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TWI846267B - Semiconductor package - Google Patents

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TWI846267B
TWI846267B TW112101540A TW112101540A TWI846267B TW I846267 B TWI846267 B TW I846267B TW 112101540 A TW112101540 A TW 112101540A TW 112101540 A TW112101540 A TW 112101540A TW I846267 B TWI846267 B TW I846267B
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chip
substrate
pads
semiconductor
semiconductor chip
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TW112101540A
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TW202429666A (en
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蔡駿宇
張玲華
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福懋科技股份有限公司
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Abstract

A semiconductor package is provided. The semiconductor package includes: a package substrate; first substrate pads and at least one second substrate pad, disposed on a peripheral region of the package substrate; a semiconductor chip and a dummy chip, stacked on the package substrate; an electrode layer, covering a top surface of the dummy chip; and first and second chip pads, disposed on a peripheral region of the semiconductor chip. The first chip pads are directly connected to the first substrate pads via first bonding wires. The second chip pads are connected to the electrode layer via second bonding wires, and the electrode layer is connected to the at least one second substrate pad via third bonding wires.

Description

半導體封裝Semiconductor Package

本發明是有關於一種半導體封裝。 The present invention relates to a semiconductor package.

隨著電子產業的發展,某些半導體晶片的尺寸越來越大。舉例而言,記憶體晶片可能因具有更大的儲存容量與更多輸入/輸出端子而具有更大的尺寸。作為結果,此些半導體晶片的輪廓可能更貼近從下方提供支撐與繞線的封裝基板之邊緣。換言之,封裝基板可能僅具有更侷限區域可設置用於以打線接合的方式連接上方半導體晶片的焊墊。在某些情況下,封裝基板的用於設置焊墊的周邊區域之寬度變得相當窄,而僅能設置有單排的焊墊。此使得焊墊以相當密集的方式排列。如此一來,在封裝基板中連接於此些焊墊的線路也變得相當密集且具有相當窄的線寬,而造成線路阻抗過高以及傳輸至上方半導體晶片的電壓不穩定等問題。 As the electronics industry develops, the size of some semiconductor chips is getting larger and larger. For example, memory chips may have a larger size due to their larger storage capacity and more input/output terminals. As a result, the contours of these semiconductor chips may be closer to the edge of the package substrate that provides support and routing from below. In other words, the package substrate may have only a more limited area to be set up for the pads used to connect to the upper semiconductor chip by wire bonding. In some cases, the width of the peripheral area of the package substrate for setting the pads becomes quite narrow, and only a single row of pads can be set up. This causes the pads to be arranged in a rather dense manner. As a result, the lines connected to these pads in the package substrate become quite dense and have a very narrow line width, resulting in problems such as excessively high line impedance and unstable voltage transmitted to the upper semiconductor chip.

本揭露的一態樣提供一種半導體封裝,包括:封裝基板; 多個第一基板焊墊與至少一第二基板焊墊,設置於所述封裝基板的周邊區域上;半導體晶片以及虛設晶片,堆疊於所述封裝基板上;電極層,覆蓋所述虛設晶片的頂面;以及多個第一晶片焊墊與多個第二晶片焊墊,設置於所述半導體晶片的周邊區域上,其中所述多個第一晶片焊墊經由多條第一接合導線而直接連接至所述多個第一基板焊墊,所述多個第二晶片焊墊經由多條第二接合導線而連接至所述電極層,且所述電極層經由多條第三接合導線而連接至所述至少一第二基板焊墊。 One aspect of the present disclosure provides a semiconductor package, comprising: a package substrate; a plurality of first substrate pads and at least one second substrate pad, disposed on the peripheral area of the package substrate; a semiconductor chip and a dummy chip, stacked on the package substrate; an electrode layer, covering the top surface of the dummy chip; and a plurality of first chip pads and a plurality of second chip pads, disposed on the peripheral area of the semiconductor chip, wherein the plurality of first chip pads are directly connected to the plurality of first substrate pads via a plurality of first bonding wires, the plurality of second chip pads are connected to the electrode layer via a plurality of second bonding wires, and the electrode layer is connected to the at least one second substrate pad via a plurality of third bonding wires.

在一些實施例中,所述多個第一晶片焊墊、所述多個第二晶片焊墊、所述多個第一基板焊墊、所述多條第一接合導線與所述多條第二接合導線沿著所述半導體晶片的第一側以及第二側排列,且所述至少一第二基板焊墊以及所述多條第三接合導線設置於所述半導體晶片的其他側。 In some embodiments, the plurality of first chip pads, the plurality of second chip pads, the plurality of first substrate pads, the plurality of first bonding wires, and the plurality of second bonding wires are arranged along the first side and the second side of the semiconductor chip, and the at least one second substrate pad and the plurality of third bonding wires are arranged on the other side of the semiconductor chip.

在一些實施例中,所述至少一第二基板焊墊包括多個第二基板焊墊,分別連接於所述多條第三接合導線中的多者。 In some embodiments, the at least one second substrate pad includes a plurality of second substrate pads, each of which is connected to a plurality of the plurality of third bonding wires.

在一些實施例中,所述多個第二晶片焊墊、所述多條第二接合導線、所述電極層、所述多條第三接合導線以及所述至少一第二基板焊墊經配置以傳輸相同的固定電壓訊號。 In some embodiments, the plurality of second chip pads, the plurality of second bonding wires, the electrode layer, the plurality of third bonding wires, and the at least one second substrate pad are configured to transmit the same fixed voltage signal.

在一些實施例中,所述至少一第二基板焊墊在個別面積上大於所述多個第一基板焊墊。 In some embodiments, the at least one second substrate pad is larger in individual area than the plurality of first substrate pads.

在一些實施例中,所述封裝基板的頂層線路層包括多條第一線路以及至少一第二線路,所述多條第一線路連接至所述多 個第一基板焊墊,所述至少一第二線路連接至所述至少一第二基板焊墊,且所述至少一第二線路在個別線寬上大於所述多條第一線路。 In some embodiments, the top circuit layer of the package substrate includes a plurality of first circuits and at least one second circuit, the plurality of first circuits are connected to the plurality of first substrate pads, the at least one second circuit is connected to the at least one second substrate pad, and the at least one second circuit has a larger individual line width than the plurality of first circuits.

在一些實施例中,所述虛設晶片堆疊於所述半導體晶片上,且所述虛設晶片的面積以及所述電極層的面積分別小於所述半導體晶片的面積。 In some embodiments, the dummy chip is stacked on the semiconductor chip, and the area of the dummy chip and the area of the electrode layer are respectively smaller than the area of the semiconductor chip.

