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TWI850859B - Chip on film package structure - Google Patents

Chip on film package structure Download PDF

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Publication number
TWI850859B
TWI850859B TW111144156A TW111144156A TWI850859B TW I850859 B TWI850859 B TW I850859B TW 111144156 A TW111144156 A TW 111144156A TW 111144156 A TW111144156 A TW 111144156A TW I850859 B TWI850859 B TW I850859B
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heat dissipation
chip
flexible circuit
circuit substrate
layer
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TW111144156A
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TW202422798A (en
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賴奎佑
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南茂科技股份有限公司
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Priority to CN202310138271.2A priority patent/CN118057601A/en
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Publication of TWI850859B publication Critical patent/TWI850859B/en

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    • H10W40/255

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Abstract

A chip on film package structure includes a flexible circuit substrate, a chip and a heat dissipation structure. The flexible circuit substrate includes a predetermined bending area and a chip bonding area on a first surface. The heat dissipation structure includes a lower structure and an upper structure. The heat dissipation structure corresponds to the chip bonding area. The lower structure includes a first lower adhesive layer. The upper structure includes a first upper insulating protection layer, an upper heat dissipation layer and a second upper insulating protection layer. The upper heat dissipation layer is located between the first upper insulating protection layer and the second upper insulating protection layer. The upper structure is attached to the lower structure by the first upper insulating protection layer. The orthographic projection area of the upper structure on the flexible circuit substrate is larger than and completely covers the orthographic projection area of the lower structure on the flexible circuit substrate. The orthographic projection of the lower structure on the flexible circuit substrate does not overlap with the predetermined bending area.

Description

薄膜覆晶封裝結構Chip-on-film packaging structure

本發明是有關於一種薄膜覆晶封裝結構。The present invention relates to a chip-on-film packaging structure.

薄膜覆晶(Chip on Film, COF)封裝結構為常見的液晶顯示器的驅動晶片的封裝型態。隨著科技進展,晶片的效率不斷提升,且單位面積中晶片之凸塊數也不斷增加。然而,此亦導致晶片在運作時所散發的熱量也變的更多。因此,為了避免晶片因為受熱而導致效能下降,許多廠商致力於發展薄膜覆晶封裝結構的散熱技術。一般而言,薄膜覆晶封裝結構上之散熱結構的面積越大,則散熱結構的散熱能力越好。Chip on Film (COF) packaging structure is a common packaging type for driver chips of liquid crystal displays. With the advancement of technology, the efficiency of chips has been continuously improved, and the number of chip bumps per unit area has been continuously increasing. However, this also causes the heat dissipated by the chip during operation to become more. Therefore, in order to prevent the performance of the chip from being reduced due to heat, many manufacturers are committed to developing heat dissipation technology for the COF packaging structure. Generally speaking, the larger the area of the heat dissipation structure on the COF packaging structure, the better the heat dissipation capacity of the heat dissipation structure.

本發明提供一種薄膜覆晶封裝結構,可藉由增加散熱結構的面積來提升散熱能力。The present invention provides a thin film chip package structure, which can improve the heat dissipation capacity by increasing the area of the heat dissipation structure.

本發明的至少一實施例提供一種薄膜覆晶封裝結構。薄膜覆晶封裝結構包括可撓性電路基板、晶片以及散熱結構。可撓性電路基板具有相對的第一表面與第二表面,且包括預定彎折區以及位於第一表面的晶片接合區。晶片接合區與預定彎折區沿著第一方向延伸。晶片接合於可撓性電路基板的晶片接合區。散熱結構包括下部結構與上部結構。散熱結構以下部結構貼設於第一表面與第二表面的至少其中一者上,並對應晶片接合區。下部結構包括第一下黏著層。上部結構包括第一上絕緣保護層、上散熱層以及第二上絕緣保護層。上散熱層位於第一上絕緣保護層與第二上絕緣保護層之間。上部結構以第一上絕緣保護層貼附於下部結構。上部結構於可撓性電路基板上的正投影面積大於且完全覆蓋下部結構於可撓性電路基板上的正投影面積。下部結構於可撓性電路基板上的正投影不重疊於預定彎折區。At least one embodiment of the present invention provides a thin film chip-on-chip packaging structure. The thin film chip-on-chip packaging structure includes a flexible circuit substrate, a chip, and a heat dissipation structure. The flexible circuit substrate has a first surface and a second surface relative to each other, and includes a predetermined bending area and a chip bonding area located on the first surface. The chip bonding area and the predetermined bending area extend along a first direction. The chip is bonded to the chip bonding area of the flexible circuit substrate. The heat dissipation structure includes a lower structure and an upper structure. The heat dissipation structure is attached to at least one of the first surface and the second surface with the lower structure, and corresponds to the chip bonding area. The lower structure includes a first lower adhesive layer. The upper structure includes a first upper insulating protective layer, an upper heat dissipation layer, and a second upper insulating protective layer. The upper heat dissipation layer is located between the first upper insulation protection layer and the second upper insulation protection layer. The upper structure is attached to the lower structure by the first upper insulation protection layer. The orthographic projection area of the upper structure on the flexible circuit substrate is larger than and completely covers the orthographic projection area of the lower structure on the flexible circuit substrate. The orthographic projection of the lower structure on the flexible circuit substrate does not overlap the predetermined bending area.

基於上述,本發明的薄膜覆晶封裝結構中的散熱結構可以藉由增加上部結構的面積來提升散熱能力,有效提升薄膜覆晶封裝結構整體的散熱效率,且由於下部結構於可撓性電路基板上的正投影不重疊於預定彎折區,可以避免散熱結構影響薄膜覆晶封裝結構的彎曲。Based on the above, the heat dissipation structure in the film flip chip packaging structure of the present invention can improve the heat dissipation capacity by increasing the area of the upper structure, effectively improving the overall heat dissipation efficiency of the film flip chip packaging structure, and because the orthographic projection of the lower structure on the flexible circuit substrate does not overlap with the predetermined bending area, the heat dissipation structure can be prevented from affecting the bending of the film flip chip packaging structure.

