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TWI858176B - Ground connection lead film - Google Patents

Ground connection lead film Download PDF

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Publication number
TWI858176B
TWI858176B TW109138299A TW109138299A TWI858176B TW I858176 B TWI858176 B TW I858176B TW 109138299 A TW109138299 A TW 109138299A TW 109138299 A TW109138299 A TW 109138299A TW I858176 B TWI858176 B TW I858176B
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TW
Taiwan
Prior art keywords
adhesive layer
width
ground connection
metal layer
connection lead
Prior art date
Application number
TW109138299A
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Chinese (zh)
Other versions
TW202202337A (en
Inventor
春名裕介
Original Assignee
日商拓自達電線股份有限公司
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Publication of TW202202337A publication Critical patent/TW202202337A/en
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Publication of TWI858176B publication Critical patent/TWI858176B/en

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Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K9/00Screening of apparatus or components against electric or magnetic fields
    • H05K9/0073Shielding materials
    • H05K9/0081Electromagnetic shielding materials, e.g. EMI, RFI shielding
    • H05K9/0084Electromagnetic shielding materials, e.g. EMI, RFI shielding comprising a single continuous metallic layer on an electrically insulating supporting structure, e.g. metal foil, film, plating coating, electro-deposition, vapour-deposition
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B15/00Layered products comprising a layer of metal
    • B32B15/04Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material
    • B32B15/08Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/0213Electrical arrangements not otherwise provided for
    • H05K1/0216Reduction of cross-talk, noise or electromagnetic interference
    • H05K1/0218Reduction of cross-talk, noise or electromagnetic interference by printed shielding conductors, ground planes or power plane
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K9/00Screening of apparatus or components against electric or magnetic fields
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K9/00Screening of apparatus or components against electric or magnetic fields
    • H05K9/0064Earth or grounding circuit

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  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Shielding Devices Or Components To Electric Or Magnetic Fields (AREA)
  • Laminated Bodies (AREA)
  • Adhesive Tapes (AREA)
  • Structure Of Printed Boards (AREA)

Abstract

本揭示發明提供一種接地連接引出膜,其不易於金屬層與接著劑層間發生剝離,且加熱時氣體不易積存於金屬層與接著劑層間,抑或提供能形成該膜的接地連接引出膜。 接地連接引出膜具備金屬層及設置於金屬層之一面的接著劑層。於金屬層形成有在厚度方向上貫通的開口部,開口部在厚度方向截面中具有具第一寬度及第二寬度之截面,前述第一寬度朝面擴展方向延伸且相對上屬寬幅,前述第二寬度朝面擴展方向延伸且相對於第一寬度而言,相對上屬狹幅。接著劑層相對於第一寬度,積層於第二寬度側的金屬層面。接著劑層之一部分可侵入抑或已侵入開口部內,在接著劑層之一部分已侵入開口部內的狀態下,第二寬度埋沒在開口部內的接著劑層中。The present invention provides a ground connection lead film that is not easy to peel off between the metal layer and the adhesive layer, and gas is not easy to accumulate between the metal layer and the adhesive layer when heated, or provides a ground connection lead film that can form the film. The ground connection lead film has a metal layer and an adhesive layer arranged on one surface of the metal layer. An opening portion that passes through the metal layer in the thickness direction is formed in the metal layer, and the opening portion has a cross section with a first width and a second width in the thickness direction cross section, the first width extends in the surface expansion direction and is relatively wide, and the second width extends in the surface expansion direction and is relatively narrow relative to the first width. The adhesive layer is deposited on the metal layer on the second width side relative to the first width. A portion of the adhesive layer may penetrate or has penetrated into the opening portion. When a portion of the adhesive layer has penetrated into the opening portion, the second width is buried in the adhesive layer in the opening portion.

Description

接地連接引出膜Ground connection lead film

發明領域 Invention Field

本揭示發明是有關於一種接地連接引出膜。 The present invention relates to a ground connection lead film.

背景技術 Background technology

在行動電話、視訊攝影機、筆記型電腦等電子機器中,印刷配線板廣泛用來將電路組裝入機構中。又,亦會利用在像是印刷頭這種可動部與控制部之連接。於該等電子機器中,必須要有電磁波屏蔽措施,針對使用於裝置內之印刷配線板,亦開始採用已施行電磁波屏蔽措施的屏蔽印刷配線板。 In electronic devices such as mobile phones, video cameras, and laptops, printed wiring boards are widely used to install circuit assemblies in the mechanism. In addition, they are also used to connect movable parts such as print heads with control parts. In these electronic devices, electromagnetic wave shielding measures must be taken. For printed wiring boards used in the devices, shielded printed wiring boards with electromagnetic wave shielding measures have also begun to be used.

上述屏蔽印刷配線板例如具有以下結構:以依序積層有接著劑層、金屬薄膜及絕緣層而成的電磁波屏蔽膜之接著劑層面密著之方式,將上述電磁波屏蔽膜載置於含有印刷電路的基體膜上,然後,利用加熱、加壓(熱壓接),使上述接著劑層接著於上述基體膜上。 The shielded printed wiring board has the following structure, for example: the electromagnetic wave shielding film is placed on a base film containing a printed circuit in a manner that the electromagnetic wave shielding film is formed by sequentially stacking an adhesive layer, a metal thin film, and an insulating layer, and then the adhesive layer is bonded to the base film by heating and pressurizing (thermocompression bonding).

再者,在將侵入屏蔽印刷配線板內的電磁波或是屏蔽印刷配線板內產生的電磁波釋放至外部之目的下,有時會使用接地連接引出膜。作為上述接地連接引出膜,已知的是由導電性基材之金屬層及用以黏貼在屏蔽印刷配線板內任意位置的接著劑層所構成者(例如參照專利文獻1及2)。 Furthermore, in order to release electromagnetic waves that penetrate into the shielded printed wiring board or electromagnetic waves generated in the shielded printed wiring board to the outside, a ground connection lead film is sometimes used. As the above-mentioned ground connection lead film, it is known that it is composed of a metal layer of a conductive substrate and an adhesive layer for sticking to any position in the shielded printed wiring board (for example, refer to patent documents 1 and 2).

先前技術文獻 Prior art literature

專利文獻 Patent Literature

專利文獻1:日本特開2016-122687號公報 Patent document 1: Japanese Patent Publication No. 2016-122687

專利文獻2:日本特開2003-86907號公報 Patent document 2: Japanese Patent Publication No. 2003-86907

發明概要 Summary of invention

然而,習知接地連接引出膜中,當金屬層與接著劑層之層間密著力薄弱時,會有金屬層與接著劑層間容易產生剝離之問題。又,將接地連接引出膜進行熱壓接以黏貼在屏蔽印刷配線板或印刷配線板時,抑或回流步驟中經加熱時,殘留於接著劑層中的有機溶劑會揮發而產生氣體,由於氣體無法通過金屬層,因此會有積存於金屬層與接著劑層間之問題。若焊料回流步驟中進行急遽之加熱,則因已積存於金屬層與接著劑層間之氣體,會有產生膨脹抑或金屬層與接著劑層之層間密著受到破壞之情形。 However, it is known that in the ground connection lead film, when the interlayer adhesion between the metal layer and the adhesive layer is weak, there is a problem that the metal layer and the adhesive layer are easily peeled off. In addition, when the ground connection lead film is hot-pressed to be attached to the shielded printed wiring board or printed wiring board, or when heated in the reflow step, the organic solvent remaining in the adhesive layer will evaporate to generate gas. Since the gas cannot pass through the metal layer, there is a problem that it is accumulated between the metal layer and the adhesive layer. If the solder is heated rapidly during the solder reflow step, the gas accumulated between the metal layer and the adhesive layer may expand or the adhesion between the metal layer and the adhesive layer may be destroyed.

防止所產生的氣體導致膨脹的方法,已知的方法是使用形成有複數個開口部的金屬層。然而,若設置開口部,則金屬層與接著劑層之接觸面積會減少,變得更加容易引起層間之剝離。 A known method for preventing expansion caused by the generated gas is to use a metal layer formed with a plurality of openings. However, if the openings are provided, the contact area between the metal layer and the adhesive layer will be reduced, making it easier to cause peeling between the layers.

故,本揭示發明之目的在提供一種接地連接引出膜,其不易於金屬層與接著劑層間發生剝離,且加熱時氣體不易積存於金屬層與接著劑層間,抑或提供能形成該膜的接地連接引出膜。 Therefore, the purpose of the present invention is to provide a ground connection lead-out film that is not easy to peel off between the metal layer and the adhesive layer, and gas is not easy to accumulate between the metal layer and the adhesive layer when heated, or to provide a ground connection lead-out film that can form such a film.

本揭示發明的發明人為了達成上述目的精心探討,結果發現,接地連接引出膜中,藉由將設置於金屬層的開口部形狀以及金屬層與接著劑層的積層形態特定化,便不易於金屬層與接著劑層間發生剝離,且加熱時氣體不易積存於金屬層與接著劑層間。本揭示發明是根據該等見解而完成。 The inventors of the present invention have made careful studies to achieve the above-mentioned purpose, and found that in the ground connection lead-out film, by specifying the shape of the opening portion provided in the metal layer and the stacking morphology of the metal layer and the adhesive layer, it is not easy for the metal layer and the adhesive layer to peel off, and it is not easy for gas to accumulate between the metal layer and the adhesive layer when heated. The present invention is completed based on these insights.