在一些實施例中,所述多條第一接合導線從所述多個第一晶片焊墊而縱向地橫越所述半導體晶片以延伸至所述多個第一基板焊墊,所述多條第二接合導線從所述多個第二晶片焊墊而縱向地橫越所述虛設晶片以延伸至所述電極層上,且所述多條第三接合導線從所述電極層上而縱向地橫越所述虛設晶片與所述半導體晶片以延伸至所述至少一第二基板焊墊。 In some embodiments, the plurality of first bonding wires extend longitudinally across the semiconductor chip from the plurality of first chip pads to the plurality of first substrate pads, the plurality of second bonding wires extend longitudinally across the dummy chip from the plurality of second chip pads to the electrode layer, and the plurality of third bonding wires extend longitudinally across the dummy chip and the semiconductor chip from the electrode layer to the at least one second substrate pad.

在一些實施例中,所述半導體晶片堆疊於所述虛設晶片與所述電極層上,且所述半導體晶片的面積分別小於所述虛設晶片的面積以及所述電極層的面積。 In some embodiments, the semiconductor chip is stacked on the dummy chip and the electrode layer, and the area of the semiconductor chip is smaller than the area of the dummy chip and the area of the electrode layer, respectively.

在一些實施例中,所述多條第一接合導線從所述多個第一晶片焊墊而縱向地橫越所述半導體晶片以及所述虛設晶片以延伸至所述多個第一基板焊墊,所述多條第二接合導線從所述多個第二基板焊墊而縱向地橫越所述半導體晶片以延伸至所述電極層上,且所述多條第三接合導線從所述電極層上而縱向地橫越所述虛設晶片以延伸至所述至少一第二基板焊墊。 In some embodiments, the plurality of first bonding wires extend from the plurality of first chip pads longitudinally across the semiconductor chip and the dummy chip to the plurality of first substrate pads, the plurality of second bonding wires extend from the plurality of second substrate pads longitudinally across the semiconductor chip to the electrode layer, and the plurality of third bonding wires extend from the electrode layer longitudinally across the dummy chip to the at least one second substrate pad.

10、20:半導體封裝 10, 20: Semiconductor packaging

100:封裝基板 100:Packaging substrate

102、104:基板焊墊 102, 104: substrate pad

106a、106b:線路 106a, 106b: Lines

108a、108b:導通孔 108a, 108b: Conductive hole

110、210:半導體晶片 110, 210: semiconductor chip

112、128、212、228:晶片膠 112, 128, 212, 228: chip glue

114、114a、114b、214、214a、214b:晶片焊墊 114, 114a, 114b, 214, 214a, 214b: chip pads

116、124、126、216、224、226:接合導線 116, 124, 126, 216, 224, 226: bonding wires

120、220:虛設晶片 120, 220: Virtual chip

122、222:電極層 122, 222: Electrode layer

GND:接地電壓訊號 GND: Ground voltage signal

PW-1、PW-2:電源電壓訊號 PW-1, PW-2: Power voltage signal

SG-A、SG-B、SG-C、SG-D、SG-E、SG-F、SG-G、SG-H、SG-I、SG-J、SG-K、SG-L、SG-M、SG-N、SG-O、SG-P:操作訊號 SG-A, SG-B, SG-C, SG-D, SG-E, SG-F, SG-G, SG-H, SG-I, SG-J, SG-K, SG-L, SG-M, SG-N, SG-O, SG-P: Operation signal

圖1A為根據本揭露一些實施例的半導體封裝的立體示意圖。 FIG. 1A is a three-dimensional schematic diagram of a semiconductor package according to some embodiments of the present disclosure.

圖1B為圖1A所示的半導體封裝的上視示意圖。 FIG. 1B is a schematic top view of the semiconductor package shown in FIG. 1A .

圖1C為圖1A所示的封裝基板的頂層線路的平面示意圖。 FIG1C is a schematic plan view of the top layer circuit of the package substrate shown in FIG1A.

圖2為根據本揭露另一些實施例的半導體封裝的立體示意圖。 FIG2 is a three-dimensional schematic diagram of a semiconductor package according to other embodiments of the present disclosure.

圖1A為根據本揭露一些實施例的半導體封裝10的立體示意圖。 FIG. 1A is a three-dimensional schematic diagram of a semiconductor package 10 according to some embodiments of the present disclosure.

請參照圖1A,半導體封裝10包括用以承載半導體晶片的封裝基板100。封裝基板100可為電路板,其可包括嵌入於絕緣層堆疊中的導電特徵(導線、導通孔等)。在一些實施例中,封裝基板100為有核基板(core substrate),其中上述的絕緣層堆疊於核心層(core layer)的相對兩側。在替代實施例中,封裝基板100為不具有核心層的無核基板(coreless substrate),且相較於有核基板而具有更小的整體厚度。 Referring to FIG. 1A , the semiconductor package 10 includes a package substrate 100 for carrying a semiconductor chip. The package substrate 100 may be a circuit board, which may include conductive features (wires, vias, etc.) embedded in an insulating layer stack. In some embodiments, the package substrate 100 is a core substrate, wherein the insulating layer is stacked on opposite sides of a core layer. In an alternative embodiment, the package substrate 100 is a coreless substrate without a core layer, and has a smaller overall thickness than a core substrate.

半導體晶片110以背面附接至封裝基板100,且以打線接合(wire bonding)的方式將半導體晶片110內的積體電路從半導體晶片110的主動面連接至封裝基板100。作為實例,半導體晶片110可為記憶體晶片。然而,半導體晶片110也可以是具有其他功 能的半導體晶片。本揭露並不以半導體晶片110的功能為限。此外,在本文中,主動面代表半導體晶片的設置有半導體元件與線路的一側的表面。相較於此,半導體晶片的相對於主動面的背面則可由承載半導體元件與線路的半導體基板的背面所定義。 The semiconductor chip 110 is attached to the package substrate 100 by the back side, and the integrated circuit in the semiconductor chip 110 is connected from the active side of the semiconductor chip 110 to the package substrate 100 by wire bonding. As an example, the semiconductor chip 110 may be a memory chip. However, the semiconductor chip 110 may also be a semiconductor chip with other functions. The present disclosure is not limited to the function of the semiconductor chip 110. In addition, in this article, the active side represents the surface of the semiconductor chip on one side where the semiconductor elements and circuits are arranged. In contrast, the back side of the semiconductor chip relative to the active side can be defined by the back side of the semiconductor substrate carrying the semiconductor elements and circuits.

在一些實施例中,以晶片膠112將半導體晶片110附接至封裝基板100。在此些實施例中,可在附接半導體晶片110之前將晶片膠112預先設置於半導體晶片110的背面,而在半導體晶片110放置於封裝基板100上時晶片膠112將半導體晶片110附接至封裝基板100。 In some embodiments, the semiconductor chip 110 is attached to the package substrate 100 with a wafer adhesive 112. In these embodiments, the wafer adhesive 112 may be pre-set on the back side of the semiconductor chip 110 before attaching the semiconductor chip 110, and the wafer adhesive 112 attaches the semiconductor chip 110 to the package substrate 100 when the semiconductor chip 110 is placed on the package substrate 100.

