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TWI858855B - Vapor chamber structure - Google Patents

Vapor chamber structure Download PDF

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TWI858855B
TWI858855B TW112129823A TW112129823A TWI858855B TW I858855 B TWI858855 B TW I858855B TW 112129823 A TW112129823 A TW 112129823A TW 112129823 A TW112129823 A TW 112129823A TW I858855 B TWI858855 B TW I858855B
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micron
aluminum
working fluid
item
patent application
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TW112129823A
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TW202421994A (en
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劉漢敏
劉文琦
李星輝
周小祥
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大陸商深圳興奇宏科技有限公司
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Abstract

A vapor chamber structure includes an aluminum upper plate, an aluminum lower plate, a working fluid and multiple micron-sized recesses. The aluminum upper plate has a first side and a second side. The aluminum lower plate has a third side and a fourth side. The aluminum upper plate and the aluminum lower plates are correspondingly mated with each other to define an airtight chamber. The working fluid is filled in the airtight chamber. The micron-sized recesses are directly formed on a surface of the third side. The micron-sized recesses are upward raised and/or downward recessed from the surface of the third side in the form of multiple small puddles so as to enhance the boiling efficiency of the working fluid in the airtight chamber and promote liquid-vapor circulation performance of the entire vapor chamber. In addition, when used in a low-temperature environment, the vapor chamber structure prevents the working fluid in the airtight chamber from freezing.

Description

均溫板結構 Temperature balancing plate structure

一種均溫板結構,尤指一種具有薄型化且兼具低溫環境下防止工作液體結冰的均溫板結構。 A heat balancing plate structure, especially a heat balancing plate structure that is thin and can prevent the working fluid from freezing in a low temperature environment.

均溫板係為一種常見的導熱元件,其透過兩相流之原理提供一種可以迅速導熱熱傳導之工作,均溫板內部具有工作流體(水、冷媒、甲醇、丙酮、液氨等),均溫板外殼主要材質常選用銅或不鏽鋼等材質,因為其內部的工作流體發生相變潛熱機制來進行熱傳導,其傳導能力達到10000c/w,其超導能力在電子、航空、軍工、石化等行業得到很好的應用。 Vapor chamber is a common heat conducting element. It provides a method of rapid heat conduction through the principle of two-phase flow. There is a working fluid (water, refrigerant, methanol, acetone, liquid ammonia, etc.) inside the vapor chamber. The main material of the vapor chamber shell is usually copper or stainless steel. Because the working fluid inside it conducts heat through a phase change latent heat mechanism, its conductivity reaches 10000c/w. Its superconductivity is well used in electronics, aviation, military industry, petrochemical and other industries.

近年來晶片封裝的熱流密度越來越高,當晶片功耗能到1000W,熱流密度250W/cm2,且晶片熱點問題,這對VC的發熱阻要求就更加嚴苛,如何降低VC內部的發熱熱阻便是兩相流產品設計的主要重點區域。 In recent years, the heat flux density of chip packaging has become higher and higher. When the chip power consumption can reach 1000W, the heat flux density is 250W/cm2, and the chip has hot spot problems, the thermal resistance requirements of VC are more stringent. How to reduce the thermal resistance inside the VC is the main focus of two-phase flow product design.

當發熱源功率較高時,需要更大體積或較大面積的含有均溫板之散熱模組來進行解熱,然而該等散熱模組若以銅及不鏽鋼材料製成,其整體之重量十分的重,壓迫在PCB板或晶片上容易產生壓裂損毀此外更要考量的是使用環境的問題,在低溫環境下內部工作流體必須選擇能在低溫環境下啟動與工作,並且更必須防止其結冰等問題,更需注意的是應用環境溫度變化循環導致內部工作液體結冰導致均溫板殼體材料膨脹造成破裂等問題。 When the power of the heat source is higher, a larger or larger heat dissipation module with a temperature averaging plate is required to dissipate heat. However, if such heat dissipation modules are made of copper and stainless steel, the overall weight is very heavy, and it is easy to cause compression and cracking damage on the PCB board or chip. In addition, the use environment must be considered. In a low-temperature environment, the internal working fluid must be selected to be able to start and work in a low-temperature environment, and it must be prevented from freezing. What is more important is that the temperature change cycle of the application environment causes the internal working fluid to freeze, resulting in the expansion of the temperature averaging plate shell material and cracking.