圖1A是依照本發明的一實施例的一種薄膜覆晶封裝結構10的上視示意圖。圖1B是沿著圖1A的線A-A’的剖面示意圖。請參考圖1A與圖1B,薄膜覆晶封裝結構10包括可撓性電路基板100、晶片200以及散熱結構HD1。在本實施例中,薄膜覆晶封裝結構10還包括底部填充膠(underfill)210。FIG. 1A is a top view of a chip-on-film package structure 10 according to an embodiment of the present invention. FIG. 1B is a cross-sectional view along line A-A' of FIG. 1A. Referring to FIG. 1A and FIG. 1B, the chip-on-film package structure 10 includes a flexible circuit substrate 100, a chip 200, and a heat dissipation structure HD1. In this embodiment, the chip-on-film package structure 10 further includes an underfill 210.

可撓性電路基板100包括可撓性介電基底110、電路層120以及防銲層130。可撓性介電基底110的材質例如包括聚乙烯對苯二甲酸酯(polyethylene terephthalate, PET)、聚醯亞胺(Polyimide, PI)、聚醚(polyethersulfone, PES)、碳酸脂(polycarbonate, PC)或其他適合的可撓性介電材料。電路層120位於可撓性介電基底110上。電路層120包括多個引腳,且其材料包括銅、鍍錫銅或其他金屬。防銲層130位於電路層120上,且覆蓋部分的電路層120。The flexible circuit substrate 100 includes a flexible dielectric substrate 110, a circuit layer 120 and a solder-proof layer 130. The material of the flexible dielectric substrate 110 includes, for example, polyethylene terephthalate (PET), polyimide (PI), polyethersulfone (PES), polycarbonate (PC) or other suitable flexible dielectric materials. The circuit layer 120 is located on the flexible dielectric substrate 110. The circuit layer 120 includes a plurality of pins, and its material includes copper, tinned copper or other metals. The solder-proof layer 130 is located on the circuit layer 120 and covers a portion of the circuit layer 120.

可撓性電路基板100具有相對的第一表面100a與第二表面100b,且包括預定彎折區104以及位於第一表面100a的晶片接合區102。在本實施例中,晶片接合區102可由防銲層130的一開口所定義。預定彎折區104指的是薄膜覆晶封裝結構10在與其他裝置(例如液晶面板及/或印刷電路板)接合後,預期會被彎折的區域。在圖1B中,以虛線繪示預定彎折區104彎折後的情形。在一些實施例中,晶片接合區102與預定彎折區104沿著第一方向D1延伸。The flexible circuit substrate 100 has a first surface 100a and a second surface 100b relative to each other, and includes a predetermined bending area 104 and a chip bonding area 102 located on the first surface 100a. In the present embodiment, the chip bonding area 102 can be defined by an opening of the anti-soldering layer 130. The predetermined bending area 104 refers to the area where the thin film chip package structure 10 is expected to be bent after being bonded to other devices (such as a liquid crystal panel and/or a printed circuit board). In FIG. 1B, the predetermined bending area 104 is shown with a dotted line after being bent. In some embodiments, the chip bonding area 102 and the predetermined bending area 104 extend along a first direction D1.

晶片200接合於可撓性電路基板100的晶片接合區102。舉例來說,晶片200係以位於主動面上的凸塊202而與電路層120電性接合。在一些實施例中,晶片200可以是驅動晶片或任何適宜的晶片。底部填充膠210填充於晶片200與可撓性電路基板100之間並覆蓋晶片200的四周。The chip 200 is bonded to the chip bonding area 102 of the flexible circuit substrate 100. For example, the chip 200 is electrically bonded to the circuit layer 120 by the bumps 202 located on the active surface. In some embodiments, the chip 200 can be a driver chip or any other suitable chip. The bottom filler 210 is filled between the chip 200 and the flexible circuit substrate 100 and covers the periphery of the chip 200.

在一些實施例中,可撓性電路基板100更包括切割線CT。在一些實施例中,沿著切割線CT切割可撓性電路基板100,以將薄膜覆晶封裝結構10取下。切割線CT定義出薄膜覆晶封裝結構10的邊界。In some embodiments, the flexible circuit substrate 100 further includes a cutting line CT. In some embodiments, the flexible circuit substrate 100 is cut along the cutting line CT to remove the chip-on-film package structure 10. The cutting line CT defines the boundary of the chip-on-film package structure 10.

散熱結構HD1包括下部結構300a與上部結構300b。散熱結構HD1對應晶片接合區102。散熱結構HD1以下部結構300a貼設於第一表面100a與第二表面100b的至少其中一者上。在本實施例中,散熱結構HD1以下部結構300a貼設於第二表面100b上。在一些實施例中,散熱結構HD1的下部結構300a於可撓性電路基板100上的正投影重疊於底部填充膠210於可撓性電路基板100上的正投影。在一些實施例中,下部結構300a於可撓性電路基板100上的正投影面積大於底部填充膠210於可撓性電路基板100上的正投影面積。The heat dissipation structure HD1 includes a lower structure 300a and an upper structure 300b. The heat dissipation structure HD1 corresponds to the chip bonding area 102. The heat dissipation structure HD1 is attached to at least one of the first surface 100a and the second surface 100b with the lower structure 300a. In this embodiment, the heat dissipation structure HD1 is attached to the second surface 100b with the lower structure 300a. In some embodiments, the orthographic projection of the lower structure 300a of the heat dissipation structure HD1 on the flexible circuit substrate 100 overlaps the orthographic projection of the bottom filler 210 on the flexible circuit substrate 100. In some embodiments, the orthographic projection area of the lower structure 300a on the flexible circuit substrate 100 is larger than the orthographic projection area of the bottom filler 210 on the flexible circuit substrate 100.

在本實施例中,下部結構300a包括第一下黏著層310。第一下黏著層310例如包括高分子材料。下部結構300a於可撓性電路基板100上的正投影重疊於晶片接合區102但不重疊於預定彎折區104。因此,可以避免下部結構300a因黏固至預定彎折區104而造成薄膜覆晶封裝結構10在預定彎折區104無法順利彎折。在一些實施例中,下部結構300a的面積大於或等於晶片接合區102的面積。In this embodiment, the lower structure 300a includes a first lower adhesive layer 310. The first lower adhesive layer 310 includes, for example, a polymer material. The orthographic projection of the lower structure 300a on the flexible circuit substrate 100 overlaps the chip bonding area 102 but does not overlap the predetermined bending area 104. Therefore, it is possible to avoid the thin film chip package structure 10 from being unable to bend smoothly in the predetermined bending area 104 due to the lower structure 300a being bonded to the predetermined bending area 104. In some embodiments, the area of the lower structure 300a is greater than or equal to the area of the chip bonding area 102.

