TWI868159B - Rotary dryer - Google Patents

Abstract

A rotary drying device is provided to improve the adsorption of a workpiece and reduce the residual water on the adsorption surface, thereby shortening the drying process and simplifying the device structure. The device comprises: a rotating turntable (10); a turntable pad (11) disposed on the turntable (10) and having an adsorption surface (12) for holding the workpiece; and a vacuum suction mechanism for adsorbing the workpiece on the adsorption surface (12) by sucking a fluid from the adsorption surface (12). The adsorption surface (12) is formed with: a suction port (15) connected to the vacuum suction mechanism for allowing the fluid sucked by the vacuum suction mechanism to flow; and a suction groove (13) for the fluid to flow, which opens in the direction of the workpiece and is connected to the suction port (15). When the workpiece is adsorbed on the adsorption surface (12), the water attached to the portion of the workpiece located near the adsorption surface (12) is removed by suction through the suction groove (13) and the suction port (15). This allows the drying process to be performed efficiently in a short time with little residual water.

Description

Rotary dryer

The present invention relates to a rotary drying device that dries a workpiece by utilizing centrifugal force to disperse and remove moisture and the like adhering to the workpiece.

In the past, a rotary drying device that holds a workpiece such as a semiconductor wafer on a rotary table and rotates the workpiece is known. In this rotary drying device, the workpiece carried on the holding surface of the rotary table is held by vacuum adsorption on the holding surface. Thereafter, the workpiece is rotated by the rotation of the rotary table. In addition, the cleaning water attached to the surface of the workpiece is scattered and removed by centrifugal force to dry the workpiece.

For example, Japanese Patent Publication No. 2015-207744 discloses a rotating device having a rotating table for holding a wafer. The rotating table of the rotating device disclosed in the same document has a disc-shaped rotating plate. The wafer is held on the upper surface side of the rotating plate.

The upper end of the rotating shaft is connected to the lower surface of the rotating plate. On the other hand, the lower end of the rotating shaft is connected to the motor. The rotating plate rotates while holding the chip using the rotational force transmitted from the motor via the rotating shaft.

In addition, for example, Japanese Patent Publication No. 2010-123858 discloses a rotary cleaning device having a rotary table, which includes a disc-shaped adsorption portion, and the disc-shaped adsorption portion is composed of a porous material having countless pores inside. The upper surface of the adsorption portion of the rotary table is configured as a holding surface for adsorbing and holding the workpiece.

The rotary cleaning device disclosed in the same document is equipped with: an air nozzle for spraying drying air to the workpiece held on the rotary table; and an air supply mechanism for supplying drying air to the air nozzle.

When the workpiece held on the holding surface leaves the holding surface, the air sent from the air supply mechanism passes through the adsorption part and is ejected from the holding surface toward the workpiece. The workpiece is ejected upward from the holding surface by the upward ejected air and leaves the rotary table.

However, in the above-mentioned prior art rotary drying device, there is room for improvement in reducing the moisture remaining in the portion of the workpiece near the adsorption surface to improve the drying efficiency.

Specifically, in the conventional rotary table, there is a problem that residual water is easily generated on the adsorption surface that holds the workpiece. If there is residual water on the adsorption surface, after the drying process that uses the rotation of the workpiece to disperse the water is completed, when the workpiece is removed from the adsorption surface of the rotary table, the water remaining on the adsorption surface is dispersed and the water is again attached to the workpiece that was dried in the drying process.

In addition, in the vacuum adsorption mechanism of the prior art, the workpiece is firmly held in a state close to vacuum so that the workpiece does not leave during the rotation of the turntable. Therefore, even if the vacuum adsorption mechanism stops and the vacuum is stopped, a vacuum portion remains on the adsorption surface, so the chip is adsorbed on the adsorption surface. Therefore, it is not easy to implement the process of making the workpiece leave the turntable after the drying process.

