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TWI863225B - Electrical discharge machining apparatus - Google Patents

Electrical discharge machining apparatus Download PDF

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Publication number
TWI863225B
TWI863225B TW112114522A TW112114522A TWI863225B TW I863225 B TWI863225 B TW I863225B TW 112114522 A TW112114522 A TW 112114522A TW 112114522 A TW112114522 A TW 112114522A TW I863225 B TWI863225 B TW I863225B
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Taiwan
Prior art keywords
electrode
discharge
processing
correction
processed
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TW112114522A
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Chinese (zh)
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TW202400330A (en
Inventor
寇崇善
葉文勇
陳長營
Original Assignee
日揚科技股份有限公司
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Priority claimed from CN202211209461.0A external-priority patent/CN115922002A/en
Application filed by 日揚科技股份有限公司 filed Critical 日揚科技股份有限公司
Priority to JP2023098506A priority Critical patent/JP7590497B2/en
Priority to US18/210,682 priority patent/US20230415251A1/en
Publication of TW202400330A publication Critical patent/TW202400330A/en
Application granted granted Critical
Publication of TWI863225B publication Critical patent/TWI863225B/en

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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23HWORKING OF METAL BY THE ACTION OF A HIGH CONCENTRATION OF ELECTRIC CURRENT ON A WORKPIECE USING AN ELECTRODE WHICH TAKES THE PLACE OF A TOOL; SUCH WORKING COMBINED WITH OTHER FORMS OF WORKING OF METAL
    • B23H7/00Processes or apparatus applicable to both electrical discharge machining and electrochemical machining
    • B23H7/02Wire-cutting
    • B23H7/08Wire electrodes
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23HWORKING OF METAL BY THE ACTION OF A HIGH CONCENTRATION OF ELECTRIC CURRENT ON A WORKPIECE USING AN ELECTRODE WHICH TAKES THE PLACE OF A TOOL; SUCH WORKING COMBINED WITH OTHER FORMS OF WORKING OF METAL
    • B23H11/00Auxiliary apparatus or details, not otherwise provided for
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23HWORKING OF METAL BY THE ACTION OF A HIGH CONCENTRATION OF ELECTRIC CURRENT ON A WORKPIECE USING AN ELECTRODE WHICH TAKES THE PLACE OF A TOOL; SUCH WORKING COMBINED WITH OTHER FORMS OF WORKING OF METAL
    • B23H7/00Processes or apparatus applicable to both electrical discharge machining and electrochemical machining
    • B23H7/02Wire-cutting
    • B23H7/08Wire electrodes
    • B23H7/10Supporting, winding or electrical connection of wire-electrode

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  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)

Abstract

An electrical discharge machining apparatus at least comprising a carrier, a discharge processing unit, and a repairing device is disclosed. The carrier is used to carry at least one object to be machined. The discharge processing unit that comprises at least one electrode and a power supplying unit is used to perform a discharge processing procedure on at least one processing target area of the object to be machined along a processing direction. When an area needed to be repaired appears on the outside of the electrode, the repairing device performs a repairing procedure on the electrode to achieve discharge stability and prevent short-circuit problems in the discharge process.

Description

放電加工裝置 Discharge processing equipment

本發明是有關於一種加工裝置,特別是有關於一種放電加工裝置。 The present invention relates to a processing device, in particular to a discharge processing device.

隨著半導體產業蓬勃發展,放電加工技術已常見用於加工處理晶錠或晶圓。放電加工(Electrical Discharge Machining,EDM)是一種藉由放電產生火花,使待加工物成為所需形狀的一種製造工藝。介電材料分隔兩電極並施以電壓,產生週期性快速變化的電流放電,用以加工上述之待加工物。放電加工技術採用兩個電極,其中一個電極稱為工具電極,或稱為放電電極,另一個電極則稱為工件電極,連接上述之待加工物。在放電加工的過程中,放電電極和工件電極間不會有實際的接觸。 With the booming development of the semiconductor industry, electrical discharge machining technology has been commonly used to process ingots or wafers. Electrical discharge machining (EDM) is a manufacturing process that generates sparks by discharge to make the object to be processed into the desired shape. The dielectric material separates the two electrodes and applies voltage to generate periodic and rapidly changing current discharge to process the above-mentioned object to be processed. The electrical discharge machining technology uses two electrodes, one of which is called the tool electrode, or the discharge electrode, and the other electrode is called the workpiece electrode, which is connected to the above-mentioned object to be processed. During the electrical discharge machining process, there is no actual contact between the discharge electrode and the workpiece electrode.

當兩個電極間的電位差增大時,兩電極之間的電場亦會增大,直到電場強度高過介電強度,此時會發生介電崩潰,電流流過兩電極,並去除部分材料。當電流停止時,新的介電材料會流到電極間的電場,排除上述的部分材料,並重新提供介電質絕緣效果。在電流流過之後,兩電極間的電位差會回到介電崩潰之前,如此可以重複進行新一次的介電崩潰。 When the potential difference between the two electrodes increases, the electric field between the two electrodes will also increase until the electric field strength is higher than the dielectric strength. At this time, dielectric collapse occurs, and the current flows through the two electrodes and removes some materials. When the current stops, new dielectric material will flow into the electric field between the electrodes, remove some of the above materials, and provide the dielectric insulation effect again. After the current flows, the potential difference between the two electrodes will return to the level before the dielectric collapse, so that a new dielectric collapse can be repeated.

然而,現有放電加工技術的缺點在於,其切割面的粗糙度不佳,且切割面上具有相當多表面裂縫,甚至會沿著非切割方向延伸,導致非預期方 向的破裂效果。而且,現有的放電加工技術在進行例如晶錠切割時,都是使用治具夾持晶錠的周緣,亦即徑向夾持晶錠的側邊,以防止滾動或位移。然而,由於晶錠的切割面也是位在徑向上,因此傳統技術僅能切割暴露在治具外側的晶錠,無法切割治具與晶錠重疊之區域,所以傳統技術需要停機並重新調整位置後,才能再次切割。此外,現有的放電加工技術一次僅能切割或薄化一片晶圓,速度相當緩慢。再者,現有的放電加工技術都是只使用單一條切割線,再加上現有的放電加工裝置並無快拆式設計,若切割線意外斷裂,則需要停機且花費相當多時間始能完成更換。 However, the disadvantage of the existing EDM technology is that the roughness of the cut surface is not good, and there are many surface cracks on the cut surface, which may even extend in the non-cutting direction, resulting in a cracking effect in an unexpected direction. Moreover, when the existing EDM technology is used to perform, for example, ingot cutting, the periphery of the ingot is clamped by a fixture, that is, the side of the ingot is clamped radially to prevent rolling or displacement. However, since the cut surface of the ingot is also located in the radial direction, the traditional technology can only cut the ingot exposed outside the fixture, and cannot cut the area where the fixture and the ingot overlap, so the traditional technology needs to be stopped and readjusted before cutting again. In addition, the existing EDM technology can only cut or thin one wafer at a time, and the speed is quite slow. Furthermore, existing EDM technologies use only a single cutting wire, and existing EDM devices do not have a quick-release design. If the cutting wire breaks accidentally, the machine needs to be shut down and it takes a long time to replace it.

有鑑於此,本發明之目的就是在提供一種放電加工裝置,藉以解決上述習知技術之諸多問題。 In view of this, the purpose of the present invention is to provide an electric discharge processing device to solve many problems of the above-mentioned known technology.

為達前述目的,本發明提出放電加工裝置,至少包含:一載台,用以承載至少一待加工物;一放電加工單元,包含至少一電極及一供電單元,用以沿著一加工行進方向以該電極對該載台上之該待加工物之一加工目標區進行一放電加工程序,其中該電極於一放電區段呈懸空狀態,該供電單元在該放電加工程序中係提供一第一電源予該電極及該待加工物,用以經由位於該放電區段中之該電極施加一放電能量予該待加工物之該加工目標區;以及一修正裝置,用以對該電極之一外觀之一待修正區域進行一修正程序以修正該電極之該外觀。 To achieve the above-mentioned purpose, the present invention proposes a discharge processing device, which at least comprises: a carrier for carrying at least one object to be processed; a discharge processing unit, comprising at least one electrode and a power supply unit, for performing a discharge processing procedure on a processing target area of the object to be processed on the carrier with the electrode along a processing direction, wherein the electrode is suspended in a discharge section, and the power supply unit provides a first power source to the electrode and the object to be processed in the discharge processing procedure, so as to apply a discharge energy to the processing target area of the object to be processed through the electrode located in the discharge section; and a correction device, for performing a correction procedure on a to-be-corrected area of an appearance of the electrode to correct the appearance of the electrode.

其中,該修正裝置係於該電極對該加工目標區進行該放電加工程序之同時,對該電極進行該修正程序。 Wherein, the correction device performs the correction process on the electrode while the electrode performs the discharge processing process on the processing target area.

其中,該修正裝置係於該電極對該加工目標區進行該放電加工程序之前或之後,對該電極進行該修正程序。 Wherein, the correction device performs the correction process on the electrode before or after the electrode performs the discharge processing process on the processing target area.

其中,該修正裝置依據該電極之一損耗速率與該放電加工程序之一進給速度以一定量調整方式修正該電極之該外觀。 The correction device corrects the appearance of the electrode by a certain amount of adjustment according to a wear rate of the electrode and a feed speed of the discharge machining process.

其中,該修正裝置依據該電極之一即時狀態以一動態調整方式修正該電極之該外觀。 Wherein, the correction device corrects the appearance of the electrode in a dynamic adjustment manner according to a real-time state of the electrode.

其中,該修正裝置包含一修刀元件,該修刀元件與該電極在該修正程序中產生一相對位移以修正該電極之該外觀。 The correction device includes a trimming element, and the trimming element and the electrode generate a relative displacement during the correction process to correct the appearance of the electrode.

其中,該修正裝置包含一升降機構及/或一平移機構,用以設置該修刀元件,使得該修刀元件移動位置而與該電極產生該相對位移。 The correction device includes a lifting mechanism and/or a translation mechanism for setting the trimming element so that the trimming element moves and generates the relative displacement with the electrode.

其中,該修刀元件係一雷射源、一刀具或一研磨件。 The trimming element is a laser source, a cutting tool or a grinding piece.

其中,該修正裝置更包含一除屑元件,用以於該修正裝置進行該修正程序之同時,去除修正該電極之該外觀時所產生之一刀屑。 The correction device further includes a chip removal element for removing the cutting chips generated when correcting the appearance of the electrode while the correction device is performing the correction procedure.

其中,該修正裝置包含一捲動機構,用以在該修正程序中捲動該電極,使得該電極之該待修正區域避開該待加工物之該加工目標區,藉以修正該電極之該外觀。 The correction device includes a rolling mechanism for rolling the electrode during the correction process so that the area of the electrode to be corrected avoids the processing target area of the object to be processed, thereby correcting the appearance of the electrode.

其中,該修正裝置更包含一分條元件,用以將該電極於該放電區段分割成彼此平行之複數個電極條。 The correction device further includes a striping element for dividing the electrode into a plurality of electrode strips parallel to each other in the discharge section.

其中,該放電加工單元更包含一夾固元件,用以於該電極進行該放電加工程序時夾固該電極之該放電區段之至少一側,且於該修正裝置進行該修正程序時釋放該電極之該放電區段之該至少一側。 The discharge processing unit further includes a clamping element for clamping at least one side of the discharge section of the electrode when the electrode performs the discharge processing procedure, and releasing the at least one side of the discharge section of the electrode when the correction device performs the correction procedure.

其中,該放電加工裝置還包含一排渣單元,該放電加工單元對該待加工物進行該放電加工程序時,該排渣單元係提供至少一外力排除該電極對該待加工物施加該放電能量時所產生之殘渣。 The discharge processing device further includes a slag removal unit. When the discharge processing unit performs the discharge processing procedure on the object to be processed, the slag removal unit provides at least one external force to remove the slag generated when the electrode applies the discharge energy to the object to be processed.

其中,該排渣單元係依據該待加工物之外形調整該外力之施加方向或施加位置以排除該殘渣。 The slag removal unit adjusts the direction or position of the external force according to the shape of the object to be processed to remove the slag.

其中,該放電加工單元更包含一治具,該治具由至少兩承載構件及至少兩固持構件分別對應組接而成,該兩固持構件係設於兩座體上,該兩座體為移動機構或轉動機構,藉以使得該放電加工單元沿著該加工行進方向進行該放電加工程序時,該電極之該放電區段與該待加工物之該加工目標區係呈往復式或循環式相對移動。 The discharge processing unit further includes a fixture, which is composed of at least two bearing components and at least two holding components respectively assembled in correspondence, and the two holding components are arranged on two bases, and the two bases are moving mechanisms or rotating mechanisms, so that when the discharge processing unit performs the discharge processing procedure along the processing direction, the discharge section of the electrode and the processing target area of the object to be processed move relative to each other in a reciprocating or cyclic manner.

其中,該電極係環繞式抵接該兩承載構件或以該電極之兩側分別抵接該兩承載構件,使得該電極於該放電區段呈該懸空狀態。 The electrode is in circumferential contact with the two supporting members or the two sides of the electrode are respectively in contact with the two supporting members, so that the electrode is in the suspended state in the discharge section.

其中,該修正裝置更包含一位向校正元件,用以依據該電極之該加工行進方向出現之一偏移現象,調整該電極與該待加工物之一相對位向以校正該加工行進方向。 The correction device further includes a directional correction element for adjusting the relative position of the electrode and the object to be processed to correct the processing direction according to a deviation phenomenon of the processing direction of the electrode.

其中,該修正裝置係藉由令該外觀上出現該待修正區域之該電極移動位置,使得該待修正區域避開該待加工物之該加工目標區,該待修正區域為一斷裂現象或一斷裂跡象。 The correction device moves the electrode position of the area to be corrected on the surface so that the area to be corrected avoids the processing target area of the object to be processed. The area to be corrected is a fracture phenomenon or a fracture sign.

其中,該電極之數量為複數個,該複數個電極於該放電區段沿著一第一方向及/或一第三方向彼此平行排列,其中該第三方向係垂直於該第一方向。 There are multiple electrodes, and the multiple electrodes are arranged parallel to each other along a first direction and/or a third direction in the discharge section, wherein the third direction is perpendicular to the first direction.

