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TWI860765B - Light emitting diode structure - Google Patents

Light emitting diode structure Download PDF

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Publication number
TWI860765B
TWI860765B TW112124429A TW112124429A TWI860765B TW I860765 B TWI860765 B TW I860765B TW 112124429 A TW112124429 A TW 112124429A TW 112124429 A TW112124429 A TW 112124429A TW I860765 B TWI860765 B TW I860765B
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Taiwan
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light
transparent conductive
emitting
electrode portion
emitting diode
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TW112124429A
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Chinese (zh)
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TW202501855A (en
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吳國禎
林坤德
馬景時
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台亞半導體股份有限公司
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Priority to TW112124429A priority Critical patent/TWI860765B/en
Priority to CN202311423271.3A priority patent/CN119230685A/en
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Publication of TWI860765B publication Critical patent/TWI860765B/en
Publication of TW202501855A publication Critical patent/TW202501855A/en

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Abstract

The present invention provides a light emitting diode structure, including a substrate, a semiconductor light emitting structure, and an electrode structure. The semiconductor light-emitting structure is located on the substrate and includes a light emitting surface. The electrode structure is located on the light emitting surface and includes a main electrode part, at least one primary electrode part and at least one transparent conductive part. A distance is maintained between the main electrode portion and each primary electrode portion, and each primary electrode portion is electrically connected to the main electrode portion through any transparent conductive portion as a current conduction path.

Description

發光二極體結構 LED structure

本發明係關於一種發光二極體結構,尤指一種可提升發光均勻度及發光效率之發光二極體結構。 The present invention relates to a light-emitting diode structure, and in particular to a light-emitting diode structure that can improve light-emitting uniformity and light-emitting efficiency.

近年來,發光二極體廣泛地應用在照明、醫療及3C產品上。發光二極體晶片主要以不同之半導體材料製成,藉由電流通過二種半導體材料之連接面,產生電致發光效應以將電能轉化為光能,使得發光二極體晶片不但能發出高亮度之光線,更具節能省電功效。 In recent years, LEDs have been widely used in lighting, medical and 3C products. LED chips are mainly made of different semiconductor materials. When the current flows through the connection surface of two semiconductor materials, the electroluminescent effect is generated to convert electrical energy into light energy, so that the LED chip can not only emit high-brightness light, but also save energy and electricity.

發光二極體晶片在結構設計上,會在晶片表面設置金屬電極,以與外部元件藉由焊線電性連接。為了提升發光二極體晶片之發光均勻度,在晶片表面會額外設置與金屬電極電性連接之延伸電極,藉由延伸電極使電流傳輸至發光效率較低之區域,使得較多電流通過前述半導體材料之連接面而增強發光效果。然而,由於延伸電極具有一定寬度,使得前述半導體材料之發光面之一部分會受到不透光之金屬電極及延伸電極遮蔽,進而縮減發光面之出光面積,如此將導致發光二極體晶片之發光效率降低或亮度衰減。 In terms of structural design, a metal electrode is set on the surface of the LED chip to be electrically connected to external components through welding wires. In order to improve the luminous uniformity of the LED chip, an extended electrode electrically connected to the metal electrode is additionally set on the chip surface. The extended electrode transmits the current to the area with lower luminous efficiency, so that more current passes through the connection surface of the semiconductor material to enhance the luminous effect. However, since the extended electrode has a certain width, a part of the luminous surface of the semiconductor material will be shielded by the opaque metal electrode and the extended electrode, thereby reducing the light-emitting area of the luminous surface, which will lead to a decrease in the luminous efficiency or brightness of the LED chip.

因此,如何設計出能改善前述問題之發光二極體結構,實為一個值得研究之課題。 Therefore, how to design a light-emitting diode structure that can improve the above-mentioned problems is indeed a topic worth studying.

本發明之目的在於提供一種可提升發光均勻度及發光效率之發光二極體結構。 The purpose of this invention is to provide a light-emitting diode structure that can improve light-emitting uniformity and light-emitting efficiency.

為達上述目的,本發明之發光二極體結構包括基板、半導體發光結構及電極結構。半導體發光結構位於基板上,且半導體發光結構包括發光面。電極結構位於發光面上。電極結構包括主電極部、至少一透明導電部及至少一次電極部。主電極部與各次電極部之間係保持間距,且各次電極部與主電極部藉由任一透明導電部電性連接以作為電流傳導路徑。 To achieve the above-mentioned purpose, the light-emitting diode structure of the present invention includes a substrate, a semiconductor light-emitting structure and an electrode structure. The semiconductor light-emitting structure is located on the substrate, and the semiconductor light-emitting structure includes a light-emitting surface. The electrode structure is located on the light-emitting surface. The electrode structure includes a main electrode part, at least one transparent conductive part and at least one primary electrode part. The main electrode part and each secondary electrode part are spaced apart, and each secondary electrode part is electrically connected to the main electrode part through any transparent conductive part to serve as a current conduction path.

在本發明之一實施例中,各透明導電部與半導體發光結構之間呈現高接觸阻抗或電性不導通。 In one embodiment of the present invention, each transparent conductive part and the semiconductor light-emitting structure present high contact impedance or electrical non-conduction.

在本發明之一實施例中,各透明導電部與半導體發光結構之間呈現低接觸阻抗。 In one embodiment of the present invention, each transparent conductive part and the semiconductor light-emitting structure exhibit low contact impedance.

