TWI782160B - split device - Google Patents
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- TWI782160B TWI782160B TW107145842A TW107145842A TWI782160B TW I782160 B TWI782160 B TW I782160B TW 107145842 A TW107145842 A TW 107145842A TW 107145842 A TW107145842 A TW 107145842A TW I782160 B TWI782160 B TW I782160B
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B28—WORKING CEMENT, CLAY, OR STONE
- B28D—WORKING STONE OR STONE-LIKE MATERIALS
- B28D5/00—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
- B28D5/0058—Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B28—WORKING CEMENT, CLAY, OR STONE
- B28D—WORKING STONE OR STONE-LIKE MATERIALS
- B28D5/00—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
- B28D5/04—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by tools other than rotary type, e.g. reciprocating tools
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Abstract
[課題] 提供可抑制在加熱時由擴展薄片所發生的發生氣體的成分附著在被加工物的表面的情形的分割裝置。 [解決手段] 本發明之分割裝置係具備有:固定被加工物單元(9)的環狀框架(8)的框架固定部(40);將擴展薄片(7)的環狀區域(101)以與被加工物(1)呈正交的方向按壓而將擴展薄片(7)擴張,將被加工物(1)破斷的薄片擴張單元;將經擴張的擴展薄片(7)的環狀區域(101)加熱而使其收縮的加熱單元(60);擴展薄片(7)加熱中,以被供給至被加工物(1)的表面的供給氣體(150)覆蓋被加工物(1)的表面,由從擴展薄片(7)所發生的發生氣體(160)遮蔽被加工物(1)的氣體供給單元(70);及在被加工物(1)的外周吸引發生氣體(160)及供給氣體(150)而進行排氣的吸引排氣單元(80)。[Problems] To provide a dividing device capable of suppressing the components of the generated gas generated by the expanded flakes from adhering to the surface of the workpiece during heating. [Solution] The dividing device of the present invention is equipped with: a frame fixing part (40) of the ring frame (8) fixing the workpiece unit (9); Press in the direction perpendicular to the workpiece (1) to expand the expanded sheet (7), and the sheet expansion unit that breaks the processed object (1); expand the ring-shaped area of the expanded sheet (7) ( 101) A heating unit (60) that heats and shrinks; while the expanding sheet (7) is being heated, the surface of the workpiece (1) is covered with the supply gas (150) supplied to the surface of the workpiece (1), The gas supply unit (70) that shields the workpiece (1) by the generated gas (160) generated from the expanded sheet (7); and sucks the generated gas (160) and the supply gas ( 150) to exhaust the suction exhaust unit (80).
Description
本發明係關於將被加工物分割成各個晶片的分割裝置。The present invention relates to a dividing device for dividing a workpiece into individual wafers.
一般而言,已知一種加工方法係對在表面形成有元件的被加工物(晶圓)照射雷射光線,沿著分割預定線,在內部形成改質層,將貼附有被加工物的擴展薄片(切割帶)擴張,藉此以改質層為破斷基點而分割成各個晶片。該類加工方法係將晶圓外周的擴展薄片擴張,因此在擴張後,擴展薄片鬆弛,造成逐漸擴張的晶片間隔變窄、或在搬送時,擴展薄片擺動而晶片彼此摩擦所致之缺口的原因。因此,開發出一種將擴張而鬆弛的擴展薄片加熱而使其收縮的加工技術與分割裝置(參照例如專利文獻1)。 [先前技術文獻] [專利文獻]In general, a processing method is known in which a laser beam is irradiated to a workpiece (wafer) with elements formed on its surface, and a modified layer is formed inside along the planned division line, and the wafer with the workpiece attached is The expanded sheet (dicing band) is expanded, and thereby divided into individual wafers with the modified layer as the breaking point. This type of processing method expands the expansion sheet on the outer periphery of the wafer, so after expansion, the expansion sheet relaxes, causing the gap between the gradually expanded wafers to narrow, or the cause of the gap caused by the friction between the wafers caused by the expansion sheet swinging during transportation. . Therefore, a processing technique and a dividing device have been developed that heat and shrink the expanded sheet that has been expanded and relaxed (see, for example, Patent Document 1). [Prior Art Document] [Patent Document]
[專利文獻1] 日本專利第5791866號公報[Patent Document 1] Japanese Patent No. 5791866
(發明所欲解決之課題)(Problem to be solved by the invention)
但是,在習知方法中,因將擴展薄片加熱,由擴展薄片發生氣體,會有該發生氣體的成分附著在被加工物(各晶片)的表面之虞。However, in the conventional method, since the expanded sheet is heated, gas is generated from the expanded sheet, and components of the generated gas may adhere to the surface of the workpiece (each wafer).