其中,該修正裝置更包含一整刀元件,該整刀元件隔開該複數個電極,用以使得該複數個電極於該放電區段維持彼此平行。 The correction device further includes a whole blade element, which separates the plurality of electrodes so as to keep the plurality of electrodes parallel to each other in the discharge section.

其中,該放電加工單元更包含一分隔柱,該複數個電極抵靠該分隔柱,用以使得該複數個電極於該放電區段彼此平行。 The discharge processing unit further includes a partition column, and the plurality of electrodes abut against the partition column so as to make the plurality of electrodes parallel to each other in the discharge section.

其中,更包含一穩定構件,該穩定構件具有複數個導槽活動式容置該複數個電極,用以穩定及導正該複數個電極,使該複數個電極沿著該加工行進方向進行該放電加工程序。 It further includes a stabilizing component having a plurality of guide grooves for movably accommodating the plurality of electrodes, so as to stabilize and correct the plurality of electrodes so that the plurality of electrodes can perform the discharge processing along the processing direction.

其中,該修正裝置係藉由令該複數個電極中該外觀上出現該待修正區域之至少一電極移動位置,使得該待修正區域避開該待加工物之該加工目標區,該待修正區域為一斷裂現象或一斷裂跡象。 The correction device moves the position of at least one electrode of the plurality of electrodes that has the area to be corrected on the surface, so that the area to be corrected avoids the processing target area of the object to be processed, and the area to be corrected is a fracture phenomenon or a fracture sign.

承上所述,依本發明之放電加工裝置,具有以下優點: As mentioned above, the discharge processing device according to the present invention has the following advantages:

(1)修正裝置可藉由修刀元件與電極之間之相對位移,修正電極之外觀,以預防放電加工程序產生短路問題。 (1) The correction device can correct the appearance of the electrode by the relative displacement between the trimming element and the electrode to prevent short circuit problems caused by the discharge machining process.

(2)修正裝置可藉由捲動或移動電極使其避開待加工物之加工目標區,以預防放電加工程序產生短路問題。 (2) The correction device can roll or move the electrode to avoid the processing target area of the object to be processed to prevent short circuit problems caused by the discharge processing process.

(3)除屑元件可藉由修刀元件與電極之間之相對位移,去除殘留在修刀元件及/或電極上之刀屑等物質。排渣單元可針對提供一或多個加工目標區提供外力,幫助排除放電加工程序或修正程序所產生之殘渣。 (3) The chip removal element can remove the chip and other materials remaining on the knife dressing element and/or the electrode by the relative displacement between the knife dressing element and the electrode. The slag removal unit can provide external force to one or more processing target areas to help remove the slag generated by the discharge processing process or the correction process.

(4)分條元件可藉由修刀元件與電極之間之相對位移,將電極之放電區段切割成數個電極條,藉此可避免板狀電極損耗不均的問題。 (4) The stripping element can cut the discharge section of the electrode into several electrode strips by the relative displacement between the trimming element and the electrode, thereby avoiding the problem of uneven wear of the plate electrode.

(5)位向校正元件可校正電極與待加工物之加工行進方向,藉此可避免加工行進方向產生偏移。 (5) The position correction element can correct the processing direction of the electrode and the object to be processed, thereby avoiding deviation in the processing direction.

(6)夾固元件可夾固電極以防止電極因受到拉扯而改變加工行進方向。 (6) The clamping element can clamp the electrode to prevent the electrode from changing the processing direction due to being pulled.

(7)整刀元件可使得多條電極之間保持平行,可避免待加工物經過放電加工後之表面產生歪斜等不平整現象。 (7) The knife element can keep multiple electrodes parallel to each other, which can prevent the surface of the workpiece from being skewed or uneven after discharge processing.

(8)穩定構件可減少電極產生抖動,還能作為分隔柱提供導引效果,並可作為電接點使用。 (8) Stabilizing components can reduce the vibration of the electrode, provide guidance as a separator, and can be used as an electrical contact.

10:放電加工裝置 10: Discharge processing equipment

20:載台 20: Carrier

21:承載板 21: Carrier plate

22:穩定構件 22: Stable components

28:接觸面 28: Contact surface

30:放電加工單元 30: Discharge processing unit

31:電接點 31: Electrical contacts

32:電極 32: Electrode

32’:電極條 32’: Electrode strip

34:供電單元 34: Power supply unit

36:治具 36: Jig

40:承載構件 40: Load-bearing components

41:軸孔 41: Axle hole

42:限位槽 42: Limiting slot

43:穿槽 43: Groove

44a:第一片材 44a: First sheet

44b:第二片材 44b: Second sheet

47:導角 47: Leading angle

50:固持構件 50: Holding component

51:凸塊 51: Bump

52:座體 52: Seat

53:凸塊 53: Bump

55:聯軸器 55: coupling

58:馬達 58: Motor

60:張力量測單元 60: Tension measurement unit

62:振動量測單元 62: Vibration measurement unit

64:排渣單元 64: Slag discharge unit

65:噴頭 65: Spray head

66:張力控制模組 66: Tension control module

68:控制器 68: Controller

80:修正裝置 80: Correction device

82:修刀元件 82: Knife repair element

83:除屑元件 83: Chip removal element

84:捲動機構 84: Rolling mechanism

85:分條元件 85: Striping components

86:夾固元件 86: Clamping element

87:整刀元件 87: Whole knife element

88:位向校正元件 88: Position correction element

89:檢測元件 89: Detection element

90:升降機構 90: Lifting mechanism

91:軌道 91:Track

92:平移機構 92: Translation mechanism

93:滑台 93: Slide table

95:軌道 95:Track

96:承載架 96:Carrier

97:滑台 97: Slide table

100:待加工物 100: Objects to be processed

110:加工目標區 110: Processing target area

281:導槽 281:Guide groove

A:兩側 A: Both sides

B:放電區段 B: Discharge section

C:區域 C: Region

D:間距 D: Spacing

X:第一方向 X: First direction

Y:第二方向 Y: Second direction

Z:第三方向 Z: Third direction

F:加工行進方向 F: Processing direction

P1:第一電源 P1: First Power Source

圖1為本發明之放電加工裝置之前視示意圖,其中圖1(A)與(B)分別為不同實施範例之示意圖。 FIG. 1 is a front view schematic diagram of the discharge machining device of the present invention, wherein FIG. 1 (A) and (B) are schematic diagrams of different implementation examples, respectively.

圖2為本發明之放電加工裝置之局部結構之上視示意圖,圖2(A)之電極數量為複數個且為環繞式設計,圖2(B)之電極數量為單個且為環繞式設計,圖2(C)之電極數量為單個且為跨接式設計。 FIG2 is a schematic top view of the partial structure of the EDM device of the present invention. FIG2(A) has multiple electrodes in a ring-shaped design, FIG2(B) has a single electrode in a ring-shaped design, and FIG2(C) has a single electrode in a cross-connected design.

圖3為本發明之治具以多個承載構件使電極平行排列之配置示意圖,其中圖3(A)與圖3(B)為不同實施範例,圖3(A)為複數個電極在加工行進方向F上彼此相互平行以依序對單一加工目標區進行放電加工程序,圖3(B)為複數個電極在第一方向X上彼此相互平行以同時對複數個加工目標區進行放電加工程序。 FIG3 is a schematic diagram of the configuration of the fixture of the present invention using multiple supporting members to arrange electrodes in parallel, wherein FIG3(A) and FIG3(B) are different implementation examples, FIG3(A) shows that multiple electrodes are parallel to each other in the processing direction F to sequentially perform a discharge processing procedure on a single processing target area, and FIG3(B) shows that multiple electrodes are parallel to each other in the first direction X to simultaneously perform a discharge processing procedure on multiple processing target areas.

圖4為放電加工程序中電極產生耗損程度不一致之現象之示意圖,其中圖4(A)與(B)為不同視角所得之示意圖。 Figure 4 is a schematic diagram showing the phenomenon of inconsistent electrode wear during EDM, where Figures 4 (A) and (B) are schematic diagrams obtained from different viewing angles.

圖5為本發明之放電加工裝置之修正裝置具有修刀元件之示意圖,其中圖5(A)與(B)為不同視角所得之示意圖。 FIG5 is a schematic diagram of the correction device of the EDM device of the present invention having a knife-repairing element, wherein FIG5 (A) and (B) are schematic diagrams obtained from different viewing angles.

圖6為本發明之放電加工裝置之修正裝置具有升降機構之示意圖,其中圖6(A)、(B)與(C)分別為不同實施範例之示意圖。 FIG6 is a schematic diagram of the correction device of the discharge machining device of the present invention having a lifting mechanism, wherein FIG6 (A), (B) and (C) are schematic diagrams of different implementation examples respectively.

圖7為本發明之放電加工裝置之修正裝置具有除屑元件之示意圖,其中圖7(A)與(B)為不同視角所得之示意圖。 FIG. 7 is a schematic diagram of the correction device of the EDM device of the present invention having a chip removal element, wherein FIG. 7 (A) and (B) are schematic diagrams obtained from different viewing angles.

圖8為本發明之放電加工裝置之修正裝置具有捲動機構之示意圖,其中圖8(A)與(B)為不同視角所得之示意圖。 FIG8 is a schematic diagram of the correction device of the EDM device of the present invention having a scrolling mechanism, wherein FIG8 (A) and (B) are schematic diagrams obtained from different viewing angles.

圖9為本發明之放電加工裝置之修正裝置藉由移位方式修正電極之流程示意圖,其中圖9(A)、(B)與(C)分別為流程步驟之示意圖。 FIG9 is a schematic diagram of the process of the correction device of the discharge machining device of the present invention correcting the electrode by shifting, wherein FIG9 (A), (B) and (C) are schematic diagrams of the process steps respectively.

圖10係本發明之放電加工裝置之修正裝置以分條元件進行分條程序之示意圖,其中圖10(A)與(B)為不同視角所得之示意圖。 FIG10 is a schematic diagram of the correction device of the EDM device of the present invention using a stripping element to perform a stripping process, wherein FIG10 (A) and (B) are schematic diagrams obtained from different viewing angles.

圖11係本發明之放電加工裝置之修正裝置以分條元件進行放電加工程序之示意圖,其中圖11(A)與(B)為不同視角所得之示意圖。 FIG11 is a schematic diagram of the correction device of the EDM device of the present invention performing the EDM process with a strip component, wherein FIG11 (A) and (B) are schematic diagrams obtained from different viewing angles.

圖12為本發明之放電加工裝置之修正裝置具有整刀元件之示意圖,其中圖12(A)與(B)為不同視角所得之示意圖。 FIG12 is a schematic diagram of the correction device of the EDM device of the present invention having a straight blade element, wherein FIG12 (A) and (B) are schematic diagrams obtained from different viewing angles.

圖13為本發明之放電加工裝置之修正裝置具有位向校正元件之示意圖,其中圖13(A)與(B)為不同視角所得之示意圖。 FIG. 13 is a schematic diagram of the correction device of the EDM device of the present invention having a position correction element, wherein FIG. 13 (A) and (B) are schematic diagrams obtained from different viewing angles.

圖14為本發明之放電加工裝置之治具捲動電極之示意圖。 Figure 14 is a schematic diagram of the jig rolling electrode of the EDM device of the present invention.

圖15為本發明之放電加工裝置具有張力控制模組之示意圖。 Figure 15 is a schematic diagram of the EDM device of the present invention having a tension control module.

圖16為本發明之放電加工裝置具有排渣單元之示意圖,其中圖16(A)與(B)分別為不同實施範例之示意圖。 FIG. 16 is a schematic diagram of the discharge machining device of the present invention having a slag removal unit, wherein FIG. 16 (A) and (B) are schematic diagrams of different implementation examples, respectively.

為利瞭解本發明之技術特徵、內容與優點及其所能達成之功效,茲將本發明配合圖式,並以實施例之表達形式詳細說明如下,而其中所使用之圖式,其主旨僅為示意及輔助說明書之用,未必為本發明實施後之真實比例與精準配置,故不應就所附之圖式的比例與配置關係解讀、侷限本發明於實際實施上的權利範圍。此外,為使便於理解,下述實施例中的相同元件係以相同的符號標示來說明。 In order to facilitate understanding of the technical features, content and advantages of the present invention and the effects that can be achieved, the present invention is described in detail as follows with the help of diagrams and in the form of embodiments. The diagrams used are only for illustration and auxiliary instructions, and may not be the true proportions and precise configurations after the implementation of the present invention. Therefore, the proportions and configurations of the attached diagrams should not be interpreted or limited to the scope of rights of the present invention in actual implementation. In addition, for ease of understanding, the same components in the following embodiments are indicated by the same symbols.

另外,在全篇說明書與申請專利範圍所使用的用詞,除有特別註明外,通常具有每個用詞使用在此領域中、在此揭露的內容中與特殊內容中的平常意義。某些用以描述本發明的用詞將於下或在此說明書的別處討論,以提供本領域技術人員在有關本發明的描述上額外的引導。 In addition, the terms used throughout the specification and the scope of the patent application generally have the ordinary meaning of each term used in this field, in the content disclosed herein, and in the specific content, unless otherwise specified. Certain terms used to describe the present invention will be discussed below or elsewhere in this specification to provide additional guidance to those skilled in the art in describing the present invention.

關於本文中如使用“第一”、“第二”、“第三”等,並非特別指稱次序或順位的意思,亦非用以限定本發明,其僅僅是為了區別以相同技術用語描述的組件或操作而已。 The use of "first", "second", "third", etc. in this article does not specifically refer to the order or sequence, nor is it used to limit the present invention. It is only used to distinguish components or operations described by the same technical terms.

其次,在本文中如使用用詞“包含”、“包括”、“具有”、“含有”等,其均為開放性的用語,即意指包含但不限於。 Secondly, the words "include", "including", "have", "contain", etc. used in this article are open terms, which means including but not limited to.