上部結構300b包括第一上絕緣保護層320、上散熱層340以及第二上絕緣保護層360。上部結構300b以第一上絕緣保護層320貼附於下部結構300a。在本實施例中,第一上絕緣保護層320貼附於第一下黏著層310,並透過第一下黏著層310而貼設於第二表面100b上。The upper structure 300b includes a first upper insulating protective layer 320, an upper heat dissipation layer 340, and a second upper insulating protective layer 360. The upper structure 300b is attached to the lower structure 300a by the first upper insulating protective layer 320. In this embodiment, the first upper insulating protective layer 320 is attached to the first lower adhesive layer 310 and is attached to the second surface 100b through the first lower adhesive layer 310.

上散熱層340位於第一上絕緣保護層320與第二上絕緣保護層360之間。在一些實施例中,上部結構300b可選擇地更包括第一上黏著層330及第二上黏著層350,其中第一上黏著層330及第二上黏著層350分別位於第一上絕緣保護層320與上散熱層340之間以及上散熱層340與第二上絕緣保護層360之間。在一些實施例中,上散熱層340的面積小於第一上絕緣保護層320的面積以及第二上絕緣保護層360的面積,藉此防止上散熱層340因為超出第一上絕緣保護層320以及第二上絕緣保護層360而直接接觸空氣所產生的氧化、鏽蝕等問題。The upper heat dissipation layer 340 is located between the first upper insulating protection layer 320 and the second upper insulating protection layer 360. In some embodiments, the upper structure 300b may optionally further include a first upper adhesive layer 330 and a second upper adhesive layer 350, wherein the first upper adhesive layer 330 and the second upper adhesive layer 350 are respectively located between the first upper insulating protection layer 320 and the upper heat dissipation layer 340 and between the upper heat dissipation layer 340 and the second upper insulating protection layer 360. In some embodiments, the area of the upper heat dissipation layer 340 is smaller than the area of the first upper insulating protection layer 320 and the area of the second upper insulating protection layer 360, thereby preventing the upper heat dissipation layer 340 from being directly exposed to air due to exceeding the first upper insulating protection layer 320 and the second upper insulating protection layer 360 and causing problems such as oxidation and rust.

上散熱層340的材質可包括金屬箔或石墨類薄膜,其中金屬箔例如是鋁箔或銅箔,但本發明不限於此。第一上絕緣保護層320以及第二上絕緣保護層360的材質例如是聚醯亞胺(Polyimide, PI),但本發明亦不限於此。The material of the upper heat dissipation layer 340 may include metal foil or graphite film, wherein the metal foil is, for example, aluminum foil or copper foil, but the present invention is not limited thereto. The material of the first upper insulating protection layer 320 and the second upper insulating protection layer 360 is, for example, polyimide (PI), but the present invention is not limited thereto.

在本實施例中,上部結構300b於可撓性電路基板100上的正投影面積大於且完全覆蓋下部結構300a於可撓性電路基板100上的正投影面積。在一些實施例中,上部結構300b的上散熱層340於可撓性電路基板100上的正投影部分重疊於預定彎折區104。由於預定彎折區104大多是位於薄膜覆晶封裝結構10中遠離晶片接合區102的一側或兩側,將上部結構300b加大至與預定彎折區104部分重疊,即可增加上散熱層340的散熱面積,進而提升散熱結構HD1的散熱效果。In this embodiment, the orthographic projection area of the upper structure 300b on the flexible circuit substrate 100 is larger than and completely covers the orthographic projection area of the lower structure 300a on the flexible circuit substrate 100. In some embodiments, the orthographic projection of the upper heat dissipation layer 340 of the upper structure 300b on the flexible circuit substrate 100 partially overlaps with the predetermined bending area 104. Since the predetermined bending area 104 is mostly located on one or both sides of the thin film flip chip package structure 10 far away from the chip bonding area 102, the upper structure 300b is enlarged to partially overlap with the predetermined bending area 104, so as to increase the heat dissipation area of the upper heat dissipation layer 340, thereby improving the heat dissipation effect of the heat dissipation structure HD1.

在一些實施例中,在重疊於下部結構300a的位置,上散熱層340至可撓性電路基板100的最小垂直距離H不小於80微米。舉例來說,在本實施例中,最小垂直距離H等於第一下黏著層310、第一上絕緣保護層320以及第一上黏著層330的總厚度,且第一下黏著層310、第一上絕緣保護層320以及第一上黏著層330的總厚度大於或等於80微米。基於上述,藉由不重疊於預定彎折區104的下部結構300a以及第一上絕緣保護層320的厚度墊高,即使上部結構300b的尺寸加大至與預定彎折區104重疊,上散熱層340對於預定彎折區104的干涉仍然可以降低,進而減少散熱結構HD1對彎曲薄膜覆晶封裝結構10的程序所造成的影響。In some embodiments, at the position overlapping the lower structure 300a, the minimum vertical distance H from the upper heat dissipation layer 340 to the flexible circuit substrate 100 is not less than 80 microns. For example, in this embodiment, the minimum vertical distance H is equal to the total thickness of the first lower adhesive layer 310, the first upper insulating protection layer 320, and the first upper adhesive layer 330, and the total thickness of the first lower adhesive layer 310, the first upper insulating protection layer 320, and the first upper adhesive layer 330 is greater than or equal to 80 microns. Based on the above, by increasing the thickness of the lower structure 300a that does not overlap the predetermined bending area 104 and the first upper insulating protection layer 320, even if the size of the upper structure 300b is increased to overlap with the predetermined bending area 104, the interference of the upper heat dissipation layer 340 with the predetermined bending area 104 can still be reduced, thereby reducing the impact of the heat dissipation structure HD1 on the process of the bent film flip chip packaging structure 10.