本發明係鑑於上述情形而完成者,目的在提供可抑制加熱時由擴展薄片所發生的發生氣體的成分附著在被加工物的表面的情形的分割裝置。 (解決課題之手段)The present invention was made in view of the above circumstances, and an object of the present invention is to provide a dividing device capable of suppressing components of generated gas generated by expanding sheets during heating from adhering to the surface of a workpiece. (means to solve the problem)
為解決上述課題,以達成目的,本發明係一種分割裝置,其係將由:沿著分割預定線而形成有分割起點的板狀的被加工物;貼附有該被加工物的擴展薄片;及貼附有該擴展薄片的外周的環狀框架所成之被加工物單元的該擴展薄片擴張而將被加工物破斷的分割裝置,其具備有:框架固定部,其係固定該被加工物單元的該環狀框架;薄片擴張單元,其係將該被加工物的外周與該環狀框架的內周的該擴展薄片的環狀區域以與該被加工物呈正交的方向按壓而將該擴展薄片擴張,將該被加工物由該分割起點破斷;加熱單元,其係具有將該經擴張的該擴展薄片的該環狀區域加熱而使其收縮的加熱部;氣體供給單元,其係該擴展薄片加熱中,對該被加工物的表面供給氣體而以該供給氣體覆蓋該被加工物的表面,由從該擴展薄片所發生的發生氣體遮蔽該被加工物;及吸引排氣單元,其係在該被加工物的外周吸引該發生氣體及該供給氣體而進行排氣。In order to solve the above-mentioned problems and achieve the purpose, the present invention is a splitting device, which is composed of: a plate-shaped workpiece with a splitting starting point formed along a planned splitting line; an expanded sheet to which the workpiece is attached; and The dividing device for breaking the workpiece by expanding the expanded sheet of the workpiece unit formed by the annular frame attached to the outer periphery of the expanded sheet is provided with a frame fixing part for fixing the workpiece The annular frame of the unit; the sheet expansion unit, which is to press the outer periphery of the workpiece and the annular region of the expanded sheet of the inner periphery of the annular frame in a direction perpendicular to the workpiece to The expanded sheet is expanded to break the workpiece from the splitting point; a heating unit has a heating portion that heats and shrinks the expanded annular region of the expanded sheet; a gas supply unit includes During the heating of the expanding sheet, the surface of the workpiece is supplied with gas to cover the surface of the workpiece with the supplied gas, and the workpiece is shielded by the generated gas generated from the expanding sheet; and a suction and exhaust unit , which sucks the generated gas and the supplied gas to the outer periphery of the workpiece to exhaust.
藉由該構成,由於具備有:擴展薄片加熱中,對被加工物的表面供給氣體而以該供給氣體覆蓋被加工物的表面,由從擴展薄片所發生的發生氣體遮蔽被加工物的氣體供給單元;及在被加工物的外周吸引發生氣體及供給氣體而進行排氣的吸引排氣單元,因此可抑制在加熱時由擴展薄片所發生的發生氣體的成分附著在被加工物的表面的情形。With this configuration, it is possible to supply gas to the surface of the workpiece during heating of the expanding sheet, cover the surface of the workpiece with the supplied gas, and shield the workpiece with the generated gas generated from the expanding sheet. unit; and a suction and exhaust unit that sucks the generated gas and the supplied gas to the outer periphery of the workpiece to exhaust, so that the component of the generated gas generated by the expanded sheet during heating can be suppressed from adhering to the surface of the workpiece .
在該構成中,亦可該吸引排氣單元的吸氣口係與該環狀區域相對面而鄰接該加熱部來作配置。藉由該構成,因加熱部的加熱所發生的發生氣體係通過鄰接加熱部的吸氣口而被迅速吸引,因此可有效抑制該發生氣體的成分附著在被加工物的表面的情形。 (發明之效果)In this configuration, the air intake port of the suction and exhaust unit may be disposed on a surface opposite to the annular region and adjacent to the heating portion. With this configuration, the generated gas generated by the heating of the heating part is quickly sucked through the suction port adjacent to the heating part, so that components of the generated gas can be effectively suppressed from adhering to the surface of the workpiece. (Effect of Invention)
藉由本發明,由於具備有:擴展薄片加熱中,對被加工物的表面供給氣體而以該供給氣體覆蓋被加工物的表面,由從擴展薄片所發生的發生氣體遮蔽被加工物的氣體供給單元;及在被加工物的外周吸引發生氣體及供給氣體而進行排氣的吸引排氣單元,因此可抑制在加熱時由擴展薄片所發生的發生氣體的成分附著在被加工物的表面的情形。According to the present invention, there is provided a gas supply unit that supplies gas to the surface of the workpiece during heating of the expanding sheet, covers the surface of the workpiece with the supplied gas, and shields the workpiece with the generated gas generated from the expanding sheet. ; and a suction and exhaust unit that sucks the generated gas and the supply gas on the periphery of the workpiece to exhaust, so that the components of the generated gas generated by the expanded sheet can be suppressed from adhering to the surface of the workpiece during heating.
一邊參照圖示,一邊詳細說明用以實施本發明的形態(實施形態)。並非為藉由以下之實施形態所記載的內容來限定本發明者。此外,在以下記載的構成要素係包含該領域熟習該項技術者可輕易想定者、實質上相同者。此外,以下記載的構成係可適當組合。此外,可在未脫離本發明之要旨的範圍內進行構成的各種省略、置換或變更。Embodiments (embodiments) for carrying out the present invention will be described in detail with reference to the drawings. The present inventors are not limited by the contents described in the following embodiments. In addition, the components described below include those that can be easily assumed by those skilled in the art and those that are substantially the same. In addition, the constitution described below can be combined suitably. In addition, various omissions, substitutions, or changes in configuration can be made without departing from the gist of the present invention.
根據圖示,說明本實施形態之分割裝置。圖1係顯示作為本實施形態之分割裝置的加工對象的被加工物之一例的斜視圖。圖2係顯示具備圖1所示之被加工物的被加工物單元之一例的斜視圖。圖3係顯示本實施形態之分割裝置的構成例的斜視圖。圖4係顯示分割裝置的構成例的剖面模式圖。圖5係顯示加熱單元的加熱部與吸引排氣單元的排氣部的配置構成例的斜視圖。The dividing device of this embodiment will be described based on the drawings. Fig. 1 is a perspective view showing an example of a workpiece to be processed by a dividing device according to the present embodiment. Fig. 2 is a perspective view showing an example of a workpiece unit including the workpiece shown in Fig. 1 . Fig. 3 is a perspective view showing a configuration example of the dividing device of the present embodiment. Fig. 4 is a schematic cross-sectional view showing a configuration example of a dividing device. Fig. 5 is a perspective view showing an example of arrangement and configuration of the heating unit of the heating unit and the exhaust unit of the suction and exhaust unit.
