TWI798327B - Film frame holding device and film frame holding method - Google Patents
Film frame holding device and film frame holding method Download PDFInfo
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- TWI798327B TWI798327B TW108100529A TW108100529A TWI798327B TW I798327 B TWI798327 B TW I798327B TW 108100529 A TW108100529 A TW 108100529A TW 108100529 A TW108100529 A TW 108100529A TW I798327 B TWI798327 B TW I798327B
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
- G03F1/64—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof characterised by the frames, e.g. structure or material, including bonding means therefor
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
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Abstract
本發明提供一種可確認薄膜確實地貼附於遮罩之薄膜框架把持裝置及薄膜框架把持方法。 使用設置於框體之薄膜把持部把持薄膜框架,使薄膜之黏著構件與遮罩抵接。將測量部配置於前端附近與遮罩重疊之第1位置而測定作為距遮罩之表面為止之距離之第1距離,且使測量部移動至前端附近與薄膜框架重疊之第2位置而測定作為距薄膜之膜為止之距離之第2距離。The invention provides a film frame holding device and a film frame holding method capable of confirming that a film is firmly attached to a mask. The film frame is held by the film holding part provided on the frame, so that the adhesive member of the film is in contact with the mask. The measuring part is arranged at the first position near the front end overlapping with the mask to measure the first distance as the distance from the surface of the mask, and the measuring part is moved to the second position near the front end overlapping the film frame and measured as The second distance is the distance from the film to the film.
Description
本發明係關於一種薄膜框架把持裝置及薄膜框架把持方法。 The invention relates to a film frame holding device and a film frame holding method.
專利文獻1中記載有一種薄膜框架把持裝置,其藉由將薄膜把持構件插入至形成於薄膜框架周緣之溝槽中而把持薄膜,將所把持之薄膜與沿大致豎直方向把持之光罩之位置對準,並將薄膜按壓至光罩,藉此將薄膜貼附於光罩。
[先前技術文獻] [Prior Art Literature]
[專利文獻] [Patent Document]
[專利文獻1]國際公開第2016/133054號 [Patent Document 1] International Publication No. 2016/133054
於專利文獻1所記載之發明中,於將薄膜貼附於光罩後,藉由將薄膜把持構件自溝槽中取下而鬆開薄膜,但若於薄膜未確實地貼附於光罩之狀態下將薄膜鬆開,則有薄膜掉落之虞。
In the invention described in
本發明係鑒於此種情況而完成者,其目的在於提供一種可確認薄膜確實地貼附於遮罩之薄膜框架把持裝置及薄膜框架把持方法。 The present invention has been made in view of such circumstances, and an object of the present invention is to provide a film frame holding device and a film frame holding method capable of confirming that a film is reliably attached to a mask.
為了解決上述課題,本發明之薄膜框架把持裝置,係把持如下薄膜而將上述薄膜貼附於沿大致豎直方向保持之大致板狀之遮罩,上述薄膜例如具有大致中空筒狀之薄膜框架、以覆蓋上述薄膜框架之中空部之方式設置於與上述薄膜框架之外周面大致正交之第1面之薄膜之膜、及設置於與上述第1面大致平行之第2面之黏著構件,其特徵在於,具備:作為將複數根棒材組合為大致矩形形狀而成之框狀之構件之框體,設置於上述框體且把持上述薄膜框架之上述外周面之薄膜把持部,設置於上述框體之測量部,及控制上述框體、上述薄膜把持部及上述測量部之控制部,上述測量部以可於前端附近與上述遮罩重疊之第1位置和上述前端附近與上述薄膜框架重疊之第2位置之間移動之方式設置,自與上述棒材之延設方向大致正交之方向觀察,上述薄膜把持部與上述測量部係設置於不同之位置,上述控制部於上述薄膜把持部把持上述薄膜框架、且將上述框體沿大致垂直方向延設並且使上述黏著構件與上述遮罩抵接之狀態下,將上述測量部配置於上述第1位置而測定作為距上述遮罩之表面為止之距離之第1距離,使上述測量部移動至上述第2位置而測定作為距上述薄膜之膜為止之距離之第2距離。 In order to solve the above-mentioned problems, the film frame holding device of the present invention is to hold the following film and attach the above-mentioned film to a substantially plate-shaped mask maintained in a substantially vertical direction. The above-mentioned film has, for example, a substantially hollow cylindrical film frame, The film of the film provided on the first surface substantially perpendicular to the outer peripheral surface of the above-mentioned film frame so as to cover the hollow portion of the above-mentioned film frame, and the adhesive member provided on the second surface substantially parallel to the above-mentioned first surface, wherein It is characterized by comprising: a frame body which is a frame-shaped member formed by combining a plurality of rods into a substantially rectangular shape; The measurement part of the body, and the control part that controls the above-mentioned frame body, the above-mentioned film holding part and the above-mentioned measurement part, the above-mentioned measurement part can overlap the first position with the above-mentioned mask near the front end and overlap with the above-mentioned film frame near the front end The method of moving between the second positions is set, and when viewed from a direction approximately perpendicular to the extension direction of the above-mentioned rod, the above-mentioned film holding part and the above-mentioned measuring part are arranged at different positions, and the above-mentioned control part is held by the above-mentioned film holding part The above-mentioned film frame and the above-mentioned frame body are extended in a substantially vertical direction and the above-mentioned adhesive member is in contact with the above-mentioned mask, and the above-mentioned measuring part is arranged at the above-mentioned first position to measure the distance from the surface of the above-mentioned mask. The first distance of the distance is to move the above-mentioned measuring part to the above-mentioned second position to measure the second distance which is the distance from the film of the above-mentioned thin film.
根據本發明之薄膜框架把持裝置,使黏著構件與遮罩抵接,將測量部配置於前端附近與遮罩重疊之第1位置而測定作為距遮罩之表面為止之距離之第1距離,使測量部移動至前端附近與上述薄膜框架重疊之第2位置而測定作為距薄膜之膜為止之距離之第2距離。藉此,可確認薄膜確實地貼附於遮罩。 According to the film frame gripping device of the present invention, the adhesive member is brought into contact with the mask, the measuring unit is arranged at the first position overlapping the mask near the front end, and the first distance as the distance from the surface of the mask is measured, so that The measurement unit moves to the second position where the vicinity of the front end overlaps with the film frame, and measures the second distance which is the distance from the film of the film. Thereby, it can be confirmed that the film is reliably attached to the mask.