在本發明之一實施例中,各透明導電部係以氧化鋅、氧化銦錫、氧化銦鋅或氧化銦鎵鋅所構成。 In one embodiment of the present invention, each transparent conductive part is composed of zinc oxide, indium tin oxide, indium zinc oxide or indium gallium zinc oxide.

在本發明之一實施例中,主電極部、至少一透明導電部及至少一次電極部係分別與半導體發光結構直接接觸,且各透明導電部之一部份夾設於主電極部及發光面之間。 In one embodiment of the present invention, the main electrode portion, at least one transparent conductive portion and at least one secondary electrode portion are respectively in direct contact with the semiconductor light-emitting structure, and a portion of each transparent conductive portion is sandwiched between the main electrode portion and the light-emitting surface.

在本發明之一實施例中,主電極部、該至少一透明導電部及至少一次電極部係分別與半導體發光結構直接接觸,且各透明導電部之一部份覆蓋主電極部之局部外表面。 In one embodiment of the present invention, the main electrode portion, the at least one transparent conductive portion and the at least one secondary electrode portion are respectively in direct contact with the semiconductor light-emitting structure, and a portion of each transparent conductive portion covers a partial outer surface of the main electrode portion.

在本發明之一實施例中,至少一透明導電部及至少一次電極部係分別與半導體發光結構直接接觸,且主電極部形成於至少一透明導電部上而與半導體發光結構間接接觸。 In one embodiment of the present invention, at least one transparent conductive portion and at least one primary electrode portion are directly in contact with the semiconductor light-emitting structure, respectively, and the main electrode portion is formed on at least one transparent conductive portion and is indirectly in contact with the semiconductor light-emitting structure.

在本發明之一實施例中,當至少一透明導電部為複數時,各透明導電部電性連接主電極部之一端可彼此連接。 In one embodiment of the present invention, when at least one transparent conductive part is plural, one end of each transparent conductive part electrically connected to the main electrode part can be connected to each other.

在本發明之一實施例中,透明導電部之寬度不小於3μm。 In one embodiment of the present invention, the width of the transparent conductive portion is not less than 3μm.

在本發明之一實施例中,至少一透明導電部覆蓋發光面除了供設置主電極部及至少一次電極部以外之其餘部分。 In one embodiment of the present invention, at least one transparent conductive portion covers the remaining portion of the light-emitting surface except for the main electrode portion and at least one primary electrode portion.

在本發明之一實施例中,透明導電部之厚度不小於1000Å。 In one embodiment of the present invention, the thickness of the transparent conductive portion is not less than 1000Å.

據此,本發明之發光二極體結構可將至少一次電極部設置在發光面上需要控制電流分布之任意位置,配合至少一透明導電部之設置使得主電極部及各次電極部電性連接以傳輸電流。據此,本發明之發光二極體結構於發光面之電流分布更為均勻,且至少一透明導電部不會遮光而提升發光效率。 Accordingly, the light-emitting diode structure of the present invention can set at least one primary electrode portion at any position on the light-emitting surface where the current distribution needs to be controlled, and with the setting of at least one transparent conductive portion, the main electrode portion and each secondary electrode portion are electrically connected to transmit current. Accordingly, the current distribution of the light-emitting diode structure of the present invention on the light-emitting surface is more uniform, and at least one transparent conductive portion will not block light, thereby improving the light-emitting efficiency.

1、1a、1b、1c、1d:發光二極體結構 1, 1a, 1b, 1c, 1d: LED structure

10:基板 10: Substrate

11:金屬點 11: Metal point

20:半導體發光結構 20: Semiconductor light-emitting structure

21:第一半導體層 21: First semiconductor layer

22:第二半導體層 22: Second semiconductor layer

23:發光層 23: Luminous layer

24:發光面 24: Shiny surface

30、30a、30b、30c、30d:電極結構 30, 30a, 30b, 30c, 30d: Electrode structure

31、31a、31b、31c、31d:主電極部 31, 31a, 31b, 31c, 31d: Main electrode part

32、32a、32b、32c、32d:次電極部 32, 32a, 32b, 32c, 32d: secondary electrode part

33、33a、33b、33c、33d:透明導電部 33, 33a, 33b, 33c, 33d: Transparent conductive part

圖1為本發明之發光二極體結構之第一實施例之俯視圖。 Figure 1 is a top view of the first embodiment of the light-emitting diode structure of the present invention.

圖2為本發明之發光二極體結構之第一實施例之剖視圖。 Figure 2 is a cross-sectional view of the first embodiment of the light-emitting diode structure of the present invention.

圖3為本發明之發光二極體結構之第二實施例之俯視圖。 FIG3 is a top view of the second embodiment of the light-emitting diode structure of the present invention.

圖4為本發明之發光二極體結構之第二實施例之剖視圖。 Figure 4 is a cross-sectional view of the second embodiment of the light-emitting diode structure of the present invention.

圖5為本發明之發光二極體結構之第三實施例之俯視圖。 FIG5 is a top view of the third embodiment of the light-emitting diode structure of the present invention.

圖6為本發明之發光二極體結構之第三實施例之剖視圖。 FIG6 is a cross-sectional view of the third embodiment of the light-emitting diode structure of the present invention.

