresholds are exceeded), as well as preventing nozzle clogging on inkjet printhead dispensers.

實務上,觀測到,跡線列印得愈厚,則愈難以獲得顆粒特定(換言之,金屬類型[例如銀]及幾何形狀[例如至少2:1之縱橫比])理論電導率。在一實例中,使用具有銀奈米顆粒之導電油墨來形成典型跡線,該典型跡線在17µm之層厚度(h )下達成30%電導率(相對於塊狀銀)(針對產生0.5 Oz之總塊狀銀重量的跡線長度),且該跡線之電阻測得為1.0歐姆。使用相同幾何形狀及方程式1將電阻減小至0.25歐姆或更低,通常,跡線厚度將增大至少4倍直至大約68至71µm(2.0 Oz銀,針對相同跡線長度)。然而,當跡線厚度增大至68至71µm之厚度時,觀測到之電阻高於所計算(使用方程式1)之0.25歐姆(Ω>0.25歐姆)。In practice, it has been observed that the thicker the trace is printed, the more difficult it is to achieve particle-specific (i.e., metal type [e.g., silver] and geometry [e.g., aspect ratio of at least 2:1]) theoretical conductivity. In one example, a typical trace formed using a conductive ink with silver nanoparticles achieved 30% conductivity (relative to bulk silver) at a layer thickness ( h ) of 17 µm (for a trace length that yielded 0.5 Oz of total bulk silver weight), and the resistance of the trace was measured to be 1.0 Ohm. Using the same geometry and Equation 1 to reduce the resistance to 0.25 ohms or less, typically the trace thickness would increase by at least 4 times to approximately 68 to 71µm (2.0 Oz Silver for the same trace length). However, when the trace thickness was increased to a thickness of 68 to 71µm, the observed resistance was higher than the calculated (using Equation 1) 0.25 ohms (Ω>0.25 ohms).

不受理論束縛,假定尤其當縱橫比r >>1(r >>1)時,奈米顆粒之幾何形狀影響2D鍵展透臨限值(可自孔展透臨限值區分),使得縱橫比愈高,則2D鍵展透臨限值將愈低。舉例而言,以經燒結跡線中之全部固體計,銀奈米顆粒(具有例如介於約2:1至5:1之間或為10:1之縱橫比)之2D鍵展透臨限值為約80 wt%(其對應於油墨中約28%(v/v)之分數濃度),而對於碳奈米管/奈米帶(具有高得多的縱橫比,例如在15:1至1,000:1範圍內),展透臨限值可已經為幾wt%(及甚至更低的分數體積)。當達到(或超出)2D鍵展透臨限值時,經燒結跡線之電阻率隨著導電材料負載進一步增大(例如,奈米顆粒分數體積濃度增大)而大幅度減小且趨於穩定。在本揭示案之內容背景中,2D鍵展透臨限值被定義為跡線中之導電材料接觸且在跡線之X-Y平面中形成連續跡線之點。Without theoretical constraints, it is assumed that the geometry of the nanoparticles affects the 2D bond penetration threshold (which can be distinguished from the pore penetration threshold), especially when the aspect ratio is r >> 1 ( r >> 1), so that the higher the aspect ratio, the lower the 2D bond penetration threshold. For example, the 2D bond spread threshold for silver nanoparticles (having an aspect ratio, e.g., between about 2:1 and 5:1 or 10:1) is about 80 wt% based on the total solids in the sintered traces (which corresponds to a fractional concentration of about 28% (v/v) in the ink), while for carbon nanotubes/nanoribbons (having much higher aspect ratios, e.g., in the range of 15:1 to 1,000:1), the spread threshold may already be a few wt% (and even lower fractional volume). When the 2D bond penetration threshold is reached (or exceeded), the resistivity of the sintered trace decreases significantly and tends to be stable as the conductive material loading is further increased (e.g., the nanoparticle fraction volume concentration increases). In the context of the present disclosure, the 2D bond penetration threshold is defined as the point where the conductive materials in the trace touch and form a continuous trace in the XY plane of the trace.

同樣不受理論束縛,雖然在給定跡線厚度下超出2D鍵展透臨限值將足以將電阻率減小至給定值(例如,30%之塊狀金屬電導率),但增大厚度將產生金屬奈米顆粒之分數體積濃度大於2D鍵展透臨限值但小於3D鍵展透臨限值之分數體積濃度(其被定義為跡線中之導電材料(顆粒)接觸且在任何方向上在跡線中形成連續塊體之分數體積濃度)的跡線。Again without theoretical constraints, while exceeding the 2D bond penetration threshold at a given trace thickness will be sufficient to reduce the resistivity to a given value (e.g., 30% of bulk metal conductivity), increasing the thickness will produce traces with a fractional volume concentration of metal nanoparticles greater than the 2D bond penetration threshold but less than the 3D bond penetration threshold (which is defined as the fractional volume concentration at which the conductive material (particles) in the trace touch and form a continuous bulk in the trace in any direction).

因此,且在一例示性實施中,且為了解決藉由還原方法抑或積層製造方法形成之多層AME中之當前狀態中的一些缺陷,本文中提供一種減小AME中之至少兩個已連接組件之間的跡線電阻率之方法,其包含:在中間層上形成至少一個跡線(藉此形成中間跡線);形成至少一個跡線,其經大小設定且經組態以在以下中之至少一者上可操作地耦接至少兩個組件:AME之外部頂端層及外部基底層;及形成預定數目個以下中之至少一者:盲通孔及埋通孔,該預定數目個通孔經大小設定且經組態以電耦接中間層上之至少一個跡線(中間跡線)與形成於以下中之至少一者上的跡線(換言之,對應外部跡線):AME之外部頂端層及外部基底層。就AME具有耦接至AME之任何側平面、壁或側面的組件而言,所揭示之方法及系統可用以同樣減小跡線電阻率,從而耦接此等側面安裝式組件與AME拓樸之其餘部分。Therefore, and in an exemplary implementation, and to address some of the deficiencies in the current state of multi-layer AMEs formed by either reduction methods or layered fabrication methods, a method of reducing the resistivity of a trace between at least two connected components in an AME is provided herein, comprising: forming at least one trace on an intermediate layer (thereby forming an intermediate trace); forming at least one trace sized and configured to be between: At least two components are operably coupled on at least one of: an external top layer and an external base layer of the AME; and a predetermined number of at least one of the following: a blind via and a buried via are formed, the predetermined number of vias being sized and configured to electrically couple at least one trace on the intermediate layer (intermediate trace) with a trace formed on at least one of the following (in other words, corresponding to the external trace): the external top layer and the external base layer of the AME. For components having an AME coupled to any side plane, wall or side of the AME, the disclosed methods and systems can be used to similarly reduce trace resistivity, thereby coupling such side-mounted components with the remainder of the AME topology.

在典型提取方法中,首先在例如承載銅箔之經銅層壓之層壓板中形成穿通孔,且基板連續地經受無電極銅(或其他金屬,例如銀)電鍍處理以形成經電鍍之穿通孔。接著,藉由以預定圖案蝕刻經金屬電鍍之基板之表面而形成跡線圖案,且接著藉由無電電鍍或蝕刻及其類似操作使跡線圖案之表面粗糙化。連續地,樹脂絕緣層形成於具有粗糙表面之跡線圖案上,且接著經受曝光及顯影處理以形成通孔(穿通孔、埋通孔或盲通孔)之開口部分,且此後,藉由沈積介電樹脂、UV固化且視情況主固化而形成層間樹脂絕緣層。在層間樹脂絕緣層(換言之,中間層)通常經受藉由酸或氧化劑進行之粗糙化處理之後,無電電鍍薄膜形成於無電電鍍膜上,隨後藉由電鍍來加厚該無電電鍍薄膜。在分離抗電鍍劑(plating resist)之後,可進行蝕刻以形成經由通孔與下層級(under-level)跡線圖案連接之跡線圖案。當最終如此形成所有中間層時,形成用於保護導體電路之阻焊層,且對曝露用於與電子部分連接之跡線圖案的部分(例如,IC晶片或母板及其類似者)進行電鍍,且接著藉由沈積(例如,藉由列印或以其他方式分配)焊錫膏來形成焊料凸塊,以完成組合式多層PCB之製造。In a typical extraction method, a through hole is first formed in a copper laminated plate, such as a copper foil, and the substrate is continuously subjected to an electrodeless copper (or other metal, such as silver) electroplating process to form the plated through hole. Then, a trace pattern is formed by etching the surface of the metal-plated substrate with a predetermined pattern, and then the surface of the trace pattern is roughened by electroless plating or etching and the like. Continuously, a resin insulating layer is formed on the trace pattern having a rough surface, and then subjected to exposure and development treatment to form an opening portion of a through hole (through hole, buried via or blind via), and thereafter, an interlayer resin insulating layer is formed by depositing a dielectric resin, UV curing and optionally main curing. After the interlayer resin insulating layer (in other words, the intermediate layer) is generally subjected to a roughening treatment by an acid or an oxidizing agent, an electroless plating film is formed on the electroless plating film, and then the electroless plating film is thickened by electroplating. After separating the plating resist, etching can be performed to form a trace pattern connected to the under-level trace pattern through a through hole. When all the intermediate layers are finally formed in this way, a solder resist layer is formed to protect the conductor circuit, and the portion of the trace pattern exposed for connection with the electronic part (e.g., IC chip or motherboard and the like) is electroplated, and then solder bumps are formed by depositing (e.g., by printing or otherwise dispensing) solder paste to complete the manufacture of the assembled multi-layer PCB.

替代地,在另一實例中,穿通孔可形成於上面承載有金屬箔之金屬包覆層板中,且接著經受無電極金屬電鍍以在其中設置經電鍍之穿通孔。接著逐影像(換言之,根據光柵檔案)蝕刻基板之表面,以在其上設置跡線圖案。藉由在此跡線圖案上進行無電電鍍或蝕刻,此跡線圖案具有粗糙表面,且包含環氧樹脂、丙烯酸樹脂、氟樹脂或其混合樹脂之中間層樹脂絕緣層構造於該粗糙表面上。接著,藉由曝光及顯影或雷射處理而形成通孔,且對樹脂進行UV固化且視情況進行後固化以提供目標中間層樹脂絕緣層。此中間層樹脂絕緣層亦經受表面粗糙化處理,且接著,經無電極電鍍之薄金屬層形成於該中間層樹脂絕緣層上。此後,抗電鍍劑安置於經無電極電鍍之金屬層上,且接著形成厚電鍍層。接著剝離抗電鍍劑且執行蝕刻以提供藉助於通孔連接至下層跡線圖案之跡線圖案。在此,亦重複上述步驟之順序,且接著,形成用於保護跡線圖案之阻焊層作為最外層(換言之,外部頂端層或外部基底層)。此阻焊層形成有開口,且對應於開口之區域中的導電跡線層經電鍍以提供接觸墊。焊料凸塊可接著形成或以其他方式沈積於接觸墊上及/或周圍以完成組合式多層AME之此實例之製造。Alternatively, in another example, through holes may be formed in a metal clad laminate having a metal foil carried thereon, and then subjected to electroless metal plating to provide plated through holes therein. The surface of the substrate is then etched imagewise (in other words, according to a grating file) to provide a trace pattern thereon. By performing electroless plating or etching on this trace pattern, the trace pattern has a rough surface, and an intermediate resin insulation layer including epoxy resin, acrylic resin, fluororesin or a mixed resin thereof is constructed on the rough surface. Then, through holes are formed by exposure and development or laser treatment, and the resin is UV cured and, if necessary, post-cured to provide a target interlayer resin insulation layer. This interlayer resin insulation layer is also subjected to surface roughening treatment, and then, a thin metal layer by electrodeless plating is formed on the interlayer resin insulation layer. Thereafter, an anti-plating agent is placed on the electrodeless plated metal layer, and then a thick plating layer is formed. The anti-plating agent is then stripped off and etching is performed to provide a trace pattern connected to the underlying trace pattern by means of a through hole. Here, the sequence of the above steps is also repeated, and then, a solder resist layer for protecting the trace pattern is formed as the outermost layer (in other words, an external top layer or an external base layer). This solder resist layer is formed with an opening, and the conductive trace layer in the area corresponding to the opening is electroplated to provide a contact pad. Solder bumps can then be formed or otherwise deposited on and/or around the contact pad to complete the manufacture of this example of a modular multi-layer AME.