圖1為本發明之放電加工裝置之前視示意圖,其中(A)圖與(B)圖分別為不同實施範例之示意圖。圖2為本發明之放電加工裝置之局部結構之上視示意圖,圖2(A)之電極數量為複數個且為環繞式設計,圖2(B)之電極數量為單個且為環繞式設計,圖2(C)之電極數量為單個且為跨接式設計。圖3為本發明之治具以多個承載構件使電極平行排列之配置示意圖,其中圖3(A)為複數個電極對單一加工目標區依序進行放電加工程序,圖3(B)則為複數個電極對複數個加工目標區同時進行放電加工程序。 FIG1 is a front view schematic diagram of the discharge machining device of the present invention, wherein (A) and (B) are schematic diagrams of different implementation examples. FIG2 is a top view schematic diagram of the partial structure of the discharge machining device of the present invention, wherein FIG2(A) has multiple electrodes and is designed in a ring-shaped manner, FIG2(B) has a single electrode and is designed in a ring-shaped manner, and FIG2(C) has a single electrode and is designed in a cross-connected manner. FIG3 is a schematic diagram of the configuration of the fixture of the present invention with multiple supporting members to arrange electrodes in parallel, wherein FIG3(A) shows that multiple electrodes perform the discharge machining process on a single processing target area in sequence, and FIG3(B) shows that multiple electrodes perform the discharge machining process on multiple processing target areas simultaneously.

請參閱圖1至圖3,本發明之放電加工(EDM)裝置10至少包含載台20及放電加工單元30。載台20係用以承載至少一待加工物100。放電加工單元30之電極32之兩端分別跨接(如圖2(C)所示)或環繞(如圖1(A)、圖1(B)、圖2(A)及圖2(B)所示)在兩個治具36上,使得電極32於放電區段B呈懸空狀態。放電加工單元30之電極32為沿著第二方向Y延伸,使得電極32於放電區段B平行於第二方向Y,其中第二方向Y分別垂直於第一方向X與加工行進方向F。位於放電區段B中之電極32(即,電極32之放電區段B)與待加工物100之加工目標區110係呈往復式或循環式相對移動(例如,沿著圖1所示之空心雙箭頭或單箭頭之方向(第二方向Y)產生相對位移),用以沿著加工行進方向F以電極32對載台20上之待加工物100之加工目標區110進行放電加工程序,例如對待加工物100的加工目標區110循序或同時進行切割(Cutting)及/或磨拋(Electric Discharge Grinding,EDG)等放電加工程序。放電加工單元30之供電單元34在放電加工程序中係提供第一電源P1予電極32及待加工物100,用以經由位於放電區段B中之電極32施加放電能量予待加工物100之加工目標區110。在圖1至圖3所示之實施態樣中,治具36之軸心係以垂直於加工行進方向F為例。惟,本發明不限於此,在其他可行實施態樣中,治具36之軸心亦可例如為平行於加工行進方向F。待加工物100可為任何導體或半導體結構,例如晶錠或晶圓等。本發明之載台20可為位置固定式載台,或者是可移動或可轉動之運動式載台,其中本發明係以載台20為具有承載板21之工作平台舉例說明,但本發明不限於此,本發明之載台20也可選擇性省略承載板21或者是改以黏膠層(如導電膠)取代承載板21。為了避免電極32在放電加工程序過程中所產生的抖動現象,本發明之放電加工裝置10係選擇性具有穩定構件22,其中穩定構件22係例如設於載台20上且例如撐頂於電極32之兩側A之間,穩 定構件22之型態並無特別限定,只要可減少電極32抖動產生,即可適用於本發明中。舉例而言,穩定構件22與電極32接觸之接觸面28可例如為平面(如圖1(A)所示),藉由例如支撐呈懸空狀態之電極32可減少抖動現象,或者是穩定構件22與電極32接觸之接觸面28可選擇性具有導槽281(如圖1(B)所示),導槽281不僅可支撐呈懸空狀態之電極32,還可在電極32相對於待加工物100進行往復式移動時穩定電極32並提供導引效果。除此之外,穩定構件22亦可選擇性為高度可伸縮之結構設計,藉此可改變穩定構件22與電極32接觸之接觸面28之高度。 Please refer to Figures 1 to 3. The EDM device 10 of the present invention at least includes a carrier 20 and an EDM unit 30. The carrier 20 is used to carry at least one object 100 to be processed. The two ends of the electrode 32 of the EDM unit 30 are respectively bridged (as shown in Figure 2(C)) or wrapped (as shown in Figures 1(A), 1(B), 2(A) and 2(B)) on two fixtures 36, so that the electrode 32 is suspended in the discharge section B. The electrode 32 of the EDM unit 30 extends along the second direction Y, so that the electrode 32 is parallel to the second direction Y in the discharge section B, wherein the second direction Y is perpendicular to the first direction X and the processing direction F. The electrode 32 located in the discharge section B (i.e., the discharge section B of the electrode 32) and the processing target area 110 of the object 100 to be processed move relative to each other in a reciprocating or cyclic manner (for example, generating relative displacement along the direction of the hollow double arrow or single arrow (second direction Y) shown in FIG. 1), so as to perform a discharge processing procedure on the processing target area 110 of the object 100 to be processed on the carrier 20 with the electrode 32 along the processing direction F, for example, performing a discharge processing procedure such as cutting (Cutting) and/or grinding (Electric Discharge Grinding, EDG) on the processing target area 110 of the object 100 to be processed sequentially or simultaneously. The power supply unit 34 of the discharge processing unit 30 provides a first power source P1 to the electrode 32 and the object to be processed 100 during the discharge processing procedure, so as to apply discharge energy to the processing target area 110 of the object to be processed 100 via the electrode 32 located in the discharge section B. In the embodiments shown in FIGS. 1 to 3 , the axis of the fixture 36 is perpendicular to the processing direction F. However, the present invention is not limited thereto, and in other feasible embodiments, the axis of the fixture 36 may also be, for example, parallel to the processing direction F. The object to be processed 100 may be any conductor or semiconductor structure, such as an ingot or a wafer. The carrier 20 of the present invention can be a fixed-position carrier, or a movable or rotatable carrier. The present invention is illustrated by taking the carrier 20 as a working platform having a supporting plate 21, but the present invention is not limited to this. The carrier 20 of the present invention can also selectively omit the supporting plate 21 or replace the supporting plate 21 with an adhesive layer (such as conductive glue). In order to prevent the electrode 32 from shaking during the EDM process, the EDM device 10 of the present invention selectively has a stabilizing member 22, wherein the stabilizing member 22 is, for example, disposed on the carrier 20 and supported between the two sides A of the electrode 32. The type of the stabilizing member 22 is not particularly limited, and any type that can reduce the shaking of the electrode 32 can be used in the present invention. For example, the contact surface 28 between the stabilizing member 22 and the electrode 32 may be a plane (as shown in FIG. 1(A)), and the shaking phenomenon can be reduced by, for example, supporting the electrode 32 in a suspended state, or the contact surface 28 between the stabilizing member 22 and the electrode 32 may optionally have a guide groove 281 (as shown in FIG. 1(B)), and the guide groove 281 can not only support the electrode 32 in a suspended state, but also stabilize the electrode 32 and provide a guiding effect when the electrode 32 moves back and forth relative to the object 100 to be processed. In addition, the stabilizing member 22 can also be selectively designed as a highly retractable structure, thereby changing the height of the contact surface 28 between the stabilizing member 22 and the electrode 32.

如圖1至圖3所示,放電加工單元30包含至少一電極32、供電單元34及治具36。電極32之數量可例如為一個(如圖2(B)與圖2(C)所示)或複數個,用以對定義於待加工物100上之一個加工目標區110或複數個加工目標區110(如圖2(A)與圖3(B)所示)進行放電加工程序。圖3為本發明透過多個承載構件使電極平行排列之兩種實施態樣之示意圖,其中圖3(A)為複數個電極32沿著加工行進方向F彼此平行排列,藉此多個電極32可對單一加工目標區110依序進行放電加工程序,圖3(B)則為複數個電極32沿著第一方向X彼此平行排列,藉此多個電極32可對複數個加工目標區110同時進行放電加工程序。以具有沿著第二方向Y延伸之放電區段B之複數個電極32為例,這些複數個電極32係例如為在第一方向X(如圖3(B)所示)及/或加工行進方向F(如圖3(A)所示)上彼此呈平行之線狀或板狀導電結構,如導電線或箔,其中加工行進方向F係平行於第三方向Z且垂直於第一方向X。電極32之數量係選擇性依據實際需求而定。這些電極32之間距係對應於待加工物100之切割或薄化厚度。這些電極32之橫向截面可為彼此相同或不相同之任意形狀,例如線狀或板狀(或稱,片狀),或者是任何對稱(如圓形、方形、矩形)或非對稱形狀。供電單元34係分別經由電接點31(electrical contact)電性連接 電極32及電性連接待加工物100。其中,供電單元34可為一組電源輸出或複數組電源輸出,用以供應第一電源P1。供電單元34亦可為串聯式或並聯式電性連接電極32,只要可經由電極32施加放電能量於待加工物100之加工目標區110,即可適用於本發明中。 As shown in FIGS. 1 to 3 , the EDM unit 30 includes at least one electrode 32, a power supply unit 34, and a fixture 36. The number of electrodes 32 may be, for example, one (as shown in FIGS. 2(B) and 2(C) ) or a plurality of electrodes 32 for performing an EDM process on a processing target area 110 or a plurality of processing target areas 110 (as shown in FIGS. 2(A) and 3(B) ) defined on the object 100 to be processed. FIG3 is a schematic diagram of two implementations of the present invention in which electrodes are arranged in parallel by using multiple supporting members, wherein FIG3(A) shows that multiple electrodes 32 are arranged in parallel with each other along the processing direction F, whereby multiple electrodes 32 can sequentially perform the discharge processing procedure on a single processing target area 110, and FIG3(B) shows that multiple electrodes 32 are arranged in parallel with each other along the first direction X, whereby multiple electrodes 32 can simultaneously perform the discharge processing procedure on multiple processing target areas 110. Taking a plurality of electrodes 32 having a discharge section B extending along the second direction Y as an example, these plurality of electrodes 32 are, for example, linear or plate-shaped conductive structures parallel to each other in the first direction X (as shown in FIG. 3(B)) and/or the processing direction F (as shown in FIG. 3(A)), such as conductive wires or foils, wherein the processing direction F is parallel to the third direction Z and perpendicular to the first direction X. The number of electrodes 32 is selectively determined according to actual needs. The spacing between these electrodes 32 corresponds to the cutting or thinning thickness of the object 100 to be processed. The transverse cross-sections of these electrodes 32 can be any shape that is the same or different from each other, such as linear or plate-shaped (or sheet-shaped), or any symmetrical (such as circular, square, rectangular) or asymmetrical shape. The power supply unit 34 is electrically connected to the electrode 32 and the object to be processed 100 through the electrical contact 31. The power supply unit 34 can be a set of power output or a plurality of sets of power outputs for supplying the first power P1. The power supply unit 34 can also be electrically connected to the electrode 32 in series or in parallel. As long as the discharge energy can be applied to the processing target area 110 of the object to be processed 100 through the electrode 32, it can be applied to the present invention.

電極32的材質可例如選自由銅(Copper)、黃銅(Brass)、鉬(Molybdenum)、鎢(Tungsten)、石墨(Graphite)、鋼(Steel)、鋁(Aluminum)及鋅(Zinc)所組成之族群。放電電極32的厚度約小於300μm,厚度範圍較佳為約30μm至約300μm。惟,須注意的是,本發明雖以電極32之數量為複數個作舉例說明,但不侷限於此,單個電極,如圖2(C)所示,亦屬於本發明請求保護之範圍。由於本發明所屬技術領域中具有通常知識者依據本發明揭示內容及現有技術應當明瞭如何將本發明之技術手段應用至單個電極或複數個電極,故此處不另贅述。當複數個電極32於加工行進方向F上彼此呈平行排列時,複數個電極32會依序沿著加工行進方向F切割或磨拋待加工物100之加工目標區110時,位於後方之電極32將會重複經過位於前方之電極32已經過之位置。換言之,以加工行進方向F由上往下為例,縱使位於前方之電極32(例如下方之電極)發生斷線現象,位於後方之電極32(例如上方之電極)仍可替補前方之電極32施加放電能量予待加工物100之加工目標區110。因此,本發明藉由電極替補功能,可避免電極32斷線所導致之製程中斷等不良影響。 The material of the electrode 32 can be selected from the group consisting of copper, brass, molybdenum, tungsten, graphite, steel, aluminum and zinc. The thickness of the discharge electrode 32 is less than about 300 μm, and the thickness range is preferably about 30 μm to about 300 μm. However, it should be noted that although the present invention uses the number of electrodes 32 as an example, it is not limited to this. A single electrode, as shown in FIG. 2(C), also falls within the scope of protection claimed by the present invention. Since a person with ordinary knowledge in the technical field to which the present invention belongs should understand how to apply the technical means of the present invention to a single electrode or a plurality of electrodes according to the disclosure of the present invention and the prior art, it will not be further described here. When the plurality of electrodes 32 are arranged parallel to each other in the processing direction F, the plurality of electrodes 32 will sequentially cut or polish the processing target area 110 of the object 100 to be processed along the processing direction F, and the electrode 32 located at the rear will repeatedly pass through the position that the electrode 32 located at the front has passed. In other words, taking the processing direction F from top to bottom as an example, even if the electrode 32 located in the front (e.g., the electrode below) is broken, the electrode 32 located in the rear (e.g., the electrode above) can still replace the electrode 32 in the front to apply discharge energy to the processing target area 110 of the object 100 to be processed. Therefore, the present invention can avoid adverse effects such as process interruption caused by the electrode 32 breaking through the electrode 32 by using the electrode replacement function.