以及針對均溫板中如何提升內部工作流體的沸騰速度從而降低蒸發熱阻,以及如何增加蒸發後之氣泡如何容易從毛細結構中脫離達到良好的換熱目的,皆為該項業者首中之目的。 How to increase the boiling speed of the internal working fluid in the temperature plate to reduce the evaporation thermal resistance, and how to increase the ease of evaporation of bubbles from the capillary structure to achieve good heat exchange are the top priorities of the industry.

爰此,為有效解決上述之問題,本發明之主要目的,係提供一種質輕、結構強度佳且可應用於低溫環境時內部工作流體不產生結冰現象,並同時可以提升內部工作流體的沸騰速度從而降低蒸發熱阻的均溫板結構。 Therefore, in order to effectively solve the above problems, the main purpose of the present invention is to provide a temperature balancing plate structure that is light in weight, has good structural strength, and can be used in low-temperature environments without causing freezing of the internal working fluid, and can also increase the boiling rate of the internal working fluid to reduce the evaporation thermal resistance.

為達上述之目的,本發明係提供均溫板結構,具有一鋁質上板、一鋁質下板、一工作流體、複數微米等級凹槽; 所述鋁質上板具有一第一側及一第二側;該鋁質下板具有一第三側及一第四側;該鋁質上、下板對應蓋合形成一氣密腔室並填充有一工作流體,該等微米等級凹槽係直接以向上凸設及或向下凹設其中任一以上成型於該第三側表面構形有複數小水漥,藉以提升及提速該氣密腔室內的工作流體沸騰效率,增加整體汽液循環效能,並防止低溫環境內部工作液體結冰之均溫板結構者。 To achieve the above-mentioned purpose, the present invention provides a temperature-averaging plate structure, which has an aluminum upper plate, an aluminum lower plate, a working fluid, and a plurality of micrometer-level grooves; the aluminum upper plate has a first side and a second side; the aluminum lower plate has a third side and a fourth side; the aluminum upper and lower plates are correspondingly covered to form an airtight chamber and filled with a working fluid, and the micrometer-level grooves are directly formed on the surface of the third side with a plurality of small water pools in an upward convex or downward concave configuration, so as to enhance and speed up the boiling efficiency of the working fluid in the airtight chamber, increase the overall vapor-liquid circulation efficiency, and prevent the working fluid from freezing in a low-temperature environment.

11:鋁質上板 11: Aluminum upper plate

111:第一側 111: First side

112:第二側 112: Second side

12:鋁質下板 12: Aluminum lower plate

121:第三側 121: Third side

122:第四側 122: Fourth side

123:蒸發區域 123: Evaporation area

13:氣密腔室 13: Airtight chamber

14:微米等級凹槽 14: Micron-grade grooves

14a:凸肋 14a: ribs

15:支撐體 15: Support body

第1圖係為本發明之均溫板結構第一實施例立體分解圖;第2圖係為本發明之均溫板結構第一實施例組合剖視圖;第3圖係為本發明之均溫板結構第一實施例另一立體分解圖。 Figure 1 is a three-dimensional exploded view of the first embodiment of the temperature balancing plate structure of the present invention; Figure 2 is a combined cross-sectional view of the first embodiment of the temperature balancing plate structure of the present invention; Figure 3 is another three-dimensional exploded view of the first embodiment of the temperature balancing plate structure of the present invention.

本發明之上述目的及其結構與功能上的特性,將依據所附圖式之較佳實施例予以說明。 The above-mentioned purpose of the present invention and its structural and functional characteristics will be explained according to the preferred embodiments of the attached drawings.