在另一實施例中,使用噴墨列印來形成具有電阻率可選擇地較低之跡線的多層AME。舉例而言,本文揭示一種使用噴墨印表機來製造多層AME中之至少兩個已連接組件之間電阻率減小之跡線的電腦化方法,其包含:提供噴墨列印系統,其包含:第一列印頭,其可操作以分配介電油墨組合物;第二列印頭,其可操作以分配導電油墨組合物;輸送機,其可操作地耦接至第一列印頭及第二列印頭,該輸送機經組態以將基板輸送至第一列印頭及第二列印頭中之每一者;及電腦輔助製造(「CAM」)模組,其包括中心處理模組(CPM),CAM與第一列印頭及第二列印頭中之每一者通信,其中CPM進一步包含:至少一個處理器,其與非暫時性儲存媒體通信,儲存於該非暫時性儲存媒體上之一組可執行指令經組態以在經執行時使CPM執行以下步驟:接收表示具有電阻率減小之跡線之多層AME的3D可視化檔案;及產生具有複數個檔案之檔案庫,每一檔案表示用於列印LPF之實質上2D層且元檔案至少表示列印次序;其中CAM模組經組態以控制輸送機、第一列印頭及第二列印頭中之每一者;提供介電油墨組合物及導電油墨組合物;使用CAM模組,自庫獲得表示用於列印具有電阻率減小之跡線之多層AME之第一層的第一檔案,第一檔案包含表示以下中之至少一者之圖案的列印指令:介電油墨及導電油墨;使用第一列印頭,形成對應於介電油墨之圖案;使用電磁輻射源,固化對應於多層PCB之2D層中之介電油墨表示的圖案;使用第二列印頭,形成對應於導電油墨之圖案;利用熱來燒結對應於導電油墨之圖案;使用CAM模組,自庫獲得表示用於列印具有電阻率減小之跡線之多層AME之後續層的後續檔案,後續檔案包含表示以下中之至少一者之圖案的列印指令:介電油墨及導電油墨;重複以下步驟:使用第一列印頭,形成對應於介電油墨之圖案,直至使用CAM模組自2D檔案庫獲得後續實質上2D層的步驟,其中在最終實質上2D層中燒結導電油墨圖案後,多層AME經組態以包含:至少一個中間跡線,其在一中間層上;至少一個外部跡線,其經大小設定且經組態以在以下中之至少一者上可操作地耦接至少兩個組件:多層AME之外部頂端層及外部基底層;及預定數目個以下中之至少一者:盲通孔及埋通孔,該盲通孔及該埋通孔電耦接至少一個中間跡線與外部跡線;及移除基板。In another embodiment, inkjet printing is used to form a multi-layer AME having traces with selectively lower resistivity. For example, a computerized method of using an inkjet printer to manufacture traces with reduced resistivity between at least two connected components in a multi-layer AME is disclosed, comprising: providing an inkjet printing system, comprising: a first print head operable to dispense a dielectric ink composition; a second print head operable to dispense a conductive ink composition; a conveyor operably coupled to the first print head and the second print head, the conveyor configured to transport a substrate to each of the first print head and the second print head; and a computer-aided manufacturing ("CAM") module, comprising a central processing module (CPM), the CAM communicating with each of the first print head and the second print head, wherein The CPM further comprises: at least one processor in communication with a non-transitory storage medium, a set of executable instructions stored on the non-transitory storage medium configured to cause the CPM to perform the following steps when executed: receiving a 3D visualization file representing multiple layers of AME with traces having reduced resistivity; and generating a file library having a plurality of files, each file representing a substantially 2D layer for printing LPF and a metafile representing at least a printing order; wherein the CAM module is configured to control each of the conveyor, the first print head, and the second print head; providing a dielectric ink composition and a conductive ink composition; using the CAM module, obtaining from the library a 3D visualization file representing a trace for printing LPF with reduced resistivity; A first file of a first layer of a multi-layer AME having traces with a resistivity-reduced pattern, the first file including printing instructions for patterns representing at least one of the following: dielectric ink and conductive ink; using a first print head to form a pattern corresponding to the dielectric ink; using an electromagnetic radiation source to cure the pattern represented by the dielectric ink in a 2D layer corresponding to the multi-layer PCB; using a second print head to form a pattern corresponding to the conductive ink; using heat to sinter the pattern corresponding to the conductive ink; using a CAM module to obtain from a library a subsequent file representing a subsequent layer of a multi-layer AME having traces with reduced resistivity, the subsequent file including printing instructions for patterns representing at least one of the following: dielectric ink and conductive ink ; repeating the following steps: using a first print head to form a pattern corresponding to the dielectric ink until a subsequent substantially 2D layer is obtained from a 2D file library using a CAM module, wherein after the conductive ink pattern is sintered in the final substantially 2D layer, the multi-layer AME is configured to include: at least one intermediate trace, which is on an intermediate layer; at least one external trace, which is sized and configured to operably couple at least two components on at least one of the following: an external top layer and an external base layer of the multi-layer AME; and a predetermined number of at least one of the following: a blind via and a buried via, the blind via and the buried via electrically coupling at least one intermediate trace with the external trace; and removing the substrate.

在一例示性實施中,術語「分配」用以表示自其中分配墨滴之裝置的操作,該裝置諸如充當分配器之列印頭。分配器可為例如用於分配少量液體之設備,包括微型閥、壓電分配器、連續噴射列印頭、沸騰(氣泡噴射)分配器及影響流經分配器之流體之溫度及性質的其他設備。在一例示性實施中,術語「列印頭」及術語「分配器」為可互換的。In one exemplary embodiment, the term "dispensing" is used to refer to the operation of a device from which ink droplets are dispensed, such as a print head acting as a dispenser. A dispenser may be, for example, a device used to dispense small amounts of liquid, including microvalves, piezoelectric dispensers, continuous jet print heads, boiling (bubble jet) dispensers, and other devices that affect the temperature and properties of the fluid flowing through the dispenser. In one exemplary embodiment, the term "print head" and the term "dispenser" are interchangeable.

此外,本文中亦提供多層AME之例示性實施,其包含:至少一個跡線,其在中間層上;跡線,其經大小設定且經組態以在以下中之至少一者上可操作地耦接至少兩個組件:PCB之外部頂端層及外部基底層;及預定數目個以下中之至少一者:盲通孔及埋通孔,該盲通孔及該埋通孔電耦接中間層上之至少一個跡線與以下中之至少一者上的跡線:多層AME之外部頂端層及外部基底層。In addition, an exemplary implementation of a multi-layer AME is also provided herein, which includes: at least one trace on an intermediate layer; a trace that is sized and configured to operably couple at least two components on at least one of the following: an external top layer and an external base layer of a PCB; and a predetermined number of at least one of the following: a blind via and a buried via, the blind via and the buried via electrically coupling at least one trace on the intermediate layer with a trace on at least one of the following: an external top layer and an external base layer of the multi-layer AME.

在本揭示案之內容背景中,應理解,跨越多層AME、橫越所有層,例如自頂端外部層至外部基底層(例如,「Z方向」)之通孔被稱作「穿通孔」,其可經電鍍或填充(使用導電金屬,例如銀、銅、金、鋁、鎳等),而在頂端外部層或基底外部層處開始;且在任何中間層處終止之通孔被稱作「盲通孔」;且任何兩個中間層之間的貫通孔(無論是否彼此鄰近)被稱作「埋通孔」。In the context of the present disclosure, it should be understood that a through hole that spans multiple layers of AME, across all layers, such as from a top external layer to an external base layer (e.g., "Z direction") is referred to as a "through hole", which may be plated or filled (using a conductive metal such as silver, copper, gold, aluminum, nickel, etc.), and starts at a top external layer or a base external layer; and a through hole that terminates at any intermediate layer is referred to as a "blind via"; and a through hole between any two intermediate layers (whether adjacent to each other or not) is referred to as a "buried via".

可參考隨附圖式獲得對本文中所揭示之組件、方法及裝置之更全面的理解。此等圖式(在本文中亦被稱作「圖」)基於說明本揭示案之便利性及簡易性而僅為示意性表示,且因此並不意欲指示裝置或其組件之相對大小及尺寸、其相對大小關係及/或界定或限制例示性實施之範疇。儘管為清楚起見而在以下描述中使用特定術語,但此等術語僅意欲指選擇用於圖式說明之例示性實施之特定結構,且並不意欲界定或限制本揭示案之範疇。在圖式及以下說明中,應理解,相同數字標記係指具有相同功能之組件。同樣,在具有XYZ軸之法線正交座標設備上參考橫截面,使得Y軸係指前後,X軸係指側對側,且Z軸係指上下。A more comprehensive understanding of the components, methods, and devices disclosed herein may be obtained by reference to the accompanying drawings. These drawings (also referred to herein as "figures") are schematic representations based on the convenience and simplicity of illustrating the present disclosure, and therefore are not intended to indicate the relative size and dimensions of the device or its components, their relative size relationships, and/or to define or limit the scope of the exemplary implementation. Although specific terms are used in the following description for clarity, these terms are only intended to refer to the specific structures of the exemplary implementations selected for the illustration of the drawings, and are not intended to define or limit the scope of the present disclosure. In the drawings and the following description, it should be understood that the same numerical designations refer to components with the same functions. Likewise, reference is made to a cross section on a normal orthogonal coordinate device having XYZ axes, such that the Y axis refers to front and back, the X axis refers to side to side, and the Z axis refers to up and down.

現轉向圖1及圖2,圖1示出當兩個導電外部跡線103i在多層PCB 100之接地外部基底平面101上方時的當前狀態。亦示出了接觸墊104j,其藉由複數個穿通孔107k耦接至外部基底(接地)平面101。應注意,圖1及圖2中未示出介電/絕緣中間層,因此暗示了將產生多層PCB 100在Z方向上之厚度h (參見例如圖2)的中間層數目,且假定外部跡線103i(圖1)及203i(圖2)沈積於外部頂端層102、202及/或外部基底層101、201上。另外,導電外部跡線103i各自示出為在經耦接接觸墊104j中終止,焊料凸塊可安置於該等接觸墊中。如所指示(參見例如方程式1),在傳統製造製程中,可藉由增大跡線103i之表面積,藉由增大跡線103i之寬度W(參見例如圖1)或增大如圖3之303i中所示的該等跡線之長度來減小電阻率。同樣地,分離的接觸墊106q亦示出為極靠近端接接觸墊104j,且與穿通孔107k一起耦接至基底外部層102。Turning now to Figures 1 and 2, Figure 1 shows the current state when two conductive external traces 103i are above a grounded external base plane 101 of a multi-layer PCB 100. Also shown are contact pads 104j, which are coupled to the external base (ground) plane 101 by a plurality of through-holes 107k. It should be noted that dielectric/insulating intermediate layers are not shown in Figures 1 and 2, thus implying the number of intermediate layers that would result in a thickness h (see, e.g., Figure 2) of the multi-layer PCB 100 in the Z direction, and assuming that the external traces 103i (Figure 1) and 203i (Figure 2) are deposited on external top layers 102, 202 and/or external base layers 101, 201. In addition, the conductive external traces 103i are each shown as terminating in a coupled contact pad 104j, in which solder bumps may be disposed. As indicated (see, e.g., Equation 1), in conventional manufacturing processes, the resistivity may be reduced by increasing the surface area of the traces 103i, by increasing the width W of the traces 103i (see, e.g., FIG. 1 ), or by increasing the length of the traces as shown in 303i of FIG. 3 . Similarly, separate contact pads 106q are also shown as being very close to the termination contact pads 104j, and coupled to the substrate external layer 102 along with through-holes 107k.

然而,在一些情況下任何選項(例如,增大跡線之長度及/或寬度)皆不可行,該等情況例如,需要使組件之間的跡線保持儘可能短(例如,將旁路電容器放置成儘可能接近其對應IC),使如圖3所示之長度不增大,及/或需要高密度組件之表面時,例如在手機或高密度互連PCB(HDI)中,其中便攜性(要求小型化)、效能(要求提高處理速度,從而縮短跡線)及組件(要求更小覆蓋區中有更多引線),所有此等者要求更密集互連、更短跡線及間隙尺寸、更小直徑通孔以及更多埋通孔。However, there are some situations where either option (e.g., increasing the length and/or width of the trace) is not feasible, such as when the traces between components need to be kept as short as possible (e.g., placing bypass capacitors as close as possible to their corresponding ICs) so that the lengths shown in Figure 3 do not increase, and/or when a high density of component surfaces is required, such as in cell phones or high density interconnect PCBs (HDI), where portability (demanding miniaturization), performance (demanding increased processing speeds, thereby shortening traces), and components (demanding more leads in a smaller footprint) all require denser interconnects, shorter trace and gap sizes, smaller diameter vias, and more buried vias.

因此,本文中所提供之用於形成具有電阻率可選擇地較低之跡線之多層AME 200的方法(相比於未使用本文中所揭示之方法製造的相同長度跡線)包含(參見例如圖2):在中間層上形成至少一個中間跡線213i;形成外部跡線203i,其經尺寸設定且經組態以在以下中之至少一者上可操作地耦接至少兩個組件:多層AME 200之外部頂端層202(未示出-隱含)及外部基底層201;及形成預定數目個以下中之至少一者:盲通孔224k、233k及埋通孔225k、226k,預定數目個通孔經尺寸設定且經組態以將至少一個中間跡線213i與形成於以下中之至少一者上的外部跡線203i電耦接:多層AME 200之外部頂端層202及外部基底層201。Thus, a method provided herein for forming a multi-layer AME 200 having a trace having a selectively lower resistivity (compared to a trace of the same length made without the methods disclosed herein) includes (see, e.g., FIG. 2 ): forming at least one middle trace 213 i on a middle layer; forming outer traces 203 i sized and configured to operably couple at least two components on at least one of the following: the multi-layer AME 200; and forming a predetermined number of at least one of the following: blind vias 224k, 233k and buried vias 225k, 226k, the predetermined number of vias being sized and configured to electrically couple at least one intermediate trace 213i with an external trace 203i formed on at least one of the following: the external top layer 202 and the external base layer 201 of the multi-layer AME 200.