In the prior art vacuum adsorption mechanism, in order to remove the adsorbed workpiece after the drying process, an air supply mechanism is required to supply air to the adsorption surface of the rotary table as disclosed in Japanese Patent Publication No. 2010-123858. That is, the air supply device has an adsorption circuit for sucking air for adsorbing the workpiece and a lifting circuit for supplying air for removing the workpiece. Therefore, the structure of the air supply device is complicated.

In addition, as disclosed in Japanese Patent Publication No. 2010-123858, there is also a problem in the method of spraying air for separation onto the adsorption surface of the adsorbed workpiece: the moisture remaining in the air piping is sprayed again after the drying process and adheres to the workpiece surface.

In addition, a method of spraying air to the adsorption surface of the workpiece to blow away the moisture before the workpiece is adsorbed and held by the rotating table can also be considered. However, in this method, an air supply device for spraying air is required. In addition, after the air spraying process, the workpiece is adsorbed by the holding surface and rotated. Therefore, the drying process takes a long time.

The present invention is completed in view of the above situation. One purpose of the present invention is to provide the following rotary drying device. In the rotary drying device, by improving the adsorption of the workpiece and reducing the residual water on the adsorption surface, the drying process can be shortened and the device structure can be simplified.

A rotary drying device of one embodiment of the present invention comprises: a rotating turntable; a turntable pad, which is arranged on the turntable and has an adsorption surface for holding a workpiece; and a vacuum suction mechanism, which adsorbs the workpiece to the adsorption surface by adsorbing a fluid from the adsorption surface, and the adsorption surface is provided with: a suction port, which is connected to the vacuum suction mechanism and allows the fluid attracted by the vacuum suction mechanism to flow; and a suction groove for the fluid to flow, which opens in the direction of the workpiece and is connected to the suction port.

According to a rotary drying device (the present rotary drying device) of one embodiment of the present invention, the adsorption surface for holding the workpiece of the rotary table pad provided on the rotating rotary table is formed with: a suction port connected to the vacuum suction mechanism for allowing the fluid sucked by the vacuum suction mechanism to flow; and a suction groove for allowing the fluid to flow, opening in the direction of the workpiece and connected to the suction port.

According to this structure, when the workpiece is adsorbed on the adsorption surface by the vacuum suction mechanism, the moisture attached to the part of the workpiece near the adsorption surface can be removed by suction through the suction groove and the suction port. Therefore, when the workpiece is rotated to use centrifugal force to disperse and remove moisture, the moisture remaining in the workpiece near the adsorption surface can be reduced. Therefore, the drying process can be performed efficiently in a short time.

Specifically, according to the present rotary drying device, before the workpiece is adsorbed on the rotary table, there is no need to perform an air spraying process for blowing away moisture from the portion of the workpiece located near the adsorption surface. Therefore, an air supply device for this process is not required. In addition, since the air spraying process is not required, the time required for the drying process can be shortened.

In addition, the amount of moisture remaining in the workpiece is reduced, so after the workpiece is rotated for drying and removed from the rotary table, it is not necessary to spray air for drying onto the workpiece again. Therefore, an air supply device for such air spraying is not required, and the time required for the drying process can be shortened.

In addition, according to the present rotary drying device, it is preferred that a linear suction recess is formed on the adsorption surface, the suction recess opens toward the workpiece, and both ends extend from the vicinity of the rotation center of the rotary pad toward the rotation radius, the suction port is formed in the suction recess, and the suction groove extends in a direction intersecting the suction recess and is connected to the suction recess. Thus, the workpiece can be properly adsorbed and held on the adsorption surface of the rotary pad. In addition, the moisture attached to the part of the workpiece held by the adsorption surface near the adsorption surface can be efficiently removed by suction.