請參閱第1、2、3圖,係為本發明之均溫板結構立體分解及組合圖,如圖所示,本發明均溫板結構,係包含:一鋁質上板11、一鋁質下板12、一工作流體2、複數微米等級凹槽14;所述鋁質上板11具有一第一側111及一第二側112,該第一、二側111、112分別設置於該鋁質上板11的上、下兩側。 Please refer to Figures 1, 2, and 3, which are three-dimensional exploded and assembled diagrams of the temperature balancing plate structure of the present invention. As shown in the figure, the temperature balancing plate structure of the present invention includes: an aluminum upper plate 11, an aluminum lower plate 12, a working fluid 2, and a plurality of micron-grade grooves 14; the aluminum upper plate 11 has a first side 111 and a second side 112, and the first and second sides 111 and 112 are respectively arranged on the upper and lower sides of the aluminum upper plate 11.

所述鋁質下板12具有一第三側121及一第四側122,該第三、四側121、122分別設置於該鋁質下板12的上、下兩側,所述鋁質下板12之第三側121具有一蒸發區域123,該第四側122對應該蒸發區域123之處與至少一發熱源(圖中未示)接觸進行熱傳導,該鋁質上、下板11、12對應蓋合,即所述鋁質上板11之第二側112與該鋁質下板12之第四側122對應蓋合形成一氣密腔室13並填充有一工作流體(圖中未示)。 The aluminum lower plate 12 has a third side 121 and a fourth side 122. The third and fourth sides 121, 122 are respectively arranged on the upper and lower sides of the aluminum lower plate 12. The third side 121 of the aluminum lower plate 12 has an evaporation area 123. The fourth side 122 is in contact with at least one heat source (not shown in the figure) corresponding to the evaporation area 123 for heat conduction. The aluminum upper and lower plates 11, 12 are correspondingly covered, that is, the second side 112 of the aluminum upper plate 11 and the fourth side 122 of the aluminum lower plate 12 are correspondingly covered to form an airtight chamber 13 and filled with a working fluid (not shown in the figure).

該等微米等級凹槽14寬度200-300um,深度30~50um,該等微米等級凹槽14係直接於該第三側121表面的蒸發區域123以向上凸設及或向下凹設(採陰或陽刻印的方式)其中任一方式構形一以上複數小水漥(坑、池、洞、塘)形成具有可容納液體的複數小空間,藉以加速沸騰速度以提升該氣密腔室13內的工作流體2沸騰效率,大幅增加整體汽液循環效能。 The micron-level grooves 14 are 200-300um wide and 30-50um deep. The micron-level grooves 14 are directly formed in the evaporation area 123 on the surface of the third side 121 by convex upward or concave downward (using negative or positive engraving) to form a plurality of small water pools (pits, pools, holes, ponds) to form a plurality of small spaces that can accommodate liquids, so as to accelerate the boiling speed and improve the boiling efficiency of the working fluid 2 in the airtight chamber 13, greatly increasing the overall vapor-liquid circulation efficiency.

該等微米等級凹槽14係為長方形、菱形、正方形、圓形、梯形、三角形等幾合形狀,並且該等微米等級凹槽14彼此可等距或非等距排列,又或者相鄰或不相鄰不連接或緊鄰連接等方式設置。 The micron-scale grooves 14 are rectangular, rhombus, square, circular, trapezoidal, triangular and other geometric shapes, and the micron-scale grooves 14 can be arranged equidistantly or unequally, or adjacently or non-adjacently, non-connected or closely connected.

複數支撐體15係為柱狀結構其可為獨立體(二端分別連接第二側及第三側)或直接由第三側向上凸起,並令凸起之一端連接該鋁質上板11之第二側112,另外該支撐體15可與該等微米等級凹槽14選擇相連接或錯位配置者。 The plurality of supporting bodies 15 are columnar structures which can be independent (two ends are connected to the second side and the third side respectively) or directly protrude upward from the third side, and one end of the protrusion is connected to the second side 112 of the aluminum upper plate 11. In addition, the supporting body 15 can be selectively connected to or staggered with the micron-level grooves 14.