即,本揭示發明提供一種接地連接引出膜,其具備金屬層及設置於上述金屬層之一面的接著劑層,於上述金屬層形成有在厚度方向上貫通上述金屬層的開口部,上述開口部在厚度方向截面中具有具第一寬度及第二寬度之 截面,上述第一寬度朝面擴展方向延伸且相對上屬寬幅,上述第二寬度朝面擴展方向延伸,且相對於上述第一寬度而言,相對上屬狹幅;上述接著劑層以上述第一寬度為基準,積層於上述第二寬度側的上述金屬層面,上述接著劑層之一部分可侵入抑或已侵入上述開口部內,在上述接著劑層之一部分已侵入上述開口部內的狀態下,上述第二寬度埋沒在已侵入上述開口部內的接著劑層中。 That is, the present invention provides a ground connection lead film, which has a metal layer and an adhesive layer disposed on one surface of the metal layer, wherein an opening portion is formed on the metal layer and passes through the metal layer in the thickness direction, wherein the opening portion has a cross section having a first width and a second width in the thickness direction cross section, wherein the first width extends in the surface expansion direction and is relatively large relative to the upper width, and the second width extends in the surface expansion direction. The adhesive layer is relatively narrow relative to the first width. The adhesive layer is deposited on the metal layer on the second width side based on the first width. A portion of the adhesive layer may or has intruded into the opening. When a portion of the adhesive layer has intruded into the opening, the second width is buried in the adhesive layer that has intruded into the opening.

上述接地連接引出膜中,藉由於金屬層形成有在厚度方向上貫通的開口部,當加熱時於接著劑層內產生氣體時,氣體可經由上述開口部而通過金屬層,因此氣體不易積存於金屬層與接著劑層間。再者,上述開口部具有相對上屬寬幅的第一寬度及相對上屬狹幅的第二寬度,且上述接著劑層以上述第一寬度為基準,積層於相對上屬狹幅的上述第二寬度側的金屬層面。然後,第一態樣中,上述接著劑層之一部分形成為可侵入上述開口部內。從第一態樣例如施以加熱/加壓處理,可藉以變遷成第二態樣。第二態樣中,上述接著劑層之一部分會侵入上述開口部內,且相對上屬狹幅的第二寬度埋沒在已侵入上述開口部內的接著劑層中。上述接地連接引出膜在此種第二態樣中,即便是在朝金屬層與接著劑層欲相互剝離之方向施力時,開口部內的接著劑也會卡在金屬層之具有上述第二寬度的部分,藉此,開口部內的接著劑以及與開口部內的接著劑一體存在之開口部外的接著劑不易從金屬層剝離,因此接著劑層不易從金屬層剝離。 In the ground connection lead film, an opening portion is formed in the metal layer that passes through the thickness direction. When gas is generated in the adhesive layer during heating, the gas can pass through the metal layer through the opening portion, so the gas is not easily accumulated between the metal layer and the adhesive layer. Furthermore, the opening portion has a first width relative to the upper attribute width and a second width relative to the upper attribute narrowness, and the adhesive layer is laminated on the metal layer surface on the side of the second width relative to the upper attribute narrowness based on the first width. Then, in the first embodiment, a part of the adhesive layer is formed to be able to penetrate into the opening portion. The first embodiment can be transformed into the second embodiment by, for example, applying a heating/pressurization treatment. In the second embodiment, a portion of the adhesive layer will intrude into the opening, and the second width, which is relatively narrow, is buried in the adhesive layer that has intruded into the opening. In the second embodiment, even when a force is applied in the direction in which the metal layer and the adhesive layer are to be peeled off from each other, the adhesive in the opening will be stuck in the portion of the metal layer having the second width, thereby making it difficult for the adhesive in the opening and the adhesive outside the opening that is integral with the adhesive in the opening to be peeled off from the metal layer, and thus the adhesive layer is difficult to be peeled off from the metal layer.

本揭示發明一實施形態的接地連接引出膜具有以下效果:金屬層與接著劑層間之剝離不易發生,且加熱時氣體不易積存於金屬層與接著劑層間。又,本揭示發明另一實施形態的接地連接引出膜,能形成具有此種效果的接地連接引出膜。 The ground connection lead-out film of one embodiment of the present invention has the following effects: peeling between the metal layer and the adhesive layer is not easy to occur, and gas is not easy to accumulate between the metal layer and the adhesive layer when heated. In addition, the ground connection lead-out film of another embodiment of the present invention can form a ground connection lead-out film with such effects.

1,1’:接地連接引出膜 1,1’: Ground connection lead film

2:金屬層 2:Metal layer

2a:金屬層露出面 2a: Metal layer exposed

2b:接著劑層積層面 2b: Then the dosage form

3,3’,64,81:接著劑層 3,3’,64,81: Next is the agent layer

5a,5b,5c:屏蔽印刷配線板 5a,5b,5c: Shielded printed wiring board

6,6’:印刷配線板 6,6’: Printed wiring board

7,8:屏蔽積層體 7,8: Shielding laminate

21:開口部 21: Opening

31:導電性粒子 31: Conductive particles

61:基底構件 61: Base component

62:電路圖案 62: Circuit diagram

62a:信號電路 62a:Signal circuit

62b:接地電路 62b: Ground circuit

63:絕緣保護層(覆蓋層) 63: Insulation protection layer (covering layer)

71:導電性接著劑層 71: Conductive adhesive layer

72,83:絕緣層 72,83: Insulation layer

82:電磁波屏蔽層 82:Electromagnetic wave shielding layer

D1:第一寬度 D1: First width

D2:第二寬度 D2: Second width

H:面擴展方向 H: Surface expansion direction

T:厚度方向 T: thickness direction

b-b’:厚度方向截面 b-b’: cross section in thickness direction

圖1(a)為外觀圖,其顯示本揭示發明之接地連接引出膜的第一態樣,以及圖1(b)為厚度方向截面之a-a’截面放大圖。 Figure 1(a) is an appearance diagram showing the first state of the ground connection lead-out film of the present invention, and Figure 1(b) is an enlarged view of the a-a’ cross section in the thickness direction.

圖2(a)為外觀圖,其顯示本揭示發明之接地連接引出膜的第二態樣,以及圖2(b)為厚度方向截面之b-b’截面放大圖。 Figure 2(a) is an appearance diagram showing the second state of the ground connection lead-out film of the present invention, and Figure 2(b) is an enlarged view of the b-b’ cross section in the thickness direction.

圖3為截面圖,其顯示應用了圖1所示接地連接引出膜的屏蔽印刷配線板之一實施形態。 FIG3 is a cross-sectional view showing one embodiment of a shielded printed wiring board using the ground connection lead film shown in FIG1.

圖4為截面圖,其顯示應用了圖1所示接地連接引出膜的屏蔽印刷配線板之其他實施形態。 FIG4 is a cross-sectional view showing another embodiment of a shielded printed wiring board using the ground connection lead film shown in FIG1.

圖5為截面圖,其顯示應用了圖1所示接地連接引出膜的屏蔽印刷配線板之另一其他實施形態。 FIG5 is a cross-sectional view showing another embodiment of a shielded printed wiring board using the ground connection lead film shown in FIG1.

用以實施發明之形態 The form used to implement the invention

[接地連接引出膜] [Ground connection lead film]

本說明書中,所謂「接地連接引出膜」,意指可於印刷配線板的任意位置上將印刷配線板之接地電路與外部之接地電位電連接的膜、或是可將電磁波屏蔽膜之屏蔽層與位於屏蔽印刷配線板外部之接地電位連接的膜。作為可將印刷配線板之接地電路與外部之接地電位電連接的膜,具體可舉例:可於印刷配線板上已積層有電磁波屏蔽膜的屏蔽印刷配線板內抑或印刷配線板上已積層有導電性補強板之附補強板印刷配線板內的任意位置上,連接印刷配線板之接地部與位於屏蔽印刷配線板外部之接地電位的膜。 In this manual, the so-called "ground connection lead film" means a film that can electrically connect the ground circuit of a printed wiring board to an external ground potential at any position on the printed wiring board, or a film that can connect the shielding layer of an electromagnetic wave shielding film to a ground potential located outside the shielded printed wiring board. As a film that can electrically connect the ground circuit of a printed wiring board to an external ground potential, a specific example is: a film that can connect the ground portion of a printed wiring board to a ground potential located outside the shielded printed wiring board at any position in a shielded printed wiring board on which an electromagnetic wave shielding film has been layered, or in a reinforced printed wiring board on which a conductive reinforced board has been layered.

圖1及圖2中顯示上述接地連接引出膜之一實施形態。圖1(a)為外觀圖,其顯示本揭示發明之接地連接引出膜的第一態樣,圖1(b)為厚度方向截面之a-a’截面放大圖。接地連接引出膜1具備金屬層2及積層於金屬層2之一面2b上的 接著劑層3。接著劑層3可以僅積層於金屬層2之單面上,亦可積層於兩面上。 FIG. 1 and FIG. 2 show an implementation form of the ground connection lead film. FIG. 1(a) is an appearance diagram showing the first state of the ground connection lead film of the present invention, and FIG. 1(b) is an enlarged view of the a-a' cross section in the thickness direction. The ground connection lead film 1 has a metal layer 2 and an adhesive layer 3 laminated on one surface 2b of the metal layer 2. The adhesive layer 3 can be laminated on only one surface of the metal layer 2, or on both surfaces.