在本實施形態中,圖1所示之被加工物1被分割加工成各個晶片。被加工物1係將矽、藍寶石、砷化鎵或SiC(碳化矽)等作為基板2的圓板狀的半導體晶圓或光元件晶圓。被加工物1係如圖1所示,在表面5之以彼此交叉的複數分割預定線3所區劃的各區域分別形成有元件4。被加工物1係在表面5的背側的背面6貼附擴展薄片7,且在擴展薄片7的外周貼附環狀框架8,由背面6側沿著分割預定線3被照射對基板2具透過性的波長的雷射光線,在基板2的內部形成沿著分割預定線3的分割起點亦即改質層100(圖2中以虛線表示)。其中,改質層100意指形成為密度、折射率、機械強度或其他物理特性與周圍的各個不同的狀態的區域,可例示熔融處理區域、裂痕區域、絕緣破壞區域、折射率變化區域、及該等區域混合存在的區域等。此外,在本實施形態中,係形成改質層100作為分割起點,但是亦可形成雷射加工溝或切削溝等,來取代改質層100。In this embodiment, the
如圖2所示,沿著分割預定線3形成有改質層100的被加工物1、被貼附在被加工物1的背面6的擴展薄片7、及貼附有擴展薄片7的外周的環狀框架8係構成被加工物單元9。亦即,被加工物單元9係由:被加工物1、擴展薄片7、及環狀框架8所成。其中,擴展薄片7係由具伸縮性的樹脂所構成,具有若被加熱即收縮的熱收縮性。As shown in FIG. 2 , the
本實施形態之分割裝置10係將形成有改質層100的被加工物1沿著分割預定線3而分割成各個元件晶片(晶片)的裝置。分割裝置10係如圖3所示,具備有:腔室20、保持平台30、框架固定部40、薄片擴張單元50、加熱單元60、氣體供給單元70、吸引排氣單元80、及控制單元96。The dividing
腔室20係形成為上部形成有開口的箱狀。腔室20係收容有:保持平台30、框架固定部40的框架載置板件41、及薄片擴張單元50。The
保持平台30係具有透過擴展薄片7來吸引保持被加工物單元9的被加工物1的保持面31者。保持平台30係圓板形狀,具備有:由不銹鋼等金屬所成之圓板狀的框體32;及由多孔陶瓷等多孔質材所構成而且藉由框體32所圍繞的圓板狀的吸附部33。框體32與吸附部33的上面係配置在同一平面上,構成吸引保持被加工物1的保持面31。吸附部33係與被加工物1為大致相同直徑。在本實施形態中,被加工物單元9係在被吸附在搬送單元95的狀態下被搬送至保持平台30。The
在保持平台30的保持面31係如圖4所示,透過被加工物單元9的擴展薄片7來載置被加工物1的背面6側。保持平台30係吸附部33與真空吸引源34相連接,藉由真空吸引源34來吸引吸附部33,藉此可將被加工物1的背面6側吸引保持在保持面31。On the
框架固定部40係固定被加工物單元9的環狀框架8者。框架固定部40係具備有:框架載置板件41、及框架按壓板件42。框架載置板件41係如圖3所示,設有平面形狀為圓形的開口部411,而且形成為上面412與水平方向呈平行地平坦形成的板狀。框架載置板件41的開口部411的內徑係形成為比環狀框架8的內徑稍大。框架載置板件41係在開口部411內配置保持平台30,且開口部411配置成與保持平台30為同軸。此外,框架載置板件41係在四角隅安裝有空氣汽缸43的活塞桿431,藉由活塞桿431作伸縮而升降自如地配置。框架載置板件41係設有定心導件44,其係以水平方向移動自如地設在上面412的四角隅,而且藉由以水平方向移動來調整環狀框架8的位置,將被加工物1定位在與保持平台30的吸附部33為同軸的位置。The
框架按壓板件42係形成為與框架載置板件41為大致相同尺寸的板狀,在中央設有與開口部411為相同尺寸的圓形開口部421。框架按壓板件42係被安裝在空氣汽缸45的活塞桿451的前端,藉由活塞桿451作伸縮,遍及框架載置板件41的上方的位置、與由框架載置板件41的上方退避的位置移動自如。框架按壓板件42係在四角隅設有定心導件44可侵入的長孔422。The
框架固定部40係被定位在框架按壓板件42由框架載置板件41的上方退避的位置,在定心導件44彼此互相遠離的狀態下,在框架載置板件41的上面412載置藉由搬送單元95被搬送而來的被加工物單元9的環狀框架8。框架固定部40係使定心導件44彼此接近,而將被加工物單元9的被加工物1定位。框架固定部40係將框架按壓板件42定位在框架載置板件41的上方,使空氣汽缸43的活塞桿431伸張,而使框架載置板件41上升。藉此,如圖4所示,被加工物單元9的環狀框架8係夾在框架載置板件41與框架按壓板件42之間而被固定。The
薄片擴張單元50係使保持平台30與框架固定部40相對移動至沿著順沿鉛直方向的軸心而彼此遠離的位置,且將擴展薄片7擴張者。薄片擴張單元50係具備有:上頂構件51、及升降單元52。The
上頂構件51係形成為圓筒狀,形成為外徑比被載置於框架載置板件41的上面412的環狀框架8的內徑為小,且內徑比被貼附在擴展薄片7的被加工物1及保持平台30的外徑為大。上頂構件51係在內側配置保持平台30,配置成與保持平台30為同軸。在上頂構件51的上端係旋轉自如地安裝有被配置在與保持平台30的保持面31為同一平面上的滾輪構件511(顯示於圖4等)。The