參閱第3圖,該等微米等級凹槽14係位於該第三側121,並沿該第三側121之橫向及縱向上凸伸複數凸肋14a,且該等凸肋14a係相互交錯形成該等微米等級凹槽14;或該等凸肋14a直接於該第三側121直接凸起並以環繞方式(如小圓圈或小矩框圈或其他形式幾何形狀形成的小型封閉區域)(如第3圖所示)構成所述微米等級凹槽14;或該等微米等級凹槽14係於該第三側121直接向下凹陷複數凹坑所形成,而該等凸肋14a或凹坑係透過直接於該第三側121表面以除料或壓印所形成,所述微米等級凹槽14係可透過傳統加工或非傳統加工進行加工,該傳統加工係為車床、銑床、鉋床、磨床、沖床、壓床等,所述非傳統加工係為雷射加工、放電加工、蝕刻加工、3D列印等。 Referring to FIG. 3 , the micrometer-scale grooves 14 are located on the third side 121, and a plurality of ribs 14a protrude in the lateral and longitudinal directions of the third side 121, and the ribs 14a are staggered to form the micrometer-scale grooves 14; or the ribs 14a directly protrude from the third side 121 and form the micrometer-scale grooves 14 in a circumferential manner (such as a small circle or a small rectangular frame or a small closed area formed in other forms of geometric shapes) (as shown in FIG. 3 ). ; or the micron-level grooves 14 are formed by directly recessing a plurality of pits on the third side 121, and the ribs 14a or pits are formed by directly removing material or embossing on the surface of the third side 121. The micron-level grooves 14 can be processed by traditional processing or non-traditional processing. The traditional processing is a lathe, a milling machine, a plating machine, a grinder, a punching machine, a press, etc. The non-traditional processing is laser processing, discharge processing, etching processing, 3D printing, etc.

並針對與發熱源(圖中未示)直接對應的主要蒸發區域123,選擇將該等微米等級凹槽14以較為密集緊密之方式排列設置,進而提升池沸騰的效率,而主要蒸發區域123外的其餘部位可以等距或非等距的方式排列設置該等微米等級凹槽14。 And for the main evaporation area 123 directly corresponding to the heat source (not shown in the figure), the micron-level grooves 14 are arranged in a denser manner to improve the efficiency of pool boiling, and the remaining parts outside the main evaporation area 123 can be arranged with the micron-level grooves 14 in an equidistant or non-equidistant manner.

該所述微米等級凹槽14上更具有一毛細結構層(圖中未示),所述毛細結構層係為燒結粉末體或編織網目或纖維體,並透過焊接或擴散接合或燒結之方式設置於該微米等級凹槽14上方並緊密結合。 The micron-level groove 14 is provided with a capillary structure layer (not shown in the figure). The capillary structure layer is a sintered powder body or a woven mesh or a fiber body, and is arranged on the micron-level groove 14 and tightly bonded by welding, diffusion bonding or sintering.

本發明主要透過選擇選用鋁材質作為均溫板上、下板的主要材料,近一步解決傳統習知銅材質或不鏽鋼材質過重所衍生之問題,並且鋁材質之材料特性,可防止均溫板在低溫環境使用下內部工作流體產生結冰等問題。 The present invention mainly uses aluminum as the main material for the upper and lower plates of the temperature equalizing plate, further solving the problem derived from the traditional copper or stainless steel materials being too heavy. In addition, the material properties of the aluminum material can prevent the internal working fluid of the temperature equalizing plate from freezing when used in a low-temperature environment.