如圖1(a)及(b)所示,於金屬層2形成有複數個在厚度方向T上貫通金屬層2的開口部21。如圖1(b)所示,開口部21之厚度方向T截面之形狀是朝遠離接著劑層3側之方向擴展的錐形形狀。上述錐形形狀具有:第一寬度D1,其朝面擴展方向H延伸且相對上屬寬幅;及第二寬度D2,其朝面擴展方向H延伸且相對上屬狹幅。金屬層2中,第一寬度D1位於與接著劑層3為相反側的金屬層面(金屬層露出面)2a上,第二寬度D2則位於接著劑層3側的金屬層面(接著劑層積層面)2b上。第一態樣中,接著劑層3之一部分並未侵入開口部21內,但接著劑層3之一部分可形成為侵入開口部21內。 As shown in Fig. 1(a) and (b), a plurality of openings 21 are formed in the metal layer 2 and penetrate the metal layer 2 in the thickness direction T. As shown in Fig. 1(b), the shape of the cross section of the opening 21 in the thickness direction T is a cone shape that expands in the direction away from the side of the adhesive layer 3. The above-mentioned cone shape has: a first width D1, which extends in the surface expansion direction H and is relatively wide; and a second width D2, which extends in the surface expansion direction H and is relatively narrow. In the metal layer 2, the first width D1 is located on the metal layer surface (metal layer exposed surface) 2a on the opposite side of the adhesive layer 3, and the second width D2 is located on the metal layer surface (adhesive layer accumulation surface) 2b on the side of the adhesive layer 3. In the first embodiment, a part of the adhesive layer 3 does not intrude into the opening 21, but a part of the adhesive layer 3 can be formed to intrude into the opening 21.

另,本說明書中,所謂「錐形形狀」,意指在截面形狀中為寬度從一方向起連續地擴展、在立體形狀中則為截面形狀從一方向起連續地擴展之形狀,並不限於擴展的增加量呈固定。舉例言之,圖1(b)所示之錐形形狀之側邊亦可為曲線。又,具有第一寬度D1及第二寬度D2的開口部21之截面形狀並不限於錐形形狀,例如可舉例:具有漏斗形狀等錐形形狀的形狀、具有凸形狀的形狀等。 In addition, in this specification, the so-called "conical shape" means a shape whose width expands continuously from one direction in a cross-sectional shape and a shape whose cross-sectional shape expands continuously from one direction in a three-dimensional shape, and is not limited to a fixed increase in expansion. For example, the side of the conical shape shown in FIG. 1(b) may also be a curve. In addition, the cross-sectional shape of the opening portion 21 having the first width D1 and the second width D2 is not limited to a conical shape, and examples include shapes having a conical shape such as a funnel shape, and shapes having a convex shape, etc.

第一態樣的接地連接引出膜1,藉著例如施以加熱/加壓處理,接著劑層3即流動而侵入開口部21內。之後,硬化成可發揮用以充分地卡住第二寬度D2的力量之程度而形成接著劑層3’,變遷成圖2所示第二態樣之接地連接引出膜1’。即,接著劑層3以具有藉著加熱及/或加壓而具有流動性之性質、及、流動後硬化之性質(具體而言,是可硬化成可發揮用以充分地卡住第二寬度D2的力量之程度之性質)為佳。 The ground connection lead film 1 of the first state is subjected to a heating/pressurizing treatment, for example, so that the adhesive layer 3 flows and invades the opening 21. Afterwards, it hardens to a degree that can fully exert the force to clamp the second width D2 to form the adhesive layer 3', and transforms into the ground connection lead film 1' of the second state shown in Figure 2. That is, the adhesive layer 3 preferably has the property of being fluid by heating and/or pressurizing, and the property of hardening after flowing (specifically, the property of being hardened to a degree that can fully exert the force to clamp the second width D2).

圖2(a)為外觀圖,其顯示本揭示發明之接地連接引出膜的第二態樣,圖2(b)為厚度方向截面之b-b’截面放大圖。如圖2(a)及(b)所示,接地連接引出膜1’中,構成接著劑層3’的接著劑之一部分會侵入已設置於金屬層2的各個開口 部21內。開口部21內的接著劑層3’界面,在厚度方向T截面中,位於比相對上屬寬幅的第一寬度D1更靠近接著劑層3’側(接著劑層積層面2b側),且相對於相對上屬狹幅的第二寬度D2,位於與接著劑層3’側為相反側(金屬層露出面2a側)。即,開口部21內的接著劑層3’之界面,以第二寬度D2為基準而位於第一寬度D1側(金屬層露出面2a側,圖2(b)之上側),於開口部21內,第二寬度D2埋沒在接著劑層3中。 FIG2(a) is an external view showing the second state of the ground connection lead film of the present invention, and FIG2(b) is an enlarged view of the b-b' cross section in the thickness direction. As shown in FIG2(a) and (b), in the ground connection lead film 1', a portion of the adhesive constituting the adhesive layer 3' will intrude into each opening 21 provided in the metal layer 2. The interface of the adhesive layer 3' in the opening 21 is located closer to the adhesive layer 3' side (adhesive layer accumulation surface 2b side) than the first width D1 of the relative upper width in the cross section T in the thickness direction, and is located on the opposite side of the adhesive layer 3' side (metal layer exposed surface 2a side) relative to the second width D2 of the relative upper narrow width. That is, the interface of the adhesive layer 3' in the opening 21 is located on the first width D1 side (metal layer exposed surface 2a side, upper side of Figure 2(b)) based on the second width D2, and in the opening 21, the second width D2 is buried in the adhesive layer 3.

第二態樣中,接地連接引出膜1’藉由於金屬層2形成有在厚度方向T上貫通的開口部21,當加熱時於接著劑層3’內產生氣體時,氣體可經由開口部21而通過金屬層2,因此氣體不易積存於金屬層2與接著劑層3’間。 In the second embodiment, the ground connection lead film 1' is formed with an opening 21 penetrating in the thickness direction T through the metal layer 2. When gas is generated in the adhesive layer 3' during heating, the gas can pass through the metal layer 2 through the opening 21, so the gas is not easily accumulated between the metal layer 2 and the adhesive layer 3'.

又,第二態樣中,於開口部21內,第二寬度D2埋沒在接著劑層3’中,藉此,即便是在朝金屬層2與接著劑層3’欲相互剝離之方向施力時,開口部21內的接著劑也會卡在具有第二寬度D2的突起,藉此,開口部21內的接著劑以及與開口部21內的接著劑一體存在之開口部21外的接著劑不易從金屬層2剝離,因此接著劑層3’不易從金屬層2剝離。又,接著劑層3’界面存在於開口部21內,接著劑層3不會從金屬層露出面2a流出。因此,在將金屬層2連接於電子零件之框體等時,構成接著劑層3’的樹脂成分不會阻礙框體與金屬層2之接觸。另,接著劑層3’界面亦可自金屬層露出面2a側露出而覆蓋金屬層2表面之一部分。 Furthermore, in the second embodiment, the second width D2 is buried in the adhesive layer 3' in the opening 21, so that even when a force is applied in the direction in which the metal layer 2 and the adhesive layer 3' are to be peeled off from each other, the adhesive in the opening 21 will be stuck in the protrusion having the second width D2, so that the adhesive in the opening 21 and the adhesive outside the opening 21 that is integral with the adhesive in the opening 21 are not easy to be peeled off from the metal layer 2, and therefore the adhesive layer 3' is not easy to be peeled off from the metal layer 2. In addition, the interface of the adhesive layer 3' exists in the opening 21, and the adhesive layer 3 will not flow out from the exposed surface 2a of the metal layer. Therefore, when the metal layer 2 is connected to the frame of the electronic component, the resin component constituting the adhesive layer 3' will not hinder the contact between the frame and the metal layer 2. In addition, the interface of the adhesive layer 3' can also be exposed from the metal layer exposed surface 2a side and cover a part of the surface of the metal layer 2.

開口部21內的接著劑層3’界面,在金屬層2之厚度方向T上位於第一寬度D1與第二寬度D2間。當金屬層露出面2a為錐形形狀之寬幅末端且接著劑層3’界面位於第一寬度D1與第二寬度D2間之情形時,在將焊料形成於開口部21上時,載置有焊料狀態的焊料底面周緣與開口部緣部間之間隙小,不易存在有空隙,於接著劑層3’表面的焊料潤濕性會提升。另,從可增加開口部21內的接著劑量並且更充分地卡住接著劑之觀點來看,開口部21內的接著劑層3’界面亦可位於第一寬度D1上。 The interface of the adhesive layer 3' in the opening 21 is located between the first width D1 and the second width D2 in the thickness direction T of the metal layer 2. When the exposed surface 2a of the metal layer is the end of the width of the tapered shape and the interface of the adhesive layer 3' is located between the first width D1 and the second width D2, when the solder is formed on the opening 21, the gap between the periphery of the bottom surface of the solder with the solder and the edge of the opening is small, and it is not easy to have a gap, and the solder wettability on the surface of the adhesive layer 3' will be improved. In addition, from the perspective of increasing the amount of adhesive in the opening 21 and more fully clamping the adhesive, the interface of the adhesive layer 3' in the opening 21 can also be located on the first width D1.

圖1(b)或圖2(b)所示之厚度方向T截面,是通過從金屬層2側上面來看呈圓形的開口部21之中心及直徑的截面。藉由令通過開口部21中心的截面為圖1(b)或圖2(b)所示之截面(即,具第一寬度D1及第二寬度D2之截面),第二態樣中可充分地卡住開口部21內的接著劑。尤其理想的是通過開口部21中心的所有厚度方向T截面為圖1(b)或圖2(b)所示之截面。另,未通過中心的截面亦可為圖1(b)或圖2(b)所示之截面,尤其理想的是開口部21之貫通部中所有厚度方向T截面為圖1(b)或圖2(b)所示之截面。 The thickness direction T section shown in FIG. 1(b) or FIG. 2(b) is a section through the center and diameter of the circular opening 21 viewed from the side of the metal layer 2. By making the section through the center of the opening 21 the section shown in FIG. 1(b) or FIG. 2(b) (i.e., the section with the first width D1 and the second width D2), the adhesive in the opening 21 can be fully clamped in the second state. It is particularly desirable that all thickness direction T sections through the center of the opening 21 are the sections shown in FIG. 1(b) or FIG. 2(b). In addition, the sections that do not pass through the center may also be the sections shown in FIG. 1(b) or FIG. 2(b), and it is particularly desirable that all thickness direction T sections in the through-portion of the opening 21 are the sections shown in FIG. 1(b) or FIG. 2(b).