請參閱圖1至圖2,治具36係選擇性例如由至少兩承載構件40及至少兩固持構件50分別對應組接而成。電極32之兩側A係分別活動式或固定式抵靠於兩承載構件40上,使得電極32之放電區段B呈懸空狀態,其中兩承載構件40係彼此隔開一段距離。兩承載構件40之尺寸及其所承載之電極32之高度並無特別 限定要相同或不相同,只要可使得電極32之放電區段B呈懸空狀態,即可適用於本發明中。固持構件50係選擇性可拆卸式或固定式穩固地組接承載構件40,固持構件50係設於座體52上,其中此座體52可為使得固持構件50位置固定之結構,或者是此座體52為能夠使得固持構件50進行移動或轉動等運動之運動機構,藉以對應地帶動承載構件40進行移動或轉動等運動,因此電極32之放電區段B可進行左右往復式移動。本發明不限於載台20帶動待加工物100朝向放電加工單元30的電極32移動或是座體52驅使電極32朝向待加工物100移動,只要放電加工(EDM)單元30與載台20上之待加工物100能夠沿著上述之加工行進方向F進行相對運動,即可適用於本發明中。以座體52為運動機構舉例,運動機構可例如為任何能夠左右往復式移動之移動機構,如滑動機構,或者是可例如為任何能夠往復式轉動或循環式轉動之轉動機構,如馬達,用以對應地驅動固持構件50進行移動或轉動等運動。藉此,承載構件40及固持構件50可選擇性與電極32一起往復式或循環式運動,使得電極32以放電區段B施加放電能量予待加工物100。為讓電極32於承載構件40有較佳的依附性,因此承載構件40之邊緣係選擇性具有導角47,如圖2所示。 Please refer to Figures 1 and 2. The fixture 36 is selectively composed of at least two supporting members 40 and at least two holding members 50 respectively correspondingly assembled. The two sides A of the electrode 32 are respectively movably or fixedly pressed against the two supporting members 40, so that the discharge section B of the electrode 32 is suspended, wherein the two supporting members 40 are separated from each other by a distance. The size of the two supporting members 40 and the height of the electrode 32 they carry are not particularly limited to be the same or different, as long as the discharge section B of the electrode 32 can be suspended, it can be applied to the present invention. The holding member 50 is selectively detachably or fixedly assembled with the supporting member 40, and the holding member 50 is arranged on a base 52, wherein the base 52 can be a structure that fixes the position of the holding member 50, or the base 52 is a motion mechanism that can move or rotate the holding member 50, thereby correspondingly driving the supporting member 40 to move or rotate, so that the discharge section B of the electrode 32 can move back and forth left and right. The present invention is not limited to the stage 20 driving the workpiece 100 to move toward the electrode 32 of the EDM unit 30 or the base 52 driving the electrode 32 to move toward the workpiece 100. As long as the EDM unit 30 and the workpiece 100 on the stage 20 can move relative to each other along the above-mentioned processing direction F, the present invention can be applied. Taking the base 52 as an example of a motion mechanism, the motion mechanism can be, for example, any moving mechanism capable of reciprocating left and right movement, such as a sliding mechanism, or any rotating mechanism capable of reciprocating rotation or cyclic rotation, such as a motor, to drive the holding member 50 to move or rotate accordingly. Thus, the supporting member 40 and the holding member 50 can selectively reciprocate or cyclically move with the electrode 32, so that the electrode 32 applies discharge energy to the object 100 to be processed in the discharge section B. In order to allow the electrode 32 to have better adhesion to the supporting member 40, the edge of the supporting member 40 selectively has a chamfer 47, as shown in FIG2.

在其他可行之實施例中,本發明之放電加工單元30可例如藉由往復式或循環式轉動兩個以上的承載構件40,以帶動多條電極32之放電區段B進行往復式或循環式移動。承載構件40與電極32之連接組態之兩種實施範例可如圖3(A)與(B)所示,每條電極32係分別環繞四個承載構件40,其中圖3(A)與圖3(B)為不同實施範例,圖3(A)為電極32沿著加工行進方向F平行排列,藉此多個電極32可對單一加工目標區110依序進行放電加工程序,圖3(B)則為電極32沿著第一方向X平行排列,藉此多個電極32可對複數個加工目標區110同時進行放電加工 程序。這些電極32共用四個承載構件40當中的兩個承載構件40,因此這些電極32之兩側A係相互接觸以呈現堆疊狀態且一起活動式抵靠於上述共用的兩個承載構件40上,至於其餘的承載構件40則成對設置於不同垂直高度或水平位置,使得電極32以一間隔於加工行進方向F(如圖3(A)所示)或於第一方向X(如圖3(B)所示)彼此平行排列。藉此,當承載構件40進行往復式或循環式轉動時,這些電極32之放電區段B也會相對於待加工物100於第二方向Y上進行位移。其中,上述共用的承載構件40係例如同步進行往復式或循環式轉動。 In other feasible embodiments, the discharge processing unit 30 of the present invention can, for example, rotate two or more supporting members 40 in a reciprocating or cyclic manner to drive the discharge sections B of the plurality of electrodes 32 to move in a reciprocating or cyclic manner. Two implementation examples of the connection configuration of the support member 40 and the electrode 32 can be shown in Figures 3(A) and (B). Each electrode 32 surrounds four support members 40 respectively. Figures 3(A) and 3(B) are different implementation examples. Figure 3(A) shows that the electrodes 32 are arranged in parallel along the processing direction F, so that multiple electrodes 32 can perform the discharge processing procedure on a single processing target area 110 in sequence. Figure 3(B) shows that the electrodes 32 are arranged in parallel along the first direction X, so that multiple electrodes 32 can perform the discharge processing procedure on multiple processing target areas 110 at the same time. These electrodes 32 share two of the four supporting members 40, so the two sides A of these electrodes 32 are in contact with each other to present a stacked state and are movably pressed against the two shared supporting members 40. The remaining supporting members 40 are arranged in pairs at different vertical heights or horizontal positions, so that the electrodes 32 are arranged parallel to each other at intervals in the processing direction F (as shown in FIG. 3 (A)) or in the first direction X (as shown in FIG. 3 (B)). Thus, when the supporting member 40 is reciprocatingly or cyclically rotated, the discharge section B of these electrodes 32 will also be displaced in the second direction Y relative to the object 100 to be processed. Among them, the shared supporting member 40 is, for example, synchronously reciprocatingly or cyclically rotated.

簡言之,本發明係舉例採用多種方式使得電極32之放電區段B與待加工物100之加工目標區110沿著加工行進方向F相對移動。第一種方式為待加工物100沿著加工行進方向F移動且電極32於加工行進方向F呈固定不動。第二種方式為電極32沿著加工行進方向F移動且待加工物100於加工行進方向F呈固定不動。第三種方式為電極32及待加工物100沿著加工行進方向F反方向移動。 In short, the present invention uses multiple methods to make the discharge section B of the electrode 32 and the processing target area 110 of the object 100 move relative to each other along the processing direction F. The first method is that the object 100 moves along the processing direction F and the electrode 32 is fixed in the processing direction F. The second method is that the electrode 32 moves along the processing direction F and the object 100 is fixed in the processing direction F. The third method is that the electrode 32 and the object 100 move in the opposite direction along the processing direction F.

同理,本發明還可採用多種方式使得電極32之放電區段B與待加工物100之加工目標區110沿著第二方向Y相對移動。第一種方式為待加工物100沿著第二方向Y移動且電極32於第二方向Y呈固定不動。第二種方式為電極32沿著第二方向Y移動且待加工物100於第二方向Y呈固定不動。第三種方式為電極32及待加工物100沿著第二方向Y反方向移動。其中,在使放電區段B與加工目標區110沿著第二方向Y相對移動的第二種方式中,本發明還可例如藉由治具36往復式或循環式捲動電極32,使得電極32左右(往復式)移動或持續(循環式)移動,或者是電極32固定在治具36上,但藉由座體52沿著各圖所示之第二方向Y左右(往復式)移動治具36以間接移動電極32。 Similarly, the present invention can also adopt multiple methods to make the discharge section B of the electrode 32 and the processing target area 110 of the object 100 to be processed move relative to each other along the second direction Y. The first method is that the object 100 to be processed moves along the second direction Y and the electrode 32 is fixed in the second direction Y. The second method is that the electrode 32 moves along the second direction Y and the object 100 to be processed is fixed in the second direction Y. The third method is that the electrode 32 and the object 100 to be processed move in opposite directions along the second direction Y. Among them, in the second method of making the discharge section B and the processing target area 110 move relative to each other along the second direction Y, the present invention can also, for example, reciprocate or cyclically roll the electrode 32 by the jig 36, so that the electrode 32 moves left and right (reciprocatingly) or continuously (cyclically), or the electrode 32 is fixed on the jig 36, but the jig 36 is moved left and right (reciprocatingly) along the second direction Y shown in the figures by the seat 52 to indirectly move the electrode 32.

惟須注意的是,本發明雖列舉上述各種進行放電加工程序之移動方式,但並非用以限定本發明。舉例而言,本發明請求保護之範圍亦可涵蓋待加工物100沿著加工行進方向F移動且電極32於加工行進方向F及第二方向Y均呈固定不動,或者是電極32沿著加工行進方向F移動且待加工物100於加工行進方向F及第二方向Y均呈固定不動。亦即,任何移動方式只要可進行放電加工程序皆屬於本發明請求保護之範圍。 However, it should be noted that although the present invention lists the above-mentioned various moving methods for performing the discharge processing procedure, it is not intended to limit the present invention. For example, the scope of protection claimed by the present invention may also cover the case where the object 100 to be processed moves along the processing direction F and the electrode 32 is fixed in both the processing direction F and the second direction Y, or the electrode 32 moves along the processing direction F and the object 100 to be processed is fixed in both the processing direction F and the second direction Y. In other words, any moving method that can perform the discharge processing procedure falls within the scope of protection claimed by the present invention.

如圖4(A)與(B)所示,由於在放電加工程序中,電極32之外觀(如,底部表面)容易產生耗損程度不一致之現象(即,本發明所定義之待修正區域),進而導致放電加工程序產生短路問題。雖然有相當多原因(例如外在原因及內在原因)均可能導致電極32產生耗損程度不一致之現象,然而為了更徹底解決上述耗損程度不一致現象所導致之短路問題,因此,如圖5(A)與(B)所示,本發明之放電加工(EDM)裝置10之一項特色在於具有修正裝置80,用以修正外觀上具有待修正區域之電極32。修正裝置80係對電極32進行一修正程序,例如在電極32對加工目標區110進行放電加工程序之同時修正電極32之外觀。惟,本發明不限於此,修正裝置80亦可例如在電極32對加工目標區110進行放電加工程序之前或者之後,對電極32進行修正程序。亦即,無論修正裝置80何時對電極32進行修正程序,只要有修正電極32之外觀使其放電可以穩定,即屬於本發明請求保護之範圍。圖4之(A)與(B)圖雖係不同視角所得之示意圖,惟為使圖面簡潔,故圖4(A)僅繪示各構件之部分結構,且圖4(B)僅繪示出欲特別描述之構件,且圖5與其餘類似圖式大致以相同方式呈現,故此處不另贅述。此外,在圖4至圖16所示之實施態樣中,治具36之軸心係平行於加工行進方向F。 As shown in FIG. 4 (A) and (B), in the EDM process, the appearance (e.g., the bottom surface) of the electrode 32 is prone to inconsistent wear (i.e., the area to be corrected defined by the present invention), which leads to a short circuit problem in the EDM process. Although there are many reasons (such as external reasons and internal reasons) that may cause the electrode 32 to have inconsistent wear, in order to more thoroughly solve the short circuit problem caused by the inconsistent wear, as shown in FIG. 5 (A) and (B), one of the features of the EDM device 10 of the present invention is that it has a correction device 80 for correcting the electrode 32 that has an area to be corrected in appearance. The correction device 80 performs a correction process on the electrode 32, for example, the appearance of the electrode 32 is corrected while the electrode 32 performs the discharge processing process on the processing target area 110. However, the present invention is not limited thereto, and the correction device 80 may also perform the correction process on the electrode 32, for example, before or after the electrode 32 performs the discharge processing process on the processing target area 110. That is, no matter when the correction device 80 performs the correction process on the electrode 32, as long as the appearance of the electrode 32 is corrected so that its discharge can be stable, it falls within the scope of protection claimed by the present invention. Although (A) and (B) of Figure 4 are schematic diagrams obtained from different viewing angles, in order to simplify the drawings, Figure 4 (A) only shows a partial structure of each component, and Figure 4 (B) only shows the components to be specifically described, and Figure 5 and other similar figures are presented in roughly the same way, so they are not described here. In addition, in the embodiments shown in Figures 4 to 16, the axis of the fixture 36 is parallel to the processing direction F.

舉例而言,如圖5(A)與(B)所示,本發明之修正裝置80可例如包含修刀元件82,用以在修正程序中,藉由修刀元件82與電極32之間之相對位移修正電極32之外觀。本發明之修刀元件82例如為雷射源、刀具或研磨件,其可例如為固定式或可移動式設置於載台20或座體52上,或是獨立設置於放電加工裝置10中(如圖6(A)至(C)所示),惟本發明不限於此,任何可使得電極32之外觀產生變化之技術手段,均屬於本發明請求保護之範圍。而且,只要修正裝置80之修刀元件82可修正電極32之放電區段B之外觀,例如使其耗損程度一致或者獲得所需之電極32之外觀,則不論本發明之修正裝置80為即時地、定時地、非定時地、週期性地或非週期性地對電極32之外觀進行修正程序,均屬於本發明請求保護之範圍。 For example, as shown in Fig. 5 (A) and (B), the correction device 80 of the present invention may include a trimming element 82, which is used to correct the appearance of the electrode 32 by the relative displacement between the trimming element 82 and the electrode 32 during the correction process. The trimming element 82 of the present invention is, for example, a laser source, a tool or a grinding piece, which may be fixed or movably arranged on the carrier 20 or the base 52, or independently arranged in the EDM device 10 (as shown in Fig. 6 (A) to (C)), but the present invention is not limited thereto, and any technical means that can change the appearance of the electrode 32 are within the scope of protection claimed by the present invention. Moreover, as long as the trimming element 82 of the correction device 80 can correct the appearance of the discharge section B of the electrode 32, for example, to make its wear level uniform or to obtain the desired appearance of the electrode 32, then regardless of whether the correction device 80 of the present invention performs a correction procedure on the appearance of the electrode 32 in real time, regularly, non-regularly, periodically or non-periodically, it all falls within the scope of protection claimed by the present invention.

本發明之修正裝置80可選擇性依據電極32之損耗速率(例如,理論或實測耗損速率)與放電加工程序之進給速度以定量調整方式修正電極32之外觀,其中修正裝置80可例如沿著加工行進方向F以定量調整方式修正電極32之外觀(例如,以預定速率沿著加工行進方向F使修刀元件82相對於待加工物100移動預定距離)或沿著第二方向Y以定量調整方式修正電極32之外觀(例如,以預定速率沿著第二方向Y使電極32相對於待加工物100移動預定長度)。或者是,修正裝置80可選擇性依據電極32之即時狀態以動態調整方式修正電極32之外觀。舉例而言,本發明還可選擇性例如藉由檢測元件89得知電極32之即時耗損程度等即時狀態。其中,檢測元件89例如為放電變化檢測元件或例如為具有光線發射器及光線接收器之光電檢測元件或影像檢測元件,用以藉由光線中斷或光線強度的變化等得知電極32之放電區段B之耗損程度。 The correction device 80 of the present invention can selectively correct the appearance of the electrode 32 in a quantitative adjustment manner according to the wear rate of the electrode 32 (e.g., theoretical or measured wear rate) and the feed rate of the discharge machining process, wherein the correction device 80 can, for example, correct the appearance of the electrode 32 in a quantitative adjustment manner along the machining direction F (e.g., moving the trimming element 82 relative to the object 100 at a predetermined speed along the machining direction F) or in a quantitative adjustment manner along the second direction Y (e.g., moving the electrode 32 relative to the object 100 at a predetermined speed along the second direction Y by a predetermined length). Alternatively, the correction device 80 can selectively correct the appearance of the electrode 32 in a dynamic adjustment manner according to the real-time state of the electrode 32. For example, the present invention can also selectively obtain the real-time status of the electrode 32, such as the real-time wear degree, by means of the detection element 89. The detection element 89 is, for example, a discharge change detection element or a photoelectric detection element or an image detection element having a light emitter and a light receiver, which is used to obtain the wear degree of the discharge section B of the electrode 32 by means of light interruption or light intensity change.