圖7為本發明之發光二極體結構之第四實施例之剖視圖。 FIG7 is a cross-sectional view of the fourth embodiment of the light-emitting diode structure of the present invention.

圖8為本發明之發光二極體結構之第五實施例之俯視圖。 FIG8 is a top view of the fifth embodiment of the light-emitting diode structure of the present invention.

由於各種態樣與實施例僅為例示性且非限制性,故在閱讀本說明書後,具有通常知識者在不偏離本發明之範疇下,亦可能有其他態樣與實施例。根據下述之詳細說明與申請專利範圍,將可使該等實施例之特徵及優點更加彰顯。 Since the various aspects and embodiments are only illustrative and non-restrictive, after reading this specification, a person with ordinary knowledge may also have other aspects and embodiments without departing from the scope of the invention. The features and advantages of these embodiments will be more prominent according to the following detailed description and patent application scope.

於本文中,係使用「一」或「一個」來描述本文所述的元件和組件。此舉只是為了方便說明,並且對本發明之範疇提供一般性的意義。因此,除非很明顯地另指他意,否則此種描述應理解為包括一個或至少一個,且單數也同時包括複數。 In this article, "a" or "an" is used to describe the elements and components described herein. This is only for the convenience of explanation and to provide a general meaning for the scope of the present invention. Therefore, unless it is obvious that it is otherwise intended, such description should be understood to include one or at least one, and the singular also includes the plural.

於本文中,用語「包括」、「具有」或其他任何類似用語意欲涵蓋非排他性之包括物。舉例而言,含有複數要件的元件或結構不僅限於本文所列出之此等要件而已,而是可以包括未明確列出但卻是該元件或結構通常固有之其他要件。 In this document, the terms "including", "having" or any other similar terms are intended to cover a non-exclusive inclusion. For example, an element or structure containing multiple elements is not limited to those elements listed herein, but may include other elements that are not expressly listed but are generally inherent to the element or structure.

以下請一併參考圖1及圖2有關本發明之發光二極體結構之第一實施例之相關圖式,其中圖2為沿圖1之線段A-A'之剖視圖。如圖1及圖2所示,本發明之發光二極體結構1包括基板10、半導體發光結構20及電極結構30。基板10為發光二極體結構1之基礎結構件,且基板10可採用矽(Si)基板、氮化鋁(AlN)基板、銅鎢(CuW)基板或鉬(Mo)基板,但本發明不以此為限。基板10包括 複數金屬點11,且複數金屬點11設置於基板10一側之表面(例如基板10面向半導體發光結構20之表面)。 Please refer to Figures 1 and 2 for the related drawings of the first embodiment of the light-emitting diode structure of the present invention, wherein Figure 2 is a cross-sectional view along the line segment AA ' of Figure 1. As shown in Figures 1 and 2, the light-emitting diode structure 1 of the present invention includes a substrate 10, a semiconductor light-emitting structure 20 and an electrode structure 30. The substrate 10 is a basic structural component of the light-emitting diode structure 1, and the substrate 10 can be a silicon (Si) substrate, an aluminum nitride (AlN) substrate, a copper tungsten (CuW) substrate or a molybdenum (Mo) substrate, but the present invention is not limited thereto. The substrate 10 includes a plurality of metal dots 11, and the plurality of metal dots 11 are arranged on a surface of one side of the substrate 10 (for example, a surface of the substrate 10 facing the semiconductor light-emitting structure 20).

半導體發光結構20位於基板10上,且半導體發光結構20用以產生電致發光效應而射出光線。半導體發光結構20包括發光面24,且發光面24為接觸基板10一側之相對另一面。在本發明之一實施例中,半導體發光結構20更可包括第一半導體層21及第二半導體層22。第一半導體層21鄰接於基板10。在以下各實施例中,第一半導體層21係採用磷化鎵(GaP)為例加以說明,但本發明不以此為限,第一半導體層21也可採用砷化鎵(GaAs)、氮化鎵(GaN)或其他半導體材料製成。第一半導體層21可藉由摻雜不同金屬而形成N型半導體或P型半導體。 The semiconductor light-emitting structure 20 is located on the substrate 10, and the semiconductor light-emitting structure 20 is used to generate an electroluminescent effect to emit light. The semiconductor light-emitting structure 20 includes a light-emitting surface 24, and the light-emitting surface 24 is the other side opposite to the side of the substrate 10. In one embodiment of the present invention, the semiconductor light-emitting structure 20 may further include a first semiconductor layer 21 and a second semiconductor layer 22. The first semiconductor layer 21 is adjacent to the substrate 10. In the following embodiments, the first semiconductor layer 21 is illustrated by using gallium phosphide (GaP) as an example, but the present invention is not limited thereto. The first semiconductor layer 21 may also be made of gallium arsenide (GaAs), gallium nitride (GaN) or other semiconductor materials. The first semiconductor layer 21 can be formed into an N-type semiconductor or a P-type semiconductor by doping different metals.