開口部21為以下錐形形狀:面擴展方向H之截面從接著劑層積層面2b朝金屬層露出面2a連續地擴大。藉由為此種形狀,可更充分地卡住開口部21內的接著劑。又,容易製作厚度方向T截面具有第一寬度D1及第二寬度D2的開口部。 The opening 21 is in the following conical shape: the cross section in the surface expansion direction H continuously expands from the adhesive layer surface 2b toward the metal layer exposed surface 2a. With this shape, the adhesive in the opening 21 can be more fully clamped. In addition, it is easy to make an opening with a first width D1 and a second width D2 in the thickness direction T cross section.

從可更充分地卡住開口部21內的接著劑之觀點來看,厚度方向T截面中第一寬度D1與第二寬度D2之長度差宜為金屬層2之厚度以上。 From the perspective of being able to more fully clamp the adhesive in the opening 21, the length difference between the first width D1 and the second width D2 in the thickness direction T cross section should be greater than the thickness of the metal layer 2.

以下,詳細說明接地連接引出膜1,1’、金屬層2及接著劑層3,3’之較佳態樣。另,本說明書中,有時會將接地連接引出膜1及1’總稱為「接地連接引出膜1群」,將接著劑層3及3’總稱為「接著劑層3群」。 The following describes in detail the preferred embodiments of the ground connection lead-out films 1, 1', the metal layer 2 and the adhesive layers 3, 3'. In addition, in this specification, the ground connection lead-out films 1 and 1' are sometimes collectively referred to as "ground connection lead-out film group 1", and the adhesive layers 3 and 3' are sometimes collectively referred to as "adhesive layer group 3".

(金屬層) (Metal layer)

於金屬層2形成有複數個開口部21。開口部21之形狀,在面擴展方向H上的形狀(即,圖1中從上面來看的形狀)為圓形,亦可為橢圓形、軌道形、多角形(例如三角形、四角形、五角形、六角形、八角形等)、星形等。從開口部之形成容易度來看,其中又以圓形為佳。又,複數個開口部21可皆為相同形狀,亦可為二種以上的不同形狀。 A plurality of openings 21 are formed in the metal layer 2. The shape of the opening 21 in the plane expansion direction H (i.e., the shape viewed from above in FIG. 1) is circular, or may be elliptical, track-shaped, polygonal (e.g., triangle, quadrangle, pentagon, hexagon, octagon, etc.), star-shaped, etc. From the perspective of the ease of forming the opening, a circular shape is preferred. In addition, the plurality of openings 21 may all be of the same shape, or may be of two or more different shapes.

開口部21之排列圖案並無特殊限制,例如可列舉:格子狀、千鳥格狀、蜂巢結構狀等。又,開口部21可規則配置,亦可無規配置。 There is no special restriction on the arrangement pattern of the openings 21, for example, a grid pattern, a houndstooth pattern, a honeycomb structure, etc. In addition, the openings 21 can be arranged regularly or irregularly.

開口部21之開口面積(各開口部之面積)並無特殊限制,以面擴展方向H上最大面積而言,宜為100~75000μm2,較佳為500~35000μm2,更佳為1000~20000μm2。若上述開口面積在100μm2以上,透氣性會變得更加良好。若上述開口面積在75000μm2以下,接地連接引出性能會變得更加良好。 The opening area of the opening 21 (the area of each opening) is not particularly limited. The maximum area in the surface expansion direction H is preferably 100-75000 μm 2 , preferably 500-35000 μm 2 , and more preferably 1000-20000 μm 2 . If the opening area is greater than 100 μm 2 , the air permeability will be better. If the opening area is less than 75000 μm 2 , the ground connection lead performance will be better.

開口部21之開口率並無特殊限制,宜為0.5~40%,較佳為2.0~30%,更佳為4.0~25%。若上述開口率在0.5%以上,透氣性會變得更加良好。若上述開口率在40%以下,接地連接引出性能會變得更加良好。 There is no special restriction on the opening ratio of the opening portion 21, which is preferably 0.5~40%, preferably 2.0~30%, and more preferably 4.0~25%. If the above opening ratio is above 0.5%, the air permeability will become better. If the above opening ratio is below 40%, the ground connection lead-out performance will become better.

構成金屬層2的金屬例如可列舉:金、銀、銅、鋁、鎳、錫、鈀、鉻、鈦、鋅或該等之合金等。從接地連接引出性能優異之觀點來看,其中又以銅層、銀層為佳,從經濟性之觀點來看,則以銅為佳。 The metals constituting the metal layer 2 include, for example, gold, silver, copper, aluminum, nickel, tin, palladium, chromium, titanium, zinc or alloys thereof. From the perspective of excellent ground connection performance, copper and silver layers are preferred, while from the perspective of economy, copper is preferred.

金屬層2可為單層、複層(例如施以金屬鍍敷的層體)中任一者。不過,於複層之情形時,開口部21是以貫通複層的金屬層2之方式設置在相同位置。 The metal layer 2 can be a single layer or a composite layer (e.g., a metal-plated layer). However, in the case of a composite layer, the opening 21 is provided at the same position in such a way as to penetrate the composite metal layer 2.

金屬層2之厚度宜為0.5~12μm,更佳為1~6μm。若上述厚度在0.5μm以上,則具有開口部且接地連接引出性能會變得更加良好。若上述厚度在12μm以下,則可擔保對具有凹凸的基板之服貼性,並且可將具備接地連接引出膜的製品縮小設計。 The thickness of the metal layer 2 is preferably 0.5~12μm, and more preferably 1~6μm. If the thickness is above 0.5μm, the opening portion and the ground connection lead-out performance will become better. If the thickness is below 12μm, the conformity to the substrate with uneven surfaces can be guaranteed, and the product with the ground connection lead-out film can be designed in a smaller size.

(接著劑層) (followed by the agent layer)

接著劑層3群發揮用以將例如接地連接引出膜1群接著於屏蔽印刷配線板或印刷配線板的接著性。接著劑層3群為單層、複層中任一者均可。接著劑層3群宜含有黏結劑成分。上述黏結劑成分可以僅使用一種,亦可使用二種以上。 The adhesive layer group 3 is used to bond, for example, the ground connection lead film group 1 to the shielded printed wiring board or printed wiring board. The adhesive layer group 3 may be a single layer or a multi-layer. The adhesive layer group 3 preferably contains an adhesive component. The above-mentioned adhesive component may be used alone or in combination of two or more.

上述黏結劑成分可列舉:熱塑性樹脂、熱硬化型樹脂、活性能量線硬化型化合物等。上述熱塑性樹脂例如可列舉:聚苯乙烯系樹脂、乙酸乙烯酯系樹脂、聚酯系樹脂、聚烯烴系樹脂(例如聚乙烯系樹脂、聚丙烯系樹脂組成物等)、聚醯亞胺系樹脂、丙烯酸系樹脂等。上述熱塑性樹脂可以僅使用一種,亦 可使用二種以上。 The above-mentioned binder components can be listed as: thermoplastic resins, thermosetting resins, active energy ray-hardening compounds, etc. The above-mentioned thermoplastic resins can be listed as: polystyrene resins, vinyl acetate resins, polyester resins, polyolefin resins (such as polyethylene resins, polypropylene resin compositions, etc.), polyimide resins, acrylic resins, etc. The above-mentioned thermoplastic resins can be used alone or in combination of two or more.

上述熱硬化型樹脂可舉例:具有熱硬化性的樹脂(熱硬化性樹脂)以及令上述熱硬化性樹脂硬化而得的樹脂兩者。上述熱硬化性樹脂例如可列舉:酚系樹脂、環氧系樹脂、胺甲酸乙酯系樹脂、三聚氰胺系樹脂、醇酸系樹脂等。上述熱硬化型樹脂可以僅使用一種,亦可使用二種以上。 Examples of the thermosetting resin include: a thermosetting resin (thermosetting resin) and a resin obtained by hardening the thermosetting resin. Examples of the thermosetting resin include: phenolic resins, epoxy resins, urethane resins, melamine resins, alkyd resins, etc. Only one type of the thermosetting resin may be used, or two or more types may be used.

上述環氧系樹脂例如可列舉:雙酚型環氧系樹脂、螺環型環氧系樹脂、萘型環氧系樹脂、聯苯型環氧系樹脂、萜烯型環氧系樹脂、環氧丙基醚型環氧系樹脂、環氧丙基胺型環氧系樹脂、酚醛清漆型環氧系樹脂等。 Examples of the above-mentioned epoxy resins include bisphenol epoxy resins, spirocyclic epoxy resins, naphthalene epoxy resins, biphenyl epoxy resins, terpene epoxy resins, glycidyl ether epoxy resins, glycidyl amine epoxy resins, novolac epoxy resins, etc.

上述雙酚型環氧樹脂例如可列舉:雙酚A型環氧樹脂、雙酚F型環氧樹脂、雙酚S型環氧樹脂、四溴雙酚A型環氧樹脂等。上述環氧丙基醚型環氧樹脂例如可列舉:參(環氧丙氧基苯基)甲烷、肆(環氧丙氧基苯基)乙烷等。上述環氧丙基胺型環氧樹脂可舉例如:四環氧丙基二胺基二苯甲烷等。上述酚醛清漆型環氧樹脂可舉例如:甲酚酚醛清漆型環氧樹脂、苯酚酚醛清漆型環氧樹脂、α-萘酚酚醛清漆型環氧樹脂、溴化苯酚酚醛清漆型環氧樹脂等。 Examples of the bisphenol type epoxy resin include bisphenol A type epoxy resin, bisphenol F type epoxy resin, bisphenol S type epoxy resin, tetrabromobisphenol A type epoxy resin, etc. Examples of the glycidyl ether type epoxy resin include tris(glycidoxyphenyl)methane, tetrakis(glycidoxyphenyl)ethane, etc. Examples of the glycidyl amine type epoxy resin include tetraglycidyl diamino diphenylmethane, etc. The above-mentioned novolac type epoxy resins include, for example: cresol novolac type epoxy resin, phenol novolac type epoxy resin, α-naphthol novolac type epoxy resin, brominated phenol novolac type epoxy resin, etc.