升降單元52係如圖4所示,具備有:將上頂構件51作升降的上頂構件升降機構52A、及將保持平台30作升降的保持平台升降機構52B。上頂構件升降機構52A係具備有:2個汽缸外殼520、及被插通在該汽缸外殼520的活塞桿521,在活塞桿521的上端部固定有上頂構件51。上頂構件51的高度位置係以該2個上頂構件升降機構52A予以調節。此外,保持平台升降機構52B係具備有:2個汽缸外殼525、及被插通在該汽缸外殼525的活塞桿526,在活塞桿526的上端部係固定有保持平台30。保持平台30的高度位置係以該2個保持平台升降機構52B予以調節。在本實施形態中,藉由上頂構件升降機構52A與保持平台升降機構52B的調整,可將上頂構件51的高度位置與保持平台30一體或獨立地進行調整。As shown in FIG. 4 , the elevating
薄片擴張單元50係由被安裝在上頂構件51的上端的滾輪構件511與保持面31位於與框架載置板件41的上面412為同一平面上的狀態,升降單元52(上頂構件升降機構52A及保持平台升降機構52B)使上頂構件51與保持平台30一體上升,藉此使擴展薄片7以面方向擴張。The
加熱單元60係將經擴張的擴展薄片7的環狀框架8的內周亦即內緣與被加工物1的外周亦即外緣之間的環狀區域101(顯示於圖2及圖4)加熱而使其收縮者。加熱單元60係具備有:圓板狀的單元本體61、及被安裝在單元本體61的複數加熱部62。The
單元本體61係被配置在保持平台30的上方而且與保持平台30為同軸。單元本體61係具有:在中央部以鉛直方向延伸的支持軸611;及在單元本體61的外緣部以周方向以等間隔形成的複數開口部612。此外,單元本體61係藉由未圖示的移動單元而升降自如而設,而且繞著與鉛直方向呈平行的軸心旋轉自如而設。The
加熱部62係被配置在形成於單元本體61的外緣部的開口部612內。加熱部62係被配置在與保持平台30及被保持在框架固定部40的被加工物單元9的擴展薄片7的環狀區域101以鉛直方向相對向的位置。在本實施形態中,加熱部62(開口部612)係設有4個,但是在本發明中,並非限定為4個。加熱部62係朝下方照射紅外線,將擴展薄片7的環狀區域101加熱的形式者,例如若被施加電壓即被加熱,而放射紅外線的紅外線陶瓷加熱器。此外,加熱部62係可在開口部612內,以單元本體61的半徑方向及鉛直方向分別獨立移動。The
氣體供給單元70係在加熱部62將擴展薄片7的環狀區域101加熱中,對被加工物1的表面5供給氣體(例如空氣;供給氣體),而以該氣體覆蓋被加工物1的表面5者。在此,加熱部62將擴展薄片7的環狀區域101加熱時,有因揮發等而由擴展薄片7發生氣體(發生氣體)的情形。若該發生氣體在被加工物1上滯留,有該發生氣體的成分附著在被加工物1的表面(元件)之虞。因此,氣體供給單元70係以所供給的氣體覆蓋被加工物1的表面5,藉此由在將擴展薄片7加熱時所發生的發生氣體遮蔽被加工物1。氣體供給單元70係具備有:形成在加熱單元60的單元本體61的中央,朝向被加工物1噴射氣體的噴射口71;與該噴射口71相連通而形成在支持軸611的內部的供給路72;連接於該供給路72的閥73;及氣體供給源74。當將擴展薄片7的環狀區域101加熱時,打開閥73,使由氣體供給源74被供給的氣體由噴射口71噴射。藉此,在被加工物1的上方形成有氣體流(空氣層)而覆蓋被加工物1的表面5。The
吸引排氣單元80係在被加工物1的外周側,吸引氣體供給單元70所供給的氣體、及將擴展薄片7加熱時所發生的發生氣體而進行排氣者。吸引排氣單元80係具備有:排氣區塊(排氣部)81、與該排氣區塊81相連結的排氣路82、及連接於該等排氣路82的吸引源83。在本實施形態中,2個排氣區塊81係如圖5所示,夾著加熱部62作配置,在各排氣區塊81的下面形成有吸氣口811。該等吸氣口811係與擴展薄片7的環狀區域101相對面而鄰接加熱部62作配置,因此因加熱部62的加熱所發生的發生氣體係可透過鄰接加熱部62的吸氣口811而迅速被吸引且進行排氣。此外,排氣區塊81係被連結於加熱部62,連同加熱部62一起在開口部612內分別以單元本體61的半徑方向及鉛直方向移動。The suction and
此外,在本實施形態中,分割裝置10係有別於吸引排氣單元80,另外具備有:輔助吸引排氣單元90。該輔助吸引排氣單元90係比吸引排氣單元80被設在離被加工物1更為外周側的位置,吸引原在吸引排氣單元80無法吸引到的發生氣體而進行排氣者。輔助吸引排氣單元90係例如具備有:形成為圓筒狀,以周方向以等間隔配置在框架載置板件41的外側的複數排氣筒91;與該排氣筒91相連結的排氣路92;及連接於該等排氣路92的吸引源93。排氣筒91係分別朝向框架載置板件41而形成有吸氣口911。在本實施形態中,排氣筒91係形成為在腔室20的外側設有2個、在腔室20的內側設有2個的構成,但是排氣筒91的形狀及數量並非為侷限於上述構成者。藉由設置該輔助吸引排氣單元90,例如即使為上述發生氣體已進入至腔室20內的情形,亦透過排氣筒91來吸引該等發生氣體且進行排氣,因此可抑制在腔室20內及腔室20外的各部位附著發生氣體的成分的情形。In addition, in the present embodiment, the