第二半導體層22位於第一半導體層21上。在以下各實施例中,第二半導體層22係採用磷化銦鎵鋁(AlGaInP)為例加以說明,但本發明不以此為限,第二半導體層22也可採用砷化鎵鋁(AlGaAs)或其他半導體材料製成。第二半導體層22同樣可藉由摻雜不同金屬而形成N型半導體或P型半導體。其中當第一半導體層21為N型半導體時,則第二半導體層22為P型半導體;反之,當第一半導體層21為P型半導體時,則第二半導體層22為N型半導體。第一半導體層21及第二半導體層22之間(即第一半導體層21及第二半導體層22之交接面)會形成發光層23,此處發光層23係為多量子井(Multiple Quantum Well,MQW)層。 The second semiconductor layer 22 is located on the first semiconductor layer 21. In the following embodiments, the second semiconductor layer 22 is illustrated by using indium gallium aluminum phosphide (AlGaInP), but the present invention is not limited thereto. The second semiconductor layer 22 can also be made of gallium aluminum arsenide (AlGaAs) or other semiconductor materials. The second semiconductor layer 22 can also be formed into an N-type semiconductor or a P-type semiconductor by doping different metals. When the first semiconductor layer 21 is an N-type semiconductor, the second semiconductor layer 22 is a P-type semiconductor; conversely, when the first semiconductor layer 21 is a P-type semiconductor, the second semiconductor layer 22 is an N-type semiconductor. A light-emitting layer 23 is formed between the first semiconductor layer 21 and the second semiconductor layer 22 (i.e., the interface between the first semiconductor layer 21 and the second semiconductor layer 22). Here, the light-emitting layer 23 is a multiple quantum well (MQW) layer.

電極結構30位於半導體發光結構20之發光面24上,且電極結構30可連接供電源,藉由對電極結構30供電以產生自電極結構30流至基板10之複數金屬點11之電流,使得電流流經發光層23而發光。在本發明中,電極結構30至 少包括主電極部31、至少一次電極部32及至少一透明導電部33。主電極部31及至少一次電極部32以金屬或合金製成,且主電極部31與各次電極部32之間保持間距。主電極部31用以作為焊墊(pad),可供焊接與供電源或/及其他電子元件電性連接之金屬線路。至少一次電極部32用以作為傳輸電流之增設金屬點。至少一次電極部32之設置數量及設置位置可依據不同設計需求而改變。舉例來說,在本發明之各實施例中,至少一次電極部32係包括4個次電極部32,且各次電極部32設置於發光面24上之發光效率較低之區域(例如均勻且分散地環繞主電極部31設置),但本發明不以此為限。 The electrode structure 30 is located on the light-emitting surface 24 of the semiconductor light-emitting structure 20, and the electrode structure 30 can be connected to a power source. By supplying power to the electrode structure 30, a current is generated from the electrode structure 30 to the plurality of metal points 11 of the substrate 10, so that the current flows through the light-emitting layer 23 to emit light. In the present invention, the electrode structure 30 at least includes a main electrode portion 31, at least one primary electrode portion 32, and at least one transparent conductive portion 33. The main electrode portion 31 and at least one primary electrode portion 32 are made of metal or alloy, and a distance is maintained between the main electrode portion 31 and each secondary electrode portion 32. The main electrode portion 31 is used as a pad for welding a metal line electrically connected to the power source or/and other electronic components. At least one primary electrode portion 32 is used as an additional metal point for transmitting current. The number and location of at least one primary electrode portion 32 can be changed according to different design requirements. For example, in each embodiment of the present invention, at least one primary electrode portion 32 includes four secondary electrode portions 32, and each secondary electrode portion 32 is disposed in a region with lower luminous efficiency on the luminous surface 24 (for example, uniformly and dispersedly disposed around the main electrode portion 31), but the present invention is not limited thereto.

各透明導電部33分別連接主電極部31及任一次電極部32,使得各次電極部32與主電極部31藉由任一透明導電部33電性連接以作為電流傳導路徑;也就是說,電流可自主電極部31經由透明導電部33傳輸至相應之次電極部32,使得次電極部32成為另一個電流傳輸源。在本發明之一實施例中,各透明導電部33係以氧化鋅(ZnO)、氧化銦錫(ITO)、氧化銦鋅(IZO)或氧化銦鎵鋅(IGZO)所構成之透明導電薄膜。在結構設計上,透明導電部33之厚度不小於1000Å。若透明導電部33大致呈現直線狀,則透明導電部33之寬度(即與主要流經透明導電部33之電流方向垂直之徑向距離)不小於3μm,以利於提供電流傳輸效果。 Each transparent conductive portion 33 is connected to the main electrode portion 31 and any one of the secondary electrode portions 32, so that each secondary electrode portion 32 is electrically connected to the main electrode portion 31 through any one of the transparent conductive portions 33 as a current transmission path; that is, the current can be transmitted from the main electrode portion 31 to the corresponding secondary electrode portion 32 through the transparent conductive portion 33, so that the secondary electrode portion 32 becomes another current transmission source. In one embodiment of the present invention, each transparent conductive portion 33 is a transparent conductive film composed of zinc oxide (ZnO), indium tin oxide (ITO), indium zinc oxide (IZO) or indium gallium zinc oxide (IGZO). In terms of structural design, the thickness of the transparent conductive portion 33 is not less than 1000Å. If the transparent conductive portion 33 is roughly in a straight line shape, the width of the transparent conductive portion 33 (i.e. the radial distance perpendicular to the direction of the current flowing mainly through the transparent conductive portion 33) is not less than 3μm, so as to provide a current transmission effect.