In addition, according to the rotary drying device, it is preferred that one end of the suction groove opens outward from the circumferential edge of the rotary pad, and both ends of the suction recess do not open outward from the circumferential edge of the rotary pad. According to this structure, air can be sucked from one end of the suction groove opened at the circumferential edge of the rotary pad. In addition, by using this air flow, the moisture attached to the workpiece can be efficiently sprayed and flowed toward the suction recess at the other end where the suction groove is opened. And, the moisture sprayed and flowed through the suction groove together with the air can be sucked and removed through the suction port formed in the suction recess.

In addition, one end of the suction groove opens outward from the circumferential edge of the rotating pad. Therefore, by stopping the suction of the vacuum suction mechanism after the rotation-based drying process is completed, the pressure in the suction groove and the suction recess is substantially equal to the pressure outside the rotating pad. As a result, the force of the rotating pad to adsorb the workpiece is substantially eliminated. Therefore, the workpiece can be easily separated from the rotating pad. As a result, the time required for the separation process after the drying process can be shortened. In addition, there is no need to set up a lifting circuit for supplying air for separating the workpiece from the rotating pad. As a result, the efficiency of the drying process can be improved, and the productivity of the rotary drying device can be improved.

In addition, according to the present rotary drying device, it is preferred that the suction port is formed to be closer to the outside of the rotation radius direction than the rotation center of the rotary pad. Thus, the suction air generated by the vacuum suction mechanism can be used to make the moisture attached to the vicinity of the rotation center, which is difficult to remove due to the centrifugal force generated by the rotation, flow to the suction port for suction and removal. Thus, the drying efficiency is improved, and the time required for the drying process can be shortened.

1: Rotary drying device

10: Rotating table

11: Rotating table pad

12: Adsorption surface

13: Attraction slot

14: Suction concave part

15: Suction port

16: Attraction path

17: Fitting recess

18: Attraction path

19: Axis

20: Drain box

21: Drainage outlet

22: Wall

23: Upper edge

24: Swivel joint

25: Axis

26: Coupling

28: Motor

29: Motor shaft

30: Vacuum pump

31: Air piping

32: Air supply device

33: Air nozzle

35: Support platform

FIG1 is a front view showing the schematic structure of a rotary drying device according to an embodiment of the present invention.

Figure 2 is a top view of the rotary table of the rotary drying device according to the embodiment of the present invention.

FIG3 is an enlarged front view of the vicinity of the rotary table of the rotary drying device showing an embodiment of the present invention.

Below, the rotary drying device of the embodiment of the present invention is described in detail based on the attached drawings. Figure 1 is a front view showing the schematic structure of the rotary drying device 1 of the embodiment of the present invention.

Referring to FIG. 1 , the rotary drying device 1 is, for example, a device that rotates a workpiece W such as a semiconductor wafer, thereby utilizing centrifugal force to scatter and remove the pure water or the like for cleaning attached to the workpiece W, thereby drying the workpiece W. The workpiece W is a circular plate-shaped or square plate-shaped processing target material. The workpiece W may be, for example, a WLP (Wafer Level Package) that has been advancing in size in recent years, a large-scale mounting substrate that further enlarges the WLP, namely a PLP (Panel Level Package), a packaging substrate, other stacked substrates, a semiconductor substrate, and a substrate for components such as capacitors.

The rotary drying device 1 has: a rotating rotary table 10; a rotary table pad 11 provided on the upper surface of the rotary table 10; a vacuum pump 30 as a vacuum suction mechanism for adsorbing the workpiece W; and a motor 28 as a driving source for rotating the rotary table 10.

The rotating table 10 is a component that supports the workpiece W placed from above. The rotating table 10 has a roughly circular shape when viewed from above. The rotating table 10 rotates in a roughly horizontal direction with the adsorbed workpiece W, with the center of its circular shape as the axis.

The shaft 19, which is the main axis of rotation of the rotary table 10, is connected to the shaft 25 by means of a rotary joint 24 so that rotational power can be transmitted from the shaft 25. The shaft 25 is connected to the motor shaft 29 of the motor 28 by means of a coupling 26 so that rotational power can be transmitted from the shaft 29. That is, the rotary table 10 rotates with the motor 28 as the driving source.