當該鋁質下板受熱時,會使液體狀態的工作流體轉化為蒸氣後向上擴散,並由於該微米等級凹槽的設置,使其形成的小水坑(複數小凹坑或複數小水窪),將原鋁質下板與該工作流體所接觸之大區域部位劃分為複數小區域,而這些小區域可增加該鋁質下板中工作流體受熱後小“核點”的水加速或快速沸騰(核沸 騰現象),而令該工作流體蒸發產生的汽泡得以快速脫離並蒸發,形成了池式沸騰與流動沸騰之現象,增加氣密腔室內部工作流體的兩相劇烈變化,則本案均溫板結構內部不同於習知均溫板的地方在於,本案均溫板結構內同時具有池式沸騰、膜沸騰、流動沸騰等沸騰相變化,進而可加速兩相流變化的熱傳現象,使均溫板可立即或瞬間快速提供均溫效果現象,相較於習知僅透過毛細結構所提供的傳統蒸發及膜狀沸騰熱傳效率更為顯著,故本發明相較於傳統均溫板另外可提供一種可產生劇烈的相變而增加潛熱換熱的能力者。 When the aluminum lower plate is heated, the working fluid in liquid state will be converted into steam and diffuse upwards. Due to the setting of the micron-level grooves, small puddles (multiple small pits or multiple small water pits) are formed, dividing the large area where the original aluminum lower plate and the working fluid are in contact into multiple small areas. These small areas can increase the acceleration or rapid boiling of water in the small "core points" of the working fluid in the aluminum lower plate after heating (nucleate boiling phenomenon), and the bubbles generated by the evaporation of the working fluid can quickly break away and evaporate, forming the phenomenon of pool boiling and flow boiling, increasing The two-phase working fluid in the airtight chamber changes dramatically. The difference between the structure of the temperature averaging plate in this case and the conventional temperature averaging plate is that the structure of the temperature averaging plate in this case has boiling phase changes such as pool boiling, film boiling, and flow boiling at the same time, which can accelerate the heat transfer phenomenon of the two-phase flow change, so that the temperature averaging plate can immediately or instantly provide a temperature averaging effect. Compared with the conventional traditional evaporation and film boiling heat transfer efficiency provided only by the capillary structure, the present invention can also provide a kind of ability to produce dramatic phase changes and increase latent heat exchange compared to the conventional temperature averaging plate.

11:鋁質上板 11: Aluminum upper plate

111:第一側 111: First side

112:第二側 112: Second side

12:鋁質下板 12: Aluminum lower plate

121:第三側 121: Third side

122:第四側 122: Fourth side

14:微米等級凹槽 14: Micron-grade grooves

14a:凸肋 14a: ribs

15:支撐體 15: Support body

Claims (8)