多個晶片焊墊114設置於半導體晶片110的主動面的周邊區域上,且可沿著半導體晶片110的輪廓排列。然而,晶片焊墊114可僅沿著半導體晶片110的輪廓的部分區段排列,而非沿著半導體晶片110的整段輪廓排列。在一些實施例中,半導體晶片110具有矩形的輪廓,且晶片焊墊114沿著半導體晶片110的相對兩側邊排列,而半導體晶片110的另外兩側邊則未設置有晶片焊墊114。晶片焊墊114可作為半導體晶片110的輸入/輸出端子。其中,某些晶片焊墊114可用於傳輸固定的電壓訊號(例如是電源電壓訊號與接地電壓訊號),而其他晶片焊墊114可用於傳輸各種操作訊號。如隨後將更詳細地說明,半導體晶片110經由用以傳輸電源電壓訊號的一組晶片焊墊114(又稱為晶片焊墊114a)間接地連接至封裝基板100,而經由其他晶片焊墊114(又稱為晶片焊墊114b)直接地連接至封裝基板100。在一些實施例 中,晶片焊墊114a週期性地排列於晶片焊墊114b之間。 A plurality of chip pads 114 are disposed on the peripheral area of the active surface of the semiconductor chip 110 and may be arranged along the outline of the semiconductor chip 110. However, the chip pads 114 may be arranged along only a portion of the outline of the semiconductor chip 110, rather than along the entire outline of the semiconductor chip 110. In some embodiments, the semiconductor chip 110 has a rectangular outline, and the chip pads 114 are arranged along two opposite sides of the semiconductor chip 110, while the other two sides of the semiconductor chip 110 are not provided with chip pads 114. The chip pads 114 may serve as input/output terminals of the semiconductor chip 110. Among them, some chip pads 114 can be used to transmit fixed voltage signals (such as power voltage signals and ground voltage signals), while other chip pads 114 can be used to transmit various operation signals. As will be described in more detail later, the semiconductor chip 110 is indirectly connected to the package substrate 100 through a set of chip pads 114 (also referred to as chip pads 114a) for transmitting power voltage signals, and is directly connected to the package substrate 100 through other chip pads 114 (also referred to as chip pads 114b). In some embodiments, the chip pads 114a are periodically arranged between the chip pads 114b.

接合導線116將晶片焊墊114b連接至封裝基板100上的基板焊墊102,以實現半導體晶片110與封裝基板100之間的直接連接。在晶片焊墊114b沿著半導體晶片110的相對兩側邊排列的實施例中,基板焊墊102也沿著半導體晶片110的此相對兩側邊而排列於封裝基板100上,以縮短連接晶片焊墊114b、基板焊墊102的接合導線116的長度。 The bonding wire 116 connects the chip pad 114b to the substrate pad 102 on the package substrate 100 to achieve a direct connection between the semiconductor chip 110 and the package substrate 100. In the embodiment where the chip pad 114b is arranged along two opposite sides of the semiconductor chip 110, the substrate pad 102 is also arranged on the package substrate 100 along the two opposite sides of the semiconductor chip 110 to shorten the length of the bonding wire 116 connecting the chip pad 114b and the substrate pad 102.

另一方面,虛設晶片120堆疊於半導體晶片110上,且電極層122設置於虛設晶片120的頂面,以使晶片焊墊114a經由電極層122而間接地連接至封裝基板100上的基板焊墊104。虛設晶片120的主要功能是用以承載電極層122。作為實例,虛設晶片120可包括半導體基底,但此半導體基底上可能並未形成有半導體元件以及線路。此外,虛設晶片120的面積可小於半導體晶片110的面積。如此一來,虛設晶片120可放置於半導體晶片110的中心區域上,而不遮蔽位於半導體晶片110的周邊區域上的晶片焊墊114。 On the other hand, the dummy chip 120 is stacked on the semiconductor chip 110, and the electrode layer 122 is disposed on the top surface of the dummy chip 120, so that the chip pad 114a is indirectly connected to the substrate pad 104 on the package substrate 100 through the electrode layer 122. The main function of the dummy chip 120 is to carry the electrode layer 122. As an example, the dummy chip 120 may include a semiconductor substrate, but the semiconductor substrate may not have semiconductor elements and circuits formed thereon. In addition, the area of the dummy chip 120 may be smaller than the area of the semiconductor chip 110. In this way, the dummy chip 120 can be placed on the central area of the semiconductor chip 110 without covering the chip pad 114 located on the peripheral area of the semiconductor chip 110.

電極層122可覆蓋虛設晶片120的上表面,且可包括單層或多層的導體材料層。半導體晶片110上的晶片焊墊114a藉由橫越虛設晶片120的側壁的接合導線124而往上連接至電極層122。基於連接至電極層122的晶片焊墊114a是用以傳輸相同的固定電壓訊號(例如是電源電壓訊號),故晶片焊墊114a可共同地連至電極層122。相較於晶片焊墊114,電極層122具有較大的 面積,而可具有更低的阻抗。 The electrode layer 122 may cover the upper surface of the virtual chip 120 and may include a single layer or multiple layers of conductive material. The chip pad 114a on the semiconductor chip 110 is connected to the electrode layer 122 upwardly by a bonding wire 124 that crosses the side wall of the virtual chip 120. Since the chip pad 114a connected to the electrode layer 122 is used to transmit the same fixed voltage signal (such as a power voltage signal), the chip pad 114a may be connected to the electrode layer 122 in common. Compared to the chip pad 114, the electrode layer 122 has a larger area and may have a lower impedance.

另外,電極層122經由接合導線126而往下連接至封裝基板100上的基板焊墊104。由於電極層122位於半導體晶片110與虛設晶片120之上,接合導線126橫越虛設晶片120與半導體晶片110的側壁以將電極層122連接至基板焊墊104,且相較於接合導線124而有更長的長度。類似於接合導線124,接合導線126亦用以傳輸相同的固定電壓訊號(例如是電源電壓訊號)。因此,一組接合導線126可共用同一基板焊墊104,且基板焊墊104可相較於基板焊墊102而具有較大的面積。舉例而言,封裝基板100上可設置有兩個或更多個基板焊墊104,且此些基板焊墊104分別連接於一組接合導線126,而相較於基板焊墊102有更大的長度或寬度。然而,封裝基板100上也可僅有單一基板焊墊104,且所有的接合導線126連接至此基板焊墊104。 In addition, the electrode layer 122 is connected downward to the substrate pad 104 on the package substrate 100 through the bonding wire 126. Since the electrode layer 122 is located above the semiconductor chip 110 and the dummy chip 120, the bonding wire 126 crosses the sidewalls of the dummy chip 120 and the semiconductor chip 110 to connect the electrode layer 122 to the substrate pad 104, and has a longer length than the bonding wire 124. Similar to the bonding wire 124, the bonding wire 126 is also used to transmit the same fixed voltage signal (e.g., a power voltage signal). Therefore, a group of bonding wires 126 can share the same substrate pad 104, and the substrate pad 104 can have a larger area than the substrate pad 102. For example, two or more substrate pads 104 can be provided on the package substrate 100, and these substrate pads 104 are respectively connected to a group of bonding wires 126, and have a larger length or width than the substrate pad 102. However, there can also be only a single substrate pad 104 on the package substrate 100, and all bonding wires 126 are connected to this substrate pad 104.

