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TWI799375B - 零件製造用膜及零件的製造方法 - Google Patents

零件製造用膜及零件的製造方法 Download PDF

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Publication number
TWI799375B
TWI799375B TW106109435A TW106109435A TWI799375B TW I799375 B TWI799375 B TW I799375B TW 106109435 A TW106109435 A TW 106109435A TW 106109435 A TW106109435 A TW 106109435A TW I799375 B TWI799375 B TW I799375B
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TW
Taiwan
Prior art keywords
manufacturing parts
film
manufacturing
parts
Prior art date
Application number
TW106109435A
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English (en)
Other versions
TW201743375A (zh
Inventor
林下英司
Original Assignee
日商三井化學東賽璐股份有限公司
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Application filed by 日商三井化學東賽璐股份有限公司 filed Critical 日商三井化學東賽璐股份有限公司
Publication of TW201743375A publication Critical patent/TW201743375A/zh
Application granted granted Critical
Publication of TWI799375B publication Critical patent/TWI799375B/zh

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Classifications

    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J7/00Adhesives in the form of films or foils
    • C09J7/20Adhesives in the form of films or foils characterised by their carriers
    • C09J7/22Plastics; Metallised plastics
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J7/00Adhesives in the form of films or foils
    • C09J7/20Adhesives in the form of films or foils characterised by their carriers
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J201/00Adhesives based on unspecified macromolecular compounds
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67092Apparatus for mechanical treatment
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67098Apparatus for thermal treatment
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67703Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
    • H01L21/67721Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations the substrates to be conveyed not being semiconductor wafers or large planar substrates, e.g. chips, lead frames
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/6835Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
    • H01L21/6836Wafer tapes, e.g. grinding or dicing support tapes
    • H10P10/12
    • H10P54/00
    • H10P72/0428
    • H10P72/0431
    • H10P72/0442
    • H10P72/3206
    • H10P72/3212
    • H10P72/7402
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B43/00Operations specially adapted for layered products and not otherwise provided for, e.g. repairing; Apparatus therefor
    • B32B43/006Delaminating
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J2203/00Applications of adhesives in processes or use of adhesives in the form of films or foils
    • C09J2203/326Applications of adhesives in processes or use of adhesives in the form of films or foils for bonding electronic components such as wafers, chips or semiconductors
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J2301/00Additional features of adhesives in the form of films or foils
    • C09J2301/10Additional features of adhesives in the form of films or foils characterized by the structural features of the adhesive tape or sheet
    • C09J2301/12Additional features of adhesives in the form of films or foils characterized by the structural features of the adhesive tape or sheet by the arrangement of layers
    • C09J2301/122Additional features of adhesives in the form of films or foils characterized by the structural features of the adhesive tape or sheet by the arrangement of layers the adhesive layer being present only on one side of the carrier, e.g. single-sided adhesive tape
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J2301/00Additional features of adhesives in the form of films or foils
    • C09J2301/30Additional features of adhesives in the form of films or foils characterized by the chemical, physicochemical or physical properties of the adhesive or the carrier
    • C09J2301/312Additional features of adhesives in the form of films or foils characterized by the chemical, physicochemical or physical properties of the adhesive or the carrier parameters being the characterizing feature
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J2467/00Presence of polyester
    • C09J2467/006Presence of polyester in the substrate
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J2477/00Presence of polyamide
    • C09J2477/006Presence of polyamide in the substrate
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01RMEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R1/00Details of instruments or arrangements of the types included in groups G01R5/00 - G01R13/00 and G01R31/00
    • G01R1/02General constructional details
    • G01R1/04Housings; Supporting members; Arrangements of terminals
    • G01R1/0408Test fixtures or contact fields; Connectors or connecting adaptors; Test clips; Test sockets
    • G01R1/0491Test fixtures or contact fields; Connectors or connecting adaptors; Test clips; Test sockets for testing integrated circuits on wafers, e.g. wafer-level test cartridge
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01RMEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R31/00Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
    • G01R31/28Testing of electronic circuits, e.g. by signal tracer
    • G01R31/282Testing of electronic circuits specially adapted for particular applications not provided for elsewhere
    • G01R31/2831Testing of materials or semi-finished products, e.g. semiconductor wafers or substrates
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02002Preparing wafers
    • H01L21/02005Preparing bulk and homogeneous wafers
    • H01L21/02008Multistep processes
    • H01L21/0201Specific process step
    • H10P72/7416
    • H10P72/7418
    • H10P72/742
    • H10P72/7436
    • H10W74/014