上述薄膜把持部可具有以可於與上述外周面抵接之抵接位置和不與上述外周面抵接之退避位置之間沿水平方向或垂直方向移動之方式設置之薄膜把持構件,上述框體可沿水平方向移動,上述控制部於將上述薄膜把持構件配置於上述抵接位置而把持上述薄膜框架且將上述框體沿大致垂直方向延設 之狀態下,使上述框體沿水平方向移動而使上述黏著構件與上述遮罩抵接,將上述測量部配置於上述第1位置而測定上述第1距離,且使上述測量部移動至上述第2位置而測定上述第2距離,於上述第1距離與上述第2距離之差為閾值以下之情形時,使上述薄膜把持構件可自上述抵接位置向上述退避位置移動。藉此,可防止於薄膜未確實地貼附於遮罩之狀態(第1距離與第2距離之差不為閾值以下之情形)時薄膜被鬆開而掉落之情況。 The film gripping portion may have a film gripping member that can move horizontally or vertically between a contact position that contacts the outer peripheral surface and a retracted position that does not contact the outer peripheral surface, and the frame body The control unit is capable of moving in the horizontal direction, and the control unit arranges the film holding member at the contact position to hold the film frame and extend the frame body in a substantially vertical direction. In this state, the frame is moved in the horizontal direction to bring the adhesive member into contact with the mask, the measuring unit is arranged at the first position to measure the first distance, and the measuring unit is moved to the first position. The second distance is measured at two positions, and when the difference between the first distance and the second distance is equal to or less than a threshold value, the film holding member can be moved from the contact position to the retracted position. Thereby, it is possible to prevent the film from being loosened and falling when the film is not firmly attached to the mask (the difference between the first distance and the second distance is not equal to or less than the threshold value).
上述測量部可於使上述黏著構件與上述遮罩抵接時之姿勢下具有設置於上述框體之上側附近且左端附近之第1測量部、及設置於上述框體之上側附近且右端附近之第2測量部。藉此,測量部可測定遮罩或薄膜之上端部、以及左右兩端附近之點。又,於將薄膜貼附於遮罩時,可發現貼附薄膜之一端而未貼附薄膜之另一端之異常。 The measurement unit may have a first measurement unit provided near the upper side and near the left end of the frame, and a first measurement unit provided near the upper side and near the right end of the frame when the adhesive member is brought into contact with the mask. 2nd measurement department. Thereby, the measurement unit can measure the upper end of the mask or the film, and the points near the left and right ends. Also, when attaching the film to the mask, it can be found that one end of the film is attached but the other end of the film is not attached.
上述框體可於使上述黏著構件與上述遮罩抵接時之姿勢下具有大致豎直地延設之大致棒狀之第1縱框部及第2縱框部、以及大致水平地延設於上述第1縱框部及上述第2縱框部之上端附近之上框部,上述第1縱框部及上述第2縱框部可沿上述上框部之延設方向移動,上述上框部可沿上述第1縱框部及上述第2縱框部之延設方向移動,上述薄膜把持部係設置於上述第1縱框部及上述第2縱框部,上述測量部係設置於上述上框部。藉此,可改變由第1縱框部、第2縱框部、上框部構成之框之大小,而應對各種大小之薄膜。又,可不論薄膜之大小而皆於薄膜之上端附近之位置測定薄膜之膜之高度。 The frame body may have a substantially rod-shaped first vertical frame portion and a second vertical frame portion extending substantially vertically in a posture when the adhesive member is brought into contact with the mask, and a substantially horizontally extending frame portion. The upper frame portion near the upper end of the first vertical frame portion and the second vertical frame portion, the first vertical frame portion and the second vertical frame portion can move along the extending direction of the upper frame portion, and the upper frame portion Can move along the extension direction of the first vertical frame part and the second vertical frame part, the film holding part is installed on the first vertical frame part and the second vertical frame part, and the measuring part is installed on the upper box part. Thereby, the size of the frame constituted by the first vertical frame portion, the second vertical frame portion, and the upper frame portion can be changed to cope with films of various sizes. Also, the film height of the film can be measured at a position near the upper end of the film regardless of the size of the film.
上述框體可具有大致水平地延設於上述第1縱框部及上述第2縱框部之下端附近之下框部,上述測量部可具有設置於上述下框部之第3測量部。藉此,可更確實地確認是否貼附薄膜。 The frame body may have a lower frame portion extended substantially horizontally near the lower ends of the first vertical frame portion and the second vertical frame portion, and the measurement unit may have a third measurement portion provided on the lower frame portion. In this way, it is possible to more reliably confirm whether or not the film is attached.
上述框體能以於使上述黏著構件與上述遮罩抵接時上端側之上述第2面與上述遮罩之距離較下端側之上述第2面與上述遮罩之距離更近之方式 傾斜。藉此,可防止產生黏著構件與遮罩局部抵接而無法將薄膜貼附於遮罩之問題。又,藉由將薄膜之上端部貼附於遮罩,根據在遮罩及薄膜之上端附近測定遮罩之表面之高度及薄膜之膜之高度所獲得之結果判定薄膜是否貼附於遮罩,而可準確地判定薄膜之貼附狀態。 The frame body can be configured such that the distance between the second surface on the upper end side and the mask is closer than the distance between the second surface on the lower end side and the mask when the adhesive member is brought into contact with the mask. tilt. Thereby, it is possible to prevent the problem that the adhesive member and the mask partially abut and the film cannot be attached to the mask. Also, by attaching the upper end of the film to the mask, it is determined whether the film is attached to the mask based on the results obtained by measuring the height of the surface of the mask and the height of the film of the film near the upper end of the mask and the film, It can accurately determine the sticking state of the film.