在晶片焊墊114、基板焊墊102以及接合導線116、124沿著半導體晶片110的相對兩側邊排列的實施例中,接合導線126與基板焊墊104可沿著半導體晶片110的另外兩側邊設置。如此一來,即便因半導體晶片110具有較大的尺寸而使得半導體晶片110的各側無法配置多排基板焊墊,還是可將基板焊墊104的位置與基板焊墊102的位置錯開。 In the embodiment where the chip pad 114, the substrate pad 102, and the bonding wires 116 and 124 are arranged along two opposite sides of the semiconductor chip 110, the bonding wire 126 and the substrate pad 104 can be arranged along the other two sides of the semiconductor chip 110. In this way, even if the semiconductor chip 110 has a large size and it is not possible to arrange multiple rows of substrate pads on each side of the semiconductor chip 110, the position of the substrate pad 104 can be staggered from the position of the substrate pad 102.

基於排列在晶片焊墊114b之間的晶片焊墊114a是經由電極層122而間接地連接至遠離基板焊墊102的基板焊墊104,故不需沿著晶片焊墊114a設置額外的基板焊墊102。也就是說,在 晶片焊墊114a的延伸處並不設置有基板焊墊102,以使得基板焊墊102的排列在晶片焊墊114a的延伸處具有空缺。如以下將參照圖1C而更詳細地描述,降低基板焊墊102的密集度可使得封裝基板100中的線路以較分散的方式分布,而可較不受線寬與節距的限制。 Since the chip pad 114a arranged between the chip pads 114b is indirectly connected to the substrate pad 104 far away from the substrate pad 102 via the electrode layer 122, it is not necessary to arrange an additional substrate pad 102 along the chip pad 114a. In other words, no substrate pad 102 is arranged at the extension of the chip pad 114a, so that the arrangement of the substrate pad 102 has a gap at the extension of the chip pad 114a. As described in more detail below with reference to FIG. 1C, reducing the density of the substrate pad 102 can make the circuits in the package substrate 100 distributed in a more dispersed manner, and less restricted by line width and pitch.

在一些實施例中,以晶片膠128將虛設晶片120附接至半導體晶片110的主動面。在此些實施例中,可在附接虛設晶片120之前將晶片膠128預先設置於虛設晶片120的底面,而在虛設晶片120放置於半導體晶片110上時晶片膠128將虛設晶片120附接至半導體晶片110。 In some embodiments, the dummy chip 120 is attached to the active surface of the semiconductor chip 110 with a wafer glue 128. In these embodiments, the wafer glue 128 may be pre-placed on the bottom surface of the dummy chip 120 before attaching the dummy chip 120, and the wafer glue 128 attaches the dummy chip 120 to the semiconductor chip 110 when the dummy chip 120 is placed on the semiconductor chip 110.

儘管未繪示,半導體封裝10還可包括包封位於封裝基板100上的構件的包封體。除此之外,封裝基板100的底側還可設置有電性連接件(例如是焊球或凸塊),以作為半導體封裝10的輸入/輸出端子。 Although not shown, the semiconductor package 10 may also include a package body that encapsulates components located on the package substrate 100. In addition, an electrical connector (such as a solder ball or a bump) may be provided on the bottom side of the package substrate 100 to serve as an input/output terminal of the semiconductor package 10.

圖1B為根據一些實施例所繪示的半導體封裝10的上視示意圖。圖1C為根據此些實施例所繪示的封裝基板100的頂層線路的平面示意圖。 FIG. 1B is a top view schematic diagram of a semiconductor package 10 according to some embodiments. FIG. 1C is a plan view schematic diagram of the top layer circuit of a package substrate 100 according to these embodiments.

如上所陳述,各種訊號可傳輸於半導體晶片110與封裝基板100之間。其中,一些訊號經由電極層122而間接地傳輸於半導體晶片110與封裝基板100之間。相較於此,另一些訊號直接地傳輸於封裝基板100與半導體晶片110之間。 As described above, various signals can be transmitted between the semiconductor chip 110 and the package substrate 100. Among them, some signals are indirectly transmitted between the semiconductor chip 110 and the package substrate 100 through the electrode layer 122. In contrast, other signals are directly transmitted between the package substrate 100 and the semiconductor chip 110.

請參照圖1B,在一些實施例中,電源電壓訊號PW-1通 過由晶片焊墊114a、接合導線124、電極層122、接合導線126與基板焊墊104所建立的訊號路徑而間接地傳輸於半導體晶片110與封裝基板100之間。另一方面,電源電壓訊號PW-2、操作訊號SG-A至SG-P以及接地電壓訊號GND則通過由晶片焊墊114b、接合導線116與基板焊墊102所建立的訊號路徑而直接地傳輸於半導體晶片110與封裝基板100之間。 Referring to FIG. 1B , in some embodiments, the power voltage signal PW-1 is indirectly transmitted between the semiconductor chip 110 and the package substrate 100 through the signal path established by the chip pad 114a, the bonding wire 124, the electrode layer 122, the bonding wire 126 and the substrate pad 104. On the other hand, the power voltage signal PW-2, the operation signals SG-A to SG-P and the ground voltage signal GND are directly transmitted between the semiconductor chip 110 and the package substrate 100 through the signal path established by the chip pad 114b, the bonding wire 116 and the substrate pad 102.