在本實施例中,散熱結構HD1的上部結構300b於可撓性電路基板100上的正投影位於切割線CT之內。在一些實施例中,上部結構300b平行於第一方向D1的邊界B1、B2於可撓性電路基板100上的正投影位於切割線CT與預定彎折區104之間,但本發明不以此為限。在其他實施例中,邊界B1、B2可位於預定彎折區104內。由於散熱結構HD1中面積較大的上部結構300b於可撓性電路基板100上的正投影位於切割線CT之內,當沿著切割線CT裁切單分薄膜覆晶封裝結構10時,刀具不會經過散熱結構HD1的任何一層構件,因此可避免例如黏著層殘留於刀具上,導致刀具壽命縮短或殘膠汙染等問題。In this embodiment, the orthographic projection of the upper structure 300b of the heat dissipation structure HD1 on the flexible circuit substrate 100 is located within the cutting line CT. In some embodiments, the orthographic projections of the boundaries B1 and B2 of the upper structure 300b parallel to the first direction D1 on the flexible circuit substrate 100 are located between the cutting line CT and the predetermined bending area 104, but the present invention is not limited thereto. In other embodiments, the boundaries B1 and B2 may be located within the predetermined bending area 104. Since the orthographic projection of the larger upper structure 300b in the heat dissipation structure HD1 on the flexible circuit substrate 100 is located within the cutting line CT, when the single-piece thin film flip chip package structure 10 is cut along the cutting line CT, the tool will not pass through any layer of the heat dissipation structure HD1, thereby avoiding problems such as adhesive layer residues remaining on the tool, resulting in shortened tool life or residual glue contamination.

圖2是依照本發明的一實施例的一種薄膜覆晶封裝結構20的剖面示意圖。在此必須說明的是,圖2的實施例沿用圖1A和圖1B的實施例的元件標號與部分內容,其中採用相同或近似的標號來表示相同或近似的元件,並且省略了相同技術內容的說明。關於省略部分的說明可參考前述實施例,在此不贅述。FIG2 is a cross-sectional schematic diagram of a thin film chip package structure 20 according to an embodiment of the present invention. It must be noted that the embodiment of FIG2 uses the component numbers and partial contents of the embodiments of FIG1A and FIG1B, wherein the same or similar numbers are used to represent the same or similar components, and the description of the same technical contents is omitted. The description of the omitted parts can be referred to the aforementioned embodiments, and will not be repeated here.

圖2的薄膜覆晶封裝結構20與圖1A和圖1B的薄膜覆晶封裝結構10的主要差異在於:薄膜覆晶封裝結構20更包括貼設於可撓性電路基板100的第一表面100a上的散熱結構HD2。在本實施例中,散熱結構HD2採用與散熱結構HD1相同之結構。因此,關於散熱結構HD2的詳細描述,請參考圖1A和圖1B的實施例,於此不再贅述。位於第一表面100a的散熱結構HD2以下部結構300a貼設於第一表面100a上,並對應晶片接合區102。更具體而言,在本實施例中,散熱結構HD2的下部結構300a的第一下黏著層310順應貼附於晶片200與覆蓋晶片200四周的底部填充膠210上。也就是說,散熱結構HD2的下部結構300a於可撓性電路基板100上的正投影完全覆蓋底部填充膠210於可撓性電路基板100上的正投影。在一些實施例中,散熱結構HD2的下部結構300a於可撓性電路基板100上的正投影面積大於底部填充膠210於可撓性電路基板100上的正投影面積。相較於圖1A與圖1B的薄膜覆晶封裝結構10,本實施例的薄膜覆晶封裝結構20在第一表面100a上也設置散熱結構HD2,藉由散熱結構HD2直接接觸發熱源(即晶片200),可更有效率地消散晶片200運作時所產生的熱能,有助於提升薄膜覆晶封裝結構20整體的散熱效率。The main difference between the thin film chip package structure 20 of FIG. 2 and the thin film chip package structure 10 of FIG. 1A and FIG. 1B is that the thin film chip package structure 20 further includes a heat dissipation structure HD2 attached to the first surface 100a of the flexible circuit substrate 100. In this embodiment, the heat dissipation structure HD2 adopts the same structure as the heat dissipation structure HD1. Therefore, for a detailed description of the heat dissipation structure HD2, please refer to the embodiment of FIG. 1A and FIG. 1B, which will not be repeated here. The heat dissipation structure HD2 located on the first surface 100a is attached to the first surface 100a with the lower structure 300a, and corresponds to the chip bonding area 102. More specifically, in this embodiment, the first lower adhesive layer 310 of the lower structure 300a of the heat dissipation structure HD2 is conformably attached to the chip 200 and the bottom filler 210 covering the periphery of the chip 200. In other words, the orthographic projection of the lower structure 300a of the heat dissipation structure HD2 on the flexible circuit substrate 100 completely covers the orthographic projection of the bottom filler 210 on the flexible circuit substrate 100. In some embodiments, the orthographic projection area of the lower structure 300a of the heat dissipation structure HD2 on the flexible circuit substrate 100 is larger than the orthographic projection area of the bottom filler 210 on the flexible circuit substrate 100. Compared to the chip-on-film package structure 10 of FIG. 1A and FIG. 1B , the chip-on-film package structure 20 of the present embodiment also has a heat dissipation structure HD2 disposed on the first surface 100a. By directly contacting the heat source (i.e., the chip 200) with the heat dissipation structure HD2, the heat energy generated during the operation of the chip 200 can be more efficiently dissipated, thereby helping to improve the overall heat dissipation efficiency of the chip-on-film package structure 20.