Landscapes

  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Chemical & Material Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Laminated Bodies (AREA)
  • Adhesive Tapes (AREA)
  • Dicing (AREA)
  • Adhesives Or Adhesive Processes (AREA)
TW106109435A 2016-03-31 2017-03-22 零件製造用膜及零件的製造方法 TWI799375B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2016-072755 2016-03-31
JP2016072755 2016-03-31

Publications (2)

Publication Number Publication Date
TW201743375A TW201743375A (zh) 2017-12-16
TWI799375B true TWI799375B (zh) 2023-04-21

Family

ID=59965210

Family Applications (1)

Application Number Title Priority Date Filing Date
TW106109435A TWI799375B (zh) 2016-03-31 2017-03-22 零件製造用膜及零件的製造方法

Country Status (6)

Country Link
EP (1) EP3439021B1 (zh)
KR (1) KR102082065B1 (zh)
CN (1) CN108966672B (zh)
SG (1) SG11201807869SA (zh)
TW (1) TWI799375B (zh)
WO (1) WO2017169747A1 (zh)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102416073B1 (ko) * 2018-02-28 2022-07-01 미쓰이 가가쿠 토세로 가부시키가이샤 부품 제조 방법, 보지 필름 및 보지구 형성 장치
JP7173740B2 (ja) * 2018-03-08 2022-11-16 日東電工株式会社 封止用シート
CN112055734B (zh) * 2018-05-28 2022-07-01 电化株式会社 粘合带和使用该粘合带的半导体装置的制造方法
MY203277A (en) 2018-11-09 2024-06-21 Resonac Corp Temporary protective film for producing semiconductor device, reel body, and method for producing semiconductor device
PH12021552880A1 (en) * 2019-06-19 2022-07-25 Resonac Corp Temporary protective film for semiconductor encapsulation molding, lead frame with temporary protective film, encapsulation molded body with temporary protective film, and method for manufacturing semiconductor device
CN115335973B (zh) * 2020-04-06 2025-12-12 株式会社力森诺科 临时保护膜、密封成形体及制造半导体封装件的方法
JP7644591B2 (ja) * 2020-12-11 2025-03-12 アールエム東セロ株式会社 電子部品の製造方法、電子部品製造装置
TW202246784A (zh) * 2021-02-10 2022-12-01 日商三井化學東賽璐股份有限公司 電子零件的製造方法、製造用膜及製造用具

Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5605844A (en) * 1995-03-31 1997-02-25 Matsushita Electric Industrial Co., Ltd. Inspecting method for semiconductor devices
US20040126575A1 (en) * 2002-07-26 2004-07-01 Nitto Denko Corporation Pressure-sensitive adhesive sheet, method for producing the same and method for using the same as well as a multi-layer sheet for use in the pressure-sensitive adhesive sheet and method for producing the same
US20050191456A1 (en) * 2004-02-26 2005-09-01 Kouichi Hashimoto Adhesive sheet roll for wafer processing
US20070066044A1 (en) * 2005-06-01 2007-03-22 Yoshiyuki Abe Semiconductor manufacturing method
US20080090085A1 (en) * 2002-06-24 2008-04-17 3M Innovative Properties Company Heat curable adhesive composition, article, semiconductor apparatus and method
JP2013038408A (ja) * 2011-07-14 2013-02-21 Nitto Denko Corp 半導体ウェハ固定用粘着テープ、半導体チップの製造方法及び接着フィルム付き粘着テープ
JP5163741B2 (ja) * 2008-04-17 2013-03-13 日立化成株式会社 接着材テープ及び接着材テープ巻重体
WO2014199993A1 (ja) * 2013-06-14 2014-12-18 電気化学工業株式会社 半導体検査用の耐熱性粘着シート
TW201643480A (zh) * 2015-03-03 2016-12-16 Lintec Corp 附有黏著劑層之光學薄膜
TW201708461A (zh) * 2015-03-27 2017-03-01 Lintec Corp 附有黏著劑層之光學薄膜