在直接連接半導體晶片110與封裝基板100的訊號路徑中,操作訊號SG-A至SG-P的訊號路徑可分別相鄰於耦合至接地電壓訊號GND的至少一訊號路徑,由此可得到接地訊號GND所提供的屏蔽。此外,一些操作訊號的訊號路徑甚至可分別位於耦合至接地電壓訊號GND的兩訊號路徑之間,而受到接地電壓訊號GND的兩面屏蔽。另一方面,其他操作訊號的訊號路徑可分別以另一側相鄰於耦合至電源電壓訊號PW-2的一訊號路徑。舉例而言,操作訊號SG-B、SG-C、SG-D、SG-E、SG-F、SG-G、SG-J、SG-K、SG-L、SG-M、SG-N、SG-O的訊號路徑可分別位於耦合至接地電壓訊號GND的兩訊號路徑之間。此外,操作訊號SG-A、SG-H、SG-I、SG-P的路徑可分別位於耦合至接地電壓訊號GND的一訊號路徑與耦合至電源電壓訊號PW-2的一訊號路徑之間。 In the signal path directly connecting the semiconductor chip 110 and the package substrate 100, the signal paths of the operating signals SG-A to SG-P can be respectively adjacent to at least one signal path coupled to the ground voltage signal GND, thereby obtaining the shielding provided by the ground signal GND. In addition, the signal paths of some operating signals can even be respectively located between two signal paths coupled to the ground voltage signal GND, and be shielded on both sides by the ground voltage signal GND. On the other hand, the signal paths of other operating signals can be respectively adjacent to a signal path coupled to the power voltage signal PW-2 on the other side. For example, the signal paths of the operating signals SG-B, SG-C, SG-D, SG-E, SG-F, SG-G, SG-J, SG-K, SG-L, SG-M, SG-N, and SG-O may be located between two signal paths coupled to the ground voltage signal GND. In addition, the paths of the operating signals SG-A, SG-H, SG-I, and SG-P may be located between a signal path coupled to the ground voltage signal GND and a signal path coupled to the power voltage signal PW-2.

對於兩側都有接地訊號GND提供屏蔽的各操作訊號路徑(亦即耦合於操作訊號SG-B、SG-C、SG-D、SG-E、SG-F、SG-G、SG-J、SG-K、SG-L、SG-M、SG-N、SG-O的各訊號路徑)而言,可以不同的距離而與兩側的接地電壓訊號GND之訊號路徑間隔 開。以操作訊號SG-B的訊號路徑作為實例,用於傳輸操作訊號SG-B的一組晶片焊墊114b、接合導線116與基板焊墊102可在一側緊鄰耦合至接地電壓訊號GND的一組晶片焊墊114b、接合導線116與基板焊墊102,且在另一側可經由用於以間接方式傳輸電源電壓訊號PW-1的一晶片焊墊114a而與耦合至接地電壓訊號GND的另一組晶片焊墊114b、接合導線116與基板焊墊102間隔開。 For each operating signal path that is shielded by the ground signal GND on both sides (i.e., each signal path coupled to the operating signals SG-B, SG-C, SG-D, SG-E, SG-F, SG-G, SG-J, SG-K, SG-L, SG-M, SG-N, SG-O), it can be separated from the signal path of the ground voltage signal GND on both sides by different distances. Taking the signal path of the operation signal SG-B as an example, a set of chip pads 114b, bonding wires 116 and substrate pads 102 for transmitting the operation signal SG-B can be closely coupled to a set of chip pads 114b, bonding wires 116 and substrate pads 102 coupled to the ground voltage signal GND on one side, and can be separated from another set of chip pads 114b, bonding wires 116 and substrate pads 102 coupled to the ground voltage signal GND on the other side via a chip pad 114a for indirectly transmitting the power voltage signal PW-1.

另一方面,由晶片焊墊114a、接合導線124、電極層122、接合導線126與基板焊墊104所建立且用以將電源電壓訊號PW-1間接地傳輸於半導體晶片110與封裝基板100之間的訊號路徑可與直接連接於半導體晶片110與封裝基板100之間的訊號路徑錯開。以圖1B所示的實例而言,將半導體晶片110直接地連接至封裝基板100的訊號路徑可排列於半導體晶片110的相對兩側,而將半導體晶片110間接地連接至封裝基板100的訊號路徑可經由半導體晶片110上的電極層122而走到位於半導體晶片110的另外兩側的基板焊墊104。基於此設計,可避免所有訊號路徑集中排列在半導體晶片110的兩側。如以下將更詳細地描述,藉此可至少部分地釋放封裝基板100的頂層線路層中的繞線面積。 On the other hand, the signal path established by the chip pad 114a, the bonding wire 124, the electrode layer 122, the bonding wire 126 and the substrate pad 104 and used to indirectly transmit the power voltage signal PW-1 between the semiconductor chip 110 and the packaging substrate 100 can be staggered from the signal path directly connected between the semiconductor chip 110 and the packaging substrate 100. In the example shown in FIG. 1B , the signal paths that directly connect the semiconductor chip 110 to the package substrate 100 can be arranged on opposite sides of the semiconductor chip 110, and the signal paths that indirectly connect the semiconductor chip 110 to the package substrate 100 can go through the electrode layer 122 on the semiconductor chip 110 to the substrate pads 104 located on the other two sides of the semiconductor chip 110. Based on this design, it is possible to avoid all signal paths being concentrated on both sides of the semiconductor chip 110. As will be described in more detail below, the routing area in the top wiring layer of the package substrate 100 can be at least partially released.

請參照圖1C,在封裝基板100的頂層線路層中,多條線路106b連接至用以將電壓電源訊號PW-2、操作訊號SG-A至SG-P以及接地電壓訊號GND直接地傳輸於半導體晶片110與封裝基板100之間的基板焊墊102。此外,藉由導通孔108b而將位於頂層線路層中的線路106b往下連接至其他線路層。在晶片焊墊102沿 著半導體晶片110的相對兩側邊排列於封裝基板100的周邊區域上的實施例中,線路106b自封裝基板100的兩側邊往內延伸至導通孔108b。此外,因基板焊墊102的排列在晶片焊墊114a的延伸處具有空缺(如參照圖1B所說明),某些相鄰的基板焊墊102以較大的間隙間隔開,使得連接於此些基板焊墊102的線路106b也以較大的間隙間隔開。如此一來,線路106b可具有較低的排列密度,使得線路106b的線寬與節距較不受限制。因此,可確保線路106b可具有夠低的阻抗,而可進一步確保所傳輸的訊號(亦即電壓電源訊號PW-2、操作訊號SG-A至SG-P以及接地電壓訊號GND)可穩定地提供至半導體晶片110。 Referring to FIG. 1C , in the top circuit layer of the package substrate 100, a plurality of circuits 106b are connected to the substrate pads 102 for directly transmitting the voltage power signal PW-2, the operation signals SG-A to SG-P, and the ground voltage signal GND between the semiconductor chip 110 and the package substrate 100. In addition, the circuits 106b in the top circuit layer are connected downward to other circuit layers through the vias 108b. In the embodiment where the chip pads 102 are arranged on the peripheral area of the package substrate 100 along the opposite sides of the semiconductor chip 110, the circuits 106b extend inward from the two sides of the package substrate 100 to the vias 108b. In addition, because the arrangement of the substrate pads 102 has a gap at the extension of the chip pads 114a (as described in reference to FIG. 1B ), some adjacent substrate pads 102 are separated by a larger gap, so that the lines 106b connected to these substrate pads 102 are also separated by a larger gap. In this way, the line 106b can have a lower arrangement density, so that the line width and pitch of the line 106b are less restricted. Therefore, it can be ensured that the line 106b can have a sufficiently low impedance, and it can further ensure that the transmitted signal (i.e., the voltage power signal PW-2, the operation signals SG-A to SG-P, and the ground voltage signal GND) can be stably provided to the semiconductor chip 110.