在本實施例中,散熱結構HD2的上部結構300b於可撓性電路基板100上的正投影面積大於且完全覆蓋下部結構300a於可撓性電路基板100上的正投影面積。散熱結構HD2的下部結構300a於可撓性電路基板100上的正投影不重疊於預定彎折區104。在本實施例中,散熱結構HD2的上部結構300b的上散熱層340於可撓性電路基板100上的正投影部分重疊於預定彎折區104。然而,在一些實施例中,散熱結構HD2的上部結構300b於可撓性電路基板100上的正投影可不重疊於預定彎折區104,本發明對於上部結構300b是否重疊於預定彎折區104並不加以限制。藉由增加上部結構300b的面積,可以提升散熱結構HD2的散熱效果。此外,不重疊於預定彎折區104的下部結構300a以及第一上絕緣保護層320的厚度墊高,使得上散熱層340對於預定彎折區104的干涉降低,進而減少散熱結構HD2對彎曲薄膜覆晶封裝結構20的程序所造成的影響。In this embodiment, the orthographic projection area of the upper structure 300b of the heat dissipation structure HD2 on the flexible circuit substrate 100 is larger than and completely covers the orthographic projection area of the lower structure 300a on the flexible circuit substrate 100. The orthographic projection of the lower structure 300a of the heat dissipation structure HD2 on the flexible circuit substrate 100 does not overlap with the predetermined bending area 104. In this embodiment, the orthographic projection of the upper heat dissipation layer 340 of the upper structure 300b of the heat dissipation structure HD2 on the flexible circuit substrate 100 partially overlaps with the predetermined bending area 104. However, in some embodiments, the orthographic projection of the upper structure 300b of the heat dissipation structure HD2 on the flexible circuit substrate 100 may not overlap the predetermined bending area 104, and the present invention does not limit whether the upper structure 300b overlaps the predetermined bending area 104. By increasing the area of the upper structure 300b, the heat dissipation effect of the heat dissipation structure HD2 can be improved. In addition, the thickness of the lower structure 300a that does not overlap the predetermined bending area 104 and the first upper insulating protection layer 320 are increased, so that the interference of the upper heat dissipation layer 340 with the predetermined bending area 104 is reduced, thereby reducing the influence of the heat dissipation structure HD2 on the process of the curved thin film chip package structure 20.

在本實施例中,散熱結構HD2的上部結構300b於可撓性電路基板100上的正投影位於切割線CT之內。在一些實施例中,上部結構300b平行於第一方向的邊界於可撓性電路基板100上的正投影位於切割線CT與預定彎折區104之間。在其他實施例中,上部結構300b平行於第一方向D1的邊界(請參考圖1A)可位於預定彎折區104內。藉此,當沿著切割線CT裁切單分薄膜覆晶封裝結構20時,刀具不會經過散熱結構HD2的任何一層構件,因此可避免例如黏著層殘留於刀具上,導致刀具壽命縮短或殘膠汙染等問題。In the present embodiment, the orthographic projection of the upper structure 300b of the heat dissipation structure HD2 on the flexible circuit substrate 100 is located within the cutting line CT. In some embodiments, the orthographic projection of the boundary of the upper structure 300b parallel to the first direction on the flexible circuit substrate 100 is located between the cutting line CT and the predetermined bending area 104. In other embodiments, the boundary of the upper structure 300b parallel to the first direction D1 (please refer to FIG. 1A ) may be located within the predetermined bending area 104. Thus, when the singulated thin film flip chip package structure 20 is cut along the cutting line CT, the tool will not pass through any layer of the heat dissipation structure HD2, thereby avoiding problems such as adhesive layer residues remaining on the tool, resulting in a shortened tool life or residual glue contamination.

圖3是依照本發明的一實施例的一種薄膜覆晶封裝結構30的剖面示意圖。在此必須說明的是,圖3的實施例沿用圖1A和圖1B的實施例的元件標號與部分內容,其中採用相同或近似的標號來表示相同或近似的元件,並且省略了相同技術內容的說明。關於省略部分的說明可參考前述實施例,在此不贅述。FIG3 is a cross-sectional schematic diagram of a thin film chip package structure 30 according to an embodiment of the present invention. It must be noted that the embodiment of FIG3 uses the component numbers and partial contents of the embodiments of FIG1A and FIG1B, wherein the same or similar numbers are used to represent the same or similar components, and the description of the same technical contents is omitted. The description of the omitted parts can refer to the aforementioned embodiments, and will not be repeated here.

圖3的薄膜覆晶封裝結構30與圖1A和1B的薄膜覆晶封裝結構10的主要差異在於:薄膜覆晶封裝結構30的散熱結構HD3的下部結構300a’更包括第二下黏著層370以及下散熱層380。The main difference between the COF package structure 30 of FIG. 3 and the COF package structure 10 of FIGS. 1A and 1B is that the lower structure 300a′ of the heat dissipation structure HD3 of the COF package structure 30 further includes a second lower adhesive layer 370 and a lower heat dissipation layer 380.

請參考圖3,下散熱層380位於第一下黏著層310與第二下黏著層370之間,且上部結構300b的第一上絕緣保護層320貼附於第二下黏著層370。在一些實施例中,下散熱層380的材質可包括金屬箔或石墨類薄膜,其中金屬箔例如是鋁箔或銅箔。3 , the lower heat dissipation layer 380 is located between the first lower adhesive layer 310 and the second lower adhesive layer 370, and the first upper insulating protection layer 320 of the upper structure 300b is attached to the second lower adhesive layer 370. In some embodiments, the material of the lower heat dissipation layer 380 may include metal foil or graphite film, wherein the metal foil is, for example, aluminum foil or copper foil.

在本實施例中,上部結構300b於可撓性電路基板100上的正投影面積大於且完全覆蓋下部結構300a’於可撓性電路基板100上的正投影面積。更具體來說,上散熱層340於可撓性電路基板100上的正投影面積大於且完全覆蓋下散熱層380於可撓性電路基板100上的正投影面積。在本實施例中,下部結構300a’於可撓性電路基板100上的正投影不重疊於預定彎折區104。因此,可以避免下部結構300a’因黏固至預定彎折區104而造成薄膜覆晶封裝結構30在預定彎折區104無法順利彎折。在一些實施例中,上部結構300b的上散熱層340於可撓性電路基板100上的正投影部分重疊於預定彎折區104,因此,可增加上散熱層340的散熱面積,進而提升散熱結構HD3的散熱效果。In this embodiment, the orthographic projection area of the upper structure 300b on the flexible circuit substrate 100 is larger than and completely covers the orthographic projection area of the lower structure 300a′ on the flexible circuit substrate 100. More specifically, the orthographic projection area of the upper heat dissipation layer 340 on the flexible circuit substrate 100 is larger than and completely covers the orthographic projection area of the lower heat dissipation layer 380 on the flexible circuit substrate 100. In this embodiment, the orthographic projection of the lower structure 300a′ on the flexible circuit substrate 100 does not overlap the predetermined bending area 104. Therefore, it is possible to avoid the problem that the chip-on-film package structure 30 cannot be bent smoothly in the predetermined bending area 104 due to the lower structure 300a' being adhered to the predetermined bending area 104. In some embodiments, the orthographic projection of the upper heat dissipation layer 340 of the upper structure 300b on the flexible circuit substrate 100 partially overlaps the predetermined bending area 104, thereby increasing the heat dissipation area of the upper heat dissipation layer 340, thereby improving the heat dissipation effect of the heat dissipation structure HD3.