上述活性能量線硬化型化合物可列舉:可利用活性能量線照射而硬化的化合物(活性能量線硬化性化合物)以及令上述活性能量線硬化性化合物硬化而得的化合物兩者。活性能量線硬化性化合物並無特殊限制,可舉例如:分子中具有1個以上(較佳為2個以上)自由基反應性基(例如(甲基)丙烯醯基)的聚合性化合物等。上述活性能量線硬化型化合物可以僅使用一種,亦可使用二種以上。 The above-mentioned active energy ray-hardening compounds can be exemplified as compounds that can be hardened by irradiation with active energy rays (active energy ray-hardening compounds) and compounds obtained by hardening the above-mentioned active energy ray-hardening compounds. There are no special restrictions on the active energy ray-hardening compounds, and examples thereof include polymerizable compounds having one or more (preferably two or more) free radical reactive groups (such as (meth)acryloyl groups) in the molecule. The above-mentioned active energy ray-hardening compounds can be used alone or in combination of two or more.

其中,上述黏結劑成分又以熱硬化型樹脂為佳。在此情形下,在將接地連接引出膜1配置於印刷配線板或屏蔽印刷配線板等被接著體上後,可利用加壓及加熱使黏結劑成分硬化,黏貼部之接著性會變得良好。舉例言之,在將接著劑層3中的黏結劑成分設為熱硬化性樹脂時,接著劑層3’中的黏結劑成分會 變成上述熱硬化性樹脂已硬化的熱硬化型樹脂。 Among them, the above-mentioned adhesive component is preferably a thermosetting resin. In this case, after the ground connection lead film 1 is arranged on the adherend such as a printed wiring board or a shielded printed wiring board, the adhesive component can be hardened by applying pressure and heat, and the adhesion of the adhesive portion will become good. For example, when the adhesive component in the adhesive layer 3 is set to a thermosetting resin, the adhesive component in the adhesive layer 3' will become a thermosetting resin in which the above-mentioned thermosetting resin has been hardened.

當上述黏結劑成分含有熱硬化型樹脂時,構成上述黏結劑成分的成分亦可含有用以促進熱硬化反應的硬化劑。上述硬化劑可依照上述熱硬化性樹脂之種類適當地選擇。上述硬化劑可以僅使用一種,亦可使用二種以上。 When the above-mentioned adhesive component contains a thermosetting resin, the components constituting the above-mentioned adhesive component may also contain a hardener for promoting a thermosetting reaction. The above-mentioned hardener may be appropriately selected according to the type of the above-mentioned thermosetting resin. The above-mentioned hardener may be used only one type or two or more types.

接著劑層3群亦可具有導電性。當具有導電性時,接地連接引出性能會變得更加良好。當具有導電性時,接著劑層3群宜包含導電性粒子。上述導電性粒子可以僅使用一種,亦可使用二種以上。 The adhesive layer group 3 may also be conductive. When conductive, the ground connection lead-out performance becomes better. When conductive, the adhesive layer group 3 preferably includes conductive particles. The above-mentioned conductive particles may be used only one type or two or more types.

上述導電性粒子例如可列舉:金屬粒子、金屬包樹脂粒子、金屬纖維、碳填料、碳奈米管等。 The above-mentioned conductive particles include, for example: metal particles, metal-coated resin particles, metal fibers, carbon fillers, carbon nanotubes, etc.

上述金屬粒子及構成上述金屬包樹脂粒子之包覆部的金屬例如可列舉:金、銀、銅、鎳、鋅、銦、錫、鉛、鉍、包含該等中2種以上之合金等。上述金屬可以僅使用一種,亦可使用二種以上。 The metal particles and the metals constituting the coating of the metal-coated resin particles can be exemplified by: gold, silver, copper, nickel, zinc, indium, tin, lead, bismuth, and alloys containing two or more of these. Only one of the above metals can be used, or two or more can be used.

具體而言,上述金屬粒子例如可列舉:銅粒子、銀粒子、鎳粒子、銀包銅粒子、銦粒子、錫粒子、鉛粒子、鉍粒子、金包銅粒子、銀包鎳粒子、金包鎳粒子、銦包銅粒子、錫包銅粒子、鉛包銅粒子、鉍包銅粒子、銦包鎳粒子、錫包鎳粒子、鉍包鎳粒子、銀包合金粒子等。上述銀包合金粒子例如可列舉:含銅的合金粒子(例如由銅、鎳與鋅之合金構成的銅合金粒子)已由銀包覆的銀包銅合金粒子等。上述金屬粒子可利用電解法、霧化法、還原法等來製作。 Specifically, the metal particles include, for example, copper particles, silver particles, nickel particles, silver-coated copper particles, indium particles, tin particles, lead particles, bismuth particles, gold-coated copper particles, silver-coated nickel particles, gold-coated nickel particles, indium-coated copper particles, tin-coated copper particles, lead-coated copper particles, bismuth-coated copper particles, indium-coated nickel particles, tin-coated nickel particles, bismuth-coated nickel particles, and silver-coated alloy particles. The silver-coated alloy particles include, for example, copper-containing alloy particles (e.g., copper alloy particles composed of an alloy of copper, nickel, and zinc) and silver-coated copper alloy particles. The above-mentioned metal particles can be produced by electrolysis, atomization, reduction, etc.

其中,上述金屬粒子又以銀粒子、銀包銅粒子、銀包銅合金粒子為佳。從導電性優異、抑制金屬粒子之氧化及凝集且可降低金屬粒子之成本之觀點來看,尤以銀包銅粒子、銀包銅合金粒子為佳。 Among them, the above-mentioned metal particles are preferably silver particles, silver-coated copper particles, and silver-coated copper alloy particles. From the perspective of excellent conductivity, inhibiting oxidation and agglomeration of metal particles, and reducing the cost of metal particles, silver-coated copper particles and silver-coated copper alloy particles are particularly preferred.

具體而言,上述金屬包樹脂粒子可列舉:銀包樹脂粒子、金包樹脂粒子、銦包樹脂粒子、錫包樹脂粒子、鉛包樹脂粒子、鉍包樹脂粒子等。 Specifically, the above-mentioned metal-coated resin particles can be listed as: silver-coated resin particles, gold-coated resin particles, indium-coated resin particles, tin-coated resin particles, lead-coated resin particles, bismuth-coated resin particles, etc.

上述導電性粒子之形狀方面可列舉:球狀、小片狀(鱗片狀)、樹枝 狀、纖維狀、不定形(多面體)等。 The shapes of the above-mentioned conductive particles can be listed as: spherical, flake (scale), branch-like, fiber-like, amorphous (polyhedron), etc.

上述導電性粒子之中位直徑(D50)宜為1~50μm,更佳為3~40μm。若上述中位直徑在1μm以上,則導電性粒子之分散性良好而凝集可獲抑制,並且不易氧化。若上述平均粒徑在50μm以下,導電性會變得良好。 The median diameter (D50) of the conductive particles is preferably 1-50 μm, more preferably 3-40 μm. If the median diameter is greater than 1 μm, the conductive particles have good dispersibility and aggregation can be suppressed, and are not easily oxidized. If the average particle size is less than 50 μm, the conductivity will be good.

當接著劑層3群具有導電性時,接著劑層3群可以視需要設為具有各向同性導電性或各向異性導電性之層體。 When the adhesive layer group 3 has conductivity, the adhesive layer group 3 can be set as a layer with isotropic conductivity or anisotropic conductivity as needed.

當接著劑層3群具有導電性時的導電性粒子之含有比例並無特殊限制,相對於接著劑層之總量100質量%,宜為2~95質量%,較佳為5~80質量%,更佳為10~70質量%。若上述含有比例在2質量%以上,導電性會變得更加良好。若上述含有比例在95質量%以下,則可足量含有黏結劑成分,對被接著體之密著性會變得更加良好。 When the adhesive layer 3 group has conductivity, the content ratio of the conductive particles is not particularly limited. Relative to the total amount of the adhesive layer 100 mass%, it is preferably 2-95 mass%, preferably 5-80 mass%, and more preferably 10-70 mass%. If the above content ratio is above 2 mass%, the conductivity will become better. If the above content ratio is below 95 mass%, the adhesive component can be contained in sufficient amount, and the adhesion to the adherend will become better.

在無損本揭示發明作為目的之效果範圍內,接著劑層3群亦可含有上述各成分以外的其他成分。上述其他成分可列舉公知或慣用之可含在接著劑層中的成分。上述其他成分可舉例如:硬化促進劑、塑化劑、阻燃劑、消泡劑、黏度調節劑、抗氧化劑、稀釋劑、防沈劑、填充劑、著色劑、調平劑、耦合劑、紫外線吸收劑、賦黏樹脂、抗結塊劑等。上述其他成分可以僅使用一種,亦可使用二種以上。 Within the scope of the effect of the purpose of the present invention, the adhesive layer group 3 may also contain other components other than the above-mentioned components. The above-mentioned other components can be listed as well-known or commonly used components that can be contained in the adhesive layer. The above-mentioned other components can be, for example: hardening accelerator, plasticizer, flame retardant, defoaming agent, viscosity regulator, antioxidant, diluent, anti-settling agent, filler, colorant, leveling agent, coupling agent, ultraviolet absorber, adhesive resin, anti-caking agent, etc. The above-mentioned other components can be used alone or in combination.