另外,封裝基板100的頂層線路層中的線路106a連接於用以將電壓電源訊號PW-1間接地傳輸於半導體晶片110與封裝基板100之間的基板焊墊104。此外,頂層線路層中的導通孔108a將線路106a連接至其他線路層。在基板焊墊102沿著半導體晶片110的兩相對側邊排列且基板焊墊104沿著半導體晶片110的另外兩相對側邊設置的實施例中,基板焊墊102、104可在封裝基板100的周邊區域上環繞半導體晶片110,且封裝基板100中的線路106a可由周邊區域往內延伸至導通孔108a。此外,連接至基板焊墊104的線路106a可相較於連接至基板焊墊102的線路106b而具有較大的線寬以及更低的阻抗。不但如此,各線路106a可連接至一組導通孔108a。以圖1C所繪示的實例而言,各線路106a可連接至3個導通孔108a。 In addition, the line 106a in the top circuit layer of the package substrate 100 is connected to the substrate pad 104 for indirectly transmitting the voltage power signal PW-1 between the semiconductor chip 110 and the package substrate 100. In addition, the via 108a in the top circuit layer connects the line 106a to other circuit layers. In an embodiment where the substrate pads 102 are arranged along two opposite sides of the semiconductor chip 110 and the substrate pads 104 are arranged along the other two opposite sides of the semiconductor chip 110, the substrate pads 102 and 104 may surround the semiconductor chip 110 on the peripheral area of the package substrate 100, and the line 106a in the package substrate 100 may extend from the peripheral area inward to the via 108a. In addition, the line 106a connected to the substrate pad 104 may have a larger line width and lower impedance than the line 106b connected to the substrate pad 102. Moreover, each line 106a may be connected to a set of vias 108a. In the example shown in FIG. 1C , each line 106a can be connected to three vias 108a.

儘管未繪示,封裝基板100還具有其他線路層,以將頂層線路層中的線路106a、106b繞線至位於封裝基板100底側的電性連接件。 Although not shown, the package substrate 100 also has other circuit layers to route the circuits 106a, 106b in the top circuit layer to the electrical connectors located on the bottom side of the package substrate 100.

圖2為根據本揭露另一些實施例的半導體封裝20的立體示意圖。半導體封裝20相似於參照圖1A至圖1C所說明的半導體封裝10。以簡潔起見,以下將不會完整地說明半導體封裝20的相同或相似於半導體封裝10之處。也就是說,所省略說明之處代表與半導體封裝10相同或相似。 FIG. 2 is a three-dimensional schematic diagram of a semiconductor package 20 according to other embodiments of the present disclosure. The semiconductor package 20 is similar to the semiconductor package 10 described with reference to FIGS. 1A to 1C . For the sake of brevity, the parts of the semiconductor package 20 that are the same or similar to the semiconductor package 10 will not be fully described below. In other words, the parts that are omitted represent the same or similar to the semiconductor package 10.

請參照圖2,半導體封裝20具有半導體晶片210、虛設晶片220以及覆蓋虛設晶片220的電極層222。在結構與功能方面,半導體晶片210可相同於參照圖1A所描述的半導體晶片110。另外,虛設晶片220與電極層222相似於參照圖1A所描述的虛設晶片120與電極層122。也就是說,虛設晶片220的主要作用在於承載電極層222,而本身可能不具有半導體元件與線路。 Referring to FIG. 2 , the semiconductor package 20 has a semiconductor chip 210, a dummy chip 220, and an electrode layer 222 covering the dummy chip 220. In terms of structure and function, the semiconductor chip 210 may be the same as the semiconductor chip 110 described with reference to FIG. 1A . In addition, the dummy chip 220 and the electrode layer 222 are similar to the dummy chip 120 and the electrode layer 122 described with reference to FIG. 1A . In other words, the main function of the dummy chip 220 is to carry the electrode layer 222, and it may not have semiconductor components and circuits.

作為差異,半導體晶片210是堆疊於虛設晶片220與電極層222上,而非設置於虛設晶片220與電極層222下方。此外,半導體晶片210的面積可小於虛設晶片220的面積。此使得半導體晶片210定位在虛設晶片220與電極層222的中心區域上時,虛設晶片220與電極層222的周邊區域並未被半導體晶片210所覆蓋。再者,設置於半導體晶片210的背面的晶片膠212將半導體晶片210附接至電極層222上。另一方面,設置於虛設晶片220的底面的晶片膠228將虛設晶片220附接至封裝基板100的頂面。 As a difference, the semiconductor chip 210 is stacked on the dummy chip 220 and the electrode layer 222, rather than being disposed under the dummy chip 220 and the electrode layer 222. In addition, the area of the semiconductor chip 210 may be smaller than the area of the dummy chip 220. This allows the semiconductor chip 210 to be positioned on the central area of the dummy chip 220 and the electrode layer 222, while the peripheral area of the dummy chip 220 and the electrode layer 222 is not covered by the semiconductor chip 210. Furthermore, the wafer glue 212 disposed on the back side of the semiconductor chip 210 attaches the semiconductor chip 210 to the electrode layer 222. On the other hand, the chip glue 228 disposed on the bottom surface of the dummy chip 220 attaches the dummy chip 220 to the top surface of the package substrate 100.

相較於參照圖1A所說明的半導體晶片110以及覆蓋有電極層122的虛設晶片120,半導體晶片210與覆蓋有電極層222的虛設晶片220具有不同的堆疊順序。因此,將半導體晶片210間接與直接地連接至封裝基板100之方式也必須對應地做出調整。 Compared to the semiconductor chip 110 and the dummy chip 120 covered with the electrode layer 122 illustrated in reference to FIG. 1A , the semiconductor chip 210 and the dummy chip 220 covered with the electrode layer 222 have a different stacking sequence. Therefore, the method of indirectly and directly connecting the semiconductor chip 210 to the package substrate 100 must also be adjusted accordingly.

設置於半導體晶片210的主動面上且沿著半導體晶片210的相對兩側邊排列的晶片焊墊214包括晶片焊墊214a與晶片焊墊214b。晶片焊墊214a排列於晶片焊墊214b之間,且半導體晶片210經由晶片焊墊214a而透過電極層222來間接地連接至封裝基板100。另一方面,半導體晶片210經由晶片焊墊214b直接地連接至封裝基板100。類似於參照圖1A所描述的晶片焊墊114a,晶片焊墊214a可用於傳輸固定電壓訊號,例如是電源電壓訊號。另外,類似於參照圖1A所描述的晶片焊墊114b,晶片焊墊214b可用於傳輸固定電壓訊號、操作訊號以及接地電壓訊號。 The chip pads 214 disposed on the active surface of the semiconductor chip 210 and arranged along two opposite sides of the semiconductor chip 210 include chip pads 214a and chip pads 214b. The chip pads 214a are arranged between the chip pads 214b, and the semiconductor chip 210 is indirectly connected to the package substrate 100 through the chip pads 214a through the electrode layer 222. On the other hand, the semiconductor chip 210 is directly connected to the package substrate 100 through the chip pads 214b. Similar to the chip pads 114a described with reference to FIG. 1A, the chip pads 214a can be used to transmit a fixed voltage signal, such as a power voltage signal. In addition, similar to the chip pad 114b described with reference to FIG. 1A , the chip pad 214b can be used to transmit a fixed voltage signal, an operating signal, and a ground voltage signal.