在一些實施例中,在重疊於下部結構300a’的位置,上散熱層340至可撓性電路基板100的最小垂直距離H不小於80微米。舉例來說,在本實施例中,最小垂直距離H等於第一下黏著層310、第二下黏著層370、下散熱層380、第一上絕緣保護層320以及第一上黏著層330的總厚度,且這個總厚度大於或等於80微米。基於上述,藉由不重疊於預定彎折區104的下部結構300a’以及第一上絕緣保護層320的厚度墊高,即使上部結構300b的尺寸加大至與預定彎折區104重疊,上散熱層340對於預定彎折區104的干涉仍然可以降低,進而減少散熱結構HD3對彎曲薄膜覆晶封裝結構30的程序所造成的影響。In some embodiments, at the position overlapping the lower structure 300a', the minimum vertical distance H from the upper heat dissipation layer 340 to the flexible circuit substrate 100 is not less than 80 microns. For example, in this embodiment, the minimum vertical distance H is equal to the total thickness of the first lower adhesive layer 310, the second lower adhesive layer 370, the lower heat dissipation layer 380, the first upper insulating protection layer 320 and the first upper adhesive layer 330, and the total thickness is greater than or equal to 80 microns. Based on the above, by increasing the thickness of the lower structure 300a' which does not overlap the predetermined bending area 104 and the first upper insulating protection layer 320, even if the size of the upper structure 300b is increased to overlap with the predetermined bending area 104, the interference of the upper heat dissipation layer 340 with the predetermined bending area 104 can still be reduced, thereby reducing the impact of the heat dissipation structure HD3 on the process of the curved thin film chip packaging structure 30.

相較於圖1A與圖1B的薄膜覆晶封裝結構10,本實施例的薄膜覆晶封裝結構30中的散熱結構HD3由於下部結構300a’也設置下散熱層380,可以進一步提升散熱結構HD3的散熱能力,有助於提升薄膜覆晶封裝結構30整體的散熱效率。Compared with the chip-on-film package structure 10 of FIG. 1A and FIG. 1B , the heat dissipation capacity of the heat dissipation structure HD3 in the chip-on-film package structure 30 of the present embodiment can be further enhanced because the lower structure 300a′ is also provided with a lower heat dissipation layer 380 , which helps to improve the overall heat dissipation efficiency of the chip-on-film package structure 30 .

圖4是依照本發明的一實施例的一種薄膜覆晶封裝結構40的剖面示意圖。在此必須說明的是,圖4的實施例沿用圖2和圖3的實施例的元件標號與部分內容,其中採用相同或近似的標號來表示相同或近似的元件,並且省略了相同技術內容的說明。關於省略部分的說明可參考前述實施例,在此不贅述。FIG4 is a cross-sectional schematic diagram of a thin film chip package structure 40 according to an embodiment of the present invention. It must be noted that the embodiment of FIG4 uses the component numbers and partial contents of the embodiments of FIG2 and FIG3, wherein the same or similar numbers are used to represent the same or similar components, and the description of the same technical contents is omitted. The description of the omitted parts can be referred to the aforementioned embodiments, and will not be repeated here.

圖4的薄膜覆晶封裝結構40與圖3的薄膜覆晶封裝結構30的主要差異在於:薄膜覆晶封裝結構40更包括貼設於可撓性電路基板100的第一表面100a上的散熱結構HD4。在本實施例中,散熱結構HD4採用與散熱結構HD3相同之結構。因此,關於散熱結構HD4的詳細描述請參考圖3的實施例,於此不再贅述。The main difference between the COF package structure 40 of FIG. 4 and the COF package structure 30 of FIG. 3 is that the COF package structure 40 further includes a heat dissipation structure HD4 attached to the first surface 100a of the flexible circuit substrate 100. In this embodiment, the heat dissipation structure HD4 adopts the same structure as the heat dissipation structure HD3. Therefore, please refer to the embodiment of FIG. 3 for a detailed description of the heat dissipation structure HD4, which will not be repeated here.

請參考圖4,在本實施例中,散熱結構HD4以下部結構300a’貼設於第一表面100a上,並對應晶片接合區102。更具體而言,散熱結構HD4的下部結構300a’貼附於晶片200與覆蓋晶片200四周的底部填充膠210。也就是說,散熱結構HD4的下部結構300a’於可撓性電路基板100上的正投影完全覆蓋底部填充膠210於可撓性電路基板100上的正投影。在一些實施例中,散熱結構HD4的下部結構300a’於可撓性電路基板100上的正投影面積大於底部填充膠210於可撓性電路基板100上的正投影面積。此外,在本實施例中,散熱結構HD4的下部結構300a’於可撓性電路基板100上的正投影不重疊於預定彎折區104。因此,可以避免下部結構300a’因黏固至預定彎折區104而造成薄膜覆晶封裝結構40在預定彎折區104無法順利彎折。Referring to FIG. 4 , in the present embodiment, the heat dissipation structure HD4 is attached to the first surface 100a with the lower structure 300a′, and corresponds to the chip bonding area 102. More specifically, the lower structure 300a′ of the heat dissipation structure HD4 is attached to the chip 200 and the bottom filler 210 covering the periphery of the chip 200. In other words, the orthographic projection of the lower structure 300a′ of the heat dissipation structure HD4 on the flexible circuit substrate 100 completely covers the orthographic projection of the bottom filler 210 on the flexible circuit substrate 100. In some embodiments, the orthographic projection area of the lower structure 300a′ of the heat dissipation structure HD4 on the flexible circuit substrate 100 is larger than the orthographic projection area of the bottom filler 210 on the flexible circuit substrate 100. In addition, in this embodiment, the orthographic projection of the lower structure 300a' of the heat dissipation structure HD4 on the flexible circuit substrate 100 does not overlap the predetermined bending area 104. Therefore, it can be avoided that the thin film flip chip package structure 40 cannot be smoothly bent in the predetermined bending area 104 due to the lower structure 300a' being adhered to the predetermined bending area 104.