為了解決上述課題,本發明之薄膜框架把持方法,係把持薄膜而將其貼附於保持於大致豎直方向上之大致板狀之遮罩,上述薄膜例如具有大致中空筒狀之薄膜框架、以覆蓋上述薄膜框架之中空部之方式設置於與上述薄膜框架之外周面大致正交之第1面之薄膜之膜、及設置於與上述第1面大致平行之第2面之黏著構件,其特徵在於:其將以可沿水平方向移動之方式設置於框體之薄膜把持構件配置於與上述外周面抵接之抵接位置而把持上述薄膜框架,於把持上述薄膜框架之狀態下使上述框體平行移動而使上述黏著構件與上述遮罩抵接,將設置於上述框體之測量部配置於前端附近與上述遮罩重疊之第1位置,測定作為距上述遮罩之表面為止之距離之第1距離,使上述測量部移動至上述前端附近與上述薄膜框架重疊之第2位置,測定作為距上述薄膜之膜為止之距離之第2距離,於上述第1距離與上述第2距離之差為閾值以下之情形時,使上述薄膜把持構件可自上述抵接位置向不與上述外周面抵接之退避位置移動。 In order to solve the above problems, the film frame holding method of the present invention is to hold the film and attach it to a substantially plate-shaped mask maintained in a substantially vertical direction. The above-mentioned film has, for example, a substantially hollow cylindrical film frame, and The film of the film provided on the first surface substantially perpendicular to the outer peripheral surface of the above-mentioned film frame in such a manner as to cover the hollow portion of the above-mentioned film frame, and the adhesive member provided on the second surface substantially parallel to the above-mentioned first surface are characterized in that In that, it arranges the film holding member provided on the frame so as to be movable in the horizontal direction at the abutting position against the above-mentioned outer peripheral surface to hold the above-mentioned film frame, and make the above-mentioned frame body in the state of holding the above-mentioned film frame. The above-mentioned adhesive member is moved parallel to the above-mentioned mask, and the measuring part provided on the above-mentioned frame is arranged at the first position overlapping the above-mentioned mask near the front end, and the second distance as the distance from the surface of the above-mentioned mask is measured. 1 distance, the above-mentioned measuring part is moved to the second position where the vicinity of the above-mentioned front end overlaps with the above-mentioned film frame, and the second distance is measured as the distance from the film of the above-mentioned film. The difference between the above-mentioned first distance and the above-mentioned second distance is When it is below the threshold value, the film gripping member can be moved from the contact position to the retreat position where it does not come into contact with the outer peripheral surface.
根據本發明,可確認將薄膜確實地貼附於光罩。 According to the present invention, it can be confirmed that the film is reliably attached to the photomask.
1:薄膜框架把持裝置 1: film frame holding device
10:框體 10: frame
11、12:縱框部 11, 12: Vertical frame part
13、14:上框部 13, 14: Upper frame part
15:框 15: box
15a:下端部 15a: lower end
15b:上端部 15b: upper end
16:驅動部 16: Drive Department
20:薄膜把持部 20: film holding part
21:薄膜把持構件 21: film holding member
22:驅動構件 22: Drive components
22a:桿 22a: Rod
22b:致動器 22b: Actuator
30:測量部 30: Measurement department
31:超音波感測器 31: Ultrasonic sensor
32:反射板 32: reflector
32a:反射部 32a: reflection part
33:致動器 33: Actuator
100:薄膜 100: film
101:薄膜框架 101: Film frame
101a:上表面 101a: upper surface
101b:下表面 101b: lower surface
101c:外周面 101c: outer peripheral surface
101d:溝槽 101d: Groove
101e:中空部 101e: hollow part
102:薄膜之膜 102: Membrane of Membrane
103:黏著構件 103: Adhesive components
151:CPU 151: CPU
151a:控制部 151a: Control Department
152:RAM 152: RAM
153:ROM 153:ROM
154:輸入輸出介面 154: Input and output interface
155:通訊介面 155: communication interface
156:媒體介面 156:Media interface
161:輸入輸出裝置 161: Input and output device
162:網路 162: Network
163:儲存媒體 163: storage media
M:遮罩 M: mask
圖1係表示第1實施形態之薄膜框架把持裝置1之概略之前視圖。
Fig. 1 is a schematic front view showing a film
圖2係表示薄膜100之概略之立體圖。
FIG. 2 is a perspective view schematically showing the
圖3係圖2之A-A剖面圖。 Fig. 3 is the A-A sectional view of Fig. 2 .
圖4係表示薄膜把持部20之概略之圖。
FIG. 4 is a diagram showing the outline of the
圖5係示意性地表示測量部30位於第1位置之狀態之圖。
FIG. 5 is a diagram schematically showing a state where the measuring
圖6係示意性地表示測量部30位於第2位置之狀態之圖。
FIG. 6 is a diagram schematically showing a state where the
圖7係表示薄膜框架把持裝置1之電氣構成之方塊圖。
FIG. 7 is a block diagram showing the electrical configuration of the film
圖8係表示薄膜框架把持裝置1所進行之處理之流程之流程圖。
FIG. 8 is a flow chart showing the flow of processing performed by the film
圖9係表示步驟S107之處理之流程之流程圖。 FIG. 9 is a flowchart showing the flow of processing in step S107.
圖10係表示步驟S107所示之檢查時之情況之示意圖。 FIG. 10 is a schematic diagram showing the situation during the inspection shown in step S107.
圖11係表示步驟S107所示之檢查時之情況之示意圖。 FIG. 11 is a schematic diagram showing the situation during the inspection shown in step S107.
以下,參照圖式對本發明之實施形態進行詳細說明。於各圖式中,對相同之要素標註相同之符號,對於重複之部分省略說明。 Hereinafter, embodiments of the present invention will be described in detail with reference to the drawings. In each figure, the same code|symbol is attached|subjected to the same element, and description of the part which overlaps is abbreviate|omitted.