為實現半導體晶片210與封裝基板100之間的直接連接,接合導線216將晶片焊墊214b往下連接至位於封裝基板100上且沿著晶片焊墊214b排列的基板焊墊102。另一方面,為實現半導體晶片210與封裝基板100之間的間接連接,接合導線224橫將晶片焊墊214a往下連接至電極層222,且接合導線226將電極層222往下連接至封裝基板100上的基板焊墊104(可以是一或多個基板焊墊104)。接合導線216、224可跨越半導體晶片210的排列有晶片焊墊214a、214b的兩側。其中,接合導線216橫越半導體晶片210的側壁與虛設晶片220的側壁以將晶片焊墊214b 連接至封裝基板100上的基板焊墊102,而接合導線224橫越半導體晶片210的側壁以將晶片焊墊214a連接至電極層222。另一方面,接合導線226可延伸於半導體晶片210的未設置有晶片焊墊214a、214b的兩側外,且橫越虛設晶片220的側壁以將電極層222連接至設置在封裝基板100上的基板焊墊104。如此一來,接合導線216可相較於接合導線224、226而具有更長的長度。此外,相似於參照圖1A所描述的接合導線126,一組接合導線226可連接至同一基板焊墊104。 To achieve direct connection between the semiconductor chip 210 and the package substrate 100, the bonding wire 216 connects the chip pad 214b downward to the substrate pad 102 located on the package substrate 100 and arranged along the chip pad 214b. On the other hand, to achieve indirect connection between the semiconductor chip 210 and the package substrate 100, the bonding wire 224 connects the chip pad 214a downward to the electrode layer 222, and the bonding wire 226 connects the electrode layer 222 downward to the substrate pad 104 (which may be one or more substrate pads 104) on the package substrate 100. The bonding wires 216 and 224 may cross over the two sides of the semiconductor chip 210 where the chip pads 214a and 214b are arranged. The bonding wire 216 crosses the side wall of the semiconductor chip 210 and the side wall of the dummy chip 220 to connect the chip pad 214b to the substrate pad 102 on the package substrate 100, and the bonding wire 224 crosses the side wall of the semiconductor chip 210 to connect the chip pad 214a to the electrode layer 222. On the other hand, the bonding wire 226 can extend outside the two sides of the semiconductor chip 210 where the chip pads 214a and 214b are not provided, and cross the side wall of the dummy chip 220 to connect the electrode layer 222 to the substrate pad 104 provided on the package substrate 100. As a result, the bonding wire 216 can have a longer length compared to the bonding wires 224 and 226. In addition, similar to the bonding wire 126 described with reference to FIG. 1A, a set of bonding wires 226 can be connected to the same substrate pad 104.

儘管未繪示,半導體封裝20還可包括包封位於封裝基板100上的構件的包封體。除此之外,封裝基板100的底側還可設置有電性連接件(例如是焊球或凸塊),以作為半導體封裝20的輸入/輸出端子。在者,封裝基板100可具有如參照圖1C所說明的頂層線路層以及其他線路層,而將封裝基板100上的基板焊墊102、104連接至位於封裝基板100底側的此些電性連接件。 Although not shown, the semiconductor package 20 may also include a package body that encapsulates the components located on the package substrate 100. In addition, the bottom side of the package substrate 100 may also be provided with electrical connectors (such as solder balls or bumps) to serve as input/output terminals of the semiconductor package 20. In addition, the package substrate 100 may have a top circuit layer and other circuit layers as described with reference to FIG. 1C, and the substrate pads 102 and 104 on the package substrate 100 are connected to these electrical connectors located on the bottom side of the package substrate 100.

綜上所述,本揭露實施例提供一種半導體封裝,包括堆疊於封裝基板上的半導體晶片與虛設晶片,且虛設晶片的表面覆蓋有電極層。第一晶片焊墊與第二晶片焊墊沿著半導體晶片的相對兩側邊而排列於半導體晶片的周邊區域上。其中,第一晶片焊墊直接連接至封裝基板上的第一基板焊墊,而用於傳輸相同的固定電壓訊號的第二晶片焊墊經由電極層而間接地連接至封裝基板上的第二基板焊墊。特別來說,第一晶片焊墊與第二晶片焊墊可在半導體晶片的兩側分別連接至第一基板焊墊與電極層,而電極 層可在半導體晶片的另外兩側連接至第二基板焊墊。也就是說,可利用大面積的電極層來將第二晶片焊墊繞線至並未設置有第一基板焊墊的位置。如此一來,可避免所有基板焊墊集中排列在半導體晶片的其中兩側。此外,即便因半導體晶片具有較大的尺寸而使得半導體晶片的各側無法配置多排基板焊墊,還是可將第一與第二基板焊墊的位置錯開。因此,可避免封裝基板內連接於第一與第二基板焊墊的頂層線路過度集中地分布。藉此,所述頂層線路的線寬與節距較不受限制,故可確保此些線路具有夠低的阻抗,而可穩定地將訊號傳輸至半導體晶片。 In summary, the disclosed embodiment provides a semiconductor package, including a semiconductor chip and a dummy chip stacked on a package substrate, and the surface of the dummy chip is covered with an electrode layer. A first chip pad and a second chip pad are arranged on the peripheral area of the semiconductor chip along the opposite sides of the semiconductor chip. The first chip pad is directly connected to the first substrate pad on the package substrate, and the second chip pad for transmitting the same fixed voltage signal is indirectly connected to the second substrate pad on the package substrate through the electrode layer. In particular, the first chip pad and the second chip pad can be connected to the first substrate pad and the electrode layer on two sides of the semiconductor chip, respectively, and the electrode layer can be connected to the second substrate pad on the other two sides of the semiconductor chip. In other words, the large-area electrode layer can be used to route the second chip pad to a position where the first substrate pad is not provided. In this way, it can be avoided that all substrate pads are concentrated on two sides of the semiconductor chip. In addition, even if the semiconductor chip has a large size and it is impossible to configure multiple rows of substrate pads on each side of the semiconductor chip, the positions of the first and second substrate pads can be staggered. Therefore, it can be avoided that the top layer circuits connected to the first and second substrate pads in the package substrate are distributed too concentratedly. In this way, the line width and pitch of the top-layer lines are less restricted, so it can be ensured that these lines have low enough impedance to stably transmit signals to the semiconductor chip.