相較於圖3的薄膜覆晶封裝結構30,本實施例的薄膜覆晶封裝結構40在第一表面100a上也設置散熱結構HD4,藉由散熱結構HD4直接接觸發熱源(即晶片200),可更有效率地消散晶片200運作時所產生的熱能,有助於提升薄膜覆晶封裝結構40整體的散熱效率。Compared to the chip-on-film package structure 30 of FIG. 3 , the chip-on-film package structure 40 of the present embodiment also has a heat dissipation structure HD4 disposed on the first surface 100a. By directly contacting the heat source (i.e., the chip 200) with the heat dissipation structure HD4, the heat energy generated during the operation of the chip 200 can be more efficiently dissipated, thereby helping to improve the overall heat dissipation efficiency of the chip-on-film package structure 40.

綜上所述,本發明的薄膜覆晶封裝結構中的散熱結構可以藉由增加上部結構的面積來提升散熱能力,有效提升薄膜覆晶封裝結構整體的散熱效率,且由於下部結構於可撓性電路基板上的正投影不重疊於預定彎折區,可以避免散熱結構影響薄膜覆晶封裝結構的彎曲。In summary, the heat dissipation structure in the film flip chip packaging structure of the present invention can improve the heat dissipation capacity by increasing the area of the upper structure, effectively improving the overall heat dissipation efficiency of the film flip chip packaging structure, and because the orthographic projection of the lower structure on the flexible circuit substrate does not overlap with the predetermined bending area, the heat dissipation structure can be prevented from affecting the bending of the film flip chip packaging structure.

10, 20, 30, 40:薄膜覆晶封裝結構 100:可撓性電路基板 100a:第一表面 100b:第二表面 102:晶片接合區 104:預定彎折區 110:可撓性介電基底 120:電路層 130:防銲層 200:晶片 202:凸塊 210:底部填充膠 300a, 300a’:下部結構 300b:上部結構 310:第一下黏著層 320:第一上絕緣保護層 330:第一上黏著層 340:上散熱層 350:第二上黏著層 360:第二上絕緣保護層 370:第二下黏著層 380:下散熱層 B1, B2:邊界 CT:切割線 D1:第一方向 H:最小垂直距離 HD1, HD2, HD3, HD4:散熱結構 10, 20, 30, 40: Chip-on-film package structure 100: Flexible circuit substrate 100a: First surface 100b: Second surface 102: Chip bonding area 104: Predetermined bending area 110: Flexible dielectric substrate 120: Circuit layer 130: Anti-soldering layer 200: Chip 202: Bump 210: Bottom filling glue 300a, 300a’: Lower structure 300b: Upper structure 310: First lower adhesive layer 320: First upper insulating protection layer 330: First upper adhesive layer 340: Upper heat sink layer 350: Second upper adhesive layer 360: Second upper insulation protection layer 370: Second lower adhesive layer 380: Lower heat dissipation layer B1, B2: Boundary CT: Cutting line D1: First direction H: Minimum vertical distance HD1, HD2, HD3, HD4: Heat dissipation structure

圖1A是依照本發明的一實施例的一種薄膜覆晶封裝結構的俯視示意圖。 圖1B是沿著圖1A的線A-A’的剖面示意圖。 圖2是依照本發明的一實施例的一種薄膜覆晶封裝結構的剖面示意圖。 圖3是依照本發明的一實施例的一種薄膜覆晶封裝結構的剖面示意圖。 圖4是依照本發明的一實施例的一種薄膜覆晶封裝結構的剖面示意圖。 FIG. 1A is a schematic top view of a thin film chip-on-chip packaging structure according to an embodiment of the present invention. FIG. 1B is a schematic cross-sectional view along line A-A’ of FIG. 1A. FIG. 2 is a schematic cross-sectional view of a thin film chip-on-chip packaging structure according to an embodiment of the present invention. FIG. 3 is a schematic cross-sectional view of a thin film chip-on-chip packaging structure according to an embodiment of the present invention. FIG. 4 is a schematic cross-sectional view of a thin film chip-on-chip packaging structure according to an embodiment of the present invention.

10:薄膜覆晶封裝結構 100:可撓性電路基板 100a:第一表面 100b:第二表面 102:晶片接合區 104:預定彎折區 110:可撓性介電基底 120:電路層 130:防銲層 200:晶片 202:凸塊 210:底部填充膠 300a:下部結構 300b:上部結構 310:第一下黏著層 320:第一上絕緣保護層 330:第一上黏著層 340:上散熱層 350:第二上黏著層 360:第二上絕緣保護層 B1:邊界 CT:切割線 H:最小垂直距離 HD1:散熱結構 10: Film chip package structure 100: Flexible circuit substrate 100a: First surface 100b: Second surface 102: Chip bonding area 104: Predetermined bending area 110: Flexible dielectric substrate 120: Circuit layer 130: Anti-soldering layer 200: Chip 202: Bump 210: Bottom filling glue 300a: Lower structure 300b: Upper structure 310: First lower adhesive layer 320: First upper insulating protective layer 330: First upper adhesive layer 340: Upper heat dissipation layer 350: Second upper adhesive layer 360: Second upper insulating protective layer B1: Boundary CT: Cutting line H: Minimum vertical distance HD1: Heat dissipation structure

Claims (10)