〈第1實施形態〉 <First Embodiment>
圖1係表示第1實施形態之薄膜框架把持裝置1之概略之前視圖。薄膜框架把持裝置1係將薄膜100貼附於保持於大致豎直方向上之大致板狀之遮罩M者。遮罩M藉由未圖示之遮罩把持裝置而保持於大致豎直方向上。
Fig. 1 is a schematic front view showing a film
首先,對薄膜100進行說明。圖2係表示薄膜100之概略之立體圖。圖3係圖2之A-A剖面圖。薄膜100主要具有薄膜框架101、撐設於薄膜框架101上之薄膜之膜102、及於薄膜框架101形成於下表面之黏著構件103(參照圖3)。
First, the
薄膜框架101係具有大致矩形之外周之框狀(大致中空筒狀),由例如鐵、鋁等金屬所形成。薄膜框架101於俯視(自圖2之紙面上方觀察)下為大致矩形形狀,於中央部具有中空部101e。於薄膜框架101以覆蓋中空部101e
之方式設置薄膜之膜102。薄膜框架101中,中空部101e之大小與光罩之大小(例如520mm×800mm~1620mm×1780mm左右)為相同程度。薄膜框架101之框狀部分之寬度為數十mm左右,厚度為2mm~10mm左右。
The
薄膜框架101具有大致平行之上表面101a及下表面101b。又,與薄膜框架101之上表面101a及下表面101b正交之外周面101c包含溝槽101d。溝槽101d係沿外周面101c形成,高度及深度為2mm左右。於溝槽101d中插入設置於框體10之薄膜把持構件21(下文詳細說明)。
The
薄膜之膜102為次微米之厚度之薄膜。薄膜之膜102係以覆蓋薄膜框架101之中空部101e之方式撐設於薄膜框架101之上表面101a。若將薄膜框架101貼附於光罩基板上,則薄膜之膜102與遮罩M之圖案形成面(表面)以既定之間隔設置。
The film of
黏著構件103係設置於薄膜框架101之下表面101b。黏著構件103以邊框狀形成於薄膜框架101之整個周邊。又,黏著構件103以不自薄膜框架101伸出之方式設置。
The
返回至圖1之說明。薄膜框架把持裝置1主要具有框體10、薄膜把持部20、及測量部30。薄膜把持部20及測量部30係設置於框體10。
Return to the description of FIG. 1 . The film
框體10係將複數根棒材組合為大致矩形形狀而成之框狀之構件。框體10主要具有縱框部11、12、上框部13、14、以及設置於縱框部11、12及上框部13、14之外側之框15。縱框部11、12、上框部13、14及框15係由例如鐵、鋁等金屬形成。
The
縱框部11、12係於圖1所示之將薄膜100貼附於遮罩M(使黏著構件103與遮罩M抵接)時之姿勢下大致豎直地延設之大致棒狀之構件,長度方向沿z方向設置。縱框部11、12係以可沿框15之下端部15a及上端部15b、即沿x方向移動之方式設置。使縱框部11、12沿x方向移動之機構可使用已公知之各
種技術。
The
上框部13、14分別為於圖1所示之將薄膜100貼附於遮罩M時之姿勢下大致水平地延設於縱框部11、12之上端附近之大致棒狀之構件,長度方向沿x方向設置。上框部13、14係分別以可沿縱框部11、12、即沿z方向移動之方式設置。使上框部13、14沿z方向移動之機構可使用已公知之各種技術。
The
此外,上框部13、14之形態並不限於此。例如,亦可為上框部由大致水平地延設之1根棒材所構成,該1根棒材之兩端附近設置於縱框部11、12。
In addition, the form of the
如上所述,藉由使縱框部11、12及上框部13、14可移動,而可改變由縱框部11、12、上框部13、14及下端部15a所構成之框之大小,從而應對各種大小之薄膜100。此外,薄膜100例如可列舉420mm×720mm之大小者、700mm×800mm之大小者、520mm×680mm之大小者、750mm×1300mm之大小者、1520mm×1680mm之大小者。
As described above, by making the
框體10係以可藉由未圖示之移動機構而沿水平方向移動之方式設置。於將薄膜100貼附於遮罩M時,框體10係沿+y方向平行移動。框體10具有驅動部16(參照圖7)、及使框體10沿水平方向移動之機構。使框體10沿水平方向移動之機構係公知,因此省略說明。
The
又,框體10於下端部附近設置未圖示之轉動軸。框體10能以轉動軸為中心,於由框15形成之面成為大致水平(與xy平面大致平行)之位置與由框15形成之面成為大致豎直(與xz平面大致平行)之位置之間轉動。於圖1中,於框體10把持薄膜100之狀態下,框體10以上端側(+z側)之下表面101b(圖1中之紙面內側)與遮罩M之距離較下端側(-z側)之下表面101b與上述遮罩之距離更近之方式相對於豎直方向傾斜。
In addition, the
薄膜把持部20具有複數個把持薄膜框架101之外周面101c之薄膜
把持構件21。薄膜把持構件21係設置於縱框部11、12、上框部13、14、下端部15a及上端部15b。
The
於圖1所示之例中,於縱框部11、12分別設置5個薄膜把持構件21,於上框部13、14分別設置1個薄膜把持構件21,於下端部15a設置5個薄膜把持構件21,於上端部15b設置1個薄膜把持構件21,但薄膜把持構件21之位置及數量並不限於此。
In the example shown in FIG. 1, five
根據薄膜100之大小,所使用之薄膜把持構件21有所不同。於圖1中,設置於框體10之薄膜把持構件21中,僅使用抵接於薄膜100(此處為外周面101c)之薄膜把持構件21。
Depending on the size of the
薄膜把持構件21以能於與外周面101c抵接之抵接位置和不與外周面101c抵接之退避位置之間沿水平方向或垂直方向移動之方式設置。圖4係表示薄膜把持部20之概略之圖。
The
薄膜把持構件21係由金屬製之板材形成。此外,薄膜把持構件21並不限於板狀之構件,例如亦可使用棒狀之構件而形成。
The
於薄膜把持構件21設置驅動構件22。驅動構件22具有桿22a、及使桿22a移動之致動器22b。薄膜把持構件21係連結於桿22a。致動器22b係設置於框體10(圖4中省略圖示)。
The
薄膜把持構件21藉由驅動構件22而於將薄膜把持構件21插入至溝槽101d中之插入位置(參照圖4實線)與未將薄膜把持構件21插入至溝槽101d中而薄膜把持構件21不與薄膜框架101干涉之退避位置(參照圖4一點鎖線)之間沿水平方向移動。
The