在本發明中,各透明導電部33係與半導體發光結構20直接接觸,而依據不同之設計需求,各透明導電部33與半導體發光結構20之間可呈現不同之接觸阻抗或電性導通效果。舉例來說,在本發明之一實施例中,藉由各透明導電部33之材料選擇及設計,各透明導電部33與半導體發光結構20之間可呈現高接觸阻抗(例如蕭特基接觸(schottky contact)或具有高接觸阻抗之歐姆接觸 (ohmic contact))或電性不導通。據此,藉由電流會選擇阻抗較低之路徑傳輸之特性,使得電流幾乎不會自透明導電部33直接向下傳輸至半導體發光結構20,而是集中側向匯集至相應之次電極部32,進而達到將電流導引至發光效率較低之區域。 In the present invention, each transparent conductive portion 33 is in direct contact with the semiconductor light emitting structure 20, and according to different design requirements, each transparent conductive portion 33 can present different contact impedances or electrical conduction effects with the semiconductor light emitting structure 20. For example, in one embodiment of the present invention, by selecting and designing the materials of each transparent conductive portion 33, each transparent conductive portion 33 can present high contact impedance (such as Schottky contact or ohmic contact with high contact impedance) or electrical non-conduction with the semiconductor light emitting structure 20. Accordingly, due to the characteristic that the current will choose to transmit along a path with lower impedance, the current will hardly be transmitted directly downward from the transparent conductive portion 33 to the semiconductor light-emitting structure 20, but will be concentrated and gathered laterally to the corresponding sub-electrode portion 32, thereby achieving the goal of guiding the current to the area with lower light-emitting efficiency.

就本發明之發光二極體結構1之第一實施例而言,當半導體發光結構20藉由磊晶製程形成於基板10上後,依序於半導體發光結構20之發光面24上形成至少一次電極部32、至少一透明導電部33及主電極部31,以構成整體之電極結構30。在結構設計上,電極結構30之主電極部31、至少一次電極部32及至少一透明導電部33係分別與半導體發光結構20直接接觸,且各透明導電部33之一部份夾設於主電極部31及半導體發光結構20之發光面24之間。此外,當至少一透明導電部33為複數時,各透明導電部33電性連接主電極部31之一端可彼此連接,例如形成如圖1所示之環狀結構。據此,主電極部31及次電極部32可藉由透明導電部33電性連接。 In the first embodiment of the light-emitting diode structure 1 of the present invention, after the semiconductor light-emitting structure 20 is formed on the substrate 10 by an epitaxial process, at least one primary electrode portion 32, at least one transparent conductive portion 33 and a main electrode portion 31 are sequentially formed on the light-emitting surface 24 of the semiconductor light-emitting structure 20 to form the entire electrode structure 30. In terms of structural design, the main electrode portion 31, at least one primary electrode portion 32 and at least one transparent conductive portion 33 of the electrode structure 30 are directly in contact with the semiconductor light-emitting structure 20, respectively, and a portion of each transparent conductive portion 33 is sandwiched between the main electrode portion 31 and the light-emitting surface 24 of the semiconductor light-emitting structure 20. In addition, when at least one transparent conductive portion 33 is plural, one end of each transparent conductive portion 33 electrically connected to the main electrode portion 31 can be connected to each other, for example, forming a ring structure as shown in FIG. 1 . Accordingly, the main electrode portion 31 and the sub-electrode portion 32 can be electrically connected via the transparent conductive portion 33.

當對主電極部31供電時,電流除了可自主電極部31直接經過半導體發光結構20朝向基板10之金屬點11傳輸以外,電流也能自主電極部31集中側向匯集至各次電極部32,再自各次電極部32直接經過半導體發光結構20朝向基板10之金屬點11傳輸。據此,本發明之發光二極體結構1藉由電極結構30可達到電流均勻分布效果,而電流經過半導體發光結構20之發光層23所發出之光線,可直接自發光面24射出或穿透各透明導電部33後射出,進而減少光線可能被遮蔽之面積範圍。又,藉由電極結構30配合基板10之複數金屬點11之位置設置,使得本發明之發光二極體結構1能提供較佳之發光效率及發光均勻度。 When the main electrode portion 31 is powered, the current can be directly transmitted from the main electrode portion 31 through the semiconductor light-emitting structure 20 toward the metal point 11 of the substrate 10. In addition, the current can also be concentrated from the main electrode portion 31 and laterally gathered to each sub-electrode portion 32, and then directly transmitted from each sub-electrode portion 32 through the semiconductor light-emitting structure 20 toward the metal point 11 of the substrate 10. Accordingly, the light-emitting diode structure 1 of the present invention can achieve a uniform current distribution effect through the electrode structure 30, and the light emitted by the light-emitting layer 23 of the semiconductor light-emitting structure 20 can be directly emitted from the light-emitting surface 24 or emitted after passing through each transparent conductive portion 33, thereby reducing the area range where the light may be shielded. In addition, by coordinating the positions of the electrode structure 30 and the multiple metal dots 11 of the substrate 10, the light-emitting diode structure 1 of the present invention can provide better light-emitting efficiency and light-emitting uniformity.