一種薄膜覆晶封裝結構,包括: 可撓性電路基板,具有相對的第一表面與第二表面,且包括預定彎折區以及位於所述第一表面的晶片接合區,所述晶片接合區與所述預定彎折區沿著第一方向延伸; 晶片,接合於所述可撓性電路基板的所述晶片接合區;以及 散熱結構,包括下部結構與上部結構,所述散熱結構以所述下部結構貼設於所述第一表面與所述第二表面的至少其中一者上,並對應所述晶片接合區,所述下部結構包括第一下黏著層,所述上部結構包括第一上絕緣保護層、上散熱層以及第二上絕緣保護層,所述上散熱層位於所述第一上絕緣保護層與所述第二上絕緣保護層之間,且所述上部結構以所述第一上絕緣保護層貼附於所述下部結構,其中所述上部結構於所述可撓性電路基板上的正投影面積大於且完全覆蓋所述下部結構於所述可撓性電路基板上的正投影面積,且所述下部結構於所述可撓性電路基板上的正投影不重疊於所述預定彎折區。 A film flip chip packaging structure includes: a flexible circuit substrate having a first surface and a second surface opposite to each other, and including a predetermined bending area and a chip bonding area located on the first surface, wherein the chip bonding area and the predetermined bending area extend along a first direction; a chip bonded to the chip bonding area of the flexible circuit substrate; and a heat dissipation structure including a lower structure and an upper structure, wherein the heat dissipation structure is attached to at least one of the first surface and the second surface with the lower structure and corresponds to the chip bonding area, wherein the lower structure includes a first lower adhesive layer, and the upper structure includes a first upper insulating protective layer, an upper heat dissipation layer and a second upper insulating protective layer, wherein the upper heat dissipation layer is located between the first upper insulating protective layer and the upper heat dissipation layer. The upper structure is attached to the lower structure by the first upper insulating protective layer, wherein the orthographic projection area of the upper structure on the flexible circuit substrate is larger than and completely covers the orthographic projection area of the lower structure on the flexible circuit substrate, and the orthographic projection of the lower structure on the flexible circuit substrate does not overlap the predetermined bending area. 如請求項1所述的薄膜覆晶封裝結構,其中在重疊於所述下部結構的位置,所述上散熱層至所述可撓性電路基板的最小垂直距離不小於80微米。The chip-on-film package structure as described in claim 1, wherein at a position overlapping the lower structure, a minimum vertical distance from the upper heat sink to the flexible circuit substrate is not less than 80 microns. 如請求項1所述的薄膜覆晶封裝結構,其中所述上散熱層於所述可撓性電路基板上的正投影部分重疊於所述預定彎折區。A chip-on-film package structure as described in claim 1, wherein the orthographic projection of the upper heat sink on the flexible circuit substrate partially overlaps the predetermined bending area. 如請求項1所述的薄膜覆晶封裝結構,其中所述可撓性電路基板更包括切割線,所述散熱結構的所述上部結構於所述可撓性電路基板上的正投影位於所述切割線之內。The chip-on-film package structure as described in claim 1, wherein the flexible circuit substrate further includes a cutting line, and the orthographic projection of the upper structure of the heat dissipation structure on the flexible circuit substrate is located within the cutting line. 如請求項4所述的薄膜覆晶封裝結構,其中所述上部結構平行於所述第一方向的邊界於所述可撓性電路基板上的正投影位於所述切割線與所述預定彎折區之間。A chip-on-film package structure as described in claim 4, wherein the orthographic projection of the boundary of the upper structure parallel to the first direction on the flexible circuit substrate is located between the cutting line and the predetermined bending area. 如請求項1所述的薄膜覆晶封裝結構,其中所述散熱結構的所述上部結構更包括第一上黏著層及第二上黏著層,分別位於所述第一上絕緣保護層與所述上散熱層之間以及所述上散熱層與所述第二上絕緣保護層之間。In the chip-on-film packaging structure as described in claim 1, the upper structure of the heat dissipation structure further includes a first upper adhesive layer and a second upper adhesive layer, which are respectively located between the first upper insulating protection layer and the upper heat dissipation layer and between the upper heat dissipation layer and the second upper insulating protection layer. 如請求項1所述的薄膜覆晶封裝結構,其中所述散熱結構的所述下部結構更包括第二下黏著層以及下散熱層,其中所述下散熱層位於所述第一下黏著層與所述第二下黏著層之間,且所述上部結構的所述第一上絕緣保護層貼附於所述第二下黏著層。A chip-on-film packaging structure as described in claim 1, wherein the lower structure of the heat dissipation structure further includes a second lower adhesive layer and a lower heat dissipation layer, wherein the lower heat dissipation layer is located between the first lower adhesive layer and the second lower adhesive layer, and the first upper insulating protection layer of the upper structure is attached to the second lower adhesive layer. 如請求項7所述的薄膜覆晶封裝結構,其中所述上散熱層於所述可撓性電路基板上的正投影面積大於且完全覆蓋所述下散熱層於所述可撓性電路基板上的正投影面積。In the chip-on-film package structure as described in claim 7, the orthographic projection area of the upper heat dissipation layer on the flexible circuit substrate is larger than and completely covers the orthographic projection area of the lower heat dissipation layer on the flexible circuit substrate. 如請求項1所述的薄膜覆晶封裝結構,更包括底部填充膠,填充於所述晶片與所述可撓性電路基板之間並覆蓋所述晶片的四周,其中所述散熱結構的所述下部結構於所述可撓性電路基板上的正投影完全覆蓋所述底部填充膠於所述可撓性電路基板上的正投影。The thin film chip packaging structure as described in claim 1 further includes a bottom filling glue, which is filled between the chip and the flexible circuit substrate and covers the four sides of the chip, wherein the orthographic projection of the lower structure of the heat dissipation structure on the flexible circuit substrate completely covers the orthographic projection of the bottom filling glue on the flexible circuit substrate. 如請求項9所述的薄膜覆晶封裝結構,其中所述下部結構於所述可撓性電路基板上的正投影面積大於所述底部填充膠於所述可撓性電路基板上的正投影面積。A chip-on-film package structure as described in claim 9, wherein the orthographic projection area of the lower structure on the flexible circuit substrate is larger than the orthographic projection area of the bottom filling glue on the flexible circuit substrate.
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Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103594433A (en) * 2013-10-31 2014-02-19 中国科学院微电子研究所 A method for manufacturing a three-dimensional packaging heat dissipation structure of a rigid-flex board
US20190306993A1 (en) * 2018-03-30 2019-10-03 Samsung Electro-Mechanics Co., Ltd. Electronic device and rigid-flexible substrate module
TW202034467A (en) * 2019-03-06 2020-09-16 南茂科技股份有限公司 Chip on film package structure
TW202232676A (en) * 2021-02-03 2022-08-16 南茂科技股份有限公司 Chip on film package structure

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103594433A (en) * 2013-10-31 2014-02-19 中国科学院微电子研究所 A method for manufacturing a three-dimensional packaging heat dissipation structure of a rigid-flex board
US20190306993A1 (en) * 2018-03-30 2019-10-03 Samsung Electro-Mechanics Co., Ltd. Electronic device and rigid-flexible substrate module
TW202034467A (en) * 2019-03-06 2020-09-16 南茂科技股份有限公司 Chip on film package structure
TW202232676A (en) * 2021-02-03 2022-08-16 南茂科技股份有限公司 Chip on film package structure

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