The turntable pad 11 provided on the upper surface of the turntable 10 is mainly formed of a resin material, for example, and has a roughly circular shape when viewed from above. Examples of the resin material include ABS resin (acrylonitrile-butadiene-styrene copolymer resin), polyvinyl chloride resin, PET (polyethylene terephthalate), and polytetrafluoroethylene.

The rotating table pad 11 is a component that absorbs and holds the workpiece W, and rotates together with the workpiece W. Specifically, the upper surface of the rotating table pad 11 is an adsorption surface 12 that holds the workpiece W.

The rotary joint 24 supports the shaft 25 and the shaft 19 which is the main shaft of the rotary table 10 so that they can rotate freely. The rotary joint 24 is a joint that forms a path for the fluid flowing out from the workpiece W side, that is, air and moisture attached to the workpiece W, to flow from the rotary table pad 11 to the vacuum pump 30 side.

An air pipe 31 serving as a path for fluid flow is connected to the fluid port of the rotary joint 24. The air pipe 31 is connected to a vacuum pump 30. The air pipe 31 may also be provided with a gas-liquid separation device (not shown) for separating moisture sucked from the workpiece W from air.

The motor 28 is a driving source for rotating the turntable 10. As described above, the motor shaft 29, which is the output shaft of the motor 28, is connected to the shaft 19, which is the main rotation shaft of the turntable 10, via the coupling 26, the shaft 25, and the operating shaft of the rotary joint 24.

Here, the rotation speed of the rotary table 10 driven by the motor 28 is, for example, 60 to 3000 r.p.m., preferably 1500 to 2500 r.p.m. By utilizing this high-speed rotation, an efficient drying process can be performed in a short time.

The rotary joint 24 and the motor 28 are fixed and supported on the support table 35. A drainage box 20 is provided on the upper part of the support table 35 and below the rotary table 10. The drainage box 20 receives water from the workpiece W and makes the water flow. The drainage box 20 is a roughly cup-shaped component that receives water scattered from the workpiece W.

A wall portion 22 is formed on the peripheral edge of the drainage box 20. The wall portion 22 receives water scattered from the rotating workpiece W by centrifugal force. The wall portion 22 has a substantially cylindrical shape. A substantially annular disc-shaped upper edge portion 23 extending toward the center of rotation is formed near the upper end of the wall portion 22. A drainage port 21 for draining water scattered from the workpiece W is formed at the bottom of the drainage box 20. A drainage pipe (not shown) is connected to the drainage port 21. The water collected in the drainage box 20 is discharged to a drainage container (not shown) through the drainage pipe.

In addition, the rotary drying device 1 may include an air supply device 32 and an air nozzle 33, wherein the air supply device 32 supplies air for drying. The air nozzle 33 blows the air from the air supply device 32 toward the upper surface of the workpiece W. Thus, the drying process can be further improved in efficiency.

FIG2 is a top view of the rotating pad 11, which is a view of the adsorption surface 12 viewed from above.

As shown in FIG2 , a substantially linear suction recess 14, a suction groove 13, and a suction port 15 are formed on the adsorption surface 12 of the rotating pad 11. The suction recess 14 extends in the radial direction of the rotating pad 11. The suction groove 13 extends in a direction (horizontal direction) intersecting the suction recess 14. The suction port 15 is formed in the suction recess 14. The suction port 15 is connected to a vacuum pump 30 (see FIG1 ) as a vacuum suction mechanism.