薄膜把持構件21之前端藉由以樹脂(例如,超高分子量聚乙烯)形成之片材等所覆蓋。藉此,於將薄膜把持構件21插入至溝槽101d中時,可防止薄膜把持構件21或薄膜框架101被磨削而產生塵屑。
The front end of the
返回至圖1之說明。測量部30測定遮罩M或薄膜框架101之高度(y方向之位置)。測量部30係設置於框體10(此處為上框部13、14)。測量部30係設置於不與薄膜把持構件21干涉之位置。換言之,自與構成框體10之棒材(例如,上框部13、14)之延設方向大致正交之方向(此處為y方向)觀察,測量部30與薄膜把持構件21係設置於不同之位置。
Return to the description of FIG. 1 . The measuring
測量部30係以可於前端附近與遮罩M重疊之第1位置(參照圖1實線)與前端附近與薄膜框架101重疊之第2位置(參照圖1二點鎖線)之間沿垂直方向移動之方式設置。
The
設置於上框部13之測量部30係設置於縱框部11之附近,設置於上框部14之測量部30係設置於縱框部12之附近。換言之,2個測量部30係分別設置於框體10之上側附近且左端附近,且設置於框體10之上側附近且右端附近。藉此,測量部30可測定遮罩M或薄膜框架101之上端部、且左右兩端附近之點。但設置測量部30之位置及數量並不限於圖1所示之形態。
The
圖5係示意性地表示測量部30位於第1位置之狀態之圖。圖6係示意性地表示測量部30位於第2位置之狀態之圖。
FIG. 5 is a diagram schematically showing a state where the measuring
測量部30主要具有超音波感測器31、及反射板32。超音波感測器31係向對象物發送超音波並接收其反射波,根據訊號發送與反射波接收之時間間隔測定距目標物之距離之測距感測器。超音波感測器31已公知,因此省略詳細之說明。
The
反射板32將由超音波感測器31發送之超音波進行反射。藉由將反射板32之反射部32a於yz平面上傾斜45度地設置,而於反射部32a中將自超音波感測器31向下(朝向-z)發送之超音波向+y方向反射(參照圖5、6中之2點鎖線)。
The
此外,於本實施形態中,測量部30具有超音波感測器31,但用
以求出距離之感測器並不限於超音波感測器31。作為測距感測器,亦可使用利用光求距離之光學式感測器、或渦電流式之感測器。作為光學式感測器,例如可使用利用雷射之雷射位移感測器、或三角測距式光學感測器。但較理想為使用非接觸式之感測器作為測量部30。又,於本實施形態中設置有反射板32,但亦可不使用反射板32。於此情形時,以向+y方向發送超音波之方式設置超音波感測器31即可。
In addition, in this embodiment, the
測量部30具有致動器33。致動器33使超音波感測器31及反射板32於第1位置與第2位置之間沿z方向(垂直方向)移動。
The measuring
於圖5中,測量部30之測量位置(此處為測量部30之前端(-z端))附近與遮罩M重疊。因此,自超音波感測器31發送之超音波到達遮罩M之表面Ma,測量部30測定反射部32a與表面Ma之距離、即表面Ma之高度(y方向之位置)。
In FIG. 5 , the vicinity of the measurement position of the measurement unit 30 (here, the front end (-z end) of the measurement unit 30 ) overlaps the mask M. Therefore, the ultrasonic wave transmitted from the
於圖6中,測量部30之測量位置(此處為測量部30之前端(-z端))附近與薄膜框架101重疊。因此,自超音波感測器31發送之超音波到達薄膜之膜102,測量部30測定反射部32a與薄膜之膜102之距離、即薄膜之膜102之高度。於將薄膜100貼附於遮罩M之情形時,遮罩M之高度與薄膜之膜102之高度之差成為閾值以下。
In FIG. 6 , the vicinity of the measurement position of the measurement unit 30 (here, the front end (-z end) of the measurement unit 30 ) overlaps the
圖7係表示薄膜框架把持裝置1之電氣構成之方塊圖。薄膜框架把持裝置1具有CPU(Central Processing Unit)151、RAM(Random Access Memory)152、ROM(Read Only Memory)153、輸入輸出介面(I/F)154、通訊介面(I/F)155、及媒體介面(I/F)156,其等與驅動部16、致動器22b、測量部30等互相連接。
FIG. 7 is a block diagram showing the electrical configuration of the film
CPU 151係根據儲存於RAM 152、ROM 153中之程式動作,進行各部之控制。自驅動部16、致動器22b、測量部30向CPU 151輸入訊號。自
CPU 151輸出之訊號被輸出至驅動部16、致動器22b、測量部30。
The
RAM 152係揮發性記憶體。ROM 153係儲存各種控制程式等之非揮發性記憶體。CPU 151根據儲存於RAM 152、ROM 153中之程式動作,進行各部之控制。又,ROM 153儲存薄膜框架把持裝置1之起動時CPU 151所進行之啟動程式、或依賴於薄膜框架把持裝置1之硬體之程式等。又,RAM 152儲存CPU 151所執行之程式及CPU 151所使用之資料等。
CPU 151經由輸入輸出介面154控制鍵盤或滑鼠等輸入輸出裝置161。通訊介面155經由網路162自其他機器接收資料並傳送至CPU 151,並且將CPU 151產生之資料經由網路162傳送至其他機器。
The
媒體介面156讀取儲存於儲存媒體163之程式或資料並儲存至RAM 152中。此外,儲存媒體163例如為IC卡、SD卡、DVD等。
The
此外,實現各功能之程式係例如自儲存媒體163中讀出,經由RAM 152而被安裝於薄膜框架把持裝置1中,由CPU 151執行。
In addition, the program which realizes each function is read from the