請參考圖3及圖4有關本發明之發光二極體結構之第二實施例之相關圖式,其中圖4為沿圖3之線段A-A'之剖視圖。如圖3及圖4所示,在本實施例中,當半導體發光結構20藉由磊晶製程形成於基板10上後,依序於半導體發光結構20之發光面24上形成至少一次電極部32a、主電極部31a及至少一透明導電部33a,以構成整體之電極結構30a。在結構設計上,電極結構30a之主電極部31a、至少一次電極部32a及至少一透明導電部33a係分別與半導體發光結構20直接接觸,且各透明導電部33a之一部份覆蓋主電極部31a之局部外表面。此外,當至少一透明導電部33a為複數時,各透明導電部33a電性連接主電極部31a之一端可彼此連接,例如形成如圖3及圖4所示之類環狀結構。據此,主電極部31a及次電極部32a可藉由透明導電部33a電性連接。由於本發明之發光二極體結構1a之第二實施例之運作原理與前述第一實施例相同,且能達到類似之功效,在此不重複贅述。 Please refer to FIG. 3 and FIG. 4 for the relevant drawings of the second embodiment of the light emitting diode structure of the present invention, wherein FIG. 4 is a cross-sectional view along the line segment AA ' of FIG. 3. As shown in FIG. 3 and FIG. 4, in this embodiment, after the semiconductor light emitting structure 20 is formed on the substrate 10 by an epitaxial process, at least one primary electrode portion 32a, a main electrode portion 31a and at least one transparent conductive portion 33a are sequentially formed on the light emitting surface 24 of the semiconductor light emitting structure 20 to form an overall electrode structure 30a. In terms of structural design, the main electrode portion 31a, at least one secondary electrode portion 32a and at least one transparent conductive portion 33a of the electrode structure 30a are respectively in direct contact with the semiconductor light-emitting structure 20, and a portion of each transparent conductive portion 33a covers a partial outer surface of the main electrode portion 31a. In addition, when there are plural at least one transparent conductive portion 33a, one end of each transparent conductive portion 33a electrically connected to the main electrode portion 31a can be connected to each other, for example, forming a ring structure as shown in Figures 3 and 4. Accordingly, the main electrode portion 31a and the secondary electrode portion 32a can be electrically connected through the transparent conductive portion 33a. Since the operating principle of the second embodiment of the LED structure 1a of the present invention is the same as that of the first embodiment and can achieve similar effects, it will not be repeated here.

請參考圖5及圖6有關本發明之發光二極體結構之第三實施例之相關圖式,其中圖6為沿圖5之線段A-A'之剖視圖。如圖5及圖6所示,在本實施例中,當半導體發光結構20藉由磊晶製程形成於基板10上後,依序於半導體發光結構20之發光面24上形成至少一次電極部32b、至少一透明導電部33b及主電極部31b,以構成整體之電極結構30b。在結構設計上,電極結構30b之至少一次電極部32b及至少一透明導電部33b係分別與半導體發光結構20直接接觸,且主電極部31b形成於至少一透明導電部33b上而與半導體發光結構20間接接觸。此外,當至少一透明導電部33b為複數時,各透明導電部33b電性連接主電極部31b之一端可彼此連接,例如形成如圖5及圖6所示之圓形結構。據此,主電極部31b及次電極部32b藉由透明導電部33b電性連接。 Please refer to FIG. 5 and FIG. 6 for the relevant drawings of the third embodiment of the light emitting diode structure of the present invention, wherein FIG. 6 is a cross-sectional view along the line segment AA ' of FIG. 5. As shown in FIG. 5 and FIG. 6, in this embodiment, after the semiconductor light emitting structure 20 is formed on the substrate 10 by an epitaxial process, at least one primary electrode portion 32b, at least one transparent conductive portion 33b and a main electrode portion 31b are sequentially formed on the light emitting surface 24 of the semiconductor light emitting structure 20 to form an overall electrode structure 30b. In terms of structural design, at least one primary electrode portion 32b and at least one transparent conductive portion 33b of the electrode structure 30b are in direct contact with the semiconductor light-emitting structure 20, respectively, and the main electrode portion 31b is formed on at least one transparent conductive portion 33b and is in indirect contact with the semiconductor light-emitting structure 20. In addition, when there are plural at least one transparent conductive portion 33b, one end of each transparent conductive portion 33b electrically connected to the main electrode portion 31b can be connected to each other, for example, forming a circular structure as shown in Figures 5 and 6. Accordingly, the main electrode portion 31b and the secondary electrode portion 32b are electrically connected via the transparent conductive portion 33b.

當對主電極部31b供電時,電流幾乎僅能自主電極部31b集中側向匯集至各次電極部32b,再自各次電極部32b直接經過半導體發光結構20朝向基板10之金屬點11傳輸。除前述設計外,由於本發明之發光二極體結構1b之第三實施例之運作原理與前述第一及第二實施例大致相同,且能達到類似之功效,在此不重複贅述。 When the main electrode portion 31b is powered, the current can almost only be concentrated and laterally gathered from the main electrode portion 31b to each sub-electrode portion 32b, and then directly transmitted from each sub-electrode portion 32b through the semiconductor light-emitting structure 20 toward the metal point 11 of the substrate 10. In addition to the above-mentioned design, since the operating principle of the third embodiment of the light-emitting diode structure 1b of the present invention is roughly the same as the above-mentioned first and second embodiments, and can achieve similar effects, it will not be repeated here.