接著劑層3群之厚度宜為3~20μm,更佳為5~15μm。若上述厚度在3μm以上,對被接著體之接著力會變得更加良好。若上述厚度在20μm以下,則可抑制成本,並且可將具備接地連接引出膜的製品縮小設計。另,在接著劑層3開始流動而侵入開口部21內之情形時等的接著劑層3’之厚度,是未侵入區域的接著劑層之厚度。 The thickness of the adhesive layer 3 group is preferably 3~20μm, and more preferably 5~15μm. If the thickness is above 3μm, the bonding force to the adherend will become better. If the thickness is below 20μm, the cost can be suppressed, and the product with the ground connection lead film can be designed in a smaller size. In addition, the thickness of the adhesive layer 3' when the adhesive layer 3 starts to flow and invades the opening 21 is the thickness of the adhesive layer in the area that has not invaded.

說明圖1及圖2所示接地連接引出膜1群之製造方法。製作圖1所示之接地連接引出膜1時,首先,接著劑層3例如可將用以形成接著劑層3的接著劑 組成物,塗佈(塗覆)於分隔膜等暫時基材或金屬層2上,並且視需要去溶劑及/或局部硬化而形成。 The manufacturing method of the ground connection lead film group 1 shown in Figures 1 and 2 is described. When manufacturing the ground connection lead film 1 shown in Figure 1, first, the adhesive layer 3, for example, can be formed by applying (coating) an adhesive composition used to form the adhesive layer 3 on a temporary substrate such as a separator or a metal layer 2, and then removing the solvent and/or partially hardening it as needed.

除了接著劑層3中所含各成分外,上述接著劑組成物例如包含溶劑(溶媒)。溶劑可舉例如:甲苯、丙酮、甲基乙基酮、甲醇、乙醇、丙醇、二甲基甲醯胺等。接著劑組成物之固體成分濃度可依照形成的接著劑層之厚度等適當地設定。 In addition to the components contained in the adhesive layer 3, the adhesive composition includes a solvent (solvent). Examples of the solvent include toluene, acetone, methyl ethyl ketone, methanol, ethanol, propanol, dimethylformamide, etc. The solid component concentration of the adhesive composition can be appropriately set according to the thickness of the formed adhesive layer, etc.

上述接著劑組成物之塗佈可使用公知塗佈法。舉例言之,可使用凹版輥式塗佈機、反向輥式塗佈機、接觸輥式塗佈機、模唇塗佈機、浸漬輥式塗佈機、棒式塗佈機、刮刀(knife)式塗佈機、噴霧塗佈機、缺角輪塗佈機、直接塗佈機、狹縫式模具塗佈機等塗佈機。 The adhesive composition can be applied by a known coating method. For example, a gravure roller coater, a reverse roller coater, a contact roller coater, a die lip coater, an immersion roller coater, a rod coater, a knife coater, a spray coater, a notched wheel coater, a direct coater, a slit die coater, and the like can be used.

當暫時基材上形成有接著劑層3時,其次,在已形成於暫時基材上的接著劑層3表面,積層已預先設置有開口部21的金屬層2。另,開口部21可藉由對金屬板(或金屬層)進行衝孔、雷射照射等公知或慣用方法來形成。又,當上述金屬板是由銅等可蝕刻之材料構成時,亦可於上述金屬板之表面,配置像是能形成開口部21這般圖案的抗蝕劑,並且利用蝕刻來形成開口部21。此外,亦可於上述金屬板之表面,印刷導電性糊抑或具有作為鍍敷催化劑機能的糊。該印刷時,藉由以預定圖案進行印刷即可形成開口部21。若是印刷上述具有作為鍍敷催化劑機能的糊的情況,可於印刷膏糊而形成開口部21後,利用無電鍍敷法或電鍍法來形成金屬膜,藉此形成金屬層2。又,亦可在已形成於暫時基材上的接著劑層3表面,將導電性糊抑或具有作為鍍敷催化劑機能的糊印刷成所期望圖案後,利用無電鍍敷法或電鍍法來形成金屬膜,藉此形成金屬層2。 When the adhesive layer 3 is formed on the temporary substrate, the metal layer 2 having the opening 21 pre-set is then laminated on the surface of the adhesive layer 3 formed on the temporary substrate. The opening 21 can be formed by punching a metal plate (or metal layer) or by laser irradiation, or by other known or conventional methods. Furthermore, when the metal plate is made of an etchable material such as copper, an anti-etching agent having a pattern that can form the opening 21 can be arranged on the surface of the metal plate, and the opening 21 can be formed by etching. Furthermore, a conductive paste or a paste that functions as a plating catalyst can be printed on the surface of the metal plate. During the printing, the opening 21 can be formed by printing with a predetermined pattern. In the case of printing the above-mentioned paste having a function as a plating catalyst, after the opening 21 is formed by printing the paste, a metal film can be formed by electroless plating or electroplating to form the metal layer 2. Alternatively, a conductive paste or a paste having a function as a plating catalyst can be printed into a desired pattern on the surface of the adhesive layer 3 formed on the temporary substrate, and then a metal film can be formed by electroless plating or electroplating to form the metal layer 2.

然後,藉由將已於接著劑層3上積層有金屬層2的膜交付至加熱/加壓處理(熱壓)等,構成接著劑層3的接著劑之一部分可侵入金屬層2的開口部21內。又,可將接地連接引出膜1之接著劑層3作為黏貼面而貼合於印刷配線板上, 然後進行熱壓,藉此使接地連接引出膜1接著於印刷配線板上,舉例言之,亦可利用此時的熱壓,形成接著劑層3’,同時令構成接著劑層3’的接著劑之一部分侵入開口部21內,以製作接地連接引出膜1’。上述熱壓時之溫度宜為100~200℃,較佳為120~190℃,更佳為140~180℃。又,以印刷配線板上的面壓為基準計,壓力宜為0.5~10MPa,較佳為1~8MPa,更佳為2~6MPa。時間宜為1min以上,較佳為2min以上,更佳為3min以上。如此一來,可製得接地連接引出膜1。 Then, by subjecting the film on which the metal layer 2 is stacked on the adhesive layer 3 to a heating/pressurizing treatment (hot pressing), a portion of the adhesive constituting the adhesive layer 3 can penetrate into the opening 21 of the metal layer 2. Alternatively, the adhesive layer 3 of the ground connection lead film 1 can be attached to the printed wiring board using the adhesive layer 3 as an adhesive surface, and then hot pressing is performed to bond the ground connection lead film 1 to the printed wiring board. For example, the hot pressing at this time can also be used to form an adhesive layer 3', and at the same time, a portion of the adhesive constituting the adhesive layer 3' can penetrate into the opening 21 to produce the ground connection lead film 1'. The temperature during the hot pressing is preferably 100-200°C, preferably 120-190°C, and more preferably 140-180°C. Moreover, based on the surface pressure on the printed wiring board, the pressure is preferably 0.5-10MPa, preferably 1-8MPa, and more preferably 2-6MPa. The time is preferably more than 1min, preferably more than 2min, and more preferably more than 3min. In this way, a ground connection lead film 1 can be obtained.

如上述,本揭示發明之接地連接引出膜,可於用以將侵入印刷配線板或屏蔽印刷配線板內的電磁波、抑或所產生的電磁波釋放至外部之目的下使用。以下,顯示已將接地連接引出膜1應用在屏蔽印刷配線板的例子。另,圖3~圖5中,省略顯示已形成於金屬層2上的開口部21。 As described above, the ground connection lead film of the present invention can be used for the purpose of releasing electromagnetic waves that invade or shield the printed wiring board, or the electromagnetic waves generated to the outside. The following shows an example in which the ground connection lead film 1 is applied to a shielded printed wiring board. In addition, in Figures 3 to 5, the opening 21 formed on the metal layer 2 is omitted.

[屏蔽印刷配線板] [Shielded printed wiring board]

如圖3所示,屬於屏蔽印刷配線板第一態樣的屏蔽印刷配線板5a具備:印刷配線板6;屏蔽積層體7,其由電磁波屏蔽膜形成;及接地連接引出膜1’,其位於印刷配線板6與屏蔽積層體7間。 As shown in FIG3 , the shielded printed wiring board 5a belonging to the first embodiment of the shielded printed wiring board comprises: a printed wiring board 6; a shielding laminate 7 formed of an electromagnetic wave shielding film; and a ground connection lead film 1', which is located between the printed wiring board 6 and the shielding laminate 7.

印刷配線板6具有:基底構件61;電路圖案62,其局部設置於基底構件61之表面;絕緣保護層(覆蓋層)63,其覆蓋電路圖案62並進行絕緣保護;及接著劑層64,其覆蓋電路圖案62,且用以接著電路圖案62及基底構件61與絕緣保護層63。電路圖案62包含複數個信號電路62a及接地電路62b。於接地電路62b上的接著劑層64及絕緣保護層63處,基於確保與屏蔽積層體7之導電性接著劑層71之導通之目的而形成有通孔。 The printed wiring board 6 has: a base member 61; a circuit pattern 62, which is partially arranged on the surface of the base member 61; an insulating protective layer (covering layer) 63, which covers the circuit pattern 62 and performs insulating protection; and an adhesive layer 64, which covers the circuit pattern 62 and is used to connect the circuit pattern 62 and the base member 61 and the insulating protective layer 63. The circuit pattern 62 includes a plurality of signal circuits 62a and a ground circuit 62b. Through holes are formed in the adhesive layer 64 and the insulating protective layer 63 on the ground circuit 62b for the purpose of ensuring conduction with the conductive adhesive layer 71 of the shielding laminate 7.