控制單元96係分別控制分割裝置10的上述構成要素,亦即薄片擴張單元50、加熱單元60、氣體供給單元70、吸引排氣單元80、及輔助吸引排氣單元90等,使分割裝置10實施對被加工物1的加工動作者。其中,控制單元96係電腦。控制單元96係連接於:藉由顯示加工動作的狀態或畫像等的液晶顯示裝置等所構成的未圖示的顯示單元、及操作人員登錄加工內容資訊等時所使用的未圖示的輸入單元。輸入單元係藉由設在顯示單元的觸控面板、與鍵盤等外部輸入裝置之中至少一個所構成。The control unit 96 is to respectively control the above-mentioned constituent elements of the dividing
接著,說明本實施形態之分割裝置10的動作。首先,如圖4所示,透過擴展薄片7而將被加工物單元9的被加工物1載置於保持平台30的保持面31,且以框架固定部40固定環狀框架8。控制單元96係將框架固定部40的框架按壓板件42定位在退避位置,在使空氣汽缸43的活塞桿431縮小且將框架載置板件41的上面412定位在比保持面31更為下方的狀態下,使搬送單元95(參照圖3)將形成有沿著分割預定線3的改質層100的被加工物單元9搬送至保持平台30的上方。接著,透過擴展薄片7,將被加工物1的背面6載置於保持面31。Next, the operation of the dividing
控制單元96係使空氣汽缸45的活塞桿451伸張而將框架按壓板件42定位在框架載置板件41的上方,使空氣汽缸43的活塞桿431伸張,而使框架載置板件41上升。藉此,被加工物單元9的環狀框架8係被夾持在框架載置板件41與框架按壓板件42之間。The control unit 96 stretches the
接著,控制單元96係將框架固定部40的定心導件44彼此接近,將被加工物單元9的被加工物1定位,而將被加工物單元9的環狀框架8固定在框架載置板件41與框架按壓板件42之間。此時,若將被加工物單元9的環狀框架8固定在框架載置板件41與框架按壓板件42之間,框架載置板件41與保持平台30係位於上面412與被安裝在上頂構件51的上端的滾輪構件511及保持面31位於同一平面上的近接位置,上頂構件51的滾輪構件511抵接於擴展薄片7的環狀區域101。Next, the control unit 96 approaches the centering guides 44 of the
圖6係顯示使薄片擴張單元上升而將擴展薄片擴張的狀態的分割裝置的剖面模式圖。圖7係顯示在將擴展薄片擴張之後,使薄片擴張單元降下的狀態的分割裝置的剖面模式圖。在將被加工物單元9的環狀框架8固定在框架載置板件41與框架按壓板件42之間之後,使保持平台30與框架固定部40以與被加工物1的表面呈正交的軸心方向相對移動,將被加工物1的外周亦即外緣與環狀框架8的內周亦即內緣之間的擴展薄片7的環狀區域101擴張。亦即,控制單元96係使薄片擴張單元50的升降單元52(上頂構件升降機構52A及保持平台升降機構52B)的各活塞桿521、526分別伸張,而使上頂構件51及保持平台30的高度位置上升。如此一來,由於設在上頂構件51的上端的滾輪構件511抵接於擴展薄片7的環狀區域101,擴展薄片7以面方向被擴張。因擴展薄片7擴張,對擴展薄片7以放射狀作用拉伸力。Fig. 6 is a schematic cross-sectional view of the dividing device in a state where the expanded sheet is expanded by raising the sheet expanding unit. Fig. 7 is a schematic cross-sectional view showing the dividing device in a state where the sheet expanding unit is lowered after expanding the expanded sheet. After the
如上所示若對被貼附在被加工物1的背面6的擴展薄片7以放射狀作用拉伸力,被加工物1係以沿著分割預定線3所形成的改質層100(圖4)為基點,如圖6所示,被分割成複數晶片110,並且晶片110間擴展,在晶片110間分別形成間隔111。此外,擴展薄片7擴張時,擴展薄片7的環狀區域101係該環狀區域101的剖面由環狀框架8的下面朝向滾輪構件511的上面而成為直線狀。As described above, when a tensile force is applied radially to the