請參考圖7為本發明之發光二極體結構之第四實施例之剖視圖。本實施例為前述第一實施例之變化型式,如圖7所示,在本實施例中,本發明之發光二極體結構1c藉由對透明導電部33c之材料選擇及設計,各透明導電部33c與半導體發光結構20之間可呈現低接觸阻抗(例如具有低接觸阻抗之歐姆接觸)。據此,雖然部分電流會選擇自透明導電部33c直接經過半導體發光結構20朝向基板10之金屬點11傳輸,但大部分電流仍會朝側向匯集至相應之次電極部32c,進而達到將電流導引至發光效率較低之區域。 Please refer to FIG. 7 for a cross-sectional view of the fourth embodiment of the light-emitting diode structure of the present invention. This embodiment is a variation of the aforementioned first embodiment. As shown in FIG. 7 , in this embodiment, the light-emitting diode structure 1c of the present invention can present a low contact impedance (e.g., an ohmic contact with low contact impedance) between each transparent conductive portion 33c and the semiconductor light-emitting structure 20 by selecting and designing the material of the transparent conductive portion 33c. Accordingly, although part of the current will choose to be transmitted directly from the transparent conductive portion 33c through the semiconductor light-emitting structure 20 toward the metal point 11 of the substrate 10, most of the current will still be gathered laterally to the corresponding sub-electrode portion 32c, thereby achieving the goal of guiding the current to the area with lower light-emitting efficiency.

請參考圖8為本發明之發光二極體結構之第五實施例之俯視圖。本實施例為前述第二實施例之變化型式,如圖8所示,在本實施例中,本發明之發光二極體結構1d藉由1個大面積之透明導電部33d覆蓋半導體發光結構20之發光面24除了供設置主電極部31d及至少一次電極部32d以外之其餘部分,且透明導電部33d之一部份覆蓋主電極部31d之局部外表面。也就是說,在本實施例中,藉由擴大透明導電部33d之覆蓋面積,使得整體之電極結構30d(包括主電極部31d、4個次電極部32d及1個大面積之透明導電部33d)會完全覆蓋半導體發光結構20之發光面24。據此,主電極部31d及次電極部32d可藉由透明導電部33d電性連接。除前述設計外,由於本發明之發光二極體結構1d之第五實施例之運作原理與前述第二實施例大致相同,且能達到類似之功效,在此不重複贅述。 Please refer to FIG8 for a top view of the fifth embodiment of the light-emitting diode structure of the present invention. This embodiment is a variation of the second embodiment described above. As shown in FIG8 , in this embodiment, the light-emitting diode structure 1d of the present invention covers the remaining portion of the light-emitting surface 24 of the semiconductor light-emitting structure 20 except for the main electrode portion 31d and at least one primary electrode portion 32d by a large-area transparent conductive portion 33d, and a portion of the transparent conductive portion 33d covers a partial outer surface of the main electrode portion 31d. That is to say, in this embodiment, by expanding the coverage area of the transparent conductive part 33d, the entire electrode structure 30d (including the main electrode part 31d, four sub-electrode parts 32d and one large-area transparent conductive part 33d) will completely cover the light-emitting surface 24 of the semiconductor light-emitting structure 20. Accordingly, the main electrode part 31d and the sub-electrode part 32d can be electrically connected through the transparent conductive part 33d. In addition to the above-mentioned design, since the operating principle of the fifth embodiment of the light-emitting diode structure 1d of the present invention is roughly the same as that of the above-mentioned second embodiment, and can achieve similar effects, it will not be repeated here.

以上實施方式本質上僅為輔助說明,且並不欲用以限制申請標的之實施例或該等實施例的應用或用途。此外,儘管已於前述實施方式中提出至少一例示性實施例,但應瞭解本發明仍可存在大量的變化。同樣應瞭解的是,本文所述之實施例並不欲用以透過任何方式限制所請求之申請標的之範圍、用途或組態。相反的,前述實施方式將可提供本領域具有通常知識者一種簡便的指引以實施所述之一或多種實施例。再者,可對元件之功能與排列進行各種變化而不脫離申請專利範圍所界定的範疇,且申請專利範圍包含已知的均等物及在本專利申請案提出申請時的所有可預見均等物。 The above embodiments are essentially only for auxiliary explanation and are not intended to limit the embodiments of the subject matter of the application or the application or use of such embodiments. In addition, although at least one exemplary embodiment has been proposed in the above embodiments, it should be understood that there are still a large number of variations of the present invention. It should also be understood that the embodiments described herein are not intended to limit the scope, use or configuration of the claimed subject matter in any way. On the contrary, the above embodiments will provide a simple guide for those with ordinary knowledge in the field to implement one or more of the embodiments described. Furthermore, various changes can be made to the functions and arrangements of the components without departing from the scope defined by the scope of the patent application, and the scope of the patent application includes known equivalents and all foreseeable equivalents at the time of filing the present patent application.