此外,該方法包含在外部跡線203i之末端(端部)處形成至少一個接觸墊204j,該接觸墊經調適、經大小設定且經組態以可操作地耦接至組件500n,該外部跡線經大小設定且經組態以可操作地耦接至少兩個組件500n(未示出)。組件500n可為例如以下中之至少一者:四方扁平裝配(QFP)封裝、薄小外形封裝(TSOP)、小外形積體電路(SOIC)封裝、小外形J引線(SOJ)封裝、塑膠引線晶片載體(PLCC)封裝、晶圓級晶片尺度封裝(WLCSP)、模具陣列處理-球狀柵格陣列(MAPBGA)封裝、四方扁平無引線(QFN)封裝、焊盤柵格陣列(LGA)封裝及旁路電容器。In addition, the method includes forming at least one contact pad 204j at a terminal end (end) of an external trace 203i, the contact pad being adapted, sized and configured to be operably coupled to a component 500n, the external trace being sized and configured to be operably coupled to at least two components 500n (not shown). The component 500n may be, for example, at least one of a quad flat package (QFP) package, a thin small outline package (TSOP), a small outline integrated circuit (SOIC) package, a small outline J-lead (SOJ) package, a plastic leaded chip carrier (PLCC) package, a wafer level chip scale package (WLCSP), a mold array process-ball grid array (MAPBGA) package, a quad flat no-lead (QFN) package, a land grid array (LGA) package, and a bypass capacitor.

因此,預定數目個盲通孔224k、233k及埋通孔225k、226k;至少一個中間跡線213i;及外部跡線203i中之至少一者的組合電阻率Ω經組態以僅提供在無經耦接之預定數目個以下中之至少一者的情況下為外部跡線103i、203i之電阻率Ω之預定分數的電阻率Ω:盲通孔224k、233k及埋通孔225k、226k;及至少一個中間跡線213i。不受理論束縛,估計外部跡線103i、203i之初始厚度針對給定長度產生固定且已知的電阻率,該外部跡線當在中間跡線213i中實質上重複且與盲通孔224k、233k及埋通孔225k、226k耦接時,將產生所得增強跡線253i之可選擇且可預測的電阻率。Therefore, the combined resistivity Ω of a predetermined number of blind vias 224k, 233k and buried vias 225k, 226k; at least one intermediate trace 213i; and at least one of the external traces 203i is configured to provide a resistivity Ω that is a predetermined fraction of the resistivity Ω of the external traces 103i, 203i only in the absence of at least one of the following being coupled: blind vias 224k, 233k and buried vias 225k, 226k; and at least one intermediate trace 213i. Without being bound by theory, it is estimated that the initial thickness of the outer traces 103i, 203i produces a fixed and known resistivity for a given length, which when substantially repeated in the middle trace 213i and coupled with the blind vias 224k, 233k and buried vias 225k, 226k, will produce a selectable and predictable resistivity of the resulting enhanced trace 253i.

舉例而言,本文中所提供之用於形成具有電阻率可選擇地較低之跡線的多層PCB 200之方法進一步包含形成複數個(2個或更多個)中間跡線213i,每一中間跡線沿多層PCB 200之豎直軸線Z安置於單獨層中。此外,複數個中間跡線中之每一中間跡線213i耦接至鄰近中間跡線,從而在緊鄰的中間跡線213i之間形成複數個埋通孔225k、226k。應注意,基於與跡線封裝相關聯之其他參數及因素,中間跡線213i可具有與任何鄰近中間跡線213i不同且可更寬或更窄的寬度W。此外,埋通孔225k、226k及盲通孔224k、233k不一定為豎直的,而是可以非豎直角度(例如,Z方向,參見圖2)傾斜。同樣,由經耦接跡線形成之網格253(在某些實例中亦稱為晶格)在整個過程中未形成均勻開口。For example, the method provided herein for forming a multi-layer PCB 200 having traces with selectively low resistivity further includes forming a plurality of (2 or more) intermediate traces 213i, each of which is disposed in a separate layer along a vertical axis Z of the multi-layer PCB 200. In addition, each of the plurality of intermediate traces 213i is coupled to an adjacent intermediate trace, thereby forming a plurality of buried vias 225k, 226k between the adjacent intermediate traces 213i. It should be noted that the intermediate trace 213i may have a width W that is different from any adjacent intermediate trace 213i and may be wider or narrower based on other parameters and factors associated with trace packaging. In addition, the buried vias 225k, 226k and the blind vias 224k, 233k are not necessarily vertical, but can be tilted at non-vertical angles (e.g., the Z direction, see FIG. 2). Similarly, the grid 253 (also referred to as a lattice in some examples) formed by the coupled traces is not formed with uniform openings throughout the process.

如圖2所示,中間跡線213i各自終止於末端埋通孔226k中,而中間跡線213i藉由末端盲通孔233k立即耦接至外部跡線203i。當存在大量中間跡線213i時,且為了不妨礙與接觸墊204j或外部跡線203i之導電性,使末端盲通孔233k(及/或非末端盲通孔224k)形成為具有面積大於(例如,直徑大於)每一非終端埋通孔225k之橫截面可為有利的。類似地,在實例中,末端埋通孔226k將同樣形成為具有面積大於(例如,直徑大於)每一非末端埋通孔225k之橫截面。此外,在另一實例中,隨著中間跡線213i愈來愈接近外部跡線203i,每一非末端埋通孔225k之橫截面將增大,從而實際上與基底外部跡線203i形成單一圓錐形盲通孔。As shown in FIG2 , the intermediate traces 213i each terminate in a terminal buried via 226k, and the intermediate traces 213i are immediately coupled to the external traces 203i through the terminal blind via 233k. When there are a large number of intermediate traces 213i, and in order not to hinder the conductivity with the contact pad 204j or the external trace 203i, it may be advantageous to form the terminal blind via 233k (and/or the non-terminal blind via 224k) to have a cross-section that is larger in area (e.g., larger in diameter) than each non-terminal buried via 225k. Similarly, in an example, the terminal buried via 226k will also be formed to have a cross-section that is larger in area (e.g., larger in diameter) than each non-terminal buried via 225k. Furthermore, in another example, as the middle trace 213i gets closer to the outer trace 203i, the cross-section of each non-terminal buried via 225k will increase, thereby actually forming a single conical blind via with the substrate outer trace 203i.

如圖2所示,本文中所提供之用於形成具有電阻率可選擇地較低之跡線的多層PCB 200之方法經組態以使得在完成具有外部跡線203i時,以下中之至少一者形成自外部跡線203i豎直地(在Z方向上)延伸之晶格253i:預定數目個非末端盲通孔224k、非末端埋通孔225k、末端埋通孔226k及末端盲通孔233k以及複數個中間跡線213i中之至少一者。如本文中所使用,術語「晶格」係指由金屬條製成之開放框架(例如,中間跡線213i及外部跡線203i),其以規則圖案重疊或交疊,藉由豎直構件(例如,埋通孔225k、226k及盲通孔224k、233k)之規則圖案連接。As shown in FIG. 2 , the method provided herein for forming a multi-layer PCB 200 having traces with optionally lower resistivity is configured such that when a lattice 253i extending vertically (in the Z direction) from the external traces 203i is completed, at least one of the following is formed: a predetermined number of non-end blind vias 224k, non-end buried vias 225k, end buried vias 226k, and end blind vias 233k and at least one of a plurality of intermediate traces 213i. As used herein, the term "lattice" refers to an open frame made of metal strips (e.g., middle trace 213i and outer traces 203i) that are overlapped or interlaced in a regular pattern and connected by a regular pattern of vertical components (e.g., buried vias 225k, 226k and blind vias 224k, 233k).

使用本文中所揭示之電腦化噴墨列印系統形成PCB的方法可包含提供基板(例如,可剝離基板,諸如膜)之步驟。沈積介電油墨之列印頭(及其派生詞;應理解為指以受控方式將材料沈積、傳送或產生於表面上之任何裝置或技術)可經組態以按需求,換言之,隨諸如輸送機速度、所需PCB子層厚度(無論通孔或熱管經填充抑或電鍍)或其組合之各種製程參數的變化而提供油墨液滴。應注意,中間跡線213i不以由製程特定子層厚度判定之相同PCB子層厚度安置,且可以與子層相同或不同的厚度安置。A method of forming a PCB using a computerized inkjet printing system disclosed herein may include the step of providing a substrate (e.g., a peelable substrate such as a film). A print head (and its derivatives; which should be understood to refer to any device or technology that deposits, transfers, or produces material on a surface in a controlled manner) that deposits dielectric ink can be configured to provide ink droplets on demand, in other words, as a function of various process parameters such as conveyor speed, desired PCB sublayer thickness (whether vias or heat pipes are filled or plated), or combinations thereof. It should be noted that the intermediate traces 213i are not disposed at the same PCB sublayer thickness determined by the process specific sublayer thickness, and can be disposed at the same or different thickness as the sublayer.

在一例示性實施中,添加了軟體特徵,此將允許在開始製造之前在例如Gerber檔案中選擇導電跡線。該軟體特徵將產生具有選定外部跡線之額外嵌入間隔信號層,以及具有通孔之埋/盲通鑽孔頭(例如,以Excellon格式)檔案,其連接含有重複跡線之複製層與外部信號層上之原始跡線層。用於形成電阻率減小之跡線的輸入參數可為例如以下中之至少一者:嵌入跡線之導電層高度;嵌入層(複製品)之間的介電層高度;複製品數目(換言之,嵌入間隔信號層之數目);通孔直徑、複製品中嵌入跡線之寬度(指安置於經耦接跡線實質上寬於其耦接至之外部跡線的內部嵌入信號層上之跡線)及通孔間距(換言之,不垂直於PCB之表面而是以預定角度傾斜以補償其他組件佈線通孔或其他參數的通孔)。複製品可接著可在列印作業中組態為內部信號層及內部通孔。In one exemplary implementation, a software feature is added that will allow conductive traces to be selected in, for example, a Gerber file before starting fabrication. The software feature will generate an additional embedded spacer signal layer with the selected external traces, as well as a buried/blind via drill head (e.g., in Excellon format) file with vias connecting the duplicate layer containing the repeated traces with the original trace layer on the external signal layer. The input parameters for forming the reduced resistivity traces may be, for example, at least one of the following: height of the conductive layer in which the traces are embedded; height of the dielectric layer between the embedded layers (replicas); number of replicas (in other words, number of embedded spacer signal layers); via diameter, width of the embedded traces in the replicas (referring to traces disposed on an internal embedded signal layer where the coupled traces are substantially wider than the external traces to which they are coupled), and via spacing (in other words, vias that are not perpendicular to the surface of the PCB but are tilted at a predetermined angle to compensate for other component routing vias or other parameters). The replicas may then be configured as internal signal layers and internal vias in a print operation.

在本文中所揭示之電腦化噴墨列印系統中使用的基板可為例如可移除或可剝離的,亦可為相對剛性材料,例如玻璃或晶體(例如藍寶石)。替代地,基板可為可撓性(例如,可捲曲)基板(或膜),以使基板易於自PCB剝離,該PCB例如聚(萘二甲酸乙二酯)(PEN)、聚醯亞胺(例如,杜邦(DuPont)之甲酮® ),矽聚合物、聚(對苯二甲酸乙二酯)(PET)、聚(四氟乙烯)(PTFE)膜等。The substrate used in the computerized inkjet printing system disclosed herein may be, for example, removable or peelable, or may be a relatively rigid material, such as glass or a crystal (e.g., sapphire). Alternatively, the substrate may be a flexible (e.g., rollable) substrate (or film) to facilitate the substrate to be peeled off from a PCB such as polyethylene naphthalate (PEN), polyimide (e.g., DuPont's ketone® ), silicone polymer, polyethylene terephthalate (PET), polytetrafluoroethylene (PTFE) film, etc.

當在第一列印頭或第二列印頭之前或之後(例如,用於燒結導電層)使用本文中所揭示之電腦化噴墨列印系統時,可採用其他功能步驟(及因此用於影響此等步驟之構件)。此等步驟可包括(但不限於):加熱步驟(受諸如夾盤之加熱元件及/或熱空氣影響);光漂白(photobleaching)(使用例如UV光源及光罩);乾燥(例如使用真空區或加熱元件);(反應性)電漿沈積(例如使用加壓電漿槍及電漿束控制器);交聯(例如藉由經由在塗佈之前將諸如{4-[(2-羥基十四基)-烴氧基]-苯基}-苯基六氟銻酸錪之光酸(photoacid)添加至聚合物溶液或用作與金屬前驅體或奈米顆粒之分散劑而選擇性地引發);退火或促進氧化還原反應。When using the computerized inkjet printing system disclosed herein before or after a first print head or a second print head (e.g., for sintering a conductive layer), other functional steps (and therefore components for affecting such steps) may be employed. Such steps may include (but are not limited to): heating steps (under the influence of heating elements such as chucks and/or hot air); photobleaching (using, for example, a UV light source and a photomask); drying (for example, using a vacuum zone or a heating element); (reactive) plasma deposition (for example, using a pressurized plasma gun and a plasma beam controller); crosslinking (for example, by selectively initiating by adding a photoacid such as {4-[(2-hydroxytetradecyl)-hydroxyl]-phenyl}-phenyl iodonium hexafluorosulfonate to the polymer solution before coating or using it as a dispersant with metal precursors or nanoparticles); annealing or promoting redox reactions.