屏蔽積層體7是積層導電性接著劑層71與絕緣層72,並透過導電性接著劑層71設置於印刷配線板6上。屏蔽積層體7可藉由將電磁波屏蔽膜貼合於印刷配線板6上後進行熱壓接而形成。利用上述熱壓接,電磁波屏蔽膜中的導電性接著劑層會利用加熱及加壓而流動,並填充已設置於接地電路62b上的上述通 孔,可令接地電路62b與導電性接著劑層71導通。 The shielding laminate 7 is a laminate of a conductive adhesive layer 71 and an insulating layer 72, and is provided on the printed wiring board 6 through the conductive adhesive layer 71. The shielding laminate 7 can be formed by attaching an electromagnetic wave shielding film to the printed wiring board 6 and then performing heat pressing. By the above-mentioned heat pressing, the conductive adhesive layer in the electromagnetic wave shielding film flows by heating and pressurizing, and fills the above-mentioned through hole provided on the grounding circuit 62b, so that the grounding circuit 62b and the conductive adhesive layer 71 can be connected.

屏蔽印刷配線板5a中,接地連接引出膜1’之一部分配置於印刷配線板6與屏蔽積層體7間,屏蔽積層體7之導電性接著劑層71與接地連接引出膜1’之金屬層2會貼合而電連接。接地連接引出膜1’之另一部分則是其中一面載置於印刷配線板6上,另一面則會露出,上述露出區域具有作為外部連接導電層之機能,在露出部分與外部之接地構件電連接。藉此,可連接印刷配線板6之接地電路62b與位於屏蔽印刷配線板5a外部的接地電位。接地連接引出膜1’可藉由以接著劑層3構成接著面之方式將接地連接引出膜1貼合於印刷配線板6上,然後進行熱壓接而形成。利用上述熱壓接,接著劑層3會因加熱及加壓而流動,並填充已設置於接地電路62b上的通孔,當接著劑層3具有導電性時,可令接地電路62b與接著劑層3’導通。 In the shielded printed wiring board 5a, a portion of the ground connection lead film 1' is arranged between the printed wiring board 6 and the shielding laminate 7, and the conductive adhesive layer 71 of the shielding laminate 7 and the metal layer 2 of the ground connection lead film 1' are bonded and electrically connected. Another portion of the ground connection lead film 1' is that one side is placed on the printed wiring board 6 and the other side is exposed. The above-mentioned exposed area has the function of serving as an external connection conductive layer, and is electrically connected to an external grounding component at the exposed portion. In this way, the ground circuit 62b of the printed wiring board 6 can be connected to the ground potential outside the shielded printed wiring board 5a. The ground connection lead film 1' can be formed by bonding the ground connection lead film 1 to the printed wiring board 6 in a manner in which the adhesive layer 3 constitutes the bonding surface, and then performing hot pressing. By using the above-mentioned hot pressing, the adhesive layer 3 will flow due to heating and pressure, and fill the through hole set on the ground circuit 62b. When the adhesive layer 3 has conductivity, the ground circuit 62b and the adhesive layer 3' can be connected.

作為圖3所示屏蔽印刷配線板5a之變形例,可舉例以下印刷配線板:具備:印刷配線板6;導電性補強構件;及接地連接引出膜1’,其位於上述導電性補強構件之導電性接著劑層內部,且該印刷配線板不具備電磁波屏蔽層。參照圖3,說明上述印刷配線板之結構。上述導電性補強構件具備導電性基板及設置於該導電性基板之一面上的導電性接著劑層。上述導電性補強構件中的導電性接著劑層會貼合於印刷配線板6上的接地電路62b上,上述導電性接著劑層之一部分則填充接地電路62b上的通孔。接地連接引出膜1’之一部分為上述導電性補強構件之導電性接著劑層之內部,並且配置成位於上述導電性基板與印刷配線板6間,上述導電性補強構件之導電性接著劑層與接地連接引出膜1’之金屬層2會電連接。接地連接引出膜1’之另一部分則是其中一面載置於印刷配線板6上,另一面之一部分則會露出,上述露出之區域具有作為外部連接導電層之機能,在露出部分處與外部之接地構件電連接。藉此,可透過上述導電性補強構件之導電性接著劑層及接地連接引出膜1’之金屬層2,連接印刷配線板6之接地電路 62b與位於外部的接地電位。 As a variation of the shielded printed wiring board 5a shown in FIG3, the following printed wiring board can be cited: it has: a printed wiring board 6; a conductive reinforcing member; and a ground connection lead film 1', which is located inside the conductive adhesive layer of the conductive reinforcing member, and the printed wiring board does not have an electromagnetic wave shielding layer. Referring to FIG3, the structure of the printed wiring board is explained. The conductive reinforcing member has a conductive substrate and a conductive adhesive layer provided on one surface of the conductive substrate. The conductive adhesive layer in the conductive reinforcing member will adhere to the ground circuit 62b on the printed wiring board 6, and a portion of the conductive adhesive layer will fill the through hole on the ground circuit 62b. A portion of the ground connection lead film 1' is inside the conductive adhesive layer of the conductive reinforcement member, and is configured to be located between the conductive substrate and the printed wiring board 6. The conductive adhesive layer of the conductive reinforcement member and the metal layer 2 of the ground connection lead film 1' are electrically connected. Another portion of the ground connection lead film 1' is one side of which is placed on the printed wiring board 6, and a portion of the other side is exposed. The exposed area has the function of an external connection conductive layer, and is electrically connected to the external grounding member at the exposed portion. In this way, the ground circuit 62b of the printed wiring board 6 can be connected to the external ground potential through the conductive adhesive layer of the conductive reinforcement member and the metal layer 2 of the ground connection lead film 1'.

圖4中顯示使用了接地連接引出膜的屏蔽印刷配線板之其他實施形態。如圖4所示,屬於屏蔽印刷配線板第二態樣的屏蔽印刷配線板5b具備:印刷配線板6;屏蔽積層體7,其設置於印刷配線板6上;及接地連接引出膜1’,其設置於屏蔽積層體7上。接地連接引出膜1’之接著劑層3’含有導電性粒子31,導電性粒子31貫通屏蔽積層體7之絕緣層72而與導電性接著劑層71接觸。又,導電性粒子31與金屬層2接觸。藉由具有此種結構,屏蔽積層體7與接地連接引出膜1’會透過導電性粒子31而導通,金屬層2具有作為外部連接導電層之機能,金屬層2表面與外部之接地構件電連接。藉此,可連接印刷配線板6之接地電路62b與位於屏蔽印刷配線板5b外部的接地電位。接地連接引出膜1’可藉由以接著劑層3構成接著面之方式,將接地連接引出膜1貼合於屏蔽印刷配線板之電磁波屏蔽積層體7上,然後進行熱壓接,使導電性粒子31貫穿絕緣層72,同時使接著劑層3接著於屏蔽積層體7而形成。另,設置接地連接引出膜1’前的屏蔽印刷配線板可設為與屏蔽印刷配線板5a之製作方法中所說明的方法相同來製作。 FIG4 shows another embodiment of a shielded printed wiring board using a ground connection lead film. As shown in FIG4, a shielded printed wiring board 5b belonging to the second embodiment of the shielded printed wiring board comprises: a printed wiring board 6; a shielding laminate 7 disposed on the printed wiring board 6; and a ground connection lead film 1' disposed on the shielding laminate 7. The adhesive layer 3' of the ground connection lead film 1' contains conductive particles 31, and the conductive particles 31 penetrate the insulating layer 72 of the shielding laminate 7 and contact the conductive adhesive layer 71. In addition, the conductive particles 31 contact the metal layer 2. By having such a structure, the shielding laminate 7 and the ground connection lead film 1' are electrically connected through the conductive particles 31, and the metal layer 2 has the function of being an external connection conductive layer, and the surface of the metal layer 2 is electrically connected to the external grounding component. In this way, the ground circuit 62b of the printed wiring board 6 can be connected to the ground potential located outside the shielding printed wiring board 5b. The ground connection lead film 1' can be formed by bonding the ground connection lead film 1 to the electromagnetic wave shielding laminate 7 of the shielding printed wiring board in a manner that the adhesive layer 3 constitutes the bonding surface, and then performing hot pressing to allow the conductive particles 31 to penetrate the insulating layer 72, and at the same time, the adhesive layer 3 is bonded to the shielding laminate 7. In addition, the shielding printed wiring board before the ground connection lead film 1' is provided can be manufactured in the same manner as described in the manufacturing method of the shielding printed wiring board 5a.

圖5中顯示使用了接地連接引出膜的屏蔽印刷配線板之另一其他實施形態。如圖5所示,屬於屏蔽印刷配線板第三態樣的屏蔽印刷配線板5c具備:印刷配線板6’;屏蔽積層體8,其設置於印刷配線板6’上;及接地連接引出膜1’,其設置於屏蔽積層體8上。除了電路圖案62是由複數個信號電路62a構成、未含接地電路62b、未形成有通孔外,印刷配線板6’係與印刷配線板6相同。另,圖5中的電路圖案62是以不含接地電路62b之態樣來圖示,惟亦可含接地電路62b。 FIG5 shows another embodiment of a shielded printed wiring board using a ground connection lead film. As shown in FIG5, a shielded printed wiring board 5c belonging to the third embodiment of the shielded printed wiring board comprises: a printed wiring board 6'; a shielding laminate 8, which is disposed on the printed wiring board 6'; and a ground connection lead film 1', which is disposed on the shielding laminate 8. The printed wiring board 6' is the same as the printed wiring board 6, except that the circuit pattern 62 is composed of a plurality of signal circuits 62a, does not include a ground circuit 62b, and does not have a through hole. In addition, the circuit pattern 62 in FIG5 is illustrated in a state without including a ground circuit 62b, but may also include a ground circuit 62b.