The suction recess 14 is a recess that opens toward the top of the adsorption surface 12, that is, toward the workpiece W. Both ends of the suction recess 14 extend approximately straight from the vicinity of the rotation center of the rotary pad 11 toward the rotation radius direction. Both ends of the suction recess 14 do not open outward from the circumferential edge of the rotary pad 11. The shape of the recess of the suction recess 14 is not particularly limited. The suction recess 14 can have, for example, a groove shape with a roughly V-shaped cross section. When adsorbing the workpiece W, the suction recess 14 becomes a flow channel for the fluid sucked by the vacuum pump 30, that is, air and moisture attached to the workpiece W, etc. to flow.

The suction groove 13 is a recessed portion that opens toward the upper side of the suction surface 12, that is, toward the direction of the workpiece W. The suction groove 13 extends approximately in a straight line in a direction intersecting the suction recess 14. One end of the suction groove 13 opens outward from the circumferential edge of the rotary pad 11. The other end of the suction groove 13 opens in the suction recess 14. That is, the suction groove 13 is formed so that the fluid can flow from the outside of the rotary pad 11 to the inside of the suction recess 14.

A plurality of suction grooves 13 are formed on the rotating pad 11. Specifically, a plurality of suction grooves 13 are formed approximately parallel to both sides of a suction recess 14 extending approximately in a straight line through the vicinity of the rotation center of the rotating pad 11. One end of the plurality of suction grooves 13 opens at the outer periphery of the rotating pad 11, and the other end is connected to the suction recess 14. When the workpiece W is adsorbed, the suction groove 13 becomes a flow channel for the fluid sucked by the vacuum pump 30, that is, air and moisture attached to the workpiece W, etc. to flow.

The suction port 15 is formed on the bottom surface of the suction recess 14. Specifically, the suction port 15 is formed at two locations on the bottom surface of the suction recess 14 that are offset from the rotation center of the rotating pad 11 toward the outer side in the rotation radius direction.

The suction port 15 is connected to the vacuum pump 30. When the workpiece W is adsorbed, the suction port 15 becomes a flow channel for the fluid sucked by the vacuum pump 30, that is, air and moisture attached to the workpiece W, etc. to flow.

That is, the pure water for cleaning and the like attached to the workpiece W is blown away by the adsorption air flowing through the suction groove 13 and the suction recess 14, and is removed together with the adsorption air flowing from the suction groove 13 through the suction recess 14 and the suction port 15.

FIG3 is an enlarged front view showing the vicinity of the rotary table pad 11 of the rotary drying device 1. FIG3 shows the schematic shape of the cross section of the rotary table 10.

As shown in FIG3 , a fitting recess 17 for fitting the turntable pad 11 is formed on the upper surface of the turntable 10. The fitting recess 17 has a substantially circular shape in a top view that is concentric with the circular shape of the main body of the turntable 10. The bottom surface side of the turntable pad 11 is fitted into the fitting recess 17 of the turntable 10 and fixed by bolts, etc., which are not shown.

As described above, a plurality of suction grooves 13 are formed on the suction surface 12 of the rotary table 11. The cross-sectional shape of the suction groove 13 is roughly V-shaped. The depth of the suction groove 13 is shallower than the depth of the suction recess 14, specifically, for example, 0.01~1mm, preferably 0.05~0.5mm. Thus, by forming the suction groove 13 to have an appropriate shape and depth, the suction surface 12 can use the suction of the vacuum pump 30 to suck the workpiece W, and hold the workpiece W with a strength that can withstand rotation.

Specifically, even when air from outside the rotary pad 11 flows in from the suction groove 13, the suction surface 12 of the rotary pad 11 can maintain a sufficient degree of vacuum. Therefore, in this case, the workpiece W will not substantially separate from the suction surface 12 due to centrifugal force.

In addition, by forming the suction groove 13 into an appropriate shape, the cross-sectional area of the flow channel can be made into an appropriate size. As a result, the speed of the air flowing through the suction groove 13 can be made into an appropriate speed. As a result, the water attached to the workpiece W can be blown away well by the air flowing through the suction groove 13.