當使用本文中所揭示之電腦化噴墨列印系統時,調配導電及/或介電油墨組合物可考慮由沈積工具施加之要求(若存在)及(視情況可移除)基板之表面特性(例如,親水性或疏水性中之至少一者及表面能)。舉例而言,在使用利用壓電頭之噴墨列印之情況下,導電油墨及/或介電油墨之黏度(在20℃下量測)可例如不低於約5 cP,例如不低於約8 cP,或不低於約10 cP,且不高於約30 cP,例如不高於約20 cP,或不高於約15 cP。導電油墨及/或介電油墨可各自經組態(例如,調配)以具有介於約25 mN/m與約35 mN/m之間,例如介於約29 mN/m與約31 mN/m之間的動態表面張力(指在列印頭孔隙處形成噴墨油墨液滴時之表面張力),如在50 ms之表面齡(surface age)及25℃下藉由最大氣泡壓力張力計量測。可調節動態表面張力以使得與可剝離基板或介電層之接觸角介於約100°與約165°之間。When using the computerized inkjet printing system disclosed herein, the conductive and/or dielectric ink compositions may be formulated taking into account the requirements imposed by the deposition tool (if any) and the surface properties of the substrate (e.g., at least one of hydrophilicity or hydrophobicity and surface energy) (which may be removed as appropriate). For example, in the case of inkjet printing using a piezo head, the viscosity of the conductive ink and/or dielectric ink (measured at 20° C.) may be, for example, not less than about 5 cP, such as not less than about 8 cP, or not less than about 10 cP, and not more than about 30 cP, such as not more than about 20 cP, or not more than about 15 cP. The conductive ink and/or the dielectric ink may each be configured (e.g., formulated) to have a dynamic surface tension (referring to the surface tension when a jetted ink droplet is formed at the print head aperture) between about 25 mN/m and about 35 mN/m, such as between about 29 mN/m and about 31 mN/m, as measured by a maximum bubble pressure tensiometer at a surface age of 50 ms and 25° C. The dynamic surface tension may be adjusted so that the contact angle with the strippable substrate or dielectric layer is between about 100° and about 165°.

在一例示性實施中,用於形成具有電阻率可選擇地較低之跡線之多層AME的噴墨油墨體系組合物及方法可藉由在基板或任何後續層上方在預定距離處例如以二(X-Y)(應理解,列印頭亦可在Z軸上移動)維形式當操縱列印頭(或基板/夾盤)時一次一個地自孔口排出本文中所提供之液體油墨液滴而圖案化。用於本文中所描述之方法中的所提供之噴墨列印頭可提供等於或小於約3 µm至10,000 µm之最小層膜厚度。In an exemplary implementation, an inkjet ink system composition and method for forming a multi-layer AME with traces having optionally low resistivity can be patterned by expelling droplets of a liquid ink provided herein from an orifice one at a time, for example, in two (X-Y) dimensions (it should be understood that the print head can also move in the Z axis) at a predetermined distance above the substrate or any subsequent layer while manipulating the print head (or substrate/chuck). The provided inkjet print heads used in the methods described herein can provide a minimum layer film thickness equal to or less than about 3 μm to 10,000 μm.

在一例示性實施中,導電油墨及/或介電油墨之每一液滴之體積可在0.5至300皮升(pL)範圍內,例如1至4 pL且視驅動脈衝之強度及油墨之性質而定。用於排出單一液滴之波形可為10 V至約70 V脈衝,或約16 V至約20 V,且可以約5 kHz與約500 kHz之間的頻率排出。In an exemplary implementation, the volume of each droplet of the conductive ink and/or dielectric ink may be in the range of 0.5 to 300 picoliters (pL), such as 1 to 4 pL and depending on the strength of the drive pulse and the properties of the ink. The waveform used to eject a single droplet may be a 10 V to about 70 V pulse, or about 16 V to about 20 V, and may be ejected at a frequency between about 5 kHz and about 500 kHz.

本文中所描述之介電油墨組合物可另外具有連續相,該連續相包含:交聯劑、共聚單體、共寡聚物、共聚物或包含前述物質中之一或多種的組合物。同樣,可藉由使聚合物與將在主鏈上形成自由基之試劑接觸來誘導寡聚物及/或聚合物主鏈以形成交聯,藉此允許交聯位點。在一例示性實施中,交聯劑、共聚單體、共寡聚物、共聚物或包含前述物質中之一或多種的組合物可為一部分或經組態以在連續相內形成溶液、乳液、凝膠或懸浮液。The dielectric ink compositions described herein may additionally have a continuous phase comprising: a crosslinking agent, a comonomer, a co-oligomer, a copolymer, or a composition comprising one or more of the foregoing. Likewise, the oligomer and/or polymer backbone may be induced to form crosslinks by contacting the polymer with an agent that will form free radicals on the backbone, thereby allowing crosslinking sites. In an exemplary implementation, the crosslinking agent, comonomer, co-oligomer, copolymer, or a composition comprising one or more of the foregoing may be part of or configured to form a solution, emulsion, gel, or suspension within the continuous phase.

在一例示性實施中,在使用用於形成具有電阻率可選擇地較低之跡線之多層AME的所揭示方法製造之AME(PCB、FPC及HDI電路)中使用之連續相可包含:多官能丙烯酸酯單體、寡聚物、聚合物或其組合;交聯劑;及自由基光引發劑,且可部分或完全地溶於連續相中。In an exemplary embodiment, the continuous phase used in an AME (PCB, FPC, and HDI circuits) fabricated using the disclosed method for forming a multi-layer AME having traces with optionally low resistivity may include: a multifunctional acrylate monomer, oligomer, polymer, or a combination thereof; a crosslinking agent; and a free radical photoinitiator, and may be partially or completely dissolved in the continuous phase.

可使用引發劑來引發介電樹脂主鏈聚合,該引發劑例如過氧化苯甲醯(BP)及其他含過氧化物之化合物。如本文中所使用之術語「引發劑」一般係指引發化學反應之物質,尤其是引發聚合之任何化合物,或產生引發聚合之反應性物種,包括例如且不限於共引發劑及/或光引發劑。An initiator may be used to initiate polymerization of the dielectric resin backbone, such as benzoyl peroxide (BP) and other peroxide-containing compounds. As used herein, the term "initiator" generally refers to a substance that initiates a chemical reaction, particularly any compound that initiates polymerization, or produces reactive species that initiate polymerization, including, for example and without limitation, co-initiators and/or photoinitiators.

在另一實施例中,在所描述之油墨組合物中使用之介電樹脂包含能夠使用光引發劑進行光引發的聚合物之活性及/或活組分。舉例而言,能夠進行光引發之此類活單體、活寡聚物、活聚合物或其組合可為例如多官能丙烯酸酯,例如,可為選自以下組成之群的多官能丙烯酸酯:1,2-乙二醇二丙烯酸酯、1,3-丙二醇二丙烯酸酯、1,4-丁二醇二丙烯酸酯、1,6-己二醇二丙烯酸酯、二丙二醇二丙烯酸酯、新戊二醇二丙烯酸酯、乙氧基化新戊二醇二丙烯酸酯、丙氧基化新戊二醇二丙烯酸酯、三丙二醇二丙烯酸酯、雙酚-A-二縮水甘油醚二丙烯酸酯、羥基特戊酸新戊二醇二丙烯酸酯、乙氧基化雙酚-A-二縮水甘油醚二丙烯酸酯、聚乙二醇二丙烯酸酯、三羥甲基丙烷三丙烯酸酯、乙氧基化三羥甲基丙烷三丙烯酸酯、丙氧基化三羥甲基丙烷三丙烯酸酯、丙氧基化甘油三丙烯酸酯、參(2-丙烯醯基氧基乙基)異氰尿酸酯、異戊四醇三丙烯酸酯、乙氧基化異戊四醇三丙烯酸酯、異戊四醇四丙烯酸酯、乙氧基化異戊四醇四丙烯酸酯、二(三羥甲基丙烷)四丙烯酸酯、二季戊四醇五丙烯酸酯及二季戊四醇六丙烯酸酯。In another embodiment, the dielectric resin used in the described ink composition comprises a reactive and/or active component of a polymer capable of being photo-triggered using a photoinitiator. For example, such a reactive monomer, reactive oligomer, reactive polymer, or combination thereof capable of being photo-triggered can be, for example, a multifunctional acrylate, for example, a multifunctional acrylate selected from the group consisting of 1,2-ethylene glycol diacrylate, 1,3-propylene glycol diacrylate, 1,4-butylene glycol diacrylate, 1,6-hexanediol diacrylate, dipropylene glycol diacrylate, neopentyl glycol diacrylate, ethoxylated neopentyl glycol diacrylate, propoxylated neopentyl glycol diacrylate, tripropylene glycol diacrylate, bisphenol-A-diglycidyl ether diacrylate, hydroxypivalate neopentyl glycol ... The present invention also includes pentylene glycol diacrylate, ethoxylated bisphenol-A-diglycidyl ether diacrylate, polyethylene glycol diacrylate, trihydroxymethylpropane triacrylate, ethoxylated trihydroxymethylpropane triacrylate, propoxylated trihydroxymethylpropane triacrylate, propoxylated glycerol triacrylate, tris(2-acryloxyethyl)isocyanurate, pentaerythritol triacrylate, ethoxylated pentaerythritol triacrylate, pentaerythritol tetraacrylate, ethoxylated pentaerythritol tetraacrylate, di(trihydroxymethylpropane)tetraacrylate, dipentaerythritol pentaacrylate and dipentaerythritol hexaacrylate.

本文中所描述之可與多官能丙烯酸酯一起使用的光引發劑可為例如自由基光引發劑。此等自由基光引發劑可為例如來自CIBA SPECIALTY CHEMICAL之Irgacure® 500,以及Darocur® 1173、Irgacure® 819、Irgacure® 184、TPO-L((2,4,6,三甲基苯甲醯)苯基亞膦酸乙酯)、二苯甲酮及苯乙酮化合物,及其類似物。舉例而言,自由基光引發劑可為陽離子光引發劑,諸如六氟銻酸三芳基鋶混合鹽。用於本文中所描述之活性連續相中的自由基光引發劑之另一實例可為2-異丙基噻噸酮。The photoinitiators that can be used with the multifunctional acrylates described herein can be, for example, free radical photoinitiators. Such free radical photoinitiators can be, for example, Irgacure® 500 from CIBA SPECIALTY CHEMICAL, as well as Darocur® 1173, Irgacure® 819, Irgacure® 184, TPO-L (ethyl (2,4,6, trimethylbenzoyl)phenylphosphinate), benzophenone and acetophenone compounds, and the like. For example, the free radical photoinitiator can be a cationic photoinitiator, such as triaryl iron salts of hexafluoroantimonate. Another example of a free radical photoinitiator used in the active continuous phase described herein can be 2-isopropylthiazolone.

術語「活單體」、「活寡聚物」、「聚合物」或其對應物(例如共聚單體)組合在一例示性實施中係指具有能夠形成自由基反應之至少一個官能基的單體、短單體基團或聚合物(換言之,反應可持續且不以其他方式藉由端基終止)。The terms "living monomer", "living oligomer", "polymer" or their equivalents (e.g., comonomer) in combination refer in an exemplary embodiment to a monomer, short monomer group, or polymer having at least one functional group capable of forming a free radical reaction (in other words, the reaction can continue and is not otherwise terminated by an end group).

用於本文中所描述之組合物、系統及方法中的用於形成具有電阻率可選擇地較低之跡線之多層AME的交聯劑可為例如一級或二級多元胺及其加合物,或在另一實例中為酸酐、聚醯胺、伸烷基各自獨立地包含2至6個碳原子的C4 -C30 聚氧化烯,或包含前述物質中之一或多種的組合物。The crosslinking agent used in the compositions, systems and methods described herein for forming a multilayer AME having traces with optionally low resistivity can be, for example, a primary or secondary polyamine and its adducts, or in another example, an anhydride, a polyamide, a C4 - C30 polyoxyalkylene wherein the alkylene groups each independently contain 2 to 6 carbon atoms, or a combination comprising one or more of the foregoing.

導電及/或介電油墨組合物可能各自需要界面活性劑及視情況輔助界面活性劑之存在。界面活性劑及/或輔助界面活性劑可為陽離子界面活性劑、陰離子界面活性劑、非離子界面活性劑及兩親共聚物,諸如嵌段共聚物。Conductive and/or dielectric ink compositions may each require the presence of a surfactant and, if appropriate, an auxiliary surfactant. The surfactant and/or auxiliary surfactant may be a cationic surfactant, an anionic surfactant, a nonionic surfactant, and an amphiphilic copolymer, such as a block copolymer.