CPU 151具有根據輸入訊號控制薄膜框架把持裝置1之各部之控制部151a之功能。控制部151a藉由執行CPU 151所讀入之既定之程式而構建。下文對控制部151a所進行之處理進行詳細說明。
The
於說明本實施形態之特徵時,圖7所示之薄膜框架把持裝置1之構成係對主要構成進行說明,並不排除例如通常之資訊處理裝置所具備之構成。圖7所示之功能構成係為了使薄膜框架把持裝置1之構成容易理解所分類者,構成要素之分類之方法或名稱並不限定於圖7所記載之形態。薄膜框架把持裝置1之構成可根據處理內容進一步分類為較多之構成要素,亦可為1個構成要素執行複數個構成要素之處理。
In describing the features of this embodiment, the configuration of the film
對由此構成之薄膜框架把持裝置1之作用進行說明。圖8係表示薄膜框架把持裝置1所進行之處理之流程之流程圖。以下之處理主要藉由控制
部151a進行。
The operation of the film
首先,控制部151a控制致動器22b使薄膜把持構件21自退避位置向插入位置移動,將薄膜把持構件21插入至溝槽101d中(步驟S101)。控制部151a係對各薄膜把持構件21逐個進行步驟S101之處理。藉此,薄膜框架把持裝置1把持薄膜100。使薄膜把持構件21於退避位置與插入位置之間移動之量係預先設定而儲存於ROM 153中。
First, the
控制部151a驅動驅動部16使框體10沿大致垂直方向轉動(步驟S102)。框體10把持薄膜100,因此薄膜100亦與框體10一起轉動。其次,控制部151a使用未圖示之檢查部,對由框體10把持之薄膜100進行檢查(步驟S103)。檢查部具有發送雷射束等之發送部,使用已公知之各種方法對薄膜100進行檢查。步驟S103已公知,因此省略說明。
The
若藉由檢查處理(步驟S103)確認薄膜100無異常,則控制部151a使用驅動部16使框體10向載置有遮罩M之裝置內平行移動(步驟S104)。然後進行遮罩M與薄膜100之位置對準(對準)(步驟S105)。於步驟S104、S105中,控制部151a藉由驅動部16使框體10轉動,以上端側之下表面101b(即黏著構件103)與遮罩M之距離較下端側之下表面101b(即黏著構件103)與遮罩M之距離更近之方式使框體10傾斜。該傾斜相對於豎直方向為微小角度。
If it is confirmed that there is no abnormality in the
對準(步驟S105)後控制部151a將薄膜100貼附於光罩(步驟S106)。步驟S106係所謂之暫貼附步驟。
After alignment (step S105), the
控制部151a藉由驅動部16以使框體10相對於豎直方向僅傾斜微小角度之狀態使框體10平行移動(此處為向+y方向移動),而使薄膜100靠近遮罩M。由此,薄膜100與遮罩M抵接。控制部151a於該狀態下使薄膜100向靠近遮罩M之方向(+y方向)移動。然而,由於薄膜100與遮罩M抵接,故而薄膜100被遮罩M按壓,藉由黏著構件103將薄膜100貼附於遮罩M。
The
於貼附步驟(步驟S106)中,薄膜100相對於遮罩M僅傾斜微小角度。與此相對,於薄膜100相對於遮罩M未傾斜而大致平行之情形時,因薄膜100之形變等導致黏著構件103與遮罩M僅局部抵接,因此存在無法使薄膜100貼附於遮罩M之可能性。因此,較理想為使薄膜100相對於遮罩M僅傾斜微小角度。
In the attaching step (step S106 ), the
其次,控制部151a使用測量部30檢查是否將薄膜100貼附於遮罩M(步驟S107)。圖9係表示步驟S107之處理之流程之流程圖。
Next, the
首先,控制部151a如圖5所示將測量部30配置於第1位置。然後,自超音波感測器31發送超音波,測定遮罩M之表面Ma之高度(y方向之位置)(步驟S201)。
First, the
其次,控制部151a藉由致動器33使超音波感測器31及反射板32移動,而如圖6所示將測量部30配置於第2位置。然後,自超音波感測器31發送超音波,測定薄膜之膜102之高度(y方向之位置)(步驟S202)。此外,使超音波感測器31及反射板32自第1位置向第2位置移動之距離係預先設定而儲存於ROM 153中。
Next, the
其後,控制部151a將遮罩M之高度與薄膜之膜102之高度之差與閾值T加以比較(步驟S203)。閾值T預先設定為任意值。例如,於薄膜框架101之厚度大致為7mm、黏著構件103之厚度大致為1mm之情形時,閾值T大致為8mm。關於閾值T之資訊(此處為值)係儲存於ROM 153中。
Thereafter, the
控制部151a根據步驟S203中之比較結果,判定薄膜100之貼附狀態(步驟S204)。於遮罩M之高度與薄膜之膜102之高度之差不為閾值以下之情形(步驟S204中為「否」)時,控制部151a判定未將薄膜100貼附於遮罩M。於未將薄膜100貼附於遮罩M之情形時,控制部151a返回至使框體10平行移動而使薄膜100靠近遮罩M之處理(步驟S106),再次進行步驟S107之貼附檢查處
理。於即便將步驟S106、S107重複數次而遮罩M之高度與薄膜之膜102之高度之差仍不為閾值以下之情形時,控制部151a停止處理。
The
於遮罩M之高度與薄膜之膜102之高度之差為閾值以下之情形(步驟S204中為「是」)時,控制部151a判定已將薄膜100貼附於遮罩M,而解除薄膜100之把持(步驟S108,參照圖8)。於步驟S108中,控制部151a控制致動器22b使薄膜把持構件21自插入位置向退避位置移動,避免薄膜把持構件21之前端與溝槽101d抵接。
When the difference between the height of the mask M and the height of the
然後,控制部151a結束圖8所示之一系列處理。若該一系列處理結束,則控制部151a使用未圖示之按壓部將薄膜100之四角向遮罩M按壓,而將薄膜100貼附於遮罩M(所謂之正式貼附)。
Then, the
圖10、11係表示步驟S107所示之檢查時之情況之示意圖。圖10之虛線表示未設置薄膜之膜102時之薄膜框架101之情況,圖10之實線表示設置有薄膜之膜102時之薄膜框架101之情況。若於薄膜框架101設置薄膜之膜102,則藉由薄膜之膜102之張力,於沿薄膜框架101之中心軸觀察時,薄膜框架101之各邊之中央部分進入內側。於本實施形態中,測量部30係設置於框體10(圖10中省略圖示)之上側附近且左右兩端附近,測量部30對薄膜100之上端附近且左右兩端附近之高度進行測定,因此,即便薄膜框架101變形,於第2位置測量部30亦可測定薄膜之膜102之高度。