接著,控制單元96係驅動真空吸引源34,藉由真空吸引源34吸引吸附部33,將被加工物1的背面6側,透過擴展薄片7而吸引保持在保持面31,來維持晶片110間的間隔111。接著,在驅動真空吸引源34的狀態下,控制單元96係使薄片擴張單元50的升降單元52(上頂構件升降機構52A及保持平台升降機構52B)的各活塞桿521、526分別短縮,如圖7所示,使上頂構件51及保持平台30下降至與框架載置板件41為相同的高度位置。在該狀態下,如圖7所示,由於設在上頂構件51的上端的滾輪構件511由擴展薄片7的環狀區域101分離,因此經擴張的擴展薄片7的環狀區域101係在上方鬆弛。Next, the control unit 96 drives the
圖8係顯示將擴展薄片的環狀區域加熱而使其收縮的狀態的分割裝置的剖面模式圖。接著,將因擴張而鬆弛的擴展薄片7的環狀區域101加熱而使其收縮。控制單元96係如圖8所示,對加熱單元60的加熱部62施加電壓等,加熱至預定溫度而由加熱部62放射紅外線。接著,使用移動單元(未圖示)使加熱單元60下降,將加熱部62接近環狀區域101,並且使加熱單元60繞軸心旋轉。在本實施形態中,在加熱單元60的單元本體61設有氣體供給單元70的噴射口71及吸引排氣單元80的排氣區塊81,因此該等噴射口71及排氣區塊81亦連同加熱單元60一起下降。此外,控制單元96係打開氣體供給單元70的閥73,由噴射口71朝向晶片110(被加工物1)噴射供給氣體150,並且使吸引排氣單元80的吸引源83進行動作。Fig. 8 is a schematic cross-sectional view of a dividing device showing a state in which an annular region of an expanded sheet is heated and shrunk. Next, the
藉此,藉由從與擴展薄片7的環狀區域101相對向的加熱部62被放射出的紅外線,擴展薄片7的環狀區域101被加熱,可使該環狀區域101的鬆弛收縮。此外,由噴射口71朝向晶片110(被加工物1)噴射供給氣體150,並且使吸引排氣單元80的吸引源83進行動作,因此在被加工物1的上方形成由中央朝向外側(環狀框架8側)的供給氣體150流(空氣層)。因此,即使藉由加熱而由擴展薄片7產生發生氣體160,該發生氣體160係連同供給氣體150一起通過形成在吸引排氣單元80的排氣區塊81的吸氣口811(圖5)而被排氣,因此可抑制上述發生氣體160的成分附著在晶片110(被加工物1)的情形。Thereby, the
此外,控制單元96係藉由使輔助吸引排氣單元90的吸引源93進行動作,可透過排氣筒91,吸引原在吸引排氣單元80無法吸引的發生氣體160來進行排氣。因此,例如,即使在原在吸引排氣單元80無法吸引的發生氣體160已進入至腔室20內的情形下,亦將該等發生氣體160透過排氣筒91進行吸引來排氣,因此可抑制發生氣體160的成分附著在腔室20內及腔室20外的各部位的情形。In addition, the control unit 96 operates the
若使擴展薄片7的環狀區域101充分收縮,關閉閥73,而停止加熱部62的加熱及吸引源83、93,並且使加熱單元60上升,而解除框架固定部40的環狀框架8的固定。如此一來,被加工物單元9係藉由經擴張的擴展薄片7的環狀區域101被收縮,即使解除保持平台30的吸附部33的吸引,亦維持晶片110間的間隔111。If the
如以上說明所示,本實施形態之分割裝置10係將由:沿著分割預定線3而形成有成為分割起點的改質層100的板狀的被加工物1;貼附有被加工物1的擴展薄片7;及貼附有擴展薄片7的外周的環狀框架8所成之被加工物單元9的擴展薄片7擴張而將被加工物1破斷者,其具備有:固定被加工物單元9的環狀框架8的框架固定部40;將被加工物1的外周與環狀框架8的內周的擴展薄片7的環狀區域101以與被加工物1呈正交的方向按壓而將擴展薄片7擴張,將被加工物1由改質層100破斷的薄片擴張單元50;具有將經擴張的擴展薄片7的環狀區域101加熱而使其收縮的加熱部62的加熱單元60;擴展薄片7加熱中,對被加工物1的表面供給氣體而以該供給氣體150覆蓋被加工物1的表面,由從擴展薄片7所發生的發生氣體160遮蔽被加工物1的氣體供給單元70;及在被加工物1的外周吸引發生氣體160及供給氣體150而進行排氣的吸引排氣單元80,因此可抑制在加熱時由擴展薄片7所發生的發生氣體160的成分附著在被加工物1的表面的情形。As described above, the dividing
此外,吸引排氣單元80的吸氣口811係與環狀區域101相對面而鄰接該加熱部62來作配置,因此因加熱部62的加熱所發生的發生氣體160係透過鄰接加熱部62的吸氣口811而被迅速吸引,因此可有效抑制該發生氣體160的成分附著在被加工物1的表面的情形。In addition, the
以上說明本發明之一實施形態,惟上述實施形態係作為例子而提示者,並非意圖限定發明之範圍。One embodiment of the present invention has been described above, but the above-mentioned embodiment is presented as an example and is not intended to limit the scope of the invention.