屏蔽積層體8是依此順序積層有非導電性接著劑層81、由導體構成的電磁波屏蔽層82及絕緣層83,並透過接著劑層81設置於印刷配線板6’上。屏蔽積層體8可藉由將電磁波屏蔽膜貼合於印刷配線板6’上,然後視需要進行熱壓接而形成。 The shielding laminate 8 is laminated with a non-conductive adhesive layer 81, an electromagnetic wave shielding layer 82 composed of a conductor, and an insulating layer 83 in this order, and is arranged on the printed wiring board 6' through the adhesive layer 81. The shielding laminate 8 can be formed by attaching an electromagnetic wave shielding film to the printed wiring board 6' and then performing heat pressing as needed.

接地連接引出膜1’之接著劑層3’含有導電性粒子31,導電性粒子31貫通屏蔽積層體8之絕緣層83而與電磁波屏蔽層82接觸。又,導電性粒子31與金屬層2接觸。藉由具有此種結構,電磁波屏蔽層82與接地連接引出膜1’會透過導電性粒子31而導通,金屬層2具有作為外部連接導電層之機能,金屬層2表面與外部之接地構件電連接。藉此,可連接屏蔽積層體8之電磁波屏蔽層82與位於屏蔽印刷配線板5c外部的接地電位,電磁波屏蔽層82發揮電磁波屏蔽機能。接地連接引出膜1’可藉由以接著劑層3構成接著面之方式,將接地連接引出膜1貼合於屏蔽印刷配線板之電磁波屏蔽積層體8上,然後進行熱壓接,使導電性粒子31貫穿絕緣層83,同時使接著劑層3接著於屏蔽積層體8而形成。另,設置接地連接引出膜1’前的屏蔽印刷配線板可設為與屏蔽印刷配線板5a之製作方法中所說明的方法相同來製作。 The adhesive layer 3' of the ground connection lead film 1' contains conductive particles 31, and the conductive particles 31 penetrate the insulating layer 83 of the shielding laminate 8 and contact the electromagnetic wave shielding layer 82. In addition, the conductive particles 31 contact the metal layer 2. By having such a structure, the electromagnetic wave shielding layer 82 and the ground connection lead film 1' are electrically connected through the conductive particles 31, and the metal layer 2 has the function of serving as an external connection conductive layer, and the surface of the metal layer 2 is electrically connected to the external grounding component. In this way, the electromagnetic wave shielding layer 82 of the shielding laminate 8 and the ground potential located outside the shielding printed wiring board 5c can be connected, and the electromagnetic wave shielding layer 82 exerts an electromagnetic wave shielding function. The ground connection lead film 1' can be formed by bonding the ground connection lead film 1 to the electromagnetic wave shielding laminate 8 of the shielding printed wiring board by forming a bonding surface with an adhesive layer 3, and then performing heat pressing to allow the conductive particles 31 to penetrate the insulating layer 83 and simultaneously allow the adhesive layer 3 to bond to the shielding laminate 8. In addition, the shielding printed wiring board before the ground connection lead film 1' is provided can be manufactured in the same manner as described in the manufacturing method of the shielding printed wiring board 5a.

1’:接地連接引出膜 1’: Ground connection lead film

2:金屬層 2:Metal layer

2a:金屬層露出面 2a: Metal layer exposed

2b:接著劑層積層面 2b: Then the dosage form

3’:接著劑層 3’: Next is the agent layer

21:開口部 21: Opening

D1:第一寬度 D1: First width

D2:第二寬度 D2: Second width

H:面擴展方向 H: Surface expansion direction

T:厚度方向 T: thickness direction

b-b’:厚度方向截面 b-b’: cross section in thickness direction

Claims (7)

一種接地連接引出膜,具備金屬層及設置於前述金屬層之一面的接著劑層;於前述金屬層形成有在厚度方向上貫通前述金屬層的開口部,前述開口部在厚度方向截面中具有具第一寬度及第二寬度之截面,前述第一寬度朝面擴展方向延伸且相對上屬寬幅,前述第二寬度朝面擴展方向延伸,且相對於前述第一寬度而言,相對上屬狹幅;前述第一寬度位於與前述接著劑層為相反側的前述金屬層面上,前述接著劑層以前述第一寬度為基準,積層於前述第二寬度側的前述金屬層面,前述接著劑層之一部分可侵入抑或已侵入前述開口部內,在前述接著劑層之一部分已侵入前述開口部內的狀態下,前述第二寬度埋沒在已侵入前述開口部內的接著劑層中。 A ground connection lead film comprises a metal layer and an adhesive layer disposed on one surface of the metal layer; an opening portion is formed on the metal layer and passes through the metal layer in the thickness direction; the opening portion has a cross section with a first width and a second width in the thickness direction cross section, the first width extends in the surface expansion direction and is relatively wide, and the second width extends in the surface expansion direction and is relatively wide relative to the first width. The first width is located on the metal layer on the opposite side of the adhesive layer. The adhesive layer is deposited on the metal layer on the second width side based on the first width. A portion of the adhesive layer may or has invaded the opening. When a portion of the adhesive layer has invaded the opening, the second width is buried in the adhesive layer that has invaded the opening. 如請求項1之接地連接引出膜,其中前述開口部在前述厚度方向截面中具有錐形形狀,該錐形形狀包含前述第一寬度及前述第二寬度,且朝遠離前述接著劑層側之方向擴展。 The ground connection lead-out film of claim 1, wherein the opening has a conical shape in the thickness direction cross section, the conical shape includes the first width and the second width, and expands in a direction away from the adhesive layer side. 如請求項1或2之接地連接引出膜,其中前述第二寬度位於前述接著劑層側的前述金屬層面上。 A ground connection lead-out film as claimed in claim 1 or 2, wherein the second width is located on the metal layer on the side of the adhesive layer. 如請求項1或2之接地連接引出膜,其中前述厚度方向截面為錐形形狀,該錐形形狀包含前述第一寬度及前述第二寬度,且朝遠離前述接著劑層側之方向擴展。 The ground connection lead-out film of claim 1 or 2, wherein the aforementioned cross section in the thickness direction is a conical shape, the conical shape includes the aforementioned first width and the aforementioned second width, and expands in a direction away from the aforementioned adhesive layer side. 如請求項1或2之接地連接引出膜,其中前述開口部包含錐形形狀,該錐形形狀係朝遠離前述接著劑層側之方向擴展。 A ground connection lead-out film as claimed in claim 1 or 2, wherein the opening portion includes a conical shape, and the conical shape expands in a direction away from the side of the adhesive layer. 如請求項1或2之接地連接引出膜,其中前述第一寬度與前述 第二寬度之長度差為前述金屬層之厚度以上。 For example, the ground connection lead film of claim 1 or 2, wherein the length difference between the aforementioned first width and the aforementioned second width is greater than the thickness of the aforementioned metal layer. 如請求項1或2之接地連接引出膜,其具有複數個前述開口部,且前述開口部之開口率為0.5~40%。 The ground connection lead-out film of claim 1 or 2 has a plurality of the aforementioned openings, and the opening ratio of the aforementioned openings is 0.5~40%.
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Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08209726A (en) * 1995-02-01 1996-08-13 Kenzo Murakami Mounting method of sheet panel and mounting structure
JP2009176761A (en) * 2006-12-27 2009-08-06 Hitachi Chem Co Ltd Conductive base substrate for plating, manufacturing method thereof, method for manufacturing base substrate with conductor layer pattern using the method, base substrate with conductor layer pattern, and translucent member of shielding electromagnetic wave
TW201509290A (en) * 2013-05-29 2015-03-01 Tatsuta Densen Kk Electromagnetic shielding film, printed circuit board using the electromagnetic shielding film, and rolled copper foil
TW201836464A (en) * 2017-02-08 2018-10-01 日商拓自達電線股份有限公司 Electromagnetic wave shielding film, shielded printed wiring board, and electronic device

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003086907A (en) 2001-06-29 2003-03-20 Tatsuta Electric Wire & Cable Co Ltd Shield flexible printed wiring board
JP2012180583A (en) * 2011-03-03 2012-09-20 Sakai Electronic Industry Co Ltd Long metal foil with multiple pores and method for manufacturing the same
JP5650186B2 (en) * 2012-12-12 2015-01-07 タツタ電線株式会社 Shield film for printed wiring board and method for producing the same
JP6349250B2 (en) 2014-12-24 2018-06-27 タツタ電線株式会社 Shield printed wiring board
KR101912542B1 (en) * 2017-10-25 2019-01-14 (주)크린앤사이언스 lectro Magnetic Shielding Materials Using Perforated Metal Foil and Process for Producing The Same
JP6839669B2 (en) * 2018-01-09 2021-03-10 タツタ電線株式会社 Electromagnetic wave shield film
CN209462702U (en) * 2018-11-26 2019-10-01 广州方邦电子股份有限公司 Free ground film and circuit board

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08209726A (en) * 1995-02-01 1996-08-13 Kenzo Murakami Mounting method of sheet panel and mounting structure
JP2009176761A (en) * 2006-12-27 2009-08-06 Hitachi Chem Co Ltd Conductive base substrate for plating, manufacturing method thereof, method for manufacturing base substrate with conductor layer pattern using the method, base substrate with conductor layer pattern, and translucent member of shielding electromagnetic wave
TW201509290A (en) * 2013-05-29 2015-03-01 Tatsuta Densen Kk Electromagnetic shielding film, printed circuit board using the electromagnetic shielding film, and rolled copper foil
TW201836464A (en) * 2017-02-08 2018-10-01 日商拓自達電線股份有限公司 Electromagnetic wave shielding film, shielded printed wiring board, and electronic device

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