此外,介電(絕緣)層部分可始終具有實質上均一的厚度,藉此形成實質上平面(例如,平坦)表面以用於接收額外導電電路圖案。介電層可為UV可固化黏著劑或其他聚合物材料。舉例而言,介電油墨包含UV可固化聚合物。其他介電聚合物諸如聚酯(PES)、聚乙烯(PE)、聚乙烯醇(PVOH)及聚甲基丙烯酸甲酯(PMMA)、聚(乙烯基吡咯啶酮)(PVP,為水溶性的且可有益於避免堵塞列印頭孔口)。其他介電材料可為光阻聚合物,例如SU-8基聚合物,亦可使用聚合物衍生之陶瓷或其組合及共聚物。In addition, the dielectric (insulating) layer portion may have a substantially uniform thickness throughout, thereby forming a substantially planar (e.g., flat) surface for receiving additional conductive circuit patterns. The dielectric layer may be a UV curable adhesive or other polymer material. For example, the dielectric ink includes a UV curable polymer. Other dielectric polymers include polyester (PES), polyethylene (PE), polyvinyl alcohol (PVOH) and polymethyl methacrylate (PMMA), poly (vinyl pyrrolidone) (PVP, which is water soluble and can be helpful in avoiding clogging the print head orifice). Other dielectric materials may be photoresist polymers, such as SU-8 based polymers, and polymer-derived ceramics or combinations and copolymers thereof may also be used.

用以實施本文中所提供之方法的噴墨系統可進一步包含電腦輔助製造(「CAM」)模組,該模組包含資料處理器、非揮發性記憶體及儲存於非揮發性記憶體上之一組可執行指令,該等可執行指令在經執行時經組態以使至少一個處理器進行以下操作:接收表示包含基礎架構元件之印刷電路板的3D可視化檔案;產生檔案之庫,每一檔案表示至少一個實質上2D層,該至少一個實質上2D層用於列印具有電阻率可選擇地較低之跡線的多層AME,從而形成實質上2D表示影像;接收與具有電阻率可選擇地較低之跡線之多層AME相關的一系列參數;及基於該一系列參數中之至少一者而更改表示至少一個實質上2D層之檔案,其中CAM模組經組態以控制第一列印頭及第二列印頭中之每一者。因此,該組可執行指令進一步經組態以在經執行時使處理器自3D可視化檔案產生複數個後續層之檔案的庫。每一後續檔案表示用於列印包含複數個嵌入式被動及主動組件之PCB之後續部分的實質上二維(2D)後續層,其中每一後續層檔案藉由列印次序編索引。此外,該組可執行指令可經組態以剖析出每一2D層之導電及介電部分,且自第一層開始針對每一層產生唯一圖案,此將指示恰當列印頭列印2D層之彼部分。The inkjet system for implementing the methods provided herein may further include a computer-aided manufacturing ("CAM") module including a data processor, a non-volatile memory, and a set of executable instructions stored in the non-volatile memory, wherein the executable instructions, when executed, are configured to cause at least one processor to perform the following operations: receive a 3D visualization file representing a printed circuit board including basic architectural components; generate a library of files, each file representing at least one The method further comprises: receiving a plurality of substantially 2D layers of AME having traces with selectively low resistivity, receiving a series of parameters related to the plurality of substantially 2D layers of AME having traces with selectively low resistivity, and modifying a file representing at least one substantially 2D layer based on at least one of the series of parameters, wherein the CAM module is configured to control each of the first print head and the second print head. Thus, the set of executable instructions is further configured to cause the processor to generate a library of files of a plurality of subsequent layers from the 3D visualization file when executed. Each subsequent file represents a substantially two-dimensional (2D) subsequent layer for printing a subsequent portion of a PCB including a plurality of embedded passive and active components, wherein each subsequent layer file is indexed by a printing order. In addition, the set of executable instructions can be configured to parse out the conductive and dielectric portions of each 2D layer and generate a unique pattern for each layer starting from the first layer, which will instruct the appropriate print head to print that portion of the 2D layer.

因此,CAM模組可包含:2D檔案庫,其儲存自包括內置被動及嵌入式主動組件之印刷電路板之3D可視化檔案轉換的檔案。如本文中所使用,術語「庫」係指來源於3D可視化檔案之2D層檔案之集合,其含有列印每一導電及介電圖案所需之資訊,該資訊可由資料收集應用程式訪問及使用,該資料收集應用程式可由電腦可讀媒體執行。每一檔案至少包含導電油墨(CI)及介電油墨(DI)之列印次序。庫中之層檔案將在同一層中具有CI及DI兩者之列印指令,然而,對應於CI及BI之每一圖案之列印次序可能會在層與層之間變化,且形成檔案庫之一部分。CAM進一步包含:與庫通信之處理器;儲存供處理器執行之一組操作指令的非暫時性儲存裝置;與處理器及庫通信之微機械噴墨列印頭;及與2D檔案庫、非暫時性儲存裝置及微機械噴墨列印頭通信之列印頭界面電路,該2D檔案庫經組態以提供特定針對功能(經列印)層之印表機操作參數。Thus, the CAM module may include: a 2D file library storing files converted from a 3D visualization file of a printed circuit board including built-in passive and embedded active components. As used herein, the term "library" refers to a collection of 2D layer files derived from a 3D visualization file, which contains the information required to print each conductive and dielectric pattern, which can be accessed and used by a data collection application that can be executed by a computer readable medium. Each file contains at least a print order for a conductive ink (CI) and a dielectric ink (DI). A layer file in the library will have print instructions for both CI and DI in the same layer, however, the print order for each pattern corresponding to CI and BI may vary from layer to layer and form part of the file library. The CAM further includes: a processor communicating with the library; a non-transitory storage device storing a set of operating instructions for execution by the processor; a micro-mechanical inkjet print head communicating with the processor and the library; and a print head interface circuit communicating with the 2D file library, the non-transitory storage device and the micro-mechanical inkjet print head, wherein the 2D file library is configured to provide printer operating parameters specific to the functional (printed) layer.

因此,在使用第一列印頭之步驟之前為以下步驟:使用CAM模組,自庫獲得所產生檔案,第一檔案表示具有電阻率可選擇地較低之跡線之多層AME的用於列印之第一實質上2D層,2D層包含表示介電油墨及導電油墨之圖案,其中在與具有電阻率可選擇地較低之跡線之多層AME相關的一系列參數中使用之參數包含例如:所需電阻率、中間跡線213i之數目、末端盲通孔233k之數目(與經耦接接觸墊204j之數目相關)、非末端埋通孔225k之數目、末端埋通孔226k之數目、其各別直徑及其組合。Therefore, the step of using the first print head is preceded by the following step: using a CAM module, obtaining a generated file from a library, the first file representing a first substantially 2D layer for printing of a multi-layer AME having traces with optionally lower resistivity, the 2D layer comprising patterns representing dielectric ink and conductive ink, wherein the parameters used in a series of parameters related to the multi-layer AME having traces with optionally lower resistivity include, for example: the required resistivity, the number of intermediate traces 213i, the number of end blind through holes 233k (related to the number of coupled contact pads 204j), the number of non-end buried through holes 225k, the number of end buried through holes 226k, their respective diameters and combinations thereof.

表示具有電阻率可選擇地較低之跡線之多層AME的3D可視化檔案可為:ODB、ODB++、.asm、STL、IGES、STEP、Catia、SolidWorks、Autocad、ProE、3D Studio、Gerber、Rhino、Altium、Orcad或包含前述中之一或多者之檔案;且其中表示至少一個實質上2D層(且上傳至庫)之檔案可為例如JPEG、GIF、TIFF、BMP、PDF檔案或包含前述中之一或多者之組合。The 3D visualization file representing a multi-layer AME with traces with optionally lower resistivity may be: ODB, ODB++, .asm, STL, IGES, STEP, Catia, SolidWorks, Autocad, ProE, 3D Studio, Gerber, Rhino, Altium, Orcad or a file comprising one or more of the foregoing; and the file representing at least one substantially 2D layer (and uploaded to the library) may be, for example, a JPEG, GIF, TIFF, BMP, PDF file or a combination comprising one or more of the foregoing.

另外,電腦程式可包含用於進行本文中所描述之方法之步驟的程式碼構件,以及儲存於可由電腦讀取之媒體上的包含程式碼構件之電腦程式產品。如本文中所描述之方法中所使用的非暫時性儲存裝置可為各種類型之非揮發性記憶體裝置或儲存裝置中之任一者(換言之,在無電源時不會丟失資訊之記憶體裝置)。術語「記憶體裝置」意欲涵蓋安裝媒體,例如CD-ROM、軟碟或磁帶裝置或非揮發性記憶體,諸如磁性媒體,例如硬驅動機、光學儲存器,或ROM、EPROM、FLASH等。記憶體裝置亦可包含其他類型之記憶體或其組合。另外,記憶體媒體可位於執行程式之第一電腦(例如,所提供之3D噴墨印表機)中,及/或可位於經由諸如網際網路之網路連接至第一電腦之第二不同電腦中。在後一種情況下,第二電腦可將程式指令進一步提供至第一電腦以供執行。術語「記憶體裝置」亦可包括可駐存於不同位置中,例如可駐存於經由網路連接之不同電腦中的兩個或更多個記憶體裝置。因此,舉例而言,點陣圖庫可駐留於遠離與所提供之3D噴墨印表機耦接之CAM模組之記憶體裝置上,且可由所提供之3D噴墨印表機訪問(例如藉由廣域網路)。In addition, the computer program may include program code components for performing the steps of the method described herein, and a computer program product containing the program code components stored on a medium that can be read by a computer. The non-transitory storage device used in the method described herein can be any of various types of non-volatile memory devices or storage devices (in other words, a memory device that does not lose information when there is no power). The term "memory device" is intended to cover installation media, such as CD-ROM, floppy disk or tape devices or non-volatile memory, such as magnetic media, such as hard drives, optical storage, or ROM, EPROM, FLASH, etc. The memory device may also include other types of memory or combinations thereof. In addition, the memory medium may be located in a first computer (e.g., a provided 3D inkjet printer) executing a program, and/or may be located in a second different computer connected to the first computer via a network such as the Internet. In the latter case, the second computer may further provide the program instructions to the first computer for execution. The term "memory device" may also include two or more memory devices that may reside in different locations, such as two or more memory devices that may reside in different computers connected via a network. Thus, for example, a bitmap library may reside on a memory device remote from a CAM module coupled to a provided 3D inkjet printer, and may be accessed by the provided 3D inkjet printer (e.g., via a wide area network).

術語「模組」之使用並不暗示所描述或主張為模組之部分的組件或功能性全部組態在(單一)共同封裝中。實情為,模組之各種組件(無論為控制邏輯抑或其他組件)中的任一者或全部可組合於單一封裝中或分開地維護,且可進一步分佈於多個群組或封裝中或跨越多個(遠端)位置及裝置而分佈。此外,在某些例示性實施中,術語「模組」係指整體式或分佈式硬體單元。The use of the term "module" does not imply that the components or functionality described or claimed as part of the module are all configured in a (single) common package. Rather, any or all of the various components of the module (whether control logic or other components) may be combined in a single package or maintained separately, and may further be distributed in multiple groups or packages or across multiple (remote) locations and devices. Furthermore, in certain exemplary implementations, the term "module" refers to an integrated or distributed hardware unit.

如本文中所使用之術語「包含」及其派生詞意欲為指定所陳述之特徵、元件、組件、群組、整數及/或步驟之存在但不排除其他未陳述之特徵、元件、組件、群組、整數及/或步驟之存在的開放術語。前述內容亦適用於具有類似含義的字組,諸如術語「包括」、「具有」及其派生詞。As used herein, the term "comprise" and its derivatives are intended to be open terms that specify the presence of stated features, elements, components, groups, integers and/or steps but do not exclude the presence of other unstated features, elements, components, groups, integers and/or steps. The foregoing also applies to words with similar meanings, such as the terms "include", "have" and their derivatives.

除非另外特定陳述,否則如自以下論述顯而易見,應瞭解,貫穿本說明書,利用諸如「處理」、「載入」、「通信」、「偵測」、「計算」、「判定」、「分析」或其類似者之術語的論述係指電腦或計算系統或類似電子計算裝置之動作及/或製程,該等動作及製程將諸如電晶體架構之表示為實體的資料操縱及/或變換成類似地表示為實體結構(換言之,樹脂或金屬/金屬性)層之其他資料。Unless otherwise specifically stated, it should be understood as apparent from the following discussion that throughout this specification, discussions utilizing terms such as "processing," "loading," "communication," "detection," "computing," "determining," "analysis," or the like, refer to actions and/or processes of a computer or computing system or similar electronic computing device that manipulate and/or transform data represented as physical objects, such as transistor structures, into other data similarly represented as physical structures (in other words, resin or metal/metallic properties) layers.

方法、程式及庫中使用之與待製造的本文中之包括電阻率減小之跡線之AME相關聯的電腦輔助設計/電腦輔助製造(CAD/CAM)產生之資訊可基於經轉換之CAD/CAM資料封裝,其可為例如IGES、DXF、DWG、DMIS、NC檔案、GERBER®檔案、EXCELLON®、STL、EPRT檔案、ODB、ODB++、.asm、STL、IGES、STEP、Catia、SolidWorks、Autocad、ProE、3D Studio、Gerber、Rhino、Altium、Orcad、Eagle檔案或包含前述中之一或多者之封裝。另外,與圖形物件相關之屬性傳送製造所需之元資訊且可精確地定義PCB。因此且在一例示性實施中,使用預處理演算法,將如本文中所描述之GERBER®、EXCELLON®、DWG、DXF、STL、EPRT ASM及其類似者轉換成2D檔案。The computer-aided design/computer-aided manufacturing (CAD/CAM) generated information associated with the AME including the reduced resistivity traces herein to be manufactured used in the methods, procedures and libraries can be based on a converted CAD/CAM data package, which can be, for example, IGES, DXF, DWG, DMIS, NC files, GERBER® files, EXCELLON®, STL, EPRT files, ODB, ODB++, .asm, STL, IGES, STEP, Catia, SolidWorks, Autocad, ProE, 3D Studio, Gerber, Rhino, Altium, Orcad, Eagle files, or a package containing one or more of the foregoing. In addition, the attributes associated with the graphic objects convey the meta-information required for manufacturing and can accurately define the PCB. Therefore and in one exemplary implementation, GERBER®, EXCELLON®, DWG, DXF, STL, EPRT ASM and the like as described herein are converted into 2D files using a pre-processing algorithm.