此外,修刀元件82可選擇性為升降式設計,藉此可依據電極32之損耗速率與放電加工程序之進給速度改變高度,使得電極32之放電區段B之耗損程度一致。舉例而言,假設載台20之移動速度(放電加工程序之進給速度)為每分鐘d長度,而電極32之理論損耗速率為每分鐘0.1d長度,若修刀元件82設於載台20上,則在進行放電加工程序時,本發明之修刀元件82可貼著電極32之底部表面,且藉由升降式設計每分鐘朝向電極32之方向伸出0.1d長度,藉以使得電極32之放電區段B在整個放電加工程序之過程中均可達到預定之耗損程度。同理,本發明之修刀元件82亦可依據電極32之即時耗損程度等即時狀態,以動態調整方式即時升降至所需之高度,藉以即時修正電極32之外觀。舉例而言,本發明之修刀元件82可例如為伸縮式設計以升降高度,或者是本發明之修刀元件82還可例如設置於升降機構90,如圖6(A)至(C)所示,藉此可隨著修正程序之需求而升降高度,且可控制修刀元件82之進給速度。升降機構90可例如為如圖6(B)與圖6(C)所示之滑台式升降台,即具有可沿著軌道91升降之滑台93,而修刀元件82則是例如經由承載晶圓之載台或是經由承載架96設置於滑台93上。或者是,升降機構90可例如為如圖6(A)所示之彈簧式(或伸縮式)升降台。而且,本發明之升降機構90不限於手動或自動式設計,只要可升降修刀元件82即屬於本發明請求保護之範圍。此外,修刀元件82還可例如經由平移機構92設置於升降機構90上,如圖6(C),即具有可沿著軌道95平移之滑台97,藉此在進行修正程序時,可選擇性利用平移機構92沿著軌道95將修刀元件82移動至電極32之下方,待修正程序完成後,再移出。本發明雖以圖6所示之結構作為說明範例,惟本發明不限於此,任何設計只要可使得修刀元件82移動位置而與電極32產生相對位移或是使電極32移動位置而與修刀元件82產生相對位移,均屬於本發明請求保護之範圍。 In addition, the trimming element 82 can be selectively designed as a lifting type, so that the height can be changed according to the wear rate of the electrode 32 and the feed speed of the discharge processing procedure, so that the wear degree of the discharge section B of the electrode 32 is consistent. For example, assuming that the moving speed of the carrier 20 (the feed speed of the discharge processing procedure) is d length per minute, and the theoretical wear rate of the electrode 32 is 0.1d length per minute, if the trimming element 82 is set on the carrier 20, then when the discharge processing procedure is performed, the trimming element 82 of the present invention can be attached to the bottom surface of the electrode 32, and through the lifting design, it can extend 0.1d length per minute toward the electrode 32, so that the discharge section B of the electrode 32 can reach a predetermined wear degree during the entire discharge processing procedure. Similarly, the trimming element 82 of the present invention can also be raised and lowered to a desired height in a dynamic adjustment manner according to the instantaneous state of the electrode 32, such as the instantaneous wear degree, so as to instantly correct the appearance of the electrode 32. For example, the trimming element 82 of the present invention can be a telescopic design to raise and lower the height, or the trimming element 82 of the present invention can also be set on a lifting mechanism 90, as shown in Figures 6 (A) to (C), so that the height can be raised and lowered as required by the correction process, and the feeding speed of the trimming element 82 can be controlled. The lifting mechanism 90 can be, for example, a slide-type lifting platform as shown in Figures 6 (B) and 6 (C), that is, it has a slide 93 that can be raised and lowered along a track 91, and the trimming element 82 is, for example, set on the slide 93 via a carrier that supports the wafer or via a carrier 96. Alternatively, the lifting mechanism 90 may be, for example, a spring-type (or telescopic) lifting platform as shown in FIG. 6 (A). Moreover, the lifting mechanism 90 of the present invention is not limited to manual or automatic designs, as long as the trimming element 82 can be lifted and lowered, it belongs to the scope of protection claimed by the present invention. In addition, the trimming element 82 may also be arranged on the lifting mechanism 90, for example, via a translation mechanism 92, as shown in FIG. 6 (C), that is, a slide 97 that can be translated along a track 95, so that when performing a correction procedure, the trimming element 82 can be selectively moved to the bottom of the electrode 32 along the track 95 by using the translation mechanism 92, and then moved out after the correction procedure is completed. Although the present invention uses the structure shown in FIG. 6 as an example for explanation, the present invention is not limited thereto. Any design that can move the trimming element 82 to produce relative displacement with the electrode 32 or that can move the electrode 32 to produce relative displacement with the trimming element 82 is within the scope of protection claimed by the present invention.

以修刀元件82為雷射源或刀具為例,其可例如位於電極32之底側或側面,當修刀元件82與電極32之間產生相對位移時,即可利用雷射源之雷射光或刀具之刀刃削除電極32底部之部分厚度,使得電極32之放電區段B上原本具有損耗程度不一致之電極32之外觀變得平整化。以修刀元件82為研磨件為例,其可例如位於電極32之底側,當修刀元件82與電極32之間產生相對位移時,藉由研磨件之研磨成分研磨除去電極32底部之部分厚度,可平整化原本具有損耗程度不一致之電極32之外觀,如圖5(B)與圖6(A)至(C)所示。 Taking the trimming element 82 as a laser source or a tool as an example, it can be located at the bottom or side of the electrode 32. When the trimming element 82 and the electrode 32 are relatively displaced, the laser light of the laser source or the blade of the tool can be used to remove part of the thickness of the bottom of the electrode 32, so that the appearance of the electrode 32 with inconsistent wear degree on the discharge section B of the electrode 32 becomes flat. Taking the trimming element 82 as an abrasive piece as an example, it can be located at the bottom of the electrode 32. When the trimming element 82 and the electrode 32 are relatively displaced, the abrasive component of the abrasive piece can be used to remove part of the thickness of the bottom of the electrode 32, so that the appearance of the electrode 32 with inconsistent wear degree can be flattened, as shown in Figure 5 (B) and Figure 6 (A) to (C).

另外,由於修正裝置80在進行修正程序之過程中,可能在修刀元件82或電極32上殘留刀屑等物質。因此,如圖7(A)與(B)所示,本發明之修正裝置80更選擇性包含除屑元件83,其可例如為海綿或刮條等清潔用具或超音波元件,且例如設於載台20、座體52或其他元件,用以抵頂電極32之底部及/或修刀元件82之頂部,藉此當修正裝置80藉由修刀元件82與電極32之間之相對位移以修刀元件82修正電極32之外觀時,除屑元件83還可同時去除殘留在修刀元件82及/或電極32上之刀屑等物質。除屑元件83之設置不侷限於固定式或可移動式設計,只要可達到清潔及除去殘留刀屑等物質,即屬於本發明請求保護之範圍。此外,本發明之除屑元件83還可選擇性為超音波元件,且例如設於圖6所示之修刀元件82、升降機構90或平移機構92上,藉此可增進修刀速率並提供除屑效果以減少磨砂紙卡屑或電極32黏附磨屑。 In addition, since the correction device 80 may leave materials such as cuttings on the trimming element 82 or the electrode 32 during the correction process, as shown in Fig. 7 (A) and (B), the correction device 80 of the present invention further selectively includes a cutting removal element 83, which may be a cleaning tool such as a sponge or a scraper or an ultrasonic element, and is disposed on the carrier 20, the base 52 or other elements to abut against the bottom of the electrode 32 and/or the top of the trimming element 82, so that when the correction device 80 corrects the appearance of the electrode 32 with the trimming element 82 by the relative displacement between the trimming element 82 and the electrode 32, the cutting removal element 83 can also remove materials such as cuttings remaining on the trimming element 82 and/or the electrode 32 at the same time. The arrangement of the chip removal element 83 is not limited to a fixed or movable design. As long as it can achieve cleaning and removal of residual knife chips and other materials, it belongs to the scope of protection claimed by the present invention. In addition, the chip removal element 83 of the present invention can also be selectively an ultrasonic element, and for example, it can be arranged on the knife trimming element 82, the lifting mechanism 90 or the translation mechanism 92 shown in Figure 6, thereby increasing the knife trimming rate and providing a chip removal effect to reduce the jamming of sanding paper or the adhesion of grinding chips to the electrode 32.

除此之外,本發明之修正裝置80還可例如藉由移位方式移開電極32之耗損程度不一致之區域C,使其避免作為放電區段B使用。如圖8(A)與圖8(B)所示,本發明之修正裝置80可選擇性例如包含捲動機構84。其中,當電極32之外觀於放電區段B出現待修正區域時,例如出現程度不一致之磨損現象或甚至斷 裂現象或跡象時,則修正裝置80之捲動機構84可藉由例如順時針或逆時針至少捲動上述外觀上出現待修正區域之電極32或移動上述外觀上出現待修正區域(區域C)之電極32使其避開(或稱錯開)待加工物100之加工目標區110,例如將斷裂之電極32捲動至穩定構件22之外側,藉此可改以電極32之其他正常區域作為放電區段B,並阻隔斷裂之電極32產生之干擾。本發明可例如以具有捲動設計之固持構件50及承載構件40之治具36作為捲動機構84。本發明之捲動機構84不限於手動或自動式設計,且結構設計不限於上述舉例,只要可移開電極32之耗損程度不一致之區域,使其避免作為放電區段B,即屬於本發明請求保護之範圍。 In addition, the correction device 80 of the present invention can also remove the region C of the electrode 32 with inconsistent wear levels by displacement, so as to prevent it from being used as the discharge section B. As shown in FIG8(A) and FIG8(B), the correction device 80 of the present invention can optionally include a rolling mechanism 84, for example. When the electrode 32 has an area to be corrected in the discharge section B, such as a wear phenomenon of inconsistent degree or even a fracture phenomenon or sign, the rolling mechanism 84 of the correction device 80 can roll at least the electrode 32 with the area to be corrected in the appearance, or move the electrode 32 with the area to be corrected (area C) in the appearance to avoid (or stagger) the processing target area 110 of the object 100, for example, rolling the fractured electrode 32 to the outside of the stabilizing member 22, so that other normal areas of the electrode 32 can be used as the discharge section B, and the interference caused by the fractured electrode 32 can be blocked. The present invention can, for example, use a holding member 50 with a rolling design and a jig 36 of a carrying member 40 as a rolling mechanism 84. The rolling mechanism 84 of the present invention is not limited to manual or automatic design, and the structural design is not limited to the above examples. As long as the area with inconsistent wear degree of the electrode 32 can be removed to avoid it from being used as the discharge section B, it belongs to the scope of protection requested by the present invention.

舉例而言,如圖9(A)至圖9(C)所示,在進行放電加工程序的過程當中(亦即,在完成放電加工程序之前),如果最下方之電極32之外觀於放電區段B出現如圖9(A)之斷裂現象時,則本發明可選擇性藉由移位方式令待加工物100主動移動位置(例如向左移動,如圖9(B)所示,使得右邊斷裂之電極32脫離(避開)待加工物100)。接著,再例如向右移動,使得左邊斷裂之電極32脫離(避開)待加工物100。此時,亦可選擇性吸住或黏住斷裂之電極32,甚至剪掉斷裂之電極32,或者是甚至只要令斷裂之電極32脫離待加工物100即可。接著,可如圖9(C)所示,令待加工物100移動至先前之放電加工位置,並以其他未斷裂之電極32繼續對待加工物100進行先前尚未完成之放電加工程序,直至完成整個放電加工程序。故,本發明可避免傳統製程需完全中斷整個放電加工裝置及放電加工程序,並手動整理電極32後,才能繼續進行上述未完成之放電加工程序。同理,本發明亦可例如藉由治具36(或,修正裝置80之捲動機構84)將斷裂之電極32向左及/或向右捲動至穩定構件22之外側,如圖9(C)所示,再以其他未斷裂之電極32繼續對待加工物100進行先前尚未完成之放電加工程序,直至完成整個放電加工程序。 在圖9(A)至圖9(C)所示之實施範例中,本發明係以穩定構件22位於載台20上且例如位於待加工物100之兩側為例,藉此當電極32被排出至穩定構件22之外側之後,自然就無法再進入穩定構件22之內側,因此可輕易地排除有出現斷裂現象之電極32。同理,本發明不限於此,本發明之穩定構件22亦可選擇性位在座體52上,或者是穩定構件22同時位於載台20與座體52上,同樣可達到藉由移位方式排除斷裂之電極32之效果。 For example, as shown in FIG. 9(A) to FIG. 9(C), during the process of performing the discharge machining procedure (i.e., before the discharge machining procedure is completed), if the appearance of the bottommost electrode 32 in the discharge section B is broken as shown in FIG. 9(A), the present invention can selectively move the position of the object 100 to be processed by means of displacement (for example, moving to the left, as shown in FIG. 9(B), so that the electrode 32 with a break on the right side is separated from (avoided) the object 100 to be processed). Then, for example, moving to the right again, so that the electrode 32 with a break on the left side is separated from (avoided) the object 100 to be processed. At this time, the broken electrode 32 can be selectively sucked or adhered, or even cut off, or even just make the broken electrode 32 separate from the object 100. Then, as shown in FIG9 (C), the object 100 can be moved to the previous discharge processing position, and other unbroken electrodes 32 can continue to perform the previously unfinished discharge processing procedure on the object 100 until the entire discharge processing procedure is completed. Therefore, the present invention can avoid the need for the traditional process to completely interrupt the entire discharge processing device and discharge processing procedure, and manually arrange the electrode 32 before continuing the above-mentioned unfinished discharge processing procedure. Similarly, the present invention can also roll the broken electrode 32 to the left and/or right to the outside of the stabilizing member 22, for example, by means of the jig 36 (or the rolling mechanism 84 of the correction device 80), as shown in FIG9(C), and then continue to perform the previously unfinished discharge processing procedure on the object 100 to be processed with other unbroken electrodes 32 until the entire discharge processing procedure is completed. In the implementation examples shown in FIG. 9(A) to FIG. 9(C), the present invention takes the stabilizing member 22 as an example, which is located on the carrier 20 and, for example, on both sides of the object 100 to be processed. Thus, after the electrode 32 is discharged to the outside of the stabilizing member 22, it naturally cannot enter the inside of the stabilizing member 22, so the electrode 32 with a broken phenomenon can be easily removed. Similarly, the present invention is not limited to this. The stabilizing member 22 of the present invention can also be selectively located on the base 52, or the stabilizing member 22 can be located on the carrier 20 and the base 52 at the same time, and the effect of removing the broken electrode 32 by displacement can also be achieved.