As described above, a suction recess 14 is formed near the rotation center of the adsorption surface 12 of the rotating pad 11, and the suction recess 14 is a recess extending in a substantially straight line. A suction port 15 serving as a flow path for the fluid is formed in the suction recess 14. Specifically, the suction port 15 is formed to penetrate from the suction recess 14 to the lower surface of the rotating pad 11.

A suction path 16 is formed on the lower surface of the rotating table pad 11, and the suction path 16 is a concave portion that becomes a flow path for the fluid. The suction path 16 is a substantially straight-line concave portion that passes through the vicinity of the rotation center of the rotating table pad 11. The suction path 16 is connected to the suction port 15 near both ends. In addition, when the rotating table pad 11 is engaged with the engagement concave portion 17 of the rotating table 10, the suction path 16 forms a flow path for the fluid connected to the suction path 18, which is formed near the rotation center of the rotating table 10.

Referring to Figures 1 to 3, according to the above structure, when the workpiece W is adsorbed, a flow path of the fluid connected to the vacuum pump 30 is formed from the outside of the rotary table 11. The flow path includes a suction groove 13, a suction recess 14, a suction port 15, a suction path 16, a suction path 18, a rotary joint 24 and an air pipe 31.

In the drying process, the workpiece W is rotated to use centrifugal force to disperse the water adsorbed on the workpiece W and remove it from the workpiece W. When performing such a drying process, the vacuum pump 30 is operated so that the adsorption surface 12 of the rotating table 11 can adsorb and hold the workpiece W.

One end of the suction groove 13 opens at the outer periphery of the rotary pad 11. Therefore, even in the state of adsorbing and holding the workpiece W, the flow of air sucked by the vacuum pump 30 from the outer periphery of the rotary pad 11 through the suction groove 13, the suction recess 14 and the suction port 15 continues.

By utilizing the above-mentioned air flow, moisture attached to the workpiece W flows with the air near the adsorption surface 12 holding the workpiece W and is sucked. That is, when the workpiece W is adsorbed by the adsorption surface 12, the moisture attached to the portion of the workpiece W near the adsorption surface 12 can be sucked and removed through the suction groove 13, the suction recess 14 and the suction port 15. Thus, a drying process with little residual water can be efficiently performed in a short time.

For example, a drying process test using the rotary drying device 1 was conducted. In this test, a silicon wafer with a diameter of 300 mm and a thickness of about 800 μm was used as the workpiece W. In this experiment, pure water was first sprayed on the front and back surfaces of the workpiece W. Thereafter, the drying process was performed by holding the workpiece W on the adsorption surface 12 and rotating the rotary table 10 at a rotation speed of 2500 r.p.m. As a result, a good drying result with substantially no problems was obtained with a drying time of 30 to 45 seconds. In addition, after the drying process, by stopping the vacuum pump 30, the workpiece W leaving process of leaving the adsorption surface 12 can also be easily performed in a substantially problem-free manner.

In addition, for example, an experiment was conducted using a 500mm×500mm acrylic plate assumed to be a PLP substrate as the workpiece W. In this experiment, pure water was first sprayed on the front and back surfaces of the workpiece W. Thereafter, the drying process was performed by holding the workpiece W on the adsorption surface 12 and rotating the rotary table 10 at a rotation speed of 500~2000r.p.m. As a result, a good drying result can be obtained with a drying time of 90~120 seconds. In addition, after the drying process, the vacuum pump 30 was stopped, so that the workpiece W can be easily removed.

Thus, according to the rotary drying device 1, the drying process can be efficiently performed in a short time. In addition, before the workpiece W is adsorbed on the rotary table 11, there is no need to perform the air spraying process required in the prior art to blow away the moisture from the part of the workpiece W near the adsorption surface 12. Therefore, an air supply device for this process is not required. In addition, since the air spraying process is not required, the time required for the drying process can be shortened.