1:發光二極體結構 1: LED structure

10:基板 10: Substrate

11:金屬點 11: Metal point

20:半導體發光結構 20: Semiconductor light-emitting structure

21:第一半導體層 21: First semiconductor layer

22:第二半導體層 22: Second semiconductor layer

23:發光層 23: Luminous layer

24:發光面 24: Shiny surface

30:電極結構 30: Electrode structure

31:主電極部 31: Main electrode part

32:次電極部 32: Sub-electrode part

33:透明導電部 33: Transparent conductive part

Claims (10)

一種發光二極體結構,包括:一基板;一半導體發光結構,位於該基板上,該半導體發光結構包括一發光面;以及一電極結構,位於該發光面上,該電極結構包括一主電極部、至少一次電極部及至少一透明導電部,該主電極部與各該次電極部之間係保持一間距,且各該次電極部與該主電極部藉由任一該透明導電部電性連接以作為電流傳導路徑;其中當該至少一透明導電部為複數時,各該透明導電部電性連接該主電極部之一端可彼此連接。 A light-emitting diode structure includes: a substrate; a semiconductor light-emitting structure located on the substrate, the semiconductor light-emitting structure includes a light-emitting surface; and an electrode structure located on the light-emitting surface, the electrode structure includes a main electrode portion, at least one secondary electrode portion and at least one transparent conductive portion, a distance is maintained between the main electrode portion and each of the secondary electrode portions, and each of the secondary electrode portions is electrically connected to the main electrode portion through any of the transparent conductive portions to serve as a current conduction path; wherein when the at least one transparent conductive portion is plural, one end of each of the transparent conductive portions electrically connected to the main electrode portion can be connected to each other. 如請求項1所述之發光二極體結構,其中各該透明導電部與該半導體發光結構之間呈現高接觸阻抗或電性不導通。 The light-emitting diode structure as described in claim 1, wherein each transparent conductive part and the semiconductor light-emitting structure exhibit high contact impedance or electrical non-conduction. 如請求項1所述之發光二極體結構,其中各該透明導電部與該半導體發光結構之間呈現低接觸阻抗。 The light-emitting diode structure as described in claim 1, wherein each transparent conductive portion and the semiconductor light-emitting structure exhibit low contact impedance. 如請求項1所述之發光二極體結構,其中各該透明導電部係以氧化鋅、氧化銦錫、氧化銦鋅或氧化銦鎵鋅所構成。 The light-emitting diode structure as described in claim 1, wherein each of the transparent conductive parts is composed of zinc oxide, indium tin oxide, indium zinc oxide or indium gallium zinc oxide. 如請求項1所述之發光二極體結構,其中該主電極部、該至少一透明導電部及該至少一次電極部係分別與該半導體發光結構直接接觸,且各該透明導電部之一部份夾設於該主電極部及該發光面之間。 The light-emitting diode structure as described in claim 1, wherein the main electrode portion, the at least one transparent conductive portion and the at least one primary electrode portion are respectively in direct contact with the semiconductor light-emitting structure, and a portion of each transparent conductive portion is sandwiched between the main electrode portion and the light-emitting surface. 如請求項1所述之發光二極體結構,其中該主電極部、該至少一透明導電部及該至少一次電極部係分別與該半導體發光結構直接接觸,且各該透明導電部之一部份覆蓋該主電極部之局部外表面。 The light-emitting diode structure as described in claim 1, wherein the main electrode portion, the at least one transparent conductive portion and the at least one secondary electrode portion are respectively in direct contact with the semiconductor light-emitting structure, and a portion of each transparent conductive portion covers a partial outer surface of the main electrode portion. 如請求項1所述之發光二極體結構,其中該至少一透明導電部及該至少一次電極部係分別與該半導體發光結構直接接觸,且該主電極部形成於該至少一透明導電部上而與該半導體發光結構間接接觸。 The light-emitting diode structure as described in claim 1, wherein the at least one transparent conductive portion and the at least one primary electrode portion are respectively in direct contact with the semiconductor light-emitting structure, and the main electrode portion is formed on the at least one transparent conductive portion and is in indirect contact with the semiconductor light-emitting structure. 如請求項1所述之發光二極體結構,其中該透明導電部之寬度不小於3μm。 The light-emitting diode structure as described in claim 1, wherein the width of the transparent conductive portion is not less than 3μm. 如請求項1所述之發光二極體結構,其中該至少一透明導電部覆蓋該發光面除了供設置該主電極部及該至少一次電極部以外之其餘部分。 The light-emitting diode structure as described in claim 1, wherein the at least one transparent conductive portion covers the remaining portion of the light-emitting surface except for the main electrode portion and the at least one primary electrode portion. 如請求項1所述之發光二極體結構,其中該透明導電部之厚度不小於1000Å。 The light-emitting diode structure as described in claim 1, wherein the thickness of the transparent conductive portion is not less than 1000Å.
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JP5234220B1 (en) * 2012-09-07 2013-07-10 三菱化学株式会社 Light emitting diode element
TW201535771A (en) * 2014-03-07 2015-09-16 Lextar Electronics Corp Light-emitting diode structure
TW202105767A (en) * 2019-07-17 2021-02-01 寶力精密科技股份有限公司 Micro light emitting diode structure and the manufacturing method thereof

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Publication number Priority date Publication date Assignee Title
TW200913308A (en) * 2007-09-13 2009-03-16 Chi Mei Lighting Tech Corp Light emitting diode device and applications thereof
WO2010146783A1 (en) * 2009-06-15 2010-12-23 パナソニック株式会社 Semiconductor light-emitting device, light-emitting module, and illumination device
JP5234220B1 (en) * 2012-09-07 2013-07-10 三菱化学株式会社 Light emitting diode element
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