本文中所揭示之所有範圍皆包括端點,且各端點可獨立地彼此組合。「組合」包括摻合物、混合物、合金、反應產物及其類似物。除非本文中另有指示或與上下文明顯矛盾,否則本文中之術語「一」及「該」不表示數目之限制,且應解釋為涵蓋單數及複數。如本文中所使用,後綴「(s)」意欲包括其修飾之術語的單數及複數兩者,藉此包括彼術語中之一或多者(例如,跡線包括一或多個跡線)。當存在時,貫穿本說明書對「一個實施例」、「另一實施例」、「一例示性實施」等之參考意謂結合該實施例所描述之特定元件(例如,特徵、結構及/或特性)包括於本文中所描述之至少一個實施例中,且可能存在於或可能不存在於其他例示性實施中。另外,應理解,所描述之元件可在各種例示性實施中以任何適合的方式組合。All ranges disclosed herein are inclusive of endpoints, and the endpoints are independently combinable with each other. "Combination" includes blends, mixtures, alloys, reaction products, and the like. Unless otherwise indicated herein or clearly contradicted by context, the terms "a", "an", and "the" herein do not indicate a limitation of number and should be interpreted as covering both the singular and the plural. As used herein, the suffix "(s)" is intended to include both the singular and the plural of the term it modifies, thereby including one or more of the term (e.g., a trace includes one or more traces). When present, references throughout this specification to "one embodiment," "another embodiment," "an exemplary implementation," etc. mean that particular elements (e.g., features, structures, and/or characteristics) described in connection with that embodiment are included in at least one embodiment described herein, and may or may not be present in other exemplary implementations. In addition, it should be understood that the described elements may be combined in any suitable manner in the various exemplary implementations.

本文中所揭示之所有範圍皆包括端點,且各端點可獨立地彼此組合。此外,在本文中,術語「第一」、「第二」及其類似術語不表示任何次序、數目或重要性,而是用於表示一個元件與另一個元件。All ranges disclosed herein include endpoints, and each endpoint can be independently combined with each other. In addition, in this article, the terms "first", "second" and similar terms do not represent any order, number or importance, but are used to indicate one element and another element.

類似地,術語「約」意謂量、尺寸、調配物、參數及其他量及特性並非且無需為精確的,而是可視需要為近似的及/或更大或更小,從而反映公差、轉換因素、捨入、量測誤差及其類似者,以及本領域中熟習此項技術者已知的其他因素。通常,無論是否明確地陳述,量、尺寸、調配物、參數或其他數目或特徵皆為「約」或「近似」的。Similarly, the term "about" means that amounts, dimensions, formulations, parameters, and other quantities and characteristics are not and need not be exact, but may be approximate and/or larger or smaller as necessary, reflecting tolerances, conversion factors, rounding, measurement errors, and the like, as well as other factors known to those skilled in the art. In general, amounts, dimensions, formulations, parameters, or other numbers or characteristics are "about" or "approximate", whether or not expressly stated.

因此,在一例示性實施中,本文中提供一種減小一多層經積層製造之電子裝置(AME)中之至少兩個已連接組件之間的跡線電阻率之方法,其包含:在一中間層上形成至少一個跡線,藉此形成一中間跡線;形成一跡線,其經大小設定且經組態以在以下中之至少一者上可操作地耦接至少兩個組件:該多層AME之一外部頂端層及外部基底層,藉此形成至少一個外部跡線;及形成一預定數目個以下中之至少一者:一盲通孔及一埋通孔,該預定數目個通孔經大小設定且經組態以電耦接該多層AME之至少一個中間跡線及一對應外部跡線,其中該方法進一步(i)包含:在該外部跡線之末端中之一者處形成至少一個接觸墊,該接觸墊經調適、經大小設定且經組態以可操作地耦接至一組件,其中(ii)該預定數目個該盲通孔及該埋通孔中之至少一者;該至少一個中間跡線;及該外部跡線的組合電阻率經組態以提供在無該等中間跡線之情況下為該外部跡線之電阻率之一預定分數的電阻率,該方法進一步(iii)包含形成複數個中間跡線,每一中間跡線沿該多層AME之一豎直軸線安置於一單獨層中,(iv)將該複數個中間跡線中之每一中間跡線耦接至一鄰近中間跡線,從而在鄰近中間跡線之間形成複數個埋通孔,(v)在該等中間跡線中之每一者之該末端處形成一末端埋通孔,每一末端埋通孔形成為具有一面積大於一非末端埋通孔中之每一者的一橫截面,(vi)在緊鄰該外部跡線之該中間跡線之每一末端處形成一末端盲通孔,該末端盲通孔形成為具有一面積大於一非末端埋通孔中之每一者的一橫截面,其中(vii)該外部跡線、預定數目個該盲通孔及該埋通孔中之至少一者、該等末端埋通孔、該等末端盲通孔及該複數個中間跡線中之至少一者形成自該外部跡線豎直地延伸至該多層AME中之一晶格,其中(viii)所形成之中間跡線之一寬度寬於該外部跡線之寬度,且其中(ix)該等鄰近中間跡線之間的該複數個埋通孔中之至少一者為傾斜的。Thus, in an exemplary implementation, a method of reducing the resistivity of a trace between at least two connected components in a multi-layer fabricated electronic device (AME) is provided herein, comprising: forming at least one trace on an intermediate layer, thereby forming an intermediate trace; forming a trace sized and configured to operably couple at least two components on at least one of: an external top layer and an external base layer of the multi-layer AME, thereby forming at least one external trace; and forming a predetermined number of at least one of: a blind via and a buried via, the predetermined number a plurality of through holes sized and configured to electrically couple at least one intermediate trace and a corresponding external trace of the multi-layer AME, wherein the method further (i) comprises: forming at least one contact pad at one of the ends of the external trace, the contact pad being adapted, sized and configured to be operably coupled to a component, wherein (ii) the combined resistivity of at least one of the predetermined number of the blind vias and the buried vias; the at least one intermediate trace; and the external trace is configured to provide a resistivity that is a predetermined fraction of the resistivity of the external trace in the absence of the intermediate traces. The method further comprises (iii) forming a plurality of intermediate traces, each intermediate trace being disposed in a single layer along a vertical axis of the multi-layer AME, (iv) coupling each of the plurality of intermediate traces to an adjacent intermediate trace, thereby forming a plurality of buried vias between the adjacent intermediate traces, (v) forming an end buried via at the end of each of the intermediate traces, each end buried via being formed to have a cross-section having an area larger than that of each of the non-end buried vias, (vi) forming an end buried via at each end of the intermediate trace adjacent to the outer trace. An end blind via hole, the end blind via hole is formed to have a cross-section having an area larger than each of a non-end buried via hole, wherein (vii) the outer trace, the predetermined number of the blind via holes and at least one of the buried via holes, the end buried via holes, the end blind via holes and at least one of the plurality of intermediate traces are formed to extend vertically from the outer trace to a lattice in the multi-layer AME, wherein (viii) a width of the intermediate trace is formed to be wider than a width of the outer trace, and wherein (ix) at least one of the plurality of buried via holes between the adjacent intermediate traces is tilted.

在另一例示性實施中,本文中提供一種多層經積層製造之電子裝置(AME),其包含:至少一個中間跡線,其在一中間層上;至少一個外部跡線,其經大小設定且經組態以在以下中之至少一者上可操作地耦接至少兩個組件:該AME之一外部頂端層及外部基底層;及一預定數目個以下中之至少一者:一盲通孔及一埋通孔,該盲通孔及該埋通孔電耦接該中間跡線與該外部跡線,其中(x)該外部跡線在一接觸墊中之至少一個端部上終止,該接觸墊經調適、經大小設定且經組態以可操作地耦接至一組件,(xi)該預定數目個該盲通孔及該埋通孔中之至少一者經組態以提供在無該至少一個中間跡線之情況下為該外部跡線之電阻率之分數的電阻率,其中(xii)該多層AME包含複數個中間跡線,每一中間跡線沿該多層AME之一豎直軸線安置於一單獨中間層中,(xiii)該複數個中間跡線中之每一中間跡線耦接至一鄰近中間跡線,其中在緊鄰中間跡線之間有複數個埋通孔,(xiv)該複數個中間跡線中之每一中間跡線在一末端埋通孔中終止,該末端埋通孔具有一面積大於一非末端埋通孔中之每一者的一橫截面,(xv)緊鄰該外部跡線之該中間層在一末端盲通孔中終止,該末端盲通孔形成為具有一面積大於一非末端埋通孔中之每一者的一橫截面,且其中(xvi)該外部跡線、預定數目個該盲通孔及該埋通孔中之至少一者、該等末端埋通孔、該等末端盲通孔及該複數個中間跡線中之至少一者形成自該外部跡線豎直地延伸至該多層AME中之一晶格。In another exemplary implementation, a multi-layer fabricated electronic device (AME) is provided herein, comprising: at least one intermediate trace on an intermediate layer; at least one external trace sized and configured to operably couple at least two components on at least one of: an external top layer and an external base layer of the AME; and a predetermined number of at least one of: a blind via and a buried via, the blind via and the buried via being connected to each other. wherein (x) the outer trace terminates at least one end in a contact pad adapted, sized and configured to be operably coupled to a component, (xi) at least one of the predetermined number of the blind vias and the buried vias is configured to provide a resistivity that is a fraction of the resistivity of the outer trace in the absence of the at least one intermediate trace, and (xii) the multi-layer AME comprises a plurality of a plurality of intermediate traces, each intermediate trace disposed in a single intermediate layer along a vertical axis of the multi-layer AME, (xiii) each intermediate trace of the plurality of intermediate traces is coupled to an adjacent intermediate trace, wherein there are a plurality of buried vias between the adjacent intermediate traces, (xiv) each intermediate trace of the plurality of intermediate traces terminates in an end buried via, the end buried via having a cross-section having an area greater than each of the non-end buried vias, (xv) the intermediate layer adjacent to the outer trace terminates in a terminal blind via formed to have a cross-section having an area greater than each of the non-terminal buried vias, and wherein (xvi) the outer trace, the predetermined number of the blind vias and at least one of the buried vias, the terminal buried vias, the terminal blind vias and at least one of the plurality of intermediate traces form a lattice extending vertically from the outer trace to the multi-layer AME.