Furthermore, even in the drying process based on rotation, the flow of the suction air in the adsorption surface 12 continues, so the moisture remaining in the workpiece W is reduced. Therefore, after the workpiece W is rotated for drying and leaves the rotating table 11, it is not necessary to spray the drying air to the workpiece W again. As a result, an air supply device for performing air spray drying after the workpiece W leaves is not required, and the time required for the drying process can be shortened.

In addition, one end of the suction groove 13 opens outward from the circumferential edge of the rotary pad 11. Therefore, by stopping the suction of the vacuum pump 30 after the rotation-based drying process is completed, the pressure inside the suction groove 13 and the suction recess 14 is substantially equal to the pressure outside the rotary pad 11.

As a result, the force of the rotary table pad 11 to adsorb the workpiece W is substantially eliminated. Therefore, the workpiece W can be easily separated from the rotary table pad 11. As a result, the time required for the separation process after the drying process can be shortened.

In addition, there is no need to set up a lifting circuit for supplying air to make the workpiece W leave the rotary table 11. That is, as a vacuum circuit, only one circuit for suction by the vacuum pump 30 is provided. Therefore, according to this embodiment, a rotary drying device 1 with high efficiency of the drying process, simplified structure, and excellent productivity is obtained.

In addition, according to the rotary drying device 1, the suction port 15 is formed to be closer to the outside of the rotation radius direction than the rotation center of the rotary pad 11. Therefore, the suction air generated by the vacuum pump 30 can be used to make the water attached to the vicinity of the rotation center, which is difficult to remove due to the centrifugal force generated by the rotation, flow to the suction port 15, and be sucked and removed. As a result, the drying efficiency is improved, and the time required for the drying process can be shortened.

In addition, the method of the present invention is not limited to the above-mentioned implementation method. In addition to the above-mentioned implementation method, the method of the present invention can be implemented by various changes within the scope of the gist of the present invention.

In addition, the rotary drying device of the present invention can be the following first rotary drying device. The first rotary drying device is characterized in that it includes: a rotating turntable; a turntable pad, which is arranged on the turntable and has an adsorption surface for holding the workpiece; and a vacuum suction mechanism, which sucks fluid from the adsorption surface and adsorbs the workpiece on the adsorption surface, and the adsorption surface is formed with: a suction port, which is connected to the vacuum suction mechanism and allows the fluid sucked by the vacuum suction mechanism to flow; and a suction groove for the fluid to flow, which opens in the direction of the workpiece and is connected to the suction port, and when the workpiece is adsorbed on the adsorption surface, the moisture attached to the part of the workpiece near the adsorption surface is removed by suction through the suction groove and the suction port.

10: Rotating table

11: Rotating table pad

12: Adsorption surface

13: Attraction slot

14: Suction concave part

15: Suction port

Claims (4)

A rotary drying device comprises: a rotating rotary table; a rotary table pad, arranged on the rotary table, having an adsorption surface for holding a workpiece; and a vacuum suction mechanism, which adsorbs the workpiece to the adsorption surface by adsorbing a fluid from the adsorption surface, wherein the adsorption surface is provided with: a suction port connected to the vacuum suction mechanism, through which the fluid attracted by the vacuum suction mechanism flows; and a suction groove for the fluid to flow, which opens in the direction of the workpiece and is connected to the suction port, and one end of the suction groove opens outward from the circumferential edge of the rotary table pad. A rotary drying device as described in claim 1, wherein a linear suction recess is formed on the adsorption surface, the suction recess opens in the direction of the workpiece, and both ends extend from the vicinity of the rotation center of the rotary pad in the direction of the rotation radius, the suction port is formed in the suction recess, and the suction groove extends in a direction intersecting the suction recess and is connected to the suction recess. A rotary drying device as described in claim 2, wherein both ends of the suction recess do not open outward from the circumferential edge of the rotary pad. A rotary drying device as described in any one of claims 1 to 3, wherein the suction port is formed to be further outward in the direction of the rotation radius than the rotation center of the rotary pad.