10:半導體封裝 10:Semiconductor packaging

100:封裝基板 100:Packaging substrate

102、104:基板焊墊 102, 104: substrate pad

110:半導體晶片 110: Semiconductor chip

112、128:晶片膠 112, 128: chip glue

114、114a、114b:晶片焊墊 114, 114a, 114b: chip pads

116、124、126:接合導線 116, 124, 126: Bonding wires

120:虛設晶片 120: Virtual chip

122:電極層 122:Electrode layer

Claims (9)

一種半導體封裝,包括:封裝基板;多個第一基板焊墊與至少一第二基板焊墊,設置於所述封裝基板的周邊區域上;半導體晶片以及虛設晶片,堆疊於所述封裝基板上;電極層,覆蓋所述虛設晶片的頂面;以及多個第一晶片焊墊與多個第二晶片焊墊,設置於所述半導體晶片的周邊區域上,其中所述多個第一晶片焊墊經由多條第一接合導線而直接連接至所述多個第一基板焊墊,所述多個第二晶片焊墊經由多條第二接合導線而連接至所述電極層,且所述電極層經由多條第三接合導線而連接至所述至少一第二基板焊墊,其中所述多個第一晶片焊墊、所述多個第二晶片焊墊、所述多個第一基板焊墊、所述多條第一接合導線與所述多條第二接合導線沿著所述半導體晶片的第一側以及第二側排列,且所述至少一第二基板焊墊以及所述多條第三接合導線設置於所述半導體晶片的其他側。 A semiconductor package comprises: a package substrate; a plurality of first substrate pads and at least one second substrate pad, arranged on a peripheral area of the package substrate; a semiconductor chip and a dummy chip, stacked on the package substrate; an electrode layer, covering the top surface of the dummy chip; and a plurality of first chip pads and a plurality of second chip pads, arranged on a peripheral area of the semiconductor chip, wherein the plurality of first chip pads are directly connected to the plurality of first substrate pads via a plurality of first bonding wires, and the plurality of second chip pads are directly connected to the plurality of first substrate pads via a plurality of first bonding wires. The chip pad is connected to the electrode layer via a plurality of second bonding wires, and the electrode layer is connected to the at least one second substrate pad via a plurality of third bonding wires, wherein the plurality of first chip pads, the plurality of second chip pads, the plurality of first substrate pads, the plurality of first bonding wires and the plurality of second bonding wires are arranged along the first side and the second side of the semiconductor chip, and the at least one second substrate pad and the plurality of third bonding wires are arranged on the other side of the semiconductor chip. 如請求項1所述的半導體封裝,其中所述至少一第二基板焊墊包括多個第二基板焊墊,分別連接於所述多條第三接合導線中的多者。 A semiconductor package as described in claim 1, wherein the at least one second substrate pad includes a plurality of second substrate pads, each of which is connected to a plurality of the plurality of third bonding wires. 如請求項1所述的半導體封裝,其中所述多個第二晶片焊墊、所述多條第二接合導線、所述電極層、所述多條第三接 合導線以及所述至少一第二基板焊墊經配置以傳輸相同的固定電壓訊號。 A semiconductor package as described in claim 1, wherein the plurality of second chip pads, the plurality of second bonding wires, the electrode layer, the plurality of third bonding wires, and the at least one second substrate pad are configured to transmit the same fixed voltage signal. 如請求項1所述的半導體封裝,其中所述至少一第二基板焊墊在個別面積上大於所述多個第一基板焊墊。 A semiconductor package as described in claim 1, wherein the at least one second substrate pad is larger in individual area than the plurality of first substrate pads. 如請求項1所述的半導體封裝,其中所述封裝基板的頂層線路層包括多條第一線路以及至少一第二線路,所述多條第一線路連接至所述多個第一基板焊墊,所述至少一第二線路連接至所述至少一第二基板焊墊,且所述至少一第二線路在個別線寬上大於所述多條第一線路。 A semiconductor package as described in claim 1, wherein the top circuit layer of the package substrate includes a plurality of first circuits and at least one second circuit, the plurality of first circuits are connected to the plurality of first substrate pads, the at least one second circuit is connected to the at least one second substrate pad, and the at least one second circuit has a larger individual line width than the plurality of first circuits. 如請求項1所述的半導體封裝,其中所述虛設晶片堆疊於所述半導體晶片上,且所述虛設晶片的面積以及所述電極層的面積分別小於所述半導體晶片的面積。 A semiconductor package as described in claim 1, wherein the dummy chip is stacked on the semiconductor chip, and the area of the dummy chip and the area of the electrode layer are respectively smaller than the area of the semiconductor chip. 如請求項6所述的半導體封裝,其中所述多條第一接合導線從所述多個第一晶片焊墊而縱向地橫越所述半導體晶片以延伸至所述多個第一基板焊墊,所述多條第二接合導線從所述多個第二晶片焊墊而縱向地橫越所述虛設晶片以延伸至所述電極層上,且所述多條第三接合導線從所述電極層上而縱向地橫越所述虛設晶片與所述半導體晶片以延伸至所述至少一第二基板焊墊。 A semiconductor package as described in claim 6, wherein the plurality of first bonding wires extend longitudinally from the plurality of first chip pads across the semiconductor chip to the plurality of first substrate pads, the plurality of second bonding wires extend longitudinally from the plurality of second chip pads across the dummy chip to the electrode layer, and the plurality of third bonding wires extend longitudinally from the electrode layer across the dummy chip and the semiconductor chip to the at least one second substrate pad. 如請求項1所述的半導體封裝,其中所述半導體晶片堆疊於所述虛設晶片與所述電極層上,且所述半導體晶片的面積分別小於所述虛設晶片的面積以及所述電極層的面積。 A semiconductor package as described in claim 1, wherein the semiconductor chip is stacked on the dummy chip and the electrode layer, and the area of the semiconductor chip is smaller than the area of the dummy chip and the area of the electrode layer, respectively. 如請求項8所述的半導體封裝,其中所述多條第一接合導線從所述多個第一晶片焊墊而縱向地橫越所述半導體晶片以及所述虛設晶片以延伸至所述多個第一基板焊墊,所述多條第二接合導線從所述多個第二晶片焊墊而縱向地橫越所述半導體晶片以延伸至所述電極層上,且所述多條第三接合導線從所述電極層上而縱向地橫越所述虛設晶片以延伸至所述至少一第二基板焊墊。 A semiconductor package as described in claim 8, wherein the plurality of first bonding wires extend longitudinally from the plurality of first chip pads across the semiconductor chip and the dummy chip to the plurality of first substrate pads, the plurality of second bonding wires extend longitudinally from the plurality of second chip pads across the semiconductor chip to the electrode layer, and the plurality of third bonding wires extend longitudinally from the electrode layer across the dummy chip to the at least one second substrate pad.
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