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TWI799695B - Substrate processing method and substrate processing device - Google Patents

Substrate processing method and substrate processing device Download PDF

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Publication number
TWI799695B
TWI799695B TW109112893A TW109112893A TWI799695B TW I799695 B TWI799695 B TW I799695B TW 109112893 A TW109112893 A TW 109112893A TW 109112893 A TW109112893 A TW 109112893A TW I799695 B TWI799695 B TW I799695B
Authority
TW
Taiwan
Prior art keywords
substrate processing
processing device
processing method
substrate
processing
Prior art date
Application number
TW109112893A
Other languages
Chinese (zh)
Other versions
TW202102314A (en
Inventor
根來世
小林健司
奥谷学
阿部博史
Original Assignee
日商斯庫林集團股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日商斯庫林集團股份有限公司 filed Critical 日商斯庫林集團股份有限公司
Publication of TW202102314A publication Critical patent/TW202102314A/en
Application granted granted Critical
Publication of TWI799695B publication Critical patent/TWI799695B/en

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Classifications

    • H10P70/20—
    • H10P52/00—
    • H10P72/0408—
    • H10P72/0414—
TW109112893A 2019-04-18 2020-04-17 Substrate processing method and substrate processing device TWI799695B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2019079465A JP7208091B2 (en) 2019-04-18 2019-04-18 Substrate processing method and substrate processing apparatus
JP2019-079465 2019-04-18

Publications (2)

Publication Number Publication Date
TW202102314A TW202102314A (en) 2021-01-16
TWI799695B true TWI799695B (en) 2023-04-21

Family

ID=72837785

Family Applications (1)

Application Number Title Priority Date Filing Date
TW109112893A TWI799695B (en) 2019-04-18 2020-04-17 Substrate processing method and substrate processing device

Country Status (5)

Country Link
JP (1) JP7208091B2 (en)
KR (1) KR102638814B1 (en)
CN (1) CN113728416B (en)
TW (1) TWI799695B (en)
WO (1) WO2020213481A1 (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7301662B2 (en) 2019-07-29 2023-07-03 株式会社Ｓｃｒｅｅｎホールディングス Substrate processing method and substrate processing apparatus
JP7627994B2 (en) 2021-05-20 2025-02-07 株式会社Ｓｃｒｅｅｎホールディングス SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
JP2025033160A (en) * 2023-08-29 2025-03-13 株式会社Ｓｃｒｅｅｎホールディングス Substrate processing method

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW200823979A (en) * 2006-09-20 2008-06-01 Dainippon Screen Mfg Substrate treatment apparatus and substrate treatment method
CN100490060C (en) * 2006-06-19 2009-05-20 大日本网目版制造株式会社 Substrate treatment method and substrate treatment apparatus
JP2010050143A (en) * 2008-08-19 2010-03-04 Dainippon Screen Mfg Co Ltd Substrate processing method, and substrate processing apparatus
JP2017117954A (en) * 2015-12-24 2017-06-29 株式会社Ｓｃｒｅｅｎホールディングス Substrate processing apparatus and substrate processing method
TW201806010A (en) * 2016-08-08 2018-02-16 日商東京威力科創股份有限公司 Liquid processing method, substrate processing apparatus, and recording medium
TW201820396A (en) * 2016-11-18 2018-06-01 美商應用材料股份有限公司 Dry high aspect ratio feature
TWI626710B (en) * 2015-06-16 2018-06-11 SCREEN Holdings Co., Ltd. Substrate processing method and substrate processing device

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5043406B2 (en) 2006-11-21 2012-10-10 大日本スクリーン製造株式会社 Substrate drying method and substrate drying apparatus
JP6611848B2 (en) * 2012-08-28 2019-11-27 株式会社Ｓｃｒｅｅｎホールディングス Substrate processing equipment
JP6427323B2 (en) * 2014-02-26 2018-11-21 株式会社Ｓｃｒｅｅｎホールディングス Substrate drying apparatus and substrate drying method
JP6818607B2 (en) * 2017-03-27 2021-01-20 株式会社Ｓｃｒｅｅｎホールディングス Substrate processing method and substrate processing equipment

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN100490060C (en) * 2006-06-19 2009-05-20 大日本网目版制造株式会社 Substrate treatment method and substrate treatment apparatus
TW200823979A (en) * 2006-09-20 2008-06-01 Dainippon Screen Mfg Substrate treatment apparatus and substrate treatment method
JP2010050143A (en) * 2008-08-19 2010-03-04 Dainippon Screen Mfg Co Ltd Substrate processing method, and substrate processing apparatus
TWI626710B (en) * 2015-06-16 2018-06-11 SCREEN Holdings Co., Ltd. Substrate processing method and substrate processing device
JP2017117954A (en) * 2015-12-24 2017-06-29 株式会社Ｓｃｒｅｅｎホールディングス Substrate processing apparatus and substrate processing method
TW201909248A (en) * 2015-12-24 2019-03-01 日商斯庫林集團股份有限公司 Substrate processing apparatus and substrate processing method
TW201806010A (en) * 2016-08-08 2018-02-16 日商東京威力科創股份有限公司 Liquid processing method, substrate processing apparatus, and recording medium
TW201820396A (en) * 2016-11-18 2018-06-01 美商應用材料股份有限公司 Dry high aspect ratio feature

Also Published As

Publication number Publication date
CN113728416A (en) 2021-11-30
CN113728416B (en) 2025-01-03
WO2020213481A1 (en) 2020-10-22
KR20210137182A (en) 2021-11-17
TW202102314A (en) 2021-01-16
JP2020178046A (en) 2020-10-29
JP7208091B2 (en) 2023-01-18
KR102638814B1 (en) 2024-02-20

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