一種均溫板結構,係包含:一鋁質上板,具有一第一側及一第二側;一鋁質下板,具有一第三側及一第四側,該鋁質上、下板對應蓋合形成一氣密腔室並填充有一工作流體,複數微米等級凹槽,該等微米等級凹槽係直接於該第三側表面向下凹設具有可容納液體的複數小空間,該等微米等級凹槽密集緊密之方式排列設置,藉以提升該氣密腔室內的工作流體沸騰效率,增加整體汽液循環效能,此外並藉由鋁質上、下板之配置使其均溫板得具有質輕、結構強度佳且可應用於低溫環境防止內部工作液體結冰者。 A temperature equalizing plate structure includes: an aluminum upper plate having a first side and a second side; an aluminum lower plate having a third side and a fourth side. The aluminum upper and lower plates are correspondingly covered to form an airtight chamber filled with a working fluid, and a plurality of micron-level grooves. The micron-level grooves are directly recessed downward on the surface of the third side and have a plurality of small spaces that can accommodate liquid. The micron-level grooves are densely arranged to improve the boiling efficiency of the working fluid in the airtight chamber and increase the overall vapor-liquid circulation efficiency. In addition, the configuration of the aluminum upper and lower plates makes the temperature equalizing plate light in weight, good in structural strength, and can be used in low-temperature environments to prevent the internal working fluid from freezing. 如申請專利範圍第1項所述之均溫板結構,其中該等微米等級凹槽係為長方形、菱形、正方形、圓形、梯形、三角形等幾合形狀。 As described in item 1 of the patent application, the heat balancing plate structure, wherein the micron-level grooves are in a rectangular, diamond, square, circular, trapezoidal, triangular or other composite shapes. 如申請專利範圍第1項所述之均溫板結構,其中更具有複數支撐體,係由第三側向上凸起連接該鋁質上板之第二側,該等支撐體與該等微米等級凹槽可選擇相連接或錯位配置。 The temperature equalizing plate structure described in item 1 of the patent application scope further comprises a plurality of supporting bodies, which are protruded upward from the third side and connected to the second side of the aluminum upper plate. The supporting bodies and the micron-level grooves can be selectively connected or staggered. 如申請專利範圍第1項所述之均溫板結構,其中所述微米等級凹槽係可透過傳統加工或非傳統加工進行加工,該傳統加工係為車床、銑床、鉋床、磨床、沖床、壓床等,所述非傳統加工係為雷射加工、放電加工、蝕刻加工、3D列印等。 As described in item 1 of the patent application, the micron-level groove can be processed by traditional processing or non-traditional processing. The traditional processing is lathe, milling machine, plating machine, grinder, punching machine, press machine, etc. The non-traditional processing is laser processing, discharge processing, etching processing, 3D printing, etc. 如申請專利範圍第1項所述之均溫板結構,其中所述微米等級凹槽上更具有一燒結粉末層或一編織網狀層。 The temperature equalizing plate structure as described in Item 1 of the patent application, wherein the micron-scale grooves further have a sintered powder layer or a woven mesh layer. 如申請專利範圍第1項所述之均溫板結構,其中該等微米等級凹槽寬度200-300um,深度30~50um。 As described in item 1 of the patent application, the temperature equalizing plate structure, wherein the micron-level grooves have a width of 200-300um and a depth of 30~50um. 如申請專利範圍第1項所述之均溫板結構,其中該等微米等級凹槽係於該第三側並沿橫向及縱向凸伸複數凸肋並相互交錯所形成。 As described in item 1 of the patent application, the heat spreader structure, wherein the micrometer-level grooves are formed by a plurality of ribs extending horizontally and vertically on the third side and interlaced with each other. 如申請專利範圍第1項所述之均溫板結構,其中所述鋁質下板之第三側具有一蒸發區域,該第四側對應該蒸發區域之處對應與至少一發熱源接觸。 As described in item 1 of the patent application, the third side of the aluminum lower plate has an evaporation area, and the fourth side corresponding to the evaporation area is in contact with at least one heat source.
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Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWM426755U (en) * 2011-08-02 2012-04-11 Ying-Tung Chen Heat pipe
US20180015385A1 (en) * 2014-10-20 2018-01-18 Numerical Design, Inc. Microfluidic-based apparatus and method for vaporization of liquids
CN113218226A (en) * 2021-04-29 2021-08-06 中南大学 Thin deformable heat dissipation structure with aluminum capillary structure and preparation method thereof
TWM621971U (en) * 2021-10-12 2022-01-01 大陸商深圳興奇宏科技有限公司 Heat spreader having enhanced two-phase flow boiling structure

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWM426755U (en) * 2011-08-02 2012-04-11 Ying-Tung Chen Heat pipe
US20180015385A1 (en) * 2014-10-20 2018-01-18 Numerical Design, Inc. Microfluidic-based apparatus and method for vaporization of liquids
CN113218226A (en) * 2021-04-29 2021-08-06 中南大学 Thin deformable heat dissipation structure with aluminum capillary structure and preparation method thereof
TWM621971U (en) * 2021-10-12 2022-01-01 大陸商深圳興奇宏科技有限公司 Heat spreader having enhanced two-phase flow boiling structure

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