簡言之,本發明之修正裝置80可例如藉由移除方式使得電極32之放電區段B之耗損程度一致,藉以提供放電穩定之效果。或者是,本發明之修正裝置80可例如藉由移位方式移開電極32之耗損程度不一致之區域C,使其避免作為放電區段B。惟,本發明不限於此,本發明之修正裝置80亦可例如綜合上述兩種方式或者採用任何可行之方式,藉以達到修正電極32之外觀之效果。換言之,無論修正裝置80採用何種技術手段對電極32進行修正程序,只要可解決耗損程度不一致現象所導致之短路問題,即屬於本發明請求保護之範圍。 In short, the correction device 80 of the present invention can make the wear degree of the discharge section B of the electrode 32 consistent, for example, by removal, so as to provide a stable discharge effect. Alternatively, the correction device 80 of the present invention can, for example, remove the area C of the electrode 32 with inconsistent wear degree by displacement, so as to avoid it from being the discharge section B. However, the present invention is not limited to this, and the correction device 80 of the present invention can also, for example, combine the above two methods or adopt any feasible method to achieve the effect of correcting the appearance of the electrode 32. In other words, no matter what technical means the correction device 80 adopts to perform the correction procedure on the electrode 32, as long as it can solve the short circuit problem caused by the inconsistent wear degree phenomenon, it belongs to the scope of protection claimed by the present invention.

本發明之修正裝置80還可選擇性更包含至少一夾固元件86(如圖4至圖9所示),固定式設於座體52上或放電加工裝置10之其他構件上,用以選擇性夾固電極32之放電區段B之至少一側,例如兩側。夾固元件86之實施態樣例如為具有虎鉗之結構,但不限於此。舉例而言,當本發明利用左右(沿著第二方向Y)移動座體52藉以經由治具36帶動電極32同步地相對於待加工物100左右位移時,則夾固元件86可選擇性夾固電極32(如圖8(B)所示)以便電極32進行放電加工程序。夾固元件86不僅可用來選擇性固定電極32之位置,還可避免電極32在進行放電加工程序時因受到拉扯而產生鬆動現象並導致電極32之張力降低,進而造成放電加工程序受到不良影響。同理,當治具36有捲動電極32之需求(例如進 行修正程序或改由移動電極32以進行放電加工程序)時,則夾固元件86可鬆開電極32。 The correction device 80 of the present invention may further optionally include at least one clamping element 86 (as shown in FIGS. 4 to 9 ), which is fixedly disposed on the base 52 or other components of the discharge processing device 10 to selectively clamp at least one side, such as both sides, of the discharge section B of the electrode 32. The implementation form of the clamping element 86 is, for example, a structure having a vise, but is not limited thereto. For example, when the present invention utilizes the base 52 to be moved left and right (along the second direction Y) to synchronously drive the electrode 32 to move left and right relative to the object to be processed 100 via the fixture 36, the clamping element 86 can selectively clamp the electrode 32 (as shown in FIG. 8 (B)) so that the electrode 32 can perform the discharge processing procedure. The clamping element 86 can not only be used to selectively fix the position of the electrode 32, but also prevent the electrode 32 from loosening due to being pulled during the EDM process, which causes the tension of the electrode 32 to decrease, thereby causing the EDM process to be adversely affected. Similarly, when the fixture 36 needs to roll the electrode 32 (for example, to perform a correction process or to move the electrode 32 to perform the EDM process), the clamping element 86 can loosen the electrode 32.

如圖5至圖9所示,由於在放電加工程序中,電極32之放電區段B係沿著加工行進方向F前進以施加放電能量予待加工物100之加工目標區110,而且電極32之放電區段B與待加工物100之加工目標區110又同時沿著第二方向Y呈相對移動,因此為了避免電極32在放電加工程序過程中所產生的抖動現象,本發明之放電加工裝置10係選擇性具有穩定構件22設於座體52上或放電加工裝置10之其他構件上,如載台20上,且穩定構件22之設置位置係例如位於電極32之放電區段B之至少一側邊或外側,穩定構件22之型態並無特別限定,只要可減少電極32抖動產生,即可適用於本發明中。舉例而言,穩定構件22例如具有導槽281,導槽281之尺寸,如深度或寬度例如為足以活動式容置電極32,導槽281之數量係對應於電極32,藉此可保持電極32彼此之間距,減少沿著第一方向X之擺盪,有效發揮穩定電極32並提供導引效果。除此之外,穩定構件22亦可選擇性為高度可伸縮之結構設計,藉此可隨著待加工物100之加工目標區110之加工溝槽之深度而改變穩定構件22與電極32接觸之導槽281之高度。其中,穩定構件22之兩個相鄰導槽281之間之條狀結構,即可作為分隔柱使用,藉以隔開多個電極32且使其彼此平行。其中,電極32抵靠在分隔柱上,例如電極32係活動式抵靠在分隔柱上,分隔柱之位置固定,但可為固定式或滾動式設計,且具有限位槽,藉以作為導向柱。分隔柱也可選擇性為導電材質,藉此電極32可經由分隔柱電性連接供電單元34,亦即分隔柱也可選擇性作為圖1之電接點31使用。此外,分隔柱也可為絕緣材質,避免電極32間電性連接。其中,兩承載構件40係例如同 步進行往復式或循環式轉動,且轉動速度相同,因此這些電極32沿著第二方向Y之往復式或循環式移動的速度也會一樣。 As shown in FIGS. 5 to 9, in the discharge processing procedure, the discharge section B of the electrode 32 moves along the processing direction F to apply discharge energy to the processing target area 110 of the object 100 to be processed, and the discharge section B of the electrode 32 and the processing target area 110 of the object 100 to be processed move relatively along the second direction Y at the same time. Therefore, in order to avoid the electrode 32 from generating The jitter phenomenon, the discharge processing device 10 of the present invention selectively has a stabilizing member 22 disposed on the base 52 or other components of the discharge processing device 10, such as the carrier 20, and the stabilizing member 22 is disposed, for example, on at least one side or outside of the discharge section B of the electrode 32. The type of the stabilizing member 22 is not particularly limited, as long as it can reduce the jitter of the electrode 32, it can be applied to the present invention. For example, the stabilizing member 22 has a guide groove 281, and the size of the guide groove 281, such as the depth or width, is sufficient to flexibly accommodate the electrode 32. The number of the guide grooves 281 corresponds to the number of the electrodes 32, thereby maintaining the distance between the electrodes 32, reducing the swing along the first direction X, effectively stabilizing the electrode 32 and providing a guiding effect. In addition, the stabilizing member 22 can also be selectively designed as a highly retractable structure, thereby changing the height of the guide groove 281 where the stabilizing member 22 contacts the electrode 32 according to the depth of the processing groove of the processing target area 110 of the object 100 to be processed. The strip structure between two adjacent guide grooves 281 of the stabilizing member 22 can be used as a partition column to separate multiple electrodes 32 and make them parallel to each other. The electrode 32 is against the partition column, for example, the electrode 32 is movably against the partition column, the position of the partition column is fixed, but it can be a fixed or rolling design, and has a limit groove to serve as a guide column. The partition column can also be selectively made of conductive material, so that the electrode 32 can be electrically connected to the power supply unit 34 through the partition column, that is, the partition column can also be selectively used as the electrical contact 31 of Figure 1. In addition, the partition column can also be made of insulating material to avoid electrical connection between the electrodes 32. The two supporting members 40 are, for example, synchronously reciprocating or cyclically rotating at the same speed, so the reciprocating or cyclic movement speeds of the electrodes 32 along the second direction Y are also the same.

如圖10(A)、圖10(B)、圖11(A)與圖11(B)所示,本發明之修正裝置80可選擇性更包含至少一分條元件85,例如設置於座體52上或放電加工裝置之任何位置上,藉由分條元件85與板狀電極32之間之相對移動,可將電極32(例如板狀)切割成彼此平行之複數個電極條32’(例如條狀)。分條元件85例如為具有多個刀刃之虎鉗夾刀,但不限於此。舉例而言,虎鉗夾刀之刀刃若夾住板狀之電極32,則當分條元件85與板狀電極32之間沿著第二方向Y產生相對移動時(例如,分條元件85之位置為固定,而電極32藉由治具36捲動以於第二方向Y上相對於分條元件85水平移動位置),則寬度較寬之板狀電極32就會被切割成多條寬度較窄之電極條32’。由於相鄰之刀刃之間距即等於電極條32’之寬度。因此,本發明還可改變虎鉗夾刀之多個刀刃之間距或數目,以調整電極條32’之寬度或條數。此外,若本發明採用捲動電極32之方式使得分條元件85得以對電極32進行分條程序,由於治具36有捲動電極32之需求,因此本發明之夾固元件86可選擇性於分條元件85進行分條程序時暫時性釋放電極32。同理,若本發明採用移動分條元件85之方式對位置固定之電極32進行分條程序,則本發明之夾固元件86可選擇性於分條元件85進行分條程序時夾固電極32以防止電極32捲動。 As shown in Fig. 10(A), Fig. 10(B), Fig. 11(A) and Fig. 11(B), the correction device 80 of the present invention may optionally further include at least one striping element 85, for example, disposed on the base 52 or at any position of the EDM device, and the electrode 32 (for example, a plate) may be cut into a plurality of electrode strips 32' (for example, strips) parallel to each other by relative movement between the striping element 85 and the plate-shaped electrode 32. The striping element 85 is, for example, a vise with multiple blades, but is not limited thereto. For example, if the blade of the vise clamp clamps the plate-shaped electrode 32, when the striping element 85 and the plate-shaped electrode 32 move relative to each other along the second direction Y (for example, the position of the striping element 85 is fixed, and the electrode 32 is rolled by the fixture 36 to move horizontally relative to the striping element 85 in the second direction Y), the wider plate-shaped electrode 32 will be cut into a plurality of narrower electrode strips 32'. Since the distance between adjacent blades is equal to the width of the electrode strip 32', the present invention can also change the distance or number of the multiple blades of the vise clamp to adjust the width or number of the electrode strips 32'. In addition, if the present invention adopts the method of rolling the electrode 32 so that the stripping element 85 can perform the stripping process on the electrode 32, since the fixture 36 has the need to roll the electrode 32, the clamping element 86 of the present invention can selectively release the electrode 32 temporarily when the stripping element 85 performs the stripping process. Similarly, if the present invention adopts the method of moving the stripping element 85 to perform the stripping process on the electrode 32 with a fixed position, the clamping element 86 of the present invention can selectively clamp the electrode 32 when the stripping element 85 performs the stripping process to prevent the electrode 32 from rolling.

如圖12(A)及12(B)所示,本發明之修正裝置80可選擇性包含至少一整刀元件87,例如設置於座體52上或放電加工裝置10之任何位置上,整刀元件87接觸電極32,藉由整刀元件87與電極32之間之相對移動,可將條狀或板狀之電極32之放電區段B整理成直線狀或豎直狀,若電極32之數目為複數個,則整刀元件87可將電極32整理成彼此平行之狀態。整刀元件87例如為具有多個梳齒, 且藉由兩個相鄰之梳齒分別抵頂每個電極32之兩側,且整刀元件87例如為可動式設計,例如由放電區段B之一側往另一側(沿著第二方向Y)移動,但不限於此。此外,若本發明藉由移動整刀元件87之方式對位置固定之電極32進行整刀程序,則本發明之夾固元件86可選擇性於整刀元件87進行整刀程序時夾固電極32以防止電極32鬆動。同理,若本發明採用捲動電極32之方式使得整刀元件87得以對電極32進行整刀程序,因為治具36有捲動電極32之需求,因此本發明之夾固元件86可選擇性於整刀元件87進行整刀程序時暫時性釋放電極32。其中,整刀元件87之梳齒,即可作為分隔柱使用,藉以隔開多個電極32且使其彼此平行。 As shown in Figures 12(A) and 12(B), the correction device 80 of the present invention may optionally include at least one straightening knife element 87, for example, it is arranged on the base 52 or at any position of the discharge processing device 10, and the straightening knife element 87 contacts the electrode 32. Through the relative movement between the straightening knife element 87 and the electrode 32, the discharge section B of the strip or plate-shaped electrode 32 can be arranged into a straight line or vertical shape. If the number of electrodes 32 is plural, the straightening knife element 87 can arrange the electrodes 32 into a state parallel to each other. The trimming element 87, for example, has a plurality of teeth, and two adjacent teeth respectively abut the two sides of each electrode 32, and the trimming element 87, for example, is a movable design, for example, moving from one side of the discharge section B to the other side (along the second direction Y), but not limited thereto. In addition, if the present invention performs a trimming process on a fixed electrode 32 by moving the trimming element 87, the clamping element 86 of the present invention can selectively clamp the electrode 32 when the trimming element 87 performs the trimming process to prevent the electrode 32 from loosening. Similarly, if the present invention adopts the method of rolling the electrode 32 so that the knife straightening element 87 can perform the knife straightening process on the electrode 32, because the fixture 36 has the need to roll the electrode 32, the clamping element 86 of the present invention can selectively release the electrode 32 temporarily when the knife straightening element 87 performs the knife straightening process. Among them, the comb teeth of the knife straightening element 87 can be used as a partition column to separate multiple electrodes 32 and make them parallel to each other.