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US7326592B2 (en) 2005-04-04 2008-02-05 Infineon Technologies Ag Stacked die package
JP4549239B2 (ja) 2005-06-22 2010-09-22 日東電工株式会社 ダイシング用粘着シート
TW200800584A (en) * 2006-04-03 2008-01-01 Gunze Kk Surface protective tape used for back grinding of semiconductor wafer and base film for the surface protective tape
SG174366A1 (en) * 2009-03-16 2011-11-28 Denki Kagaku Kogyo Kk Adhesive and adhesive sheet
JP5324319B2 (ja) 2009-05-26 2013-10-23 日東電工株式会社 ウエハマウント方法とウエハマウント装置
JP2011029331A (ja) * 2009-07-23 2011-02-10 Disco Abrasive Syst Ltd ウエーハの研削方法および保護テープ
WO2012026431A1 (ja) 2010-08-23 2012-03-01 積水化学工業株式会社 接着シート及び半導体チップの実装方法
JP6010945B2 (ja) * 2012-03-16 2016-10-19 住友ベークライト株式会社 ダイシングフィルム
JP2013203925A (ja) * 2012-03-29 2013-10-07 Nitto Denko Corp 水生生物付着防止粘着テープ
FR3005661B1 (fr) * 2013-05-16 2016-06-10 Novacel Sa Film adhesif sensible a la pression et son utilisation pour la protection de surfaces
JP6542502B2 (ja) * 2013-11-15 2019-07-10 三井化学株式会社 拡張性基材フィルム、ダイシングフィルム、半導体用表面保護フィルム、及び半導体装置の製造方法
JP2015156438A (ja) * 2014-02-20 2015-08-27 リンテック株式会社 半導体チップの製造方法
JP6303754B2 (ja) * 2014-04-21 2018-04-04 住友ベークライト株式会社 ダイシングフィルム
JP2015214658A (ja) * 2014-05-12 2015-12-03 三井化学株式会社 拡張性基材フィルム、拡張性粘着フィルム、ダイシングフィルム、拡張性基材フィルムの製造方法、及び半導体装置の製造方法
SG11201609451VA (en) * 2014-06-10 2016-12-29 Lintec Corp Dicing sheet

Patent Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5605844A (en) * 1995-03-31 1997-02-25 Matsushita Electric Industrial Co., Ltd. Inspecting method for semiconductor devices
US20080090085A1 (en) * 2002-06-24 2008-04-17 3M Innovative Properties Company Heat curable adhesive composition, article, semiconductor apparatus and method
US20040126575A1 (en) * 2002-07-26 2004-07-01 Nitto Denko Corporation Pressure-sensitive adhesive sheet, method for producing the same and method for using the same as well as a multi-layer sheet for use in the pressure-sensitive adhesive sheet and method for producing the same
US20050191456A1 (en) * 2004-02-26 2005-09-01 Kouichi Hashimoto Adhesive sheet roll for wafer processing
US20070066044A1 (en) * 2005-06-01 2007-03-22 Yoshiyuki Abe Semiconductor manufacturing method
JP5163741B2 (ja) * 2008-04-17 2013-03-13 日立化成株式会社 接着材テープ及び接着材テープ巻重体
JP2013038408A (ja) * 2011-07-14 2013-02-21 Nitto Denko Corp 半導体ウェハ固定用粘着テープ、半導体チップの製造方法及び接着フィルム付き粘着テープ
WO2014199993A1 (ja) * 2013-06-14 2014-12-18 電気化学工業株式会社 半導体検査用の耐熱性粘着シート
TW201643480A (zh) * 2015-03-03 2016-12-16 Lintec Corp 附有黏著劑層之光學薄膜
TW201708461A (zh) * 2015-03-27 2017-03-01 Lintec Corp 附有黏著劑層之光學薄膜

Also Published As

Publication number Publication date
WO2017169747A1 (ja) 2017-10-05
EP3439021B1 (en) 2025-01-29
SG11201807869SA (en) 2018-10-30
CN108966672B (zh) 2023-08-18
EP3439021A4 (en) 2019-11-27
KR102082065B1 (ko) 2020-02-26
EP3439021A1 (en) 2019-02-06
CN108966672A (zh) 2018-12-07
TW201743375A (zh) 2017-12-16
KR20180100647A (ko) 2018-09-11

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