10 and 11 are schematic diagrams showing the situation during the inspection shown in step S107. The dotted line in FIG. 10 shows the situation of the
又,如圖11所示,於將薄膜100貼附於遮罩M時,假定產生貼附薄膜100之一端(例如,+x側之端),而未貼附薄膜100之另一端(例如,-x側之端)之異常之情形。於本實施形態中,由於測量部30對薄膜100之上端附近且左右兩端附近之高度進行測定,故而若產生此種異常,則於一測量部30(此處為+x側之測量部30)中,遮罩M之高度與薄膜之膜102之高度之差成為閾值以下,但於另一測量部30(此處為-x側之測量部30)中,遮罩M之高度與薄膜
之膜102之高度之差不為閾值以下。因此,藉由將設置於上框部13之測量部30設置於縱框部11之附近,將設置於上框部14之測量部30設置於縱框部12之附近,而可檢測此種異常。
Also, as shown in FIG. 11 , when the
根據本實施形態,可確認將薄膜100確實地貼附於遮罩M。因此,可防止於未將薄膜100確實地貼附於遮罩M之狀態下鬆開薄膜100而薄膜100掉落之狀況。
According to this embodiment, it can be confirmed that the
於利用例如使框體10移動之馬達等之座標確認薄膜100之貼附狀態之情形時,有因薄膜把持構件21之損傷等導致薄膜100與遮罩M之位置關係與假定不同,而於未將薄膜100貼附於遮罩M之狀態下鬆開薄膜100之虞。尤其是於尺寸較大之薄膜100之情形時,掉落1塊薄膜100會導致產生1000萬日元左右之高額損失。因此,如本實施形態般,藉由確認將薄膜100確實地貼附於遮罩M,可減少無謂之成本。
When the attached state of the
又,根據本實施形態,由於實際測定遮罩M之表面Ma與薄膜100之距離而確認貼附狀態,故而即便於操作各種厚度之薄膜框架101之情形時,薄膜框架把持裝置1亦可容易地應對。
Also, according to this embodiment, since the distance between the surface Ma of the mask M and the
又,根據本實施形態,藉由使框體10、即薄膜100以相對於豎直方向僅傾斜微小角度之狀態平行移動而將黏著構件103按壓至遮罩M,從而將薄膜100之上端部貼附於遮罩M,於遮罩M及薄膜100之上端附近,根據測定表面Ma之高度及薄膜之膜102之高度所獲得之結果判定是否將薄膜100貼附於遮罩M,因此可準確地判定薄膜100之貼附狀態。
Also, according to the present embodiment, by moving the
此外,於本實施形態中,薄膜框架把持裝置1具有2個測量部30,且將2個測量部30設置於框體10之上側附近且左右兩端附近,但設置測量部30之位置及數量並不限於此。2個測量部30亦可設置於縱框部11、12之上端附近而非設置於上框部13、14。於此情形時,致動器33使超音波感測器31及反
射板32於第1位置與第2位置之間沿x方向(水平方向)移動即可。
In addition, in this embodiment, the film
又,例如,亦可為薄膜框架把持裝置1具有3個測量部30,且將3個測量部30設置於上框部13、14及下端部15a。藉由在薄膜100之上下端附近測定薄膜之膜102之高度,而可更確實地確認是否貼附薄膜100。於此情形時,於使薄膜100抵接於遮罩M時,上端側之下表面101b與遮罩M之距離較下端側之下表面101b與遮罩M之距離更近,因此於步驟S203、204中,可使下端側之閾值大於上端側之閾值。此外,設置於下端部15a之測量部30較理想為配置於下端部15a之x方向大致中央部。
Moreover, for example, the film
又,例如,測量部30亦可設置於上端部15b而非設置於上框部13、14。由於將測量部30設置於上端部15b,故而可於薄膜100之上端附近之位置測定薄膜之膜102之高度。於設置於上端部15b之測量部30為1個之情形時,測量部30較理想為設置於框體10之中央附近。但為了檢測將薄膜100之一部分(例如+x端)貼附於遮罩M、未將另一部分(例如-x端)貼附於遮罩M之狀態,較理想為將測量部30設置於框體10之上側且左右兩端附近。
Also, for example, the
又,於本實施形態中,主要以縱框部11、12或上框部13、14可相對於框15移動之方式設置,以使框體10可把持各種大小之薄膜100,但縱框部11、12或上框部13、14並非必需。例如,於框體10只要可把持1種薄膜100即可之情形時,僅框15即可。於此情形時,測量部30對薄膜100之上側附近且左右兩端附近之點進行測定,故而較理想為設置於處於框15之上側之2個角附近。
Also, in the present embodiment, the
以上已參照圖式對本發明之實施形態進行了詳細說明,但具體之構成並不限於該實施形態,亦包括不脫離本發明之主旨之範圍之設計變更等。只要為本技術領域中具有通常知識者,則可對實施形態之各要素進行適當變更、追加、轉換等。 The embodiment of the present invention has been described in detail above with reference to the drawings, but the specific configuration is not limited to the embodiment, and design changes within the scope of the present invention are also included. Appropriate changes, additions, conversions, and the like can be made to each element of the embodiment as long as those with ordinary knowledge in the technical field can do so.