如圖13(A)與13(B)所示,本發明之修正裝置80可選擇性更包含一位向校正元件88,用以於當電極32之加工行進方向F出現偏斜等偏移現象時,依據此偏移現象調整電極32與待加工物100之相對位向以校正電極32與待加工物100之加工行進方向F。舉例而言,位向校正元件88可例如為伸縮式推桿(如,手動式或電動式伸縮式推桿),藉由例如推動載台20、電極32或放電加工裝置中可使電極32或待加工物100改變相對位向之其他構件,可達到例如沿著第一方向X對應地調整電極32與待加工物100之相對位向之效果。舉例而言,本發明可例如藉由檢測元件89得知電極32之加工行進方向F是否產生偏移。其中,檢測元件89例如為放電變化檢測元件或例如為具有光線發射器及光線接收器之光電檢測元件或影像檢測元件,用以藉由光線中斷或光線強度的變化等得知電極32之加工行進方向F是否產生偏移。 As shown in FIGS. 13(A) and 13(B), the correction device 80 of the present invention may optionally further include a position correction element 88, which is used to adjust the relative position of the electrode 32 and the object 100 to be processed according to the deviation phenomenon when the processing direction F of the electrode 32 is deflected or otherwise offset to correct the processing direction F of the electrode 32 and the object 100. For example, the position correction element 88 may be a telescopic push rod (e.g., a manual or electric telescopic push rod), and by, for example, pushing the stage 20, the electrode 32, or other components in the EDM apparatus that can change the relative position of the electrode 32 or the object 100 to be processed, the relative position of the electrode 32 and the object 100 to be processed can be adjusted accordingly along the first direction X. For example, the present invention can detect whether the processing direction F of the electrode 32 is offset by using the detection element 89. The detection element 89 is, for example, a discharge change detection element or a photoelectric detection element or an image detection element having a light emitter and a light receiver, which is used to detect whether the processing direction F of the electrode 32 is offset by light interruption or light intensity change.

除此之外,在本發明中,治具36往復式或循環式捲動電極32之技術手段可採用如圖14與圖15所示之態樣,其中電極32例如環繞(雙側橫跨)兩治具36或僅單側橫跨兩治具36。兩治具36可轉動式設於座體52上,兩治具36係例如 經由兩聯軸器55連接兩馬達58,藉此兩治具36可經由兩馬達58之運轉而對應旋轉,並且使得電極32沿著第二方向Y進行往復式或循環式移動。由於電極32之放電區段B呈懸空狀態,因此本發明選擇性具有張力控制模組66(如圖15所示),其係例如包含張力量測單元60及控制器68,其中張力量測單元60係用於量測電極32的張力值,控制器68係電性連接兩馬達58,藉以依據電極32的張力值控制兩馬達58,使兩馬達58分別進行等速之收放轉動,進而調整電極32之張力值,藉以使得電極32在沿著第二方向Y進行運動時仍維持指定數值之張力值。此外,本發明還可例如依據電極32之長度及移動速度計算兩馬達58交換運轉方向之時間,進而達到使電極32呈往復移動之效果。 In addition, in the present invention, the technical means for the fixture 36 to reciprocate or cyclically roll the electrode 32 can adopt the state shown in Figures 14 and 15, wherein the electrode 32, for example, surrounds (crosses both sides) two fixtures 36 or only crosses one side of the two fixtures 36. The two fixtures 36 are rotatably arranged on the base 52, and the two fixtures 36 are, for example, connected to two motors 58 via two couplings 55, whereby the two fixtures 36 can rotate correspondingly through the operation of the two motors 58, and the electrode 32 is moved reciprocally or cyclically along the second direction Y. Since the discharge section B of the electrode 32 is in a suspended state, the present invention selectively has a tension control module 66 (as shown in FIG. 15 ), which includes, for example, a tension measurement unit 60 and a controller 68, wherein the tension measurement unit 60 is used to measure the tension value of the electrode 32, and the controller 68 is electrically connected to the two motors 58, so as to control the two motors 58 according to the tension value of the electrode 32, so that the two motors 58 respectively perform the same speed of retraction and extension rotation, thereby adjusting the tension value of the electrode 32, so that the electrode 32 still maintains the tension value of the specified value when moving along the second direction Y. In addition, the present invention can also calculate the time for the two motors 58 to exchange the running direction according to the length and movement speed of the electrode 32, thereby achieving the effect of making the electrode 32 reciprocate.

須注意的是,本發明雖列舉多個構件以執行一種或多種功能,然而本發明並不限於此。本發明可選擇性使得單一構件執行多種功能,例如將穩定構件22及整刀元件87整合成同一構件,或者是例如將穩定構件22、整刀元件87、夾固元件86、除屑元件83及放電加工裝置10之其他構件之一者或多者整合成同一構件。同理,本發明亦不限於選擇上述之全部構件,本發明之放電加工裝置亦可從上述之多個構件中僅選擇部分構件,以便進行放電加工程序。 It should be noted that although the present invention lists multiple components to perform one or more functions, the present invention is not limited to this. The present invention can selectively allow a single component to perform multiple functions, such as integrating the stabilizing component 22 and the whole blade component 87 into the same component, or, for example, integrating the stabilizing component 22, the whole blade component 87, the clamping component 86, the chip removal component 83 and one or more of the other components of the EDM device 10 into the same component. Similarly, the present invention is not limited to selecting all of the above components. The EDM device of the present invention can also select only some of the components from the above components to perform the EDM process.

在上述各實施範例中,本發明之放電加工單元30皆可選擇性包含排渣單元。舉例而言,如圖16(A)與(B)所示之實施範例,本發明之放電加工單元30可選擇性包含排渣單元64,放電加工單元30對待加工物100進行放電加工程序時,排渣單元64係提供一或多個外力排除電極32對待加工物100施加放電能量所產生之殘渣,排渣單元64所產生之外力施力方向或施加位置係對應於電極32之放電區段B。其中,排渣單元64可例如為氣流產生器、水流產生器、超音波產生器、壓電震盪器或磁力產生元件。外力可例如為氣流、水流、超音波震盪、壓 電震盪、吸力或磁力等。排渣單元64不限於設置於載台20上,甚至可設置於電極32之放電區段B之周圍。以排渣單元64為超音波產生器或壓電震盪器為例,排渣單元64可例如設置於治具36或載台20上,藉由直接產生外力直接作用於治具36或載台20上,排渣單元64所產生之外力還可例如使治具36、待加工物100或電極32產生震盪,且例如同時產生震盪,可提供輔助排除殘渣之效果。此外,如圖16(B)所示,本發明之排渣單元64亦可選擇性依據待加工物100之外形調整外力之施加方向及/或施加位置以排除電極32對待加工物100施加放電能量所產生之殘渣。舉例而言,以排渣單元64為可噴水清除殘渣之水流產生器為例,排渣單元64例如為具有多個可移動位置之噴頭65,且可依據待加工物100之外形而調整噴水之方向。例如,待加工物100若為晶錠,則排渣單元64之多個噴頭65係分布於晶錠之弧面上,且選擇性分布於晶錠之弧面之兩側。甚至,排渣單元64之多個噴頭65還可例如選擇性隨著放電加工之即時深度位置,而調整弧型之形狀或噴頭的位置,藉此可達到隨著待加工物100之外形而動態調整噴水之效果。同理,此排渣單元64亦可作為上述之除屑元件使用上述雖僅以排渣單元64為水流產生器舉例說明,惟本發明所屬技術領域中具有通常知識者,應當了解如何修改任何可行之排渣單元64,使其達到本發明之動態調整噴水設計之效果或達到隨著待加工物100之外形而動態噴水之效果,故此處不另贅述。其中,在圖16(A)與(B)所示之實施範例中,承載構件40分別包含第一片材44a及第二片材44b,且電極32係夾固於第一片材44a與第二片材44b之間,藉此可使得複數個電極32於加工行進方向F上彼此平行,以便對待加工物100進行放電加工程序。舉例而言,承載構件40係選擇性例如為具有穿槽43,承載構件40可利用穿槽43套接在固持 構件50之凸塊53上。由於,電極32係夾固於治具36上,因此本發明藉由此治具36之快拆式設計,可達到快速替換電極32之效果。 In each of the above-mentioned embodiments, the discharge processing unit 30 of the present invention can selectively include a slag removal unit. For example, as shown in the embodiments of FIG. 16 (A) and (B), the discharge processing unit 30 of the present invention can selectively include a slag removal unit 64. When the discharge processing unit 30 performs the discharge processing procedure on the object 100 to be processed, the slag removal unit 64 provides one or more external forces to remove the slag generated by the electrode 32 applying the discharge energy to the object 100 to be processed. The external force applied direction or applied position generated by the slag removal unit 64 corresponds to the discharge section B of the electrode 32. The slag removal unit 64 can be, for example, an air flow generator, a water flow generator, an ultrasonic generator, a piezoelectric oscillator, or a magnetic force generating element. The external force may be, for example, air flow, water flow, ultrasonic vibration, piezoelectric vibration, suction or magnetic force. The slag removal unit 64 is not limited to being disposed on the carrier 20, and may even be disposed around the discharge section B of the electrode 32. For example, if the slag removal unit 64 is an ultrasonic generator or a piezoelectric vibration device, the slag removal unit 64 may be disposed on the fixture 36 or the carrier 20, and the external force generated by the slag removal unit 64 may also cause the fixture 36, the object 100 to be processed or the electrode 32 to vibrate, and may also cause vibrations at the same time, thereby providing an auxiliary effect of removing slag. In addition, as shown in FIG. 16(B), the deslagging unit 64 of the present invention can also selectively adjust the direction and/or position of applying the external force according to the shape of the object 100 to be processed to remove the slag generated by the electrode 32 applying the discharge energy to the object 100 to be processed. For example, the deslagging unit 64 is a water flow generator that can spray water to remove the slag. The deslagging unit 64 is, for example, a nozzle 65 with multiple movable positions, and the direction of the water spray can be adjusted according to the shape of the object 100 to be processed. For example, if the object 100 to be processed is an ingot, the multiple nozzles 65 of the deslagging unit 64 are distributed on the curved surface of the ingot, and are selectively distributed on both sides of the curved surface of the ingot. Even more, the multiple nozzles 65 of the slag removal unit 64 can selectively adjust the arc shape or the position of the nozzle according to the instantaneous depth position of the discharge machining, so as to achieve the effect of dynamically adjusting the water spraying according to the external shape of the object 100 to be processed. Similarly, this slag removal unit 64 can also be used as the above-mentioned chip removal element. Although the above-mentioned slag removal unit 64 is only used as a water flow generator as an example, those with ordinary knowledge in the technical field to which the present invention belongs should understand how to modify any feasible slag removal unit 64 to achieve the effect of the dynamic adjustment of the water spraying design of the present invention or the effect of dynamically spraying according to the external shape of the object 100 to be processed, so it is not further described here. Among them, in the embodiment shown in Figures 16 (A) and (B), the supporting member 40 includes a first sheet 44a and a second sheet 44b, and the electrode 32 is clamped between the first sheet 44a and the second sheet 44b, so that the plurality of electrodes 32 can be parallel to each other in the processing direction F, so as to perform the discharge processing procedure on the object 100 to be processed. For example, the supporting member 40 is selectively provided with a through groove 43, and the supporting member 40 can be sleeved on the protrusion 53 of the holding member 50 by using the through groove 43. Since the electrode 32 is clamped on the fixture 36, the present invention can achieve the effect of quickly replacing the electrode 32 by means of the quick-release design of the fixture 36.

在本發明中,承載構件40之表面選擇性例如為具有複數個限位槽42(如圖2所示),用以將電極32限位於限位槽42中,不同限位槽42中之電極32可為各自電性獨立,也可為依序連接而彼此電性連通。不同限位槽42中之電極32之數量不限於彼此相同,亦即位於不同限位槽42中之電極32之數量也可為彼此不相同。限位槽42同樣以上述之間距D沿著第一方向X平行排列,藉此可使得電極32沿著第一方向X平行排列。限位槽42之寬度係對應於電極32之寬度,例如限位槽42之寬度略大於電極32之寬度,藉此可使得電極32限位於限位槽42中。固持構件50係選擇性可拆卸式或固定式穩固地組接承載構件40,且承載構件40與固持構件50之組接態樣並無特別限定,只要可使得承載構件40組接於固持構件50,或者可使得承載構件40藉由固持構件50之移動或轉動等運動而選擇性進行移動或轉動等運動,即可適用於本發明中。承載構件40係例如為具有軸孔41之圓筒形(如圖2所示)或其他形狀之套筒,承載構件40可利用軸孔41套接在固持構件50之凸塊51上。此外,為了減少電極32意外斷裂時更換電極32所需時間,因此本發明還可例如先將承載構件40之軸孔41套設在同樣具有凸塊之仿(Dummy)支撐構件上。藉此,使用者可從仿支撐構件快速取出已環繞有電極32之承載構件40,並將此承載構件40之軸孔41套接在固持構件50之凸塊51,或者是將固持構件50之凸塊51插入承載構件40之軸孔41,故可快速完成治具36之組裝。惟,本發明之治具36並不限於此,任何治具36之結構設計只要可承載電極32,以便使電極32進行放電加工程序,即屬於本發明請求保護之範圍。 In the present invention, the surface of the supporting member 40 selectively has a plurality of limiting grooves 42 (as shown in FIG. 2 ) for limiting the electrodes 32 in the limiting grooves 42. The electrodes 32 in different limiting grooves 42 may be electrically independent or may be connected in sequence and electrically connected to each other. The number of electrodes 32 in different limiting grooves 42 is not limited to being the same, that is, the number of electrodes 32 in different limiting grooves 42 may also be different. The limiting grooves 42 are also arranged in parallel along the first direction X at the above-mentioned spacing D, so that the electrodes 32 can be arranged in parallel along the first direction X. The width of the limiting groove 42 corresponds to the width of the electrode 32. For example, the width of the limiting groove 42 is slightly larger than the width of the electrode 32, so that the electrode 32 can be limited in the limiting groove 42. The holding member 50 is selectively detachably or fixedly assembled with the supporting member 40, and the assembly mode of the supporting member 40 and the holding member 50 is not particularly limited. As long as the supporting member 40 can be assembled with the holding member 50, or the supporting member 40 can be selectively moved or rotated by the movement or rotation of the holding member 50, it can be applied to the present invention. The supporting member 40 is, for example, a cylindrical sleeve (as shown in FIG. 2 ) or other shaped sleeve with an axial hole 41. The supporting member 40 can be sleeved on the protrusion 51 of the holding member 50 by using the axial hole 41. In addition, in order to reduce the time required to replace the electrode 32 when the electrode 32 is accidentally broken, the present invention can also, for example, sleeve the axial hole 41 of the supporting member 40 on a dummy supporting member having a protrusion. Thus, the user can quickly take out the supporting member 40 with the electrode 32 wrapped around it from the imitation supporting member, and sleeve the axial hole 41 of the supporting member 40 on the protrusion 51 of the holding member 50, or insert the protrusion 51 of the holding member 50 into the axial hole 41 of the supporting member 40, so that the assembly of the jig 36 can be completed quickly. However, the jig 36 of the present invention is not limited to this. Any structural design of the jig 36, as long as it can carry the electrode 32 so that the electrode 32 can be subjected to the discharge processing procedure, belongs to the scope of protection claimed by the present invention.