1‧‧‧被加工物2‧‧‧基板3‧‧‧分割預定線4‧‧‧元件5‧‧‧表面6‧‧‧背面7‧‧‧擴展薄片8‧‧‧環狀框架9‧‧‧被加工物單元10‧‧‧分割裝置20‧‧‧腔室30‧‧‧保持平台31‧‧‧保持面32‧‧‧框體33‧‧‧吸附部34‧‧‧真空吸引源40‧‧‧框架固定部41‧‧‧框架載置板件411‧‧‧開口部412‧‧‧上面42‧‧‧框架按壓板件421‧‧‧圓形開口部422‧‧‧長孔43‧‧‧空氣汽缸431‧‧‧活塞桿44‧‧‧定心導件45‧‧‧空氣汽缸451‧‧‧活塞桿50‧‧‧薄片擴張單元51‧‧‧上頂構件511‧‧‧滾輪構件52‧‧‧升降單元52A‧‧‧上頂構件升降機構52B‧‧‧保持平台升降機構520‧‧‧汽缸外殼521‧‧‧活塞桿525‧‧‧汽缸外殼526‧‧‧活塞桿60‧‧‧加熱單元61‧‧‧單元本體611‧‧‧支持軸612‧‧‧開口部62‧‧‧加熱部70‧‧‧氣體供給單元71‧‧‧噴射口72‧‧‧供給路73‧‧‧閥74‧‧‧氣體供給源80‧‧‧吸引排氣單元81‧‧‧排氣區塊811‧‧‧吸氣口82‧‧‧排氣路83‧‧‧吸引源90‧‧‧輔助吸引排氣單元91‧‧‧排氣筒911‧‧‧吸氣口92‧‧‧排氣路93‧‧‧吸引源95‧‧‧搬送單元96‧‧‧控制單元100‧‧‧改質層(分割起點)101‧‧‧環狀區域110‧‧‧晶片111‧‧‧間隔150‧‧‧供給氣體160‧‧‧發生氣體1‧‧‧processed object 2‧‧‧substrate 3‧‧‧separation plan 4‧‧‧component 5‧‧‧surface 6‧‧‧rear surface 7‧‧‧extended sheet 8‧‧‧ring frame 9‧‧ ‧Processed object unit 10 ‧‧Frame fixing part 41‧‧‧Frame mounting plate 411‧‧‧Opening part 412‧‧‧Front surface 42‧‧‧Frame pressing plate 421‧‧‧Circular opening 422‧‧‧Elongated hole 43‧‧ ‧Air cylinder 431‧‧‧piston rod 44‧‧‧centering guide 45‧‧‧air cylinder 451‧‧‧piston rod 50‧‧‧sheet expansion unit 51‧‧‧top member 511‧‧‧roller member 52 ‧‧‧Elevating Unit 52A‧‧‧Elevating Mechanism for Upper Member 52B‧‧‧Holding Platform Lifting Mechanism 520‧‧‧Cylinder Housing 521‧‧‧Piston Rod 525‧‧‧Cylinder Housing 526‧‧‧Piston Rod 60‧‧‧ Heating unit 61‧‧‧unit body 611‧‧‧support shaft 612‧‧‧opening portion 62‧‧‧heating part 70‧‧‧gas supply unit 71‧‧‧injection port 72‧‧‧supply path 73‧‧‧valve 74‧‧‧gas supply source 80‧‧‧suction exhaust unit 81‧‧‧exhaust block 811‧‧‧suction port 82‧‧‧exhaust path 83‧‧‧suction source 90‧‧‧auxiliary suction exhaust Air unit 91‧‧‧Exhaust tube 911‧‧‧Suction port 92‧‧‧Exhaust path 93‧‧‧Suction source 95‧‧‧Conveying unit 96‧‧‧Control unit 100‧‧‧Modified layer (divided Starting point) 101‧‧‧annular area 110‧‧‧wafer 111‧‧‧interval 150‧‧‧gas supply 160‧‧‧generated gas
圖1係顯示作為本實施形態之分割裝置之加工對象的被加工物之一例的斜視圖。 圖2係顯示具備圖1所示之被加工物的被加工物單元之一例的斜視圖。 圖3係顯示本實施形態之分割裝置的構成例的斜視圖。 圖4係顯示分割裝置的構成例的剖面模式圖。 圖5係顯示加熱單元的加熱部與吸引排氣單元的排氣部的配置構成例的斜視圖。 圖6係顯示使薄片擴張單元上升而將擴展薄片擴張後的狀態的分割裝置的剖面模式圖。 圖7係顯示在將擴展薄片擴張後,使薄片擴張單元降下後的狀態的分割裝置的剖面模式圖。 圖8係顯示將擴展薄片的環狀區域加熱而使其收縮的狀態的分割裝置的剖面模式圖。Fig. 1 is a perspective view showing an example of a workpiece to be processed by a dividing device according to the present embodiment. Fig. 2 is a perspective view showing an example of a workpiece unit including the workpiece shown in Fig. 1 . Fig. 3 is a perspective view showing an example of the structure of the dividing device of this embodiment. Fig. 4 is a schematic cross-sectional view showing an example of the structure of the dividing device. Fig. 5 is a perspective view showing an example of the arrangement of the heating unit of the heating unit and the exhaust unit of the suction and exhaust unit. Fig. 6 is a schematic cross-sectional view showing the splitting device in a state where the expanded sheet is expanded by raising the sheet expanding unit. Fig. 7 is a schematic cross-sectional view showing the splitting device in a state where the sheet expanding unit is lowered after expanding the expanded sheet. Fig. 8 is a schematic cross-sectional view of a splitting device showing a state in which an annular region of an expanded sheet is heated and shrunk.