在又一例示性實施中,本文中提供一種使用噴墨印表機來製造一多層經積層製造之電子裝置(AME)中之至少兩個已連接組件之間電阻率減小之一跡線的電腦化方法,其包含:提供一噴墨列印系統,其包含:一第一列印頭,其可操作以分配一介電油墨組合物;一第二列印頭,其可操作以分配一導電油墨組合物;一輸送機,其可操作地耦接至該第一列印頭及該第二列印頭,該輸送機經組態以將一基板輸送至該第一列印頭及該第二列印頭中之每一者;及一電腦輔助製造(「CAM」)模組,其包括一中心處理模組(CPM),該CAM與該第一列印頭及該第二列印頭中之每一者通信,其中該CPM進一步包含:至少一個處理器,其與一非暫時性儲存媒體通信,儲存於該非暫時性儲存媒體上之一組可執行指令經組態以在經執行時使該CPM執行以下步驟:接收表示具有電阻率減小之跡線之該多層AME的一3D可視化檔案;及產生具有複數個檔案之一檔案庫,每一檔案表示用於列印LPF之一實質上2D層且一元檔案至少表示列印次序;其中該CAM模組經組態以控制該輸送機、該第一列印頭及該第二列印頭中之每一者;提供該介電油墨組合物及該導電油墨組合物;使用該CAM模組,自該庫獲得表示用於列印具有該等電阻率減小之跡線之該多層AME之第一層的一第一檔案,該第一檔案包含表示以下中之至少一者之一圖案的列印指令:該介電油墨及該導電油墨;使用該第一列印頭,形成對應於該介電油墨之該圖案;使用電磁輻射源,固化對應於該多層AME之該2D層中之介電油墨表示的該圖案;使用該第二列印頭,形成對應於該導電油墨之該圖案;利用熱來燒結對應於該導電油墨之該圖案;使用該CAM模組,自該庫獲得表示用於列印具有該等電阻率減小之跡線之該多層AME之一後續層的一後續檔案,該後續檔案包含表示以下中之至少一者之一圖案的列印指令:該介電油墨及該導電油墨;重複以下步驟:使用該第一列印頭,形成對應於該介電油墨之該圖案,直至使用該CAM模組自2D檔案庫獲得後續實質上2D層的步驟,其中在最終實質上2D層中燒結導電油墨圖案後,該多層AME經組態以包含:至少一個中間跡線,其在一中間層上;至少一個外部跡線,其經大小設定且經組態以在以下中之至少一者上可操作地耦接至少兩個組件:該多層AME之一外部頂端層及外部基底層;及一預定數目個以下中之至少一者:一盲通孔及一埋通孔,該盲通孔及該埋通孔電耦接該中間跡線與該外部跡線;及移除該基板,其中(xvii)該外部跡線在一接觸墊中之至少一個端部上終止,該接觸墊經調適、經大小設定且經組態以可操作地耦接至一組件,(xviii)該預定數目個該盲通孔及該埋通孔中之至少一者經組態以提供作為該外部跡線之電阻率之分數的電阻率,其中在該最終實質上2D層中燒結該導電油墨後(xix),該多層AME經組態以包含複數個中間跡線,每一中間跡線沿該多層AME之一豎直軸線安置於一單獨層中,(xx)該複數個中間跡線中之每一中間跡線耦接至一鄰近中間跡線,其中在緊鄰中間跡線之間有複數個埋通孔,(xxi)該複數個中間跡線中之每一中間跡線在一末端埋通孔中終止,該末端埋通孔具有一面積大於一非末端埋通孔中之每一者的一橫截面,(xxii)緊鄰該外部跡線之該中間層在一末端盲通孔中終止,該末端盲通孔形成為具有一面積大於每一該等非末端埋通孔的一橫截面,(xxiii)該外部跡線、預定數目個該盲通孔及該埋通孔中之至少一者、該等末端埋通孔、該等末端盲通孔及該複數個中間跡線中之至少一者來自自該外部跡線豎直地延伸至該多層AME中之一晶格,(xxiv)所形成之中間跡線之一寬度寬於該外部跡線之寬度,且(xxv)其中在該最終實質上2D層中燒結該導電油墨圖案後,該等鄰近中間跡線之間的該複數個埋通孔中之至少一者為傾斜的。In yet another exemplary implementation, a computerized method for using an inkjet printer to fabricate a trace with reduced resistivity between at least two connected components in a multi-layer fabricated electronic device (AME) is provided herein, comprising: providing an inkjet printing system, comprising: a first print head operable to dispense a dielectric ink composition; a second print head operable to dispense a conductive ink composition; a conveyor operably coupled to the first print head and the second print head, the conveyor being configured to transport a substrate to the first print head and the second print head; each of the print heads; and a computer-aided manufacturing ("CAM") module including a central processing module (CPM), the CAM communicating with each of the first print head and the second print head, wherein the CPM further comprises: at least one processor communicating with a non-transitory storage medium, a set of executable instructions stored on the non-transitory storage medium configured to cause the CPM to perform the following steps when executed: receiving a 3D visualization file representing the multi-layer AME having traces with reduced resistivity; and generating a file library having a plurality of files, Each file represents a substantially 2D layer for printing an LPF and a meta file represents at least a printing order; wherein the CAM module is configured to control each of the conveyor, the first print head and the second print head; provide the dielectric ink composition and the conductive ink composition; using the CAM module, obtain from the library a first file representing a first layer of the multi-layer AME having the traces with reduced resistivity, the first file including print instructions representing a pattern of at least one of the following: the dielectric ink and the conductive ink; using the first print head, forming the pattern corresponding to the dielectric ink; curing the pattern represented by the dielectric ink in the 2D layer corresponding to the multi-layer AME using an electromagnetic radiation source; forming the pattern corresponding to the conductive ink using the second print head; sintering the pattern corresponding to the conductive ink using heat; obtaining from the library, using the CAM module, a subsequent file representing a subsequent layer of the multi-layer AME having the traces with reduced resistivity, the subsequent file including print instructions representing a pattern of at least one of the following: the dielectric ink and the conductive ink; repeating the following steps: Using the first print head, forming the pattern corresponding to the dielectric ink until the step of obtaining a subsequent substantially 2D layer from the 2D file library using the CAM module, wherein after sintering the conductive ink pattern in the final substantially 2D layer, the multi-layer AME is configured to include: at least one intermediate trace, which is on an intermediate layer; at least one external trace, which is sized and configured to operably couple at least two components on at least one of the following: an external top layer and an external base layer of the multi-layer AME; and a predetermined number of at least one of the following: a blind through hole and a a buried via, the blind via and the buried via electrically coupling the intermediate trace with the outer trace; and removing the substrate, wherein (xvii) the outer trace terminates at least one end in a contact pad, the contact pad being adapted, sized and configured to be operably coupled to a component, (xviii) at least one of the predetermined number of the blind vias and the buried vias is configured to provide a resistivity that is a fraction of the resistivity of the outer trace, wherein after sintering the conductive ink in the final substantially 2D layer (xix), the multi-layer AME is configured to include a plurality of intermediate traces and the outer traces; traces, each intermediate trace being disposed in a single layer along a vertical axis of the multi-layer AME, (xx) each of the plurality of intermediate traces is coupled to an adjacent intermediate trace, wherein there are a plurality of buried vias between the adjacent intermediate traces, (xxi) each of the plurality of intermediate traces terminates in an end buried via having a cross-section with an area greater than each of the non-end buried vias, (xxii) the intermediate layer adjacent to the outer trace terminates in an end blind via formed to have an area greater than each of the non-end buried vias. a cross-section of the non-terminal buried vias, (xxiii) the outer trace, at least one of the predetermined number of the blind vias and the buried via, the terminal buried vias, the terminal blind vias and at least one of the plurality of intermediate traces are from extending vertically from the outer trace to a lattice in the multi-layer AME, (xxiv) a width of the intermediate trace formed is wider than a width of the outer trace, and (xxv) wherein after firing the conductive ink pattern in the final substantially 2D layer, at least one of the plurality of buried vias between the adjacent intermediate traces is tilted.

當然,以上實例及描述僅出於說明之目的而提供,且並不意欲以任何方式限制所揭示之技術。如本領域中熟習此項技術者將瞭解,可以多種方式實施所揭示之技術,該等方式採用上文所描述之彼等技術中之多於一種技術,所有此等皆不超出本發明之範疇。Of course, the above examples and descriptions are provided for illustrative purposes only and are not intended to limit the disclosed technology in any way. As will be appreciated by those skilled in the art, the disclosed technology can be implemented in a variety of ways, which employ more than one of the techniques described above, all of which are within the scope of the present invention.

100:多層印刷電路板(PCB) 101:外部基底層 102:外部頂端層 103i:外部跡線 104j:接觸墊 106q:接觸墊 107k:穿通孔 200:多層經積層製造之電子裝置(AME)/多層PCB 201:外部基底層 202:外部頂端層 203i:外部跡線 204j:接觸墊 213i:中間跡線 224k:盲通孔 225k:埋通孔 226k:埋通孔 233k:盲通孔 253i:晶格/增強跡線 303i:跡線 500n:組件 h:跡線厚度 W:跡線寬度100: Multilayer printed circuit board (PCB) 101: External base layer 102: External top layer 103i: External trace 104j: Contact pad 106q: Contact pad 107k: Through hole 200: Multilayer Amplitude-Added Electronic Device (AME)/Multilayer PCB 201: External base layer 20 2: External top layer 203i: External trace 204j: Contact pad 213i: Middle trace 224k: Blind via 225k: Buried via 226k: Buried via 233k: Blind via 253i: Lattice/enhanced trace 303i: Trace 500n: Component h: Trace thickness W: Trace width

為了更好地理解用於例如使用多層印刷電路板(PCB)、可撓性印刷電路(FPC)及高密度互連印刷電路(HDI電路)之直接噴墨列印在多層印刷電路板中形成電阻率可選擇地減小之跡線的方法,關於其例示性實施參考隨附實例及圖式,在該等圖式中:In order to better understand the method for forming traces with selectively reduced resistivity in multi-layer printed circuit boards (PCBs), flexible printed circuits (FPCs), and high density interconnect printed circuits (HDI circuits) using direct inkjet printing, for example, reference is made to the accompanying examples and drawings for exemplary implementations thereof, in which:

圖1示出了具有固定面積之跡線的透視示意圖;FIG1 shows a perspective schematic diagram of a trace with a fixed area;

圖2示出了使用所揭示方法形成之電阻率減小之跡線的透視示意圖;且FIG. 2 shows a perspective schematic diagram of a reduced resistivity trace formed using the disclosed method; and

圖3示出了使用先前技術形成之佈線板的頂部平面圖。FIG. 3 shows a top plan view of a wiring board formed using prior art techniques.

100:多層印刷電路板(PCB)100:Multi-layer printed circuit board (PCB)

101:外部基底層101: External base layer

102:外部頂端層102: External top layer

103i:外部跡線103i: External trace

104j:接觸墊104j:Contact pad

106q:接觸墊106q: Contact pad

107k:穿通孔107k:Through hole

h:跡線厚度h: trace thickness

W:跡線寬度W: trace width

Claims (28)