綜上所述,本發明之放電加工裝置,具有以下優點: In summary, the EDM device of the present invention has the following advantages:

(1)修正裝置可藉由修刀元件與電極之間之相對位移,修正電極之外觀,以預防放電加工程序產生短路問題。 (1) The correction device can correct the appearance of the electrode by the relative displacement between the trimming element and the electrode to prevent short circuit problems caused by the discharge machining process.

(2)修正裝置可藉由捲動或移動電極使其避開待加工物之加工目標區,以預防放電加工程序產生短路問題。 (2) The correction device can roll or move the electrode to avoid the processing target area of the object to be processed to prevent short circuit problems caused by the discharge processing process.

(3)除屑元件可藉由修刀元件與電極之間之相對位移,去除殘留在修刀元件及/或電極上之刀屑等物質。排渣單元可針對提供一或多個加工目標區提供外力,幫助排除放電加工程序或修正程序所產生之殘渣。 (3) The chip removal element can remove the chip and other materials remaining on the knife dressing element and/or the electrode by the relative displacement between the knife dressing element and the electrode. The slag removal unit can provide external force to one or more processing target areas to help remove the slag generated by the discharge processing process or the correction process.

(4)分條元件可藉由修刀元件與電極之間之相對位移,將電極之放電區段切割成數個電極條,藉此可避免板狀電極損耗不均的問題。 (4) The stripping element can cut the discharge section of the electrode into several electrode strips by the relative displacement between the trimming element and the electrode, thereby avoiding the problem of uneven wear of the plate electrode.

(5)位向校正元件可校正電極與待加工物之加工行進方向,藉此可避免加工行進方向產生偏移。 (5) The position correction element can correct the processing direction of the electrode and the object to be processed, thereby avoiding deviation in the processing direction.

(6)夾固元件可夾固電極以防止電極因受到拉扯而改變加工行進方向。 (6) The clamping element can clamp the electrode to prevent the electrode from changing the processing direction due to being pulled.

(7)整刀元件可使得多條電極之間保持平行,可避免待加工物經過放電加工後之表面產生歪斜等不平整現象。 (7) The knife element can keep multiple electrodes parallel to each other, which can prevent the surface of the workpiece from being skewed or uneven after discharge processing.

(8)穩定構件可減少電極產生抖動,還能作為分隔柱提供導引效果,並可作為電接點使用。 (8) Stabilizing components can reduce the vibration of the electrode, provide guidance as a separator, and can be used as an electrical contact.

以上所述僅為舉例性,而非為限制性者。任何未脫離本發明之精神與範疇,而對其進行之等效修改或變更,均應包含於後附之申請專利範圍中。 The above description is for illustrative purposes only and is not intended to be limiting. Any equivalent modification or change made to the invention without departing from the spirit and scope of the invention shall be included in the scope of the patent application attached hereto.

10:放電加工裝置 10: Discharge processing equipment

100:待加工物 100: Objects to be processed

20:載台 20: Carrier

22:穩定構件 22: Stable components

32:電極 32: Electrode

36:治具 36: Jig

52:座體 52: Seat

80:修正裝置 80: Correction device

82:修刀元件 82: Knife repair element

86:夾固元件 86: Clamping element

89:檢測元件 89: Detection element

281:導槽 281:Guide groove

B:放電區段 B: Discharge section

X:第一方向 X: First direction

Y:第二方向 Y: Second direction

F:加工行進方向 F: Processing direction

Claims (22)

一種放電加工裝置,至少包含:一載台,用以承載至少一待加工物;一放電加工單元,包含至少一電極及一供電單元,用以沿著一加工行進方向以該電極對該載台上之該待加工物之至少一加工目標區進行一放電加工程序,其中該電極於一放電區段呈懸空狀態,該供電單元在該放電加工程序中係提供一第一電源予該電極及該待加工物,用以經由位於該放電區段中之該電極施加一放電能量予該待加工物之該加工目標區;以及一修正裝置,用以對該電極之一外觀之一待修正區域進行一修正程序以修正該電極之該外觀,其中該修正裝置包含一修刀元件,該修刀元件與該電極在該修正程序中產生一相對位移以修正該電極之該外觀。 A discharge processing device comprises at least: a carrier for carrying at least one object to be processed; a discharge processing unit comprising at least one electrode and a power supply unit for performing a discharge processing procedure on at least one processing target area of the object to be processed on the carrier along a processing direction with the electrode, wherein the electrode is suspended in a discharge section, and the power supply unit provides a first power source to the electrode during the discharge processing. The electrode and the object to be processed are used to apply a discharge energy to the processing target area of the object to be processed through the electrode located in the discharge section; and a correction device is used to perform a correction process on a to-be-corrected area of an appearance of the electrode to correct the appearance of the electrode, wherein the correction device includes a trimming element, and the trimming element and the electrode generate a relative displacement in the correction process to correct the appearance of the electrode. 如請求項1所述之放電加工裝置,其中該修正裝置係於該電極對該加工目標區進行該放電加工程序之同時,對該電極進行該修正程序。 The discharge machining device as described in claim 1, wherein the correction device performs the correction process on the electrode while the electrode performs the discharge machining process on the machining target area. 如請求項1所述之放電加工裝置,其中該修正裝置係於該電極對該加工目標區進行該放電加工程序之前或之後,對該電極進行該修正程序。 The discharge machining device as described in claim 1, wherein the correction device performs the correction process on the electrode before or after the electrode performs the discharge machining process on the machining target area. 如請求項1、2或3所述之放電加工裝置,其中該修正裝置依據該電極之一損耗速率與該放電加工程序之一進給速度以一定量調整方式修正該電極之該外觀。 The discharge machining device as described in claim 1, 2 or 3, wherein the correction device corrects the appearance of the electrode in a certain amount of adjustment according to a wear rate of the electrode and a feed speed of the discharge machining process. 如請求項1、2或3所述之放電加工裝置,其中該修正裝置依據該電極之一即時狀態以一動態調整方式修正該電極之該外觀。 The discharge machining device as described in claim 1, 2 or 3, wherein the correction device corrects the appearance of the electrode in a dynamic adjustment manner according to a real-time state of the electrode. 如請求項1所述之放電加工裝置,其中該修正裝置包含一升降機構及/或一平移機構,用以設置該修刀元件,使得該修刀元件移動位置而與該電極產生該相對位移。 The discharge machining device as described in claim 1, wherein the correction device includes a lifting mechanism and/or a translation mechanism for setting the trimming element so that the trimming element moves to produce the relative displacement with the electrode. 如請求項1所述之放電加工裝置,其中該修刀元件係一雷射源、一刀具或一研磨件。 The EDM device as described in claim 1, wherein the tool-dressing element is a laser source, a tool or a grinding piece. 如請求項1所述之放電加工裝置,其中該修正裝置更包含一除屑元件,用以於該修正裝置進行該修正程序之同時,去除修正該電極之該外觀時所產生之一刀屑。 The discharge machining device as described in claim 1, wherein the correction device further comprises a chip removal element for removing a chip generated when correcting the appearance of the electrode while the correction device is performing the correction process. 如請求項1所述之放電加工裝置,其中該修正裝置包含一捲動機構,用以在該修正程序中捲動該電極,使得該電極之該待修正區域避開該待加工物之該加工目標區,藉以修正該電極之該外觀。 The discharge machining device as described in claim 1, wherein the correction device includes a rolling mechanism for rolling the electrode during the correction process so that the area to be corrected of the electrode avoids the processing target area of the object to be processed, thereby correcting the appearance of the electrode. 如請求項1所述之放電加工裝置,其中該修正裝置更包含一分條元件,用以將該電極於該放電區段分割成彼此平行之複數個電極條。 The discharge processing device as described in claim 1, wherein the correction device further comprises a striping element for dividing the electrode into a plurality of electrode strips parallel to each other in the discharge section. 如請求項1所述之放電加工裝置,其中該放電加工單元更包含一夾固元件,用以於該電極進行該放電加工程序時夾固該電極之該放電區段之至少一側,且於該修正裝置進行該修正程序時釋放該電極之該放電區段之該至少一側。 The discharge processing device as described in claim 1, wherein the discharge processing unit further comprises a clamping element for clamping at least one side of the discharge section of the electrode when the electrode performs the discharge processing procedure, and releasing the at least one side of the discharge section of the electrode when the correction device performs the correction procedure. 如請求項1所述之放電加工裝置,其中該放電加工裝置還包含一排渣單元,該放電加工單元對該待加工物進行該放電加工程序時,該排渣單元係提供至少一外力排除該電極對該待加工物施加該放電能量時所產生之殘渣。 The discharge machining device as described in claim 1, wherein the discharge machining device further comprises a slag removal unit, and when the discharge machining unit performs the discharge machining process on the object to be processed, the slag removal unit provides at least one external force to remove the slag generated when the electrode applies the discharge energy to the object to be processed. 如請求項12所述之放電加工裝置,其中該排渣單元係依據該待加工物之外形調整該外力之施加方向或施加位置以排除該殘渣。 The discharge machining device as described in claim 12, wherein the slag removal unit adjusts the direction or position of application of the external force according to the shape of the object to be processed to remove the slag. 如請求項1所述之放電加工裝置,其中該放電加工單元更包含:一治具,該治具由至少兩承載構件及至少兩固持構件分別對應組接而成,該兩固持構件係設於兩座體上,該兩座體為移動機構或轉動機構,藉以使得該放電加工單元沿著該加工行進方向進行該放電加工程序時,該電極之該放電區段與該待加工物之該加工目標區係呈往復式或循環式相對移動。 The discharge processing device as described in claim 1, wherein the discharge processing unit further comprises: a fixture, the fixture is composed of at least two bearing components and at least two holding components respectively assembled in correspondence, the two holding components are arranged on two bases, and the two bases are moving mechanisms or rotating mechanisms, so that when the discharge processing unit performs the discharge processing procedure along the processing direction, the discharge section of the electrode and the processing target area of the object to be processed move relative to each other in a reciprocating or cyclic manner. 如請求項14所述之放電加工裝置,其中該電極係環繞式抵接該兩承載構件或以該電極之兩側分別抵接該兩承載構件,使得該電極於該放電區段呈該懸空狀態。 The discharge processing device as described in claim 14, wherein the electrode is in circumferential contact with the two supporting members or the two sides of the electrode are respectively in contact with the two supporting members, so that the electrode is in the suspended state in the discharge section. 如請求項1所述之放電加工裝置,其中該修正裝置更包含一位向校正元件,用以依據該電極之該加工行進方向出現之一偏移現象,調整該電極與該待加工物之一相對位向以校正該加工行進方向。 The discharge machining device as described in claim 1, wherein the correction device further includes a directional correction element for adjusting the relative position of the electrode and the object to be machined to correct the machining direction according to a deviation phenomenon of the machining direction of the electrode. 如請求項1所述之放電加工裝置,其中該修正裝置係藉由令該外觀上出現該待修正區域之該電極移動位置,使得該待修正區域避開該待加工物之該加工目標區,該待修正區域為一斷裂現象或一斷裂跡象。 The discharge machining device as described in claim 1, wherein the correction device moves the electrode position of the area to be corrected on the surface so that the area to be corrected avoids the processing target area of the object to be processed, and the area to be corrected is a fracture phenomenon or a fracture sign. 如請求項1-3及6-17中任一項所述之放電加工裝置,其中該電極之數量為複數個,該複數個電極於該放電區段沿著一第一方向及/或一第三方向彼此平行排列,其中該第三方向垂直於該第一方向。 The discharge machining device as described in any one of claims 1-3 and 6-17, wherein the number of the electrodes is plural, and the plural electrodes are arranged parallel to each other along a first direction and/or a third direction in the discharge section, wherein the third direction is perpendicular to the first direction. 如請求項18所述之放電加工裝置,其中該修正裝置更包含一整刀元件,該整刀元件隔開該複數個電極,用以使得該複數個電極於該放電區段維持彼此平行排列。 The discharge machining device as described in claim 18, wherein the correction device further comprises a full blade element, the full blade element separates the plurality of electrodes so as to maintain the plurality of electrodes arranged parallel to each other in the discharge section. 如請求項18所述之放電加工裝置,其中該放電加工單元更包含一分隔柱,該複數個電極抵靠該分隔柱,用以使得該複數個電極於該放電區段彼此平行。 The discharge machining device as described in claim 18, wherein the discharge machining unit further comprises a partition column, and the plurality of electrodes abut against the partition column so as to make the plurality of electrodes parallel to each other in the discharge section. 如請求項18所述之放電加工裝置,更包含一穩定構件,該穩定構件具有複數個導槽活動式容置該複數個電極,用以穩定及導正該複數個電極,使該複數個電極沿著該加工行進方向進行該放電加工程序。 The discharge machining device as described in claim 18 further includes a stabilizing member having a plurality of guide grooves for movably accommodating the plurality of electrodes, for stabilizing and correcting the plurality of electrodes so that the plurality of electrodes can perform the discharge machining process along the machining direction. 如請求項18所述之放電加工裝置,其中該修正裝置係藉由令該複數個電極中該外觀上出現該待修正區域之至少一電極移動位置,使得該待修正區域避開該待加工物之該加工目標區,該待修正區域為一斷裂現象或一斷裂跡象。 The discharge machining device as described in claim 18, wherein the correction device moves the position of at least one electrode among the plurality of electrodes that has the area to be corrected on the surface, so that the area to be corrected avoids the processing target area of the object to be processed, and the area to be corrected is a fracture phenomenon or a fracture sign.
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