又,於本發明中,所謂「大致」係不僅包括嚴格相同之情形,而且包括不喪失同一性之程度之誤差或變形之概念。例如,所謂大致平行並不限於嚴格平行之情形,係包括例如數度左右之誤差之概念。又,例如,於僅表述為平行、正交等之情形時,不僅包括嚴格平行、正交等情形,而且包括大致平行、大致正交等情形。又,於本發明中,所謂「附近」意指包括處於成為基準之位置附近之範圍(可任意確定)之區域。例如,於A之附近之情形時,該概念係表示處於A附近之範圍之區域,可包含A,亦可不包含A。 In addition, in the present invention, the term "approximately" includes not only the situation of being exactly the same, but also the concept of error or deformation to the extent that the identity is not lost. For example, the so-called approximately parallel is not limited to the situation of being strictly parallel, and includes concepts such as an error of about several degrees. Also, for example, when it is only expressed as parallel, orthogonal, etc., not only strictly parallel, orthogonal, etc., but also approximately parallel, approximately orthogonal, etc. are included. In addition, in the present invention, "nearby" means an area including a range (arbitrary determination) in the vicinity of a reference position. For example, in the case of the vicinity of A, the concept refers to the area in the vicinity of A, which may or may not include A.
1‧‧‧薄膜框架把持裝置 1‧‧‧Film frame holding device
10‧‧‧框體 10‧‧‧frame
11、12‧‧‧縱框部 11, 12‧‧‧Longitudinal frame
13、14‧‧‧上框部 13, 14‧‧‧upper frame
15‧‧‧框 15‧‧‧Frame
15a‧‧‧下端部 15a‧‧‧lower end
15b‧‧‧上端部 15b‧‧‧upper end
20‧‧‧薄膜把持部 20‧‧‧Film control part
21‧‧‧薄膜把持構件 21‧‧‧Film holding member
30‧‧‧測量部 30‧‧‧Measurement Department
100‧‧‧薄膜 100‧‧‧film
101‧‧‧薄膜框架 101‧‧‧Film frame
101a‧‧‧上表面 101a‧‧‧upper surface
101b‧‧‧下表面 101b‧‧‧lower surface
102‧‧‧薄膜之膜 102‧‧‧Membrane of thin film
M‧‧‧遮罩 M‧‧‧Masking
Claims (10)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2018010999A JP6921412B2 (en) | 2018-01-25 | 2018-01-25 | Pellicle frame gripping device and pellicle frame gripping method |
| JPJP2018-010999 | 2018-01-25 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW201933512A TW201933512A (en) | 2019-08-16 |
| TWI798327B true TWI798327B (en) | 2023-04-11 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW108100529A TWI798327B (en) | 2018-01-25 | 2019-01-07 | Film frame holding device and film frame holding method |
Country Status (5)
| Country | Link |
|---|---|
| JP (1) | JP6921412B2 (en) |
| KR (1) | KR102703121B1 (en) |
| CN (1) | CN111630453B (en) |
| TW (1) | TWI798327B (en) |
| WO (1) | WO2019146547A1 (en) |
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|---|---|---|---|---|
| JP2022101135A (en) | 2020-12-24 | 2022-07-06 | 株式会社ブイ・テクノロジー | Pellicle frame gripping device |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006163035A (en) * | 2004-12-08 | 2006-06-22 | Dainippon Printing Co Ltd | Large pellicle, pellicle transport method, pellicle case, and pellicle transfer device |
| JP2007510937A (en) * | 2003-10-06 | 2007-04-26 | トッパン、フォウタマスクス、インク | System and method for automatically mounting a pellicle assembly on a photomask. |
| WO2016133054A1 (en) * | 2015-02-19 | 2016-08-25 | 株式会社ブイ・テクノロジー | Pellicle frame gripping device and pellicle frame gripping method |
| JP2016218162A (en) * | 2015-05-18 | 2016-12-22 | 信越化学工業株式会社 | Pellicle and its mounting method |
| US20180329314A1 (en) * | 2014-11-17 | 2018-11-15 | Asml Netherlands B.V. | Mask Assembly |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH05281710A (en) * | 1992-04-03 | 1993-10-29 | Tosoh Corp | Manufacture of pellicle |
| JPH0683041A (en) * | 1992-09-03 | 1994-03-25 | Fujitsu Ltd | Pellicle attachment state inspection method and apparatus |
-
2018
- 2018-01-25 JP JP2018010999A patent/JP6921412B2/en active Active
-
2019
- 2019-01-07 TW TW108100529A patent/TWI798327B/en active
- 2019-01-21 KR KR1020207019887A patent/KR102703121B1/en active Active
- 2019-01-21 CN CN201980009593.9A patent/CN111630453B/en active Active
- 2019-01-21 WO PCT/JP2019/001668 patent/WO2019146547A1/en not_active Ceased
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2007510937A (en) * | 2003-10-06 | 2007-04-26 | トッパン、フォウタマスクス、インク | System and method for automatically mounting a pellicle assembly on a photomask. |
| JP2006163035A (en) * | 2004-12-08 | 2006-06-22 | Dainippon Printing Co Ltd | Large pellicle, pellicle transport method, pellicle case, and pellicle transfer device |
| US20180329314A1 (en) * | 2014-11-17 | 2018-11-15 | Asml Netherlands B.V. | Mask Assembly |
| WO2016133054A1 (en) * | 2015-02-19 | 2016-08-25 | 株式会社ブイ・テクノロジー | Pellicle frame gripping device and pellicle frame gripping method |
| JP2016218162A (en) * | 2015-05-18 | 2016-12-22 | 信越化学工業株式会社 | Pellicle and its mounting method |
Also Published As
| Publication number | Publication date |
|---|---|
| CN111630453A (en) | 2020-09-04 |
| CN111630453B (en) | 2023-08-25 |
| KR20200108280A (en) | 2020-09-17 |
| JP2019128501A (en) | 2019-08-01 |
| TW201933512A (en) | 2019-08-16 |
| KR102703121B1 (en) | 2024-09-05 |
| JP6921412B2 (en) | 2021-08-18 |
| WO2019146547A1 (en) | 2019-08-01 |
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