1‧‧‧被加工物 1‧‧‧processed object
7‧‧‧擴展薄片 7‧‧‧Extended sheet
8‧‧‧環狀框架 8‧‧‧Ring frame
9‧‧‧被加工物單元 9‧‧‧Processed object unit
10‧‧‧分割裝置 10‧‧‧Splitting device
20‧‧‧腔室 20‧‧‧chamber
30‧‧‧保持平台 30‧‧‧maintain the platform
33‧‧‧吸附部 33‧‧‧Adsorption part
34‧‧‧真空吸引源 34‧‧‧Vacuum suction source
40‧‧‧框架固定部 40‧‧‧Frame fixing part
41‧‧‧框架載置板件 41‧‧‧Frame mounting plate
42‧‧‧框架按壓板件 42‧‧‧Frame pressing plate
43‧‧‧空氣汽缸 43‧‧‧air cylinder
431‧‧‧活塞桿 431‧‧‧piston rod
51‧‧‧上頂構件 51‧‧‧top member
511‧‧‧滾輪構件 511‧‧‧Roller component
52A‧‧‧上頂構件升降機構 52A‧‧‧Elevating mechanism of upper member
52B‧‧‧保持平台升降機構 52B‧‧‧maintaining platform lifting mechanism
520‧‧‧汽缸外殼 520‧‧‧Cylinder shell
521‧‧‧活塞桿 521‧‧‧piston rod
525‧‧‧汽缸外殼 525‧‧‧Cylinder shell
526‧‧‧活塞桿 526‧‧‧piston rod
60‧‧‧加熱單元 60‧‧‧heating unit
61‧‧‧單元本體 61‧‧‧unit body
611‧‧‧支持軸 611‧‧‧Support shaft
612‧‧‧開口部 612‧‧‧opening
62‧‧‧加熱部 62‧‧‧Heating Department
70‧‧‧氣體供給單元 70‧‧‧gas supply unit
71‧‧‧噴射口 71‧‧‧jet port
72‧‧‧供給路 72‧‧‧Supply Road
73‧‧‧閥 73‧‧‧valve
74‧‧‧氣體供給源 74‧‧‧gas supply source
80‧‧‧吸引排氣單元 80‧‧‧Suction exhaust unit
81‧‧‧排氣區塊 81‧‧‧Exhaust block
82‧‧‧排氣路 82‧‧‧Exhaust Road
83‧‧‧吸引源 83‧‧‧Attraction source
90‧‧‧輔助吸引排氣單元 90‧‧‧Auxiliary suction exhaust unit
91‧‧‧排氣筒 91‧‧‧exhaust pipe
92‧‧‧排氣路 92‧‧‧Exhaust Road
93‧‧‧吸引源 93‧‧‧Attraction source
101‧‧‧環狀區域 101‧‧‧circular area
110‧‧‧晶片 110‧‧‧chip
150‧‧‧供給氣體 150‧‧‧gas supply
160‧‧‧發生氣體 160‧‧‧Gas generation
Claims (1)
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| JP2017244119A JP7076204B2 (en) | 2017-12-20 | 2017-12-20 | Split device |
| JP2017-244119 | 2017-12-20 |
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| TWI782160B true TWI782160B (en) | 2022-11-01 |
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| TW107145842A TWI782160B (en) | 2017-12-20 | 2018-12-19 | split device |
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| JP (1) | JP7076204B2 (en) |
| KR (1) | KR20190074961A (en) |
| CN (1) | CN110010522B (en) |
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| JP7313219B2 (en) * | 2019-07-22 | 2023-07-24 | 株式会社ディスコ | Expanding method and expanding device |
| JP7325258B2 (en) * | 2019-08-14 | 2023-08-14 | 株式会社ディスコ | Expanding device |
| JP7679207B2 (en) * | 2021-02-24 | 2025-05-19 | 株式会社ディスコ | Expansion Unit |
| WO2023042260A1 (en) * | 2021-09-14 | 2023-03-23 | ヤマハ発動機株式会社 | Expansion device |
| KR102542890B1 (en) * | 2023-04-03 | 2023-06-13 | 남진우 | Wafer elongation device |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2014140856A (en) * | 2013-01-22 | 2014-08-07 | Disco Abrasive Syst Ltd | Laser processing device |
| TW201613436A (en) * | 2014-07-01 | 2016-04-01 | Disco Corp | Chip spacing maintaining apparatus |
| TW201633446A (en) * | 2014-12-05 | 2016-09-16 | 琳得科股份有限公司 | Separation device and separation method |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5791866A (en) | 1980-11-26 | 1982-06-08 | Kubota Ltd | Production of composite roll for rolling which is not constant in thickness of outside shell layer |
| JP3290943B2 (en) * | 1997-01-16 | 2002-06-10 | 東京エレクトロン株式会社 | Resist coating / developing apparatus and resist processing method |
| JP2007059633A (en) * | 2005-08-24 | 2007-03-08 | Tokyo Electron Ltd | Substrate heating apparatus and substrate heating method |
| JP6249586B2 (en) | 2011-08-31 | 2017-12-20 | 株式会社東京精密 | Work dividing apparatus and work dividing method |
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2017
- 2017-12-20 JP JP2017244119A patent/JP7076204B2/en active Active
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- 2018-12-18 CN CN201811550001.8A patent/CN110010522B/en active Active
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2014140856A (en) * | 2013-01-22 | 2014-08-07 | Disco Abrasive Syst Ltd | Laser processing device |
| TW201613436A (en) * | 2014-07-01 | 2016-04-01 | Disco Corp | Chip spacing maintaining apparatus |
| TW201633446A (en) * | 2014-12-05 | 2016-09-16 | 琳得科股份有限公司 | Separation device and separation method |
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| JP7076204B2 (en) | 2022-05-27 |
| CN110010522B (en) | 2024-05-03 |
| TW201929064A (en) | 2019-07-16 |
| CN110010522A (en) | 2019-07-12 |
| JP2019110268A (en) | 2019-07-04 |
| KR20190074961A (en) | 2019-06-28 |
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