一種減小一多層經積層製造之電子裝置(AME)中之至少兩個已連接組件之間的跡線電阻率之方法,其包含:a.在一中間層上形成至少一個跡線,藉此形成一中間跡線;b.形成一跡線,其經大小設定且經組態以在以下中之至少一者上可操作地耦接至少兩個組件:該多層AME之一外部頂端層及外部基底層,藉此形成至少一個外部跡線;及c.形成一預定數目個以下中之至少一者:一盲通孔及一埋通孔,該預定數目個通孔經大小設定且經組態以電耦接該多層AME之該至少一個中間跡線及一對應外部跡線,其中在該至少一個外部跡線與該至少一個中間跡線之間之一末端盲通孔具有一橫截面直徑,該橫截面直徑大於至少一個非末端埋通孔之一橫截面之一直徑。 A method of reducing the resistivity of a trace between at least two connected components in a multi-layered electronic device (AME), comprising: a. forming at least one trace on an intermediate layer, thereby forming an intermediate trace; b. forming a trace sized and configured to operably couple at least two components on at least one of: an external top layer and an external base layer of the multi-layered AME, thereby forming at least one external trace; and c. forming a predetermined number of at least one of: a blind via and a buried via, the predetermined number of vias being sized and configured to electrically couple the at least one middle trace and a corresponding outer trace of the multi-layer AME, wherein an end blind via between the at least one outer trace and the at least one middle trace has a cross-sectional diameter that is greater than a diameter of a cross-sectional area of at least one non-end buried via. 如請求項1之方法,其進一步包含:在該外部跡線之末端處形成至少一個接觸墊,該接觸墊經調適、經大小設定且經組態以可操作地耦接至一組件。 The method of claim 1, further comprising: forming at least one contact pad at the end of the external trace, the contact pad being adapted, sized and configured to be operably coupled to a component. 如請求項2之方法,其中該預定數目個該盲通孔及該埋通孔中之至少一者;該至少一個中間跡線;及該外部跡線的組合電阻率經組態以提供在無該等中間跡線之情況下為該外部跡線之電阻率之一預定分數的電阻率。 The method of claim 2, wherein the combined resistivity of the predetermined number of at least one of the blind vias and the buried vias; the at least one intermediate trace; and the outer trace is configured to provide a resistivity that is a predetermined fraction of the resistivity of the outer trace in the absence of the intermediate traces. 如請求項3之方法,其進一步包含形成複數個中間跡線,每一中間跡線沿該多層AME之一豎直軸線安置於一單獨層中。 The method of claim 3 further comprises forming a plurality of intermediate traces, each intermediate trace being disposed in a single layer along a vertical axis of the multi-layer AME. 如請求項4之方法,其進一步包含將該複數個中間跡線中之每一中間跡線耦接至一鄰近中間跡線,從而在鄰近中間跡線之間形成複數個埋 通孔。 The method of claim 4 further comprises coupling each of the plurality of intermediate traces to an adjacent intermediate trace, thereby forming a plurality of buried vias between the adjacent intermediate traces. 如請求項5之方法,其進一步包含在該等中間跡線中之每一者之該末端處形成一末端埋通孔,每一末端埋通孔形成為具有一面積大於該至少一個非末端埋通孔中之每一者的一橫截面。 The method of claim 5 further comprises forming an end buried via at the end of each of the intermediate traces, each end buried via being formed to have a cross-section having an area larger than each of the at least one non-end buried via. 如請求項6之方法,其進一步包含在緊鄰該外部跡線之該中間跡線之每一末端處形成該末端盲通孔,該末端盲通孔形成為具有一面積大於該至少一個非末端埋通孔中之每一者的一橫截面。 The method of claim 6 further comprises forming the terminal blind via at each end of the middle trace adjacent to the outer trace, the terminal blind via being formed to have a cross-section having an area larger than each of the at least one non-terminal buried via. 如請求項7之方法,其中:該外部跡線、預定數目個該盲通孔及該埋通孔中之至少一者、該等末端埋通孔、該等末端盲通孔及該複數個中間跡線中之至少一者形成自該外部跡線豎直地延伸至該多層AME中之一晶格。 The method of claim 7, wherein: the external trace, the predetermined number of the blind vias and at least one of the buried vias, the terminal buried vias, the terminal blind vias and at least one of the plurality of intermediate traces form a lattice extending vertically from the external trace to the multi-layer AME. 如請求項4之方法,其中所形成之中間跡線之一寬度寬於該外部跡線之寬度。 A method as claimed in claim 4, wherein a width of the intermediate trace formed is wider than a width of the outer trace. 如請求項5之方法,其中該等鄰近中間跡線之間的該複數個埋通孔中之至少一者為傾斜的。 The method of claim 5, wherein at least one of the plurality of buried vias between the adjacent intermediate traces is tilted. 一種多層AME,其包含:a.至少一個中間跡線,其在一中間層上;b.至少一個外部跡線,其經大小設定且經組態以在以下中之至少一者上可操作地耦接至少兩個組件:該AME之一外部頂端層及外部基底層;及c.一預定數目個以下中之至少一者:一盲通孔及一埋通孔,該盲通孔及該埋通孔電耦接該中間跡線與該外部跡線,其中在該至少一個外部跡線與該至少一個中間跡線之間之一末端盲通孔具有一橫截面直徑,該橫截面直徑大於至少一個非末端埋通孔之一橫截面之一直 徑。 A multi-layer AME, comprising: a. at least one middle trace on a middle layer; b. at least one external trace sized and configured to operably couple at least two components on at least one of: an external top layer and an external base layer of the AME; and c. a predetermined number of at least one of: a blind via and a buried via, the blind via and the buried via electrically coupling the middle trace with the external trace, wherein an end blind via between the at least one external trace and the at least one middle trace has a cross-sectional diameter that is greater than a diameter of a cross-sectional area of at least one non-end buried via. 如請求項11之多層AME,其中該外部跡線在一接觸墊中之至少一個端部上終止,該接觸墊經調適、經大小設定且經組態以可操作地耦接至一組件。 A multi-layer AME as claimed in claim 11, wherein the external trace terminates at least one end in a contact pad adapted, sized and configured to be operably coupled to a component. 如請求項12之多層AME,其中該預定數目個該盲通孔及該埋通孔中之至少一者經組態以提供在無該至少一個中間跡線之情況下為該外部跡線之電阻率之分數的電阻率。 The multi-layer AME of claim 12, wherein at least one of the predetermined number of the blind vias and the buried vias is configured to provide a resistivity that is a fraction of the resistivity of the outer trace in the absence of the at least one intermediate trace. 如請求項13之多層AME,其中該多層AME包含複數個中間跡線,每一中間跡線沿該多層AME之一豎直軸線安置於一單獨中間層中。 A multi-layer AME as claimed in claim 13, wherein the multi-layer AME comprises a plurality of intermediate traces, each of which is disposed in a separate intermediate layer along a vertical axis of the multi-layer AME. 如請求項14之多層AME,其中該複數個中間跡線中之每一中間跡線耦接至一鄰近中間跡線,其中在緊鄰中間跡線之間有複數個埋通孔。 A multi-layer AME as claimed in claim 14, wherein each of the plurality of intermediate traces is coupled to an adjacent intermediate trace, wherein there are a plurality of buried vias between the adjacent intermediate traces. 如請求項15之多層AME,其中該複數個中間跡線中之每一中間跡線在一末端埋通孔中終止,該末端埋通孔具有一面積大於該至少一個非末端埋通孔中之每一者的一橫截面。 A multi-layer AME as claimed in claim 15, wherein each of the plurality of intermediate traces terminates in a terminal buried via, the terminal buried via having a cross-section having an area greater than each of the at least one non-terminal buried via. 如請求項16之多層AME,其中緊鄰該外部跡線之該中間層在該末端盲通孔中終止,該末端盲通孔形成為具有一面積大於該至少一個非末端埋通孔中之每一者的一橫截面。 A multi-layer AME as claimed in claim 16, wherein the intermediate layer adjacent to the outer trace terminates in the terminal blind via hole, the terminal blind via hole being formed to have a cross-section having an area larger than each of the at least one non-terminal buried via hole. 如請求項17之多層AME,其中該外部跡線、預定數目個該盲通孔及該埋通孔中之至少一者、該等末端埋通孔、該等末端盲通孔及該複數個中間跡線中之至少一者形成自該外部跡線豎直地延伸至該多層AME中之一晶格。 A multi-layer AME as claimed in claim 17, wherein the external trace, the predetermined number of the blind vias and at least one of the buried vias, the terminal buried vias, the terminal blind vias and at least one of the plurality of intermediate traces form a lattice extending vertically from the external trace to the multi-layer AME. 一種使用噴墨印表機來製造一多層經積層製造之電子裝置(AME)中之至少兩個已連接組件之間電阻率減小之一跡線的電腦化方法,其 包含:a.提供一噴墨列印系統,其包含:i.一第一列印頭,其可操作以分配一介電油墨組合物;ii.一第二列印頭,其可操作以分配一導電油墨組合物;iii.一輸送機,其可操作地耦接至該第一列印頭及該第二列印頭,該輸送機經組態以將一基板輸送至該第一列印頭及該第二列印頭中之每一者;及iv.一電腦輔助製造(「CAM」)模組,其包括一中心處理模組(CPM),該CAM與該第一列印頭及該第二列印頭中之每一者通信,其中該CPM進一步包含:至少一個處理器,其與一非暫時性儲存媒體通信,儲存於該非暫時性儲存媒體上之一組可執行指令經組態以在經執行時使該CPM執行以下步驟:接收表示具有電阻率減小之跡線之該多層AME的一3D可視化檔案;及產生具有複數個檔案之一檔案庫,每一檔案表示用於列印LPF之一實質上2D層且一元檔案至少表示列印次序;其中該CAM模組經組態以控制該輸送機、該第一列印頭及該第二列印頭中之每一者;b.提供該介電油墨組合物及該導電油墨組合物;c.使用該CAM模組,自該庫獲得表示用於列印具有該等電阻率減小之跡線之該多層AME之第一層的一第一檔案,該第一檔案包含表示以下中之至少一者之一圖案的列印指令:該介電油墨及該導電油墨;d.使用該第一列印頭,形成對應於該介電油墨之該圖案;e.使用電磁輻射源,固化對應於該多層AME之該2D層中之介電油墨表示的該圖案;f.使用該第二列印頭,形成對應於該導電油墨之該圖案; g.利用熱來燒結對應於該導電油墨之該圖案;h.使用該CAM模組,自該庫獲得表示用於列印具有該等電阻率減小之跡線之該多層AME之一後續層的一後續檔案;該後續檔案包含表示以下中之至少一者之一圖案的列印指令:該介電油墨及該導電油墨;i.重複以下步驟:使用該第一列印頭,形成對應於該介電油墨之該圖案,直至使用該CAM模組自2D檔案庫獲得後續實質上2D層的步驟,其中在最終實質上2D層中燒結導電油墨圖案後,該多層AME經組態以包含:i.至少一個中間跡線,其在一中間層上;ii.至少一個外部跡線,其經大小設定且經組態以在以下中之至少一者上可操作地耦接至少兩個組件:該多層AME之一外部頂端層及外部基底層;及iii.一預定數目個以下中之至少一者:一盲通孔及一埋通孔,該盲通孔及該埋通孔電耦接該中間跡線與該外部跡線;其中在該至少一個外部跡線與該至少一個中間跡線之間之一末端盲通孔具有一橫截面直徑,該橫截面直徑大於至少一個非末端埋通孔之一橫截面之一直徑;及j.移除該基板。 A computerized method for using an inkjet printer to produce a trace with reduced resistivity between at least two connected components in a multi-layer fabricated electronic device (AME), comprising: a. providing an inkjet printing system, comprising: i. a first print head operable to dispense a dielectric ink composition; ii. a second print head operable to dispense a conductive ink composition; iii. a conveyor operably coupled to the first print head and the second print head, the conveyor configured to convey a substrate to each of the first print head and the second print head; and iv. a computer-aided manufacturing ("CAM") module, comprising a central processing module (CPM), the CAM communicating with each of the first print head and the second print head, wherein the CPM further comprises: to at least one processor in communication with a non-transitory storage medium, a set of executable instructions stored on the non-transitory storage medium configured to, when executed, cause the CPM to perform the following steps: receiving a 3D visualization file representing the multi-layer AME having traces with reduced resistivity; and generating a file library having a plurality of files, each file representing a substantially 2D layer for printing LPF and a meta file At least representing a printing order; wherein the CAM module is configured to control each of the conveyor, the first print head and the second print head; b. providing the dielectric ink composition and the conductive ink composition; c. using the CAM module, obtaining from the library a first file representing a first layer of the multi-layer AME having the traces with reduced resistivity, the first file comprising print instructions representing a pattern of at least one of the following: the dielectric ink and the conductive ink; d. using the first print head, forming the pattern corresponding to the dielectric ink; e. using an electromagnetic radiation source, curing the pattern represented by the dielectric ink in the 2D layer corresponding to the multi-layer AME; f. using the second print head, forming the pattern corresponding to the conductive ink; g. using heat to sinter the pattern corresponding to the conductive ink ; h. using the CAM module, obtaining from the library a subsequent file representing a subsequent layer of the multi-layer AME having the traces with reduced resistivity; the subsequent file includes print instructions representing a pattern of at least one of the following: the dielectric ink and the conductive ink; i. repeating the following steps: using the first print head to form the pattern corresponding to the dielectric ink until the CAM module is used The step of obtaining a subsequent substantially 2D layer from the 2D file library, wherein after sintering the conductive ink pattern in the final substantially 2D layer, the multi-layer AME is configured to include: i. at least one intermediate trace on an intermediate layer; ii. at least one external trace sized and configured to operably couple at least two components on at least one of: an external top layer and an external layer of the multi-layer AME; base layer; and iii. a predetermined number of at least one of: a blind via and a buried via, the blind via and the buried via electrically coupling the middle trace and the outer trace; wherein an end blind via between the at least one outer trace and the at least one middle trace has a cross-sectional diameter that is greater than a diameter of a cross-sectional area of at least one non-end buried via; and j. removing the substrate. 如請求項19之方法,其中該外部跡線在一接觸墊中之至少一個端部上終止,該接觸墊經調適、經大小設定且經組態以可操作地耦接至一組件。 The method of claim 19, wherein the external trace terminates at least one end in a contact pad that is adapted, sized, and configured to be operably coupled to a component. 如請求項20之方法,其中該預定數目個該盲通孔及該埋通孔中之至少一者經組態以提供作為該外部跡線之電阻率之分數的電阻率。 The method of claim 20, wherein at least one of the predetermined number of the blind vias and the buried vias is configured to provide a resistivity that is a fraction of the resistivity of the external trace. 如請求項19之方法,其中在該最終實質上2D層中燒結該導 電油墨後,該多層AME經組態以包含複數個中間跡線,每一中間跡線沿該多層AME之一豎直軸線安置於一單獨層中。 The method of claim 19, wherein after sintering the conductive ink in the final substantially 2D layer, the multi-layer AME is configured to include a plurality of intermediate traces, each intermediate trace being disposed in a separate layer along a vertical axis of the multi-layer AME. 如請求項22之方法,其中在該最終實質上2D層中燒結該導電油墨圖案後,該複數個中間跡線中之每一中間跡線耦接至一鄰近中間跡線,其中在緊鄰中間跡線之間有複數個埋通孔。 The method of claim 22, wherein after sintering the conductive ink pattern in the final substantially 2D layer, each of the plurality of intermediate traces is coupled to an adjacent intermediate trace, wherein there are a plurality of buried vias between the adjacent intermediate traces. 如請求項23之方法,其中在該最終實質上2D層中燒結該導電油墨圖案後,該複數個中間跡線中之每一中間跡線在一末端埋通孔中終止,該末端埋通孔具有一面積大於該至少一個非末端埋通孔中之每一者的一橫截面。 The method of claim 23, wherein after sintering the conductive ink pattern in the final substantially 2D layer, each of the plurality of intermediate traces terminates in a terminal buried via having a cross-section having an area greater than each of the at least one non-terminal buried via. 如請求項24之方法,其中在該最終實質上2D層中燒結該導電油墨圖案後,緊鄰該外部跡線之該中間層在該末端盲通孔中終止,該末端盲通孔形成為具有一面積大於該至少一個非末端埋通孔中之每一者的一橫截面。 The method of claim 24, wherein after firing the conductive ink pattern in the final substantially 2D layer, the intermediate layer adjacent to the outer trace terminates in the terminal blind via, the terminal blind via being formed to have a cross-section having an area greater than each of the at least one non-terminal buried via. 如請求項25之方法,其中在該最終實質上2D層中燒結該導電油墨圖案後,該外部跡線、預定數目個該盲通孔及該埋通孔中之至少一者、該等末端埋通孔、該等末端盲通孔及該複數個中間跡線中之至少一者來自自該外部跡線豎直地延伸至該多層AME中之一晶格。 The method of claim 25, wherein after sintering the conductive ink pattern in the final substantially 2D layer, the outer trace, at least one of the predetermined number of the blind vias and the buried vias, the terminal buried vias, the terminal blind vias, and at least one of the plurality of intermediate traces are from extending vertically from the outer trace to a lattice in the multi-layer AME. 如請求項22之方法,其中在該最終實質上2D層中燒結該導電油墨圖案後,所形成之中間跡線之一寬度寬於該外部跡線之寬度。 The method of claim 22, wherein after firing the conductive ink pattern in the final substantially 2D layer, a width of the middle trace formed is wider than a width of the outer trace. 如請求項23之方法,其中在該最終實質上2D層中燒結該導電油墨圖案後,該等鄰近中間跡線之間的該複數個埋通孔中之至少一者為傾斜的。 The method of claim 23, wherein after firing the conductive ink pattern in the final substantially 2D layer, at least one of the plurality of buried vias between the adjacent intermediate traces is tilted.
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